JP2976398B2 - Reversible thermosensitive recording material and method for producing the same - Google Patents
Reversible thermosensitive recording material and method for producing the sameInfo
- Publication number
- JP2976398B2 JP2976398B2 JP4250707A JP25070792A JP2976398B2 JP 2976398 B2 JP2976398 B2 JP 2976398B2 JP 4250707 A JP4250707 A JP 4250707A JP 25070792 A JP25070792 A JP 25070792A JP 2976398 B2 JP2976398 B2 JP 2976398B2
- Authority
- JP
- Japan
- Prior art keywords
- heat
- reversible thermosensitive
- recording material
- layer
- thermosensitive recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 title claims description 82
- 230000002441 reversible effect Effects 0.000 title claims description 43
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000126 substance Substances 0.000 claims description 50
- 229920005989 resin Polymers 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 40
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 15
- 238000005191 phase separation Methods 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 54
- 239000013078 crystal Substances 0.000 description 20
- -1 fatty acid ester Chemical class 0.000 description 20
- 238000001035 drying Methods 0.000 description 16
- 235000014113 dietary fatty acids Nutrition 0.000 description 15
- 229930195729 fatty acid Natural products 0.000 description 15
- 239000000194 fatty acid Substances 0.000 description 15
- 238000000149 argon plasma sintering Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 150000004665 fatty acids Chemical class 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 8
- 229910052736 halogen Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 6
- OMOVVBIIQSXZSZ-UHFFFAOYSA-N [6-(4-acetyloxy-5,9a-dimethyl-2,7-dioxo-4,5a,6,9-tetrahydro-3h-pyrano[3,4-b]oxepin-5-yl)-5-formyloxy-3-(furan-3-yl)-3a-methyl-7-methylidene-1a,2,3,4,5,6-hexahydroindeno[1,7a-b]oxiren-4-yl] 2-hydroxy-3-methylpentanoate Chemical compound CC12C(OC(=O)C(O)C(C)CC)C(OC=O)C(C3(C)C(CC(=O)OC4(C)COC(=O)CC43)OC(C)=O)C(=C)C32OC3CC1C=1C=COC=1 OMOVVBIIQSXZSZ-UHFFFAOYSA-N 0.000 description 5
- 150000001408 amides Chemical class 0.000 description 5
- 150000003863 ammonium salts Chemical class 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 4
- CKDDRHZIAZRDBW-UHFFFAOYSA-N henicosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCC(O)=O CKDDRHZIAZRDBW-UHFFFAOYSA-N 0.000 description 4
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 4
- ISYWECDDZWTKFF-UHFFFAOYSA-N nonadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCCC(O)=O ISYWECDDZWTKFF-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- XEZVDURJDFGERA-UHFFFAOYSA-N tricosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCC(O)=O XEZVDURJDFGERA-UHFFFAOYSA-N 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 235000021357 Behenic acid Nutrition 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229940116226 behenic acid Drugs 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- JQCXWCOOWVGKMT-UHFFFAOYSA-N diheptyl phthalate Chemical compound CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC JQCXWCOOWVGKMT-UHFFFAOYSA-N 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 150000005846 sugar alcohols Polymers 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- NXQMCAOPTPLPRL-UHFFFAOYSA-N 2-(2-benzoyloxyethoxy)ethyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCCOCCOC(=O)C1=CC=CC=C1 NXQMCAOPTPLPRL-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Chemical compound CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- ZVFDTKUVRCTHQE-UHFFFAOYSA-N Diisodecyl phthalate Chemical compound CC(C)CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC(C)C ZVFDTKUVRCTHQE-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- 235000021353 Lignoceric acid Nutrition 0.000 description 2
- CQXMAMUUWHYSIY-UHFFFAOYSA-N Lignoceric acid Natural products CCCCCCCCCCCCCCCCCCCCCCCC(=O)OCCC1=CC=C(O)C=C1 CQXMAMUUWHYSIY-UHFFFAOYSA-N 0.000 description 2
- HPEUJPJOZXNMSJ-UHFFFAOYSA-N Methyl stearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC HPEUJPJOZXNMSJ-UHFFFAOYSA-N 0.000 description 2
- 235000021314 Palmitic acid Nutrition 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- FARYTWBWLZAXNK-WAYWQWQTSA-N ethyl (z)-3-(methylamino)but-2-enoate Chemical compound CCOC(=O)\C=C(\C)NC FARYTWBWLZAXNK-WAYWQWQTSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 2
- YAQXGBBDJYBXKL-UHFFFAOYSA-N iron(2+);1,10-phenanthroline;dicyanide Chemical compound [Fe+2].N#[C-].N#[C-].C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1 YAQXGBBDJYBXKL-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- MWMPEAHGUXCSMY-UHFFFAOYSA-N pentacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCC(O)=O MWMPEAHGUXCSMY-UHFFFAOYSA-N 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QOISQGPTELEAKI-UHFFFAOYSA-N 2-(9-octyloctadecan-9-yloxycarbonyl)benzoic acid Chemical compound CCCCCCCCCC(CCCCCCCC)(CCCCCCCC)OC(=O)C1=CC=CC=C1C(O)=O QOISQGPTELEAKI-UHFFFAOYSA-N 0.000 description 1
- JEYLQCXBYFQJRO-UHFFFAOYSA-N 2-[2-[2-(2-ethylbutanoyloxy)ethoxy]ethoxy]ethyl 2-ethylbutanoate Chemical compound CCC(CC)C(=O)OCCOCCOCCOC(=O)C(CC)CC JEYLQCXBYFQJRO-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- QZCLKYGREBVARF-UHFFFAOYSA-N Acetyl tributyl citrate Chemical group CCCCOC(=O)CC(C(=O)OCCCC)(OC(C)=O)CC(=O)OCCCC QZCLKYGREBVARF-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- GOJCZVPJCKEBQV-UHFFFAOYSA-N Butyl phthalyl butylglycolate Chemical compound CCCCOC(=O)COC(=O)C1=CC=CC=C1C(=O)OCCCC GOJCZVPJCKEBQV-UHFFFAOYSA-N 0.000 description 1
- 239000004803 Di-2ethylhexylphthalate Substances 0.000 description 1
- XTJFFFGAUHQWII-UHFFFAOYSA-N Dibutyl adipate Chemical compound CCCCOC(=O)CCCCC(=O)OCCCC XTJFFFGAUHQWII-UHFFFAOYSA-N 0.000 description 1
- PYGXAGIECVVIOZ-UHFFFAOYSA-N Dibutyl decanedioate Chemical compound CCCCOC(=O)CCCCCCCCC(=O)OCCCC PYGXAGIECVVIOZ-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 229920001986 Vinylidene chloride-vinyl chloride copolymer Polymers 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229940067597 azelate Drugs 0.000 description 1
- SAOKZLXYCUGLFA-UHFFFAOYSA-N bis(2-ethylhexyl) adipate Chemical compound CCCCC(CC)COC(=O)CCCCC(=O)OCC(CC)CCCC SAOKZLXYCUGLFA-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- BEWFIPLBFJGWSR-UHFFFAOYSA-N butyl 12-acetyloxyoctadec-9-enoate Chemical compound CCCCCCC(OC(C)=O)CC=CCCCCCCCC(=O)OCCCC BEWFIPLBFJGWSR-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 229940100539 dibutyl adipate Drugs 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- HHECSPXBQJHZAF-UHFFFAOYSA-N dihexyl hexanedioate Chemical compound CCCCCCOC(=O)CCCCC(=O)OCCCCCC HHECSPXBQJHZAF-UHFFFAOYSA-N 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- VJHINFRRDQUWOJ-UHFFFAOYSA-N dioctyl sebacate Chemical compound CCCCC(CC)COC(=O)CCCCCCCCC(=O)OCC(CC)CCCC VJHINFRRDQUWOJ-UHFFFAOYSA-N 0.000 description 1
- IFLDFHHUUCVKNJ-UHFFFAOYSA-N dodecyl docosanoate Chemical compound CCCCCCCCCCCCCCCCCCCCCC(=O)OCCCCCCCCCCCC IFLDFHHUUCVKNJ-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- CAMHHLOGFDZBBG-UHFFFAOYSA-N epoxidized methyl oleate Natural products CCCCCCCCC1OC1CCCCCCCC(=O)OC CAMHHLOGFDZBBG-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- UULYVBBLIYLRCU-UHFFFAOYSA-N myristyl palmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OCCCCCCCCCCCCCC UULYVBBLIYLRCU-UHFFFAOYSA-N 0.000 description 1
- WIBFFTLQMKKBLZ-SEYXRHQNSA-N n-butyl oleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCCCC WIBFFTLQMKKBLZ-SEYXRHQNSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- TZXYSEYEGNHPQI-UHFFFAOYSA-N octadecyl dodecanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCCCCCCCCCC TZXYSEYEGNHPQI-UHFFFAOYSA-N 0.000 description 1
- NKBWPOSQERPBFI-UHFFFAOYSA-N octadecyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCCCCCCCCCCCCCCCC NKBWPOSQERPBFI-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- BPJZKLBPJBMLQG-KWRJMZDGSA-N propanoyl (z,12r)-12-hydroxyoctadec-9-enoate Chemical compound CCCCCC[C@@H](O)C\C=C/CCCCCCCC(=O)OC(=O)CC BPJZKLBPJBMLQG-KWRJMZDGSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- MHXBHWLGRWOABW-UHFFFAOYSA-N tetradecyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCCCCCCCCCCCC MHXBHWLGRWOABW-UHFFFAOYSA-N 0.000 description 1
- 230000008542 thermal sensitivity Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、感熱層の温度による可
逆的な透明度変化を利用して記録及び消去を行なうため
の可逆性感熱材料、及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reversible thermosensitive material for recording and erasing by utilizing a reversible change in transparency of a thermosensitive layer depending on the temperature, and a method for producing the same.
