JP2020001955A - Production method of purified hydrochloric acid - Google Patents

Abstract

PROBLEM TO BE SOLVED: To develop a method of further improving the removability of crude hydrochloric acid containing an anionic metal chlorine complex and obtaining purified hydrochloric acid of higher purity with respect to charged metal impurities. SOLUTION: The crude hydrochloric acid containing a charged metallic impurity containing at least an anionic metal chlorine complex (specifically, an anionic iron chlorine complex etc.) is obtained after contacting with a cation exchange resin. Removal of cationic gold impurities, hydrochloric acid is brought into contact with an anion exchange resin, and more preferably, the purified hydrochloric acid is treated with a fine particle supplement filter. . [Selection diagram] None

Description

  The present invention relates to a method for producing purified hydrochloric acid, and more particularly, to a method for producing high-purity purified hydrochloric acid used as an etching agent for a substrate in a semiconductor production process.

  Hydrochloric acid is an industrial basic raw material having a wide range of uses, and is usually produced by dissolving and purifying synthetic hydrogen chloride obtained by reacting chlorine and hydrogen in water. Further, hydrochloric acid is discharged as a by-product in a process of producing chlorinated hydrocarbons such as vinyl chloride, methylene chloride, and chloroform, a process of producing a fluorocarbon, a process of producing a urethane, and a process of producing a polycarbonate.

  In general, by-product hydrochloric acid in the above process contains, for example, metal impurities such as iron, copper, zinc, nickel, sodium, calcium, and potassium. Was restricted in its use. Therefore, although a reduction treatment is performed, for example, in the case of distillation, hydrochloric acid causes an azeotropic phenomenon, so that it is difficult to fractionate, and if it is intended to increase the degree of purification of hydrochloric acid by this method, the process becomes complicated and the apparatus becomes complicated. There was a problem of becoming large-scale.

For this reason, it has been attempted to reduce these metal impurities by using an adsorbent. For example, in the case of activated carbon, the effect of removing organic impurities is high, but the effect of removing the metal impurities alone is sufficient. Cannot be obtained. On the other hand, since many of these metal impurities are dissociable and charged with metal ions in hydrochloric acid, it has been proposed to use an ion exchange resin as the adsorbent. In this case, the high metal impurity in hydrochloric acid is iron, which dissociates and further forms a complex with chloride ions to form the anionic iron-chlorine complex [FeCl ₄ ] ^- . In addition, depending on the method for producing by-product hydrochloric acid, zinc and the like are contained at a considerably high concentration, which also forms an anionic zinc-chlorine complex and the like. Therefore, it has been reported that a treatment with an anion exchange resin is performed to remove the anionic metal chlorine complex (for example, Patent Documents 1 to 4).

JP 03-028102 A JP-A-02-233503 JP-A-2006-138017 JP-A-59-069152

  By the treatment with the anion exchange resin, the anionic metal chloride complex contained in the by-product hydrochloric acid can be removed with a considerably high efficiency. However, in the by-product hydrochloric acid and the like generated in the chlorinated hydrocarbon production plant, since the content of impurities of iron and zinc is particularly large due to the catalyst and the material of the reactor, removal of the chlorine complex formed therefrom The efficiency is still unsatisfactory to a high degree, and as the metal impurities, there are various general metal impurities which dissociate into cations other than those forming the anionic chlorine complex, which remain. The problem remains. It is conceivable that the residual cationic metal impurities are adsorbed and removed by treating this with a cation exchange resin. For example, hydrochloric acid treated with the anion exchange resin is treated with the cation exchange resin in this manner. Even if the treatment is carried out, the above-mentioned cationic metal impurities can only be removed, but does not contribute to the removal of the anionic metal chlorine complex.

