JP3625127B2 - Substrate transfer device and vacuum device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate transfer apparatus for simultaneously transferring a plurality of substrates in a substrate in an apparatus such as CVD and sputtering.
[0002]
[Prior art]
Conventionally, in the semiconductor and liquid crystal industries, vacuum processing apparatuses such as sputtering, CVD, and dry etching for forming a thin film on a substrate surface have been used. Among these vacuum processing apparatuses, a multi-chamber type apparatus having a plurality of vacuum processing chambers each having an independent exhaust system has been put into practical use.
[0003]
An example of a conventional multi-chamber vacuum processing apparatus is shown in FIG. FIG. 10 shows a plan view of the apparatus. A plurality of process chambers 109 and a load lock chamber 107 are arranged around the transfer chamber 110 located in the center. A gate valve V105 is provided between each process chamber 109 and the transfer chamber 110, and between the transfer chamber 110 and the load lock chamber 107, and a gate valve A106 is provided between the load lock chamber 107 and the atmosphere. In addition, each process chamber 109, the transfer chamber 110, and the load lock chamber 107 are each provided with a vacuum pump that exhausts air independently.
[0004]
The transfer chamber 110 is provided with a vacuum transfer robot 108 for transferring the substrate 109. Each process of the substrate 102 in the load lock chamber 107 is performed by a rotation operation in a vertical direction with respect to the paper surface and an expansion / contraction operation in a horizontal plane. Carrying in into the chamber 109 and carrying out from each process chamber 109 to the load lock chamber 107 are performed. The vacuum transfer robot 108 transfers the substrates 102 one by one.
[0005]
Further, an atmospheric transfer robot 103 is installed on the atmosphere side, and the substrate cassette 104 storing a plurality of substrates 102 is transferred to the load lock chamber 106.
[0006]
Hereinafter, the operation of the above-described apparatus will be described in more detail.
[0007]
First, the substrate cassette 104 storing a plurality of substrates 102 on the atmosphere side is carried into the load lock chamber 106 via the gate valve A 106 by the atmosphere transfer robot 103.
[0008]
Then, the gate valve A106 is closed, and the inside of the load lock chamber 106 is evacuated by a vacuum pump. When the load lock chamber 106 reaches a predetermined degree of vacuum, the gate valve V105 is opened, and the vacuum transfer robot 108 in the transfer chamber 110 takes out one substrate 102 from the substrate cassette 104 and transfers it to the process chamber 109. The substrate 102 processed in the process chamber 109 is returned to the substrate cassette 104 by the vacuum transfer robot 108.
[0009]
This is repeated, and when all of the substrate cassette 104 is filled with the processed substrate 102, the gate valve V105 is closed, the load lock chamber 106 is released to the atmosphere, the gate valve A106 is opened, and the substrate cassette 104 is opened. The load lock chamber 106 is taken out.
[0010]
By the way, in recent years, the semiconductor and liquid crystal industries are strongly demanded to improve productivity, and therefore it is desirable to shorten the processing time in the process chamber. However, due to the recent increase in the substrate size and the like, the transfer time of the vacuum transfer system and the expansion of the transfer mechanism cause a problem that it is difficult for the conventional transfer apparatus to immediately carry out the processed substrate. .
[0011]
As an apparatus capable of solving these problems and increasing the throughput, there is a batch type vacuum processing apparatus in which a plurality of process boxes are provided in one process chamber and a plurality of substrates are processed simultaneously.
[0012]
11 and 12 show an outline of a batch type vacuum processing apparatus. 11 and 12 show a plan view and a side view of the vacuum processing apparatus, respectively. Here, the same reference numerals are given to substantially the same parts as those in FIG.
[0013]
There are a process chamber 121 and a load lock chamber 123 around the transfer chamber 120, and a vacuum transfer robot 124 for transferring a plurality of substrates 102 simultaneously is installed in the transfer chamber 120. A plurality of process boxes 122 are installed in the process chamber 121. The process box 122 can perform batch processing on a plurality of substrates 102 placed inside.
