JP6656261B2 - Apparatus for depositing vaporized material, distribution pipe, vacuum deposition chamber, and method for depositing vaporized material - Google Patents

Description

[0001] implementation form, material deposition apparatus, the distributor pipe for material deposition apparatus, the deposition apparatus having a material deposition device, and to a method for depositing on a substrate a material. Implementation form, in particular, material deposition of a vacuum deposition chamber, a vacuum deposition apparatus having a material deposition device, and to a method for depositing a material onto a substrate in a vacuum deposition chamber.

  [0002] Organic evaporators are tools for the production of organic light emitting diodes (OLEDs). OLEDs are special light-emitting diodes, in which the light-emitting layer comprises a thin film of an organic compound. Organic light emitting diodes (OLEDs) are used in the manufacture of television screens, computer monitors, mobile phones, and other handheld devices for displaying information. OLEDs can also be used for general spatial lighting. The range of colors, brightness, and viewing angles possible with OLED displays is larger than that of conventional LCD displays because OLED pixels emit light directly and do not use a backlight. Thus, the energy consumption of an OLED display is significantly less than that of a conventional LCD display. Furthermore, in fact, OLEDs can be manufactured on flexible substrates, which leads to further applications. For example, an OLED display may include a layer of organic material located between two electrodes all deposited on a substrate to form a matrix display panel having individually energizable pixels. An OLED is typically placed between two glass panels, the edges of which are sealed to encapsulate the OLED therein.

  [0003] There are many challenges encountered in the manufacture of such display devices. OLED displays or OLED lighting applications include, for example, some large amounts of organic materials that evaporate in a vacuum. The organic material is deposited in a subsequent manner through a shadow mask. For the production of highly efficient OLED stacks, co-deposition or co-evaporation of two or more materials, eg, host and dopant, leading to a mixed / doped layer is desirable. In addition, it must be taken into account that there are several processing conditions for the evaporation of very sensitive organic materials.

  [0004] To deposit a material on a substrate, the material is heated until it evaporates. Also, the tube that guides the material to the substrate may be heated, for example, to maintain the evaporated material at a controlled temperature or to prevent the evaporated material from condensing in the tube. As the material evaporates, it is guided to the substrate, such as by passing through a distribution pipe having an outlet or nozzle for the evaporated material. In recent years, the accuracy of the deposition process has been increased, for example, so that the pixel size provided can be made smaller and smaller. However, it is difficult to further increase the accuracy and predictability of the evaporation process due to the shadowing effect of the mask, the spread of the evaporated material, and the like.

  [0005] In view of the above, it is desirable to provide a material deposition apparatus, a vacuum deposition chamber, a distribution pipe, and a method for depositing material on a substrate, which overcome at least some of the problems in the art. It is an object of the embodiments described herein.

[0006] In light of the above, there is provided a material deposition apparatus, a deposition chamber, a distribution pipe, and a method for depositing material on a substrate according to the independent claims . A further aspect of embodiments, advantages, and features, the dependent claims are evident from the description and the accompanying drawings.

  [0007] According to one embodiment, there is provided a material deposition apparatus for depositing evaporated material, particularly two or more evaporated materials, on a substrate in a vacuum chamber. The material deposition apparatus includes a first material evaporator configured to evaporate a first material to be deposited on a substrate, particularly a first material of the two or more materials; and a first distribution pipe housing. A first distribution pipe in fluid communication with the first material evaporator; a plurality of first nozzles in the first distribution pipe housing; One or more nozzles of one nozzle include an opening length and an opening size, and the ratio of the length to size of the one or more nozzles of the plurality of first nozzles is 2: 1 or more. And a first material source comprising a first nozzle. The material deposition apparatus includes a second material evaporator configured to evaporate a second material to be deposited on the substrate, particularly a second material of the two or more materials; and a second distribution pipe housing. A second distribution pipe in fluid communication with the second material evaporator; and a second plurality of nozzles in the second distribution pipe housing. A source of material is further provided. The distance between the first nozzle of the plurality of first nozzles and the second nozzle of the plurality of second nozzles is 30 mm or less.

  [0008] According to another embodiment, there is provided a material deposition apparatus for depositing evaporated material, particularly two or more evaporated materials, on a substrate in a vacuum chamber. The material deposition apparatus includes a first material evaporator configured to evaporate a first material to be deposited on a substrate, particularly a first material of the two or more materials; and a first distribution pipe housing. A first distribution pipe in fluid communication with the first material evaporator; a plurality of first nozzles in the first distribution pipe housing; The one or more nozzles of the one nozzle are configured to have an opening length and an opening size and to provide a first dispensing direction, and the length of the one or more nozzles of the plurality of first nozzles is set. A first material source comprising a plurality of first nozzles having a ratio of length to size of 2: 1 or greater. The material deposition apparatus includes a second material evaporator configured to evaporate a second material to be deposited on the substrate, particularly a second material of the two or more materials; and a second distribution pipe housing. A second distribution pipe in fluid communication with the second material evaporator; a second plurality of nozzles in the second distribution pipe housing, the second distribution pipe including a second nozzle; A second source of material further comprising a plurality of second nozzles, one or more of the nozzles configured to provide a second dispensing direction. The first distribution direction of the one or more nozzles of the plurality of first nozzles and the second distribution direction of the one or more nozzles of the plurality of second nozzles are arranged or parallel to each other. The arrangement is shifted up to 5 ° from the arrangement.

  [0009] According to a further embodiment, a distribution pipe is provided for depositing evaporated material on a substrate in a vacuum chamber. The distribution pipe includes a distribution pipe housing and a nozzle in the distribution pipe housing, the nozzle having an opening length and an opening size. The length to size ratio of the nozzle is greater than 2: 1 and the nozzle includes a material that is chemically inert to the evaporated organic material.

  [0010] According to a further embodiment, there is provided a material deposition apparatus for depositing evaporated material, particularly two or more evaporated materials, on a substrate in a vacuum chamber. A material deposition device, the first material evaporator configured to evaporate a first material to be deposited on the substrate, particularly a first material of the two or more materials; a first component of the material deposition device; A distribution pipe according to the embodiments described herein, which is a pipe, comprising a first material source comprising a distribution pipe in fluid communication with a first material evaporator. A second material evaporator configured to evaporate a second material to be deposited on the substrate, particularly a second material of the two or more materials; and a second material evaporator comprising a distribution pipe housing. A second material source comprising: a second distribution pipe in fluid communication with a second material evaporator; and a plurality of second nozzles in the second distribution pipe housing. Further provision. The distance between the nozzle of the first distribution pipe and the second nozzle of the plurality of second nozzles of the second distribution pipe is 30 mm or less. Additionally or alternatively, the nozzles of the first distribution pipe are configured to provide a first distribution direction, and the second nozzles of the plurality of nozzles of the second distribution pipe are configured to provide a second distribution pipe. The first dispensing direction and the second dispensing direction are arranged parallel to each other or at a maximum of 5 ° from the parallel arrangement.

  [0011] According to a further embodiment, a vacuum deposition chamber is provided. The vacuum deposition chamber includes a material deposition apparatus according to the embodiments described herein. The vacuum deposition chamber further includes a substrate support for supporting the substrate during deposition. The distance between at least one of the distribution pipes of the material deposition device and the substrate support is less than 250 mm.

[0012] According to a further embodiment, a method is provided for depositing evaporated material on a substrate in a vacuum deposition chamber having a chamber space. The method includes evaporating the first material with a first material evaporator disposed within the chamber space. The method further includes providing a vaporized first material to a first distribution pipe that includes a first distribution pipe housing, wherein the first distribution pipe is in fluid communication with the first material evaporator. . Providing the first distribution pipe with the evaporated first material typically includes providing a pressure of about 10 ^-2 to 10 ^-1 mbar in the first distribution pipe. The method further includes directing the evaporated material through one or more of the plurality of first nozzles in the first distribution pipe housing. One or more nozzles of the first plurality of nozzles may have an opening length and an opening size, and guiding the evaporated material through the one or more nozzles may have a length to size ratio of 2: 1 or more. Guiding the evaporated material through one or more nozzles. The method further includes discharging the vaporized material into the chamber space toward the substrate in the chamber space, wherein the chamber space provides a pressure of about ^10-5 to ^10-7 mbar.

[0013] Embodiments are also directed to apparatus for performing the disclosed methods, including apparatus portions for performing each described method feature . The method features may be implemented in hardware components, a computer programmed with appropriate software, any combination of the two, or in any other manner. Furthermore, implementation form is also directed to a method for operating the apparatus described. It includes method features for performing all functions of the device.

[0014 ] In order that the above features of the embodiments may be understood in detail, a more detailed description of the invention, briefly summarized above, may be obtained by reference to the embodiments. The accompanying drawings, related to the implementation form, are described below.

FIGS. a to f show schematic and partial detail views of a material deposition apparatus according to embodiments described herein. FIGS. a to c show schematic diagrams of distribution pipes of a deposition apparatus according to embodiments described herein. FIG. 3 shows a diagram of material distribution of distribution pipes and nozzles according to embodiments described herein. 1 shows a diagram of the material distribution of a distribution pipe of a known system. FIG. 3 shows a comparative view of the material distribution of a distribution pipe according to embodiments described herein and known systems. 1 illustrates a material deposition apparatus according to embodiments described herein. 1 shows a known deposition system. a and b show a schematic side view and a schematic top view of a material deposition apparatus according to an embodiment described herein. a and b show a schematic side view of a material deposition apparatus according to an embodiment described herein, and a detailed view of a distribution pipe and a nozzle of the material deposition apparatus according to an embodiment described herein. FIGS. 3a-3d show schematic diagrams of nozzles used in distribution pipes and material deposition equipment according to embodiments described herein. a to c show a material deposition apparatus and a distribution pipe according to the embodiments described herein. a and b show distribution pipes according to embodiments described herein. FIG. 4 illustrates a vacuum deposition chamber according to embodiments described herein. FIG. 4 shows a flowchart of a method for depositing a material on a substrate, according to embodiments described herein.

  [0015] Reference will now be made in detail to the various embodiments, one or more examples of which are illustrated in the figures. In the following description of the drawings, the same reference numbers represent the same components. Generally, only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation only, and is not meant as a limitation. Furthermore, features illustrated or described as part of one embodiment, can be used on another embodiment or be used with another embodiment to yield a further embodiment. . This specification is intended to cover such modifications and variations.

