JP3318453B2 - Electronic component storage package - Google Patents
Electronic component storage packageInfo
- Publication number
- JP3318453B2 JP3318453B2 JP30757694A JP30757694A JP3318453B2 JP 3318453 B2 JP3318453 B2 JP 3318453B2 JP 30757694 A JP30757694 A JP 30757694A JP 30757694 A JP30757694 A JP 30757694A JP 3318453 B2 JP3318453 B2 JP 3318453B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- frame
- melting point
- insulating
- nickel plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16195—Flat cap [not enclosing an internal cavity]
Landscapes
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は弾性表面波素子や半導体
素子等の電子部品を気密に収容するための電子部品収納
用パッケージに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a package for storing electronic components such as surface acoustic wave devices and semiconductor devices in an airtight manner.
【0002】[0002]
【従来の技術】従来、電子部品、例えば弾性表面波素子
を収容する電子部品収納用パッケージは、通常、酸化ア
ルミニウム質焼結体等の電気絶縁材料から成り、その上
面の略中央部に弾性表面波素子が搭載される搭載部を有
する絶縁基体と、酸化アルミニウム質焼結体等の電気絶
縁材料から成り、前記弾性表面波素子が搭載される搭載
部を囲繞するように絶縁基体上面に取着される絶縁枠体
と、前記絶縁枠体の内側から外側にかけて導出され、弾
性表面波素子を外部電気回路に電気的に接続するための
タングステン、モリブデン、マンガン等の高融点金属粉
末から成る複数個のメタライズ配線層と、鉄−ニッケル
−コバルト合金や鉄−ニッケル合金等の金属材料から成
る蓋体とから構成されており、絶縁基体の弾性表面波素
子搭載部に弾性表面波素子を接着剤を介して接着固定す
るとともに該弾性表面波素子の電極をボンディングワイ
ヤを介してメタライズ配線層に接続し、しかる後、絶縁
枠体上面に金属製蓋体を溶接し、絶縁基体と絶縁枠体と
金属製蓋体とから成る容器内部に弾性表面波素子を気密
に収容することによって最終製品としての弾性表面波装
置となる。2. Description of the Related Art Conventionally, an electronic component housing package for housing an electronic component, for example, a surface acoustic wave element, is usually made of an electrically insulating material such as an aluminum oxide sintered body, and has an elastic surface substantially at the center of its upper surface. An insulating base having a mounting portion on which the wave element is mounted, and an electrically insulating material such as an aluminum oxide sintered body, which is attached to an upper surface of the insulating base so as to surround the mounting portion on which the surface acoustic wave element is mounted. And a plurality of insulating frames derived from the inside to the outside of the insulating frame and made of a high melting point metal powder such as tungsten, molybdenum, or manganese for electrically connecting the surface acoustic wave element to an external electric circuit. And a cover made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy. The wave element is bonded and fixed with an adhesive, and the electrodes of the surface acoustic wave element are connected to the metallized wiring layer via bonding wires. Thereafter, a metal lid is welded to the upper surface of the insulating frame to form an insulating substrate. The surface acoustic wave element is hermetically accommodated inside a container formed of a metal frame, an insulating frame, and a metal lid, thereby providing a surface acoustic wave device as a final product.
【0003】尚、前記従来の電子部品収納用パッケージ
は通常、絶縁枠体の上面に鉄−ニッケル−コバルト合金
や鉄−ニッケル合金等の金属材料から成る金属枠体を予
めロウ付けしておき、該金属枠体の上部に、表面にニッ
ケルメッキ層が被着されている金属製蓋体を載置させる
ととも該金属製蓋体表面のニッケルメッキを溶接時に溶
融させ、溶融ニッケルメッキで金属枠体と金属製蓋体と
を接合させることによって金属製蓋体は絶縁枠体の上面
に取着され、これによって絶縁基体と絶縁枠体と金属製
蓋体とから成る容器が気密に封止される。In the conventional package for storing electronic parts, a metal frame made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy is usually soldered to the upper surface of the insulating frame in advance. A metal lid having a nickel plating layer on the surface is placed on top of the metal frame, and the nickel plating on the surface of the metal lid is melted at the time of welding, and the metal frame is formed by molten nickel plating. By joining the body and the metal lid, the metal lid is attached to the upper surface of the insulating frame, whereby the container consisting of the insulating base, the insulating frame and the metal lid is hermetically sealed. You.
