JP5903820B2 - Method for producing transparent conductive film and method for producing touch panel - Google Patents

Description

The present invention relates to a manufacturing method and a manufacturing method for a touch panel transparent conductive film, and more particularly a method for producing a transparent conductive film excellent in adhesion and durability of the polyester film substrate and the transparent conductive layer, And a method of manufacturing a touch panel including the transparent conductive film.

  In recent years, plastic products are good in terms of processability and weight reduction, and various products are being replaced from glass products to plastic products. However, since the surface of these plastic products is easily damaged, a hard coat layer is often provided on the surface or a film provided with a hard coat layer is used for the purpose of imparting surface hardness and scratch resistance.

  In addition, for conventional glass products, plastic films are increasingly being bonded to prevent scattering when broken, and a hard coat layer is formed on the surface of these films in order to strengthen their hardness. In particular, it is used for display devices such as LCD, PDP, FED, and EL, and the outermost surface of touch panels and the like.

  Moreover, a transparent conductive film is obtained by forming the multilayer film which consists of transparent thin films, such as a metal oxide, on a transparent base material. Conventionally, a method of forming these multilayer films by a dry coating method such as a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method has been proposed.

  The transparent conductive film is required to have high durability at the same time, one of which is improved adhesion of each layer. In particular, a decrease in the adhesion of each layer due to a durability test under a high temperature and high humidity environment is a serious issue that directly leads to aged deterioration and mechanical durability when used as a touch panel. Adhesion is required.

  Therefore, for the purpose of improving the adhesion between the substrate and the vapor deposition surface, an anchor coat layer made of a silane coupling agent is laminated on the substrate surface, or an adhesive layer made of an isocyanate compound and a sealant layer are laminated. Although the technique (patent document 1) etc. to make are proposed, since all raise a product cost, it is unpreferable. For this reason, a polyester film having good adhesion to the transparent conductive layer is required.

JP 2011-046058 A

  In view of the above problems, the present invention provides a transparent conductive film having improved adhesion and durability between a polyester film substrate and a transparent conductive layer, and a touch panel provided with the transparent conductive film. Objective.

  The inventors of the present invention have made extensive studies on the above problems and found that the above problems can be solved by using the means described below.

That is, the manufacturing method of the transparent conductive film according to the present invention, on a polyester film substrate, and the hard coat layer comprises at least a transparent conductive layer made of metal oxide, the residual stress of the transparent conductive layer is 10 N / a method for producing a transparent conductive film is m ² or less, a step of 1 hour after standing film longitudinal direction of the heat shrinkage ratio under 0.99 ° C. environment to prepare 0.5% greater than polyester film substrate Without applying heat treatment to the polyester film base material, a coating liquid containing a photocurable resin is applied to at least one surface of the polyester film base material, and the coating liquid is irradiated with light. forming a coating layer, the polyester film substrate hard coat layer is formed, a step of heat treatment 60 to 180 seconds at 120 to 180 ° C., hard coat A metal oxide is deposited on the first layer by sputtering at a deposition pressure of 1 to 12 Pa, and the formed film is crystallized by heat treatment at 130 to 150 ° C., thereby laminating a transparent conductive layer. A polyester film base material on which a hard coat layer before being laminated with a transparent conductive layer is formed, and the thermal contraction rate in the longitudinal direction of the film after being left for 1 hour in an environment of 150 ° C. It is characterized by being adjusted to 0.5% or less by heat treatment after the hard coat layer is formed.

Moreover, in the manufacturing method of the transparent conductive film concerning this invention, it is preferable that the optical adjustment layer which consists of an inorganic compound is formed in the at least one surface of a polyester-type film base material.

Furthermore, the method of manufacturing the touch panel of the present invention, Ru and a step of manufacturing the touch panel by using a step of obtaining a transparent conductive film by the method described above, the resulting transparent conductive film.

