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JP5307351B2 - Weakly acidic chlorine water production equipment - Google Patents

Weakly acidic chlorine water production equipment Download PDF

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JP5307351B2
JP5307351B2 JP2007114222A JP2007114222A JP5307351B2 JP 5307351 B2 JP5307351 B2 JP 5307351B2 JP 2007114222 A JP2007114222 A JP 2007114222A JP 2007114222 A JP2007114222 A JP 2007114222A JP 5307351 B2 JP5307351 B2 JP 5307351B2
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JP2008266096A (en
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元 川崎
香織 星野
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Tacmina Corp
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Description

本発明は、例えば、食品等の殺菌に用いられる弱酸性塩素水を製造する弱酸性塩素水製造装置に関する。   The present invention relates to a weakly acidic chlorinated water production apparatus for producing weakly acidic chlorinated water used for sterilization of foods, for example.

例えば、食品等の殺菌対象物を殺菌する殺菌剤としては、次亜塩素酸ナトリウム水溶液といった次亜塩素酸塩水溶液が一般的に使用されている。この次亜塩素酸塩水溶液は、水素イオン指数(以下「pH」という)が比較的高く(例えばpH8以上)、その状態で使用される場合が多いが、pHが高いと、遊離塩素として次亜塩素酸イオンの存在率が高くなり(図9参照)、この場合の殺菌力は、比較的弱い。   For example, a hypochlorite aqueous solution such as a sodium hypochlorite aqueous solution is generally used as a disinfectant for sterilizing an object to be sterilized such as food. This aqueous hypochlorite aqueous solution has a relatively high hydrogen ion index (hereinafter referred to as “pH”) (for example, pH 8 or more) and is often used in this state. The abundance of chlorate ions increases (see FIG. 9), and the bactericidal power in this case is relatively weak.

そのため、次亜塩素酸塩水溶液に、より強い殺菌力を発揮させるには、pHを低くして、次亜塩素酸の存在率を高めることが望ましい(図9参照)が、このpHが低過ぎると(例えばpH4以下の場合)、有毒な塩素ガスが多量に発生するため、好ましくない。   Therefore, in order to exert a stronger sterilizing power in the hypochlorite aqueous solution, it is desirable to lower the pH and increase the abundance of hypochlorous acid (see FIG. 9), but this pH is too low. (For example, when the pH is 4 or less), a large amount of toxic chlorine gas is generated, which is not preferable.

したがって、塩素ガスの発生を抑制しながらも、高い殺菌力を発揮させるには、次亜塩素酸塩水溶液のpHを6程度の弱酸性の状態になるように調節するのが望ましい。例えば、この次亜塩素酸塩水溶液のpHの調節には、塩酸水溶液が用いられる。次亜塩素酸塩水溶液に塩酸水溶液を混合してpHを調節するには、希釈水を供給する供給経路に次亜塩素酸塩水溶液と塩酸水溶液を混合してスタティックミキサーで混合・希釈する手法が一般的である。このようにすることで、所定のpHに調整された、殺菌効果の高い弱酸性塩素水が生成される。   Therefore, it is desirable to adjust the pH of the hypochlorite aqueous solution to be in a slightly acidic state of about 6 in order to exert high sterilizing power while suppressing generation of chlorine gas. For example, a hydrochloric acid aqueous solution is used for adjusting the pH of the hypochlorite aqueous solution. In order to adjust pH by mixing aqueous hydrochloric acid solution with hypochlorite aqueous solution, a method of mixing hypochlorite aqueous solution and aqueous hydrochloric acid solution in a supply path for supplying dilution water, and mixing and diluting with a static mixer. It is common. By doing in this way, the weak acidic chlorine water with the high bactericidal effect adjusted to predetermined | prescribed pH is produced | generated.

しかしながら、希釈水の供給経路に次亜塩素酸塩水溶液と塩酸水溶液を注入して混合・希釈させた場合、局部的に濃度の高い次亜塩素酸塩水溶液と濃度の高い塩酸水溶液とが接触し、これによって、有毒な塩素ガスが発生するおそれがある。   However, when hypochlorite aqueous solution and hydrochloric acid aqueous solution are injected into the dilution water supply path and mixed and diluted, the locally concentrated hypochlorite aqueous solution and the concentrated hydrochloric acid aqueous solution come into contact with each other. As a result, toxic chlorine gas may be generated.

本発明は、上記の事情に鑑みてなされたものであり、次亜塩素酸塩水溶液と塩酸水溶液を段階的に希釈することにより、塩素ガスの発生を抑制した弱酸性塩素水を製造できる弱酸性塩素水製造装置を提供することを課題とする。   The present invention has been made in view of the above circumstances, and is capable of producing weakly acidic chlorine water that suppresses generation of chlorine gas by diluting a hypochlorite aqueous solution and a hydrochloric acid aqueous solution stepwise. It is an object to provide a chlorine water production apparatus.

本発明は上記の課題を解決するためのものであり、塩酸水溶液を希釈する希釈水が供給される第1供給経路と、第1供給経路に塩酸水溶液を供給する供給装置と、次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路と、第2供給経路に次亜塩素酸塩水溶液を供給する供給装置と、第1供給経路と第2供給経路を合流させるとともに、第1供給経路で希釈された塩酸水溶液と第2供給経路で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を供給する第3供給経路とを備えた弱酸性塩素水製造装置であって、第1供給経路には、塩酸水溶液の供給装置から供給される塩酸水溶液を注入する第1注入口と、第1注入口の下流側に位置するとともに、流量抵抗を生じさせて第1注入口から注入された塩酸水溶液を希釈水と混合して希釈する第1混合希釈部とが設けられており、第2供給経路には、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液を注入する第2注入口と、第2注入口の下流側に位置するとともに、流量抵抗を生じさせて第2注入口から注入された次亜塩素酸塩水溶液を希釈水と混合して希釈する第2混合希釈部とが設けられており、第3供給経路には、流量抵抗を生じさせて、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを混合して所定の水素イオン指数の弱酸性塩素水を生成する第3混合希釈部が設けられていることを特徴とする。   The present invention has been made to solve the above-described problems, and includes a first supply path for supplying dilution water for diluting a hydrochloric acid aqueous solution, a supply device for supplying a hydrochloric acid aqueous solution to the first supply path, and hypochlorous acid. A second supply path for supplying dilution water for diluting the salt aqueous solution, a supply device for supplying a hypochlorite aqueous solution to the second supply path, a first supply path and a second supply path, Third supply for supplying weakly acidic chlorine water having a predetermined hydrogen ion index by mixing and diluting a hydrochloric acid aqueous solution diluted in one supply route and a hypochlorite aqueous solution diluted in a second supply route A weakly acidic chlorinated water production apparatus comprising: a first inlet for injecting a hydrochloric acid aqueous solution supplied from a hydrochloric acid aqueous solution supply device to the first supply path; and a downstream side of the first inlet. And the flow resistance is generated A first mixing / dilution unit for mixing and diluting the hydrochloric acid aqueous solution injected from the inlet with dilution water is provided, and a hypochlorous acid aqueous solution supplied from a hypochlorite aqueous solution supply device is provided in the second supply path. A second inlet for injecting a chlorate aqueous solution, and a hypochlorite aqueous solution injected from the second inlet with a flow resistance, located downstream of the second inlet and mixed with dilution water And a second mixed dilution section for dilution. The flow rate resistance is generated in the third supply path to dilute the hydrochloric acid aqueous solution diluted in the first mixed dilution section and the second mixed dilution section. In addition, a third mixed dilution section is provided that mixes the hypochlorite aqueous solution with the aqueous solution to generate weakly acidic chlorinated water having a predetermined hydrogen ion index.

かかる構成によれば、第1供給経路の第1混合希釈部で流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合することで、塩酸水溶液を所定の濃度に均一に希釈できる。また、第2供給経路の第2混合希釈部に流量抵抗を生じさせて、次亜塩素酸塩水溶液と希釈水を混合することで、次亜塩素酸塩水溶液を所定の濃度に均一に希釈できる。そして、このように均一に希釈された塩酸水溶液と次亜塩素酸塩水溶液とを第3供給経路の第3混合希釈部で流量抵抗を生じさせて混合することで、塩酸水溶液と次亜塩素酸塩水溶液はさらに混合されて均一に希釈され、これによって所定のpHの弱酸性塩素水が生成される。このように、第1混合希釈部および第2混合希釈部で塩酸水溶液と次亜塩素酸塩水溶液を希釈し、このように希釈された塩酸水溶液と次亜塩素酸塩水溶液をさらに第3混合希釈部で混合して、段階的に希釈することで、濃度の高い次亜塩素酸塩水溶液と、濃度の高い塩酸水溶液とが接触することがなくなり、弱酸性塩素水は、塩素ガスの発生を抑制できるものになる。   According to such a configuration, the aqueous hydrochloric acid solution can be uniformly diluted to a predetermined concentration by generating a flow resistance at the first mixing / dilution section of the first supply path and mixing the aqueous hydrochloric acid solution and the dilution water. In addition, the hypochlorite aqueous solution can be uniformly diluted to a predetermined concentration by generating a flow resistance in the second mixing and dilution part of the second supply path and mixing the hypochlorite aqueous solution and the dilution water. . Then, the hydrochloric acid aqueous solution and the hypochlorite aqueous solution thus uniformly diluted are mixed with each other by generating flow resistance at the third mixing dilution section of the third supply path, so that the hydrochloric acid aqueous solution and the hypochlorous acid are mixed. The aqueous salt solution is further mixed and diluted uniformly, whereby weakly acidic chlorinated water having a predetermined pH is generated. In this way, the hydrochloric acid aqueous solution and the hypochlorite aqueous solution are diluted in the first mixed dilution section and the second mixed dilution section, and the diluted hydrochloric acid aqueous solution and hypochlorite aqueous solution are further mixed in the third mixed dilution. By mixing and diluting in stages, the highly concentrated hypochlorite aqueous solution and the highly concentrated hydrochloric acid aqueous solution do not come into contact with each other. Weakly acidic chlorinated water suppresses the generation of chlorine gas. It will be possible.

