JP6661969B2 - 異方性導電フィルム及び接続構造体 - Google Patents
異方性導電フィルム及び接続構造体 Download PDFInfo
- Publication number
- JP6661969B2 JP6661969B2 JP2015211174A JP2015211174A JP6661969B2 JP 6661969 B2 JP6661969 B2 JP 6661969B2 JP 2015211174 A JP2015211174 A JP 2015211174A JP 2015211174 A JP2015211174 A JP 2015211174A JP 6661969 B2 JP6661969 B2 JP 6661969B2
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- Prior art keywords
- conductive
- particles
- conductive film
- conductive particles
- anisotropic conductive
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Description
Lx>(Lb+Le)
Lx>(Ld+Le)
を満たすように接続端子20の端子間距離Lxに対し、該端子間距離Lxの方向の導電粒子ユニット3の長さLdと導電粒子2の粒子径Leを調整すればよい。
Lx>(Ld+Le)
が満たされないと接続端子20間でショートが発生し易くなる。しかしながら、導電粒子ユニット3を構成する導電粒子2の粒子径Leや導電粒子2の配列数が等しくても、同図(b)に示すように、端子間距離Lxの方向に対して導電粒子ユニット3の長手方向を傾け、端子間距離Lxの方向の導電粒子ユニット3の長さLdを短くし、上述の式が満たされるようにすればよい。
実施例1〜11及び比較例1、2
<異方導性導電フィルムの製造の概要>
導電粒子ユニットの中心の配列が長方格子を形成し、一つの導電粒子ユニットあたりの導電粒子の個数(以下、連結個数という)、導電粒子の粒子径(μm)、導電粒子ユニットの最大長(μm)、異方性導電フィルムの長手方向に対する導電粒子ユニットの長手方向の角度θ、隣接する導電粒子ユニットの導電粒子同士の最近接距離La(μm)、導電粒子の配置密度(個/mm2)が表1に示す数値の異方性導電フィルムを製造した。
ジビニルベンゼン、スチレン、ブチルメタクリレートの混合比を調整した溶液に、重合開始剤としてベンゾイルパーオキサイドを投入して高速で均一攪拌しながら加熱を行い、重合反応を行うことにより微粒子分散液を得た。前記微粒子分散液をろ過し減圧乾燥することにより微粒子の凝集体であるブロック体を得た。更に、前記ブロック体を粉砕し分級することにより、平均粒子径2μm、3μmおよび6μmのジビニルベンゼン系樹脂粒子を得た。
この導電粒子が絶縁接着剤層中に表1の配列で含まれている異方性導電フィルムを次のようにして製造した。まず、フェノキシ樹脂(新日鉄住金化学(株)、YP−50)60質量部、エポキシ樹脂(三菱化学(株)、jER828)40質量部、カチオン重合開始剤(潜在性硬化剤)(三新化学工業(株)、SI−60L)2質量部を含有する熱重合性の絶縁性樹脂組成物を調製し、これをフィルム厚さ50μmのPETフィルム上に塗布し、80℃のオーブンにて5分間乾燥させ、PETフィルム上に厚み20μmの粘着層を形成した。
(a)導通抵抗、(b)ショート数、(c)バンプ1個当たりの粒子最小捕捉数、(d)バンプ間の粒子状態を次のように評価した。結果を表1A及び表1Bに示す。
有効接続面積(バンプと基板とが対峙する面積)が異なる3通りの評価用接続物の導通抵抗を接続した。
(a-1)導通抵抗(有効接続面積400μm2)
各実施例及び比較例の異方性導電フィルムを、導通抵抗評価用ICとガラス基板の間に挟み、加熱加圧(180℃、80MPa、5秒)して各評価用接続物を得、この評価用接続物の導通抵抗はデジタルマルチメータを用いて4端子法で2mAの電流を通電したときの値で測定した。1Ω未満であれば、実用上問題はない。
ここで、この各評価用ICとガラス基板は、それらの端子パターンが対応しており、サイズは次の通りである。
また、異方性導電フィルムを用いて評価用ICとガラス基板を接続する場合、異方性導電フィルムの長手方向をバンプの短手方向(端子間距離の方向)に合わせた。結果を表1Aに示す。
外径 0.7×20mm
厚み 0.2mm