  [0016] As used herein, the term "fluid communication" refers to the fact that two elements in fluid communication can exchange fluid via a coupling and that fluid flows between the two elements. It can be understood that it can be done. In one example, the element in fluid communication may include a hollow structure through which fluid may flow. According to some embodiments, at least one of the elements in fluid communication may be a tube-like element.

  [0017] Further, in the following description, a material source may be understood as a source that provides a material to be deposited on a substrate. In particular, the material source can be configured to provide material to be deposited on a substrate in a vacuum chamber, such as a vacuum deposition chamber or apparatus. In some embodiments, the material source may provide the material to be deposited on the substrate by being configured to evaporate the material to be deposited. For example, the source of material may include an evaporator or crucible that evaporates the material to be deposited on the substrate and, in particular, discharges the evaporated material in a direction toward the substrate or into the distribution pipe of the source of material. In some embodiments, the evaporator may be located in fluid communication with a distribution pipe, for example, to dispense evaporated material.

  [0018] According to some embodiments described herein, a distribution pipe may be understood as a pipe for guiding and distributing evaporated material. In particular, the distribution pipe may guide the evaporated material from the evaporator to the outlet or opening of the distribution pipe. A straight distribution pipe can be understood as a pipe extending in a first direction, in particular in a vertical direction. In some embodiments, the straight distribution tubing comprises a cylindrical tube that may have a circular bottom shape or any other suitable bottom shape.

  [0019] Nozzles found herein are devices for guiding a fluid, particularly for controlling the direction or properties of the fluid (such as the flow, velocity, shape and / or pressure rate of the fluid emerging from the nozzle). Device. According to some embodiments described herein, the nozzle may be a device for guiding or directing a vapor, such as, for example, a vapor of evaporated material deposited on a substrate. The nozzle may have an inlet for receiving a fluid, an opening (eg, a hole or passage) for guiding the fluid through the nozzle, and an outlet for discharging the fluid. Typically, the openings or passages of the nozzle may include defined geometries to achieve a desired direction or characteristic of the fluid flowing through the nozzle. According to some embodiments, the nozzle may be part of the distribution pipe or coupled to a distribution pipe that provides the vaporized material and may receive the vaporized material from the distribution pipe.

  [0020] In accordance with embodiments described herein, there is provided a material deposition apparatus for depositing evaporated material on a substrate in a vacuum chamber. According to some embodiments, the material evaporator may be configured to deposit two or more evaporated materials on a substrate in a vacuum chamber. The material deposition apparatus includes a first material source that includes a first material evaporator configured to evaporate a first material deposited on a substrate. According to some embodiments, the first material can be a first material from two or more materials deposited on the substrate. The first source of material is a first distribution pipe including a first distribution pipe housing, which is in fluid communication with the first material evaporator, and wherein the material source is a plurality of first distribution pipe housings. It further includes a first distribution pipe further including one nozzle. Typically, one or more nozzles of the plurality of first nozzles comprises an opening length and an opening size, and the length to size ratio of the one or more nozzles of the plurality of first nozzles is 2 : 1. The material deposition apparatus includes a second material source that includes a second material evaporator configured to evaporate a second material deposited on the substrate. According to some embodiments, the second material is a second material of the two or more materials deposited on the substrate. The second material source is a second distribution pipe including a second distribution pipe housing, and further includes a second distribution pipe in fluid communication with the second material evaporator. The second material source further includes a plurality of second nozzles in the second distribution pipe housing. According to embodiments described herein, the distance between the first of the plurality of first nozzles and the second of the plurality of second nozzles is no greater than 30 mm. According to some embodiments, the first material and the second material may be the same material, or alternatively, may be different materials.

  FIG. 1 a shows a side view of a material deposition apparatus 100 according to embodiments described herein. The embodiment of the material deposition apparatus shown in FIG. 1a comprises a first material source having a first material evaporator 102a, a second material source having a second material evaporator 102b, and a third material evaporator. And a third material source having 102c. In one embodiment, each of the material evaporators 102a, 102b, and 102c may provide a different material. In another embodiment, each of the material evaporators may provide the same material, or a portion of the material evaporator may provide the same material, while another portion of the material evaporator is Provide different materials. According to some embodiments, material evaporators 102a, 102b, and 102c may be crucibles configured to evaporate a material to be deposited on a substrate. The material evaporators 102a, 102b, and 102c are located in fluid communication with the distribution pipes 106a, 106b, and 106c, respectively. The material evaporated by one of the material evaporators can be discharged from the material evaporator and flow in the respective distribution pipe.

  [0022] As can be seen from FIG. 1a, each of distribution pipes 106a, 106b, and 106c includes a distribution pipe housing that includes a plurality of nozzles 712. Through a plurality of nozzles, the evaporated material is released and guided to a substrate (not shown) to be coated. According to some embodiments, the nozzle 712 is an integral part of the distribution pipe, such as an opening formed in the distribution pipe housing, or, for example, directs the evaporated material toward the substrate to be coated. , May be provided by a nozzle coupled to the distribution pipe housing to perform a defined process. In one example, the nozzle may be coupled to the distribution line by screwing, plugging, or shrinking. In one embodiment, the nozzle may be interchangeably coupled to a distribution pipe of the material deposition device.

  [0023] FIG. 1b shows an enlarged view of section A of the third distribution pipe 106c shown in FIG. 1a. The partial view shown in FIG. 1b shows the distribution pipe 106c and one nozzle 712 of the plurality of nozzles of the distribution pipe 106c. The nozzle 712 provides an opening 713 or passage through which the evaporated material can pass. The opening 713 of the nozzle 712 provides an opening length 714, as shown in FIG. 1b. According to some embodiments, the opening length 714 may be measured along the longitudinal or length axis of the nozzle, particularly in a direction corresponding to the average fluid direction exiting the nozzle. In one embodiment, the nozzle opening length 714 may be substantially perpendicular to the longitudinal (or linear) direction of the distribution pipe.

  [0024] The term "substantially right angle" can be understood to include a deviation of up to 15 degrees from a strictly right angle arrangement. According to some embodiments, further terms referred to in the following description as "substantially" include a deviation of up to 15 degrees from an arrangement having the indicated angle, or about 15% of a dimension May be included.

  [0025] FIG. 1c shows material deposition apparatus 100 in a front view, which may correspond to the material deposition apparatus shown in FIG. 1a, but has been rotated about 90 °. The material evaporators 102a, 102b, and 102c are located in fluid communication with the distribution pipes 106a, 106b, and 106c, respectively. The opening of the nozzle 712 can be seen in a front view. The nozzles 712 of the different distribution pipes 106a, 106b, and 106c provide a distance 200 from each other. According to embodiments described herein, the distance between the first nozzles may be typically less than 50 mm, more typically less than 30 mm, and even more typically 25 mm.

  [0026] According to some embodiments, the distance between the nozzles of the different distribution pipes 106a, 106b, and 106c is measured from the center point of each nozzle opening. In one example, the center point of the opening of the nozzle may be defined as the center point of the geometry of the opening. If the opening is a circle, the center point of the circle is a point equidistant from a point on the edge. For example, if the opening of the nozzle has a symmetrical shape, the center point of the opening may be described as a point that remains unchanged by the symmetric operation. For example, the center point of a square, rectangle, rhombus, or parallelogram is a portion where diagonal lines intersect, that is, a center point that is a rotationally symmetric fixed point. Similarly, the center of the ellipse is where the axes intersect. According to some embodiments, the center point may be understood to be the center of gravity of the shape.

  [0027] In some embodiments, the distance 200 between the nozzles of the distribution pipe can be a substantially horizontal distance. For example, distribution pipes 106a, 106b, and 106c may extend substantially vertically. The nozzle may have an evaporation direction, that is, a direction in which the nozzle emits the evaporated material, which is substantially horizontal. According to some embodiments, the substantial horizontal distance between the nozzles of different distribution pipes may be understood to include a deviation of about 15 ° from a strict horizontal arrangement.

  [0028] According to some embodiments, the distance between nozzles may be described as the distance of different distribution pipes to each other, for example, measured from the longitudinal axis of the distribution pipes. In one embodiment, the distribution pipes have a distance 200 to each other.

  [0029] FIGS. 1d to 1f show the embodiment of the partial view B shown in the front view of FIG. 1c. 1d to 1f show the opening size 716 of the nozzle 712. The opening size of the nozzle can be determined depending on the shape of the nozzle. In one embodiment, the opening size may be understood as one dimension of the opening that is not the opening length. According to some embodiments, the opening size may be the smallest dimension of the cross section of the opening, especially at the exit of the nozzle (where evaporative material exits the nozzle).

  [0030] FIG. 1d shows an example of a nozzle opening and opening size 716, where the opening size corresponds to the cross-section, particularly the diameter of the opening. FIG. 1e shows an example in which the nozzle opening has an elliptical shape and the opening size is defined by the smallest dimension of the cross section of the opening. FIG. 1f shows an example where the nozzle opening has an elongated circular shape and the opening size is defined by the smallest dimension of the cross section of the opening. As will be understood in more detail below, the illustrated embodiment of FIGS. 1a to 1f is merely an example, and the present application is not limited to the illustrated example of nozzle opening size, shape and length, or material sources. Those skilled in the art will understand that the present invention is not limited to the illustrated example of the distribution pipe arrangement.

  [0031] According to embodiments described herein, each nozzle of the first distribution pipe may have an opening length to size ratio of 2: 1 or greater, or a nozzle of the first distribution pipe. May have the stated length to size ratio. According to some embodiments, the second and / or third distribution pipes of the material deposition apparatus described herein also include one or more nozzles having an opening length to size ratio of 2: 1 or greater. May be included.

  [0032] According to some embodiments, which may be combined with other embodiments described herein, the distribution pipe may have a substantially triangular cross-section. FIG. 2 a shows an example of a cross section of the distribution pipe 106. The distribution pipe 106 has walls 322, 326, and 324 surrounding the internal cavity 710. The wall 322 is provided on the outlet side of the source of material where the nozzle 712 is provided. The cross section of the distribution pipe can be described as essentially triangular, that is, the main part of the distribution pipe corresponds to the triangular part, and / or the cross section of the distribution pipe has rounded corners and / or cuts. It can be a triangle with a given angle. As shown in FIG. 2a, for example, the corners of the triangle on the exit side are truncated.