  ADVANTAGE OF THE INVENTION According to this invention, the touchscreen provided with the transparent conductive film which improved the adhesiveness and durability of a polyester-type film base material and a transparent conductive layer, and this transparent conductive film can be provided.

Schematic sectional view showing an example of the configuration of the transparent conductive film of the present invention Schematic sectional view showing an example of the configuration of the touch panel of the present invention

  Hereinafter, the transparent conductive film of the present invention will be described. FIG. 1 is a schematic cross-sectional view showing an example of the configuration of the transparent conductive film of the present invention, in which a hard coat layer 2 is formed on one side of a polyester-based film substrate 1, and on the hard coat layer 2, The optical adjustment layer 3 and the transparent conductive layer 4 are sequentially laminated.

  In the present invention, the polyester film base material 1 on which the hard coat layer 2 before the transparent conductive layer 4 is laminated has a thermal contraction rate in the longitudinal direction of the film after being left for 1 hour in an environment of 150 ° C. 0.5% or less.

  The heat shrinkage rate in the present invention represents the rate of change of the dimension in the longitudinal direction of the film after leaving the polyester film substrate in an environment of 150 ° C. for 1 hour with respect to the dimension before leaving. is there.

  Since the heat treatment for crystallizing the transparent conductive layer is generally performed at 130 ° C. to 150 ° C., it is important that the heat shrinkage rate at 150 ° C. is a specific value.

  The thermal contraction rate of the polyester film base material 1 on which the hard coat layer 2 before the transparent conductive layer 4 is laminated in the present invention is 0.5% or less, preferably 0.3% or less. When the thermal shrinkage rate is larger than 0.5%, the polyester-based film substrate 1 is shrunk by heat treatment after the transparent conductive layer 4 is laminated or left in a high temperature environment, and between the transparent conductive layer 4 Distortion increases. If the strain between the polyester film substrate 1 and the transparent conductive layer 4 is large, the interlayer adhesion deteriorates, and the durability also deteriorates.

  As described above, the heat shrinkage rate of the polyester film base material 1 on which the hard coat layer 2 is formed in the present invention indicates the heat shrinkage rate before the transparent conductive layer 4 is laminated. Even when the thermal contraction rate of the polyester film substrate 1 exceeds 0.5% when the coat layer 2 is formed, it may be 0.5% or less before the transparent conductive layer 4 is laminated. For example, after forming the hard coat layer 2 on at least one surface of the polyester-based film substrate 1, heat treatment is performed, and after adjusting the heat shrinkage rate to 0.5% or less, the transparent conductive layer 4 is laminated. However, it is preferable from the viewpoint of suppressing a decrease in interlayer adhesion due to heat treatment after the transparent conductive layer 4 is laminated or being left in a high temperature environment.

  When the heat treatment is performed on the polyester film substrate 1 having the hard coat layer 2 formed on at least one surface thereof, the heat treatment conditions are not particularly limited, but for example, at about 120 to 180 ° C. for about 60 to 180 seconds. It is preferable that

  In the present invention, the polyester film substrate 1 may be a polyester film such as a polyethylene terephthalate film or a polyethylene naphthalate film as long as the effects of the present invention are not impaired. In addition, various known additives such as lubricants, pigments, antioxidants, antistatic agents and the like may be added to the polyester-based film substrate 1 within a range that does not impair the effects of the present invention.

  The said polyester-type film base material 1 can be manufactured by a well-known film forming method. Examples of the film forming method include a method in which a biaxial stretching method such as a simultaneous biaxial stretching method or a sequential biaxial stretching method is performed, followed by a heat setting treatment. For example, as the sequential biaxial stretching method, in addition to the method of sequentially performing longitudinal stretching and lateral stretching or lateral stretching and longitudinal stretching, transverse-longitudinal-longitudinal stretching method, longitudinal-transverse-longitudinal stretching method, longitudinal-longitudinal-lateral stretching A stretching method such as a method can be employed. Further, the simultaneous biaxial stretching method may be a conventional simultaneous biaxial stretching method, or simultaneous biaxial stretching in multiple stages.

