JP3803757B2 - Ultrafine particle production equipment - Google Patents

Description

  The present invention relates to an ultrafine particle production apparatus. In more detail, by performing arc discharge in a mixed gas atmosphere of a reactive gas such as hydrogen, nitrogen, and oxygen and an inert gas, a forced evaporation phenomenon is generated from the material, so that a metal, an alloy, a ceramic, or a composite material of these The present invention relates to an apparatus for producing ultrafine particles.

  Ultra-fine particles of metals, alloys, ceramics, or composites of these materials are produced by causing an arc discharge in a mixed gas atmosphere of a reactive gas such as hydrogen, nitrogen, or oxygen and an inert gas to cause forced evaporation from the material. The method of doing is known conventionally. In such a method, a material to be atomized is placed on a water-cooled copper table set in an ultrafine particle generation chamber of an airtight container, a discharge is caused between this material and a tungsten electrode, and hydrogen, nitrogen or oxygen as an atmospheric gas is generated. When activated by an arc, this activated gas is supersaturated and dissolved in a raw material melted by arc heat, and the raw material is forcibly evaporated to generate ultrafine particles.

  Regarding an apparatus for producing ultrafine particles based on such a principle, Patent Document 1 discloses that a metal dissolution table and a discharge electrode are arranged facing each other in a vertical cylindrical sealed container, and hydrogen or non-oxidizing hydrogen is used. An inlet for the contained gas is provided so as to form a swirling flow from the top to the bottom in the sealed container, and the generated ultrafine particles are supplied to a cooler and a collector provided below the sealed container by the swirling flow. An apparatus for guiding is disclosed.

  Patent Document 2 discloses an apparatus that improves the recovery rate of ultrafine particles in the apparatus disclosed in Patent Document 1 described above. In the apparatus disclosed in Patent Document 2, a cylindrical container having a horizontal axis is used as a sealed container for generating ultrafine particles, and a fine powder generation zone is formed at or near the axial center of the container. At the same time, the atmosphere gas injection nozzle is continuously provided over almost the entire length of the container body so as to inject the atmosphere gas in the tangential direction of the inner peripheral surface of the container, while providing the atmosphere gas suction port on the side wall surface portion, A tornado-shaped flow of atmospheric gas that is swung around the container axis and contracted toward the suction port is formed in the container, and the fine powder generated in the fine powder generation zone on the tornado-shaped gas flow is sucked into the suction port. An apparatus is disclosed that is adapted to be carried out of the container. According to such an apparatus, the generated ultrafine particles can be effectively prevented from adhering to the inner surface of the container, and as a result, the yield of ultrafine particles is increased.

  In Patent Document 3, a conical nozzle is provided at one end of a cylindrical container having a horizontal axis, and a gas introduction head is provided in the vicinity of the connection between the conical nozzle and the cylindrical container. An apparatus is disclosed in which a recirculation gas or a room gas is injected from an introduction head in a tangential direction or a radial direction of a container to prevent agglomeration growth of ultrafine particles.

Japanese Patent Publication No.58-54166 Japanese Patent Laid-Open No. 2-2405 Japanese Patent No. 3383608

    In the apparatus for producing ultrafine particles disclosed in Patent Document 1 and Patent Document 2, since the arc discharge is performed between the material placed in the ultrafine particle generating chamber and the electrode, the electrode is usually disposed on the vertical line of the material. The angle between the material and the electrode was in the high angle range of 75 ° to 90 °. When arc discharge is performed with a device having such an electrode arrangement and the material is forcibly evaporated to generate ultrafine particles, the generated ultrafine particles move upward, so that some of the ultrafine particles are again arced. The gas reaction caused by the above reached the region, and aggregation due to plasma radiation and remelting occurred, and the collected ultrafine particles had a large particle size distribution.

  In addition, in the conventional ultrafine particle production apparatus, a swirl flow is generated in the ultrafine particle generation chamber so as to convey the ultrafine particles to the collector. However, some of the generated ultrafine particles are conveyed. Without remaining in the ultrafine particle generation chamber. It is advantageous to recover the remaining ultrafine particles in order to improve the yield, and it is also advantageous in preventing electrode wear. Therefore, when the ultrafine particles are collected by cleaning the inside of the ultrafine particle generation chamber, the electrodes and material mounting table are fixed in the ultrafine particle generation chamber. It was over.