また、本発明に係る弱酸性塩素水製造装置は、第1供給経路と第2供給経路とは希釈水を供給する主供給経路から分岐されており、第1供給経路における第1注入口よりも上流側位置と、第2供給経路における第2注入口よりも上流側位置との間に差圧計が設けられ、しかも、第1供給経路には、この第1供給経路の希釈水の流量を調整する第1流量調整弁が設けられ、第2供給経路には、この第2供給経路の希釈水の流量を調整する第2流量調整弁が設けられている構成を採用できる。   In the weakly acidic chlorinated water production apparatus according to the present invention, the first supply path and the second supply path are branched from the main supply path for supplying dilution water, and are more than the first inlet in the first supply path. A differential pressure gauge is provided between the upstream position and a position upstream of the second inlet in the second supply path, and the flow rate of dilution water in the first supply path is adjusted in the first supply path. A first flow rate adjusting valve is provided, and a configuration in which a second flow rate adjusting valve for adjusting the flow rate of the dilution water in the second supply route is provided in the second supply route can be adopted.

かかる構成によれば、主供給経路から分岐された第1供給経路と第2供給経路を流れる希釈水の流量に差がある場合、差圧計によって第1供給経路と第2供給経路との圧力差を読み取り、これに応じて、第1流量調整弁、第2流量調整弁を操作することにより、例えば、第1供給経路と第2供給装置を流れる希釈水の流量を均等にすることができるようになる。   According to this configuration, when there is a difference in the flow rate of the dilution water flowing through the first supply path and the second supply path branched from the main supply path, the pressure difference between the first supply path and the second supply path is determined by the differential pressure gauge. By operating the first flow rate adjustment valve and the second flow rate adjustment valve accordingly, for example, the flow rate of the dilution water flowing through the first supply path and the second supply device can be made equal. become.

また、本発明に係る弱酸性塩素水製造装置は、第1混合希釈部が、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と希釈水を混合し、塩酸水溶液を希釈水とともに板部材の貫通孔を通過させることにより、この塩酸水溶液を所定の濃度に希釈できるように構成されており、第1供給経路が、第1混合希釈部の下流側に第1流量調整弁を備えている構成を採用できる。   In the weakly acidic chlorinated water production apparatus according to the present invention, the first mixing and dilution unit includes a plate member in which a plurality of through-holes are formed, and causes flow resistance on the upstream side of the plate member to generate hydrochloric acid. The aqueous solution and the dilution water are mixed, and the hydrochloric acid aqueous solution is passed through the through-hole of the plate member together with the dilution water so that the hydrochloric acid aqueous solution can be diluted to a predetermined concentration. A configuration in which a first flow rate adjusting valve is provided on the downstream side of the mixing dilution section can be employed.

かかる構成によれば、第1混合希釈部に板部材を設けることで、第1混合希釈部の板部材の上流側の部分に流量抵抗が生じ、この部分で塩酸水溶液と希釈水とを混合させ、そして塩酸水溶液と希釈水が板部材の貫通孔を通過して拡散することにより、塩酸水溶液を均一に希釈することができるようになる。さらに、第1混合希釈部の下流側に第1流量調整弁を設けることによって、板部材の流量抵抗を調節できるようになり、これによって、希釈水の流量、注入された塩酸水溶液の量の変化に応じて、所望の濃度に塩酸水溶液を希釈できるようになる。   According to this configuration, by providing the plate member in the first mixing / dilution unit, flow resistance is generated in the upstream portion of the plate member of the first mixing / dilution unit, and the hydrochloric acid aqueous solution and the dilution water are mixed in this portion. Then, the aqueous hydrochloric acid solution and the diluted water diffuse through the through holes of the plate member, so that the aqueous hydrochloric acid solution can be diluted uniformly. Furthermore, by providing the first flow rate adjusting valve on the downstream side of the first mixing and diluting section, the flow resistance of the plate member can be adjusted, thereby changing the flow rate of the dilution water and the amount of the injected hydrochloric acid aqueous solution. Accordingly, the aqueous hydrochloric acid solution can be diluted to a desired concentration.

また、本発明に係る弱酸性塩素水製造装置は、第2混合希釈部が、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて次亜塩素酸塩水溶液と希釈水を混合し、次亜塩素酸塩水溶液を希釈水とともに板部材の貫通孔を通過させることにより、次亜塩素酸塩水溶液を所定の濃度に希釈できるように構成されており、第2供給経路が、第2混合希釈部の下流側に第2流量調整弁を備えている構成を採用できる。   Further, in the weakly acidic chlorine water production apparatus according to the present invention, the second mixed dilution section includes a plate member in which a plurality of through holes are formed, and generates a flow resistance on the upstream side of the plate member. It is configured so that the hypochlorite aqueous solution can be diluted to a predetermined concentration by mixing the aqueous chlorite solution and the dilution water, and passing the hypochlorite aqueous solution together with the dilution water through the through hole of the plate member. Therefore, the second supply path may be provided with a second flow rate adjustment valve on the downstream side of the second mixing / dilution unit.

かかる構成によれば、第2混合希釈部に板部材を設けることで、第2混合希釈部の板部材の上流側の部分に流量抵抗が生じ、この部分で次亜塩素酸塩水溶液と希釈水とを混合させ、そして次亜塩素酸塩水溶液と希釈水が板部材の貫通孔を通過して拡散することにより、次亜塩素酸塩水溶液を均一に希釈することができるようになる。さらに、第2混合希釈部の下流側に第2流量調整弁を設けることによって、板部材の流量抵抗を調節できるようになり、これによって、希釈水の流量、注入された次亜塩素酸塩水溶液の量の変化に応じて、所望の濃度に次亜塩素酸塩水溶液を希釈できるようになる。   According to such a configuration, by providing the plate member in the second mixed dilution section, flow resistance is generated in the upstream portion of the plate member of the second mixed dilution section, and in this portion, the hypochlorite aqueous solution and the dilution water are generated. And the hypochlorite aqueous solution and the dilution water diffuse through the through-holes of the plate member, whereby the hypochlorite aqueous solution can be diluted uniformly. Further, by providing a second flow rate adjusting valve downstream of the second mixing and diluting section, the flow resistance of the plate member can be adjusted, whereby the flow rate of diluted water and the injected hypochlorite aqueous solution can be adjusted. The hypochlorite aqueous solution can be diluted to a desired concentration according to the change in the amount of.

また、本発明に係る弱酸性塩素水製造装置では、第3混合希釈部には複数の貫通孔が形成された板部材が設けられ、第3混合希釈部が、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と次亜塩素酸塩水溶液とを混合するとともに、次亜塩素酸塩水溶液を塩酸水溶液とともに板部材の貫通孔を通過させることにより、所定の水素イオン指数の弱酸性塩素水を生成するように構成され、第3供給経路が、第3混合希釈部の下流側に第3流量調整弁を備えているようにしてもよい。   Further, in the weakly acidic chlorine water production apparatus according to the present invention, the third mixed dilution section is provided with a plate member having a plurality of through holes, and the third mixed dilution section has a flow resistance on the upstream side of the plate member. The aqueous hydrochloric acid solution and the hypochlorite aqueous solution are mixed, and the hypochlorite aqueous solution is passed through the through-holes of the plate member together with the aqueous hydrochloric acid solution. The third supply path may be provided with a third flow rate adjustment valve on the downstream side of the third mixing / dilution unit.

かかる構成によれば、第3混合希釈部に板部材を設けることで、第3混合希釈部の板部材の上流側の部分に流量抵抗が生じ、希釈された次亜塩素酸塩水溶液と塩酸水溶液とをこの部分で混合させ、そして次亜塩素酸塩水溶液と塩酸水溶液が板部材の貫通孔を通過して拡散することにより、均一に混合されたムラのない弱酸性塩素水を生成できる。   According to such a configuration, by providing a plate member in the third mixed dilution section, flow resistance is generated in the upstream portion of the plate member of the third mixed dilution section, and the diluted hypochlorite aqueous solution and hydrochloric acid aqueous solution are diluted. Are mixed in this portion, and the hypochlorite aqueous solution and the hydrochloric acid aqueous solution are diffused through the through-holes of the plate member, whereby uniformly mixed weakly acidic chloric water without unevenness can be generated.

また、本発明に係る弱酸性塩素水製造装置は、次亜塩素酸塩水溶液の供給装置が、希釈水の流量に応じた量の次亜塩素酸塩水溶液を第1供給経路に供給するように制御され、塩酸水溶液の供給装置が、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第2供給経路に供給するように制御される構成を採用できる。   Further, the weakly acidic chlorinated water production apparatus according to the present invention is such that the hypochlorite aqueous solution supply device supplies a hypochlorite aqueous solution in an amount corresponding to the flow rate of the dilution water to the first supply path. And the supply device for the aqueous hydrochloric acid solution is controlled so as to supply the aqueous hydrochloric acid solution in an amount corresponding to the amount of the hypochlorite aqueous solution supplied from the supply device for the hypochlorite aqueous solution to the second supply path. Can be adopted.

かかる構成によれば、希釈水の流量に応じた量の次亜塩素酸塩水溶液を第1供給経路に注入し、次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第2供給経路に注入することによって、所望のpHの弱酸性塩素水を生成できるようになる。   According to this configuration, the hypochlorite aqueous solution in an amount corresponding to the flow rate of the dilution water is injected into the first supply path, and the hydrochloric acid aqueous solution in an amount corresponding to the amount of the hypochlorite aqueous solution is injected into the second supply path. By injecting into the aqueous solution, weakly acidic chlorinated water having a desired pH can be generated.