[0014]
In this vacuum processing apparatus, the substrate 102 is carried from the substrate cassette 104 into the load lock chamber 123 by the atmospheric transfer robot 103 from the atmosphere side.
[0015]
Then, the plurality of substrates 102 in the load lock chamber 123 are simultaneously taken out by the vacuum transfer robot 124 and carried into the process chamber 121. In addition, the plurality of substrates 102 that have been processed are simultaneously removed from the process chamber 121 and returned to the load lock chamber 123.
[0016]
As described above, in this apparatus, since a large number of substrates are batch-transferred simultaneously in the transfer chamber 120, the joint portion is large due to the weight of the substrate to be transferred and the weight of the rack portion that supports the substrate of the vacuum transfer robot. A load is applied, and the life of the joint bearings and the like is shortened. It causes failure and particle generation. In particular, when the conveyance speed is increased and the weight of the conveyed product is increased in the conveyance in a vacuum, this phenomenon appears remarkably.
[0017]
In the film formation in vacuum, the generation of particles is a problem, and there is a magnetic levitation transport as a method for solving the problem. Magnetic levitation conveyance is a conveyance method that eliminates sliding parts and does not generate particles. This magnetic levitation conveyance will be described with reference to the explanatory diagram of FIG.
[0018]
The magnetic levitation transfer apparatus includes a vacuum tunnel 135 formed by a partition wall 131 and maintained in a vacuum state, and a transfer table 133 disposed in the vacuum tunnel 135. Above the vacuum tunnel 135, levitation electromagnets 134 that levitate and support the carriage 133 in a non-contact state are disposed on the left and right.
[0019]
On the other hand, a linear motor 136 and a displacement sensor 138 are disposed below the vacuum tunnel 135 to move and move the transport table 133. Each is installed at equal intervals in a direction perpendicular to the page.
[0020]
The displacement sensor 138 measures the vertical distance to the transport table 133, adjusts the attractive force of the electromagnet 134, and controls the position and orientation of the transport table 133. Then, the carriage 133 is caused to travel in the traveling direction by the linear motor 136.
[0021]
Since the transport table 133 is completely levitated, there is no sliding part and no particles are generated in the transport system.
[0022]
[Problems to be solved by the invention]
However, the magnetic levitation transport device is originally suitable for transporting a long distance in a vacuum, and is not suitable for transporting a substrate in a vacuum device. This is because the positional accuracy of the substrate is important when the substrate is carried into and out of the process chamber, and it is difficult to maintain the positional accuracy with a normal magnetic levitation transport apparatus. In order to carry within the range where the above positional accuracy is actually maintained, it is necessary to use a high-precision large device as a levitating electromagnet or a driving linear motor. There is a need to perform with high accuracy (a high-precision position detector is required), which is practically impossible.
[0023]
In view of the above-described problems, the present invention provides a substrate transport apparatus that transports a plurality of substrates simultaneously in a vacuum, and has a low failure rate and low particle generation despite the heavy transport. The purpose is to provide.
[0024]
[Means for Solving the Problems]
The substrate transfer apparatus according to claim 1, wherein the substrate transfer apparatus moves a transfer loader mounted with a substrate to a predetermined position. Said To the transport loader, Said The conveyance loader on which the substrate is mounted has buoyancy imparting means for giving buoyancy sufficient to prevent levitation. And an articulated robot for moving the transfer loader. Is.
[0025]
The substrate transfer apparatus according to claim 2 is the substrate transfer apparatus according to claim 1, wherein the buoyancy imparting means imparts buoyancy to the transfer loader by magnetic force.
[0026]
The substrate transfer apparatus according to claim 3 is the substrate transfer apparatus according to claim 2, wherein the buoyancy imparting means includes a magnetic force adjusting means for adjusting the magnetic force according to the weight of the transfer loader on which the substrate is mounted. It is.