  In recent years, in the semiconductor manufacturing process, in the etching of a substrate, wirings and integrated circuits have been increasingly miniaturized, and the importance of accurately etching and cleaning these without metal contamination has been increasing. Accordingly, with this, the demand for high purity has been increasing year by year with respect to hydrochloric acid used for an etching agent and a cleaning agent, and an anionic surfactant has been developed so that the by-product hydrochloric acid can be used for this purpose. It has been a major problem to develop a method for further improving the removability of crude hydrochloric acid containing a metal chlorine complex and obtaining a higher-purity purified hydrochloric acid for charged metal impurities.

  In view of the above problems, the present inventors have continued intensive studies. As a result, the present inventors have found that the above problem can be solved by performing a combination of a cation exchange resin treatment and an anion exchange resin treatment in this order on the crude hydrochloric acid containing the anionic metal chlorine complex. The invention has been completed.

  That is, the present invention comprises contacting a crude hydrochloric acid containing a charged metal impurity containing at least an anionic metal chloride complex with a cation exchange resin, and then removing the resulting cationic metal impurity by removing the hydrochloric acid from the anion. A method for producing purified hydrochloric acid, which is brought into contact with an exchange resin.

  According to the method of the present invention, with respect to crude hydrochloric acid containing an anionic metal chlorine complex, it is possible to further enhance the removability of the anionic metal chlorine complex and obtain purified hydrochloric acid with higher purity with respect to charged metal impurities. It is possible. Such highly purified hydrochloric acid can be effectively used in various industrial applications when metal contamination or generation of side reactions due to metal is disliked. In particular, in a semiconductor manufacturing process, when used as an etching agent or a cleaning agent for a substrate (hereinafter, these are also abbreviated as “for an etching agent, etc.”), accurate etching is required to suppress metal contamination. It will be highly satisfying the recent demands and is very significant.

In the present invention, the crude hydrochloric acid to be purified preferably has a hydrogen chloride content of at least 3% by mass, more preferably at least 5% by mass. Generally, 35 to 37% by mass which is standardly treated as industrial hydrochloric acid is most preferable. Further, the crude hydrochloric acid contains at least a charged metal impurity containing an anionic metal chloride complex. Examples of the chargeable metal impurities include metal ions such as iron, copper, zinc, manganese, nickel, sodium, calcium, potassium, barium, lead, magnesium, tin, aluminum, cadmium, chromium, and molybdenum. Many of these are charged with cations in hydrochloric acid, but iron, copper, zinc, manganese, nickel, etc. are not only dissociated into cations as described above, but also complexes with chloride ions, for example, Iron forms an anionic iron-chlorine complex [FeCl ₄ ] ⁻ , and zinc forms an anionic zinc-chlorine complex [ZnCl ₄ ] ^2- . Thus, these iron and zinc, which form such an anionic metal chloride complex, are usually contained in a large amount in hydrochloric acid in the production process of hydrochloric acid due to the catalyst and the material of the reactor. Would.

  Thus, of the metal impurities, cationic ones can be almost completely removed by contacting the crude hydrochloric acid with the cation exchange resin. However, as described above, the content of the anionic metal chloride complex tends to increase, but depending on the ionic species, even if the complex is brought into contact with an anion exchange resin, it is adsorbed and removed to some extent efficiently. It is possible but not at a satisfactory level. That is, the metallic impurities such as iron and zinc could not be reduced to a satisfactory degree.

  Under such circumstances, the present invention is characterized in that the purification of the crude hydrochloric acid is performed by performing the adsorption removal treatment by contacting the cation exchange resin prior to the adsorption removal treatment by contacting the anion exchange resin. It has the characteristics of Thus, not only the general cationic metal impurities can be simply removed by the adsorption removal treatment using the cation exchange resin in the former stage, but also the removal of the anionic metal chlorine complex in the adsorption removal treatment using the anion exchange resin in the subsequent stage. An unexpected effect is exhibited, in which the efficiency is greatly improved.

