JP5126089B2 - Ray cut filter - Google Patents

Description

  The present invention relates to a light cut filter that suppresses transmission of light in a preset wavelength band.

  In an optical system of an electronic camera typified by a general video camera or a digital still camera, a coupling optical system, an infrared cut filter, an optical low-pass filter, a CCD (Charge Coupled Device), and a MOS from the subject side along the optical axis. An imaging device such as (Metal Oxide Semiconductor) is sequentially disposed (for example, see Patent Document 1). In addition, the imaging device here has a sensitivity characteristic that responds to a light beam having a wider wavelength band than a light beam having a wavelength band (visible light) visible to the human eye. Therefore, in addition to visible light, it also responds to light in the infrared region and ultraviolet region.

  By the way, the human eye responds to light having a wavelength in the range of about 400 to 620 nm in a dark place and responds to light having a wavelength in the range of about 420 to 700 nm in a bright place. In contrast, for example, a CCD responds with high sensitivity to light having a wavelength in the range of 400 to 700 nm, and further responds to light having a wavelength of less than 400 nm and light having a wavelength of more than 700 nm.

  For this reason, in the imaging device described in Patent Document 1 below, an infrared cut filter is provided in addition to the CCD that is the imaging device so that infrared rays do not reach the imaging device, and the captured image is close to the human eye. Is to be obtained.

  As an infrared cut filter used in an imaging device described in Patent Document 1 described below, an infrared cut coat that transmits visible light and reflects infrared light is used.

Currently, the infrared cut coating _is laminated alternately with the high refractive index material such as _{TiO 2, ZrO 2, Ta 2} O 5, Nb 2 O 5, the SiO _2, MgF ₂ or the like of a low refractive index material and a transparent substrate Thus, it is composed of a multilayer film made up of several tens of layers.

  According to this infrared cut coat, it is possible to obtain “a characteristic in which the transmittance sharply decreases” from the visible range to the infrared range, and it is easy to adjust the point at which the transmittance is approximately 0% to about 700 nm. It is.

  Now, demands for low power consumption and high sensitivity are increasing, and electronic cameras that meet these demands have been developed. In particular, devices having higher infrared sensitivity than conventional imaging devices have been developed. However, in an imaging device using only the current infrared cut coat, the infrared cut is insufficient. Therefore, at present, in order to cut infrared rays, a method of using an infrared cut coat and infrared absorbing glass in combination is employed.

JP 2000-209510 A

  However, when an infrared cut coat and an infrared absorbing glass are used in combination to cut infrared rays, there is a problem that the light cut filter becomes thick and the material cost increases.

  Therefore, in order to solve the above-described problems, an object of the present invention is to provide a thin light-cut filter that cuts infrared rays using only an infrared cut coat as a light-cut filter.

  In order to achieve the above object, a light beam cut filter according to the present invention includes a transparent substrate and a multilayer film that is formed on the transparent substrate and cuts light in a desired wavelength band, and the multilayer film is preset. It is composed of a plurality of light cut groups having different wavelength bands of light rays to be cut, and a plurality of common films made of a common optical film thickness, divided for each optical film thickness. The common films are provided adjacent to each other.

  ADVANTAGE OF THE INVENTION According to this invention, it can be set as the thin light cut filter which cuts infrared rays only with an infrared cut coat as a light cut filter. That is, according to the present invention, since the multilayer film is divided into a plurality of light cut groups, the transmittance change rate (variation amount) in a wide wavelength range without increasing the number of layers in one light cut group. It has the characteristic to suppress And according to this invention, the said multilayer film is further comprised from these several light cut groups and the said common film, and each of these several light cut groups has a common film which each has a common optical film thickness. Are arranged adjacent to each other, so that a composite wave is formed by combining the plurality of light cut groups and the common film. According to this characteristic of the present invention, it is possible to suppress the amount of transmission of light in the infrared region (particularly the near infrared region) while transmitting light in the visible region. Specifically, it is possible to widen the band for suppressing the amount of transmitted light in the infrared region while transmitting light from the lower limit wavelength in the visible range of about 400 nm to the upper limit wavelength of about 650 nm. As a result, the light cut filter according to the present invention does not require a separate infrared absorbing glass.

  In the above-described configuration, the plurality of light beam cut groups include a light beam including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 0.9 or more and less than 1.15. A cut group and a light ray cut group consisting of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.15 or more and less than 1.30, The common film may be a light cut group including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less.

