JP4976922B2 - Substrate transfer device - Google Patents

Description

  The present invention relates to a substrate transfer apparatus for preliminarily positioning a substrate such as an electronic circuit substrate and transferring the substrate from a loading stage to an exposure stage.

  Conventionally, when a predetermined pattern is exposed on a substrate such as an electronic circuit board, when a substrate is transported from a carry-in position (carry-in stage) to an exposure position (exposure stage) by an exposure device, for example, a transport device as shown below Is used (for example, Patent Document 1). The transfer device sucks and holds the upper surface of the substrate placed at the carry-in position by the suction holding unit, moves the suction holding unit to the exposure position along the moving rail, and exposes the substrate held by the suction holding unit. The substrate is transferred by transferring it to the position.

  In addition, a transport device that preliminarily positions (pre-aligns) a substrate when the substrate is loaded into the carry-in position is disclosed (for example, Patent Document 2). The transport device includes a transport roller that mounts a substrate and moves in the transport direction, and a centering unit having a pin that pushes an end surface of the substrate on the transport roller in the X direction and the Y direction between the transport rollers. It has.

Furthermore, an apparatus for preliminarily positioning the substrate transported to the exposure position has been proposed (for example, Patent Document 3). This apparatus is based on an exposure table for placing a substrate at an exposure position, an optical sensor for measuring the position of the substrate placed on the exposure table, and the position of the substrate measured by the optical sensor, And a drive mechanism for moving the exposure table to an alignment position before alignment with the mask. Therefore, when the substrate is preliminarily positioned, the substrate does not come into contact with other members and is not rubbed.
Japanese Patent Laid-Open No. 06-345279 Japanese Patent Laid-Open No. 06-348025 JP 05-326361 A

However, the above-described technique for performing preliminary positioning together with the transport in the substrate transport path in the conventional carry-in stage and exposure stage has the following problems.
In the configuration in which the preliminary positioning of the substrate is performed on the exposure stage, it is not possible to proceed to the next operation unless the substrate position is within the allowable range.
In addition, when the preliminary positioning of the substrate is performed at the carry-in stage, a pin that pushes the substrate in response to the substrate is configured because a preliminary positioning mechanism in which the pins installed below the conveyance roller protrude from between the conveyance rollers is installed. It took time to adjust the installation position.

  The present invention has been devised in view of such problems, and it is possible to preliminarily position a substrate before transporting it to the exposure stage without installing a preliminary positioning mechanism for the substrate on the carry-in stage or the exposure stage. An object of the present invention is to provide a substrate transfer apparatus that can easily adjust the pin installation position.

In order to solve the above-mentioned problems, a substrate transport apparatus according to the present invention is a substrate transport apparatus that descends from above a substrate carried into a carry-in stage to perform preliminary positioning, and holds the substrate and transports it to an exposure stage. A preliminary positioning mechanism that performs preliminary positioning by pushing an end face of the substrate placed on the carry-in stage, and supports the preliminary positioning mechanism by a support body, and sucks the preliminary-positioned substrate. A holding mechanism that holds and conveys the exposure stage. The preliminary positioning mechanism includes a driving unit supported by the support body, and a pushing unit that is driven by the driving unit to push the end surface of the substrate. The pushing means includes a first abutting pin and a second abutting pin that abut one end surface and the other end surface of the substrate, respectively, and the first abutting pin and the first abutting pin. It includes a first support and a second support member for supporting the contact pin respectively, wherein the drive means comprises a magnetic shaft body arranged a cylindrical N and S poles alternately, the magnetic axis body Rotating means for rotating around the axis, and linear N poles and S poles provided in contact with each other in a non-contact manner on the circumferential surface of the magnetic shaft rotated by the rotating means, are alternately arranged to start movement. A first elongate magnetic body and a second elongate magnetic body, the end point address of which is adjustable , and the first elongate magnetic body supports the first support body, and the second elongate magnetic body. The body is configured to support the second support.

