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JP3308365B2 - How to remove nitrogen trifluoride gas - Google Patents

How to remove nitrogen trifluoride gas

Info

Publication number
JP3308365B2
JP3308365B2 JP32171393A JP32171393A JP3308365B2 JP 3308365 B2 JP3308365 B2 JP 3308365B2 JP 32171393 A JP32171393 A JP 32171393A JP 32171393 A JP32171393 A JP 32171393A JP 3308365 B2 JP3308365 B2 JP 3308365B2
Authority
JP
Japan
Prior art keywords
gas
exhaust gas
room temperature
pipe
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP32171393A
Other languages
Japanese (ja)
Other versions
JPH07171342A (en
Inventor
定一 菰原
眞 在塚
功 原田
隆 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Priority to JP32171393A priority Critical patent/JP3308365B2/en
Publication of JPH07171342A publication Critical patent/JPH07171342A/en
Application granted granted Critical
Publication of JP3308365B2 publication Critical patent/JP3308365B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Catalysts (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ドライエッチング排ガ
ス等に含まれる三弗化窒素ガスを分解して除害する方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for decomposing and removing nitrogen trifluoride gas contained in dry etching exhaust gas and the like.

【0002】[0002]

【従来技術】三弗化窒素ガス(以下、NFと称す)
は、LSIのドライエッチング剤あるいは弗化剤として
注目されており、特に、ドライエッチング剤としては、
CFなどのパーフロロカーボン系のエッチング剤にく
らべエッチングの際に生じるLSI基板の汚染が極めて
少ないなどの利点を有している。一方、NFは大気中
で極めて安定であり、水や酸、アルカリ水溶液とも反応
しない不燃性のガスであるが、TLV10ppmの毒性
ガスである。このため使用後のNF含有ガスをそのま
ま大気中に放出する事はできず、空気中で10ppm以
下に希釈して排出するか、あるいは何らかの分解処理を
した上で排出しているのが現状である。
[Prior art] nitrogen trifluoride gas (hereinafter referred to as NF 3)
Is attracting attention as a dry etching agent or a fluorinating agent for LSI. In particular, as a dry etching agent,
Contamination of LSI substrate occurring during perfluorocarbon-based etching compared with the etching agent such as CF 4 has advantages such as extremely small. On the other hand, NF 3 is extremely stable in the air and is a nonflammable gas that does not react with water, acid, or an aqueous alkali solution, but is a toxic gas having a TLV of 10 ppm. For this reason, the NF 3 -containing gas after use cannot be released to the atmosphere as it is, and is currently diluted to 10 ppm or less in air or discharged after some decomposition treatment. is there.

【0003】しかしながら、空気希釈の上排出されるN
は大気中で分解されないため、今後のNF使用量
増加見込みとあいまって自然環境、特に生物体系への悪
影響が懸念されている。そこで従来、NFの除害方法
として、NFを含むガスに水素を混合し、この混合ガ
スを還元性触媒に接触させることにより、水素還元反応
で分解するようにしたり(特開平2−303524号公
報)、NFを含むガスと、還元性触媒、アルミナ及び
シリカの内の少なくとも1種を主成分とする物質とを接
触させるようにしたもの(特開昭62−273039号
公報)が知られている。
However, the N discharged after air dilution
F 3 is because they are not degraded in the atmosphere, it is feared adverse effect on the combined natural environment, and particularly in biological systems and the future of NF 3 usage increase expected. Therefore, conventionally, as abatement method NF 3, it was mixed with hydrogen gas comprising NF 3, by contacting the mixed gas to a reducing catalyst, or so as to decompose the hydrogen reduction reaction (JP-A-2-303524 Japanese Patent Application Laid-Open No. 62-273039 discloses a method in which a gas containing NF 3 is brought into contact with a substance mainly containing at least one of a reducing catalyst, alumina and silica. Have been.

