JP3231964B2 - Manufacturing method of substrate with functional film - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to, for example, a liquid crystal display device,
PCB, thin-film magnetic heads, for various applications such as a solar cell, it relates <br/> the manufacture how functional film-coated substrate having a composite functional film.

[0002]

2. Description of the Related Art FIG. 11 shows a schematic sectional structure of a sealing region of a conventional liquid crystal display device. Here, as an example, S
A TN (Super Twisted Nematic) type color liquid crystal display device is exemplified.

As shown in FIG. 1, a liquid crystal display device comprises a pair of translucent substrates 51 made of soda-lime glass or the like.
The two translucent substrates 51 and 51 are adhered and fixed at the peripheral edge of the substrate via a sealant 57 containing a spacer and a coupling agent. A light-transmitting substrate 51 shown on the lower side in the drawing constitutes a common substrate, and a color filter 52 and a light-shielding film 61 are formed on a surface of the light-transmitting substrate 51 facing the other light-transmitting substrate 51. At the same time, a top coat film (or a protective film) 54 is formed so as to cover it, and furthermore, an ITO
(Indium Tin Oxide) An electrode 55 and an alignment film 56 are sequentially formed. On the other hand, a light-transmitting substrate 51 shown on the upper side constitutes a segment substrate, and an ITO electrode 55, an insulating film 59, and an alignment film are provided on a surface of the light-transmitting substrate 51 facing the other light-transmitting substrate 51. 56 are formed in order. A liquid crystal material 58 is provided in the gap between the two translucent substrates 51.
Are enclosed, and polarizing plates 60 with a retardation plate are adhered to the outer surfaces of the translucent substrates 51, 51, respectively.

In manufacturing such a liquid crystal display device, a color filter 52 and a light shielding film 6 are formed on a light transmitting substrate 51.
In the process of forming the composite functional film comprising No. 1 and JP-A No. 62-247331,
No. 9203, JP-A-5-241013, JP-A-5-21013
-241014, JP-A-5-341113, and JP-A-5-341114.
A self-alignment method (self-alignment method) using backside exposure or backside exposure is used.

FIG. 12 shows a schematic process of forming a composite functional film composed of a color filter 52 and a light-shielding film 61 on a light-transmitting substrate 51 by a self-aligned back exposure method in a manufacturing process of a liquid crystal display element.

First, a process (hereinafter, the process is simply called P
At 101), as shown in FIG.
A color filter 52 that absorbs or blocks ultraviolet light is patterned on a light transmitting substrate 51. An SiO ₂ film, which is an undercoat film, is coated on the translucent substrate 51 as needed. In this case, the color filter 5
When the color filter 52 is formed by an electrodeposition method, it is not necessary when the color filter 52 is formed by a pigment dispersion method using a photosensitive resin or a printing method. It is necessary to form

Next, as shown in FIG. 13B, a photosensitive resin material containing a photosensitive resin composition serving as a light-shielding film is formed on the transparent substrate 51 on which the pattern of the color filter 52 is formed. For example, a photosensitive black ink is arranged by a screen printing method (P102), and prebaking is performed to form a black ink layer 53. The photosensitive resin material selected here is one in which the contained photosensitive resin composition is exposed to ultraviolet light that is shielded or absorbed in the color filter 52. In addition to the photosensitive black ink, the photosensitive resin layer Can be used a black photosensitive colored transfer film provided on a temporary support. In this case, the transparent substrate 5
A film is formed on the light-transmitting substrate 51 by applying pressure and heat by a so-called dry lamination technique by bringing a photosensitive colored transfer film into close contact with a thin layer.

[0008] Next, as shown in FIG. 13 (c), the black ink layer 5 is pressed from the back side of the translucent substrate 51 by a high-pressure mercury lamp.
3 is back-exposed (P103). In this back exposure, the color filter 52 acts as a photomask that absorbs or blocks the light of the high-pressure mercury lamp, and is exposed to the back so that the black ink layer 53 disposed on the color filter 52 is not exposed. Light curing is performed from the side in contact with the substrate 51. Thereby, the black ink layer 53 is formed on the transparent substrate 51.
The farther from the side, the more uncured. (C) of FIG.
In (d) and (e), the degree of cure in the black ink layer 53 is shown in three stages, with the fully cured cured portions being cross-hatched, the half-cured semi-cured portions being hatched, and the uncured portions being hatched. Shown in white.

Next, as shown in FIG. 13 (d), the uncured portion of the black ink layer 53 is removed by development, and further washed and dried (P104 and P105). By this development, the surface 53a of the black ink layer 53 becomes a semi-cured surface that is half-cured.

Thereafter, as shown in FIG. 13E, post-baking is performed by light irradiation or baking (P10).
6). By patterning the black ink layer 53 in this manner, the light shielding film 61 is formed.

Certainly, in such a self-aligned backside exposure system, the color filter 52 is used as a photomask and the space between the color filter 52 and the light-shielding film 61 is different from the case where only the front side exposure is performed. A film can be formed without generating a gap, and a high-precision light shielding film 61 can be formed.
It can be produced economically with simple steps. On the other hand, if the exposure is performed only by the front exposure, if the space between the color filter and the light shielding film is to be filled without gaps, it is necessary to use photolithography or the like, and the process becomes extremely complicated.

By performing back exposure in this manner, even if a chip such as a pinhole is present in the color filter 52 formed earlier, the chipped portion is made of the material of the light shielding film 61. It can also be repaired using black ink.

On the other hand, Japanese Patent Application Laid-Open No. 5-80503 discloses a dry lamination technique in which a photosensitive resin layer of a photosensitive colored transfer film is changed from a temporary support to a permanent support (in the above case, a light-transmitting substrate). When transferring to ()), it can be transferred so that there is no transfer failure caused by minute dust, bubbles, steps on the permanent support, etc., and exhibits excellent peelability with the temporary support, and at the same time, exposure in air The structure of the photosensitive colored transfer film which enables the transfer and the transfer method thereof are disclosed. In other words, in this case, by providing an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order on the temporary support, the adhesive force between the thermoplastic resin layer and the temporary support is improved. Constituting the smallest photosensitive colored transfer film,
After this photosensitive colored transfer film is heated and pressed to a permanent support, it is peeled off at the boundary between the thermoplastic resin layer and the temporary support, and the photosensitive resin layer is interposed between the thermoplastic resin layer and the intermediate layer. Pattern exposure and development to form an image on a permanent support.

In Japanese Patent Application Laid-Open No. 4-323618, a black matrix (light-shielding film) and a color placement portion are formed on a glass substrate, and an aqueous solution of cerium oxide particles is polished with a urethane pad, and the surface thereof is made 5%. There is disclosed a technique for improving the adhesion between a protective film (or a top coat film) made of epoxy and a color placement portion by performing a warm bath treatment in a sodium hydroxide bath having a high concentration.

