JP6255303B2 - Polishing table changer and polishing table removal method - Google Patents

Description

  The present invention relates to an apparatus and method for exchanging a polishing table used in a polishing apparatus for polishing a substrate such as a wafer. In particular, the present invention relates to an apparatus and a method for realizing simple maintenance while restricting a maintenance space from the viewpoint of increasing the size of a polishing table and increasing productivity per footprint as the wafer size increases.

  The CMP apparatus is a polishing apparatus that polishes a wafer chemically and mechanically. One of the largest components in a CMP apparatus is a polishing table. This polishing table is a surface plate-like rotating body that is mounted horizontally on a table shaft and has a polishing pad attached to the surface thereof. This polishing table is a large and heavy part and cannot be replaced manually. For this reason, a series of operations are performed in which a dedicated lifter is prepared, the polishing table is lifted in the CMP apparatus, moved horizontally, pulled out of the CMP apparatus, and placed on a receiving table.

  In the conventional method, since the polishing table is pulled out horizontally and placed on the receiving table, a maintenance space larger than the diameter of the polishing table is required. For example, in a CMP apparatus having a wafer size of 300 mm, the maintenance space necessary for exchanging the polishing table is 900 mm. However, in a CMP apparatus with a wafer size of 450 mm, since the polishing table diameter exceeds 1000 mm, it is difficult to replace the polishing table in the conventional maintenance space of 900 mm.

Japanese Patent Application Laid-Open No. 2001-341068

Accordingly, an object of the present invention is to provide a polishing table exchanging apparatus and a method for taking out a polishing table that can exchange a large polishing table in a small maintenance space.

  In order to achieve the above-described object, one aspect of the present invention is a polishing table exchange device for removing a polishing table from a polishing device, the crane moving the polishing table in a vertical direction and a horizontal direction, and the polishing A polishing table exchanging apparatus comprising: a table table on which a table is placed; and a table table tilting mechanism for tilting the table table.

In a preferred aspect, the polishing table exchanging apparatus as a whole is further provided with a moving mechanism that is movable.
In a preferred aspect, the apparatus further includes a connecting portion connected to the polishing apparatus.
In a preferred aspect, the crane includes a lift arm that is extendable in a horizontal direction, a table support that is attached to a tip of the lift arm, and that supports the polishing table, and a vertical movement device that moves the lift arm up and down. It is characterized by having.

In another aspect of the present invention, the polishing table is raised, the raised polishing table is moved in the horizontal direction, the polishing table is taken out of the polishing apparatus, the polishing table is placed on a table base, and the table base is placed on the table base. The polishing table is taken out together with the polishing table.

  According to the present invention, the vertical projection area of the polishing table, which is a large component, can be reduced by tilting the polishing table together with the table base. Therefore, a large polishing table can be replaced with a smaller maintenance space. As a result, the number of polishing apparatuses that can be installed per footprint can be increased. The apparatus and method of the present invention are indispensable for simultaneously realizing productivity improvement by increasing the number of polishing apparatuses, in addition to productivity improvement by increasing the wafer size.

It is a perspective view which shows a polish device typically. It is a side view which shows the polishing table replacement | exchange apparatus which is a jig | tool for replacing | exchanging a polishing table. It is a bottom view which shows a lift arm and an arm lock mechanism. It is a top view which shows the grinding | polishing table to which the chain as a table support tool was connected. It is a perspective view which shows a table stand. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table. It is a figure for demonstrating operation | movement of the polishing table replacement | exchange apparatus when replacing | exchanging a polishing table.

  Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view schematically showing a polishing apparatus. A polishing apparatus (also referred to as a CMP apparatus) 1 includes a polishing table 3 for supporting a polishing pad 2, a polishing head 4 for pressing the wafer W against the polishing pad 2 on the polishing table 3, and polishing the wafer W, and a polishing pad 2 is provided with a polishing liquid supply nozzle 5 for supplying a polishing liquid (usually slurry).