With this configuration, when the substrate is carried into the carry-in stage, the substrate carrying device is lowered to the substrate side by the lifting mechanism provided in the carrying mechanism, and the magnetic shaft body of the driving means is moved in one direction by the turning means. The first long magnetic body and the second long magnetic body are moved in the linear direction. At that time, the first long magnetic body in which cylindrical S-poles and N-poles are alternately continuous, and linear N-poles and S-poles are alternately arranged so that the movement start point end point address can be adjusted. Since the second long magnetic body has a non-contact configuration, the movement range can be easily changed by adjusting the movement start point end point address. The substrate transport device preliminarily positions the substrate by moving both long magnetic bodies, so that the first contact pin and the second contact pin supported by both supports push the end surface of the substrate. . After completing the preliminary positioning of the substrate, the substrate transport device sucks and holds the substrate and moves up by the lifting mechanism, moves from the loading stage to the exposure stage along the transport rail, and transports the held substrate to the exposure stage. To do.

  In the substrate transport apparatus, the first support body and the second support body may be configured such that the first contact pin and the second contact pin are at a height equivalent to an end surface of the substrate or an end surface of the substrate. The moving mechanism is configured to move from a lower height to a height higher than the end surface of the substrate.

  With this configuration, when the substrate transport apparatus delivers the substrate W to the exposure stage, the lower end (tip end) of the first contact pin and the second contact pin from the surface holding the substrate of the transport mechanism. ) Is on the upper side, and the substrate can be smoothly placed on the exposure stage.

  Furthermore, in the substrate transport apparatus, the transport mechanism is installed below the support body and sucks and holds the substrate by a suction pad, and linearly extends from an end surface facing the suction hold plate toward the center. And the first contact pin and the second contact pin move along the notch groove.

  With this configuration, the substrate transport device allows the first contact pin and the second contact pin to move along the notch groove of the suction holding plate, regardless of whether the workpiece size is large or small. Preliminary positioning can be performed by pushing the end face of the substrate.

Further, in the substrate transport apparatus, the first long magnetic body and the second long magnetic body are disposed on one side and the other with the magnetic shaft body as a center, and each is opposite by rotation of the magnetic shaft body. It was set as the structure which moves to a direction linearly.
With this configuration, the substrate transport apparatus can linearly reciprocate the first long magnetic body and the second long magnetic body by rotating the magnetic shaft body.

And in the said board | substrate conveyance apparatus, the said drive means has a driven shaft provided in parallel with the said 1st elongate magnetic body and the said 2nd elongate magnetic body, respectively, and the said 1st support body is a said 1st support body. One long magnetic body and the driven shaft are supported to reciprocate, and the second support body is supported by the second long magnetic body and the driven shaft to reciprocate.
With this configuration, the substrate transfer apparatus can perform a stable reciprocating operation.

The substrate transfer apparatus according to the present invention has the following excellent effects.
The substrate transport apparatus can perform preliminary position setting before transporting the substrate to the exposure stage without complicating the configuration of the carry-in stage. Since the first long magnetic body and the second long magnetic body are non-contact, dust such as dust is not dropped on the substrate.
Further, in the substrate transport apparatus, the driving means of the preliminary positioning mechanism has a non-contact configuration with the magnetic shaft body, the first long magnetic body, and the second long magnetic body in which the S pole and the N pole are alternately continuous. Since it is easy to change the movement range, it is possible to easily adjust the movement range of the first contact pin and the second contact pin even if the size of the substrate changes.
The substrate transfer device only needs to install the first contact pin and the second contact pin of the pushing means at positions opposed to both ends from the center of the support body, and the installation position of the preliminary positioning mechanism can be easily adjusted. .

An embodiment of a substrate transfer apparatus according to the present invention will be described in detail with reference to the drawings.
FIG. 1 is a side view schematically showing a substrate transfer apparatus provided in an exposure apparatus, FIG. 2 is a perspective view showing the entire substrate transfer apparatus, and FIG. 3 is a schematic view of the substrate transfer apparatus as viewed from below. FIG. 4A is a plan view showing a part of the substrate transport apparatus with a part omitted, FIG. 4B is a cross-sectional view schematically showing the substrate transport apparatus in section, and FIG. It is a schematic diagram which shows typically the structure of a drive means.