[0015]

However, the above-described self-alignment back exposure method has many advantages as described above, but is provided so as to cover the light shielding film 61 and the like when a liquid crystal display element is formed. The adhesion between the top coat film (or protective film) 54 and the light shielding film 61 is low,
There is a problem that the seal is easily peeled off at the boundary between the top coat film (or protective film) 54 and the light shielding film 61, and as a result, the reliability of the liquid crystal display element is reduced.

In other words, in such a method, it is necessary to suppress the light amount at the time of back exposure so as not to cause so-called exposure fog, in which the portion up to the black ink layer 53 placed on the color filter 52 is exposed and cured. Therefore, it is not possible to cure the surface of the black ink layer 53 up to the surface side, and as shown in FIG. It is in an uncured state. Then, since the development is performed while the front side is uncured, the surface 53a of the black ink layer 53 exposed by the development (the surface 6a of the light shielding film 61 in FIG.
1a) is such that low molecules such as a photopolymerization initiator and a reactive monomer flow out, and polymers such as a binder easily remain,
As a result, the degree of polymerization or cross-linking is reduced, resulting in a rough film surface. With such a rough film surface, it is difficult to obtain high adhesion with the protective film 54,
It is easy to peel off.

When the black ink layer 53 is exposed and developed only by back exposure as described above, the thickness of the black ink layer 53 is always smaller than the thickness of the black ink layer 53 disposed at the beginning. Therefore, in the conventional method, the only way to obtain a desired film thickness is to control the degree of exposure, and it is necessary to finely adjust the lamp intensity, the exposure time, the amount of the photocuring agent, and the like.

Further, when the light amount is adjusted so as not to cause exposure fog, the portion having the same height as the surface of the color filter 53 is in an uncured or semi-cured state and is removed at the time of development. As a result, FIG. As shown in (e), the thickness of the light shielding film 61 is smaller than that of the color filter 53,
There is a problem that the light-shielding property is reduced and a step is generated between the color filter 53 and the display quality of the liquid crystal display element.

[0019]

In order to solve the above problems BRIEF SUMMARY OF THE INVENTION The method of feature film-coated substrate of the present invention, a phase each pattern of at least two of the functional film has a different function in the same plane In the method of manufacturing a substrate with a functional film having a composite functional film formed continuously, a pattern of a first functional film that absorbs or blocks light of a specific wavelength is formed on a light-transmitting substrate, A photosensitive resin material containing a photosensitive resin composition which is cured by being sensitized to light of the specific wavelength, which is a material of the second functional film, is disposed so as to cover the pattern of the first functional film. While exposing from the back side, at least the region excluding the pattern position of the first functional film, is exposed from the front side, and then developed to form the composite functional film, and from the front side Exposure is separated from translucent substrate Provided that, and is characterized in that performed through a photomask having light shielding portions are formed to have a wider pattern width than the pattern width of the first function film.

Hereinafter, the present invention will be described in detail.

The light-transmitting substrate is not particularly limited as long as it transmits light of a specific wavelength. For example, soda lime glass, low alkali glass (neutral borosilicate glass), non-alkali glass, quartz glass, a transparent ceramic plate, a plastic plate, a plastic film, or the like is preferably used. However, a substrate having a large alkali elution amount needs to form a SiO ₂ film as an undercoat film, and the SiO ₂ film is formed by an evaporation method, a sputtering method,
CVD (Chemical vapor deposition) method or CLD
(Chemical liquid deposition) method.

The light having the above-mentioned specific wavelength may be any of ultraviolet light, visible light, infrared light and a mixture thereof, and is limited by a light source or a filter in some cases. As the type of light source used for the back exposure or the front exposure, a high-pressure mercury lamp including ultraviolet light and visible light (g-line = 436 n
m, h-line = 405 nm and i-line = 365 nm),
A xenon lamp (e-line = 546 nm) containing visible light is used, and an Ar laser of ultraviolet light (351.1 nm) and a He-Cd laser of visible light (44
2 nm) can be used. It is necessary that the peak wavelength of the light source overlaps with the photosensitive wavelength range of the photosensitive resin material used. And specifically H
As a direct exposure apparatus using a laser capable of selecting an e-Cd laser or an Ar laser, there is a laser beam direct drawing apparatus LBDD series manufactured by Hakuto Corporation.

The first functional film that absorbs or blocks light having the specific wavelength described above may be any film that sufficiently absorbs or blocks light having at least the specific wavelength. Such first
Examples of the functional film include a color filter, a dummy color filter, a film thickness adjustment film, a photoresist film, a transparent conductive film, a semiconductor film, an insulating film, an absorption filter, a metal conductive film, a metal reflective film, a multilayer reflective film, and a metal. There are masks and mirrors. The above-mentioned dummy color filters are provided, in addition to the color filters formed in the pixels to be originally illuminated for display, on the periphery of the illuminated pixels for uniformity of display in the display area in some cases. Examples of the color filter forming method include an electrodeposition method with a pattern electrode, an electrodeposition method without a pattern electrode, a pigment dispersion method using a photosensitive resin, a pigment dispersion method using etching, a pigment dispersion film transfer method, a printing method, a dyeing method, and multilayer interference. Any of a film method, a vapor deposition method, a polarizing plate method and the like may be used.

The second functional film formed of the above-mentioned photosensitive resin material includes a visible light shielding film, a colored film, a transparent film, a white diffuse reflection film, and the like.

Other than the above-mentioned first and second functional films formed on the above-mentioned substrate with a functional film, an undercoat film for preventing alkali elution, and a case where the light-transmitting substrate is a plastic or film substrate Gas barrier film, transparent conductive film, metal conductive film, top coat film, insulating film, diffuse reflection film, thin film or thick film such as alignment film or adhesive applied to,
There are components such as LSI, TCP, heater, sensor, and solar cell.

The photosensitive resin material used as the material of the above-mentioned second functional film may be a photo-curing type material which can be patterned by exposure and development. The photosensitive resin composition contained in the photosensitive resin material may be any of a photopolymerization type, a photocrosslinking type, a photodimerization type, and a photomodified type, but a photopolymerization type capable of thickening the photosensitive layer by polymerization and crosslinking. preferable. Also,
The form may be any of a liquid substance and a film.
Photopolymerizable photosensitive resin composition is generally a photopolymerization initiator,
It contains a reactive monomer or binder as a basic component. Examples of the type of the binder include an acrylic resin type and an acrylic / epoxy resin type. Other than the photosensitive resin composition contained in the photosensitive resin material, there are organic pigments and dyes of various colors. Since the surface of the photosensitive resin composition is not cured when oxygen is present in the periphery during photocuring, it is preferable to arrange an oxygen blocking film over the photosensitive resin composition. Recently, there is a case where the oxygen barrier film is not required.

