JP5699990B2 - Method for producing organoxysilane compound having piperazinyl group and piperazine compound - Google Patents
Method for producing organoxysilane compound having piperazinyl group and piperazine compound Download PDFInfo
- Publication number
- JP5699990B2 JP5699990B2 JP2012134727A JP2012134727A JP5699990B2 JP 5699990 B2 JP5699990 B2 JP 5699990B2 JP 2012134727 A JP2012134727 A JP 2012134727A JP 2012134727 A JP2012134727 A JP 2012134727A JP 5699990 B2 JP5699990 B2 JP 5699990B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- piperazine
- formula
- organoxysilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- GLUUGHFHXGJENI-UHFFFAOYSA-N diethylenediamine Natural products C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 title claims description 64
- 150000001875 compounds Chemical class 0.000 title claims description 42
- -1 piperazine compound Chemical class 0.000 title claims description 28
- 125000004193 piperazinyl group Chemical group 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 19
- 150000002430 hydrocarbons Chemical class 0.000 claims description 16
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 14
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 238000006243 chemical reaction Methods 0.000 description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 239000002904 solvent Substances 0.000 description 20
- 238000004821 distillation Methods 0.000 description 17
- MBNZWTSAAPQLKH-UHFFFAOYSA-N [SiH3]N1CCNCC1 Chemical compound [SiH3]N1CCNCC1 MBNZWTSAAPQLKH-UHFFFAOYSA-N 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- LATGBXWIZRTLHS-UHFFFAOYSA-N piperazin-1-yl-tri(propan-2-yl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)N1CCNCC1 LATGBXWIZRTLHS-UHFFFAOYSA-N 0.000 description 8
- 238000005828 desilylation reaction Methods 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000002329 infrared spectrum Methods 0.000 description 6
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 6
- HXYMWKLNCJPAKW-UHFFFAOYSA-N trimethoxy(3-piperazin-1-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCN1CCNCC1 HXYMWKLNCJPAKW-UHFFFAOYSA-N 0.000 description 6
- 239000008096 xylene Substances 0.000 description 6
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 125000003277 amino group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 238000001819 mass spectrum Methods 0.000 description 4
- 229940098779 methanesulfonic acid Drugs 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- QZYRDEYZWLOYGR-UHFFFAOYSA-N triethyl(piperazin-1-yl)silane Chemical compound CC[Si](CC)(CC)N1CCNCC1 QZYRDEYZWLOYGR-UHFFFAOYSA-N 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 3
- 239000003759 ester based solvent Substances 0.000 description 3
- 239000004210 ether based solvent Substances 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 2
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZGBCJPKJJYFDRX-UHFFFAOYSA-N C1CN(CCN1)[Si](C2=CC=CC=C2)(C3=CC=CC=C3)C4=CC=CC=C4 Chemical compound C1CN(CCN1)[Si](C2=CC=CC=C2)(C3=CC=CC=C3)C4=CC=CC=C4 ZGBCJPKJJYFDRX-UHFFFAOYSA-N 0.000 description 2
- FBMIHYCVCWQBHP-UHFFFAOYSA-N CC(C)(C)[Si](C(C)(C)C)(C(C)(C)C)N1CCNCC1 Chemical compound CC(C)(C)[Si](C(C)(C)C)(C(C)(C)C)N1CCNCC1 FBMIHYCVCWQBHP-UHFFFAOYSA-N 0.000 description 2
- UHFDOAWNRCWIIJ-UHFFFAOYSA-N CC1=CC=CC=C1[Si](C2=CC=CC=C2C)(C3=CC=CC=C3C)N4CCNCC4 Chemical compound CC1=CC=CC=C1[Si](C2=CC=CC=C2C)(C3=CC=CC=C3C)N4CCNCC4 UHFDOAWNRCWIIJ-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 125000006165 cyclic alkyl group Chemical group 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- 229940032330 sulfuric acid Drugs 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 2
- RYEPWWHOKXPLHZ-UHFFFAOYSA-N (1-decylpiperazin-2-yl)-dimethylsilane Chemical compound C(CCCCCCCCC)N1C(CNCC1)[SiH](C)C RYEPWWHOKXPLHZ-UHFFFAOYSA-N 0.000 description 1
- FCZISCSSXWYEHT-UHFFFAOYSA-N (1-hexylpiperazin-2-yl)-dimethylsilane Chemical compound C(CCCCC)N1C(CNCC1)[SiH](C)C FCZISCSSXWYEHT-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JMFBXUMHVSZUKY-UHFFFAOYSA-N 3-bromopropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCBr JMFBXUMHVSZUKY-UHFFFAOYSA-N 0.000 description 1
- GLISZRPOUBOZDL-UHFFFAOYSA-N 3-bromopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCBr GLISZRPOUBOZDL-UHFFFAOYSA-N 0.000 description 1
- QMCUBOARAQBLHB-UHFFFAOYSA-N 3-bromopropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCBr QMCUBOARAQBLHB-UHFFFAOYSA-N 0.000 description 1
- XVNYMEVFHNKMIA-UHFFFAOYSA-N 3-bromopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCBr XVNYMEVFHNKMIA-UHFFFAOYSA-N 0.000 description 1
- DVNITCIXECDQNF-UHFFFAOYSA-N 3-bromopropyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCCBr DVNITCIXECDQNF-UHFFFAOYSA-N 0.000 description 1
- DGVYQFHPUPYPBV-UHFFFAOYSA-N 3-bromopropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCBr DGVYQFHPUPYPBV-UHFFFAOYSA-N 0.000 description 1
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- IIFBEYQLKOBDQH-UHFFFAOYSA-N 3-chloropropyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCCCl IIFBEYQLKOBDQH-UHFFFAOYSA-N 0.000 description 1
- JTWDWVCNOLORBR-UHFFFAOYSA-N 3-chloropropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCCl JTWDWVCNOLORBR-UHFFFAOYSA-N 0.000 description 1
- NILZGRNPRBIQOG-UHFFFAOYSA-N 3-iodopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCI NILZGRNPRBIQOG-UHFFFAOYSA-N 0.000 description 1
- XHJPYQRUQOLHCE-UHFFFAOYSA-N 3-iodopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCI XHJPYQRUQOLHCE-UHFFFAOYSA-N 0.000 description 1
- PSLKPYBKBFFELQ-UHFFFAOYSA-N 3-iodopropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCI PSLKPYBKBFFELQ-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- NHVUIVDMKZNLEN-UHFFFAOYSA-N CC(CCN1CCNCC1)[SiH](OC)OC Chemical compound CC(CCN1CCNCC1)[SiH](OC)OC NHVUIVDMKZNLEN-UHFFFAOYSA-N 0.000 description 1