  As shown in FIG. 1, the exposure apparatus A is transported by a substrate carry-in stage 30, a substrate carrying device 1 that preliminarily positions and carries the substrate W carried into the carry-in stage 30, and the substrate carrying device 1. An exposure stage 40 that is aligned to place and expose the exposed substrate W, and an exposure for exposing the pattern of the mask M by irradiating light from the light source 51 onto the substrate W placed on the exposure stage 40. An optical system 50 and a carry-out stage 60 for carrying out the exposed substrate W are mainly provided.

  The carry-in stage 30 receives the substrate W from the outside of the apparatus and moves it to a predetermined position via the transport roller 31. As shown in FIG. 2, the carry-in stage 30 is configured such that the transport roller 31 is appropriately divided in the axial direction and aligned in the moving direction so that the work of the preliminary positioning mechanism 2 described later is appropriately performed. Installed.

  The exposure stage 40 receives and holds the substrate W from the substrate transfer apparatus 1, performs an alignment operation with the mask M, aligns the mask M and the substrate W, and then fixes the substrate W to expose the pattern of the mask M. To do. The exposure stage 40 holds the substrate W on the table surface and rises to form a vacuum space in cooperation with the baking frame F that holds the mask M, thereby exposing the pattern of the mask on the substrate W.

  The exposure optical system 50 forms a light source 51 including a lamp 52 and an elliptical reflecting mirror 53 and an optical path for irradiating the light from the light source 51 onto the substrate W. The exposure optical system 50 uses a parallel light optical system in which a reflecting mirror and a lens are combined when irradiating light to the substrate W as parallel light, and also irradiates the substrate W with light as scattered light. A scattered light optical system such as a mirror that scatters irradiated light is used.

  The carry-out stage 60 is for receiving the substrate W that has been exposed at the exposure stage 40 or the abnormal substrate W from a transfer device (not shown) and out of the device. In the carry-out stage 60, the substrate W is carried out of the apparatus by the feed roller 61.

Next, the substrate transfer apparatus 1 will be described.
As shown in FIGS. 1 and 2, the substrate transfer apparatus 1 sucks the preliminary positioning mechanism 2 that preliminarily positions the substrate W and the substrate W that has been preliminary positioned after supporting the preliminary positioning mechanism 2 and carries in the loading stage 30. To the exposure stage 40.

  The transport mechanism 20 includes left and right moving rails 21 installed from the carry-in stage 30 to the exposure stage 40, a support member 17 orthogonal to the moving rails 21 and 21 and supported between the moving rails, An elevating mechanism 18 supported by the support member 17, a support main body 12 supported below the elevating mechanism 18, and an adsorption holding plate 13 that adsorbs and holds the substrate W provided below the support main body 12. I have. Further, the preliminary positioning mechanism 2 described later is supported above (upper surface side) of the support body 12 (see FIG. 4).

  The moving rails 21 are installed on the left and right sides of the support body 12, and for example, linear guides or the like are used. The configuration of the moving rail 21 is not particularly limited as long as it can reciprocate the support body 12 in the linear direction.

  The elevating mechanism 18 performs an operation of elevating the suction holding plate 13 when transferring the substrate W (see FIGS. 3 and 4). The lifting mechanism 18 is connected to the support plate 12c of the support body 12. If the suction holding plate 13 can be lifted and lowered, for example, a slide mechanism such as an LM guide and a drive mechanism using a motor and a feed screw or an air cylinder. It does not matter. The elevating mechanism 18 is configured to operate in two stages so that the height of the position is different when performing the preliminary positioning operation and the operation of holding the substrate W by suction. It is also possible to adopt a configuration in which the operation is performed with a single-stage operation so that the heights are the same when performing.

