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JP3185600B2 - Solder layer - Google Patents

Solder layer

Info

Publication number
JP3185600B2
JP3185600B2 JP09533995A JP9533995A JP3185600B2 JP 3185600 B2 JP3185600 B2 JP 3185600B2 JP 09533995 A JP09533995 A JP 09533995A JP 9533995 A JP9533995 A JP 9533995A JP 3185600 B2 JP3185600 B2 JP 3185600B2
Authority
JP
Japan
Prior art keywords
solder
improving layer
wettability
layer
test piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP09533995A
Other languages
Japanese (ja)
Other versions
JPH08290288A (en
Inventor
輝 中西
一明 柄澤
俊也 赤松
浩三 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP09533995A priority Critical patent/JP3185600B2/en
Publication of JPH08290288A publication Critical patent/JPH08290288A/en
Application granted granted Critical
Publication of JP3185600B2 publication Critical patent/JP3185600B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電子部品や半導体部品の
配線接続に使用する無鉛はんだに関する。はんだ(Sold
er) は融点が450 ℃以下のろう(鑞)付け用の合金を指
し、軟ろうとも云われており、鉛(Pb )ー錫(Sn )
系合金が代表的なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead-free solder used for wiring connection of electronic parts and semiconductor parts. Solder (Sold
er) is a brazing alloy having a melting point of 450 ° C. or less, and is also called soft solder, and is composed of lead (Pb) -tin (Sn).
Typical alloys are typical.

【0002】こゝで、Pb37 Sn63 組成は183 ℃の共晶
温度を示し、共晶はんだとして標準的に使用されてお
り、Sn 組成比を10〜90%に変えたものも用途に応じて
使用されている。すなわち、Sn 組成比の大きなもの程
接着性は良好であり、またPbの含有量が少ないので毒
性は少ないものゝ機械的に脆いと云う問題がある。一
方、Pb は単独では硬度(ブリネル硬度)が2.5 〜3と
小さく軟らかいものゝ、合金化することにより硬度が増
し、また、Pb-Sn 系の場合は融点が低くなり、流れが
良くなって金属の狭い隙間までろう付けできると云う特
徴がある。
Here, the composition of Pb 37 Sn 63 has a eutectic temperature of 183 ° C., and is used as a standard eutectic solder. Has been used. That is, the higher the Sn composition ratio, the better the adhesion, and the lower the Pb content, the lower the toxicity, but the mechanically brittle. On the other hand, Pb alone has a hardness (Brinell hardness) as small as 2.5 to 3 and is soft. However, the hardness increases by alloying. In the case of Pb-Sn system, the melting point decreases and the flow becomes better, The feature is that it can be brazed to a narrow gap.

【0003】[0003]

【従来の技術】Pb-Sn 系はんだは代表的なろう材であ
って、半導体部品と配線基板にパターン形成されている
導体線路との回路接続に使われているが、加熱の影響を
避ける必要がある場合があり、このような場合にはPb-
Sn 系よりも更に融点の低いSn-Cd(カドミウム)-Pb
系やBi(ビスマス)-Sn-Pb 系などが使用されてきた。
2. Description of the Related Art Pb-Sn solder is a typical brazing material, and is used for circuit connection between semiconductor components and conductor lines formed on a wiring board. In such a case, Pb-
Sn-Cd (cadmium) -Pb, which has a lower melting point than Sn-based
Systems and Bi (bismuth) -Sn-Pb systems have been used.

【0004】このように、今まで各種のはんだが実用化
されているが、多くのはんだはPbを構成要素とする二
成分系或いは三成分系のものが多い。然し、Pb の使用
は環境衛生の面から、また、トランジスタに対するソフ
トエラーの面からも問題があり、使用が敬遠されつゝあ
る。
As described above, various solders have been put to practical use, but many solders are mostly two-component or three-component solders containing Pb as a constituent element. However, the use of Pb is problematic in terms of environmental hygiene and in terms of soft errors with respect to transistors, and its use is often avoided.

