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JP3309939B2 - Light emitting diode - Google Patents

Light emitting diode

Info

Publication number
JP3309939B2
JP3309939B2 JP21555694A JP21555694A JP3309939B2 JP 3309939 B2 JP3309939 B2 JP 3309939B2 JP 21555694 A JP21555694 A JP 21555694A JP 21555694 A JP21555694 A JP 21555694A JP 3309939 B2 JP3309939 B2 JP 3309939B2
Authority
JP
Japan
Prior art keywords
resin
adhesive
light emitting
chip
emitting diode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP21555694A
Other languages
Japanese (ja)
Other versions
JPH0878727A (en
Inventor
潤一 畠田
功祐 的場
明人 岸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichia Corp
Original Assignee
Nichia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichia Corp filed Critical Nichia Corp
Priority to JP21555694A priority Critical patent/JP3309939B2/en
Publication of JPH0878727A publication Critical patent/JPH0878727A/en
Application granted granted Critical
Publication of JP3309939B2 publication Critical patent/JP3309939B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/32257Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic the layer connector connecting to a bonding area disposed in a recess of the surface of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48257Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48464Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area also being a ball bond, i.e. ball-to-ball
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Led Device Packages (AREA)
  • Led Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はサファイア基板上に窒化
ガリウム系化合物半導体(InXAlYGa1- X-YN、0
≦X、0≦Y、X+Y≦1)よりなる発光チップが、サファ
イア基板を接着面として支持体上に接着され、全体が樹
脂でモールドされた構造を備える発光ダイオード(LE
D)に関する。
The present invention relates to a gallium nitride compound on a sapphire substrate semiconductor (In X Al Y Ga 1- XY N, 0
A light emitting diode (LE) having a structure in which a light emitting chip composed of ≤X, 0≤Y, X + Y≤1) is bonded to a support with a sapphire substrate as an adhesive surface, and is entirely molded with resin.
D).

【0002】[0002]

【従来の技術】最近、窒化ガリウム系化合物半導体を発
光チップとする青色LED、青緑色LEDが実用化され
たばかりである。そのLEDの構造を図3に示す。発光
チップはサファイア基板1上にp−n接合した窒化ガリ
ウム系化合物半導体層2が形成されてなり、サファイア
基板1とリードフレーム4とは接着剤3で接着され、全
体は樹脂5でモールドされている。接着剤3およびモー
ルド樹脂5にはエポキシ樹脂が使用されている。接着剤
3はサファイア基板1を透過した窒化ガリウム系化合物
半導体層2の発光をリードフレーム4面で反射させて発
光観測面側に取り出す目的で、さらに接着面からはみ出
した接着剤3が窒化ガリウム系化合物半導体層2面に回
り込んでも電極間をショートさせない目的で、透明で絶
縁性を有するエポキシ樹脂が使用されている。窒化ガリ
ウム系化合物半導体層2はサファイア基板1側から順
に、GaNよりなるバッファ層と、GaNよりなるn型
層と、AlGaNよりなるn型クラッド層と、InGa
Nよりなる活性層と、AlGaNよりなるp型クラッド
層と、GaNよりなるp型コンタクト層とが順に積層さ
れたダブルへテロ構造とされており、この構造により、
LEDは順方向電流(If)20mAにおいて、順方向
電圧(Vf)3.6V、ピーク発光波長450〜520
nm、光度1cd以上、発光出力1.2mW以上と、青
色LED、青緑LEDでは過去最高の性能を示してい
る。
2. Description of the Related Art Recently, blue LEDs and blue-green LEDs using a gallium nitride-based compound semiconductor as a light emitting chip have just been put into practical use. FIG. 3 shows the structure of the LED. The light emitting chip is formed by forming a gallium nitride based compound semiconductor layer 2 having a pn junction on a sapphire substrate 1, and the sapphire substrate 1 and the lead frame 4 are bonded with an adhesive 3, and the whole is molded with a resin 5. I have. Epoxy resin is used for the adhesive 3 and the mold resin 5. The adhesive 3 reflects the light emitted from the gallium nitride-based compound semiconductor layer 2 transmitted through the sapphire substrate 1 on the surface of the lead frame 4 and takes it out to the light emission observation surface side. A transparent and insulating epoxy resin is used for the purpose of not causing a short circuit between the electrodes even when it goes around the surface of the compound semiconductor layer 2. The gallium nitride-based compound semiconductor layer 2 includes, in order from the sapphire substrate 1, a buffer layer made of GaN, an n-type layer made of GaN, an n-type clad layer made of AlGaN,
An active layer made of N, a p-type clad layer made of AlGaN, and a p-type contact layer made of GaN have a double hetero structure in which layers are sequentially stacked.
The LED has a forward voltage (Vf) of 3.6 V and a peak emission wavelength of 450 to 520 at a forward current (If) of 20 mA.
nm, a luminous intensity of 1 cd or more, and a light emission output of 1.2 mW or more.

