JP2013106002A - Liquid immersion member, liquid immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing generation of poor exposure.SOLUTION: A liquid immersion member is arranged at least a part of the surroundings of an optical member having an emission surface to which exposure light is emitted and an outside surface which is arranged in the surroundings of the emission surface in a liquid immersion exposure apparatus. The liquid immersion member has: a first member which has a first inner surface at least a part of which faces the outside surface via a first gap, and a first lower surface which an object facing the emission surface can face, and forms a first liquid immersion space of first liquid on the side of the emission surface; a second member which is arranged outside the first member to an optical path, and has a second lower surface which the object can face; a first supply port which is arranged at one or both of the first member and the second member, and supplies the first liquid; a first collection port which is arranged at one or both of the first member and the second member, and collects at least a part of the first liquid from the first supply port; and a second supply port which faces a second gap between the first member and the second member, and supplies second liquid to the second gap.

Description

  The present invention relates to an immersion member, an immersion exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Patent Application Publication No. 2007/0139628 US Patent Application Publication No. 2008/0174748

  In the immersion exposure apparatus, for example, if the quality of the liquid deteriorates or the liquid flows out of a predetermined space, an exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide an immersion member, an immersion exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, in the immersion exposure apparatus, the immersion exposure apparatus is disposed on at least a part of the periphery of an optical member having an exit surface from which exposure light is emitted and an outer surface disposed around the exit surface. A liquid immersion member having at least a first inner surface facing the outer surface through the first gap and a first lower surface capable of facing an object facing the injection surface, A first member that forms a first immersion space for one liquid; a second member that is disposed outside the first member with respect to the optical path and that has a second lower surface on which an object can face; the first member and the second member; A first supply port that is disposed on one or both of the members and supplies a first liquid; and at least a portion of the first liquid from the first supply port that is disposed on one or both of the first member and the second member. The first recovery port to be recovered faces the second gap between the first member and the second member, and the second gap Liquid immersion member and a second supply port for supplying liquid is provided.

  According to the second aspect of the present invention, in the immersion exposure apparatus, the optical exposure member is disposed on at least a part of the periphery of the optical member having an exit surface from which exposure light is emitted and an outer surface disposed around the exit surface. A liquid immersion member having at least a first inner surface facing the outer surface through the first gap and a first lower surface capable of facing an object facing the injection surface, A first member that forms a first immersion space for one liquid; a second member that is disposed outside the first member with respect to the optical path and that has a second lower surface on which an object can face; the first member and the second member; A first supply port that is disposed on one or both of the members and supplies a first liquid; and at least a portion of the first liquid from the first supply port that is disposed on one or both of the first member and the second member. The first recovery port to be recovered faces the second gap between the first member and the second member, and the second gap The liquid immersion member comprises a second recovery port for recovering the liquid, it is provided.

  According to the third aspect of the present invention, in the immersion exposure apparatus, the exposure apparatus is disposed on at least a part of the periphery of the optical member having the exit surface from which the exposure light is emitted and the outer surface disposed around the exit surface. A liquid immersion member having at least a first inner surface facing the outer surface through the first gap and a first lower surface capable of facing an object facing the injection surface, A first member that forms a first immersion space for one liquid, a second inner surface that is disposed on the outer side of the first member with respect to the optical path, and that faces the first outer surface of the first member via a second gap; A second member having a second lower surface that can be opposed to an object, a first supply port that is disposed on one or both of the first member and the second member, and that supplies the first liquid; and the first member and the second member The 1st recovery port which is arranged in one or both and collects at least a part of the 1st liquid from the 1st supply port It comprises one or both of the first inner surface and second inner surface, the liquid immersion member having a corner portion is provided.

  According to a fourth aspect of the present invention, there is provided an immersion exposure apparatus for exposing a substrate with exposure light through a first liquid, the liquid comprising the liquid immersion member according to any one of the first to third aspects. An immersion exposure apparatus is provided.

  According to a fifth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the immersion exposure apparatus according to the fourth aspect and developing the exposed substrate.

  According to the sixth aspect of the present invention, the exposure of exposing the substrate with the exposure light through the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A method comprising: a first inner surface that faces an outer surface of an optical member that is disposed at least partially around the emission surface via a first gap; and a first lower surface that can face the substrate that faces the emission surface; A first liquid from a first supply port disposed on one or both of a first member having a first surface and a second member disposed on the outer side of the first member with respect to the optical path and having a second lower surface on which an object can be opposed. Supplying, recovering at least part of the first liquid from the first supply port from the first recovery port disposed in one or both of the first member and the second member, and the first supply port Supply of the first liquid from the first and recovery of the first liquid from the first recovery port, Forming a first immersion space for the first liquid so that the optical path of the exposure light in between is filled with the first liquid, exposing the substrate through the first liquid in the first immersion space, An exposure method is provided that includes supplying a second liquid to the second gap from a second supply port facing the second gap between the first member and the second member.

  According to the seventh aspect of the present invention, the exposure of exposing the substrate with the exposure light through the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A method comprising: a first inner surface that opposes an outer surface of an optical member that is disposed at least partially around the exit surface through a first gap; and a first lower surface that can face a substrate that opposes the exit surface. The first liquid from the first supply port disposed on one or both of the first member and the second member disposed on the outside of the first member with respect to the optical path and having a second lower surface on which the object can face. Supplying, recovering at least a part of the first liquid from the first supply port from the first recovery port arranged in one or both of the first member and the second member, and from the first supply port Supply of the first liquid and recovery of the first liquid from the first recovery port, Forming a first immersion space of the first liquid so that an optical path of the exposure light is filled with the first liquid, exposing the substrate through the first liquid in the first immersion space, An exposure method is provided that includes recovering the first liquid in the second gap from a second recovery port facing the second gap between the first member and the second member.

  According to the eighth aspect of the present invention, the exposure of the substrate with the exposure light is performed through the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A method comprising: a first inner surface that opposes an outer surface of an optical member that is disposed at least partially around the exit surface through a first gap; and a first lower surface that can face a substrate that opposes the exit surface. The first liquid from the first supply port disposed on one or both of the first member and the second member disposed on the outside of the first member with respect to the optical path and having a second lower surface on which the object can face. Supplying, recovering at least a part of the first liquid from the first supply port from the first recovery port arranged in one or both of the first member and the second member, and from the first supply port Supply of the first liquid and recovery of the first liquid from the first recovery port, Forming a first liquid immersion space for the first liquid so that the optical path of the exposure light is filled with the first liquid, and exposing the substrate through the first liquid in the first liquid immersion space. An exposure method is provided in which one or both of the first inner surface and the second inner surface have corners.

