JP2820328B2 - Abrasive for high-speed finishing - Google Patents
Abrasive for high-speed finishingInfo
- Publication number
- JP2820328B2 JP2820328B2 JP3037714A JP3771491A JP2820328B2 JP 2820328 B2 JP2820328 B2 JP 2820328B2 JP 3037714 A JP3037714 A JP 3037714A JP 3771491 A JP3771491 A JP 3771491A JP 2820328 B2 JP2820328 B2 JP 2820328B2
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- polishing
- film
- optical connector
- platen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 claims description 53
- 239000002245 particle Substances 0.000 claims description 31
- 239000013256 coordination polymer Substances 0.000 claims description 8
- 229920002678 cellulose Polymers 0.000 claims description 6
- 239000001913 cellulose Substances 0.000 claims description 6
- 229920002134 Carboxymethyl cellulose Polymers 0.000 claims description 5
- 239000001768 carboxy methyl cellulose Substances 0.000 claims description 5
- 235000010948 carboxy methyl cellulose Nutrition 0.000 claims description 5
- 239000008112 carboxymethyl-cellulose Substances 0.000 claims description 5
- 239000002612 dispersion medium Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 description 29
- 239000013307 optical fiber Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 12
- 239000007788 liquid Substances 0.000 description 11
- 239000010432 diamond Substances 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 9
- 239000000919 ceramic Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 208000032544 Cicatrix Diseases 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【０００１】[0001]
【発明の技術分野】本発明は高速仕上用研磨剤、さらに
詳細には高速においてセラミック燒結体、非結晶などの
硬脆材料を高能率に精密に研磨できる高速仕上用研磨剤
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive for high-speed finishing, and more particularly to an abrasive for high-speed finishing which can polish hard and brittle materials such as ceramic sintered bodies and amorphous materials at high speed with high efficiency.
【０００２】[0002]
【従来技術】光ファイバ相互間の接続や切り離しを容易
に行なうための光コネクタの端面を精密に研磨して接続
損失を低減し、反射戻り光を少なくする研磨方法として
は、金属の定盤面に光コネクタフェルールの先端を押圧
し、前記光コネクタフェルールの先端を定盤面に対し、
相対的にしゅう動させて光コネクタフェルールの先端を
研磨する方法がある。この際、研磨粒子であるダイヤモ
ンド粒子を含む油性研磨剤を前記研磨部分に供給しなが
ら行なう（第一方法）。2. Description of the Related Art As a polishing method for precisely polishing an end face of an optical connector for easily connecting and disconnecting optical fibers to each other to reduce connection loss and reduce reflected return light, a metal surface plate is used. Press the tip of the optical connector ferrule, the tip of the optical connector ferrule against the surface of the platen,
There is a method of polishing the tip of the optical connector ferrule by relatively sliding. At this time, the polishing is performed while supplying an oil-based abrasive containing diamond particles as abrasive particles to the polished portion (first method).
【０００３】また、回転定盤の上にゴム状の弾性シート
を設置し、ダイヤモンドなどの研磨粒子を塗布固定した
研磨シートを弾性シート状に載置し、これを研磨定盤と
して研磨剤や研磨液を光コネクタフェルールの先端に供
給しながら、先端部を押しつけて研磨する方法も知られ
ている。この方法においては、ゴム状の弾性シートのた
わみを利用して光コネクタフェルールの先端を球面に研
磨することが可能であり、ダイヤモンド粒子も微細であ
ることから光ファイバの表面も平滑に研磨することがで
きる（第二方法）。Further, a rubber-like elastic sheet is placed on a rotating platen, and a polishing sheet on which abrasive particles such as diamond are applied and fixed is placed in the form of an elastic sheet. There is also known a method in which a liquid is supplied to the tip of an optical connector ferrule while the tip is pressed to polish the liquid. In this method, the tip of the optical connector ferrule can be polished to a spherical surface by using the deflection of a rubber-like elastic sheet, and since the diamond particles are fine, the surface of the optical fiber can also be polished smoothly. (Second method).
