JP2000354944A - Convex spherical surface polishing method of ferrule for optical connector - Google Patents
Convex spherical surface polishing method of ferrule for optical connectorInfo
- Publication number
- JP2000354944A JP2000354944A JP2000009180A JP2000009180A JP2000354944A JP 2000354944 A JP2000354944 A JP 2000354944A JP 2000009180 A JP2000009180 A JP 2000009180A JP 2000009180 A JP2000009180 A JP 2000009180A JP 2000354944 A JP2000354944 A JP 2000354944A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- ferrule
- convex spherical
- spherical surface
- polishing sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 89
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000003287 optical effect Effects 0.000 title claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000006061 abrasive grain Substances 0.000 claims abstract description 23
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 22
- 239000013307 optical fiber Substances 0.000 claims abstract description 18
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 12
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 10
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910000423 chromium oxide Inorganic materials 0.000 claims abstract description 8
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 8
- 239000002245 particle Substances 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 5
- 230000002349 favourable effect Effects 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- 239000010453 quartz Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 206010067482 No adverse event Diseases 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Mechanical Coupling Of Light Guides (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光コネクタを構成
する一部材であるフェルールの端面を、凸球面状に研磨
する研磨方法の改良に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a polishing method for polishing an end face of a ferrule, which is one member of an optical connector, into a convex spherical shape.
【０００２】[0002]
【従来の技術】従来より、光信号を伝送する石英等から
なるコアとそのコアを被覆するクラッドとからなる光フ
ァイバを保持したフェルールの端面を、そのコアを頂点
とした凸球面状に鏡面又は粗面に研磨している。2. Description of the Related Art Conventionally, an end face of a ferrule holding an optical fiber composed of a core made of quartz or the like for transmitting an optical signal and a clad covering the core has a convex or spherical surface having the core as a vertex. Polished to a rough surface.
【０００３】従来より行われていた研磨方法は、ダイヤ
モンドからなる砥粒がバインダを介して樹脂基板に固着
されてなる研磨シートを研磨機の弾性変形可能なベース
上に固定し、その研磨シートに光ファイバを保持したフ
ェルールの端面を押圧させ、研磨シート上面に水を供給
しながら、研磨シートに該フェルールが略一定の軌跡を
描くようにベースを移動させて、フェルールの端面を凸
球面状に研磨加工している。また、通常、必要に応じて
中仕上げをした後、さらに仕上げ研磨を行う。[0003] In a conventional polishing method, a polishing sheet in which abrasive grains made of diamond are fixed to a resin substrate via a binder is fixed on an elastically deformable base of a polishing machine, and the polishing sheet is attached to the polishing sheet. While pressing the end face of the ferrule holding the optical fiber and supplying water to the upper surface of the polishing sheet, the base is moved so that the ferrule draws a substantially constant trajectory on the polishing sheet, and the end face of the ferrule is formed into a convex spherical shape. Polished. In addition, usually, after a semi-finishing is performed as needed, a finishing polishing is further performed.
【０００４】かかる仕上げ研磨としては、アルミナシー
トと、酸化シリコンからなる砥粒を含む研磨液を用いて
研磨する方法がある。As such finish polishing, there is a method of polishing using an alumina sheet and a polishing liquid containing abrasive grains composed of silicon oxide.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、上述し
た仕上げ研磨方法では、アルミナ粒子は新モース硬度が
１２でかたい為、光ファイバ端面の研磨が鏡面状態には
なりにくく、且つ光ファイバの端面とフェルール端面と
の間に段差ができ、さらにファイバーの表面に加工変質
層ができてしまうため、反射減衰量が５５ｄＢ以下が限
界という問題がある。However, in the above-mentioned finish polishing method, since the alumina particles have a new Mohs hardness of 12 which is hard, the polishing of the end face of the optical fiber is hardly mirror-finished, and the polishing of the end face of the optical fiber is difficult. Since a step is formed between the ferrule and the end face of the ferrule, and further, a damaged layer is formed on the surface of the fiber, there is a problem that the return loss is limited to 55 dB or less.
【０００６】また、仕上げ研磨方法としては、セルロー
スフィルムと酸化シリコン砥粒とを用いた研磨方法、研
磨剤を有さないフィルムと酸化シリコン砥粒とを用いる
研磨方法が提案されている。しかしながら、これらの研
磨方法では研磨剤が酸化シリコンのみであるため、研削
能力が小さく、削り残りが発生し、また、中仕上げが必
須となり、作業効率が悪いという問題がある。As the finish polishing method, a polishing method using a cellulose film and silicon oxide abrasive grains, and a polishing method using a film having no abrasive and silicon oxide abrasive grains have been proposed. However, in these polishing methods, since the polishing agent is only silicon oxide, there is a problem in that the grinding ability is small, the uncut portion is left, and the intermediate finishing is indispensable, and the working efficiency is poor.