【0002】[0002]
【従来の技術】可逆性感熱記録材料については多くが提
案されており、例えばその代表的なものとしては、延期
ビニル系樹脂のような樹脂母材中に高級脂肪酸のような
有機低分子物質を分散した感熱層を有する可逆性感熱記
録材料が知られている(特開昭54−119377号、
特開昭55−154198号などの公報)。この種の記
録材料による画像形成及び消去は温度による感熱層の可
逆的な透明度変化を利用したものであるが、不透明部が
透明化する温度が一般に低く、使用する高級脂肪酸によ
る多少の差異はあるが65〜72℃程度で、かつ透明化
温度範囲の幅が2〜4℃と狭いという欠点があった。こ
のため、高温環境下での使用に制限があり、また、少な
くとも一部が不透明な記録材料全体を透明化したり、あ
るいは、全体が不透明な記録材料に透明画像を形成する
際の温度制御に難点があり、実用上の問題があった。2. Description of the Related Art Many reversible thermosensitive recording materials have been proposed. For example, as a typical example, an organic low molecular weight substance such as a higher fatty acid is contained in a resin base material such as a postponed vinyl resin. A reversible thermosensitive recording material having a dispersed thermosensitive layer is known (JP-A-54-119377;
JP-A-55-154198, etc.). Image formation and erasing with this type of recording material utilize reversible changes in the transparency of the heat-sensitive layer with temperature, but the temperature at which the opaque portion is transparent is generally low, and there are some differences depending on the higher fatty acid used. Of about 65 to 72 ° C., and the width of the transparentizing temperature range is as narrow as 2 to 4 ° C. For this reason, use in a high-temperature environment is limited, and there is a problem in that at least a part of the entire opaque recording material is made transparent, or a temperature control when forming a transparent image on the entire opaque recording material is difficult. There was a practical problem.
【0003】こうした点を配慮して、本発明者らは、先
に、特開昭63−39378号公報、特開昭63−13
0380号公報、特開平1−123788号公報等にお
いて、ある種の有機低分子物質(脂肪酸エステル、エー
テル、チオエーテル或いは可塑剤等)及びその有機低分
子物質と共融しやすい物質を含有させることにより、透
明化する温度巾を拡大できることを示した。しかし、可
逆性感熱材料の応用分野の広がりから、透明化する温度
巾をさらに拡大したいという要求も出てきた。また、前
記の発明のような素材面での工夫を反映しても、該感熱
層の製造条件などにより透明化する温度巾が変化し、安
定して透明化する温度巾の広い可逆性感熱材料が得られ
ないことがあった。In consideration of these points, the present inventors have previously described Japanese Patent Application Laid-Open Nos. 63-39378 and 63-13-13.
Japanese Patent Application Laid-Open No. 0380, JP-A-1-123788, etc., contain a certain kind of organic low-molecular substance (fatty acid ester, ether, thioether or plasticizer, etc.) and a substance which is easily eutectic with the organic low-molecular substance. It was shown that the temperature range for the transparency could be expanded. However, with the expansion of the application field of the reversible thermosensitive material, there has been a demand for further expanding the temperature range for the transparency. In addition, even if the invention in the material aspect as described above is reflected, the reversible thermosensitive material having a wide temperature range in which the temperature range for transparency changes depending on the manufacturing conditions of the thermosensitive layer, etc. Could not be obtained.
【0004】[0004]
【発明が解決しようとする課題】本発明は、前記の不都
合、欠点を解消して、加熱制御に余裕がある可逆性感熱
記録材料、及び該可逆性感熱記録材料の製造方法を提供
するものである。SUMMARY OF THE INVENTION The present invention solves the above-mentioned disadvantages and drawbacks, and provides a reversible thermosensitive recording material having sufficient heating control and a method for producing the reversible thermosensitive recording material. is there.
【0005】[0005]
【課題を解決するための手段】本発明は、支持体上に、
温度に依存して透明度が可逆的に変化する有機低分子物
質と樹脂母材とから成る感熱層を設けた可逆性感熱記録
材料において、該有機低分子物質は該樹脂母材中に分散
された状態の相分離構造を有し、該感熱層の相分離の構
造周期が1.5μm以上であることを特徴とする可逆性
感熱記録材料が提供される。また、有機低分子物質と樹
脂母材とを含む溶液を支持体上に塗布し、塗膜を形成さ
せた後乾燥させ、感熱層を形成させてなる前記可逆性感
熱記録材料の製造方法において、該塗膜中の溶媒90%
以上を蒸発させた後、140℃以上で熱処理することを
特徴とする前記可逆性感熱記録材料の製造方法が提供さ
れる。SUMMARY OF THE INVENTION The present invention provides a method for manufacturing a semiconductor device comprising the steps of:
In a reversible thermosensitive recording material provided with a heat-sensitive layer composed of an organic low-molecular substance whose transparency reversibly changes depending on temperature and a resin base material, the organic low-molecular substance was dispersed in the resin base material. A reversible thermosensitive recording material is provided, which has a phase separation structure in a state, and a structural period of phase separation of the thermosensitive layer is 1.5 μm or more. Further, in the method for producing a reversible thermosensitive recording material, a solution containing an organic low-molecular substance and a resin base material is coated on a support, a coating film is formed and dried, and a thermosensitive layer is formed. 90% solvent in the coating
The method for producing the reversible thermosensitive recording material is characterized in that after the above is evaporated, heat treatment is performed at 140 ° C. or higher.
【0006】本発明の可逆性感熱記録材料は、前記のご
とき透明度変化(透明状態、白濁不透明状態)を利用し
ており、この透明状態と白濁不透明状態との違いは次の
ように推測される。すなわち、(i)透明の場合には樹
脂母材中に分散された有機低分子物質の粒子は有機低分
子物質の大きな粒子で構成されており、片側から入射し
た光は散乱されること無く反対側に透過するため透明に
見えること、また、(ii)白濁の場合には有機低分子物
質の粒子は有機低分子物質の微細な結晶が集合した多結
晶で構成され、個々の結晶の結晶軸がいろいろな方向を
向いているため片側から入射した光は有機低分子物質粒
子の結晶の界面で何度も屈折し、散乱されるため白く見
えること、等に由来している。The reversible thermosensitive recording material of the present invention utilizes the above-mentioned change in transparency (transparent state, cloudy opaque state), and the difference between this transparent state and cloudy opaque state is presumed as follows. . That is, (i) in the case of transparency, the particles of the organic low-molecular substance dispersed in the resin base material are composed of large particles of the organic low-molecular substance, and the light incident from one side is not scattered and is opposite. (Ii) In the case of cloudiness, the particles of the organic low-molecular substance are composed of polycrystals composed of fine crystals of the organic low-molecular substance, and the crystal axes of the individual crystals Is oriented in various directions, so that light incident from one side is refracted many times at the interface between the crystals of the organic low-molecular substance particles, and is scattered, so that it appears white.
【0007】図1(熱による透明度の変化を表わしてい
る)において、樹脂母材と、この樹脂母材中に分散され
た有機低分子物質とを主成分とする感熱層は、例えばT
0以下の常温では白濁不透明状態にある。これを温度T2
に加熱すると透明になり、この状態で再びT0以下の常
温に戻しても透明のままである。これは温度T2からT0
以下に至るまでに有機低分子物質が半溶融状態を経て微
細な多結晶状態からより大きな単結晶状態へと結晶が成
長するためと考えられる。更にT3以上の温度に加熱す
ると、最大透明度と最大不透明度との中間の半透明状態
になる。次に、この温度を下げて行くと、再び透明状態
をとることなる最初の白濁不透明状態に戻る。これは温
度T3以上で有機低分子物質が溶融後、冷却されること
により多結晶が析出するためであると考えられる。な
お、この不透明状態のものをT1〜T2間の温度に加熱し
た後、常温すなわちT0以下の温度に冷却した場合には
透明と不透明との中間の状態をとることができる。ま
た、前記常温で透明になったものも再びT3以上の温度
に加熱した後常温に戻せば、再び白濁不透明状態に戻
る。即ち、常温で不透明及び透明の両形態並びにその中
間状態をとることができる。従って、熱を選択的に与え
ることにより感熱層を選択的に加熱し、透明地に白濁画
像、白濁地に透明画像を形成することができ、その変化
は何回も繰り返することが可能である。In FIG. 1 (which shows a change in transparency due to heat), a heat-sensitive layer mainly composed of a resin base material and an organic low-molecular substance dispersed in the resin base material is, for example, T
At a room temperature of 0 or less, it is cloudy and opaque. This is called temperature T 2
When the temperature is returned to room temperature below T 0 , the film remains transparent. This is from temperature T 2 to T 0
It is considered that the crystal grows from the fine polycrystalline state to the larger single crystal state through the semi-molten state of the organic low-molecular substance until the following. Upon further heating to T 3 or more temperature becomes translucent state intermediate between the maximum transparency and the maximum opacity. Then, when the temperature is lowered, the state returns to the first cloudy and opaque state, which is again a transparent state. This after low-molecular organic material is melted at a temperature T 3 or more, presumably because the polycrystals precipitated by being cooled. When this opaque state is heated to a temperature between T 1 and T 2 and then cooled to room temperature, that is, a temperature equal to or lower than T 0 , an intermediate state between transparent and opaque can be obtained. Also, by returning to room temperature After heating to be again T 3 or more temperature which became clear at the normal temperature, the flow returns to cloudy opaque state again. That is, both opaque and transparent forms at room temperature and intermediate states thereof can be taken. Therefore, the heat-sensitive layer can be selectively heated by selectively applying heat to form a cloudy image on a transparent ground and a transparent image on a cloudy ground, and the change can be repeated many times. .