【０００４】[0004]
【発明が解決しようとする課題】上述の第一の研磨方法
によれば、被研磨材である光コネクタを前記定盤に押し
つけ、さらにこの定盤を回転させ、加工面に油性研磨剤
を供給しながら研磨する。このとき、油性研磨剤は水性
研磨剤に比べて研磨能率が低く、光コネクタの加工面の
洗浄においては洗浄効率が良好とはいえない欠点があっ
た。また凝集して塊となったときには、局部的なひっか
き傷が多数形成され光ファイバの面に加工歪みによる残
留応力が形成されていた。この結果光ファイバ面の極表
層部の屈折率が異なる境界層で光が反射し、戻り光とな
り、本来の信号のノイズになったり、半導体などの光源
に悪影響を及ぼすなどの問題を生じていた。According to the above-mentioned first polishing method, an optical connector, which is a material to be polished, is pressed against the surface plate, and the surface plate is further rotated to supply an oily abrasive to the processing surface. While polishing. At this time, the oil-based abrasive has a lower polishing efficiency than the aqueous abrasive, and has a drawback that the cleaning efficiency is not good in cleaning the processed surface of the optical connector. Further, when the aggregates were aggregated, a large number of local scratches were formed, and residual stress due to processing strain was formed on the surface of the optical fiber. As a result, light is reflected on a boundary layer having a different refractive index at the outermost layer of the optical fiber surface, becomes a return light, and causes problems such as noise of an original signal and adversely affecting a light source such as a semiconductor. .
【０００５】また、上述の第二の研磨方法によれば、前
記光コネクタは外周を覆うジルコニアなどの固いセラミ
ックよりなるフェルールとその中心に設けられた光ファ
イバより構成されるが、前記フェルールは固いため、光
ファイバより研磨されにくい。このため光ファイバが優
先的に研磨されることになり、光コネクタフェルールの
中心に引っ込みを生じてしまうという欠点があった。こ
の引っ込み量が０．１μｍ程度あると、光コネクタ同志
を突き合わせたときに光ファイバ先端間に隙間を生じ、
信号伝達時に光の反射が発生して回路全体に悪影響を及
ぼす問題があった。According to the above-mentioned second polishing method, the optical connector comprises a ferrule made of a hard ceramic such as zirconia covering the outer periphery and an optical fiber provided at the center of the ferrule, but the ferrule is hard. Therefore, it is harder to polish than an optical fiber. For this reason, the optical fiber is polished preferentially, and there is a drawback that the center of the optical connector ferrule is retracted. If the amount of retraction is about 0.1 μm, a gap is created between the ends of the optical fibers when the optical connectors are butted against each other,
There has been a problem that light is reflected during signal transmission and adversely affects the entire circuit.
【０００６】本発明は上述の問題点に鑑みなされたもの
であり、上述のような研磨方法に主として使用する研磨
剤において、局部的な傷を形成せず、良好な面粗度で研
磨でき洗浄の簡単な高速仕上用研磨剤を提供することを
課題とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and a polishing agent mainly used for the above-mentioned polishing method can be polished with a good surface roughness without forming local scars and can be cleaned. It is an object of the present invention to provide an abrasive for high-speed finishing which is simple.
【０００７】[0007]
【課題を解決するための手段】上記課題を解決するた
め、本発明による高速仕上用研磨剤は、親水性セルロー
スフィルムである定盤フィルムに被研磨剤を押し付けて
高速研磨するための高速仕上用研磨剤であって、水性分
散媒中に平均粒径が０．１〜１０μｍの研磨粒子とカル
ボキシメチルセルロースを添加し、１から２０ＣＰの粘
性値を示すようにしたことを特徴とするものである。In order to solve the above-mentioned problems, an abrasive for high-speed finishing according to the present invention comprises a hydrophilic cellulose.