【0003】[0003]

【発明が解決しようとする課題】前記青色LED、青緑
色LEDの特性は、通常の使用条件においては十分その
仕様を満足しているが、未だ不十分な点があった。例え
ば85℃、85%RHのような高温高湿条件下で連続点
灯試験を行った場合、出力の低下が大きいという欠点が
ある。例えばその一部では500時間経過後の出力が6
0%まで低下してしまうものがある。LEDは信頼性に
優れた発光デバイスであるので、前記のような高温高湿
下においても、安定した出力を維持できる青色LEDを
実現する必要がある。
Although the characteristics of the blue LED and the blue-green LED sufficiently satisfy the specifications under ordinary use conditions, there are still insufficient points. For example, when a continuous lighting test is performed under a high-temperature and high-humidity condition such as 85 ° C. and 85% RH, there is a disadvantage that the output greatly decreases. For example, in some of them, the output after 500 hours elapse is 6
In some cases, it drops to 0%. Since the LED is a highly reliable light emitting device, it is necessary to realize a blue LED that can maintain a stable output even under the above-mentioned high temperature and high humidity.

【0004】従って本発明はこの問題を解決するために
なされてもので、その目的とするところは、窒化ガリウ
ム系化合物半導体を発光チップとするLEDの信頼性を
高めることにあり、具体的には過酷な条件下で使用して
も出力が低下することが少ないLEDを実現することに
ある。
Therefore, the present invention has been made to solve this problem, and an object of the present invention is to improve the reliability of an LED using a gallium nitride-based compound semiconductor as a light emitting chip. An object of the present invention is to realize an LED in which the output hardly decreases even when used under severe conditions.

【0005】[0005]

【課題を解決するための手段】本発明は、サファイア基
板上に窒化ガリウム系化合物半導体が積層されてなる発
光チップの該サファイア基板面が接着剤を介して支持体
上に設置され、さらに前記発光チップ全体が樹脂でモー
ルドされてなる発光ダイオードにおいて、前記発光チッ
プは、モールドされた樹脂よりも硬度の小さい樹脂より
なる少なくともサファイア基板の表出面全体を覆う接着
剤で接着されていることを特徴とする発光ダイオードで
ある。本発明の請求項2記載の発明は、前記接着剤とモ
ールド樹脂の硬度差が25℃におけるロックウェル硬度
で10以上あることを特徴とする請求項1に記載の発光
ダイオードである。本発明の請求項3に記載の発明は、
前記接着剤がゴム状弾性樹脂であり、前記モールド樹脂
が25℃におけるロックウェル硬度が80以上の樹脂で
あることを特徴とする請求項1に記載の発光ダイオード
である。本発明の請求項4に記載の発明は、前記接着剤
にはゴム状弾性微粒子が含有されることを特徴とする請
求項1ないし請求項3の内のいずれか一項に記載の発光
ダイオードである。
According to the present invention, there is provided a light emitting chip comprising a gallium nitride-based compound semiconductor laminated on a sapphire substrate, the sapphire substrate surface being placed on a support via an adhesive, and In a light emitting diode in which the entire chip is molded with a resin, the light emitting chip is bonded with an adhesive covering at least the entire exposed surface of a sapphire substrate made of a resin having a lower hardness than the molded resin. Light emitting diode. The invention according to claim 2 of the present invention is the light emitting diode according to claim 1, wherein a difference in hardness between the adhesive and the mold resin is 10 or more in Rockwell hardness at 25 ° C. The invention described in claim 3 of the present invention provides:
The light emitting diode according to claim 1, wherein the adhesive is a rubber-like elastic resin, and the mold resin is a resin having a Rockwell hardness at 25 ° C of 80 or more. The invention according to claim 4 of the present invention is the light emitting diode according to any one of claims 1 to 3, wherein the adhesive contains rubber-like elastic fine particles. is there.

