JP3482657B2 - Circuit board and method of manufacturing the same - Google Patents
Circuit board and method of manufacturing the sameInfo
- Publication number
- JP3482657B2 JP3482657B2 JP17646093A JP17646093A JP3482657B2 JP 3482657 B2 JP3482657 B2 JP 3482657B2 JP 17646093 A JP17646093 A JP 17646093A JP 17646093 A JP17646093 A JP 17646093A JP 3482657 B2 JP3482657 B2 JP 3482657B2
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- pattern
- film
- thermoplastic resin
- circuit board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4053—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
- H05K3/4069—Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4038—Through-connections; Vertical interconnect access [VIA] connections
- H05K3/4084—Through-connections; Vertical interconnect access [VIA] connections by deforming at least one of the conductive layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体LSI、チップ部
品などを搭載し、かつそれらを相互配線する回路基板、
及びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a circuit board on which a semiconductor LSI, chip parts, etc. are mounted and which are interconnected.
And a manufacturing method thereof.
【0002】[0002]
【従来の技術】電子機器の小型化、多様化に伴い、高密
度配線、高密度実装が可能な基板として多層基板が広く
利用されるようになってきた。さらに今後は半導体ベア
チップや狭ピッチ半導体ICの実装基板として需要は高
まると予想され、微細な配線が容易で、信頼性の高い多
層基板の製造方法が必要になると考えられる。また可と
う性やコネクターケーブルを兼ねるということからフレ
キシブル回路基板についても注目が集まっている。従来
のフレキシブル多層回路基板の例を図8にあげる。製造
の仕方を次に述べる。まずポリイミド等のフィルム1に
銅メッキまたは銅箔を両面につける。次にフォトリソ法
・エッチングなどによりパターン2を形成する。これを
必要な分繰り返す。次にパターンのあるポリイミドフィ
ルムと接着剤3付きのパターンのないポリイミドフィル
ムを交互に積層する。接着剤の硬化後、スルーホール穴
4をあける。スルーホール穴に銅メッキを施し、表層パ
ターンの形成やオーバーコートあるいはカバーレイ等の
形成をもって多層基板ができあがる。2. Description of the Related Art With the miniaturization and diversification of electronic equipment, multilayer boards have come to be widely used as boards capable of high-density wiring and high-density mounting. Furthermore, it is expected that demand will increase in the future as a mounting substrate for semiconductor bare chips and narrow-pitch semiconductor ICs, and it is considered necessary to provide a method for manufacturing a multilayer substrate that facilitates fine wiring and has high reliability. Attention is also being paid to flexible circuit boards because they also serve as flexibility and connector cables. An example of a conventional flexible multilayer circuit board is shown in FIG. The manufacturing method will be described below. First, a film 1 made of polyimide or the like is provided with copper plating or copper foil on both sides. Next, a pattern 2 is formed by photolithography, etching, or the like. Repeat this as needed. Next, the patterned polyimide film and the unpatterned polyimide film with the adhesive 3 are alternately laminated. After the adhesive is hardened, the through hole 4 is opened. Copper plating is applied to the through-hole holes, and a multilayer substrate is completed by forming a surface layer pattern, an overcoat, a coverlay, or the like.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、メッキ
をすることは工程数が増えるとともに設備の費用や環境
対策などに費用がかかり製品のコストを上げるもとにな
る。またフィルムとフィルムの接着に接着剤等を使用す
るのでスルーホールメッキの接続不良などがでやすく歩
留まりを悪くしている。また導体のパターンを形成する
時、ドライフィルム等を使用してレジストパターンを出
すことや導体パターンをエッチングすることは工程数が
多い。したがって、より簡便な方法でパターンを形成す
る方法が望まれている。However, plating increases the number of steps and costs for equipment and environmental measures, resulting in an increase in product cost. In addition, since an adhesive or the like is used to bond the films to each other, poor connection of through-hole plating is likely to occur, resulting in poor yield. Further, when forming a conductor pattern, there are many steps in forming a resist pattern using a dry film or the like and etching the conductor pattern. Therefore, a method of forming a pattern by a simpler method is desired.