【0008】しかしながら、前記の如く可逆性感熱記録
材料の記録・消去が有機低分子物質の結晶状態におい
て、微細な多結晶状態か比較的大きな単結晶状態かとい
う差異によって光散乱、光透過を利用するプロセスであ
るので、光散乱・透過を起こさせるための結晶成長やそ
の効果は自ずと有機低分子物質と樹脂母材の相分離構造
に依存する。However, as described above, light scattering and light transmission are used depending on whether the recording / erasing of the reversible thermosensitive recording material is a fine polycrystalline state or a relatively large single crystal state in the crystalline state of the organic low molecular substance. Therefore, the crystal growth for causing light scattering and transmission and the effect thereof naturally depend on the phase separation structure between the organic low-molecular substance and the resin base material.
【0009】相分離の状態を記述するにあたって、構造
周期の考え方が重要になる。構造周期というのは相分離
構造の大きさを表わす量と考えてよい。例えば、図2
(a)に模式的に示したようなA物質がB物質中に球状
のドメインを形成して成る相分離構造においては図2
(a)中の点線の位置での断面を考えると、図2(b)
に示したようにA物質とB物質の組成は周期的に変化し
た形でとらえることができる。この周期Λを構造周期と
呼ぶ。この構造周期はどのような相分離構造においても
とらえられるわけではなく、次のような要因が総合的に
満足された場合にとらえることが可能であり、また、意
味のある数値となる。 (1)相分離構造がある程度秩序のある規則正しさをも
っており特徴的な構造周期があること。 (2)構造中のA物質とB物質の体積比が極端に大きか
ったり、小さかったりしないこと。 (3)構造中のA物質とB物質がある程度明確に分離し
ていること。In describing the state of phase separation, the concept of the structural period becomes important. The structural period may be considered as a quantity representing the size of the phase separation structure. For example, FIG.
FIG. 2 shows a phase separation structure in which substance A forms a spherical domain in substance B as schematically shown in FIG.
Considering the cross section at the position of the dotted line in (a), FIG.
As shown in the above, the composition of the substance A and the substance B can be grasped in a periodically changed form. This period Λ is called a structural period. This structural period is not determined in any phase separation structure, but can be determined when the following factors are comprehensively satisfied, and is a meaningful numerical value. (1) The phase-separated structure has a certain degree of regularity and a characteristic structural period. (2) The volume ratio between the substance A and the substance B in the structure is not extremely large or small. (3) Substance A and substance B in the structure are clearly separated to some extent.
【0010】本発明に係る可逆性感熱記録材料の場合、
A物質が有機低分子物質、B物質が樹脂母材とおきかえ
て考えて良く、該感熱層中でこれらの物質が上記
(1)、(2)、(3)の要因を総合的に満足する場合
に構造周期の概念が有効となる。ただし、上記(1)、
(2)、(3)の要因の各々がどの程度満足されれば良
いかは明確にはできない。このような構造周期でとらえ
る方法としては、有機高分子化合物の構造解析に用いら
れる光散乱測定法が有効である。光散乱の測定法につい
ては図3(a)に模式的に示したように、試料に光源か
ら光をあてその透過光の散乱角度から構造周期を算出す
るもので散乱角度と構造周期Λの関係は(1)式(数
1)で与えられる。 〔数1〕 ここで、λは光源の波長[μm]、Dは試料の屈折率
[−]、σは散乱角度[deg]である。一般に測定に
用いる光源にはレーザー光が用いられており、He−N
eレーザーが最も良く用いられている。前記(1)、
(2)、(3)の条件を満足するような試料を光散乱測
定装置にかけると散乱光は図3(a)に示したようなリ
ング状の光強度分布を示す。散乱光強度を散乱角度に対
しプロットすると図3(b)のようなある角度で強度の
ピーク値をもった曲線を示す。このピーク値での角度θ
mを前記(1)式に代入し得られた値がその試料特有の
構造周期Λmとなる。In the case of the reversible thermosensitive recording material according to the present invention,
The substance A may be considered as a low-molecular organic substance and the substance B may be considered as a resin base material, and these substances comprehensively satisfy the above factors (1), (2) and (3) in the heat-sensitive layer. In this case, the concept of the structural period becomes effective. However, the above (1),
It is not clear how much each of the factors (2) and (3) should be satisfied. A light scattering measurement method used for analyzing the structure of an organic polymer compound is effective as a method of capturing such a structural period. As shown in FIG. 3 (a), a method of measuring light scattering involves applying light from a light source to a sample and calculating the structural period from the scattering angle of the transmitted light. The relationship between the scattering angle and the structural period Λ Is given by equation (1). [Equation 1] Here, λ is the wavelength [μm] of the light source, D is the refractive index of the sample [−], and σ is the scattering angle [deg]. Generally, laser light is used as a light source for measurement, and He-N
e-lasers are most often used. (1),
When a sample satisfying the conditions (2) and (3) is applied to a light scattering measurement device, the scattered light shows a ring-shaped light intensity distribution as shown in FIG. When the scattered light intensity is plotted against the scattering angle, a curve having a peak value of the intensity at a certain angle as shown in FIG. 3B is shown. Angle θ at this peak value
The value obtained by substituting m into the above equation (1) becomes the structural period Δm unique to the sample.
【0011】本発明に係る可逆性感熱記録材料におい
て、光散乱測定法によって該感熱層の構造周期を測定す
る場合の具体的な方法を例として記す。光散乱測定装置
としては、(株)オプテック製 GP−7(光源He−
Neレーザー 波長λ=0.6328μm)を用いた。
測定試料はある程度の光透過性を有していることが必要
である。このため該感熱層を不透明な支持体上に設けた
場合はこの支持体を除去して試料としなければならない
が、透明な支持体上に設けた場合はこの限りではない。
また該感熱層はフィルム状であり、散乱角度の算出には
試料と空気の屈折率差を考慮した角度補正が必要とな
る。この理由は図4の模式的に示したように、散乱光が
フィルムと空気の界面にでさらに屈折をおこすため、見
かけの散乱角θapは真の散乱角θよりも小くなることに
よる。In the reversible thermosensitive recording material according to the present invention, a specific method for measuring the structural period of the thermosensitive layer by a light scattering measurement method will be described as an example. As a light scattering measuring device, GP-7 (Optical Co., Ltd.) (light source He-
Ne laser wavelength λ = 0.6328 μm) was used.
The measurement sample needs to have a certain degree of light transmittance. Therefore, when the heat-sensitive layer is provided on an opaque support, the support must be removed to obtain a sample. However, when the heat-sensitive layer is provided on a transparent support, this is not the case.
The heat-sensitive layer is in the form of a film, and calculation of the scattering angle requires angle correction in consideration of the refractive index difference between the sample and air. The reason for this is that, as schematically shown in FIG. 4, the scattered light further refracts at the interface between the film and air, so that the apparent scattering angle θap becomes smaller than the true scattering angle θ.
【0012】また本発明に係る試料では温度によって白
濁、透明及び半透明状態に変化するため、どの状態で光
散乱測定を行なうかが問題となる。透明状態においては
ほとんど散乱が起こらないため、白濁または半透明状態
で光散乱測定を行なう。この両者においては散乱の光強
度分布の形は多少異なるものの強度ピーク値での角度θ
mはほとんど変化しないため、測定のしやすい方の状態
で行なえば良い。Further, the sample according to the present invention changes to a cloudy, transparent, or translucent state depending on the temperature, and therefore, there is a problem in which state the light scattering measurement is performed. Since little scattering occurs in the transparent state, the light scattering measurement is performed in the cloudy or translucent state. In both cases, the shape of the light intensity distribution of scattering is slightly different, but the angle θ at the intensity peak value.
Since m hardly changes, the measurement should be performed in a state where measurement is easy.