- MHXVODWBDJCUCQ-UHFFFAOYSA-N CCO[SiH](C(C)CCN1CCNCC1)OCC Chemical compound CCO[SiH](C(C)CCN1CCNCC1)OCC MHXVODWBDJCUCQ-UHFFFAOYSA-N 0.000 description 1
- RFPYJJDXKVHRBQ-UHFFFAOYSA-N CCO[SiH](C)CI Chemical compound CCO[SiH](C)CI RFPYJJDXKVHRBQ-UHFFFAOYSA-N 0.000 description 1
- QATFXWFJGLXYNH-UHFFFAOYSA-N CCO[SiH](CC1CNCCN1C)OCC Chemical compound CCO[SiH](CC1CNCCN1C)OCC QATFXWFJGLXYNH-UHFFFAOYSA-N 0.000 description 1
- MZLZWYCMYYCTDD-UHFFFAOYSA-N CN1CCNCC1C[SiH](OC)OC Chemical compound CN1CCNCC1C[SiH](OC)OC MZLZWYCMYYCTDD-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- SBSLQTZCZRAGDL-UHFFFAOYSA-N bromo-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Br)(C(C)C)C(C)C SBSLQTZCZRAGDL-UHFFFAOYSA-N 0.000 description 1
- QGHLTGVNDIVBDK-UHFFFAOYSA-N bromomethyl(triethoxy)silane Chemical compound CCO[Si](CBr)(OCC)OCC QGHLTGVNDIVBDK-UHFFFAOYSA-N 0.000 description 1
- SPQZWICZZVMTBO-UHFFFAOYSA-N bromomethyl(trimethoxy)silane Chemical compound CO[Si](CBr)(OC)OC SPQZWICZZVMTBO-UHFFFAOYSA-N 0.000 description 1
- AOIHZRBXZRWRBG-UHFFFAOYSA-N bromomethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(CBr)OCC AOIHZRBXZRWRBG-UHFFFAOYSA-N 0.000 description 1
- LRHAJOGWNWDFPH-UHFFFAOYSA-N bromomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CBr)OC LRHAJOGWNWDFPH-UHFFFAOYSA-N 0.000 description 1
- CNTRZROSTQPQPP-UHFFFAOYSA-N bromomethyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CBr CNTRZROSTQPQPP-UHFFFAOYSA-N 0.000 description 1
- SGEIZEOCYMDFJP-UHFFFAOYSA-N bromomethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CBr SGEIZEOCYMDFJP-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 description 1
- FPOSCXQHGOVVPD-UHFFFAOYSA-N chloromethyl(trimethoxy)silane Chemical compound CO[Si](CCl)(OC)OC FPOSCXQHGOVVPD-UHFFFAOYSA-N 0.000 description 1
- XGLLBUISUZEUMW-UHFFFAOYSA-N chloromethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(CCl)OCC XGLLBUISUZEUMW-UHFFFAOYSA-N 0.000 description 1
- ZXZMFKUGAPMMCJ-UHFFFAOYSA-N chloromethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CCl)OC ZXZMFKUGAPMMCJ-UHFFFAOYSA-N 0.000 description 1
- IGMQAYXTTRYCPZ-UHFFFAOYSA-N chloromethyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCl IGMQAYXTTRYCPZ-UHFFFAOYSA-N 0.000 description 1
- ZCSLOBFDVTWIBL-UHFFFAOYSA-N chloromethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCl ZCSLOBFDVTWIBL-UHFFFAOYSA-N 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CUYYRHJXVUTXTC-UHFFFAOYSA-N diethoxy-(3-iodopropyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CCCI CUYYRHJXVUTXTC-UHFFFAOYSA-N 0.000 description 1
- QQFCUZOKYOROTM-UHFFFAOYSA-N diethoxy-(iodomethyl)-methylsilane Chemical compound CCO[Si](C)(CI)OCC QQFCUZOKYOROTM-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- CDCKLMBMWGHNQE-UHFFFAOYSA-N ethoxy-(3-iodopropyl)-dimethylsilane Chemical compound CCO[Si](C)(C)CCCI CDCKLMBMWGHNQE-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- WWRSUSXZSPZJTA-UHFFFAOYSA-N iodomethyl(trimethoxy)silane Chemical compound CO[Si](CI)(OC)OC WWRSUSXZSPZJTA-UHFFFAOYSA-N 0.000 description 1
- FJPYMZLMTMLZFM-UHFFFAOYSA-N iodomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CI)OC FJPYMZLMTMLZFM-UHFFFAOYSA-N 0.000 description 1
- BZJCWVVDHBNPBN-UHFFFAOYSA-N iodomethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CI BZJCWVVDHBNPBN-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QIOYHIUHPGORLS-UHFFFAOYSA-N n,n-dimethyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN(C)C QIOYHIUHPGORLS-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- DOVSWWRKFANNHT-UHFFFAOYSA-N tri(butan-2-yl)-chlorosilane Chemical compound CCC(C)[Si](Cl)(C(C)CC)C(C)CC DOVSWWRKFANNHT-UHFFFAOYSA-N 0.000 description 1
- LRDFQYDEQSHCFN-UHFFFAOYSA-N tri(propan-2-yl)-(trifluoromethyl)silane Chemical compound CC(C)[Si](C(C)C)(C(C)C)C(F)(F)F LRDFQYDEQSHCFN-UHFFFAOYSA-N 0.000 description 1
- CEUOVFXKPHREFM-UHFFFAOYSA-N tricyclohexyl(piperazin-1-yl)silane Chemical compound C1CCC(CC1)[Si](C1CCCCC1)(C1CCCCC1)N1CCNCC1 CEUOVFXKPHREFM-UHFFFAOYSA-N 0.000 description 1
- BEMUQMBNEQEDRU-UHFFFAOYSA-N tricyclopentyl(piperazin-1-yl)silane Chemical compound C1CCC(C1)[Si](C1CCCC1)(C1CCCC1)N1CCNCC1 BEMUQMBNEQEDRU-UHFFFAOYSA-N 0.000 description 1
- MPPFOAIOEZRFPO-UHFFFAOYSA-N triethoxy(3-iodopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCI MPPFOAIOEZRFPO-UHFFFAOYSA-N 0.000 description 1
- CQERQNNEKFKVFU-UHFFFAOYSA-N triethoxy(3-piperazin-1-ylpropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN1CCNCC1 CQERQNNEKFKVFU-UHFFFAOYSA-N 0.000 description 1
- ALFJOLYGZMCHHC-UHFFFAOYSA-N triethoxy(iodomethyl)silane Chemical compound CCO[Si](CI)(OCC)OCC ALFJOLYGZMCHHC-UHFFFAOYSA-N 0.000 description 1
- IWZQQYBJUOJZHU-UHFFFAOYSA-N triethoxy-(2-methylpiperazin-1-yl)silane Chemical compound CCO[Si](OCC)(OCC)N1CCNCC1C IWZQQYBJUOJZHU-UHFFFAOYSA-N 0.000 description 1
- NUKNNYBZEVDMPB-UHFFFAOYSA-N trimethoxy(piperazin-1-ylmethyl)silane Chemical compound CO[Si](OC)(OC)CN1CCNCC1 NUKNNYBZEVDMPB-UHFFFAOYSA-N 0.000 description 1
- KJIIRNRRFVPFJZ-UHFFFAOYSA-N trimethyl(piperazin-1-yl)silane Chemical compound C[Si](C)(C)N1CCNCC1 KJIIRNRRFVPFJZ-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- MWHTTZHGWQATOD-UHFFFAOYSA-N tris(2-methylpropyl)-piperazin-1-ylsilane Chemical compound CC(C)C[Si](CC(C)C)(CC(C)C)N1CCNCC1 MWHTTZHGWQATOD-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Description
本発明は、樹脂添加剤、塗料添加剤、接着剤、シランカップリング剤、繊維処理剤、表面処理剤として有用なピペラジニル基を有するオルガノキシシラン化合物の製造方法及びピペラジン化合物に関する。 The present invention relates to a method for producing an organoxysilane compound having a piperazinyl group useful as a resin additive, a paint additive, an adhesive, a silane coupling agent, a fiber treatment agent, and a surface treatment agent, and a piperazine compound.