  For example, the stretched film obtained by the biaxial stretching method may be subjected to heat treatment, and in this heat treatment, relaxation treatment may be performed as necessary. Further, by performing these heat treatment and relaxation treatment, a film having a heat shrinkage rate in the film longitudinal direction at 150 ° C. of 0.5% or less can be obtained.

  In order to impart mechanical strength to the transparent conductive film of the present invention, a hard coat layer 2 is formed on at least one surface of the polyester film substrate 1.

  Although there is no limitation in particular in forming the hard-coat layer 2, It is preferable to use resin which has transparency, moderate hardness, and mechanical strength. Specifically, a photocurable resin composed of a monomer or a crosslinkable oligomer having a trifunctional or higher functional acrylate that can be expected to be three-dimensionally crosslinked as a main component is preferable.

  Examples of trifunctional or higher acrylates include trimethylolpropane triacrylate, isocyanuric acid EO-modified triacrylate, pentaerythritol triacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate. Ditrimethylolpropane tetraacrylate, pentaerythritol tetraacrylate, polyester acrylate and the like are preferable. Of these, isocyanuric acid EO-modified triacrylate and polyester acrylate are particularly preferable. These may be used alone or in combination of two or more. In addition to these tri- or higher functional acrylates, so-called acrylic resins such as epoxy acrylate, urethane acrylate, polyol acrylate and the like can be used in combination.

  As the crosslinkable oligomer, acrylic oligomers such as polyester (meth) acrylate, polyether (meth) acrylate, polyurethane (meth) acrylate, epoxy (meth) acrylate, and silicone (meth) acrylate are preferable. Specific examples include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, bisphenol A type epoxy acrylate, polyurethane diacrylate, cresol novolac type epoxy (meth) acrylate, and the like.

  Moreover, when forming the hard-coat layer 2, you may add other additives, such as particle | grains and a photoinitiator, to the said resin.

  Examples of the particles to be added include organic or inorganic particles, but considering the transparency of the hard coat layer 2, it is preferable to use organic particles. Examples of the organic particles include particles made of acrylic resin, polystyrene resin, polyester resin, polyolefin resin, polyamide resin, polycarbonate resin, polyurethane resin, silicone resin, fluorine resin, and the like.

  The average particle diameter of the particles varies depending on the thickness of the hard coat layer 2 but is preferably 2 μm or more, more preferably 5 μm or more, and preferably 30 μm or less, more preferably 15 μm or less, for reasons of appearance such as haze. It is. Further, for the same reason, the content of the particles is preferably 0.5 parts by weight or more and preferably 5 parts by weight or less with respect to 100 parts by weight of the resin.

  When a photopolymerization initiator is added, as a radical-generating photopolymerization initiator, for example, benzoin and its alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzylmethyl ketal, acetophenone, 2, Acetophenones such as 2-dimethoxy-2-phenylacetophenone and 1-hydroxycyclohexyl phenyl ketone, anthraquinones such as methylanthraquinone, 2-ethylanthraquinone and 2-amylanthraquinone, thioxanthone, 2,4-diethylthioxanthone, 2,4 -Thioxanthones such as diisopropylthioxanthone, ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal, benzophenone, 4,4-biphenyl Benzophenone such as methylamino benzophenone and azo compounds. These can be used alone or as a mixture of two or more. Further, it may be used in combination with a photoinitiator such as a tertiary amine such as triethanolamine or methyldiethanolamine, or a benzoic acid derivative such as 2-dimethylaminoethylbenzoic acid or ethyl 4-dimethylaminobenzoate. it can.