【0013】そして、このような感熱体の背面に着色シ
ートを配置すれば、白地に着色シートの色の画像または
着色シートの地に白色の画像を形成することができる。
また、OHP(オーバーヘッドプロジェクター)などで
投影すれば、白濁部は暗部になり、透明部は光が透過し
スクリーン上では明部となる。If a colored sheet is arranged on the back of such a heat-sensitive element, an image of the color of the colored sheet on a white background or a white image on the background of the colored sheet can be formed.
Further, when projected by an OHP (overhead projector) or the like, the cloudy portion becomes a dark portion, the transparent portion transmits light, and becomes a bright portion on the screen.
【0014】このような可逆性感熱記録材料を用いて画
像の形成と消去とを行なうには、画像形成用と画像消去
用の二つのサーマルヘッドを持つか、若しくは、印加エ
ネルギー条件を変化させることにより画像形成及び画像
消去を行なう単一のサーマルヘッドを持つものの使用が
有効である。前者の場合には、二つのサーマルヘッドが
必要なため装置のコストは上がるが、それぞれのサーマ
ルヘッドのエネルギー印加条件を別々にし可逆性感熱記
録材料を1回通せば、画像の形成と消去とを行なうこと
ができる。後者の場合には、一つのサーマルヘッドで画
像の形成及び消去を行なうため、感熱記録材料が通過す
る1回にサーマルヘッドにエネルギーを印加する条件を
画像を形成する部位、消去する部位に合わせて細かく変
えていくか、または、一度感熱記録材料上の画像を消去
した後もう一度感熱記録材料を逆向きに走行させ別のエ
ネルギー条件で画像を形成する等、操作は複雑化するが
サーマルヘッドが1つであるため装置コストは安くな
る。To form and erase an image using such a reversible thermosensitive recording material, it is necessary to have two thermal heads for image formation and image erasing, or to change the applied energy conditions. It is effective to use a device having a single thermal head for forming an image and erasing an image. In the former case, the cost of the apparatus increases because two thermal heads are required, but if the energy application conditions for each thermal head are different and the reversible thermosensitive recording material is passed once, the formation and erasing of the image can be performed. Can do it. In the latter case, in order to form and erase an image with one thermal head, the condition for applying energy to the thermal head at one time when the thermal recording material passes is adjusted according to the part where the image is formed and the part to be erased. Although the operation is complicated, the operation is complicated, for example, the image is formed under different energy conditions by changing the thermal recording material in a small direction or by erasing the image on the thermal recording material once and then running the thermal recording material in the opposite direction again. Therefore, the equipment cost is reduced.
【0015】本発明に係る可逆性感熱記録材料を作るに
は、一般に樹脂母材及び有機低分子物質の二成分を溶解
した溶液をプラスチックシート、ガラス板、金属板など
の支持体の上に塗布乾燥して形成せしめれば良い。In order to prepare the reversible thermosensitive recording material according to the present invention, a solution in which two components of a resin base material and an organic low-molecular substance are dissolved is generally coated on a support such as a plastic sheet, a glass plate, or a metal plate. What is necessary is just to dry and form.
【0016】また、本発明の如き構造周期1.5μm以
上の相分離構造をもった感熱層を得る製造方法は、溶剤
構成、乾燥条件及び乾燥後の熱処理条件によって得られ
る。即ち、感熱層の構造周期は乾燥条件によってその大
小をコントロールすることが可能であり、乾燥強度が弱
いほど、すなわち遅い乾燥ほど大きな構造周期の感熱層
が得られる。しかしながら本発明のごとき大きな相分離
構造をもった感熱層を得るためには単に乾燥強度を弱く
すると、乾燥後の塗膜表面に有機低分子溶質が析出し、
さらに別の層を積層する場合の支障になることがしばし
ばあった。この析出を抑制するために、溶媒構成に工夫
したり乾燥温度等を精密にコントロールするなどして対
応することも可能であるが、塗工液の組成に制限を加え
たり、装置的に工夫したりする必要があった。Further, the method for producing a thermosensitive layer having a phase separation structure having a structural period of 1.5 μm or more as in the present invention can be obtained by a solvent constitution, drying conditions and heat treatment conditions after drying. That is, the size of the structural cycle of the heat-sensitive layer can be controlled by the drying conditions. The weaker the drying strength, that is, the slower the drying, the larger the heat-sensitive layer having a large structural cycle. However, in order to obtain a heat-sensitive layer having a large phase-separated structure as in the present invention, if the drying strength is simply reduced, organic low-molecular solutes precipitate on the coating film surface after drying,
Often, this hinders the stacking of another layer. In order to suppress this precipitation, it is possible to take measures such as devising the solvent composition or precisely controlling the drying temperature, etc.However, it is possible to restrict the composition of the coating liquid or to devise the equipment. Had to be done.
【0017】そこで、乾燥条件及び乾燥に続く熱処理条
件を選択することによって、本発明の目的を達成しうる
ことを見出した。即ち、溶液を支持体上に塗工し塗膜を
形成し、乾燥により塗膜中の溶媒の90%以上を蒸発さ
せた後、140℃以上で熱処理することにより構造周期
1.5μm以上でなおかつ塗膜表面への有機低分子物質
の析出のない感熱層が容易に得られる。これは塗膜表面
への有機低分子物質の析出を抑制しうるある程度の乾燥
強度を与え、一担、中程度の大きさの構造周期をもった
感熱層を形成させた後、熱処理によって構造周期をさら
に増大させるものであり、過度の熱を加えない限り一担
形成された塗膜表面の状態は変化しないため、有機低分
子物質の表面への析出がなく構造周期1.5μm以上の
感熱層が得られる。Therefore, it has been found that the object of the present invention can be achieved by selecting drying conditions and heat treatment conditions subsequent to drying. That is, the solution is coated on a support to form a coating film, and after drying 90% or more of the solvent in the coating film by drying, heat treatment is performed at 140 ° C. or more, so that the structural period is 1.5 μm or more and A heat-sensitive layer without deposition of organic low-molecular substances on the coating film surface can be easily obtained. This provides a certain amount of drying strength that can suppress the deposition of organic low-molecular substances on the coating film surface, forms a heat-sensitive layer with a medium-sized structural cycle, and then heat-treats it to form a structural cycle. The heat-sensitive layer having a structural period of 1.5 μm or more without deposition of organic low-molecular substances on the surface because the state of the formed coating film surface does not change unless excessive heat is applied. Is obtained.
【0018】熱処理により構造周期が増大するのは、次
のようなメカニズムによるものと考えられる。すなわ
ち、塗膜の溶媒がある程度蒸発し、明確な相分離構造を
示す状態においては、樹脂母材と有機低分子物質は相溶
せず、分離しようとする力が働き、構造周期をより大き
くしようとする。しかしながら、膜の温度が十分高くな
い状態では、樹脂母材の粘度が高く流動性がないために
分離しようとする力は、これに打ち勝つことはできない
が、温度の上昇とともに樹脂母材の粘度が低下し流動性
が増すために構造周期が増大することによる。It is considered that the structural period is increased by the heat treatment due to the following mechanism. In other words, when the solvent of the coating film evaporates to some extent and shows a clear phase-separated structure, the resin base material and the organic low-molecular-weight substance do not become compatible with each other, and a force for separating works to increase the structural period. And However, when the temperature of the membrane is not sufficiently high, the force of separation cannot be overcome due to the high viscosity of the resin base material and lack of fluidity, but the viscosity of the resin base material increases as the temperature increases. This is due to an increase in the structural period due to a decrease in the fluidity.
【0019】熱処理の温度は樹脂母材の種類や支持体の
種類にもよるが、あまり低いと構造周期の増大に時間を
要すが逆に高すぎると樹脂母材及び支持体を劣化させる
原因ともなるため、140℃以上250℃以下が好まし
い。さらにかかる熱処理を行なうに用いられる手段とし
ては、ヒーターロール、熱風式加熱器や赤外線加熱器な
どがある。Although the temperature of the heat treatment depends on the type of the resin base material and the type of the support, if it is too low, it takes time to increase the structural period, while if it is too high, the resin base material and the support may be deteriorated. Therefore, the temperature is preferably 140 ° C. or more and 250 ° C. or less. Means used for performing such heat treatment include a heater roll, a hot air heater, an infrared heater, and the like.
【0020】また、本発明において樹脂母材と有機低分
子物質の2成分を溶解する場合に蒸気圧の異なる少なく
とも二種類以上の有機溶剤を用いる方法がある。樹脂母
材及び有機低分子物質の種類によって種々選択できる
が、例えばテトラヒドロフラン、テトラヒドロピラン、
ジオキサン、メチルエチルケトン、メチルイソブチルケ
トン、クロロホルム、四塩化炭素、エタノール、トルエ
ン、ベンゼン等が挙げられる。In the present invention, there is a method in which at least two or more kinds of organic solvents having different vapor pressures are used when dissolving the two components of the resin base material and the organic low-molecular substance. Various selections can be made depending on the type of the resin base material and the organic low-molecular substance, for example, tetrahydrofuran, tetrahydropyran,
Examples thereof include dioxane, methyl ethyl ketone, methyl isobutyl ketone, chloroform, carbon tetrachloride, ethanol, toluene, and benzene.