  [0033] The width of the outlet side of the distribution pipe, for example, the dimensions of the wall 322 of the cross section shown in FIG. Further, other dimensions of the cross section of the distribution pipe 106 are indicated by arrows 354 and 355. According to embodiments described herein, the width of the outlet side of the distribution pipe may be 30% or less of the largest dimension of the cross-section, for example, 30% of the larger dimension shown by arrows 354 and 355. %. In view of the size and shape of the distribution pipe, the nozzle 712 of the adjacent distribution pipe 106 can be provided at a smaller distance. A smaller distance improves the mixing of the organic materials that evaporate next to each other.

  [0034] FIG. 2b shows an embodiment where two distribution pipes are provided next to each other. Therefore, a material deposition apparatus having two distribution pipes as shown in FIG. 2b can evaporate two organic materials adjacent to each other. Such a material deposition device can also be referred to as a material deposition array. As shown in FIG. 2b, the cross-sectional shape of distribution pipe 106 allows the nozzles of adjacent distribution pipes to be located close to one another. According to some embodiments, which may be combined with other embodiments described herein, the first nozzle of the first distribution pipe and the second nozzle of the second distribution pipe include: It can have a distance of 30 mm or less, such as a distance from 5 mm to 25 mm. More specifically, the distance of the first outlet or nozzle to the second outlet or nozzle can be 10 mm or less.

  [0035] According to some embodiments described herein, the distance between the first nozzle of the first distribution pipe and the second nozzle of the second distribution pipe is the distance of each nozzle. It can be measured as the minimum distance between the vertical axes. In one example, the minimum distance between the longitudinal axes of each nozzle is measured at the outlet of the nozzle (that is, where the evaporated material leaves the nozzle). FIG. 2c shows a partial view C of the device shown in FIG. 2b. Part C, enlarged in FIG. 2c, shows an example of two nozzles 106a and 106b, wherein the distance 200 between the nozzles is at the outlet of each nozzle, of the first nozzle of the first distribution pipe 106a. It is measured between the vertical axis 201 and the vertical axis 202 of the second nozzle of the first distribution pipe 106b. According to some embodiments, the longitudinal axis of the nozzle referred to herein extends along the length of the nozzle.

[0036] According to the embodiments described herein, the material deposition apparatus described herein can be used in high precision processes, such as OLED production processes. 3a and 4a show the effect of a material deposition apparatus according to the embodiments described herein. 3b and 4b show the effect of the known material deposition device of the comparative example. FIG. 3a shows test data for the distribution of vaporized material emitted from a material deposition apparatus according to embodiments described herein. Curve 800 shows the experimental results of evaporated material emitted from a nozzle having a length to size ratio of 2: 1 or greater. The example of FIG. 3a shows that the distribution of the evaporated material follows approximately the cos ⁶ shape. A comparison with the known material deposition device shown in FIG. 3b shows that the distribution of the conventional material deposition device corresponds to the cos ¹ shape shown by curve 801. The difference between the curve 800 generated by the material deposition apparatus according to the embodiments described herein and the curve 801 of the known system is substantially the width of the plume of vaporized material and the volume of vaporized material in the plume. It is a concentration distribution. For example, if a mask is used to deposit material on a substrate, such as in an OLED production system, pixel openings having a size of about 50 μm × about 50 μm, or even smaller, such as about 30 μm or less, or about 30 μm or less. The pixel mask may have a pixel opening having a cross-sectional dimension of 20 μm (for example, a minimum cross-sectional dimension). In one example, the pixel mask may have a thickness of about 40 μm. Considering the thickness of the mask and the size of the pixel openings, a shadowing effect may occur in which the pixel openings of the mask block the pixel openings. Material deposition devices and / or distribution pipes and / or nozzles according to embodiments described herein may help reduce shadowing effects.

  [0037] The high directionality that can be achieved by using evaporation in a material deposition apparatus according to embodiments described herein means that more evaporated material is actually deposited on the substrate (eg, the area above and below the substrate). ), Resulting in improved utilization of the evaporated material.

[0038] FIG. 3c shows the distribution of evaporated material at the pixels of the mask and three different lines. All three lines show the distribution of evaporated material at a defined distance between the nozzle and the substrate. In one example, the distance between the nozzle outlet (where the evaporated material leaves the nozzle) and the substrate or substrate support can be 250 mm or less, such as, for example, about 200 mm or about 150 mm. The first line 804 shows the distribution of the evaporated material at the pixel openings of the mask provided by known material deposition equipment. Distribution of the first line 804, corresponds to the distribution such as cos ^1. In the material deposition apparatus or distribution pipe according to the embodiments described herein, the distribution of the evaporated material may correspond to a distribution such as cos ⁶ indicated by the second line 805. In particular, the slope of the second line 805 is steeper than the slope of the first line 804. ^One skilled in the art can understand from FIG. 3c that the edges of the pixel openings of the mask are better filled with the cos ⁶ distribution than the cos ¹ distribution. A third line 806 shows the results of an experimental test on a material deposition apparatus or distribution pipe according to embodiments described herein. The third line 806 substantially follows the second line 805 with a cos ^6- like distribution of the evaporated material. The shadowing effect can be reduced when using a material deposition device or distribution pipe according to embodiments described herein.

  [0039] FIG. 4a illustrates a material deposition apparatus according to an embodiment described herein that typically includes three material deposition apparatuses 100a, 100b, and 100c. The material deposition device may be a material deposition device described in embodiments herein. The deposition system of FIG. 4 a further shows a substrate 121 coated with the evaporated material, and a mask 132 for masking the substrate 121. FIG. 4a schematically illustrates how evaporated material 802 leaves material deposition devices 100a, 100b, and 100c, and in particular, exits the nozzles of the material deposition device. According to the embodiments described herein, the evaporated material 802 spreads as it leaves the material deposition apparatus and enters the vacuum space of the deposition chamber. Nozzles having a length to size ratio of 2: 1 or more, for example, by including an angle of about 30 ° or less, can have a limited spread of evaporated material. Comparison with known deposition systems shows that in FIG. 4b, the evaporated material 803 includes an angle of about 60 °.

  [0040] As can be seen from the examples shown in FIGS. 3a, 3b, 3c, 4a and 4b, the material deposition apparatus according to the embodiments described herein has a smaller distribution of evaporated material. Spreading can be provided and the evaporated material can be guided more precisely to the substrate, in particular to the mask opening to coat the substrate with high precision.

  [0041] Placing the nozzle of the distribution pipe at a distance of less than 30 mm further provides an option for mixing different materials of different material sources 100a, 100b, and 100c. The reduction in the distance between the nozzles of the material deposition device can be further improved by using special shapes for the distribution pipe, such as the shape like a triangle typically shown in FIG. 4a.

[0042] Having a cos ^6- like distribution of evaporated material allows for the use of smaller mask apertures and improved accuracy of smaller structures coated on the substrate, such as pixels for OLED products. obtain.

  [0043] According to some embodiments, there is provided a material deposition apparatus for depositing evaporated material on a substrate in a vacuum chamber. According to some embodiments, the material evaporator may be configured to deposit two or more evaporated materials on a substrate in a vacuum chamber. The material deposition apparatus includes a first material source that includes a first material evaporator configured to evaporate a first material deposited on a substrate. According to some embodiments, the first material may be a first material of two or more materials to be deposited on the substrate. The first source of material is a first distribution pipe including a first distribution pipe housing, and further includes a first distribution pipe in fluid communication with the first material evaporator. Further, the first material source is a plurality of first nozzles in the first distribution pipe housing, wherein one or more of the plurality of first nozzles has an opening length and an opening size. And a plurality of first nozzles configured to provide a first dispensing direction. The length to size ratio of one or more of the plurality of first nozzles is 2: 1 or more. The material deposition apparatus further includes a second material source that includes a second material evaporator configured to evaporate a second material deposited on the substrate. According to some embodiments, the second material can be a second material of the two or more materials deposited on the substrate. The second material source is a second distribution pipe including a second distribution pipe housing, and further includes a second distribution pipe in fluid communication with the second material evaporator. The second material source is a plurality of second nozzles in the second distribution pipe housing, one or more of the second nozzles being configured to provide a second dispensing direction. , A plurality of second nozzles. According to embodiments described herein, which may be combined with other embodiments described herein, a first distribution direction of one or more nozzles of a plurality of first nozzles, and a plurality of first nozzles. The second distribution direction of the one or more nozzles of the two nozzles is arranged parallel to one another or is offset from the parallel arrangement by up to 5 °. According to some embodiments, the first material and the second material may be the same material, or alternatively, may be different materials.

  [0044] FIG. 5a shows a material deposition wherein the first distribution direction of the nozzles of the first distribution pipe housing and the second distribution direction of the nozzles of the second distribution pipe housing are arranged substantially parallel. The device is shown. The material deposition apparatus typically shown in FIG. 5a shows a first material source 100a and a second material source 100b. Each of the material sources 100a and 100b includes a material evaporator 102a and 102b, respectively. In one embodiment, each of the material evaporators may provide a different material. In another embodiment, each of the material evaporators may provide the same material, or a portion of the material evaporator may provide the same material, while another portion of the material evaporator is Provide different materials. According to embodiments described herein, the first material source 100a includes a first distribution pipe 106a, and the second material source 100b includes a second distribution pipe 102b. The first and second distribution pipes each have a distribution pipe housing in which the nozzle 712 is located. In particular, the first distribution line includes a plurality of first nozzles and the second distribution line includes a plurality of first nozzles, for discharging vaporized material from each distribution tube housing toward the substrate to be coated. 2 nozzles.

  [0045] According to embodiments described herein, one or more of the nozzles of the first distribution pipe and / or the second distribution pipe may be greater than or equal to 2: 1, for example, 2.5: 1,3. May have a length: size ratio of greater than 1: 1, 5: 1, or 5: 1. The size and length of the nozzle openings can be understood as described in detail above with respect to FIGS. 1a to 1f. In some embodiments, one or more nozzles of the first distribution pipe provide a first distribution direction, and one or more nozzles of the second distribution pipe provide a second distribution direction. .