【0004】[0004]
【課題を解決するための手段】上記課題を解決するた
め、熱可塑性樹脂フィルムの両面に導体を所定の厚さに
形成する導体形成工程と、次にその導体の片方の面に所
定のパターンを形成するパターン形成工程と、次にもう
一方の面には、ビアホールのランドを形成するランド形
成工程と、ビアホールランドのある箇所の上下より導体
を所定の温度に加熱して樹脂を溶かし、両面の導体を接
続させてビアホールを形成するビアホール形成工程と、
ビアホールの箇所に充填材を埋める工程と、前記パター
ン形成済みのフィルムと別のパターン形成済みフィルム
を所定層数積層して積層体を形成する積層工程と、前記
積層体を加熱加圧することにより個々の前記フィルム間
と個々の前記充填材間を接着し、同時に、前記充填材に
より層間を導体接続する加熱加圧工程とからなる回路基
板の製造方法において、前記導体形成工程と前記パター
ン形成工程とが、ポリイミドフィルムの片面に導体を所
定の厚さに蒸着後所定のパターンに形成する工程と、次
に前記熱可塑性樹脂フィルムを下にして前記ポリイミド
フィルムの導体パターンのある面が前記熱可塑性樹脂フ
ィルムと接触するように積み重ね、前記ポリイミドフィ
ルムの上より所定の温度に加熱して、熱可塑性樹脂フィ
ルムの上に導体パターンを転写する転写工程とからなる
回路基板の製造方法を用いる。また、熱可塑性樹脂フィ
ルムの両面に導体を所定の厚さに形成する導体形成工程
と、次にその導体の片方の面に所定のパターンを形成す
るパターン形成工程と、次にもう一方の面には、ビアホ
ールのランドを形成するランド形成工程と、ビアホール
ランドのある箇所の上下より導体を所定の温度に加熱し
て樹脂を溶かし、両面の導体を接続させてビアホールを
形成するビアホール形成工程と、次に金属電極をビアホ
ール部分に上下より接触させて所定の電流を流し、導体
接続部分を溶接する溶接工程と、ビアホールの箇所に充
填材を埋める埋め込み工程と、前記パターン形成済みの
フィルムと別のパターン形成済みのフィルムを所定層数
積層して積層体を形成する積層工程と、前記積層体を加
熱加圧することにより前記積層体を構成する個々の隣接
フィルム間を前記充填材を介して相互に接合する加熱加
圧工程とからなる回路基板の製造方法において、前記導
体形成工程と前記パターン形成工程とが、ポリイミドフ
ィルムの片面に導体を所定の厚さに蒸着後所定のパター
ンに形成する工程と、次に前記熱可塑性樹脂フィルムを
下にして前記ポリイミドフィルムの導体パターンのある
面が前記熱可塑性樹脂フィルムと接触するように積み重
ね、前記ポリイミドフィルムの上より所定の温度に加熱
して、熱可塑性樹脂フィルムの上に導体パターンを転写
する転写工程とからなる回路基板の製造方法を用いるこ
ともできる。さらに、前記充填材を導電ペーストとした
回路基板の製造方法を用いてもよい。 In order to solve the above-mentioned problems , conductors having a predetermined thickness are formed on both surfaces of a thermoplastic resin film.
Conductor formation process to be formed, and then place on one side of the conductor
The pattern formation process of forming a fixed pattern, and then another
One side has a land shape that forms a land for a via hole.
Conducting process and conductor from above and below where there is a via hole land
To a prescribed temperature to melt the resin and connect the conductors on both sides.
A via hole forming step of continuously forming a via hole,
The step of filling the filling material in the place of the via hole, and the pattern
Patterned film and another patterned film
Laminating step of laminating a predetermined number of layers to form a laminated body,
Between the individual films by heating and pressing the laminate
And between the individual fillers and at the same time
Circuit board consisting of heating and pressurizing process for connecting conductors between layers
In the method for manufacturing a plate, the conductor forming step and the pattern
The process of forming the conductor places the conductor on one side of the polyimide film.
After the step of forming a predetermined pattern after vapor deposition to a constant thickness,
With the thermoplastic resin film underneath the polyimide
The surface of the film with the conductor pattern is the thermoplastic resin film.
The polyimide film is stacked so that it is in contact with the film.
From the top of the rum, heat it to the specified temperature and
It consists of a transfer process that transfers the conductor pattern onto the rum.
A circuit board manufacturing method is used. In addition, the thermoplastic resin
Conductor formation process to form conductors with a specified thickness on both sides of the rum
And then form a predetermined pattern on one side of the conductor
Pattern forming process, and then on the other side,
Formation process to form the land of the
Heat the conductor to the specified temperature from above and below the land area.
Melt the resin and connect the conductors on both sides to form the via hole.
A via hole forming process is performed, and then a metal electrode is formed on the via hole.
Contact the upper and lower parts of the
Welding process to weld the connection part and filling the via hole
The embedding step of filling the filling material and the pattern-formed
A certain number of layers with a pattern-formed film different from the film
A laminating step of laminating to form a laminated body, and adding the laminated body.
Individual adjacency forming the laminate by hot pressing
Heat applied to bond the films to each other through the filler.
