JP3072324B2 - Weld spatter adhesion inhibitor - Google Patents
Weld spatter adhesion inhibitorInfo
- Publication number
- JP3072324B2 JP3072324B2 JP2055823A JP5582390A JP3072324B2 JP 3072324 B2 JP3072324 B2 JP 3072324B2 JP 2055823 A JP2055823 A JP 2055823A JP 5582390 A JP5582390 A JP 5582390A JP 3072324 B2 JP3072324 B2 JP 3072324B2
- Authority
- JP
- Japan
- Prior art keywords
- welding
- acid
- salt
- alkali
- spatter adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003112 inhibitor Substances 0.000 title description 10
- -1 inorganic acid salt Chemical class 0.000 claims description 44
- 229910052783 alkali metal Inorganic materials 0.000 claims description 7
- 150000003863 ammonium salts Chemical class 0.000 claims description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical class 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- 238000003466 welding Methods 0.000 description 29
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- 239000003513 alkali Substances 0.000 description 15
- 239000004094 surface-active agent Substances 0.000 description 14
- 239000002253 acid Substances 0.000 description 12
- 238000005406 washing Methods 0.000 description 12
- 238000004140 cleaning Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 238000005554 pickling Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- QCOGKXLOEWLIDC-UHFFFAOYSA-N N-methylbutylamine Chemical compound CCCCNC QCOGKXLOEWLIDC-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229910052810 boron oxide Inorganic materials 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 239000002562 thickening agent Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- GIAFURWZWWWBQT-UHFFFAOYSA-N 2-(2-aminoethoxy)ethanol Chemical compound NCCOCCO GIAFURWZWWWBQT-UHFFFAOYSA-N 0.000 description 1
- JCAYXDKNUSEQRT-UHFFFAOYSA-N 2-aminoethoxyboronic acid Chemical compound NCCOB(O)O JCAYXDKNUSEQRT-UHFFFAOYSA-N 0.000 description 1
- BLFRQYKZFKYQLO-UHFFFAOYSA-N 4-aminobutan-1-ol Chemical compound NCCCCO BLFRQYKZFKYQLO-UHFFFAOYSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229920001213 Polysorbate 20 Polymers 0.000 description 1
- 229920001214 Polysorbate 60 Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000004664 distearyldimethylammonium chloride (DHTDMAC) Substances 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000004312 hexamethylene tetramine Substances 0.000 description 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229940094506 lauryl betaine Drugs 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- CVMIVKAWUQZOBP-UHFFFAOYSA-L manganic acid Chemical compound O[Mn](O)(=O)=O CVMIVKAWUQZOBP-UHFFFAOYSA-L 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- HDZGCSFEDULWCS-UHFFFAOYSA-N monomethylhydrazine Chemical compound CNN HDZGCSFEDULWCS-UHFFFAOYSA-N 0.000 description 1
- DVEKCXOJTLDBFE-UHFFFAOYSA-N n-dodecyl-n,n-dimethylglycinate Chemical compound CCCCCCCCCCCC[N+](C)(C)CC([O-])=O DVEKCXOJTLDBFE-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Nonmetallic Welding Materials (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は鋼材等をアーク溶接する際に発生するスパッ
ターが溶接周辺の母材等に付着するのを防止するための
塗布剤、すなわち溶接スパッター付着防止剤に関するも
ので、とりわけ使用後に脱脂洗浄して除去するタイプに
係わるものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a coating agent for preventing spatter generated when arc welding steel or the like from adhering to a base metal or the like in the vicinity of welding, that is, a welding spatter. The present invention relates to an anti-adhesion agent, and more particularly to a type which removes by degreasing after use.
[従来の技術] 従来より、溶接用のスパッター付着防止剤には、溶接
後も塗布皮膜を残したままその上から直接塗料を塗り重
ねて行く直接塗装タイプと、溶接後に塗布皮膜をシンナ
ー、アルカリ、酸などによって脱脂洗浄して除去する脱
脂洗浄タイプとが存在している。[Prior art] Conventionally, as a spatter adhesion inhibitor for welding, there are a direct coating type in which a coating is directly applied over the coating while leaving the coating after welding, and a coating thinner or an alkali after welding. And a degreasing cleaning type that removes by degreasing with an acid or the like.