【0004】また前記絶縁枠体への金属枠体のロウ付け
はまず絶縁枠体の上面にタングステンやモリブデン、マ
ンガン等の高融点金属粉末から成るメタライズ金属層を
従来周知のスクリーン印刷法等の厚膜手法を採用するこ
とによって被着形成し、次に前記枠状メタライズ金属層
上に銀ロウ等のロウ材と金属枠体とを順次載置させ、最
後に前記ロウ材に約800 ℃の温度を印加し、ロウ材を加
熱溶融させることによって行われる。[0004] In addition, the metal frame is brazed to the insulating frame by first forming a metallized metal layer made of a high melting point metal powder such as tungsten, molybdenum or manganese on the upper surface of the insulating frame by a known screen printing method or the like. Then, a brazing material such as silver brazing and a metal frame are sequentially placed on the frame-shaped metallized metal layer, and finally a temperature of about 800 ° C. is applied to the brazing material. Is applied and the brazing material is heated and melted.
【0005】更に前記金属製蓋体の表面に被着されてい
るニッケルメッキ層は従来周知の電解メッキ法や無電解
メッキ法を採用することによって金属製蓋体表面に所定
厚みに被着される。[0005] Further, the nickel plating layer applied to the surface of the metal lid is applied to a predetermined thickness on the surface of the metal lid by employing a conventionally known electrolytic plating method or electroless plating method. .
【0006】[0006]
【発明が解決しようとする課題】しかしながら、近時、
電子機器は小型化が急激に進み、これに伴って電子部品
収納用パッケージも小型化が要求され、絶縁枠体の厚み
が薄くなってきたこと、金属製蓋体の表面に被着されて
いるニッケルメッキ層はその溶融温度が1100℃〜1400℃
と高いこと等から溶接により金属製蓋体の表面に被着さ
れているニッケルメッキ層を溶融させ、該溶融するニッ
ケルメッキ層で金属枠体と金属製蓋体とを接合させるこ
とによって絶縁基体と絶縁枠体と金属製蓋体とから成る
容器内部に弾性表面波素子等を気密に収容する場合、金
属製蓋体を金属枠体に溶接させる際の熱ショックによっ
て絶縁枠体にクラックが発生し、その結果、容器内部の
気密封止が破れ、容器内部に収容する弾性表面波素子等
を長期間にわたり正常、且つ安定に作動させることがで
きないという欠点を有していた。However, recently,
As electronic devices have been rapidly reduced in size, electronic component storage packages have also been required to be reduced in size, and the thickness of the insulating frame has been reduced, and the electronic device has been attached to the surface of a metal lid. Nickel plating layer has a melting temperature of 1100 ℃ ~ 1400 ℃
And melting the nickel-plated layer adhered to the surface of the metal lid by welding, and joining the metal frame and the metal lid with the molten nickel-plated layer to form an insulating base. When a surface acoustic wave element or the like is hermetically accommodated inside a container formed of an insulating frame and a metal lid, cracks are generated in the insulating frame due to heat shock when the metal lid is welded to the metal frame. As a result, the hermetic seal inside the container is broken, and the surface acoustic wave element or the like accommodated in the container cannot be normally and stably operated for a long period of time.
【0007】[0007]
【発明の目的】本発明は上記欠点に鑑み案出されたもの
で、その目的は容器内部の気密封止を完全とし、内部に
収容する電子部品を長期間にわたり正常、且つ安定に作
動させることができる電子部品収納用パッケージを提供
することにある。SUMMARY OF THE INVENTION The present invention has been devised in view of the above-mentioned drawbacks, and has as its object to complete the hermetic sealing of the inside of a container and to allow the electronic components housed therein to operate normally and stably for a long period of time. It is an object of the present invention to provide a package for storing electronic components.
【0008】[0008]
【課題を解決するための手段】本発明は上面に電子部品
が搭載される搭載部を有する絶縁基体と、前記電子部品
が搭載される搭載部を囲繞するように前記絶縁基体上面
に取着された絶縁枠体と、前記絶縁枠体の上面に被着さ
れた枠状のメタライズ金属層と、前記枠状のメタライズ
金属層にロウ付けされた金属枠体と、前記金属枠体上面
に溶接される金属製蓋体とから成る電子部品収納用パッ
ケージであって、前記金属製蓋体は、表面に融点が11
00〜1400℃と高いニッケルメッキ層および融点が
950℃以下と低いニッケルメッキ層を順次被着させ
て、該融点が950℃以下と低いニッケルメッキ層のみ
を溶融させて前記金属枠体に接合されることを特徴とす
るものである。According to the present invention, there is provided an insulating substrate having a mounting portion on which an electronic component is mounted on an upper surface, and an insulating substrate mounted on the upper surface of the insulating substrate so as to surround the mounting portion on which the electronic component is mounted. An insulating frame, a frame-shaped metallized metal layer attached to the upper surface of the insulating frame, a metal frame brazed to the frame-shaped metalized metal layer, and welded to the upper surface of the metal frame. An electronic component storage package comprising: a metal lid having a melting point of 11 on the surface.