  [0046] According to the embodiments described herein, the distribution direction of the nozzles may be understood as the average distribution direction of the nozzles. In some embodiments, the average dispensing direction is the line in the plume of vaporized material emitted from the nozzle toward the substrate to be coated, particularly the concentration of vaporized material along which the vaporized material is concentrated. A line that reaches a maximum in the plume may correspond substantially. In some embodiments, the average dispensing direction of the nozzle may be understood to correspond to the centerline of the plume geometry of the vaporized material emitted from the nozzle toward the substrate to be deposited. In some embodiments, the center line of the steam plume corresponds to a line that includes the center of gravity of the plume geometry of the vaporized material and a point on the longitudinal or longitudinal axis of the nozzle, e.g., a point at the nozzle exit. Then it can be explained. According to a further embodiment, the average dispensing direction of the nozzle is between the nozzle outlet and the substrate to be coated, in particular between the point of the nozzle outlet located on the longitudinal or longitudinal axis of the nozzle and the substrate to be coated. Can be described as extending along a line with the distance of

  [0047] FIG. 5b shows a top view of a material deposition apparatus including material sources 100a and 100b according to some embodiments. As can be seen from the examples shown in FIGS. 5a and 5b, the nozzle 712 of the first distribution pipe 106a provides a first distribution direction 210 and the nozzle 712 of the second distribution pipe 106b provides a second distribution pipe. A direction 211 is provided. Typically, the nozzles of the first distribution pipe and the second distribution pipe are arranged such that the first distribution direction and the second distribution direction are parallel to each other. According to some embodiments, the first dispensing direction and the second dispensing direction are offset from a strictly parallel arrangement by up to 5 °, for example, about 3 ° or about 2 ° from a strictly parallel arrangement. And the like. According to some embodiments, the first distribution direction 210 and the second distribution direction 211 shown in FIGS. 5a and 5b may have a distance between each other of about 30 mm or less.

  [0048] As already explained earlier, the first distribution pipe and the second distribution pipe of the material deposition apparatus illustrated in Figs. 5a and 5b may have a triangular shape. 6a and 6b show a substantially triangular material deposition device in which the distribution directions of the nozzles of the first distribution pipe and the second distribution pipe are substantially parallel to each other.

  [0049] FIG. 6a shows a first material source having a first distribution pipe 106a, a second material source having a second distribution pipe 106b, and a third material source having a third distribution pipe 106c. FIG. 4 shows a cross-sectional view of the provided embodiment. According to some embodiments, the distribution pipe may be equipped with a heating element 380 and a thermal insulator 879 to improve heating efficiency and avoid condensation of evaporated material in the distribution pipe. Evaporator control housing 702 is provided adjacent to the distribution pipe and is coupled to the distribution pipe via thermal insulator 879. The arrows on distribution pipes 106a, 106b, and 106c (when viewed in the projection plane) illustrate the evaporated organic material exiting distribution pipes 106a, 106b, and 106c. The average distribution direction of each nozzle of the distribution pipe is indicated by reference numerals 210, 211 and 212. As can be seen in FIG. 6a, the distribution directions of the different distribution pipes are substantially parallel.

  [0050] A partial simplified view of the nozzle 712 of the three distribution pipes 106a, 106b, and 106c is shown in FIG. 6b. The three nozzles 712 typically shown have a length axis or longitudinal axis 201, 202, 203. The nozzle 712 evaporates in the first distribution direction 210, the second distribution direction 211, and the third distribution direction 212 from the distribution pipes 106a, 106b, and 106c toward the substrate (not shown) to be coated. Can guide the material. As shown in the embodiment illustrated in FIG. 6b, the three dispensing directions may be parallel to each other or may deviate from a strictly parallel arrangement by up to 5 °.

  [0051] According to the embodiments described herein, different distribution pipes, such as the first, second and third distribution pipes referred to herein, may be, for example, 3 in the case of three distribution pipes. It may be located in fluid communication with a different evaporator, such as two different evaporators. In some embodiments, different distribution pipes may be located in fluid communication with an evaporator of the same type, but evaporating different materials. For example, three different components may be provided by three distribution pipes located in fluid communication with three evaporators. In one example, the material deposition apparatus described herein can be used to produce an OLED. Evaporated material may include the three components used to produce OLEDs.

  [0052] Using a parallel arrangement of dispensing directions of different nozzles and using a nozzle having a length to size ratio of 2: 1 according to embodiments described herein emits from the nozzles. Can help improve the uniformity and predictability of the behavior of the evaporated material as it evolves. For example, the fact that the direction of a vaporized material is substantially parallel or adjacent to the direction of another vaporized material allows for a regular and uniform effect of the vaporized material on a mask and / or substrate. Can be. In one example, different components of different distribution pipes may have substantially the same angle of impact on the mask and / or the substrate, particularly substantially orthogonal to the mask and / or the substrate. The production of the coating of one or more components may be performed in a more precise manner by the material deposition apparatus according to the embodiments described herein. In addition, material sources having a parallel arrangement of the dispensing directions can be used for mounting and calculating when different material sources have a defined angle between the dispensing directions, for example, as is done in known systems. Effort can be reduced. Further, the material deposition apparatus including the above-described parallel arrangement of dispensing directions, according to embodiments described herein, results in uniform mixing of different components when different components are used with different material sources. be able to.

  [0053] According to some embodiments, a distribution pipe is provided for depositing evaporated material on a substrate in a vacuum chamber. The distribution pipe includes a distribution pipe housing and a nozzle in the distribution pipe housing. The nozzle includes an opening length and an opening size, and the ratio of the length to the size of the nozzle is 2: 1 or more. According to some embodiments, which may be combined with other embodiments described herein, the nozzle comprises a material that is chemically inert to the evaporated organic material. In one example, the evaporated organic material can have a temperature typically between about 150 ° C and about 650 ° C, more typically between about 100 ° C and 500 ° C.

  [0054] FIGS. 7a to 7d show examples of nozzles of distribution pipes according to embodiments described herein. The nozzle 200 shown in FIGS. 7a to 7d includes an opening 203 (or passage or hole 203) for guiding the evaporated material through the nozzle. According to the embodiments described herein, the nozzle 200 has an opening length 714 and an opening size 716. The nozzle length to size ratio in embodiments described herein can be, for example, 2: 1 or more, as described above. The terms "aperture length" and "aperture size" can be understood as previously described with respect to FIGS. 1a to 1f.

  [0055] FIG. 7a illustrates a nozzle that includes a first nozzle material 206 and a second nozzle material 208. For example, first nozzle material 206 may be a material having a thermal conductivity value greater than 21 W / mK, such as, for example, copper. A second nozzle material 208 may be provided inside the opening or passage 203 and, in some embodiments, may be chemically inert to the evaporated organic material. For example, the second nozzle material may be selected from Ta, Nb, Ti, DLC, stainless steel, quartz glass and graphite. As can be seen from the embodiment shown in FIG. 7 a, the second nozzle material 208 may be provided as a thin coating inside the channel 203.

  [0056] FIG. 7b shows an embodiment of a nozzle having a first nozzle material 206 and a second nozzle material 208. The example nozzle shown in FIG. 7b has a first part made from a first nozzle material 206 (e.g., having a thermal conductivity value greater than 21 W / mK) and a vaporized organic material. And a second part made from a second nozzle material 208, which may be inert. In one example, the first and second nozzle materials may be selected as described with respect to FIG. 7a. As can be seen from FIG. 7b, the second nozzle material 208 is part of the nozzle, not only the inner passage side in particular.

  [0057] According to some embodiments, the thickness of the second nozzle material may typically be in the range of a few nanometers to a few micrometers. In one example, the thickness of the second nozzle material of the nozzle opening is typically between about 10 nm and about 50 μm, more typically between about 100 nm and about 50 μm, and even more typically. May be between about 500 nm to about 50 μm. In one example, the thickness of the second nozzle material can be about 10 μm.

  [0058] FIG. 7c shows a nozzle 200 made from a first nozzle material having a thermal conductivity greater than the thermal conductivity of the distribution pipe to which the nozzle can be coupled, or greater than 21 W / mK. 1 shows an embodiment. In the embodiments described herein, the first nozzle material 206 is inert to the evaporated organic material. In one example, the first nozzle material may be selected from Ta, Nb, Ti, DLC, or graphite.

  [0059] FIG. 7d shows a perspective view of the nozzle shown in FIG. 7a, according to an embodiment described herein. In the opening 713, the second nozzle material 208 can be seen, while outside the nozzle 200, the first nozzle material 206 is shown.

  [0060] According to some embodiments described herein, the nozzle openings or passages through which the evaporated material flows during the evaporation process and reaches the substrate to be coated are typically May have a size from about 1 mm to about 10 mm, more typically from about 1 mm to about 6 mm, and even more typically from about 2 mm to about 5 mm. According to some embodiments, the diameter of the passage or opening may refer to the smallest dimension of the cross-section, for example, the diameter of the passage or opening. In one embodiment, the size of the opening or passage is measured at the outlet of the nozzle. According to some embodiments described herein, which may be combined with other embodiments described herein, openings or passages are produced, for example, with a tolerance of about 10 μm to about 18 μm. For example, it can be produced in the tolerance range H7.

  [0061] According to some embodiments described herein, or for a material deposition apparatus for depositing material on a substrate in a vacuum deposition chamber, according to embodiments described herein or The nozzle for the distribution pipe may include threads for repeatedly coupling and uncoupling the nozzle to the distribution pipe. In some embodiments, a nozzle having a thread for coupling to a distribution pipe may have an internal thread and / or an external thread that can repeatedly couple the nozzle to the distribution pipe without specifically breaking the distribution pipe or the nozzle. May be provided. For example, a first nozzle having defined characteristics may be coupled to a distribution pipe for a first process. After the first process has been completed, the first nozzle can be decoupled and a second nozzle can be coupled to the distribution line for the second process. If the first process is performed again, the second nozzle may be decoupled from the distribution pipe and the first nozzle may be re-coupled to the distribution pipe to perform the first process. According to some embodiments, the distribution pipe may also further comprise a thread for a replaceable connection to the distribution pipe of the nozzle, for example by matching the thread of the nozzle.

  [0062] According to some embodiments described herein, the material deposition apparatus described in the embodiments described herein, and the distribution pipe described in the embodiments described herein, are provided in accordance with FIGS. Can be seen. Distribution tube 106 may be located in fluid communication with the crucible to distribute the evaporative material provided by crucible 104. The distribution pipe can be, for example, an elongated cube having a heating unit 715. The evaporating crucible can be a reservoir for the organic material that evaporates in the heating unit 725. According to an exemplary embodiment, which may be combined with other embodiments described herein, distribution tubing 106 provides a source. According to some embodiments described herein, the material deposition apparatus 100 includes a plurality of openings for discharging vaporized material toward the substrate, such as nozzles located along at least one line. And / or further comprising an outlet.