  In this case, it is possible to suppress the transmission amount of light in the infrared region (particularly in the near infrared region) while transmitting light in the visible region. Specifically, a light-cut group consisting of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less, an optical film thickness of 0.9 or more and less than 1.15, and a center wavelength of 700 nm. Since the light cut group consisting of at least one cut layer having a thickness of 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less is disposed adjacent to the lower limit of the visible range Light having a wavelength in the vicinity of about 400 nm can be transmitted. When the optical film thickness of the common film exceeds 1.80, transmission of visible light is hindered. Furthermore, a light beam cut group comprising at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less, an optical film thickness of 1.15 or more and less than 1.30, and a center wavelength of 700 nm or more. Since the light cut group consisting of at least one cut layer having a thickness of 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less is arranged adjacent to the light transmission group in the infrared region. It becomes possible to widen the band for suppressing the amount. As a result, it is possible not only to suppress the amount of light having a wavelength of about 650 nm to about 1100 nm while transmitting light having a wavelength of about 400 nm to about 650 nm, which is in the visible range, but also to about 1100 nm to about 1200 nm. It is also possible to suppress the amount of transmitted light having a wavelength.

In the above configuration, the multilayer film includes a plurality of alternately stacked first thin films using TiO ₂ or Nb ₂ O ₂ made of a high refractive index material and second thin films using SiO ₂ made of a low refractive index material. The plurality of light-cut groups include the first thin film having a physical film thickness of 68 nm or more and 74 nm or less, and the second thin film having a physical film thickness of 107 nm or more and 148 nm or less. A light cut group consisting of the first thin film having a physical film thickness of 87 nm to 106 nm and the second thin film having a physical film thickness of 137 nm to 167 nm. The common film includes a first thin film having a physical film thickness of 98 nm or more and 147 nm or less, and a physical film thickness of 155 nm or more and 232 nm or less. It may be a light cut group comprising the second thin film.

  In this case, it is possible to suppress the transmission amount of light in the infrared region (particularly in the near infrared region) while transmitting light in the visible region. Specifically, a light cut group comprising the first thin film having a physical film thickness of 68 nm or more and 74 nm or less, and the second thin film having a physical film thickness of 107 nm or more and 148 nm or less, and a physical film Since the first thin film having a thickness of 98 nm or more and 147 nm or less and the common film including the second thin film having a physical film thickness of 155 nm or more and 232 nm or less are provided adjacent to each other, visible The first thin film having a physical film thickness of 87 nm or more and 106 nm or less and a physical film thickness of 137 nm or more and 167 nm can be transmitted. A light-cut group comprising the second thin film, the first thin film having a physical film thickness of 98 nm or more and 147 nm or less, and a physical film thickness. Since there is 155nm or more and the common film composed of said second thin film is 232nm or less provided adjacent, it is possible to widen the band to suppress the amount of transmitted light in the infrared region. As a result, it is possible not only to suppress the transmission amount of light having a wavelength of about 650 nm to about 1100 nm while transmitting light having a wavelength of about 400 nm to about 650 nm, which is in the visible range, but also to light having a wavelength of about 1100 nm to about 1200 nm. Can also be suppressed.

  In the above configuration, the multilayer film may include an adjustment layer at a position where the refractive index changes.

  In this case, it is possible to suppress the generation of ripples, and in particular, it is possible to suppress the generation of ripples in the wavelength region even though they are transmitted, and it is also possible to suppress the amount of change in transmittance that is abruptly displaced.

  ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the thin-shaped light cut filter which cuts infrared rays only with an infrared cut coat as a light cut filter.

FIG. 1 is a schematic diagram showing a configuration of an infrared cut filter according to the present embodiment. FIG. 2 is a schematic configuration diagram showing the configuration of the infrared cut filter according to the present embodiment. FIG. 3 is a schematic diagram showing the transmittance characteristics of the infrared cut filter according to the present embodiment. FIG. 4 is a diagram illustrating the transmittance characteristics of the infrared cut filter according to the first embodiment. FIG. 5 is a diagram illustrating the transmittance characteristics of the infrared cut filter according to the second embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the embodiment described below, a case where the present invention is applied to an infrared cut filter intended for infrared cut as a light cut filter is shown.

  As shown in FIG. 1, an infrared cut filter 1 according to the present embodiment cuts a light beam in a desired wavelength band formed on a crystal plate 2 that is a transparent substrate and one main surface 21 of the crystal plate 2. The multilayer film 3 and the antireflection film 4 (AR film) formed on the other main surface 22 of the crystal plate 2 are formed.