A nickel plating layer as high as 00 to 1400 ° C. and a nickel plating layer with a melting point as low as 950 ° C. or less are sequentially applied, and only the nickel plating layer with a melting point as low as 950 ° C. or less is melted and joined to the metal frame. It is characterized by that.
【0009】また本発明は前記融点が950℃以下と低
いニッケルメッキ層がその内部にリンを9.0 乃至12.0重
量%含有して成ることを特徴とするものである。Further, the present invention is characterized in that the nickel plating layer having a low melting point of 950 ° C. or less contains 9.0 to 12.0% by weight of phosphorus therein.
【0010】[0010]
【作用】本発明の電子部品収納用パッケージによれば、
金属製蓋体の表面に融点の高いニッケルメッキ層と融点
が950℃以下と低いニッケルメッキ層を順次被着させ
たことから金属枠体と金属製蓋体とを溶接により接合さ
せ、絶縁基体と絶縁枠体と金属製蓋体とから成る容器内
部に弾性表面波素子等の電子部品を気密に収容する際、
絶縁枠体に大きな熱ショックが印加されて絶縁枠体にク
ラックを発生させることは一切なく、その結果、容器内
部の気密封止が完全となり、容器内部に収容する弾性表
面波素子等を長期間にわたり正常、且つ安定に作動させ
ることが可能となる。According to the electronic component storage package of the present invention,
Since a nickel plating layer having a high melting point and a nickel plating layer having a melting point as low as 950 ° C. or less were sequentially applied to the surface of the metal lid, the metal frame and the metal lid were joined by welding, and the insulating base and When housing electronic components such as surface acoustic wave elements in an airtight manner inside a container consisting of an insulating frame and a metal lid
A large thermal shock is not applied to the insulating frame, and no crack is generated in the insulating frame.As a result, the hermetic sealing inside the container is completed, and the surface acoustic wave element or the like housed inside the container can be used for a long time. For normal and stable operation.
【0011】[0011]
【実施例】次に本発明を添付図面に基づき詳細に説明す
る。図1は本発明にかかる電子部品収納用パッケージの
一実施例を示し、1 は絶縁基体、2 は絶縁枠体、3 は金
属製蓋体である。この絶縁基体1 と絶縁枠体2 と金属製
蓋体3 とで弾性表面波素子等の電子部品4 を収容する容
器が構成される。BRIEF DESCRIPTION OF THE DRAWINGS FIG. FIG. 1 shows an embodiment of an electronic component storage package according to the present invention, in which 1 is an insulating base, 2 is an insulating frame, and 3 is a metal lid. The insulating base 1, the insulating frame 2, and the metal lid 3 constitute a container for housing an electronic component 4 such as a surface acoustic wave device.
【0012】前記絶縁基体1 は酸化アルミニウム質焼結
体、ムライト質焼結体、窒化アルミニウム質焼結体、炭
化珪素質焼結体、ガラスセラミックス焼結体等から成
り、その上面の略中央部に電子部品4 が搭載される搭載
部1aを有し、該搭載部1aに弾性表面波素子等の電子部品
4 が接着剤を介して搭載固定される。The insulating substrate 1 is made of a sintered body of aluminum oxide, a sintered body of mullite, a sintered body of aluminum nitride, a sintered body of silicon carbide, a sintered body of glass ceramic, or the like. And a mounting portion 1a on which the electronic component 4 is mounted. The mounting portion 1a has an electronic component such as a surface acoustic wave element.
4 is mounted and fixed via an adhesive.
【0013】前記絶縁基体1 は例えば、酸化アルミニウ
ム質焼結体から成る場合、酸化アルミニウム、酸化珪
素、酸化マグネシウム、酸化カルシウム等の原料粉末に
適当な有機バインダー、可塑剤、溶剤を添加混合して泥
漿物を作るとともに該泥漿物をドクターブレード法やカ
レンダーロール法を採用することによってセラミックグ
リーンシート(セラミック生シート)と成し、しかる
後、前記セラミックグリーンシートに適当な打ち抜き加
工を施すとともにこれを複数枚積層し、約1600℃の温度
で焼成することによって製作される。When the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, a suitable organic binder, a plasticizer, and a solvent are added to a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. The slurry is formed, and the slurry is formed into a ceramic green sheet (ceramic green sheet) by employing a doctor blade method or a calendar roll method. Thereafter, the ceramic green sheet is subjected to an appropriate punching process and It is manufactured by stacking a plurality of sheets and firing at a temperature of about 1600 ° C.