  [0063] According to some embodiments, which may be combined with other embodiments described herein, the nozzle of the distribution pipe has a direction substantially perpendicular to the length of the distribution pipe, such as It may be adapted to emit evaporated material in a direction different from the length of the distribution pipe. According to some embodiments, the outlets (eg, nozzles) are positioned such that the primary evaporation direction is ± 20 ° horizontally. According to some particular embodiments, the direction of evaporation can be oriented slightly upward, for example in the range from horizontal to 15 °, such as 3 ° to 7 ° above. Similarly, the substrate can be slightly tilted to be substantially perpendicular to the direction of evaporation. In the case of an inclined substrate, generation of undesired particles can be reduced. However, the nozzle and material deposition device according to the embodiments described herein may also be used in a deposition device configured to deposit material on a horizontally oriented substrate.

  [0064] In one example, the length of distribution pipe 106 corresponds to at least the height of the substrate to be deposited in the deposition apparatus. In many cases, the length of the distribution pipe 106 will be at least 10% or even 20% longer than the height of the substrate to be deposited. With the distribution pipe being longer than the height of the substrate, a uniform deposition at the top of the substrate and / or at the bottom of the substrate can be provided.

  [0065] According to some embodiments, which can be combined with other embodiments described herein, the length of the distribution pipe can be 1.3 m or more, for example, 2.5 m or more. it can. According to one configuration, an evaporating crucible 104 is provided at the lower end of the distribution pipe 106, as shown in FIG. The organic material evaporates in the evaporation crucible 104. The vapor of the organic material enters the distribution pipe 106 at the bottom of the distribution pipe and is guided essentially laterally through a plurality of nozzles in the distribution pipe, for example, towards an essentially vertical substrate.

  [0066] FIG. 8b shows an enlarged schematic view of a portion of the material source with distribution pipe 106 coupled to evaporating crucible 104. A flange unit 703 configured to couple between the evaporation crucible 104 and the distribution pipe 106 is provided. For example, evaporating crucibles and distribution pipes are provided as separate units that can be separated and combined or assembled at a flange unit, for example, for operation of a material source.

  [0067] The distribution pipe 106 has an internal cavity 710. A heating unit 715 may be provided to heat the distribution pipe. Accordingly, the distribution pipe 106 can be heated to a temperature at which the vapor of the organic material provided by the evaporation crucible 104 does not liquefy at the inner portion of the wall of the distribution pipe 106.

  [0068] For example, the distribution line is typically between about 1 ° C and about 20 ° C, more typically between about 5 ° C and about 20 ° C, and more typically between about 10 ° C and about 15 ° C. , Which are higher than the evaporation temperature of the material deposited on the substrate. Two or more heat shields 717 are provided around the distribution pipe 106.

  [0069] In operation, distribution pipe 106 may be coupled to evaporating crucible 104 at flange unit 703. Evaporating crucible 104 is configured to receive the organic material to be evaporated and to evaporate the organic material. According to some embodiments, the material to be evaporated can include at least one of ITO, NPD, Alq3, quinacridone, Mg / AG, starburst material, and the like. FIG. 8b shows a cross section through the housing of the evaporation crucible 104. A refill opening is provided at the top of the evaporating crucible, which can be closed using, for example, a plug 722, lid, cover or the like to close the enclosure of the evaporating crucible 104.

  [0070] An outer heating unit 725 is provided within the housing of the evaporating crucible 104. The outer heating element can extend along at least a portion of the wall of the evaporating crucible 104. According to some embodiments, which may be combined with other embodiments described herein, one or more central heating elements 726 may additionally or alternatively be provided. FIG. 8b shows two central heating elements 726. According to some embodiments, the evaporating crucible 104 can further include a shield 727.

  [0071] According to some embodiments, an evaporating crucible 104 is provided at the lower end of the distribution line 106, as typically shown in FIGS. 8a and 8b. According to further embodiments, which can be combined with the other embodiments described herein, the steam conduit 732 includes a central portion of the distribution pipe 106 or another between the lower end of the distribution pipe and the upper end of the distribution pipe. Can be provided to the distribution pipe at a location. FIG. 8c shows an example of a material source having a distribution pipe 106 and a steam conduit 732 provided in a central portion of the distribution pipe. Organic material vapor is generated in the evaporating crucible 104 and is directed through the vapor conduit 732 to the central portion of the distribution line 106. The steam exits distribution pipe 106 through a plurality of nozzles 712, which may be the nozzles described with respect to FIGS. 7a-7d. According to further embodiments that can be combined with other embodiments described herein, two or more steam conduits 732 may be provided at different locations along the length of distribution pipe 106. In some embodiments, the steam conduit 732 may be coupled to either one evaporating crucible 104 or several evaporating crucibles 104. For example, each vapor conduit 732 may have a corresponding evaporating crucible 104. Alternatively, the evaporating crucible 104 can be in fluid communication with two or more vapor conduits 732 that are coupled to the distribution line 106.

  [0072] As described herein, the distribution pipe can be a hollow cylinder. The term cylinder can be understood to be generally recognized as having a circular bottom shape, a circular top shape, and a curved surface area or contour that joins the top and small bottom circles. According to further additional or alternative embodiments, which can be combined with the other embodiments described herein, the term cylinder refers to any bottom shape, matching top shape in mathematical sense, It can further be understood that it has a curved surface area or contour joining the upper and lower shapes. Thus, the cylinder need not necessarily have a circular cross section. Alternatively, the bottom and top surfaces can have a shape different from a circle.

  [0073] FIGS. 9a and 9b show cross-sectional views of an embodiment of a distribution pipe 106 for a material deposition apparatus according to embodiments described herein. According to some embodiments, distribution pipe 106 includes a distribution pipe housing 116 that includes or is made from a first housing material. As can be seen from the embodiment shown in FIGS. 9a and 9b, the distribution pipe is a straight distribution pipe extending along a first direction 136.

  [0074] FIG. 9a shows a distribution pipe having a plurality of openings 107 disposed along a first direction of the distribution pipe housing. In some embodiments, the wall 109 of the distribution pipe opening can be understood as a nozzle according to embodiments described herein. In one example, the wall 109 of the opening 107 may include a first nozzle material (eg, by being coated with the first nozzle material), where the thermal conductivity value of the first nozzle material may be several. May be greater than the thermal conductivity of the first distribution pipe material or greater than 21 W / mK. In one example, the wall 109 of the opening 107 may be covered with copper. In one embodiment, the wall may be covered with a second nozzle material, such as a material that is chemically inert to copper and evaporated organic materials.

  [0075] FIG. 9b illustrates an embodiment of a distribution pipe according to embodiments described herein. 9b includes an opening 107 in which an extension wall 108 is provided. Typically, the extension wall 108 of the opening 107 extends in a direction substantially perpendicular to the first direction 136 of the distribution pipe housing 116. According to some embodiments, the wall 108 of the opening 107 may extend from the distribution pipe at any suitable angle. In some embodiments, the wall 108 of the opening 107 of the distribution pipe housing 116 may provide a nozzle of the distribution pipe 106 according to embodiments herein. For example, wall 108 may include or be made from a first nozzle material. In some embodiments, the wall 108 can be coated on the inner wall with a first and / or second nozzle material, such as a material that is chemically inert to the evaporated organic material.

  [0076] In some embodiments, the wall 108 provides a mounting aid for mounting a nozzle to the distribution tubing housing 116, such as, for example, the nozzle typically shown in FIGS. 8a-8d. According to some embodiments, wall 108 may provide threads for threading the nozzle to distribution pipe housing 116.

[0077] According to some embodiments, which may be combined with the other embodiments described herein, the nozzle of the material deposition apparatus or distribution pipe referred to herein, such as cos ⁿ Can be designed to form plumes with various shaped contours, where n is especially greater than 4. In one example, the nozzle is designed to form a plume having a contour with a shape such as cos ⁶ . Nozzles that provide a plume formed in the cos ⁿ of the evaporated material may be useful if a narrow shaped plume is desired. For example, deposition processes involving a mask for a substrate having small openings (such as openings having a size of about 20 μm) benefit from a narrow cos ^n- shaped plume, and the utilization of material means that the plume of evaporated material is It does not spread out, but may increase as it passes through the openings in the mask. According to some embodiments, the nozzle may be designed such that the relationship between the length of the nozzle and the diameter of the passage of the nozzle is located in a defined relationship, such as 2: 1 or more. According to additional or alternative embodiments, the nozzle passage may include steps, ramps, one or more collimator structures and / or pressure stages to achieve the desired plume shape.

  [0078] According to some embodiments described herein, a vacuum deposition chamber is described. The vacuum deposition chamber includes a material deposition apparatus according to any of the embodiments described above. The vacuum deposition chamber further includes a substrate support for supporting the substrate during deposition. Typically, the distance between at least one of the distribution pipes of the material deposition device and the substrate support is less than 250 mm. According to some embodiments, the distance between the distribution pipe and the substrate support is determined by the location of the substrate support (e.g., contacts, clamps, or the like) that is in a plane with the nozzle outlet of the distribution pipe and the substrate. ).

  [0079] In some embodiments, the vacuum deposition chamber may include a material deposition apparatus having a nozzle with a ratio of opening size to opening length of 2: 1 or greater. According to some embodiments, which may be combined with other embodiments described herein, the vacuum deposition chamber comprises a first and second material source (eg, a plurality of first nozzles) as described above. And a material distribution apparatus having a first material source and a second material source (e.g., a second distribution pipe having a plurality of second nozzles). Typically, the distance between the first nozzle of the plurality of first nozzles and the second nozzle of the plurality of second nozzles is 30 mm or less.

  [0080] According to some embodiments, which may be combined with other embodiments described herein, the vacuum deposition chamber includes a nozzle having a ratio of opening size to opening length of 2: 1 or greater. May include a material deposition apparatus. According to some embodiments, which may be combined with other embodiments described herein, the vacuum deposition chamber comprises a first and second material source (eg, a plurality of first nozzles) as described above. And a material distribution apparatus having a first material source and a second material source (e.g., a second distribution pipe having a plurality of second nozzles). Typically, at least one of the plurality of first nozzles of the first distribution pipe provides a first distribution direction and at least one of the plurality of second nozzles provides a second distribution direction. provide. In some embodiments, the first distribution direction of one or more nozzles of the plurality of first nozzles and the second distribution direction of one or more nozzles of the plurality of second nozzles are parallel to each other. They are arranged up to 5 ° from the arranged or parallel arrangement.

