JP3524321B2 - Method for manufacturing plate-like body having precision partition, plate-like body having precision partition, method for manufacturing substrate for plasma display device, and substrate for plasma display device - Google Patents
Method for manufacturing plate-like body having precision partition, plate-like body having precision partition, method for manufacturing substrate for plasma display device, and substrate for plasma display deviceInfo
- Publication number
- JP3524321B2 JP3524321B2 JP11169297A JP11169297A JP3524321B2 JP 3524321 B2 JP3524321 B2 JP 3524321B2 JP 11169297 A JP11169297 A JP 11169297A JP 11169297 A JP11169297 A JP 11169297A JP 3524321 B2 JP3524321 B2 JP 3524321B2
- Authority
- JP
- Japan
- Prior art keywords
- back plate
- substrate
- display device
- plasma display
- partition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005192 partition Methods 0.000 title claims description 99
- 239000000758 substrate Substances 0.000 title claims description 48
- 238000004519 manufacturing process Methods 0.000 title claims description 29
- 238000000034 method Methods 0.000 title claims description 28
- 239000011521 glass Substances 0.000 claims description 56
- 239000000919 ceramic Substances 0.000 claims description 44
- 239000000843 powder Substances 0.000 claims description 43
- 239000000203 mixture Substances 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 24
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 18
- 239000011230 binding agent Substances 0.000 claims description 17
- 238000003825 pressing Methods 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 239000002003 electrode paste Substances 0.000 claims description 9
- 238000007639 printing Methods 0.000 description 11
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- -1 phthalic acid ester Chemical class 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 239000006259 organic additive Substances 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- BEQKKZICTDFVMG-UHFFFAOYSA-N 1,2,3,4,6-pentaoxepane-5,7-dione Chemical compound O=C1OOOOC(=O)O1 BEQKKZICTDFVMG-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000005210 alkyl ammonium group Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 229910052586 apatite Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012933 diacyl peroxide Substances 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 125000005456 glyceride group Chemical group 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- MMCOUVMKNAHQOY-UHFFFAOYSA-L oxido carbonate Chemical compound [O-]OC([O-])=O MMCOUVMKNAHQOY-UHFFFAOYSA-L 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920005646 polycarboxylate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、精密隔壁を有する
板状体の製造方法、精密隔壁を有する板状体、高精度か
つ安価な大画面用カラー表示装置等に用いられるプラズ
マ表示装置用基板の製造方法およびプラズマ表示装置用
基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a plate-shaped body having a precision partition, a plate-shaped body having a precision partition, a substrate for a plasma display device used in a high-precision and inexpensive large-screen color display device and the like. And a substrate for a plasma display device.
【0002】[0002]
【従来の技術】薄型の大画面用カラー表示装置等に用い
られるプラズマ表示装置は、微小な表示セルと呼ばれる
隔壁で囲まれた空間に、対向する電極を設け、前記空間
に希ガス等の放電可能なガスを封入した構造を成してお
り、対向する電極間に放電によりプラズマを発生させ、
該プラズマにより蛍光体を発光させて画面の発光素子と
して利用するものである。2. Description of the Related Art A plasma display device used in a thin large-screen color display device or the like is provided with facing electrodes in a space surrounded by partition walls called minute display cells, and discharge of rare gas or the like in the space. It has a structure in which possible gas is enclosed, and plasma is generated by discharge between the opposing electrodes,
The plasma causes the phosphor to emit light and is used as a light emitting element of the screen.
【0003】具体的な構造は、図12に示すように、背
面板101の一面に多数の隔壁102を形成して各隔壁
102間をセル103とし、このセル103の底面に電
極104を備えたものを基板105とする。この基板1
05に対して、セル103の内壁面106に蛍光体を塗
布し、一方、電極107を備えた正面板108を基板1
05の隔壁102上に接合して、セル103にガスを封
入することにより、プラズマ表示装置を構成する。な
お、電極104,107は、実際には直交するように配
置するものであるが、図12では説明のため、平行配置
とした。As shown in FIG. 12, a specific structure is such that a large number of partition walls 102 are formed on one surface of a back plate 101 to form cells 103 between the partition walls 102, and an electrode 104 is provided on the bottom surface of the cell 103. The one is a substrate 105. This board 1
05, the phosphor was applied to the inner wall surface 106 of the cell 103, while the front plate 108 having the electrodes 107 was mounted on the substrate 1.
The plasma display device is configured by joining the cells on the partition wall No. 05 and enclosing the gas in the cell 103. Although the electrodes 104 and 107 are actually arranged so as to be orthogonal to each other, they are arranged in parallel in FIG. 12 for the sake of explanation.
【0004】ところで、前記プラズマ表示装置用の基板
105を製造する際には、予め背面板101上に多数の
電極104を形成した後で各電極104間に隔壁106
を形成するが、この隔壁106の製造方法としては、印
刷積層法、アディティブ法、サンドブラスト法、感光性
ペースト法が知られている。印刷積層法は、隔壁102
を成す材料のペーストを用いて厚膜印刷法により背面板
101上に所定パターンの隔壁102を印刷形成するも
ので、1回の印刷で形成できる厚さが約30μm程度で
あることから、印刷、乾燥を繰り返しながら約200μ
m程度の高さを必要とする隔壁102を形成するもので
ある(特開平2−213020号公報参照)。When manufacturing the substrate 105 for the plasma display device, a large number of electrodes 104 are formed on the back plate 101 in advance, and then the partition walls 106 are provided between the electrodes 104.
As a method of manufacturing the partition wall 106, a printing lamination method, an additive method, a sandblast method, and a photosensitive paste method are known. The printing lamination method uses the partition wall 102.
The partition wall 102 having a predetermined pattern is formed by printing on the back plate 101 by using a thick film printing method using a paste of a material forming the above. Since the thickness that can be formed by one printing is about 30 μm, printing is performed. Approximately 200μ while repeating drying
The partition wall 102, which requires a height of about m, is formed (see JP-A-2-213020).
【0005】また、アディティブ法は、背面板101上
に感光性樹脂を塗布し、感光性樹脂に光で溝を刻設し、
その溝にガラスの粉体を埋め込んで隔壁102を形成す
るものである。さらに、サンドブラスト法は、背面板1
01の全面に所定厚さのガラス層を形成し、この表面に
隔壁102形状のレジストマスクを形成しておいて、サ
ンドブラストにて隔壁102以外の部分のガラス層を除
去するようにしたものである(特開平4−259728
号公報参照)。Further, in the additive method, a photosensitive resin is applied on the back plate 101, and grooves are formed in the photosensitive resin with light,
A glass powder is embedded in the groove to form the partition wall 102. Furthermore, the sandblast method is used for the back plate 1
A glass layer having a predetermined thickness is formed on the entire surface of No. 01, a resist mask in the shape of the partition 102 is formed on the surface, and the glass layer other than the partition 102 is removed by sandblasting. (JP-A-4-259728
(See Japanese Patent Publication).
