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JP2744108B2 - Hybrid integrated circuit device - Google Patents

Hybrid integrated circuit device

Info

Publication number
JP2744108B2
JP2744108B2 JP2080292A JP8029290A JP2744108B2 JP 2744108 B2 JP2744108 B2 JP 2744108B2 JP 2080292 A JP2080292 A JP 2080292A JP 8029290 A JP8029290 A JP 8029290A JP 2744108 B2 JP2744108 B2 JP 2744108B2
Authority
JP
Japan
Prior art keywords
film substrate
heat
substrate
integrated circuit
thick film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2080292A
Other languages
Japanese (ja)
Other versions
JPH03280486A (en
Inventor
康夫 田口
和良 武田
久 持田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2080292A priority Critical patent/JP2744108B2/en
Publication of JPH03280486A publication Critical patent/JPH03280486A/en
Application granted granted Critical
Publication of JP2744108B2 publication Critical patent/JP2744108B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/05Insulated conductive substrates, e.g. insulated metal substrate

Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Structure Of Printed Boards (AREA)

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、混成集積回路素子に係わり特に、高出力に
伴って必要とされる放熱構造に好適する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a hybrid integrated circuit device, and is particularly suitable for a heat dissipation structure required for high output.

(従来の技術) 受動素子、能動素子または回路用部品の中から選定し
た一種もしくは複数種を半導体基板にモノリシック(Mo
nolythic)に造込む集積回路素子は、最近のD−RAMに
対表されるように集積度が益々増大する傾向にある。こ
れに対いして、半導体基板にモノリシックに形成できな
いL成分などをハイブリッド(Hybrid)方式により形成
する混成集積回路素子でもパッキングデンシティ(Pack
ing Density)を改良した製品が開発されその用途の増
大は著しいものがある。
(Prior art) One or more types selected from passive elements, active elements or circuit components are monolithically (Mo)
The degree of integration of integrated circuit elements which are to be built nolythic tends to increase more and more as represented by recent DRAMs. On the other hand, even in a hybrid integrated circuit device in which an L component or the like that cannot be monolithically formed on a semiconductor substrate is formed by a hybrid method, a packing density (Packing density) is required.
In addition, products with improved ing densities have been developed and their uses have been remarkably increased.

このように集積度の増大の伴う混成集積回路素子の課
題に熱放散対策があり、その解決策の一つとしてヒート
シンク(Heat Sink)が利用されている。その要部を示
す第1図の断面図により説明すると、例えばアルミナセ
ラミックス(Alumina Ceramics)基板1の片面に電子回
路に必要な部品2…を実装しており、平坦な他面にヒー
トシンク即ち放熱用金属板3を接着剤層4を介して一体
としている。
As described above, there is a measure for heat dissipation as a problem of a hybrid integrated circuit element accompanied by an increase in the degree of integration, and a heat sink is used as one of the solutions. To explain this with reference to the cross-sectional view of FIG. 1 showing the main part, for example, components 2... Required for an electronic circuit are mounted on one surface of an alumina ceramics substrate 1 and a heat sink, that is, The metal plate 3 is integrated via an adhesive layer 4.

ところで、アルミナセラミックス基板1などにハイブ
リッド方式で形成する部品2…には、集積回路素子、個
別半導体素子、ときにはL成分などの他にいわゆるトリ
ミング(Trimming)法により所定値に調整する抵抗も含
まれており、このような各種部品を実装した基板を本発
明では厚膜基板とする。一方、混成集積回路素子の集積
度を向上するために厚膜基板の両面に各種部品を実装す
る方式(第2図参照)も多用されている。この場合は、
アルミナセラミックス基板1の露出面即ち放熱用金属板
5を設置しない表面に半導体素子などを配置し、他面に
は、トリミングする抵抗及び配線層を設置し、両面の各
部品の電気的接続には、アルミナセラミックス基板1の
厚さ方向を貫通して形成するスルーホール(Through Ho
le)6を利用する。
By the way, the components 2 formed on the alumina ceramic substrate 1 and the like in a hybrid manner include an integrated circuit element, an individual semiconductor element, sometimes an L component, and also a resistor which is adjusted to a predetermined value by a so-called trimming method. In the present invention, a substrate on which such various components are mounted is referred to as a thick film substrate. On the other hand, a method of mounting various components on both sides of a thick film substrate (see FIG. 2) is often used in order to improve the degree of integration of the hybrid integrated circuit element. in this case,
A semiconductor element or the like is arranged on the exposed surface of the alumina ceramic substrate 1, that is, a surface on which the heat-dissipating metal plate 5 is not installed, and a resistor and a wiring layer to be trimmed are installed on the other surface. Through holes formed through the thickness direction of the alumina ceramic substrate 1 (Through Ho
le) Use 6