【0014】また前記絶縁基体1には電子部品4を搭載す
る搭載部1a周辺から側面を介し底面にかけて導出する複
数個のメタライズ配線層5が被着形成されており、電子
部品搭載部1a周辺に位置するメタライズ配線層5の一端
には電子部品4の各電極がボンディングワイヤ6を介して
電気的に接続され、また絶縁基体1の底面に導出する部
位には外部電気回路が半田等のロウ材を介して電気的に
接続される。前記絶縁基体1に形成したメタライズ配線
層5はタングステン、モリブデン、マンガン等の高融点
金属粉末から成り、該メタライズ配線層5は容器内部に
収容する電子部品4の各電極を外部電気回路に電気的接
続する作用を為す。A plurality of metallized wiring layers 5 extending from the periphery of the mounting portion 1a on which the electronic component 4 is mounted to the bottom surface via the side surface are formed on the insulating base 1, and are formed around the electronic component mounting portion 1a. Each electrode of the electronic component 4 is electrically connected to one end of the located metallized wiring layer 5 via a bonding wire 6, and an external electric circuit is provided with a brazing material such as solder at a portion led out to the bottom surface of the insulating base 1. Are electrically connected via The metallized wiring layer 5 formed on the insulating base 1 is made of a high melting point metal powder such as tungsten, molybdenum, manganese, etc., and the metallized wiring layer 5 electrically connects each electrode of the electronic component 4 housed in the container to an external electric circuit. Acts to connect.
【0015】前記メタライズ配線層5 は例えば、タング
ステン等の高融点金属粉末に適当な有機バインダー、可
塑剤、溶剤を添加混合して得た金属ペーストを絶縁基体
1 となるセラミックグリーンシートに予め従来周知のス
クリーン印刷法により所定パターンに印刷塗布しておく
ことによって絶縁基体1 の所定位置に所定パターンに被
着形成される。The metallized wiring layer 5 is made of, for example, a metal paste obtained by adding a suitable organic binder, a plasticizer, and a solvent to a refractory metal powder such as tungsten and mixing it with an insulating substrate.
By printing and applying a predetermined pattern on the ceramic green sheet to be 1 in advance by a conventionally known screen printing method, the ceramic green sheet is adhered and formed at a predetermined position on the insulating substrate 1 in a predetermined pattern.
【0016】尚、前記メタライズ配線層5 はその露出す
る表面にニッケル、金等の耐蝕性に優れ、且つロウ材と
濡れ性の良い金属をメッキ法により1.0 乃至20.0μm の
厚みに層着させておくとメタライズ配線層5 の酸化腐食
を有効に防止することができるとともにメタライズ配線
層5 とボンディングワイヤ6 との接続、及びメタライズ
配線層5 と外部電気回路とのロウ材を介しての接続を強
固となすことができる。従って、前記メタライズ配線層
5 の表面にはニッケル、金等の耐蝕性に優れ、且つロウ
材と濡れ性が良い金属をメッキ法により1.0 乃至20.0μ
mの厚みに層着させておくことが好ましい。The metallized wiring layer 5 is formed by plating a metal having excellent corrosion resistance such as nickel and gold and having good wettability with a brazing material to a thickness of 1.0 to 20.0 μm on the exposed surface by plating. By doing so, oxidation corrosion of the metallized wiring layer 5 can be effectively prevented, and the connection between the metallized wiring layer 5 and the bonding wire 6 and the connection between the metallized wiring layer 5 and the external electric circuit via a brazing material are firmly strengthened. Can be made. Therefore, the metallized wiring layer
The surface of 5 is made of a metal with excellent corrosion resistance, such as nickel and gold, and a good wettability with brazing material, 1.0 to 20.0μ by plating.
It is preferable to coat the layer with a thickness of m.
【0017】また前記絶縁基体1の上面には電子部品の
搭載部1aを囲繞するようにして絶縁枠体2が取着されて
おり、該絶縁枠体2の内側と絶縁基体1上面とで形成され
る空間が電子部品4を収容するための空所となる。An insulating frame 2 is attached to the upper surface of the insulating base 1 so as to surround the mounting portion 1a of the electronic component, and is formed by the inside of the insulating frame 2 and the upper surface of the insulating base 1. The space to be used becomes a space for accommodating the electronic component 4.