The multilayer film 3 is formed by alternately laminating a plurality of first thin films 31 made of a high refractive index material and second thin films 32 made of a low refractive index material. Therefore, the odd-numbered layers counted from the one surface side of the crystal plate 2 are constituted by the first thin film 31, and the even-numbered layers are constituted by the second thin film 32. In this embodiment, TiO ₂ is used for the first thin film and SiO ₂ is used for the second thin film.

As a manufacturing method of the multilayer film 3, TiO ₂ and SiO ₂ are alternately vacuum-deposited on a main surface 21 of the quartz plate 2 by a known vacuum deposition apparatus (not shown), as shown in FIG. A multilayer film 3 is formed. In addition, the film thickness adjustment of each thin film 31 and 32 performs vapor deposition operation | movement, monitoring a film thickness, and when the predetermined film thickness is reached, the shutter (illustration omitted) provided in the vicinity of the vapor deposition source (illustration omitted) is closed. For example, the deposition of the deposition material (TiO ₂ , SiO ₂ ) is stopped.

Further, with respect to the other main surface 22 of the quartz plate 2, a single layer, Al ₂ O ₂ and a multilayer film composed of ZrO ₂ and MgF ₂ Metropolitan consisting MgF _2, or a multilayer film composed of TiO ₂ and SiO ₂ Metropolitan This film is vacuum-deposited by a well-known vacuum deposition apparatus (not shown) to form an antireflection film 4 as shown in FIG. The antireflection film 4 performs a vapor deposition operation while monitoring the film thickness, and closes a shutter (not shown) provided in the vicinity of the vapor deposition source (not shown) when the predetermined film thickness is reached. This is done by stopping the deposition.

  As shown in FIG. 2, the multilayer film 3 is composed of a plurality of layers defined by ordinal numbers in order from one main surface 21 side of the quartz plate 2, in this embodiment, one layer, two layers, three layers, and so on. ing. Each of the first layer, the second layer, the third layer,... Is formed by laminating a first thin film 31 and a second thin film 32. The first thin film 31 and the second thin film 32 to be stacked have different optical film thicknesses, so that the thicknesses of the first layer, the second layer, the third layer,. In addition, the optical film thickness here is calculated | required by Numerical formula 1 mentioned below.

[Formula 1]
Nd = d × N × 4 / λ (Nd: optical film thickness, d: physical film thickness, N: refractive index, λ: center wavelength)
The multilayer film described above is arranged at a position where the refractive index changes, and a plurality of light cut groups (film thickness groups) divided for each preset optical film thickness, a plurality of common films 33 having a common optical film thickness, and the like. And the prepared adjustment layer 34.

  Specifically, each of the plurality of light ray cut groups has different wavelength bands of light rays to be cut. In the present embodiment, the plurality of light ray cut groups are composed of a first light ray cut group 35 and a second light ray cut group 36. ing.

  The first light cut group 35 includes at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 0.9 or more and less than 1.15. The first light cut group 35 includes a first thin film 31 having a physical film thickness of 68 nm or more and 74 nm or less, and a second thin film 32 having a physical film thickness of 107 nm or more and 148 nm or less. .

  The second light cut group 36 includes at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.15 or more and less than 1.30. The second light cut group 36 includes a first thin film 31 having a physical film thickness of 87 nm or more and 106 nm or less, and a second thin film 32 having a physical film thickness of 137 nm or more and 167 nm or less. .

  The plurality of common films 33 are arranged adjacent to each of the plurality of light beam cut groups. The common film 33 is a light beam cut group including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less. The common film 33 includes a first thin film 31 having a physical film thickness of 98 nm or more and 147 nm or less, and a second thin film 32 having a physical film thickness of 155 nm or more and 232 nm or less.

  With the configuration described above, the infrared cut filter 1 according to the present embodiment can obtain transmittance characteristics as shown in FIG.

  The wavelength characteristics of the infrared cut filter 1 according to this embodiment are actually measured, and the measurement results and configuration are shown as Example 1 in FIG.

In the first embodiment, the crystal plate 2 having a refractive index of 1,54 in N atmosphere is used as the transparent substrate. Further, as the first thin film 31, TiO ₂ having a refractive index in the N atmosphere of 2.3000 is used, and as the second thin film 31, SiO ₂ having a refractive index in the N atmosphere of 1.46000 is used. The center wavelength is 725.00 nm.