  According to a ninth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the sixth to eighth aspects; and developing the exposed substrate. Is provided.

  According to the tenth aspect of the present invention, the substrate is exposed to the computer with the exposure light via the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of an immersion exposure apparatus that performs exposure, wherein the first inner surface is opposed to the outer surface of an optical member that is disposed at least partially around the emission surface via the first gap, and the emission surface. Arranged on one or both of a first member having a first lower surface that can be opposed to an opposing substrate, and a second member that is disposed outside the first member with respect to the optical path and has a second lower surface that can be opposed to an object. At least one of the first liquid from the first supply port from the first recovery port disposed on one or both of the first member and the second member; The first part, the first liquid supply from the first supply port and the first Forming the first liquid immersion space so that the optical path of the exposure light between the exit surface and the substrate is filled with the first liquid by collecting the first liquid from the collection port; Exposing the substrate through the first liquid in one immersion space and supplying the second liquid to the second gap from the second supply port facing the second gap between the first member and the second member And a program for executing the program is provided.

  According to the eleventh aspect of the present invention, the substrate is exposed to the computer with the exposure light via the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of an immersion exposure apparatus for exposure, wherein at least a part faces a first inner surface opposite to an outer surface of an optical member arranged around the emission surface via a first gap, and the emission surface. A first member having a first lower surface to which the substrate to be opposed can be disposed, and an outer surface of the first member with respect to the optical path, and disposed on one or both of the second members having the second lower surface to which the object can be opposed. Supplying the first liquid from the first supply port, and at least part of the first liquid from the first supply port from the first recovery port disposed in one or both of the first member and the second member. Collecting the first liquid from the first supply port and the first time Forming a first immersion space for the first liquid so that the optical path of the exposure light between the emission surface and the substrate is filled with the first liquid by collecting the first liquid from the mouth; The substrate is exposed through the first liquid in the immersion space, and the first liquid in the second gap is recovered from the second recovery port facing the second gap between the first member and the second member. And a program for executing the above are provided.

  According to the twelfth aspect of the present invention, the substrate is exposed to the computer with the exposure light via the first liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of an immersion exposure apparatus for exposure, wherein at least a part faces a first inner surface opposite to an outer surface of an optical member arranged around the emission surface via a first gap, and the emission surface. A first member having a first lower surface to which the substrate to be opposed can be disposed, and an outer surface of the first member with respect to the optical path, and disposed on one or both of the second members having the second lower surface to which the object can be opposed. Supplying the first liquid from the first supply port, and at least part of the first liquid from the first supply port from the first recovery port disposed in one or both of the first member and the second member. Collecting the first liquid from the first supply port and the first time Forming a first immersion space for the first liquid so that the optical path of the exposure light between the emission surface and the substrate is filled with the first liquid by collecting the first liquid from the mouth; Exposing the substrate through the first liquid in the immersion space is performed, and a program is provided in which one or both of the first inner surface and the second inner surface have corners.

  According to the thirteenth aspect of the present invention, there is provided a computer-readable recording medium on which any one of the tenth to twelfth programs is recorded.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of the present invention, the occurrence of defective devices can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 2nd Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 3rd Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 4th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 6th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 7th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 8th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 9th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 9th Embodiment. It is a flowchart which shows an example of the manufacturing method of a device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS1 is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1. In the present embodiment, water (pure water) is used as the liquid LQ.

  In FIG. 1, an exposure apparatus EX includes a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and an illumination system IL that illuminates the mask M with exposure light EL. The projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, the liquid immersion member 3 that forms the liquid immersion space LS1 of the liquid LQ, the mask stage 1 and the substrate stage 2 A measurement system 4 that measures the position, a control device 5 that controls the operation of the entire exposure apparatus EX, and a storage device 6 that is connected to the control device 5 and stores various types of information related to exposure are provided. The storage device 6 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 6 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

  In the present embodiment, the liquid immersion member 3 is disposed at least at a part of the periphery of the terminal optical element 7 closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The last optical element 7 has an emission surface 7R from which the exposure light EL is emitted, and an outer surface 7S arranged around the emission surface 7R.

  In the present embodiment, the immersion space LS1 is formed on the exit surface 7R side. The immersion space LS1 is formed so that the optical path K of the exposure light EL emitted from the emission surface 7R is filled with the liquid LQ. In the present embodiment, the liquid immersion member 3 includes a first member 30 that forms an immersion space LS1 for the liquid LQ on the emission surface 7R side, and a second member that is disposed outside the first member 30 with respect to the optical path K. 60.

  The exposure apparatus EX includes at least a body (frame) 100 that supports the projection optical system PL. Further, the exposure apparatus EX includes a chamber apparatus 103 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space 102 in which the exposure light EL travels. The chamber device 103 includes a chamber member 104 that forms the space 102 and an environment control device 105 that adjusts the environment of the space 102. The space 102 is an internal space formed by the chamber member 104. The body 100 is disposed in the space 102.

  The space 102 includes a space 102A and a space 102B. The space 102A is a space where the substrate P is processed. The substrate stage 2 moves in the space 102A.

  The environment control device 105 includes an air supply unit 105S that supplies the gas Gs to the spaces 102A and 102B. The gas control unit 105S supplies the gas Gs to the spaces 102A and 102B from the air supply unit 105S to control the environment of the spaces 102A and 102B. adjust. In the present embodiment, at least the substrate stage 2 and the last optical element 7 of the projection optical system PL are arranged in the space 102A. In the present embodiment, the gas Gs supplied from the environment control device 105 to the space 102 is air.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 1 is movable on the guide surface 8G of the base member 8 while holding the mask M. The mask stage 1 moves on the guide surface 8G so that at least a part of the mask M moves in the illumination area IR. The mask stage 1 is moved by the operation of a drive system 1D including a planar motor as disclosed in, for example, US Pat. No. 6,452,292. The planar motor has a mover disposed on the mask stage 1 and a stator disposed on the base member 8. In the present embodiment, the mask stage 1 can move in six directions on the guide surface 8G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 1D. The drive system 1D that moves the mask stage 1 may not be a planar motor. For example, the drive system 1D may include a linear motor.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  The exit surface 7R of the last optical element 7 emits the exposure light EL toward the image plane of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 7R can be irradiated. In the present embodiment, the projection region PR includes a position facing the exit surface 7R.