【0004】[0004]

【発明が解決しようとする課題】ところが従来の除害方
法では、前者のものでは130〜180℃、後者のもの
では200℃前後という高温雰囲気下でNFを分解す
るようにしていることから、大掛かりな外部ヒータが必
要で、装置全体が大型化し、取り扱いが不便でコストが
高いという実用上の問題点があった。また、(特開平5
−261247号公報)は常温での除害方法である。し
かし、これに準ずる方法では、NF処理能力(触媒の
単位容積当りの処理量)が低いだけでなく、ガス流速が
速いと充分な除害が出来ない等の問題がある。
In However conventional abatement methods [0006] Since the intended former you have to disassemble the NF 3 in a high temperature atmosphere of 130 to 180 ° C., by way of the latter 200 ° C. before and after There is a practical problem that a large-scale external heater is required, the entire apparatus becomes large, handling is inconvenient, and cost is high. Also, (Japanese Unexamined Patent Application Publication No.
Japanese Patent Application Laid-Open No. 261247/1995) is a method of removing harm at room temperature. However, the method according to this method has problems that not only the NF 3 processing capacity (the processing amount per unit volume of the catalyst) is low, but also if the gas flow rate is high, sufficient detoxification cannot be performed.

【0005】[0005]

【課題を解決するための手段】本発明者等は、従来技術
の欠点を改良し、工業的実施の可能な方法について鋭意
検討した結果、特定な方法で処理した金属を使用するこ
とにより、その目的を達成することを見いだし、本発明
を完成するに至った。即ち、本発明は還元性金属触媒に
一酸化炭素を作用させて活性化し、活性化された該還元
性金属触媒に三弗化窒素含有ガスを常温下で接触させる
ことを特徴とする三弗化窒素ガスの除害方法に関する。
DISCLOSURE OF THE INVENTION The present inventors have improved the drawbacks of the prior art, and have conducted intensive studies on methods that can be implemented industrially. The inventors have found that the object has been achieved, and have completed the present invention. That is, the present invention is characterized in that carbon monoxide is acted on a reducing metal catalyst to activate the same, and the activated reducing metal catalyst is brought into contact with a gas containing nitrogen trifluoride at room temperature. The present invention relates to a method for removing nitrogen gas.

【0006】以下、本発明を更に詳細に説明する。本発
明で使用する還元性金属触媒としては、金属、金属酸化
物、金属水酸化物を有効な物質として含有し、金属元素
としては、Cu、Fe、Zn、Cr、Mn等があげられ
る。
Hereinafter, the present invention will be described in more detail. The reducing metal catalyst used in the present invention contains a metal, a metal oxide, or a metal hydroxide as an effective substance, and examples of the metal element include Cu, Fe, Zn, Cr, and Mn.

【0007】還元性金属触媒の活性化処理は、雰囲気炉
やカラムに充填したタブレット形状の還元性金属触媒
に、100%の一酸化炭素を用いるか、または不活性ガ
スで希釈された一酸化炭素を用い、300〜1000℃
の範囲において、好ましくは400〜600℃で含有金
属の融点以下の温度で行うことが好ましい。上記の範囲
外、例えば、300℃未満では充分な活性が得らず、N
通気後数分でNFが検出されるので好ましくな
い。また、1000℃を超えると、活性は得られるもの
の、NF処理能力がダウンするため、エネルギー消費
量及び装置の耐久面から好ましくない。
In the activation treatment of the reducing metal catalyst, 100% carbon monoxide is used for the reducing metal catalyst in the form of a tablet filled in an atmosphere furnace or a column, or carbon monoxide diluted with an inert gas is used. 300-1000 ° C
It is preferable to carry out at a temperature of preferably 400 to 600 ° C. and lower than the melting point of the contained metal. If the temperature is out of the above range, for example, less than 300 ° C., sufficient activity cannot be obtained.
NF 3 is detected several minutes after aeration of F 3, which is not preferable. On the other hand, when the temperature exceeds 1000 ° C., although the activity is obtained, the NF 3 treatment capacity is reduced, which is not preferable in terms of energy consumption and durability of the apparatus.

【0008】以上の如く、本発明は、還元性金属触媒に
一酸化炭素を300〜1000℃の範囲で作用させて還
元性金属触媒を活性化し、この活性化した還元性金属触
媒にNF含有ガスを常温下で接触させることにより、
NFを分解させるようにしているので、外部ヒータで
反応塔を加温する必要がなく、装置全体を小型化するこ
とができ、取り扱いが簡便となる。これにより、除害コ
ストを低くすることができる。また、従来品より寿命が
長く、広範囲のガス流速に対応できる。
As described above, the present invention activates a reducing metal catalyst by causing carbon monoxide to act on the reducing metal catalyst at a temperature in the range of 300 to 1000 ° C., and the activated reducing metal catalyst contains NF 3. By bringing the gas into contact at room temperature,
Since NF 3 is decomposed, there is no need to heat the reaction tower with an external heater, so that the entire apparatus can be reduced in size and handling is simplified. Thereby, the abatement cost can be reduced. In addition, it has a longer life than conventional products and can cope with a wide range of gas velocities.