本発明は後者の洗浄タイプに関するもので、従来にお
けるこの種のものは下記の如く3種類に分類できるので
あるが、それぞれに欠点を有しているのである。The present invention relates to the latter type of cleaning. Conventional types of this type can be classified into the following three types, but each has its own drawbacks.
その第1の種類は、タルク、炭酸カルシウム、炭酸マ
グネシウム、酸化チタン等の無機粉末を主成分として増
粘剤を加えて水等の溶剤に分散させた分散型であり、こ
れは使用上の問題点として攪拌作業工程が増えることが
あげられ、また洗浄時に粉末が飛散して環境悪化を来た
し、さらに洗浄廃液の処理が困難である、等の欠点を有
しているのである。The first type is a dispersion type in which an inorganic powder such as talc, calcium carbonate, magnesium carbonate, and titanium oxide is used as a main component and a thickener is added thereto and dispersed in a solvent such as water. The point is that the number of agitation work steps is increased, and the powder is scattered at the time of washing, resulting in environmental deterioration, and furthermore, there are disadvantages such as difficulty in treating the washing waste liquid.
また第2の種類は、シリコンを主成分として溶剤に溶
解したり、界面活性剤を用いてエマルジョンとして水分
散させたもので、シリコンタイプと称されステンレス溶
接用として使用するものであるが、このシリコンタイプ
は使用後の除去に際して硝酸、弗酸等の毒性の強い酸を
使用しないと除去が困難であり、また、酸洗いが長時間
になるとシリコン皮膜が再付着して除去ムラを生じると
いう欠点が存在するのである。The second type is a type in which silicon is used as a main component and is dissolved in a solvent or is dispersed in water as an emulsion using a surfactant. The silicon type is difficult to remove unless a highly toxic acid such as nitric acid or hydrofluoric acid is used when removing it after use. In addition, if the pickling is performed for a long time, the silicon film will re-adhere, causing unevenness in removal. Exists.
さらに第3の種類は、ポリビニルアルコール、ポリエ
チレングリコール等の水溶性樹脂を主成分として用いる
ものであるが、これは溶接熱で樹脂が炭化される部分が
生じ、この炭化部分が酸にもアルカリにも溶解しにくく
除去不良を生じるという欠点を有し、除去せずにその上
から塗装した場合には密着不良を生じるのである。The third type uses a water-soluble resin such as polyvinyl alcohol or polyethylene glycol as a main component. This generates a portion where the resin is carbonized by welding heat, and the carbonized portion is converted to an acid or an alkali. However, they have the disadvantage that they are difficult to dissolve and cause defective removal, and when they are applied from above without being removed, poor adhesion occurs.
[発明が解決しようとする課題] 本発明は上記の様な問題点のないスパッター付着防止
剤を開発することを目的としてなされたもので、作業上
従来の工程数を増やすことなく、洗浄工程で簡単に除去
でき後工程に問題を残さず、作業環境を悪化させること
もなく、しかも、本来のスパッター付着防止性にすぐ
れ、また高い耐熱性を有すると共に酸やアルカリ等の洗
浄液槽に浮遊物や沈澱を生じず長時間使用できる等の諸
特性を有する溶接スパッター付着防止剤を提供しようと
するものである。[Problems to be Solved by the Invention] The present invention has been made for the purpose of developing a spatter adhesion preventive agent having no problems as described above. It can be easily removed, does not leave any problems in the post-process, does not deteriorate the working environment, has excellent original spatter adhesion prevention properties, has high heat resistance, and is free from suspended matter in a cleaning solution tank such as acid or alkali. It is an object of the present invention to provide a welding spatter adhesion preventive agent having various properties such as being able to be used for a long time without causing precipitation.
[課題を解決するための手段] 上記目的を達成するために洗浄タイプの溶接スパッタ
ー付着防止剤として、ホウ酸、モリブデン酸、タングス
テン酸等の金属無機酸の各種塩類と界面活性剤との併用
を試験したところ、これらを所定範囲の割合で配合した
ものが、非常にすぐれた性能を有することが判明したの
である。[Means for Solving the Problems] In order to achieve the above object, a combination of various salts of metal inorganic acids such as boric acid, molybdic acid, tungstic acid and a surfactant is used as a cleaning type welding spatter adhesion inhibitor. Upon testing, it was found that those blended in a predetermined range had excellent performance.