アミノ基を有するオルガノキシシラン化合物は、樹脂添加剤、塗料添加剤、接着剤、シランカップリング剤、繊維処理剤、表面処理剤として有用であり、このようなアミノ基を有するオルガノキシシラン化合物としては、アミノプロピルトリメトキシシラン等の1級アミノ基を有するオルガノキシシラン化合物や、N−フェニルアミノプロピルトリメトキシシラン等の2級アミノ基を有するオルガノキシシラン化合物、また、ジメチルアミノプロピルトリメトキシシラン等の3級アミノ基を有するオルガノキシシラン化合物等が知られている。 Organoxysilane compounds having amino groups are useful as resin additives, paint additives, adhesives, silane coupling agents, fiber treatment agents, surface treatment agents, and as such organoxysilane compounds having amino groups. Are organoxysilane compounds having a primary amino group such as aminopropyltrimethoxysilane, organoxysilane compounds having a secondary amino group such as N-phenylaminopropyltrimethoxysilane, and dimethylaminopropyltrimethoxysilane. An organoxysilane compound having a tertiary amino group such as is known.
上記アミノ基を有するオルガノキシシラン化合物の中でも、特許文献1(特開平4−214470号公報)記載のN−(3−メチルジメトキシシリル)ピペラジンのようなピペラジニル基を有するオルガノキシシラン化合物は、黄変せず、柔らかさを付与することができる繊維処理剤として有用であるとの記載がある。 Among the above-mentioned organoxysilane compounds having an amino group, an organoxysilane compound having a piperazinyl group such as N- (3-methyldimethoxysilyl) piperazine described in Patent Document 1 (JP-A-4-214470) is yellow. There is a description that it is useful as a fiber treatment agent that does not change and can impart softness.
しかしながら、特許文献1のように、一般にピペラジニル基を有するオルガノキシシラン化合物は、ピペラジンとハロアルキルオルガノキシシラン化合物との反応により製造できるが、ピペラジンは融点108℃、沸点144℃の固体であり、且つ有機溶媒に難溶であるため、反応後、蒸留精製を行った場合、ピペラジンが昇華、蒸留塔や留出ラインが閉塞する問題があり、工業的に製造を実施するのは困難である。
However, as in
また、ピペラジンはハロアルキルオルガノキシシラン化合物との反応点を2つ有しているため、目的とするピペラジニル基を有するオルガノキシシラン化合物の選択性を向上させるには大量のピペラジンを使用する必要があり、ピペラジン昇華、閉塞の問題がますます顕著に表れてしまう。 Also, since piperazine has two reactive sites with the haloalkylorganoxysilane compound, it is necessary to use a large amount of piperazine to improve the selectivity of the desired organoxysilane compound having a piperazinyl group. The problem of piperazine sublimation and blockage becomes more pronounced.
本発明は、上記事情に鑑みなされたもので、蒸留時、ピペラジンの閉塞等が起こらず、工業的に実施可能なピペラジニル基を有するオルガノキシシラン化合物の製造方法及びピペラジン化合物を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for producing an organoxysilane compound having a piperazinyl group and a piperazine compound that can be industrially implemented without causing blockage of piperazine during distillation. And
本発明者らは、上記目的を達成するため鋭意検討を重ねた結果、ハロアルキルオルガノキシシラン化合物と特定のシリル基で保護されたピペラジン化合物を反応させ、その後シリル化することにより、蒸留塔や留出ラインへのピペラジンの閉塞の問題が生じず、効率的にピペラジニル基を有するオルガノキシシラン化合物を製造できることを知見し、本発明を完成するに至った。 As a result of intensive investigations to achieve the above object, the present inventors have reacted a haloalkylorganoxyxysilane compound with a piperazine compound protected with a specific silyl group, and then silylated to produce a distillation column or distillation column. It has been found that an organoxysilane compound having a piperazinyl group can be efficiently produced without causing the problem of blockage of piperazine in the outlet line, and the present invention has been completed.
従って、本発明は、下記に示すピペラジニル基を有するオルガノキシシラン化合物の製造方法及びピペラジン化合物を提供する。
〔1〕
下記一般式(1)
で示されるオルガノキシシラン化合物と下記一般式(2)
で示されるシリル基で保護されたピペラジン化合物を反応させて、下記一般式(3)
で示されるシリル基で保護されたピペラジニル基を有するオルガノキシシラン化合物を得た後、この式(3)のオルガノキシシラン化合物を脱シリル化することを特徴とする、下記一般式(4)
で示されるピペラジニル基を有するオルガノキシシラン化合物の製造方法。
〔2〕
上記一般式(2)のR4、R5及びR6が炭素数3〜20の非置換又は置換の2級もしくは3級炭化水素基である〔1〕記載のピペラジニル基を有するオルガノキシシラン化合物の製造方法。
〔3〕
下記一般式(5)
で示されるシリル基で保護されたピペラジン化合物。
〔4〕
R7、R8及びR9が全てイソプロピル基であるか又は全てsec−ブチル基である〔3〕記載のシリル基で保護されたピペラジン化合物。
Therefore, this invention provides the manufacturing method and piperazine compound of the organoxysilane compound which has a piperazinyl group shown below.
[1]
The following general formula (1)
And the following general formula (2)
A piperazine compound protected with a silyl group represented by the following general formula (3):
The organoxysilane compound having a piperazinyl group protected with a silyl group represented by formula (3) is obtained, and then the organoxysilane compound represented by the formula (3) is desilylated.
The manufacturing method of the organoxysilane compound which has a piperazinyl group shown by these.
[2]
The organoxysilane compound having a piperazinyl group according to [1], wherein R 4 , R 5 and R 6 in the general formula (2) are unsubstituted or substituted secondary or tertiary hydrocarbon groups having 3 to 20 carbon atoms. Manufacturing method.
[3]
The following general formula (5)
A piperazine compound protected with a silyl group represented by the formula:
[4]
The piperazine compound protected with a silyl group according to [3], wherein R 7 , R 8 and R 9 are all isopropyl groups or all sec-butyl groups.
本発明の製造方法によれば、樹脂添加剤、塗料添加剤、接着剤、シランカップリング剤、繊維処理剤、表面処理剤として有用なピペラジニル基を有するオルガノキシシラン化合物を効率的に製造することができる。 According to the production method of the present invention, an organoxysilane compound having a piperazinyl group useful as a resin additive, a paint additive, an adhesive, a silane coupling agent, a fiber treatment agent, and a surface treatment agent is efficiently produced. Can do.
本発明のピペラジニル基を有するオルガノキシシラン化合物の製造方法は、下記一般式(1)
で示されるオルガノキシシラン化合物と下記一般式(2)
で示されるシリル基で保護されたピペラジン化合物を反応させて、下記一般式(3)
で示されるシリル基で保護されたピペラジニル基を有するオルガノキシシラン化合物を得た後、この式(3)のオルガノキシシラン化合物を脱シリル化し、下記一般式(4)
で示されるピペラジニル基を有するオルガノキシシラン化合物を得るものである。
The method for producing an organoxysilane compound having a piperazinyl group according to the present invention is represented by the following general formula (1).