Press the abrasive on the platen film
A fast finish polishing agents for high-speed polishing, abrasive particles having an average particle size in an aqueous dispersion medium 0.1~10μm and Cal
Boxymethylcellulose is added to give a viscosity value of 1 to 20 CP.
【０００８】水性分散媒中に親水性セルロースを添加
し、研磨液の粘度を１〜２０ＣＰと大きくすることによ
り、高速で回転研磨する定盤フィルムの遠心力によって
外周方向に飛散しにくくしたため、光コネクタフェルー
ルの端面を良好に研磨することができる。また、定盤フ
ィルムとして親水性セルロースフィルムを使用すること
によって、研磨液と定盤フィルムの濡れ性が著しく改良
され、研磨効率および良好な研磨が可能になるという利
点がある。 [0008] By adding hydrophilic cellulose to the aqueous dispersion medium and increasing the viscosity of the polishing liquid to 1 to 20 CP, it is difficult to scatter in the outer peripheral direction due to the centrifugal force of the platen film which is polished at high speed. The end face of the connector ferrule can be polished well. In addition,
Use of hydrophilic cellulose film as film
Significantly improves the wettability between the polishing liquid and the platen film
Polishing efficiency and good polishing.
There is a point.
【０００９】本発明をさらに詳しく説明する。The present invention will be described in more detail.
【０００１０】本発明に使用される研磨粒子は基本的に
限定されるものではなく、種々のものが使用できる。例
えば天然ダイヤモンドあるいは人造ダイヤモンド、キュ
ービックボロンナイトランドなどを挙げることができ
る。このなかで、光コネクタフェルールの研磨にはダイ
ヤモンド粒子がもっとも好ましい。The abrasive particles used in the present invention are not fundamentally limited, and various abrasive particles can be used. For example, natural diamond, artificial diamond, cubic boron nightland, and the like can be given. Of these, diamond particles are most preferable for polishing the optical connector ferrule.
【０００１１】このような研磨粒子は好ましくは０．１
〜１０重量％添加する。０．１重量％未満であると研磨
力が不足し、また研磨面を傷つける恐れを生じる。一方
１０重量％を越えて添加しても研磨力は、これ以上上昇
しないし、かえって面状態を悪化させると共に相手方の
定盤の耐久性を悪化させる恐れがある。Such abrasive particles are preferably 0.1
To 10% by weight. If the amount is less than 0.1% by weight, the polishing power is insufficient, and the polished surface may be damaged. On the other hand, if it is added in an amount exceeding 10% by weight, the polishing power does not increase any more, and on the contrary, the surface condition may be worsened and the durability of the mating platen may be worsened.
【０００１２】さらに研磨粒子の平均粒径は０．１〜１
０μｍであるのがよい。平均粒径が０．１μｍ未満であ
ると、製造が困難であると共に研削力が不足する恐れを
生じ、一方１０μｍを越えると、面粗度が悪化する恐れ
がある。The average particle size of the abrasive particles is 0.1 to 1
It is preferably 0 μm. If the average particle size is less than 0.1 μm, the production becomes difficult and the grinding force may be insufficient. On the other hand, if it exceeds 10 μm, the surface roughness may be deteriorated.
【００１３】カルボキシメチルセルロースとしてはミク
ロフィビリル化したものを使用するのがよい。 As carboxymethylcellulose, Miku
It is preferable to use a rofibilylated product.
【００１４】この親水性カルボキシメチルセルロースの
添加量は、好ましくは０．０４〜２０重量％である。
０．０４重量％未満であると、粘度が不足し、また研磨
粒子を均一に分散できない恐れがあり、一方２０重量％
を越えると粘度が大きくなり過ぎる恐れを生じるからで
ある。[0014] The amount of the hydrophilic carboxymethyl cellulose added is preferably 0.04 to 20% by weight.
If the amount is less than 0.04% by weight, the viscosity may be insufficient, and the abrasive particles may not be uniformly dispersed.