すなわち本発明は、金属無機酸のアルカリ金属塩、ア
ルカリ土類金属塩、アミン塩、アンモニウム塩から選ば
れる金属無機酸塩の1種又は2種以上を5〜35重量%、
及び界面活性剤1〜20重量%、を必須成分として配合し
てなることを特徴とする溶接スパッター付着防止剤、を
要旨とするものである。That is, the present invention relates to an alkali metal salt of a metal inorganic acid, an alkaline earth metal salt, an amine salt, and one or more metal inorganic acid salts selected from ammonium salts in an amount of 5 to 35% by weight,
And 1 to 20% by weight of a surfactant as an essential component.
本発明における金属無機酸とは、ホウ酸、アルミン
酸、ケイ酸、スズ酸、チタン酸、クロム酸、モリブデン
酸、タングステン酸、マンガン酸などであり、これらを
下記の如き各種塩類として使用するのである。The metal inorganic acid in the present invention includes boric acid, aluminate, silicic acid, stannic acid, titanic acid, chromic acid, molybdic acid, tungstic acid, manganic acid, and the like, and these are used as various salts as described below. is there.
つまり、金属無機酸のナトリウム塩、カリウム塩、リ
チウム塩などのアルカリ金属塩、また同じくカルシウム
塩、マグネシウム塩などのアルカリ土類金属塩、さらに
は同じくアミン塩、アンモニウム塩などから選ばれる金
属無機酸塩の1種又は2種以上を使用するのである。That is, alkali metal salts such as sodium, potassium and lithium salts of metal inorganic acids, alkaline earth metal salts such as calcium salts and magnesium salts, and also metal inorganic acids selected from amine salts and ammonium salts One or more of the salts are used.
なお、例えばホウ酸アルカリ金属塩を用いる場合、ホ
ウ酸に苛性アルカリ液を配合して使用しても良いし、酸
化ホウ素を苛性アルカリ液に溶かすことによりホウ酸ア
ルカリ金属塩として用いても良いものである。In the case of using an alkali metal borate, for example, a caustic alkali solution may be mixed with boric acid, or boron oxide may be used as an alkali metal borate by dissolving boron oxide in the caustic alkali solution. It is.
また、上記のアミン塩やアンモニウム塩として用いる
場合には、アンモニアの外に下記の如き多種類のアミン
を使用することが可能である。When used as the above amine salt or ammonium salt, various kinds of amines as described below can be used in addition to ammonia.
低級(モノ、ジ、トリ)アルキルアミン類 メチルアミン、エチルアミン、プロピルアミン、ジメ
チルアミン、ジエチルアミン、ジプロピルアミン、ジブ
チルアミン、n−ブチルメチルアミン、トリメチルアミ
ン、トリブチルアミン、メチルジエチルアミンなど 環式アミン類 モルホリン、ピロリジン、ピペリジンなど ジアミン類 ヒドラジン、メチルヒドラジン、2−3トルエンジア
ミン、エチレンジアミンなど 置換アミン類 ヒドロオキシルアミン、エタノールアミン、ジエタノ
ールアミン、ブタノールアミン、ヘキサノールアミン、
メチルジエタノールアミン、オクタノールアミン、ジグ
リコールアミン、その他のポリグリコールアミン、トリ
エタノールアミン、メチルエタノールアミン、n−アミ
ノエタノールアミンなど ポリアミン類 ジエチレントリアミン、トリエチレンテトラミン、ヘ
キサメチレンテトラミンなど 本発明は以上の様な各種の金属無機酸塩類から選ばれ
る1種又は2種以上と界面活性剤とを必須成分として配
合したものであり、金属無機酸塩の配合割合が5〜35重
量%であることが必要となっている。Lower (mono, di, tri) alkylamines Methylamine, ethylamine, propylamine, dimethylamine, diethylamine, dipropylamine, dibutylamine, n-butylmethylamine, trimethylamine, tributylamine, methyldiethylamine, etc. Cyclic amines morpholine , Pyrrolidine, piperidine, etc. Diamines hydrazine, methylhydrazine, 2-3 toluenediamine, ethylenediamine, etc. Substituted amines hydroxyylamine, ethanolamine, diethanolamine, butanolamine, hexanolamine,
Polyamines such as methyldiethanolamine, octanolamine, diglycolamine, other polyglycolamine, triethanolamine, methylethanolamine, n-aminoethanolamine, etc.Polyamines diethylenetriamine, triethylenetetramine, hexamethylenetetramine, etc. One or two or more selected from metal inorganic acid salts of the above and a surfactant are blended as essential components, and the blending ratio of the metal inorganic acid salt must be 5 to 35% by weight. I have.
