JP4955563B2 - バリヤー被覆をもつ物品及びそのような物品を製造する方法 - Google Patents
バリヤー被覆をもつ物品及びそのような物品を製造する方法 Download PDFInfo
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- JP4955563B2 JP4955563B2 JP2007538362A JP2007538362A JP4955563B2 JP 4955563 B2 JP4955563 B2 JP 4955563B2 JP 2007538362 A JP2007538362 A JP 2007538362A JP 2007538362 A JP2007538362 A JP 2007538362A JP 4955563 B2 JP4955563 B2 JP 4955563B2
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- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 claims description 17
- 230000007062 hydrolysis Effects 0.000 claims description 17
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- 229910052814 silicon oxide Inorganic materials 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 13
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- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052718 tin Inorganic materials 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 7
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- 150000002222 fluorine compounds Chemical class 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000001273 butane Substances 0.000 claims description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 3
- 150000002902 organometallic compounds Chemical class 0.000 claims description 3
- 239000001294 propane Substances 0.000 claims description 3
- 230000003796 beauty Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 189
- 238000000151 deposition Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 11
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- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 8
- 239000002346 layers by function Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 238000002485 combustion reaction Methods 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical group [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 7
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- 238000005034 decoration Methods 0.000 description 6
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000012791 sliding layer Substances 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 125000001475 halogen functional group Chemical group 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
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- 238000004544 sputter deposition Methods 0.000 description 4
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- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
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- 125000004429 atom Chemical group 0.000 description 1
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- 239000010419 fine particle Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
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- 238000004806 packaging method and process Methods 0.000 description 1
- 235000021485 packed food Nutrition 0.000 description 1
- 238000009512 pharmaceutical packaging Methods 0.000 description 1
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- 150000004756 silanes Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/365—Coating different sides of a glass substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
Description
例えば、基体の装飾的な色材を燃焼させたとき、本発明によるバリヤー被覆は、基体への装飾的色材の拡散を防止することができ、また反対に、ガラス又はガラスセラミックから構成成分が拡散するのを防止することができる。驚くべきことに、本発明による火炎−熱分解被覆が基体に適用され、焼き付けられた装飾の末端に望ましくない光輪(halo)や境目が形成するのを防止することができることが発見された。この態様の方法及びそれによって製造される生産物はまた、本出願人の本出願と同日に出願した「拡散バリヤーを持つガラス−セラミック物品及び拡散バリヤーを持つガラス−セラミック物品の製造方法」という表題のドイツ特許出願に記載されている。その詳細はここに記載している本発明に全体として組み込まれる。装飾の焼き付けの際、装飾の周囲の光輪の形成を避けるためには、ほんの約10ナノメートルの火炎−熱分解層の層厚で可能となる。