【0005】すなわち、廃棄処理されたプリント配線基
板を屋外において雨曝しにしておくと、はんだ中のPb
が溶出して地下水を汚染し、人体に悪影響を及ぼすと云
う問題がある。また、天然のPb は四種類の同位元素す
なわち、204 Pb,206 Pb, 207 Pb,208 Pb の混合物で
あり、Pb はトリウム(Th )崩壊系列,ウラニウム
(U)崩壊系列,アクチウム(Ac )崩壊系列の最終生
成物であることから、α崩壊を伴い、α線を放出するこ
とから、このα線の照射によりトランジスタが誤動作
(ソフトエラー)を生ずると云う問題がある。
That is, a printed wiring board that has been discarded
If the board is exposed to rain outdoors, Pb in the solder
Elutes and contaminates groundwater, adversely affecting the human body.
Problem. Natural Pb has four isotopes.
That is,204Pb,206Pb, 207Pb,208With a mixture of Pb
Yes, Pb is thorium (Th) decay series, uranium
(U) The final life of the decay series, actium (Ac) decay series
Because it is a product, it can emit α-rays with α-decay.
Therefore, the transistor malfunctions due to this α-ray irradiation
(Soft error).

【0006】そこで、このような問題を避けるために各
種の対策が施されている。例えば廃棄電子機器の野積み
を止めるとか、フリップ・チップ・タイプの半導体集積
回路(IC)の装着は、半球状をしたはんだバンプを多
層回路基板上にパターン形成されているバンプ(Bump)
に位置合わせして融着する装着方法が採られているが、
この場合に、はんだバンプより発するα線によるソフト
エラーを防ぐために、はんだバンプをトランジスタがマ
トリックス状に形成してある活性領域からずらせて周辺
領域に形成し、距離を稼ぐことによってα線の照射を防
ぐなどの方法が行われてきた。
Therefore, various measures have been taken to avoid such a problem. For example, when stopping the accumulation of discarded electronic devices or mounting flip-chip type semiconductor integrated circuits (ICs), hemispherical solder bumps are patterned on a multilayer circuit board (Bump).
Although the mounting method of positioning and fusing is adopted,
In this case, in order to prevent a soft error due to α-rays emitted from the solder bumps, the solder bumps are formed in the peripheral region by displacing from the active region where the transistor is formed in a matrix form, and the irradiation of the α-rays is performed by increasing the distance. Prevention and other measures have been taken.

【0007】然し、これらの方法は何れも応急的なもの
であり、本質的な方法として無鉛はんだの実用化が望ま
れている。
However, all of these methods are urgent, and practical use of lead-free solder is desired as an essential method.

【0008】[0008]

【発明が解決しようとする課題】現在、はんだ付けには
二成分系或いは三成分系のはんだが使用されているが、
殆どのものが、Pb を構成成分として含んでいる。すな
わち、Pb は柔軟な金属であって、溶融はんだの流れを
良くし、狭い隙間に侵入させることができるなどの特徴
から採用されている。然し、Pb は野晒しにすると酸性
雨などの影響により炭酸鉛(Pb CO3 )や硫酸鉛(P
b SO4 )となって溶出し、地下水を汚染すると云う問
題があり、また、はんだバンプを構成するPb からはα
線が照射されてトランジスタを誤動作させると云う問題
があり、これらの問題を無くするために無鉛はんだを実
用化することが課題である。
At present, two-component or three-component solder is used for soldering.
Most contain Pb as a constituent. That is, Pb is a flexible metal, and is adopted because of its features such as improving the flow of molten solder and allowing it to penetrate into narrow gaps. However, if Pb is exposed to the field, lead carbonate (Pb CO 3 ) or lead sulfate (Pb
b SO 4 ), which elutes and contaminates groundwater.
There is a problem that a line is irradiated and a transistor malfunctions. To eliminate these problems, it is an issue to put lead-free solder into practical use.

【0009】[0009]

【課題を解決するための手段】上記の課題は、被処理基
板表面に形成され、金,銀,ニッケル,パラジウム,白
金の内の一つよりなる濡れ性向上層と、該濡れ性向上層
表面に形成され、インジウムとビスマスを組合わせた二
成分の無鉛はんだとを有するはんだ層によって解決する
ことができる。
SUMMARY OF THE INVENTION The above-mentioned object is to solve the problem with the substrate to be treated.
Formed on the plate surface, gold, silver, nickel, palladium, white
A wettability improving layer comprising one of gold, and the wettability improving layer
A combination of indium and bismuth formed on the surface
The problem can be solved by a solder layer having the components lead-free solder .