【0006】図1に本発明のLEDの構造を示す。基本
的な発光チップの構成は図5の従来のLEDと変わるも
のではなく、発光チップのサファイア基板1とリードフ
レーム14とを接着している接着剤13の性質をモール
ド樹脂15よりも硬度の小さい材料としている。
FIG. 1 shows the structure of the LED of the present invention. The basic structure of the light emitting chip is the same as that of the conventional LED shown in FIG. 5, and the property of the adhesive 13 for bonding the sapphire substrate 1 of the light emitting chip and the lead frame 14 is smaller than the hardness of the mold resin 15. Material.

【0007】接着剤13には、モールド樹脂15よりも
硬度が小さい材料を選択する必要があり、例えばモール
ド樹脂15がロックウェル(M)硬度(以下、本明細書
においてロックウェル硬度は25℃での値を指すものと
する。)120のエポキシ樹脂を使用する際には、12
0よりも小さいエポキシ樹脂、ユリア樹脂、アクリル樹
脂、シリコーン樹脂等の柔らかい材料を使用する。シリ
コーン樹脂のようなゴム状の弾性を有する材料では、そ
の硬度はロックウェル硬度をもって表さず、例えばJI
S−Aの値でもって表され、その値が60よりも小さい
シリコーン樹脂を好ましく用いることができる。接着剤
13には、モールド樹脂15との硬度差がロックウェル
硬度で10以上、さらに好ましくは20以上のものを選
択することが望ましい。互いの硬度差が大きいものを選
択することによりチップに係るストレスが小さくなりL
EDの信頼性が向上する。具体的には過酷な条件で使用
しても出力が低下することが少ない。
For the adhesive 13, it is necessary to select a material having a hardness lower than that of the mold resin 15. For example, the mold resin 15 has a Rockwell (M) hardness (hereinafter referred to as a Rockwell hardness of 25 ° C. in the present specification). When the epoxy resin of 120 is used, 12
Use a soft material smaller than 0, such as an epoxy resin, a urea resin, an acrylic resin, or a silicone resin. For a rubber-like elastic material such as silicone resin, its hardness is not represented by Rockwell hardness.
A silicone resin represented by the value of SA and having a value of less than 60 can be preferably used. It is desirable to select the adhesive 13 having a Rockwell hardness of 10 or more, more preferably 20 or more, in hardness difference from the mold resin 15. By selecting those having a large difference in hardness, the stress applied to the chip is reduced and L
The reliability of the ED is improved. Specifically, even when used under severe conditions, the output rarely drops.

【0008】さらに、前記のような接着剤13は透明で
絶縁性を有しているため、図1に示すように接着剤13
が発光チップの側面を伝って半導体層のp−n接合界面
にまで回り込んでも、電極間をショートさせることがな
い。しかも透明であるのでサファイア基板1を透過する
発光を接着剤13が透過して、接着面であるリードフレ
ーム14面で反射されるので、発光を有効に外部に取り
出すことが可能である。また、チップの接着力を高める
ため、意図的に接着剤の量を多くすることも可能であ
る。以上のようなことより、接着剤13に使用する材料
には、最も弾性があり絶縁性かつ透明なシリコーン樹脂
を特に推奨できる。
Furthermore, since the above-mentioned adhesive 13 is transparent and has insulating properties, as shown in FIG.
Does not short-circuit between the electrodes even if it reaches the pn junction interface of the semiconductor layer along the side surface of the light emitting chip. Moreover, since the light is transmitted, the light transmitted through the sapphire substrate 1 is transmitted through the adhesive 13 and is reflected on the lead frame 14, which is the bonding surface, so that the light can be effectively extracted to the outside. Further, in order to increase the adhesive strength of the chip, it is possible to intentionally increase the amount of the adhesive. From the above, as the material used for the adhesive 13, the most elastic, insulating and transparent silicone resin can be particularly recommended.

【0009】[0009]

【作用】発光チップの発熱により封止樹脂が熱膨張し、
膨張、収縮による歪が発光チップに悪影響を与え、LE
Dの出力を低下させることが知られている。この対策と
して従来では発光チップの表面に緩衝層として熱膨張係
数の異なる樹脂(例えばシリコーン樹脂)を被覆し、そ
の樹脂の上にエポキシ樹脂をモールドすることによりL
EDとしていた。
The sealing resin thermally expands due to the heat generated by the light emitting chip,
Strain due to expansion and contraction adversely affects the light emitting chip, and LE
It is known to reduce the output of D. Conventionally, as a countermeasure, a resin (for example, a silicone resin) having a different coefficient of thermal expansion is coated on the surface of the light emitting chip as a buffer layer, and an epoxy resin is molded on the resin.
ED.