  Furthermore, in the conventional ultrafine particle production equipment, in order to produce ultrafine particles stably, the state of arc discharge in the ultrafine particle generation chamber is observed, and the operating conditions are adjusted depending on the arc shape, sample position, etc. However, depending on the gas flow in the ultrafine particle generation chamber, the ultrafine particles may adhere to the observation window, and the visibility from the observation window may not be sufficiently secured.

  Furthermore, in the conventional ultrafine particle production apparatus, the ultrafine particles and the carrier gas are separated by using a filter in the ultrafine particle collection chamber. Clogging may occur due to accumulation, and the operation may be interrupted by the cleaning operation of the filter.

  Furthermore, in the conventional ultrafine particle production apparatus, the gas introduced into the ultrafine particle generation chamber for arc discharge is used as the air flow of the ultrafine particles, but is transported to such a collector to separate the ultrafine particles. When the gas after use was not used, the gas consumption was large.

  Furthermore, in the conventional apparatus for producing ultrafine particles, arc discharge is generated between the electrode and the material, so that the raw materials for obtaining the ultrafine particles are necessarily limited to conductive materials. It was difficult to make non-conductive materials such as ultrafine particles.

  Accordingly, the present invention advantageously solves the above-described problems, and advantageously prevents the aggregation and remelting of ultrafine particles generated by the forced evaporation method, and advantageously produces ultrafine particles with a uniform particle size distribution. In addition, the inside of the ultrafine particle generation chamber can be easily cleaned, a sufficient field of view can be secured from the observation window, the filter can be prevented from clogging, and continuous collection can be performed, and the gas used can be reused. An object of the present invention is to propose an ultrafine particle production apparatus capable of making nonconductive material ultrafine particles.

The present invention advantageously solves the above problems, and ultrafine particles generation chamber, equipped with an ultra fine particle collection chamber which connects to the ultrafine particle generation chamber, wherein the ultrafine particles generating chamber, and the material loading table to be connected to the power supply while arranged close to the discharge electrodes, ultrafine particles, wherein the inlet of the gas reacting provided by arc discharge in the ultra-fine particles generation chamber, generated by evaporation of the material placed on the material placing table, gas in ultrafine particles producing device for conveying to the nanoparticle collection chamber by the airflow, the nanoparticle generating chamber substantially has a semi-cylindrical, the shape of one end communicating with the ultrafine particles collecting chamber becomes substantially a semi-conical In addition, there is provided an ultrafine particle production apparatus characterized in that an opening / closing door is provided on the other end face and the discharge electrode is attached to the opening / closing door .

  In the ultrafine particle production apparatus of the present invention, the gas inlet is provided at the end face and the peripheral surface of the ultrafine particle generation chamber, and the ultrafine particle collection chamber is formed in the ultrafine particle generation chamber by the gas ejected from the inlet. It can be set as the structure which generate | occur | produces the gas flow of the turning flow which goes to.

  In addition, the ultrafine particle production apparatus of the present invention can be configured to have means for adjusting the velocity of the gas flow in accordance with the generation rate of the ultrafine particles.

Further, the ultrafine particles production apparatus of the present invention, the discharge electrode, the angle of the material may be 50 ° ± 20 ° is configured.

  Further, in the ultrafine particle production apparatus of the present invention, the material mounting table may be configured so that it can be moved up and down with reference to the standard position, with the position being the same plane as the bottom surface of the ultrafine particle generating chamber. it can.

  In the ultrafine particle production apparatus of the present invention, an observation window can be provided in the ultrafine particle generation chamber, and a view securing means can be provided in the observation window.

  In the ultrafine particle production apparatus of the present invention, the ultrafine particle collection chamber is provided with one or more collectors having a filter, and provided with a reverse pressure applying means for preventing clogging of the filter. Can be configured.

  Further, in the ultrafine particle production apparatus of the present invention, a configuration is provided in which a gas pipe that collects the gas after collection in the ultrafine particle collection chamber and leads to the gas inlet of the ultrafine particle generation chamber is provided with a circulation pump; can do.

  In the ultrafine particle production apparatus of the present invention, the material mounting table in the ultrafine particle generation chamber is connected to the anode of the power source, the discharge electrode is connected to the cathode of the power source as a non-consumable tungsten electrode, It can be set as the structure which has a control means which makes the gas pressure led to the fine particle generation chamber 10 kPa-150 kPa.