【0010】[0010]

【作用】はんだの必要条件は、 半導体チップとこれを装着する回路基板との熱膨張
係数の違いにより生ずる応力を吸収できるような柔軟さ
を有すること、 DIP(Dual-in-line Package) 方式やQFP(Qu
adruped Flat Package)方式をとる半導体装置を装着す
る場合のように高い接合強度をもっていること、 狭い隙間の間にも浸透できるように良好な流れ性を
もっていること、 であり、これらの条件を満たす代表的なものがPb37
n63 共晶はんだである。
[Function] The solder must be flexible enough to absorb the stress caused by the difference in the coefficient of thermal expansion between the semiconductor chip and the circuit board on which it is mounted, a DIP (Dual-in-line Package) method, QFP (Qu
(adruped Flat Package) High bonding strength as in the case of mounting a semiconductor device, and good flowability so that it can penetrate into narrow gaps. Is Pb 37 S
n 63 eutectic solder.

【0011】発明者等はPb レスはんだを実用化するに
当たって、Pb の代替となる元素の必要条件を検討した
結果、Pb と類似の性質を示すことが必須条件であり、
これは元素の周期律表においてPb の周囲にあり、且
つ、毒性を有しない金属元素の組合せが適当であると考
えた。
In order to put the Pb-less solder into practical use, the inventors of the present invention have studied the necessary conditions for an element that can substitute for Pb, and as a result, it is essential that they exhibit properties similar to Pb.
It was considered that a combination of metal elements which are around Pb in the periodic table of elements and have no toxicity is appropriate.

【0012】図1はPb の周囲の周期律表を示すもの
で、元素番号82のPb を囲んで元素番号49のIn,元素番
号50のSn,元素番号51のSb,元素番号81のTl,元素番号
83のBi が存在するが、Tl とSb はPb と同様に化合
物は有毒なことから必要条件から外れ、結局、In-Bi
系をPb レスはんだの候補として選んだ。そして、図2
に示すメニスコグラフ試験などを行い、はんだ付け性を
調べた結果、良好な結果を得ることができた。
FIG. 1 shows a periodic table around Pb, in which Pb of element No. 82 is surrounded by In of element No. 49, Sn of element No. 50, Sb of element No. 51, Tl of element No. 81, Element number
There are 83 Bi's, but Tl and Sb, like Pb, fall outside of the requirement because the compounds are toxic and eventually become In-Bi.
The system was selected as a candidate for Pb-less solder. And FIG.
As a result of conducting a meniscograph test and the like and examining the solderability, good results could be obtained.

【0013】こゝで、これら二成分系のはんだは組成比
として共晶はんだが融点が最も低く、また、析出した合
金組成が同一であること望ましいが、一方、Pb Sn
系はんだにおいて、Sn の組成比10〜90重量%のものが
使用されているように組成比の異なる二成分合金が次第
に析出し、最終的に共晶合金が析出しても一向に差し障
りない。
Here, it is desirable that the eutectic solder has the lowest melting point and the same alloy composition as those of these two-component solders.
Binary alloys having different composition ratios gradually precipitate as in the case of using a solder having a composition ratio of Sn of 10 to 90% by weight in the system solder. Even if the eutectic alloy finally precipitates, there is no problem.

【0014】次に、図2に示すメニスコグラフ試験を説
明すると、はんだ付けする試験片1にフラックスを塗布
した後、圧力センサを備えたメニスコグラフ試験機に装
着し(1の段階)、同図(A)に示すようにはんだ浴2
の中に挿入すると、当初は溶融はんだが試験片1を弾き
出そうとする反撥力3が現れ(2の段階)、同図(B)
に示すように反撥力3が記録されるが、加温されたフラ
ックスにより試験片1の表面にある酸化膜が除去される
に従って濡れ性を生じて試験片1がはんだ浴2の中への
引き込み力4が生ずる(4の段階)。こゝで、メニスコ
グラフ試験は試験片1をはんだ浴2の挿入した後、試験
片1に加わる力が反撥力3から引き込み力4に変わるま
での時間を濡れ時間として評価する方法である。
Next, the meniscograph test shown in FIG. 2 will be described. After applying a flux to the test piece 1 to be soldered, the test piece 1 is mounted on a meniscograph tester equipped with a pressure sensor (step 1). 2) Solder bath 2
When it is inserted into the test piece, a repulsive force 3 appears at first, at which the molten solder tries to pop out the test piece 1 (stage 2), and FIG.
The repulsive force 3 is recorded as shown in FIG. 3, but as the oxide film on the surface of the test piece 1 is removed by the heated flux, the wettability is generated and the test piece 1 is drawn into the solder bath 2. Force 4 occurs (stage 4). Here, the meniscograph test is a method of evaluating the time from the insertion of the test piece 1 into the solder bath 2 until the force applied to the test piece 1 changes from the repulsion force 3 to the pull-in force 4 as the wetting time.

