JP5313044B2 - Surface treatment agent for copper or copper alloy and use thereof - Google Patents
Surface treatment agent for copper or copper alloy and use thereof Download PDFInfo
- Publication number
- JP5313044B2 JP5313044B2 JP2009124003A JP2009124003A JP5313044B2 JP 5313044 B2 JP5313044 B2 JP 5313044B2 JP 2009124003 A JP2009124003 A JP 2009124003A JP 2009124003 A JP2009124003 A JP 2009124003A JP 5313044 B2 JP5313044 B2 JP 5313044B2
- Authority
- JP
- Japan
- Prior art keywords
- imidazole
- dichlorophenyl
- dichlorobenzyl
- methylimidazole
- chlorophenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 59
- 239000010949 copper Substances 0.000 title claims abstract description 59
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 27
- 239000012756 surface treatment agent Substances 0.000 title claims description 43
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims abstract description 70
- 238000000034 method Methods 0.000 claims abstract description 51
- -1 imidazole compound Chemical class 0.000 claims abstract description 44
- 238000005476 soldering Methods 0.000 claims abstract description 25
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- 125000001309 chloro group Chemical group Cl* 0.000 claims abstract description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 5
- 229910000679 solder Inorganic materials 0.000 claims description 88
- 239000000126 substance Substances 0.000 claims description 43
- 238000004381 surface treatment Methods 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 description 30
- 238000003786 synthesis reaction Methods 0.000 description 27
- 238000006243 chemical reaction Methods 0.000 description 23
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 21
- 125000005843 halogen group Chemical group 0.000 description 21
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 20
- JVWYWIOGQGTDGZ-UHFFFAOYSA-N 2-(4-chlorophenyl)ethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=C(Cl)C=C1 JVWYWIOGQGTDGZ-UHFFFAOYSA-N 0.000 description 19
- LIGACIXOYTUXAW-UHFFFAOYSA-N phenacyl bromide Chemical compound BrCC(=O)C1=CC=CC=C1 LIGACIXOYTUXAW-UHFFFAOYSA-N 0.000 description 19
- IVYMIRMKXZAHRV-UHFFFAOYSA-N 4-chlorophenylacetonitrile Chemical compound ClC1=CC=C(CC#N)C=C1 IVYMIRMKXZAHRV-UHFFFAOYSA-N 0.000 description 18
- 230000005496 eutectics Effects 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- YWQFUOSTIJIKRY-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)ethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=C(Cl)C=C1Cl YWQFUOSTIJIKRY-UHFFFAOYSA-N 0.000 description 12
- 150000002460 imidazoles Chemical class 0.000 description 12
- 239000000243 solution Substances 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 239000006071 cream Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- VJARIBGMDPJLCL-UHFFFAOYSA-N 2-(2,4-dichlorophenyl)acetonitrile Chemical compound ClC1=CC=C(CC#N)C(Cl)=C1 VJARIBGMDPJLCL-UHFFFAOYSA-N 0.000 description 6
- QKCZDPJRZVWXRC-UHFFFAOYSA-N 2-(2-chlorophenyl)ethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=CC=C1Cl QKCZDPJRZVWXRC-UHFFFAOYSA-N 0.000 description 6
- UBSBLGBWNYUPDW-UHFFFAOYSA-N 2-phenylethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=CC=C1 UBSBLGBWNYUPDW-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- SUSQOBVLVYHIEX-UHFFFAOYSA-N phenylacetonitrile Chemical compound N#CCC1=CC=CC=C1 SUSQOBVLVYHIEX-UHFFFAOYSA-N 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 235000002639 sodium chloride Nutrition 0.000 description 5
- WJPKYOOURIMUTE-UHFFFAOYSA-N 2-(4-bromophenyl)ethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=C(Br)C=C1 WJPKYOOURIMUTE-UHFFFAOYSA-N 0.000 description 4
- MIOXQOWDBJXPEI-UHFFFAOYSA-N 2-[(2-chlorophenyl)methyl]-5-(2,4-dichlorophenyl)-1h-imidazole Chemical group ClC1=CC(Cl)=CC=C1C(N1)=CN=C1CC1=CC=CC=C1Cl MIOXQOWDBJXPEI-UHFFFAOYSA-N 0.000 description 4
- JCMXDZNTAPKQJJ-UHFFFAOYSA-N 2-[(4-bromophenyl)methyl]-4-(2,4-dichlorophenyl)-5-methyl-1h-imidazole Chemical group N=1C(C=2C(=CC(Cl)=CC=2)Cl)=C(C)NC=1CC1=CC=C(Br)C=C1 JCMXDZNTAPKQJJ-UHFFFAOYSA-N 0.000 description 4
- YAEINWKUQRMOTB-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-5-(2,4-dichlorophenyl)-1h-imidazole Chemical group C1=CC(Cl)=CC=C1CC1=NC=C(C=2C(=CC(Cl)=CC=2)Cl)N1 YAEINWKUQRMOTB-UHFFFAOYSA-N 0.000 description 4
- RGAXHDHPGCIJTQ-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-5-phenyl-1h-imidazole Chemical group C1=CC(Cl)=CC=C1CC1=NC=C(C=2C=CC=CC=2)N1 RGAXHDHPGCIJTQ-UHFFFAOYSA-N 0.000 description 4
- SAKMPXRILWVZEG-UHFFFAOYSA-N 2-bromo-1-(4-chlorophenyl)propan-1-one Chemical group CC(Br)C(=O)C1=CC=C(Cl)C=C1 SAKMPXRILWVZEG-UHFFFAOYSA-N 0.000 description 4
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 150000002366 halogen compounds Chemical class 0.000 description 4
- 125000002883 imidazolyl group Chemical group 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- MRDUURPIPLIGQX-UHFFFAOYSA-N 2-(2-chlorophenyl)acetonitrile Chemical compound ClC1=CC=CC=C1CC#N MRDUURPIPLIGQX-UHFFFAOYSA-N 0.000 description 3
- AWVKQWIOURZHQZ-UHFFFAOYSA-N 2-[(2,4-dichlorophenyl)methyl]-4,5-diphenyl-1h-imidazole Chemical compound ClC1=CC(Cl)=CC=C1CC1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 AWVKQWIOURZHQZ-UHFFFAOYSA-N 0.000 description 3
- HIEMXPXRTCUWRY-UHFFFAOYSA-N 2-[(2-chlorophenyl)methyl]-5-methyl-4-phenyl-1h-imidazole Chemical group N=1C(C=2C=CC=CC=2)=C(C)NC=1CC1=CC=CC=C1Cl HIEMXPXRTCUWRY-UHFFFAOYSA-N 0.000 description 3
- ZXRKYCPXQSWHPU-UHFFFAOYSA-N 2-[(4-bromophenyl)methyl]-4-(3,4-dichlorophenyl)-5-methyl-1h-imidazole Chemical group N=1C(C=2C=C(Cl)C(Cl)=CC=2)=C(C)NC=1CC1=CC=C(Br)C=C1 ZXRKYCPXQSWHPU-UHFFFAOYSA-N 0.000 description 3
- KOLRMWAFBJEBHR-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-1h-imidazole Chemical compound C1=CC(Cl)=CC=C1CC1=NC=CN1 KOLRMWAFBJEBHR-UHFFFAOYSA-N 0.000 description 3
- IKCMEDJGOKBRFC-UHFFFAOYSA-N 2-benzyl-4-(2,4-dichlorophenyl)-5-methyl-1h-imidazole Chemical group N=1C(C=2C(=CC(Cl)=CC=2)Cl)=C(C)NC=1CC1=CC=CC=C1 IKCMEDJGOKBRFC-UHFFFAOYSA-N 0.000 description 3
- PVNXLJLPOZCHCT-UHFFFAOYSA-N 2-benzyl-4-(4-chlorophenyl)-5-methyl-1h-imidazole Chemical group N=1C(C=2C=CC(Cl)=CC=2)=C(C)NC=1CC1=CC=CC=C1 PVNXLJLPOZCHCT-UHFFFAOYSA-N 0.000 description 3
- KQHLBMVGQBPSMT-UHFFFAOYSA-N 2-bromo-1-(2,4-dichlorophenyl)propan-1-one Chemical group CC(Br)C(=O)C1=CC=C(Cl)C=C1Cl KQHLBMVGQBPSMT-UHFFFAOYSA-N 0.000 description 3
- YPKHWACIODYBCI-UHFFFAOYSA-N 2-bromo-1-(3,4-dichlorophenyl)propan-1-one Chemical group CC(Br)C(=O)C1=CC=C(Cl)C(Cl)=C1 YPKHWACIODYBCI-UHFFFAOYSA-N 0.000 description 3
- NWAMRPCZWHSYJQ-UHFFFAOYSA-N 4-(2,4-dichlorophenyl)-2-[(2,4-dichlorophenyl)methyl]-5-methyl-1h-imidazole Chemical compound N=1C(C=2C(=CC(Cl)=CC=2)Cl)=C(C)NC=1CC1=CC=C(Cl)C=C1Cl NWAMRPCZWHSYJQ-UHFFFAOYSA-N 0.000 description 3
- WNIGLYWHRAEARM-UHFFFAOYSA-N 4-(2-chlorophenyl)-2-[(4-chlorophenyl)methyl]-5-methyl-1h-imidazole Chemical group N=1C(C=2C(=CC=CC=2)Cl)=C(C)NC=1CC1=CC=C(Cl)C=C1 WNIGLYWHRAEARM-UHFFFAOYSA-N 0.000 description 3
- QDLGRHSFUUKDFU-UHFFFAOYSA-N 4-(3,4-dichlorophenyl)-2-[(2,4-dichlorophenyl)methyl]-5-methyl-1h-imidazole Chemical compound N=1C(C=2C=C(Cl)C(Cl)=CC=2)=C(C)NC=1CC1=CC=C(Cl)C=C1Cl QDLGRHSFUUKDFU-UHFFFAOYSA-N 0.000 description 3
- QKIJTKZZIDQDJS-UHFFFAOYSA-N 4-(4-bromophenyl)-2-[(2,4-dichlorophenyl)methyl]-5-methyl-1h-imidazole Chemical compound N=1C(C=2C=CC(Br)=CC=2)=C(C)NC=1CC1=CC=C(Cl)C=C1Cl QKIJTKZZIDQDJS-UHFFFAOYSA-N 0.000 description 3
- BFFQNYOCYAFKRU-UHFFFAOYSA-N 4-(4-chlorophenyl)-2-[(2,4-dichlorophenyl)methyl]-5-methyl-1h-imidazole Chemical compound N=1C(C=2C=CC(Cl)=CC=2)=C(C)NC=1CC1=CC=C(Cl)C=C1Cl BFFQNYOCYAFKRU-UHFFFAOYSA-N 0.000 description 3
- UBZWLOOOMQNUQG-UHFFFAOYSA-N 4-(4-chlorophenyl)-2-[(2-chlorophenyl)methyl]-5-methyl-1h-imidazole Chemical group N=1C(C=2C=CC(Cl)=CC=2)=C(C)NC=1CC1=CC=CC=C1Cl UBZWLOOOMQNUQG-UHFFFAOYSA-N 0.000 description 3
- CXVGZFZCMPMBGD-UHFFFAOYSA-N 4-(4-chlorophenyl)-2-[(4-chlorophenyl)methyl]-5-methyl-1h-imidazole Chemical group N=1C(C=2C=CC(Cl)=CC=2)=C(C)NC=1CC1=CC=C(Cl)C=C1 CXVGZFZCMPMBGD-UHFFFAOYSA-N 0.000 description 3
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Chemical class C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 239000005749 Copper compound Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Chemical class O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 150000001880 copper compounds Chemical class 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 150000007522 mineralic acids Chemical class 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 150000003505 terpenes Chemical class 0.000 description 3
- 235000007586 terpenes Nutrition 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Chemical class OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 3
- GYZCRANCCZYNGO-UHFFFAOYSA-N 2-(3,4,5-trichlorophenyl)ethanimidamide hydrochloride Chemical compound Cl.ClC=1C=C(C=C(C1Cl)Cl)CC(=N)N GYZCRANCCZYNGO-UHFFFAOYSA-N 0.000 description 2
- XHNMUESLGUOKPZ-UHFFFAOYSA-N 2-(3,4-dichlorophenyl)ethanimidamide;hydrochloride Chemical compound Cl.NC(=N)CC1=CC=C(Cl)C(Cl)=C1 XHNMUESLGUOKPZ-UHFFFAOYSA-N 0.000 description 2
- MFHFWRBXPQDZSA-UHFFFAOYSA-N 2-(4-bromophenyl)acetonitrile Chemical compound BrC1=CC=C(CC#N)C=C1 MFHFWRBXPQDZSA-UHFFFAOYSA-N 0.000 description 2
- SZQRWBCRMOVIBC-UHFFFAOYSA-N 2-[(2,4-dichlorophenyl)methyl]-5-phenyl-1h-imidazole Chemical group ClC1=CC(Cl)=CC=C1CC1=NC=C(C=2C=CC=CC=2)N1 SZQRWBCRMOVIBC-UHFFFAOYSA-N 0.000 description 2
- COGUOPIIFAMLES-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-1h-benzimidazole Chemical compound C1=CC(Cl)=CC=C1CC1=NC2=CC=CC=C2N1 COGUOPIIFAMLES-UHFFFAOYSA-N 0.000 description 2
- KDSKQXDRLMFINF-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-4,5-dihydro-1h-imidazole Chemical compound C1=CC(Cl)=CC=C1CC1=NCCN1 KDSKQXDRLMFINF-UHFFFAOYSA-N 0.000 description 2
- PZZGYJVWZDSKDN-UHFFFAOYSA-N 2-[(4-chlorophenyl)methyl]-5-methyl-4-(3,4,5-trichlorophenyl)-1h-imidazole Chemical compound N=1C(C=2C=C(Cl)C(Cl)=C(Cl)C=2)=C(C)NC=1CC1=CC=C(Cl)C=C1 PZZGYJVWZDSKDN-UHFFFAOYSA-N 0.000 description 2
- JUEBSZPWUQYFOR-UHFFFAOYSA-N 2-benzyl-5-phenyl-1h-imidazole Chemical compound C=1C=CC=CC=1CC(NC=1)=NC=1C1=CC=CC=C1 JUEBSZPWUQYFOR-UHFFFAOYSA-N 0.000 description 2
- DASJDMQCPIDJIF-UHFFFAOYSA-N 2-bromo-1-(2,4-dichlorophenyl)ethanone Chemical group ClC1=CC=C(C(=O)CBr)C(Cl)=C1 DASJDMQCPIDJIF-UHFFFAOYSA-N 0.000 description 2
- OWVMFLLVLFONOO-UHFFFAOYSA-N 3-butoxypropanoic acid Chemical compound CCCCOCCC(O)=O OWVMFLLVLFONOO-UHFFFAOYSA-N 0.000 description 2
- SLYXWWFBIJLCSQ-UHFFFAOYSA-N 4-(3,4-dichlorophenyl)-2-[(3,4-dichlorophenyl)methyl]-5-methyl-1h-imidazole Chemical compound N=1C(C=2C=C(Cl)C(Cl)=CC=2)=C(C)NC=1CC1=CC=C(Cl)C(Cl)=C1 SLYXWWFBIJLCSQ-UHFFFAOYSA-N 0.000 description 2
- NCHVXQRTPCCPOE-UHFFFAOYSA-N 5-hexyl-4-phenyl-2-[(3,4,5-trichlorophenyl)methyl]-1h-imidazole Chemical compound N=1C(C=2C=CC=CC=2)=C(CCCCCC)NC=1CC1=CC(Cl)=C(Cl)C(Cl)=C1 NCHVXQRTPCCPOE-UHFFFAOYSA-N 0.000 description 2
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
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- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
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- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000004480 active ingredient Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