【0021】本発明において、可逆性感熱記録材料の感
熱部の樹脂母材に用いられる樹脂は皮膜またはシートを
形成することができ透明性が良く、機械的に安定な樹脂
が好ましい。このような樹脂としては、ポリ塩化ビニ
ル;塩化ビニル−酢酸ビニル共重合体、塩化ビニル−酢
酸ビニル−ビニルアルコール共重合体、塩化ビニル−酢
酸ビニル−マレイン酸共重合体、塩化ビニル−アクリレ
ート共重合体等の塩化ビニル系共重合体;ポリ塩化ビニ
リデン、塩化ビニリデン−塩化ビニル共重合体、塩化ビ
ニリデン−アクリロニトリル共重合体等の塩化ビニリデ
ン系共重合体;ポリエステル;ポリアミド;ポリアクリ
レート又はポリメタクリレート或いはアクリレート−メ
タクリレート共重合体;シリコーン樹脂等が挙げられ
る。これらは単独で或いは2種以上混合して使用され
る。In the present invention, the resin used as the resin base material of the heat-sensitive portion of the reversible thermosensitive recording material is preferably a resin which can form a film or sheet, has good transparency, and is mechanically stable. Examples of such a resin include polyvinyl chloride; vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-vinyl alcohol copolymer, vinyl chloride-vinyl acetate-maleic acid copolymer, and vinyl chloride-acrylate copolymer. Vinylidene chloride copolymers such as polyvinylidene chloride, vinylidene chloride-vinyl chloride copolymer, vinylidene chloride-acrylonitrile copolymer; polyester; polyamide; polyacrylate or polymethacrylate or acrylate -Methacrylate copolymers; silicone resins and the like. These may be used alone or as a mixture of two or more.
【0022】一方、有機低分子物質としては感熱部中で
熱により多結晶から単結晶に変化するもの(図1に示し
た温度T1〜T3の範囲で変化するもの)であればよく、
一般に融点30〜200℃好ましくは50〜150℃程
度のものが使用される。このような有機低分子物質とし
てはアルカノール;アルカンジオール;ハロゲンアルカ
ノールまたはハロゲンアルカンジオール;アルキルアミ
ン;アルカン;アルケン;アルキン;ハロゲンアルカ
ン;ハロゲンアルケン;ハロゲンアルキン;シクロアル
カン;シクロアルケン;シクロアルキン;飽和または不
飽和モノまたはジカルボン酸又はこれらのエステル、ア
ミド又はアンモニウム塩;飽和または不飽和ハロゲン脂
肪酸またはこれらのエステル、アミド又はアンモニウム
塩;アリルカルボン酸またはそれらのエステル、アミド
又はアンモニウム塩;ハロゲンアリルカルボン酸または
それらのエステル、アミド又はアンモニウム塩;チオア
ルコール;チオカルボン酸又はそれらのエステル、アミ
ドまたはアンモニウム塩;チオアルコールのカルボン酸
エステル等が挙げられる。これらは単独で又は2種以上
混合して使用される。これらの化合物の炭素数は10〜
60、好ましくは10〜38、特に10〜30が好まし
い。エステル中のアルコール基部分は飽和していてもよ
く、飽和していなくてもよく、またハロゲン置換されて
いてもよい。いずれにしても有機低分子物質は分子中に
酸素、窒素、硫黄及びハロゲンの少くとも1種、例えば
−OH、−COOH、−CONH、−COOR、−N
H、−NH2、−S−、−S−S−、−O−、ハロゲン
等を含む化合物であることが好ましい。On the other hand, any organic low-molecular substance may be used as long as it changes from polycrystal to single crystal by heat in the heat-sensitive part (a substance which changes in the temperature range of T 1 to T 3 shown in FIG. 1).
Generally, those having a melting point of about 30 to 200 ° C, preferably about 50 to 150 ° C are used. Such organic low molecular weight substances include alkanol; alkane diol; halogen alkanol or halogen alkane diol; alkylamine; alkane; alkene; alkyne; halogen alkane; halogen alkene; halogen alkyne; cycloalkane; cycloalkene; cycloalkyne; Unsaturated mono- or dicarboxylic acids or their esters, amides or ammonium salts; saturated or unsaturated halogen fatty acids or their esters, amides or ammonium salts; allylcarboxylic acids or their esters, amides or ammonium salts; Esters, amides or ammonium salts thereof; thioalcohols; thiocarboxylic acids or esters, amides or ammonium salts thereof; Carboxylic acid esters, and the like. These may be used alone or in combination of two or more. These compounds have 10 to 10 carbon atoms.
60, preferably 10 to 38, particularly preferably 10 to 30. The alcohol group in the ester may be saturated, may not be saturated, and may be halogen-substituted. In any case, the organic low molecular weight substance contains at least one kind of oxygen, nitrogen, sulfur and halogen in the molecule, for example, -OH, -COOH, -CONH, -COOR, -N
H, -NH 2, -S -, - S-S -, - O-, is preferably a compound containing a halogen and the like.
【0023】更に具体的には、これら化合物としてはラ
ウリン酸、ドデカン酸、ミリスチン酸、ペンタデカン
酸、パルミチン酸、ヘンイコサン酸、トリコサン酸、リ
グノセリン酸、ペンタコサン酸、セロチン酸、モンタン
酸、メリシン酸、ステアリン酸、ベヘン酸、ノナデカン
酸、アラギン酸、オレイン酸等の高級脂肪酸;ステアリ
ン酸メチル、ステアリン酸テトラデシル、ステアリン酸
オクタデシル、ラウリン酸オクタデシル、パルミチン酸
テトラデシル、ベヘン酸ドデシル等の高級脂肪酸のエス
テル;C16H33−O−C16H33 , C16H33−S−C
16H33 ,C18H37−S−C18H37 , C12H25−S
−C12H25 ,C19H39−S−C19H39 , C12H25
−S−S−C12H25 , 等のエーテル又はチオエーテル等がある。中でも本発明
では高級脂肪酸、特にパルミチン酸、ヘンエイコサン
酸、トリコサン酸、リグノセリン酸、ペンタデカン酸、
ノナデカン酸、アラキン酸、ステアリン酸、ベヘン酸等
の炭素数16以上の高級脂肪酸が好ましく、炭素数16
〜24の高級脂肪酸が更に好ましい。More specifically, these compounds include lauric acid, dodecanoic acid, myristic acid, pentadecanoic acid, palmitic acid, henicosanoic acid, tricosanoic acid, lignoceric acid, pentacosanoic acid, serotinic acid, montanic acid, melicic acid, stearic acid. Higher fatty acids such as acid, behenic acid, nonadecanoic acid, araginic acid and oleic acid; esters of higher fatty acids such as methyl stearate, tetradecyl stearate, octadecyl stearate, octadecyl laurate, tetradecyl palmitate and dodecyl behenate; C 16 H 33 -OC 16 H 33 , C 16 H 33 -SC
16 H 33, C 18 H 37 -S-C 18 H 37, C 12 H 25 -S
-C 12 H 25, C 19 H 39 -S-C 19 H 39, C 12 H 25
—S—S—C 12 H 25 , And ether or thioether. Among them, in the present invention, higher fatty acids, especially palmitic acid, heneicosanoic acid, tricosanoic acid, lignoceric acid, pentadecanoic acid,
Higher fatty acids having 16 or more carbon atoms, such as nonadecanoic acid, arachinic acid, stearic acid, and behenic acid, are preferred.
~ 24 higher fatty acids are more preferred.
【0024】また、透明化できる温度の巾を広げるに
は、この明細書において記載した有機低分子物質を適宜
組合せるか、または、そうした有機低分子物質と融点の
異なる他の材料とを組合せればよい。これらは例えば特
開昭63−39378号、特開昭63−130380号
などの公報や、特願平1−140109号、特開平2−
1363号などの明細書に開示されているが、これらに
限定されるものではない。Further, in order to widen the range of temperatures at which transparency can be obtained, the organic low-molecular substance described in this specification is appropriately combined, or such an organic low-molecular substance is combined with another material having a different melting point. I just need. These are disclosed in, for example, JP-A-63-39378 and JP-A-63-130380, and Japanese Patent Application Nos. 1-140109, 2-
Although disclosed in the specification such as No. 1363, the present invention is not limited thereto.
【0025】なお、感熱層中の有機低分子物質と樹脂母
材との割合は、重量比で2:1〜1:16程度が好まし
く、1:2〜1:8が更に好ましい。樹脂母材の比率が
これ以下になると、有機低分子物質を樹脂母材中に保持
した膜に形成することが困難となり、またこれ以上にな
ると、有機低分子物質の量が少ないため、不透明化が困
難になる。The ratio between the organic low-molecular substance and the resin base material in the heat-sensitive layer is preferably about 2: 1 to 1:16, more preferably 1: 2 to 1: 8 by weight. When the ratio of the resin base material is less than this, it becomes difficult to form an organic low-molecular substance in a film held in the resin base material. Becomes difficult.