In the method for manufacturing a circuit board, which comprises a pressure step,
The body forming step and the pattern forming step are performed using a polyimide film.
After depositing a conductor on one side of the film to a specified thickness, apply a specified pattern.
Forming the thermoplastic resin film.
There is a conductor pattern of the polyimide film below
Stack so that the surface is in contact with the thermoplastic film
Hey, heat to the specified temperature from above the polyimide film
Then, transfer the conductor pattern onto the thermoplastic resin film.
The transfer board manufacturing method including
I can do it. Further, the filler is a conductive paste
A circuit board manufacturing method may be used.
【0005】[0005]
【作用】上記構成により、熱可塑性樹脂フィルムの両面
に導体を形成し、導体の上下よりフィルムを加熱する
と、フィルムが液状もしくは液状に近くなり、上下の導
体との接触が容易に行える。さらに、いったん溶けたフ
ィルムが導体を固定するので安定した接触が保たれてビ
アホールを容易に形成することができる。前記のビアホ
ール形成を多層回路基板の製造へ用いると、個々のビア
ホールはブラインドビアになり、熱可塑性樹脂フィル
ム、または熱可塑性樹脂フィルム及び充填材が層と層と
をくっつける接着剤を兼ね、また充填材は層間接続材を
兼ねることもできるので、多層回路基板が容易に実現す
る。第二の手段では、熱可塑性樹脂フィルムの両面に導
体を形成し、導体の上下よりフィルムを加熱すると、フ
ィルムが液状もしくは液状に近くなり、上下の導体との
接触が容易に行える。さらに接続部分に所定の電流を流
すことにより溶接を行うと、物理的な接触による接続が
より安定化した導体接続を行いビアホール形成ができ
る。前記のビアホール形成を多層基板の製造へ用いる
と、個々のビアホールはブラインドビアになり、熱可塑
性樹脂フィルム、または熱可塑性樹脂フィルム及び充填
材が層と層とをくっつける接着剤を兼ね、また充填材は
層間接続材を兼ねることもできるので、多層回路基板が
容易に実現する。With the above structure, when conductors are formed on both surfaces of the thermoplastic resin film and the film is heated from above and below the conductor, the film becomes liquid or close to liquid, and the upper and lower conductors can be easily contacted. Further, since the film once melted fixes the conductor, stable contact is maintained and the via hole can be easily formed. When the above-mentioned via hole formation is used for manufacturing a multilayer circuit board, each via hole becomes a blind via, and the thermoplastic resin film, or the thermoplastic resin film and the filling material also serve as an adhesive for adhering the layers to each other, and also filling. Since the material can also serve as the interlayer connecting material, a multilayer circuit board can be easily realized. In the second means, conductors are formed on both sides of the thermoplastic resin film, and the film is heated from above and below the conductor, so that the film becomes liquid or close to liquid, and the upper and lower conductors can be easily contacted. Further, when welding is performed by applying a predetermined current to the connection portion, the conductor connection can be made more stable by physical contact, and the via hole can be formed. When the above-mentioned via hole formation is used for manufacturing a multilayer substrate, each via hole becomes a blind via, and the thermoplastic resin film, or the thermoplastic resin film and the filler also serve as an adhesive for adhering the layers to each other, and also the filler. Since it can also serve as an interlayer connecting material, a multilayer circuit board can be easily realized.