This is because, if it exceeds, the viscosity may become too large.
【００１５】上述のような親水性カルボキシメチルセル
ロース及び研磨粒子は水性分散媒に添加され、研磨剤と
するものであるが、この研磨剤の粘度は１〜２０ＣＰで
ある。この粘度が１ＣＰ未満であると、粘度が小さすぎ
て高速研磨できない恐れがあり、一方２０ＣＰを越える
と粘度が大きくなり過ぎる。A hydrophilic carboxymethyl cell as described above
Loin and abrasive particles are added to an aqueous dispersion medium to form an abrasive, and the viscosity of the abrasive is 1 to 20 CP. If the viscosity is less than 1 CP, the viscosity may be too small to perform high-speed polishing, while if it exceeds 20 CP, the viscosity may be too large.
【０００１６】上述のような研磨剤には、上述の成分の
ほか、例えば増粘剤、分散剤などを添加することも可能
である。The above-mentioned abrasive may contain, for example, a thickener and a dispersant in addition to the above-mentioned components.
【０００１７】本発明による高速仕上用研磨剤によれ
ば、特に研磨定盤の周速が５０〜８００ｍ／分という高
速で研磨する研磨剤として優れている。The polishing agent for high-speed finishing according to the present invention is particularly excellent as a polishing agent for polishing at a high speed of a peripheral speed of a polishing platen of 50 to 800 m / min.
【０００１８】[00018]
【実施例】第１図に本発明の高速仕上用研磨剤を使用す
るための研磨装置の概略図を示している。この図より明
らかなように、シート状のセルロース系樹脂製の定盤フ
ィルム１がリング状金具２と薄板の押さえリング３とで
挾持されている。そして回転定盤４外周部に形成された
ねじ部４aにリング状金具２を閉め込んで固定すると、
回転定盤４の上面に形成されたリング状金具４ｂにより
定盤フィルム１は一定の張力で引っ張られる。FIG. 1 is a schematic view of a polishing apparatus for using the polishing agent for high-speed finishing of the present invention. As is clear from this figure, a sheet-shaped platen film 1 made of a cellulose resin is sandwiched between a ring-shaped metal fitting 2 and a thin holding ring 3. Then, when the ring-shaped metal fitting 2 is closed and fixed to the screw part 4a formed on the outer periphery of the rotary platen 4,
The platen film 1 is pulled with a constant tension by the ring-shaped metal fitting 4b formed on the upper surface of the rotary platen 4.
【０００１９】図示しない回転装置にはチャック５が設
けられており、チャック５には光コネクタフェルール６
が保持されている。光コネクタフェルール６はセラミッ
クであるジルコニア製のフェルール７と、フェルール７
の中心に固定された光ファイバ８とで構成され、光コネ
クタフェルールの先端は前記定盤フィルム１に一定量押
し込まれて、押圧された状態になっている。図中、９は
光コネクタフェルール６の先端と定盤フィルム１の当接
部に研磨剤を供給する研磨剤供給ノズルである。A rotating device (not shown) is provided with a chuck 5, and the chuck 5 has an optical connector ferrule 6
Is held. The optical connector ferrule 6 includes a ferrule 7 made of ceramic zirconia and a ferrule 7.
And the optical fiber 8 fixed to the center of the optical connector ferrule. The tip of the optical connector ferrule is pushed into the platen film 1 by a fixed amount, and is in a pressed state. In the figure, reference numeral 9 denotes an abrasive supply nozzle for supplying an abrasive to a contact portion between the tip of the optical connector ferrule 6 and the platen film 1.