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- PGDVSLLRBHHCLI-UHFFFAOYSA-N 5-phenyl-2-[(2,4,5-tribromophenyl)methyl]-1h-imidazole Chemical compound C1=C(Br)C(Br)=CC(Br)=C1CC1=NC=C(C=2C=CC=CC=2)N1 PGDVSLLRBHHCLI-UHFFFAOYSA-N 0.000 description 1
- RXDPISSUIPEWTP-UHFFFAOYSA-N 5-phenyl-2-[(3,4,5-trichlorophenyl)methyl]-1h-imidazole Chemical compound ClC1=C(Cl)C(Cl)=CC(CC=2NC(=CN=2)C=2C=CC=CC=2)=C1 RXDPISSUIPEWTP-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 229910017944 Ag—Cu Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229910016334 Bi—In Inorganic materials 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- UFSDSGIFFOCCCU-UHFFFAOYSA-N ClC1=C(CC=2NC=C(N2)C2=C(C(=CC=C2)Cl)Cl)C=CC=C1Cl.BrC1=CC=C(C=C1)C=1N=C(NC1)CC1=C(C=CC(=C1)Br)Br.ClC1=CC=C(C=C1)C=1N=C(NC1)CC1=C(C=CC(=C1)Br)Br Chemical compound ClC1=C(CC=2NC=C(N2)C2=C(C(=CC=C2)Cl)Cl)C=CC=C1Cl.BrC1=CC=C(C=C1)C=1N=C(NC1)CC1=C(C=CC(=C1)Br)Br.ClC1=CC=C(C=C1)C=1N=C(NC1)CC1=C(C=CC(=C1)Br)Br UFSDSGIFFOCCCU-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- RBNPOMFGQQGHHO-UWTATZPHSA-N D-glyceric acid Chemical compound OC[C@@H](O)C(O)=O RBNPOMFGQQGHHO-UWTATZPHSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000013032 Hydrocarbon resin Substances 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 102220474387 PDZ and LIM domain protein 7_H63A_mutation Human genes 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910020830 Sn-Bi Inorganic materials 0.000 description 1
- 229910020888 Sn-Cu Inorganic materials 0.000 description 1
- 229910020994 Sn-Zn Inorganic materials 0.000 description 1
- 229910018728 Sn—Bi Inorganic materials 0.000 description 1
- 229910019204 Sn—Cu Inorganic materials 0.000 description 1
- 229910009069 Sn—Zn Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- CANRESZKMUPMAE-UHFFFAOYSA-L Zinc lactate Chemical compound [Zn+2].CC(O)C([O-])=O.CC(O)C([O-])=O CANRESZKMUPMAE-UHFFFAOYSA-L 0.000 description 1
- RAOSIAYCXKBGFE-UHFFFAOYSA-K [Cu+3].[O-]P([O-])([O-])=O Chemical compound [Cu+3].[O-]P([O-])([O-])=O RAOSIAYCXKBGFE-UHFFFAOYSA-K 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- PBCJIPOGFJYBJE-UHFFFAOYSA-N acetonitrile;hydrate Chemical compound O.CC#N PBCJIPOGFJYBJE-UHFFFAOYSA-N 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229920006271 aliphatic hydrocarbon resin Polymers 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229920006272 aromatic hydrocarbon resin Polymers 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- NKNDPYCGAZPOFS-UHFFFAOYSA-M copper(i) bromide Chemical compound Br[Cu] NKNDPYCGAZPOFS-UHFFFAOYSA-M 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- WOWBFOBYOAGEEA-UHFFFAOYSA-N diafenthiuron Chemical compound CC(C)C1=C(NC(=S)NC(C)(C)C)C(C(C)C)=CC(OC=2C=CC=CC=2)=C1 WOWBFOBYOAGEEA-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920006270 hydrocarbon resin Polymers 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- RMIODHQZRUFFFF-UHFFFAOYSA-N methoxyacetic acid Chemical compound COCC(O)=O RMIODHQZRUFFFF-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- WEZYFYMYMKUAHY-UHFFFAOYSA-N tert-butyl 2,4-dibenzylpiperazine-1-carboxylate Chemical compound C1C(CC=2C=CC=CC=2)N(C(=O)OC(C)(C)C)CCN1CC1=CC=CC=C1 WEZYFYMYMKUAHY-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910001174 tin-lead alloy Inorganic materials 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WGIWBXUNRXCYRA-UHFFFAOYSA-H trizinc;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WGIWBXUNRXCYRA-UHFFFAOYSA-H 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011746 zinc citrate Substances 0.000 description 1
- 235000006076 zinc citrate Nutrition 0.000 description 1
- 229940068475 zinc citrate Drugs 0.000 description 1
- SRWMQSFFRFWREA-UHFFFAOYSA-M zinc formate Chemical compound [Zn+2].[O-]C=O SRWMQSFFRFWREA-UHFFFAOYSA-M 0.000 description 1
- 239000011576 zinc lactate Substances 0.000 description 1
- 235000000193 zinc lactate Nutrition 0.000 description 1
- 229940050168 zinc lactate Drugs 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- ZPEJZWGMHAKWNL-UHFFFAOYSA-L zinc;oxalate Chemical compound [Zn+2].[O-]C(=O)C([O-])=O ZPEJZWGMHAKWNL-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3615—N-compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/48—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
- C23C22/52—Treatment of copper or alloys based thereon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/12—Copper or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Chemical Treatment Of Metals (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本発明は、電子部品などをプリント配線板の銅または銅合金に半田付けする際に使用する表面処理剤及びその利用に関するものである。 The present invention relates to a surface treatment agent used when soldering an electronic component or the like to copper or a copper alloy of a printed wiring board, and the use thereof.
近時プリント配線板の実装方法として、実装密度を向上させた表面実装が広く採用されている。このような表面実装方法は、チップ部品をクリーム半田で接合する両面表面実装、チップ部品のクリーム半田による表面実装とディスクリート部品のスルホール実装を組み合わせた混載実装等に分けられる。いずれの実装方法においても、プリント配線板は複数回の半田付けが行われるので、その度に高温に曝されて厳しい熱履歴を受ける。
その結果、プリント配線板の回路部を構成する銅または銅合金(以下、単に銅と云うことがある)の表面は、加熱されることにより酸化皮膜の形成が促進されるので、該回路部表面の半田付け性を良好に保つことができない。
Recently, surface mounting with improved mounting density has been widely adopted as a method for mounting printed wiring boards. Such surface mounting methods can be classified into double-sided surface mounting in which chip components are joined by cream solder, mixed mounting in which surface mounting by chip solder cream soldering and through-hole mounting of discrete components are combined. In any mounting method, since the printed wiring board is soldered a plurality of times, it is exposed to a high temperature each time and receives a severe thermal history.
As a result, the surface of the copper or copper alloy (hereinafter sometimes simply referred to as copper) constituting the circuit part of the printed wiring board is heated to promote the formation of an oxide film. It is not possible to maintain good solderability.
このようなプリント配線板の銅回路部を空気酸化から保護するために、表面処理剤を使用して該回路部表面に化成皮膜を形成させる処理が広く行われているが、銅回路部が複数回の熱履歴を受けた後も化成皮膜が変成(劣化)することなく銅回路部を保護し、これによって半田付け性を良好なものに保つことが要求されている。 In order to protect the copper circuit portion of such a printed wiring board from air oxidation, a treatment for forming a chemical conversion film on the surface of the circuit portion using a surface treatment agent is widely performed. It is required to protect the copper circuit portion without changing (deteriorating) the chemical film even after receiving the heat history of the times, thereby maintaining good solderability.
従来から電子部品をプリント配線板などに接合する際には、錫−鉛合金の共晶半田が広く使用されていたが、近年その半田合金中に含まれる鉛による人体への有害性が懸念され、鉛を含まない半田を使用することが求められている。
そのために種々の無鉛半田が検討されているが、例えば錫をベース金属として、銀、亜鉛、ビスマス、インジウム、アンチモンや銅などの金属を添加した無鉛半田が提案されている。
Conventionally, tin-lead alloy eutectic solder has been widely used for joining electronic components to printed wiring boards, etc., but in recent years there is concern about the harmfulness of the lead contained in the solder alloy to the human body. There is a need to use solder that does not contain lead.
For this purpose, various lead-free solders have been studied. For example, lead-free solders having a metal such as silver, zinc, bismuth, indium, antimony and copper as a base metal have been proposed.
ところで、従来の錫−鉛系共晶半田は、接合母材に使用される金属、特に銅の表面に対する濡れ性に優れ銅に対して強固に接合するので、銅部材間の接合性については高い信頼性が得られている。
これに対して、無鉛半田は従来の錫−鉛半田に比べると、銅の表面に対する濡れ性が劣っているので、半田付け性が悪く、ボイド発生などの接合不良が生じ、接合強度も低いものであった。
そのため無鉛半田を使用するに当たっては、より半田付け性の良好な半田合金および無鉛半田に適したフラックスの選定が求められているが、銅または銅合金表面の酸化防止のために使用される表面処理剤に対しても、無鉛半田の濡れ性を改善し半田付け性を良好なものとする機能が求められている。
また、無鉛半田の多くは融点が高く、半田付け温度が従来の錫−鉛系共晶半田に比べて20〜50℃程高くなるため、当該表面処理剤に対しては、優れた耐熱性を有する化成皮膜を形成させることも望まれている。
By the way, the conventional tin-lead eutectic solder has excellent wettability with respect to the metal used for the bonding base material, particularly copper, and is firmly bonded to copper, so that the bonding property between the copper members is high. Reliability is obtained.
In contrast, lead-free solder is inferior in wettability to the copper surface compared to conventional tin-lead solder, so solderability is poor, bonding defects such as voids occur, and bonding strength is low Met.
Therefore, when using lead-free solder, selection of a solder alloy with better solderability and a flux suitable for lead-free solder is required, but surface treatment used to prevent oxidation of copper or copper alloy surfaces Also for the agent, a function of improving the wettability of the lead-free solder and improving the solderability is required.
In addition, most lead-free solders have a high melting point, and the soldering temperature is about 20 to 50 ° C. higher than that of conventional tin-lead eutectic solder. Therefore, the surface treatment agent has excellent heat resistance. It is also desired to form a chemical conversion film.
このような表面処理剤の有効成分として、種々のイミダゾール化合物が提案されている。例えば、特許文献1には、2−ウンデシルイミダゾールの如き2−アルキルイミダゾール化合物が、特許文献2には、2−フェニルイミダゾールや2−フェニル−4−メチルイミダゾールの如き2−アリールイミダゾール化合物が、特許文献3には、2−ノニルベンズイミダゾールの如き2−アルキルベンズイミダゾール化合物が、特許文献4には、2−(4−クロロフェニルメチル)ベンズイミダゾールの如き2−アラルキルベンズイミダゾール化合物が、特許文献5には、2−(4−クロロフェニルメチル)イミダゾールや2−(2,4−ジクロロフェニルメチル)4,5−ジフェニルイミダゾールの如き2−アラルキルイミダゾール化合物が開示されている。 Various imidazole compounds have been proposed as active ingredients of such surface treatment agents. For example, Patent Document 1 includes 2-alkylimidazole compounds such as 2-undecylimidazole, and Patent Document 2 includes 2-arylimidazole compounds such as 2-phenylimidazole and 2-phenyl-4-methylimidazole. Patent Document 3 discloses a 2-alkylbenzimidazole compound such as 2-nonylbenzimidazole, and Patent Document 4 discloses a 2-aralkylbenzimidazole compound such as 2- (4-chlorophenylmethyl) benzimidazole. Discloses 2-aralkylimidazole compounds such as 2- (4-chlorophenylmethyl) imidazole and 2- (2,4-dichlorophenylmethyl) 4,5-diphenylimidazole.
しかしながら、これらのイミダゾール化合物を含有する表面処理剤を使用した場合には、銅表面に形成される化成皮膜の耐熱性が未だ満足すべきものではなかった。また、半田付けを行う際にも、半田の濡れ性が不十分であり、良好な半田付け性を得ることができない。特に共晶半田に代えて、無鉛半田を使用して半田付けを行う場合には、前記の表面処理剤は実用に供し難いものであった。 However, when the surface treatment agent containing these imidazole compounds is used, the heat resistance of the chemical conversion film formed on the copper surface has not yet been satisfactory. Also, when soldering, the solder wettability is insufficient, and good solderability cannot be obtained. In particular, in the case where soldering is performed using lead-free solder instead of eutectic solder, the surface treatment agent is difficult to be practically used.
本発明は斯かる事情に鑑みてなされたものであって、半田を使用して電子部品等をプリント配線板に接合する際に、プリント配線板の回路部等を構成する銅または銅合金の表面に耐熱性に優れた化成皮膜を形成させ、且つ半田との濡れ性が向上し、半田付け性を良好なものとする表面処理剤および表面処理方法を提供することを目的とする。
また、前記の表面処理剤を回路部を構成する銅または銅合金の表面に接触させたプリント配線板および、銅または銅合金の表面を前記の表面処理剤で接触させた後に、無鉛半田を使用して半田付けを行う半田付け方法を提供することを目的とする。
The present invention has been made in view of such circumstances, and the surface of copper or a copper alloy constituting a circuit portion or the like of a printed wiring board when an electronic component or the like is joined to the printed wiring board using solder. An object of the present invention is to provide a surface treatment agent and a surface treatment method that form a chemical conversion film having excellent heat resistance, improve wettability with solder, and improve solderability.