  The polishing table 3 is connected to a table motor 6 disposed below the table shaft 3a, and the polishing table 3 is rotated by the table motor 6 in a direction indicated by an arrow. A polishing pad 2 is affixed to the upper surface of the polishing table 3, and the upper surface of the polishing pad 2 constitutes a polishing surface 2a for polishing the wafer W. The polishing head 4 is connected to the lower end of the head shaft 7. The polishing head 4 is configured to hold the wafer W on the lower surface thereof by vacuum suction. The head shaft 7 is moved up and down by a vertical movement mechanism (not shown).

  The polishing of the wafer W is performed as follows. The polishing head 4 and the polishing table 3 are rotated in directions indicated by arrows, respectively, and a polishing liquid (slurry) is supplied onto the polishing pad 2 from the polishing liquid supply nozzle 5. In this state, the polishing head 4 presses the wafer W against the polishing surface 2 a of the polishing pad 2. The surface of the wafer W is polished by the mechanical action of abrasive grains contained in the polishing liquid and the chemical action of the polishing liquid.

  FIG. 2 is a side view showing the polishing table exchange device 10 which is a jig for exchanging the polishing table 3. The polishing table exchanging device 10 supports the polishing table 3 and moves the polishing table 3 in the vertical and horizontal directions, a table base 14 on which the polishing table 3 is placed, and the table base 14 is tilted. A power jack 15 as a table base tilting mechanism is provided.

  The crane 12 includes a lift arm 21 that can be expanded and contracted in the horizontal direction, a handle 22 that is gripped by a hand when the lift arm 21 is expanded and contracted in the horizontal direction, and an arm lock mechanism 23 that fixes the tip position of the lift arm 21. A plurality of chains (table support tools) 24 attached to the tip of the lift arm 21 for supporting the polishing table 3, an arm holder 26 for holding the lift arm 21, and the arm holder 26 and the lift arm 21. And a winch 30 as a vertically moving device that moves up and down integrally. The lift arm 21 of this embodiment is a telescopic arm.

  The arm holder 26 is supported by a plurality of linear guides 33 attached to a plurality of vertical frames 16 extending in the vertical direction so as to be movable in the vertical direction. The winch 30 is attached to a horizontal frame 17 fixed to the vertical frame 16. The vertical frame 16 and the horizontal frame 17 constitute a housing 18 of the polishing table exchange device 10. The crane 12, the table base 14, and the power jack 15 are attached to the housing 18.

  The winch 30 and the arm holder 26 are connected by a wire rope (not shown). When the winch 30 winds up the wire rope, the arm holder 26 and the lift arm 21 held by the arm holder 26 are raised together. When the winch 30 unwinds the wire rope, the arm holder 26 and the lift arm 21 descend due to their own weight. The vertical movement of the arm holder 26 and the lift arm 21 is guided in the vertical direction by the linear guide 33.

  FIG. 3 is a bottom view showing the lift arm 21 and the arm lock mechanism 23. As shown in FIG. 3, the arm lock mechanism 23 includes a pantograph mechanism. The arm lock mechanism 23 is disposed along the lift arm 21, and the arm lock mechanism 23 is supported by a bracket 27. One end of the arm lock mechanism 23 is connected to the tip of the lift arm 21, and the other end of the arm lock mechanism 23 is connected to the arm holder 26. The handle 22 is fixed to the tip of the lift arm 21.

  When the handle 22 is grasped by hand and the lift arm 21 is manually expanded and contracted, the arm lock mechanism 23 is expanded and contracted in the same manner. The arm lock mechanism 23 includes a lock lever 23a that fixes the length thereof, and the entire length of the arm lock mechanism 23 is fixed by manually operating the lock lever 23a. Therefore, the horizontal length of the lift arm 21 connected to the arm lock mechanism 23 is fixed, and the position of the tip of the lift arm 21 is fixed. Instead of the handle 22 and the arm lock mechanism 23, an actuator (for example, a combination of a motor and a ball screw) that extends and retracts the lift arm 21 in the horizontal direction may be provided.