【０００２０】このような装置を使用し、前述の光コネ
クタフエルール６の研磨を行なった。まず、研磨剤１０
として、粒径幅０〜５μｍのダイヤモンド粒子を０．２
〜１０重量％、カルボキシメチルセルロースを０．０４
から２０重量％水に添加し、１から２０ＣＰの粘度に調
整した種々の研磨液を使用し、上記の研磨装置で研磨を
行なった。研磨定盤の周速は５００ｍ／ｍｉｎであり、
ファイバ先端の荷重は５００ｇであった。Using such an apparatus, the optical connector ferrule 6 was polished. First, the abrasive 10
The diamond particles having a particle size width of 0 to 5 μm
-10% by weight, 0.04% carboxymethylcellulose
To 20% by weight of water and various polishing liquids adjusted to a viscosity of 1 to 20 CP were polished by the above polishing apparatus. The peripheral speed of the polishing platen is 500 m / min,
The load at the fiber tip was 500 g.
【００２１】まず、光コネクタフェルール６の先端を定
盤フィルム１に一定量押し込み、定盤フィルム１のフィ
ルム面に研磨剤供給ノズル９より研磨剤を滴下させる。
回転定盤４を回転させると共にチャック５を回転させ、
さらに回転定盤４を径方向に揺動させ、定盤フィルム１
に対し、光コネクタフェルール６の先端を相対的に揺動
させて光コネクタフェルール６の先端を研磨した。この
ような研磨操作によって１〜５μｍ前後の量を研磨す
る。また、平均粒径０．１〜１０μｍのダイヤモンド粒
子を添加され、また所定の粘度の研磨液は前記定盤フィ
ルム１などの回転によって容易に分散状態となる。さら
に、粘性研磨液の上層に浮遊した粒子と粘性研磨液によ
り粘度層が形成され、流体支持された粒子を多量に含ん
だソフトなポリシャと同じ工具が出来上がる。このよう
な粘性状態の水溶液である研磨剤１０と、水との親和性
のよいOH基を有するセルロース系の定盤フィルム１との
組み合わせを使用すると、研磨中に被研磨面と定盤フィ
ルム１との面との間に粘度層が形成される。この研磨剤
と定盤フィルム相互の水酸基により、水に対する濡れ性
が極めて良好になる。この結果、研磨液中の粒子が被研
磨面に作用して、ジルコニアセラミックス、石英ファイ
バの端面に凝集せず、粒子の分散が均一になる。また、
研磨剤の粘性効果により研磨中も飛散することなく、十
分保持されることから、加工能率も高まり、さらに粒子
が塊として作用しないため傷の発生も妨げられる。First, the tip of the optical connector ferrule 6 is pushed into the platen film 1 by a predetermined amount, and the abrasive is dropped from the abrasive supply nozzle 9 onto the film surface of the platen film 1.
By rotating the rotary platen 4 and the chuck 5,
Further, the rotating platen 4 is swung in the radial direction, and the platen film 1 is rotated.
The tip of the optical connector ferrule 6 was polished by relatively swinging the tip of the optical connector ferrule 6. By such a polishing operation, an amount of about 1 to 5 μm is polished. In addition, diamond particles having an average particle size of 0.1 to 10 μm are added, and the polishing liquid having a predetermined viscosity is easily dispersed by rotation of the platen film 1 or the like. Furthermore, a viscous layer is formed by the particles suspended in the upper layer of the viscous polishing liquid and the viscous polishing liquid, and the same tool as a soft polisher containing a large amount of particles supported by the fluid is completed. When a combination of the abrasive 10 which is an aqueous solution in such a viscous state and the cellulose-based platen film 1 having an OH group having a good affinity for water is used, the surface to be polished and the platen film 1 during polishing are used. A viscous layer is formed between the surface and the surface . Due to the hydroxyl group between the abrasive and the platen film, the wettability with water becomes extremely good. As a result, the particles in the polishing liquid do not act on the surface to be polished and aggregate on the end faces of the zirconia ceramics and the quartz fiber, and the particles are uniformly dispersed. Also,
Due to the viscous effect of the abrasive, the abrasive is not scattered during polishing and is sufficiently held, so that the processing efficiency is enhanced, and the generation of scratches is prevented because the particles do not act as a lump.