Also, a printed wiring board in which the surface treatment agent is brought into contact with the surface of copper or a copper alloy constituting the circuit part, and a lead-free solder is used after the surface of the copper or copper alloy is brought into contact with the surface treatment agent. An object of the present invention is to provide a soldering method for performing soldering.
本発明者らは、前記の課題を解決するために鋭意検討を重ねた結果、化1の化学式(I)で示されるイミダゾール化合物を含有する表面処理剤によって、銅回路部を有するプリント配線板を処理することにより、銅回路部の表面に耐熱性に優れた、即ち無鉛半田の半田付け温度に耐え得る化成皮膜を形成させることができ、且つ無鉛半田を使用して半田付けを行うに際して、銅または銅合金の表面に対する半田の濡れ性を向上させることにより、良好な半田付け性が得られることを認め本発明を完成するに至ったものである。
即ち、第1の発明は、化学式(I)で示されるイミダゾール化合物を含有することを特徴とする銅または銅合金の表面処理剤である。第2の発明は、銅または銅合金の表面に、第1の発明の表面処理剤を接触させることを特徴とする銅または銅合金の表面処理方法である。第3の発明は、銅回路部の銅または銅合金の表面に、第1の発明の表面処理剤を接触させたことを特徴とするプリント配線板である。第4の発明は、銅または銅合金の表面を、第1の発明の表面処理剤で接触させた後に無鉛半田を使用して半田付けを行うことを特徴とする半田付け方法である。
As a result of intensive studies in order to solve the above-mentioned problems, the present inventors have developed a printed wiring board having a copper circuit portion with a surface treatment agent containing an imidazole compound represented by the chemical formula (I) of Chemical Formula 1 By performing the treatment, it is possible to form a chemical conversion film excellent in heat resistance on the surface of the copper circuit portion, that is, capable of withstanding the soldering temperature of lead-free solder, and when performing soldering using lead-free solder, Alternatively, the present invention has been completed by recognizing that good solderability can be obtained by improving the wettability of the solder to the surface of the copper alloy.
That is, the first invention is a surface treating agent for copper or copper alloy characterized by containing an imidazole compound represented by the chemical formula (I). 2nd invention is the surface treatment method of copper or copper alloy characterized by making the surface treating agent of 1st invention contact the surface of copper or copper alloy. 3rd invention is the printed wiring board characterized by making the surface treatment agent of 1st invention contact the surface of the copper or copper alloy of a copper circuit part. A fourth invention is a soldering method, wherein the surface of copper or a copper alloy is brought into contact with the surface treatment agent of the first invention, and then soldering is performed using lead-free solder.
本発明の表面処理剤は、プリント配線板の回路部等を構成する銅または銅合金の表面に、耐熱性に優れた化成皮膜を形成させることができると共に、該表面に対する無鉛半田の濡れ性を飛躍的に向上させ、半田付け性を良好なものとすることができる。
また、本発明の半田付け方法は、有害金属である鉛を含まない半田の使用を可能とするので、環境保護の観点において有用なものである。
The surface treatment agent of the present invention can form a chemical conversion film having excellent heat resistance on the surface of copper or copper alloy constituting the circuit portion of the printed wiring board, etc., and also has the wettability of lead-free solder on the surface. It is possible to dramatically improve the solderability.
In addition, the soldering method of the present invention is useful from the viewpoint of environmental protection because it enables the use of solder that does not contain lead, which is a harmful metal.
以下、本発明について詳細に説明する。
本発明の実施において使用するイミダゾール化合物は、化2の化学式(I)で示されるものであり、イミダゾール環の2位にベンジル基(以下、単にベンジル基と云う)が結合し、イミダゾール環の4(5)位にフェニル基(以下、単にフェニル基と云う)が結合した基本骨格を有するイミダゾール化合物であり、ベンジル基のベンゼン環またはフェニル基の少なくとも何れか一方に、塩素原子及び又は臭素原子(以下、塩素原子及び臭素原子を合わせてハロゲン原子と云うことがある)が1つ以上置換したイミダゾール化合物である。
Hereinafter, the present invention will be described in detail.
The imidazole compound used in the practice of the present invention is represented by the chemical formula (I) of Chemical Formula 2, and a benzyl group (hereinafter simply referred to as a benzyl group) is bonded to the 2-position of the imidazole ring. (5) An imidazole compound having a basic skeleton in which a phenyl group (hereinafter simply referred to as a phenyl group) is bonded to the position, and at least one of a benzyl ring or a phenyl group of a benzyl group, a chlorine atom and / or a bromine atom ( Hereinafter, it is an imidazole compound in which one or more substituted chlorine atoms and bromine atoms are sometimes referred to as halogen atoms.
このようなイミダゾール化合物としては、(A)ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が1つ置換したもの、(B)ベンジル基およびフェニル基の両方にハロゲン原子が1つ置換したもの、(C)ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が2つ以上置換したもの、(D)ベンジル基またはフェニル基のどちらか一方にハロゲン原子が2つ以上置換し、其の他方にはハロゲン原子が1つ置換したもの、(E)ベンジル基およびフェニル基の両方にハロゲン原子が2つ以上置換したものに分類することができる。 As such imidazole compounds, (A) one in which only one of the benzyl group or the phenyl group is substituted with a halogen atom, and (B) one in which both the benzyl group and the phenyl group are substituted with one halogen atom (C) one in which only one of benzyl group or phenyl group is substituted with two or more halogen atoms, (D) one in which either benzyl group or phenyl group is substituted with two or more halogen atoms, and the other Can be classified into those in which one halogen atom is substituted, and (E) those in which two or more halogen atoms are substituted on both the benzyl group and the phenyl group.
本発明者等が得た知見によると、前記(A)〜(E)のイミダゾール化合物を含有する表面処理剤を用いて銅または銅合金の表面に化成皮膜を形成させ、無鉛半田を使用して半田付けを行った場合の半田付け性は、(A)<(B)<(C)〜(E)の順序で良好であった。即ち、(A)のイミダゾール化合物を含有する表面処理剤を用いて銅表面に化成皮膜を形成させた場合の半田付け性に比べて、(B)のイミダゾール化合物を含有する表面処理剤を用いて銅表面に化成皮膜を形成させた場合の半田付け性が優れていた。同様に、(B)のイミダゾール化合物の場合に比べて、(C)のイミダゾール化合物の場合の方が半田付け性が優れていた。また、(C)、(D)および(E)を含有する表面処理剤を用いて銅表面に化成皮膜を形成させた場合においては、ほぼ同等の半田付け性が得られた。 According to the knowledge obtained by the present inventors, a chemical conversion film is formed on the surface of copper or a copper alloy using the surface treatment agent containing the imidazole compounds (A) to (E), and lead-free solder is used. The solderability when soldering was performed was good in the order of (A) <(B) <(C) to (E). That is, using the surface treatment agent containing the imidazole compound of (B), compared with the solderability when the chemical conversion film is formed on the copper surface using the surface treatment agent containing the imidazole compound of (A). The solderability when the chemical film was formed on the copper surface was excellent. Similarly, the solderability of the imidazole compound (C) was superior to that of the imidazole compound (B). Moreover, when the chemical conversion film was formed on the copper surface using the surface treating agent containing (C), (D) and (E), almost the same solderability was obtained.
以上の知見によれば、本発明の実施に適するイミダゾール化合物は、化学式(I)において、mまたはnの少なくとも一方が1以上である場合に比べて、mおよびnの両者が1以上であることが好ましく、mまたはnの少なくとも一方が2以上であることがより好ましい。 According to the above findings, the imidazole compound suitable for the practice of the present invention has both m and n of 1 or more in the chemical formula (I) as compared with the case where at least one of m or n is 1 or more. It is preferable that at least one of m or n is 2 or more.
化学式(I)におけるRは、水素原子またはアルキル基であるが、該アルキル基とは、炭素数が1〜8であって直鎖状または分岐状の飽和脂肪族基である。このようなアルキル基の例としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等が挙げられる。 R in the chemical formula (I) is a hydrogen atom or an alkyl group, and the alkyl group is a linear or branched saturated aliphatic group having 1 to 8 carbon atoms. Examples of such alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, heptyl, octyl, etc. Is mentioned.
本発明の実施において使用するイミダゾール化合物は、例えば、化3の反応スキームで示される合成法を採用することにより合成することができる。なお、フェニルアセトアミジン化合物としては、フェニルアセトアミジン塩酸塩化合物を好適に使用することができる。 The imidazole compound used in the practice of the present invention can be synthesized, for example, by employing the synthesis method shown in the reaction scheme of Chemical Formula 3. In addition, as a phenylacetamidine compound, a phenylacetamidine hydrochloride compound can be used conveniently.
本発明の実施において使用する化学式(I)で示されるイミダゾール化合物としては、例えばRが水素原子の場合を例示すると、
2−ベンジル−4−(2−クロロフェニル)イミダゾール、
2−ベンジル−4−(3−クロロフェニル)イミダゾール、
2−ベンジル−4−(4−クロロフェニル)イミダゾール、
2−ベンジル−4−(2−ブロモフェニル)イミダゾール、
2−ベンジル−4−(3−ブロモフェニル)イミダゾール、
2−ベンジル−4−(4−ブロモフェニル)イミダゾール、
2−ベンジル−4−(2,3−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(2,4−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(2,5−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(2,6−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(3,4−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(3,5−ジクロロフェニル)イミダゾール、
2−ベンジル−4−(2,4−ジブロモフェニル)イミダゾール、
2−ベンジル−4−(2,5−ジブロモフェニル)イミダゾール、
2−ベンジル−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−ベンジル−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−ベンジル−4−(2,4,5−トリブロモフェニル)イミダゾール、
2−(2−クロロベンジル)−4−フェニルイミダゾール、
2−(3−クロロベンジル)−4−フェニルイミダゾール、
2−(4−クロロベンジル)−4−フェニルイミダゾール、
2−(2−ブロモベンジル)−4−フェニルイミダゾール、
2−(3−ブロモベンジル)−4−フェニルイミダゾール、
2−(4−ブロモベンジル)−4−フェニルイミダゾール、
2−(2−クロロベンジル)−4−(2−クロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(4−クロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2−クロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(4−クロロフェニル)イミダゾール、
4−(4−ブロモフェニル)−2−(4−クロロベンジル)イミダゾール、
2−(4−ブロモベンジル)−4−(2−クロロフェニル)イミダゾール、
2−(4−ブロモベンジル)−4−(4−クロロフェニル)イミダゾール、
2−(4−ブロモベンジル)−4−(4−ブロモフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(3−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(3−クロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,4−ジブロモフェニル)イミダゾール、
2−(2−ブロモベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2−ブロモベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2−ブロモベンジル)−4−(2,5−ジブロモフェニル)イミダゾール、
2−(2−クロロベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−4−(2,4,5−トリブロモフェニル)イミダゾール、
2−(4−ブロモベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−(2−ブロモベンジル)−4−(2,4,6−トリブロモフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−フェニルイミダゾール、
2−(2,4−ジクロロベンジル)−4−フェニルイミダゾール、
2−(2,5−ジクロロベンジル)−4−フェニルイミダゾール、
2−(2,6−ジクロロベンジル)−4−フェニルイミダゾール、
2−(3,4−ジクロロベンジル)−4−フェニルイミダゾール、
2−(3,5−ジクロロベンジル)−4−フェニルイミダゾール、
2−(2,4−ジブロモベンジル)−4−フェニルイミダゾール、
4−(2−クロロフェニル)−2−(2,3−ジクロロベンジル)イミダゾール、
4−(2−クロロフェニル)−2−(2,4−ジクロロベンジル)イミダゾール、
4−(2−クロロフェニル)−2−(2,5−ジクロロベンジル)イミダゾール、
4−(2−クロロフェニル)−2−(2,6−ジクロロベンジル)イミダゾール、
4−(2−クロロフェニル)−2−(3,4−ジクロロベンジル)イミダゾール、
4−(2−クロロフェニル)−2−(3,5−ジクロロベンジル)イミダゾール、
4−(3−クロロフェニル)−2−(2,4−ジクロロベンジル)イミダゾール、
4−(3−クロロフェニル)−2−(2,6−ジクロロベンジル)イミダゾール、
4−(3−クロロフェニル)−2−(3,4−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,3−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,4−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,5−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,6−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(3,4−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(3,5−ジクロロベンジル)イミダゾール、
4−(2−ブロモフェニル)−2−(2,4−ジクロロベンジル)イミダゾール、
4−(2−ブロモフェニル)−2−(3,4−ジクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,5−ジブロモベンジル)イミダゾール
4−(4−ブロモフェニル)−2−(2,5−ジブロモベンジル)イミダゾール
2−(2,3−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,3−ジクロロフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,5−ジクロロフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,6−ジクロロフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(2,5−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(2,6−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
2−(3,5−ジクロロベンジル)−4−(3,5−ジクロロフェニル)イミダゾール、
4−(2,5−ジブロモフェニル)−2−(2,4−ジクロロベンジル)イミダゾール、
4−(2,5−ジブロモフェニル)−2−(3,4−ジクロロベンジル)イミダゾール、
2−(2,5−ジブロモベンジル)−4−(3,4−ジクロロフェニル)イミダゾール、
2−(2,4−ジブロモベンジル)−4−(3,4−ジブロモフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,4,6−トリブロモフェニル)イミダゾール、
2−(2,4−ジブロモベンジル)−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−(2,4−ジブロモベンジル)−4−(2,4,5−トリブロモフェニル)イミダゾール、
4−フェニル−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−フェニル−2−(2,4,5−トリブロモベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,3,6−トリクロロベンジル)イミダゾール、
4−(2−ブロモフェニル)−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−2−(2,3,5−トリブロモベンジル)イミダゾール、
4−(4−ブロモフェニル)−2−(2,4,6−トリブロモベンジル)イミダゾール、
4−(2,4−ジクロロフェニル)−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(2,4−ジブロモフェニル)−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(3,4−ジクロロフェニル)−2−(2,4,5−トリブロモベンジル)イミダゾール、
4−(2,5−ジブロモフェニル)−2−(2,3,5−トリブロモベンジル)イミダゾール、
2−(3,4,5−トリクロロベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
4−(2,4,5−トリブロモフェニル)−2−(3,4,5−トリクロロベンジル)イミダゾール、
2−(2,4,6−トリブロモベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−(2,4,6−トリブロモベンジル)−4−(2,4,6−トリブロモフェニル)イミダゾール等が挙げられる。
As an imidazole compound represented by the chemical formula (I) used in the practice of the present invention, for example, when R is a hydrogen atom,
2-benzyl-4- (2-chlorophenyl) imidazole,
2-benzyl-4- (3-chlorophenyl) imidazole,
2-benzyl-4- (4-chlorophenyl) imidazole,
2-benzyl-4- (2-bromophenyl) imidazole,
2-benzyl-4- (3-bromophenyl) imidazole,
2-benzyl-4- (4-bromophenyl) imidazole,
2-benzyl-4- (2,3-dichlorophenyl) imidazole,
2-benzyl-4- (2,4-dichlorophenyl) imidazole,
2-benzyl-4- (2,5-dichlorophenyl) imidazole,
2-benzyl-4- (2,6-dichlorophenyl) imidazole,
2-benzyl-4- (3,4-dichlorophenyl) imidazole,
2-benzyl-4- (3,5-dichlorophenyl) imidazole,
2-benzyl-4- (2,4-dibromophenyl) imidazole,
2-benzyl-4- (2,5-dibromophenyl) imidazole,
2-benzyl-4- (2,4,5-trichlorophenyl) imidazole,
2-benzyl-4- (3,4,5-trichlorophenyl) imidazole,
2-benzyl-4- (2,4,5-tribromophenyl) imidazole,
2- (2-chlorobenzyl) -4-phenylimidazole,
2- (3-chlorobenzyl) -4-phenylimidazole,
2- (4-chlorobenzyl) -4-phenylimidazole,
2- (2-bromobenzyl) -4-phenylimidazole,
2- (3-bromobenzyl) -4-phenylimidazole,
2- (4-bromobenzyl) -4-phenylimidazole,
2- (2-chlorobenzyl) -4- (2-chlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (4-chlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2-chlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (4-chlorophenyl) imidazole,
4- (4-bromophenyl) -2- (4-chlorobenzyl) imidazole,
2- (4-bromobenzyl) -4- (2-chlorophenyl) imidazole,
2- (4-bromobenzyl) -4- (4-chlorophenyl) imidazole,
2- (4-bromobenzyl) -4- (4-bromophenyl) imidazole,
2- (2-chlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2-chlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (3-chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (3-chlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,4-dibromophenyl) imidazole,
2- (2-bromobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2-bromobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2-bromobenzyl) -4- (2,5-dibromophenyl) imidazole,
2- (2-chlorobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