【0006】さらにその上に、感光性ペースト法は、背
面板101上に感光性樹脂を混合したペーストを塗布
し、マスキング後、光を照射して直接隔壁102を形成
するものである。Further, the photosensitive paste method is a method in which a paste containing a photosensitive resin is applied on the back plate 101, masked and then irradiated with light to directly form the partition wall 102.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、上記印
刷積層法では、所定の高さの隔壁102を形成するため
に何回も印刷・乾燥工程を繰り返して積層しなければな
らず、極めて工程数が多くなり、その上、積層毎に精度
よく印刷する必要があるため、非常に歩留りが悪かっ
た。さらに、印刷時の位置ズレにより隔壁102が変形
し易く、かつ印刷製版の伸び等のために、隔壁102に
よって形成される表示セルの寸法精度としては、100
0セル分の寸法を45列測定した時の測定値の最大差が
0.35mm程度あり、高精細度化の要求を満足するも
のではなかった。However, in the above-mentioned printing and laminating method, the printing and drying steps have to be repeated many times to form the partition wall 102 having a predetermined height, and the number of steps is extremely large. In addition, the number of prints is increased, and moreover, it is necessary to print with high accuracy for each stack, so that the yield is very low. Further, the partition wall 102 is easily deformed due to misalignment during printing, and due to elongation of the printing plate, the dimensional accuracy of the display cell formed by the partition wall 102 is 100.
There was a maximum difference of about 0.35 mm in the measured values when measuring the size of 0 cell in 45 columns, which did not satisfy the demand for high definition.
【0008】また、アディティブ法でも光を用いて隔壁
102を形成するもので、必ずしも十分な精度で隔壁1
02を形成できるものではなかった。さらに、サンドブ
ラスト法においても、マスク形成にフォトレジストを用
いた後サンドブラストを行うため、工程が複雑であり、
しかも高精度に隔壁102を形成することは困難であっ
た。さらに、ブラスト加工に用いる研磨剤を回収し繰り
返して使用する場合は、研磨剤の磨耗劣化による研削力
の低下や経時変化があり、安定して量産することが困難
であった。一方、研磨剤を回収せずに使用する場合は、
研磨剤のコストが高くなり、この場合も大量生産は困難
であった。Further, even in the additive method, the partition wall 102 is formed by using light, and the partition wall 1 is not always sufficiently accurate.
02 could not be formed. Further, even in the sandblasting method, since the sandblasting is performed after using the photoresist for forming the mask, the process is complicated,
Moreover, it was difficult to form the partition wall 102 with high accuracy. Further, when the abrasive used for the blasting process is collected and repeatedly used, the grinding force is deteriorated due to wear deterioration of the abrasive and changes with time, so that it is difficult to mass-produce it stably. On the other hand, if you use it without collecting the abrasive,
The cost of the abrasive has increased, and in this case too, mass production has been difficult.
【0009】さらにその上に、感光性ペースト法でも光
を用いて隔壁102を形成するもので、必ずしも十分な
精度で隔壁102を形成できるものではなかった。プラ
ズマ表示装置用基板105では、背面板101上の電極
104間に正確に精度よく隔壁102を配置することが
強く求められているが、前記いずれの製造方法でも、高
精度で微細なピッチを有する大型のプラズマ表示装置用
基板105を簡単な工程で安価に製造することは困難で
あった。Furthermore, the barrier ribs 102 are formed by using light even by the photosensitive paste method, and the barrier ribs 102 cannot always be formed with sufficient accuracy. In the plasma display device substrate 105, it is strongly demanded that the partition walls 102 be accurately and accurately arranged between the electrodes 104 on the back plate 101, but in any of the above manufacturing methods, the partition walls 102 have high precision and a fine pitch. It has been difficult to inexpensively manufacture the large-sized plasma display device substrate 105 by a simple process.
【0010】本発明は、前記課題に鑑みてなされたもの
であり、その目的は、プラズマ表示装置用基板を、1回
の簡単な成形工程で、歩留り良く製造するとともに、変
形のない平滑表面を有する高精度な隔壁を所定高さで得
られ、40インチ以上の大画面化が容易に実現でき、表
示セルのピッチが0.25mm未満の高精細度化が実現
できるプラズマ表示装置用基板およびその製造方法を提
供することにある。The present invention has been made in view of the above problems, and an object thereof is to manufacture a substrate for a plasma display device in a single molding step with a high yield and to obtain a smooth surface without deformation. A substrate for a plasma display device capable of obtaining a highly accurate partition wall having a predetermined height, easily realizing a large screen of 40 inches or more, and achieving a high definition of a display cell pitch of less than 0.25 mm, and a substrate thereof. It is to provide a manufacturing method.
【0011】[0011]
【課題を解決するための手段】本発明は、上記の事情に
鑑み、精密な隔壁を形成するため、粒径が0.2〜10
μmのセラミックス粉体またはガラス粉体と、ポリビニ
ールアルコール、ボリビニールブチラール、アクリル樹
脂、スチレン樹脂、ウレタン樹脂の少なくとも一種のバ
インダーとの混合物を、セラミックスまたはガラスから
なる背面板に塗布し、複数の円周溝を刻設したロールの
表面で塗布面を加圧しながら回転させて背面板に隔壁を
形成することにより、40インチ以上の画面で隔壁間の
セルのピッチを0.25mm未満としたプラズマ表示装
置用基板の製造方法とした。In view of the above-mentioned circumstances, the present invention forms a precise partition wall, so that the grain size is 0.2-10.
μm ceramic powder or glass powder and polyvinyl chloride
Alcohol, polyvinyl butyral, acrylic
A mixture of at least one binder of grease, styrene resin, and urethane resin is applied to a back plate made of ceramics or glass, and the application surface is applied on the surface of a roll having a plurality of circumferential grooves. By rotating while applying pressure to form partition walls on the back plate , a space between the partition walls of a screen of 40 inches or more can be formed .
A method of manufacturing a substrate for a plasma display device , in which the cell pitch was less than 0.25 mm .
【0012】また、本発明は、基板の隔壁間に電極を確
実に配置するため、セラミックス粉体またはガラス粉体
とバインダーとの混合物を、セラミックスまたはガラス
からなる背面板に塗布し、塗布した混合物の上にさらに
電極ペーストを塗布し、複数の溝を刻設したロールの表
面で塗布面を加圧しながら回転させて背面板に隔壁を形
成し、隔壁間に電極を配置するようにしたプラズマ表示
装置用基板の製造方法とした。Further, according to the present invention, in order to reliably arrange the electrodes between the partition walls of the substrate, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and the applied mixture is applied. Plasma display in which electrode paste is applied on top of the rolls, the rolls are engraved with multiple grooves, and the rolls are rotated while pressurizing the coating surface to form partition walls on the back plate and electrodes are arranged between the partition walls. A method for manufacturing a device substrate is used.