−火炎−熱分解性被覆ボトル、特に薬品のコンテナ、
−オーブンの窓、
−反射板、特にガラス−セラミックの反射板、
−ガラス−セラミックホブ(hob)、又は
−包装用フィルム
であることができる。
特に図7に示される例の場合、層5はまた、緑色のガラス反射板をセラミック化する前に作られる。双方の場合において、層5は、もしそれがないと拡散プロセスが反射板への大きな熱負荷下に起こり、そして、長期的にはガラス−セラミックの変質を起こし、最終的には反射板の破壊を起こすような拡散プロセスに対してバリヤーとなる。図7、8で表されるようなものではなくて、火炎−熱分解層5自体を反射層として製造することができる。例えば、図5において火炎−熱分解的に製造されるような多層干渉層が反射層となる。追加的な反射層67はこの場合必要ではない。
5 金属酸化物含有層(火炎−熱分解バリヤー層)
11,12 基体の面
13 インジウム−スズ酸化物層
15 疎水性層
16 基板
20,21 バーナー
22 火炎
26 プラスチックフィルム
27,28 ローラー
50 表面
57 ケイ素酸化物含有粒子
65 反射板
66,67 反射被覆層
70 ストーブ
72 のぞき窓
80 太陽熱ソーラー装置
81 コレクターチューブ
82 ソーラーガラス部品
83 多層反射防止層
200 ホブ(hob)
Claims (14)
- 基体の表面領域の少なくとも1つに火炎を通し、火炎が基体のその領域を通過する間に火炎中でケイ素化合物及び/又は金属チタン、アルミニウム、ジルコニウム、スズ又はインジウムのうち1つを含有する化合物を含む金属含有化合物を加水分解することにより、基体上に火炎−熱分解的に適用された金属酸化物含有層からなるバリヤー被覆が堆積され、金属酸化物含有層はセラミック化の前に原料ガラス基体の少なくとも片面に適用され、その原料ガラス基体はセラミック化基板の被覆面の上におかれて、その後セラミック化されることにより、バリヤー被覆は基体の基板への粘着性付着を回避することを特徴とするガラス−セラミック物品を製造する方法。
- 前記バリヤー被膜は火炎中でケイ素化合物の加水分解により堆積されるシリケート含有層を含み、ケイ素化合物は以下の少なくとも1つの物質であることを特徴とする請求項1に記載された方法。
−ヘキサメチルジシロキサン(HMDSO)、
−ヘキサメチルジシラザン(HMDSN)、
−テトラメトキシシラン
−テトラエトキシシラン - 基体は火炎を通過し、火炎中で複数の金属含有化合物を加水分解することにより金属酸化物含有層が堆積されることを特徴とする請求項1又は2に記載された方法。
- 基体は、1又はそれ以上の、それぞれ供給される異なった金属含有化合物の火炎を順に通過することを特徴とする請求項1〜3のいずれか1項に記載された方法。
- 酸化性の部分と還元性の部分をもつ火炎が作られ、基体はその酸化性の部分だけを通過することを特徴とする請求項1〜4のいずれか1項に記載された方法。
- メタン、プロパン又はブタンを含有する可燃性ガスが火炎を作るのに使用されることを特徴とする請求項1〜5のいずれか1項に記載された方法。
- 水素又は一酸化炭素を含有する可燃性ガスが火炎を作るために使用されることを特徴とする請求項1〜6のいずれか1項に記載された方法。
- セラミックの装飾的な色材が金属酸化物含有層に適用され、焼き付けられていることを特徴とする請求項1〜7のいずれか1項に記載された方法。
- 有機金属化合物が可燃性ガスに添加され、それにより導電性又は半導電性酸化物が加水分解により製造されることを特徴とする請求項1〜8のいずれか1項に記載された方法。
- 疎水性被覆が火炎−熱分解的に適用された金属酸化物含有層の上に適用されることを特徴とする請求項1〜9のいずれか1項に記載された方法。
- フッ素化合物と共にシリケート含有ゲル−ゾルが火炎−熱分解的に適用された金属酸化物含有層の上に適用されることを特徴とする請求項10に記載された方法。
- ケイ素酸化物を含有し、80ナノメートル以下の粒子が層の表面上に並び、かつ4〜40ナノメートルの層厚に堆積されている、火炎−熱分解的に適用された金属酸化物含有層の粒状表面構造が火炎−熱分解堆積により製造されることを特徴とする請求項1〜11のいずれか1項に記載された方法。
- ケイ素酸化物を含有し、60ナノメートル以下の粒子が層の表面上に並び、かつ4〜40ナノメートルの層厚に堆積されている、火炎−熱分解的に適用された金属酸化物含有層の粒状表面構造が火炎−熱分解堆積により製造されることを特徴とする請求項1〜12のいずれか1項に記載された方法。
- 火炎−熱分解的に適用された金属酸化物含有層は最大20ナノメートルの層厚に堆積されていることを特徴とする請求項1〜13のいずれか1項に記載された方法。
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DE102004053706.2 | 2004-11-03 | ||
DE200410053706 DE102004053706A1 (de) | 2004-11-03 | 2004-11-03 | Gegenstand mit Barrierebeschichtung und Verfahren zur Herstellung eines solchen Gegenstandes |
PCT/EP2005/011752 WO2006048276A1 (de) | 2004-11-03 | 2005-11-03 | Gegenstand mit barrierebeschichtung und verfahren zur herstellung eines solchen gegenstandes |
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JP2008518800A JP2008518800A (ja) | 2008-06-05 |
JP4955563B2 true JP4955563B2 (ja) | 2012-06-20 |
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EP (2) | EP2261185A3 (ja) |
JP (1) | JP4955563B2 (ja) |
CN (1) | CN101151223B (ja) |
DE (1) | DE102004053706A1 (ja) |
ES (1) | ES2387498T3 (ja) |
WO (1) | WO2006048276A1 (ja) |
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Publication number | Publication date |
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CN101151223A (zh) | 2008-03-26 |
EP2261185A3 (de) | 2013-10-02 |
ES2387498T3 (es) | 2012-09-25 |
CN101151223B (zh) | 2012-11-21 |
JP2008518800A (ja) | 2008-06-05 |
DE102004053706A1 (de) | 2006-05-04 |
EP1807371B1 (de) | 2012-06-20 |
WO2006048276A1 (de) | 2006-05-11 |
DE102004053706A8 (de) | 2006-10-05 |
EP2261185A2 (de) | 2010-12-15 |
EP1807371A1 (de) | 2007-07-18 |
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