【０００７】そこで、本発明は、作業効率が良好で、反
射減衰量が５５ｄＢ以上と良好な光コネクタ用フェルー
ルの凸球面研磨方法を提供することにある。Accordingly, an object of the present invention is to provide a method for polishing a convex spherical surface of a ferrule for an optical connector, which has good working efficiency and a return loss of 55 dB or more.
【０００８】[0008]
【課題を解決するための手段】前記課題を解決する本発
明の第１の態様は、砥粒が固着された研磨シートをベー
ス上に固定して該研磨シートに光ファイバを保持したフ
ェルールの端面を押圧した状態で両者を相対移動するこ
とにより、前記フェルールの端面を凸球面状に仕上げ研
磨する方法において、前記研磨シートに固着された砥粒
が、酸化セリウム、シリコンカーバイド、酸化シリコ
ン、ジルコニア、酸化クロム、酸化鉄から選ばれる少な
くとも１種であり、粒径が０．１μｍ以下の酸化シリコ
ン砥粒を含有する研磨液を、前記研磨シート表面に供給
してフェルール端面を凸球面に研磨することを特徴とす
る光コネクタ用フェルールの凸球面研磨方法にある。According to a first aspect of the present invention, there is provided an end face of a ferrule in which a polishing sheet having abrasive grains fixed thereto is fixed on a base and an optical fiber is held on the polishing sheet. In a method of finishing polishing the end face of the ferrule to a convex spherical shape by relatively moving the two while pressing the same, the abrasive grains fixed to the polishing sheet, cerium oxide, silicon carbide, silicon oxide, zirconia, A polishing liquid containing at least one selected from chromium oxide and iron oxide and containing silicon oxide abrasive particles having a particle size of 0.1 μm or less is supplied to the polishing sheet surface to polish the ferrule end surface into a convex spherical surface. The method for polishing a convex spherical surface of a ferrule for an optical connector is characterized in that:
【０００９】本発明の第２の態様は、第１の態様におい
て、前記研磨シートに固着された砥粒の粒径が６μｍ以
下であることを特徴とする光コネクタ用フェルールの凸
球面研磨方法にある。According to a second aspect of the present invention, there is provided the method for polishing a convex spherical surface of a ferrule for an optical connector according to the first aspect, wherein a particle diameter of abrasive grains fixed to the polishing sheet is 6 μm or less. is there.
【００１０】本発明の第３の態様は、第１又は２の態様
において、粗研削した後の光コネクタフェルールを仕上
げ研磨することを特徴とする光コネクタ用フェルールの
凸球面研磨方法にある。A third aspect of the present invention is the method for polishing a convex spherical surface of a ferrule for an optical connector according to the first or second aspect, wherein the optical connector ferrule after rough grinding is finish-polished.
【００１１】本発明では、酸化セリウム、シリコンカー
バイド、酸化シリコン、ジルコニア、酸化クロム、酸化
鉄から選ばれる少なくとも１種を砥粒とする研磨シート
と、粒径が０．１μｍ以下の酸化シリコン砥粒を含有す
る研磨液を用いている。酸化セリウム、シリコンカーバ
イド、酸化シリコン、ジルコニア、酸化クロム、酸化鉄
から選ばれる少なくとも１種の砥粒は光ファイバ、すな
わち、石英ガラスに対して研磨能力が大きく、研磨面が
鏡面に近くなるので、反射減衰率量を５５ｄＢ以上とす
ることができる。また、研磨液に含有される酸化シリコ
ンはフェルールを構成するジルコニアに対して研削力が
あり、一方、粒径が０．１μｍ以下の酸化シリコン砥粒
を用いているので、光ファイバに対しては傷などの悪影
響を与えないので、フェルール端面を仕上げ研磨するこ
とができ、光ファイバ端面とその周囲のフェルール端面
との段差が０．１μｍ以下、良好には０．０５μｍ以下
とすることができる。According to the present invention, there is provided a polishing sheet comprising at least one selected from cerium oxide, silicon carbide, silicon oxide, zirconia, chromium oxide and iron oxide, and a silicon oxide abrasive having a particle size of 0.1 μm or less. Is used. At least one abrasive selected from cerium oxide, silicon carbide, silicon oxide, zirconia, chromium oxide, and iron oxide has a large polishing ability for optical fibers, that is, quartz glass, and the polished surface is close to a mirror surface. The amount of return loss can be 55 dB or more. Also, the silicon oxide contained in the polishing liquid has a grinding force on zirconia constituting the ferrule, and on the other hand, since silicon oxide abrasive grains having a particle size of 0.1 μm or less are used, for the optical fiber, Since the ferrule end face can be finished and polished since it has no adverse effects such as scratches, the step between the optical fiber end face and the surrounding ferrule end face can be made 0.1 μm or less, preferably 0.05 μm or less.