  The addition amount of the photopolymerization initiator is preferably 0.1 parts by weight or more and 5 parts by weight or less, more preferably 0.5 parts by weight or more and 3 parts by weight with respect to 100 parts by weight of the resin as the main component. Or less. When the addition amount of the photopolymerization initiator is less than the lower limit value, the hard coat layer 2 may be insufficiently cured. Moreover, when the addition amount of a photoinitiator exceeds an upper limit, yellowing may arise in the hard-coat layer 2, or there exists a possibility that a weather resistance may fall.

  When a photocurable resin is used as the resin, the light used for curing the photocurable resin is, for example, ultraviolet rays, electron beams, gamma rays, and the like. In the case of electron beams or gamma rays, a photopolymerization initiator or a photoinitiator aid is not necessarily used. May not be used. As these radiation sources, for example, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, acceleration electrons, or the like can be used.

  The formation method of the hard coat layer 2 is not particularly limited, and a resin or other additive as a main component is dissolved in a solvent, and the obtained coating liquid is, for example, a die coating method, a curtain flow coating method, a roll coating method, It is formed by applying on the polyester film substrate 1 by a known application method such as reverse roll coating, gravure coating, knife coating, bar coating, spin coating, or micro gravure coating. Can do.

  The solvent is not particularly limited as long as it can dissolve the main component resin and other additives. Specifically, as a solvent, for example, ethanol, isopropyl alcohol, isobutyl alcohol, benzene, toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, ethyl acetate, n-butyl acetate, isoamyl acetate, ethyl lactate, methyl cellosolve, ethyl cellosolve Butyl cellosolve, methyl cellosolve acetate, propylene glycol monomethyl ether acetate and the like. These may be used alone or in combination of two or more.

  Although the thickness of the hard-coat layer 2 formed on the polyester-type film base material 1 is not specifically limited, It is preferable that it is the range of 0.5 micrometer or more and 15 micrometers or less. Moreover, it is more preferable that the refractive index of the hard coat layer 2 is the same as or close to the refractive index of the polyester film substrate 1, and the refractive index is about 1.45 or more and 1.75 or less. It is preferable.

  The hard coat layer 2 only needs to be formed on at least one surface of the polyester film substrate 1, but may be formed on both surfaces of the polyester film substrate 1.

  In the transparent conductive film of the present invention, an optical adjustment layer made of an inorganic compound is preferably formed on at least one surface of the polyester film substrate. As shown in FIG. 1, the polyester film substrate 1 It is preferable that the hard coat layer 2 is formed thereon, and the optical adjustment layer 3 is laminated on the hard coat layer 2.

  The optical adjustment layer 3 has a function of adjusting the transmittance and hue of the transparent conductive film, and is a layer for improving visibility. When the optical adjustment layer 3 is made of an inorganic compound, for example, an inorganic compound such as an oxide, sulfide, fluoride, or nitride can be used. The optical adjustment layer 3 made of such an inorganic compound has a different refractive index depending on the material (type of compound), and the optical adjustment layer 3 having a different refractive index is formed with a specific film thickness, thereby providing optical characteristics. It becomes possible to adjust. Note that the optical adjustment layer is not limited to a single layer, and may be a plurality of layers according to the target optical characteristics.

  Examples of the inorganic compound having a low refractive index include magnesium oxide (1.6), silicon dioxide (1.5), magnesium fluoride (1.4), calcium fluoride (1.3 to 1.4), and fluoride. Examples include cerium (1.6) and aluminum fluoride (1.3). Examples of the inorganic compound having a high refractive index include titanium oxide (2.4), zirconium oxide (2.4), zinc sulfide (2.3), tantalum oxide (2.1), and zinc oxide (2.1 ), Indium oxide (2.0), niobium oxide (2.3), tantalum oxide (2.2), and the like. However, the numerical value in the parenthesis represents a refractive index.