  The substrate stage 2 is movable on the guide surface 9G of the base member 9 while holding the substrate P. The substrate stage 2 moves on the guide surface 9G so that at least a part of the substrate P moves in the projection region PR. The substrate stage 2 is moved by the operation of a drive system 2D including a planar motor as disclosed in, for example, US Pat. No. 6,452,292. The planar motor has a mover disposed on the substrate stage 2 and a stator disposed on the base member 9. In the present embodiment, the substrate stage 2 is movable in six directions including the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions on the guide surface 9G by the operation of the drive system 2D. The drive system 2D that moves the substrate stage 2 may not be a planar motor. For example, the drive system 2D may include a linear motor.

  In this embodiment, the substrate stage 2 can release the lower surface of the substrate P as disclosed in, for example, US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. And a second holding part 22 that is disposed around the first holding part 21 and holds the lower surface of the cover member T in a releasable manner. The cover member T is disposed around the substrate P held by the first holding unit 21.

  In the present embodiment, the first holding unit 21 holds the substrate P. The second holding unit 22 holds the cover member T. In the present embodiment, the upper surface of the substrate P held by the first holding unit 21 and the upper surface of the cover member T held by the second holding unit 22 are arranged in substantially the same plane (substantially flush with each other). ).

  The cover member T may be formed integrally with the substrate stage 2. In this case, the second holding unit 22 is omitted.

  The measurement system 4 includes one or both of an interferometer system and an encoder system. The interferometer system irradiates the measurement mirror of the mask stage 1 with measurement light, measures the position of the mask stage 1, and irradiates the measurement mirror of the substrate stage 2 with measurement light. And an interferometer unit that measures the position of 2. The encoder system includes an encoder head having an irradiation device that emits measurement light and a light receiving device that receives the measurement light, as disclosed in, for example, US Patent Application Publication No. 2007/0288121. The encoder head is disposed on the substrate stage 2 and irradiates measurement light from the irradiation device onto a scale member having a lattice (scale, lattice line), and receives the measurement light via the lattice with a light receiving device. Measure the position of the grid.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 5 operates the drive systems 1D and 2D based on the measurement result of the measurement system 4, and the mask stage 1 (mask M ) And position control of the substrate stage 2 (substrate P).

  Next, the liquid immersion member 3 according to the present embodiment will be described. 2 is a side sectional view parallel to the YZ plane showing an example of the liquid immersion member 3 according to the present embodiment, and FIG. 3 is an enlarged view of a part of FIG.

  As shown in FIGS. 2 and 3, the liquid immersion member 3 is disposed at least at a part around the terminal optical element 7. The last optical element 7 has an emission surface 7R from which the exposure light EL is emitted, and an outer surface 7S arranged around the emission surface 7R.

  In the present embodiment, the emission surface 7R faces the −Z direction and is parallel to the XY plane. The exit surface 7R facing the −Z direction may be a convex surface or a concave surface. The optical axis AX of the last optical element 7 is parallel to the Z axis. In the present embodiment, the exposure light EL emitted from the emission surface 7R travels in the −Z direction.

  In the present embodiment, the outer surface 7S does not emit the exposure light EL. In other words, the exposure light EL does not pass through the outer surface 7S. In the present embodiment, the outer surface 7S is inclined upward toward the outer side with respect to the radiation direction with respect to the optical axis AX of the terminal optical element 7.

  In the present embodiment, the immersion space LS1 is formed on the exit surface 7R side so that the optical path K of the exposure light EL between the terminal optical element 7 and the object facing the exit surface 7R is filled with the liquid LQ. The In the present embodiment, the object facing the exit surface 7R includes an object that can be arranged in the projection region PR. In the present embodiment, the object includes at least one of the substrate stage 2 (cover member T) and the substrate P held by the substrate stage 2 (first holding unit 21). Further, the object can be arranged to face the lower surface of the liquid immersion member 3. In the exposure of the substrate P, the immersion space LS1 is formed on the exit surface 7R side so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS1 is formed so that only a part of the upper surface (front surface) of the substrate P including the projection region PR is covered with the liquid LQ.

  In the present embodiment, the liquid immersion member 3 includes a first member 30 and a second member 60. In the present embodiment, the first member 30 and the second member 60 are supported by the body 100 via the support device 10. In the present embodiment, the position of the body 100 is substantially fixed. The support device 10 supports the first member 30 and the second member 60 above the object (the substrate P or the like).

  In the present embodiment, the support device 10 includes a support member 11 to which the first member 30 and the second member 60 are connected, and a connecting member 12 that connects the support member 11 and the body 100. In the present embodiment, the positions of the support member 11 and the connecting member 12 are substantially fixed. In other words, the relative positions of the support member 11 and the connecting member 12 and the body 100 do not change.

  In the present embodiment, the support device 10 includes a first support mechanism 13 that connects the first member 30 and the support member 11, and a second support mechanism 14 that connects the second member 60 and the support member 11.

  In the present embodiment, the first support mechanism 13 supports the first member 30 so that the position of the first member 30 with respect to the support member 11 does not change. That is, in the present embodiment, the position of the first member 30 does not change.

  In the present embodiment, the second support mechanism 14 supports the second member 60 so that the position of the second member 60 with respect to the support member 11 changes. That is, in the present embodiment, the position of the second member 60 can be changed. In other words, the relative position between the second member 60 and the support member 11 can be changed. Therefore, in the present embodiment, the second support mechanism 14 supports the second member 60 movably with respect to the first member 30.

  In the present embodiment, the second member 60 is supported by the second support mechanism 14 so as to be actively movable. For example, the second support mechanism 14 may include a drive device including an actuator that can move the second member 60.

  The second member 60 may be supported by the second support mechanism 14 so as to be passively movable. For example, the second support mechanism 14 may include one or both of a spring member and a bellows member, and may support the second member 60 so as to be movable.

  In the present embodiment, the second member 60 is supported so as to be movable at least in the Z-axis direction. The second member 60 may be supported so as to be movable in at least one of the X-axis direction, the Y-axis direction, the θX direction, the θY direction, and the θZ direction.

  In addition, the 1st support mechanism 13 may support the 1st member 30 so that a movement is possible. For example, the first member 30 may be passively supported by the first support mechanism 13 including one or both of a spring member and a bellows member. For example, the first member 30 may be actively movably supported by the second support mechanism 14 including an actuator. The first member 30 may be supported so as to be movable in the Z-axis direction, and is movable with respect to at least one of the X-axis direction, the Y-axis direction, the Z-axis direction, the θX direction, the θY direction, and the θZ direction. May be supported.

  Note that the position of the second member 60 may be substantially fixed.

  Note that one or both of the first member 30 and the second member 60 may be supported by a member different from the support device 10. For example, one or both of the first member 30 and the second member 60 may be supported by the body 100 via a support member different from the support device 10, or at least one optical element of the projection optical system PL may be used. You may support by the supporting member to support. Further, one or both of the first member 30 and the second member 60 may be connected to a body (frame) that does not support the projection optical system PL.