[0027]
A substrate transfer device according to a fourth aspect of the present invention is the substrate transfer device according to the first aspect, wherein the substrate support claw that moves according to the movement of the transfer loader is provided. Vertical A plurality are provided in the direction.
[0028]
The substrate transfer apparatus according to claim 5, Claim 1 In the substrate transfer apparatus described in The articulated robot regulates the vertical and horizontal movement trajectories of the transport loader by moving the transport loader along a predetermined trajectory. Is.
[0029]
Claim 6 A vacuum apparatus incorporates the substrate transfer apparatus according to any one of claims 1, 2, 4, and 5. Is.
[0030]
A vacuum apparatus according to a seventh aspect is the vacuum apparatus according to the sixth aspect, further comprising a load lock chamber having the substrate transfer device therein, and the buoyancy imparting means is provided on an upper surface of the transfer loader in the substrate transfer device. Fixed permanent magnet When, An electromagnet installed on the upper surface of the inner wall of the load lock chamber so as to face the permanent magnet The above permanent magnet and electromagnet A suction force is generated between the two.
[0031]
Claim 8 The vacuum apparatus according to claim 6, wherein the vacuum apparatus according to claim 6 includes a stage provided with a load lock chamber having the substrate transfer device therein, and a substrate delivery pin interlocked with a transfer loader in the substrate transfer device. And the substrate transfer apparatus transfers the substrate between the load lock chamber and a stage in the process chamber. Is.
[0032]
Hereinafter, the operation of the present invention will be described.
[0033]
The substrate transfer device of the present invention is a substrate transfer device that moves a transfer loader loaded with a substrate to a predetermined position, and has a buoyancy imparting means that gives the transfer loader a buoyancy that prevents the transfer loader loaded with the substrate from rising. It has. In the present invention, since the buoyancy sufficient to prevent the transfer loader from floating is given to the transfer loader, the apparent weight of the transfer loader can be reduced, so that the failure rate can be kept low. The position in (direction) can be accurately controlled.
[0034]
Also, In the substrate transport apparatus, the buoyancy imparting unit may impart buoyancy to the transport loader by magnetic force. By applying buoyancy by magnetic force, it is possible to realize clean conveyance without generation of particles.
[0035]
further, The buoyancy imparting means may comprise a magnetic force adjusting means for adjusting the magnetic force according to the weight of the transport loader on which the substrate is mounted. Furthermore, the applied magnetic force is adjusted based on the total weight including the substrate of the transport loader. Ru Therefore, an appropriate buoyancy can be applied according to the use situation.
[0036]
Also, The substrate transfer device may include a restricting unit that restricts a movement trajectory of the transfer loader. Since the means for restricting the movement trajectory of the transport loader is provided, it is possible to realize more reliable position control of the transport loader.
[0037]
Also, The said board | substrate conveyance apparatus WHEREIN: The said control means may comprise the V-shaped wheel provided in the conveyance loader and the conveyance path | route of a board | substrate, and the V-shaped rail fitted to it. If the V-shaped wheel and the V-shaped rail fitted to the V-shaped wheel are restricted, the movement in the horizontal direction can be reliably restricted.
[0038]
further, The restricting means may include a flat wheel and a flat rail provided in the conveyance path of the conveyance loader and the substrate. Furthermore, if it restrict | limits with a flat wheel and a flat rail, the movement of the rotation direction centering on the moving direction of a conveyance loader can be controlled reliably.
[0039]
Also, The said board | substrate conveyance apparatus WHEREIN: The said control means may regulate the moving track | orbit of a conveyance loader by magnetic force. If the horizontal movement of the transport loader is regulated by magnetic force, the horizontal movement regulation can be adjusted according to the movement situation.
[0040]
Further, if the transfer loader is moved by an articulated robot, the sliding portion can be eliminated and the generation of particles can be suppressed.
[0041]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
[0042]
(Embodiment 1)
Hereinafter, the substrate transfer apparatus according to the first embodiment of the present invention will be described with reference to FIGS.