【0006】[0006]
【実施例】図1は本発明による多層回路基板の断面図で
ある。以下製造法について図1を参照しながら説明す
る。ポリエチレンナフタレートのような熱可塑性樹脂フ
ィルム5に銅箔を熱プレスするか、もしくは蒸着法によ
りニッケル・銅を蒸着して導体6をつけた。ここで本実
施例では熱可塑性樹脂フィルム5としてポリエチレンナ
フタレートを使用したが、他の熱可塑性樹脂フィルムた
とえばポリフェニレンスルフィド、ポリエーテルイミ
ド、ポリエーテルケトンなどでもよい。次にフォトリソ
法、エッチング等によりパターン6を形成する。次に図
2のように両面から熱したこて10をビアホールランド
7のところにあててビア形成を行った。このときこて1
0の温度は、200℃〜250℃であり、加圧力は20
0g〜300gである。またフィルム5の厚みは50μ
mである。次にビアホール9のところはへこんでいる
が、そこへ充填材として導電ペースト8を充填した。ペ
ーストとしては低温硬化型の銀ペーストや銅ペーストを
使用した。他方同様に形成した別パターンのフィルムを
積層する。そして熱プレスする。熱プレスと同時に導電
ペーストも硬化する。以上により本発明の多層回路基板
ができる。以上で充填材としての導電ペーストに、低温
硬化型ペーストを使用したが、半田ペーストでも同様の
結果が得られる。また導電ペースト以外の充填材を使用
してもよい。たとえば金属粉末等である。 1 is a sectional view of a multilayer circuit board according to the present invention. The manufacturing method will be described below with reference to FIG. A copper foil was hot-pressed onto a thermoplastic resin film 5 such as polyethylene naphthalate, or nickel-copper was vapor-deposited by a vapor deposition method to attach the conductor 6. Although polyethylene naphthalate is used as the thermoplastic resin film 5 in this embodiment, other thermoplastic resin films such as polyphenylene sulfide, polyether imide and polyether ketone may be used. Next, the pattern 6 is formed by photolithography, etching, or the like. Next, as shown in FIG. 2, a trowel 10 heated from both sides was applied to the via hole land 7 to form a via. This time trowel 1
The temperature of 0 is 200 ° C to 250 ° C, and the applied pressure is 20
It is 0 g to 300 g. The thickness of the film 5 is 50μ
m. Next, although the via hole 9 was dented, the conductive paste 8 was filled therein as a filling material. As the paste, a low temperature curing type silver paste or a copper paste was used. On the other hand, films of different patterns formed in the same manner are laminated. Then heat press. Heat pressing at the same time as conductive <br/> paste also cured. The multi-layer circuit board of the present invention can be obtained as described above. As described above, the low temperature curing type paste is used as the conductive paste as the filler, but the same result can be obtained with the solder paste. Also, use fillers other than conductive paste
You may. For example, metal powder or the like.
【0007】次に第2の実施例について述べる。Next, a second embodiment will be described.
【0008】第1の実施例において、ビアホール形成を
加熱されたこて10を導体6がついた熱可塑性樹脂フィ
ルム5にあてたが、本実施例においては、図3のように
YAGレーザー光11をビアホールランド7のところに
照射して、導体6を熱し、次に耐熱性の材料、たとえば
金属やエボナイト等でできたこて16を、加圧力200
g〜300gで上下より押しつけるとフィルム5が溶け
ているので導体の接触が行われビアホール9が形成され
る。以後の工程は第1実施例と同様である。In the first embodiment, the trowel 10 heated to form the via hole is applied to the thermoplastic resin film 5 with the conductor 6, but in this embodiment, the YAG laser beam 11 is applied as shown in FIG. The via hole land 7 is irradiated to heat the conductor 6, and then a trowel 16 made of a heat-resistant material such as metal or ebonite is applied with a pressure of 200.
When the film 5 is pressed from above and below with g to 300 g, the film 5 is melted, so that the conductor is brought into contact and the via hole 9 is formed. The subsequent steps are the same as those in the first embodiment.
【0009】次に第3の実施例について述べる。Next, a third embodiment will be described.
【0010】第1の実施例において、ビアホール9を形
成した後、さらに図4のようにビアホールランド7に上
下より金属電流17をあて、導体6の厚みが10〜20
μm、加圧力100g〜300gの範囲で、所定の電流
値を流して溶接を行った。以後の工程は第1の実施例と
同様な方法で多層回路基板を作成した。In the first embodiment, after the via hole 9 is formed, a metal current 17 is applied to the via hole land 7 from above and below as shown in FIG.
Welding was performed by applying a predetermined current value in the range of μm and a pressing force of 100 g to 300 g. Subsequent steps produced a multilayer circuit board by the same method as in the first embodiment.
【0011】次に第4の実施例について述べる。Next, a fourth embodiment will be described.
【0012】第2の実施例において、ビアホール9を形
成した後、されに図4のようにビアホールランド7に上
下より金属電極17をあて、導体6の厚みが10〜20
μm、加圧力100g〜300gの範囲で、所定の電流
値を流して溶接を行った。以後の工程は第1の実施例と
同様な方法で多層回路基板を作成した。In the second embodiment, after forming the via hole 9, the metal electrode 17 is applied to the via hole land 7 from above and below as shown in FIG.
Welding was performed by applying a predetermined current value in the range of μm and a pressing force of 100 g to 300 g. Subsequent steps produced a multilayer circuit board by the same method as in the first embodiment.