【0013】さらに、本発明は、基板の隔壁先端に黒色
系材料を確実に配置するため、セラミックス粉体または
ガラス粉体とバインダーとの混合物を、セラミックスま
たはガラスからなる背面板に塗布し、塗布した混合物の
上にさらに黒色系材料を塗布し、複数の溝を刻設したロ
ールの表面で塗布面を加圧しながら回転させて背面板に
隔壁を形成し、隔壁先端に黒色系材料を配置するように
したプラズマ表示装置用基板の製造方法とした。Further, according to the present invention, in order to reliably dispose the black material at the tip of the partition wall of the substrate, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass and applied. A black material is further coated on the mixture, and the partition is formed on the back plate by rotating while applying pressure to the coating surface on the surface of the roll having a plurality of grooves engraved, and the black material is arranged at the tip of the partition. The method for producing a substrate for a plasma display device as described above was employed.
【0014】さらにその上に、本発明は、加工後ロール
から隔壁が確実に離型すべく、セラミックス粉体または
ガラス粉体とバインダーとの混合物を、セラミックスま
たはガラスからなる背面板に塗布し、塗布した混合物の
上にさらに離型剤を塗布し、複数の円周溝を刻設したロ
ールの表面で塗布面を加圧しながら回転させて背面板に
隔壁を形成し、隔壁先端に離型剤を配置し、加工後ロー
ルから隔壁が離型するようにしたプラズマ表示装置用基
板の製造方法とした。Furthermore, according to the present invention, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass in order to surely separate the partition from the roll after processing, A mold release agent is further applied on the applied mixture, and the roll is engraved with a plurality of circumferential grooves to rotate while applying the pressure on the coated surface to form a partition wall on the back plate, and a mold release agent at the partition wall tip. Was arranged, and the partition walls were released from the roll after processing, and the plasma display device substrate was manufactured.
【0015】さらに、本発明は、基板の平滑性を向上さ
せるため、セラミックスまたはガラスからなる背面板に
ブチラール樹脂を塗布し、前記ブチラール樹脂上にセラ
ミックス粉体またはガラス粉体とバインダーとの混合物
を塗布し、複数の溝を刻設したロールの表面で塗布面を
加圧しながら回転させて背面板に隔壁を形成し、塗布し
たブチラール樹脂により背面板の平滑性および背面板と
隔壁の密着性を向上するようにしたプラズマ表示装置用
基板の製造方法とした。さらにその上に、本発明は、プ
ラズマ表示装置用基板を、上記のプラズマ表示装置用基
板の製造方法により製作するようにした。Further, according to the present invention, in order to improve the smoothness of the substrate, a butyral resin is applied to a back plate made of ceramics or glass, and a mixture of ceramic powder or glass powder and a binder is applied on the butyral resin. Apply and rotate while applying pressure to the surface of the roll with multiple grooves engraved to form partition walls on the back plate, and apply butyral resin to smooth the back plate and the adhesion between the back plate and the partition walls. The method of manufacturing a substrate for a plasma display device is improved. Furthermore, according to the present invention, a substrate for a plasma display device is manufactured by the above-described method for manufacturing a substrate for a plasma display device.
【0016】また、本発明は、プラズマ表示装置を、上
記のプラズマ表示装置用基板を用い、各隔壁間に形成さ
れたセルの底面に電極を備え、セルの内壁面に蛍光体を
塗布し、電極を備えた正面板で上記隔壁の上端を覆って
なるプラズマ表示装置とした。Further, according to the present invention, a plasma display device is formed between the partition walls using the above-mentioned substrate for plasma display device.
The bottom surface of the cell is equipped with an electrode, and the phosphor is
Apply and cover the top of the partition with a front plate equipped with electrodes
It was a plasma display device .
【0017】[0017]
【発明の実施の形態】以下、本発明の実施形態を添付す
る図面に基づいて、以下詳細に説明する。図1に示すよ
うに、プラズマ表示装置用の基板1は、セラミックスま
たはガラスから成る背面板2の一面にセラミックスまた
はガラスから成る複数の隔壁3を備え、各隔壁3間にセ
ル4が形成される。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. As shown in FIG. 1, a substrate 1 for a plasma display device is provided with a plurality of partition walls 3 made of ceramics or glass on one surface of a back plate 2 made of ceramics or glass, and cells 4 are formed between the partition walls 3. .
【0018】そして、このセル4の底面に電極5を備え
ており、セル4の内壁面6に蛍光体が塗布された後、図
12に示すように電極107を備えた正面板108で隔
壁3の上端を覆い、セル4にガスを封入することでプラ
ズマ表示装置を構成することができる。そして、電極
5、107間で放電することにより、セル4の内壁面6
に塗布した蛍光体を発光させることができる。なお、実
際には、電極5,107は直交するように配置する。ま
た、図示していないが、電極107を一対の電極で構成
した3電極方式とすることもできる。この場合は、一対
の電極107間で維持放電を起こし、背面板2の電極5
で制御する面放電型となる。Then, an electrode 5 is provided on the bottom surface of the cell 4, and after the phosphor is applied to the inner wall surface 6 of the cell 4, the front plate 108 provided with the electrode 107 as shown in FIG. A plasma display device can be constructed by covering the upper end of the cell and enclosing the gas in the cell 4. Then, by discharging between the electrodes 5 and 107, the inner wall surface 6 of the cell 4 is
It is possible to emit light from the phosphor coated on. In practice, the electrodes 5 and 107 are arranged so as to be orthogonal to each other. Further, although not shown, the electrode 107 may be of a three-electrode type composed of a pair of electrodes. In this case, a sustain discharge is generated between the pair of electrodes 107, and the electrodes 5 on the back plate 2
It becomes a surface discharge type controlled by.
【0019】次に、上記基板1の製造方法を説明する。
まず、図2に全体の概要を示す。図3に示すセラミック
スまたはガラスからなる背面板2の一面に所定間隔でス
クリーン印刷で電極5を形成する。図4に示すように、
電極5を有する背面板2上にセラミックスまたはガラス
の粉体とバインダーとの混合物のペースト11を塗布す
る。Next, a method of manufacturing the substrate 1 will be described.
First, FIG. 2 shows an overview of the whole. The electrodes 5 are formed on one surface of the back plate 2 made of ceramics or glass shown in FIG. 3 by screen printing at predetermined intervals. As shown in FIG.
A paste 11 of a mixture of ceramic or glass powder and a binder is applied on the back plate 2 having the electrodes 5.
【0020】次に、図5に示すように、乾燥後、隔壁3
に対応する所定の間隔で所定の幅、深さの円周溝12を
有するロール13の表面を前記ペースト11の塗布面に
当接させ加圧しながら回転させて背面板2に隔壁3を形
成する。即ち、ロール13を当接させ加圧することによ
って、ペースト11がロール13の円周溝12に入り込
んで押し固められ、隔壁3が形成されるのである。Next, as shown in FIG. 5, after the drying, the partition wall 3
The partition wall 3 is formed on the back plate 2 by bringing the surface of the roll 13 having the circumferential groove 12 having a predetermined width and depth corresponding to the above into contact with the application surface of the paste 11 and rotating while applying pressure. . That is, when the roll 13 is brought into contact with and pressed, the paste 11 enters the circumferential groove 12 of the roll 13 and is pressed and solidified to form the partition wall 3.