  FIG. 4 is a plan view showing the polishing table 3 to which a chain 24 as a table support is connected. In the present embodiment, three chains 24 are used, and the polishing table 3 is suspended from the lift arm 21 by these three chains 24. A first suspension bracket 41 and a second suspension bracket 42 are attached to the periphery of the polishing table 3. The first suspension bracket 41 and the second suspension bracket 42 are arranged symmetrically with respect to the center of the polishing table 3. The first suspension bracket 41 includes one connection ring (eye bolt) 44, and the second suspension bracket 42 includes two connection rings (eye bolts) 45 and 46. One of the three chains 24 is attached to the connection ring 44 of the first suspension bracket 41, and the other two are attached to the connection rings 45 and 46 of the second suspension bracket 42. The other ends of the three chains 24 are connected to a mounting portion 48 fixed to the tip of the lift arm 21.

  FIG. 5 is a perspective view showing the table base 14. As shown in FIG. 5, the table base 14 includes two support arms 51 that are parallel to each other, a connecting arm 52 that connects the two support arms 51, and an arm that is fixed to the two support arms 51. A shaft 54 is provided. These support arms 51 have a horizontal table mounting surface 51a. Further, these support arms 51 each have two claws 51b extending vertically at their tips. Bearings (not shown) are fixed to the two support frames 57 extending vertically, and the arm shaft 54 extending horizontally is rotatably supported by these bearings. Therefore, the table base 14 is configured to be able to rotate around the axis of the arm shaft 54. The support frame 57 constitutes the housing 18 together with the vertical frame 16 and the horizontal frame 17.

  A locking member 61 is fixed to the end of the arm shaft 54, and the locking member 61 rotates integrally with the arm shaft 54. An arm stopper (upper arm stopper) 64 fixed to the support frame 57 is disposed above the locking member 61. When the table base 14 rotates until the table mounting surface 51a becomes horizontal, the locking member 61 comes into contact with the arm stopper 64, so that the table base 14 does not rotate any more. Therefore, the table base 14 is allowed to tilt only downward with respect to the horizontal direction.

  As shown in FIG. 2, an arm stopper (lower arm stopper) 65 is disposed below the table base 14. When the table base 14 tilts downward with respect to the horizontal direction, the lower surface of the table base 14 comes into contact with the arm stopper 65 so that the table base 14 does not tilt further downward. Accordingly, the range of inclination of the table base 14 is limited by the upper arm stopper 64 and the lower arm stopper 65. A power jack (table base tilting mechanism) 15 is connected to the connecting arm 52 (see FIG. 5) of the table base 14. The power jack 15 is provided with a handle 15a. When the handle 15a is turned, the table base 14 rotates downward about the arm shaft 54, and thereby the table base 14 tilts downward.

  A plurality of rollers 69 as a moving mechanism are fixed to a base frame 67 that constitutes a part of the casing 18 of the polishing table exchange device 10. These rollers 69 allow the polishing table exchange device 10 itself to move with the polishing table 3 and transport the polishing table 3 to a desired location.

  Next, a method for exchanging the polishing table 3 using the polishing table exchanging device 10 will be described. First, as shown in FIG. 6, the polishing table exchange device 10 is moved and brought into contact with the frames 1 a and 1 b of the polishing device 1. The polishing table exchanging device 10 has a plurality of connecting portions 71 and 72 that are detachably connected to the frames 1 a and 1 b of the polishing device 1. In the present embodiment, two connecting portions 71 and 72 are provided at the upper and lower portions of the housing 18. These connecting portions 71 and 72 are connected to the frames 1 a and 1 b of the polishing apparatus 1 by bolts (not shown), respectively, whereby the entire polishing table exchange apparatus 10 is fixed to the polishing apparatus 1.

  Next, as shown in FIG. 7, the polishing table 3 and the lift arm 21 are connected by a chain 24. As described above, the first suspension bracket 41 and the second suspension bracket 42 are attached to the polishing table 3, and the chain 24 is connected to the polishing table 3 via these suspension brackets 41 and 42. In this state, as shown in FIG. 8, the lift arm 21 is raised by the winch 30 and the polishing table 3 is pulled up. Next, as shown in FIG. 9, the handle 22 attached to the tip of the lift arm 21 is grasped, and the lift arm 21 is contracted by pulling forward, and the polishing table 3 is moved in the horizontal direction toward the table base 14. . The horizontal movement of the polishing table 3 is performed until the entire polishing table 3 is taken out from the polishing apparatus 1 and the peripheral edge of the polishing table 3 comes into contact with the claws 51b of the table base 14 as shown in FIG. Is called.