バンプ仕様 金メッキ、高さ12μm、サイズ10×40μm、バンプ間距離10μm
ガラス材質 コーニング社製
外径 30×50mm
厚み 0.5mm
電極 ITO配線
導通抵抗評価用ICのバンプ仕様を以下のものに変更し、評価用ICのアライメントをバンプの短手(幅)方向に6μmおよび8μm意図的にずらし、有効接続面積を300μm2又は200μm2とする以外は、(a-1)と同様にして接続して評価用接続物を得、その導通抵抗を(a-1)と同様に測定した。結果を表1Bに示す。なお、表1Bには、実質的なバンプの大きさとICのバンプ−バンプ間スペース(即ち、同一ICのバンプ間での水平方向の導体距離)の数値を示した。
バンプ仕様 金メッキ、高さ12μm、サイズ12×50μm、バンプ間距離10μm
実施例1〜11及び比較例1〜2の導通抵抗評価用接続物のバンプ間100個においてショートしているチャンネル数を計測し、ショート数とした。
櫛歯TEG(test element group))
外径 1.5×13mm
厚み 0.5mm
バンプ仕様 金メッキ、高さ15μm、サイズ25×140μm、バンプ間距離7.5μm
各実施例及び比較例の異方性導電フィルムを用いて、(a-1)と同様にして評価用接続物(バンプ100個)を得、各バンプにおける粒子捕捉数を計測し、その最小数を求めた。なお、この接続においても、異方性導電フィルムの長手方向をバンプの短手方向(端子間距離の方向)に合わせた。結果を表1Aに示す。
(評価基準)
A(非常に良好):10個以上
B(良好):5個以上、10個未満
C(普通):3個以上、5個未満
D(不良):3個未満
(c)の評価用接続物(即ち、(a-1)、(a-2)、(a-3)と同様にして得た評価用接続物)において、バンプ−バンプ間においてバンプと接続していない導電粒子が互いに連結することにより形成された導電粒子群の発生数をカウントした。表1Aに、(a-1)と同様にして得た評価用接続物について、バンプ−バンプ間の個数100あたりの、接続前の状態に対して導電粒子ユニットもしくは導電粒子が連結した導電粒子群のカウント値を示す。このカウント値により、異方性導電接続における導電粒子の移動のし易さ(即ち、導電粒子の接触によるショートの発生リスク)を評価することができる。
表2に示す導電粒子の連結個数と配置とし、実施例1と同様にして異方性導電フィルムを製造し、評価した。結果を表2に示す。
表3に示す導電粒子の連結個数の配置とし、実施例1と同様にして異方性導電フィルムを製造し、評価した。結果を表3に示す。
表3から、導電粒子ユニットの長手方向と異方性導電フィルムの短手方向(接続端子の長手方向)とが揃っている場合、個々の導電粒子ユニット内の導電粒子の間隙をゼロから導電粒子の粒子径の1/2の大きさまで任意に変更しても導電粒子ユニットが格子状に配列した状態を形成することができ、ショート数を低減し導通信頼性を高められることがわかる。
2、2a 導電粒子
3、3a、3b、3p、3q、3i、3j、3k 導電粒子ユニット
4 絶縁接着剤層
5 絶縁接着剤層形成用組成物層
6 剥離シート
10、10p、10q 型
11 凹み
20 接続端子
D1 異方性導電フィルムの長手方向
D2 異方性導電フィルムの短手方向
La 隣接する導電粒子ユニット及び単独の導電粒子から選ばれる導電粒子同士の最近接距離
La1 隣接する導電粒子ユニットの最近接距離の異方性導電フィルムの長手方向の長さ
Lb 導電粒子ユニットの異方性導電フィルムの長手方向の長さ
Lc 隣接する導電粒子ユニットの導電粒子であって、異方性導電フィルムの長手方向で重なる最近接導電粒子同士の該長手方向の距離
Ld 接続端子間距離の方向の導電粒子ユニットの長さ
Le 導電粒子の粒子径
Lh 型の凹みの長手方向に隣接する凹み同士の距離
Li 型の凹みの、該凹みの長手方向の長さ
Lj 型の凹みに導電粒子を充填した後の間隙の、該凹みの長手方向の長さの合計
Lx 接続端子間距離
s1、s2、s3 間隙
θ 異方性導電フィルムの長手方向に対する導電粒子ユニットの長手方向の角度
Claims (12)
- 導電粒子が一列に配列した導電粒子ユニット、又は導電粒子が一列に配列した導電粒子ユニットと単独の導電粒子が、絶縁接着剤層中に格子状に配置された異方性導電フィルムであって、隣接する導電粒子ユニット及び単独の導電粒子から選ばれる導電粒子同士の最近接距離が導電粒子の粒子径の0.5倍以上であり、導電粒子ユニットとして、該ユニットにおける導電粒子の配列方向が第1の方向の導電粒子ユニットと、第2の方向の導電粒子ユニットとを有する異方性導電フィルム。