  Thus, it is not always clear why the use of a combination of a cation exchange resin and an anion exchange resin in a specific treatment order for the purification of crude hydrochloric acid enables advanced removal of anionic metal chloride complexes. However, the present inventors presume as follows. That is, even if the metal ion forms an anionic metal chloride complex in this way, the total amount of the metal ion does not form the metal chloride complex, and the metal ion dissociated as a cation remains constant. Present in quantity.

  The crude hydrochloric acid in a complex ion coexisting state, in which various other metal cations are present, is brought into contact with an anion exchange resin to remove the anionic metal chloride complex. It is considered that this has a certain adverse effect on the adsorption efficiency and the adsorption efficiency, and this is one of the reasons why the removability cannot be brought to the above-mentioned satisfactory level. Therefore, as in the present invention, the crude hydrochloric acid is first subjected to an adsorption treatment with a cation exchange resin to adsorb and remove coexisting cations, and then the resulting hydrochloric acid to remove the cationic metal impurities is subjected to anion treatment. It has been speculated that if it comes into contact with an ion exchange resin, the removal will be more efficient than before.

  Therefore, even in the case of purifying crude hydrochloric acid by combining a cation exchange resin and an anion exchange resin, the processing order is reverse to the above, that is, after performing adsorption removal by the anion exchange resin, In the case of performing adsorption removal using a cation exchange resin, satisfactory purification results cannot be obtained because there is no improvement that the removal of the anionic metal chloride complex in the former stage cannot be performed sufficiently as before.

  The content of the charged metal impurities in the crude hydrochloric acid is preferably 100 ppt or more, more preferably 500 ppt or more, as the total amount of each metal, from the viewpoint of sufficiently exhibiting the effects of the present invention. Moreover, the upper limit is preferably 300,000 ppt or less, more preferably 100,000 ppt or less, and further preferably 50,000 ppt or less.

  In such charged metal impurities, the content of a metal capable of forming an anionic metal chloride complex in hydrochloric acid, specifically, the content of iron, zinc, copper, and nickel is from the viewpoint of sufficiently exerting the effects of the present invention. , Iron content is preferably 100 to 20,000 ppt, more preferably 500 to 10,000 ppt, zinc content is preferably 100 to 20,000 ppt, more preferably 500 to 10,000 ppt, and copper content is 50 ppt to It is preferably 10,000 ppt, more preferably 500 to 5000 ppt, and the content of nickel is preferably 100 ppt to 20,000 ppt, and more preferably 500 to 10,000 ppt. In particular, it is effective that the content of iron and zinc is within the above range.

  In the present invention, the content of such charged metal impurities in hydrochloric acid is evaluated by the amount of metal measured by ICP-MS (inductively coupled plasma mass spectrometer). The metal forming the anionic metal chlorine complex is evaluated not by the amount of the complex but by the amount of the metal constituting the complex.

  The crude hydrochloric acid to be provided to the present invention may be one produced by any method as long as it satisfies the requirements of the above-mentioned charged metal impurities, and combusts chlorine and hydrogen to generate a hydrogen chloride gas and an aqueous solution. It may be manufactured by a so-called direct method. Since the above-mentioned charged metal impurities are inevitably contained to some extent, and the effect of the purification according to the present invention is easily exhibited remarkably, the chlorinated hydrocarbon production process, fluorocarbon production process, urethane production process, polycarbonate production More preferably, the by-product hydrochloric acid is produced in a plant for producing an organic compound such as a process. Examples of the process for producing the chlorinated hydrocarbon include a process for producing a chlorinated hydrocarbon such as vinyl chloride, methylene chloride, and chloroform. In particular, a process for producing vinyl chloride, specifically, 1,2-dichloroethane Is a process for producing vinyl chloride in which is thermally decomposed.