  The first member 30 has a first inner surface 30A and a first lower surface 30B. At least a portion of the first inner surface 30A faces the outer surface 7S of the last optical element 7 with the first gap G1 interposed therebetween. The first lower surface 30B can be opposed to an object facing the emission surface 7R. 2 and 3, the substrate P is shown as an example of an object with which the emission surface 7R and the first lower surface 30B face each other. As described above, as the object, for example, the substrate stage 2 (cover member T Or an object different from the substrate stage 2 and the substrate P. In the following description, the case where the object facing the emission surface 7R is the substrate P will be described as an example.

  In the present embodiment, the first member 30 is an annular member. At least a part of the first member 30 is disposed around the terminal optical element 7. In the present embodiment, at least a part of the first member 30 is also disposed around the optical path K between the terminal optical element 7 and the substrate P.

  The first member 30 may not be an annular member. For example, a plurality of first members 30 may be arranged around the last optical element 7 with an interval therebetween. Further, the first member 30 may be disposed at a part of the periphery of the last optical element 7. Further, the first member 30 may be disposed at least at a part of the periphery of the terminal optical element 7 and may not be disposed around the optical path K between the terminal optical element 7 and the substrate P.

  The second member 60 is disposed outside the first member 30 with respect to the optical path K (the optical axis AX of the terminal optical element 7). The second member 60 has a second inner surface 60A and a second lower surface 60B. At least a part of the second inner surface 60A is opposed to the first outer surface 30C of the first member 30 with the second gap G2. The substrate P can be opposed to the second lower surface 60B.

  In the present embodiment, a space SP <b> 1 is formed between the terminal optical element 7 and the first member 30. A space SPa is formed between the first member 30 and the object (substrate P or the like) facing the lower surface of the first member 30. A space SPb is formed between the second member 60 and an object (such as the substrate P) facing the lower surface of the second member. A space SP <b> 2 is formed between the first member 30 and the second member 60.

  The space SP1 has an opening 23 at the upper end. The opening 23 is formed between the outer surface 7S and the upper end of the first inner surface 30A. The space SP1 is opened to the atmosphere around the liquid immersion member 3 through the opening 23. That is, the space SP1 is opened to the space 102 (102A) formed by the chamber device 103 through the opening 23. In other words, the space SP1 is connected to the space 102 via the opening 23. Note that the pressure in the space 102 may be adjusted to atmospheric pressure, may be adjusted to a pressure higher than atmospheric pressure, or may be adjusted to a lower pressure.

  The space SP2 has an opening 25 at the upper end and an opening 26 at the lower end. The opening 25 is formed between the upper end of the first outer surface 30C and the second inner surface 60A. The opening 26 is formed between the lower end of the first outer surface 30C and the second inner surface 60A. The space SP <b> 2 is opened to the atmosphere around the liquid immersion member 3 through the opening 25. That is, the space SP2 is connected to the space 102 (102A) through the opening 25. The space SP2 is connected to the space SPa and the space SPb through the opening 26.

  Further, the space SPa and the space SPb are also opened to the atmosphere around the liquid immersion member 3.

  The liquid immersion member 3 includes a supply port 31 that supplies the liquid LQ and a recovery port 62 that recovers at least a part of the liquid LQ from the supply port 31. The supply port 31 supplies the liquid LQ so that the immersion space LS1 is formed. At least a part of the liquid LQ supplied from the supply port 31 is supplied to the optical path K. In the present embodiment, the recovery port 62 is disposed outside the supply port 31 with respect to the radial direction with respect to the optical path K (optical axis AX).

  In the present embodiment, the supply port 31 is disposed in the first member 30. In the present embodiment, the supply port 31 includes a supply port 31A and a supply port 31B.

  The supply port 31A is disposed so as to face the space SP1. In the present embodiment, the supply port 31A is disposed in the first member 30 so as to face the optical path K between the emission surface 7R and the substrate P. In the present embodiment, the supply port 31A is disposed on the first inner surface 30A. At least a part of the first inner surface 30A is disposed around the supply port 31A. The supply port 31A may be disposed on the first inner surface 30A so as to face the outer surface 7S of the last optical element 7.

  The supply port 31B is disposed so as to face the space SPa. In the present embodiment, the supply port 31B is disposed in the first member 30 such that the substrate P faces the supply port 31B. In the present embodiment, the supply port 31B is disposed on the first lower surface 30B. At least a part of the first lower surface 30B is disposed around the supply port 31B.

  In the present embodiment, the supply port 31A may be provided and the supply port 31B may be omitted, or the supply port 31B may be provided and the supply port 31A may be omitted. The supply port 31 may include a supply port arranged at least at a part of the first outer surface 30C.

  The supply port 31 may include a supply port provided in at least a part of the second member 60. For example, the supply port for supplying the liquid LQ may be disposed on at least a part of the second lower surface 60B of the second member 60, or may be disposed on at least a part of the second inner surface 60A. That is, the supply port for supplying the liquid LQ may be disposed in both the first member 30 and the second member 60.

  In the present embodiment, the recovery port 62 is disposed in the second member 60. In the present embodiment, the recovery port 62 is disposed so as to face the space SPb. In the present embodiment, the recovery port 62 is disposed in the second member 60 so that the substrate P faces. In the present embodiment, the recovery port 62 is disposed on the second lower surface 60B. At least a part of the second lower surface 60B is disposed around the collection port 62.

  In the present embodiment, the second member 60 has an opening 60 </ b> K formed so as to face the substrate P. The opening 60 </ b> K is disposed at the lower end of the space 60 </ b> S formed inside the second member 60. In the present embodiment, the porous member 63 is disposed in the opening 60K. In the present embodiment, the porous member 63 has an upper surface facing the space 60S, a lower surface facing in the opposite direction of the upper surface, and a plurality of holes connecting the upper surface and the lower surface. In the present embodiment, the recovery port 62 includes a hole of the porous member 63. In the present embodiment, the second lower surface 60 </ b> B includes the lower surface of the porous member 63. The liquid LQ is collected through the hole of the porous member 63.

  Note that the recovery port 62 may not be a hole of the porous member 63. For example, the recovery port 62 may be an opening formed in the second member 60. That is, the second member 60 may collect the liquid LQ without passing through the porous member.

  The recovery port 62 may be disposed on at least a part of the second inner surface 60A of the second member 60 without being disposed on the second lower surface 60B. The collection port 62 may include a collection port disposed on the second inner surface 60A and a collection port disposed on the second lower surface 60B.