And the following general formula (2)
A piperazine compound protected with a silyl group represented by the following general formula (3):
After obtaining an organoxysilane compound having a piperazinyl group protected by a silyl group represented by formula (3), the organoxysilane compound of the formula (3) is desilylated to give the following general formula (4)
The organoxysilane compound which has a piperazinyl group shown by these is obtained.
上記一般式(1)において、R1で示される炭素数1〜20の直鎖状又は分岐鎖状の2価炭化水素基としては、具体的には、メチレン基、ジメチレン基、トリメチレン基、テトラメチレン基、ヘキサメチレン基、オクタメチレン基、デカメチレン基、イソブチレン基等のアルキレン基、フェニレン基等のアリーレン基、メチレンフェニレン基、メチレンフェニレンメチレン基等のアラルキレン基が例示される。 In the general formula (1), as the linear or branched divalent hydrocarbon group having 1 to 20 carbon atoms represented by R 1 , specifically, a methylene group, a dimethylene group, a trimethylene group, tetra Examples thereof include alkylene groups such as a methylene group, hexamethylene group, octamethylene group, decamethylene group and isobutylene group, arylene groups such as a phenylene group, and aralkylene groups such as a methylenephenylene group and a methylenephenylenemethylene group.
R2及びR3は炭素数1〜20の非置換又は置換の1価炭化水素基であり、直鎖状、分岐鎖状又は環状のアルキル基、アルケニル基、アリール基、アラルキル基等が挙げられる。具体的には、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、デシル基、ドデシル基、テトラデシル基、ヘキサデシル基、オクタデシル基、イコシル基等の直鎖状のアルキル基、イソプロピル基、イソブチル基、sec−ブチル基、tert−ブチル基、テキシル基、2−エチルヘキシル基等の分岐鎖状のアルキル基、シクロペンチル基、シクロヘキシル基等の環状のアルキル基、ビニル基、アリル基、プロペニル基等のアルケニル基、フェニル基、トリル基等のアリール基、ベンジル基等のアラルキル基などが例示され、特にメチル基、エチル基が好ましい。また、炭化水素基の水素原子の一部又は全部が置換されていてもよく、該置換基としては、具体的には、例えば、メトキシ基、エトキシ基、(イソ)プロポキシ基等のアルコキシ基;フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;シアノ基;アミノ基;フェニル基、トリル基等の炭素数6〜18のアリール基;ベンジル基、フェネチル基等の炭素数7〜18のアラルキル基;炭素数2〜18のアシル基;アルキルシリル基;アルコキシシリル基が挙げられ、更にエステル基、エーテル基、スルフィド基等が介在していてもよく、これらを組み合わせて用いることもできる。 R 2 and R 3 are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 20 carbon atoms, and examples thereof include linear, branched or cyclic alkyl groups, alkenyl groups, aryl groups, and aralkyl groups. . Specifically, straight chain such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, dodecyl, tetradecyl, hexadecyl, octadecyl, icosyl, etc. -Like alkyl groups, isopropyl groups, isobutyl groups, sec-butyl groups, tert-butyl groups, texyl groups, 2-ethylhexyl groups and other branched alkyl groups, cyclopentyl groups, cyclohexyl groups and other cyclic alkyl groups, vinyl Group, an alkenyl group such as an allyl group and a propenyl group, an aryl group such as a phenyl group and a tolyl group, an aralkyl group such as a benzyl group and the like, and a methyl group and an ethyl group are particularly preferable. Moreover, a part or all of the hydrogen atoms of the hydrocarbon group may be substituted. Specific examples of the substituent include alkoxy groups such as a methoxy group, an ethoxy group, and an (iso) propoxy group; Halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; cyano group; amino group; aryl group having 6 to 18 carbon atoms such as phenyl group and tolyl group; 7 to 18 carbon atoms such as benzyl group and phenethyl group An aralkyl group; an acyl group having 2 to 18 carbon atoms; an alkylsilyl group; an alkoxysilyl group, and further an ester group, an ether group, a sulfide group, or the like may be interposed, and these may be used in combination. .
また、Xはハロゲン原子であり、具体的には塩素原子、臭素原子、ヨウ素原子が挙げられる。 X is a halogen atom, and specific examples include a chlorine atom, a bromine atom, and an iodine atom.
上記一般式(1)で示されるオルガノキシシラン化合物の具体例としてはクロロメチルトリメトキシシラン、クロロメチルメチルジメトキシシラン、クロロメチルジメチルメトキシシラン、クロロメチルトリエトキシシラン、クロロメチルメチルジエトキシシラン、クロロメチルジメチルエトキシシラン、ブロモメチルトリメトキシシラン、ブロモメチルメチルジメトキシシラン、ブロモメチルジメチルメトキシシラン、ブロモメチルトリエトキシシラン、ブロモメチルメチルジエトキシシラン、ブロモメチルジメチルエトキシシラン、ヨードメチルトリメトキシシラン、ヨードメチルメチルジメトキシシラン、ヨードメチルジメチルメトキシシラン、ヨードメチルトリエトキシシラン、ヨードメチルメチルジエトキシシラン、ヨードメチルジメチルエトキシシラン、3−クロロプロピルトリメトキシシラン、3−クロロプロピルメチルジメトキシシラン、3−クロロプロピルジメチルメトキシシラン、3−クロロプロピルトリエトキシシラン、3−クロロプロピルメチルジエトキシシラン、3−クロロプロピルジメチルエトキシシラン、3−ブロモプロピルトリメトキシシラン、3−ブロモプロピルメチルジメトキシシラン、3−ブロモプロピルジメチルメトキシシラン、3−ブロモプロピルトリエトキシシラン、3−ブロモプロピルメチルジエトキシシラン、3−ブロモプロピルジメチルエトキシシラン、3−ヨードプロピルトリメトキシシラン、3−ヨードプロピルメチルジメトキシシラン、3−ヨードプロピルジメチルメトキシシラン、3−ヨードプロピルトリエトキシシラン、3−ヨードプロピルメチルジエトキシシラン、3−ヨードプロピルジメチルエトキシシラン等が例示される。 Specific examples of the organoxysilane compound represented by the general formula (1) include chloromethyltrimethoxysilane, chloromethylmethyldimethoxysilane, chloromethyldimethylmethoxysilane, chloromethyltriethoxysilane, chloromethylmethyldiethoxysilane, chloro Methyldimethylethoxysilane, bromomethyltrimethoxysilane, bromomethylmethyldimethoxysilane, bromomethyldimethylmethoxysilane, bromomethyltriethoxysilane, bromomethylmethyldiethoxysilane, bromomethyldimethylethoxysilane, iodomethyltrimethoxysilane, iodomethyl Methyldimethoxysilane, iodomethyldimethylmethoxysilane, iodomethyltriethoxysilane, iodomethylmethyldiethoxysilane, iodomethyl Methylethoxysilane, 3-chloropropyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyldimethylmethoxysilane, 3-chloropropyltriethoxysilane, 3-chloropropylmethyldiethoxysilane, 3-chloropropyldimethyl Ethoxysilane, 3-bromopropyltrimethoxysilane, 3-bromopropylmethyldimethoxysilane, 3-bromopropyldimethylmethoxysilane, 3-bromopropyltriethoxysilane, 3-bromopropylmethyldiethoxysilane, 3-bromopropyldimethylethoxy Silane, 3-iodopropyltrimethoxysilane, 3-iodopropylmethyldimethoxysilane, 3-iodopropyldimethylmethoxysilane, 3-iodopropyltriethoxysilane Down, 3-iodo-propyl methyl diethoxy silane, 3-iodo-propyl dimethyl ethoxy silane, and the like.