【0010】しかし本発明では、サファイアという絶縁
性かつ透明基板を有する窒化ガリウム系化合物半導体発
光チップ特有の構造を利用することにより、従来のよう
にチップの前面ではなく、接着面に緩衝層を設けること
により、チップに係るストレスを小さくしてLEDの出
力低下を防止することに成功した。
However, in the present invention, a buffer layer is provided not on the front surface of the chip but on the bonding surface by using a structure specific to a gallium nitride-based compound semiconductor light emitting chip having an insulating and transparent substrate called sapphire. As a result, the stress on the chip was reduced and the output of the LED was prevented from being reduced.

【0011】まず請求項1のLEDでは、チップを接着
する樹脂の材料をモールド樹脂よりも硬度の小さいもの
を選択することにより、サファイア基板と支持体間に緩
衝層を設け、この緩衝層でもってチップに係るストレス
を緩和できる。
In the LED according to the first aspect of the present invention, a buffer material is provided between the sapphire substrate and the support by selecting a resin material for bonding the chip having a hardness lower than that of the mold resin. The stress on the chip can be reduced.

【0012】請求項3では最も効果の大きい組み合わせ
として、接着剤をシリコーン樹脂等のゴム状の弾性を有
する樹脂とし、モールド樹脂をエポキシ、アクリル等の
硬度をロックウェル硬度で表せる樹脂を選択している。
ゴム状の弾性を有する樹脂は吸収力も大きく、本発明の
LEDでは最も接着剤として適しており、モールド樹脂
は、ロックウェル硬度が80より小さいとLEDの封止
樹脂としては不適である。
According to a third aspect of the present invention, as the most effective combination, the adhesive is made of a resin having rubber-like elasticity such as silicone resin, and the mold resin is selected from resins such as epoxy and acrylic which can express the hardness by Rockwell hardness. I have.
A rubber-like resin having a large elasticity has a large absorptivity, and is most suitable as an adhesive in the LED of the present invention. A mold resin having a Rockwell hardness of less than 80 is not suitable as an LED sealing resin.

【0013】また、請求項4で示すように接着剤の材料
にゴム状の微粒子を添加しても、接着剤に弾性を付与す
ることが可能である。ゴム微粒子はその粒径が0.5μ
m以下、さらに好ましくは0.1μm以下のものを選択
することが好ましい。0.5μmよりも大きいと、接着
剤が不透明となり発光を透過しにくくなるからである。
従ってゴム状の微粒子は透明か、または白色のものを選
択することが好ましい。但し、本明細書において、透明
とは窒化ガリウム系化合物半導体層の発光波長を透過す
るという意味であり、必ずしも無色透明を意味するもの
ではない。また、白色とは窒化ガリウム系化合物半導体
層の発光を反射する反射率を有する白色を意味するもの
とする。
Further, even if rubber-like fine particles are added to the material of the adhesive, elasticity can be imparted to the adhesive. Rubber microparticles have a particle size of 0.5μ
m or less, more preferably 0.1 μm or less. If the thickness is larger than 0.5 μm, the adhesive becomes opaque and it becomes difficult to transmit light.
Therefore, it is preferable to select transparent or white rubber-like fine particles. However, in the present specification, “transparent” means that the emission wavelength of the gallium nitride-based compound semiconductor layer is transmitted, and does not necessarily mean colorless and transparent. Further, white means white having a reflectivity for reflecting light emitted from the gallium nitride-based compound semiconductor layer.

【0014】ゴム微粒子は請求項1に記載の接着剤に混
入して、弾性を付与すると共にフィラーとしてもよい
し、さらに、請求項3のように最初から弾性を有するゴ
ム状の接着剤に混入して、フィラーとしてもよい。好ま
しくはゴム微粒子の材料を接着剤に使用する材料よりも
熱伝導率の大きい材料を選択すると、チップの発熱を効
率よく、リードフレーム等の支持体に伝えることが可能
となり、チップの寿命が向上する。
The rubber fine particles may be mixed with the adhesive according to the first aspect to impart elasticity and serve as a filler. Further, the fine particles may be mixed into the rubbery adhesive having elasticity from the beginning. Then, it may be used as a filler. Preferably, the material of the rubber fine particles is selected to have a higher thermal conductivity than the material used for the adhesive, so that the heat generated by the chip can be efficiently transmitted to a support such as a lead frame, thereby improving the life of the chip. I do.