2- (4-chlorobenzyl) -4- (2,4,5-tribromophenyl) imidazole,
2- (4-bromobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
2- (2-bromobenzyl) -4- (2,4,6-tribromophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4-phenylimidazole,
2- (2,4-dichlorobenzyl) -4-phenylimidazole,
2- (2,5-dichlorobenzyl) -4-phenylimidazole,
2- (2,6-dichlorobenzyl) -4-phenylimidazole,
2- (3,4-dichlorobenzyl) -4-phenylimidazole,
2- (3,5-dichlorobenzyl) -4-phenylimidazole,
2- (2,4-dibromobenzyl) -4-phenylimidazole,
4- (2-chlorophenyl) -2- (2,3-dichlorobenzyl) imidazole,
4- (2-chlorophenyl) -2- (2,4-dichlorobenzyl) imidazole,
4- (2-chlorophenyl) -2- (2,5-dichlorobenzyl) imidazole,
4- (2-chlorophenyl) -2- (2,6-dichlorobenzyl) imidazole,
4- (2-chlorophenyl) -2- (3,4-dichlorobenzyl) imidazole,
4- (2-chlorophenyl) -2- (3,5-dichlorobenzyl) imidazole,
4- (3-chlorophenyl) -2- (2,4-dichlorobenzyl) imidazole,
4- (3-chlorophenyl) -2- (2,6-dichlorobenzyl) imidazole,
4- (3-chlorophenyl) -2- (3,4-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,3-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,4-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,5-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,6-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (3,4-dichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (3,5-dichlorobenzyl) imidazole,
4- (2-bromophenyl) -2- (2,4-dichlorobenzyl) imidazole,
4- (2-bromophenyl) -2- (3,4-dichlorobenzyl) imidazole,
4- (4-Chlorophenyl) -2- (2,5-dibromobenzyl) imidazole 4- (4-bromophenyl) -2- (2,5-dibromobenzyl) imidazole 2- (2,3-dichlorobenzyl)- 4- (2,3-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (2,3-dichlorophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (2,4-dichlorophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (2,5-dichlorophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (2,6-dichlorophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2,3-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (2,5-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (2,6-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
2- (3,5-dichlorobenzyl) -4- (3,5-dichlorophenyl) imidazole,
4- (2,5-dibromophenyl) -2- (2,4-dichlorobenzyl) imidazole,
4- (2,5-dibromophenyl) -2- (3,4-dichlorobenzyl) imidazole,
2- (2,5-dibromobenzyl) -4- (3,4-dichlorophenyl) imidazole,
2- (2,4-dibromobenzyl) -4- (3,4-dibromophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (3,4,5-trichlorophenyl) imidazole,
2- (2,4-dichlorobenzyl) -4- (2,4,6-tribromophenyl) imidazole,
2- (2,4-dibromobenzyl) -4- (3,4,5-trichlorophenyl) imidazole,
2- (2,4-dibromobenzyl) -4- (2,4,5-tribromophenyl) imidazole,
4-phenyl-2- (3,4,5-trichlorobenzyl) imidazole,
4-phenyl-2- (2,4,5-tribromobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,3,6-trichlorobenzyl) imidazole,
4- (2-bromophenyl) -2- (3,4,5-trichlorobenzyl) imidazole,
4- (4-chlorophenyl) -2- (2,3,5-tribromobenzyl) imidazole,
4- (4-bromophenyl) -2- (2,4,6-tribromobenzyl) imidazole,
4- (2,4-dichlorophenyl) -2- (3,4,5-trichlorobenzyl) imidazole,
4- (2,4-dibromophenyl) -2- (3,4,5-trichlorobenzyl) imidazole,
4- (3,4-dichlorophenyl) -2- (2,4,5-tribromobenzyl) imidazole,
4- (2,5-dibromophenyl) -2- (2,3,5-tribromobenzyl) imidazole,
2- (3,4,5-trichlorobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
4- (2,4,5-tribromophenyl) -2- (3,4,5-trichlorobenzyl) imidazole,
2- (2,4,6-tribromobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
2- (2,4,6-tribromobenzyl) -4- (2,4,6-tribromophenyl) imidazole and the like.
同様に、例えばRがメチル基の場合を例示すると、
2−ベンジル−4−(2−クロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(3−クロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(4−クロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2−ブロモフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(3−ブロモフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(4−ブロモフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,4−ジブロモフェニル)−5−メチルイミダゾール、
2−ベンジル−4−(2,5−ジブロモフェニル)−5−メチルイミダゾール、
2−ベンジル−5−メチル−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−ベンジル−5−メチル−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−ベンジル−5−メチル−4−(2,4,5−トリブロモフェニル)イミダゾール、
2−(2−クロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(3−クロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(4−クロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2−ブロモベンジル)−5−メチル−4−フェニルイミダゾール、
2−(3−ブロモベンジル)−5−メチル−4−フェニルイミダゾール、
2−(4−ブロモベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2−クロロベンジル)−4−(2−クロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2−クロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾール、
4−(4−ブロモフェニル)−2−(2−クロロベンジル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(2−クロロフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(4−ブロモフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(3−クロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(3−クロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−クロロベンジル)−4−(2,4−ジブロモフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(4−ブロモベンジル)−4−(2,5−ジブロモフェニル)−5−メチルイミダゾール、
2−(2−クロロベンジル)−5−メチル−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−(4−クロロベンジル)−5−メチル−4−(2,4,5−トリブロモフェニル)イミダゾール、
2−(4−ブロモベンジル)−5−メチル−4−(2,4,5−トリクロロフェニル)イミダゾール、
2−(2−ブロモベンジル)−5−メチル−4−(2,4,6−トリブロモフェニル)イミダゾール、
2−(2,3−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2,4−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2,5−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2,6−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(3,4−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(3,5−ジクロロベンジル)−5−メチル−4−フェニルイミダゾール、
2−(2,4−ジブロモベンジル)−5−メチル−4−フェニルイミダゾール、
4−(2−クロロフェニル)−2−(2,3−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−クロロフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−クロロフェニル)−2−(2,5−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−クロロフェニル)−2−(2,6−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−クロロフェニル)−2−(3,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−クロロフェニル)−2−(3,5−ジクロロベンジル)−5−メチルイミダゾール、
4−(3−クロロフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(3−クロロフェニル)−2−(2,6−ジクロロベンジル)−5−メチルイミダゾール、
4−(3−クロロフェニル)−2−(3,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(2,3−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(2,5−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(2,6−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(3,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(3,5−ジクロロベンジル)−5−メチルイミダゾール、
4−(2−ブロモフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−ブロモフェニル)−2−(3,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(4−クロロフェニル)−2−(2,5−ジブロモベンジル)−5−メチルイミダゾール、
4−(4−ブロモフェニル)−2−(2,5−ジブロモベンジル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,3−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(2,6−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,3−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,5−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,6−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,4−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
2−(3,5−ジクロロベンジル)−4−(3,5−ジクロロフェニル)−5−メチルイミダゾール、
4−(2,5−ジブロモフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール、
4−(2,5−ジブロモフェニル)−2−(3,4−ジクロロベンジル)−5−メチルイミダゾール、
2−(2,5−ジブロモベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール、
2−(2,4−ジブロモベンジル)−4−(3,4−ジブロモフェニル)−5−メチルイミダゾール、
2−(2,4−ジクロロベンジル)−5−メチル−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−(3,4−ジクロロベンジル)−5−メチル−4−(2,4,6−トリブロモフェニル)イミダゾール、
2−(2,4−ジブロモベンジル)−5−メチル−4−(3,4,5−トリクロロフェニル)イミダゾール、
2−(2,4−ジブロモベンジル)−5−メチル−4−(2,4,5−トリブロモフェニル)イミダゾール、
5−メチル−4−フェニル−2−(3,4,5−トリクロロベンジル)イミダゾール、
5−メチル−4−フェニル−2−(2,4,5−トリブロモベンジル)イミダゾール、
4−(4−クロロフェニル)−5−メチル−2−(2,3,6−トリクロロベンジル)イミダゾール、
4−(4−ブロモフェニル)−5−メチル−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(4−クロロフェニル)−5−メチル−2−(2,3,5−トリブロモベンジル)イミダゾール、
4−(4−ブロモフェニル)−5−メチル−2−(2,4,6−トリブロモベンジル)イミダゾール、
4−(2,4−ジクロロフェニル)−5−メチル−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(2,4−ジブロモフェニル)−5−メチル−2−(3,4,5−トリクロロベンジル)イミダゾール、
4−(3,4−ジクロロフェニル)−5−メチル−2−(2,4,5−トリブロモベンジル)イミダゾール、
4−(2,5−ジブロモフェニル)−5−メチル−2−(2,3,5−トリブロモベンジル)イミダゾール、
5−メチル−2−(3,4,5−トリクロロベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
5−メチル−4−(2,4,5−トリブロモフェニル)−2−(3,4,5−トリクロロベンジル)イミダゾール、
5−メチル−2−(2,4,6−トリブロモベンジル)−4−(2,4,5−トリクロロフェニル)イミダゾール、
5−メチル−2−(2,4,6−トリブロモベンジル)−4−(2,4,6−トリブロモフェニル)イミダゾール等が挙げられる。
Similarly, for example, when R is a methyl group,
2-benzyl-4- (2-chlorophenyl) -5-methylimidazole,
2-benzyl-4- (3-chlorophenyl) -5-methylimidazole,
2-benzyl-4- (4-chlorophenyl) -5-methylimidazole,
2-benzyl-4- (2-bromophenyl) -5-methylimidazole,
2-benzyl-4- (3-bromophenyl) -5-methylimidazole,
2-benzyl-4- (4-bromophenyl) -5-methylimidazole,
2-benzyl-4- (2,3-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (2,4-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (2,5-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (2,6-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (3,4-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (3,5-dichlorophenyl) -5-methylimidazole,
2-benzyl-4- (2,4-dibromophenyl) -5-methylimidazole,
2-benzyl-4- (2,5-dibromophenyl) -5-methylimidazole,
2-benzyl-5-methyl-4- (2,4,5-trichlorophenyl) imidazole,
2-benzyl-5-methyl-4- (3,4,5-trichlorophenyl) imidazole,
2-benzyl-5-methyl-4- (2,4,5-tribromophenyl) imidazole,
2- (2-chlorobenzyl) -5-methyl-4-phenylimidazole,
2- (3-chlorobenzyl) -5-methyl-4-phenylimidazole,
2- (4-chlorobenzyl) -5-methyl-4-phenylimidazole,
2- (2-bromobenzyl) -5-methyl-4-phenylimidazole,
2- (3-bromobenzyl) -5-methyl-4-phenylimidazole,
2- (4-bromobenzyl) -5-methyl-4-phenylimidazole,
2- (2-chlorobenzyl) -4- (2-chlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (4-chlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2-chlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (4-chlorophenyl) -5-methylimidazole,
4- (4-bromophenyl) -2- (2-chlorobenzyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (2-chlorophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (4-chlorophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (4-bromophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (3-chlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (3-chlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (4-chlorobenzyl) -4- (2,4-dibromophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (4-bromobenzyl) -4- (2,5-dibromophenyl) -5-methylimidazole,
2- (2-chlorobenzyl) -5-methyl-4- (2,4,5-trichlorophenyl) imidazole,
2- (4-chlorobenzyl) -5-methyl-4- (2,4,5-tribromophenyl) imidazole,
2- (4-bromobenzyl) -5-methyl-4- (2,4,5-trichlorophenyl) imidazole,
2- (2-bromobenzyl) -5-methyl-4- (2,4,6-tribromophenyl) imidazole,
2- (2,3-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (2,4-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (2,5-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (2,6-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (3,4-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (3,5-dichlorobenzyl) -5-methyl-4-phenylimidazole,
2- (2,4-dibromobenzyl) -5-methyl-4-phenylimidazole,
4- (2-chlorophenyl) -2- (2,3-dichlorobenzyl) -5-methylimidazole,
4- (2-chlorophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole,
4- (2-chlorophenyl) -2- (2,5-dichlorobenzyl) -5-methylimidazole,
4- (2-chlorophenyl) -2- (2,6-dichlorobenzyl) -5-methylimidazole,
4- (2-chlorophenyl) -2- (3,4-dichlorobenzyl) -5-methylimidazole,
4- (2-chlorophenyl) -2- (3,5-dichlorobenzyl) -5-methylimidazole,
4- (3-chlorophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole,
4- (3-chlorophenyl) -2- (2,6-dichlorobenzyl) -5-methylimidazole,
4- (3-chlorophenyl) -2- (3,4-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (2,3-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (2,5-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (2,6-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (3,4-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (3,5-dichlorobenzyl) -5-methylimidazole,
4- (2-bromophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole,
4- (4-bromophenyl) -2- (3,4-dichlorobenzyl) -5-methylimidazole,
4- (4-chlorophenyl) -2- (2,5-dibromobenzyl) -5-methylimidazole,
4- (4-bromophenyl) -2- (2,5-dibromobenzyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (2,3-dichlorophenyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (2,5-dichlorophenyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (2,6-dichlorophenyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2,3-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (2,5-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (2,6-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (3,4-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
2- (3,5-dichlorobenzyl) -4- (3,5-dichlorophenyl) -5-methylimidazole,
4- (2,5-dibromophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole,
4- (2,5-dibromophenyl) -2- (3,4-dichlorobenzyl) -5-methylimidazole,
2- (2,5-dibromobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole,
2- (2,4-dibromobenzyl) -4- (3,4-dibromophenyl) -5-methylimidazole,
2- (2,4-dichlorobenzyl) -5-methyl-4- (3,4,5-trichlorophenyl) imidazole,
2- (3,4-dichlorobenzyl) -5-methyl-4- (2,4,6-tribromophenyl) imidazole,
2- (2,4-dibromobenzyl) -5-methyl-4- (3,4,5-trichlorophenyl) imidazole,
2- (2,4-dibromobenzyl) -5-methyl-4- (2,4,5-tribromophenyl) imidazole,
5-methyl-4-phenyl-2- (3,4,5-trichlorobenzyl) imidazole,
5-methyl-4-phenyl-2- (2,4,5-tribromobenzyl) imidazole,
4- (4-chlorophenyl) -5-methyl-2- (2,3,6-trichlorobenzyl) imidazole,
4- (4-bromophenyl) -5-methyl-2- (3,4,5-trichlorobenzyl) imidazole,
4- (4-chlorophenyl) -5-methyl-2- (2,3,5-tribromobenzyl) imidazole,
4- (4-bromophenyl) -5-methyl-2- (2,4,6-tribromobenzyl) imidazole,
4- (2,4-dichlorophenyl) -5-methyl-2- (3,4,5-trichlorobenzyl) imidazole,
4- (2,4-dibromophenyl) -5-methyl-2- (3,4,5-trichlorobenzyl) imidazole,
4- (3,4-dichlorophenyl) -5-methyl-2- (2,4,5-tribromobenzyl) imidazole,
4- (2,5-dibromophenyl) -5-methyl-2- (2,3,5-tribromobenzyl) imidazole,
5-methyl-2- (3,4,5-trichlorobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
5-methyl-4- (2,4,5-tribromophenyl) -2- (3,4,5-trichlorobenzyl) imidazole,
5-methyl-2- (2,4,6-tribromobenzyl) -4- (2,4,5-trichlorophenyl) imidazole,
And 5-methyl-2- (2,4,6-tribromobenzyl) -4- (2,4,6-tribromophenyl) imidazole.