【００１２】従って、プリドームフェルールとする場
合、粗研磨（ＰＣ研磨）の後、中仕上げ研磨することな
く、本発明により仕上げ研磨を行うことができる。Therefore, when a pre-dome ferrule is used, finish polishing can be performed according to the present invention without performing intermediate finish polishing after rough polishing (PC polishing).
【００１３】[0013]
【発明の実施の形態】次に、本発明の端面研磨方法の一
実施形態を図面に基づいて説明をする。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, an embodiment of an edge polishing method according to the present invention will be described with reference to the drawings.
【００１４】まず、本実施形態の光ファイバ１を保持し
たフェルール２の端面を研磨するための研磨装置は周知
構造のものであり、研磨シート３０を弾性変形可能なベ
ース３を介して保持する研磨定盤４と、この研磨定盤４
をその中心を回転中心とした自転運動及びその回転中心
より所要量偏心した位置を回転中心とした公転運動を同
時に行うように駆動する図示しない駆動部とを具備す
る。また、光信号を伝送する石英等からなるコア及びク
ラッドからなる光ファイバ１を保持したフェルール２を
研磨シート３０と直交する上下方向にスライド可能に支
持すると共に、研磨時には所定の圧力でフェルール２を
研磨シート３０に押圧する図示しない支持部を備えてい
る。First, the polishing apparatus for polishing the end face of the ferrule 2 holding the optical fiber 1 of the present embodiment has a well-known structure. The polishing apparatus holds the polishing sheet 30 via the elastically deformable base 3. Surface plate 4 and this polishing surface plate 4
And a drive unit (not shown) for simultaneously performing a rotational movement about the center of rotation and a revolving movement about a position eccentric from the rotation center by a required amount of eccentricity. Further, a ferrule 2 holding an optical fiber 1 made of quartz or the like and a clad made of quartz or the like for transmitting an optical signal is slidably supported in a vertical direction orthogonal to the polishing sheet 30, and the ferrule 2 is polished at a predetermined pressure during polishing. A support (not shown) for pressing the polishing sheet 30 is provided.
【００１５】一方、ベース３上に載置される研磨シート
３０は、砥粒３１がバインダ３３を介して樹脂基板３４
に固着されたものであり、ベース３上に載置固定され
る。On the other hand, the abrasive sheet 30 placed on the base 3 is made of abrasive particles 31 with a resin substrate 34
And is mounted and fixed on the base 3.
【００１６】ここで、研磨シート３０が具備する砥粒３
１は、新モース硬度５の酸化セリウムであり、好ましく
は、平均粒径が６μｍ以下のものである。この砥粒３１
は、光ファイバ１に対する研磨能力が大であり、研磨面
が鏡面状となる。Here, the abrasive grains 3 of the polishing sheet 30 are provided.
Reference numeral 1 denotes cerium oxide having a new Mohs hardness of 5, preferably having an average particle size of 6 μm or less. This abrasive grain 31
Has a large polishing ability with respect to the optical fiber 1, and the polished surface becomes a mirror surface.
【００１７】また、研磨シート３０を用いてフェルール
２を研磨する際には、研磨液５０を使用する。ここで、
研磨液５０は、砥粒３１より小さい粒径の酸化シリコン
からなる。この酸化シリコンの平均粒径は、０．１μｍ
以下とするのが好ましい。このような微粒の酸化シリコ
ンは、フェルール２を構成するジルコニア等に対しては
研削力があるが、光ファイバ１の端面へ悪影響は及ぼさ
ない。When polishing the ferrule 2 using the polishing sheet 30, a polishing liquid 50 is used. here,
Polishing liquid 50 is made of silicon oxide having a particle size smaller than abrasive grains 31. The average particle size of this silicon oxide is 0.1 μm
It is preferable to set the following. Such fine silicon oxide has a grinding force on zirconia and the like constituting the ferrule 2, but does not adversely affect the end face of the optical fiber 1.