【0015】さらにまた、接着剤が絶縁性を備える樹脂
であるので、図1のように意図的に接着剤の量を増やし
て接着力を高めることも可能であり、仮に量を増やした
ために、接着剤が半導体層側のp−n接合界面に触れて
も素子を破壊することがないので信頼性に優れたLED
を提供できる。
Further, since the adhesive is a resin having an insulating property, it is possible to intentionally increase the amount of the adhesive as shown in FIG. 1 to increase the adhesive strength. LED with excellent reliability because the element does not break down even if the adhesive touches the pn junction interface on the semiconductor layer side
Can be provided.

【0016】[0016]

【実施例】 [実施例1]2インチφのサファイア基板の表面に、G
aNバッファ層と、Siドープn型GaN層と、Siド
ープn型AlGaNクラッド層と、Si+ZnドープI
nGaN活性層と、Mgドープp型AlGaN層と、M
gドープp型GaN層とが順に積層されたウェーハを用
意した。このウェーハの窒化ガリウム系化合物半導体層
側を所定の形状でエッチングした後、常法に従いn型G
aN層にn電極、p型GaN層に正電極を形成した。電
極形成後、ウェーハをスクライバーで350μm角にブ
レイクしてLEDチップを得た。次に、このLEDチッ
プをウェーハごとダイボンダーにセットした。
EXAMPLES Example 1 A surface of a 2 inch φ sapphire substrate was coated with G
aN buffer layer, Si-doped n-type GaN layer, Si-doped n-type AlGaN cladding layer, and Si + Zn-doped I
nGaN active layer, Mg-doped p-type AlGaN layer,
A wafer was prepared in which g-doped p-type GaN layers were sequentially stacked. After etching the gallium nitride-based compound semiconductor layer side of the wafer in a predetermined shape, n-type G
An n electrode was formed on the aN layer, and a positive electrode was formed on the p-type GaN layer. After the electrodes were formed, the wafer was broken into 350 μm squares with a scriber to obtain LED chips. Next, this LED chip was set on a die bonder together with the wafer.

【0017】ダイボンダーに図1に示すような構造のL
EDに組み上げるためのリードフレームをセットし、リ
ードフレーム14のカップ内に接着剤13をディスペン
サーで注入した。接着剤13には、硬化後の硬度(JI
S−A)32、熱膨張係数3×10-4/℃、無色透明の
シリコーン樹脂を使用した。LEDチップをカップ内に
ダイボンドした後、150℃で加熱して接着剤を硬化さ
せた。接着剤硬化後、ワイヤーボンダーでLEDチップ
の電極にワイヤーボンディングを行った。
An L having a structure as shown in FIG.
A lead frame to be assembled into the ED was set, and the adhesive 13 was injected into the cup of the lead frame 14 with a dispenser. The adhesive 13 has a hardness after curing (JI
SA) 32, a colorless and transparent silicone resin having a coefficient of thermal expansion of 3 × 10 −4 / ° C. was used. After the LED chip was die-bonded in the cup, the adhesive was heated at 150 ° C. to cure the adhesive. After the adhesive was cured, wire bonding was performed on the electrodes of the LED chip using a wire bonder.

【0018】最後に、LEDチップが接着されたリード
フレームをモールド装置に移送し、樹脂15でチップ全
体をモールドした後、120℃で加熱して樹脂15を硬
化させ、図1に示すような構造のLEDランプを得た。
樹脂15は硬化後のロックウェル硬度115、熱膨張係
数7.8×10-5/℃の無色透明のエポキシ樹脂を使用
した。
Finally, the lead frame to which the LED chip is adhered is transferred to a molding device, and the entire chip is molded with the resin 15, and then heated at 120 ° C. to cure the resin 15, thereby obtaining a structure as shown in FIG. LED lamp was obtained.
As the resin 15, a colorless and transparent epoxy resin having a Rockwell hardness of 115 after curing and a thermal expansion coefficient of 7.8 × 10 −5 / ° C. was used.