【０００２２】第２図に、上述のような１から２０ＣＰ
に変化させた研磨液を使用したジルコニア及び石英それ
ぞれの加工能率を調べた実験結果を示す。この第２図よ
り明らかなようにジルコニアセラミックスと石英の加工
能率は粘度の増加にともない良好になることがわかっ
た。これは研磨剤が回転する定盤フィルムと被加工材の
間の領域外に遠心力によって飛散されるのを抑止し、有
効作用粒子が増加するためと考えられる。特にジルコニ
アセラミックスの場合には粒界及び気孔に微粒子が容易
に食い込み加工を促進するものと考えられる。[0002] Fig. 2 shows the above-mentioned 1 to 20 CP.
The experimental results of examining the processing efficiencies of zirconia and quartz using the polishing liquid changed to? As is clear from FIG. 2, the processing efficiency of zirconia ceramics and quartz became better as the viscosity increased. This is considered to be because the abrasive is prevented from being scattered by the centrifugal force outside the region between the rotating platen film and the workpiece, and the effective particles are increased. In particular, in the case of zirconia ceramics, it is considered that fine particles easily penetrate into grain boundaries and pores to promote the processing.
【０００２３】また、表１にジルコニアセラミックス、
石英ファイバ材についての粘度１ＣＰと２０ＣＰの研磨
剤における端面の表面粗さを測定した結果を示す。従来
の第一方法または第二方法で研磨した時の表面粗さは数
百Å程度であり、本発明の研磨粒子を用いることにより
大幅に改善できることが判る。[0002] Table 1 shows zirconia ceramics,
The result which measured the surface roughness of the end surface in the polishing agent of viscosity 1CP and 20CP about a quartz fiber material is shown. The surface roughness when polished by the conventional first method or the second method is about several hundreds of square meters, and it can be seen that the use of the abrasive particles of the present invention can greatly improve the surface roughness.
【０００２４】[00024]
【表１】 [Table 1]
【０００２５】一方、前述したように、従来の第二方法
で得られた光コネクタフェルールの先端形状は、図４に
示したようになる。第一方法、第二方法では光ファイバ
３１の面にひっかき傷が多数形成されて光の反射減衰量
が３０ｄＢ以下となり、特に第二方法では光ファイバ４
２の引っ込み４３量が、図４に示すように０．０５μｍ
以上となる。なお、図中、４１はフェルールを示す。On the other hand, as described above, the tip shape of the optical connector ferrule obtained by the conventional second method is as shown in FIG. In the first method and the second method, a large number of scratches are formed on the surface of the optical fiber 31 and the reflection loss of light becomes 30 dB or less.
2 was 0.05 μm as shown in FIG.
That is all. In the figure, reference numeral 41 denotes a ferrule.
【０００２６】図３に本発明の研磨剤により研磨した光
ファイバコネクタの結果を示す。図より明らかなよう
に、フェルール７と光ファイバ８の段差は０．０１μｍ
以下と小さく、この状態からさらに研磨時間を増加させ
ても光ファイバ８の突出し量はこれ以上増加しない。光
ファイバ８の表面の平均粗さ（Ra）は２０Å以下であ
る。また光コネクタフェルール６の反射減衰量は３５ｄ
Ｂ前後が得られる。FIG. 3 shows the results of an optical fiber connector polished with the abrasive of the present invention. As is apparent from the figure, the step between the ferrule 7 and the optical fiber 8 is 0.01 μm.
The protrusion amount of the optical fiber 8 does not further increase even if the polishing time is further increased from this state. The average roughness (Ra) of the surface of the optical fiber 8 is 20 ° or less. The return loss of the optical connector ferrule 6 is 35d.
B is obtained.