本発明によれば、次亜塩素酸塩水溶液と塩酸水溶液を第1供給経路、第2供給経路および第3供給経路で段階的に希釈することにより、塩素ガスの発生を抑制した弱酸性塩素水を製造できる。   According to the present invention, the weakly acidic chlorinated water in which generation of chlorine gas is suppressed by diluting the hypochlorite aqueous solution and the hydrochloric acid aqueous solution in stages in the first supply path, the second supply path, and the third supply path. Can be manufactured.

以下、本発明に係る弱酸性塩素水製造装置の実施の形態を、図面に基づき説明する。   Hereinafter, an embodiment of a weakly acidic chlorinated water production apparatus according to the present invention will be described with reference to the drawings.

図1、図2に示す弱酸性塩素水製造装置1は、次亜塩素酸塩水溶液、塩酸水溶液を希釈水で希釈し、希釈された次亜塩素酸塩水溶液と塩酸水溶液を混合・希釈させて所定のpHの弱酸性塩素水を製造するものである。本実施形態では、次亜塩素酸塩水溶液として所定濃度の次亜塩素酸ナトリウム水溶液が用いられる。次亜塩素酸塩水溶液のpH調節剤として用いられる塩酸水溶液の原液には、所定の重量パーセント濃度のものが用いられる。この塩酸水溶液は、有機物の影響を受けない点で特に有用である。なお、本実施形態において、「弱酸性」とはpH5〜7の範囲をいう(pH7は厳密に言えば、中性だが、ここでは「弱酸性」として取り扱うこととする)。   The weakly acidic chlorinated water production apparatus 1 shown in FIGS. 1 and 2 dilutes a hypochlorite aqueous solution and a hydrochloric acid aqueous solution with a dilution water, and mixes and dilutes the diluted hypochlorite aqueous solution and the hydrochloric acid aqueous solution. A weakly acidic chlorinated water having a predetermined pH is produced. In this embodiment, a sodium hypochlorite aqueous solution having a predetermined concentration is used as the hypochlorite aqueous solution. As a stock solution of a hydrochloric acid aqueous solution used as a pH adjuster for a hypochlorite aqueous solution, a solution having a predetermined weight percent concentration is used. This aqueous hydrochloric acid solution is particularly useful in that it is not affected by organic substances. In the present embodiment, “weakly acidic” refers to a range of pH 5 to 7 (pH 7 is strictly speaking neutral, but here treated as “weakly acidic”).

弱酸性塩素水製造装置1は、希釈水を供給する主供給経路2と、塩酸水溶液を希釈する希釈水が供給される第1供給経路3と、第1供給経路3に塩酸水溶液を供給する供給装置(以下「第1供給装置」という)4と、次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路5と、第2供給経路5に次亜塩素酸塩水溶液を供給する供給装置(以下「第2供給装置」という)6と、第1供給経路3と第2供給経路5を合流させるとともに、第1供給経路3で希釈された塩酸水溶液と第2供給経路5で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を生成する第3供給経路7と、第1供給装置4、第2供給装置6を制御する制御装置8等を備えている。   The weakly acidic chlorinated water production apparatus 1 includes a main supply path 2 for supplying dilution water, a first supply path 3 for supplying dilution water for diluting hydrochloric acid aqueous solution, and a supply for supplying hydrochloric acid aqueous solution to the first supply path 3 A device (hereinafter referred to as “first supply device”) 4, a second supply path 5 for supplying dilution water for diluting the hypochlorite aqueous solution, and supplying a hypochlorite aqueous solution to the second supply path 5 A supply device (hereinafter referred to as a “second supply device”) 6, a first supply path 3 and a second supply path 5, and a hydrochloric acid solution diluted in the first supply path 3 and the second supply path 5. A third supply path 7, a first supply device 4, and a second supply device 6 that generate weakly acidic chlorinated water having a predetermined hydrogen ion index by mixing and diluting the diluted hypochlorite aqueous solution. A control device 8 or the like is provided.

主供給経路2には、送水ポンプ21、流量調整弁(例えばニードル弁)22、流量計23、圧力計24が設けられており、希釈水は送水ポンプ21によって主供給経路2の下流に送水され、その希釈水の流量、圧力を、流量計23、圧力計24で測定できるようになっている。主供給経路2の下流側には、第1供給経路3と第2供給経路5が分岐して設けられている。   The main supply path 2 is provided with a water supply pump 21, a flow rate adjusting valve (for example, a needle valve) 22, a flow meter 23, and a pressure gauge 24, and dilution water is supplied downstream of the main supply path 2 by the water supply pump 21. The flow rate and pressure of the dilution water can be measured with a flow meter 23 and a pressure meter 24. A first supply path 3 and a second supply path 5 are branched from the main supply path 2.

第1供給経路3には、第1供給装置4から供給される塩酸水溶液を注入するための第1注入口31と、第1供給装置4から供給された塩酸水溶液を希釈水と混合して希釈する第1混合希釈部(リアクションタンク)32と、第1供給経路3を流れる塩酸水溶液(希釈水を含む)の流量を調整する第1流量調整弁(例えばニードル弁)33が設けられている。   In the first supply path 3, a first inlet 31 for injecting a hydrochloric acid aqueous solution supplied from the first supply device 4 and a hydrochloric acid aqueous solution supplied from the first supply device 4 are mixed with dilution water for dilution. And a first flow rate adjustment valve (for example, a needle valve) 33 that adjusts the flow rate of the aqueous hydrochloric acid solution (including dilution water) flowing through the first supply path 3.

第1混合希釈部32は、その内径が第1供給経路3の内径よりも大きくなっており、その中途部に複数の貫通孔34aを有する板部材(邪魔板)34が設けられている。これにより、第1混合希釈部32の板部材34よりも上流側の部分には、第1混合希釈部32内に流入した塩酸水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第1反応領域」という)35が形成される。   The first mixing dilution section 32 has an inner diameter larger than the inner diameter of the first supply path 3, and a plate member (baffle plate) 34 having a plurality of through holes 34 a is provided in the middle. As a result, a flow resistance against the aqueous hydrochloric acid solution and the diluting water that has flowed into the first mixed diluting unit 32 is generated at a portion upstream of the plate member 34 of the first mixed diluting unit 32, and the aqueous hydrochloric acid solution and the diluting water are generated. A region 35 (hereinafter referred to as “first reaction region”) is formed.

また、第1混合希釈部32は、板部材34より下流側の部分に、板部材34の貫通孔34aを通過して拡散した塩酸水溶液と希釈水をさらに均一に希釈させる領域(以下「第1安定領域」という)36が形成されている。第1供給経路3に供給された希釈水と塩酸水溶液は、板部材34による流量抵抗によって第1反応領域35で所定時間混合され、板部材34の貫通孔34aを通過することによって、第1安定領域36内に拡散し、この第1安定領域36を通過することによって均一に希釈され、所定濃度に希釈された塩酸水溶液となる。   The first mixing / dilution unit 32 further uniformly dilutes the hydrochloric acid aqueous solution and the diluting water diffused through the through hole 34a of the plate member 34 in a portion downstream of the plate member 34 (hereinafter referred to as “first”). 36) is formed. The dilution water and the hydrochloric acid aqueous solution supplied to the first supply path 3 are mixed for a predetermined time in the first reaction region 35 by the flow resistance of the plate member 34, and pass through the through hole 34 a of the plate member 34. By diffusing into the region 36 and passing through the first stable region 36, the solution is uniformly diluted to form a hydrochloric acid aqueous solution diluted to a predetermined concentration.

第1流量調整弁33は、第1混合希釈部32の下流側に設けられており、この第1流量調整弁33を操作することにより、第1混合希釈部32内の圧力を調整するとともに、第1混合希釈部32によって希釈された塩酸水溶液、または、第1混合希釈部32に流入する前の希釈水の流量を調節できるようになっている。   The first flow rate adjustment valve 33 is provided on the downstream side of the first mixing / dilution unit 32. By operating the first flow rate adjustment valve 33, the pressure in the first mixing / dilution unit 32 is adjusted, The flow rate of the aqueous hydrochloric acid diluted by the first mixing / dilution unit 32 or the dilution water before flowing into the first mixing / dilution unit 32 can be adjusted.

第2供給経路5には、第2供給装置6から供給される次亜塩素酸塩水溶液を注入する第2注入口41と、第2供給装置6から供給された次亜塩素酸塩水溶液と希釈水とを混合して希釈する第2混合希釈部(リアクションタンク)42と、第2供給装置6を流れる次亜塩素酸塩水溶液(希釈水を含む)の流量を調整する第2流量調整弁(例えばニードル弁)43が設けられている。   In the second supply path 5, a second inlet 41 for injecting a hypochlorite aqueous solution supplied from the second supply device 6, and a hypochlorite aqueous solution and dilution supplied from the second supply device 6 A second flow dilution valve (reaction tank) 42 for mixing and diluting water, and a second flow rate adjusting valve (for adjusting the flow rate of the hypochlorite aqueous solution (including diluted water) flowing through the second supply device 6) For example, a needle valve) 43 is provided.

第2混合希釈部42は、第1混合希釈部32と同様に、その内径が第2供給経路5の内径よりも大きくなっており、その中途部に複数の貫通孔44aを有する板部材(邪魔板)44が設けられている。これにより、第2混合希釈部42の板部材44よりも上流側の部分には、第2混合希釈部42内に流入した次亜塩素酸塩水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第2反応領域」という)45が形成される。   Similarly to the first mixing / dilution unit 32, the second mixing / dilution unit 42 has an inner diameter larger than the inner diameter of the second supply path 5, and a plate member having a plurality of through-holes 44 a in the middle thereof (disturbance) Plate) 44 is provided. As a result, a flow resistance against the hypochlorite aqueous solution and dilution water that has flowed into the second mixed dilution section 42 is generated in a portion upstream of the plate member 44 of the second mixed dilution section 42, and hydrochloric acid is generated. A region (hereinafter referred to as “second reaction region”) 45 in which the aqueous solution and the dilution water are mixed is formed.