  In the ultrafine particle production apparatus of the present invention, one or more reaction gases selected from hydrogen, nitrogen, oxygen, ammonia and methane, and an inert gas are introduced from the gas inlet of the ultrafine particle generation chamber. The mixed gas can be supplied.

  In the ultrafine particle production apparatus of the present invention, a gripping device for moving or inverting the material placed on the material placing table can be provided in the ultrafine particle generating chamber.

  In the ultrafine particle production apparatus of the present invention, the produced ultrafine particles are a metal, an alloy, a nitride, a boride, an oxide, a metal-ceramic composite, a mixture of different materials, or a composite. be able to.

  In the ultrafine particle production apparatus according to the present invention, the ultrafine particle generation chamber has a substantially semi-cylindrical shape, and one end connected to the ultrafine particle collection chamber has a substantially semiconical shape. When a swirling flow of the carrier gas is generated in the room, a gas flow at a certain flow velocity is generated in the vicinity of the ultrafine particle generation region. That is, in the conventional ultrafine particle generation chamber, the shape is cylindrical, and there is an ultrafine particle generation region in the vicinity of the central axis, so that the swirling flow of the carrier gas has a low flow velocity in the vicinity of the central axis. As a result, conventionally generated ultrafine particles stay in the generation region, which may cause aggregation and remelting. On the other hand, in the present invention, the gas flow can be secured at a certain flow rate even in the vicinity of the ultrafine particle generation region by adopting a novel shape, thereby effectively preventing aggregation and remelting of the ultrafine particles. And ultrafine particles having a narrow particle size distribution can be recovered.

  In addition, since the gas inlet is provided at the end face of the ultrafine particle generation chamber to generate a gas flow toward the ultrafine particle collection chamber, the ultrafine particles can be smoothly conveyed by the swirling flow. Aggregation and remelting of fine particles can be more effectively prevented.

  In addition, by making the discharge electrode attached to the end face part an acute angle with the material, it is possible to smoothly carry ultrafine particles while avoiding aggregation and remelting due to plasma radiation, Aggregation and remelting of ultrafine particles can be more effectively prevented.

  In addition, by providing an opening / closing door on the end face, and attaching the discharge electrode to the opening / closing door, the electrode can be taken out of the ultrafine particle generation chamber together with the door, and the material mounting table can be raised and lowered, Cleaning of the ultrafine particle generation chamber and collection of ultrafine particles became easy.

  Further, by providing the field of view securing means in the observation window of the ultrafine particle generation chamber, the field of view from the observation window can be sufficiently secured without the field of view being blocked by the adhesion of the particles.

  In addition, multiple collectors are provided, and each is equipped with a counter-pressure applying means that prevents clogging of the filters, effectively preventing clogging of each filter and continuously collecting ultrafine particles. Can be done.

  In addition, the gas after separating the ultrafine particles is collected and a gas pipe that leads to the gas inlet of the ultrafine particle generation chamber is provided together with a circulation pump. This gas is reused for the generation of ultrafine particles. be able to.

  In addition, two discharge electrodes are attached as non-consumable tungsten electrodes on the peripheral surface of the semi-cylindrical ultrafine particle generation chamber, and an AC power source is connected to both electrodes, thereby causing arc discharge between the two tungsten electrodes. By applying the arc flame to the nonconductive material indirectly, ultrafine particles can be generated from the nonconductive material.

Hereinafter, the present invention will be described more specifically with reference to the drawings.
FIG. 1 schematically shows an example of an ultrafine particle production apparatus according to the present invention. In FIG. 1, reference numeral 1 denotes an ultrafine particle generation chamber, and an ultrafine particle collection chamber 2 is connected to the ultrafine particle generation chamber 1 via a valve 3. In the inner space of the ultrafine particle generation chamber 1, a material mounting table 4 for placing a material that generates ultrafine particles is disposed, while the discharge electrode 5 has the tip of the discharge electrode 5 mounted on the material. It arrange | positions so that the stand 4 may be adjoined. Usually, the material mounting table 4 is connected to the anode of the DC power source 6, and the discharge electrode 5 is connected to the cathode of the power source 6, and an arc is formed between the material on the material mounting table 4 and the tip of the discharge electrode 5. Causes a discharge.