Either of the above-described front exposure and back exposure may be performed first, or may be performed simultaneously. Further, the position of the front exposure and the position of the back exposure do not always need to coincide, and there are various types of exposure positional relationships. That is, when exposing the second functional film containing the photosensitive resin between the patterns of the first functional film that absorbs or blocks light of a specific wavelength or the peripheral portion thereof, for example, (1) both the pattern and the peripheral portion are exposed. Performing front exposure and rear exposure, (2)
For example, only the back exposure is performed between the patterns and a part of the periphery, and the front exposure and the back exposure are performed only on the periphery. In the front exposure, light irradiation may be performed with a high-pressure mercury lamp, a xenon lamp, or the like through a photomask, or patterning exposure may be performed directly with laser light without using a photomask.

As the photomask separated from the light-transmitting substrate used in the front exposure, either a hard mask in which the light-shielding portion is a metal thin film or an emulsion mask in which the light-shielding portion is a silver halide emulsion film is used. However, a hard mask having good patterning characteristics is preferable.

Here, a photomask having a pattern wider than the pattern width of the first functional film is provided in consideration of the positional accuracy of the pattern position. Further, the pattern width of the light-shielding portion formed on the photomask may be designed as wide as possible, and the exposed line width of the surface region may be increased by over-exposure during front exposure.

In the above-mentioned back exposure, at least the first functional film already formed on the translucent substrate is used as a photomask when forming the second functional film. Further, in order to provide a region where the second functional film is not formed (for example, a peripheral portion of the multi-panel glass substrate, a position of an alignment mark of the glass substrate, and a terminal region of the liquid crystal panel), the first functional film is formed.
In addition to the photomask with the functional film, use of a photomask such as a glass mask such as a perforated pattern mask of black antireflection treatment metal or the above-mentioned hard mask which is arranged separately from the translucent substrate, or in advance by a printing method The photosensitive resin material may not be disposed in a region where the second functional film is not formed.

When the photosensitive resin material, which is the material of the second functional film, is placed so as to be substantially equal to the film thickness of the first functional film, if the photosensitive resin material is a film type, the first resin film is used. A film having the same thickness as that used for forming the functional film may be used. In the case of a liquid substance, gravure offset printing, spinner printing, a roll coater method, or the like is preferable for thin printing.

The method of manufacturing a substrate with a functional film according to the present invention comprises a color filter, a channel protective film type inverted staggered TF.
It can be used for various applications such as T-substrate, printed circuit board, printer, sensor, thin-film magnetic head, linear array, solar cell, etc.

[0033]

In the method of manufacturing a substrate with a functional film according to the present invention , a photosensitive resin material containing a photosensitive resin composition, which is a material of a second functional film, is disposed so as to cover a pattern of the first functional film. A back surface using a first functional film as a photomask, which has been conventionally used, in which the photosensitive resin composition is cured by being exposed to light having a wavelength that the first functional film absorbs or blocks when exposed. In addition to the exposure, at least a portion excluding the pattern position of the first functional film is subjected to frontal exposure. Therefore, the second functional film can be formed without using a complicated process such as photolithography by back exposure, and the photosensitive resin material in a region excluding the pattern position of the first functional film is sufficiently cured by front exposure. be able to.

As a result, the film surface of the second functional film exposed when the uncured photosensitive resin material is developed and removed has a photopolymerization initiator or a reactive Low molecules such as monomers do not flow out, and polymers such as binders do not remain, and a smooth surface having a high degree of polymerization or cross-linking can be obtained, and a smooth surface having a high degree of polymerization or cross-linking can be obtained. A composite functional film having a surface is obtained.

In the case of only conventional backside exposure, the thickness of the formed second functional film is necessarily smaller than the thickness of the photosensitive resin material layer disposed first, so that a desired thickness can be obtained. Required fine adjustment of lamp intensity, exposure time, amount of photocuring agent, and the like. Moreover, in the case of conventional back exposure only,
When the amount of light is adjusted so as not to cause exposure fog, the portion of the photosensitive resin material having the same height as the surface of the first functional film is in an uncured or semi-cured state, and is removed at the time of development to remove the film of the second functional film. The thickness is smaller than the thickness of the first functional film. Therefore, for example, when the second functional film is a light-shielding film of a liquid crystal display element, the light-shielding property is reduced or a step is generated between the color filter and the light-shielding film constituting the composite functional film, and the liquid crystal display element The display quality was degraded. However, by incorporating frontal exposure as in the present invention, the surface side is cured and is not removed by development, so such fine adjustment is not required, and the film thickness is adjusted when disposing the photosensitive resin material layer. By simply setting the thickness of the second functional film to a desired thickness and arranging the photosensitive resin material so that the thickness is substantially equal to the thickness of the first functional film, It is possible to form a flat composite functional film having a sufficient thickness and a small thickness difference between the film surface of the first functional film and the film surface of the second functional film.

Further, the exposure from the front side is performed via a photomask which is arranged at a distance from the light-transmitting substrate and has a light shielding portion having a pattern width wider than the pattern width of the first functional film. Therefore, even if the photomask is largely displaced from the pattern of the first functional film, the photosensitive resin material disposed on the first functional film is photopolymerized and the two surfaces slightly overlap each other. Does not occur, and a flat composite function film having no portion in which the second function film is formed on the first function film can be formed. This is particularly effective when the exposure area is small or when the pattern width is relatively large.

[0037]

[Embodiment 1] An embodiment of the present invention will be described below with reference to FIGS. In this embodiment,
The method for manufacturing a substrate with a functional film according to the present invention uses the retardation plate method S
Adopted in the manufacturing process of TN (Super Twisted Nematic) type color liquid crystal display element, in the process of providing a composite functional film consisting of a color filter (first functional film) and a light-shielding film (second functional film) on a translucent substrate An example is shown.