【0026】感熱層の厚みは1〜30μmが好ましく、
2〜20μmがさらに好ましい。感熱層が厚すぎると感
熱層の層内での熱の分布が発生し均一に透明化すること
が困難となる。また、感熱層が薄すぎると白濁度が低下
しコントラストが低くなる。更に、感熱層中の有機低分
子物質の量を増加させると白濁度を増すことができる。The thickness of the heat-sensitive layer is preferably 1 to 30 μm,
2-20 μm is more preferred. If the heat-sensitive layer is too thick, heat distribution will occur in the heat-sensitive layer, making it difficult to achieve uniform transparency. On the other hand, if the heat-sensitive layer is too thin, the turbidity decreases and the contrast decreases. Further, the turbidity can be increased by increasing the amount of the organic low-molecular substance in the heat-sensitive layer.
【0027】感熱層には以上の成分の他に、透明画像の
形成を容易にするために、界面活性剤、高沸点溶剤等の
添加物を添加することができる。これらの添加物の具体
例は次の通りである。 高沸点溶剤の例;リン酸トリブチル、リン酸トリ−2−
エチルヘキシル、リン酸トリフェニル、リン酸トリクレ
ジル、オレイン酸ブチル、フタル酸ジメチル、フタル酸
ジエチル、フタル酸ジブチル、フタル酸ジヘプチル、フ
タル酸ジ−n−オクチル、フタル酸ジ−2−エチルヘキ
シル、フタル酸ジイソノニル、フタル酸ジオクチルデシ
ル、フタル酸ジイソデシル、フタル酸ブチルベンジル、
アジピン酸ジブチル、アジピン酸ジ−n−ヘキシル、ア
ジピン酸ジ−2−エチルヘキシル、アゼライン酸ジ−2
−エチルヘキシル、セバシン酸ジブチル、セバシン酸ジ
−2−エチルヘキシル、ジエチレングリコールジベンゾ
エート、トリエチレングリコールジ−2−エチルブチラ
ート、アセチルリシノール酸メチル、アセチルリシノー
ル酸ブチル、ブチルフタリルブチルグリコレート、アセ
チルクエン酸トリブチル。In addition to the above components, additives such as a surfactant and a high boiling point solvent can be added to the heat-sensitive layer in order to facilitate formation of a transparent image. Specific examples of these additives are as follows. Examples of high boiling point solvents; tributyl phosphate, tri-2-phosphate
Ethylhexyl, triphenyl phosphate, tricresyl phosphate, butyl oleate, dimethyl phthalate, diethyl phthalate, dibutyl phthalate, diheptyl phthalate, di-n-octyl phthalate, di-2-ethylhexyl phthalate, diisononyl phthalate , Dioctyldecyl phthalate, diisodecyl phthalate, butylbenzyl phthalate,
Dibutyl adipate, di-n-hexyl adipate, di-2-ethylhexyl adipate, di-2 azelate
-Ethylhexyl, dibutyl sebacate, di-2-ethylhexyl sebacate, diethylene glycol dibenzoate, triethylene glycol di-2-ethyl butyrate, methyl acetyl ricinoleate, butyl acetyl ricinoleate, butyl phthalyl butyl glycolate, acetyl citric acid Tributyl.
【0028】界面活性剤、その他の添加物の例;多価ア
ルコール高級脂肪酸エステル;多価アルコール高級アル
キルエーテル;多価アルコール高級脂肪酸エステル、高
級アルコール、高級アルキルフェノール、高級脂肪酸高
級アルキルアミン、高級脂肪酸アミド、油脂又はポリプ
ロピレングリコールの低級オレフィンオキサイド付加
物;アセチレングリコール;高級アルキルベンゼンスル
ホン酸のNa、Ca、Ba又はMg塩;高級脂肪酸、芳
香族カルボン酸、高級脂肪酸スルホン酸、芳香族スルホ
ン酸、硫酸モノエステル又はリン酸モノ−又はジ−エス
テルのCa、Ba又はMg塩;低度硫酸化油;ポリ長鎖
アルキルアクリレート;アクリル系オルゴマー;ポリ長
鎖アルキルメタクリレート;長鎖アルキルメタクリレー
ト〜アミン含有モノマー共重合体;スチレン〜無水マレ
イン酸共重合体;オレフィン〜無水マレイン酸共重合
体。Examples of surfactants and other additives: polyhydric alcohol higher fatty acid ester; polyhydric alcohol higher alkyl ether; polyhydric alcohol higher fatty acid ester, higher alcohol, higher alkylphenol, higher fatty acid higher alkylamine, higher fatty acid amide Lower olefin oxide adducts of fats and oils or polypropylene glycol; acetylene glycol; Na, Ca, Ba or Mg salts of higher alkylbenzene sulfonic acids; higher fatty acids, aromatic carboxylic acids, higher fatty acid sulfonic acids, aromatic sulfonic acids, monoesters of sulfuric acid Or Ca, Ba or Mg salts of phosphoric acid mono- or di-esters; low sulfated oils; poly long chain alkyl acrylates; acrylic oligomers; poly long chain alkyl methacrylates; Chromatography copolymers; styrene-maleic anhydride copolymer; olefin-maleic anhydride copolymer.
【0029】本発明において、可逆性感熱記録材料の支
持体としては、前記したようにプラスチックフィルム、
ガラス板、金属板等が用いられる。この記録材料の画像
コントラストを向上させるために記録層の背面に光反射
層を設けることも可能である。この場合には記録層の厚
みを薄くしても高コントラストが得られる。具体的には
Al、Ni、Sn、Au、Ag等を蒸着することが挙げ
られる(特開昭64−14079号に記載)。支持体が
Al蒸着層のような樹脂との接着力に乏しい材質の場合
には、支持体と感熱層との間に接着層を設けてもよい
(特開平3−7377号)。他に、コントラストを向上
させるために感熱層と着色層ないしは光反射層の間に空
気等の低屈折等を設ける方法を用いてもよい。In the present invention, as the support of the reversible thermosensitive recording material, as described above, a plastic film,
A glass plate, a metal plate, or the like is used. In order to improve the image contrast of the recording material, a light reflection layer can be provided on the back surface of the recording layer. In this case, high contrast can be obtained even if the thickness of the recording layer is reduced. Specific examples include vapor deposition of Al, Ni, Sn, Au, Ag, and the like (described in JP-A-64-14079). When the support is made of a material having poor adhesion to a resin, such as an Al vapor-deposited layer, an adhesive layer may be provided between the support and the heat-sensitive layer (JP-A-3-7377). Alternatively, a method of providing low refraction of air or the like between the heat-sensitive layer and the coloring layer or the light reflecting layer may be used to improve the contrast.
【0030】また、本発明の感熱部上に、サーマルヘッ
ド等の書き込み法による加熱手段の熱と圧力で表面が変
形して透明部の透明度が低下するのを防ぐため、保護層
を設けても良い。感熱部上に積層する保護層(厚さ0.
1〜10μm)の材料としてはシリコーン系ゴム、シリ
コーン樹脂(特開昭63−221087号公報に記
載)、ポリシロキサングラフトポリマー(特開昭63−
317385号に記載)や紫外線硬化樹脂又は電子線硬
化樹脂(特開平2−566号に記載)等が挙げられる。
さらに、ごみ、埃等がサーマルヘッドに付着することを
防ぐために保護層に無機または有機の填料を含有させる
等の方法により表面を粗面にしてもよい(特開平4−8
5077号に記載)。いずれの場合も、塗布時に溶剤を
用いるが、その溶剤は、感熱部の樹脂ならびに有機低分
子物質を溶解しにくいほうが望ましい。感熱部の樹脂及
び有機低分子物質を溶解しにくい溶剤としてはn−ヘキ
サン、メチルアルコール、エチルアルコール、イソプロ
ピルアルコール等が挙げられ、特にアルコール系の溶剤
がコスト面から望ましい。Further, a protective layer may be provided on the heat-sensitive portion of the present invention in order to prevent the surface from being deformed by the heat and pressure of the heating means by a writing method such as a thermal head and the transparency of the transparent portion being reduced. good. A protective layer (thickness of 0. 0) laminated on the heat sensitive part.
Materials of silicone rubber, silicone resin (described in JP-A-63-221087), and polysiloxane graft polymer (JP-A-63-210 μm)
317385), an ultraviolet curable resin or an electron beam curable resin (described in JP-A-2-566).
Further, the surface may be roughened by a method such as adding an inorganic or organic filler to the protective layer in order to prevent dust, dirt and the like from adhering to the thermal head (Japanese Patent Laid-Open No. 4-8).
No. 5077). In any case, a solvent is used at the time of coating, and it is preferable that the solvent does not easily dissolve the resin of the heat-sensitive part and the organic low-molecular substance. Examples of the solvent that hardly dissolves the resin and the organic low-molecular substance in the heat-sensitive portion include n-hexane, methyl alcohol, ethyl alcohol, and isopropyl alcohol, and an alcohol-based solvent is particularly desirable in terms of cost.