  The thin films 31 and 32 are formed by the above-described manufacturing method of the multilayer film 3 composed of 48 layers so that the optical film thickness of each of the thin films 31 and 32 has a value as shown in Table 1, and is shown in FIG. Such transmission characteristics can be obtained. In Example 1, the incident angle of the light beam is 0 degree, that is, the light beam is vertically incident.

表１は、赤外線カットフィルタ１の多層膜３の組成及び各薄膜（第１薄膜３１、第２薄膜３２）の光学膜厚を示している。

Table 1 shows the composition of the multilayer film 3 of the infrared cut filter 1 and the optical film thickness of each thin film (the first thin film 31 and the second thin film 32).

  Moreover, in Example 1, as shown in Table 1, out of 48 layers of the multilayer film 3, one layer and two layers are configured as the adjustment layer 34, and three to nineteen layers are configured as the first light cut group. 20 to 22 layers are configured as a common film 33, 23 to 28 layers are configured as a second light cut group, 29 to 47 layers are configured as a common film 33, and 48 layers are configured as an adjustment layer 34. It is configured.

  As shown in FIG. 4, the infrared cut filter 1 according to the first embodiment transmits light having a wavelength of about 400 nm to about 650 nm, which is the visible region, and transmits light in the infrared region (particularly near infrared region). The amount of transmission from about 680 nm to about 1200 nm is suppressed to about 0% (specifically, about 5% or less).

  As described above, according to the present embodiment, it is possible to cut infrared rays using only the thin infrared cut filter 1 as the light cut filter.

  That is, according to the light ray cut filter 1 according to the present embodiment, the multilayer film is divided into a plurality of light ray cut groups (the first light ray cut group 35 and the second light ray cut group 36). Without increasing the number of layers of the film, it has a characteristic of suppressing the change rate (transition amount) of transmittance in a wide wavelength range. Further, according to the light beam cut filter 1 according to the present embodiment, the multilayer film further includes the first light beam cut group 35, the second light beam cut group 36, and the common film 33, and the first light beam cut group 35. And the second light ray cut group 36 are adjacently arranged with a common film 33 having a common optical film thickness, so that the first light ray cut group 35, the second light ray cut group 36, and the common film 33, The combined wave is constructed. According to the characteristics of the light cut filter 1 according to the present embodiment, it is possible to suppress the amount of transmission of light in the infrared region (particularly the near infrared region) while transmitting light in the visible region. Specifically, it is possible to widen the band for suppressing the amount of transmitted light in the infrared region while transmitting light from about 400 nm which is the lower limit wavelength in the visible range to about 650 nm which is the upper limit wavelength. As a result, the light cut filter 1 according to the present embodiment does not require a separate infrared absorbing glass.

  In addition, the plurality of light cut groups includes a first light cut made of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 0.9 or more and less than 1.15. The group 35 includes a second light ray cut group 36 including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.15 or more and less than 1.30. In addition, the common film 33 is a light cut group including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less. The amount of transmission of light in the infrared region (particularly the near infrared region) can be suppressed while transmitting light in the visible region.

  Specifically, a first light ray cut group 35 including at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 0.9 or more and less than 1.15, A light ray cut group (common film 33) composed of at least one cut layer having a wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less is provided adjacently. Therefore, light having a wavelength in the vicinity of about 400 nm, which is the lower limit wavelength in the visible range, can be transmitted. When the optical film thickness of the common film exceeds 1.80, transmission of visible light is hindered. Furthermore, the second wavelength cut group 36 composed of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.15 or more and less than 1.30, and the center wavelength is Since the light cut group (common film 33) composed of at least one cut layer having a thickness of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less is provided adjacently. In addition, it is possible to widen the band for suppressing the amount of transmitted light in the infrared region. As a result, it is possible not only to suppress the amount of transmission of light having a wavelength of about 650 nm to about 1100 nm while transmitting light having a wavelength of about 400 nm to about 650 nm in the visible range, but also to light having a wavelength of about 1100 nm to about 1200 nm. Can also be suppressed.