  As shown in FIGS. 2, 3, and 4, the support main body 12 is supported by a support member 17 that spans the left and right moving rails 21 via an elevating mechanism 18. The support main body 12 includes a main body portion 12a formed in a rectangular plate shape, mounting pieces 12b and 12b provided so as to protrude laterally from both opposing sides of the main body portion 12a, and the mounting pieces 12b and 12b. And a support plate 12c provided via a member erected upward from each of the above. Here, the support plate 12 c is supported by the lower end of the lifting mechanism 18.

  The support body 12 supports a suction holding plate 13 formed larger than the area of the substrate W on the lower surface side, and supports a preliminary positioning mechanism 2 described later on the upper surface side. Note that a notch 12d is similarly formed in the main body 12a of the support main body 12 in accordance with a position corresponding to a notch groove 13b described later. By forming the notch 12d, the area of the main body 12a can be increased, and the installation surface of the preliminary positioning mechanism 2 described later can be increased.

As shown in FIGS. 2 and 3, the suction holding plate 13 includes, for example, a suction part main body 13 a formed in a rectangular plate shape, and is linearly cut from the end of the four sides of the suction part main body 13 a toward the center. And a plurality of suction pads 13c provided for sucking the substrate W on the lower surface side of the suction portion main body 13a.
The notch groove 13b is formed to move _first contact pins 3a ₁ and 3a ₁ and second contact pins 3b ₁ and 3b ₁ of the preliminary positioning mechanism 2 described later. Although not shown, the suction holding plate 13 is configured so that the suction area can be switched as appropriate according to the size of the substrate W. The configuration of the suction holding plate 13 is not limited as long as the substrate W can be sucked and held by the operation of a vacuum pump (not shown).

  As shown in FIG. 2 and FIG. 3, the preliminary positioning mechanism 2 is installed on the upper surface side of the support body 12 and performs preliminary positioning of the substrate W. This preliminary positioning mechanism 2 has a pushing means 3 that abuts against the end face of the substrate W and pushes, and a drive means 6 that linearly reciprocates the pushing means 3.

As shown in FIG. 2, the pushing means 3 has one and the other pushing portions 3A and 3B at the facing positions, and has the same configuration. Therefore, the configuration of the one pushing portion 3A is here. This will be explained as a representative.
The pressing portion 3A includes first contact pins 3a ₁ and 3a ₁ that contact the end surface of the substrate W, slide portions 3a ₂ and 3a ₂ that support the _first contact pins 3a ₁ and 3a ₁ , and the slide. a first support member 3a ₃ for supporting the part _{3a 2, 3a} 2, the first abutment pin _3a 1, 3a first disposed over the _first contact pin _3a 1, 3a ₁ connection plate 3a ₅ for connecting And a drive unit 3a ₄ for moving the connecting plate 3a ₅ up and down.

In the pushing portion 3A, the drive portion 3a ₄ is configured as an air cylinder, for example, and a piston (not shown) of the air cylinder protrudes upward by injecting air, and a connecting plate 3a connected to the piston. ₅ by the up and down along the slide portion _3a 2, 3a _2, which is first vertically moving the contact pin _3a 1, 3a _1. Furthermore, as the moving mechanism for moving the first contact pins 3a ₁ and 3a ₁ in the vertical direction, the slide portions 3a ₂ and 3a ₂ have been described as an example here, but the configuration thereof is not limited.

This pushing portion 3A is connected to driving means 6 described later, and pushes the end surface of the substrate W by linearly reciprocating in the horizontal direction. Note that the tips of the first contact pins 3a ₁ and 3a _{1 that} contact the end surface of the substrate W are formed to be rotatable around the axis of the pin shaft, and when the end surface of the substrate W is pushed, The load on the substrate W is reduced.