【0031】更に、保護層形成液の溶剤やモノマー成分
等から感熱層を保護するために、保護層と感熱層との間
に中間層を設けることができる(特開平1−13378
号公報に記載)。中間層の材料としては感熱層中の樹脂
母材として挙げたものの他に下記のような熱硬化性樹
脂、熱可逆性樹脂が使用可能である。即ち、具体的に
は、ポリエチレン、ポリプロピレン、ポリスチレン、ポ
リビニルアルコール、ポリビニルブチラール、ポリウレ
タン、飽和ポリエステル、不飽和ポリエステル、エポキ
シ樹脂、フェノール樹脂、ポリカーボネート、ポリアミ
ド等が挙げられる。中間層の厚さは用途により異なるが
0.1〜2μmくらいが好ましい。これ以下になると、
保護効果が下がり、これ以上となると熱感度が低下す
る。さらに磁気記録層を設けカードとして用いることも
可能である(実開平2−3876号、特開平3−130
188号に記載)。Further, an intermediate layer can be provided between the protective layer and the heat-sensitive layer in order to protect the heat-sensitive layer from a solvent, a monomer component, and the like of the protective layer-forming solution (Japanese Patent Laid-Open No. 1-1378).
No. Gazette). As the material of the intermediate layer, the following thermosetting resins and thermoreversible resins can be used in addition to those listed as the resin base material in the thermosensitive layer. That is, specific examples include polyethylene, polypropylene, polystyrene, polyvinyl alcohol, polyvinyl butyral, polyurethane, saturated polyester, unsaturated polyester, epoxy resin, phenol resin, polycarbonate, polyamide, and the like. The thickness of the intermediate layer varies depending on the application, but is preferably about 0.1 to 2 μm. Below this,
The protective effect is reduced, and above this, the thermal sensitivity is reduced. Furthermore, it is also possible to provide a magnetic recording layer and use it as a card (Japanese Utility Model Laid-Open No. 2-3876, Japanese Unexamined Patent Publication No. 3-130).
188).
【0032】[0032]
【作用】本発明によれば感熱層の相分離構造の構造周期
を1.5μm以上とすることで加熱制御に余裕がある可
逆性感熱記録材料が得られる。この理由は明らかではな
いが、前述のように有機低分子物質の結晶状態に影響を
与えている有機低分子物質と樹脂母材の相互作用の大き
さが相分離の構造周期によって変化していることによる
ものと考えられる。透明化する温度巾が広くなるために
は、次の2つの要因のどちらか一方又は両方が満たさな
ければならない。 (1)ドメイン内において、白濁状態の微細な多結晶状
態から透明状態のより大きな単結晶状態への結晶成長変
化がより低温で起こる。 (2)ドメイン内において、有機低分子物質が溶融して
半白濁状態となる温度がより高温となる。 上記の(1)及び(2)の要因はドメイン内の有機低分
子物質の結晶状態が変化するときの問題であり、この変
化において樹脂母材との相互作用が影響しているものと
考えられる。また、影響の大きさが構造周期とともに変
化しており、構造周期1.5μm以上において十分に広
い透明化温度巾を与えるものと考えられる。According to the present invention, a reversible thermosensitive recording material having a sufficient heating control can be obtained by setting the structural period of the phase separation structure of the thermosensitive layer to 1.5 μm or more. Although the reason for this is not clear, as described above, the magnitude of the interaction between the organic low-molecular substance and the resin base material, which affects the crystal state of the organic low-molecular substance, varies depending on the structural period of the phase separation. It is thought to be due to this. Either one or both of the following two factors must be satisfied in order for the temperature range to be transparent to be widened. (1) In a domain, a crystal growth change from a fine polycrystalline state in a cloudy state to a larger single crystal state in a transparent state occurs at a lower temperature. (2) In the domain, the temperature at which the organic low-molecular substance is melted and becomes semi-opaque becomes higher. The above factors (1) and (2) are problems when the crystal state of the organic low-molecular substance in the domain changes, and it is considered that the interaction with the resin base material influences the change. . Further, the magnitude of the influence changes with the structural period, and it is considered that a sufficiently wide transparency temperature range is provided when the structural period is 1.5 μm or more.
【0033】本発明において、透明化温度巾への寄与の
大きさは、要因(2)よりも要因(1)の方が主なもの
である。要因(1)については相互作用を次のように解
釈することもできる。すなわち、有機低分子物質と樹脂
母材との相互作用は、結果として、ごく微細な結晶を生
成することをことを妨げる力としてはたらき、この力の
大きさは、構造周期が小さいほど大きい。逆に構造周期
が大きいとごく微細な多結晶を作りやすいとすれば、構
造周期大のときの白濁状態でのドメイン内は非常に微細
な結晶の集合として構成され、一方、構造周期小のとき
の白濁状態でのドメイン内はこれよりも多少大きな結晶
の集合として構成されていることになる。結晶はその大
きさが小さければ小さい程融点が下がることからより小
さな微細結晶の集合である構造周期大のときが、より低
温で多結晶状態から単結晶状態への変化が起こるものと
考えられる。In the present invention, the factor (1) is more important than the factor (2) in the degree of contribution to the transparency temperature range. For factor (1), the interaction can be interpreted as follows. That is, the interaction between the organic low-molecular substance and the resin base material acts as a force that prevents the formation of very fine crystals as a result, and the magnitude of this force increases as the structural period decreases. Conversely, if it is assumed that a very large polycrystal can be easily formed when the structural period is large, the domain in the cloudy state when the structural period is large is formed as a set of very fine crystals, while when the structural period is small. The domain in the cloudy state is formed as a set of crystals slightly larger than this. Since the melting point of the crystal decreases as the size of the crystal decreases, it is considered that a change from a polycrystalline state to a single crystal state occurs at a lower temperature when the structural period is large, which is a collection of smaller fine crystals.
【0034】[0034]
【実施例】ここでの部及び%はいずれも重量基準であ
る。 実施例1 約50μm厚の透明なポリエステルフィルム上に ベヘン酸 6部 エイコサン2酸 4部 塩化ビニル−酢酸ビニル共重合体 40部 (電気化学工業社製、デンカビニール #1000GK) フタル酸ジイソデシル 3部 テトラヒドロフラン 148部 トルエン 49部 よりなる溶液をワイヤーバーで塗布し、100℃の熱風
乾燥器中で60秒間乾燥後すばやく赤外線加熱器に入
れ、30秒間熱処理した、このときの温度は160℃〜
190℃であった。このようにして、15μm厚の記録
層を設け、さらにその上に、 ウレタンアクリレート系紫外線硬化性樹脂の75%酢酸ブチル溶液 (大日本インキ化学社製、ユニディック C7−157) 10部 イソプロピルアルコール 10部 よりなる溶液をワイヤーバーで塗布し、100℃の熱風
乾燥器中で60秒間乾燥後、80w/cmの紫外線ラン
プで硬化させ約2μm厚のオーバーコート相を設けて可
逆性感熱記録材料を作成した。EXAMPLES All parts and percentages herein are by weight. EXAMPLE 1 Behenic acid 6 parts Eicosane diacid 4 parts Vinyl chloride-vinyl acetate copolymer 40 parts (Denka vinyl # 1000GK, manufactured by Denki Kagaku Kogyo KK) Diisodecyl phthalate 3 parts Tetrahydrofuran on a transparent polyester film about 50 μm thick A solution consisting of 148 parts of toluene and 49 parts of a solution was applied with a wire bar, dried in a hot air drier at 100 ° C. for 60 seconds, quickly put into an infrared heater, and heat-treated for 30 seconds. The temperature at this time was 160 ° C.
190 ° C. In this manner, a recording layer having a thickness of 15 μm is provided, and further thereon, 10 parts of a 75% butyl acetate solution of a urethane acrylate-based ultraviolet curable resin (manufactured by Dainippon Ink and Chemicals, Inc., Unidic C7-157) 10 parts isopropyl alcohol 10 Part of the solution is applied with a wire bar, dried in a hot air drier at 100 ° C. for 60 seconds, and cured with an ultraviolet lamp of 80 w / cm to provide an overcoat phase having a thickness of about 2 μm to prepare a reversible thermosensitive recording material. did.
【0035】実施例2 熱処理の時間を60秒間とした以外は実施例1と同様に
して可逆性感熱材料を作成した。Example 2 A reversible thermosensitive material was prepared in the same manner as in Example 1 except that the heat treatment time was changed to 60 seconds.
【0036】実施例3 記録層の厚みを10μmとした以外は実施例1と同様に
して可逆性感熱記録材料を作成した。Example 3 A reversible thermosensitive recording material was prepared in the same manner as in Example 1 except that the thickness of the recording layer was changed to 10 μm.
【0037】実施例4 記録層の厚みを10μmとした以外は実施例2と同様に
して可逆性感熱記録材料を作成した。Example 4 A reversible thermosensitive recording material was prepared in the same manner as in Example 2 except that the thickness of the recording layer was changed to 10 μm.