【0009】[0009]

【実施例】以下実施例及び比較例により本発明を更に詳
細に説明する。 実施例1 長さ500mm、内径16.5mmφのステンレス製カ
ラムと両側にガス導入管、排ガス管、そしてカラム接続
するジョイント、カラムを加熱するためのヒーターを備
えた装置を使用し、このカラムの中央に4mmφ×4m
mHのタブレット形状に形成されている処理剤を120
mm(25ml、17.5g)充填した。なお、この処
理剤は還元触媒として使用されているFeを主体
とする鉄系触媒を使用した。この鉄系触媒は金属鉄と酸
化鉄をケイソウ土で固めたもので、金属鉄と酸化鉄を6
0%含んでいる。処理剤を充填した後、500℃に加熱
した状態でガス導入管より一酸化炭素を300cc/m
inで6時間通気させて、処理剤中の酸化鉄を100%
一酸化炭素で処理し、処理剤を活性化させた後、窒素を
流して、処理剤を室温まで冷却させた。この処理した充
填カラムを、ガス導入管、排ガス管を備えた除害装置に
移動し、室温においてNで希釈されたNF濃度1%
を有するガスを1500cc/min(空塔線速度1
1.68cm/sec)の流量で通気した。この時、排
ガス口よりでるガス中のNFをガスクロマトグラフで
分析した結果、通気後36分までは、NFは検出され
なかった。結果を表1に示す。
The present invention will be described in more detail with reference to the following Examples and Comparative Examples. Example 1 An apparatus equipped with a stainless steel column having a length of 500 mm and an inner diameter of 16.5 mmφ, a gas inlet tube, an exhaust gas tube on both sides, a joint for connecting the column, and a heater for heating the column was used. 4mmφ × 4m
The treatment agent formed in a tablet shape of mH
mm (25 ml, 17.5 g). The treatment agent used was an iron-based catalyst mainly composed of Fe 2 O 3 used as a reduction catalyst. This iron-based catalyst is obtained by solidifying metallic iron and iron oxide with diatomaceous earth.
Contains 0%. After filling the treatment agent, the mixture was heated to 500 ° C., and 300 cc / m of carbon monoxide was introduced from the gas inlet tube.
in for 6 hours, 100% of iron oxide in treatment agent
After treatment with carbon monoxide to activate the treating agent, nitrogen was flowed to cool the treating agent to room temperature. The treated packed column was moved to a scrubber equipped with a gas introduction pipe and an exhaust gas pipe, and the NF 3 concentration diluted with N 2 at room temperature was 1%.
1500 cc / min (superficial linear velocity 1)
Aeration was performed at a flow rate of 1.68 cm / sec). At this time, as a result of analyzing NF 3 in the gas discharged from the exhaust gas port by gas chromatography, NF 3 was not detected until 36 minutes after the ventilation. Table 1 shows the results.

【0010】実施例2 実施例1と同様の方法で処理した充填カラムを、ガス導
入管、排ガス管を備えた除害装置に移動し室温において
で希釈されたNF濃度0.1%を有するガスを2
700cc/min(空塔線速度21.03cm/se
c)の流量で通気した。この時、排ガス口よりでるガス
中のNFをガスクロマトグラフで分析した結果、通気
後150分までは、NFは検出されなかった。結果を
表1に示す。
Example 2 A packed column treated in the same manner as in Example 1 was transferred to an abatement apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and the NF 3 concentration diluted with N 2 at room temperature was 0.1%. Gas with
700 cc / min (superficial linear velocity 21.03 cm / se
Vent at the flow rate of c). At this time, as a result of analyzing NF 3 in the gas discharged from the exhaust gas port by gas chromatography, NF 3 was not detected until 150 minutes after the ventilation. Table 1 shows the results.