これらのイミダゾール化合物は、水に溶解させて調製した表面処理剤の有効成分として使用される。これらのイミダゾール化合物は表面処理剤中に、0.01〜10重量%の割合、好ましくは0.1〜5重量%の割合で含有される。イミダゾール化合物の含有割合が0.01重量%より少ないと、銅表面に形成される化成皮膜の膜厚が薄くなり、銅表面の酸化を十分に防止することができない。また、10重量%より多い場合には表面処理剤中にイミダゾール化合物が溶け残ったり、あるいは完溶したとしても再析出する虞があり好ましくない。
なお、本発明の実施においては、化学式(I)で示されるイミダゾール化合物のうち、適宜の1種類のみを使用する他、種類の異なるイミダゾール化合物を組み合わせて使用することも可能である。
These imidazole compounds are used as an active ingredient of a surface treatment agent prepared by dissolving in water. These imidazole compounds are contained in the surface treatment agent in a proportion of 0.01 to 10% by weight, preferably in a proportion of 0.1 to 5% by weight. When the content ratio of the imidazole compound is less than 0.01% by weight, the film thickness of the chemical conversion film formed on the copper surface becomes thin, and oxidation of the copper surface cannot be sufficiently prevented. On the other hand, when the amount is more than 10% by weight, the imidazole compound remains undissolved in the surface treatment agent or may be re-precipitated even if it is completely dissolved.
In the practice of the present invention, among the imidazole compounds represented by the chemical formula (I), only one appropriate type may be used, or different types of imidazole compounds may be used in combination.
本発明の実施において、イミダゾール化合物を水に溶解(水溶液化)するに当たっては、一般的には、酸として有機酸または無機酸を使用するが、少量の有機溶媒を併用しても良い。この際に使用される代表的な有機酸としては、蟻酸、酢酸、プロピオン酸、酪酸、グリオキシル酸、ピルビン酸、アセト酢酸、レブリン酸、ヘプタン酸、カプリル酸、カプリン酸、ラウリン酸、グリコール酸、グリセリン酸、乳酸、アクリル酸、メトキシ酢酸、エトキシ酢酸、プロポキシ酢酸、ブトキシ酢酸、2−(2−メトキシエトキシ)酢酸、2−[2−(2−エトキシエトキシ)エトキシ]酢酸、2−{2−[2−(2−エトキシエトキシ)エトキシ]エトキシ}酢酸、3−メトキシプロピオン酸、3−エトキシプロピオン酸、3−プロポキシプロピオン酸、3−ブトキシプロピオン酸、安息香酸、パラニトロ安息香酸、パラトルエンスルホン酸、サリチル酸、ピクリン酸、蓚酸、コハク酸、マレイン酸、フマール酸、酒石酸、アジピン酸等が挙げられ、無機酸としては、塩酸、リン酸、硫酸、硝酸等が挙げられる。これらの酸は、表面処理剤中に0.1〜50重量%の割合、好ましくは1〜30重量%の割合で含有される。 In the practice of the present invention, an organic acid or an inorganic acid is generally used as an acid for dissolving (making an aqueous solution) an imidazole compound in water, but a small amount of an organic solvent may be used in combination. Typical organic acids used in this case include formic acid, acetic acid, propionic acid, butyric acid, glyoxylic acid, pyruvic acid, acetoacetic acid, levulinic acid, heptanoic acid, caprylic acid, capric acid, lauric acid, glycolic acid, Glyceric acid, lactic acid, acrylic acid, methoxyacetic acid, ethoxyacetic acid, propoxyacetic acid, butoxyacetic acid, 2- (2-methoxyethoxy) acetic acid, 2- [2- (2-ethoxyethoxy) ethoxy] acetic acid, 2- {2- [2- (2-Ethoxyethoxy) ethoxy] ethoxy} acetic acid, 3-methoxypropionic acid, 3-ethoxypropionic acid, 3-propoxypropionic acid, 3-butoxypropionic acid, benzoic acid, paranitrobenzoic acid, paratoluenesulfonic acid , Salicylic acid, picric acid, succinic acid, succinic acid, maleic acid, fumaric acid, tartaric acid, adipic acid Acid, and examples of the inorganic acids, hydrochloric acid, phosphoric acid, sulfuric acid, and nitric acid. These acids are contained in the surface treatment agent in a proportion of 0.1 to 50% by weight, preferably 1 to 30% by weight.
また、有機溶媒としては、メタノール、エタノール、イソプロピルアルコールなどの低級アルコールあるいはアセトン、N,N−ジメチルホルムアミド、エチレングリコール等の水と自由に混和するものが適している。 As the organic solvent, those which are freely miscible with water such as lower alcohols such as methanol, ethanol and isopropyl alcohol or water such as acetone, N, N-dimethylformamide and ethylene glycol are suitable.
本発明の表面処理剤には、銅または銅合金の表面における化成皮膜の形成速度を速めるために銅化合物を添加することができ、また形成された化成皮膜の耐熱性を更に向上させるために亜鉛化合物を添加しても良い。
前記銅化合物の代表的なものとしては、酢酸銅、塩化第一銅、塩化第二銅、臭化第一銅、臭化第二銅、ヨウ化銅、水酸化銅、リン酸銅、硫酸銅、硝酸銅等であり、また前記亜鉛化合物の代表的なものとしては、酸化亜鉛、蟻酸亜鉛、酢酸亜鉛、蓚酸亜鉛、乳酸亜鉛、クエン酸亜鉛、硫酸亜鉛、硝酸亜鉛、リン酸亜鉛等が挙げられ、何れも表面処理剤中に0.01〜10重量%の割合、好ましくは0.02〜5重量%の割合で含有させれば良い。
A copper compound can be added to the surface treatment agent of the present invention in order to increase the formation rate of the chemical conversion film on the surface of copper or copper alloy, and zinc can be added to further improve the heat resistance of the formed chemical conversion film. A compound may be added.
Representative examples of the copper compound include copper acetate, cuprous chloride, cupric chloride, cuprous bromide, cupric bromide, copper iodide, copper hydroxide, copper phosphate, copper sulfate. Typical examples of the zinc compound include zinc oxide, zinc formate, zinc acetate, zinc oxalate, zinc lactate, zinc citrate, zinc sulfate, zinc nitrate, zinc phosphate and the like. In any case, the surface treatment agent may contain 0.01 to 10% by weight, preferably 0.02 to 5% by weight.
これらの銅化合物や亜鉛化合物を用いる場合には、有機酸または無機酸の他に、アンモニアあるいはモノエタノールアミン、ジエタノールアミン、トリエタノールアミンなどのアミン類等の緩衝作用を有する物質を添加して溶液のpHを安定にすることが好ましい。 When these copper compounds and zinc compounds are used, in addition to organic or inorganic acids, substances having a buffering action such as ammonia or amines such as monoethanolamine, diethanolamine and triethanolamine are added to the solution. It is preferable to stabilize the pH.
本発明の表面処理剤には、化成皮膜の形成速度および該皮膜の耐熱性を更に向上させるために、ハロゲン化合物を表面処理剤中に0.001〜1重量%、好ましくは0.01〜0.1重量%の含有割合となるように添加することができる。ハロゲン化合物としては、例えばフッ化ナトリウム、フッ化カリウム、フッ化アンモニウム、塩化ナトリム、塩化カリウム、塩化アンモニウム、臭化ナトリウム、臭化カリウム、臭化アンモニウム、ヨウ化ナトリム、ヨウ化カリウム、ヨウ化アンモニウム等が挙げられる。 In the surface treatment agent of the present invention, a halogen compound is added in an amount of 0.001 to 1% by weight, preferably 0.01 to 0% in the surface treatment agent in order to further improve the formation rate of the chemical conversion film and the heat resistance of the film. .1% by weight can be added. Examples of the halogen compound include sodium fluoride, potassium fluoride, ammonium fluoride, sodium chloride, potassium chloride, ammonium chloride, sodium bromide, potassium bromide, ammonium bromide, sodium iodide, potassium iodide, and ammonium iodide. Etc.
本発明の表面処理剤を用いて銅または銅合金の表面を処理する際の条件としては、表面処理剤の液温を10〜70℃、接触時間を1秒〜10分とすることが好ましい。接触方法としては、浸漬、噴霧、塗布等の方法が挙げられる。 As conditions for treating the surface of copper or a copper alloy using the surface treatment agent of the present invention, it is preferable that the liquid temperature of the surface treatment agent is 10 to 70 ° C. and the contact time is 1 second to 10 minutes. Examples of the contact method include dipping, spraying, and application methods.
また本発明の表面処理を行った後、化成皮膜上に熱可塑性樹脂により二重構造を形成し、更に耐熱性を高めることも可能である。
即ち、銅または銅合金の表面上に化成皮膜を生成させた後、ロジン、ロジンエステル等のロジン誘導体、テルペン樹脂、テルペンフェノール樹脂等のテルペン樹脂誘導体、芳香族炭化水素樹脂、脂肪族炭化水素樹脂等の炭化水素樹脂やこれらの混合物からなる耐熱性に優れた熱可塑性樹脂を、トルエン、酢酸エチル、イソプロピルアルコール等の溶媒に溶解し、ロールコーター等により化成皮膜上に膜厚1〜30μmの厚みになるように均一に塗布して、化成皮膜と熱可塑性樹脂の二重構造を形成させれば良い。
Moreover, after performing the surface treatment of this invention, it is also possible to form a double structure with a thermoplastic resin on a chemical conversion film, and to further improve heat resistance.
That is, after forming a chemical conversion film on the surface of copper or copper alloy, rosin derivatives such as rosin and rosin ester, terpene resin derivatives such as terpene resin and terpene phenol resin, aromatic hydrocarbon resin and aliphatic hydrocarbon resin A thermoplastic resin excellent in heat resistance composed of a hydrocarbon resin such as the above or a mixture thereof is dissolved in a solvent such as toluene, ethyl acetate, isopropyl alcohol, and the thickness of 1 to 30 μm on the chemical conversion film by a roll coater or the like. It is sufficient to apply uniformly to form a double structure of the chemical conversion film and the thermoplastic resin.
本発明の実施に適する無鉛半田としては、Sn−Ag−Cu系、Sn−Ag−Bi系、Sn−Bi系、Sn−Ag−Bi−In系、Sn−Zn系、Sn−Cu系等の無鉛半田が挙げられる。 Lead-free solders suitable for the practice of the present invention include Sn—Ag—Cu, Sn—Ag—Bi, Sn—Bi, Sn—Ag—Bi—In, Sn—Zn, Sn—Cu, etc. Lead-free solder is mentioned.
また本発明の半田付け方法は、加熱溶融した液体状の半田が入っている半田槽の上を、プリント配線板を流し、電子部品とプリント配線板の接合部に半田付けを行なうフロー法または、予めプリント配線板にペースト状のクリーム半田を回路パターンに合わせて印刷し、そこに電子部品を実装し、プリント配線板を加熱して半田を溶融させ、半田付けを行うリフロー法等に適応し得るものである。 In addition, the soldering method of the present invention is a flow method in which a printed wiring board is flowed over a solder bath containing heated and melted liquid solder, and soldering is performed on the joint between the electronic component and the printed wiring board, or It can be applied to the reflow method, etc., in which paste-like cream solder is printed on the printed wiring board according to the circuit pattern in advance, electronic components are mounted on the printed wiring board, the printed wiring board is heated to melt the solder, and soldering is performed. Is.