この金属無機酸塩の配合割合が5重量%未満ではスパ
ッター付着の防止効果が低くなり、一方この割合が35重
量%をこえると溶接のビード中に入った場合にブローホ
ールやピット等の溶接欠陥を発生しやすくなったり、ま
たシンナーによる洗浄性が低下するのである。If the mixing ratio of the metal inorganic acid salt is less than 5% by weight, the effect of preventing spatter adhesion is reduced. On the other hand, if the mixing ratio is more than 35% by weight, welding defects such as blowholes and pits may occur when the alloy enters a welding bead. This is easy to generate, and the washing performance by the thinner is deteriorated.
次に本発明において配合される界面活性剤としては、
ノニオン系、アニオン系、カチオン系、両性系のいずれ
の界面活性剤も使用できるが、ノニオン系のものが好適
な結果を得る場合が比較的多いものである。Next, as the surfactant to be blended in the present invention,
Although any of nonionic, anionic, cationic and amphoteric surfactants can be used, nonionic surfactants are more likely to provide suitable results.
このノニオン系界面活性剤としては、ポリオキシエチ
レンラウリルエーテル等の如きポリオキシエチレンアル
キルエーテル、ポリオキシエチレンノニルフエノールエ
ーテル等の如きポリオキシエチレンアルキルフエノール
エーテル、ポリオキシエチレンモノステアレート等の如
きポリオキシエチレンアルキルエステル、ポリオキシエ
チレンソルビタンモノラウレート等の如きポリオキシエ
チレンソルビタンモノアルキルエステルなどがあげられ
る。Examples of the nonionic surfactant include polyoxyethylene alkyl ethers such as polyoxyethylene lauryl ether, polyoxyethylene alkyl phenol ethers such as polyoxyethylene nonylphenol ether, and polyoxyethylenes such as polyoxyethylene monostearate. And polyoxyethylene sorbitan monoalkyl esters such as ethylene alkyl ester and polyoxyethylene sorbitan monolaurate.
またアニオン系界面活性剤としては、ロジン石けんの
様なアルキルカルボン酸塩脂肪酸石けん、ドデシルベン
ゼンスルホン酸ナトリウムの様なアルキル硫酸塩、アル
キルアルコール硫酸エステル塩、などがあげられる。Examples of the anionic surfactant include an alkyl carboxylate fatty acid soap such as rosin soap, an alkyl sulfate such as sodium dodecylbenzenesulfonate, and an alkyl alcohol sulfate.
またカチオン系界面活性剤としては、N−アルキルト
リメチレンジアミン塩、ジアルキルジメチルアンモニウ
ムクロライド、ポリオキシエチレンアルキルアミン等が
使用できる。As the cationic surfactant, N-alkyltrimethylenediamine salt, dialkyldimethylammonium chloride, polyoxyethylene alkylamine and the like can be used.
さらに両性系界面活性剤としては、アルキルベンジル
ジメチルアンモニウム、ラウリルベタイン、イミダゾリ
ニウムベタイン、ジステアリルジメチルアンモニウムク
ロライドなどがあげられる。Further, examples of the amphoteric surfactant include alkylbenzyldimethylammonium, laurylbetaine, imidazoliniumbetaine, distearyldimethylammonium chloride and the like.