  The contact with the cation exchange resin, which is the first processing step for purifying the crude hydrochloric acid, may be performed in any manner as long as the purpose of removing the cation metal impurities is achieved. As the cation exchange resin, any of a strongly acidic cation exchange resin and a weakly acidic cation exchange resin can be used. Examples of the resin matrix of the cation exchange resin include a styrene resin, an acrylic resin, and a methacrylic resin. Among them, a styrene resin is preferable, and a styrene-divinylbenzene copolymer is more preferable. Further, examples of the resin structure of the cation exchange resin include a gel type and a porous type, and a gel type having a large ion exchange capacity and a high physical strength is preferable. The micropores formed in the cation exchange resin preferably have a pore diameter of 30 ° or more. Examples of the functional group of the cation exchange resin include a sulfonic acid group, a carboxyl group, a phosphoric acid group, and the like. Among them, a sulfonic acid group is preferable.

The total exchange capacity of the cation exchange resin is preferably at least 1.2 milliequivalents, more preferably at least 1.5 milliequivalents per 1 mL of the swelling resin, if the cation exchange resin is strongly acidic. Further, if it is weakly acidic, it is preferably at least 2.0 meq, more preferably at least 2.5 meq with respect to 1 mL of the swelling resin.
The water content of the cation exchange resin is preferably 70% or less, more preferably 60% or less.

Commercial products may be used as such a cation exchange resin. Examples of the strongly acidic cation exchange resin include “Amberlite IR120B”, “Amberlite IR124”, and “Amberlite 200CT” manufactured by Organo Corporation. , "Alright DS-1", "Allite DS-4";"DowexHCR-S","Dowex HCR-W2 (H)", "Dowex Marathon Series", "Dowex Mono" manufactured by Dow Chemical Company. Sphere series ";" Diaion SK series "," Diaion UBK series ", and" Diaion PK series "manufactured by Mitsubishi Chemical Corporation. Examples of the weakly acidic cation exchange resin include “Amberlite IRC76”, “Diaion WK Series” and “Diaion WK40L” manufactured by Mitsubishi Chemical Corporation.
As these cation exchange resins, strongly acidic cation exchange resins are preferable from the viewpoint of high removal of cation metal impurities, and the counter ion is more preferably H-type. It is preferable that the cation exchange resin is washed with water and nitric acid which have been purified to high purity in advance to remove the raw material monomers of the cation exchange resin and impurities in the raw material monomers.
The method of contacting with the cation exchange resin may be a batch type or a packed column type, but the packed column type is preferred from the viewpoint of purification efficiency.
When contacted in packed column type, but liquid permeation speed of the crude hydrochloride is capable of appropriately selected, as a space velocity (SV), preferably 0.1 [hr ^-1] or more, 0.2 [hr ^{- 1} ] or more, more preferably 0.5 [hr ^-1 ] or more, and preferably 50 [hr ^-1 ] or less, more preferably 10 [hr ^-1 ] or less, and 8 [hr ^-1 ] or less. It is still more preferably 5 [hr ^-1 ] or less. The scope of such a space velocity (SV), preferably 0.1~50 [hr ^-1], and more preferably 0.1~10 [hr ^-1], and more preferably 0.2 to 8 [hr ^-1 ], And still more preferably 0.5 to 5 [hr ^-1 ].
Further, the flow rate of the crude hydrochloric acid can be appropriately selected, but the flow rate (BV) with respect to the filling capacity of the cation exchange resin is preferably 0.5 (mL / mL) or more, and more preferably 10 (mL / mL). The above is more preferable, 100 (mL / mL) or more is still more preferable, 1000 (mL / mL) or more is still more preferable, and 10,000 (mL / mL) or less is preferable, and 8000 (mL / mL) or less is more preferable. It is more preferably at most 6,000 (mL / mL), and still more preferably at most 4,000 (mL / mL). As a range of such a flow multiple, preferably 0.5 to 10000 (mL / mL), more preferably 10 to 8000 (mL / mL), further preferably 100 to 6000 (mL / mL), and still more preferably It is 1000-4000 (mL / mL).