  [0081] According to some embodiments, the vacuum deposition chamber may include a material deposition apparatus having a distribution pipe that includes a distribution pipe housing and a nozzle of the distribution pipe housing. The length to size ratio of the nozzle opening is 2: 1 or greater, and the nozzle comprises a material that is chemically inert to the evaporated organic material, such as the organic materials referred to above.

  [0082] FIG. 10 illustrates a deposition apparatus 300 in which a material deposition apparatus, distribution tubing or nozzle according to embodiments described herein may be used. Elements referred to below, such as nozzles or distribution pipes, may be the elements described in detail above with respect to FIGS. For example, the distribution tubing referred to below may be the distribution tubing typically described with respect to FIGS. 1-9, unless the combined embodiments are consistent with each other.

  [0083] The deposition apparatus 300 of FIG. 10 includes the material source 100 at a location within the vacuum chamber 110. According to some embodiments, which may be combined with other embodiments described herein, the material source is configured for translation and rotation about an axis. The material source 100 has one or more evaporation crucibles 104 and one or more distribution pipes 106. Two evaporating crucibles and two distribution pipes are shown in FIG. The distribution pipe 106 is supported by the support 102. Further, according to some embodiments, the evaporation crucible 104 can also be supported by the support 102. Two substrates 121 are provided in the vacuum chamber 110. Typically, a mask 132 for masking the layer deposition on the substrate may be provided between the substrate and the material source 100. In some embodiments, the mask is typically about 10 μm to about 50 μm in size, more typically about 15 μm to about 40 μm, and more typically about 15 μm to about 30 μm (eg, , Such as a pixel mask having an aperture that includes the cross-sectional diameter or minimum dimension). In one example, the size of the mask opening is about 20 μm. In another example, the mask opening has an extension of about 50 μm × 50 μm. The organic material evaporates from the distribution pipe 106.

  [0084] According to embodiments described herein, the substrate is coated with an organic material in essentially vertical locations. The view shown in FIG. 10 is a top view of the apparatus including the material source 100. Typically, the distribution pipe is a straight steam distribution showerhead. According to some embodiments, the distribution pipe provides an essentially vertically extending source. According to embodiments described herein, which may be combined with other embodiments described herein, essentially vertical means no more than 20 °, especially when referring to substrate orientation, for example, It is understood that a deviation from the vertical direction of 10 ° or less is allowed. The shift may be provided, for example, because a substrate support with some shift from the vertical orientation may result in a more stable substrate position. However, the substrate orientation during the deposition of the organic material is considered to be essentially vertical and different from the horizontal substrate orientation. In some embodiments, the surface of the substrate is coated with a source extending in one direction corresponding to a translation along one substrate dimension and another direction corresponding to another substrate dimension. In other embodiments, the deposition apparatus can be a deposition apparatus for depositing material on an essentially horizontally oriented substrate. For example, coating of a substrate in a deposition apparatus may be performed in a vertical direction.

  [0085] FIG. 10 shows an embodiment of a deposition apparatus 300 for depositing organic material in a vacuum chamber 110. The material source 100 is provided in the vacuum chamber 110 in a trajectory, such as a loop trajectory or a linear guide 320, for example. The trajectory of the linear guide 320 is configured for translation of the material source 100. According to different embodiments, which can be combined with other embodiments described herein, a driver for the translational movement is provided in the material source 100, in the orbital or linear guide 320, in the vacuum chamber 110, Or a combination thereof. FIG. 10 shows a valve 205, for example, a gate valve. Valve 205 allows for a vacuum seal to an adjacent vacuum chamber (not shown in FIG. 10). The valve can be opened for transfer of the substrate 121 or the mask 132 into or out of the vacuum chamber 110.

  [0086] According to some embodiments, an additional vacuum chamber, such as a maintenance vacuum chamber 210, is provided adjacent to the vacuum chamber 110, which may be combined with other embodiments described herein. . In some embodiments, the vacuum chamber 110 and the maintenance vacuum chamber 210 are connected by a valve 207. The valve 207 is configured to open and close a vacuum seal between the vacuum chamber 110 and the maintenance vacuum chamber 210. Material source 100 can be transferred to maintenance vacuum chamber 210 while valve 207 is open. Thereafter, the valve may be closed to provide a vacuum seal between the vacuum chamber 110 and the maintenance vacuum chamber 210. When the valve is closed, the maintenance vacuum chamber 210 can be vented and opened for material source 100 maintenance without breaking the vacuum in the vacuum chamber 110.

  [0087] The two substrates 121 are supported on respective transport trajectories in the vacuum chamber 110 of the embodiment shown in FIG. According to some embodiments, the distance between at least one of the distribution pipes and the substrate support is less than 250 mm. In FIG. 10, the distance is indicated by the distance 101 between the substrate support 126 and the outlet of the nozzle of the distribution pipe 106 of the material source 100. Further, two tracks are provided for providing a mask 132 on top. The coating on the substrate 121 can be masked by a respective mask 132. According to an exemplary embodiment, the mask 132, ie, the first mask 132 corresponding to the first substrate 121, and the second mask 132 corresponding to the second substrate 121 are placed in the mask frame 131. Provided to hold the mask 132 in place.

  [0088] According to some embodiments, which may be combined with other embodiments described herein, the substrate 121 may be supported by a substrate support 126 coupled to the alignment unit 112. . The alignment unit 112 can adjust the position of the substrate 121 with respect to the mask 132. FIG. 10 shows an embodiment where the substrate support 126 is coupled to the alignment unit 112. Thus, the substrate is moved with respect to the mask 132 during the deposition of the organic material, for accurate alignment between the substrate and the mask. According to further embodiments, which can be combined with the other embodiments described herein, alternatively or additionally, a mask 132 and / or a mask frame 131 holding the mask 132 may be attached to the alignment unit 112. Can be combined. According to some embodiments, either the mask can be positioned relative to the substrate 121, or both the mask 132 and the substrate 121 can be positioned relative to each other. The alignment unit 112 is configured to adjust the position between the substrate 121 and the mask 132 with respect to each other, allowing for correct alignment of the masking during the deposition process, but without the need for a high quality LED display. Useful for manufacturing or OLED display manufacturing.

  [0089] As shown in FIG. 10, the linear guide 320 provides the direction of translation of the material source 100. On both sides of the material source 100, masks 132 are provided. The mask 132 can extend essentially parallel to the direction of translation. Further, the substrate 121 on the opposite side of the material source 100 can also extend essentially parallel to the direction of translation. According to an exemplary embodiment, substrate 121 can be moved into and out of vacuum chamber 110 via valve 205. The deposition apparatus 300 can include a respective transport trajectory for transporting each of the substrates 121. For example, the transport trajectory can extend into and out of the vacuum chamber 110, parallel to the substrate position shown in FIG.

  [0090] Typically, additional tracks are provided to support mask frame 131 and mask 132. Thus, some embodiments, which may be combined with other embodiments described herein, may include four tracks in the vacuum chamber 110. To move one of the masks 132 from the chamber, such as for cleaning the mask 132, the mask frame 131 and the mask can be moved on a transport trajectory of the substrate 121. Next, each mask frame can enter and exit the vacuum chamber 110 on the substrate transport trajectory. Although it is possible to provide the mask frame 131 with separate transport trajectories into and out of the vacuum chamber 110, the cost of ownership of the deposition apparatus 200 is only two trajectories, the transport trajectory of the substrate. Can be reduced when extending into and out of the vacuum chamber 110, and in addition, the mask frame 131 can be moved onto each one of the substrate transport trajectories by a suitable actuator or robot. it can.

  [0091] FIG. 10 shows an exemplary embodiment of the material source 100. Material source 100 includes a support 102. Support 102 is configured for translational movement along linear guide 320. The support 102 supports two evaporation crucibles 104 and two distribution pipes 106 provided on the evaporation crucible 104. The vapor generated in the evaporating crucible can move upward from one or more nozzles or outlets of the distribution pipe.

[0092] According to embodiments described herein, the material source includes one or more evaporating crucibles and one or more distribution tubes, each one of the one or more distribution tubes being one or more distribution tubes. A fluid communication can be provided with each one of the plurality of evaporating crucibles. Various applications to OLED device fabrication include processing features in which one or more organic materials evaporate simultaneously. Thus, for the example shown in FIG. 10, two distribution pipes and corresponding evaporating crucibles can be provided adjacent to each other. Thus, the material source 100 may also be referred to as a material source array, for example, where two or more organic materials evaporate simultaneously. As described herein, the material source array itself can be referred to as a material source for two or more organic materials, for example, evaporating three materials and depositing them on one substrate An array of material sources can be provided. According to some embodiments, the material source array may be configured to simultaneously provide the same material from different material sources.

[0093] One or more nozzles of the distribution pipe may include one or more nozzles, which may be provided, for example, to a showerhead or another vapor distribution system. The nozzle provided to the distribution pipe described herein can be a nozzle described in an embodiment herein, such as the nozzle described with respect to FIGS. 8a to 8d. It can be understood herein that the distribution pipe includes a housing having an opening such that the pressure in the distribution pipe is higher than the pressure outside the distribution pipe, for example, by at least one order of magnitude. In one example, the pressure of the distribution pipe can be from about ¹⁰ -2 mbar to about ¹⁰ -3 mbar.

  [0094] According to the embodiments described herein, which can be combined with other embodiments described herein, the rotation of the distribution pipe is at least the rotation of the evaporator control housing to which the distribution pipe is mounted. Can be provided. Additionally or alternatively, rotation of the distribution pipe can be provided by moving the material source along a curved portion of the loop trajectory. Typically, the evaporating crucible is also mounted on an evaporator control housing. Thus, the material source comprises a distribution pipe and an evaporating crucible, both of which can be rotatably mounted, for example together.

  [0095] According to some embodiments, which can be combined with other embodiments described herein, the distribution pipe or evaporator pipe can be designed in a triangular shape, and thus the distribution pipe opening or nozzle. Can be as close as possible to one another. By bringing the openings or nozzles of the distribution pipe as close as possible to one another, an improved mixing of different organic materials can be achieved, for example when two, three or more different organic materials are evaporated together. .