  The optical adjustment layer 3 may be produced by any film forming method as long as the film thickness can be controlled, and the thin film dry coating method is particularly excellent. For this, a vacuum vapor deposition method, a physical vapor deposition method such as sputtering, or a chemical vapor deposition method such as a CVD method can be used. In particular, in order to form a thin film having a uniform film quality over a large area, a sputtering method in which the process is stable and the thin film becomes dense is preferable.

  The thickness of the optical adjustment layer 3 is not particularly limited, and may be specified together with the type of the inorganic compound to be used according to the target optical characteristics. For example, the thickness is preferably in the range of 10 nm to 100 nm.

  The transparent conductive film of the present invention comprises at least a transparent conductive layer made of a metal oxide on a polyester film substrate, and the transparent conductive layer is laminated on the hard coat layer, as shown in FIG. Further, a hard coat layer 2 is formed on the polyester film substrate 1, an optical adjustment layer 3 is laminated on the hard coat layer 2, and a transparent conductive layer 4 is further laminated on the optical adjustment layer 3. It is preferable.

  The transparent conductive layer 4 is made of a metal oxide, and as the metal oxide, any one of indium oxide, zinc oxide and tin oxide, or two or three of these mixed oxides, and other additives However, it is not particularly limited, and various materials can be used depending on the purpose and application. At present, the most reliable and proven material is indium tin oxide (ITO).

  When the indium tin oxide (ITO) is used as the material of the transparent conductive layer 4, the content ratio of tin oxide doped in indium oxide may be arbitrarily selected according to the specifications required for the device. In the case of the polyester-based film substrate 1, the material used for crystallizing the thin film for the purpose of increasing the mechanical strength preferably has a tin oxide content of less than 10% by weight. In order to give, it is preferable that the content rate of a tin oxide is 10 weight% or more. Moreover, when low resistance is calculated | required by a thin film, it is preferable that the content rate of a tin oxide is the range of 2-20 weight%.

  The manufacturing method of the transparent conductive layer 4 may be any film forming method as long as the film thickness can be controlled, similar to the manufacturing method of the optical adjustment layer 3, and the dry coating method of the thin film is particularly excellent. . For this, a vacuum vapor deposition method, a physical vapor deposition method such as sputtering, or a chemical vapor deposition method such as a CVD method can be used. In particular, in order to form a thin film having a uniform film quality over a large area, a sputtering method in which the process is stable and the thin film becomes dense is preferable.

In the present invention, the residual stress of the laminated transparent conductive layer 4 is preferably 10 N / m ² or less.

  The residual stress in the present invention is a stress due to the film of the transparent conductive layer 4 formed on the polyester film substrate 1, and the case where the polyester film substrate 1 warps with the film inside is pulled into the film. It is defined that there is a stress, and conversely, the case where the polyester-based film substrate 1 warps with the membrane facing outward is defined as having compressive stress in the membrane.

  For the measurement of the residual stress in the present invention, a thin film stress measuring device (FLX-2320-S manufactured by Toago Technology Co., Ltd.) is used. When a film is formed on a substrate such as a Si wafer, stress is generated and the substrate is deformed because the physical constants of the substrate and the thin film are different. Since the deformation due to the uniformly formed thin film appears as a warp of the substrate, the thin film stress measuring apparatus can measure the stress by the amount of change of the warp.

The residual stress of the laminated transparent conductive layer 4 is preferably 10 N / m ² or less, more preferably 5 N / m ² or less. When the residual stress is larger than 10 N / m ^2, the stress difference between the base material and the transparent conductive layer becomes large, the interlayer adhesion may be lowered, and the durability may be lowered.

  The residual stress of the transparent conductive layer 4 can be adjusted by the film forming pressure. For example, in the case where the transparent conductive layer 4 is formed by sputtering, the transparent conductive layer 4 having a desired residual stress can be formed by adjusting the film formation pressure during formation in the range of 1 to 12 Pa.

  The thickness of the transparent conductive layer 4 is not particularly limited, and may be appropriately adjusted according to the target characteristics. For example, it is preferably in the range of 10 nm or more and 50 nm or less.

