JP6605946B2 - チップ収容トレイからチップをピックアップする方法 - Google Patents
チップ収容トレイからチップをピックアップする方法 Download PDFInfo
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- JP6605946B2 JP6605946B2 JP2015251182A JP2015251182A JP6605946B2 JP 6605946 B2 JP6605946 B2 JP 6605946B2 JP 2015251182 A JP2015251182 A JP 2015251182A JP 2015251182 A JP2015251182 A JP 2015251182A JP 6605946 B2 JP6605946 B2 JP 6605946B2
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- 238000003860 storage Methods 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 16
- 239000011148 porous material Substances 0.000 claims description 11
- 238000005520 cutting process Methods 0.000 description 54
- 239000000758 substrate Substances 0.000 description 42
- 239000004065 semiconductor Substances 0.000 description 11
- 239000002184 metal Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 4
- 230000004308 accommodation Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000003754 machining Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67333—Trays for chips
- H01L21/67336—Trays for chips characterized by a material, a roughness, a coating or the like
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67356—Closed carriers specially adapted for containing chips, dies or ICs
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67333—Trays for chips
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/18—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of the types provided for in two or more different main groups of the same subclass of H10B, H10D, H10F, H10H, H10K or H10N
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68313—Auxiliary support including a cavity for storing a finished device, e.g. IC package, or a partly finished device, e.g. die, during manufacturing or mounting
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Dicing (AREA)
- Packaging Frangible Articles (AREA)
Description
チップ収容トレイはタック力を有し表面にチップを保持する保持シートと、該保持シートの裏面を支持する底壁と該底壁から立設し該保持シートを囲繞する側壁とからなる枠体と、を具備し、該保持シートと該枠体の該底壁には該保持シートの表面に開口する複数の細孔が形成されており、
チップ収容トレイに収容された複数のチップから所定のチップをピックアップする際には、ピックアップ装置のピックアップコレットをピックアップすべき所定のチップの上面に位置付けると共に、エアー噴出筒を、チップ収容トレイを構成する底壁における該ピックアップすべき所定のチップと対応する下面に位置付けて底壁に形成された細孔と保持シートに形成された細孔とを通して該ピックアップすべき所定のチップの下面にエアーを噴出してピックアップコレットにより該チップを個別にピックアップする、チップ収容トレイから個々に分割されたチップをピックアップする方法が提供される。
さらに、本発明によるチップ収容トレイから個々に分割されたチップをピックアップする方法では、保持シートと枠体の底壁には保持シートの表面に開口する複数の細孔が形成されており、チップ収容トレイに収容された複数のチップから所定のチップをピックアップする際には、ピックアップ装置のピックアップコレットをピックアップすべき所定のチップの上面に位置付けると共に、エアー噴出筒を、チップ収容トレイを構成する底壁における該ピックアップすべき所定のチップと対応する下面に位置付けて底壁に形成された細孔と保持シートに形成された細孔とを通して該ピックアップすべき所定のチップの下面にエアーを噴出してピックアップコレットにより該チップを個別にピックアップすることにより、ピックアップすべきチップを容易に剥離することができる。
保持治具2は、図2の(a)に示すように矩形状に形成され表面中央部に上記パッケージ基板1を吸引保持する吸引保持部20が突出して設けられている。吸引保持部20の上面(保持面)にはパッケージ基板1に形成された第1の分割予定ライン111および第2の分割予定ライン112と対応する領域に後述する切削ブレードの切れ刃を逃がす逃がし溝21および22が格子状に形成されている。また、吸引保持部材20には、第1の分割予定ライン111および第2の分割予定ライン112によって区画された複数の領域にそれぞれ吸引孔23が形成されており、この吸引孔23が図示しない吸引手段に連通されるようになっている。なお、保持治具2の4隅には、位置決め用の穴24が設けられている。このように構成された保持治具2には、図2の(b)に示すように吸引保持部20の上面(保持面)に上記パッケージ基板1が載置される。
図3に示す切削装置3は、略直方体状の装置ハウジング31を具備している。この装置ハウジング31内には、被加工物を保持する吸引テーブル32が切削送り方向である矢印Xで示す方向に移動可能に配設されている。吸引テーブル32の上面には吸引凹部321が設けられており、この吸引凹部321に図示しない吸引手段と連通する吸引口322が開口している。また、吸引テーブル32の上面における4隅には、上記保持治具2の4隅に設けられた位置決め用の穴24が嵌合する位置きめピン323が立設されている。また、吸引テーブル32は、図示しない回転機構によって回転可能に構成されている。このように構成された吸引テーブル32は、図示しない切削送り手段によって、矢印Xで示す切削送り方向に移動せしめられるようになっている。