また、第2混合希釈部42は、板部材44より下流側の部分に、板部材44の貫通孔44aを通過して拡散した塩酸水溶液と希釈水をさらに均一に混合させる領域(以下「第2安定領域」という)46が形成されている。第2供給経路5に供給された希釈水と塩酸水溶液は、板部材44による流量抵抗によって第2反応領域45で所定時間混合され、板部材44の貫通孔44aを通過することによって、第2安定領域46内に拡散し、この第2安定領域46を通過することによって、均一に希釈されて所定濃度に希釈された次亜塩素酸塩水溶液となる。   The second mixing / dilution section 42 is a region where the aqueous hydrochloric acid solution and the diluting water diffused through the through hole 44a of the plate member 44 are mixed more uniformly in the downstream portion of the plate member 44 (hereinafter referred to as “second”). 46) (referred to as “stable region”). The diluting water and hydrochloric acid aqueous solution supplied to the second supply path 5 are mixed in the second reaction region 45 for a predetermined time by the flow resistance of the plate member 44 and pass through the through hole 44a of the plate member 44. By diffusing into the region 46 and passing through the second stable region 46, a hypochlorite aqueous solution that has been uniformly diluted to a predetermined concentration is obtained.

第2流量調整弁43は、第2混合希釈部42の下流側に設けられており、この第2流量調整弁43を操作することにより、第2混合希釈部42の内部圧力を調節するとともに、第2混合希釈部42によって希釈された次亜塩素酸塩水溶液、または、第2混合希釈部42に流入する前の稀釈水の流量を調節できるようになっている。   The second flow rate adjustment valve 43 is provided on the downstream side of the second mixing dilution unit 42, and by operating the second flow rate adjustment valve 43, the internal pressure of the second mixing dilution unit 42 is adjusted, The flow rate of the hypochlorite aqueous solution diluted by the second mixing / dilution unit 42 or the flow rate of the diluted water before flowing into the second mixing / dilution unit 42 can be adjusted.

第1供給経路3と第2供給経路5の間には、差圧計51が設けられている。この差圧計51は、第1供給経路3の第1注入口31よりも上流側の位置と、第2供給経路5の第2注入口41よりも上流側の位置との間に設けられており、この位置を流れる希釈水の圧力の差を測定するものである。   A differential pressure gauge 51 is provided between the first supply path 3 and the second supply path 5. The differential pressure gauge 51 is provided between a position upstream of the first inlet 31 of the first supply path 3 and a position upstream of the second inlet 41 of the second supply path 5. The pressure difference of the dilution water flowing through this position is measured.

第1供給装置4は、塩酸水溶液を貯留する第1貯留タンク55と、この第1貯留タンク55に貯留された塩酸水溶液を第1供給経路3に送る第1注入ポンプ56を備える。また、第2供給装置6は、次亜塩素酸塩水溶液を貯留する第2貯留タンク58と、この第2貯留タンク58に貯留された次亜塩素酸塩水溶液を第2供給経路5に送る第2注入ポンプ59を備える。   The first supply device 4 includes a first storage tank 55 that stores a hydrochloric acid aqueous solution, and a first injection pump 56 that sends the hydrochloric acid aqueous solution stored in the first storage tank 55 to the first supply path 3. The second supply device 6 also includes a second storage tank 58 that stores the hypochlorite aqueous solution, and a second storage tank 58 that sends the hypochlorite aqueous solution stored in the second storage tank 58 to the second supply path 5. Two infusion pumps 59 are provided.

第3供給経路7には、流量抵抗を生じさせて、第1混合希釈部32で希釈された塩酸水溶液と第2混合希釈部42で希釈された次亜塩素酸塩水溶液とを混合して希釈することにより、所定のpHの弱酸性塩素水を生成する第3混合希釈部61と、第3混合希釈部61によって生成された弱酸性塩素水の流量を調整する第3流量調整弁(例えばニードル弁)62が設けられている。   In the third supply path 7, flow resistance is generated, and the hydrochloric acid aqueous solution diluted in the first mixing / dilution unit 32 and the hypochlorite aqueous solution diluted in the second mixing / dilution unit 42 are mixed and diluted. 3rd dilution part 61 which generates weak acidic chlorine water of predetermined pH, and the 3rd flow control valve (for example, needle) which adjusts the flow volume of weak acidic chlorine water generated by the 3rd mixed dilution part 61 Valve) 62 is provided.

第3混合希釈部61は、その内径が第3供給経路7の内径よりも大きくなっており、その中途部に複数の貫通孔63aが形成された板部材63が設けられている。これにより、第3混合希釈部61の板部材63よりも上流側の部分には、第3混合希釈部61内に流入した次亜塩素酸塩水溶液と希釈水に対する流量抵抗を生じさせて、塩酸水溶液と希釈水とを混合させる領域(以下「第3反応領域」という)64が形成される。   The inner diameter of the third mixing / dilution unit 61 is larger than the inner diameter of the third supply path 7, and a plate member 63 having a plurality of through holes 63 a formed in the middle thereof. As a result, a flow resistance against the hypochlorite aqueous solution and the diluted water that has flowed into the third mixed dilution section 61 is generated in a portion upstream of the plate member 63 of the third mixed dilution section 61, and hydrochloric acid is generated. A region (hereinafter referred to as “third reaction region”) 64 in which the aqueous solution and the dilution water are mixed is formed.

また、第3混合希釈部61は、板部材63より下流側の部分に、板部材63の貫通孔63aを通過して拡散した塩酸水溶液と希釈水をさらに均一に希釈させる領域(以下「第3安定領域」という)65が形成されている。所定濃度に希釈されて第3供給経路7に供給された塩酸水溶液と次亜塩素酸塩水溶液は、板部材63による流量抵抗によって第3反応領域64で所定時間混合され、板部材63の貫通孔63aを通過することによって、第3安定領域65内に拡散し、この第3安定領域65を通過することによって、均一に希釈されて所定のpHに調整された弱酸性塩素水となる。   The third mixing / dilution unit 61 further uniformly dilutes the aqueous hydrochloric acid solution and the diluting water diffused through the through hole 63a of the plate member 63 in the downstream portion of the plate member 63 (hereinafter referred to as “third”). 65) (referred to as “stable region”). The hydrochloric acid aqueous solution and the hypochlorite aqueous solution diluted to a predetermined concentration and supplied to the third supply path 7 are mixed in the third reaction region 64 for a predetermined time by the flow resistance of the plate member 63, and the through holes of the plate member 63 are mixed. By passing through 63a, it diffuses into the third stable region 65, and by passing through the third stable region 65, it becomes weakly acidic chlorinated water that is uniformly diluted and adjusted to a predetermined pH.

第3流量調整弁62は、第3混合希釈部61の下流側に設けられており、この第3流量調整弁62を操作することにより、第3混合希釈部61の圧力を調整するとともに、第3混合希釈部61で生成された弱酸性塩素水の流量を調整できるようになっている。   The third flow rate adjustment valve 62 is provided on the downstream side of the third mixing / dilution unit 61. By operating the third flow rate adjustment valve 62, the pressure of the third mixing / dilution unit 61 is adjusted, It is possible to adjust the flow rate of the weakly acidic chlorinated water generated by the three-mixing / dilution unit 61.

なお、第1混合希釈部32、第2混合希釈部42、第3混合希釈部61の内部圧力は、第1流量調整弁(圧力調整弁)33、第2流量調整弁(圧力調整弁)43、第3流量調整弁(圧力調整弁)62を操作することにより、いずれも0.2Mpa以上に保たれている。   The internal pressures of the first mixing dilution unit 32, the second mixing dilution unit 42, and the third mixing dilution unit 61 are the first flow rate adjustment valve (pressure adjustment valve) 33 and the second flow rate adjustment valve (pressure adjustment valve) 43. By operating the third flow rate regulating valve (pressure regulating valve) 62, both are maintained at 0.2 Mpa or more.

制御装置8は、第1供給装置4の第1注入ポンプ56を制御するコントローラ(以下「第1コントローラ」という)71と、第2供給装置6の第2注入ポンプ59を制御するコントローラ(以下「第2コントローラ」という)72、主供給経路2の流量計23のデータを取り込んで、その値を第2コントローラ72に送信する流量指示計73と、第3供給経路7から供給される弱酸性塩素水の温度を表示する温度指示計74、弱酸性塩素水のpHを表示するpH指示調節計75、弱酸性塩素水の塩素濃度を表示する塩素濃度指示計76、記録計77等を備えている。   The control device 8 includes a controller (hereinafter referred to as “first controller”) 71 that controls the first infusion pump 56 of the first supply device 4 and a controller (hereinafter referred to as “the first controller” hereinafter) that controls the second infusion pump 59 of the second supply device 6. 72, a flow indicator 73 that takes in data of the flow meter 23 of the main supply path 2 and transmits the value to the second controller 72, and weakly acidic chlorine supplied from the third supply path 7 A temperature indicator 74 that displays the temperature of water, a pH indicator controller 75 that displays the pH of weakly acidic chlorine water, a chlorine concentration indicator 76 that displays the chlorine concentration of weakly acidic chlorine water, a recorder 77, and the like are provided. .