上記一般式(2)中のR4、R5及びR6は、上記R1又はR2で例示した基と同様の置換基が挙げられ、特に炭素数3〜20の非置換又は置換の2級もしくは3級炭化水素基が好ましく、その中でもイソプロピル基、sec−ブチル基、シクロペンチル基、シクロヘキシル基、tert−ブチル基、テキシル基がより好ましい。一般式(1)で示されるオルガノキシシラン化合物と反応させる時に起こるシリル基の脱離反応(副反応)を抑制することができるためである。 R 4 , R 5, and R 6 in the general formula (2) include the same substituents as those exemplified for R 1 or R 2 , and are particularly unsubstituted or substituted 2 having 3 to 20 carbon atoms. A tertiary or tertiary hydrocarbon group is preferable, and among them, an isopropyl group, a sec-butyl group, a cyclopentyl group, a cyclohexyl group, a tert-butyl group, and a texyl group are more preferable. This is because the elimination reaction (side reaction) of the silyl group that occurs when reacting with the organoxysilane compound represented by the general formula (1) can be suppressed.
上記一般式(2)で示されるシリル基で保護されたピペラジン化合物の具体例としては、N−トリメチルシリルピペラジン、N−ヘキシルジメチルシリルピペラジン、N−デシルジメチルシリルピペラジン、N−トリエチルシリルピペラジン、N−トリイソブチルシリルピペラジン、N−t−ブチルジメチルシリルピペラジン、N−t−ブチルジフェニルシリルピペラジン、N−トリイソプロピルシリルピペラジン、N−トリ(sec−ブチル)シリルピペラジン、N−トリシクロペンチルシリルピペラジン、N−トリシクロヘキシルシリルピペラジン、N−トリフェニルシリルピペラジン、N−トリトリルシリルピペラジン、N−トリt−ブチルシリルピペラジン、N−t−ブチルジイソプロピルシリルピペラジン、N−t−ブチルジ(sec−ブチル)シリルピペラジン、N−t−ブチルジシクロペンチルシリルピペラジン、N−t−ブチルジシクロヘキシルシリルピペラジン、N−テキシルジイソプロピルシリルピペラジン、N−テキシルジ(sec−ブチル)シリルピペラジン、N−テキシルジシクロペンチルシリルピペラジン、N−テキシルジシクロヘキシルシリルピペラジン等が例示され、特にN−トリイソプロピルシリルピペラジン、N−トリ(sec−ブチル)シリルピペラジン、N−トリシクロペンチルシリルピペラジン、N−トリシクロヘキシルシリルピペラジン、N−トリフェニルシリルピペラジン、N−トリトリルシリルピペラジン、N−トリt−ブチルシリルピペラジン、N−t−ブチルジイソプロピルシリルピペラジン、N−t−ブチルジ(sec−ブチル)シリルピペラジン、N−t−ブチルジシクロペンチルシリルピペラジン、N−t−ブチルジシクロヘキシルシリルピペラジン、N−テキシルジイソプロピルシリルピペラジン、N−テキシルジ(sec−ブチル)シリルピペラジン、N−テキシルジシクロペンチルシリルピペラジン、N−テキシルジシクロヘキシルシリルピペラジンが好ましい。 Specific examples of the piperazine compound protected by the silyl group represented by the general formula (2) include N-trimethylsilylpiperazine, N-hexyldimethylsilylpiperazine, N-decyldimethylsilylpiperazine, N-triethylsilylpiperazine, N- Triisobutylsilylpiperazine, Nt-butyldimethylsilylpiperazine, Nt-butyldiphenylsilylpiperazine, N-triisopropylsilylpiperazine, N-tri (sec-butyl) silylpiperazine, N-tricyclopentylsilylpiperazine, N- Tricyclohexylsilylpiperazine, N-triphenylsilylpiperazine, N-tritolylsilylpiperazine, N-trit-butylsilylpiperazine, Nt-butyldiisopropylsilylpiperazine, Nt-butyldi (s c-butyl) silylpiperazine, Nt-butyldicyclopentylsilylpiperazine, Nt-butyldicyclohexylsilylpiperazine, N-texyldiisopropylsilylpiperazine, N-texyldi (sec-butyl) silylpiperazine, N-texyldicyclopentyl Examples include silyl piperazine, N-texyl dicyclohexyl silyl piperazine and the like, in particular, N-triisopropylsilyl piperazine, N-tri (sec-butyl) silyl piperazine, N-tricyclopentyl silyl piperazine, N-tricyclohexyl silyl piperazine, N- Triphenylsilylpiperazine, N-tritolylsilylpiperazine, N-trit-butylsilylpiperazine, Nt-butyldiisopropylsilylpiperazine, Nt-butyldi (sec- Cyl) silylpiperazine, Nt-butyldicyclopentylsilylpiperazine, Nt-butyldicyclohexylsilylpiperazine, N-texyldiisopropylsilylpiperazine, N-texyldi (sec-butyl) silylpiperazine, N-texyldicyclopentylsilylpiperazine N-Texyldicyclohexylsilylpiperazine is preferred.
上記一般式(1)で示されるオルガノキシシラン化合物と上記一般式(2)で示されるシリル基で保護されたピペラジン化合物の配合比は特に限定されないが、反応性、生産性の点から、一般式(1)で示されるオルガノキシシラン化合物1モルに対し、一般式(2)で示されるシリル基で保護されたピペラジン化合物を0.2〜4モル、特に0.5〜2モルの範囲が好ましい。 The compounding ratio of the organoxysilane compound represented by the general formula (1) and the piperazine compound protected by the silyl group represented by the general formula (2) is not particularly limited, but in terms of reactivity and productivity, The amount of the piperazine compound protected by the silyl group represented by the general formula (2) is 0.2 to 4 moles, particularly 0.5 to 2 moles per mole of the organoxysilane compound represented by the formula (1). preferable.
上記反応の反応温度は特に限定されないが、0〜200℃、特に20〜150℃が好ましく、反応時間も特に限定されないが、1〜40時間、特に1〜20時間が好ましい。反応雰囲気は、窒素、アルゴン等の不活性ガス雰囲気とすることが好ましい。 Although the reaction temperature of the said reaction is not specifically limited, 0-200 degreeC, especially 20-150 degreeC is preferable, Reaction time is not specifically limited, However, 1-40 hours, Especially 1-20 hours are preferable. The reaction atmosphere is preferably an inert gas atmosphere such as nitrogen or argon.
なお、上記反応は無溶媒でも進行するが、溶媒を用いることもできる。用いられる溶媒としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のエステル系溶媒、アセトニトリル、N,N−ジメチルホルムアミド、N−メチルピロリドン等の非プロトン性極性溶媒、ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒等が例示される。これらの溶媒は1種を単独で使用してもよく、あるいは2種以上を混合して使用してもよい。 In addition, although the said reaction advances even without a solvent, a solvent can also be used. Solvents used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene, ether solvents such as diethyl ether, tetrahydrofuran and dioxane, and ester solvents such as ethyl acetate and butyl acetate. And aprotic polar solvents such as acetonitrile, N, N-dimethylformamide and N-methylpyrrolidone, and chlorinated hydrocarbon solvents such as dichloromethane and chloroform. These solvents may be used alone or in combination of two or more.