【0021】ロール13の加圧力は、例えばロール13
の軸方向のペースト11との接触長さ1cm当たり7k
g程度で、接触長さ100cmで700kgとなる。そ
の後、熱処理などにより隔壁3を硬化させれば、基板1
を得ることができる。このように、本発明によれば、ロ
ール13を当接して加圧しながら回転するだけで良いた
め、予めロール13を高精度に作製しておけば、容易に
高精度の隔壁3を形成することができ、寸法の大きい基
板1でも容易に製造できる。The pressure applied to the roll 13 is, for example, the roll 13
Contact length with the paste 11 in the axial direction of 7k per 1cm
When the contact length is 100 cm, the weight becomes 700 kg. After that, if the partition walls 3 are cured by heat treatment or the like, the substrate 1
Can be obtained. As described above, according to the present invention, since it suffices to rotate the roll 13 while contacting and pressing the roll 13, it is possible to easily form the partition wall 3 with high precision by manufacturing the roll 13 with high precision in advance. Therefore, even a large-sized substrate 1 can be easily manufactured.
【0022】なお、上述した本発明の製造方法は、プラ
ズマ表示装置用の基板に限らず、インクジェットプリン
タヘッドや光通信用部材などの様々な部材における精密
隔壁に適用することができる。ここで、隔壁3を成すペ
ースト11のセラミックス粉体としては、アルミナ(A
l2 O3 ) 、ジルコニア (ZrO2 )等の酸化物系セラ
ミックスや、窒化珪素(Si3 N4 )、窒化アルミニウ
ム(AlN)、炭化珪素(SiC)等の非酸化物系セラ
ミックス等、あるいはアパタイト(Ca5 (PO4 )3
(F,Cl,OH))等のいずれをも用いることがで
き、これらのセラミックス粉体には各種焼結助剤を所望
量添加することができる。The above-described manufacturing method of the present invention can be applied not only to a substrate for a plasma display device but also to a precision partition wall in various members such as an ink jet printer head and a member for optical communication. Here, as the ceramic powder of the paste 11 forming the partition walls 3, alumina (A
l 2 O 3 ), zirconia (ZrO 2 ) and other oxide ceramics, silicon nitride (Si 3 N 4 ), aluminum nitride (AlN), silicon carbide (SiC) and other non-oxide ceramics, or apatite (Ca 5 (PO 4 ) 3
Any of (F, Cl, OH)) can be used, and various sintering aids can be added to these ceramic powders in desired amounts.
【0023】上記焼結助剤としては、アルミナ粉末には
シリカ(SiO2 )、カルシア(CaO)、イットリア
(Y2 O3 )およびマグネシア(MgO)等を、ジルコ
ニア粉末にはイットリア(Y2 O3 )やセリウム(C
e)、ジスプロシウム(Dy)、イッテルビウム(Y
b)等の希土類元素の酸化物を、また窒化珪素粉末には
イットリア(Y2 O3 )とアルミナ(Al2 O3 ) 等
を、窒化アルミニウム粉末には周期律表第3a族元素酸
化物(RE2 O3 ) 等を、炭化珪素粉末にはホウ素
(B)とカーボン(C)等を所望量添加することができ
る。[0023] As the sintering aid, the alumina powder silica (SiO 2), calcia (CaO), yttria (Y 2 O 3) and magnesia (MgO) or the like, the zirconia powder yttria (Y 2 O 3 ) and cerium (C
e), dysprosium (Dy), ytterbium (Y
b) and other rare earth element oxides, silicon nitride powders such as yttria (Y 2 O 3 ) and alumina (Al 2 O 3 ), and aluminum nitride powders such as group 3a element oxides of the periodic table ( RE 2 O 3 ), etc., and boron (B), carbon (C), etc. can be added in desired amounts to the silicon carbide powder.
【0024】また、隔壁3をなすガラス粉体としては、
ケイ酸塩を主成分とし、鉛(Pb)、硫黄(S)、セレ
ン(Se)、明礬等の一種以上を含有した各種ガラスを
用いることができる。さらに、隔壁3をガラスで形成し
フィラーとしてセラミックスを添加すれば、強度、光学
特性を向上させることができる。例えば、光反射性を向
上させ、パネルの輝度を向上させる目的からは、アルミ
ナ、ジルコニア、チタニア、酸化亜鉛などの白色のセラ
ミックスを、遮光性を向上させパネルのコントラストを
向上させる目的からは、酸化ニッケル、酸化銅、酸化ク
ロムなどの濃色のセラミックスを目的に応じて適宜添加
する。As the glass powder forming the partition wall 3,
Various glasses containing silicate as a main component and containing one or more of lead (Pb), sulfur (S), selenium (Se), alum and the like can be used. Further, if the partition wall 3 is formed of glass and ceramics is added as a filler, the strength and optical characteristics can be improved. For example, white ceramics such as alumina, zirconia, titania, and zinc oxide are used for the purpose of improving the light reflectivity and the brightness of the panel. Dark-colored ceramics such as nickel, copper oxide, and chromium oxide are appropriately added depending on the purpose.
【0025】尚、これらセラミックスまたはガラス粉体
の粒径は、数十ミクロンからサブミクロンのものが好適
に用いることができ、具体的には0.2〜10μm、好
ましくは0.2〜5μm程度のものが良い。さらに、こ
れらのセラミックスまたはガラスの粉末に添加する有機
性添加物としては、ポリビニールアルコール、ポリビニ
ールブチラール、アクリル樹脂、スチレン樹脂、ウレタ
ン樹脂等が挙げられる。The ceramic or glass powder having a particle size of several tens of microns to submicrons can be suitably used, specifically, 0.2 to 10 μm, preferably about 0.2 to 5 μm. Things are good. Furthermore, examples of organic additives added to these ceramic or glass powders include polyvinyl alcohol, polyvinyl butyral, acrylic resins, styrene resins, urethane resins and the like.
【0026】また、混合物のペースト11中に加えられ
る溶媒は、前記有機性添加物を相溶するものであれば特
に限定するものではなく、例えば、トルエン、キシレ
ン、ベンゼン、フタル酸エステル等の芳香族溶剤や、ヘ
キサノール、オクタノール、デカノール、オキシアルコ
ール等の高級アルコール類、あるいは酢酸エステル、グ
リセライド等エステル類を用いることができる。Further, the solvent added to the paste 11 of the mixture is not particularly limited as long as it is compatible with the organic additives, and examples thereof include aromatic substances such as toluene, xylene, benzene and phthalic acid ester. Group solvents, higher alcohols such as hexanol, octanol, decanol and oxyalcohol, or esters such as acetic acid ester and glyceride can be used.