【0011】実施例3 実施例1と同様の方法で処理した充填カラムを、ガス導
入管、排ガス管を備えた除害装置に移動し室温において
で希釈されたNF濃度0.1%、O:0.05
%、NO:0.05%を有するガスを500cc/m
in(空塔線速度3.89cm/sec)の流量で通気
した。この時、排ガス口よりでるガス中のNFをガス
クロマトグラフで分析した結果、通気後8時間までは、
NFは勿論、NOも検出されなかった。結果を表1
に示す。
Example 3 A packed column treated in the same manner as in Example 1 was transferred to an abatement apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and the NF 3 concentration diluted with N 2 at room temperature was 0.1%. , O 2 : 0.05
%, NO 2: a gas having a 0.05% 500 cc / m
Vent at a flow rate of in (superficial linear velocity 3.89 cm / sec). At this time, as a result of analyzing NF 3 in the gas coming out of the exhaust gas port by gas chromatography, up to 8 hours after aeration,
NF 3 is, of course, NO 2 was detected. Table 1 shows the results
Shown in

【0012】実施例4 4mmφ×4mmHのタブレット形状に形成されている
Feを主体とする鉄系触媒を50g取り、一酸化
炭素雰囲気炉にいれ、昇温し500℃にした状態で、1
00%一酸化炭素を1000cc/minで6時間通気
させて、処理剤中の酸化鉄を一酸化炭素で処理し、処理
剤を活性化させた後、窒素を流して、処理剤を室温まで
冷却させた。この時得られた活性化した処理剤は40.
5gであった。この鉄系触媒は金属鉄と酸化鉄をケイソ
ウ土で固めたもので、金属鉄と酸化鉄を60%含んでい
る。室温まで冷却した処理剤を、空気に触れないように
すみやかにNBOX内に移動し、カラムに25ml充
填した。次に、ガス導入管、排ガス管を備えた除害装置
に移動し、室温においてNで希釈されたNF濃度1
%を有するガスを1500cc/min(空塔線速度1
1.68cm/sec)の流量で通気した。この時、排
ガス口よりでるガス中のNFをガスクロマトグラフで
分析した結果、通気後30分までは、NFは検出され
なかった。結果を表1に示す。
Example 4 50 g of an iron-based catalyst mainly composed of Fe 2 O 3 formed in a 4 mmφ × 4 mmH tablet shape was placed in a carbon monoxide atmosphere furnace, and the temperature was raised to 500 ° C. 1
The iron oxide in the treating agent is treated with carbon monoxide by circulating 00% carbon monoxide at 1000 cc / min for 6 hours to activate the treating agent, and then flowing nitrogen to cool the treating agent to room temperature. I let it. The activated treating agent obtained at this time is 40.
It was 5 g. This iron-based catalyst is obtained by solidifying metallic iron and iron oxide with diatomaceous earth, and contains 60% of metallic iron and iron oxide. The treatment agent cooled to room temperature was immediately transferred into the N 2 BOX without contact with air, and the column was filled with 25 ml. Next, it moved to the abatement apparatus provided with the gas introduction pipe and the exhaust gas pipe, and at room temperature, the NF 3 concentration diluted with N 2 was 1
% Of gas at 1500 cc / min (superficial linear velocity 1
Aeration was performed at a flow rate of 1.68 cm / sec). At this time, as a result of analyzing NF 3 in the gas discharged from the exhaust gas port by gas chromatography, NF 3 was not detected until 30 minutes after the ventilation. Table 1 shows the results.

【0013】実施例5 処理温度を350℃とした以外は、実施例1と同様の方
法で処理した充填カラムを、ガス導入管、排ガス管を備
えた除害装置に移動し、室温においてNで希釈された
NF濃度1%を有するガスを1500cc/min
(空塔線速度11.68cm/sec)の流量で通気し
た。この時、排ガス口よりでるガス中のNFをガスク
ロマトグラフで分析した結果、通気後24分までは、N
が検出されなかった。結果を表1に示す。
Example 5 A packed column treated in the same manner as in Example 1 except that the treatment temperature was set to 350 ° C. was transferred to a detoxification apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and N 2 was added at room temperature. Gas with NF 3 concentration of 1% diluted at 1500 cc / min
(Vent at a linear velocity of 11.68 cm / sec). At this time, NF 3 in the gas coming out of the exhaust gas port was analyzed by gas chromatography, and as a result, N
F 3 is not detected. Table 1 shows the results.