【００１８】このような構成でフェルール２を研磨する
場合、回転駆動される研磨定盤４上にベース３を介して
保持される研磨シート３０上に、研磨液５０を所定量供
給しながら、フェルール２を研磨シート３０に押圧する
（図１（ａ）及び（ｂ））。When the ferrule 2 is polished in such a configuration, a predetermined amount of the polishing liquid 50 is supplied onto the polishing sheet 30 held via the base 3 on the polishing platen 4 which is driven to rotate. 2 is pressed against the polishing sheet 30 (FIGS. 1A and 1B).
【００１９】なお、本実施形態では、先端面が球面状に
研削されたプリドームフェルール２を用いている。In the present embodiment, a pre-dome ferrule 2 whose tip end surface is ground into a spherical shape is used.
【００２０】このとき、ゴム弾性体等からなるベース３
は、押圧力に応じて弾性変形し、研磨シート３０の表面
がフェルール２端面に沿って曲げられる。At this time, the base 3 made of a rubber elastic material or the like is used.
Is elastically deformed according to the pressing force, and the surface of the polishing sheet 30 is bent along the end face of the ferrule 2.
【００２１】かかる研磨方法では、光ファイバ１の端面
は酸化セリウムからなる砥粒３１により鏡面状に研磨さ
れ、また、光ファイバ１の端面とフェルール２の端面と
の段差が０．１μｍ以下、良好な条件下では０．０５μ
ｍ以下となる。これにより、反射減衰量が５５ｄＢ以上
というフェルールが作製できる。In this polishing method, the end face of the optical fiber 1 is mirror-polished by abrasive grains 31 made of cerium oxide, and the step between the end face of the optical fiber 1 and the end face of the ferrule 2 is 0.1 μm or less. Under normal conditions
m or less. Thus, a ferrule having a return loss of 55 dB or more can be manufactured.
【００２２】また、酸化セリウムは光ファイバー１に対
する研削力が良好なので、プリドームフェルールを作製
する工程で、ＰＣ研削（粗研削）の後、中仕上げをする
ことなく削り残りがない本実施形態の研磨を仕上げとし
て行うことができ、工程数の低減を図ることができると
いう利点を有する。In addition, since cerium oxide has a good grinding force on the optical fiber 1, in the process of manufacturing the pre-dome ferrule, after the PC grinding (rough grinding), the polishing of the present embodiment is performed without intermediate finishing without any remaining finishing. Has the advantage that the number of steps can be reduced.
【００２３】さらに、酸化セリウムの研磨シートは、１
０回以上のリサイクルが可能で、他の砥粒を用いたもの
と比較して二倍程度の寿命があるので、経済的であると
いう利点がある。Further, the polishing sheet of cerium oxide is
Recycling can be performed zero or more times, and the service life is about twice as long as that using other abrasive grains.
【００２４】上記の酸化セリウムの代わりに、ジルコニ
ア（新モース硬度１１）、酸化シリコン特にＳｉＯ２
（新モース硬度７）、酸化クロム（新モース硬度６−
７）、シリコンカーバイド（新モース硬度１３）を用い
ても優れた研削性能が得られる。さらに、酸化セリウ
ム、ジルコニア、酸化シリコン、酸化クロム、シリコン
カーバイドを適宜混合しても、研削が可能である。Instead of the above-mentioned cerium oxide, zirconia (new Mohs hardness 11), silicon oxide, especially SiO2
(New Mohs hardness 7), chromium oxide (new Mohs hardness 6)
7), excellent grinding performance can be obtained even using silicon carbide (new Mohs hardness 13). Furthermore, grinding can be performed by appropriately mixing cerium oxide, zirconia, silicon oxide, chromium oxide, and silicon carbide.
【００２５】[0025]
【発明の効果】本発明は、以上説明したように、研磨シ
ートの砥粒として石英ガラスに対して研磨能力の高い酸
化セリウム、シリコンカーバイド、酸化シリコン、ジル
コニア、酸化クロム、酸化鉄から選ばれる少なくとも１
種を用いると共に、研磨液の砥粒としてジルコニアに対
して研削力が良好であるが石英ガラスに対して傷の発生
等の悪影響がない微粒の酸化シリコンを用いることによ
り、反射減衰量が５５ｄＢ以上と良好なフェルールが作
製できる。しかも、中仕上げすることなく粗研磨したフ
ェルールを直接仕上げ研磨することができるので、工程
数を削減できるという利点がある。As described above, the present invention provides at least one of cerium oxide, silicon carbide, silicon oxide, zirconia, chromium oxide, and iron oxide having a high polishing ability for quartz glass as abrasive grains of a polishing sheet. 1
The use of seeds and the use of finely divided silicon oxide, which has good grinding power against zirconia as abrasive grains of the polishing liquid but does not adversely affect the occurrence of scratches on quartz glass, has a return loss of 55 dB or more. And a good ferrule can be manufactured. In addition, since the roughly polished ferrule can be directly polished without intermediate finishing, there is an advantage that the number of steps can be reduced.