【0015】次に、被処理基板のはんだ付けに当たって
はそのまゝでははんだ付けできない金属があり、また、
濡れ性の悪い金属があることからはんだ付け性向上のた
めの予備処理が必要となる。
Next, when soldering the substrate to be processed, there are metals that cannot be soldered beforehand.
Preliminary treatment for improving solderability is required because some metals have poor wettability.

【0016】例えば、鉄(Fe ),チタン(Ti ),ク
ローム(Cr )やアルミ(Al )のように表面に不動態
皮膜を備える金属はそのまゝでははんだ付けできない。
また、Pb Sn 系はんだに対して金(Au )は濡れ性は
極めて良好ではあるが、PbSn 系はんだと容易に合金
を作って溶け込む(通称喰われ)と云う問題があり、そ
のために被処理基板のはんだ付け位置には濡れ性向上層
/バリア層/密着性向上層の三層構造の表面処理が行わ
れることが多い。
For example, metals having a passivation film on the surface, such as iron (Fe), titanium (Ti), chrome (Cr), and aluminum (Al) cannot be soldered as they are.
Further, although gold (Au) has extremely good wettability with respect to PbSn-based solder, there is a problem that an alloy is easily formed with PbSn-based solder and melts in (commonly known as erosion). Is often subjected to a surface treatment of a three-layer structure of a wettability improving layer / barrier layer / adhesion improving layer.

【0017】すなわち、被処理基板のはんだ付け位置に
はスパッタ法や真空蒸着法などの手段によりTi やCr
など、被処理基板との接着性の優れた金属膜を密着性向
上層として形成し、この上にニッケル(Ni )のよう
に、はんだ付け性は良いが融点が高く(Ni の融点は14
55℃)容易にはんだ喰われが生じない金属膜をバリア層
として形成し、更に、この上にAu ,銀(Ag ),銅
(Cu ), パラジウム(Pd ), 白金(Pt )など、は
んだの濡れ性の良い金属膜を濡れ性向上層として形成し
ている。そして、濡れ性向上層/バリア層/密着性向上
層の膜厚は3000Å/1000Å/1000Å程度をとることが多
い。
That is, Ti or Cr is placed at the soldering position of the substrate to be processed by means such as sputtering or vacuum evaporation.
For example, a metal film having excellent adhesiveness to a substrate to be processed is formed as an adhesion improving layer, and a soldering property such as nickel (Ni) is good but the melting point is high (Ni has a melting point of 14
(55 ° C.) A metal film that does not easily cause solder erosion is formed as a barrier layer, and furthermore, a solder film such as Au, silver (Ag), copper (Cu), palladium (Pd), platinum (Pt) is formed thereon. A metal film having good wettability is formed as a wettability improving layer. The thickness of the wettability improving layer / barrier layer / adhesion improving layer is often about 3000/1000/1000.

【0018】そこで、本発明に係るPb レスはんだにお
いても、従来のPb Sn 系はんだに使用されている三層
構造と同様な処理を施した結果、良好なはんだ付け性を
得ることができた。
Therefore, in the case of the Pb-less solder according to the present invention, the same processing as that of the three-layer structure used for the conventional PbSn-based solder was performed, and as a result, good solderability was obtained.

【0019】[0019]

【実施例】【Example】

実施例1:(In-Bi 系) 試験片としては厚さが500 μm のシリコン(Si )ウエ
ハを40×5 mm の寸法に切断した後、このSi 片に密着
性向上層としてチタン(Ti )を1000Åの厚さに、バリ
ア層としてニッケル(Ni )を1000Åの厚さにスパッタ
した後、この上に濡れ性向上層として金(Au ),銀
(Ag )の二種類の金属をスパッタして試験片とし、は
んだ付け性を調べた。
Example 1: (In-Bi-based) As a test piece, a silicon (Si) wafer having a thickness of 500 μm was cut into a size of 40 × 5 mm, and titanium (Ti) was added to the Si piece as an adhesion improving layer. Is sputtered to a thickness of 1000 mm, and nickel (Ni) is sputtered to a thickness of 1000 mm as a barrier layer. Then, two kinds of metals, gold (Au) and silver (Ag), are sputtered as a wettability improving layer. The test pieces were used to examine solderability.