In the multilayer film, a plurality of first thin films 31 using TiO ₂ or Nb ₂ O ₂ made of a high refractive index material and second thin films 32 using SiO ₂ made of a low refractive index material are alternately stacked. The first light cut group 35 includes a first thin film 31 having a physical film thickness of 68 nm or more and 74 nm or less, and a second thin film 32 having a physical film thickness of 107 nm or more and 148 nm or less. The second light cut group 36 includes a first thin film 31 having a physical film thickness of 87 nm or more and 106 nm or less, and a second thin film 32 having a physical film thickness of 133 nm or more and 167 nm or less. The film 33 includes a first thin film 31 having a physical film thickness of 98 nm or more and 147 nm or less, and a light beam cap comprising a second thin film 32 having a physical film thickness of 155 nm or more and 232 nm or less. Since a group, while transmitting the light in the visible region, it is possible to suppress the amount of transmitted light in the infrared region (especially near-infrared region). Specifically, the first light cut group 35 made of the physical film thickness and the material and the light cut group (common film 33) made of the physical film thickness and the material are provided adjacent to each other. A light beam having a lower limit wavelength of about 400 nm can be transmitted, the second light beam cut group 36 made of the physical film thickness and the material, and the light beam cut group (common film made of the physical film thickness and the material). 33) are provided adjacent to each other, so that it is possible to widen the band for suppressing the amount of transmitted light in the infrared region. As a result, it is possible not only to suppress the amount of transmission of light having a wavelength of about 650 nm to about 1100 nm while transmitting light having a wavelength of about 400 nm to about 650 nm in the visible range, but also to light having a wavelength of about 1100 nm to about 1200 nm. Can also be suppressed.

  In addition, since the adjustment layer 34 is provided at the position where the refractive index changes in the multilayer film, the generation of ripples can be suppressed, and in particular, the generation of ripples in the wavelength region can be suppressed even though it is transmitted. It is also possible to suppress the amount of change in transmittance that changes sharply.

  In the present embodiment, the multilayer film 3 intended to cut light in the band from the visible range to the infrared range is formed, but the present invention is not limited to this, and the ultraviolet range is also included. A multilayer film intended to cut light in a band extending over the visible range may be formed. In the present embodiment, the multilayer film 3 intended to cut the light beam in the band from the visible region to the infrared region is formed on the one principal surface 21 of the quartz plate 2 and reflected on the other principal surface 22. Although the prevention film 4 is formed, the present invention is not limited to this, and the design can be arbitrarily changed.

  Moreover, in this Embodiment, although the crystal plate 2 is used for a transparent substrate, it is not limited to this, For example, a glass plate may be sufficient if it is a board | substrate which can permeate | transmit a light ray. Further, the quartz plate 2 is not limited, and may be a single plate quartz plate, for example, a birefringent plate or a birefringent plate composed of a plurality of plates. Moreover, you may comprise a transparent substrate combining a quartz plate and a glass plate.

In the present embodiment, TiO ₂ is used for the first thin film 31. However, the present invention is not limited to this, and the first thin film 31 may be made of a high refractive index material. For example, ZrO ₂ Ta ₂ O ₂ , Nb ₂ O ₂ or the like may be used. Moreover, although SiO ₂ is used for the second thin film 32, the present invention is not limited to this, and the second thin film 32 only needs to be made of a low refractive index material. For example, MgF ₂ or the like may be used. .

  In the present embodiment, the plurality of light ray cut groups are constituted by the first light ray cut group 35 and the second light ray cut group 36. However, the present invention is not limited to this. It may be a group.

  In the present embodiment, the multilayer film 3 and the antireflection film 4 are formed on the quartz plate 2 by a vacuum deposition method. However, the present invention is not limited to this, and the multilayer film 3 and the antireflection film 4 are not limited thereto. You may form in the quartz plate 2 by other methods, such as an ion assist vapor deposition method and sputtering method.

  In Example 1, the multilayer film 3 is composed of 48 layers, but the number of layers is not limited, and may be 60 layers, for example.

  Specifically, an example (Example 2) of the multilayer film 3 having 60 layers is shown below.

  The infrared cut filter 1 according to Example 2 is different from the above-described embodiment and Example 1 in the configuration of the multilayer film 3. Therefore, in Example 2, the configuration of the multilayer film 3 different from the above-described embodiment and Example 1 will be described, and description of the same configuration will be omitted. Therefore, the operational effects of the same configuration as the present embodiment and Example 1 are the same as those of the present embodiment and Example 1 described above.

  In the present Example 2, the manufacturing method of the multilayer film 3 composed of 60 layers described above so that the optical film thickness of each of the thin films (the first thin film 31 and the second thin film 32) becomes a value as shown in Table 2. The first thin film 31 and the second thin film 32 are formed, and transmission characteristics as shown in FIG. 5 are obtained.