  Note that the recovery port 62 may be provided in at least a part of the first member 30. For example, the recovery port 62 may be disposed on at least a part of the first lower surface 30B of the first member 30, or may be disposed on at least a part of the first outer surface 30C. Note that the recovery port 62 may include a recovery port arranged in the first member 30 and a recovery port arranged in the second member 60.

  In the present embodiment, the upper surface of an object (substrate P or the like) that faces the lower surface of the liquid immersion member 3 faces the first lower surface 30B of the first member 30 via the gap Ga. The upper surface of the object (substrate P or the like) faces the second lower surface 60B of the second member 60 via the gap Gb. In the present embodiment, the size of the gap Gb is smaller than the size of the gap Ga. Note that the size of the gap Gb may be equal to the size of the gap Ga, or the size of the gap Gb may be larger than the size of the gap Ga.

  In the present embodiment, the first lower surface 30B is substantially parallel to the XY plane. The second lower surface 60B is substantially parallel to the XY plane. In the present embodiment, the first lower surface 30B is substantially parallel to the upper surface of the substrate P. In the present embodiment, the second lower surface 60B is substantially parallel to the upper surface of the substrate P.

  One or both of the first lower surface 30B and the second lower surface 60B may be inclined with respect to the XY plane. Further, one or both of the first lower surface 30B and the second lower surface 60B may include a curved surface.

  In the present embodiment, the first member 30 is disposed at least at a part of the first part 30PA disposed between the emission surface 7R and the upper surface of the substrate P and at least a part of the periphery of the terminal optical element 7. Second portion 30PB. The first portion 30PA includes an upper surface facing the emission surface 7R and a lower surface facing the opposite direction of the upper surface. Further, the first portion 30PA has an opening (hole) 24 through which the exposure light EL emitted from the emission surface 7R passes. The opening 24 is formed so as to connect the upper surface and the lower surface of the first portion 30PA. The first lower surface 30B includes the lower surface of the first portion 30PA.

  The first inner surface 30A is disposed in the second portion 30PB. In the present embodiment, the first inner surface 30A is inclined upward toward the outside with respect to the radial direction with respect to the optical path K (optical axis AX). In the present embodiment, the first inner surface 30 </ b> A is substantially parallel to the outer surface 7 </ b> S of the last optical element 7. The first inner surface 30A may be non-parallel to the outer surface 7S of the last optical element 7.

  In the present embodiment, the space SP1 is connected to the space SPa through the opening 24.

  The first outer surface 30C is disposed so as to surround the optical path K (optical axis AX). In the present embodiment, the first outer surface 30C is substantially parallel to the Z axis. Note that the first outer surface 30C may be inclined upward inward with respect to the radiation direction with respect to the optical path K (optical axis AX). Note that the first outer surface 30C may be inclined upward toward the outside with respect to the radiation direction with respect to the optical path K (optical axis AX).

  The second inner surface 60A is disposed so as to surround the optical path K (optical axis AX). In the present embodiment, the second inner surface 60A is substantially parallel to the first outer surface 30C. In the present embodiment, the second inner surface 60A is substantially parallel to the Z axis. Note that the second inner surface 60A may be non-parallel to the first outer surface 30C. The second inner surface 60A may be inclined upward inward with respect to the radiation direction with respect to the optical path K (optical axis AX). The second inner surface 60A may be inclined upward toward the outer side with respect to the radiation direction with respect to the optical path K (optical axis AX).

  In the present embodiment, the fluid containing the liquid LQ and the gas Gs in the space 102 can flow (move) between the space SP1 and the space SPa. Further, the fluid can flow (move) between the space SP2 and the space SPa. Further, the fluid can flow (move) between the space SP2 and the space SPb. Further, the fluid can flow (move) between the space SPa and the space SPb.

  In the present embodiment, the liquid immersion member 3 faces the second gap G2 (space SP2) between the first member 30 and the second member 60, and supplies the liquid LR to the second gap G2. It has. In the present embodiment, the liquid LR is the same type of liquid as the liquid LQ. That is, in the present embodiment, the liquid LR is water (pure water). Note that the liquid LR supplied from the supply port 61 may be a different type of liquid from the liquid LQ supplied from the supply port 31. For example, the liquid LR may be a liquid having a viscosity (viscosity) different from that of the liquid LQ. Further, the liquid LR may be a liquid having a transmittance (transmittance with respect to the exposure light EL) different from that of the liquid LQ.

  In the present embodiment, the supply port 61 is disposed on the second inner surface 60A of the second member 60 so as to face the second gap G2 (space SP2). The supply port 61 may be disposed on the first outer surface 30C of the first member 30 so as to face the second gap G2. The supply port 61 may be disposed on both the first member 30 and the second member 60 so as to face the second gap G2. The supply port 61 may be disposed on a member different from the first member 30 and the second member 60 so as to face the second gap G2.

  In this embodiment, the supply port 61 is arrange | positioned in the position higher than the supply port 31 (31A, 31B) regarding the Z-axis direction. In the present embodiment, the supply port 61 is disposed at a position higher than the emission surface 7R in the Z-axis direction. Moreover, in this embodiment, the supply port 61 is arrange | positioned in the position higher than the collection | recovery port 62 regarding the Z-axis direction. Moreover, in this embodiment, the supply port 61 is arrange | positioned in the position higher than the center part of 60 A of 2nd inner surfaces regarding Z-axis direction. In the present embodiment, the supply port 61 is disposed at a position higher than the central portion of the first outer surface 30C in the Z-axis direction. In addition, the supply port 61 may be arrange | positioned in the position higher than the supply port 31B regarding the Z-axis direction, and may be arrange | positioned in the position lower than the supply port 31A.

  In the present embodiment, the supply ports 31 (31A, 31B) are connected to the liquid supply device 33 that can supply the liquid LQ via the supply flow paths 32 (32A, 32B) formed inside the first member 30. Is done. The liquid supply device 33 can supply clean and temperature-adjusted liquid LQ. The supply port 31A supplies the liquid LQ from the liquid supply device 33 to a space including the optical path K between the last optical element 7 and the substrate P. The supply port 31B supplies the liquid LQ from the liquid supply device 33 to the space SPa between the first member 30 and the substrate P.

  In the present embodiment, the liquid LQ supplied from the supply port 31A flows through the space between the emission surface 7R and the upper surface of the first portion 30PA, and is supplied onto the substrate P through the opening 24. At least a part of the liquid LQ supplied from the supply port 31A and passing through the opening 24 is supplied to the space SPa.

  At least a part of the liquid LQ supplied from the supply port 31A to the space SPa and at least a part of the liquid LQ supplied from the supply port 31B to the space SPa are connected to the first member 30 and the second member via the opening 26. There is a possibility of flowing into the space SP2 (second gap G2).