[0043]
FIG. 1 is a schematic plan view of a vacuum apparatus incorporating a substrate transfer apparatus of the present invention, and FIGS. 2 and 3 are a side view and a front view showing the configuration of a load lock chamber and a process chamber part, respectively. 4 and 5 are explanatory views for explaining a mechanism for delivering a substrate.
[0044]
In FIG. 1, reference numeral 6 denotes a process chamber, which is arranged radially with respect to one atmospheric transfer robot 21 together with five load lock chambers. The atmospheric transfer robot 21 is not in a vacuum but in the atmosphere. A gate valve A8 is provided on each load lock chamber 5 on the atmospheric transfer robot 21 side, and a gate valve V9 is provided on each load lock chamber 5 on the process chamber 6 side. The load lock chamber 5 is in contact with the atmospheric part via the gate valve A8. Inside the load lock chamber 5, a vacuum transfer vehicle 1 that can move in only one direction to the process chamber 6 is disposed.
[0045]
The atmospheric transfer robot 21 is linked to the vacuum transfer vehicle 1 in the load lock chamber 5 and transfers the substrate 2 at high speed by vacuum suction or the like. Further, the atmospheric transfer robot 21 takes the substrate 2 directly into and out of the substrate cassette 20.
[0046]
The operation of this vacuum processing apparatus will be described below.
[0047]
(1) In FIG. 1, first, the substrate 2 is taken out from the substrate cassette 20 placed in the atmosphere by the atmospheric transfer robot 21. Next, the gate valve A <b> 8 of the load lock chamber 5 is opened, and the load lock chamber 5 is conveyed into the load lock chamber 5. In the load lock chamber 5, the substrate 2 is transferred to the vacuum transfer vehicle 1 in conjunction with the atmospheric transfer robot 21 and the vacuum transfer vehicle 1.
[0048]
(2) Next, the gate valve A8 is closed and the load lock chamber 5 is evacuated.
[0049]
(3) Thereafter, the gate valve V9 is opened, and the substrate 2 is transferred into the process chamber 6 by the vacuum transfer vehicle 1.
[0050]
(Four) Subsequently, the gate valve V <b> 9 is closed, and the process for the substrate 2 is executed in the process chamber 6.
[0051]
(Five) After the processing, the substrate 2 is taken out from the process chamber 6, (1) ~ (3) The substrate 2 is stored in the substrate cassette 20 by the reverse operation. The process is completed in such a procedure.
[0052]
As shown in FIGS. 2 and 3, the load lock chamber 5 and the process chamber 6 are isolated from the atmosphere by a partition wall 11. In the load lock chamber 5, there is a transport vehicle 1 that carries the substrate 2 into and out of the process chamber 6. The transport vehicle 1 is formed so as to be able to reciprocate on a rail 13 provided on the floor surface of the load lock chamber 5. The conveyance vehicle 1 can be driven by power from a ball screw (not shown), pressing force from a rod-like member, or the like.
[0053]
A plurality of substrate support claws 10 are provided on the support 1 a of the transport vehicle 1, and the substrate 2 is mounted thereon. A plurality of process boxes 7 are installed in the process chamber 6 so that a plurality of substrates 2 can be processed simultaneously.
[0054]
As shown in FIG. 3, the wheel 12 of the conveyance vehicle 1 uses a V-shaped wheel 12a on one side and a flat wheel 12b on the other side. Accordingly, the V-shaped rail 13a and the flat rail 13b are installed in the load lock chamber 5. The trajectory of the transport vehicle 1 is restricted by the V-shaped wheels 12a and the V-shaped rails 13a, and the flat wheels 12b and the flat rails 13b stop the rotation around the axis perpendicular to the paper surface of the transport vehicle 1.
[0055]
A permanent magnet 3 is fixed between the wheels 12 (12a, 12b) at the lower part of the transport vehicle 1, and the electromagnet is opposed to the permanent magnet 3 provided in the transport vehicle 1 on the floor surface of the load lock chamber 5. 4 is arranged. The electromagnet 4 is formed so as to extend in the moving direction of the transport vehicle 1, and the electromagnet 4 always exists at a position facing the permanent magnet 3 even when the transport vehicle 1 moves.