制御装置8は、予め設定された所定のpHの弱酸性塩素水を製造すべく、第1供給装置4と第2供給装置6を制御する。すなわち、制御装置8は、流量比例制御によって第1供給経路3に供給すべき塩酸水溶液、および第2供給経路5に供給すべき次亜塩素酸塩水溶液の量を決定する。具体的には、制御装置8は、流量計23で測定された希釈水の流量データを流量指示計73で読み取り、第2コントローラ72は、流量指示計73から送られた流量データを基に、この流量データに比例した、第1供給経路3に供給されるべき次亜塩素酸塩水溶液の量を決定する。そして、第2コントローラ72から第2供給装置6の第2注入ポンプ59を作動させて決定された量の次亜塩素酸塩水溶液を第2供給経路5に送る。   The control device 8 controls the first supply device 4 and the second supply device 6 to produce weakly acidic chlorinated water having a predetermined pH set in advance. That is, the control device 8 determines the amount of the aqueous hydrochloric acid solution to be supplied to the first supply path 3 and the amount of the hypochlorite aqueous solution to be supplied to the second supply path 5 by flow rate proportional control. Specifically, the control device 8 reads the flow rate data of the dilution water measured by the flow meter 23 with the flow rate indicator 73, and the second controller 72 is based on the flow rate data sent from the flow rate indicator 73. The amount of hypochlorite aqueous solution to be supplied to the first supply path 3 in proportion to the flow rate data is determined. Then, the second controller 72 operates the second injection pump 59 of the second supply device 6 to send the determined amount of hypochlorite aqueous solution to the second supply path 5.

そして、第1コントローラ71は、第2コントローラ72で決定された次亜塩素酸塩水溶液の量に応じて第1供給経路3に供給されるべき塩酸水溶液の量を決定する。なお、この塩酸水溶液の量は、次亜塩素酸塩水溶液の量に比例するものである。さらに、第1コントローラ71は、第1供給装置4の第1注入ポンプ56を作動させて決定された量の塩酸水溶液を第2供給経路5に送る。以上により、第2供給装置6は、流量計23で測定された希釈水の流量に応じた量の次亜塩素酸塩水溶液を供給するように制御され、第1供給装置4は、第2供給装置6から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を供給するように制御される。   Then, the first controller 71 determines the amount of the hydrochloric acid aqueous solution to be supplied to the first supply path 3 according to the amount of the hypochlorite aqueous solution determined by the second controller 72. The amount of the hydrochloric acid aqueous solution is proportional to the amount of the hypochlorite aqueous solution. Furthermore, the first controller 71 operates the first injection pump 56 of the first supply device 4 to send the determined amount of aqueous hydrochloric acid solution to the second supply path 5. As described above, the second supply device 6 is controlled to supply a hypochlorite aqueous solution in an amount corresponding to the flow rate of the dilution water measured by the flow meter 23, and the first supply device 4 Control is performed to supply an aqueous hydrochloric acid solution in an amount corresponding to the amount of the hypochlorite aqueous solution supplied from the device 6.

第3供給経路7の第3混合希釈部61の下流側には、温度センサ80、pHセンサ81、塩素濃度センサ82が設けられており、制御装置8の温度指示計74は、温度センサ80によって測定された温度データを指示し、pH指示調節計75は、pHセンサ81によって測定された弱酸性塩素水のpH値を指示し、塩素濃度指示計76は、塩素濃度センサ82によって測定された弱酸性塩素水の塩素濃度を指示するようになっている。記録計77は、温度指示計74、pH指示調節計75、塩素濃度指示計76で指示された値を記録するようになっている。   A temperature sensor 80, a pH sensor 81, and a chlorine concentration sensor 82 are provided on the downstream side of the third mixing and dilution unit 61 in the third supply path 7, and the temperature indicator 74 of the control device 8 is controlled by the temperature sensor 80. The measured temperature data is indicated, the pH indicating controller 75 indicates the pH value of the weakly acidic chlorinated water measured by the pH sensor 81, and the chlorine concentration indicator 76 is the weakly measured by the chlorine concentration sensor 82. The chlorine concentration of acidic chlorine water is indicated. The recorder 77 records values indicated by the temperature indicator 74, the pH indicator controller 75, and the chlorine concentration indicator 76.

以下、弱酸性塩素水製造装置1を使用して弱酸性塩素水を製造する方法を説明する。   Hereinafter, a method for producing weakly acidic chlorine water using the weakly acidic chlorine water production apparatus 1 will be described.

弱酸性塩素水製造装置1は、送水ポンプ21を作動させることにより、希釈水を主供給経路2から第1供給経路3、第2供給経路5へと送水する。主供給経路2を流れる希釈水は第1供給経路3と第2供給経路5とに分流(分岐)され、それぞれの供給経路を流れる。   The weakly acidic chlorinated water manufacturing apparatus 1 supplies dilution water from the main supply path 2 to the first supply path 3 and the second supply path 5 by operating the water supply pump 21. The dilution water flowing through the main supply path 2 is branched (branched) into the first supply path 3 and the second supply path 5 and flows through the respective supply paths.

第2供給装置6は、制御装置8に制御されて、必要な次亜塩素酸塩水溶液を、第2注入口41を介して第2供給経路5に供給する。第1供給装置4は、制御装置8に制御されて、第2供給装置6から供給される次亜塩素酸塩水溶液の量に応じた塩酸水溶液を、第1注入口31を介して第1供給経路3に供給する。   The second supply device 6 is controlled by the control device 8 to supply a necessary hypochlorite aqueous solution to the second supply path 5 via the second inlet 41. The first supply device 4 is controlled by the control device 8 to supply a first aqueous solution of hydrochloric acid corresponding to the amount of hypochlorite aqueous solution supplied from the second supply device 6 through the first inlet 31. Supply to path 3.

第1供給経路3に供給された塩酸水溶液は希釈水とともに第1混合希釈部32に流入する。そして、第1混合希釈部32で塩酸水溶液と希釈水とが混合され、均一に希釈化された所定濃度の塩酸水溶液が生成される。第2供給経路5に供給された次亜塩素酸塩水溶液は、希釈水とともに第2混合希釈部42に流入する。そして第2混合希釈部42で次亜塩素酸塩水溶液と希釈水が混合され、均一に希釈化された所定濃度の次亜塩素酸塩水溶液が生成される。   The aqueous hydrochloric acid solution supplied to the first supply path 3 flows into the first mixing / dilution unit 32 together with the dilution water. Then, the hydrochloric acid aqueous solution and the dilution water are mixed in the first mixing / dilution unit 32 to generate a hydrochloric acid aqueous solution having a predetermined concentration that is uniformly diluted. The hypochlorite aqueous solution supplied to the second supply path 5 flows into the second mixing dilution section 42 together with the dilution water. Then, the hypochlorite aqueous solution and the diluting water are mixed in the second mixing / dilution unit 42 to produce a hypochlorite aqueous solution having a predetermined concentration that is uniformly diluted.

第1供給経路3で希釈された塩酸水溶液と、第2供給経路5で希釈された次亜塩素酸塩水溶液は、第3供給経路7で合流するとともに第3混合希釈部61に流入する。次亜塩素酸塩水溶液と塩酸水溶液は、第3混合希釈部61で均一に混合して希釈化され、所定のpHの弱酸性塩素水となる。この弱酸性塩素水は、第3供給経路7から、例えば食品等の洗浄槽等の供給対象に供給される。   The aqueous hydrochloric acid solution diluted in the first supply path 3 and the hypochlorite aqueous solution diluted in the second supply path 5 merge in the third supply path 7 and flow into the third mixing and dilution unit 61. The hypochlorite aqueous solution and the hydrochloric acid aqueous solution are uniformly mixed and diluted by the third mixing and dilution unit 61 to become weakly acidic chlorinated water having a predetermined pH. The weakly acidic chlorinated water is supplied from the third supply path 7 to a supply target such as a washing tank for food, for example.

上記構成の弱酸性塩素水製造装置1によれば、第1供給経路3の第1混合希釈部32によって塩酸水溶液と希釈水を混合して均一に希釈するとともに、第2供給経路5の第2混合希釈部42によって次亜塩素酸塩水溶液と希釈水を混合して均一に希釈して、希釈された塩酸水溶液と次亜塩素酸塩水溶液を第3供給経路7の第3混合希釈部61で混合して希釈することによって、塩酸水溶液と次亜塩素酸塩水溶液は段階的に希釈され、均一でムラのない弱酸性塩素水として生成される。これにより、弱酸性塩素水は、局部的に濃度の高い次亜塩素酸塩水溶液と濃度の高い塩酸水溶液とが接触することがなく、したがって、塩素ガスの発生を抑制できるものになる。   According to the weakly acidic chlorinated water production apparatus 1 having the above configuration, the hydrochloric acid aqueous solution and the dilution water are mixed and uniformly diluted by the first mixing and dilution unit 32 of the first supply path 3, and the second supply path 5 The hypochlorite aqueous solution and the diluting water are mixed and uniformly diluted by the mixing and diluting unit 42, and the diluted hydrochloric acid aqueous solution and the hypochlorite aqueous solution are mixed by the third mixing and diluting unit 61 of the third supply path 7. By mixing and diluting, the hydrochloric acid aqueous solution and the hypochlorite aqueous solution are diluted stepwise, and are produced as weakly acidic chloric water that is uniform and free from unevenness. As a result, the weakly acidic chlorinated water does not contact the locally concentrated hypochlorite aqueous solution and the highly concentrated hydrochloric acid aqueous solution, and therefore can suppress generation of chlorine gas.

また、第1注入口31、第2注入口41よりも上流側で第1供給経路3と第2供給経路5の間に差圧計51を設けることによって、第1供給経路3と第2供給経路5の圧力差が生じた場合に、第1供給経路3の第1流量調整弁33又は第2供給経路5の第2流量調整弁43を操作することによって、圧力差をなくすことで、第1供給経路3と第2供給経路5を流れる希釈水の流量を均等にできる。   Further, by providing a differential pressure gauge 51 between the first supply path 3 and the second supply path 5 upstream of the first inlet 31 and the second inlet 41, the first supply path 3 and the second supply path. When the pressure difference of 5 occurs, the first flow rate adjustment valve 33 of the first supply path 3 or the second flow rate adjustment valve 43 of the second supply path 5 is operated to eliminate the pressure difference, thereby The flow rate of the dilution water flowing through the supply path 3 and the second supply path 5 can be made equal.