【0013】なお、第1の実施例において、導体6のパ
ターンは、フォトリソ法・エッチングなどにより形成し
たが、他の方法により導体6のパターンを形成した例を
図5により説明する。まずポリイミドフィルム19の片
面に、導体6として所定の厚み分、ニッケルおよび銅を
蒸着した。このときメタルマスクを使用して所定のパタ
ーンが形成されるようにした。次にポリエチレンナフタ
レートのような熱可塑性樹脂フィルム5を下に、ポリイ
ミドフィルム19の導体6が形成された面が熱可塑性樹
脂フィルム5にあたるようにして重ねる。次に300℃
〜450℃に加熱したこて20をポリイミドフィルム1
9の導体6の無い面よりあてて、ゆっくり移動させる。
すると熱可塑性樹脂フィルム5の表面が少し溶ける。す
るとこれが接着剤の働きをして、密着の弱いポリイミド
フィルム面から熱可塑性樹脂フィルム面へ導体6が転写
される。回路基板のパターン作成が以上の方法ででき
る。[0013] In the first embodiment, the pattern of the conductor 6 has been formed by a photolithography etching, an example of forming a pattern of conductors 6 by other methods
This will be described with reference to FIG. First, nickel and copper were vapor-deposited as a conductor 6 on one surface of the polyimide film 19 in a predetermined thickness. At this time, a metal mask was used to form a predetermined pattern. Next, the thermoplastic resin film 5 such as polyethylene naphthalate is placed underneath so that the surface of the polyimide film 19 on which the conductor 6 is formed corresponds to the thermoplastic resin film 5. Next 300 ° C
Soldering iron 20 heated to ~ 450 ° C is polyimide film 1
Aim it from the surface of 9 which does not have the conductor 6, and move it slowly.
Then, the surface of the thermoplastic resin film 5 is slightly melted. Then, this acts as an adhesive, and the conductor 6 is transferred from the surface of the polyimide film having weak adhesion to the surface of the thermoplastic resin film. The circuit board pattern can be created by the above method.
【0014】次に導体6の形成について、上記こてによ
る加熱とは異なる方法を図6により説明する。 Next, regarding the formation of the conductor 6, the above-mentioned trowel is used.
A method different from the heating method will be described with reference to FIG.
【0015】ポリイミドフィルム19の片面に、導体6
として所定の厚み分、ニッケル及び銅を蒸着した。この
ときメタルマスクを使用して所定のパターンが形成され
るようにした。次にポリエチレンナフタレートのような
熱可塑性樹脂フィルム5を下に、ポリイミドフィルム1
9の導体6が形成された面が熱可塑性樹脂フィルム5に
あたるようにして重ねる。前述の例において、導体を転
写するとき、加熱されたこて20を使用したが本実施例
では図6のように、ヒーター21内蔵の配線パターンの
形状をした金型22により、金型を300℃〜450℃
の温度に加熱して、一括して導体を転写する。前述の例
よりも、効率的にパターン形成が可能である。On one side of the polyimide film 19, the conductor 6
As a predetermined thickness, nickel and copper were vapor-deposited. At this time, a metal mask was used to form a predetermined pattern. Next, with a thermoplastic resin film 5 such as polyethylene naphthalate underneath, the polyimide film 1
The thermoplastic resin film 5 is overlaid so that the surface of the conductor 9 on which the conductor 6 is formed hits. In the above example , when the conductor is transferred, the heated iron 20 is used, but in the present embodiment, the die is 300 ° C. by the die 22 having the shape of the wiring pattern with the built-in heater 21, as shown in FIG. ~ 450 ° C
It is heated to the temperature of and the conductors are transferred at once. It is possible to form a pattern more efficiently than in the above example .
【0016】導体を転写するとき、加熱されたこてを用
いる前述の例のかわりに図7のように、ポリイミドフィ
ルムの導体の無い面より、レーザー光23を照射して、
ポリイミドフィルムを加熱する。そして熱可塑性樹脂フ
ィルム5が表面が少し溶けたところへ、耐熱性のある材
料からなるこて27で押さえつけ、レーザー光23を照
射する部分を移動させるとともにこて27を移動させて
導体6を転写する。図 5に示す例とともに、導体パター
ン6の形成に加えて部分的なパターン修正にも使用可能
であり、さらにレーザー光を小さい面積で当てることで
微細なパターン形成が可能になる。When transferring conductors , use a heated iron
Instead of the above-mentioned example , as shown in FIG. 7, by irradiating the laser light 23 from the surface of the polyimide film on which the conductor is not formed,
Heat the polyimide film. Then, where the surface of the thermoplastic resin film 5 is slightly melted, it is pressed with a trowel 27 made of a heat-resistant material to move the portion irradiated with the laser light 23 and move the trowel 27 to transfer the conductor 6. To do. In addition to the example shown in FIG. 5, it can be used for partial pattern correction in addition to the formation of the conductor pattern 6, and it becomes possible to form a fine pattern by irradiating a laser beam with a small area.