  The ultrafine particle generation chamber 1 is provided with gas inlets 7, 7 a, 7 b, and a reaction gas such as hydrogen, nitrogen, or oxygen is introduced into the ultrafine particle generation chamber 1 from the gas inlet 7, such as argon. Along with the inert gas, gas can be introduced from a gas introduction line 9 connected to the gas supply source 8. Part of the gas from the gas introduction line 9 is led to the gas ejection port 7a formed at the tip of the discharge electrode 5 through the outer cylinder of the discharge electrode 5 to prevent wear of the discharge electrode 5 made of tungsten. In addition to being useful, it is activated (plasmaized) by arc discharge. In the introduced gas atmosphere, the arc discharge described above is generated in the ultrafine particle generation chamber 1 to generate the arc plasma 23 in the arc generation region, and the material 4a placed on the material mounting table is forcibly evaporated. To generate ultrafine particles. Further, by ejecting gas from the gas introduction ports 7, 7 a, 7 b to the ultrafine particle generation chamber 1, the gas flow generated in the generation chamber 1 is utilized for transporting the ultrafine particles, and the ultrafine particle flow 22 is generated. Guide to ultrafine particle collection chamber 2. The inner wall of the ultrafine particle generation chamber 1 is water cooled by a cooling means (not shown), thereby preventing the temperature of the carrier gas stream from rising and preventing the ultrafine particle growth.

  One of the features of the ultrafine particle production apparatus according to the present invention is the shape of the ultrafine particle generation chamber 1. That is, the cylindrical shape is cut by a plane parallel to the rotation axis, and has a substantially semi-cylindrical portion 1a having the plane as a bottom, and the substantially semi-conical portion 1b that is airtightly connected to the substantially semi-cylindrical portion 1a. The shape is on the side connected to the ultrafine particle collection chamber. By adopting such a shape and arranging the material mounting table 4 so as to be flush with the bottom of the substantially semi-cylindrical portion 1a, the ultrafine particles generated from the material on the material mounting table 4 can be removed from the gas inlets 7, 7a or Since it is rapidly transferred from the spot by the swirl flow 21 generated by the gas ejected from 7b, the aggregation and remelting of ultrafine particles due to the radiant heat of the arc discharge can be suppressed. In addition, since the bottom of the substantially semi-cylindrical portion 1a is a flat surface, it is easy to clean the ultrafine particle generation chamber 1 or collect the ultrafine particles deposited in the ultrafine particle generation chamber 1. In addition, the shape of the substantially semi-cylindrical part 1a in this invention is not restricted to the shape which cut | disconnected the cylindrical shape by the plane containing a rotating shaft, ie, a complete semi-cylindrical shape.

  Further, by connecting the substantially semi-cylindrical portion 1a and making the portion 1b connected to the ultra fine particle collecting chamber 2 into a substantially semi-conical shape, the ultra fine particles conveyed by the gas stream from the substantially semi-cylindrical portion 1a are obtained. It becomes possible to guide to the ultrafine particle collection chamber 2 smoothly without disturbing the airflow.

  Next, the gas introduction port 7 is provided at least in the end surface portion 1c of the ultrafine particle generation chamber 1, and the direction of the gas introduction port is a swirling gas flow in the ultrafine particle generation chamber by the gas ejected from the introduction port. The direction to generate. For example, a plurality of gas introduction ports 7 are provided in the vicinity of the peripheral edge of the end surface portion 1c, and the direction of the gas introduction ports 7 is a direction along a tangent line when viewed from the end surface portion 1c. The gas jetted from the inlet is directed to generate a swirling gas stream in the ultrafine particle generating chamber. Thus, by providing the gas introduction port 7 in the end surface portion 1c and generating a swirling gas air flow, it is possible to convey the ultra fine particles to the gas air flow and smoothly guide them to the ultra fine particle collecting chamber 2. is there. The gas introduction port 7 can be provided not only in the end surface portion 1c but also in the substantially cylindrical portion 1b of the ultrafine particle generation chamber 1, and as shown in FIG. 1, the gas ejection port 7b is provided with the substantially cylindrical portion 1b. Thus, the gas flow of the swirl flow is further enhanced.