【0018】前記絶縁枠体2 は絶縁基体1 と同様の電気
絶縁材料、具体的には酸化アルミニウム質焼結体、ムラ
イト質焼結体、窒化アルミニウム質焼結体、炭化珪素質
焼結体、ガラスセラミックス焼結体等から成り、絶縁基
体1を製作する際と同じ方法によって枠状のセラミック
グリーンシート(セラミック生シート)を得、これを絶
縁基体1 となるセラミックグリーンシート上に予め載置
させておくことによって絶縁基体1 上に一体的に取着さ
れる。The insulating frame 2 is made of the same electrical insulating material as the insulating base 1, specifically, an aluminum oxide sintered body, a mullite sintered body, an aluminum nitride sintered body, a silicon carbide sintered body, A frame-shaped ceramic green sheet (green ceramic sheet) made of a glass-ceramic sintered body or the like and obtained by the same method as that for manufacturing the insulating base 1 is placed on the ceramic green sheet serving as the insulating base 1 in advance. By doing so, they are integrally attached on the insulating base 1.
【0019】前記絶縁枠体2 は更にその上面に枠状のメ
タライズ金属層7 が被着形成されており、該メタライズ
金属層7 には金属枠体8 がロウ材を介してロウ付けされ
ている。The insulating frame 2 is further provided with a frame-shaped metallized metal layer 7 on its upper surface, and a metal frame 8 is brazed to the metallized metal layer 7 with a brazing material. .
【0020】前記絶縁枠体2 上面の枠状のメタライズ金
属層7 はタングステン、モリブデン、マンガン等の高融
点金属粉末から成り、該メタライズ金属層7 は金属枠体
8 を絶縁枠体2 にロウ付けする際の下地金属層として作
用する。The frame-shaped metallized metal layer 7 on the upper surface of the insulating frame 2 is made of a high melting point metal powder such as tungsten, molybdenum, manganese or the like.
8 acts as a base metal layer when brazing to the insulating frame 2.
【0021】また前記枠状のメタライズ金属層7 はタン
グステン等の高融点金属粉末に適当な有機バインダー、
可塑剤、溶剤を添加混合して得た金属ペーストを絶縁枠
体2となる枠状のセラミックグリーンシート上に従来周
知のスクリーン印刷法により予め所定厚みに印刷塗布し
ておくことによって絶縁枠体2 の上面に被着形成され
る。The frame-shaped metallized metal layer 7 is made of an organic binder suitable for a high melting point metal powder such as tungsten.
A metal paste obtained by adding and mixing a plasticizer and a solvent is preliminarily printed and applied to a predetermined thickness by a conventionally known screen printing method on a frame-shaped ceramic green sheet serving as the insulating frame 2 to thereby form the insulating frame 2. Is formed on the upper surface of.
【0022】更に前記メタライズ金属層7にロウ材を介
してロウ付けされている金属枠体8は鉄−ニッケル−コ
バルト合金や鉄−ニッケル合金等の金属材料から成り、
該金属枠体8は後述する金属製蓋体3を絶縁枠体2に取着
する際の下地金属部材として作用する。The metal frame 8 brazed to the metallized metal layer 7 via a brazing material is made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy.
The metal frame 8 functions as a base metal member when attaching a metal lid 3 described later to the insulating frame 2.
【0023】尚、前記鉄−ニッケル−コバルト合金や鉄
−ニッケル合金等の金属材料から成る金属枠体8 は鉄−
ニッケル−コバルト合金等のインゴット(塊)を圧延加
工法や打ち抜き加工法等、従来周知の金属加工法を採用
することによって所定の枠状に製作される。The metal frame 8 made of a metal material such as the above-mentioned iron-nickel-cobalt alloy or iron-nickel alloy is
An ingot (a lump) such as a nickel-cobalt alloy is manufactured into a predetermined frame shape by employing a conventionally known metal working method such as a rolling method or a punching method.
【0024】また前記金属枠体8を絶縁枠体2に被着させ
た枠状のメタライズ金属層7にロウ付けするロウ材とし
ては銀−銅合金(銀ロウ)や金−銀合金等が好適に使用
される。The brazing material to be brazed to the frame-shaped metallized metal layer 7 in which the metal frame 8 is attached to the insulating frame 2 is preferably a silver-copper alloy (silver brazing) or a gold-silver alloy. Used for
【0025】前記金属枠体8の上部には更に鉄−ニッケ
ル−コバルト合金や鉄−ニッケル合金等の金属材料から
成る金属製蓋体3がシームウエルド法等の溶接により取
着され、これによって絶縁基体1と絶縁枠体2と金属製蓋
体3とから成る容器内部に弾性表面波素子等の電子部品4
が気密に収容される。A metal lid 3 made of a metal material such as an iron-nickel-cobalt alloy or an iron-nickel alloy is attached to the upper portion of the metal frame 8 by welding such as a seam welding method. An electronic component 4 such as a surface acoustic wave device is placed inside a container comprising a base 1, an insulating frame 2 and a metal
Are housed in an airtight manner.