【０００２７】上述したように、セルロース系の樹脂フ
ィルム１と、ダイヤモンドの粒子を水溶性の粘性を有す
るカルボキシメチルセルロースを主成分とする研磨液中
に分散させた研磨剤を組み合わせ、光コネクタフェルー
ル６を研磨することにより、フェルール７と光ファイバ
８の段差が０．０１μｍ以下で、反射減衰率が３０〜３
５ｄＢ程度の光コネクタフェルール６が得られる。第一
方法、第二方法に対しコネクタの加工能率は向上し、ま
た反射減衰量が５ｄＢ以上向上する。さらに、第二方法
に対しての光ファイバ８の引っ込みの問題を解決したこ
とになる。なお、上記実施例において、本発明の研磨剤
を光コネクタフェルールの研磨について説明したが、Si
C、Al2O3、Si3N4などのセラミックスやSUS材及び超鋼材
などの金属材料、Siウエハなどの結晶材料の表面を加工
歪を極めて小さく、しかも鏡面に研磨する場合などにも
使用できる。As described above, the optical connector ferrule 6 is formed by combining the cellulosic resin film 1 and the abrasive obtained by dispersing diamond particles in a polishing liquid containing carboxymethyl cellulose having water-soluble viscosity as a main component. By polishing, the step between the ferrule 7 and the optical fiber 8 is 0.01 μm or less, and the return loss is 30 to 3 μm.
An optical connector ferrule 6 of about 5 dB is obtained. Compared with the first method and the second method, the processing efficiency of the connector is improved, and the return loss is improved by 5 dB or more. Further, the problem of the retracting of the optical fiber 8 with respect to the second method is solved. In the above embodiment, the polishing agent of the present invention was described for polishing an optical connector ferrule.
It is also used when the surface of ceramics such as C, Al 2 O 3 , Si 3 N 4 , metal materials such as SUS material and super steel material, and crystal materials such as Si wafers have extremely small processing distortion and are polished to a mirror surface. it can.
【００２８】[0028]
【発明の効果】本発明による高速仕上用研磨剤によれ
ば、研磨粒子および親水性セルロースを水に添加して、
所定粘度にした研磨剤であるため、高速で加工する研磨
装置に適用してもその遠心力で飛散することはなく、効
率的に研磨を行なうことができるという利点がある。ま
た定盤フィルムとして水との親和性のよいセルロース系
のフィルムを使用しているので、水溶性の粘性状の研磨
粒子が有効に作用することになり研磨効率が高くなる。
また、研磨微粒子の分散性が良好であるため、例えば光
ファイバ面に傷の少ない高品位の加工面を形成できると
いう利点もある。According to the polishing slurry for high-speed finishing of the present invention, abrasive particles and hydrophilic cellulose are added to water,
Since the polishing agent has a predetermined viscosity, there is an advantage that even if the polishing agent is applied to a polishing apparatus for processing at a high speed, the polishing agent is not scattered by the centrifugal force and the polishing can be performed efficiently. Also because it uses the film affinity good cellulosic with water as surface plate film, the polishing efficiency will be water-soluble viscosity-shaped abrasive particles acts effectively increases.
Also, since the dispersibility of the abrasive fine particles is good, there is an advantage that a high-quality processed surface with few scratches can be formed on the optical fiber surface, for example.
【図１】 本発明による高速仕上用研磨剤を使用する研
磨装置の説明図。FIG. 1 is an explanatory view of a polishing apparatus using a polishing agent for high-speed finishing according to the present invention.
【図２】 仕上剤の加工能率を示す図。FIG. 2 is a view showing the processing efficiency of a finishing agent.
【図３】 本発明の実施例で研磨した光コネクタフェル
ールの先端拡大図。FIG. 3 is an enlarged front end view of the optical connector ferrule polished in the embodiment of the present invention.
【図４】 第二方法で研磨した光コネクタフェルールの
先端の拡大図。FIG. 4 is an enlarged view of the tip of the optical connector ferrule polished by the second method.