ところで、アルミナセラミックス基板1の両面にいわ
ゆるスクリーン(Screen)印刷法により形成する配線層
は、薄いガラス(Glass)層を被覆して保護しておりま
た、他面に取付ける抵抗にも薄いガラス層により保護し
ている。スルーホール6壁面を構成するアルミナセラミ
ックス基板1には、例えばメッキ法により配線層を形成
して、両面に設置する配線層と電気的に接続して所定の
電子回路の形成に備えている。このスルーホール6に被
着する配線層にも保護ガラス層を被覆して絶縁性を確保
しているし、放熱用金属板5は接着剤層4によりアルミ
ナセラミックス基板1と一体にするが、両者の固定を確
実にするために圧着工程を最後に行うのが一般的であ
る。
By the way, the wiring layer formed on both surfaces of the alumina ceramic substrate 1 by a so-called screen printing method is protected by covering with a thin glass (Glass) layer. Protected. A wiring layer is formed on the alumina ceramic substrate 1 constituting the wall surface of the through hole 6 by, for example, a plating method, and is electrically connected to the wiring layers provided on both sides to prepare for forming a predetermined electronic circuit. The wiring layer attached to the through-hole 6 is also covered with a protective glass layer to ensure insulation. The heat-dissipating metal plate 5 is integrated with the alumina ceramics substrate 1 by the adhesive layer 4. In general, a crimping step is performed last to ensure the fixation.

(発明が解決しようとする課題) 厚膜基板の両面を利用する型の混成集積回路素子で
は、放熱用金属板5の平坦な全面を放熱に利用すること
ができない。と言うのは、スルーホール6の角部が厚膜
基板1表面及び他面との交わる付近に形成した配線層を
覆うガラス層が圧着工程により剥離したり、薄くなって
絶縁性が損なわれる恐れを解消するのに、この付近に対
応する放熱用金属板5に凹部7を設置する(第3図参
照)。このために厚膜基板1の両面を利用する型では、
放熱効率が悪いと共に製造単価が増大する難点の外に、
製造工程時に両者の位置合せが必要となり、工数が増題
する欠点が生ずる。しかも、厚膜基板1の他面に設置し
た抵抗体に大電流を流して発熱が起こった場合には、放
熱性が損なわれる難点がある。
(Problems to be Solved by the Invention) In a hybrid integrated circuit device of the type using both surfaces of a thick film substrate, the entire flat surface of the heat dissipation metal plate 5 cannot be used for heat dissipation. This is because the glass layer covering the wiring layer formed in the vicinity of the corner of the through hole 6 intersecting with the surface of the thick film substrate 1 and the other surface may be peeled off or thinned by the crimping process and the insulating property may be impaired. In order to solve the problem, the concave portion 7 is provided in the metal plate 5 for heat radiation corresponding to the vicinity (see FIG. 3). For this reason, in a mold using both sides of the thick film substrate 1,
In addition to the disadvantage that the heat dissipation efficiency is poor and the manufacturing unit price increases,
During the manufacturing process, the two need to be aligned, resulting in a disadvantage that the number of steps is increased. In addition, when a large current flows through the resistor provided on the other surface of the thick film substrate 1 to generate heat, there is a problem that heat dissipation is impaired.

本発明は、このような事情により成されたもので特
に、厚膜基板の両面に電子回路用部品を取付ける混成集
積回路素子の放熱効率を改善することを目的とするもの
である。
The present invention has been made under such circumstances, and it is an object of the present invention to improve the heat radiation efficiency of a hybrid integrated circuit device in which electronic circuit components are mounted on both surfaces of a thick film substrate.