先ず、切削装置3の吸引テーブル32上にパッケージ基板1が載置され保持治具2を載置する。このとき、保持治具2の4隅に設けられた複数の位置決め用の穴24を吸引テーブル32の4隅に配設された位置決めピン323に嵌合することにより、パッケージ基板1が載置され保持治具2は所定の位置に位置付けられる。そして、図示しない吸引手段を作動することにより、吸引テーブル32の吸引口322、吸引凹部321、保持治具2に設けられた複数の吸引孔23を介して保持治具2の吸引保持部20に載置されたパッケージ基板1の各チップ113に負圧が作用し、パッケージ基板1の各チップ113が保持治具2の吸引保持部20上に吸引保持される(パッケージ基板保持工程)。
図6および図7の(a),(b)に示すチップ収容トレイ5は、表面に複数のチップを保持する矩形状の保持シート51と、該保持シート51を支持する矩形状の枠体52とからなっている。保持シート51は、タック力を有するシートからなっており、上面である表面に複数のチップをタック力によって保持する。タック力を有するシートとしては、新タック化成株式会社が製造販売する商品名「セパレス」または「ハンデコタック」を用いることができる。枠体52は、保持シート51の下面である裏面を支持する支持面521aを有する底壁521と、該底壁521から立設し保持シート51を囲繞する側壁522、522、522、522とからなっている。底壁521の下面には、短手方向両側に図示しない搬送装置の支持部材と係合する2個の係合凹部521b、521bがそれぞれ設けられている(図6には一方の側の係合凹部521b、521bのみが示されている)。このように構成されたチップ収容トレイ5を構成する保持シート51および枠体52の底壁521には、図7の(b)に示すように保持シート51の表面に開口する複数の細孔51aおよび521cが形成されている。なお、細孔51aおよび521cは、保持シート51の表面側からレーザー光線を照射して枠体52の底壁521を貫通するように形成することができる。
複数のチップ113を保持治具2の吸引保持部20上からチップ収容トレイ5に収容するには、図示の実施形態においてはチップ搬送装置6を用いて実施する。チップ搬送装置6は、複数のチップを吸引保持する吸引保持パッド61と、該吸引保持パッド61を一端部に支持する搬送アーム62を具備しており、搬送アーム62が図示しない作動機構によって作動せしめられる。吸引保持パッド61は、下面に上記複数のチップ113を形成するパッケージ基板1と同様の大きさの矩形状の凹部611aを備えたパッド本体611と、該パッド本体611の凹部611aに嵌合された吸着パッド612とからなっている。パッド本体611は、中央部に上記凹部611aに連通する吸引口611bが設けられている。この吸引口611bは、図示しない吸引手段に連通されている。上記吸着パッド612は矩形状に形成されており、上記保持治具2の吸引保持部20に設けられた吸引孔23と同様に複数のチップ113と対応する位置に複数の吸引孔612aが設けられている。従って、図示しない吸引手段が作動すると、吸引口611bおよび凹部611aを介して複数の吸引孔612aに負圧が作用せしめられる。
113:デバイス
2:保持治具
20:吸引保持部
21、22:逃がし溝
23:吸引孔
3:切削装置
32:吸引テーブル
33:スピンドルユニット
333:切削ブレード
5:チップ収容トレイ
51:保持シート
52:枠体
6:デバイス搬送装置
61:吸引保持パッド
7:ピックアップ装置
Claims (1)
- 複数のチップを収容するチップ収容トレイから個々に分割されたチップをピックアップする方法であって、
チップ収容トレイはタック力を有し表面にチップを保持する保持シートと、該保持シートの裏面を支持する底壁と該底壁から立設し該保持シートを囲繞する側壁とからなる枠体と、を具備し、該保持シートと該枠体の該底壁には該保持シートの表面に開口する複数の細孔が形成されており、
チップ収容トレイに収容された複数のチップから所定のチップをピックアップする際には、ピックアップ装置のピックアップコレットをピックアップすべき所定のチップの上面に位置付けると共に、エアー噴出筒を、チップ収容トレイを構成する底壁における該ピックアップすべき所定のチップと対応する下面に位置付けて底壁に形成された細孔と保持シートに形成された細孔とを通して該ピックアップすべき所定のチップの下面にエアーを噴出してピックアップコレットにより該チップを個別にピックアップする、チップ収容トレイから個々に分割されたチップをピックアップする方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015251182A JP6605946B2 (ja) | 2015-12-24 | 2015-12-24 | チップ収容トレイからチップをピックアップする方法 |
TW105136684A TWI706499B (zh) | 2015-12-24 | 2016-11-10 | 晶片收容托盤 |
SG10201610082WA SG10201610082WA (en) | 2015-12-24 | 2016-12-01 | Chip accommodation tray |
US15/373,795 US10475681B2 (en) | 2015-12-24 | 2016-12-09 | Chip accommodation tray |
KR1020160170159A KR102465718B1 (ko) | 2015-12-24 | 2016-12-14 | 칩 수용 트레이로부터 개개로 분할된 칩을 픽업하는 방법 |
CN201611151774.XA CN106935536B (zh) | 2015-12-24 | 2016-12-14 | 芯片收纳托盘 |
DE102016225805.2A DE102016225805A1 (de) | 2015-12-24 | 2016-12-21 | Chipaufnahmeträger |
Applications Claiming Priority (1)
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JP7304709B2 (ja) * | 2019-02-19 | 2023-07-07 | 株式会社ディスコ | 被加工物の加工方法 |
KR102633195B1 (ko) * | 2021-12-10 | 2024-02-01 | 세메스 주식회사 | 필름 결합 모듈 및 이를 포함하는 반도체 스트립 절단 및 분류 장비 |
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US10475681B2 (en) | 2019-11-12 |
SG10201610082WA (en) | 2017-07-28 |
DE102016225805A1 (de) | 2017-06-29 |
CN106935536B (zh) | 2022-02-18 |
TWI706499B (zh) | 2020-10-01 |
CN106935536A (zh) | 2017-07-07 |
KR20170076562A (ko) | 2017-07-04 |
US20170186635A1 (en) | 2017-06-29 |
TW201732987A (zh) | 2017-09-16 |
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JP2017117913A (ja) | 2017-06-29 |
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