JP4523958B2 - 蛍光x線分析装置およびそれに用いるプログラム - Google Patents
蛍光x線分析装置およびそれに用いるプログラム Download PDFInfo
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- JP4523958B2 JP4523958B2 JP2007244720A JP2007244720A JP4523958B2 JP 4523958 B2 JP4523958 B2 JP 4523958B2 JP 2007244720 A JP2007244720 A JP 2007244720A JP 2007244720 A JP2007244720 A JP 2007244720A JP 4523958 B2 JP4523958 B2 JP 4523958B2
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- 238000004876 x-ray fluorescence Methods 0.000 title claims description 8
- 238000001514 detection method Methods 0.000 claims description 56
- 239000000203 mixture Substances 0.000 claims description 46
- 238000011088 calibration curve Methods 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 14
- 230000035945 sensitivity Effects 0.000 claims description 7
- 238000002441 X-ray diffraction Methods 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000523 sample Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 13
- 238000004458 analytical method Methods 0.000 description 3
- 239000012496 blank sample Substances 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 1
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Description
2 1次X線
4 2次X線
9 検出手段
10 算出手段
13 試料
Claims (2)
- 試料に1次X線を照射するX線源と、
試料から発生する2次X線の強度を測定する検出手段と、
仮定した組成に基づいて、試料中の各元素から発生する2次X線の理論強度を計算し、その理論強度と前記検出手段で測定した測定強度を理論強度スケールに換算した換算測定強度とが一致するように、前記仮定した組成を逐次近似的に修正計算して、試料の組成を算出する算出手段としてのコンピュータとを備えた蛍光X線分析装置において、
前記算出手段が、
算出した組成に含まれない非検出元素については所定の微量濃度を加えて検出限界算出用の組成を仮定し、その検出限界算出用の組成に基づいて、非検出元素から発生する2次X線の理論強度を計算し、
その非検出元素の理論強度と、あらかじめ理論強度と測定強度との間の換算のために求められた装置感度係数とから、非検出元素の推定測定強度を計算し、
その非検出元素の推定測定強度と前記所定の微量濃度とから、非検出元素の検量線勾配を計算し、
前記検出手段で測定した非検出元素のバックグラウンドの測定強度から、非検出元素のバックグラウンドの統計変動を計算し、
その非検出元素のバックグラウンドの統計変動と前記非検出元素の検量線勾配とから、非検出元素の検出限界を算出することを特徴とする蛍光X線分析装置。 - 請求項1に記載の蛍光X線分析装置が備えるコンピュータを前記算出手段として機能させるためのプログラム。
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JP2007244720A JP4523958B2 (ja) | 2007-09-21 | 2007-09-21 | 蛍光x線分析装置およびそれに用いるプログラム |
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JP2007244720A JP4523958B2 (ja) | 2007-09-21 | 2007-09-21 | 蛍光x線分析装置およびそれに用いるプログラム |
Publications (2)
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JP2009074954A JP2009074954A (ja) | 2009-04-09 |
JP4523958B2 true JP4523958B2 (ja) | 2010-08-11 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2011099749A (ja) * | 2009-11-05 | 2011-05-19 | Horiba Ltd | 濃度計測方法及び蛍光x線分析装置 |
KR101440236B1 (ko) * | 2013-06-13 | 2014-09-12 | 전북대학교산학협력단 | X선 형광 분석 방법 및 이를 위한 백그라운드 제거 방법 |
JP7190751B2 (ja) * | 2020-10-30 | 2022-12-16 | 株式会社リガク | 蛍光x線分析装置 |
JP2024120518A (ja) * | 2023-02-24 | 2024-09-05 | 株式会社リガク | 蛍光x線分析装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001050917A (ja) * | 1999-08-06 | 2001-02-23 | Rigaku Industrial Co | 蛍光x線分析装置 |
JP2005003471A (ja) * | 2003-06-11 | 2005-01-06 | Murata Mfg Co Ltd | メッキ皮膜の蛍光x線分析方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001050917A (ja) * | 1999-08-06 | 2001-02-23 | Rigaku Industrial Co | 蛍光x線分析装置 |
JP2005003471A (ja) * | 2003-06-11 | 2005-01-06 | Murata Mfg Co Ltd | メッキ皮膜の蛍光x線分析方法 |
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