  As shown in FIG. 11, the chain 24 is removed from the polishing table 3 and the lift arm 21, whereby the polishing table 3 is placed on the table mounting surface 51 a (see FIG. 5) of the table base 14. In order to fix the polishing table 3 to the table base 14, the polishing table 3 is tied to the table base 14 with a belt 75. Then, as shown in FIG. 12, the handle 15 a of the power jack 15 is turned, and the table base 14 is tilted together with the polishing table 3 until the lower surface of the table base 14 comes into contact with the lower arm stopper 65. The inclined polishing table 3 is supported by the claw 51 b so that the polishing table 3 does not slide off the table base 14.

  As shown in FIG. 13, the bolts (not shown) are removed to release the connecting portions 71 and 72 from the frames 1 a and 1 b of the polishing apparatus 1, thereby polishing the polishing table exchange apparatus 10 on which the polishing table 3 is mounted. Disconnect from device 1. The polishing table exchanging device 10 provided with the roller 69 as a moving mechanism can be moved to a desired place. As can be seen from FIG. 13, the tilted polishing table 3 is accommodated in the housing 18 of the polishing table changer 10. Therefore, if the polishing table changer 10 is used, the polishing table 3 can be exchanged in a narrow maintenance space, and the polishing table 3 can be transported in a narrow maintenance space. When a new polishing table 3 is carried into the polishing apparatus 1, a series of steps shown in FIGS. 6 to 13 may be performed in the reverse flow.

  The embodiment described above is described for the purpose of enabling the person having ordinary knowledge in the technical field to which the present invention belongs to implement the present invention. Various modifications of the above embodiment can be naturally made by those skilled in the art, and the technical idea of the present invention can be applied to other embodiments. Accordingly, the present invention is not limited to the described embodiments, but is to be construed in the widest scope according to the technical idea defined by the claims.

1 Polishing equipment (CMP equipment)
2 Polishing pad 3 Polishing table 4 Polishing head 5 Polishing liquid supply nozzle 6 Table motor 7 Head shaft 10 Polishing table changer 12 Crane 14 Table base 15 Power jack (table base tilting mechanism)
16 Vertical frame 17 Horizontal frame 18 Case 21 Lift arm 22 Handle 23 Arm lock mechanism 24 Chain (table support)
26 Arm holder 27 Bracket 30 Winch (vertical movement device)
33 Linear guide 41 First hanging bracket 42 Second hanging bracket 44, 45, 46 Connecting ring (eye bolt)
48 Mounting portion 51 Support arm 51a Table placement surface 51b Claw 52 Connecting arm 54 Arm shaft 57 Support frame 61 Locking member 64 Arm stopper (upper arm stopper)
65 Arm stopper (lower arm stopper)
67 Base frame 69 Roller 71, 72 Connecting part 75 Belt

Claims (5)

A polishing table exchange device for removing the polishing table from the polishing device,
A crane for moving the polishing table vertically and horizontally;
A table base on which the polishing table is placed;
A polishing table exchanging apparatus comprising a table table tilting mechanism for tilting the table table.   The polishing table exchange device according to claim 1, further comprising a moving mechanism that enables movement of the entire polishing table exchange device.   The polishing table exchanging apparatus according to claim 1, further comprising a connecting portion connected to the polishing apparatus.   The crane includes a lift arm that is extendable in the horizontal direction, a table support that is attached to a tip of the lift arm, and that supports the polishing table, and a vertical movement device that moves the lift arm up and down. The polishing table exchange device according to any one of claims 1 to 3, wherein Raise the polishing table,
Moving the raised polishing table in the horizontal direction to remove the polishing table from the polishing apparatus;
Place the polishing table on a table base,
A method for removing a polishing table, wherein the table table is inclined together with the polishing table.

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