[発明の構成] (課題を解決するための手段) 放熱用金属板と、放熱用金属板に対向して配置する厚
膜基板と、厚膜基板の両面に設置する回路パターンと、
前記厚膜基板の厚さ方向を貫通して設置するスルーホー
ルと、前記回路パターンを接続し、前記スノーホールを
介して形成する配線層、前記スノーホールに形成する配
線層を保護する絶縁層と、前記放熱用金属板及び厚膜基
板間に一体には位置する熱伝導・絶縁性基板と、これら
を覆って前記放熱用金属板に固着する金属容器に本発明
に係わる混成集積回路素子の特徴がある。
[Composition of the Invention] (Means for Solving the Problems) A metal plate for heat dissipation, a thick film substrate arranged to face the metal plate for heat dissipation, and circuit patterns provided on both surfaces of the thick film substrate,
A through-hole installed through the thickness direction of the thick film substrate, a wiring layer connected to the circuit pattern and formed through the snow hole, and an insulating layer protecting the wiring layer formed in the snow hole. The features of the hybrid integrated circuit device according to the present invention include a heat conductive / insulating substrate integrally located between the heat radiating metal plate and the thick film substrate, and a metal container that covers these and is fixed to the heat radiating metal plate. There is.

(作用) 本発明に係わる混成集積回路素子は、例えば車輌用と
して利用する場合もあり、当然コンパクト(Compact)
なものが要求されしかも、所定の電子回路には動作時に
発熱量が大きく、大電流を附勢する抵抗や例えばジャイ
アントトランジスタ(Giant Transister以後G−Tr)と
記載する)を設置しなければならない時もある。従来技
術でのG−Trなどの設置方法は、厚膜基板と別の基板を
利用するのが一般的であり、必要な面積が増え車輌用な
どのように決められた容積または面積内に設置するのに
不都合となる。更に、本発明に係わる混成集積回路素子
では動作時発熱する抵抗が必要であり、厚膜基板の裏面
即ち必要な回路部品をマウント(Mount)する表面の反
対側に設置する。このように限られた容積または面積内
に取付ける必要がある混成集積回路素子では、集積度向
上の観点から厚膜基板に必要な回路部品を設置させざる
を得ないので、特別な放熱及び絶縁対策として厚膜基板
と放熱用金属板間に熱伝導・絶縁性基板を配置する手法
を採用している。更に、車輌用などのような混成集積回
路素子は、金属容器により保護して厳しい環境例えば−
40℃〜150℃に使用に耐えるようにされている。
(Operation) The hybrid integrated circuit device according to the present invention may be used, for example, for a vehicle, and is naturally compact.
When a certain electronic circuit requires a large amount of heat during operation and a resistor for energizing a large current, for example, a giant transistor (hereinafter referred to as G-Tr) must be installed in a given electronic circuit. There is also. In the conventional method of installing G-Tr, etc., it is common to use a thick film substrate and another substrate, which increases the required area and installs it in a fixed volume or area such as for vehicles. It is inconvenient to do so. Furthermore, the hybrid integrated circuit device according to the present invention requires a resistor that generates heat during operation, and is disposed on the back surface of the thick film substrate, that is, on the side opposite to the surface on which the necessary circuit components are mounted. In the case of such a hybrid integrated circuit element that needs to be mounted within a limited volume or area, it is necessary to install necessary circuit components on a thick-film substrate from the viewpoint of improving the degree of integration. A method of arranging a heat conductive / insulating substrate between a thick film substrate and a heat dissipating metal plate is adopted. In addition, hybrid integrated circuit devices such as those for vehicles are protected by a metal container and protected from severe environments such as-
It is designed to withstand use between 40 ° C and 150 ° C.