As shown in FIGS. 2 and 4, the driving means 6 includes a magnetic shaft body 7 formed in a cylindrical body or a columnar body rotatably installed in the center of the support body 12, and the magnetic shaft body 7 as an axis. The first long magnetic body 9 </ b> A that faces the circumferential surface of the magnetic shaft body 7 that is rotated by the rotating means 8 and is not in contact with the magnetic shaft body 7. And the second long magnetic body 9B, the first driven shaft 10A and the second driven shaft 10B arranged so as to be parallel to the first long magnetic body 9A and the second long magnetic body 9B, and the first The first driven shaft 10A and the second driven shaft 10B, and the guide portion 11 for guiding the first long magnetic body 9A and the second long magnetic body 9B on the magnetic shaft body 7 side are provided. In addition, the drive means 6 is the 1st elongate magnetic body 9A, the 2nd elongate magnetic body 9B, and the 1st driven shaft 10A and the 2nd driven shaft 10B in the 1st side of 1st of the pushing part 3A. The support 3a ₃ and the second support 3b ₃ of the pushing portion 3B are connected.

  As shown in FIG. 5, the magnetic shaft 7 of the driving means 6 includes a magnetic part 7a in which S and N poles, which are opposite magnetic poles, are alternately arranged on the circumference, and a circumferential surface of the magnetic part 7a. And a stainless steel cylindrical cover 7b provided in contact therewith. The cylindrical cover 7b is preferably made of metal or the like, and protects the surface of the magnetic part 7a. Further, the first long magnetic body 9A and the second long magnetic body 9B are formed such that the S pole and the N pole are continuously formed across the position facing the magnetic shaft body 7 when moving in the linear direction. Yes.

When the magnetic shaft body 7 is rotated by the rotational force transmitted from the rotation means 8, the driving means 6 is moved along with the rotation of the magnetic shaft body 7, and the first long magnetic body 9 </ b> A and the second long magnetic body 7 </ b> A. Magnetic poles 9B are alternately affected by the S and N poles for a while in the opposite magnetic poles. Therefore, the first long magnetic body 9A and the second long magnetic body 9B move in a linear direction in which the magnetic poles repel from the stationary state. At the same time, the first driven shaft 10A and the second driven shaft 10B move following the linear direction. Therefore, the preliminary positioning mechanism 2 drives the pushing means 3 by the driving means 6 and pushes the end surface of the substrate W by the first abutting pins 3a ₁ , 3a ₁ and the second abutting pins 3b ₁ , 3b _1. Thus, the preliminary positioning of the substrate W can be performed.

  The arrangement of the magnetic shaft body 7, the first long magnetic body 9A, and the second long magnetic body 9B is opposed to each other with an interval between which foreign matter is not caught and the influence of the mutual magnetic force can be maintained. It is desirable. Further, it may be configured such that the magnetic shaft body 7 is connected to a drive shaft such as a motor that is the rotation means 8 via a transmission means, and the magnetic shaft body 7 is rotated by the rotation of the motor that is the rotation means 8.

Next, with reference to FIG. 1 and FIG. 6, the exposure apparatus A mainly operates to transport the substrate W from the carry-in stage 30 to the exposure stage 40 until the substrate W is carried in and then carried out. explain.
As shown in FIGS. 1 and 6A, when the substrate W is carried into the carry-in stage 30 from outside the apparatus, the substrate W is rotated to a predetermined position by the conveyance roller 31 and stopped.

When the substrate W moves to a predetermined position of the transport roller 31, as shown in FIG. 6B, the substrate transport device 1 is lowered downward by the lifting mechanism 18, and the first contact pins 3a ₁ , 3a ₁ and the _first contact pins 3a ₁ , 3a ₁ and 2 A height position where the tips of the contact pins 3b ₁ and 3b ₁ contact the end surface of the substrate W is set. Then, the preliminary positioning mechanism 2 rotates the magnetic shaft 7 in one direction (for example, clockwise) by the rotating means 8 of the driving means 6 to guide the first long magnetic body 9A and the second long magnetic body 9B. By moving in the direction to be accommodated in the part 11, the end face of the substrate W is pushed by the tips of the first contact pins 3a ₁ and 3a ₁ and the second contact pins 3b ₁ and 3b ₁ to perform preliminary positioning.