【0027】とりわけ、前記フタル酸エステル、オキシ
アルコール等は好適に使用でき、さらに、溶媒を緩やか
に揮発させるために、前記溶媒を2種類以上併用するこ
とも可能である。また、前記溶媒の含有量は、成形性の
点からは成形体の保形性を維持するために、セラミック
スまたはガラスの粉体100重量部に対して0.1重量
部以上必要であり、一方セラミックスまたはガラスの粉
体と有機性添加物の混合物の粘性を低くすることが望ま
しいことからは35重量部以下がより望ましく、乾燥時
と焼成時の収縮を考慮すると1〜15重量部であること
が最も望ましい。Above all, the above-mentioned phthalic acid ester, oxyalcohol and the like can be preferably used, and in addition, two or more kinds of the above-mentioned solvents can be used together in order to slowly volatilize the solvent. In addition, the content of the solvent is required to be 0.1 parts by weight or more based on 100 parts by weight of the ceramic or glass powder in order to maintain the shape retention of the formed body from the viewpoint of formability. Since it is desirable to lower the viscosity of the mixture of the ceramic or glass powder and the organic additive, it is more preferably 35 parts by weight or less, and 1 to 15 parts by weight in consideration of shrinkage during drying and firing. Is most desirable.
【0028】なお、本発明におけるロール13の材質は
特に限定されないが、例えば金属や樹脂、あるいはゴム
等が使用でき、必要ならば離型性向上や磨耗防止のため
に、表面被膜等の表面処理を行ってもよい。また、ロー
ル13に形成する溝は円周溝に限らず、ロール13の軸
方向に平行な溝であってもよい。また、上記背面板2
は、未焼成のグリーンシートあるいは焼結体で、材質は
特に限定しないが、例えば各種セラミックグリーンシー
トや各種ガラス基板、磁器基板等で隔壁3の材質と熱膨
張率が近似していることが望ましい。なお、ガラス基板
としては、例えばソーダライムガラスやその歪み点を向
上するために無機フィラーを分散させた物など比較的安
価なガラスを使用できる。The material of the roll 13 in the present invention is not particularly limited. For example, metal, resin, rubber or the like can be used, and if necessary, surface treatment such as surface coating for improving releasability and preventing abrasion. You may go. Further, the groove formed on the roll 13 is not limited to the circumferential groove, and may be a groove parallel to the axial direction of the roll 13. Also, the back plate 2
Is an unfired green sheet or a sintered body, and its material is not particularly limited, but it is desirable that the coefficient of thermal expansion be close to that of the material of the partition wall 3 such as various ceramic green sheets, various glass substrates, and porcelain substrates. . As the glass substrate, relatively inexpensive glass such as soda lime glass or a material in which an inorganic filler is dispersed to improve its strain point can be used.
【0029】また、混合物のペースト11において、セ
ラミックスまたはガラス粉体の分散性向上のために、例
えば、ポリエチレングリコールエーテル、アルキルスル
ホン酸塩、ポリカルボン酸塩、アルキルアンモニウム塩
等の界面活性剤を添加してもよく、その含有量としては
分散性の向上および熱分解性の点から、セラミックスま
たはガラス粉体100重量部に対して0.05〜5重量
部が望ましい。In order to improve the dispersibility of the ceramic or glass powder in the paste 11 of the mixture, for example, a surfactant such as polyethylene glycol ether, alkyl sulfonate, polycarboxylate or alkylammonium salt is added. The content may be 0.05 to 5 parts by weight with respect to 100 parts by weight of the ceramic or glass powder from the viewpoint of improving dispersibility and thermal decomposability.
【0030】さらに、混合物のペースト11中のバイン
ダーには硬化反応促進剤または重合開始剤等と称される
硬化触媒を添加することができる。前記硬化触媒として
は、有機過酸化物やアゾ化合物を使用することができ、
例えば、ケトンパーオキサイド、ジアシルパーオキサイ
ド、パーオキシケタール、パーオキシエステル、ハイド
ロパーオキサイド、パーオキシカーボネート、t−ブチ
ルパーオキシ−2−エチルヘキサノエート、ビス(4−
t−ブチルシクロヘキシル)パーオキシジカーボネー
ト、ジクミルパーオキサイド等の有機過酸化物や、アゾ
ビスイソブチロニトリル等のアゾ化合物が挙げられる。Further, a curing catalyst called a curing reaction accelerator or a polymerization initiator can be added to the binder in the paste 11 of the mixture. As the curing catalyst, it is possible to use an organic peroxide or an azo compound,
For example, ketone peroxide, diacyl peroxide, peroxyketal, peroxyester, hydroperoxide, peroxycarbonate, t-butylperoxy-2-ethylhexanoate, bis (4-
Examples thereof include organic peroxides such as t-butylcyclohexyl) peroxydicarbonate and dicumyl peroxide, and azo compounds such as azobisisobutyronitrile.
【0031】次に、他の実施形態を説明する。図6にお
いては、背面板2の上にセラミックスまたはガラスの粉
体とバインダーとの混合物のペースト11が塗布され、
塗布した混合物のペースト11の上に電極ペースト14
が塗布されている。上述した方法と同様にして円周溝1
2を複数個有するロール13を当接させ加圧しながら回
転させると、図7に示すように、隔壁3が形成され、隔
壁3と隔壁3の間に正確に電極ペースト14が配置され
これを電極5する。隔壁3先端の電極ペースト14が不
要の際は、削除するとよい。Next, another embodiment will be described. In FIG. 6, a paste 11 of a mixture of ceramic or glass powder and a binder is applied on the back plate 2.
Electrode paste 14 on top of paste 11 of the applied mixture
Has been applied. Circumferential groove 1 similar to the method described above
When a roll 13 having a plurality of 2 is abutted and rotated while being pressurized, partition walls 3 are formed, and an electrode paste 14 is accurately placed between the partition walls 3 as shown in FIG. 5. When the electrode paste 14 at the tip of the partition wall 3 is unnecessary, it may be deleted.
【0032】また、前記では電極5を隔壁3と隔壁3の
間に正確に配置する例について述べたが、背面板2と正
面板108の接着性を良好にし、画像のコントラストを
付けるために、隔壁3の先端に黒色系材料を設けようと
する場合には、図8に示すように混合物のペースト11
の上に、さらに黒色系材料15を塗布する。続いて、上
述した方法と同様にして、図9に示すように、複数の円
周溝12を有するロール13を前記黒色系材料15に当
接させながら回転させ、背面板2に隔壁3を形成し、隔
壁3の先端に正確に黒色系材料15を設けることができ
る。なお、上述の黒色系材料としては、例えば黒色ガラ
スを用いる。In the above, an example in which the electrodes 5 are accurately arranged between the partition walls 3 has been described, but in order to improve the adhesiveness between the rear plate 2 and the front plate 108 and to provide image contrast, When a black material is to be provided at the tip of the partition wall 3, as shown in FIG.