  Further, at least a part of the liquid LQ supplied from the supply port 31A to the space SPa and at least a part of the liquid LQ supplied from the supply port 31B to the space SPa are spaces between the second member 60 and the substrate P. It flows into SPb. At least a part of the liquid LQ in the space SPb is recovered from the recovery port 62 (hole of the porous member 63) disposed so as to face the space SPb.

  In the present embodiment, the recovery port 62 is connected to a liquid recovery device 63 that can recover the liquid LQ via a recovery flow path (space) 60S formed inside the second member 60. The liquid recovery device 63 includes, for example, a vacuum system and can recover (suction) the liquid LQ.

  The liquid supply device 33 and the liquid recovery device 63 are controlled by the control device 5. In the present embodiment, the recovery of the liquid LQ from the recovery port 62 is executed in parallel with the supply of the liquid LQ from the supply port 31 (31A, 31B), so An immersion space LS1 is formed with the liquid LQ between the first member 30 and the second member 60 and the substrate P on the other side. In the present embodiment, at least a part of the immersion space LS <b> 1 is formed on the first lower surface 30 </ b> B side of the first member 30. Further, at least a part of the liquid immersion member LS1 is formed on the second lower surface 60B side of the second member 60.

  In the present embodiment, the supply port 61 is connected to a liquid supply device 65 capable of supplying the liquid LR via a supply flow path 64 formed inside the second member 60. The liquid supply device 65 can supply the liquid LR. The supply port 61 supplies the liquid LR from the liquid supply device 65 to the space SP2 (second gap G2) between the first member 30 and the second member 60.

  In the present embodiment, the liquid LR supplied from the supply port 61 flows through the space SP2 between the first outer surface 30C and the second inner surface 60A, and passes through the opening 26 disposed at the lower end of the space SP2 to form the substrate P. Supplied on top. At least a part of the liquid LR supplied from the supply port 61 and passed through the opening 26 flows into the space SPb.

  At least a part of the liquid LR supplied from the supply port 61 to the space SP2 and flowing into the space SPb through the opening 26 is from a recovery port 62 (hole of the porous member 63) arranged to face the space SPb. Collected. The liquid recovery device 63 can also recover the liquid LR.

  The liquid supply device 65 is controlled by the control device 5. In the present embodiment, the recovery of the liquids LQ and LR from the recovery port 62 is performed in parallel with the supply of the liquid LQ from the supply ports 31 (31A and 31B) and the supply of the liquid LR from the supply port 61. The The liquid supply from one of the supply port 31 and the supply port 61 can be performed and the liquid supply from the other can be stopped.

  In the present embodiment, the temperature of the liquid LQ supplied from the supply port 31 and the temperature of the liquid LR supplied from the supply port 61 may be different. For example, in order to adjust the temperature of one or both of the first member 30 and the second member 60, the temperature of the liquid LR supplied from the supply port 61 is higher than the temperature of the liquid LQ supplied from the supply port 31. It may be low or low. Further, the cleanliness of the liquid LQ supplied from the supply port 31 and the cleanliness of the liquid LR supplied from the supply port 61 may be different. For example, the cleanness of the liquid LR supplied from the supply port 61 may be lower than the cleanness of the liquid LQ supplied from the supply port 31.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  The control device 5 executes a process of loading (loading) the substrate P before exposure into the first holding unit 21. The control device 5 moves the substrate stage 2 to a substrate exchange position away from the liquid immersion member 3 in order to carry (load) the substrate P before exposure into the first holding unit 21. For example, when the exposed substrate P is held by the first holding unit 21, after the process of carrying out (unloading) the exposed substrate P from the first holding unit 21 is performed, before the exposure, A process of loading (loading) the substrate P into the first holding unit 21 is executed.

  The board replacement position is a position where the board P can be replaced. The exchange process of the substrate P uses the transfer device to carry out (unload) the exposed substrate P held by the first holding unit 21 from the first holding unit 21 and expose the first holding unit 21 to exposure. This includes at least one of the processes of loading (loading) the previous substrate P. The control device 5 moves the substrate stage 2 to a substrate replacement position away from the liquid immersion member 3 and executes a substrate P replacement process.

  After the unexposed substrate P is loaded on the first holding unit 21, the control device 5 moves the substrate stage 2 to the projection region PR, and the terminal optical element 7, the liquid immersion member 3, and the substrate stage 2 (substrate P). ) To form an immersion space LS1 for the liquid LQ. The control device 5 supplies the liquid LQ from the supply port 31 in order to form the immersion space LS1. Further, the control device 5 recovers at least a part of the liquid LQ from the supply port 31 from the recovery port 62. The terminal optical element is such that the optical path K of the exposure light EL between the emission surface 7R and the substrate P is filled with the liquid LQ by the supply of the liquid LQ from the supply port 31 and the recovery of the liquid LQ from the recovery port 62. 7, an immersion space LS1 is formed between at least a part of the first member 30 and the second member 60 and the substrate P (substrate stage 2).

  After the immersion space LS1 is formed so that the optical path K is filled with the liquid LQ, the control device 5 starts the exposure process for the substrate P. The control device 5 emits the exposure light EL from the illumination system IL in a state where the immersion space LS1 is formed and the emission surface 7 and at least a part of the substrate P face each other. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P through the projection optical system PL and the liquid LQ. Thus, the substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS1, and an image of the pattern of the mask M is projected onto the substrate P.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 5 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS1 on the substrate P while moving the mask M in the Y-axis direction.

  In the present embodiment, the liquid LR is supplied from the supply port 61 in a state where the immersion space LS1 is formed. The liquid supply from the supply port 61 may be started after the immersion space LS1 is formed, or the liquid supply from the supply port 61 may be started before the immersion space LS1 is formed.

  In the present embodiment, at least a part of the liquid LQ supplied from the supply port 31 flows into the space SP2 (second gap G2) through the opening 26. In the present embodiment, the liquid LR is supplied from the supply port 61 in a state where the liquid LQ exists in at least a part of the space SP2. Thereby, the liquids LQ and LR flow in at least a part of the space SP2. In addition, at least a part of the liquid LQ that has flowed into the space SP2 through the opening 26 is discharged from the space SP2 through the opening 26. Further, at least part of the liquid LR in the space SP2 is also discharged from the space SP2 through the opening 26. At least a part of the liquids LQ and LR discharged from the space SP2 flows into the space SPb and is recovered from the recovery port 62.

