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JP2019217655A5
JP2019217655A5 JP2018115264A JP2018115264A JP2019217655A5 JP 2019217655 A5 JP2019217655 A5 JP 2019217655A5 JP 2018115264 A JP2018115264 A JP 2018115264A JP 2018115264 A JP2018115264 A JP 2018115264A JP 2019217655 A5 JP2019217655 A5 JP 2019217655A5
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water
water tank
value
magnetic
tank
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JP2019217655A (en
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磁気ユニットは、水循環路内を流通する水の内部に該水の流通方向と垂直な磁場を形成する。このような磁場が形成されることによって、水の性質が変化することが知られている。すなわち、水には、例えばCa2+、Mg2+、CO 2−等のプラスイオン、マイナスイオン(帯電性物質)が含まれるため、磁気ユニットによって形成される磁場を水が横切る際に電子励起作用が生じ、これによって水分子が細分化される。また、磁場を水が横切る際に生じるローレンツ力によって、水分子同士の結合が外れ、水の集団構造が小さくなる。このため、水の粘性が低下して水の浸透性、水の溶解性が向上し、表面張力が低下する。また、磁気処理によってpH値が変化するものの、わずかであるため、比較的簡単に水槽内の水を弱酸性に維持することができる。なお、本発明者の実験によると、磁気処理によ水のpH値の変動0.4〜1.0程度であった。 The magnetic unit forms a magnetic field perpendicular to the flow direction of the water in the water flowing in the water circulation path. It is known that the formation of such a magnetic field changes the properties of water. That is, since water contains positive ions and negative ions (chargeable substances) such as Ca 2+ , Mg 2+ , and CO 3 2- , for example, when water crosses the magnetic field formed by the magnetic unit, the electronic excitation action occurs. Which results in fragmentation of the water molecule. Further, due to Lorentz force generated when water crosses the magnetic field, bonds between water molecules are released, and the collective structure of water is reduced. For this reason, the viscosity of water decreases, the permeability of water and the solubility of water improve, and the surface tension decreases. Further, although the pH value changes due to the magnetic treatment, the pH value is small, so that the water in the water tank can be maintained relatively weakly acidic. Incidentally, according to the experiments conducted by the present inventors, the variation of the pH value of that by the magnetically treated water was about 0.4 to 1.0.

なお、紫外線照射量が多いほど殺菌作用は強くなる。また、細菌の種類(菌種)によって、有効な殺菌作用が得られる紫外線照射量が異なる。したがって、水循環路内を流通する水の流量(L/min)に応じて、また、水に含まれる細菌の種類に応じて、紫外線の照射量を決定すると良い。
例えば、大腸菌、枯草菌、青カビを99.99%死滅(不活性化)させるために必要な紫外線照射量はそれぞれ9000μW・sec/cm2、21300μW・sec/cm2、36000μW・sec/cm2とされている。したがって、これらの細菌が水に含まれる場合は、青カビを死滅させることができるように、紫外線照射量を決定することにより、大腸菌及び枯草菌も死滅さることができる。
The bactericidal action becomes stronger as the amount of ultraviolet irradiation increases. In addition, the amount of ultraviolet irradiation at which an effective bactericidal action is obtained differs depending on the type of bacteria (species of bacteria). Therefore, the irradiation amount of the ultraviolet rays may be determined according to the flow rate (L / min) of the water flowing through the water circulation path and according to the type of bacteria contained in the water.
For example, the amount of UV irradiation required to kill (inactivate) E. coli, Bacillus subtilis, and blue mold by 99.99% is 9000 μW · sec / cm 2 , 21300 μW · sec / cm 2 , and 36000 μW · sec / cm 2 , respectively. Have been. Therefore, if these bacteria in the water, so that it can kill blue mold, by determining the amount of ultraviolet irradiation, E. coli and B. subtilis may also Rukoto killed.

濾過装置は、水に含まれる不要成分を除去するために設置される。水に含まれる不要成分としては、オフセット印刷機で使用される油性インキや水槽内に混入した埃、水槽の内壁に付着している水垢、細菌の死骸等が挙げられる。したがって、濾過装置には、これらの不要成分を除去することができるフィルターや吸着材を使用すると良い。 The filtration device is installed to remove unnecessary components contained in water. The unnecessary components contained in the water, dust mixed into the oil-based ink or a water tank for use in an offset printing machine, water stain adhering to the inner wall of the water tank, bacteria carcasses and the like. Therefore, it is preferable to use a filter or an adsorbent capable of removing these unnecessary components in the filtration device.