また、第1混合希釈部32の中途部に板部材(邪魔板)34を設けることによって、この板部材34の上流側の第1反応領域35に流量抵抗(圧力抵抗)を生じさせ、第1反応領域35に流入した塩酸水溶液と希釈水とを一定時間混合させ、さらに、これらを板部材34の貫通孔34aを通過させて第1安定領域36に拡散させることによって、塩酸水溶液は、ムラなく均一に希釈されることになる。   Further, by providing a plate member (baffle plate) 34 in the middle of the first mixing / dilution unit 32, a flow resistance (pressure resistance) is generated in the first reaction region 35 on the upstream side of the plate member 34. By mixing the aqueous hydrochloric acid solution and the diluting water that have flowed into the reaction region 35 for a certain period of time, and passing these through the through holes 34a of the plate member 34 and diffusing into the first stable region 36, the aqueous hydrochloric acid solution is evenly distributed. It will be diluted uniformly.

同様に、第2混合希釈部42の中途部に板部材(邪魔板)44を設けることによって、この板部材44の上流側の第2反応領域45に流量抵抗(圧力抵抗)を生じさせ、第2反応領域45に流入した次亜塩素酸塩水溶液と希釈水とを一定時間混合させ、さらに、これらを板部材44の貫通孔44aを通過させて第2安定領域46に拡散させることによって、次亜塩素酸塩水溶液は、ムラなく均一に希釈されることになる。   Similarly, by providing a plate member (baffle plate) 44 in the middle of the second mixing / dilution unit 42, a flow resistance (pressure resistance) is generated in the second reaction region 45 on the upstream side of the plate member 44. 2 The hypochlorite aqueous solution and the dilution water that have flowed into the reaction region 45 are mixed for a certain period of time, and further, these are passed through the through-hole 44a of the plate member 44 and diffused into the second stable region 46, so that The aqueous chlorite solution is diluted uniformly without unevenness.

同様に、第3混合希釈部61の中途部に板部材(邪魔板)63を設けることによって、この板部材63の上流側の第3反応領域64に流量抵抗を生じさせ、第3反応領域64に流入した塩酸水溶液と次亜塩素酸塩水溶液とを一定時間混合させ、さらに、これらを板部材63の貫通孔63aを通過させて第3安定領域65に拡散させることによって、塩酸水溶液と次亜塩素酸塩水溶液はムラなく均一に混合・希釈され、塩素ガスの発生しにくい弱酸性塩素水が生成される。   Similarly, by providing a plate member (baffle plate) 63 in the middle of the third mixing / dilution unit 61, a flow resistance is generated in the third reaction region 64 on the upstream side of the plate member 63, and the third reaction region 64. The aqueous hydrochloric acid solution and the hypochlorite aqueous solution that flowed into the plate member are mixed for a certain period of time, and further, these are passed through the through holes 63a of the plate member 63 and diffused into the third stable region 65, whereby the aqueous hydrochloric acid solution and the hypochlorous acid solution are mixed. The aqueous chlorate solution is evenly mixed and diluted evenly, producing weakly acidic chlorinated water that hardly generates chlorine gas.

また、主供給経路2に流量計23を設け、制御装置8によって、流量計23で測定された希釈水の量に応じた(比例した)量の次亜塩素酸塩水溶液を供給するように第2供給装置6を制御するとともに、第2供給装置6から供給される次亜塩素酸塩水溶液の量に応じた(比例した)量の塩酸水溶液を供給するように第1供給装置4を制御することにより、所定の濃度でかつ所定のpHの弱酸性塩素水を確実に生成できる。   Further, a flow meter 23 is provided in the main supply path 2, and the controller 8 supplies a hypochlorite aqueous solution in an amount (proportional) corresponding to the amount of dilution water measured by the flow meter 23. 2 controls the supply device 6 and controls the first supply device 4 so as to supply an aqueous hydrochloric acid solution in an amount proportional to the amount of the hypochlorite aqueous solution supplied from the second supply device 6. Thus, weakly acidic chlorine water having a predetermined concentration and a predetermined pH can be reliably generated.

弱酸性塩素水製造装置1を用いて製造したpH6および7の弱酸性塩素水(以下「実施例」という)と、上記背景技術欄で述べた方法にて生成したpH6および7の塩素水(以下「比較例」という)の発生塩素ガス濃度の比較試験を行った。この試験は、実施例、比較例について、それぞれ100ccの弱酸性塩素水をビーカーに入れて気密性を有する密封容器(袋)内に封入し、1分間放置した後に密封容器内の塩素濃度を塩素検知管によって測定した。   Weakly acidic chlorinated water of pH 6 and 7 (hereinafter referred to as “Example”) produced using the weakly acidic chlorinated water production apparatus 1 and chlorinated water of pH 6 and 7 (hereinafter referred to as “Example”) produced by the method described in the background section above A comparative test of the generated chlorine gas concentration of “Comparative Example” was conducted. In this test, for each of the Examples and Comparative Examples, 100 cc of weakly acidic chlorinated water was placed in a beaker and sealed in an airtight sealed container (bag). After standing for 1 minute, the chlorine concentration in the sealed container was determined as chlorine. Measured with a detector tube.

試験結果を図3に示す。図3は、実施例と比較例との塩素ガスの発生濃度を比較したものである。なお、弱酸性塩素水の生成には、塩素濃度150ppmの水道水を希釈水として使用した。図3に示すように、pH6および7の場合において、実施例の方が比較例よりも発生する塩素の濃度が低く、したがって、弱酸性塩素水製造装置1で製造された弱酸性塩素水は、塩素ガスの発生を抑制できるものであることが判る。なお、図3には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。   The test results are shown in FIG. FIG. 3 compares the chlorine gas generation concentrations of the example and the comparative example. For the production of weakly acidic chlorinated water, tap water having a chlorine concentration of 150 ppm was used as dilution water. As shown in FIG. 3, in the case of pH 6 and 7, the concentration of chlorine generated in the example is lower than that in the comparative example. Therefore, the weak acid chlorine water produced by the weak acid chlorine water production apparatus 1 is It can be seen that the generation of chlorine gas can be suppressed. In FIG. 3, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example.

弱酸性塩素水製造装置1の第3混合希釈部61の内部圧力を変化させて弱酸性塩素水を製造し、それぞれの圧力における弱酸性塩素水の塩素発生濃度を測定した。測定結果を図4に示す。図4は、pH6、7の弱酸性塩素水を製造した場合の第3混合希釈部61の内圧と発生塩素ガスの濃度の関係を示している。なお、弱酸性塩素水製造には、150ppmの水道水を希釈水として使用した。図4に示すように、pH6、7いずれの場合においても、第3混合希釈部61の内部圧力が0.2MPa以上の場合に、発生する塩素ガス濃度を低く抑制できることが判る。   Weakly acidic chlorinated water was produced by changing the internal pressure of the third mixing and dilution unit 61 of the weakly acidic chlorinated water production apparatus 1, and the chlorine generation concentration of the weakly acidic chlorinated water at each pressure was measured. The measurement results are shown in FIG. FIG. 4 shows the relationship between the internal pressure of the third mixed dilution section 61 and the concentration of the generated chlorine gas when weakly acidic chlorine water having pH 6 and 7 is produced. In addition, 150 ppm tap water was used as dilution water for weak acidic chlorine water manufacture. As shown in FIG. 4, it can be seen that, in both cases of pH 6 and 7, when the internal pressure of the third mixing dilution section 61 is 0.2 MPa or more, the generated chlorine gas concentration can be suppressed low.

弱酸性塩素水製造装置1を用いて製造した弱酸性塩素水(実施例)と、上記背景技術欄で述べた方法にて生成した弱酸性塩素水(比較例)とをバブリング試験を行って比較した。本試験では、希釈水として塩素濃度150ppmの水道水を使用した。バブリング試験は、実施例を、比較例を別個のビーカーに入れるとともに密封容器内に封入し、ビーカーの弱酸性塩素水に空気を一定時間注入したときに、実施例、比較例から発生する塩素の濃度を測定した。試験結果を図5に示す。図5は、弱酸性塩素水のpHが6.0、6.5、7.0の場合において、実施例、比較例から発生する塩素ガスの濃度(ppm)を比較したものである。なお、図5には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。   Comparison of weakly acidic chlorinated water produced by using the weakly acidic chlorinated water production apparatus 1 (Example) and weakly acidic chlorinated water (comparative example) produced by the method described in the background section above by performing a bubbling test did. In this test, tap water having a chlorine concentration of 150 ppm was used as dilution water. In the bubbling test, the comparative example was placed in a separate beaker and sealed in a sealed container, and when air was injected into the weakly acidic chlorine water of the beaker for a certain period of time, the chlorine generated from the examples and comparative examples was measured. Concentration was measured. The test results are shown in FIG. FIG. 5 compares the concentration (ppm) of chlorine gas generated from the examples and comparative examples when the pH of the weakly acidic chlorinated water is 6.0, 6.5, and 7.0. In FIG. 5, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example.

図5に示すように、pH6〜7の範囲において、実施例は、比較例よりも塩素ガス濃度が低くなっており、これにより、弱酸性塩素水製造装置1によって製造された弱酸性塩素水は、塩素ガスの発生を抑制できることが判る。   As shown in FIG. 5, in the range of pH 6 to 7, the example has a lower chlorine gas concentration than the comparative example, and thus the weakly acidic chlorinated water produced by the weakly acidic chlorinated water production apparatus 1 is It can be seen that generation of chlorine gas can be suppressed.