【0020】次に、はんだ浴としては、図3に示すIn-
Bi 系状態図において、共晶組成イ(共晶温度72℃) を
示すIn-34wtBi と、In2Bi の合金組成( 融点89℃)
と、In Bi の合金組成( 融点110 ℃) を示す3種類の
はんだ浴について、それぞれの浴温を130 ℃,150℃およ
び160 ℃に保ち、Ag を濡れ性向上層とする試料を用い
てメニスコグラフ試験を行った。
Next, as a solder bath, In- as shown in FIG.
In Bi phase diagram, the eutectic composition Lee and In- 34 wt Bi indicating the (eutectic temperature 72 ° C.), an In 2 Bi alloy composition (melting point 89 ° C.)
And three kinds of solder baths having an In Bi alloy composition (melting point: 110 ° C.), a meniscograph using a sample in which each bath temperature was kept at 130 ° C., 150 ° C. and 160 ° C. and Ag was used as a wettability improving layer. The test was performed.

【0021】その結果、3種類のはんだ浴の濡れ時間の
平均値は2.23秒,1.52 秒および1.57秒であって良好な結
果を得ることができた。
As a result, the average values of the wetting times of the three types of solder baths were 2.23 seconds, 1.52 seconds and 1.57 seconds, and good results could be obtained.

【0022】[0022]

【0023】[0023]

【0024】[0024]

【発明の効果】Pb37 Sn63 をはんだ浴とし実施例
に使用したAu を濡れ性向上層とする試料についてメニ
スコグラフ試験を行った結果は濡れ時間の平均値は0.46
秒であり、これに較べてIn-Bi 系についても同様な結
果を得ることができ、これにより無鉛はんだとして使用
できることが明らかになった。
As a result of a meniscograph test on a sample in which Pb 37 Sn 63 is used as a solder bath and Au used in the examples is used as a wettability improving layer, the average value of the wetting time is 0.46.
In seconds, also can achieve the same results with the an In-Bi system in comparison with this, it became clear that can be used this way as a lead-free solder.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 周期律表の一部である。FIG. 1 is a part of a periodic table.

【図2】 メニスコグラフ試験の説明図である。FIG. 2 is an explanatory diagram of a meniscograph test.

【図3】 In-Bi 系状態図である。FIG. 3 is an In-Bi system state diagram.

【符号の説明】[Explanation of symbols]

1 試験片 2 はんだ浴 3 反撥力 4 引き込み力 DESCRIPTION OF SYMBOLS 1 Test piece 2 Solder bath 3 Repulsion force 4 Pull-in force

───────────────────────────────────────────────────── フロントページの続き (72)発明者 清水 浩三 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (56)参考文献 特開 平8−224689(JP,A) (58)調査した分野(Int.Cl.7,DB名) B23K 35/20,35/26,35/34 ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Kozo Shimizu 1015 Kamiodanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Fujitsu Limited (56) References JP-A-8-224689 (JP, A) (58) Fields investigated (Int.Cl. 7 , DB name) B23K 35 / 20,35 / 26,35 / 34

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 被処理基板表面に形成され、金,銀,ニ
ッケル,パラジウム,白金の内の一つよりなる濡れ性向
上層と、 該濡れ性向上層表面に形成され、インジウムビスマス
を組合わせた二成分の無鉛はんだとを有するはんだ層。
1. A wettability improving layer formed on a surface of a substrate to be processed and made of one of gold, silver, nickel, palladium, and platinum, and indium and bismuth formed on the surface of the wettability improving layer. A solder layer having a combined two-component lead-free solder.
JP09533995A 1995-04-20 1995-04-20 Solder layer Expired - Fee Related JP3185600B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09533995A JP3185600B2 (en) 1995-04-20 1995-04-20 Solder layer

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Application Number Priority Date Filing Date Title
JP09533995A JP3185600B2 (en) 1995-04-20 1995-04-20 Solder layer

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JPH08290288A JPH08290288A (en) 1996-11-05
JP3185600B2 true JP3185600B2 (en) 2001-07-11

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Publication number Priority date Publication date Assignee Title
JP4135268B2 (en) * 1998-09-04 2008-08-20 株式会社豊田中央研究所 Lead-free solder alloy
US6342442B1 (en) * 1998-11-20 2002-01-29 Agere Systems Guardian Corp. Kinetically controlled solder bonding
US7168608B2 (en) * 2002-12-24 2007-01-30 Avago Technologies General Ip (Singapore) Pte. Ltd. System and method for hermetic seal formation
EP2300195B1 (en) * 2008-06-23 2020-01-22 Materion Advanced Materials Technologies and Services Inc. Gold-tin-indium solder for processing compatibility with lead-free tin-based solder
CN108971793B (en) * 2018-08-24 2021-04-23 云南科威液态金属谷研发有限公司 Low-temperature lead-free solder

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