以下、本発明の具体的な実施例について、図面を参照しつつ説明する。
[第1実施例]
図1は、本発明の第1実施例に係るオフセット印刷用湿し水供給システムの全体構成を示している。同図に示すように、オフセット印刷用湿し水供給システム1(以下、水供給システム1という)は、大きく分けて本体部100と湿し水処理部200とから構成されている。
Hereinafter, specific examples of the present invention will be described with reference to the drawings.
[First embodiment]
FIG. 1 shows the overall configuration of a dampening solution supply system for offset printing according to a first embodiment of the present invention. As shown in FIG. 1, the dampening solution supply system 1 for offset printing (hereinafter, referred to as a water supply system 1) is roughly composed of a main body 100 and a dampening solution treatment unit 200.

上述した要素の他、本体部100は、水槽110内の排水管147の下端部に配置された攪拌機180、水槽110内の水の温度を検出する温度センサ181、水のpH値を検出するpH電極182、水槽110内の水位を検出する水位電極183を備えている。さらに、水槽110の右側壁部に形成された、水槽110内の水が所定の水位を超えたときにその超過分を排出するための開口184、水槽110の底部に形成された排水口185、前記開口184及び排水口185に接続された排水路186、187、排水路187に取り付けられたバルブ188等を備えている。 In addition to the elements described above, the main body 100 includes a stirrer 180 disposed at the lower end of the drain pipe 147 in the water tank 110, a temperature sensor 181 for detecting the temperature of the water in the water tank 110, and a pH for detecting the pH value of the water. An electrode 182 and a water level electrode 183 for detecting the water level in the water tank 110 are provided. Further, an opening 184 formed on the right side wall of the water tank 110 for discharging the excess water when the water in the water tank 110 exceeds a predetermined water level, a drain port 185 formed at the bottom of the water tank 110, Drainage channels 186, 187 connected to the opening 184 and the drainage port 185, a valve 188 attached to the drainage channel 187, and the like are provided.

[湿し水処理部]
湿し水処理部200は、入口側端部が水槽110の底部に接続され、出口側端部が水槽110の左側壁部に接続された水循環路210と、水循環路210の入口側端部から出口側端部に向かって順に設けられた循環ポンプ220、濾過装置230、磁気ユニット240、及び紫外線照射装置(以下「UV装置」という)250とを備えている。また、湿し水処理部200は、水循環路210の入口側端部及び出口側端部の近傍にそれぞれ設けられたバルブ260、261、循環ポンプ220とろ過装置230の間の水循環路210に設けられたバルブ262濾過装置230と磁気ユニット240との間の水循環路210に設けられた流量調整バルブ263及び流量計264、磁気ユニット240とUV装置250の間の水循環路210から分岐された排水路265、排水路265に取り付けられたバルブ266を備えている。
[Dampening water treatment unit]
The dampening water treatment unit 200 has a water circulation path 210 having an inlet end connected to the bottom of the water tank 110 and an outlet end connected to the left side wall of the water tank 110, and a water circulation path 210 from the inlet end of the water circulation path 210. A circulation pump 220, a filtering device 230, a magnetic unit 240, and an ultraviolet irradiation device (hereinafter, referred to as “UV device”) 250 are sequentially provided toward the outlet side end. Further, the dampening water treatment unit 200 is provided in the water circulation passage 210 between the circulation pump 220 and the filtration device 230 , and the valves 260 and 261 provided near the inlet end and the outlet end of the water circulation passage 210, respectively. Valve 262 , a flow control valve 263 and a flow meter 264 provided in the water circulation path 210 between the filtration device 230 and the magnetic unit 240, and drainage water branched from the water circulation path 210 between the magnetic unit 240 and the UV device 250. road 265, Bei Eteiru a valve 266 which is attached to the drainage channel 265.

また、給水路120を通じて原水が水槽110内に供給され、エッチ液タンク300内のエッチ液がエッチ液供給路160を通じて水槽110内に供給される。さらに、循環ポンプ220によって水槽110内の水が水槽110と湿し水処理部200の間を循環し、その間に、濾過装置230によって水に含まれる不要成分が除去され、磁気ユニット240によって水のクラスターが細分化され、表面張力の低下やpH値の維持等、オフセット印刷に適正な性質の水とされ、UV装置250によって水に含まれる細菌等が死滅される。 Raw water is supplied into the water tank 110 through the water supply channel 120, and the etchant in the etchant tank 300 is supplied into the water tank 110 through the etchant supply channel 160. Further, the water in the water tank 110 is circulated between the water tank 110 and the dampening water treatment unit 200 by the circulation pump 220, while unnecessary components contained in the water are removed by the filtration device 230, and the water is removed by the magnetic unit 240. The clusters are subdivided into water having properties appropriate for offset printing, such as a reduction in surface tension and maintenance of the pH value, and bacteria and the like contained in the water are killed by the UV device 250.

