JP7015668B2 - 板状物の分割装置 - Google Patents
板状物の分割装置 Download PDFInfo
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- JP7015668B2 JP7015668B2 JP2017197829A JP2017197829A JP7015668B2 JP 7015668 B2 JP7015668 B2 JP 7015668B2 JP 2017197829 A JP2017197829 A JP 2017197829A JP 2017197829 A JP2017197829 A JP 2017197829A JP 7015668 B2 JP7015668 B2 JP 7015668B2
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- plate
- shaped object
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
- B28D5/0023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rectilinearly
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0017—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools
- B28D5/0029—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing using moving tools rotating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0052—Means for supporting or holding work during breaking
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0088—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being angularly adjustable
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
11 フレーム保持手段
12 分割手段
13 移動手段
20 保持部
21 押圧部
23 第1保持部
24 第2保持部
27 矩形状当接部材
55 検出手段
C チップ
F 環状フレーム
L 分割予定ライン
T 保護テープ
W 板状物
Claims (2)
- 環状フレームに装着された保護テープの上面に貼着され分割予定ラインに沿って強度が低下して形成されている板状物を、該分割予定ラインに沿って分割する板状物の分割装置であって、
該環状フレームを保持する保持面を有し回転可能に構成されたフレーム保持手段と、該保護テープに貼着された該板状物の分割予定ラインを検出する検出手段と、該検出手段によって検出された該板状物の該分割予定ラインの近傍を押圧し、該板状物を該分割予定ラインに沿ってチップに分割する分割手段と、該フレーム保持手段と該分割手段とを相対的に移動させる移動手段と、を備え、
該分割手段は、該板状物の割断する分割予定ライン近傍を該板状物の上面及び下面の両面側から保持する保持部と、該保持部により保持しているチップの該割断する分割予定ラインに対して隣り合うチップを押圧して該分割予定ラインに沿って分割する押圧部と、を備え、
該押圧部は、進退手段と、該進退手段に接続された押し下げ部材とを備え、
該保持部で該板状物を挟んで保持し、該進退手段の駆動によって該押し下げ部材を該板状物に対して進行させて該分割予定ラインに沿って分割し、該進退手段の駆動によって該押し下げ部材を該板状物に対して退行し、該保持部を該板状物から退行する分割要領を、該板状物の各該分割予定ラインにて繰り返す板状物の分割装置。 - 該保持部は、該保護テープを介して該板状物の下面側から該板状物を突き上げる第1保持部と、該板状物に対して該第1保持部と対向して該板状物の上方に配設され且つ該板状物を上方から当接して保持する第2保持部とを備え、
該第1保持部は、様々な長さの複数の矩形状当接部材を備え、該分割予定ラインの長さに応じて対応する長さの該矩形状当接部材が位置付けられること、を特徴とする請求項1記載の板状物の分割装置。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017197829A JP7015668B2 (ja) | 2017-10-11 | 2017-10-11 | 板状物の分割装置 |
MYPI2018703630A MY191251A (en) | 2017-10-11 | 2018-10-02 | Apparatus for dividing workpiece |
SG10201808747SA SG10201808747SA (en) | 2017-10-11 | 2018-10-03 | Apparatus for dividing workpiece |
US16/153,010 US10818523B2 (en) | 2017-10-11 | 2018-10-05 | Apparatus for dividing workpiece |
CN201811168040.1A CN109659253B (zh) | 2017-10-11 | 2018-10-08 | 板状物的分割装置 |
KR1020180119654A KR102515300B1 (ko) | 2017-10-11 | 2018-10-08 | 판형물의 분할 장치 |
TW107135497A TWI799452B (zh) | 2017-10-11 | 2018-10-09 | 板狀物的分割裝置 |
DE102018217297.8A DE102018217297B4 (de) | 2017-10-11 | 2018-10-10 | Vorrichtung zum Teilen eines Werkstücks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017197829A JP7015668B2 (ja) | 2017-10-11 | 2017-10-11 | 板状物の分割装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019071390A JP2019071390A (ja) | 2019-05-09 |
JP7015668B2 true JP7015668B2 (ja) | 2022-02-03 |
Family
ID=65816759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2017197829A Active JP7015668B2 (ja) | 2017-10-11 | 2017-10-11 | 板状物の分割装置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US10818523B2 (ja) |
JP (1) | JP7015668B2 (ja) |
KR (1) | KR102515300B1 (ja) |
CN (1) | CN109659253B (ja) |
DE (1) | DE102018217297B4 (ja) |
MY (1) | MY191251A (ja) |
SG (1) | SG10201808747SA (ja) |
TW (1) | TWI799452B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200075386A1 (en) * | 2018-08-30 | 2020-03-05 | Texas Instruments Incorporated | Subring for semiconductor dies |
JP7355618B2 (ja) * | 2018-12-04 | 2023-10-03 | 株式会社ディスコ | ウエーハ分割装置 |
CN110739261B (zh) * | 2019-11-20 | 2024-09-27 | 西北电子装备技术研究所(中国电子科技集团公司第二研究所) | 一种石英舟硅片的顶升机构 |
JP2023128800A (ja) * | 2022-03-04 | 2023-09-14 | 株式会社ディスコ | 分割装置 |
JP2024027963A (ja) | 2022-08-19 | 2024-03-01 | 株式会社ディスコ | ブレーキング装置及びブレーキング方法 |
CN117533788B (zh) * | 2023-11-10 | 2024-04-19 | 珠海诚锋电子科技有限公司 | 一种自动上下料的圆晶检测设备及其使用方法 |
Citations (3)
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JP2014120508A (ja) | 2012-12-13 | 2014-06-30 | Disco Abrasive Syst Ltd | 分割装置および分割方法 |
JP2017073443A (ja) | 2015-10-06 | 2017-04-13 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
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2017
- 2017-10-11 JP JP2017197829A patent/JP7015668B2/ja active Active
-
2018
- 2018-10-02 MY MYPI2018703630A patent/MY191251A/en unknown
- 2018-10-03 SG SG10201808747SA patent/SG10201808747SA/en unknown
- 2018-10-05 US US16/153,010 patent/US10818523B2/en active Active
- 2018-10-08 CN CN201811168040.1A patent/CN109659253B/zh active Active
- 2018-10-08 KR KR1020180119654A patent/KR102515300B1/ko active Active
- 2018-10-09 TW TW107135497A patent/TWI799452B/zh active
- 2018-10-10 DE DE102018217297.8A patent/DE102018217297B4/de active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011243804A (ja) | 2010-05-19 | 2011-12-01 | Disco Abrasive Syst Ltd | 板状物の分割装置 |
JP2014120508A (ja) | 2012-12-13 | 2014-06-30 | Disco Abrasive Syst Ltd | 分割装置および分割方法 |
JP2017073443A (ja) | 2015-10-06 | 2017-04-13 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
Also Published As
Publication number | Publication date |
---|---|
MY191251A (en) | 2022-06-10 |
SG10201808747SA (en) | 2019-05-30 |
DE102018217297B4 (de) | 2024-12-05 |
KR20190040904A (ko) | 2019-04-19 |
DE102018217297A1 (de) | 2019-04-11 |
CN109659253B (zh) | 2024-03-12 |
TW201914972A (zh) | 2019-04-16 |
TWI799452B (zh) | 2023-04-21 |
US10818523B2 (en) | 2020-10-27 |
US20190109023A1 (en) | 2019-04-11 |
JP2019071390A (ja) | 2019-05-09 |
KR102515300B1 (ko) | 2023-03-28 |
CN109659253A (zh) | 2019-04-19 |
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