A black material 15 is further applied onto the above. Then, as in the method described above, as shown in FIG. 9, a roll 13 having a plurality of circumferential grooves 12 is rotated while abutting against the black material 15 to form the partition wall 3 on the back plate 2. However, the black material 15 can be accurately provided on the tip of the partition wall 3. As the above-mentioned black material, for example, black glass is used.
【0033】さらに、ロール13で成形した後に、隔壁
3を確実に離型させるために、図10に示すように、背
面板2の上面に付着させた混合物のペースト11の上に
離型剤16を塗布しておくとよい。また、セラミックス
またはガラスからなる背面板2の表面は、±10μm程
度の凹凸が存在するが、図11に示すように背面板2の
表面が平坦になるようにブチラール樹脂17を塗布し、
そこに隔壁3を形成することもできる。背面板2の表面
に多少の凹凸が存在してもブチラール樹脂17を塗布す
ることによってロール13をならめかに回転させること
ができ、正確に隔壁3を背面板2に形成できる。Further, in order to surely release the partition wall 3 after molding with the roll 13, as shown in FIG. 10, a release agent 16 is applied on the paste 11 of the mixture adhered to the upper surface of the back plate 2. Should be applied beforehand. Further, the surface of the back plate 2 made of ceramics or glass has irregularities of about ± 10 μm, but the butyral resin 17 is applied so that the surface of the back plate 2 becomes flat as shown in FIG.
The partition 3 can also be formed there. Even if there is some unevenness on the surface of the back plate 2, the butyral resin 17 is applied so that the roll 13 can be smoothly rotated, and the partition wall 3 can be accurately formed on the back plate 2.
【0034】その後、加熱した際、ブチラール樹脂17
が存在しても隔壁3が背面板2に当接するまで移動して
背面板2に当接して接合される。このようにしてなる背
面板2の正面板108との接着は何ら問題なく行われ
る。
「実施例」実施例1
ロール13として、直径50mm、長さ200mmの金
属製ロールに、溝幅50μm、溝深さ200μmの円周
溝を220μmピッチで900本を刻設した。一方、背
面板2として200×250mmのソーダライム製ガラ
ス板を準備した。Then, when heated, butyral resin 17
Even if there exists, the partition wall 3 moves until it comes into contact with the back plate 2 and comes into contact with the back plate 2 and is joined thereto. Bonding of the back plate 2 and the front plate 108 thus formed can be performed without any problem. Example 1 As the roll 13, a metal roll having a diameter of 50 mm and a length of 200 mm was engraved with 900 circumferential grooves having a groove width of 50 μm and a groove depth of 200 μm at a pitch of 220 μm. On the other hand, a glass plate made of soda lime having a size of 200 × 250 mm was prepared as the back plate 2.
【0035】ペースト11として、アルミナとチタニア
を添加した低融点鉛ガラス粉末を、バインダーと混練し
ペースト化してガラス板上にドクターブレード手法で塗
布した。ロールを塗膜上から7kg/cmの圧力で加圧
し、ロールを回転させると共にガラス板を送り、隔壁を
形成した。得られた成形体を550〜600℃で焼成し
た。As the paste 11, low melting point lead glass powder to which alumina and titania were added was kneaded with a binder to form a paste, which was applied onto a glass plate by a doctor blade method. The roll was pressed from above the coating film at a pressure of 7 kg / cm, the roll was rotated, and the glass plate was sent to form partition walls. The obtained molded body was fired at 550 to 600 ° C.
【0036】以上の操作により、幅40μm、高さ15
0μmの隔壁を持つ、プラズマ表示装置用基板が得られ
た。実施例2
実施例1と同様に、円周溝を持ったロールと、ペースト
を塗布したガラス板を準備した。ペースト塗膜表面に、
電極ペースト14としてAgを主成分とする導電ペース
トを塗布し、80℃で乾燥させた。ロールを7kg/c
mで加圧し、回転させ、ガラス板上に隔壁を形成した。By the above operation, width 40 μm, height 15
A substrate for a plasma display device having a partition wall of 0 μm was obtained. Example 2 Similar to Example 1, a roll having a circumferential groove and a glass plate coated with paste were prepared. On the paste coating surface,
A conductive paste containing Ag as a main component was applied as the electrode paste 14 and dried at 80 ° C. Roll 7kg / c
It was pressurized with m and rotated to form a partition wall on the glass plate.
【0037】得られた成形体は550〜600℃で焼成
した。以上の操作により、幅40μm、高さ150μm
の隔壁を持つ、プラズマ表示装置用基板が得られた。こ
の時、隔壁間は導電ペーストで埋められ、電極として機
能した。実施例3
実施例1と同様に、円周溝を持ったロールを準備した。
ペーストとしては、チタニアを添加した白色ペーストと
黒色系材料15として酸化ニッケルを添加した黒色ペー
ストを準備した。The obtained molded body was fired at 550 to 600 ° C. By the above operation, width 40μm, height 150μm
Thus, a substrate for a plasma display device having the partition walls was obtained. At this time, the space between the partition walls was filled with a conductive paste and functioned as an electrode. Example 3 Similar to Example 1, a roll having a circumferential groove was prepared.
As the paste, a white paste containing titania and a black paste containing nickel oxide as the black material 15 were prepared.
【0038】白色ペーストをガラス板材上に塗布し、乾
燥後、黒色ペーストを重ねて塗布した。7kg/cmの
圧力でロールを用いて隔壁を形成した。得られた成形体
を550〜600℃で焼成することで、隔壁先端が黒色
であるプラズマ表示装置用基板が得られた。A white paste was applied on a glass plate material, dried, and then a black paste was overlaid and applied. A partition was formed using a roll at a pressure of 7 kg / cm. By firing the obtained molded body at 550 to 600 ° C., a substrate for a plasma display device having a black partition wall tip was obtained.
【0039】実施例4
ガラス板材表面に揮発性溶媒で溶液状としたブチラール
樹脂を塗布し、乾燥させた。実施例1と同じ手法で隔壁
を形成したところ、ガラス板材の厚みバラツキに起因す
る隔壁高さのバラツキが、±10μmであったものが、
本実施例では、±3μmとなった。 Example 4 Butyral resin in the form of a solution with a volatile solvent was applied to the surface of a glass plate and dried. When the partition wall was formed by the same method as in Example 1, the variation in the partition wall height due to the variation in the thickness of the glass plate material was ± 10 μm.
In this example, it was ± 3 μm.
【0040】[0040]
【発明の効果】本発明は、上述のように、粒径が0.2
〜10μmのセラミックス粉体またはガラス粉体と、ポ
リビニールアルコール、ボリビニールブチラール、アク
リル樹脂、スチレン樹脂、ウレタン樹脂の少なくとも一
種のバインダーとの混合物を、セラミックスまたはガラ
スからなる背面板に塗布し、複数の円周溝を刻設したロ
ールの表面で塗布面を加圧しながら回転させて背面板に
隔壁を形成することにより、40インチ以上の画面で隔
壁間のセルのピッチを0.25mm未満としたプラズマ
表示装置用基板の製造方法であるので、精密な隔壁の製
造方法を安価で確実に提供できる。As described above, the present invention has a particle size of 0.2.