  Note that the height position of the suction holding plate 13 when performing preliminary positioning is adjusted to a position close to the upper surface of the substrate W and held by suction with the suction pad 13c. This is convenient because both operations can be performed by a single descent operation of the elevating mechanism 18. Of course, the two-step lowering operation of the elevating mechanism 18 is performed so that the height position of the lower surface of the suction pad 13c of the suction holding plate 13 is different between the preliminary positioning and the suction holding of the substrate W. It doesn't matter.

As shown in FIG. 6C, when the preliminary positioning of the substrate W is completed, the magnetic shaft body 7 is rotated in the other direction by the rotating means 8 of the driving means 6 (for example, counterclockwise), so that the first long magnetic body is obtained. The first contact pins 3a ₁ and 3a ₁ and the second contact pins 3b ₁ and 3b ₁ are moved from the end face of the substrate W by moving the 9A and the second long magnetic body 9B in a direction protruding from the guide portion 11. Separate. At the same time, the substrate transport apparatus 1 lowers the suction holding plate 13 via the lifting mechanism 18 and holds the substrate W by suction while being in contact with or close to the substrate W by the suction pad 13c.

In the substrate transfer apparatus 1, when the preliminary positioning is performed by the first contact pins 3a ₁ and 3a ₁ and the second contact pins 3b ₁ and 3b ₁ , the magnetic shaft body 7 of the driving unit 6 and the first length Since the long magnetic body 9A and the second long magnetic body 9B are not in contact with each other, dust such as dust does not fall to the substrate W side.

When the substrate transport apparatus 1 attracts and holds the substrate W, the substrate W is lifted so as to be separated from the carry-in stage 30 by the elevating mechanism 18, and moved to the exposure stage 40 along the moving rail 21 to expose the substrate W. Transport to stage 40. When the substrate W is sucked and held, the first contact pins 3a ₁ and 3a ₁ are driven by driving the drive unit 3a ₄ and the drive unit 3b ₄ to move the connection plate 3a ₅ and the connection plate 3b ₅ upward. The lower ends of the second contact pins 3b ₁ and 3b ₁ may be positioned above the lower surface of the suction pad 13c of the suction holding plate 13.

  As shown in FIG. 1, in the exposure stage 40 on which the substrate W is transported, alignment work with the mask M is performed, and the substrate W is irradiated with light through the exposure optical system 50 to perform the exposure work. In the exposure apparatus A, the substrate W for which the exposure operation has been completed is transferred from the exposure stage 40 to the carry-out stage 60 by a transfer apparatus (not shown) and carried out of the apparatus.

  As described above, the substrate transport apparatus 1 performs preliminary positioning from above the substrate W, sucks and holds the substrate W for which preliminary positioning has been completed, and transports the substrate W from the carry-in stage 30 to the exposure stage 40.

  The substrate transport apparatus 1 has been described as an example in which the substrate W is preliminarily positioned by linearly reciprocating the pushing portions 3A and 3B along the transport direction (X direction) of the substrate W. However, the preliminary positioning of the substrate W may be performed by linearly reciprocating and moving the pushing portions 3A and 3B in a direction orthogonal to the transport direction of the substrate W (tentatively the Y direction).

The substrate transport apparatus 1 may be configured to perform preliminary positioning by pushing the end surface of the substrate W from both the X direction and the Y direction. In order to push the end face of the substrate W from the X direction and the Y direction, for example, the magnetic shaft body 7 is elongated in the axial direction, and the driving means 6 in the X direction and the driving means 6 in the Y direction are moved in the height direction. It can be configured by providing a step. Of course, the magnetic shaft body 7 may be provided in each of the X direction and the Y direction.
Furthermore, when the substrate transport apparatus 1 changes the type of the substrate W to be processed, the size of the substrate W may change, but as the adjustment of the driving means 6, the first long magnetic body 9A and the second long length By changing the address of the movement start point and end point of the magnetic body 9B, it is possible to easily cope with it.