１ 定盤フィルム ２ リング状金具 ３ 押さえリング ４ 回転定盤 ５ チャック ６ 光コネクタフェルール ７ フェルール ８ 光ファイバ ９ 研磨剤供給ノズル １０ 研磨剤 DESCRIPTION OF SYMBOLS 1 Surface plate film 2 Ring-shaped bracket 3 Holding ring 4 Rotation surface plate 5 Chuck 6 Optical connector ferrule 7 Ferrule 8 Optical fiber 9 Abrasive supply nozzle 10 Abrasive
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大平 文和 東京都千代田区内幸町一丁目１番６号 日本電信電話株式会社内 (72)発明者 平舘 正志 東京都江戸川区西葛西５−10−26−507 (72)発明者 羽織 誠一 東京都渋谷区本町４−48−２ (56)参考文献 特開 平２−14280（ＪＰ，Ａ) 特開 平２−300244（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) C09K 3/14 B24B 19/00 B24B 37/00 ＣＡ（ＳＴＮ) ＷＰＩ／Ｌ（ＱＵＥＳＴＥＬ)──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Bunka Ohira 1-6-1, Uchisaiwaicho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Corporation (72) Inventor Masashi Hiradate 5-10-26 Nishikasai, Edogawa-ku, Tokyo -507 (72) Inventor Seiichi Haori 4-48-2 Honcho, Shibuya-ku, Tokyo (56) References JP-A-2-14280 (JP, A) JP-A-2-300244 (JP, A) (58) Survey 6 (Int. Cl. 6 , DB name) C09K 3/14 B24B 19/00 B24B 37/00 CA (STN) WPI / L (QUESTEL)
Claims (1)
ィルムに被研磨剤を押し付けて高速研磨するための高速
仕上用研磨剤であって、水性分散媒中に平均粒径が０．
１〜１０ミクロンの研磨粒子とカルボキシメチルセルロ
ースを添加し、１から２０ＣＰの粘性値を示すようにし
たことを特徴とする高速仕上用研磨剤。1. A platen film which is a hydrophilic cellulose film.
High-speed for high-speed polishing by pressing the abrasive to the film
An abrasive for finishing, which has an average particle size of 0.1 in an aqueous dispersion medium.
1-10 micron abrasive particles and carboxymethyl cellulose
An abrasive for high-speed finishing, characterized by adding a base to give a viscosity value of 1 to 20 CP.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3037714A JP2820328B2 (en) | 1991-02-08 | 1991-02-08 | Abrasive for high-speed finishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3037714A JP2820328B2 (en) | 1991-02-08 | 1991-02-08 | Abrasive for high-speed finishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0593183A JPH0593183A (en) | 1993-04-16 |
| JP2820328B2 true JP2820328B2 (en) | 1998-11-05 |
Family
ID=12505189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3037714A Expired - Lifetime JP2820328B2 (en) | 1991-02-08 | 1991-02-08 | Abrasive for high-speed finishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2820328B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10309660A (en) * | 1997-05-07 | 1998-11-24 | Tokuyama Corp | Finishing abrasive |
| FI126837B (en) | 2013-09-05 | 2017-06-15 | Upm Kymmene Corp | Composite articles and process for its manufacture |
| JP2016124915A (en) * | 2014-12-26 | 2016-07-11 | 株式会社フジミインコーポレーテッド | Polishing composition, polishing method and method for producing ceramic parts |
| JP6756460B2 (en) * | 2014-12-26 | 2020-09-16 | 株式会社フジミインコーポレーテッド | Polishing method and manufacturing method of ceramic parts |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0214280A (en) * | 1988-07-01 | 1990-01-18 | Showa Denko Kk | Composition for polishing plastic |
| JPH02300244A (en) * | 1989-05-15 | 1990-12-12 | Kanebo Ltd | Abrasive-containing cellulose composite particle |
-
1991
- 1991-02-08 JP JP3037714A patent/JP2820328B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0593183A (en) | 1993-04-16 |
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