  It is preferable to adjust the velocity of the gas stream in the ultrafine particle generation chamber 1 in accordance with the generation rate of the ultrafine particles. Since the generation speed of the ultrafine particles varies depending on the type of material and the like, the air flow velocity is set so that the ultrafine particles do not adhere to the inner surface of the ultrafine particle generation chamber 1 and the discharge electrode 5 as much as possible. This can be adjusted, for example, by controlling the flow rate from the gas supply source 8. Further, as will be described later, when a circulation pump for collecting the gas after collection / separation of ultrafine particles in the ultrafine particle collection chamber 2 and leading it to the gas introduction port 7 is provided, the gas is controlled by controlling the circulation pump. You can also adjust the speed of the airflow.

  Next, the discharge electrode 5 can be basically attached to the end surface portion 1c of the ultrafine particle generation chamber 1, but besides the end surface portion 1c, as shown in FIG. Can be attached. Further, a plurality of discharge electrodes 5 can be attached, and for example, each of the end surface portion 1c and the peripheral surface portion or a plurality of electrodes can be provided on the peripheral surface portion. When the discharge electrode 5 is attached to the end face portion 1c, the angle between the discharge electrode and the material is preferably in the range of about 50 ° ± 20 °. By attaching the discharge electrode 5 to the end face 1c so that the angle falls within this range, it is possible to avoid that the ultrafine particles generated from the material return to the reaction region due to arc discharge, and prevent the aggregation and remelting of the ultrafine particles. it can.

  It is desirable that an end door 1c to which the discharge electrode 5 is attached is provided with an opening / closing door, or the above-described discharge electrode 5 is attached to the opening / closing door so that the end surface 1c also serves as the opening / closing door. That is, in order to clean the inside of the ultrafine particle generating chamber 1, it is necessary to provide an opening / closing door. As shown in a perspective view of the main part of the ultrafine particle generating chamber 1 in FIG. Since the discharge electrode 5 is attached to the opening / closing door 1c and the discharge electrode 5 is removed from the inside of the ultrafine particle generation chamber 1 when the door is opened, the ultrafine particle generation chamber is provided. 1. It does not become an obstacle to cleaning the inside, and can be easily cleaned.

The material mounting table 4 is disposed in an airtight state to the bottom so that the upper surface of the material mounting table 4 is substantially flush with the bottom of the substantially semi-cylindrical portion 1a. It is preferable that the mounting table 4 can be moved up and down. This is for facilitating cleaning around the material mounting table 4 in the ultrafine particle generation chamber 1 by lowering the material mounting table 4 when cleaning the inside of the ultrafine particle generation chamber 1. Further, by allowing the material mounting table 4 to be lowered and removed from the ultrafine particle generating chamber 1, cleaning and maintenance of the material mounting table 4 are facilitated. On the other hand, by allowing the material mounting table 4 to rise from a height that is substantially flush with the bottom, the angle between the discharge electrode and the material and the plasma frame when generating ultrafine particles are obtained. The situation can be adjusted. The means for raising and lowering the material mounting table 4 is not particularly limited. For example, the rod 10 connected to the lower part of the material mounting table 4 can be provided below the material mounting table 4, and an elevating mechanism for the rod 10 can be provided.

An observation window 11 shown in FIG. 2 is provided in the peripheral surface portion 1a and / or the end surface portion 1c of the ultrafine particle generation chamber 1, and an arc discharge state or the like can be observed from the observation window. If ultrafine particles adhere to the observation window 11, the observation field of view cannot be secured sufficiently. For example, even if ultrafine particles are deposited inside the observation window by disposing a pair of permanent magnets 12 attracting each other on both surfaces of the observation window made of glass and attaching them to the glass surface by mutual magnetic force, the observation window If the outer magnet is slid on the glass surface, the magnet on the inner side of the observation window slides along with it, and as a result, ultrafine particles are removed, thereby ensuring visibility. In addition to this, for example, although not shown, a wiper around which a pair of heat-resistant woven fabrics are wound may be provided in the observation window 11. In this case, one or two selected from the group consisting of heat-resistant synthetic fibers such as aramid fibers and wholly aromatic polyester fibers, inorganic fibers such as carbon fibers, glass fibers, and boron fibers, and metal fibers such as iron fibers and copper fibers. What used more than seed | species and made the woven fabric shape is preferable.