  The temperature of the crude hydrochloric acid to be brought into contact with such a cation exchange resin is usually selected from the range of 10 to 50 ° C. Here, the formation amount of the anionic metal chloride complex from the chloride ion to the cation tends to increase as the temperature of the crude hydrochloric acid increases, and in this tendency, the formation of such an anionic metal chloride complex is caused. Since the metal is iron, zinc, copper, or the like, the temperature of the crude hydrochloric acid is more preferably in the range of 15 to 30 ° C.

  In the present invention, the step of contacting the anion exchange resin subsequent to the contact with the cation exchange resin may be performed in any manner as long as the purpose of removing the anionic metal chloride complex is achieved. As the anion exchange resin, a weakly basic anion exchange resin can be used, but from the viewpoint of highly removing the anionic metal chloride complex, it is preferable to use a strongly basic anion exchange resin. Examples of the resin matrix of the anion exchange resin include a styrene resin, an acrylic resin, and a methacrylic resin, and among them, an acrylic resin is preferable. Examples of the resin structure of the anion exchange resin include a gel type and a porous type, and a gel type is preferable. Examples of the functional group of the anion exchange resin include an ammonium derivative group having a quaternary ammonium group, and specific examples include a benzyltrimethylammonium group and a benzyldimethylhydroxyethylammonium group.

The total exchange capacity of the anion exchange resin is preferably 1.2 meq. Or more, and more preferably 1.5 meq. The water content of the anion exchange resin is preferably 70% or less, more preferably 60% or less.
Commercial products may be used as such an anion exchange resin. For example, "Amberlite IRA-400J" and "Amberlite IRA-410J" manufactured by Organo Corporation; "Dowex Marathon" manufactured by Dow Chemical Company Series "," Dowex 1-X, 2-X "," Diaion SA Series "," Diaion UBA120 "," Diaion PA Series "manufactured by Mitsubishi Chemical Corporation, and the like.

  The counter ion of the anion exchange resin may be either an OH type or a Cl type. The OH type may be used after the Cl type has been converted to the OH type by washing with sodium hydroxide or the like. In addition, it is preferable that these anion exchange resins are washed with water and nitric acid which have been purified to high purity in advance to remove the raw material monomers of the anion exchange resin and impurities in the raw material monomers.

  The method of contact with the anion exchange resin may be a batch type or a packed column type, but the packed column type is preferred from the viewpoint of purification efficiency.

  In the case of performing the packed column method, the flow rate and the flow rate of hydrochloric acid obtained by contacting the cation exchange resin and removing the cationic metal impurities are the same as in the case of the above-described contact with the cation exchange resin. You can do it.

  The temperature for contact with the anion exchange resin may be selected from the range of 10 to 50 ° C. in the same manner as the temperature of crude hydrochloric acid at the time of contact with the cation exchange resin. Here, the formation of an anionic metal chlorine complex in which chloride ions are bonded to metal ions tends to increase as the liquid temperature increases. Therefore, it is preferable to make contact with the anion exchange resin at a relatively high temperature of 20 to 40 ° C. in order not to be present as a cation and to adsorb and remove as much as possible an anionic metal chloride complex.

  As described above, it is possible to efficiently produce purified hydrochloric acid having an extremely small content of chargeable metal impurities. Therefore, this purified hydrochloric acid can be used beneficially in various uses of high-purity hydrochloric acid, such as an etching agent for a substrate, in a semiconductor manufacturing process. Just use it. That is, in the purified hydrochloric acid obtained by the method of the present invention, although the content of the chargeable metal impurities can be sufficiently reduced as described above, the undissociated metal fine particles are not dissolved as the metal impurities, It is derived from the catalyst used in the production of hydrochloric acid and the material of the reactor. Furthermore, in addition to metal fine particles, various inorganic and organic dust fine particles are mixed in from various environments. In a semiconductor manufacturing process, in the finer wiring and integrated circuits, fine metal impurities such as fine metal particles also cause defects that lead to defects when they adhere to the substrate surface. It is preferable to perform a treatment with a filter.