【0026】前記金属製蓋体3 はその表面に融点の高い
ニッケルメッキ層3aと融点が950℃以下と低いニッケ
ルメッキ層3bが順次被着されており、該融点が高いニッ
ケルメッキ層3aは金属枠体8 に金属製蓋体3 を溶接によ
り取着させる際、その溶融を不可として金属枠体8 と金
属製蓋体3 との接合を強固となす作用を為し、また融点
が950℃以下と低いニッケルメッキ層3bは金属枠体8
に金属製蓋体3 を溶接により取着させる際に溶融し、金
属枠体8 と金属製蓋体3 とを接合させる作用を為す。こ
の場合、溶融した融点が950℃以下と低いニッケルメ
ッキ層3bはその下部に融点の高いニッケルメッキ層3aが
存在するため金属製蓋体3 と強固に取着し、これによっ
て金属製蓋体3 と金属枠体8 とを強固に接合させる。ま
た融点が950℃以下と低いニッケルメッキ層3bは溶接
による溶融温度が低いことから溶接時に絶縁枠体2 に大
きな熱ショックが印加されることはなく、その結果、絶
縁枠体2 にクラックが発生することは一切なく、これに
よって容器内部の気密封止を完全とし、容器内部に収容
する電子部品4 を長期間にわたり正常、且つ安定に作動
させることができる。On the surface of the metal lid 3, a nickel plating layer 3a having a high melting point and a nickel plating layer 3b having a low melting point of 950 ° C. or less are sequentially applied on the surface, and the nickel plating layer 3a having a high melting point is formed of a metal. When the metal lid 3 is attached to the frame 8 by welding, the metal lid 8 acts to strengthen the joining between the metal frame 8 and the metal lid 3 by disabling its melting, and has a melting point of 950 ° C. or less. And low nickel plating layer 3b is metal frame 8
When the metal cover 3 is attached to the metal frame 3 by welding, it melts and acts to join the metal frame 8 and the metal cover 3. In this case, the molten nickel plating layer 3b having a low melting point of 950 ° C. or less is firmly attached to the metal lid 3 due to the presence of the nickel plating layer 3a having a high melting point under the nickel plating layer 3b. And the metal frame 8 are firmly joined. Further, since the melting temperature of the nickel plating layer 3b having a low melting point of 950 ° C. or less is low by welding, a large thermal shock is not applied to the insulating frame 2 during welding, and as a result, cracks occur in the insulating frame 2 In this way, the hermetic sealing of the inside of the container is completed, and the electronic components 4 housed inside the container can be operated normally and stably for a long period of time.
【0027】前記融点の高いニッケルメッキ層3aは例え
ば、従来周知の電解メッキ法によって金属製蓋体3 の表
面に所定厚み(2.0〜6.0 μm)に被着され、また融点が9
50℃以下と低いニッケルメッキ層3bは例えば、従来周
知の無電解メッキ法によって融点の高いニッケルメッキ
層3a表面に所定厚み(0.5〜3.0 μm)に被着される。The nickel plating layer 3a having a high melting point is applied to the surface of the metal cover 3 to a predetermined thickness (2.0 to 6.0 μm) by, for example, a conventionally well-known electrolytic plating method.
The nickel plating layer 3b as low as 50 ° C. or less is applied to the surface of the nickel plating layer 3a having a high melting point to a predetermined thickness (0.5 to 3.0 μm) by, for example, a conventionally known electroless plating method.
【0028】前記融点が950℃以下と低いニッケルメ
ッキ層3bはニッケルメッキ層中にリンを9.0 乃至12.0重
量%含有させることによって形成され、ニッケルメッキ
層中へのリンの含有は融点の高いニッケルメッキ層3a表
面に無電解メッキ法によって融点が950℃以下と低い
ニッケルメッキ層3bを被着させる際に、メッキ液中に予
め所定量のリンを添加しておくことよって行われる。The nickel plating layer 3b having a melting point as low as 950 ° C. or less is formed by adding 9.0 to 12.0% by weight of phosphorus to the nickel plating layer. When a nickel plating layer 3b having a low melting point of 950 ° C. or less is applied to the surface of the layer 3a by electroless plating, a predetermined amount of phosphorus is added to a plating solution in advance.