[0056]
When a current is applied to the electromagnet 4, a repulsive force is generated between the permanent magnet 3 and the electromagnet 4, and buoyancy acts on the transport vehicle 1. Here, the electric power supplied to the electromagnet 4 is adjusted so that the buoyancy is such that the transport vehicle 1 does not float off the rail. Here, if the positions of the permanent magnet 3 and the electromagnet 4 are adjusted so that the buoyancy is applied in the vicinity of the position of the center of gravity of the transport vehicle 1, the transport vehicle 1 can be stably moved on the rail.
[0057]
The electric power supplied to the electromagnet 4 in order to generate the buoyancy as described above may be a predetermined constant value or may be adjustable as shown in FIG. In FIG. 3, a buoyancy adjuster 14 that outputs a signal corresponding to the number of substrates (or weight) is provided, and a command value is sent to the electromagnet driver 15 in response to the input of the number of substrates (or weight) from the user. Output. The electromagnet driver 15 supplies the electromagnet 4 with a current corresponding to the number of substrates (or weight) according to the command value.
[0058]
The supply of electric power to the electromagnet 4 may be applied to the entire electromagnet 4 or may be sequentially supplied in the moving direction as the transport vehicle 1 moves.
[0059]
In the substrate transfer apparatus of the present embodiment, since the transfer vehicle 1 is moved by applying a magnetic force that does not cause the transfer vehicle 1 to float, the gravity of the transfer vehicle 1 is apparently reduced, and the drive system of the transfer vehicle 1 is reduced. Can be reduced, and positioning in the vertical direction (direction of gravity) can be performed. Moreover, the track of the transport vehicle 1 can be regulated by the rail, and the positioning can be surely performed in the horizontal direction. Moreover, since the load applied to the rail is reduced, the generation of particles due to the sliding of the wheel and the rail can be suppressed. Here, the V-shaped wheel 12a and the V-shaped rail 13a are used for horizontal positioning, but the present invention is not limited to this.
[0060]
The electric current is supplied to the electromagnet 4 only when the transport vehicle 1 moves, and the magnetic force generated by the permanent magnet and the electromagnet attached to the transport vehicle 1 does not affect the process performed in the process chamber. .
[0061]
Next, a method for transferring the substrate in the vacuum apparatus will be described with reference to FIGS.
[0062]
FIG. 4 is a perspective view showing the positional relationship between the atmospheric transfer robot 21, the vacuum transfer vehicle 1 in the load lock chamber 5, and the stages 24 in the plurality of process boxes 7 in the process chamber 6.
[0063]
In the load lock chamber 5 and the process chamber 6, the atmospheric transfer robot 21, the vacuum transfer vehicle 1, and the substrate transfer pin 25 in the process box 7 work together to transfer the substrate 2 (this operation will be described later). As shown in FIG. 4, the atmospheric transfer robot 21 transfers the substrate 2 and the stage 24 in the process box 7 to and from the vacuum transfer vehicle 1 in the load lock chamber 5.
[0064]
An example of the substrate delivery process will be described with reference to FIG.
[0065]
As shown in FIG. 5A, in the state where the substrate 2 is fixed by the vacuum adsorber 23 provided on the U-shaped arm 22 of the atmospheric transfer robot 21, the inside of the load lock chamber 5 is moved along with the movement of the arm 22. Approaches the substrate support claw 10 of the vacuum transfer vehicle 1.
[0066]
As shown in FIG. 5B, the arm 22 of the atmospheric transfer robot 21 enters between the substrate support claws 10 of the vacuum transfer vehicle 1 in the load lock chamber 5. The substrate support claw 10 moves back and forth according to the movement of the transport vehicle 1.
[0067]
Next, as shown in FIG. 5 (c), the arm 22 of the atmospheric transfer robot 21 is gradually lowered, and the substrate 2 is transferred in such a manner that the substrate 2 is placed on the substrate support claw 10 of the vacuum transfer vehicle 1.