FIG. 2 shows a schematic sectional structure of a seal region of a liquid crystal display element having a substrate with a functional film manufactured by the method for manufacturing a substrate with a functional film according to the present invention. The liquid crystal display element has a pair of translucent substrates (hereinafter simply abbreviated as substrates) 1.1 made of soda lime glass or the like. The polarizing plates with plates 10 are attached, and a liquid crystal material 8 is sandwiched between the substrates. A light-transmitting substrate 1 shown on the lower side in the drawing constitutes a common substrate, and an undercoat film (not shown) and a color filter (not shown) are provided on a surface of the light-transmitting substrate 1 facing the other light-transmitting substrate 1. 2 and a light-shielding film 3, a top coat film (or a protective film) 4 is formed so as to cover them, and an ITO (Indium Tin Oxide) electrode 5, which is a common electrode, and an alignment film 6
Are formed in order. On the other hand, the transparent substrate 1 shown on the upper side
Constitutes a segment substrate, and an undercoat film (not shown), an ITO pattern electrode 5 as a segment electrode, an insulating film 9, are provided on a surface of the light-transmitting substrate 1 facing the other light-transmitting substrate 1. An alignment film 6 is formed in order. These two translucent substrates 1 1 and 1 are adhered and fixed at their peripheral portions by a sealing agent 7 in which a spacer and a coupling agent are mixed, and a cross section of a sealing portion region to which the sealing agent 7 is applied. The configuration includes, from the common side, a light-transmitting substrate 1, a light-shielding film 3, a top coat film 4, a sealant 7, and a light-transmitting substrate 1.

The surface 3a of the light-shielding film 3 on the side of the top coat film 4 is formed by adopting a step of exposing from the front as described later, thereby obtaining a smooth surface having a high polymerization density or a high crosslinking density. As a result, this liquid crystal display element has high reliability without peeling off the seal.

First, an outline of a manufacturing process of a liquid crystal display device having such a configuration will be described with reference to FIG. Each surface of the pair of light-transmitting substrates 1 is polished to form an SiO ₂ film as an undercoat film on one surface (P1), and an undercoat film is formed on one of the light-transmitting substrates 1 A color filter 2 having a thickness of 1.5 μm is formed on the surface (P2). Subsequently, a light-shielding film 3 having a thickness of 1.5 μm is formed excluding a predetermined region between the color filters 2 and a peripheral portion of the substrate. Yes (P
3). Next, a top coat film (or protective film) 4 made of an acrylic resin is formed on the entire surface of the substrate so as to cover the color filter 2 and the light shielding film 3 (P4), and an ITO pattern electrode serving as a common electrode is further formed thereon. 5. A polyimide film as the alignment film 6 is formed in order (P5 and P6). Thereafter, a rubbing treatment is performed on the polyimide film (P7) to complete the common substrate.

On the other hand, an ITO pattern electrode 5 serving as a segment electrode is formed on the undercoat film forming surface of the other translucent substrate 1 (P10), and an insulating film 9 of silicon-titanium mixture is formed thereon. An oxide is formed (P11). Further, a polyimide film as the alignment film 6 is formed thereon (P12), and a rubbing process is performed on the polyimide film in the same manner as the common substrate (P13) to complete the segment substrate.

When the common substrate and the segment substrate are completed in this way, a two-pack type epoxy resin as the sealing agent 7 is applied to the periphery of the display area on the electrode forming surface of each translucent substrate 1.1. Except for the injection port, it is formed by heating and pressing (P8, P14), and the translucent substrates 1.1 on the common side and the segment side are bonded together (P15). In this case,
The sealant 7 may be formed on either the common side or the segment side.

Thereafter, the cell is filled with the liquid crystal material 8 from the injection port, and the injection port is sealed (P16).
The polarizers 10 with a retardation plate are adhered to the outer surface of No. 1 (P17). Thus, a liquid crystal display element is completed.

Next, the color filter 2 is formed on the common-side light-transmitting substrate 1 by using the method for manufacturing a substrate with a functional film of the present invention.
P2 and P3 in the process diagram of FIG. 3 for forming a composite functional film composed of the light-shielding film 3 will be described in detail with reference to FIGS.

First, as shown in FIG. 1A, a red, green and blue film having a thickness of about 1.5 μm is formed on a light-transmitting substrate 1 on which an undercoat film (not shown) is formed by electrodeposition. The color filters 2 are formed in a stripe shape (P21). Here, first, an ITO electrode for each color (not shown) is patterned and formed in a stripe shape on the translucent substrate 1, a red filter is formed on the ITO electrode for red by an electrodeposition method, and then green. A color filter and a blue color filter are similarly formed. The pattern width of the color filter 2 of each color is 75 μm and the pattern gap of each color is 25 μm. (The technique of forming a color filter by the electrodeposition method used here is described in the document “Color filter production for liquid crystal panels”. Technology ”(triceps, 1991.12.1
8, p113-p127)).

Next, as shown in FIG. 1B, a photosensitive black ink color mosaic CK (Fuji Hunt Co.), which is a negative photosensitive resin material, is formed on the transparent substrate 1 on which the color filter 2 is formed. Electronics Technology Co., Ltd.) with a thickness of 1.5 μm by spinner method (P
22). Then, pre-bake at 100 ° C for 5 minutes (P2
3), a black ink layer 11 is formed.

Next, as shown in FIG. 1C, the black ink layer 11 was coated with a color filter 2 having a pattern width of 75 μm.
Through a photomask 20 having a chrome film pattern (light shielding portion) 20a having a width of 85 μm, which is slightly wider than m, front exposure is performed using an unshown ultra-high pressure mercury lamp (P24).
The exposure condition at this time is 200 mj / cm for i-line and h-line.
² By this front exposure, each color filter 2.
The black ink layer 11 between the two is photo-cured except for the area adjacent to the color filter 2. In the figure, the hardened portions are shown by cross hatching, and the uncured portions are shown by white outlines.

Next, as shown in FIG. 1D, the black ink layer 11 is exposed from the back surface of the translucent substrate 1 using the same ultra-high pressure mercury lamp as in the case of front exposure (P25). The amount of light irradiation here is such that exposure fog does not occur,
It is 50 mj / cm ² which is smaller than in the case of front exposure.
By this back exposure, the black ink layer 11 in the area where the color filter 2 is not formed is cured in order from the light transmitting substrate 1 side. At this time, each color filter 2 masked by the photomask 20 in the front exposure is used.
The area adjacent to the color filter 2 between them is also newly photo-cured. The surface side of the black ink layer 11 in the adjacent area is
It becomes an uncured state or a semi-cured state, and this portion is indicated by hatching in the figure.

When the exposure is completed, a color mosaic developer CD is used as a developer as shown in FIG.
The black ink layer 11 is developed using (manufactured by Fuji Hunt Electronics Technology) (P26). By this development, the uncured black ink layer 11 on the color filter and the black ink layer 1 in the area adjacent to the color filter
At least those in the uncured state in the surface area are removed.

Thereafter, it is washed with water and dried (P27), and is further subjected to post-baking at 220 ° C. for 1 hour (P2).
8). As a result, as shown in FIG. 2F, the black ink layer 11 is patterned into a desired shape, and the light shielding film 3 is formed.
Is formed.