【0017】[0017]
【発明の効果】以上本発明は、ビアホールを形成するの
にメッキ法を使用せずとも、フィルムを熱で溶融するだ
けで上下の導体との接続が簡単にとれるので、装置、工
程が簡単になる。また多層基板の製造へ用いると、容易
にブラインドビアを含んだ多層基板ができるので、基板
の高密度化が実現する。また熱可塑性樹脂フィルム、ま
たは熱可塑性樹脂フィルム及び充填材が層と層とをくっ
つける接着剤を兼ね、また充填材は層間接続材を兼ねる
こともできるので、層間をつなぐ接着剤を使用しないの
で、従来のようなビア接続の不良を無くすことができ
る。加えてフィルムを熱で溶融し上下の導体との接続を
行ない、さらに接続部分を溶接することにより、接続を
より安定化することができる。多層基板の製造へ用いる
と、より信頼度の高い基板ができる。従来よりも、生産
性が向上し、しかも設備投資も少なくて済むので多層回
路基板の低コスト化、生産効率向上に大いに寄与でき
る。またビアホール形成後さらに溶接を行うことにより
接続抵抗の安定化ができ、ビアホールの信頼性がさらに
向上する。パターン形成のパターン転写については、従
来のパターン転写と異なり、熱可塑性樹脂フィルムが接
着剤の働きをするので接着剤等をいっさい使用せず、ま
た離型材も用いずに直接導体を転写できるので、パター
ン形成の工程が簡単になる。さらに導体パターンの作成
においても、エッチング等のウェットな工程を経なくと
も、完全にドライな雰囲気でパターンが作成できるの
で、環境対策等の費用が必要なく、簡便にパターン形成
ができるので、回路基板及び多層回路基板の低コスト化
・量産性向上に大いに寄与できる。As described above, according to the present invention, even if the plating method is not used for forming the via hole, the connection between the upper and lower conductors can be easily made only by melting the film with heat, so that the device and the process can be simplified. Become. Further, when it is used for manufacturing a multi-layered substrate, a multi-layered substrate including blind vias can be easily formed, so that high density of the substrate can be realized. Further, since the thermoplastic resin film, or the thermoplastic resin film and the filler also serves as an adhesive for sticking the layers to each other, and the filler can also serve as an interlayer connecting material, an adhesive for connecting the layers is not used, It is possible to eliminate the conventional via connection failure. In addition, the film can be melted by heat to be connected to the upper and lower conductors, and the connecting portion can be welded to further stabilize the connection. When used for manufacturing a multi-layer substrate, a substrate with higher reliability can be obtained. Since the productivity is improved and the capital investment is less than ever, it can greatly contribute to the cost reduction and the production efficiency improvement of the multilayer circuit board. Further, by further welding after forming the via hole, the connection resistance can be stabilized, and the reliability of the via hole is further improved. Regarding pattern transfer of pattern formation, unlike conventional pattern transfer, since the thermoplastic resin film acts as an adhesive, it is possible to transfer the conductor directly without using any adhesive, etc. The pattern formation process is simplified. Further, even in the case of forming a conductor pattern, the pattern can be formed in a completely dry atmosphere without a wet process such as etching, so that the pattern can be easily formed without the need for the cost of environmental measures. In addition, it can greatly contribute to cost reduction and mass productivity improvement of the multilayer circuit board.
【図1】本発明の第1の実施例における回路基板の断面
図FIG. 1 is a sectional view of a circuit board according to a first embodiment of the present invention.
【図2】本発明の第1の実施例における回路基板の製造
方法を説明する回路基板の断面図FIG. 2 is a sectional view of a circuit board for explaining a method of manufacturing the circuit board according to the first embodiment of the present invention.
【図3】本発明の第2の実施例における回路基板製造方
法を説明する回路基板の断面図FIG. 3 is a sectional view of a circuit board for explaining a circuit board manufacturing method according to a second embodiment of the present invention.
【図4】本発明の第3の実施例における回路基板の製造
方法を説明する回路基板の断面図FIG. 4 is a sectional view of a circuit board illustrating a method of manufacturing a circuit board according to a third embodiment of the present invention.
【図5】本発明の第5の実施例における回路基板の製造
方法を説明する回路基板の断面図FIG. 5 is a sectional view of a circuit board illustrating a method of manufacturing a circuit board according to a fifth embodiment of the present invention.
【図6】本発明の第6の実施例における回路基板の製造
方法を説明する回路基板の断面図FIG. 6 is a sectional view of a circuit board illustrating a method of manufacturing a circuit board according to a sixth embodiment of the present invention.
【図7】本発明の第7の実施例における回路基板の製造
方法を説明する回路基板の断面図FIG. 7 is a sectional view of a circuit board illustrating a method of manufacturing a circuit board according to a seventh embodiment of the present invention.