  [0096] According to the embodiments described herein, the width of the outlet side of the distribution pipe (the side of the distribution pipe including the opening) is 30% or less of the maximum dimension of the cross section. In light of this, the opening of the distribution pipe or the nozzle of the adjacent distribution pipe can be provided at a smaller distance. A smaller distance improves the mixing of the organic materials that evaporate next to each other. Still further, additionally or alternatively, apart from the improved mixing of the organic material, the width of the wall facing the substrate essentially parallel can be reduced. Similarly, the surface area of the wall facing the substrate, essentially parallel, can be reduced. This arrangement reduces the thermal load provided to the mask or substrate supported in or shortly before the deposition area.

  [0097] Additionally or alternatively, considering the triangular shape of the material source, the area radiating toward the mask is reduced. In addition, large numbers of metal plates, such as, for example, up to ten metal plates, can be provided to reduce heat transfer from the material source to the mask. According to some embodiments, which can be combined with other embodiments described herein, the heat shield or metal plate can be provided with an orifice for the nozzle, at least on the front side of the source, That is, it can be attached to the side surface facing the substrate.

  [0098] Although the embodiment shown in FIG. 10 provides a movable source for the deposition apparatus, those skilled in the art will appreciate that the above embodiments can also be applied in a deposition apparatus where the substrate moves during processing. right. For example, the substrate to be coated can be guided and driven along a stationary source of material.

[0099] Embodiments described herein relate particularly to the deposition of organic materials, such as, for example, for OLED display fabrication on large area substrates. According to some embodiments, a large area substrate, or a carrier supporting one or more substrates, ie, a large area carrier, can have a size of at least 0.174 m ² . For example, GEN5 corresponding to a substrate of about 1.4 m ² (1.1 mx 1.3 m), GEN 7.5 corresponding to a substrate of about 4.29 m ² (1.95 mx 2.2 m), about 5.7 m Processing large area substrates, such as GEN 8.5 corresponding to ² substrates (2.2 mx 2.5 m), or GEN 10 corresponding to about 8.7 m ² substrates (2.85 mx 3.05 m) To that end, the deposition apparatus can be adapted. Larger generations, such as GEN11 and GEN12, and corresponding substrate areas can be implemented as well. According to an exemplary embodiment, which can be combined with the other embodiments described herein, the thickness of the substrate can be from 0.1 to 1.8 mm, and the holding device for the substrate is: It can be adapted to the thickness of such a substrate. However, in particular, the thickness of the substrate can be less than or equal to about 0.9 mm, 0.5 mm or 0.3 mm, and the holding device is adapted to such substrate thickness. Typically, the substrate can be made from any material suitable for material deposition. For example, the substrate may be a group of glass (eg, soda lime glass, borosilicate glass, etc.), metal, polymer, ceramic, composite, carbon fiber material, or any other material or combination of materials that can be coated by a deposition process. Can be made from materials selected from:

  [00100] According to some embodiments, a method is provided for depositing evaporated material on a substrate in a vacuum deposition chamber having a chamber space. A chamber space can be understood as a space surrounded by chamber walls, in particular a space providing the same pressure regime. A flowchart 400 illustrating a method according to embodiments described herein is shown in FIG. The method includes, at block 410, evaporating a first material with a first material evaporator disposed within the chamber space. For example, a first material evaporator can be a source for evaporating organic materials. In one example, the evaporator may be adapted to evaporate a material having an evaporation temperature from about 150C to about 500C. In some embodiments, the material source can be a crucible.

[00101] At block 420, the method includes providing the vaporized first material to a first distribution pipe comprising a first distribution pipe housing. According to the embodiments described herein, the first distribution pipe is in fluid communication with the first material evaporator. According to some embodiments, the distribution pipe can be, for example, the aforementioned distribution pipe, such as a straight distribution pipe, or the distribution pipe shown and described with respect to FIGS. Providing the first distribution pipe with the vaporized first material further comprises providing a pressure of about 10 ^-2 to 10 ^-1 mbar in the first distribution pipe. At block 430, the evaporated material is guided through one or more of the plurality of first nozzles in the first distribution pipe housing. Typically, one or more nozzles of the plurality of first nozzles have an opening length and an opening size, and guiding the evaporated material through the one or more nozzles can be at least 2: 1. Further comprising directing the evaporated material through one or more nozzles having a length to size ratio. According to some embodiments, the nozzle through which the evaporated material is guided may be the nozzle described in the above embodiment. In one example, the nozzle may be screwed into the distribution pipe housing. In certain embodiments, which may be combined with other embodiments described herein, the nozzle is chemically inert to the evaporated organic material, such as the nozzle shown in FIGS. 7a-7d. Material may be included. According to some embodiments, the nozzle may be part of the distribution pipe typically shown and described with respect to FIGS. 9a and 9b.

[00102] At block 440, the evaporated material is released into the chamber space toward a substrate in the chamber space. Typically, the chamber space provides a pressure of about ^10-5 mbar to ^10-7 mbar, more typically about ^10-6 mbar to about ^10-7 mbar. For example, a vacuum chamber can evacuate the chamber to a pressure of about ^10-5 mbar to ^10-7 mbar and include pumps, seals, etc. to maintain that pressure in the chamber. In some embodiments, the steam plume emitted from the nozzle may have a distribution such as cos ⁶ . According to some embodiments described herein, a steam plume having a distribution such as cos ⁶ may provide, for example, a smaller shadowing effect than a steam plume having a distribution such as cos ⁶ . The effect is shown, for example, in FIGS. 3a to 3c. Cos ⁶ -like distribution of the dispensed material can increase not only the precision of the deposition, but also the uniformity of the material deposition on the substrate.

[00103] According to some embodiments, the method includes evaporating the second material using a second material evaporator in the chamber space, and evaporating the evaporated second material to a second material. Providing to a second distribution pipe including the distribution pipe housing of the above. According to some embodiments, the second material can be the same material as the first material. In other embodiments, the second material is different from the first material. In some embodiments, the second distribution pipe may be a distribution pipe described above. Typically, the second distribution line is in fluid communication with the second material evaporator, and providing the vaporized material to the second distribution line is between about 10 ^-2 mbar and 10 ^-1 mbar. In the second distribution pipe. Vacuum chambers and / or material deposition equipment may be provided with pumps, seals, sluices, etc. to provide and maintain pressure in distribution pipes. The method may further include directing the evaporated material through one or more of the plurality of second nozzles in the second distribution pipe housing. In some embodiments, the first evaporated material and the second evaporated material are separated by less than 30 mm from one or more first nozzles and one or more first nozzles and the second distribution tube. Or it is guided through a plurality of second nozzles. A distance of less than 30 mm may allow for accurate deposition of different evaporated materials on a substrate, for example, for the production of OLED displays or the like.

  [00104] According to an embodiment, which may be combined with other embodiments described herein, the first evaporated material is provided in the second distribution pipe in one or more second nozzles of the second nozzle. Discharge from one or more first nozzles of the first distribution pipe in a first distribution direction parallel to the distribution direction or offset by up to 5 ° from a parallel arrangement. The parallel arrangement of the dispensing directions may allow for defined deposition and mixing characteristics of different evaporating materials coming from different material sources.

  [00105] According to a further embodiment, which may be combined with the other embodiments described herein, at least one or more nozzles of the first distribution pipe and the second distribution pipe are evaporated. Including materials that are chemically inert to organic materials. Evaporated material passing through the nozzle containing inert material (eg, inert material as a coating on the nozzle opening) is not affected by the nozzle material and remains in the desired state. For example, the composition of the evaporated material remains the same before and after the nozzle. In one example, direction, flow rate and pressure, however, may be affected by the nozzle.

[00106] In some embodiments, the method includes heating the distribution pipe to an evaporation temperature of the substrate or the material to be deposited thereon. The heating of the distribution pipe can be performed by a heating device. In one example, the performance of the heating device is supported by a heat shield, for example, as described above with respect to FIGS. 8a-8c.
[00107] In some embodiments, which can be combined with other embodiments described herein, an apparatus is provided for depositing evaporated material on a substrate in a vacuum chamber. The apparatus is a first source of material: a first evaporator configured to evaporate a first material deposited on a substrate; a first evaporator in fluid communication with the first evaporator. A plurality of first nozzles in fluid communication with the first distribution pipe housing, wherein one or more of the plurality of first nozzles has an opening length and an opening size; A first material source comprising a plurality of first nozzles, wherein a ratio of an opening length to an opening size of one or more nozzles of the plurality of first nozzles is 2: 1 or more; and a second material source. A second evaporator configured to evaporate a second material deposited on the substrate; a second distribution pipe housing in fluid communication with the second evaporator; A second material source comprising a plurality of second nozzles in fluid communication with the distribution pipe housing of the second material. , The distance between the plurality of first at least one first nozzle and a plurality of second at least one second nozzle in a nozzle of the nozzle is 50mm or less.
[[00108] In some embodiments that may be combined with other embodiments described herein, the first dispensing direction corresponds to a length direction of one or more nozzles of the plurality of first nozzles. The second distribution direction corresponds to the length direction of one or more nozzles of the plurality of second nozzles.
"[00109] In some embodiments, which may be combined with other embodiments described herein, the ratio of aperture length to aperture size is dimensionless.
"[00110] In some embodiments that may be combined with other embodiments described herein, the opening size of the nozzle is defined by the smallest dimension of the cross-section of the opening.

According to [001 11] some embodiments, the use of the distribution pipe according to use, and / or the specification of the material deposition apparatus as described herein is provided.

[001 12 ] While the above description has been directed to certain embodiments, other and further embodiments may be devised without departing from the basic scope of the present disclosure. The scope is defined by the claims that follow.