  In FIG. 1, an ultrafine particle collection chamber 2, that is, a glove box, is connected from an ultrafine particle generation chamber 1 via a valve 3. The ultrafine particle conveyance path from the ultrafine particle generation chamber 1 to the ultrafine particle collection chamber 2 has a structure in which refraction is reduced and ultrafine particle adhesion in the tube is avoided as much as possible. A collector 13 for the ultrafine particles 19 is provided in the inner space of the ultrafine particle collection chamber 2 where the ultrafine particles are conveyed. A plurality of the collectors 13 can be provided in the ultrafine particle collecting chamber 2. The collector 13 has a filter 14 that separates ultrafine particles and gas with this filter and discharges the separated gas to the outside of the ultrafine particle collecting chamber 2. The material and shape of the filter are not particularly limited. In addition, when a cylindrical filter is used, a method of attaching ultrafine particles to the outer peripheral surface of the filter or a method of attaching to the inner peripheral surface may be used. The separated gas may be forcibly discharged from the ultrafine particle collection chamber 2 by the suction pump CP15 shown in FIG.

  In the ultrafine particle collection chamber 2, the filter that separates the ultrafine particles and the carrier gas inevitably becomes clogged due to the accumulation of ultrafine particles during continuous operation. Therefore, a counter pressure applying means for preventing clogging of the filter is provided. For example, a pressurizing means 18 and a gas conduit connected to the pressurizing means 18 are provided together with a valve in a gas conduit that is connected from the filter to the outside of the ultrafine particle collecting chamber 2 and discharges gas. Then, the valve provided on the gas discharge side is closed, the valve connected to the pressurizing means is opened, and the gas pressure in the filter is temporarily made higher than the surrounding gas pressure by the pressurizing means. Then, since the gas passes through the filter in the opposite direction, the ultra fine particles attached to the filter can be separated and removed.

  The filter 13 is provided with a plurality of filters 14, and the filter is free from clogging by independently providing a gas pipe for discharging gas and a gas pipe connected to the pressurizing means. In this case, it is not necessary to interrupt the collection of ultrafine particles. That is, in order to remove clogging of one filter, even when gas pressure from the pressurizing means is applied to the filter, it is possible to repair ultrafine particles with another filter by switching the valve. is there. Therefore, it becomes possible to collect ultrafine particles continuously.

  Needless to say, a transparent observation window can be provided in the ultrafine particle collection chamber 2 in order to observe the collection state of the ultrafine particles in the ultrafine particle collection chamber 2.

In the ultrafine particle collection chamber 2, the gas from which the ultrafine particles have been separated through the filter 14 of the collector 13 passes through the gas line connected to the circulation pump 15 having the gas discharge valve 16, and the gas in the ultrafine particle generation chamber 1. Can be led to the inlet 7. As described above, when the gas after separating the ultrafine particles is led to the ultrafine particle generation chamber 1 and reused for the generation of the ultrafine particles, the gas is discharged from the ultrafine particle collection chamber to the outside air. In comparison, the gas consumption can be significantly reduced. Note that the gas discharged from the ultrafine particle collection chamber is at a low temperature, but if the gas is circulated and continuously operated, the gas temperature may gradually increase. the heat exchanger 17 is provided, it is advantageous to cool the gas.

  In order to produce ultrafine particles by using the ultrafine particle production apparatus according to the present invention described above, for example, the material mounting table 4 arranged inside the ultrafine particle generation chamber 1 is connected to the anode of the power source 6 and used as the discharge electrode 5. A non-consumable tungsten electrode is connected to the cathode of the power source 6 and the gas pressure of the gas introduced into the ultrafine particle generation chamber by the gas introduction port 7 is controlled in the range of 10 kPa to 150 kPa to generate ultrafine particles.

  As the gas species supplied to the ultrafine particle generation chamber 1 from the gas inlets 7, 7a, 7b of the ultrafine particle generation chamber, one or more reaction gases selected from hydrogen, nitrogen, oxygen, ammonia and methane are used. , Argon, helium, xenon and the like, or a mixed gas with one or more inert gases can be used.

  The material can be a lump of any shape. A gripping device (magic hand) can be provided in the vicinity of the material placing table 4 inside the ultrafine particle generation chamber 1. This gripping device is useful for gripping the material on the material mounting table 4 and moving the material and turning the material upside down.