また、脱シリル化は、活性プロトンを有する化合物と反応させることにより実施される。
用いられる活性プロトンを有する化合物としては、メタノール、エタノール、1−プロパノール、2−プロパノール、エチレングリコール等のアルコール化合物、フェノール、クレゾール等のフェノール化合物、酢酸、プロピオン酸等のカルボン酸化合物が例示される。
Desilylation is carried out by reacting with a compound having an active proton.
Examples of the compound having an active proton used include alcohol compounds such as methanol, ethanol, 1-propanol, 2-propanol and ethylene glycol, phenol compounds such as phenol and cresol, and carboxylic acid compounds such as acetic acid and propionic acid. .
用いられる活性プロトンを有する化合物の使用量は特に限定されないが、上記一般式(2)で示されるシリル基で保護されたピペラジン化合物1モルに対し、活性プロトンを有する化合物を0.2〜10モル、特に0.5〜5モルの範囲が好ましい。 The amount of the compound having an active proton to be used is not particularly limited, but 0.2 to 10 mol of the compound having an active proton is used per 1 mol of the piperazine compound protected by the silyl group represented by the general formula (2). In particular, the range of 0.5 to 5 mol is preferable.
脱シリル化反応の温度は0〜200℃とすることができ、反応時間は通常1〜40時間である。反応雰囲気は、窒素、アルゴン等の不活性ガス雰囲気とすることが好ましい。 The temperature of desilylation reaction can be 0-200 degreeC, and reaction time is 1 to 40 hours normally. The reaction atmosphere is preferably an inert gas atmosphere such as nitrogen or argon.
脱シリル化は無触媒でも進行するが、反応速度を向上させる目的で触媒を用いることもできる。用いられる触媒としては、硫酸、メタンスルホン酸、ベンゼンスルホン酸、トルエンスルホン酸、ドデシルベンゼンスルホン酸、トリフルオロメタンスルホン酸等のスルホン酸化合物、塩酸、硝酸、及び上記酸の塩が例示される。 The desilylation proceeds even without a catalyst, but a catalyst can be used for the purpose of improving the reaction rate. Examples of the catalyst used include sulfuric acid, methanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, dodecylbenzenesulfonic acid, sulfonic acid compounds such as trifluoromethanesulfonic acid, hydrochloric acid, nitric acid, and salts of the above acids.
触媒の使用量は特に限定されないが、反応性、生産性の点から、上記一般式(1)で示されるシリル基で保護されたピペラジン化合物1モルに対し0.0001〜0.1モル、特に0.001〜0.05モルの範囲が好ましい。 The amount of the catalyst used is not particularly limited, but from the viewpoint of reactivity and productivity, 0.0001 to 0.1 mol, in particular, per 1 mol of the piperazine compound protected by the silyl group represented by the general formula (1). A range of 0.001 to 0.05 mol is preferred.
なお、上記反応は無溶媒でも進行するが、溶媒を用いることもできる。用いられる溶媒としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のエステル系溶媒、アセトニトリル、N,N−ジメチルホルムアミド、N−メチルピロリドン等の非プロトン性極性溶媒、ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒等が例示される。これらの溶媒は1種を単独で使用してもよく、あるいは2種以上を混合して使用してもよい。 In addition, although the said reaction advances even without a solvent, a solvent can also be used. Solvents used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene, ether solvents such as diethyl ether, tetrahydrofuran and dioxane, and ester solvents such as ethyl acetate and butyl acetate. And aprotic polar solvents such as acetonitrile, N, N-dimethylformamide and N-methylpyrrolidone, and chlorinated hydrocarbon solvents such as dichloromethane and chloroform. These solvents may be used alone or in combination of two or more.
上記脱シリル化反応により、上記一般式(4)で示されるピペラジニル基を有するオルガノキシシラン化合物が得られる。上記一般式(4)で示されるピペラジニル基を有するオルガノキシシラン化合物としては、具体的にはN−トリメトキシシリルメチルピペラジン、N−メチルジメトキシシリルメチルピペラジン、N−ジメチルメトキシシリルメチルピペラジン、N−トリエトキシシリルメチルピペラジン、N−メチルジエトキシシリルメチルピペラジン、N−ジメチルエトキシシリルメチルピペラジン、N−(3−トリメトキシシリルプロピル)ピペラジン、N−(3−メチルジメトキシシリルプロピル)ピペラジン、N−(3−ジメチルメトキシシリルプロピル)ピペラジン、N−(3−トリエトキシシリルプロピル)ピペラジン、N−(3−メチルジエトキシシリルプロピル)ピペラジン、N−(3−ジメチルエトキシシリルプロピル)ピペラジン等が例示される。 By the desilylation reaction, an organoxysilane compound having a piperazinyl group represented by the general formula (4) is obtained. Specific examples of the organoxysilane compound having a piperazinyl group represented by the general formula (4) include N-trimethoxysilylmethylpiperazine, N-methyldimethoxysilylmethylpiperazine, N-dimethylmethoxysilylmethylpiperazine, N- Triethoxysilylmethylpiperazine, N-methyldiethoxysilylmethylpiperazine, N-dimethylethoxysilylmethylpiperazine, N- (3-trimethoxysilylpropyl) piperazine, N- (3-methyldimethoxysilylpropyl) piperazine, N- ( 3-dimethylmethoxysilylpropyl) piperazine, N- (3-triethoxysilylpropyl) piperazine, N- (3-methyldiethoxysilylpropyl) piperazine, N- (3-dimethylethoxysilylpropyl) piperazine, etc. It is shown.
また、本発明における上記一般式(5)で示されるシリル基で保護されたピペラジン化合物は、ピペラジンを例えばR7R8R9Si−基(式中、R7、R8及びR9は、上記と同様である。)を有するシリル化剤でシリル化することにより得られる。 In the present invention, the piperazine compound protected with the silyl group represented by the general formula (5) is prepared by converting piperazine into, for example, an R 7 R 8 R 9 Si— group (wherein R 7 , R 8 and R 9 are It is obtained by silylation with a silylating agent having the same as above.
用いられるシリル化剤としては、トリイソプロピルクロロシラン、トリイソプロピルブロモシラン、トリイソプロピルヨードシラン等のR1R2R3SiX(R1、R2及びR3は、上記と同様であり、Xは塩素原子等のハロゲン原子である。)で示されるトリオルガノハロシラン化合物、トリイソプロピルシリルトリフルオロメタンスルホン酸等のシリルトリフルオロメタンスルホン酸化合物が例示される。 The silylating agent used is R 1 R 2 R 3 SiX such as triisopropylchlorosilane, triisopropylbromosilane, triisopropyliodosilane (R 1 , R 2 and R 3 are the same as above, and X is chlorine And a silyl trifluoromethane sulfonic acid compound such as triisopropylsilyl trifluoromethane sulfonic acid.
