JP6006875B2 - 小型流体分析デバイスおよび製造方法 - Google Patents
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Description
シリコン基板201を提供する工程、酸化マスク202を提供する工程、酸化マスク202をパターニングして酸化マスク202中に微細な構造を形成する工程、を含む微細な構造203を提供する工程と、
酸化物202を保護するために保護層204を提供する工程と、
粗い構造205のリソグラフィを行う工程と、
粗い構造205のエッチングを行う工程と、
粗い構造205を保護するために酸化物206を成長する工程であって、微細な構造203の上の保護層204は酸化物の成長を妨げる工程と、
保護層204を除去し、微細な構造203をエッチングする工程と、
酸化物206を除去する工程と、
を行うことにより作製されても良い。
Claims (16)
- 流体サンプルを分析するためのデバイス(100)であって、このデバイスは、
マイクロ流体素子(102)を通って、毛細管力により、前記流体サンプルが伝達されるように設計された、流体基板(101)中に設けられた前記マイクロ流体素子(102)、および前記マイクロ流体素子(102)に流体チャネルを介して接続された前記流体サンプルを提供する手段、を含む前記流体基板(101)と、
前記流体基板(101)に取り付けられ、少なくとも部分的に前記流体基板(101)を覆い、少なくとも部分的に前記マイクロ流体素子(102)を閉じる蓋(103)と、を含み、
前記流体基板(101)はシリコン流体基板であり、前記蓋(103)はCMOSチップであり、
前記マイクロ流体素子(102)は、マイクロピラー(207)を含み、
前記流体サンプルが前記マイクロ流体素子(102)中に存在する場合、前記蓋(103)の少なくとも一部は前記流体サンプルに接触するデバイス(100)。 - 前記蓋(103)は、トランジスタ層を含み、トランジスタ層は、少なくとも1つの電気部品と電気的に接続され、電気部品は以下に示す:生物学的感知回路、検出目的の電極、流体取り扱い目的の電極、データ通信目的の回路、無線データ通信目的の回路、温度センサ、温度コントロールのためのヒータ電極、流体センサおよび流体粘性コントロールのための電極、の少なくとも1つである請求項1に記載のデバイス(100)。
- 前記流体サンプルを提供する手段は、シリコンから形成され、前記マイクロ流体素子(102)に接続された内部流体チャネル(105)を含む集積された針(104)であり、前記針(104)は、前記流体基板(101)の突出部分であり、皮膚組織に向かって押しつけた場合に、皮膚組織を突き抜けるように配置される請求項1または2に記載のデバイス(100)。
- 前記流体基板(101)は、切り欠き(106)を含み、前記切り欠き(106)中に前記針(104)が配置される請求項3に記載のデバイス(100)。
- 前記流体基板(104)は、取り外し可能なように前記流体基板(101)に取り付けられた、前記針(104)を保護するための保護構造(107)を含む請求項3に記載のデバイス(100)。
- 前記流体サンプルを提供する手段は、注入口(109)である請求項1または2に記載のデバイス(100)。
- 前記流体基板(101)は、更に、前記流体サンプルが前記デバイス(100)中に存在する場合に、前記流体サンプルの光学的励起と検出を可能にする少なくとも1つの光導波路を含む請求項1〜6のいずれかに記載のデバイス(100)。
- 前記流体基板(101)または前記蓋(103)は、前記マイクロ流体素子(102)の少なくとも1つの領域または前記蓋(103)の少なくとも1つの領域に、生化学的試薬を適用するための少なくとも1つのスルーホールを含む請求項1〜7のいずれかに記載のデバイス(100)。
- リソグラフィでパターニングされたポリマーを用いて、前記蓋(103)が前記流体基板(101)に接合される請求項1〜8のいずれかに記載のデバイス(100)。
- 更に、前記蓋(103)から電気信号を読み出すために前記蓋(103)に電気的に接続された金属コンタクトを含む請求項1〜9のいずれかに記載のデバイス(100)。
- 前記流体基板(101)および/または前記蓋(103)の少なくとも一部は透明材料から作製され、前記流体サンプルが前記マイクロ流体素子(102)中に存在する場合に、前記流体サンプルの光学検査を可能にする請求項1〜10のいずれかに記載のデバイス(100)。
- 前記デバイス(100)の形状は、携帯通信デバイスへの挿入を可能にする請求項1〜11のいずれかに記載のデバイス(100)。
- 流体サンプルを分析するためのデバイス(100)の製造方法であって、この方法は、
マイクロピラー(207)を含むマイクロ流体素子(102)と、前記マイクロ流体素子(102)に接続された流体チャネルとを含む流体基板(101)を提供する工程と、
蓋(103)を提供する工程と、
少なくとも部分的に前記流体基板(101)を閉じるように、前記流体基板(101)を前記蓋(103)に取り付ける工程と、を含み、
前記流体基板(101)はシリコン流体基板で、前記蓋(103)はCMOSチップであり、
前記流体サンプルが前記マイクロ流体素子(102)中に存在する場合、前記蓋(103)の少なくとも一部は前記流体サンプルに接触するように、CMOS互換接合プロセスを用いて、前記流体基板(101)が前記蓋(103)に取り付けられる製造方法。 - 前記流体基板(101)を提供する工程は、
シリコン基板(201)を提供し、酸化マスク(202)を提供し、前記酸化マスクをパターニングして前記酸化マスク(202)中に微細構造(203)を形成する工程と、
前記酸化マスク(202)を保護するために保護層(204)を提供する工程と、
粗い構造(205)をパターニングする工程と、
前記粗い構造(205)をエッチングする工程と、
前記粗い構造(205)を保護するために酸化物(206)を成長させる工程と、
前記保護層(204)を除去して、前記微細構造(203)をエッチングする工程と、
前記酸化物(206)を除去する工程と、を含む請求項13に記載の方法。 - 前記流体基板と前記流体サンプルとの表面相互作用を修正するために、前記流体基板(101)と前記蓋(103)の表面は、部分的または完全に被覆される請求項13に記載の方法。
- 前記マイクロピラー(207)は、毛細流動の間に、前記流体サンプルの濾過、分離、調整、または混合を可能とすることを特徴とする請求項1〜12のいずれかに記載のデバイス(100)。
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