  The transparent conductive film of this invention is excellent in the adhesiveness and durability of a polyester-type film base material and a transparent conductive layer, and can be used suitably as a structural member of a touch panel.

  The touch panel of the present invention includes the transparent conductive film of the present invention. There are various types of touch panels using a transparent conductive film, such as a resistive film type that specifies a touch position by contacting upper and lower electrodes, and a capacitive coupling type that senses a change in capacitance. However, the touch panel of the present invention is not particularly limited.

  The configuration of the touch panel of the present invention is not particularly limited as long as it includes the transparent conductive film of the present invention. FIG. 2 is a schematic cross-sectional view showing an example of the configuration of the touch panel of the present invention. For example, a transparent conductive film 12 is formed on a substrate 11 such as glass, and the transparent conductive film 12 is formed on the transparent conductive film 12 via a spacer 13. The transparent conductive layer 4 of the transparent conductive film 10 of the invention is disposed oppositely. The transparent conductive film 12 and the transparent conductive layer 4 are kept away from each other by the spacer 13. In this case, in the transparent conductive film 10 of the present invention, it is preferable that the hard coat layer 2 is formed on both surfaces of the polyester film substrate 1, and the hard coat layer 2 on which the optical adjustment layer 3 is not formed. The side is the front surface of the touch panel, and characters and the like can be input with the pen 14, for example.

  The usefulness of the present invention will be specifically described below with reference to examples and comparative examples. However, the present invention is not limited to these examples.

(Examples 1 to 3 and Comparative Example 1)
A polyethylene terephthalate film (Toyobo Co., Ltd., A4300-125) was used as the polyester film substrate. This polyethylene terephthalate film had a thermal shrinkage in the machine direction of 1.0% after being left for 1 hour in an environment of 150 ° C.

Subsequently, by a gravure coating method, a hard coat coating solution (composition: urethane acrylate (manufactured by Kyoeisha Chemical Co., Ltd., UA-510H) 100 parts by weight, an alkylphenone photopolymerization initiator ( 4 parts by weight of Ciba Specialty Chemicals, IRGACURE 907) and 100 parts by weight of ethyl acetate) were applied to one side of a polyethylene terephthalate film, dried, and irradiated with 400 mJ / cm ² of ultraviolet light with a metal halide lamp, and a hard coat layer was applied. Formed.

  Furthermore, the polyethylene terephthalate film on which the hard coat layer was formed was subjected to heat treatment in an oven (Examples 1 to 3). The heat treatment conditions are as shown in Table 1.

Subsequently, an optical adjustment layer and a transparent conductive layer were sequentially formed on the hard coat layer by forming a film by a DC magnetron sputtering method to obtain a transparent conductive film. At this time, silicon dioxide (SiO ₂ ) was used as the material for the optical adjustment layer, and ITO containing 10% by weight of tin oxide was used as the material for the transparent conductive layer. Moreover, the thickness of the optical adjustment layer was 50 nm, and the thickness of the transparent conductive layer was 20 nm. In addition, the film-forming pressure at the time of forming a transparent conductive layer is as showing in Table 1.

  The obtained transparent conductive film was evaluated by the following method. The results are shown in Table 1.

<Evaluation method>
(1) Thermal shrinkage rate Polyethylene terephthalate film with hard coat layer (Examples 1 to 3) subjected to heat treatment under the conditions shown in Table 1 or polyethylene terephthalate film with hard coat layer not subjected to heat treatment (Comparative Example 1) ), The film was marked at two places on the surface in the longitudinal direction, and the initial distance A was measured. Subsequently, the film was left in an oven at 150 ° C. for 1 hour. After 1 hour, the film was taken out of the oven, cooled to room temperature, and the interval B after heating was measured. Using the obtained values of A and B, the thermal shrinkage rate was determined by the following formula.
Thermal shrinkage (%) = {(A−B) / A} × 100

(2) Residual stress Using a thin-film stress measurement device (FLX-2320-S, manufactured by Toago Technology Co., Ltd.), the stress was measured by the amount of change in the warp of the transparent conductive film, and the residual of the formed transparent conductive layer The stress was determined.