[0068]
Subsequently, the arm 22 of the atmospheric transfer robot 21 is separated from the load lock chamber 5 as shown in FIG. On the other hand, the substrate support claw 10 of the vacuum transfer vehicle 1 moves with the movement of the transfer vehicle 1, and the substrate 2 on the substrate support claw 10 moves to the process chamber 6 along with the movement.
[0069]
Then, as shown in FIG. 5 (e), the pins 25 provided on the stage 24 in the process chamber 6 project to support the substrate 2.
[0070]
Finally, as shown in FIG. 5 (f), the substrate support claw 10 returns to the load lock chamber 5 together with the transport vehicle 1. In the process chamber 6, the pins 25 are lowered to complete the setting of the substrate 2. Thereafter, the substrate 2 is subjected to a predetermined process.
[0071]
The substrate 2 that has been subjected to the predetermined processing is transported in the reverse operation from FIG. 5 (f) to FIG. 5 (a).
[0072]
In addition, although the example of a mechanism which delivers one board | substrate was shown in FIG. 5, a plurality of board | substrates can be processed simultaneously by installing two or more in the vertical direction.
[0073]
As described above, according to the substrate transfer apparatus of the present embodiment, even when a plurality of substrates are transferred simultaneously in a vacuum, the apparent weight can be reduced by supplying buoyancy, so the failure rate is reduced. It is possible to suppress the generation of particles.
[0074]
(Embodiment 2)
FIG. 6 is a front sectional view showing the substrate transfer apparatus according to the second embodiment. The present embodiment is different from the first embodiment regarding the regulation of the trajectory in the horizontal direction of the transport vehicle 1 and the method of imparting buoyancy, and the other parts are the same. For this reason, the same reference numerals are given to the same components as in FIGS.
[0075]
In the present embodiment, as shown in FIG. 6, L-shaped permanent magnets 72 are fixed to both sides of the lower portion of the transport vehicle 1, and L is placed on the floor surface of the load lock chamber 5 so as to face the permanent magnets 72. A letter-shaped electromagnet 73 is installed. The wheels 70 of the transport vehicle 1 are all flat wheels, and a flat rail 71 is formed in the load lock chamber 5.
[0076]
Below, operation | movement of the board | substrate conveyance apparatus of this Embodiment is demonstrated.
[0077]
In the configuration of FIG. 6, when a current is passed through the electromagnet 73, a repulsive force is generated between the permanent magnet 72 and the electromagnet 73. Since the permanent magnet and the electromagnet 73 are each formed in an L shape, the repulsive force is generated in both the vertical direction and the horizontal direction. And the buoyancy is given to the conveyance vehicle 1 by the repulsive force generated in the vertical direction, and the track of the conveyance vehicle 1 is regulated by the repulsive force generated in the horizontal direction.
[0078]
In such a substrate transport apparatus, as in the first embodiment, in the vertical direction, the buoyancy applied to the transport vehicle 1 is set to a force that does not lift the transport vehicle 1 on which the substrate is mounted. The vehicle 1 can be positioned reliably.
[0079]
Further, the rail for regulation is not used in the horizontal direction as in the first embodiment, and the position is regulated by magnetic force. It is desirable to vary the electric power supplied to the electromagnet 73 based on the detection result.
[0080]
According to the present embodiment as described above, the apparent weight can be reduced by supplying buoyancy to the transport vehicle 1, so that the failure rate can be kept low and the generation of particles can also be suppressed. .
[0081]
(Embodiment 3)
FIG. 7 is a front sectional view showing the substrate transfer apparatus of the third embodiment. The present embodiment is different from the first and second embodiments in the method of regulating the trajectory in the horizontal direction of the transport vehicle 1, and the other parts are the same. For this reason, the same reference numerals are given to substantially the same components as in FIGS.
[0082]
As shown in FIG. 7, permanent magnets 75 are fixed to both side surfaces of the transport vehicle 1. In addition, an electromagnet 76 is installed on the inner wall side surface of the load lock chamber 5 so as to face the permanent magnet 75.