  According to the method of the present invention, the secondary effect that the filterability is good is also obtained by the method of the present invention because the charged metal impurities in the hydrochloric acid have been removed to a high degree. That is, in the state where the complex ions coexist, even if the fine hydrochloric acid is subjected to the filtering treatment of the coarse hydrochloric acid, the charged impurities are adsorbed to the fine particle impurities, and the aggregated particles are easily generated, This may hinder smooth filtration, but this is eliminated.

  The filter for capturing fine particles is not particularly limited as long as it is a material having strong acid resistance, and a filter made of a fluororesin such as polyvinylidene fluoride (PVDF) or polytetrafluoroethylene (PTFE) is preferable. The hole diameter is preferably 1 μm or less in consideration of an etchant used in the semiconductor manufacturing process, and a hole diameter of 0.5 μm to 0.05 μm is generally used. When it is required to remove finer particulate impurities, a filter having a pore diameter smaller than 0.05 μm is also used favorably.

  As the shape of the filter, known filters such as a flat membrane, a hollow fiber membrane, a tubular membrane, and a monolith membrane can be used. The filter treatment may be carried out by feeding purified hydrochloric acid obtained by contacting with an anion exchange resin to a fine particle trapping filter using a pump or the like. In order to capture particles more efficiently, it is preferable to install filters having different pore sizes in a plurality of stages.

  The production method of the present invention is generally carried out in an area adjacent to a chemical production plant where crude hydrochloric acid is produced as a by-product. That is, a cation-exchange resin packed tower for treating crude hydrochloric acid, and an anion-exchange resin packed for removing hydrochloric acid from the cation exchange resin packed tower, which is treated with hydrochloric acid, in an area adjacent to the chemical manufacturing plant. It is a common mode to provide a purified hydrochloric acid producing apparatus including a column, supply crude hydrochloric acid by-produced in the chemical production plant to the apparatus, and carry out the production of purified hydrochloric acid. In the case where purified hydrochloric acid from which particulate impurities are also removed is desired, the production apparatus may be further provided with a particulate capture filter for filtering purified hydrochloric acid discharged from the anion exchange resin packed tower. .

  After the purified hydrochloric acid obtained by the present invention is filled in a clean container, the purified hydrochloric acid is transported to a consuming plant such as a semiconductor manufacturing plant where it is used and used. Charged metal impurities such as those made of acid-resistant alloys such as Hastelloy and Inconel, those made of metal containers whose inner surface is coated with fluorinated resin, and those made of resin such as high-molecular-weight polyolefin. What can minimize the elution of is used after sufficiently cleaning the inner surface. As the inert gas introduced into the cavity of the container, a highly clean inert gas is used.

  However, even with such a clean filling environment, the storage period is prolonged, and when the filling container is exposed to a harsh environment such as high temperature, the risk of recontamination of purified hydrochloric acid due to elution from the container material is completely reduced. It is difficult to get rid of it. In particular, a chemical manufacturing plant in which crude hydrochloric acid is produced as a by-product is generally considerably remote from a consuming plant such as a semiconductor manufacturing plant using purified hydrochloric acid. Therefore, long-distance transportation is inevitable to deliver this. In addition, if the consuming factory is far away, delivery arrangements for the order become complicated, and the storage period in the storage tank after manufacture tends to be long. From these, there is a risk of recontamination by the time of use, even if hydrochloric acid is highly purified. In particular, for a substrate etching agent or the like in a semiconductor manufacturing process, which has a particularly high demand for high purity, prevention thereof has been strongly desired.