- 隣接する導電粒子ユニットの導電粒子であって、異方性導電フィルムの長手方向で重なる最近接導電粒子同士の該長手方向の距離が、導電粒子の粒子径の0.5倍以上である請求項1記載の異方性導電フィルム。
- 各導電粒子ユニットの長手方向が、異方性導電フィルムの長手方向に対して傾いている請求項1又は2に記載の異方性導電フィルム。
- 導電粒子ユニットを形成する導電粒子数が異なる複数通りの導電粒子ユニットが配置されている請求項1〜3のいずれかに記載の異方性導電フィルム。
- 導電粒子ユニットが2個の導電粒子から構成されている請求項1〜4のいずれかに記載の異方性導電フィルム。
- 導電粒子ユニットが3個以上の導電粒子から構成されている請求項1〜5のいずれかに記載の異方性導電フィルム。
- 導電粒子が金属粒子及び/又は金属被覆樹脂粒子である請求項1〜6のいずれかに記載の異方性導電フィルム。
- 導電粒子が2種以上の金属粒子及び/又は金属被覆樹脂粒子である請求項1〜6のいずれかに記載の異方性導電フィルム。
- 絶縁接着剤層に更に別の絶縁接着剤層が積層されている請求項1〜8のいずれかに記載の異方性導電フィルム。
- 請求項1〜9のいずれかに記載の異方性導電フィルムを用いて第1電子部品の接続端子と第2電子部品の接続端子とを異方性導電接続した接続構造体。
- 接続端子間の距離が、該接続端子間の距離方向の導電粒子ユニットの長さと、導電粒子の粒子径との和よりも大きい請求項10記載の接続構造体。
- 請求項1〜10のいずれかに記載の異方性導電フィルムを用いて第1電子部品の接続端子と第2電子部品の接続端子とを異方性導電接続する、接続構造体の製造方法。
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JP6169915B2 (ja) * | 2012-08-01 | 2017-07-26 | デクセリアルズ株式会社 | 異方性導電フィルムの製造方法、異方性導電フィルム、及び接続構造体 |
KR20180049207A (ko) * | 2012-08-29 | 2018-05-10 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 및 그 제조 방법 |
TWI733504B (zh) | 2014-11-17 | 2021-07-11 | 日商迪睿合股份有限公司 | 異向性導電膜及連接構造體 |
KR102682993B1 (ko) * | 2016-05-05 | 2024-07-08 | 데쿠세리아루즈 가부시키가이샤 | 이방성 도전 필름 |
CN118325319A (zh) * | 2016-05-05 | 2024-07-12 | 迪睿合株式会社 | 填充剂配置膜 |
JP7274811B2 (ja) | 2016-05-05 | 2023-05-17 | デクセリアルズ株式会社 | 異方性導電フィルム |
US20170338204A1 (en) * | 2016-05-17 | 2017-11-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Device and Method for UBM/RDL Routing |
CN113053562B (zh) * | 2017-01-27 | 2023-03-31 | 昭和电工材料株式会社 | 绝缘被覆导电粒子、各向异性导电膜及其制造方法、连接结构体及其制造方法 |
JP2019029135A (ja) * | 2017-07-27 | 2019-02-21 | 日立化成株式会社 | 異方性導電フィルム及びその製造方法、並びに接続構造体及びその製造方法 |
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TWI826476B (zh) * | 2018-06-26 | 2023-12-21 | 日商力森諾科股份有限公司 | 各向異性導電膜及其製造方法以及連接結構體的製造方法 |
CN112543693A (zh) | 2018-06-26 | 2021-03-23 | 昭和电工材料株式会社 | 焊料粒子 |
US20200156291A1 (en) * | 2018-11-21 | 2020-05-21 | Shin-Etsu Chemical Co., Ltd. | Anisotropic film and method for manufacturing anisotropic film |
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