[0083]
Here, by supplying a current to the electromagnet 76 while controlling the magnitude thereof, a repulsive force can be generated between the permanent magnet 75 and the electromagnet 76 to restrict the track of the transport vehicle 1.
[0084]
In such a substrate transport apparatus, as in the first and second embodiments, the buoyancy applied to the transport vehicle 1 is set to a force that does not lift the transport vehicle 1 on which the substrate is mounted in the vertical direction. And the positioning of the conveyance vehicle 1 can be performed reliably.
[0085]
Further, the rail for regulation is not used in the horizontal direction as in the first embodiment, and the position is regulated by magnetic force. It is desirable to vary the power supplied to the electromagnet 76 based on the detection result.
[0086]
As described above, according to the present embodiment, the apparent weight can be reduced by supplying buoyancy, so that the failure rate can be reduced and the generation of particles can also be suppressed.
[0087]
(Embodiment 4)
FIG. 8 is a front sectional view showing the configuration of the substrate transfer apparatus according to the fourth embodiment. In the present embodiment, the method for imparting buoyancy to the transport vehicle 1 is different from that in the third embodiment, and the other parts are the same. For this reason, the same reference numerals are given to substantially the same components as in FIGS.
[0088]
As shown in FIG. 8, a permanent magnet 80 is fixed to the upper surface of the transport vehicle 1. Further, an electromagnet 81 is installed on the upper surface of the inner wall of the load lock chamber 5 so as to face the permanent magnet 80.
[0089]
In the substrate transport apparatus having this configuration, an attractive force is generated between the permanent magnet 80 and the electromagnet 81 by causing a current to flow through the electromagnet 81, and buoyancy is applied to the transport vehicle 1. The suction force here is set to a force that does not cause the transport vehicle 1 to float. Thereby, similarly to Embodiment 1, the conveyance vehicle 1 can be reliably positioned with respect to the vertical direction.
[0090]
Further, the rail for regulation is not used in the horizontal direction as in the first embodiment, and the position is regulated by magnetic force. It is desirable to vary the electric power supplied to the electromagnet 76 based on the detection result.
[0091]
As described above, according to the present embodiment, in a substrate transport apparatus that transports a plurality of substrates at the same time in a vacuum, the substrate transport is low in failure rate and low in spite of heavy transport. A device can be realized.
[0092]
(Embodiment 5)
FIG. 9 is a front sectional view showing the configuration of the vacuum transfer apparatus according to the fifth embodiment. The present embodiment is different from the above-described first to fourth embodiments in the track regulation method. For this reason, the same reference numerals are given to substantially the same components as in FIGS.
[0093]
As shown in FIG. 9, here, the transport vehicle 1 is moved using an articulated robot 90. The articulated robot 90 moves the transport vehicle 1 along a predetermined trajectory. For this reason, the movement track of the transport vehicle 1 is reliably regulated in the vertical direction and the horizontal direction.
[0094]
Further, in the present embodiment, an attractive force is generated in the permanent magnet 80 and the electromagnet 81 to reduce the gravity of the transport vehicle 1 applied to the articulated robot 90, so that the moment acting on each joint of the articulated robot is small. This increases the life of the joint and increases the reliability.
[0095]
In the first to fifth embodiments, the conveyance in a vacuum atmosphere in which remarkable effects such as particle suppression are obtained has been described. Needless to say, the substrate conveyance apparatus of the present invention can also be used in the atmosphere.
[0096]
Further, as means for giving buoyancy, aerodynamic force by compressed air may be used in addition to magnetic force.
[0097]
【The invention's effect】
According to the present invention, while controlling the track of the transport vehicle, in order to give the transport vehicle buoyancy so that it does not float from the track, the load due to gravity acting on the portion that supports the transport vehicle without difficulty in position control is imposed. Can be reduced. Accordingly, the load due to gravity on the sliding parts such as the bearings of the transfer device is reduced, the generation of particles is suppressed, the life is extended, and the failure rate of the substrate transfer device is reduced. In particular, it is effective in a vacuum atmosphere because generation of problematic particles can be suppressed.