  From this demand, in the present invention, it is advantageous to provide the apparatus for producing purified hydrochloric acid in an area near a factory that consumes purified hydrochloric acid (particularly, an area near a semiconductor manufacturing factory), and to perform production at a place near this factory. It is. In this case, when an order for purified hydrochloric acid is received, new purified hydrochloric acid produced before and after the order can be delivered to the consuming factory for use in a short time, and the risk of recontamination can be greatly reduced. More preferably, it is preferable that the purified hydrochloric acid be directly supplied to the step of using purified hydrochloric acid in a use plant by a pipe since the risk of recontamination can be further reduced.

  Here, the neighborhood of the factory where the purified hydrochloric acid is consumed is determined by external factors such as the topography and the road environment, and cannot be determined unequivocally. Considering that it can be used, it is preferably within a radius of 2 km, more preferably within a radius of 1 km from the place of use.

   Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

Example 1
A cylindrical column made of PFA (inner diameter 20 mm, height 800 mm) was filled with 100 ml of a strongly acidic cation exchange resin (Dowex 50WX8, manufactured by Dow Chemical Co.) that had been washed with ultrapure water and nitric acid. Subsequently, the same operation as described above was also performed on a strongly basic anion exchange resin (Diaion PA316, manufactured by Mitsubishi Chemical Corporation), and the prepared columns were serially connected in the order of a cation exchange resin column and an anion exchange resin. Connected. Subsequently, crude hydrochloric acid (liquid temperature of 25 ° C., HCl concentration of 36 wt.%) Produced as a by-product in a vinyl chloride production plant for thermally decomposing 1,2-dichloroethane was circulated at SV = 1, and an initial distillate was obtained. The distillate obtained after discarding 20 ml is collected, and the metal component in the sample is analyzed using ICP-MS (inductively coupled plasma mass spectrometer), and the number of particles in the liquid is measured with a particle counter (particle counting). Instrument). The results are shown in Tables 1 and 2.

Example 2
Same as Example 1 except that a filter made of polytetrafluoroethylene (PTFE) having a pore size of 0.2 μm was attached to the outlet of the anion exchange resin column, and the purified hydrochloric acid obtained in Example 1 was continuously filtered. Was performed. The results are shown in Tables 1 and 2.

Claims (8)

  After contacting a crude hydrochloric acid containing a charged metal impurity containing at least an anionic metal chlorine complex with a cation exchange resin, contacting the resulting anion exchange resin with the removed hydrochloric acid of the resulting cationic metal impurity, A method for producing purified hydrochloric acid, comprising:   The method according to claim 1, wherein the purified hydrochloric acid obtained by the method according to claim 1 is treated with a fine particle trapping filter.   The method for producing purified hydrochloric acid according to claim 1 or 2, wherein the crude hydrochloric acid containing a charged metal impurity containing at least an anionic metal chlorine complex is a by-product hydrochloric acid produced in a chlorinated hydrocarbon production plant. .   The method for producing purified hydrochloric acid according to claim 3, wherein the chlorinated hydrocarbon production plant is a vinyl chloride production plant for thermally decomposing 1,2-dichloroethane.   The purified hydrochloric acid according to any one of claims 1 to 4, wherein the purified hydrochloric acid is used for an etching agent or a cleaning agent for a substrate in a semiconductor manufacturing process, and the production of the purified hydrochloric acid is performed in an area adjacent to the semiconductor manufacturing plant. Manufacturing method.   The method for producing purified hydrochloric acid according to claim 5, wherein the produced purified hydrochloric acid is directly supplied to a step of adjusting an etching agent or a cleaning agent in a semiconductor production process by a pipe.   A cation exchange resin packed tower for treating crude hydrochloric acid containing charged metal impurities containing at least an anionic metal chlorine complex, and a treatment for removing hydrochloric acid from the cation exchange resin packed tower for removing the cationic metal impurities discharged from the cation exchange resin packed tower An apparatus for producing purified hydrochloric acid, comprising:   The apparatus for producing purified hydrochloric acid according to claim 7, further comprising a fine particle capturing filter for filtering purified hydrochloric acid discharged from the anion exchange resin packed tower.