【0019】以上のようにして作成したLEDランプを
常温で点灯させたところ、If20mAにおいて、Vf
3.6V、ピーク発光波長450nm、光度1200m
cd、発光出力1.8mWであった。また別に加速度試
験として、このLEDランプ100個を無作為に抽出
し、85℃、85%RHの高温高湿条件下で40mAを
流し、500時間連続点灯して、最初の出力と比較した
ところ、急激に出力の低下したものはなく、最初の出力
に比べて、全て95%±3%の範囲にあった。
When the LED lamp prepared as described above was turned on at room temperature, Vf was obtained at If mA of 20 mA.
3.6 V, peak emission wavelength 450 nm, luminous intensity 1200 m
cd and the light emission output were 1.8 mW. Separately, as an acceleration test, 100 of these LED lamps were randomly extracted, subjected to 40 mA under high temperature and high humidity conditions of 85 ° C. and 85% RH, lit continuously for 500 hours, and compared with the initial output. There was no sharp drop in output, and the output was all within the range of 95% ± 3% as compared to the initial output.

【0020】[実施例2]ダイボンド時にディスペンサ
ーに充填する接着剤を、硬化後のロックウェル硬度9
7、熱膨張係数8.5×10-5/℃、無色透明のエポキ
シ樹脂とし、さらにモールド樹脂をロックウェル硬度1
17、熱膨張係数7.8×10-5/℃、無色透明のエポ
キシ樹脂とする他は、実施例1と同様にしてLEDラン
プを作成した。このランプ100個を同様に抽出し、4
0mAにて500時間高温高湿試験したところ、急激に
出力が低下したものはなく、全て87%±4%の範囲に
あった。
Example 2 An adhesive to be filled into a dispenser at the time of die bonding was applied to a Rockwell hardness of 9 after curing.
7. Thermal expansion coefficient 8.5 × 10 -5 / ° C, colorless and transparent epoxy resin, and mold resin of Rockwell hardness 1
17. An LED lamp was prepared in the same manner as in Example 1, except that a colorless and transparent epoxy resin having a thermal expansion coefficient of 7.8 × 10 −5 / ° C. was used. Similarly, 100 lamps were extracted and 4 lamps were extracted.
When a high-temperature and high-humidity test was performed at 0 mA for 500 hours, there was no sudden decrease in output, and all were within the range of 87% ± 4%.

【0021】[実施例3]ダイボンド時にディスペンサ
ーに充填する接着剤を、硬化後のロックウェル硬度9
7、熱膨張係数8.5×10-5/℃、無色透明のエポキ
シ樹脂に、平均粒径0.1μmの白色ゴム状微粒子を1
0重量%混合したものを使用した。さらにモールド樹脂
をロックウェル硬度117、熱膨張係数7.8×10-5
/℃、無色透明のエポキシ樹脂とする他は、実施例1と
同様にしてLEDランプを作成した。このランプ100
個を同様に40mAで500時間高温高湿試験したとこ
ろ、急激に出力が低下したものはなく、全て92%±3
%の範囲にあった。
Example 3 The adhesive to be filled in the dispenser at the time of die bonding was applied to a Rockwell hardness of 9 after curing.
7. One white rubber-like fine particle having an average particle size of 0.1 μm is added to a colorless and transparent epoxy resin having a thermal expansion coefficient of 8.5 × 10 −5 / ° C.
A mixture of 0% by weight was used. Further, the molding resin is made of a Rockwell hardness of 117 and a thermal expansion coefficient of 7.8 × 10 −5.
An LED lamp was prepared in the same manner as in Example 1, except that the colorless transparent epoxy resin was used. This lamp 100
The test pieces were similarly subjected to a high-temperature and high-humidity test at 40 mA for 500 hours.
% Range.

【0022】[実施例4]図2を元に実施例4を説明す
る。基本的な構成は図1と特に変わるものではないが、
LEDチップの支持体をセラミック基板24としてい
る。このセラミック基板24には予め電極パターンが形
成されており、LEDチップの電極はパターン化された
電極とワイヤーボンディングされる。
Embodiment 4 Embodiment 4 will be described with reference to FIG. The basic configuration is not particularly different from FIG.
The support for the LED chips is a ceramic substrate 24. An electrode pattern is formed on the ceramic substrate 24 in advance, and the electrodes of the LED chip are wire-bonded to the patterned electrodes.