  In the present embodiment, since the liquid LR is supplied from the supply port 61 to the space SP2 (second gap G2), the liquid LQ (LR) is suppressed from staying in the space SP2 for a long time. Thereby, the contamination of the liquid LQ (LR) in the space SP2 due to the retention is suppressed. That is, if the liquid LQ (LR) stays in the space SP2 for a long time, the quality (water quality) of the liquid LQ (LR) in the space SP2 decreases or the liquid LQ (LR) is contaminated, for example, bacteria are generated. there is a possibility. As a result, the quality of the liquid LQ existing in the optical path K or the quality of the liquid LQ in contact with the substrate P is deteriorated, and exposure failure may occur.

  According to the present embodiment, since the liquid LR is supplied to the space SP2 from the supply port 61 disposed so as to face the space SP2 (second gap G2), the liquid LQ (LR) is supplied to the space SP2. ). Further, the liquid LQ (LR) can be discharged from the space SP2. As a result, the liquid LQ (LR) is suppressed from staying in the space SP2. Therefore, the contamination of the liquid LQ is suppressed, and the occurrence of exposure failure is suppressed.

  Further, according to the present embodiment, the position of the surface (interface) LG2 of the liquid LQ (LR) in the space PSP2 may be adjusted by supplying the liquid LR from the supply port 61. For example, by adjusting the supply amount of the liquid LR from the supply port 61 per unit time, the position of the surface LG2 of the liquid LQ (LR) in the space SP2 is substantially reduced while suppressing the retention of the liquid LQ in the space SP2. It may be kept constant. Thereby, for example, the liquid LQ (LR) in the space SP2 is suppressed from flowing out from the opening 25 at the upper end of the space SP2.

  As described above, according to the present embodiment, since the liquid LR is supplied to the space SP2 from the supply port 61 disposed so as to face the space SP2 (second gap G2), the space SP2 The liquid LQ in can be maintained in a desired state. For example, the outflow of the liquid LQ (LR) from the space SP2 can be suppressed while suppressing the retention of the liquid LQ (LR) in the space SP2. Therefore, the occurrence of defective exposure and the occurrence of defective devices can be suppressed.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 4 is a diagram illustrating an example of the liquid immersion member 3002 according to the second embodiment. As shown in FIG. 4, in the present embodiment, the liquid immersion member 3002 faces the second gap G2 (space SP2) between the first member 302 and the second member 602, and the liquid in the second gap G2 A recovery port 66 for recovering LQ is provided.

  In the present embodiment, the recovery port 66 is disposed on the first inner surface 602A of the second member 602 so as to face the second gap G2. The recovery port 66 may be disposed on the first outer surface 302C of the first member 302 so as to face the second gap G2. Note that the recovery port 66 may be disposed on both the first member 302 and the second member 602 so as to face the second gap G2. Note that the recovery port 66 may be disposed on a member different from the first member 302 and the second member 602 so as to face the second gap G2.

  In the present embodiment, the recovery port 66 is disposed at a position higher than the supply ports 31 (31A, 31B) in the Z-axis direction. In the present embodiment, the recovery port 66 is disposed at a position higher than the exit surface 7R in the Z-axis direction. In the present embodiment, the recovery port 66 is disposed at a position higher than the recovery port 62 in the Z-axis direction. In the present embodiment, the recovery port 66 is disposed at a position higher than the central portion of the second inner surface 602A in the Z-axis direction. In the present embodiment, the recovery port 66 is arranged at a position higher than the central portion of the first outer surface 302C in the Z-axis direction. The recovery port 66 may be disposed at a position higher than the supply port 31B and disposed at a position lower than the supply port 31A in the Z-axis direction.

  In the present embodiment, the recovery port 66 is connected to a liquid recovery device 68 capable of recovering the liquid LQ via a recovery channel 67 formed inside the second member 602. The liquid recovery device 68 can connect the recovery port 66 to a vacuum system and can recover the liquid LQ.

  In the present embodiment, the control device 5 performs the recovery operation of the recovery port 66 in a state where the immersion space LS1 is formed with the liquid LQ. In the present embodiment, at least a part of the liquid LQ supplied from the supply port 31 and flowing into the space SP2 from the space SPa via the opening 26 is recovered from the recovery port 66. This suppresses the occurrence of exposure failure.

  For example, by collecting at least a part of the liquid LQ in the space SP2 from the recovery port 66, the liquid LQ stays in the space SP2. Therefore, contamination of the liquid LQ is suppressed. Further, by collecting at least a part of the liquid LQ in the space SP2 from the collection port 66, the liquid LQ in the space SP2 is suppressed from flowing out of the space SP2 through the opening 25 at the upper end of the space SP2.

  Further, the position of the surface (interface) LG2 of the liquid LQ in the space SP2 may be adjusted by recovering at least a part of the liquid LQ in the space SP2 from the recovery port 66. Further, by recovering at least part of the liquid LQ in the space SP2 from the recovery port 65, the position of the surface (interface) LG2 of the liquid LQ in the space SP2 may be maintained substantially constant. Also in this embodiment, the occurrence of defective exposure and the occurrence of defective devices are suppressed.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 5 is a diagram illustrating an example of the liquid immersion member 3003 according to the third embodiment. As shown in FIG. 5, in this embodiment, the liquid immersion member 3003 faces the second gap G2, faces the second gap G2, the supply port 61C that supplies the liquid LR to the second gap G2, and the second gap G2. A recovery port 66C that recovers one or both of the liquid LQ and the liquid LR in the two gaps G2. In the present embodiment, the supply port 61C is disposed on the second inner surface 603A of the second member 603 so as to face the second gap G2. The recovery port 66C is disposed on the first outer surface 303C of the first member 303 so as to face the second gap G2. In the present embodiment, the supply port 61C and the recovery port 66C are disposed at substantially the same position (height) with respect to the Z-axis direction. The supply port 61C may be disposed at a higher position than the collection port 66C or may be disposed at a lower position.

  The supply port 61C may be disposed on the first outer surface 303C of the first member 303, and the recovery port 66C may be disposed on the second inner surface 603A of the second member 603.

  Note that both the supply port 61 </ b> C and the recovery port 66 </ b> C are disposed on the second member 603 and may not be disposed on the first member 303. Note that both the supply port 61 </ b> C and the recovery port 66 </ b> C are disposed in the first member 303 and may not be disposed in the second member 603. Note that the supply port 61 </ b> C and the recovery port 66 </ b> C may be disposed in both the first member 303 and the second member 603.

  Note that one or both of the supply port 61C and the recovery port 66C may be arranged on a member different from the first member 303 and the second member 603 so as to face the second gap G2.