【0029】尚、前記融点が950℃以下と低いニッケ
ルメッキ層3bはニッケルメッキ層中にリンを含有させて
形成する場合にはそのリンの含有量が9.0 重量%未満、
或いは12.0重量%を越えると融点が高くなって使用不可
となる。従って、前記融点が950℃以下と低いニッケ
ルメッキ層3bをニッケルメッキ層中にリンを含有させて
形成する場合にはリンの含有量を9.0 乃至12.0重量%と
することに特定される。When the nickel plating layer 3b having a low melting point of 950 ° C. or less is formed by adding phosphorus to the nickel plating layer, the phosphorus content is less than 9.0% by weight.
Otherwise, if it exceeds 12.0% by weight, the melting point becomes too high to use. Therefore, when the nickel plating layer 3b having a melting point as low as 950 ° C. or lower is formed by adding phosphorus to the nickel plating layer, the phosphorus content is specified to be 9.0 to 12.0% by weight.
【0030】また前記融点が950℃以下と低いニッケ
ルメッキ層3bはその厚みが0.5 μm未満であると金属製
蓋体3 を金属枠体8 に強固に接合させるのが困難となる
傾向にあり、また3.0 μm を越えると融点が950℃以
下と低いニッケルメッキ層3bの電気抵抗値が低くなって
溶接の効率が悪くなる傾向にある。従って、前記融点が
950℃以下と低いニッケルメッキ層3bは金属製蓋体3
を金属枠体8 に効率良く、強固に接合させるためにその
厚みを0.5 μm 乃至3.0 μm としておくことが好まし
い。If the thickness of the nickel plating layer 3b having a low melting point of 950 ° C. or less is less than 0.5 μm, it tends to be difficult to firmly join the metal lid 3 to the metal frame 8; On the other hand, if it exceeds 3.0 μm, the electric resistance of the nickel plating layer 3b, whose melting point is as low as 950 ° C. or less, tends to be low, and the welding efficiency tends to be poor. Therefore, the nickel plating layer 3b whose melting point is as low as 950 ° C. or less is
In order to efficiently and firmly join the metal frame 8 to the metal frame 8, the thickness thereof is preferably set to 0.5 μm to 3.0 μm.
【0031】かくして上述の電子部品収納用パッケージ
によれば、絶縁基体1 の電子部品の搭載部1aに弾性表面
波素子等の電子部品4を接着剤を介して接着固定すると
ともに該電子部品4の各電極をボンディングワイヤ6を介
してメタライズ配線層5に電気的に接続し、しかる後、
絶縁枠体2の上面にロウ付けした金属枠体8に金属製蓋体
3をシームウエルド法等により溶接し、絶縁基体1と絶縁
枠体2と金属製蓋体3とから成る容器内部に電子部品4を
気密に封止することによって最終製品としての弾性表面
波装置等となる。Thus, according to the electronic component storage package described above, the electronic component 4 such as a surface acoustic wave element is bonded and fixed to the mounting portion 1a of the electronic component on the insulating base 1 with the adhesive, and the electronic component 4 is mounted. Each electrode is electrically connected to the metallized wiring layer 5 via the bonding wire 6, and thereafter,
Metal cover 8 brazed to the upper surface of insulating frame 2
3 is welded by a seam welding method or the like, and the electronic component 4 is hermetically sealed inside a container comprising the insulating base 1, the insulating frame 2 and the metal lid 3, so that a surface acoustic wave device or the like as a final product is obtained. Becomes
【0032】尚、本発明は上述した実施例に限定される
ものではなく、本発明の要旨を逸脱しない範囲であれば
種々の変更は可能である。The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.
【0033】[0033]
【発明の効果】本発明の電子部品収納用パッケージによ
れば、金属製蓋体の表面に融点が1100〜1400℃
と高いニッケルメッキ層と融点が950℃以下と低いニ
ッケルメッキ層を順次被着させて、融点が950℃以下
と低いニッケルメッキ層のみを溶融させて金属製蓋体が
金属枠体に接合されることから、金属枠体と金属製蓋体
とを溶接により接合させ、絶縁基体と絶縁枠体と金属製
蓋体とから成る容器内部に弾性表面波素子等の電子部品
を気密に収容する際、絶縁枠体に大きな熱ショックが印
加されて絶縁枠体にクラックを発生させることは一切な
く、その結果、容器内部の気密封止が完全となり、容器
内部に収容する弾性表面波素子等を長期間にわたり正
常、且つ安定に作動させることが可能となる。According to the electronic component housing package of the present invention, the surface of the metal lid has a melting point of 1100 to 1400 ° C.