【図8】従来例のフレキシブル多層基板の断面図FIG. 8 is a sectional view of a conventional flexible multilayer substrate.
5 熱可塑性樹脂フィルム 6 導体 7 ビアホールランド 8 導電ペースト 9 ビアホール 10 熱したこて 11 YAGレーザー光 16 耐熱材料でできたこて 17 金属電極 19 ポリイミドフィルム 20 熱したこて 21 ヒーター 22 金型 23 レーザー光 27 耐熱材料でできたこて 5 Thermoplastic resin film 6 conductors 7 beer hall land 8 Conductive paste 9 Beer hall 10 heated trowel 11 YAG laser light 16 Trowels made of heat-resistant material 17 Metal electrode 19 Polyimide film 20 heated trowel 21 heater 22 mold 23 Laser light 27 Trowels made of heat-resistant material
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI H05K 3/46 H05K 3/46 N (72)発明者 田崎 学 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (72)発明者 西川 英信 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 昭52−71677(JP,A) 特開 昭63−250192(JP,A) 特開 平4−196290(JP,A) 特開 平1−194385(JP,A) 特開 昭52−8472(JP,A) 特開 平2−36591(JP,A) 特開 昭58−97895(JP,A) 特公 昭55−5822(JP,B1) (58)調査した分野(Int.Cl.7,DB名) H05K 1/11 H05K 3/40 H05K 3/46 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI H05K 3/46 H05K 3/46 N (72) Inventor Manabu Tasaki 1006 Kadoma, Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. ( 72) Inventor Hidenobu Nishikawa 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) Reference JP-A-52-71677 (JP, A) JP-A-63-250192 (JP, A) JP Japanese Unexamined Patent Publication No. 4-196290 (JP, A) Japanese Unexamined Patent Publication No. 1-194385 (JP, A) Japanese Unexamined Patent Publication No. 52-8472 (JP, A) Japanese Unexamined Patent Publication No. 36591 (JP, A) Japanese Unexamined Patent Publication No. 58-97895 (JP , A) JP-B-55-5822 (JP, B1) (58) Fields investigated (Int.Cl. 7 , DB name) H05K 1/11 H05K 3/40 H05K 3/46
Claims (4)
定の厚さに形成する導体形成工程と、次にその導体の片
方の面に所定のパターンを形成するパターン形成工程
と、次にもう一方の面には、ビアホールのランドを形成
するランド形成工程と、ビアホールランドのある箇所の
上下より導体を所定の温度に加熱して樹脂を溶かし、両
面の導体を接続させてビアホールを形成するビアホール
形成工程と、ビアホールの箇所に充填材を埋める工程
と、前記パターン形成済みのフィルムと別のパターン形
成済みフィルムを所定層数積層して積層体を形成する積
層工程と、前記積層体を加熱加圧することにより個々の
前記フィルム間と個々の前記充填材間を接着し、同時
に、前記充填材により層間を導体接続する加熱加圧工程
とからなる回路基板の製造方法において、 前記導体形成工程と前記パターン形成工程とが、ポリイ
ミドフィルムの片面に導体を所定の厚さに蒸着後所定の
パターンに形成する工程と、次に前記熱可塑性樹脂フィ
ルムを下にして前記ポリイミドフィルムの導体パターン
のある面が前記熱可塑性樹脂フィルムと接触するように
積み重ね、前記ポリイミドフィルムの上より所定の温度
に加熱して、熱可塑性樹脂フィルムの上に導体パターン
を転写する転写工程とからなる回路基板の製造方法。 1. A conductor is provided on both sides of a thermoplastic resin film.
Conductor formed to a constant thicknessForming processAnd then a piece of that conductor
Form a predetermined pattern on one sidePattern formation process
And then, the land of the via hole is formed on the other surface.
DoLand formation processAnd a part of the beer hall land
Heat the conductor from above and below to the specified temperature to melt the resin,
Connect vias on surface to form via holesBeer hall
Forming processAnd the step of filling the filling material in the via hole
And a pattern shape different from the film on which the pattern is formed
Laminate a predetermined number of layers to form a laminateproduct
Layer processBy heating and pressing the laminate,Individual
Bond between the films and the individual fillers at the same time
And a heating and pressurizing step of connecting conductors between the layers by the filler.