(実施例) 本発明に係わる実施例を第4図乃至第5図を参照して
説明する。即ち、厚さ0.8mm程度のセラミックからなる
厚膜基板10の両面には、スクリーン印刷法により導電性
金属からなる配線層(図示せず)を設け、その一面に電
子回路に必要な部品を取付ける。更に厚膜基板10の厚さ
方向を貫通するスルーホール11…を設置すると共に、配
線層を例えばメッキ法により被覆して両表面に形成した
配線層の導通を図る。このような処理を終えた厚膜基板
10の裏面即ち後述の半導体素子などを設置しない面に
は、動作時に発熱を生じる抵抗12を配線層に接続して形
成する。従来技術にあっては、ガラス層などの絶縁物層
で抵抗12を被覆保護しているが、本発明では、この抵抗
層12には塗布していない。更に、,電子回路用部品とし
て樹脂封止型集積回路素子、G−Trなどの外にL成分や
場所によってはコイル(Coil)をいわゆる表面実装方式
により抵抗12を設置しない他表面に設置する。G−Trの
設置に当たっては、セラミックス製厚膜基板10に代え
て、窒化アルミニュウム製基板に亜酸化銅などを介する
方法や、アルミナセラミックス基板10にモリブデン(Mo
lybdenum)製板体(図示せず)を介して設置する方法が
採られている。窒化アルミニゥム製基板を厚膜基板10に
接着剤層を利用して固着する。このように回路部品を取
付けた厚膜基板10には、熱伝導・絶縁性基板例えばセラ
ミックス基板13及び例えば銅または銅合金製の放熱用金
属板14を導電性接着剤層155、15により一体に固着して
混成集積回路素子の大部分を形成する。第4図に示した
ように3層からなる積層体の表面部分を構成する厚膜基
板10の端部には、金属容器16をハーメチックシール(Ha
rmetic Seal)により気密に固着して車輌用混成集積回
路素子を完成する。
(Embodiment) An embodiment according to the present invention will be described with reference to FIGS. That is, a wiring layer (not shown) made of a conductive metal is provided on both surfaces of a thick film substrate 10 made of a ceramic having a thickness of about 0.8 mm by a screen printing method, and components necessary for an electronic circuit are mounted on one surface thereof. . Further, through holes 11 penetrating in the thickness direction of the thick film substrate 10 are provided, and the wiring layers are coated by, for example, a plating method so as to conduct the wiring layers formed on both surfaces. Thick film substrate after such treatment
On the back surface of the device 10, that is, a surface on which a semiconductor element, which will be described later, is not installed, a resistor 12 that generates heat during operation is formed by connecting to a wiring layer. In the prior art, the resistor 12 is covered and protected by an insulating layer such as a glass layer, but is not applied to the resistor layer 12 in the present invention. Further, in addition to a resin-encapsulated integrated circuit element, a G-Tr, or the like as an electronic circuit component, depending on the L component and the location, a coil may be installed on a surface other than the resistor 12 by a so-called surface mounting method. When installing the G-Tr, instead of the ceramic thick film substrate 10, a method of interposing cuprous oxide or the like on an aluminum nitride substrate, or a method using molybdenum (Mo
(lybdenum) plate member (not shown). A substrate made of aluminum nitride is fixed to the thick film substrate 10 using an adhesive layer. On the thick film substrate 10 on which the circuit components are mounted as described above, a heat conductive / insulating substrate such as a ceramic substrate 13 and a heat dissipating metal plate 14 made of, for example, copper or a copper alloy are integrally formed by conductive adhesive layers 155 and 15. Secures to form the majority of the hybrid integrated circuit device. As shown in FIG. 4, a metal container 16 is hermetically sealed at the end of the thick film substrate 10 constituting the surface of the three-layer laminate.
rmetic Seal) to complete the hybrid integrated circuit device for vehicles.

第3図では、金属容器16取付前の状態を示した斜視図
である。
FIG. 3 is a perspective view showing a state before the metal container 16 is attached.

厚膜基板10と放熱用金属板14は、いずれも厚さが上記
のように0.8mmから0.635mm程度であり、長さは3〜5mm
とし、金属容器16は、ほぼ40Φ位の大きさが普通であ
る。
The thickness of the thick film substrate 10 and the heat dissipation metal plate 14 are both about 0.8 mm to 0.635 mm as described above, and the length is 3 to 5 mm.
The size of the metal container 16 is generally about 40Φ.