【0014】実施例6 処理温度を900℃とした以外は、実施例1と同様の方
法で処理した充填カラムを、ガス導入管、排ガス管を備
えた除害装置に移動し、室温においてNで希釈された
NF濃度1%を有するガスを1500cc/min
(空塔線速度11.68cm/sec)の流量で通気し
た。この時、排ガス口よりでるガス中のNFをガスク
ロマトグラフで分析した結果、通気後24分までは、N
は検出されなかった。結果を表1に示す。
Example 6 A packed column treated in the same manner as in Example 1 except that the treatment temperature was set to 900 ° C. was transferred to a detoxification apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and N 2 was added at room temperature. Gas with NF 3 concentration of 1% diluted at 1500 cc / min
(Vent at a linear velocity of 11.68 cm / sec). At this time, NF 3 in the gas coming out of the exhaust gas port was analyzed by gas chromatography.
F 3 was not detected. Table 1 shows the results.

【0015】実施例7 Cuを主成分とする還元性金属触媒を、長さ500m
m、内径16.5mmφのステンレス製カラムと両側に
ガス導入管、排ガス管、そしてカラム接続するジョイン
ト、カラムを加熱するためのヒーターを備えた装置を使
用し、このカラムの中央に4mmφ×4mmHのタブレ
ット形状に形成されている処理剤を120mm(25m
l、15.5g)充填し、実施例1の装置を使用し同条
件で処理を行った。この処理した充填カラムを、ガス導
入管、排ガス管を備えた除害装置に移動し、室温におい
てNで希釈されたNF濃度1%を有するガスを15
00cc/min(空塔線速度11.68cm/se
c)の流量で通気した。この時、排ガス口よりでるガス
中のNFをガスクロマトグラフで分析した結果、通気
後24分までは、NFは検出されなかった。結果を表
1に示す。
Example 7 A reducing metal catalyst containing Cu as a main component was used for a length of 500 m.
m, an apparatus equipped with a stainless steel column having an inner diameter of 16.5 mmφ, a gas inlet pipe, an exhaust gas pipe on both sides, a joint for connecting the column, and a heater for heating the column was used. 120 mm (25 m)
l, 15.5 g), and processed under the same conditions using the apparatus of Example 1. The treated packed column is moved to a scrubber equipped with a gas introduction pipe and an exhaust gas pipe, and a gas having a NF 3 concentration of 1% diluted with N 2 at room temperature is supplied to the apparatus.
00cc / min (superficial line velocity 11.68cm / se
Vent at the flow rate of c). At this time, as a result of analyzing NF 3 in the gas discharged from the exhaust gas port by gas chromatography, NF 3 was not detected until 24 minutes after the ventilation. Table 1 shows the results.

【0016】実施例8 Znを主成分とする還元性金属触媒を、長さ500m
m、内径16.5mmφのステンレス製カラムと両側に
ガス導入管、排ガス管、そしてカラム接続するジョイン
ト、カラムを加熱するためのヒーターを備えた装置を使
用し、このカラムの中央に4mmφ×4mmHのタブレ
ット形状に形成されている処理剤を120mm(25m
l、19.3g)充填し、実施例1の装置を使用し同条
件で処理を行った。この処理した充填カラムを、ガス導
入管、排ガス管を備えた除害装置に移動し、室温におい
てNで希釈されたNF濃度1%を有するガスを15
00cc/min(空塔線速度11.68cm/se
c)の流量で通気した。この時、排ガス口よりでるガス
中のNFをガスクロマトグラフで分析した結果、通気
後30分までは、NFは検出されなかった。結果を表
1に示す。
Example 8 A reducing metal catalyst containing Zn as a main component was used for a length of 500 m.
m, an apparatus equipped with a stainless steel column having an inner diameter of 16.5 mmφ, a gas inlet pipe, an exhaust gas pipe on both sides, a joint for connecting the column, and a heater for heating the column was used. 120 mm (25 m)
l, 19.3 g), and the mixture was treated using the apparatus of Example 1 under the same conditions. The treated packed column is moved to a scrubber equipped with a gas introduction pipe and an exhaust gas pipe, and a gas having a NF 3 concentration of 1% diluted with N 2 at room temperature is supplied to the apparatus.
00cc / min (superficial line velocity 11.68cm / se
Vent at the flow rate of c). At this time, as a result of analyzing NF 3 in the gas discharged from the exhaust gas port by gas chromatography, NF 3 was not detected until 30 minutes after the ventilation. Table 1 shows the results.