FIG. 5 shows the surface 3a of the thus formed light-shielding film 3 in contact with the top coat film (or protective film) 4.
The state of is shown. In this case, portions that are sufficiently cured by exposure and have a high degree of polymerization or crosslinking are indicated by cross-hatching, and portions that are insufficiently cured by exposure and have a low degree of polymerization or crosslinking are indicated by hatching. As can be seen from the figure, in the case of the common substrate of the present embodiment, the surface 3a of the light-shielding film 3 is a smooth surface having a high degree of polymerization or cross-linking except for the periphery of the color filter 2.

As described above, in the manufacturing process of the liquid crystal display device of the present embodiment, the case where the black ink layer 11 disposed so as to cover the color filter 2 is exposed to form the light shielding film 3 is conventionally performed. In addition to back exposure using the color filter 2 as a mask, front exposure is performed via a photomask 20. Therefore, the light-shielding film 3 can be formed without a gap between the color filter 2 and the color filter 2 by the back exposure without going through a complicated process, and the portion excluding the pattern position of the color filter 2 by the exposure from the front. Can be sufficiently cured. Thereby, when the uncured portion of the black ink layer 11 on the color filter 2 is developed and removed, low molecules such as a photopolymerization initiator and a reactive monomer flow out from the film surface 3a of the light shielding film 3, The film surface 3a can be a smooth surface having a high degree of polymerization or cross-linking without leaving a polymer such as a binder. And
As described above, since the boundary surface between the light-shielding film 3 and the top coat film 4 becomes a smooth surface, the adhesion between the light-shielding film 3 and the top coat film 4 is improved. Has high reliability, which is excellent in impact resistance, high temperature and high humidity resistance without peeling of the seal as described above.

Further, in the case of the conventional exposure only from the back side,
The thickness of the formed light-shielding film 3 is necessarily smaller than the thickness of the black ink layer 11 disposed first, and in order to obtain a desired thickness,
Fine adjustments such as lamp intensity, exposure time, and photo-curing agent amount were required. However, since the front side is not removed by development by the frontal exposure, the black ink is applied with the same thickness as the color filter 2, so that the lamp intensity, the exposure time, the amount of the photocuring agent, etc. The light-shielding film 3 having the same thickness (1.5 μm) as the color filter 2 can be easily formed without the need for fine adjustment. As a result, in the liquid crystal display element in which the light shielding film 3 is formed as described above, the process of forming the light shielding film 3 does not require detailed condition adjustment or the like, and can reduce the manufacturing cost.

In the case of the conventional backside exposure alone, if the light amount is adjusted so as not to cause exposure fog, the portion at the same height as the film surface of the color filter 2 becomes uncured or semi-cured, and is removed during development. As a result, the thickness of the light-shielding film 3 becomes thinner than that of the color filter 2, and the light-shielding property of the light-shielding film 3 is reduced, and a step is generated between the light-shielding film 3 and the color filter 2, so that the liquid crystal display element has Although the display quality has been reduced, such a problem is solved, and the light-shielding film 3 having excellent light-shielding properties is obtained, and the thickness difference is eliminated.

Further, at the time of the front exposure, the front exposure was performed on the translucent substrate 1 through the photomask 20 having the chrome film pattern 20a having a width of 85 μm, which is slightly wider than the pattern width of the color filter 2 of 75 μm. Therefore, even if the photomask slightly shifts during exposure, a flat composite function film can be formed without forming the light shielding film 3 on the color filter 2.

As described above, in the present embodiment, the light-shielding property of the light-shielding film 3 is improved, and a flat composite function film with a small step is formed between the color filter 2 and the light-shielding film 3. Even with the configuration via the film 4, the display quality of the liquid crystal display element is improved.

In this embodiment, when the black ink layer 11 is exposed, the amount of light irradiation in the front exposure is larger than that in the back exposure, and the unmasked portion of the black ink layer 11 is sufficiently removed from the front. To be cured. Therefore, this portion has a sufficiently high degree of polymerization or cross-linking, and is less susceptible to changes in the subsequent development step. Note that the black ink layer 11 in the portion in contact with the color filter 2 is cured by back exposure with a light irradiation amount that does not cause exposure fog, but this portion is a portion in contact with the color filter 2. Since this is different from the seal area A as shown in FIG. 5, this does not cause peeling of the seal.

Even if the color filter 2 has a hole such as a pinhole, the portion can be repaired because it is filled with black ink and cured by back exposure to fill the hole.

In this embodiment, a two-pack type epoxy resin is used as the sealant 7. However, as the sealant 7, a one-pack type thermosetting resin, a two-pack type thermosetting resin, a photo-setting resin is used. There are epoxy resin, phenol resin, acrylic resin and the like as the material.

The above-mentioned top coat film 4 (or protective film)
Also, besides the epoxy resin, an organic film such as an acrylic resin, a polyimide resin, or a silicone resin may be used, or an inorganic film such as a SiO ₂ , Si ₃ N _4, or Si—Ti oxide film may be used. May be stacked.

In this embodiment, the phase difference plate system S
Although an example in which the present invention is applied to the manufacturing process of a TN (Super Twisted Nematic) type color liquid crystal display device has been described, the present invention is not limited to this embodiment.
Two-layer STN color liquid crystal display device, SSFLC color liquid crystal display device, antiferroelectric liquid crystal color liquid crystal display device, TN color liquid crystal display device, two-terminal device color liquid crystal display device, or three-terminal device color The present invention can be applied to a manufacturing process of a liquid crystal display element and the like, and also applicable to various uses such as a printed circuit board, a thin film magnetic head, and a solar cell.

Comparative Example 1 Here, a comparative example of the above-mentioned Example 1 will be described.

First, color filters of each color are formed in stripes on a light-transmitting substrate serving as a common substrate in the same manner as in Example 1 by electrodeposition. The same color mosaic CK as in Example 1 was used as a negative photosensitive black ink on the substrate by spinner method and prebaked at 100 ° C. for 5 minutes to form a black ink layer. Then, from the back of the translucent substrate, using an ultra-high pressure mercury lamp, 50 mj / c
Exposure is performed at m ² , and the black ink layer in a portion where there is no color filter is photo-cured in order from the light-transmitting substrate side. afterwards,
The uncured black ink layer on each color filter and at least the uncured black ink layer between the color filters are removed with the same developer CD as described above. Thereafter, the substrate is washed with water, dried, and post-baked at 220 ° C. for 1 hour to form a light-shielding film.