表２は、赤外線カットフィルタ１の多層膜３の組成及び各薄膜（第１薄膜３１、第２薄膜３２）の光学膜厚を示している。

Table 2 shows the composition of the multilayer film 3 of the infrared cut filter 1 and the optical film thickness of each thin film (the first thin film 31 and the second thin film 32).

  In Example 2, as shown in Table 2, among the 60 layers of the multilayer film 3, 1, 11, 12, 18-22, and 40 layers are configured as the adjustment layer 3d.

  Moreover, in this Example 2, as shown in Table 2, 1 layer-4 layers are comprised as the adjustment layer 34 among 60 layers of the multilayer film 3, and 5 layers-25 layers are comprised as a 1st light cut group. 26 layers are configured as the adjustment layer 34, 27 layers to 31 layers are configured as the common film 33, 32 layers to 36 layers are configured as the second light cut group, and 37 layers to 59 layers are configured as the common film 33. 60 layers are configured as the adjustment layer 34.

  As described above, in the second embodiment, the adjustment layer 34 includes the crystal plate 2 and the first light cut group 35, the first light cut group 35 and the common film 33, and the second light cut. Arranged outside the group 36. In particular, the adjustment layer 34 between the first light cut group 35 and the common film 33 is provided to prevent the refractive index from changing abruptly, and the transmittance is changed as compared with the first embodiment. Although it can be relaxed, the thickness is increased as compared with the first embodiment.

  As shown in FIG. 5, in the infrared cut filter 1 according to the second embodiment, the light having a wavelength of about 400 nm to about 650 nm, which is the visible region, is transmitted, and the light is in the infrared region (particularly near infrared region). The amount of transmission from about 680 nm to about 1200 nm is suppressed to about 0% (specifically, about 2% or less).

  It should be noted that the present invention can be implemented in various other forms without departing from the spirit, gist, or main features. For this reason, the above-described embodiment is merely an example in all respects and should not be interpreted in a limited manner. The scope of the present invention is indicated by the claims, and is not restricted by the text of the specification. Further, all modifications and changes belonging to the equivalent scope of the claims are within the scope of the present invention.

  The present invention can be applied to a light cut filter including at least an infrared cut.

1 Light cut filter (Infrared cut filter)
2 Transparent substrate (crystal plate)
21 Main surface 22 of crystal plate Other main surface 3 of crystal plate Multilayer film 31 First thin film 32 Second thin film 33 Common film 34 Adjustment layer 35 First light beam cut group 36 Second light beam cut group 4 Antireflection film

Claims (4)

In the light cut filter,
It consists of a transparent substrate and a multilayer film that is formed on this transparent substrate and cuts light in a desired wavelength band,
The multilayer film is composed of a plurality of light-cut groups having different wavelength bands of light rays to be cut, and a plurality of common films made of a common optical film thickness, which are divided for each preset optical film thickness.
The light-cut filter, wherein the plurality of light-cut groups are each provided with the common film adjacent thereto. The light cut filter according to claim 1,
The plurality of light-cut groups include a light-cut group consisting of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less, and an optical film thickness of 0.9 or more and less than 1.15; A central wavelength is 700 nm or more and 750 nm or less, and an optical film thickness is 1.15 or more and less than 1.30, and is composed of a light cut group consisting of at least one cut layer,
The common film is a light-cut group composed of at least one cut layer having a center wavelength of 700 nm or more and 750 nm or less and an optical film thickness of 1.30 or more and 1.80 or less. A light cut filter. In the light cut filter according to claim 1 or 2,
The multilayer film is formed by alternately laminating a plurality of first thin films using TiO ₂ or Nb ₂ O ₂ made of a high refractive index material and second thin films using SiO ₂ made of a low refractive index material,
The plurality of light beam cut groups include the first thin film having a physical film thickness of 68 nm to 74 nm and the second thin film having a physical film thickness of 107 nm to 148 nm. And a light cut group consisting of the first thin film having a physical film thickness of 87 nm or more and 106 nm or less and the second thin film having a physical film thickness of 137 nm or more and 167 nm or less,
The common film is a light-cut group comprising the first thin film having a physical film thickness of 98 nm or more and 147 nm or less and the second thin film having a physical film thickness of 155 nm or more and 232 nm or less. A light cut filter characterized by. In the light cut filter according to any one of claims 1 to 3,
The multi-layer film includes an adjustment layer at a position where the refractive index changes.

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