この様な界面活性剤を単独又は適宜に併用して、前記
の金属無機酸塩を主成分とする組成物中に配合するので
あるが、その配合割合は1〜20重量%の範囲であること
が必要であり、1重量%未満では使用後のシンナー洗浄
の場合に金属無機酸塩が除去しにくくなるし、一方この
割合が20重量%をこえると溶接熱で炭化物を生じやすく
なり、この炭化物が洗浄工程で除去し難くなるのであ
る。Such surfactants are used alone or in combination as appropriate in a composition containing the metal inorganic acid salt as a main component, and the compounding ratio is in the range of 1 to 20% by weight. If it is less than 1% by weight, it becomes difficult to remove the metal inorganic acid salt in the case of thinner cleaning after use. On the other hand, if this proportion exceeds 20% by weight, carbides are easily generated by welding heat, Are difficult to remove in the washing step.
本発明おける金属無機酸塩と界面活性剤は前記した濃
度範囲内に適宜の溶剤に混合・溶解するのであるが、そ
の溶剤としては特に限定はしないが、水単独又は水と水
可溶のアルコール類の併用が好ましく、この水可溶のア
ルコール類としてはメタノール、エタノール、イソプロ
パノール、エチレングリコール、グリセリン、及びこれ
らの誘導体を用いることができるものである。The metal inorganic acid salt and the surfactant in the present invention are mixed and dissolved in an appropriate solvent within the above-mentioned concentration range, and the solvent is not particularly limited, but may be water alone or water-soluble alcohol. The water-soluble alcohols include methanol, ethanol, isopropanol, ethylene glycol, glycerin, and derivatives thereof.
なお、本発明スパッター付着防止剤を実際に適用する
にあたっては、使用条件に合せてその性能を損なわない
範囲で、適当量の防錆剤、増粘剤、レベリング剤、着色
剤、香料等を添加併用しても良いものである。When actually applying the spatter adhesion inhibitor of the present invention, an appropriate amount of a rust inhibitor, a thickener, a leveling agent, a coloring agent, a fragrance, etc. are added within a range that does not impair the performance according to the use conditions. They may be used in combination.
[作用] 本発明は以上の様な構成からなる溶接スパッター付着
防止剤であり、主成分の金属無機酸塩は高耐熱性を有
し、さらに溶接熱にも分解しにくく溶接による熱履歴が
あっても酸洗いやアルカリ洗いの工程で溶解して簡単に
除去でき、また、このスパッター付着防止剤は酸やアル
カリに浸漬して洗浄した場合、その洗浄液槽に浮遊物や
沈澱を生じることはなく洗浄液が長期間使用できるもの
である。[Action] The present invention is a welding spatter adhesion inhibitor having the above-mentioned structure, and the metal inorganic acid salt as a main component has high heat resistance, is hardly decomposed even by welding heat, and has a heat history due to welding. Even in the pickling or alkali washing process, it can be easily removed by dissolving in the process of washing with acid.Also, when this spatter adhesion inhibitor is washed by immersion in acid or alkali, no floating substances or precipitates are generated in the washing liquid tank. The cleaning liquid can be used for a long time.
しかも、この金属無機酸塩に適切量配合された界面活
性剤によってシンナー洗いの工程でも容易に金属無機酸
塩の皮膜が除去されるし、またこの界面活性剤の作用に
より金属無機酸塩の皮膜が均一に溶接母材に付着するの
である。In addition, a surfactant mixed in an appropriate amount with the metal inorganic acid salt easily removes the film of the metal inorganic acid salt even in the thinner washing step, and the action of the surfactant allows the film of the metal inorganic acid salt to be removed. Is uniformly adhered to the welding base metal.
そしてこの高耐熱性の均一な皮膜が母材へのスパッタ
ーの付着を確実に防止し、塗装後の外観不良やメッキ後
の外観不良を無くし、また錆の発生原因も無くなるので
ある。The uniform film having high heat resistance reliably prevents spatter from adhering to the base material, eliminates poor appearance after coating and poor appearance after plating, and eliminates the cause of rust.
さらに本発明防止剤は、前述したように使用後に、酸
洗い、アルカリ洗いの如き洗浄工程において簡単に除去
できるので後工程に問題を残さないし、粉末の飛散や洗
浄液による汚染もなく作業性、環境性もすぐれたものと
なっているのである。Further, as described above, the inhibitor of the present invention can be easily removed after use in a washing step such as pickling or alkali washing, so that there is no problem in subsequent steps, there is no scattering of powder or contamination by a washing solution, and workability and environmental protection are not caused. The nature is also excellent.