FIG. 14 is a plan view of the common substrate. In the figure, the portion of the light-shielding film 61 that is in contact with the top coat film (or the protective film) and that has not been sufficiently cured by light exposure and has a low degree of polymerization or cross-linking is indicated by hatching. As described above, in the case of the common substrate of this comparative example, the entire surface 61a of the light-shielding film 61 including the seal region B has a low degree of polymerization or crosslinking, and is rough. Moreover, the film thickness is about 1.2 μm,
It was thinner than 1.5 μm of the color filter 52, had a film thickness step with the color filter 52, and was inferior in light-shielding properties.

Then, according to the first embodiment, a phase difference plate type STN type color liquid crystal display element was manufactured.
In this liquid crystal display element, seal peeling occurred between the light-shielding film 61 and the top coat film (or the protective film), resulting in poor reliability.

Embodiment 2 Another embodiment of the present invention will be described below with reference to FIGS. 2, 3 and 6. For convenience of explanation, members having the same functions as the members shown in the first embodiment are denoted by the same reference numerals, and description thereof will be omitted.

In this embodiment, as in the first embodiment, the method of manufacturing a substrate with a functional film of the present invention is applied to a process of manufacturing an STN type color liquid crystal display device with a retardation plate on a light-transmitting substrate. An example in which the method is adopted in a step of providing a composite functional film of a color filter (first functional film) and a light-shielding film (second functional film) will be described.

The schematic cross section of the sealing region of the liquid crystal display element having the substrate with a functional film manufactured by the method for manufacturing a substrate with a functional film of this embodiment has the same configuration as that of FIG. In the case of the present embodiment, the surface 3a of the light-shielding film 3 on the side of the top coat film 4 is polished after the post-baking and subjected to an alkali treatment, so that a smoother surface than in the case of the first embodiment is obtained. Has become.

That is, in this embodiment, as shown in FIG. 6, the same steps as in the above embodiment are performed from P21 to P28, post-baking is performed, and then an aqueous solution of cerium oxide particles is polished with a urethane pad (FIG. 6). P29), the surface thereof is subjected to an alkali treatment by a warm bath treatment in a 5% concentration sodium hydroxide bath (P30).

As a result, the adhesion between the top coat film 4 which is an epoxy resin and the light shielding film 3 is further improved,
Adhesion increased.

Then, the process of forming the color filter 2 and the light-shielding film 3 shown in FIG. 6 was adopted in P2 and P3 in the process diagram of FIG. 3 shown in the first embodiment to form a liquid crystal display element. It was possible to prevent the peeling of the seal (for details of the polishing and alkali treatment techniques, refer to the above-mentioned publication).

[Comparative Example 2] Here, a comparative example of the above-mentioned Example 2 will be described.

The same polishing step and alkali treatment step as those in Example 2 were adopted in the step of forming the light-shielding film in Comparative Example 1 to form an STN type color liquid crystal display device with a retardation plate. In this liquid crystal display element, the peeling of the seal was certainly less likely to occur than in Comparative Example 1, but the peeling of the seal was also likely to occur.

Embodiment 3 Another embodiment of the present invention will be described below with reference to FIGS. 2, 3, 7 and 9. For the sake of convenience, members having the same functions as those described in the first and second embodiments are denoted by the same reference numerals, and description thereof is omitted.

In this embodiment, as in the first embodiment, the method for manufacturing a substrate with a functional film of the present invention is applied to a process for manufacturing an STN type color liquid crystal display device with a retardation plate on a light-transmitting substrate. An example in which the method is adopted in a step of providing a composite functional film of a color filter (first functional film) and a light-shielding film (second functional film) will be described.

The schematic cross section of the sealing region of the liquid crystal display device having the substrate with a functional film manufactured by the method for manufacturing a substrate with a functional film of this embodiment has the same configuration as that of FIG.

However, what differs from the first embodiment is that
Instead of forming the color filter 2 by the electrodeposition method as described above, the photosensitive color transfer film of each color is pressed and transferred by a dry lamination technique in which the film is brought into close contact with the translucent substrate 1 and laminated. It is formed by exposing and developing by a photolithography method. Similarly, using a black photosensitive colored transfer film as a photosensitive resin material, a light shielding film 3 is formed.
Is formed.

Although the structure of the photosensitive colored transfer film is not particularly shown, an acrylic thermoplastic resin layer for avoiding bubbles during transfer is provided on a temporary support of a polyethylene terephthalate film. A water-soluble polymer-based intermediate layer as a barrier layer for preventing diffusion of oxygen and preventing the thermoplastic resin layer and the photosensitive resin layer from being mixed with each other, a red or green or blue pigment, and an acrylate monomer A colored layer containing an acrylic resin-based binder is formed, and the uppermost portion is formed of a polyolefin-based cover film.

The process of forming a composite function film composed of the color filter 2 and the light-shielding film 3 on the light-transmitting substrate 1 in this embodiment will be described with reference to FIGS.

First, as shown in FIG. 7A, a silane coupling agent (Shin-Etsu Chemical: KBM-60) was placed on a translucent substrate 1 coated with an SiO ₂ film as an undercoat film.
3) After performing a 1% aqueous solution treatment, the photosensitive colored transfer film is pressure-transferred by a so-called dry lamination technique in which the photosensitive colored transfer film is brought into close contact with the light-transmitting substrate 1 and laminated.
Then, by exposure and development by the photography method,
Color filter 2 is mosaic red, green, blue,
It is formed with a film thickness of about 1.8 μm (P41).

Here, first, a red color filter and a film thickness adjustment film existing in the terminal area of the liquid crystal panel are formed with a red film, then a green color filter is formed with a green film, and finally a blue color filter is formed. A blue color filter is formed from the film. The pattern size of each color forming the mosaic is 275 μm long and 75 μm wide, and the pattern gap of each color is 25 μm wide.

Next, as shown in FIG. 7 (b), a black photosensitive colored transfer film of the same form as above is used on the transparent substrate 1 on which the color filter 2 is formed, and a cover film is formed. Is removed, and transferred by applying pressure and heat by a laminator (not shown) (P42). When the black film layer 25 is thus formed on the translucent substrate 1, the temporary support in the black film layer 25 is peeled off at the interface between the temporary support and the thermoplastic resin layer, and the temporary support is removed. Yes (P
43).

Next, as shown in FIG. 7C, the pattern of the color filter 2 formed on the light-transmitting substrate 1 is used as a photomask, and the terminal region 32 of the liquid crystal panel (FIG.
And a photomask 22 for masking the periphery of the multi-piece translucent substrate 1 so that the peripheral edge of the translucent substrate 1 is not irradiated with light. Back exposure at 30 mj / cm ² (P4
4). Thereby, the black film layer 25 between the color filters 2 is light-cured from the light-transmitting substrate 1 side. At this time, the black film layer 25 on the color filter 2
In the uncured state, the surface region of the black film layer 25 between the color filters 2 is in an uncured state or a semi-cured state.