<実験2:pH値及びORP値の変動>
<1.実験方法>
上述した実施例の水供給システム1の運転時における、水槽110内の水のpH値及びORP値(酸化還元電位)の変化を調べた。また、比較例として、上述した特許文献1に記載の湿し水供給システムで用いられている光触媒装置を湿し水処理部200に付加したシステム(比較例システム)を構成し、この比較例システムの運転時における、水槽110内の水のpH値及びORP(酸化還元電位)値の変化も調べた。なお、実際の運転時と同じ運転条件にするため、実施例及び比較例のいずれのシステムも、水槽内の湿し水をオフセット印刷機に供給すると共に、オフセット印刷機から湿し水の余剰分を回収して実験を行った。
<Experiment 2: fluctuation of pH value and ORP value>
<1. Experimental method>
Changes in the pH value and ORP value (oxidation-reduction potential) of the water in the water tank 110 during the operation of the water supply system 1 of the above-described embodiment were examined. Further, as a comparative example, a system (comparative example system) in which a photocatalyst device used in the dampening solution supply system described in Patent Document 1 described above is added to the dampening solution treatment unit 200 is configured. during operation, the change in pH value of the water in the water tank 110 and ORP (oxidation - reducing potential) value was also investigated. In addition, in order to set the same operating conditions as in the actual operation, in each of the systems of the embodiment and the comparative example, the dampening solution in the water tank is supplied to the offset printing press, and the excess dampening solution is supplied from the offset printing press. Was recovered and an experiment was performed.

濾過装置
装置本体:内部に長さが500mmのフィルターを5本装着可能なハウジング(ベッセル)を2個内蔵(一次ハウジング及び二次ハウジング
濾過ポンプ:水槽内の水を一次ハウジング、二次ハウジングの順に流通させ
一次ハウジング:Aフィルターを5本装着
二次ハウジング:Bフィルターを3本、Cフィルターを2本装着
Aフィルター:3μm以上の粗ゴミを除去可能なワインドタイプフィルター(二次ハウジング内のフィルターの目詰まり防止用)
Bフィルター:1μmまでの微細ゴミを除去可能なワインドタイプフィルター
Cフィルター:湿し水内に混入している成分(顔料、インキ油分等)を除去可能な吸着フィルター
Filtration device Main unit: Two housings (vessels) to which five 500 mm long filters can be installed (primary housing and secondary housing )
Filtering pump: A water in the water tank primary housing, the primary housing Ru is circulated in the order of the secondary housing: A filter five mounting the secondary housing: B filters three to, C filter the two mounting A filters: 3 [mu] m or more Wind type filter capable of removing coarse dust (for preventing clogging of the filter in the secondary housing)
B filter: Wind type filter capable of removing fine dust up to 1 μm C filter: Adsorption filter capable of removing components (pigment, ink oil, etc.) mixed in the fountain solution

なお、本発明は上記した実施例に限定されるものではなく、適宜の変更が可能である。
例えば、水循環路210における循環ポンプ220、濾過装置230、磁気ユニット240、UV装置250の配置は図1、図2に示した例に限らず、例えば磁気ユニットとUV装置250の配置が逆でも良い。また、濾過装置230、磁気ユニット240、UV装置250を設置する数は1個に限らず、複数個でも良い。さらに、濾過装置230、磁気ユニット240、UV装置250を設置する数は同じでなくても良い。
It should be noted that the present invention is not limited to the above-described embodiment, and appropriate changes can be made.
For example, the arrangement of the circulation pump 220, the filtration device 230, the magnetic unit 240, and the UV device 250 in the water circulation path 210 is not limited to the examples shown in FIGS. 1 and 2, and the arrangement of the magnetic unit and the UV device 250 may be reversed. . Further, the number of the filtering devices 230, the magnetic units 240, and the UV devices 250 is not limited to one, but may be plural. Further, the numbers of the filtering devices 230, the magnetic units 240, and the UV devices 250 may not be the same.

JP2018115264A 2018-06-18 2018-06-18 Damping water supply system and damping water processing apparatus for offset-printing Pending JP2019217655A (en)

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JP2019217655A5 true JP2019217655A5 (en) 2020-02-13

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