【0023】実施例1のLEDチップのサファイア基板
を、ダイボンダーに設置されたセラミック基板の所定の
位置に、接着剤23でダイボンドした。接着剤35には
硬化後の硬度(JIS−A)32、熱膨張係数3×10
-4/℃、無色透明のシリコーン樹脂にフィラーとして粒
径0.1μmの白色ゴム微粒子を5重量%混合したもの
を使用した。
The sapphire substrate of the LED chip of Example 1 was die-bonded to a predetermined position of a ceramic substrate set in a die bonder with an adhesive 23. The adhesive 35 has a hardness after curing (JIS-A) of 32 and a thermal expansion coefficient of 3 × 10
A mixture obtained by mixing 5% by weight of white rubber fine particles having a particle size of 0.1 μm as a filler with a colorless and transparent silicone resin at −4 / ° C. was used.

【0024】次に、ワイヤーボンダーでLEDチップの
電極と、セラミック基板の電極とを接続した後、モール
ド装置にてLEDチップを樹脂25で封止した。樹脂2
5には硬化後のロックウェル硬度110、熱膨張係数
7.8×10-5/℃の無色透明のエポキシ樹脂を使用し
た。
Next, after connecting the electrode of the LED chip and the electrode of the ceramic substrate with a wire bonder, the LED chip was sealed with a resin 25 by a molding device. Resin 2
For No. 5, a colorless and transparent epoxy resin having a Rockwell hardness of 110 after curing and a thermal expansion coefficient of 7.8 × 10 −5 / ° C. was used.

【0025】以上のようにして作成したLEDランプか
ら100個を抽出し、40mA、高温高湿条件下で50
0時間連続点灯させたところ、急激に出力の低下したも
のはなく、最初の出力に比べて、全て95%±4%の範
囲にあった。
One hundred LED lamps were extracted from the LED lamps prepared as described above, and were extracted under the conditions of 40 mA, high temperature and high humidity.
When the light was continuously lit for 0 hours, there was no sudden decrease in output, and the output was all within the range of 95% ± 4% as compared with the initial output.

【0026】[比較例]実施例1においてダイボンド時
の接着剤に、モールド樹脂と同一の樹脂を使用する他は
同様にしてLEDを得た。このLEDランプ100個を
同様に高温高湿試験したところ、500時間で出力は7
0%±10%にまで低下した。
Comparative Example An LED was obtained in the same manner as in Example 1, except that the same resin as the mold resin was used as the adhesive at the time of die bonding. When 100 LED lamps were similarly subjected to a high-temperature and high-humidity test, the output was 7 in 500 hours.
It decreased to 0% ± 10%.

【0027】[0027]

【発明の効果】以上説明したように本発明のLEDはチ
ップを接着する接着剤をモールド樹脂よりも硬度の小さ
い樹脂としていることにより、チップの発熱によりチッ
プに係るストレスを接着剤層で緩和することができるの
で、チップの信頼性を格段に向上させることができる。
また他の技術として、チップの窒化ガリウム系化合物半
導体層とモールド樹脂との間に、緩衝層として、従来よ
り行われているシリコーン樹脂等の緩衝層となる樹脂層
を形成することも可能である。
As described above, in the LED of the present invention, since the adhesive for bonding the chip is a resin having a lower hardness than the molding resin, the stress applied to the chip due to the heat generated by the chip is reduced by the adhesive layer. Therefore, the reliability of the chip can be remarkably improved.
As another technique, it is also possible to form a resin layer serving as a buffer layer of a conventional silicone resin or the like as a buffer layer between the gallium nitride-based compound semiconductor layer of the chip and the mold resin. .

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の一実施例のLEDランプの構造を示
す模式断面図。
FIG. 1 is a schematic sectional view showing the structure of an LED lamp according to one embodiment of the present invention.

【図2】 本発明の他の実施例のLEDランプの構造を
示す模式断面図。
FIG. 2 is a schematic sectional view showing the structure of an LED lamp according to another embodiment of the present invention.

【図3】 従来のLEDランプの構造を示す模式断面
図。
FIG. 3 is a schematic sectional view showing the structure of a conventional LED lamp.