Ceramic powder or glass powder of 10 μm and po
Livinyl alcohol, Polyvinyl butyral, Ac
At least one of rill resin, styrene resin, urethane resin
A mixture of species of the binder, was applied to the back plate made of ceramic or glass, by forming the partition walls on the back plate is rotated while pressing the coated surface on the surface of a plurality of rolls engraved circumferential groove , 40 inch screen or more
Since this is a method of manufacturing a substrate for a plasma display device in which the cell pitch between walls is less than 0.25 mm , a precise method of manufacturing partition walls can be provided inexpensively and reliably.
【0041】また、本発明は、セラミックス粉体または
ガラス粉体とバインダーとの混合物を、セラミックスま
たはガラスからなる背面板に塗布し、塗布した混合物の
上にさらに電極ペーストを塗布し、複数の溝を刻設した
ロールの表面で塗布面を加圧しながら回転させて背面板
に隔壁を形成し、隔壁間に電極を配置するようにしたプ
ラズマ表示装置用基板の製造方法であるので、基板の隔
壁間に電極を確実に配置できる。In the present invention, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and an electrode paste is further applied onto the applied mixture to form a plurality of grooves. It is a method of manufacturing a substrate for a plasma display device in which partition walls are formed on the back plate by rotating while applying pressure on the surface of the roll engraved with the coating surface. The electrodes can be reliably arranged in between.
【0042】さらに、本発明は、セラミックス粉体また
はガラス粉体とバインダーとの混合物を、セラミックス
またはガラスからなる背面板に塗布し、塗布した混合物
の上にさらに黒色系材料を塗布し、複数の溝を刻設した
ロールの表面で塗布面を加圧しながら回転させて背面板
に隔壁を形成し、隔壁先端に黒色系材料を配置するよう
にしたプラズマ表示装置用基板の製造方法であるので、
基板の隔壁先端に黒色系材料を確実に配置できる。Further, according to the present invention, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and a black material is further applied onto the applied mixture to form a plurality of materials. Since it is a manufacturing method of a substrate for a plasma display device in which a partition is formed on the back plate by rotating while applying a pressure on the surface of the roll in which grooves are engraved, and a black material is arranged at the tip of the partition,
The black material can be reliably placed on the tip of the partition wall of the substrate.
【0043】さらにその上に、本発明は、セラミックス
粉体またはガラス粉体とバインダーとの混合物を、セラ
ミックスまたはガラスからなる背面板に塗布し、塗布し
た混合物の上にさらに離型剤を塗布し、複数の円周溝を
刻設したロールの表面で塗布面を加圧しながら回転させ
て背面板に隔壁を形成し、隔壁先端に離型剤を配置し、
加工後ロールから隔壁が離型するようにしたプラズマ表
示装置用基板の製造方法であるので、加工後ロールから
隔壁が確実に離型できる。Furthermore, in the present invention, a mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and a release agent is further applied onto the applied mixture. , The surface of the roll having a plurality of circumferential grooves engraved is rotated while pressing the coating surface to form a partition wall on the back plate, and a mold release agent is arranged at the tip of the partition wall.
Since this is a method of manufacturing a substrate for a plasma display device in which the partition wall is released from the processed roll, the partition wall can be reliably released from the processed roll.
【0044】また、本発明は、セラミックスまたはガラ
スからなる背面板にブチラール樹脂を塗布し、前記ブチ
ラール樹脂上にセラミックス粉体またはガラス粉体とバ
インダーとの混合物を塗布し、複数の溝を刻設したロー
ルの表面で塗布面を加圧しながら回転させて背面板に隔
壁を形成し、塗布したブチラール樹脂により背面板の平
滑性および背面板と隔壁の密着性を向上するようにした
プラズマ表示装置用基板の製造方法であるので、基板の
平滑性を向上させることができる。さらに本発明は、上
記のプラズマ表示装置用基板の製造方法により製作する
ので、緻密でかつ安価なプラズマ表示装置用基板を提供
できる。In the present invention, a butyral resin is applied to a back plate made of ceramics or glass, a mixture of ceramic powder or glass powder and a binder is applied on the butyral resin, and a plurality of grooves are formed. For plasma display device in which partition walls are formed on the back plate by rotating the coated surface while applying pressure to the back plate, and the smoothness of the back plate and the adhesion between the back plate and the partition walls are improved by the coated butyral resin. Since it is a method of manufacturing a substrate, the smoothness of the substrate can be improved. Further, since the present invention is manufactured by the above method for manufacturing a plasma display device substrate, a dense and inexpensive plasma display device substrate can be provided.
【0045】また、本発明は、上記のプラズマ表示装置
用基板を用い、各隔壁間に形成されたセルの底面に電極
を備え、セルの内壁面に蛍光体を塗布し、電極を備えた
正面板で上記隔壁の上端を覆ってなるプラズマ表示装置
とした。The present invention also provides the above plasma display device.
Electrodes on the bottom surface of the cell formed between the partitions
Equipped with a phosphor on the inner wall surface of the cell and equipped with an electrode
Plasma display device in which a front plate covers the upper end of the partition wall
And
【図1】本発明に係るプラズマ表示装置用基板の斜視図
である。FIG. 1 is a perspective view of a substrate for a plasma display device according to the present invention.
【図2】本発明の製造方法の概略を示す斜視図である。FIG. 2 is a perspective view showing an outline of a manufacturing method of the present invention.
【図3】本発明に係る背面板の一面に電極を印刷による
付着させた状態の縦断面図である。FIG. 3 is a vertical cross-sectional view showing a state in which electrodes are attached to one surface of a back plate according to the present invention by printing.
【図4】背面板に混合物のペーストを付着した状態の縦
断面図である。FIG. 4 is a vertical cross-sectional view showing a state in which the paste of the mixture is attached to the back plate.
【図5】ロールにより背面板に隔壁を形成した状態の縦
断面図である。FIG. 5 is a vertical cross-sectional view showing a state where a partition wall is formed on a back plate by a roll.
【図6】電極ペーストを塗布した状態の背面板の縦断面
図である。FIG. 6 is a vertical cross-sectional view of a back plate with an electrode paste applied.
【図7】図6で示した状態の表面をロールにより背面板
に隔壁を形成した状態の縦断面図である。FIG. 7 is a vertical cross-sectional view of a state in which a partition wall is formed on the back plate by a roll on the surface in the state shown in FIG.
【図8】背面板に黒色系材料を塗布した状態の縦断面図
である。FIG. 8 is a vertical cross-sectional view showing a state where a black material is applied to the back plate.