[0098]
Moreover, since the influence of gravity can be reduced by the buoyancy imparting means, there is no problem even if a plurality of transported objects are mounted. Furthermore, the buoyancy can be easily given to the object to be conveyed by the magnetic force, and the buoyancy can be easily switched according to the weight of the object to be conveyed.
[Brief description of the drawings]
FIG. 1 is a plan view showing a configuration of a substrate transfer apparatus according to a first embodiment of the present invention.
FIG. 2 is a side view showing the configuration of the substrate transfer apparatus according to the first embodiment.
FIG. 3 is a front sectional view showing the configuration of the transport vehicle according to the first embodiment of the present invention.
4 is a perspective view showing a substrate transfer mechanism according to Embodiment 1. FIG.
FIG. 5 is a diagram illustrating a substrate transfer operation according to the first embodiment.
FIG. 6 is a front sectional view showing a configuration of a transport vehicle according to a second embodiment.
FIG. 7 is a front cross-sectional view showing a configuration of a transport vehicle according to a third embodiment.
FIG. 8 is a front sectional view showing a configuration of a transport vehicle according to a fourth embodiment.
FIG. 9 is a front sectional view showing a configuration of a transport vehicle according to a fifth embodiment.
FIG. 10 is a plan view showing a configuration of a conventional substrate transfer apparatus.
FIG. 11 is a plan view showing a configuration of a conventional substrate transfer apparatus.
FIG. 12 is a side view showing a configuration of a conventional substrate transfer apparatus.
FIG. 13 is a cross-sectional view showing a configuration of a conventional substrate transfer apparatus.
[Explanation of symbols]
1 Transport vehicle
2 Substrate
3,72,75,80 Permanent magnet
4,73,76,81 Electromagnet
5 Load lock room
6 Process chamber
7 Process box
12,70 wheels
13,71 rail
14 Buoyancy adjuster
15 Electromagnet driver
20 PCB cassette
21 Atmospheric transfer robot
90 Articulated robot

Claims (8)

In a substrate transfer device that moves a transfer loader loaded with a substrate to a predetermined position,
The transport loader is provided with buoyancy imparting means for providing a buoyancy that does not cause the transport loader mounted with the substrate to float ,
A substrate transfer apparatus comprising an articulated robot for moving the transfer loader . The substrate transport apparatus according to claim 1, wherein the buoyancy imparting unit imparts buoyancy to the transport loader by magnetic force. The substrate transfer apparatus according to claim 2, wherein the buoyancy imparting unit includes a magnetic force adjusting unit that adjusts the magnetic force according to a weight of a transfer loader on which the substrate is mounted. The substrate transport apparatus according to claim 1, wherein the transport loader includes a plurality of substrate support claws in the vertical direction that move according to the movement of the transport loader. 2. The substrate transfer apparatus according to claim 1, wherein the articulated robot moves the transfer loader along a predetermined trajectory, thereby restricting a movement trajectory of the transfer loader in a vertical direction and a horizontal direction. . A vacuum apparatus comprising the substrate transfer apparatus according to any one of claims 1, 2, 4, and 5. With a load lock chamber having the substrate transfer device inside,
Said buoyancy providing means is constituted by a conveyor and the permanent magnet fixed to the loader top, and the installation electromagnets so as to face the permanent magnets on the inner wall upper surface of the load lock chamber in the substrate transfer device, the permanent magnet The vacuum apparatus according to claim 6, wherein an attractive force is generated between the magnet and the electromagnet . A load lock chamber having the substrate transfer device therein;
A process chamber having therein a stage provided with substrate transfer pins interlocked with a transfer loader in the substrate transfer apparatus;
The vacuum apparatus according to claim 6, wherein the substrate transfer device transfers a substrate between the load lock chamber and a stage in the process chamber.

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