Method of manufacturing circuit board comprisingAt The conductor forming step and the pattern forming step are
After depositing a conductor to the specified thickness on one side of the mid film,
The step of forming a pattern, and then the thermoplastic resin film
Conductor pattern of the polyimide film with rum down
So that the side with the contact with the thermoplastic resin film
Stacked, above the polyimide film at a predetermined temperature
Heat to a conductor pattern on the thermoplastic resin film
A method of manufacturing a circuit board, which comprises a transfer step of transferring
定の厚さに形成する導体形成工程と、次にその導体の片
方の面に所定のパターンを形成するパターン形成工程
と、次にもう一方の面には、ビアホールのランドを形成
するランド形成工程と、ビアホールランドのある箇所の
上下より導体を所定の温度に加熱して樹脂を溶かし、両
面の導体を接続させてビアホールを形成するビアホール
形成工程と、次に金属電極をビアホール部分に上下より
接触させて所定の電流を流し、導体接続部分を溶接する
溶接工程と、ビアホールの箇所に充填材を埋める埋め込
み工程と、前記パターン形成済みのフィルムと別のパタ
ーン形成済みのフィルムを所定層数積層して積層体を形
成する積層工程と、前記積層体を加熱加圧することによ
り前記積層体を構成する個々の隣接フィルム間を前記充
填材を介して相互に接合する加熱加圧工程とからなる回
路基板の製造方法において、 前記導体形成工程と前記パターン形成工程とが、ポリイ
ミドフィルムの片面に導体を所定の厚さに蒸着後所定の
パターンに形成する工程と、次に前記熱可塑性樹脂フィ
ルムを下にして前記ポリイミドフィルムの導体パターン
のある面が前記熱可塑性樹脂フィルムと接触するように
積み重ね、前記ポリイミドフィルムの上より所定の温度
に加熱して、熱可塑性樹脂フィルムの上に導体パターン
を転写する転写工程とからなる回路基板の製造方法。 2. A conductor is provided on both sides of the thermoplastic resin film.
Form to a fixed thicknessConductor formation processAnd then a piece of that conductor
Form a predetermined pattern on one sidePattern formation process
And then, the land of the via hole is formed on the other surface.
DoLand formation processAnd a part of the beer hall land
Heat the conductor from above and below to the specified temperature to melt the resin,
Connect vias on surface to form via holesBeer hall
Forming processNext, the metal electrode is placed on the via hole from above
Weld the conductor connection parts by bringing them into contact with each other and passing a specified current.
Welding processAnd fill the via hole with filling materialEmbedding
Only processAnd a pattern different from the film on which the pattern is formed.
Form a laminated body by laminating a predetermined number of layers that have already been formed.
CompleteLaminating processAnd heating and pressurizing the laminate.
The space between the individual adjacent films that make up the laminate is
Join each other via fillerHeating and pressing processTimes consisting of
Road board manufacturing methodAt The conductor forming step and the pattern forming step are
After depositing a conductor to the specified thickness on one side of the mid film,
The step of forming a pattern, and then the thermoplastic resin film
Conductor pattern of the polyimide film with rum down
So that the side with the contact with the thermoplastic resin film
Stacked, above the polyimide film at a predetermined temperature
Heat to a conductor pattern on the thermoplastic resin film
A method of manufacturing a circuit board, which comprises a transfer step of transferring
は2記載の回路基板の製造方法 。3. The method for manufacturing a circuit board according to claim 1, wherein the filler is a conductive paste.
製造方法により製造された回路基板。 4. A circuit board manufactured by the method of manufacturing a circuit board according to claim 1, 2, or 3 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17646093A JP3482657B2 (en) | 1993-07-16 | 1993-07-16 | Circuit board and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17646093A JP3482657B2 (en) | 1993-07-16 | 1993-07-16 | Circuit board and method of manufacturing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0738218A JPH0738218A (en) | 1995-02-07 |
JP3482657B2 true JP3482657B2 (en) | 2003-12-22 |
Family
ID=16014089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17646093A Expired - Fee Related JP3482657B2 (en) | 1993-07-16 | 1993-07-16 | Circuit board and method of manufacturing the same |
Country Status (1)
Country | Link |
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JP (1) | JP3482657B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3290041B2 (en) * | 1995-02-17 | 2002-06-10 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Multilayer printed circuit board, method for manufacturing multilayer printed circuit board |
JP2831970B2 (en) * | 1996-04-12 | 1998-12-02 | 山一電機株式会社 | Interlayer connection method for circuit boards |
FI982568A7 (en) * | 1997-12-02 | 1999-06-03 | Samsung Electro Mech | Method for manufacturing a multilayer printed circuit board |
KR100346400B1 (en) * | 1999-12-16 | 2002-08-01 | 엘지전자주식회사 | Multi-layer pcb and the manufacturing method the same |
-
1993
- 1993-07-16 JP JP17646093A patent/JP3482657B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0738218A (en) | 1995-02-07 |
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