弱酸性塩素水製造装置1を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水の大腸菌(JM109)に対する殺菌効果を確認する試験を行った。試験結果を図6に示す。図6は、弱酸性塩素水製造装置1によって、pHの値が6、6.5、7の弱酸性塩素水を製造し、約1×107cfu/mlの大腸菌の培養液に注入したときの菌数を示したものである。なお、図6には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。図6では、大腸菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。 A weak acidic chlorinated water having a different pH was produced using the weak acidic chlorinated water production apparatus 1, and a test was conducted to confirm the bactericidal effect on the weakly acidic chlorinated water of each pH against Escherichia coli (JM109). The test results are shown in FIG. FIG. 6 shows a case where weakly acidic chlorine water production apparatus 1 produces weakly acidic chlorine water having a pH value of 6, 6.5, 7 and injects it into a culture solution of E. coli at about 1 × 10 7 cfu / ml. This shows the number of bacteria. In FIG. 6, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example. In FIG. 6, it means that the germicidal effect of weakly acidic chlorinated water is higher as the number of E. coli bacteria decreases.

図6に示すように、pH6〜7の範囲で弱酸性塩素水はその殺菌作用により、大腸菌の数を減少できることが判る。さらに、pH6〜7の範囲の弱酸性塩素水がさらに殺菌効果が高く、pH6の弱酸性塩素水が、殺菌効果が最も高いことが判る。   As shown in FIG. 6, it can be seen that weakly acidic chlorinated water can reduce the number of Escherichia coli by its bactericidal action in the range of pH 6-7. Furthermore, it can be seen that weakly acidic chlorinated water having a pH in the range of 6 to 7 has a higher sterilizing effect, and weakly acidic chlorinated water having a pH of 6 has the highest sterilizing effect.

弱酸性塩素水製造装置1を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水の表皮ブドウ球菌に対する殺菌効果を確認する試験を行った。試験結果を図7に示す。図7は、pH値が6、6.5、7の弱酸性塩素水を製造し、約1×106cfu/mlの表皮ブドウ球菌の培養液に注入したときの菌数を示したものである。なお、図7には、塩酸水溶液を使用せずに生成したpH9の塩素水についても参考例として表示している。図7では、表皮ブドウ球菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。図7に示すように、pH値が6〜7の範囲の弱酸性塩素水が表皮ブドウ球菌に対する殺菌効果が高いことが判る。 The weak acidic chlorinated water production apparatus 1 was used to produce weak acidic chlorinated water having different pHs, and a test was conducted to confirm the bactericidal effect against Staphylococcus epidermidis of each of the weakly acidic chlorinated waters at each pH. The test results are shown in FIG. FIG. 7 shows the number of cells when weakly acidic chlorinated water having pH values of 6, 6.5, and 7 is produced and injected into a culture solution of Staphylococcus epidermidis at about 1 × 10 6 cfu / ml. is there. In FIG. 7, pH 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example. In FIG. 7, the smaller the number of Staphylococcus epidermidis, the higher the bactericidal effect of weakly acidic chlorinated water. As shown in FIG. 7, it can be seen that weakly acidic chlorinated water having a pH value in the range of 6 to 7 has a high bactericidal effect against Staphylococcus epidermidis.

弱酸性塩素水製造装置1を用いてpHの異なる弱酸性塩素水を製造し、それぞれのpHの弱酸性塩素水のセレウス菌(芽胞菌)に対する殺菌効果を確認する試験を行った。試験結果を図8に示す。図8は、弱酸性塩素水製造装置1によってpH値が6.0、6.5、7.0の弱酸性塩素水を製造し、約1×106.1cfu/mlのセレウス菌の培養液に注入し、1分経過時(1分処理)、3分経過時(3分処理)、5分経過時(5分処理)の菌数を示したものである。なお、図8には、塩酸水溶液を使用せずに生成したpH8.1、9の塩素水についても参考例として表示している。図8では、セレウス菌の菌数が少なくなればなる程、弱酸性塩素水の殺菌効果が高いことを意味する。 A weak acidic chlorinated water having different pHs was produced using the weak acidic chlorinated water production apparatus 1, and a test was conducted to confirm the bactericidal effect on the Bacillus cereus (spore fungus) of the weakly acidic chlorinated water of each pH. The test results are shown in FIG. FIG. 8 shows that weakly acidic chlorinated water having pH values of 6.0, 6.5, and 7.0 is manufactured by the weakly acidic chlorinated water manufacturing apparatus 1 and used as a culture solution of Bacillus cereus at about 1 × 10 6.1 cfu / ml. The number of bacteria is shown when 1 minute has passed (1 minute treatment), 3 minutes have passed (3 minutes treatment), and 5 minutes have passed (5 minutes treatment). In FIG. 8, pH 8.1 and 9 chlorine water produced without using a hydrochloric acid aqueous solution is also shown as a reference example. In FIG. 8, the smaller the number of Bacillus cereus bacteria, the higher the bactericidal effect of weakly acidic chlorinated water.

図8に示すように、弱酸性塩素水は、pH6.0〜7.0の範囲で、1分以上の処理時間をかけた場合に、セレウス菌を殺菌できることが判る。また、pH6.0〜6.5の範囲で殺菌効果がより高く、pH6.0の場合が最も殺菌効果が高いことが判る。   As shown in FIG. 8, it can be seen that weakly acidic chlorinated water can sterilize Bacillus cereus when a treatment time of 1 minute or more is applied in the range of pH 6.0 to 7.0. Moreover, it turns out that a bactericidal effect is higher in the range of pH 6.0-6.5, and the case of pH 6.0 has the highest bactericidal effect.

なお、本発明は上記の実施形態に限らず、種々の変更・変形が可能である。   In addition, this invention is not restricted to said embodiment, A various change and deformation | transformation are possible.

例えば、上記の実施形態では、主供給経路2から第1供給経路3と第2供給経路5が分岐している弱酸性塩素水製造装置1を例示したが、第1供給経路3と第2供給経路5を独立した構成にしてもよい。この場合、第1供給経路3と、第2供給経路5のそれぞれに、送水ポンプ21、流量計23を設け、制御装置8によって、第1供給装置4と、第2供給装置6を別個に制御(流量比例制御)するようにしたり、第2供給経路5の希釈水の流量に応じて次亜塩素酸塩水溶液の流量を供給するように第2供給装置を制御し、第2供給装置から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を供給するように、第1供給装置を制御するようにしてもよい。   For example, in the above embodiment, the weak acidic chlorine water production apparatus 1 in which the first supply path 3 and the second supply path 5 are branched from the main supply path 2 is illustrated, but the first supply path 3 and the second supply are illustrated. The path 5 may be configured independently. In this case, a water supply pump 21 and a flow meter 23 are provided in each of the first supply path 3 and the second supply path 5, and the first supply apparatus 4 and the second supply apparatus 6 are separately controlled by the control device 8. (The flow rate proportional control) or the second supply device is controlled so as to supply the flow rate of the hypochlorite aqueous solution according to the flow rate of the dilution water in the second supply path 5, and supplied from the second supply device The first supply device may be controlled so as to supply an aqueous hydrochloric acid solution in an amount corresponding to the amount of the hypochlorite aqueous solution.

上記の実施形態では、第1混合希釈部32の下流側に第1流量調整弁33が設けられ、第2混合希釈部42の下流側に第2流量調整弁43が設けられた弱酸性塩素水製造装置1を例示したが、これに限らず、第1混合希釈部32の上流側に第1流量調整弁33を設け、第2混合希釈部42の上流側に第2流量調整弁43を設けて、希釈水の流量を調節するようにしてもよい。   In the above embodiment, the weakly acidic chlorine water in which the first flow rate adjustment valve 33 is provided on the downstream side of the first mixing dilution unit 32 and the second flow rate adjustment valve 43 is provided on the downstream side of the second mixing dilution unit 42. Although the manufacturing apparatus 1 has been illustrated, the present invention is not limited thereto, and the first flow rate adjustment valve 33 is provided on the upstream side of the first mixing / dilution unit 32 and the second flow rate adjustment valve 43 is provided on the upstream side of the second mixing / dilution unit 42. Then, the flow rate of the dilution water may be adjusted.

上記の実施形態では、第1供給経路3と第2供給経路5の間に差圧計51が設けられた弱酸性塩素水製造装置1を例示したが、この差圧計51に代えて、第1供給経路3の第1注入口31よりも上流側に流量計23を設け、第2供給経路5の第2注入口41よりも上流側に流量計23を設けるようにして、それぞれの流量計23で測定した流量値に基づいて、第1供給経路3、第2供給経路5の希釈水の流量を調節するようにしてもよい。   In the above embodiment, the weakly acidic chlorine water production apparatus 1 in which the differential pressure gauge 51 is provided between the first supply path 3 and the second supply path 5 is illustrated. However, instead of the differential pressure gauge 51, the first supply is provided. The flow meter 23 is provided on the upstream side of the first inlet 31 of the path 3 and the flow meter 23 is provided on the upstream side of the second inlet 41 of the second supply path 5. You may make it adjust the flow volume of the dilution water of the 1st supply path 3 and the 2nd supply path 5 based on the measured flow value.

本発明の一実施形態に係る弱酸性塩素水製造装置のフロー図である。It is a flowchart of the weak acidic chlorine water manufacturing apparatus which concerns on one Embodiment of this invention. 弱酸性塩素水製造装置の要部の拡大図である。It is an enlarged view of the principal part of a weak acidic chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造した弱酸性塩素水から発生した塩素ガスの濃度を示すグラフである。It is a graph which shows the density | concentration of the chlorine gas generate | occur | produced from the weak acidic chlorine water manufactured with the weak acidic chlorine water manufacturing apparatus. 弱酸性塩素水製造装置の第3混合希釈部の内圧を変化させて弱酸性塩素水を製造したときに、各弱酸性塩素水から発生した塩素ガスの濃度を示すグラフである。It is a graph which shows the density | concentration of the chlorine gas generate | occur | produced from each weakly acidic chlorine water when changing the internal pressure of the 3rd mixing dilution part of a weakly acidic chlorine water manufacturing apparatus and manufacturing weakly acidic chlorine water. バブリング試験の試験結果を示すグラフである。It is a graph which shows the test result of a bubbling test. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の大腸菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to colon_bacillus | E._coli of the weak acid chlorine water manufactured with the weak acid chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の表皮ブドウ球菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to Staphylococcus epidermidis produced with the weak acid chlorine water manufacturing apparatus. 弱酸性塩素水製造装置によって製造された弱酸性塩素水の芽胞菌に対する殺菌作用を示すグラフである。It is a graph which shows the bactericidal action with respect to the spore bacteria of the weak acid chlorine water manufactured with the weak acid chlorine water manufacturing apparatus. 水素イオン指数に対する弱酸性塩素水の遊離塩素の存在率(存在比)を示すグラフである。It is a graph which shows the abundance ratio (abundance ratio) of weakly acidic chlorine water free chlorine with respect to the hydrogen ion index.