  When the material is a non-conductive material such as ceramics, even if DC power is supplied from the power source to the material mounting table 4 and the discharge electrode 5, an arc discharge is generated between the material and the electrode. Is difficult. Therefore, in the ultrafine particle production apparatus according to the present invention, as shown in FIG. 2, a plurality of discharge electrodes 5a are provided on the peripheral surface portion of the ultrafine particle generation chamber, and an AC power source (not shown) is connected to these electrodes. Arc discharge. Thus, arc discharge is performed between the electrodes 5a attached to the peripheral surface portion, and the arc flame is indirectly applied to the nonconductive material on the material mounting table 4, so that the nonconductive material as well as the conductive material can be used. Ultrafine particles can be produced.

  As described above, in the ultrafine particle manufacturing apparatus according to the present invention, the material may be conductive or non-conductive, and the material itself, or ultrafine particles of nitride, oxide or carbide of the material can be prepared. As a result, it is possible to advantageously produce ultrafine particles that are metals, alloys, nitrides, borides, oxides, metal-ceramic composites, mixtures of different materials, or composites. .

It is a schematic diagram which shows an example of the ultrafine particle preparation apparatus according to this invention. It is a perspective view which shows the principal part of an ultrafine particle generation chamber.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Ultrafine particle generation chamber 2 Ultrafine particle collection chamber 4 Material mounting base 5 Discharge electrode 7 Gas inlet

Claims (12)

And ultra-fine particles generation chamber, equipped with an ultra fine particle collection chamber which connects to the ultrafine particle generation chamber, wherein the ultrafine particles generation chamber, while arranged close to the material loading table to be connected to the power source and the discharge electrode, wherein the inlet of the gas reacting provided by arc discharge in the ultra-fine particles generation chamber, the ultrafine particles produced by evaporation of the material placed on the material placing table, ultra is conveyed to the ultrafine particles collected chamber by the gas stream In the fine particle production device,
The nanoparticle generating chamber substantially has a semi-cylindrical, said one end communicating with ultrafine particulate collection chamber has a shape substantially consisting of half cone shaped, the door at the other end end surface, on the door An ultrafine particle production apparatus having the discharge electrode attached thereto.   The gas inlet is provided at the end face and the peripheral surface of the ultrafine particle generation chamber, and the gas ejected from the inlet generates a swirling gas flow toward the ultrafine particle collection chamber in the ultrafine particle generation chamber. The ultrafine particle manufacturing apparatus according to claim 1.   The apparatus for producing ultrafine particles according to claim 2, further comprising means for adjusting the speed of the gas flow in accordance with the generation speed of the ultrafine particles. Wherein the discharge electrode, angle ultrafine particles prepared according to any one of claims 1 to 3, characterized in that it is 50 ° ± 20 ° with the material. It said material mounting table, a position where the bottom surface flush with ultrafine particles generation chamber as a standard position, according to any one of claims 1 to 4, characterized in that vertically movable with this standard position to the reference Ultrafine particle production equipment. The ultrafine particle production apparatus according to any one of claims 1 to 5 , wherein an observation window is provided in the ultrafine particle generation chamber, and a visual field securing means is provided in the observation window. The nanoparticle collection chamber is provided with one or more collector having a filter, according to claim 1 to 6, characterized in that a counter pressure applying means to prevent clogging of the filter The ultrafine particle production apparatus according to any one of the above. Wherein the gas after trapping of ultrafine particulate collection chamber is recovered, one of claims 1 to 7, characterized in that the gas conduit is provided with a circulating pump leading to the inlet of the gas ultrafine particles generation chamber 1 The ultrafine particle production apparatus according to the item. The material mounting table of the ultrafine particle generation chamber is connected to the anode of the power supply, the discharge electrode is connected to the cathode of the power supply as a non-consumable tungsten electrode, and the gas pressure led to the ultrafine particle generation chamber by the gas inlet is 10 kPa to 150 kPa The apparatus for producing ultrafine particles according to any one of claims 1 to 8, further comprising a control means. The gas inlet of the ultrafine generation chamber, hydrogen, nitrogen, oxygen, ammonia, and one or more reactive gases selected from methane, claims 1 mixed gas of an inert gas is supplied 9 The ultrafine particle production apparatus according to any one of the above. The ultrafine particle production apparatus according to any one of claims 1 to 10, wherein a gripping device for moving or reversing the material placed on the material placing table is provided in the ultrafine particle generation chamber. Ultrafine particles to be produced are metals, alloys, nitrides, borides, carbides, oxides, metals - ceramic composite compound, as claimed in mixture or any one of claims 1 to 11 which is a composite of different materials Ultrafine particle production equipment.

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