[実施例] 下記のa〜fの各種金属無機酸塩と、イ〜ハの各種界
面活性剤とを、第1表の如く配合した実施例1〜6、及
び第2表の如く配合した比較例1〜4を、それぞれ調製
した。[Examples] Examples 1 to 6 in which various metal inorganic acid salts of the following a to f and various surfactants of I to C were blended as shown in Table 1, and a comparison in which they were blended as shown in Table 2. Examples 1 to 4 were each prepared.
金属無機酸塩(各無機酸+各アルカリ液) a…ホウ酸ナトリウム b…ホウ酸モノエタノールアミン塩 c…アルミン酸ジエタノールアミン塩 d…アルミン酸マグネシウム e…モリブデン酸ナトリウム f…タングステン酸アンモニウム 界面活性剤 イ…ポリオキシエチレンラウリルエーテル ロ…ポリオキシエチレンドデシルフエニルエーテル ハ…モノアルキル4級アンモニウム塩 上記第1表及び第2表の各組成物を溶接母材にそれぞ
れ刷毛塗りで塗布し、下記の如き溶接条件で溶接試験を
行なった。Metal inorganic acid salt (each inorganic acid + each alkali solution) a ... sodium borate b ... monoethanolamine borate c ... diethanolamine aluminate d ... magnesium aluminate e ... sodium molybdate f ... ammonium tungstate surfactant A: Polyoxyethylene lauryl ether B: Polyoxyethylene dodecyl phenyl ether C: Monoalkyl quaternary ammonium salt Each of the compositions shown in Tables 1 and 2 was applied to the welding base metal by brush coating, and a welding test was performed under the following welding conditions.
溶接条件 炭酸ガスアーク溶接 厚さ9mmの軟鋼板をT型すみ肉で溶接 溶接電流 ……300A アーク電圧……30V 溶接速度 ……50cm/分 ワイヤー径……1.2mmφ ガス流量 ……20/分 評価 溶接後における100cm2中のスパッター付着数、ピット
発生数、を各組成物の試験について計測し、またシンナ
ー、酸、アルカリによる各洗浄性を試験した。Welding conditions Carbon dioxide gas arc welding Weld a 9mm thick mild steel plate with a T-shaped fillet Welding current …… 300A Arc voltage… 30V Welding speed …… 50cm / min Wire diameter… 1.2mmφ Gas flow …… 20 / min Evaluation Welding Thereafter, the number of spatters deposited and the number of pits generated in 100 cm 2 were measured for the test of each composition, and the detergency of each composition with a thinner, an acid and an alkali was tested.
これらの結果を第3表に示す。 Table 3 shows the results.
なお、表中の記号は下記の内容を示すものである。 The symbols in the table indicate the following contents.
◎……分解物がなく洗浄性が良い。 ◎: Good detergency with no decomposition products.
○……わずかに分解物が残るが後工程に問題がない。 …: Decomposed product remains slightly, but there is no problem in the subsequent process.
△……皮膜が少し残り後工程に問題を生じる。 Δ: A little film remains, causing problems in the post-process.
×……皮膜のほとんどが残り皮膜除去ができない。 ×: Most of the film remains and the film cannot be removed.
この第3表より、本発明の実施例ではすぐれたスパッ
ター付着防止性を示し、しかも溶接欠陥もなく、さらに
その皮膜洗浄性はシンナー、酸、アルカリのいずれにお
いてもすぐれた結果を示すことが認められるのである。From Table 3, it can be seen that the examples of the present invention show excellent spatter adhesion prevention properties, have no welding defects, and exhibit excellent film cleaning properties in any of thinner, acid and alkali. It is done.