以下、本発明を実施例及び比較例によって具体的に説明するが、本発明はこれらに限定されるものではない。
なお、実施例及び比較例で使用したイミダゾール化合物ならびに評価試験方法は次のとおりである。
EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention concretely, this invention is not limited to these.
In addition, the imidazole compound used in the Example and the comparative example and the evaluation test method are as follows.
[イミダゾール化合物]
実施例に使用したイミダゾール化合物は以下のとおりであり、合成例を参考例2〜20に示す。なお、参考例1には、参考例2のイミダゾール化合物の原料となる(4−クロロフェニル)アセトアミジン塩酸塩の合成例を示す。
[Imidazole compound]
The imidazole compounds used in the examples are as follows, and synthesis examples are shown in Reference Examples 2 to 20. Reference Example 1 shows a synthesis example of (4-chlorophenyl) acetamidine hydrochloride, which is a raw material for the imidazole compound of Reference Example 2.
・2−(4−クロロベンジル)−4−フェニルイミダゾール(「A−1」と略記する)
・2−ベンジル−4−(4−クロロフェニル)−5−メチルイミダゾール(「A−2」と略記する)
・2−(2−クロロベンジル)−5−メチル−4−フェニルイミダゾール(「A−3」と略記する)
・2−(2−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾール(「B−1」と略記する)
・2−(4−クロロベンジル)−4−(2−クロロフェニル)−5−メチルイミダゾール(「B−2」と略記する)
・2−(4−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾール(「B−3」と略記する)
・2−(2,4−ジクロロベンジル)−4−フェニルイミダゾール(「C−1」と略記する)
・2−ベンジル−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール(「C−2」と略記する)
・5−ヘキシル−4−フェニル−2−(3,4,5−トリクロロベンジル)イミダゾール(「C−3」と略記する)
・4−(4−クロロフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール(「D−1」と略記する)
・4−(4−ブロモフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾール(「D−2」と略記する)
・2−(2−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール(「D−3」と略記する)
・2−(4−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾール(「D−4」と略記する)
・2−(4−ブロモベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール(「D−5」と略記する)
・2−(4−ブロモベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール(「D−6」と略記する)
・2−(4−クロロベンジル)−5−メチル−4−(3,4,5−トリクロロフェニル)イミダゾール(「D−7」と略記する)
・2−(2,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾール(「E−1」と略記する)
・2−(2,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール(「E−2」と略記する)
・2−(3,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾール(「E−3」と略記する)
2- (4-chlorobenzyl) -4-phenylimidazole (abbreviated as “A-1”)
2-Benzyl-4- (4-chlorophenyl) -5-methylimidazole (abbreviated as “A-2”)
2- (2-chlorobenzyl) -5-methyl-4-phenylimidazole (abbreviated as “A-3”)
2- (2-chlorobenzyl) -4- (4-chlorophenyl) -5-methylimidazole (abbreviated as “B-1”)
2- (4-chlorobenzyl) -4- (2-chlorophenyl) -5-methylimidazole (abbreviated as “B-2”)
2- (4-chlorobenzyl) -4- (4-chlorophenyl) -5-methylimidazole (abbreviated as “B-3”)
2- (2,4-dichlorobenzyl) -4-phenylimidazole (abbreviated as “C-1”)
2-Benzyl-4- (2,4-dichlorophenyl) -5-methylimidazole (abbreviated as “C-2”)
5-hexyl-4-phenyl-2- (3,4,5-trichlorobenzyl) imidazole (abbreviated as “C-3”)
4- (4-chlorophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole (abbreviated as “D-1”)
4- (4-Bromophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole (abbreviated as “D-2”)
2- (2-chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole (abbreviated as “D-3”)
2- (4-Chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole (abbreviated as “D-4”)
2- (4-bromobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole (abbreviated as “D-5”)
2- (4-bromobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole (abbreviated as “D-6”)
2- (4-chlorobenzyl) -5-methyl-4- (3,4,5-trichlorophenyl) imidazole (abbreviated as “D-7”)
2- (2,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole (abbreviated as “E-1”)
2- (2,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole (abbreviated as “E-2”)
2- (3,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole (abbreviated as “E-3”)
なお、符号A〜Eは前述のとおり、各々(A)ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が1つ置換したイミダゾール化合物、(B)ベンジル基およびフェニル基の両方にハロゲン原子が1つ置換したイミダゾール化合物、(C)ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が2つ以上置換したイミダゾール化合物、(D)ベンジル基またはフェニル基のどちらか一方にハロゲン原子が2つ以上置換し、其の他方にはハロゲン原子が1つ置換したイミダゾール化合物、(E)ベンジル基およびフェニル基の両方にハロゲン原子が2つ以上置換したイミダゾール化合物であることを表す。 As described above, the symbols A to E are (A) an imidazole compound in which one of the benzyl group and the phenyl group is substituted with one halogen atom, and (B) a halogen atom in both the benzyl group and the phenyl group. One substituted imidazole compound, (C) an imidazole compound in which only one of the benzyl group and the phenyl group is substituted with two or more halogen atoms, and (D) two halogen atoms in either the benzyl group or the phenyl group It represents that it is an imidazole compound substituted with one or more halogen atoms and (E) an imidazole compound substituted with two or more halogen atoms on both the benzyl group and the phenyl group.
〔参考例1〕
<(4−クロロフェニル)アセトアミジン塩酸塩の合成>
(4−クロロフェニル)アセトニトリル137.2g(0.905mol)及び脱水エタノール51.1g(1.11mol)からなる溶液へ、冷却下15〜20℃にて、塩化水素ガス36.7g(1.01mol)を2時間かけて吹き込んだ。吹き込みの途中から固体が生成した。該反応混合物を室温に一晩おくと白色固体として(4−クロロフェニル)アセトイミド酸エチル塩酸塩が得られた。該固体を砕いた後、氷冷下に振とうしながら、アンモニア28.4g(1.67mol)及び脱水エタノール250gからなる溶液を少しずつ加えた。加え終わった後氷冷下にて1時間、室温に戻して一晩撹拌し、白色固体の不溶物をろ去後、ろ液を減圧乾固して、白色結晶の(4−クロロフェニル)アセトアミジン塩酸塩 178g(0.868mol、収率96%)を得た。
[Reference Example 1]
<Synthesis of (4-chlorophenyl) acetamidine hydrochloride>
To a solution consisting of 137.2 g (0.905 mol) of (4-chlorophenyl) acetonitrile and 51.1 g (1.11 mol) of dehydrated ethanol, 36.7 g (1.01 mol) of hydrogen chloride gas at 15 to 20 ° C. under cooling. Was blown in over 2 hours. A solid formed during the blowing. The reaction mixture was left at room temperature overnight to give ethyl (4-chlorophenyl) acetimidate as a white solid. After crushing the solid, a solution consisting of 28.4 g (1.67 mol) of ammonia and 250 g of dehydrated ethanol was added little by little while shaking under ice cooling. After the addition was completed, the mixture was returned to room temperature for 1 hour under ice-cooling and stirred overnight. After filtering off the white solid insoluble matter, the filtrate was evaporated to dryness under reduced pressure to give (4-chlorophenyl) acetamidine as white crystals. 178 g (0.868 mol, yield 96%) of hydrochloride was obtained.
〔参考例2〕
<A−1の合成>
(4−クロロフェニル)アセトアミジン塩酸塩61.5g(0.30mol)及びテトラヒドロフラン250mlからなる溶液にソジウムメチラート16.2g(0.30mol)を加え、50℃にて1時間加熱後、次いで炭酸カリウム83g(0.60mol)を加え、該懸濁液に、2−ブロモアセトフェノン59.7g(0.30mol)及びテトラヒドロフラン200mlからなる溶液を50〜55℃にて滴下した。滴下終了後、2時間加熱還流した。次いで、反応液を室温まで冷却して不溶物をろ去し、ろ液を減圧濃縮し、濃縮物を水で洗浄後、トルエンで撹拌処理すると結晶が析出した。ろ取した該結晶を、メタノール中活性炭で脱色後、再結晶して、微桃色結晶の2−(4−クロロベンジル)−4−フェニルイミダゾール25g(0.093mol、収率31%)を得た。
[Reference Example 2]
<Synthesis of A-1>
16.2 g (0.30 mol) of sodium methylate was added to a solution consisting of 61.5 g (0.30 mol) of (4-chlorophenyl) acetamidine hydrochloride and 250 ml of tetrahydrofuran, heated at 50 ° C. for 1 hour, and then carbonated. 83 g (0.60 mol) of potassium was added, and a solution consisting of 59.7 g (0.30 mol) of 2-bromoacetophenone and 200 ml of tetrahydrofuran was added dropwise to the suspension at 50 to 55 ° C. After completion of the dropwise addition, the mixture was heated to reflux for 2 hours. Next, the reaction solution was cooled to room temperature, insolubles were removed by filtration, the filtrate was concentrated under reduced pressure, and the concentrate was washed with water and then stirred with toluene to precipitate crystals. The crystals collected by filtration were decolorized with activated carbon in methanol and recrystallized to obtain 25 g (0.093 mol, 31% yield) of 2- (4-chlorobenzyl) -4-phenylimidazole as slightly pink crystals. .
〔参考例3〕
<A−2の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルをフェニルアセトニトリルに代えて、参考例1の方法に準拠してフェニルアセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩をフェニルアセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−4´−クロロプロピオフェノンに代えて、参考例2の方法に準拠して2−ベンジル−4−(4−クロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 3]
<Synthesis of A-2>
First, phenylacetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with phenylacetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with phenylacetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromo-4′-chloropropiophenone, and conforming to the method of Reference Example 2 Thus, 2-benzyl-4- (4-chlorophenyl) -5-methylimidazole was synthesized.
〔参考例4〕
<A−3の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2−クロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2−クロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2−クロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモプロピオフェノンに代えて、参考例2の方法に準拠して2−(2−クロロベンジル)−5−メチル−4−フェニルイミダゾールを合成した。
[Reference Example 4]
<Synthesis of A-3>
First, (2-chlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2-chlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2-chlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromopropiophenone, and the method of Reference Example 2 was followed. 2- (2-chlorobenzyl) -5-methyl-4-phenylimidazole was synthesized.
〔参考例5〕
<B−1の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2−クロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2−クロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2−クロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−4´−クロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(2−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 5]
<Synthesis of B-1>
First, (2-chlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2-chlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2-chlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromo-4′-chloropropiophenone, Reference Example 2 2- (2-Chlorobenzyl) -4- (4-chlorophenyl) -5-methylimidazole was synthesized according to the above method.
〔参考例6〕
<B−2の合成>
参考例2の2−ブロモアセトフェノンを2−ブロモ−2´−クロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(4−クロロベンジル)−4−(2−クロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 6]
<Synthesis of B-2>
Instead of 2-bromoacetophenone in Reference Example 2 with 2-bromo-2′-chloropropiophenone, 2- (4-chlorobenzyl) -4- (2-chlorophenyl)- 5-methylimidazole was synthesized.
〔参考例7〕
<B−3の合成>
参考例2の2−ブロモアセトフェノンを2−ブロモ−4´−クロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(4−クロロベンジル)−4−(4−クロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 7]
<Synthesis of B-3>
Instead of 2-bromoacetophenone in Reference Example 2 with 2-bromo-4′-chloropropiophenone, 2- (4-chlorobenzyl) -4- (4-chlorophenyl)- 5-methylimidazole was synthesized.
〔参考例8〕
<C−1の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に代えて、参考例2の方法に準拠して2−(2,4−ジクロロベンジル)−4−フェニルイミダゾールを合成した。
[Reference Example 8]
<Synthesis of C-1>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride, and 2- (2,4-dichlorobenzyl) was used according to the method of Reference Example 2. -4-Phenylimidazole was synthesized.
〔参考例9〕
<C−2の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルをフェニルアセトニトリルに代えて、参考例1の方法に準拠してフェニルアセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩をフェニルアセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−2´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−ベンジル−4−(2,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 9]
<Synthesis of C-2>
First, phenylacetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with phenylacetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with phenylacetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromo-2 ′, 4′-dichloropropiophenone. According to the method, 2-benzyl-4- (2,4-dichlorophenyl) -5-methylimidazole was synthesized.
〔参考例10〕
<C−3の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(3,4,5−トリクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(3,4,5−トリクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(3,4,5−トリクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモオクタノフェノンに代えて、参考例2の方法に準拠して5−ヘキシル−4−フェニル−2−(3,4,5−トリクロロベンジル)イミダゾールを合成した。
[Reference Example 10]
<Synthesis of C-3>
First, (3,4,5-trichlorophenyl) acetamidine hydrochloride is used in accordance with the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (3,4,5-trichlorophenyl) acetonitrile. A salt was synthesized.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (3,4,5-trichlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromooctanophenone, Reference Example 2 According to the method of 5-hexyl-4-phenyl-2- (3,4,5-trichlorobenzyl) imidazole was synthesized.
〔参考例11〕
<D−1の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−4´−クロロプロピオフェノンに代えて、参考例2の方法に準拠して4−(4−クロロフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾールを合成した。
[Reference Example 11]
<Synthesis of D-1>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-4′-chloropropiophenone. According to the method of Example 2, 4- (4-chlorophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole was synthesized.
〔参考例12〕
<D−2の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2,4´−ジブロモプロピオフェノンに代えて、参考例2の方法に準拠して4−(4−ブロモフェニル)−2−(2,4−ジクロロベンジル)−5−メチルイミダゾールを合成した。
[Reference Example 12]
<Synthesis of D-2>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2,4′-dibromopropiophenone, Reference Example 2 According to the method of 4- (4-bromophenyl) -2- (2,4-dichlorobenzyl) -5-methylimidazole was synthesized.
〔参考例13〕
<D−3の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2−クロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2−クロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2−クロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−2´,4´−ジクロロアセトフェノンに代えて、参考例2の方法に準拠して2−(2−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾールを合成した。
[Reference Example 13]
<Synthesis of D-3>
First, (2-chlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2-chlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2-chlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromo-2 ′, 4′-dichloroacetophenone, Reference Example According to the method of 2, 2- (2-chlorobenzyl) -4- (2,4-dichlorophenyl) imidazole was synthesized.