Then, as shown in FIG. 7D, a black film layer 25 having a thermoplastic resin layer and an intermediate layer laminated thereon is formed.
Is formed through a photomask 23 on which a chromium film pattern 23a is formed so that light is not irradiated to the formation region of the color filter 2, the terminal region of the liquid crystal panel, and the periphery of the multi-piece translucent substrate 1. Using a super-high pressure mercury lamp (not shown), front exposure is performed at 200 mj / cm ² , and the black film layer 25 existing on the periphery of the color filter 2 forming region including the sealing region is light-cured (P45). in this case,
The black film layer 25 existing between the color filters 2 is not irradiated with light. Thereafter, the thermoplastic resin layer and the intermediate layer provided on the surface side of the black film layer 25 are removed with a 1% aqueous solution of triethanolamine (P46).

Then, as shown in FIG. 7E, the remaining black colored layer of the black film layer 25 is developed with a 1% aqueous solution of sodium carbonate (P47). Thereby, the uncured black colored layer on the color filter 2 and the color filter 2
At least the uncured state in the surface region of the black colored layer is removed in the adjacent region of. Then, after washing with water and drying (P48), light irradiation from both sides of 1000 mj / cm ² and post-baking of baking at 220 ° C. for 1 hour are performed (P49). As a result, as shown in FIG. 7F, the photosensitive black transfer film was used as the material, and the film thickness was about 1.
A light-shielding layer 3 having a surface 3a having a smooth front exposure area of 8 μm was formed.

FIG. 9 shows the surface 3a of the thus formed light-shielding film 3 in contact with the top coat film (or protective film) 4.
The state of is shown. In this case, portions that are sufficiently cured by exposure and have a high degree of polymerization or crosslinking are indicated by cross-hatching, and portions that are insufficiently cured by exposure and have a low degree of polymerization or crosslinking are indicated by hatching. As can be seen from the figure, in the case of the common substrate of this embodiment, the surface 3a of the light-shielding film 3 is entirely overlapped with the peripheral portion including the seal region A except for the space between the color filters 2. It has a smooth surface with a high degree or degree of crosslinking.

Then, the process of forming the color filter 2 and the light-shielding film 3 shown in FIG. 8 was incorporated into P2 and P3 in the process chart of FIG. 3 shown in the first embodiment to form a liquid crystal display element. Peeling could be eliminated (for details of the dry lamination technique, see the above-mentioned publications).

[Comparative Example 3] Here, a comparative example of the above-mentioned Example 3 will be described.

First, on a translucent substrate serving as a common substrate,
In the same manner as in Example 3, a red, green, and blue color filter of about 1.8 μm for each color is formed in a mosaic pattern on the photosensitive colored transfer film by a transfer method. On the light-transmitting substrate on which the color filter was formed, transfer was performed using a photosensitive black film in the same manner as in Example 3, the temporary support was removed, and a thermoplastic resin layer, an intermediate layer, A black coloring layer is formed over the light-transmitting substrate. Thereafter, light is irradiated from the back of the translucent substrate using a super-high pressure mercury lamp at 30 mj / cm ² .
With this operation, the photosensitive black film between the color filters is light-cured from the light-transmitting substrate side. In this state, the photosensitive black film on the color filter is in an uncured state. The surface region of the black colored layer between the color filters is in an uncured state or a semi-cured state.
After development, it is manufactured in the same manner as in Example 3.

FIG. 15 is a plan view of the common substrate. In the figure, the portion of the light-shielding film 61 that is in contact with the top coat film (or the protective film) and that has not been sufficiently cured by light exposure and has a low degree of polymerization or cross-linking is indicated by hatching. As described above, in the case of the common substrate of this comparative example, the entire surface 61a of the light-shielding film 61, which is the colored layer remaining after the development, including the sealing region B, has a low degree of polymerization or crosslinking, and is rough. Moreover, the film thickness was about 1.2 μm, which was thinner than the color filter 52 of 1.5 μm, and had a film thickness step with the color filter 52 and was inferior in light-shielding properties.

Then, according to the first embodiment, a phase difference plate type STN type color liquid crystal display element is manufactured.
In this liquid crystal display element, seal peeling occurred between the light-shielding film 61 and the top coat film (or the protective film), resulting in poor reliability.

[Embodiment 4] Another embodiment of the present invention will be described below with reference to FIGS. For convenience of explanation,
Members having the same functions as those described in the first, second, and third embodiments are denoted by the same reference numerals, and description thereof will be omitted.

In this embodiment, as in the case of the third embodiment, the method of manufacturing a substrate with a functional film of the present invention is applied to a process of manufacturing an STN type color liquid crystal display device with a retardation plate on a light-transmitting substrate. An example in which the method is adopted in a step of providing a composite functional film of a color filter (first functional film) and a light-shielding film (second functional film) will be described.

The schematic cross section of the sealing region of the liquid crystal display element having the substrate with a functional film manufactured by the method of manufacturing a substrate with a functional film of this embodiment has the same configuration as that of FIG. In the case of the third embodiment, the surface 3a of the light shielding film 3 on the side of the top coat film 4 is polished after post-baking and subjected to an alkali treatment in the same manner as in the second embodiment. Further, the surface is smoother.

That is, in this embodiment, as shown in FIG. 10, the same steps as those of the third embodiment are performed from P41 to P49, and after post-baking, the cerium oxide particle aqueous solution is polished with a urethane pad. (P50),
The surface is subjected to a warm bath treatment in a 5% concentration sodium hydroxide bath to carry out an alkali treatment (P51).

Thus, as in the case of the second embodiment, the adhesion between the top coat film (or the protective film) 4, which is an epoxy resin, and the light-shielding film 3 is further improved, and the adhesion is increased. .

Then, the process of forming the color filter 2 and the light-shielding film 3 shown in FIG. 10 was incorporated into P2 and P3 in the process diagram of FIG. 3 shown in the first embodiment to form a liquid crystal display element. Seal peeling could be prevented.

Comparative Example 4 Here, a comparative example of the above-mentioned Example 4 will be described.

The same polishing step and alkali treatment step as those in Example 4 were adopted in the step of forming the light-shielding film in Comparative Example 3 to form an STN-type color liquid crystal display element with a retardation plate. In this liquid crystal display element, the peeling of the seal was certainly less likely to occur as compared with Comparative Example 3, but the peeling of the seal was also likely to occur.

Finally, Table 1 shows the results of comparing the sealing strengths in the above example and the respective comparative examples.