It is a schematic diagram which shows typically the whole exposure apparatus using the board | substrate conveyance apparatus which concerns on this invention from the side. It is a perspective view showing typically the whole substrate conveyance device concerning the present invention. It is a perspective view which shows typically the state looked up from the downward direction of the board | substrate conveyance apparatus which concerns on this invention. (A) is a top view which abbreviate | omits and shows a part of board | substrate conveyance apparatus which concerns on this invention, (b) is sectional drawing which shows typically the board | substrate conveyance apparatus which concerns on this invention in a cross section. It is a schematic diagram which shows typically the structure of the drive means of the board | substrate conveying apparatus which concerns on this invention. (A)-(d) is a side view which shows typically the operation state of the board | substrate conveyance apparatus which concerns on this invention, respectively.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate conveyance apparatus 2 Preliminary positioning mechanism 3a ₁ 1st contact pin 3b ₁ 2nd contact pin 3 Pushing mechanism 3a ₂ (3b ₂ ) Slide part (moving mechanism)
3a ₃ (3b ₃ ) First support (second support)
3a ₄ (3b ₄ ) Drive unit 3a ₅ (3b ₅ ) Connection plate (moving mechanism)
3A Pushing part 3B Pushing part 6 Driving means 7 Magnetic shaft body 7a Magnetic part 7b Cylindrical cover 8 Turning means 9A First long magnetic body 9B Second long magnetic body 10A First driven shaft 10B Second driven shaft 11 Guide part 12 Support body 12a Body part 12b Mounting piece 12c Support plate 12d Notch 13 Suction holding plate 13a Suction part body 13b Notch groove 13c Suction pad 17 Support member 18 Lifting mechanism 20 Transport mechanism 21 Moving rail 30 Loading stage 31 Transport roller 40 Exposure stage 50 Exposure optical system 51 Light source 52 Lamp 53 Elliptical mirror 60 Unloading stage 61 Roller A Exposure apparatus M Mask W Substrate

Claims (5)

A substrate carrying apparatus that descends from above the substrate carried into the carry-in stage and performs preliminary positioning, and holds the substrate and carries it to the exposure stage,
A preliminary positioning mechanism that performs preliminary positioning by pushing the end surface of the substrate placed on the carry-in stage, and supports the preliminary positioning mechanism by a support body, and sucks and holds the pre-positioned substrate. A transport mechanism for transporting to the exposure stage,
The preliminary positioning mechanism includes a driving unit supported by the support body, and a pushing unit that is driven by the driving unit to push the end surface of the substrate.
The pushing means supports a first abutting pin and a second abutting pin that abut one end surface and the other end surface of the substrate, respectively, and a first abutting pin and a second abutting pin for supporting the first abutting pin and the second abutting pin, respectively. A support and a second support,
The drive means includes a magnetic shaft body in which cylindrical N poles and S poles are alternately arranged, a turning means for turning the magnetic shaft body around an axis, and a magnetic shaft body rotated by the turning means. A first long magnetic body and a second long magnetic body which are arranged so that the movement start point end point address can be adjusted by alternately arranging linear N poles and S poles provided to face each other in a non-contact state. Have
The substrate transport apparatus, wherein the first long magnetic body supports the first support, and the second long magnetic body supports the second support.   The first support body and the second support body are configured so that the first contact pin and the second contact pin have the same height as the end surface of the substrate or a height lower than the end surface of the substrate. The substrate transport apparatus according to claim 1, further comprising a moving mechanism that moves to a height above the end surface of the substrate. The transport mechanism is installed below the support body and sucks and holds the substrate by a suction pad, and is cut out to a predetermined length linearly from the facing end surface of the suction holding plate toward the center. A notch groove formed,
3. The substrate transfer apparatus according to claim 1, wherein the first contact pin and the second contact pin move along the notch groove. 4.   The first elongate magnetic body and the second elongate magnetic body are arranged on one and the other with the magnetic shaft body as the center, and each of them moves linearly in the opposite direction by the rotation of the magnetic shaft body. The substrate transfer apparatus according to claim 1. The driving means has driven shafts provided in parallel to the first long magnetic body and the second long magnetic body,
The first support is supported by the first long magnetic body and the driven shaft, and reciprocates. The second support is supported by the second long magnetic body and the driven shaft, and reciprocates. The substrate transport mechanism according to claim 1, wherein:

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