〔参考例14〕
<D−4の合成>
参考例2の2−ブロモアセトフェノンを2−ブロモ−2´,4´−ジクロロアセトフェノンに代えて、参考例2の方法に準拠して2−(4−クロロベンジル)−4−(2,4−ジクロロフェニル)イミダゾールを合成した。
[Reference Example 14]
<Synthesis of D-4>
The 2-bromoacetophenone of Reference Example 2 was replaced with 2-bromo-2 ′, 4′-dichloroacetophenone, and 2- (4-chlorobenzyl) -4- (2,4- Dichlorophenyl) imidazole was synthesized.
〔参考例15〕
<D−5の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(4−ブロモフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(4−ブロモフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(4−ブロモフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−2´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(4−ブロモベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 15]
<Synthesis of D-5>
First, (4-bromophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (4-bromophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (4-bromophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-2 ′, 4′-dichloropropiophenone. According to the method of Reference Example 2, 2- (4-bromobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole was synthesized.
〔参考例16〕
<D−6の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(4−ブロモフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(4−ブロモフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(4−ブロモフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−3´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(4−ブロモベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 16]
<Synthesis of D-6>
First, (4-bromophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (4-bromophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (4-bromophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-3 ′, 4′-dichloropropiophenone. According to the method of Reference Example 2, 2- (4-bromobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole was synthesized.
〔参考例17〕
<D−7の合成>
参考例2の2−ブロモアセトフェノンを2−ブロモ−3´,4´,5´−トリクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(4−クロロベンジル)−5−メチル−4−(3,4,5−トリクロロフェニル)イミダゾールを合成した。
[Reference Example 17]
<Synthesis of D-7>
In place of 2-bromoacetophenone in Reference Example 2 instead of 2-bromo-3 ′, 4 ′, 5′-trichloropropiophenone, 2- (4-chlorobenzyl) -5-5- Methyl-4- (3,4,5-trichlorophenyl) imidazole was synthesized.
〔参考例18〕
<E−1の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−2´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(2,4−ジクロロベンジル)−4−(2,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 18]
<Synthesis of E-1>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-2 ′, 4′-dichloropropiophenone. Then, 2- (2,4-dichlorobenzyl) -4- (2,4-dichlorophenyl) -5-methylimidazole was synthesized according to the method of Reference Example 2.
〔参考例19〕
<E−2の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−3´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(2,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 19]
<Synthesis of E-2>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-3 ′, 4′-dichloropropiophenone. According to the method of Reference Example 2, 2- (2,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole was synthesized.
〔参考例20〕
<E−3の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(3,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(3,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(3,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−3´,4´−ジクロロプロピオフェノンに代えて、参考例2の方法に準拠して2−(3,4−ジクロロベンジル)−4−(3,4−ジクロロフェニル)−5−メチルイミダゾールを合成した。
[Reference Example 20]
<Synthesis of E-3>
First, (3,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (3,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (3,4-dichlorophenyl) acetamidine hydrochloride, and 2-bromoacetophenone was replaced with 2-bromo-3 ′, 4′-dichloropropiophenone. Then, 2- (3,4-dichlorobenzyl) -4- (3,4-dichlorophenyl) -5-methylimidazole was synthesized according to the method of Reference Example 2.
比較例に使用したイミダゾール化合物は、以下のとおりである。
・2−ベンジル−4−フェニルイミダゾール(「Z−1」と略記する)
・2−ベンジル−5−クロロ−4−メチルイミダゾール(「Z−2」と略記する)
・2−(4−クロロベンジル)イミダゾール(「Z−3」と略記する)
・2−(2,4−ジクロロベンジル)−4,5−ジフェニルイミダゾール(「Z−4」と略記する)
・4−メチル−2−フェニルイミダゾール(「Z−5」と略記する)
・2−(4−クロロベンジル)ベンズイミダゾール(「Z−6」と略記する)
The imidazole compounds used in the comparative examples are as follows.
2-Benzyl-4-phenylimidazole (abbreviated as “Z-1”)
2-Benzyl-5-chloro-4-methylimidazole (abbreviated as “Z-2”)
2- (4-Chlorobenzyl) imidazole (abbreviated as “Z-3”)
2- (2,4-dichlorobenzyl) -4,5-diphenylimidazole (abbreviated as “Z-4”)
4-methyl-2-phenylimidazole (abbreviated as “Z-5”)
2- (4-Chlorobenzyl) benzimidazole (abbreviated as “Z-6”)
Z−1、Z−2、Z−3およびZ−4の合成例を参考例21〜24に示す。Z−5およびZ−6については、各々四国化成工業社製の商品名「キュアゾール2P4MZ」ならびに和光純薬工業社製試薬を使用した。 Reference examples 21 to 24 show synthesis examples of Z-1, Z-2, Z-3, and Z-4. For Z-5 and Z-6, trade names “CUREZOL 2P4MZ” manufactured by Shikoku Kasei Kogyo Co., Ltd. and reagents manufactured by Wako Pure Chemical Industries, Ltd. were used.
〔参考例21〕
<Z−1の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルをフェニルアセトニトリルに代えて、参考例1の方法に準拠してフェニルアセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩をフェニルアセトアミジン塩酸塩に代えて、参考例2の方法に準拠して2−ベンジル−4−フェニルイミダゾールを合成した。
[Reference Example 21]
<Synthesis of Z-1>
First, phenylacetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with phenylacetonitrile.
Subsequently, 2-benzyl-4-phenylimidazole was synthesized according to the method of Reference Example 2 by replacing (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 with phenylacetamidine hydrochloride.
〔参考例22〕
<Z−2の合成>
2−ベンジル−4−メチルイミダゾール(POLY ORGANIX社製、「2B4MI」)16g(0.093mol)及びエタノール100mlからなる溶液に、室温下、N−クロロスクシンイミド13.3g(0.1mol)を少しずつ加え、1時間撹拌した後、反応液を減圧乾固し、乾固物を熱水で洗浄し、次いでアセトニトリルから再結晶し、うすいベージュをおびた針状晶として、2−ベンジル−5−クロロ−4−メチルイミダゾールを8.5g(0.041mol、収率44%)得た。
[Reference Example 22]
<Synthesis of Z-2>
To a solution consisting of 16 g (0.093 mol) of 2-benzyl-4-methylimidazole (POLY ORGANIX, “2B4MI”) and 100 ml of ethanol, 13.3 g (0.1 mol) of N-chlorosuccinimide was gradually added at room temperature. In addition, after stirring for 1 hour, the reaction solution was dried under reduced pressure, and the dried product was washed with hot water and then recrystallized from acetonitrile to give 2-benzyl-5-chloro as needle crystals with a light beige color. 8.5 g (0.041 mol, yield 44%) of -4-methylimidazole was obtained.
〔参考例23〕
<Z−3の合成>
(4−クロロフェニル)アセトニトリル52.0g(0.343mol)、エチレンジアミン22.8g(0.38mol)及び硫黄0.21g(6.5mmol)からなる液を加熱撹拌し、150℃から280℃まで2時間かけて昇温した。放冷後、水酸化ナトリウム1.0g及びメタノール10mlからなる溶液を加え、3時間加熱還流した。反応物を減圧濃縮した後、濃縮物を減圧蒸留し、沸点163−170℃/4mmHg留分として、2−(4−クロロベンジル)イミダゾリンを43g(0.22mol、収率64%)得た。
次いで、上記2−(4−クロロベンジル)イミダゾリン21g(0.108mol)及びジオキサン250mlからなる溶液に、室温下、過マンガン酸カリウム27g(0.17mol)を少しずつ加え、8時間加熱還流した後、不溶物をろ去し、ろ液を減圧乾固し、乾固物を水で洗浄後、水−アセトニトリルから再結晶し、乳白色結晶として、2−(4−クロロベンジル)イミダゾール13.5g(0.070mol、収率65%)を得た。
[Reference Example 23]
<Synthesis of Z-3>
A solution consisting of 52.0 g (0.343 mol) of (4-chlorophenyl) acetonitrile, 22.8 g (0.38 mol) of ethylenediamine and 0.21 g (6.5 mmol) of sulfur was heated and stirred, and 150 ° C. to 280 ° C. for 2 hours. The temperature increased over time. After allowing to cool, a solution consisting of 1.0 g of sodium hydroxide and 10 ml of methanol was added and heated to reflux for 3 hours. After the reaction product was concentrated under reduced pressure, the concentrate was distilled under reduced pressure to obtain 43 g (0.22 mol, yield 64%) of 2- (4-chlorobenzyl) imidazoline as a fraction having a boiling point of 163-170 ° C./4 mmHg.
Next, 27 g (0.17 mol) of potassium permanganate was added little by little at room temperature to a solution consisting of 21 g (0.108 mol) of 2- (4-chlorobenzyl) imidazoline and 250 ml of dioxane, and the mixture was heated to reflux for 8 hours. Insoluble matter was removed by filtration, the filtrate was evaporated to dryness under reduced pressure, and the dried product was washed with water and recrystallized from water-acetonitrile to give 13.5 g of 2- (4-chlorobenzyl) imidazole as milky white crystals ( 0.070 mol, yield 65%) was obtained.
〔参考例24〕
<Z−4の合成>
まず、参考例1の(4−クロロフェニル)アセトニトリルを(2,4−ジクロロフェニル)アセトニトリルに代えて、参考例1の方法に準拠して(2,4−ジクロロフェニル)アセトアミジン塩酸塩を合成した。
次いで、参考例2の(4−クロロフェニル)アセトアミジン塩酸塩を(2,4−ジクロロフェニル)アセトアミジン塩酸塩に、2−ブロモアセトフェノンを2−ブロモ−2−フェニルアセトフェノンに代えて、参考例2の方法に準拠して2−(2,4−ジクロロベンジル)−4,5−ジフェニルイミダゾールを合成した。
[Reference Example 24]
<Synthesis of Z-4>
First, (2,4-dichlorophenyl) acetamidine hydrochloride was synthesized according to the method of Reference Example 1 by replacing (4-chlorophenyl) acetonitrile of Reference Example 1 with (2,4-dichlorophenyl) acetonitrile.
Subsequently, (4-chlorophenyl) acetamidine hydrochloride of Reference Example 2 was replaced with (2,4-dichlorophenyl) acetamidine hydrochloride and 2-bromoacetophenone was replaced with 2-bromo-2-phenylacetophenone. According to the method, 2- (2,4-dichlorobenzyl) -4,5-diphenylimidazole was synthesized.
実施例に使用したイミダゾール化合物の化学式を、化4〜6に示す。 Chemical formulas of imidazole compounds used in Examples are shown in Chemical Formulas 4-6.
比較例に使用したイミダゾール化合物の化学式を化7に示す。 The chemical formula of the imidazole compound used in the comparative example is shown in Chemical formula 7.
実施例および比較例で採用した評価試験方法は、以下のとおりである。 The evaluation test methods employed in the examples and comparative examples are as follows.
[半田上がり性の評価試験]
試験片として、内径0.80mmの銅スルホールを300穴有する120mm(縦)×150mm(横)×1.6mm(厚み)のガラスエポキシ樹脂製のプリント配線板を使用した。この試験片を脱脂、ソフトエッチング及び水洗を行った後、所定の液温に保持した表面処理剤に所定時間浸漬し、次いで水洗、乾燥して銅表面上に厚さ約0.10〜0.50μmの化成皮膜を形成させた。
この表面処理を行った試験片について、赤外線リフロー装置(製品名:MULTI−PRO−306、ヴィトロニクス社製)を用いて、ピーク温度が240℃であるリフロー加熱を3回行い、次いで、フロー半田付け装置(コンベア速度:1.0m/分)を用いて半田付けを行った。
なお、使用した半田は、63錫-37鉛(重量%)の組成を有する錫−鉛系共晶半田(商品名:H63A、千住金属工業製)であり、半田付けに際して使用したフラックスはJS−64MSS(弘輝製)である。また、半田温度は240℃とした。
また、前記の表面処理を行った試験片について、錫−鉛系共晶半田の場合と同様にして無鉛半田を使用して半田付けを行った。なお、使用した半田は、96.5錫-3.0銀-0.5銅(重量%)の組成を有する無鉛半田(商品名:H705「エコソルダー」、千住金属工業製)であり、半田付けに際して使用したフラックスはJS−E−09(弘輝製)である。また、リフロー加熱のピーク温度は245℃であり、半田温度も245℃とした。
半田付けを行った試験片について、銅スルーホールの上部ランド部分まで半田が上がった(半田付けされた)スルーホール数を計測し、全スルーホール数(300穴)に対する割合(%)を算出した。
銅の表面に対して半田の濡れ性が大きい程、溶融した半田が銅スルーホール内を浸透し該スルーホールの上部ランド部分まで上がり易くなる。即ち、全スルーホール数に対する上部ランド部分まで半田が上がったスルーホール数の割合が大きい程、銅に対する半田濡れ性が優れ、半田付け性が良好なものと判定される。
[Evaluation test of solderability]
As a test piece, a printed wiring board made of glass epoxy resin of 120 mm (vertical) × 150 mm (horizontal) × 1.6 mm (thickness) having 300 copper through holes with an inner diameter of 0.80 mm was used. The test piece was degreased, soft-etched and washed with water, then immersed in a surface treatment agent maintained at a predetermined liquid temperature for a predetermined time, then washed with water and dried to a thickness of about 0.10 to 0.00 on the copper surface. A 50 μm chemical conversion film was formed.
About the test piece which performed this surface treatment, the reflow heating whose peak temperature is 240 degreeC was performed 3 times using the infrared reflow apparatus (product name: MULTI-PRO-306, Vitronics company make), then, flow solder Soldering was performed using an attaching device (conveyor speed: 1.0 m / min).
The solder used was tin-lead eutectic solder (trade name: H63A, manufactured by Senju Metal Industry Co., Ltd.) having a composition of 63 tin-37 lead (weight%), and the flux used for soldering was JS- 64MSS (manufactured by Hiroki). The solder temperature was 240 ° C.
Further, the test piece subjected to the surface treatment was soldered using lead-free solder in the same manner as in the case of tin-lead eutectic solder. The solder used is a lead-free solder (trade name: H705 “Eco Solder”, manufactured by Senju Metal Industry Co., Ltd.) having a composition of 96.5 tin-3.0 silver-0.5 copper (% by weight). The flux used for attaching is JS-E-09 (manufactured by Hiroki). The peak temperature of reflow heating was 245 ° C., and the solder temperature was 245 ° C.
For the soldered test piece, the number of through holes in which the solder went up to the upper land portion of the copper through hole (soldered) was measured, and the ratio (%) to the total number of through holes (300 holes) was calculated. .