【0038】比較例1 約50μm厚の透明なポリエステルフィルム上に実施例
1と同様の溶液をワイヤーバーで塗布し、100℃の熱
風乾燥器で90秒間乾燥して、15μm厚の感熱層を設
け、さらにその上に実施例と同様なオーバーコート層を
設けて可逆性感熱記録材料を作成した。Comparative Example 1 The same solution as in Example 1 was applied on a transparent polyester film having a thickness of about 50 μm with a wire bar, and dried with a hot air drier at 100 ° C. for 90 seconds to provide a heat-sensitive layer having a thickness of 15 μm. Further, an overcoat layer similar to that of the example was further provided thereon to prepare a reversible thermosensitive recording material.
【0039】比較例2 比較例1と同様にして10μm厚の記録層を設けた可逆
性感熱材料を作成した。Comparative Example 2 In the same manner as in Comparative Example 1, a reversible thermosensitive material provided with a recording layer having a thickness of 10 μm was prepared.
【0040】比較例3 乾燥温度を110℃とした以外は比較例2と同様にして
可逆性感熱記録材料を作成した。Comparative Example 3 A reversible thermosensitive recording material was prepared in the same manner as in Comparative Example 2 except that the drying temperature was changed to 110 ° C.
【0041】比較例4 乾燥温度を70℃とした以外は比較例1と同様にして可
逆性感熱記録材料を作成した。Comparative Example 4 A reversible thermosensitive recording material was prepared in the same manner as in Comparative Example 1 except that the drying temperature was changed to 70 ° C.
【0042】以上のようにして作成した可逆性感熱記録
材料を前述の光散乱測定法により構造周期を測定した。
測定は白濁と透明の中間状態(85℃)で行なった。ま
た屈折率Dは1.5として構造周期を計算した。実施例
1と比較例1の散乱角度と強度の関係を図5に示した。
次に、作成した各々の可逆性感熱記録材料を熱傾斜試験
機((株)東洋精機製作所 Type H−100)に
て、50〜118℃の温度範囲で2℃おきに加温し、各
加温部の画像濃度を測定した。画像濃度測定はマクベス
反射濃度計RD−914を用いた。そのとき黒色に印刷
した(O.D 1.9)を背面にして濃度測定を行なっ
た。透明化温度巾は、 O.D=〔(最透明濃度−最白濁濃度)×0.9+最白
濁濃度〕以上の温度を示す温度の下限と上限を温度V.
S.濃度のグラフから読み取り、その差として求めた。
ただし、比較例4は有機低分子物質の表面への析出があ
ったため評価から除外した。以上の結果を表1にまとめ
た。また構造周期と透明化温度巾の関係を図6に示し
た。図6で、膜厚15μm及び10μmの場合の各々に
ついて、透明化温度巾は構造周期とともに広くなってい
ることを示している。また本発明の可逆性感熱記録材料
は従来のものよりも構造周期が大きく透明化温度巾が広
い。The structure cycle of the reversible thermosensitive recording material prepared as described above was measured by the light scattering measurement method described above.
The measurement was performed in an intermediate state (85 ° C.) between cloudy and transparent. The structural period was calculated with the refractive index D set to 1.5. FIG. 5 shows the relationship between the scattering angle and the intensity in Example 1 and Comparative Example 1.
Next, each of the prepared reversible thermosensitive recording materials was heated by a thermal gradient tester (Type H-100, manufactured by Toyo Seiki Seisaku-sho, Ltd.) in a temperature range of 50 to 118 ° C. every 2 ° C. The image density of the warm part was measured. The image density was measured using a Macbeth reflection densitometer RD-914. At that time, the density measurement was performed with black (OD 1.9) printed on the back side. The clearing temperature range is O.D. D = [(most transparent density−most opaque density) × 0.9 + most opaque density]
S. The density was read from the graph, and the difference was obtained.
However, Comparative Example 4 was excluded from the evaluation because the organic low molecular weight substance was deposited on the surface. Table 1 summarizes the above results. FIG. 6 shows the relationship between the structural period and the transparency temperature range. FIG. 6 shows that for each of the film thicknesses of 15 μm and 10 μm, the transparency temperature width increases with the structural period. Further, the reversible thermosensitive recording material of the present invention has a larger structural period and a wider transparency temperature range than conventional ones.
【0043】[0043]
【表1】 [Table 1]
【0044】[0044]
【発明の効果】本発明の可逆性感熱記録材料は、感熱層
の相分離の構造周期が1.5μm以上であるから、透明
化温度範囲の幅が広く、記録及び消去における加熱制御
が容易である。また、本発明の、感熱層形成において、
支持体上に感熱層形成用塗布液を塗布し、塗膜を形成さ
せ、乾燥により該塗膜中の溶媒の90%以上を蒸発させ
た後140℃以上に熱処理させる製造方法により、前記
可逆性感熱記録材料を製造することができる。According to the reversible thermosensitive recording material of the present invention, since the structural period of the phase separation of the thermosensitive layer is 1.5 μm or more, the range of the transparency temperature range is wide, and the heating control in recording and erasing is easy. is there. Further, in the heat-sensitive layer formation of the present invention,
The above-mentioned reversible sensation is obtained by applying a coating solution for forming a heat-sensitive layer on a support, forming a coating film, evaporating 90% or more of the solvent in the coating film by drying, and then heat-treating to 140 ° C. or more. Thermal recording materials can be manufactured.
【図1】本発明に係る可逆性感熱記録材料の熱による透
明度の変化を表わした図である。FIG. 1 is a diagram showing a change in transparency of a reversible thermosensitive recording material according to the present invention due to heat.
【図2】(a)は、相分離構造を模式的に表わした図で
ある。(b)は、相分離構造と構造周期の関係を模式的
に表わした図である。FIG. 2A is a diagram schematically illustrating a phase separation structure. (B) is a diagram schematically showing the relationship between the phase separation structure and the structural period.
【図3】光散乱測定の概念を模式的に表わした図であ
る。FIG. 3 is a diagram schematically illustrating the concept of light scattering measurement.
【図4】見かけの散乱角と真の散乱角の関係を模式的に
表わした図である。FIG. 4 is a diagram schematically showing a relationship between an apparent scattering angle and a true scattering angle.
【図5】実施例1及び比較例1の光散乱測定の結果を表
わした図である。FIG. 5 is a diagram showing the results of light scattering measurement of Example 1 and Comparative Example 1.
【図6】構造周期と透明化温度巾の関係を示した図であ
る。FIG. 6 is a diagram showing a relationship between a structural period and a transparentization temperature range.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 香川 勉 東京都大田区中馬込1丁目3番6号 株 式会社リコー内 (56)参考文献 特開 昭54−119377(JP,A) 特開 昭55−154198(JP,A) (58)調査した分野(Int.Cl.6,DB名) B41M 5/36 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Tsutomu Kagawa 1-3-6 Nakamagome, Ota-ku, Tokyo Inside Ricoh Company, Ltd. (56) References JP-A-54-119377 (JP, A) JP-A Sho 55-154198 (JP, A) (58) Fields studied (Int. Cl. 6 , DB name) B41M 5/36
Claims (3)
逆的に変化する有機低分子物質と樹脂母材とから成る感
熱層を設けた可逆性感熱層を設けた可逆性感熱記録材料
において、該有機低分子物質は該樹脂母材中に分散され
た状態の相分離構造を有し、該感熱層の相分離の構造周
期が1.5μm以上であることを特徴とする可逆性感熱
記録材料。1. A reversible thermosensitive recording material comprising a support and a reversible thermosensitive layer comprising a thermosensitive layer comprising a low-molecular organic substance whose transparency changes reversibly depending on temperature and a resin base material. Wherein the organic low-molecular substance has a phase separation structure in a state of being dispersed in the resin base material, and the structural cycle of phase separation of the heat-sensitive layer is 1.5 μm or more. Recording material.
る請求項1記載の可逆性感熱記録材料。The reversible thermosensitive recording material according to claim 1.
支持体上に塗布し、塗膜を形成させた後乾燥させ、感熱
層を形成させてなる請求項1又は2記載の可逆性感熱材
料の製造方法において、該塗膜中の溶媒の90%以上を
蒸発させた後、140℃以上で熱処理することを特徴と
する請求項1又は2記載の可逆性感熱記録材料の製造方
法。 3. A solution containing the low-molecular organic material and the resin base material coated on a support, and then dried to form a coating film, reversible sense of consisting to form a heat-sensitive layer according to claim 1 or 2, wherein 3. The method for producing a reversible thermosensitive recording material according to claim 1 or 2 , wherein in the method for producing a thermal material, after evaporating 90% or more of the solvent in the coating film, heat treatment is performed at 140 ° C or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4250707A JP2976398B2 (en) | 1992-08-26 | 1992-08-26 | Reversible thermosensitive recording material and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4250707A JP2976398B2 (en) | 1992-08-26 | 1992-08-26 | Reversible thermosensitive recording material and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0672032A JPH0672032A (en) | 1994-03-15 |
JP2976398B2 true JP2976398B2 (en) | 1999-11-10 |
Family
ID=17211856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4250707A Expired - Lifetime JP2976398B2 (en) | 1992-08-26 | 1992-08-26 | Reversible thermosensitive recording material and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2976398B2 (en) |
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1992
- 1992-08-26 JP JP4250707A patent/JP2976398B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0672032A (en) | 1994-03-15 |
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