Claims (16)

An apparatus for depositing evaporated material on a substrate (121) in a vacuum chamber (110) having a chamber space, the apparatus comprising:
A first material source (100a),
A first material evaporator (102a) configured to evaporate the first material;
A first distribution pipe (106a) comprising a first distribution pipe housing (116), the first distribution pipe (106a) being in fluid communication with the first material evaporator;
A plurality of first nozzles (712) in the first distribution pipe housing (116), wherein one or more nozzles of the plurality of first nozzles has an opening length (714) and an opening size. (716), wherein the ratio of the opening length to the opening size of the one or more nozzles of the plurality of first nozzles is 2: 1 or more. A first source of material (100a), comprising:
A second material source (100b),
A second material evaporator (102b) configured to evaporate the second material;
A second distribution pipe (106b) including a second distribution pipe housing, the second distribution pipe (106b) being in fluid communication with the second material evaporator;
A second material source (100b), comprising a plurality of second nozzles (712) in the second distribution pipe housing;
A pixel mask (132) including an opening having a size of 50 μm × 50 μm or less between a position where the substrate (121) is arranged and the first distribution pipe (106a);
With
A distance (200) between at least one first nozzle of the plurality of first nozzles and at least one second nozzle of the plurality of second nozzles is 50 mm or less;
One or more distances between the one or more nozzles of the plurality of first nozzles and the position where the substrate (121) is arranged are less than 250 mm;
During the deposition, the apparatus is arranged such that the vaporized first material is at a pressure of 10 ⁻² to 10 ⁻¹ mbar in the first distribution pipe (106a) and the chamber space is 10 ⁻⁵ to 10 ⁻⁵ mbar. pressure of 10 ^-7 mbar is controllable to provide,
The apparatus, wherein the width of the outlet side of the first distribution pipe is 30% or less of the maximum dimension of the cross section of the first distribution pipe .   The distance (200) between the at least one first nozzle of the plurality of first nozzles and the at least one second nozzle of the plurality of second nozzles is a horizontal distance. The apparatus of claim 1.   Apparatus according to claim 1 or 2, wherein the distance between the first distribution pipe (106a) and the second distribution pipe (106b) is less than or equal to 30 mm.   The distance (200) between the at least one first nozzle of the plurality of first nozzles and the at least one second nozzle of the plurality of second nozzles is the at least one Apparatus according to any of the preceding claims, wherein the distance is between a first center point of a first nozzle and a second center point of the at least one second nozzle.   The first nozzle (712) provides a first dispensing direction (210), the second nozzle (712) provides a second dispensing direction (211), and the first dispensing direction 5. The device according to claim 1, wherein the (210) and the second distribution direction (211) are arranged at a maximum of 5 ° off parallel to one another. An apparatus for depositing evaporated material on a substrate (121) in a vacuum chamber (110) having a chamber space, the apparatus comprising:
A first material source (100a),
A first material evaporator (102a) configured to evaporate the first material;
A first distribution pipe (106a) including a first distribution pipe housing (116), the first distribution pipe (106a) being in fluid communication with the first material evaporator (102a);
A plurality of first nozzles (712) in the first distribution pipe housing (116), wherein one or more of the plurality of first nozzles has an opening length (714) and an opening length. And providing a first dispensing direction (210), wherein the ratio of the opening length to the opening size of the one or more nozzles of the plurality of first nozzles is 2: A first material source (100a) comprising a plurality of first nozzles (712), one or more;
A second material source (100b),
A second material evaporator (102b) configured to evaporate the second material;
A second distribution pipe (106b) including a second distribution pipe housing (116), the second distribution pipe (106b) being in fluid communication with the second material evaporator (102b);
A plurality of second nozzles (712) in the second distribution pipe housing (116), wherein one or more of the plurality of second nozzles is in a second distribution direction (211). A second material source (100b), comprising a plurality of second nozzles (712), configured to provide:
A pixel mask (132) including an opening having a size of 50 μm × 50 μm or less between a position where the substrate (121) is arranged and the first distribution pipe (106a);
With
The first distribution direction (210) of the one or more nozzles (712) of the plurality of first nozzles and the first distribution direction (210) of the one or more nozzles (712) of the plurality of second nozzles 2, the distribution directions (211) are shifted from the parallel state by up to 5 °,
One or more distances between the one or more nozzles of the plurality of first nozzles and the position where the substrate (121) is arranged are less than 250 mm;
During the deposition, the apparatus is arranged such that the vaporized first material is at a pressure of 10 ⁻² to 10 ⁻¹ mbar in the first distribution pipe (106a) and the chamber space is 10 ⁻⁵ to 10 ⁻⁵ mbar. pressure of 10 ^-7 mbar is controllable to provide,
The apparatus, wherein the width of the outlet side of the first distribution pipe is 30% or less of the maximum dimension of the cross section of the first distribution pipe .   The first distribution direction (210) corresponds to an average evaporation direction of a plume of evaporated material discharged from the one or more nozzles (712) of the plurality of first nozzles; 7. The method according to claim 6, wherein the two dispensing directions (211) correspond to the average evaporating direction of the plume of evaporated material discharged from the one or more nozzles (712) of the plurality of second nozzles. The described device.   The distance between at least one first nozzle of the plurality of first nozzles and at least one second nozzle of the plurality of second nozzles is 50 mm or less. An apparatus according to claim 1.   The one or more nozzles (712) of at least one of the plurality of nozzles of the first distribution pipe (106a) and the second distribution pipe (106b) chemically react with the evaporated organic material. Apparatus according to any of the preceding claims, comprising a material that is inert. An apparatus for depositing evaporated material on a substrate (121) in a vacuum chamber (110) having a chamber space, the apparatus comprising:
A first material source (100a),
A first material evaporator (102a) configured to evaporate the first material;
A first distribution pipe (106a) including a first distribution pipe housing (116), the first distribution pipe (106a) being in fluid communication with the first material evaporator (102a);
A plurality of first nozzles (712) in the first distribution pipe housing (116) of the first distribution pipe (106a), wherein one or more nozzles of the plurality of first nozzles is An opening (713) having an opening length (714) and an opening size (716), wherein the ratio of the opening length to the opening size of the one or more nozzles of the plurality of first nozzles is 2: 1. A plurality of first nozzles, wherein the plurality of first nozzles include a material that is chemically inert to an evaporated organic material;
A first source of material (100a), comprising:
A second material source (100b),
A second material evaporator (102b) configured to evaporate the second material;
A second distribution pipe (106b) including a second distribution pipe housing (116), the second distribution pipe (106b) being in fluid communication with the second material evaporator (102b);
A second material source (100b), comprising a plurality of second nozzles (712) in the second distribution pipe housing (116);
A pixel mask (132) including an opening having a size of 50 μm × 50 μm or less between a position where the substrate (121) is arranged and the first distribution pipe (106a);
With
One or more distances between the one or more nozzles of the plurality of first nozzles and the position where the substrate (121) is arranged are less than 250 mm;
During the deposition, the apparatus is arranged such that the vaporized first material is at a pressure of 10 ⁻² to 10 ⁻¹ mbar in the first distribution pipe (106a) and the chamber space is 10 ⁻⁵ to 10 ⁻⁵ mbar. pressure of 10 ^-7 mbar is controllable to provide,
A distance (200) between at least one of the first nozzles and at least one of the second nozzles is equal to or less than 50 mm, or at least one of the first nozzles (712) is a first nozzle. The second nozzle (712) is configured to provide a dispensing direction (210), and at least one of the second nozzles (712) is configured to provide a second dispensing direction (211); dispensing direction (210) and said second distribution direction (211) are arranged offset to 5 ° at the maximum from the parallel to each other,
The apparatus, wherein the width of the outlet side of the first distribution pipe is 30% or less of the maximum dimension of the cross section of the first distribution pipe . The nozzle (712) having an opening length to opening size ratio of at least 2: 1 to form a cos ⁶ shaped vapor plume of evaporated organic material. An apparatus for depositing the vaporized material according to claim 1. A vacuum deposition chamber (110),
An apparatus for depositing evaporated material according to any one of claims 1 to 11 ,
A substrate support (126) for supporting the substrate (121) during deposition;
A vacuum deposition chamber (110), wherein a distance between at least one of the distribution pipes (106a; 106b; 106c) of the apparatus and the substrate support (126) is less than 250 mm. The first distribution pipe (106a), the plurality of first nozzles (712), the second distribution pipe (106b), and the plurality of second nozzles (712) are connected to the vacuum deposition chamber (110). 13. The vacuum deposition chamber of claim 12, wherein the chamber is movable within. A method for depositing evaporated material on a substrate (121) in a vacuum deposition chamber (110) having a chamber space, the method comprising:
Evaporating a first material by a first material evaporator (102a) disposed in the chamber space;
Providing the evaporated first material to a first distribution pipe (106a) comprising a first distribution pipe housing (116), wherein the first distribution pipe (106a) comprises a first distribution pipe (106a); It is in fluid communication with the first material evaporator (102a) at a pressure of 10 ^-2 to 10 ^-1 mbar in the distribution pipe (106a), and the width of the outlet side of the first distribution pipe is the above-mentioned. Providing no more than 30% of the largest dimension of the cross-section of the first distribution pipe ;
Guiding the vaporized first material through one or more of a plurality of first nozzles (712) in the first distribution pipe housing (116), wherein the plurality of first nozzles (712) are disposed in the first distribution pipe housing (116). One or more of the nozzles has an opening length (714) and an opening size (716), has a ratio of the opening length to the opening size of 2: 1 or more, and Guiding, wherein one or more distances between the one or more nozzles of the first nozzles and the substrate (121) is less than 250 mm;
The evaporating first into the chamber space toward the substrate (121) in the chamber space through a pixel mask (132) having openings of 50 μm × 50 μm or less corresponding to each OLED pixel of the OLED display. Discharging a material, wherein the chamber space provides a pressure of ^10-5 to ^10-7 mbar, comprising discharging. Evaporating a second material by a second material evaporator (102b) in the chamber space;
Providing the evaporated second material to a second distribution pipe (106b) comprising a second distribution pipe housing (116), wherein the second distribution pipe (106b) comprises a second distribution pipe (106b). Providing in fluid communication with said second material evaporator (102b) at a pressure of 10 ^-2 to 10 ^-1 mbar in a distribution pipe;
Guiding the vaporized second material through one or more of a plurality of second nozzles (712) in the second distribution pipe housing (116).
The one or more first nozzles and the second nozzle of the first distribution pipe (106a) are spaced apart by less than 50 mm, respectively, by the evaporated first material and the evaporated second material. The first material that has been guided and / or evaporated through the one or more second nozzles of the distribution pipe (106b) is coupled to the one or more second nozzles of the second distribution pipe (106b). Of the first distribution pipe (106a) in a first distribution direction (210) which is parallel to the second distribution direction (211) of the nozzles or deviates by up to 5 ° from said parallel arrangement. The one or more nozzles discharged from the one or more first nozzles and / or the at least one nozzle of the first distribution pipe (106a) and the second distribution pipe (106b) are vaporized organic. Materials that are chemically inert to the material 15. The method of claim 14, comprising a fee.   Apparatus according to claim 1, 6 or 10, wherein the first distribution pipe and the second distribution pipe extend substantially vertically.

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