符号の説明Explanation of symbols

1…弱酸性塩素水製造装置、2…主供給経路、3…第1供給経路、4…第1供給装置、5…第2供給経路、6…第2供給装置、7…第3供給経路、8…制御装置、31…第1注入口、32…第1混合希釈部、33…第1流量調整弁、34…板部材、34a…貫通孔、41…第2注入口、42…第2混合希釈部、43…第2流量調整弁、44…板部材、51…差圧計、61…第3混合希釈部、63…板部材   DESCRIPTION OF SYMBOLS 1 ... Weakly acidic chlorine water manufacturing apparatus, 2 ... Main supply path, 3 ... 1st supply path, 4 ... 1st supply apparatus, 5 ... 2nd supply path, 6 ... 2nd supply apparatus, 7 ... 3rd supply path, DESCRIPTION OF SYMBOLS 8 ... Control apparatus, 31 ... 1st inlet, 32 ... 1st mixing dilution part, 33 ... 1st flow control valve, 34 ... Plate member, 34a ... Through-hole, 41 ... 2nd inlet, 42 ... 2nd mixing Dilution part 43 ... 2nd flow regulating valve 44 ... Plate member 51 ... Differential pressure gauge 61 ... Third mixed dilution part 63 ... Plate member

Claims (5)

塩酸水溶液を希釈する希釈水が供給される第1供給経路と、第1供給経路に塩酸水溶液を供給する供給装置と、次亜塩素酸塩水溶液を希釈する希釈水が供給される第2供給経路と、第2供給経路に次亜塩素酸塩水溶液を供給する供給装置と、第1供給経路と第2供給経路を合流させるとともに、第1供給経路で希釈された塩酸水溶液と第2供給経路で希釈された次亜塩素酸塩水溶液とを混合させて希釈することにより、所定の水素イオン指数の弱酸性塩素水を供給する第3供給経路とを備えた弱酸性塩素水製造装置であって、
第1供給経路には、塩酸水溶液の供給装置から供給される塩酸水溶液を注入する第1注入口と、第1注入口の下流側に位置するとともに、流量抵抗を生じさせて第1注入口から注入された塩酸水溶液を希釈水と混合して希釈する第1混合希釈部とが設けられており、
第2供給経路には、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液を注入する第2注入口と、第2注入口の下流側に位置するとともに、流量抵抗を生じさせて第2注入口から注入された次亜塩素酸塩水溶液を希釈水と混合して希釈する第2混合希釈部とが設けられており、
第3供給経路には、流量抵抗を生じさせて、第1混合希釈部で希釈された塩酸水溶液と第2混合希釈部で希釈された次亜塩素酸塩水溶液とを混合して所定の水素イオン指数の弱酸性塩素水を生成する第3混合希釈部が設けられており、
第1供給経路と第2供給経路とは希釈水を供給する主供給経路から分岐されており、第1供給経路における第1注入口よりも上流側位置と、第2供給経路における第2注入口よりも上流側位置との間に差圧計が設けられ、しかも、第1供給経路には、この第1供給経路の希釈水の流量を調整する第1流量調整弁が設けられ、第2供給経路には、この第2供給経路の希釈水の流量を調整する第2流量調整弁が設けられていることを特徴とする弱酸性塩素水製造装置。
A first supply path for supplying dilution water for diluting hydrochloric acid aqueous solution, a supply device for supplying hydrochloric acid aqueous solution to the first supply path, and a second supply path for supplying dilution water for diluting hypochlorite aqueous solution And a supply device for supplying a hypochlorite aqueous solution to the second supply path, a first supply path and a second supply path are joined together, and the hydrochloric acid aqueous solution diluted in the first supply path and the second supply path A weakly acidic chlorinated water production apparatus comprising a third supply path for supplying weakly acidic chlorinated water having a predetermined hydrogen ion index by mixing and diluting a diluted hypochlorite aqueous solution,
The first supply path has a first inlet for injecting a hydrochloric acid aqueous solution supplied from a hydrochloric acid aqueous solution supply device and a downstream side of the first inlet, and generates a flow resistance from the first inlet. A first mixed dilution section for mixing and diluting the injected hydrochloric acid aqueous solution with dilution water,
The second supply path has a second inlet for injecting a hypochlorite aqueous solution supplied from a hypochlorite aqueous solution supply device, a downstream side of the second inlet, and a flow resistance. A second mixed dilution section for mixing and diluting the hypochlorite aqueous solution generated and injected from the second inlet with dilution water is provided,
In the third supply path, a flow resistance is generated, and a hydrochloric acid aqueous solution diluted in the first mixing dilution unit and a hypochlorite aqueous solution diluted in the second mixing dilution unit are mixed to obtain predetermined hydrogen ions. A third mixed dilution section for generating an index of weakly acidic chlorinated water is provided ,
The first supply path and the second supply path are branched from the main supply path for supplying dilution water, and are located upstream of the first inlet in the first supply path and the second inlet in the second supply path. A differential pressure gauge is provided between the first supply path and a first flow rate adjusting valve for adjusting the flow rate of the dilution water in the first supply path, and the second supply path is provided in the first supply path. Is provided with a second flow rate adjustment valve for adjusting the flow rate of the dilution water in the second supply path .
第1混合希釈部は、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と希釈水を混合し、塩酸水溶液を希釈水とともに板部材の貫通孔を通過させることにより、この塩酸水溶液を所定の濃度に希釈できるように構成されており、
第1供給経路は、第1混合希釈部の下流側に第1流量調整弁を備えている請求項に記載の弱酸性塩素水製造装置。
The first mixing / dilution unit includes a plate member having a plurality of through holes formed therein, and creates a flow resistance on the upstream side of the plate member to mix the hydrochloric acid aqueous solution and the dilution water, and the hydrochloric acid aqueous solution together with the dilution water. By passing through the through hole of the plate member, this aqueous hydrochloric acid solution is configured to be diluted to a predetermined concentration,
The weak acid chlorine water manufacturing apparatus according to claim 1 , wherein the first supply path includes a first flow rate adjustment valve on the downstream side of the first mixing dilution section.
第2混合希釈部は、複数の貫通孔が形成された板部材を内部に備えるとともに、板部材の上流側で流量抵抗を生じさせて次亜塩素酸塩水溶液と希釈水を混合し、次亜塩素酸塩水溶液を希釈水とともに板部材の貫通孔を通過させることにより、次亜塩素酸塩水溶液を所定の濃度に希釈できるように構成されており、
第2供給経路は、第2混合希釈部の下流側に第2流量調整弁を備えている請求項又はに記載の弱酸性塩素水製造装置。
The second mixing / dilution unit includes a plate member having a plurality of through holes formed therein, and generates a flow resistance on the upstream side of the plate member to mix the hypochlorite aqueous solution and the dilution water. By passing the chlorate aqueous solution together with the dilution water through the through hole of the plate member, the hypochlorite aqueous solution can be diluted to a predetermined concentration,
The weak acid chlorine water manufacturing apparatus according to claim 1 or 2 , wherein the second supply path includes a second flow rate adjustment valve on the downstream side of the second mixing and dilution unit.
第3混合希釈部には複数の貫通孔が形成された板部材が設けられ、第3混合希釈部は、板部材の上流側で流量抵抗を生じさせて塩酸水溶液と次亜塩素酸塩水溶液とを混合するとともに、次亜塩素酸塩水溶液を塩酸水溶液とともに板部材の貫通孔を通過させることにより、所定の水素イオン指数の弱酸性塩素水を生成するように構成されており、
第3供給経路は、第3混合希釈部の下流側に第3流量調整弁を備えている請求項1からのいずれか1項に記載の弱酸性塩素水製造装置。
A plate member having a plurality of through-holes is provided in the third mixing / dilution unit, and the third mixing / dilution unit generates a flow resistance on the upstream side of the plate member to generate a hydrochloric acid aqueous solution and a hypochlorite aqueous solution. And by passing the hypochlorite aqueous solution together with the hydrochloric acid aqueous solution through the through hole of the plate member, it is configured to generate weakly acidic chlorine water having a predetermined hydrogen ion index,
The weak acid chlorine water manufacturing apparatus according to any one of claims 1 to 3 , wherein the third supply path includes a third flow rate adjustment valve on the downstream side of the third mixing and dilution unit.
次亜塩素酸塩水溶液の供給装置は、希釈水の流量に応じた量の次亜塩素酸塩水溶液を第1供給経路に供給するように制御され、塩酸水溶液の供給装置は、次亜塩素酸塩水溶液の供給装置から供給される次亜塩素酸塩水溶液の量に応じた量の塩酸水溶液を第2供給経路に供給するように制御される請求項1からのいずれか1項に記載の弱酸性塩素水製造装置。 The hypochlorite aqueous solution supply device is controlled so as to supply a hypochlorite aqueous solution in an amount corresponding to the flow rate of the dilution water to the first supply path, and the hydrochloric acid aqueous solution supply device is hypochlorous acid. from claim 1 is controlled to supply the amount of aqueous hydrochloric acid corresponding to the amount of hypochlorite solution supplied from the supply device of a salt solution to the second supply path according to any one of the 4 Weakly acidic chlorine water production equipment.
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