(3) Adhesion After the transparent conductive layer surface of the transparent conductive film is cut in a grid pattern so that one square is 10 squares × 10 squares = 100 squares with 1 mm square, an adhesive tape ( A peel test was performed using Nichiban Co., Ltd., industrial 24 mm wide cello tape (registered trademark), and the adhesion was evaluated by the residual rate in 100 squares. Table 1 shows x / 100 as the number of cells remaining without peeling in 100 cells.

(4) Adhesiveness after light resistance test The transparent conductive film was subjected to a light resistance test according to the following outline, and the adhesiveness after the test was evaluated in the same manner as the peel test of (3) above.
(Light test outline)
Equipment used: ATLAS Xenon Weatherometer Ci4000
(Made by Toyo Seiki Seisakusho)
Illuminance: 1.2 W / m ² (420 nm)
Black standard panel temperature: 40 ℃
Tank temperature: 20 ° C
Humidity in the tank: 50% RH
Test time: 200 hours

  As shown in Table 1, in the transparent conductive films of Examples 1 to 3, the polyethylene terephthalate film on which the hard coat layer before the transparent conductive layer was laminated was heat-treated, and the environment at 150 ° C. Since the thermal shrinkage in the longitudinal direction of the film after standing for 1 hour is 0.5% or less, the adhesion after the light resistance test is remarkably improved as compared with the transparent conductive film of Comparative Example 1. I understand. Further, as in Example 3, it can be seen that by adjusting the film forming pressure during the formation of the transparent conductive layer, a transparent conductive film having a smaller residual stress and further improved interlayer adhesion can be obtained.

  The transparent conductive film obtained by the present invention can be suitably used for display devices such as LCD, PDP, FED, and EL, touch panels, and the like.

DESCRIPTION OF SYMBOLS 1 Polyester-type film base material 2 Hard-coat layer 3 Optical adjustment layer 4 Transparent conductive layer 10 Transparent conductive film

Claims (3)

On polyester film substrate, and the hard coat layer comprises at least a transparent conductive layer made of a metal oxide, met production method of the residual stress transparent conductive is 10 N / m ² or less of the transparent conductive layer film And
A step of preparing a polyester film substrate having a thermal shrinkage rate in the longitudinal direction of the film after standing for 1 hour in an environment of 150 ° C. is greater than 0.5%;
Applying a coating liquid containing a photocurable resin to at least one surface of the polyester-based film base without performing heat treatment on the polyester-based film base , and irradiating the coating liquid with light forming a hard coat layer in,
Heat-treating the polyester-based film substrate on which the hard coat layer is formed at 120 to 180 ° C. for 60 to 180 seconds;
On the hard coat layer, a metal oxide is formed at a film forming pressure of 1 to 12 Pa by sputtering, and the formed film is crystallized by heat treatment at 130 to 150 ° C., whereby the transparent conductive layer is formed. And laminating
The heat shrinkage ratio in the longitudinal direction of the film after standing for 1 hour in an environment of 150 ° C. of the polyester film base material on which the hard coat layer before the transparent conductive layer is formed is all hard coat layers. The manufacturing method of the transparent conductive film characterized by being adjusted to 0.5% or less by the heat processing after forming. The method for producing a transparent conductive film according to claim 1, further comprising a step of forming an optical adjustment layer made of an inorganic compound on at least one surface of the polyester film substrate. Obtaining a transparent conductive film by the production method according to claim 1 or 2 ,
The resulting transparent conductive film using a Ru and a step of manufacturing the touch panel, the touch panel manufacturing method.

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