[0101]

[Table 1]

[0102]

As is evident from the foregoing description, the manufacturing method of the feature-film-coated substrate of the present invention, each pattern of at least two of the functional film is formed continuously in the same plane composite having different functions In the method of manufacturing a substrate with a functional film having a functional film, a pattern of a first functional film that absorbs or blocks light of a specific wavelength is formed on a light-transmitting substrate, and then the pattern of the first functional film is covered. A photosensitive resin material containing a photosensitive resin composition that is hardened by being exposed to light having the specific wavelength, which is a material of the second functional film, is arranged, and while the photosensitive resin material is exposed from the back side, At least a region excluding the pattern position of the first functional film is exposed from the front side and then developed to form the composite functional film, and the exposure from the front side is separated from the light-transmitting substrate. Arranged, and
This is performed via a photomask on which a light shielding portion having a pattern width wider than the pattern width of the first functional film is formed.

According to the above configuration, the second functional film can be formed without using complicated steps such as photolithography by back exposure, and the photosensitivity of the area excluding the pattern position of the first functional film by front exposure. The resin material can be sufficiently cured.

As a result, the film surface of the second functional film exposed when the uncured photosensitive resin material is developed and removed has a photopolymerization initiator or a reactive Low molecules such as monomers do not flow out, and polymers such as binders do not remain. There is an effect that a composite functional film having a surface can be obtained.

Also, by incorporating the front exposure as in the present invention, the surface side is cured and is not removed by development, so that the film thickness is adjusted at the time of disposing the photosensitive resin material layer without requiring fine adjustment. only briefly with the film thickness of the second function film can be set to a desired thickness, to place the photosensitive resin material as the film thickness thereof becomes substantially equal to the thickness of the first functional layer lever This has the effect that a flat composite function film having a sufficient thickness and having a small thickness difference between the film surface of the first function film and the film surface of the second function film can be formed.

Further, even if the photomask is largely displaced from the pattern of the first functional film, the photosensitive resin material disposed on the first functional film is subjected to photopolymerization, so that both surfaces slightly overlap each other. Does not occur, the first
There is an effect that a flat composite function film can be formed without forming the second function film on the function film.

[Brief description of the drawings]

FIGS. 1A to 1F show a manufacturing process of a substrate with a functional film according to an embodiment of the present invention. FIGS. FIG. 3 is a schematic cross-sectional view showing a step of forming a composite function film including a color filter and a light-shielding film.

FIG. 2 is a schematic cross-sectional view of a main part of a sealing region of a liquid crystal display element in all examples of the present invention.

FIG. 3 is a schematic manufacturing process diagram of a liquid crystal display element in all examples of the present invention.

FIG. 4 is a process chart for forming a composite functional film composed of a color filter and a light-shielding film on a light-transmitting substrate serving as a common substrate of the liquid crystal display element according to each schematic cross-sectional view shown in FIG.

FIG. 5 is a plan view of a common substrate of the liquid crystal display element manufactured by the steps shown in FIGS. 1 and 4, and the light-shielding film is indicated by cross-hatching when the degree of polymerization or cross-linking on the surface is high. When the degree of polymerization or degree of cross-linking of the surface is low, it is indicated by hatching.

FIG. 6 shows another method for manufacturing a substrate with a functional film of the present invention, in which a composite functional film composed of a color filter and a light-shielding film is formed on a light-transmitting substrate serving as a common substrate of a liquid crystal display element. It is a process drawing.

7 (a) to 7 (f) show a manufacturing process of a substrate with a functional film according to another embodiment of the present invention. FIGS. 7 (a) to 7 (f) show a process on a light-transmitting substrate serving as a common substrate of a liquid crystal display element. FIG. 4 is a schematic cross-sectional view showing a step of forming a composite function film including a color filter and a light-shielding film.

FIG. 8 is a process chart of forming a composite functional film including a color filter and a light-shielding film on a light-transmitting substrate serving as a common substrate of a liquid crystal display element according to the schematic cross-sectional views shown in FIG. .

FIG. 9 is a plan view of a common substrate of the liquid crystal display element manufactured by the steps shown in FIGS. 7 and 8, and the light-shielding film is indicated by cross-hatching when the degree of polymerization or cross-linking on the surface is high. When the degree of polymerization or degree of cross-linking of the surface is low, it is indicated by hatching.

FIG. 10 shows another method of manufacturing a substrate with a functional film according to the present invention, in which a composite functional film composed of a color filter and a light-shielding film is formed on a light-transmitting substrate serving as a common substrate of a liquid crystal display element. It is a process drawing.

FIG. 11 is a schematic cross-sectional view of a principal part of a seal region of a liquid crystal display element having a common substrate on which a composite functional film including a color filter and a light shielding film has been formed through a conventional manufacturing process.

FIG. 12 is a conventional process diagram for forming a composite functional film including a color filter and a light-shielding film on a light-transmitting substrate serving as a common substrate of a liquid crystal display element.

FIGS. 13A to 13E are cross-sectional views showing a conventional process for forming a composite functional film including a color filter and a light-shielding film on a light-transmitting substrate serving as a common substrate of a liquid crystal display element. It is a schematic diagram.

FIG. 14 is a plan view of a common substrate of a liquid crystal display element manufactured according to the process of Comparative Example 1. In the light-shielding film, portions of the surface having a low degree of polymerization or cross-linking are indicated by hatching.

FIG. 15 is a plan view of a common substrate of a liquid crystal display element manufactured according to the process of Comparative Example 3. In the light-shielding film, portions of the surface having a low degree of polymerization or cross-linking are indicated by hatching.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 translucent substrate 2 color filter (first functional film) 3 light-shielding film (second functional film) 4 top coat film 5 ITO pattern electrode 6 alignment film 7 sealant 8 liquid crystal material 9 insulating layer 11 black ink layer (photosensitive 20 Photomask 20a Light-shielding portion pattern 25 Black film layer (photosensitive resin material)

Claims (1)

(57) [Claims] In a method of manufacturing a substrate with a functional film having a composite functional film in which patterns of at least two types of functional films having different functions are continuously formed on the same surface, light having a specific wavelength is provided. After a pattern of a first functional film that absorbs or blocks light is formed on a light-transmitting substrate, it is exposed to light of the specific wavelength, which is a material of the second functional film, so as to cover the pattern of the first functional film. A photosensitive resin material containing a photosensitive resin composition that cures and is disposed, and the photosensitive resin material is exposed from the back side, while at least a region excluding the pattern position of the first functional film is exposed from the front side. And then developing to form the composite functional film, wherein the exposure from the front side is disposed separately from the light-transmitting substrate,
And a method of manufacturing a substrate with a functional film, wherein the method is performed via a photomask on which a light shielding portion having a pattern width wider than the pattern width of the first functional film is formed.