ピペラジンとシリル化剤との配合比は特に限定されないが、反応性、生産性の点から、ピペラジン1モルに対し、シリル化剤を、シリル基のモル数で0.2〜4モル、特に0.5〜1.5モルの範囲が好ましい。 The compounding ratio of piperazine and silylating agent is not particularly limited. However, from the viewpoint of reactivity and productivity, the silylating agent is 0.2 to 4 mol, particularly 0 in terms of the number of moles of silyl group with respect to 1 mol of piperazine. The range of 0.5 to 1.5 mol is preferred.
上記反応の反応温度は特に限定されないが、0〜200℃、特に20〜150℃が好ましく、反応時間も特に限定されないが、1〜40時間、特に1〜20時間が好ましい。反応雰囲気は、窒素、アルゴン等の不活性ガス雰囲気とすることが好ましい。 Although the reaction temperature of the said reaction is not specifically limited, 0-200 degreeC, especially 20-150 degreeC is preferable, Reaction time is not specifically limited, However, 1-40 hours, Especially 1-20 hours are preferable. The reaction atmosphere is preferably an inert gas atmosphere such as nitrogen or argon.
なお、上記反応は無溶媒でも進行するが、溶媒を用いることもできる。用いられる溶媒としては、ペンタン、ヘキサン、シクロヘキサン、ヘプタン、イソオクタン、ベンゼン、トルエン、キシレン等の炭化水素系溶媒、ジエチルエーテル、テトラヒドロフラン、ジオキサン等のエーテル系溶媒、酢酸エチル、酢酸ブチル等のエステル系溶媒、アセトニトリル、N,N−ジメチルホルムアミド、N−メチルピロリドン等の非プロトン性極性溶媒、ジクロロメタン、クロロホルム等の塩素化炭化水素系溶媒等が例示される。これらの溶媒は1種を単独で使用してもよく、あるいは2種以上を混合して使用してもよい。 In addition, although the said reaction advances even without a solvent, a solvent can also be used. Solvents used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene and xylene, ether solvents such as diethyl ether, tetrahydrofuran and dioxane, and ester solvents such as ethyl acetate and butyl acetate. And aprotic polar solvents such as acetonitrile, N, N-dimethylformamide and N-methylpyrrolidone, and chlorinated hydrocarbon solvents such as dichloromethane and chloroform. These solvents may be used alone or in combination of two or more.
また、本反応において、反応速度を向上させる目的で触媒を用いることもできる。用いられる触媒としては、硫酸、メタンスルホン酸、ベンゼンスルホン酸、トルエンスルホン酸、ドデシルベンゼンスルホン酸、トリフルオロメタンスルホン酸等のスルホン酸化合物、塩酸、硝酸及び上記酸の塩が例示される。 In this reaction, a catalyst can also be used for the purpose of improving the reaction rate. Examples of the catalyst used include sulfuric acid, methanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, dodecylbenzenesulfonic acid, sulfonic acid compounds such as trifluoromethanesulfonic acid, hydrochloric acid, nitric acid, and salts of the above acids.
使用量は特に限定されないが、反応性、生産性の点から、ピペラジン1モルに対し0.0001〜0.1モル、特に0.001〜0.05モルの範囲が好ましい。 The amount used is not particularly limited, but from the viewpoint of reactivity and productivity, a range of 0.0001 to 0.1 mol, particularly 0.001 to 0.05 mol is preferable with respect to 1 mol of piperazine.
以下、実施例及び比較例を示して本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example are shown and this invention is demonstrated concretely, this invention is not restrict | limited to the following Example.
[実施例1]N−トリイソプロピルシリルピペラジン
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、ピペラジン189.4g(2.2モル)、キシレン200ml、メタンスルホン酸1.0g(0.01モル)を仕込み、130℃に加熱した。内温が安定した後、トリイソプロピルクロロシラン192.8g(1.0モル)を2時間かけて滴下し、その温度で10時間撹拌した。室温まで冷却後、10質量%水酸化ナトリウム水溶液500gを加え、有機層を分液、蒸留し、沸点109−111℃/0.4kPaの留分を132.6g得た。
[Example 1] N-triisopropylsilylpiperazine In a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, piperazine 189.4 g (2.2 mol),
得られた留分の質量スペクトル、1H−NMRスペクトル、IRスペクトルを測定した。
質量スペクトル
m/z 242,199,170,157,73,59
1H−NMRスペクトル(重クロロホルム溶媒)
図1にチャートで示す。
IRスペクトル
図2にチャートで示す。
以上の結果より、得られた化合物はN−トリイソプロピルシリルピペラジンであることが確認された。
A mass spectrum, 1 H-NMR spectrum, and IR spectrum of the obtained fraction were measured.
Mass spectrum m / z 242,199,170,157,73,59
1 H-NMR spectrum (deuterated chloroform solvent)
A chart is shown in FIG.
IR spectrum FIG. 2 is a chart.
From the above results, it was confirmed that the obtained compound was N-triisopropylsilylpiperazine.
[実施例2]N−トリイソプロピルシリルピペラジンを原料として用いるN−(3−トリメトキシシリルプロピル)ピペラジンの合成
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、実施例1で得られたN−トリイソプロピルシリルピペラジン48.5g(0.2モル)、トリエチルアミン22.3g(0.22モル)、トルエン60mlを仕込み、90℃に加熱した。内温が安定した後、3−クロロプロピルトリメトキシシラン39.7g(0.2モル)を2時間かけて滴下し、90−110℃で6時間撹拌した。反応液をろ過後、ろ液にメタノール9.6gを添加し、60−70℃で12時間撹拌し、脱シリル化反応を行った。反応液を蒸留し、N−(3−トリメトキシシリル)プロピルピペラジンを沸点112℃/0.4kPaの留分として33.1g得た。蒸留中、塔及び留出ラインへのピペラジンの析出は見られなかった。
Example 2 Synthesis of N- (3-trimethoxysilylpropyl) piperazine using N-triisopropylsilylpiperazine as a raw material A flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer was obtained in Example 1. The obtained N-triisopropylsilylpiperazine (48.5 g, 0.2 mol), triethylamine (22.3 g, 0.22 mol), and toluene (60 ml) were charged and heated to 90 ° C. After the internal temperature was stabilized, 39.7 g (0.2 mol) of 3-chloropropyltrimethoxysilane was added dropwise over 2 hours, followed by stirring at 90-110 ° C. for 6 hours. After filtering the reaction solution, 9.6 g of methanol was added to the filtrate and stirred at 60-70 ° C. for 12 hours to carry out desilylation reaction. The reaction solution was distilled to obtain 33.1 g of N- (3-trimethoxysilyl) propylpiperazine as a fraction having a boiling point of 112 ° C./0.4 kPa. During the distillation, no piperazine was deposited on the column and the distillation line.
[実施例3]N−トリ(sec−ブチル)シリルピペラジン
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、ピペラジン189.4g(2.2モル)、キシレン200ml、メタンスルホン酸1.9g(0.02モル)を仕込み、130℃に加熱した。内温が安定した後、トリ(sec−ブチル)クロロシラン234.9g(1.0モル)を2時間かけて滴下し、その温度で24時間撹拌した。室温まで冷却後、10質量%水酸化ナトリウム水溶液500gを加え、有機層を分液、蒸留し、沸点123−125℃/0.2kPaの留分を153.6g得た。
[Example 3] N-tri (sec-butyl) silylpiperazine In a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer, piperazine 189.4 g (2.2 mol),
得られた留分の質量スペクトル、1H−NMRスペクトル、IRスペクトルを測定した。
質量スペクトル
m/z 284,227,171,85,59
1H−NMRスペクトル(重クロロホルム溶媒)
図3にチャートで示す。
IRスペクトル
図4にチャートで示す。
以上の結果より、得られた化合物はN−トリ(sec−ブチル)シリルピペラジンであることが確認された。
A mass spectrum, 1 H-NMR spectrum, and IR spectrum of the obtained fraction were measured.