一方、比較例1のように金属無機酸塩の量も界面活性
剤の量も共に不足している場合はスパッター付着数が増
加し、また比較例2のように界面活性剤の量が不足する
場合はシンナー洗浄性に著るしく劣り、さらに比較例3
のように界面活性剤が多すぎる場合は溶接欠陥も出るし
酸やアルカリによる洗浄性が低下し、そして比較例4の
ように金属無機酸塩が多すぎると溶接欠陥も多くなる
し、洗浄性も低下し特にシンナー、アルカリによる洗浄
性が著るしく劣るのである。On the other hand, when both the amount of the metal inorganic acid salt and the amount of the surfactant are insufficient as in Comparative Example 1, the number of sputters increases, and the amount of the surfactant is insufficient as in Comparative Example 2. In the case, the thinner cleaning property was remarkably inferior, and Comparative Example 3
When the amount of the surfactant is too large as in Example 1, welding defects are generated, and the detergency by an acid or an alkali is deteriorated. In particular, and the washability with thinner and alkali is remarkably inferior.
[発明の効果] 本発明の効果は作用欄で詳述した通りであるが、簡単
にまとめると下記の通りである。[Effects of the Invention] The effects of the present invention are as detailed in the operation section, but are briefly summarized as follows.
(1)主成分である金属無機酸塩の高耐熱性により溶接
熱でも分解しないスパッター付着防止剤である。(1) A spatter adhesion inhibitor which does not decompose even by welding heat due to the high heat resistance of the metal inorganic acid salt as the main component.
(2)したがって使用後に酸、アルカリ、シンナー等の
洗浄剤によって簡単に洗浄でき、後工程に問題を残さな
い。(2) Therefore, after use, it can be easily washed with a cleaning agent such as an acid, an alkali, and a thinner, so that there is no problem in the subsequent steps.
(3)この配合組成物は酸やアルカリに浸漬して洗浄し
た場合、その洗浄液に浮遊物や沈澱を生じることなく長
期間の使用ができる。(3) When this composition is washed by immersing it in an acid or alkali, it can be used for a long period of time without causing suspended matters or precipitates in the washing solution.
(4)溶接母材に塗布しやすく均一な皮膜となり、すぐ
れたスパッター付着防止性を有している。(4) It is easy to apply to the welding base material, becomes a uniform film, and has excellent spatter adhesion prevention properties.
(5)作業性、環境性も良好なものである。(5) Workability and environmental performance are also good.
以上の様に、本発明スパッター付着防止剤は種々なる
すぐれた効果を有し、溶接技術分野にきわめて高い有用
性を発揮するものである。As described above, the spatter adhesion inhibitor of the present invention has various excellent effects and exhibits extremely high utility in the field of welding technology.
Claims (1)
類金属塩、アミン塩、アンモニウム塩から選ばれる金属
無機酸塩の1種又は2種以上を5〜35重量%、及び界面
活性剤1〜20重量%、を必須成分として配合してなるこ
とを特徴とする溶接スパッター付着防止剤。1. An inorganic acid salt of an alkali metal, an alkaline earth metal, an amine salt or an ammonium salt selected from the group consisting of an alkali metal salt, an alkali metal salt, an amine salt and an ammonium salt. 20 to 20% by weight as an essential component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2055823A JP3072324B2 (en) | 1990-03-06 | 1990-03-06 | Weld spatter adhesion inhibitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2055823A JP3072324B2 (en) | 1990-03-06 | 1990-03-06 | Weld spatter adhesion inhibitor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03258488A JPH03258488A (en) | 1991-11-18 |
JP3072324B2 true JP3072324B2 (en) | 2000-07-31 |
Family
ID=13009680
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2055823A Expired - Lifetime JP3072324B2 (en) | 1990-03-06 | 1990-03-06 | Weld spatter adhesion inhibitor |
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JP (1) | JP3072324B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3279435B2 (en) * | 1994-06-10 | 2002-04-30 | 旭硝子株式会社 | Paste for thin film pattern formation |
JP5384895B2 (en) * | 2008-09-29 | 2014-01-08 | 株式会社槌屋 | Spatter adhesion inhibitor |
JP2012081492A (en) * | 2010-10-08 | 2012-04-26 | Tsuchiya Co Ltd | Spatter adhesion preventive agent |
WO2021059306A1 (en) * | 2019-09-25 | 2021-04-01 | Vaziri Kourosh | Plawea (preservation liquid for arc welding affected areas ) |
-
1990
- 1990-03-06 JP JP2055823A patent/JP3072324B2/en not_active Expired - Lifetime
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