A nickel plating layer having a high melting point and a nickel plating layer having a melting point as low as 950 ° C. or less are sequentially applied, and only the nickel plating layer having a melting point as low as 950 ° C. or less is melted to join the metal lid to the metal frame. From the above, when the metal frame and the metal lid are joined by welding, and when electronic components such as surface acoustic wave elements are hermetically accommodated inside a container including the insulating base, the insulating frame and the metal lid, A large thermal shock is not applied to the insulating frame, and no crack is generated in the insulating frame.As a result, the hermetic sealing inside the container is completed, and the surface acoustic wave element or the like housed inside the container can be used for a long time. For normal and stable operation.
【図1】本発明の電子部品収納用パッケージの一実施例
を示す断面図である。FIG. 1 is a cross-sectional view showing an embodiment of an electronic component storage package according to the present invention.
1・・・・・・絶縁基体 1a・・・・・電子部品の搭載部 2・・・・・・絶縁枠体 3・・・・・・金属製蓋体 3a・・・・・融点が高いニッケルメッキ層 3b・・・・・融点が950℃以下と低いニッケルメッ
キ層 4・・・・・・電子部品 5・・・・・・メタライズ配線層 7・・・・・・メタライズ金属層 8・・・・・・金属枠体DESCRIPTION OF SYMBOLS 1 ... Insulating base 1a ... Mounting part of electronic components 2 ... Insulating frame 3 ... Metal lid 3a ... High melting point Nickel plating layer 3b Nickel plating layer with melting point as low as 950 ° C. or less 4 Electronic component 5 Metallized wiring layer 7 Metallized metal layer 8 ..... Metal frame
Claims (2)
する絶縁基体と、前記電子部品が搭載される搭載部を囲
繞するように前記絶縁基体上面に取着された絶縁枠体
と、前記絶縁枠体の上面に被着された枠状のメタライズ
金属層と、前記枠状のメタライズ金属層にロウ付けされ
た金属枠体と、前記金属枠体上面に溶接される金属製蓋
体とから成る電子部品収納用パッケージであって、前記
金属製蓋体は、表面に融点が1100〜1400℃と高
いニッケルメッキ層および融点が950℃以下と低いニ
ッケルメッキ層を順次被着させて、該融点が950℃以
下と低いニッケルメッキ層のみを溶融させて前記金属枠
体に接合されることを特徴とする電子部品収納用パッケ
ージ。An insulating base having a mounting portion on which an electronic component is mounted on an upper surface; an insulating frame attached to the upper surface of the insulating base so as to surround the mounting portion on which the electronic component is mounted; a frame-shaped metallized metal layer deposited on the upper surface of the insulating frame, is brazed to the frame-shaped metallized metal layer
And a metal lid welded to the upper surface of the metal frame, wherein the metal lid has a melting point of 1100 to 1400 ° C. on the surface. A nickel plating layer and a nickel plating layer having a melting point as low as 950 ° C. or less are sequentially deposited, and the melting point is 950 ° C. or less.
Only the lower and lower nickel plating layers are melted to
A package for storing electronic components, which is joined to a body .
メッキ層はその内部に9.0乃至12.0重量%のリンを含有
していることを特徴とする請求項1に記載の電子部品収
納用パッケージ。2. The electronic component storage package according to claim 1, wherein the nickel plating layer having a melting point as low as 950 ° C. or less contains 9.0 to 12.0% by weight of phosphorus therein.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30757694A JP3318453B2 (en) | 1994-12-12 | 1994-12-12 | Electronic component storage package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30757694A JP3318453B2 (en) | 1994-12-12 | 1994-12-12 | Electronic component storage package |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH08167667A JPH08167667A (en) | 1996-06-25 |
JP3318453B2 true JP3318453B2 (en) | 2002-08-26 |
Family
ID=17970746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30757694A Expired - Fee Related JP3318453B2 (en) | 1994-12-12 | 1994-12-12 | Electronic component storage package |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3318453B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007095812A (en) * | 2005-09-27 | 2007-04-12 | Pioneer Electronic Corp | Housing for electronic component, laser welding apparatus, and laser welding method |
JP2010186691A (en) * | 2009-02-13 | 2010-08-26 | Seiko Instruments Inc | Electrochemical cell |
-
1994
- 1994-12-12 JP JP30757694A patent/JP3318453B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH08167667A (en) | 1996-06-25 |
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