Mass spectrum m /
1 H-NMR spectrum (deuterated chloroform solvent)
FIG. 3 shows a chart.
IR spectrum FIG. 4 is a chart.
From the above results, it was confirmed that the obtained compound was N-tri (sec-butyl) silylpiperazine.
[実施例4]N−トリ(sec−ブチル)シリルピペラジンを原料として用いるN−(3−トリメトキシシリルプロピル)ピペラジンの合成
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、実施例3で得られたN−トリ(sec−ブチル)シリルピペラジン56.9g(0.2モル)、トリエチルアミン22.3g(0.22モル)、トルエン60mlを仕込み、90℃に加熱した。内温が安定した後、3−クロロプロピルトリメトキシシラン39.7g(0.2モル)を2時間かけて滴下し、90−110℃で6時間撹拌した。反応液をろ過後、ろ液にメタノール9.6gを添加し、60−70℃で24時間撹拌し、脱シリル化反応を行った。反応液を蒸留し、N−(3−トリメトキシシリル)プロピルピペラジンを沸点112℃/0.4kPaの留分として30.5g得た。蒸留中、塔及び留出ラインへのピペラジンの析出は見られなかった。
[Example 4] Synthesis of N- (3-trimethoxysilylpropyl) piperazine using N-tri (sec-butyl) silylpiperazine as a raw material A flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer was used. N-tri (sec-butyl) silylpiperazine obtained in Example 3 (56.9 g, 0.2 mol), triethylamine (22.3 g, 0.22 mol), and toluene (60 ml) were charged and heated to 90 ° C. After the internal temperature was stabilized, 39.7 g (0.2 mol) of 3-chloropropyltrimethoxysilane was added dropwise over 2 hours, followed by stirring at 90-110 ° C. for 6 hours. After filtering the reaction solution, 9.6 g of methanol was added to the filtrate and stirred at 60-70 ° C. for 24 hours to carry out desilylation reaction. The reaction solution was distilled to obtain 30.5 g of N- (3-trimethoxysilyl) propylpiperazine as a fraction having a boiling point of 112 ° C./0.4 kPa. During the distillation, no piperazine was deposited on the column and the distillation line.
[実施例5]N−トリエチルシリルピペラジンを原料として用いるN−(3−トリメトキシシリルプロピル)ピペラジンの合成
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、ピペラジン189.4g(2.2モル)、キシレン200mlを仕込み、130℃に加熱した。内温が安定した後、トリエチルクロロシラン150.7g(1.0モル)を2時間かけて滴下し、その温度で2時間撹拌した。室温まで冷却後、10質量%水酸化ナトリウム水溶液500gを加え、有機層を分液、蒸留した。N−トリエチルシリルピペラジンを沸点90−91℃/0.4kPaの留分として106.0g得た。
続いて撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、得られたN−トリエチルシリルピペラジン40.1g(0.2モル)、トリエチルアミン22.3g(0.22モル)、トルエン60mlを仕込み、90℃に加熱した。内温が安定した後、3−クロロプロピルトリメトキシシラン39.7g(0.2モル)を2時間かけて滴下し、90−110℃で6時間撹拌した。反応液をろ過後、ろ液にメタノール9.6gを添加し、60−70℃で6時間撹拌し、脱シリル化反応を行った。反応液を蒸留し、N−(3−トリメトキシシリル)プロピルピペラジンを沸点112℃/0.4kPaの留分として29.7g得た。蒸留中、塔及び留出ラインへのピペラジンの析出は見られなかった。
Example 5 Synthesis of N- (3-trimethoxysilylpropyl) piperazine using N-triethylsilylpiperazine as a raw material In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 189.4 g (2 2 mol) and 200 ml of xylene were charged and heated to 130 ° C. After the internal temperature was stabilized, 150.7 g (1.0 mol) of triethylchlorosilane was added dropwise over 2 hours and stirred at that temperature for 2 hours. After cooling to room temperature, 500 g of a 10% by mass aqueous sodium hydroxide solution was added, and the organic layer was separated and distilled. 106.0 g of N-triethylsilylpiperazine was obtained as a fraction having a boiling point of 90-91 ° C./0.4 kPa.
Subsequently, 40.1 g (0.2 mol) of the obtained N-triethylsilylpiperazine, 22.3 g (0.22 mol) of triethylamine, 60 ml of toluene were added to a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer. And heated to 90 ° C. After the internal temperature was stabilized, 39.7 g (0.2 mol) of 3-chloropropyltrimethoxysilane was added dropwise over 2 hours, followed by stirring at 90-110 ° C. for 6 hours. After filtering the reaction solution, 9.6 g of methanol was added to the filtrate and stirred at 60-70 ° C. for 6 hours to carry out desilylation reaction. The reaction solution was distilled to obtain 29.7 g of N- (3-trimethoxysilyl) propylpiperazine as a fraction having a boiling point of 112 ° C./0.4 kPa. During the distillation, no piperazine was deposited on the column and the distillation line.
[比較例1]ピペラジンを原料として用いるN−(3−トリメトキシシリルプロピル)ピペラジンの合成
撹拌機、還流器、滴下ロート及び温度計を備えたフラスコに、ピペラジン51.7g(0.6モル)、トルエン60mlを仕込み、110℃に加熱した。内温が安定した後、3−クロロプロピルトリメトキシシラン39.7g(0.2モル)を2時間かけて滴下し、その温度で6時間撹拌した。反応液をろ過後、ろ液を蒸留した。蒸留中、蒸留塔及び、留出ラインにピペラジンの析出が確認され、蒸留塔、留出ラインの閉塞を防ぐために加温し、ピペラジンを融解する操作が必要であった。N−(3−トリメトキシシリルプロピル)ピペラジンを沸点112℃/0.4kPaの留分として25.5g得た。
Comparative Example 1 Synthesis of N- (3-trimethoxysilylpropyl) piperazine using piperazine as a raw material In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 51.7 g (0.6 mol) of
Claims (4)
で示されるオルガノキシシラン化合物と下記一般式(2)
で示されるシリル基で保護されたピペラジン化合物を反応させて、下記一般式(3)
で示されるシリル基で保護されたピペラジニル基を有するオルガノキシシラン化合物を得た後、この式(3)のオルガノキシシラン化合物を脱シリル化することを特徴とする、下記一般式(4)
で示されるピペラジニル基を有するオルガノキシシラン化合物の製造方法。 The following general formula (1)
And the following general formula (2)
A piperazine compound protected with a silyl group represented by the following general formula (3):
After obtaining an organoxysilane compound having a piperazinyl group protected by a silyl group represented by the formula (3), the organoxysilane compound of the formula (3) is desilylated, and the following general formula (4)
The manufacturing method of the organoxysilane compound which has a piperazinyl group shown by these.
で示されるシリル基で保護されたピペラジン化合物。 The following general formula (5)
A piperazine compound protected with a silyl group represented by the formula:
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