[発明の効果] 本発明では、両面印刷された厚膜基板からの放熱が、
片面印刷された基板と同様な効率で行なえる。また、基
板とヒートシンク用金属基板間に挿入される熱伝導・絶
縁性基板は、絶縁性及び放熱性に優れているので、金属
基板側の厚膜基板は、保護材料で覆う必要がなくなるの
で、製造単価が安くなる利点があるばかりではなく更
に、この厚膜基板側に設置する抵抗については、その放
熱が確保できる。更にまた、混成集積回路素子の製造に
ついても厚膜基板、熱伝導・絶縁性基板更に金属基板を
接着剤により一体とするので、特別な位置合せが要らな
い利点もあり、製造工数削減ひいては製造単価の低減を
もたらすものである。
[Effect of the Invention] In the present invention, heat radiation from a thick-film substrate printed on both sides is
It can be performed with the same efficiency as a single-side printed substrate. In addition, since the heat conductive / insulating substrate inserted between the substrate and the heat sink metal substrate has excellent insulation and heat dissipation, it is not necessary to cover the thick film substrate on the metal substrate side with a protective material. Not only is there an advantage that the manufacturing unit price is low, but also the heat radiation of the resistor installed on the thick film substrate side can be ensured. Furthermore, in the production of hybrid integrated circuit elements, since a thick film substrate, a heat conductive / insulating substrate, and a metal substrate are integrated with an adhesive, there is an advantage that no special alignment is required. Is brought about.

【図面の簡単な説明】[Brief description of the drawings]

第1図乃至第3図は、従来の混成集積回路素子の断面
図、第4図は、本発明に係わる混成集積回路素子の概略
を示す斜視図、第5図は、本発明に係わる混成集積回路
素子の断面図である。 1、10:セラミック基板、厚膜基板、 2:部品、3、14:放熱用金属板、 4、15:接着剤、6、11:スルーホール、 7:凹部分、5、12:抵抗、 13:熱伝導・絶縁性基板、16:金属容器。
1 to 3 are cross-sectional views of a conventional hybrid integrated circuit device, FIG. 4 is a perspective view schematically showing a hybrid integrated circuit device according to the present invention, and FIG. 5 is a hybrid integrated device according to the present invention. It is sectional drawing of a circuit element. 1, 10: ceramic substrate, thick film substrate, 2: component, 3, 14: metal plate for heat dissipation, 4, 15: adhesive, 6, 11: through hole, 7: recess, 5, 12: resistance, 13 : Heat conductive / insulating substrate, 16: Metal container.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−127590(JP,A) 実開 昭60−109349(JP,U) 実公 昭59−10770(JP,Y2) ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-63-127590 (JP, A) JP-A-60-109349 (JP, U) JP-A-59-10770 (JP, Y2)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】放熱用金属板と、放熱用金属板に対向して
配置する厚膜基板と、前記厚膜基板の両面に設置する回
路パターンと、前記厚膜基板の厚さ方向を貫通して設置
するスルーホールと、前記回路パターンを接続し前記ス
ルーホールを介して形成する配線層と、前記放熱用金属
板及び厚膜基板間に一体配置する熱伝導・絶縁性基板
と、これらを覆って前記放熱用金属板に固着する金属容
器を具備することを特徴とする混成集積回路素子。
1. A heat-dissipating metal plate, a thick-film substrate disposed to face the heat-dissipating metal plate, circuit patterns provided on both sides of the thick-film substrate, and a through-hole extending through the thickness direction of the thick-film substrate. A wiring layer formed by connecting the circuit pattern and forming through the through hole; a heat conductive / insulating substrate integrally disposed between the heat dissipating metal plate and the thick film substrate; And a metal container fixed to the heat-dissipating metal plate.
JP2080292A 1990-03-28 1990-03-28 Hybrid integrated circuit device Expired - Fee Related JP2744108B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2080292A JP2744108B2 (en) 1990-03-28 1990-03-28 Hybrid integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2080292A JP2744108B2 (en) 1990-03-28 1990-03-28 Hybrid integrated circuit device

Publications (2)

Publication Number Publication Date
JPH03280486A JPH03280486A (en) 1991-12-11
JP2744108B2 true JP2744108B2 (en) 1998-04-28

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JP2080292A Expired - Fee Related JP2744108B2 (en) 1990-03-28 1990-03-28 Hybrid integrated circuit device

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JP (1) JP2744108B2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138156Y2 (en) * 1971-04-16 1976-09-18
JPS5827225U (en) * 1981-08-12 1983-02-22 大盛工業株式会社 Powder quantitative feeding device
NL191484C (en) * 1983-08-12 1995-08-04 Krambrock Wolfgang Dipl Ing Device for dosing and pneumatic conveying of bulk material.
JPS6256528U (en) * 1985-09-27 1987-04-08

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Publication number Publication date
JPH03280486A (en) 1991-12-11

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