【符号の説明】[Explanation of symbols]

1 ・・・・サファイア基板 2 ・・・・窒化ガリウム系化合物半導体層 13、23・・・・・接着剤 15、25・・・・・モールド樹脂 14、24・・・・・支持体 DESCRIPTION OF SYMBOLS 1 ... Sapphire board | substrate 2 ... Gallium nitride compound semiconductor layer 13,23 ... Adhesive agent 15,25 ... Mold resin 14,24 ... Support

フロントページの続き (56)参考文献 特開 昭62−101090(JP,A) 特開 昭61−34085(JP,A) 特開 昭61−5530(JP,A) (58)調査した分野(Int.Cl.7,DB名) H01L 33/00 H01L 21/56 H01L 23/28 JICSTファイル(JOIS)(56) References JP-A-62-101090 (JP, A) JP-A-61-34085 (JP, A) JP-A-61-5530 (JP, A) (58) Fields investigated (Int) .Cl. 7 , DB name) H01L 33/00 H01L 21/56 H01L 23/28 JICST file (JOIS)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 サファイア基板上に窒化ガリウム系化合
物半導体が積層されてなる発光チップの該サファイア基
板面が接着剤を介して支持体上に設置され、さらに前記
発光チップ全体が樹脂でモールドされてなる発光ダイオ
ードにおいて、前記発光チップは、モールドされた樹脂
よりも硬度の小さい樹脂よりなる少なくともサファイア
基板の表出面全体を覆う接着剤で接着されていることを
特徴とする発光ダイオード。
1. A light emitting chip in which a gallium nitride-based compound semiconductor is laminated on a sapphire substrate, the sapphire substrate surface is placed on a support via an adhesive, and the entire light emitting chip is molded with a resin. The light emitting diode according to claim 1, wherein the light emitting chip is bonded with an adhesive made of a resin having a hardness lower than that of a molded resin and covering at least an entire exposed surface of the sapphire substrate.
【請求項2】 前記接着剤とモールド樹脂の硬度差が2
5℃におけるロックウェル硬度で10以上あることを特
徴とする請求項1に記載の発光ダイオード。
2. The hardness difference between the adhesive and the mold resin is 2
The light-emitting diode according to claim 1, wherein the light-emitting diode has a Rockwell hardness of 10 or more at 5 ° C.
【請求項3】 前記接着剤がゴム状弾性樹脂であり、前
記モールド樹脂が25℃におけるロックウェル硬度が8
0以上の樹脂であることを特徴とする請求項1に記載の
発光ダイオード。
3. The adhesive is a rubber-like elastic resin, and the mold resin has a Rockwell hardness of 8 at 25 ° C.
The light emitting diode according to claim 1, wherein the light emitting diode is a resin of 0 or more.
【請求項4】 前記接着剤にはゴム状弾性微粒子が含有
されることを特徴とする請求項1ないし請求項3の内の
いずれか一項に記載の発光ダイオード。
4. The light emitting diode according to claim 1, wherein the adhesive contains rubber-like elastic fine particles.
JP21555694A 1994-09-09 1994-09-09 Light emitting diode Expired - Fee Related JP3309939B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21555694A JP3309939B2 (en) 1994-09-09 1994-09-09 Light emitting diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21555694A JP3309939B2 (en) 1994-09-09 1994-09-09 Light emitting diode

Publications (2)

Publication Number Publication Date
JPH0878727A JPH0878727A (en) 1996-03-22
JP3309939B2 true JP3309939B2 (en) 2002-07-29

Family

ID=16674390

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21555694A Expired - Fee Related JP3309939B2 (en) 1994-09-09 1994-09-09 Light emitting diode

Country Status (1)

Country Link
JP (1) JP3309939B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW383508B (en) 1996-07-29 2000-03-01 Nichia Kagaku Kogyo Kk Light emitting device and display
JP2002107249A (en) * 2000-10-03 2002-04-10 Fuji Electric Co Ltd Semiconductor pressure sensor
JP2002124705A (en) * 2000-10-17 2002-04-26 Citizen Electronics Co Ltd Light emitting diode and its manufacturing method
JP4358092B2 (en) 2004-11-26 2009-11-04 アバゴ・テクノロジーズ・イーシービーユー・アイピー(シンガポール)プライベート・リミテッド Light emitting device and manufacturing method thereof
TW200717856A (en) * 2005-10-28 2007-05-01 Taiwan Oasis Technology Co Ltd Method of fabricating light emitting diode
JP5066333B2 (en) * 2005-11-02 2012-11-07 シチズン電子株式会社 LED light emitting device.
JP2007311401A (en) * 2006-05-16 2007-11-29 Idec Corp Led light emitting device and method of fabricating the same

Also Published As

Publication number Publication date
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