【0017】比較例1 処理温度を200℃とした以外は、実施例1と同様の方
法で処理した充填カラムを、ガス導入管、排ガス管を備
えた除害装置に移動し、室温においてNで希釈された
NF濃度1%を有するガスを1500cc/min
(空塔線速度11.68cm/sec)の流量で通気し
た。この時、排ガス口よりでるガス中のNFをガスク
ロマトグラフで分析した結果、通気後3分まではNF
は検出されなかった。結果を表1に示す。
Comparative Example 1 A packed column treated in the same manner as in Example 1 except that the treatment temperature was set to 200 ° C. was transferred to a detoxification apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and N 2 was added at room temperature. Gas with NF 3 concentration of 1% diluted at 1500 cc / min
(Vent at a linear velocity of 11.68 cm / sec). At this time, as a result of the NF 3 in the gas exiting from the gas outlet was analyzed by gas chromatograph until 3 minutes after venting NF 3
Was not detected. Table 1 shows the results.

【0018】比較例2 処理温度を1100℃とした以外は、実施例1と同様の
方法で処理した充填カラムを、ガス導入管、排ガス管を
備えた除害装置に移動し、室温においてNで希釈され
たNF濃度1%を有するガスを1500cc/min
(空塔線速度11.68cm/sec)の流量で通気し
た。この時、排ガス口よりでるガス中のNFをガスク
ロマトグラフで分析した結果、通気後12分までは、N
は検出されなかった。結果を表1に示す。
Comparative Example 2 A packed column treated in the same manner as in Example 1 except that the treatment temperature was changed to 1100 ° C., was transferred to an abatement apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and N 2 was added at room temperature. Gas with NF 3 concentration of 1% diluted at 1500 cc / min
(Vent at a linear velocity of 11.68 cm / sec). At this time, NF 3 in the gas coming out of the exhaust gas port was analyzed by gas chromatography.
F 3 was not detected. Table 1 shows the results.

【0019】比較例3 長さ500mm、内径16.5mmφのステンレス製カ
ラムと両側にガス導入管、排ガス管、そしてカラム接続
するジョイント、カラムを加熱するためのヒーターを備
えた装置を使用し、このカラムの中央に4mmφ×4m
mHのタブレット形状に形成されている処理剤を120
mm(25ml、25.5g)充填した。なお、この処
理剤は還元触媒として使用されているニッケル触媒を使
用した。このニッケル触媒は金属ニッケルと酸化ニッケ
ルをケイソウ土で固めたもので、金属ニッケルを55%
含んでいる。処理剤を充填した後、200℃に加熱した
状態でガス導入管より水素を20時間通気させて、処理
剤中の酸化鉄を水素で還元させることにより、処理剤を
活性化させた後、窒素を流して、処理剤を室温まで冷却
させた。この処理した充填カラムを、ガス導入管、排ガ
ス管を備えた除害装置に移動し室温においてNで希釈
されたNF濃度1%を有するガスを1500cc/m
in(空塔線速度11.68cm/sec)の流量で通
気した。この時、排ガス口よりでるガス中のNFをガ
スクロマトグラフで分析した結果、通気後6分までは、
NFは検出されなかった。結果を表1に示す。
Comparative Example 3 An apparatus equipped with a stainless steel column having a length of 500 mm and an inner diameter of 16.5 mmφ, a gas inlet pipe, an exhaust gas pipe on both sides, a joint for connecting the column, and a heater for heating the column was used. 4mmφ × 4m at the center of the column
The treatment agent formed in a tablet shape of mH
mm (25 ml, 25.5 g). The treating agent used was a nickel catalyst used as a reducing catalyst. This nickel catalyst is obtained by solidifying metallic nickel and nickel oxide with diatomaceous earth.
Contains. After filling the treatment agent, the treatment agent is activated by reducing the iron oxide in the treatment agent with hydrogen by passing hydrogen through the gas introduction tube for 20 hours while heating to 200 ° C. To allow the treatment to cool to room temperature. The packed column thus treated is moved to an abatement apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and a gas having a NF 3 concentration of 1% diluted with N 2 at room temperature is supplied at 1500 cc / m 2.
Vent at a flow rate of in (superficial linear velocity 11.68 cm / sec). At this time, NF 3 in the gas coming out of the exhaust gas port was analyzed by gas chromatography.
NF 3 was not detected. Table 1 shows the results.