The higher the solder wettability with respect to the copper surface, the more easily the molten solder penetrates into the copper through hole and rises to the upper land portion of the through hole. That is, it is determined that the higher the ratio of the number of through holes in which the solder has reached the upper land portion with respect to the total number of through holes, the better the solder wettability with respect to copper and the better the solderability.
[半田広がり性の評価試験]
試験片として、50mm(縦)×50mm(横)×1.2mm(厚み)のガラスエポキシ樹脂製のプリント配線板(回路パターンとして、銅箔からなる導体幅0.80mm、長さ20mmの回路部を、1.0mmの間隔にて幅方向に10本形成させたもの)を使用した。この試験片を脱脂、ソフトエッチング及び水洗を行った後、所定の液温に保持した表面処理剤に所定時間浸漬し、次いで水洗、乾燥して銅表面上に厚さ約0.10〜0.50μmの化成皮膜を形成させた。
この表面処理を行った試験片について、赤外線リフロー装置(製品名:MULTI−PRO−306、ヴィトロニクス社製)を用いて、ピーク温度が240℃であるリフロー加熱を1回行った。その後、開口径1.2mm、厚み150μmのメタルマスクを使用して銅回路部の中央に錫−鉛系クリーム半田を印刷し、前期条件でリフロー加熱を行い、半田付けを行った。なお、使用した錫−鉛系クリーム半田は63錫-37鉛(重量%)からなる組成の共晶半田(商品名:OZ−63−330F−40−10、千住金属工業製)である。
また、前記の表面処理を行った試験片について、錫−鉛系クリーム半田の場合と同様にして無鉛系クリーム半田を使用して半田付けを行った。なお、使用した無鉛系クリーム半田は、96.5錫-3.0銀-0.5銅(重量%)からなる組成の無鉛半田(商品名:M705−221BM5−42−11、千住金属工業製)である。また、クリーム半田の印刷前および印刷後に行うリフロー加熱は、ピーク温度が245℃になるように設定した。
得られた試験片について、銅回路部上に濡れ広がった半田の長さ(mm)を測定した。
この長さが大きい程、半田濡れ性が優れ、半田付け性が良好なものと判定される。
[Evaluation test of solder spreadability]
As a test piece, a printed wiring board made of glass epoxy resin of 50 mm (vertical) × 50 mm (horizontal) × 1.2 mm (thickness) (as a circuit pattern, a circuit part having a conductor width of 0.80 mm and a length of 20 mm made of copper foil) 10 were formed in the width direction at intervals of 1.0 mm). The test piece was degreased, soft-etched and washed with water, then immersed in a surface treatment agent maintained at a predetermined liquid temperature for a predetermined time, then washed with water and dried to a thickness of about 0.10 to 0.00 on the copper surface. A 50 μm chemical conversion film was formed.
About the test piece which performed this surface treatment, the reflow heating whose peak temperature is 240 degreeC was performed once using the infrared reflow apparatus (Product name: MULTI-PRO-306, Vitronics company make). After that, using a metal mask having an opening diameter of 1.2 mm and a thickness of 150 μm, tin-lead cream solder was printed at the center of the copper circuit portion, and reflow heating was performed under the previous conditions to perform soldering. The tin-lead cream solder used is a eutectic solder (trade name: OZ-63-330F-40-10, manufactured by Senju Metal Industry Co., Ltd.) composed of 63 tin-37 lead (% by weight).
Moreover, about the test piece which performed the said surface treatment, it soldered using the lead-free cream solder similarly to the case of a tin-lead cream solder. The lead-free cream solder used was a lead-free solder (commercial name: M705-221BM5-42-11, manufactured by Senju Metal Industry Co., Ltd.) composed of 96.5 tin-3.0 silver-0.5 copper (% by weight). ). The reflow heating performed before and after the cream solder printing was set so that the peak temperature was 245 ° C.
About the obtained test piece, the length (mm) of the solder which wet-spreaded on the copper circuit part was measured.
The larger this length, the better the solder wettability and the better the solderability.
〔実施例1〕
イミダゾール化合物として2−(4−クロロベンジル)−4−フェニルイミダゾール、酸としてレブリン酸、金属塩として酢酸銅及び塩化亜鉛を、表1記載の組成になるようにイオン交換水に溶解させた後、アンモニア水でpH3.6に調整して表面処理剤を調製した。
次いで、プリント配線板の試験片を40℃に温調した表面処理剤に30秒間浸漬したのち、水洗、乾燥し、半田上がり性及び半田広がり性を測定した。これらの試験結果は表1に示したとおりであった。
[Example 1]
After dissolving 2- (4-chlorobenzyl) -4-phenylimidazole as an imidazole compound, levulinic acid as an acid, copper acetate and zinc chloride as a metal salt in ion-exchanged water so as to have the composition described in Table 1, A surface treatment agent was prepared by adjusting the pH to 3.6 with aqueous ammonia.
Next, the test piece of the printed wiring board was immersed in a surface treatment agent adjusted to 40 ° C. for 30 seconds, then washed with water and dried, and the solder finish and solder spreadability were measured. These test results were as shown in Table 1.
〔実施例2〜19〕
実施例1と同様にして、表1〜2記載のイミダゾール化合物、酸、金属塩およびハロゲン化合物を使用して、表1〜2記載の組成を有する表面処理剤を調製し、表1〜2に記載の処理条件にて表面処理を行った。得られた試験片について、半田上がり性及び半田広がり性を測定した。これらの試験結果は表1〜2に示したとおりであった。
[Examples 2 to 19]
In the same manner as in Example 1, using the imidazole compounds, acids, metal salts and halogen compounds described in Tables 1-2, surface treatment agents having the compositions described in Tables 1-2 were prepared. Surface treatment was performed under the described treatment conditions. About the obtained test piece, solder rising property and solder spreading property were measured. These test results were as shown in Tables 1-2.
〔比較例1〜6〕
実施例1と同様にして、表3記載のイミダゾール化合物、酸、金属塩およびハロゲン化合物を使用して、表3記載の組成を有する表面処理剤を調製し、表3に記載の処理条件にて表面処理を行った。得られた試験片について、半田上がり性及び半田広がり性を測定した。これらの試験結果は表3に示したとおりであった。
[Comparative Examples 1-6]
In the same manner as in Example 1, using the imidazole compound, acid, metal salt and halogen compound described in Table 3, a surface treatment agent having the composition described in Table 3 was prepared, and the treatment conditions described in Table 3 were used. Surface treatment was performed. About the obtained test piece, solder rising property and solder spreading property were measured. The test results were as shown in Table 3.
表1(実施例1〜9)と表2(実施例10〜19)に示した試験結果によれば、本発明の表面処理剤をプリント配線板の銅表面に接触させて、銅表面に化成皮膜を形成させることにより、銅表面に対する共晶半田または無鉛半田の濡れ性が向上したものと認められ、銅表面に対する共晶半田または無鉛半田の半田付け性(半田上がり性、半田広がり性)が良好なものとなった。 According to the test results shown in Table 1 (Examples 1 to 9) and Table 2 (Examples 10 to 19), the surface treatment agent of the present invention was brought into contact with the copper surface of the printed wiring board to form a chemical on the copper surface. By forming a film, it is recognized that the wettability of eutectic solder or lead-free solder on the copper surface is improved, and the solderability of the eutectic solder or lead-free solder on the copper surface (solderability, solder spreadability) It became good.
実施例1〜19においては、共晶半田を用いた場合の半田上がり性が何れも100%であり(実施例3のみ98%)、実施例1〜19の間に差異が認められないが、無鉛半田を用いた場合の半田上がり性と、共晶半田または無鉛半田を用いた場合の半田広がり性については、実施例1〜3(以下、ケースAと云う)、実施例4〜6(以下、ケースBと云う)、実施例7〜19(以下、ケースCと云う)間に差が認められた。即ち、ケースA<ケースB<ケースCの順序で、前記の無鉛半田を用いた場合の半田上がり性と、共晶半田または無鉛半田を用いた場合の半田広がり性が向上した。 In Examples 1 to 19, the solderability when eutectic solder is used is 100% (only Example 3 is 98%), and there is no difference between Examples 1 to 19, Examples 1 to 3 (hereinafter referred to as “case A”) and Examples 4 to 6 (hereinafter referred to as “case A”) regarding solderability when lead-free solder is used and solder easiness when eutectic solder or lead-free solder is used. , Case B) and Examples 7 to 19 (hereinafter referred to as Case C) were found to be different. That is, in the order of Case A <Case B <Case C, the solder liftability when the lead-free solder is used and the solder spreadability when eutectic solder or lead-free solder is used are improved.
ケースAにおいて使用したイミダゾール化合物は、ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が1つ置換したものである。ケースBにおいて使用したイミダゾール化合物は、ベンジル基およびフェニル基の両方にハロゲン原子が1つ置換したものである。ケースCにおいて使用したイミダゾール化合物は、(i)ベンジル基またはフェニル基のどちらか一方のみにハロゲン原子が2つ以上置換したもの(実施例7〜9)、(ii)ベンジル基またはフェニル基のどちらか一方にハロゲン原子が2つ以上置換し、其の他方にはハロゲン原子が1つ置換したものと(実施例10〜16)、(iii)ベンジル基およびフェニル基の両方にハロゲン原子が2つ置換したものである(実施例17〜19)。 The imidazole compound used in Case A is a compound in which one of the benzyl group and the phenyl group is substituted with one halogen atom. The imidazole compound used in Case B is a compound in which one halogen atom is substituted on both the benzyl group and the phenyl group. The imidazole compound used in Case C is either (i) one in which only one of the benzyl group or the phenyl group is substituted with two or more halogen atoms (Examples 7 to 9), and (ii) either the benzyl group or the phenyl group. One is substituted with two or more halogen atoms, the other is substituted with one halogen atom (Examples 10 to 16), and (iii) two halogen atoms are present in both the benzyl group and the phenyl group. Substituted (Examples 17 to 19).
表3(比較例1〜6)に示した試験結果によれば、比較例4の表面処理剤を使用した場合の半田付け性が比較的良好であった。この表面処理剤に使用したイミダゾール化合物(Z−4)は、ベンジル基にハロゲン原子が2つ置換したものであるが、本発明の実施に適するイミダゾール化合物とは、イミダゾール環の5位に結合した置換基の種類において相違する。即ち、比較例4の試験結果においては、イミダゾール環の2位にハロゲン原子が2つ置換したベンジル基が結合し、同4位にフェニル基が結合した化学構造に由来する半田付け性向上の効果が示唆されているとも云えるが、本発明の実施に適するイミダゾール化合物は、前記の化学構造を有し、且つZ−4とは異なってイミダゾール環の5位に、フェニル基の代わりに水素原子またはアルキル基が結合する構造としたものであり、この点が本発明の実施に適するイミダゾール化合物の特長である。
本発明の表面処理剤は、共晶半田を用いた半田付けの際にも問題なく使用し得るものであるが、共晶半田に比べて半田付け性が劣る無鉛半田を用いた半田付けの際に好適に使用し得るものである。
According to the test results shown in Table 3 (Comparative Examples 1 to 6), the solderability when the surface treating agent of Comparative Example 4 was used was relatively good. The imidazole compound (Z-4) used in this surface treatment agent is a compound in which two halogen atoms are substituted on the benzyl group, but is bonded to the 5-position of the imidazole ring with the imidazole compound suitable for the practice of the present invention. It differs in the kind of substituent. That is, in the test result of Comparative Example 4, the effect of improving solderability derived from a chemical structure in which a benzyl group substituted with two halogen atoms is bonded to the 2-position of the imidazole ring and a phenyl group is bonded to the 4-position. However, an imidazole compound suitable for practicing the present invention has the above chemical structure and, unlike Z-4, is a hydrogen atom instead of a phenyl group at the 5-position of the imidazole ring. Alternatively, the structure is one in which an alkyl group is bonded, and this is a feature of an imidazole compound suitable for the practice of the present invention.
The surface treatment agent of the present invention can be used without problems even when soldering using eutectic solder, but when soldering using lead-free solder which is inferior in solderability compared to eutectic solder. Can be suitably used.
本発明によれば、半田を使用して電子部品等をプリント配線板に接合する際に、プリント配線板の回路部等を構成する銅または銅合金の表面に耐熱性に優れた化成皮膜を形成させ、且つ半田との濡れ性が向上し、半田付け性を良好なものとする表面処理剤および表面処理方法を提供することができる。
また、前記の表面処理剤を回路部を構成する銅または銅合金の表面に接触させたプリント配線板および、銅または銅合金の表面を前記の表面処理剤で接触させた後に、無鉛半田を使用して半田付けを行う半田付け方法を提供することができる。
According to the present invention, when an electronic component or the like is bonded to a printed wiring board using solder, a chemical conversion film having excellent heat resistance is formed on the surface of copper or a copper alloy constituting a circuit portion or the like of the printed wiring board. In addition, a surface treatment agent and a surface treatment method that improve wettability with solder and improve solderability can be provided.
Also, a printed wiring board in which the surface treatment agent is brought into contact with the surface of copper or a copper alloy constituting the circuit part, and a lead-free solder is used after the surface of the copper or copper alloy is brought into contact with the surface treatment agent. Thus, a soldering method for performing soldering can be provided.
Claims (4)
A soldering method, wherein the surface of copper or a copper alloy is brought into contact with the surface treatment agent according to claim 1 and then soldered using lead-free solder.
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PCT/JP2009/064318 WO2010016620A1 (en) | 2008-08-08 | 2009-08-07 | Surface treating agent for copper or copper alloy and use thereof |
MYPI2011000452A MY162495A (en) | 2008-08-08 | 2009-08-07 | Surface treating agent for copper or copper alloy and use thereof |
CN200980131025.2A CN102119240B (en) | 2008-08-08 | 2009-08-07 | Surface treating agent for copper or copper alloy and use thereof |
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JP5260357B2 (en) * | 2008-09-17 | 2013-08-14 | 四国化成工業株式会社 | 2- (2,4-dichlorobenzyl) -4-phenyl-5-alkylimidazole compound |
JP5260208B2 (en) * | 2008-09-22 | 2013-08-14 | 四国化成工業株式会社 | 2- (2,4-Dichlorobenzyl) -4- (halogenated phenyl) imidazole compound |
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KR101555753B1 (en) | 2013-11-18 | 2015-09-30 | 서울대학교산학협력단 | one-step method for preparation of corrosion preventive copper paste and its flexible dipole tag antenna application |
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JP6681566B1 (en) * | 2019-05-27 | 2020-04-15 | 千住金属工業株式会社 | Solder paste and flux |
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