【図9】図8で示した状態の表面をロールにより背面板
に隔壁を形成した状態を示す縦断面図である。9 is a vertical cross-sectional view showing a state in which partition walls are formed on the back plate by rolls on the surface in the state shown in FIG.
【図10】背面板に離型剤を付着した状態の縦断面図で
ある。FIG. 10 is a vertical cross-sectional view showing a state where a release agent is attached to the back plate.
【図11】凹凸のある背面板の表面にブチラール樹脂を
塗布し平滑面とした状態を示す縦断面図である。FIG. 11 is a vertical cross-sectional view showing a state in which a butyral resin is applied to the surface of an uneven back plate to form a smooth surface.
【図12】従来のプラズマ表示装置の概要を示す縦断面
図である。FIG. 12 is a vertical cross-sectional view showing an outline of a conventional plasma display device.
1…基板 2…背面板 3…隔壁 4…セル 5…電極 6…内壁面 11…混合物のペースト 12…円周溝 13…ロール 14…電極ペースト 15…黒色系材料 16…離型剤 17…ブチラール樹脂 1 ... Substrate 2 ... Back plate 3 ... Partition 4 ... cell 5 ... Electrode 6 ... Inner wall 11 ... Mix paste 12 ... Circumferential groove 13 ... roll 14 ... Electrode paste 15 ... Black material 16 ... Release agent 17 ... Butyral resin
───────────────────────────────────────────────────── フロントページの続き (72)発明者 米山 健一 鹿児島県国分市山下町1−4 京セラ株 式会社 総合研究所内 (72)発明者 西岡 尉彦 鹿児島県国分市山下町1−4 京セラ株 式会社 総合研究所内 (56)参考文献 特開 平10−199401(JP,A) 特開 平10−188793(JP,A) 特開 平9−283017(JP,A) 特開 平9−69335(JP,A) 特開 平9−12336(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01J 9/02 H01J 11/02 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kenichi Yoneyama 1-4 Yamashita-cho, Kokubun-shi, Kagoshima Kyocera Co., Ltd. Research Institute (72) Inventor, Masahiko Nishioka 1-4 Yamashita-cho, Kokubun-shi, Kagoshima Kyocera stock-type Company Research Institute (56) Reference JP-A-10-199401 (JP, A) JP-A-10-188793 (JP, A) JP-A-9-283017 (JP, A) JP-A-9-69335 (JP , A) JP-A-9-12336 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) H01J 9/02 H01J 11/02
Claims (3)
インダーとの混合物を、セラミックスまたはガラスから
なる背面板に塗布し、塗布した混合物の上にさらに電極
ペーストを塗布し、複数の溝を刻設したロールの表面で
塗布面を加圧しながら回転させて背面板に隔壁を形成
し、隔壁間に電極を配置するようにしたプラズマ表示装
置用基板の製造方法。1. A mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and an electrode paste is further applied on the applied mixture to form a plurality of grooves. A method of manufacturing a substrate for a plasma display device, wherein a partition surface is formed on a back plate by rotating a roll surface while applying pressure to the coating surface, and electrodes are arranged between the partition walls.
インダーとの混合物を、セラミックスまたはガラスから
なる背面板に塗布し、塗布した混合物の上にさらに黒色
系材料を塗布し、複数の溝を刻設したロールの表面で塗
布面を加圧しながら回転させて背面板に隔壁を形成し、
隔壁先端に黒色系材料を配置するようにしたプラズマ表
示装置用基板の製造方法。2. A mixture of ceramic powder or glass powder and a binder is applied to a back plate made of ceramics or glass, and a black material is further applied on the applied mixture to form a plurality of grooves. Form the partition on the back plate by rotating while applying pressure to the coated surface on the surface of the roll,
A method for manufacturing a substrate for a plasma display device, in which a black material is arranged at the tip of a partition.
板にブチラール樹脂を塗布し、前記ブチラール樹脂上に
セラミックス粉体またはガラス粉体とバインダーとの混
合物を塗布し、複数の溝を刻設したロールの表面で塗布
面を加圧しながら回転させて背面板に隔壁を形成し、塗
布したブチラール樹脂により背面板の平滑性および背面
板と隔壁の密着性を向上するようにしたプラズマ表示装
置用基板の製造方法。3. A surface of a roll in which a butyral resin is applied to a back plate made of ceramics or glass, a mixture of ceramic powder or glass powder and a binder is applied to the butyral resin, and a plurality of grooves are engraved. A method for manufacturing a substrate for a plasma display device in which a partition wall is formed by rotating the coating surface while applying pressure with a back plate, and the smoothness of the back plate and the adhesion between the back plate and the partition wall are improved by the applied butyral resin. .
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11169297A JP3524321B2 (en) | 1997-04-30 | 1997-04-30 | Method for manufacturing plate-like body having precision partition, plate-like body having precision partition, method for manufacturing substrate for plasma display device, and substrate for plasma display device |
KR10-1998-0015472A KR100499683B1 (en) | 1997-04-30 | 1998-04-30 | Method for manufacturing flat plate with precise bulkhead, flat plate with precise bulkhead, method for manufacturing plasma display unit substrate and plasma unit substrate |
EP98107984A EP0875915B1 (en) | 1997-04-30 | 1998-04-30 | Method for manufacturing plasma display unit substrate |
DE69826359T DE69826359T2 (en) | 1997-04-30 | 1998-04-30 | Manufacturing process of a substrate for a plasma display unit |
US09/070,210 US6149482A (en) | 1997-04-30 | 1998-04-30 | Method for manufacturing flat plate with precise bulkhead, flat plate with precise bulkhead, method for manufacturing plasma display unit substrate and plasma display unit substrate |
TW087106576A TW398017B (en) | 1997-04-30 | 1998-06-29 | Method for manufacturing flat plate with precise bulkhead, flat plate with precise bulkhead, method for manufacturing plasma display unit substrate and plasma display unit substrate and plasma display unit substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11169297A JP3524321B2 (en) | 1997-04-30 | 1997-04-30 | Method for manufacturing plate-like body having precision partition, plate-like body having precision partition, method for manufacturing substrate for plasma display device, and substrate for plasma display device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10302614A JPH10302614A (en) | 1998-11-13 |
JP3524321B2 true JP3524321B2 (en) | 2004-05-10 |
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JP11169297A Expired - Fee Related JP3524321B2 (en) | 1997-04-30 | 1997-04-30 | Method for manufacturing plate-like body having precision partition, plate-like body having precision partition, method for manufacturing substrate for plasma display device, and substrate for plasma display device |
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KR100578885B1 (en) | 2004-05-28 | 2006-05-11 | 삼성에스디아이 주식회사 | Manufacturing Method Of Plasma Display Panel |
KR100808178B1 (en) | 2005-07-18 | 2008-02-29 | 엘지전자 주식회사 | Lamination apparatus, upper substrate of plasma display panel manufactured using the same, and method for forming the same |
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1997
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JPH10302614A (en) | 1998-11-13 |
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