【0020】比較例4 比較例3と同様の方法で処理した充填カラムを、ガス導
入管、排ガス管を備えた除害装置に移動し室温において
で希釈されたNF濃度0.1%を有するガスを2
700cc/min(空塔線速度21.03cm/se
c)の流量で通気した。この時、排ガス口よりでるガス
中のNFをガスクロマトグラフで分析した結果、通気
後直ちにNFが検出された。結果を表1に示す。
Comparative Example 4 A packed column treated in the same manner as in Comparative Example 3 was transferred to an abatement apparatus equipped with a gas introduction pipe and an exhaust gas pipe, and the NF 3 concentration diluted with N 2 at room temperature was 0.1%. Gas with
700 cc / min (superficial linear velocity 21.03 cm / se
Vent at the flow rate of c). At this time, NF 3 in the gas flowing out from the exhaust gas port was analyzed by gas chromatography, and as a result, NF 3 was detected immediately after ventilation. Table 1 shows the results.

【0021】[0021]

【表1】 [Table 1]

【0022】[0022]

【発明の効果】以上、詳細に説明したように本発明は、
一酸化炭素で活性処理した金属にNF 含有ガスを作用
させて分解するという簡単な方法であるので、NF
有排気ガスをその処理時に水素を添加することなしに分
解処理することができる。しかも、その処理は常温下で
行うことができるので、除害装置全体を簡略化すること
ができるうえ、その取扱いも簡便となり、実用性に優れ
ている。また、触媒単位容積当たりの処理量も多く、有
害な窒素酸化物の除去も可能で有り、広範囲のガス流速
で使用できる。
As described above, the present invention provides:
NF on metal activated with carbon monoxide 3Act on contained gas
NF3Including
Exhaust gas is separated without adding hydrogen during the treatment.
Can be solved. Moreover, the treatment is performed at room temperature
Simplification of the entire abatement system
And its handling is simple and practical.
ing. Also, the amount of treatment per unit volume of catalyst is large, and
Removal of harmful nitrogen oxides is possible, and a wide range of gas flow rates
Can be used with

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI B01J 37/08 B01J 23/74 301A (56)参考文献 特開 平5−261247(JP,A) 特開 平7−171343(JP,A) (58)調査した分野(Int.Cl.7,DB名) B01D 53/34 ────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 Identification symbol FI B01J 37/08 B01J 23/74 301A (56) References JP-A-5-261247 (JP, A) JP-A-7-171343 ( JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) B01D 53/34

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 還元性金属触媒を300〜1000
℃で一酸化炭素を作用させて活性化し、活性化された該
還元性金属触媒に三弗化窒素含有ガスを常温下で接触さ
せることを特徴とする三弗化窒素ガスの除害方法。
1. A reducing metal catalyst comprising 300 to 1000
A method for removing nitrogen trifluoride gas, comprising activating carbon monoxide at a temperature of 0.degree. C. and contacting the activated reducing metal catalyst with a gas containing nitrogen trifluoride at room temperature.
JP32171393A 1993-12-21 1993-12-21 How to remove nitrogen trifluoride gas Expired - Fee Related JP3308365B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32171393A JP3308365B2 (en) 1993-12-21 1993-12-21 How to remove nitrogen trifluoride gas

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Application Number Priority Date Filing Date Title
JP32171393A JP3308365B2 (en) 1993-12-21 1993-12-21 How to remove nitrogen trifluoride gas

Publications (2)

Publication Number Publication Date
JPH07171342A JPH07171342A (en) 1995-07-11
JP3308365B2 true JP3308365B2 (en) 2002-07-29

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146606A (en) * 1999-02-09 2000-11-14 Showa Denko Kabushiki Kaisha Reactive agent and process for decomposing nitrogen fluoride
JP2008207139A (en) * 2007-02-28 2008-09-11 Hitachi Ltd Exhaust gas treatment method and apparatus

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