【図１】本発明に係る光コネクタ用フェルールの凸球面
研磨方法における研磨加工時の模式図である。FIG. 1 is a schematic view of a ferrule for an optical connector according to the present invention during polishing in a method for polishing a convex spherical surface.
１ 光ファイバ ２ フェルール ３ ベース ４ 研磨定盤 ３０ 研磨シート ３１ 砥粒 ５０ 研磨液 ５１ 砥粒 DESCRIPTION OF SYMBOLS 1 Optical fiber 2 Ferrule 3 Base 4 Polishing surface plate 30 Polishing sheet 31 Abrasive grain 50 Polishing liquid 51 Abrasive grain
Claims (3)
に固定して該研磨シートに光ファイバを保持したフェル
ールの端面を押圧した状態で両者を相対移動することに
より、前記フェルールの端面を凸球面状に仕上げ研磨す
る方法において、 前記研磨シートに固着された砥粒が、酸化セリウム、シ
リコンカーバイド、酸化シリコン、ジルコニア、酸化ク
ロム、酸化鉄から選ばれる少なくとも１種であり、粒径
が０．１μｍ以下の酸化シリコン砥粒を含有する研磨液
を、前記研磨シート表面に供給してフェルール端面を凸
球面に研磨することを特徴とする光コネクタ用フェルー
ルの凸球面研磨方法。An end face of the ferrule is fixed by fixing a polishing sheet on which abrasive grains are fixed on a base and pressing the end face of a ferrule holding an optical fiber on the polishing sheet, while relatively moving the ferrule. In the method of finish polishing to a convex spherical shape, the abrasive grains fixed to the polishing sheet are at least one selected from cerium oxide, silicon carbide, silicon oxide, zirconia, chromium oxide, and iron oxide, and have a particle size of 0. A method for polishing a convex spherical surface of a ferrule for an optical connector, comprising: supplying a polishing liquid containing silicon oxide abrasive grains of 1 μm or less to the polishing sheet surface and polishing the ferrule end surface to a convex spherical surface.
着された砥粒の粒径が６μｍ以下であることを特徴とす
る光コネクタ用フェルールの凸球面研磨方法。2. The method for polishing a convex spherical surface of a ferrule for an optical connector according to claim 1, wherein the particle size of the abrasive particles fixed to the polishing sheet is 6 μm or less.
の光コネクタフェルールを仕上げ研磨することを特徴と
する光コネクタ用フェルールの凸球面研磨方法。3. The method for polishing a convex spherical surface of an optical connector ferrule according to claim 1 or 2, wherein the optical connector ferrule after the rough grinding is finish-polished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000009180A JP2000354944A (en) | 1999-03-02 | 2000-01-18 | Convex spherical surface polishing method of ferrule for optical connector |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5459999 | 1999-03-02 | ||
| JP11-102498 | 1999-04-09 | ||
| JP11-54599 | 1999-04-09 | ||
| JP10249899 | 1999-04-09 | ||
| JP2000009180A JP2000354944A (en) | 1999-03-02 | 2000-01-18 | Convex spherical surface polishing method of ferrule for optical connector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000354944A true JP2000354944A (en) | 2000-12-26 |
Family
ID=27295349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000009180A Abandoned JP2000354944A (en) | 1999-03-02 | 2000-01-18 | Convex spherical surface polishing method of ferrule for optical connector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000354944A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002239926A (en) * | 2001-02-07 | 2002-08-28 | Dainippon Printing Co Ltd | Polishing film and method for producing the same |
| JP2003025209A (en) * | 2001-07-23 | 2003-01-29 | Nisshin Steel Co Ltd | Polishing method for stainless steel |
| US6755728B2 (en) | 2001-03-29 | 2004-06-29 | Noritake Co., Ltd. | Abrasive film in which water-soluble inorganic compound is added to binder |
-
2000
- 2000-01-18 JP JP2000009180A patent/JP2000354944A/en not_active Abandoned
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002239926A (en) * | 2001-02-07 | 2002-08-28 | Dainippon Printing Co Ltd | Polishing film and method for producing the same |
| US6755728B2 (en) | 2001-03-29 | 2004-06-29 | Noritake Co., Ltd. | Abrasive film in which water-soluble inorganic compound is added to binder |
| JP2003025209A (en) * | 2001-07-23 | 2003-01-29 | Nisshin Steel Co Ltd | Polishing method for stainless steel |
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