  In this embodiment, in parallel with the supply of the liquid LR from the supply port 61C, the recovery of the liquids LQ and LR from the recovery port 66C is performed. The controller 5 does not perform the recovery operation of the recovery port 66C, but supplies the liquid LR from the supply port 61C, and starts the supply operation of the liquid LR from the supply port 61C. After the elapse of time, the supply operation may be stopped and the recovery operation from the recovery port 66C may be executed. Further, after the second time has elapsed since the start of the recovery operation from the recovery port 66C, the control device 5 stops the recovery operation and also starts the supply operation of the liquid LR from the supply port 61C. Good. That is, the supply operation from the supply port 61C and the recovery operation from the recovery port 66C may be performed alternately.

  In the present embodiment, the control device 5 performs the supply operation of the supply port 61C and the recovery operation of the recovery port 66C in a state where the immersion space LS1 is formed with the liquid LQ. In the present embodiment, at least a part of the liquid LQ supplied from the supply port 31 and flowing into the space SP2 from the space SPa through the opening 24, and at least a part of the liquid LR supplied from the supply port 61C to the space SP2. Is recovered from the recovery port 66C. This suppresses the occurrence of exposure failure.

  For example, the stagnation of the liquids LQ and LR in the space SP2 is suppressed by one or both of the supply of the liquid LR from the supply port 61C and the recovery of the liquids LQ and LR in the space SP2 from the recovery port 66C. Therefore, contamination of the liquids LQ and LR in the space SP2 is suppressed. Further, by one or both of the supply operation of the supply port 61C and the recovery operation of the recovery port 66C, the liquid LQ (LR) in the space SP2 is suppressed from flowing out of the space SP2 through the opening 25 at the upper end of the space SP2. The Further, the position of the surface (interface) LG2 of the liquid LQ (LR) in the space SP2 may be adjusted by one or both of the supply operation of the supply port 61C and the recovery operation of the recovery port 66C. Further, the position of the surface (interface) LG2 of the liquid LQ (LR) in the space SP2 may be maintained substantially constant by one or both of the supply operation of the supply port 61C and the recovery operation of the recovery port 66C. Also in this embodiment, the occurrence of defective exposure and the occurrence of defective devices are suppressed.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 6 is a diagram illustrating an example of the liquid immersion member 3004 according to the fourth embodiment. In FIG. 6, the liquid immersion member 3004 includes a first member 304 having a first inner surface 304A, and a second member 604 having a second inner surface 604A.

  In the present embodiment, the first gap G1 between the outer surface 7S of the last optical element 7 and the first inner surface 304A includes a first portion B1 close to the substrate P and a second portion B2 above the first portion B1. Have In the present embodiment, the size of the first gap G1 in the second portion B2 is larger than the size of the first gap G1 in the first portion B1.

  In the present embodiment, the first inner surface 304A includes a first region A1 close to the substrate P, a second region A2 disposed above the first region A1, an upper end of the first region A1, and a lower end of the second region A2. And a third region A3 that faces the direction different from the first and second regions A1 and A2.

  In the present embodiment, the first portion B1 includes a first gap G1 between the outer surface 7S and the first region A1. The second portion B2 includes a first gap G1 between the outer surface 7S and the second and third regions A2, A3.

  In the present embodiment, the third region A3 is inclined upward toward the outside in the radial direction with respect to the optical path K (optical axis AX). Note that the third region A3 may be substantially parallel to the XY plane.

  In the present embodiment, the supply port 31A is disposed in the first region A1. The supply port 31A is disposed so as to be immersed in the liquid LQ in the immersion space LS1.

  In the present embodiment, the first inner surface 304A has a corner portion K1 and a corner portion K2. The corner K1 is formed at the boundary between the first region A1 and the third region A3. The corner K2 is formed at the boundary between the third region A3 and the second region A2. The corner K1 is convex toward the outer surface 7S. The corner K2 is recessed with respect to the outer surface 7S.

  In the present embodiment, the second gap G2 has a third portion B3 close to the substrate P and a fourth portion B4 above the third portion B3. The size of the second gap G2 in the fourth portion B4 is larger than the size of the second gap G2 in the third portion B3.

  In the present embodiment, the first outer surface 304C includes a fourth region A4 close to the substrate P, a fifth region A5 disposed above the fourth region A4, an upper end of the fourth region A4, and a lower end of the fifth region A5. And a sixth region A6 that faces the direction different from the fourth and fifth regions A4, A5.

  In the present embodiment, the third portion B3 includes a second gap G2 between the fourth region A4 and the second inner surface 604A. The fourth portion B4 includes a second gap G2 between the fifth and sixth regions A5, A6 and the second inner surface 604A.

  In the present embodiment, the sixth region A6 is inclined upward inward with respect to the radiation direction with respect to the optical path K (optical axis AX). Note that the sixth region A6 may be substantially parallel to the XY plane.

  In the present embodiment, the recovery port 66D is disposed in the fifth region A5. The collection port 66D is disposed so as to face the second gap G2. The recovery port 66D recovers the liquid LQ in the second gap G2. The recovery port 66D may be disposed in the sixth region A6, or may be disposed in both the fifth region A5 and the sixth region A6.

  A supply port 61D that faces the second gap G2 and supplies the liquid LR to the second gap G2 may be arranged in the fifth region A5 instead of the recovery port 66D or together with the recovery port 66D. The supply port 61D may be disposed in the sixth region A6, or may be disposed in both the fifth region A5 and the sixth region A6.

  Note that one or both of the supply port 61D that supplies the liquid LQ to the second gap G2 and the recovery port 66D that recovers the liquids LQ and LR in the second gap G2 face the fifth and sixth regions A5 and A6. The second inner surface 604A may be disposed on at least a part.

  In the present embodiment, the first outer surface 304C has a corner portion K3 and a corner portion K4. The corner K3 is formed at the boundary between the fourth region A4 and the sixth region A6. The corner K4 is formed at the boundary between the sixth region A6 and the fifth region A5. The corner portion K3 is convex toward the second inner surface 604A. The corner K4 is recessed with respect to the second inner surface 604A.

  In the present embodiment, since the corner portion K1 is provided in the first gap G1, the surface (interface) LG1 of the liquid LQ is suppressed from moving upward from the corner portion K1 in the first gap G1. . Accordingly, the liquid LQ in the first gap G1 is suppressed from flowing out from the first gap G1 through the opening 23.

  In the present embodiment, since the corner portion K3 is provided in the second gap G2, the surface (interface) LG2 of the liquid LQ is prevented from moving upward from the corner portion K3 in the second gap G2. Is done. Accordingly, the liquid LQ in the second gap G2 is suppressed from flowing out of the second gap G2 through the opening 25.

  In the present embodiment, one or both of the recovery port 66D that recovers the liquid LQ from the second gap G2 and the supply port 61D that supplies the liquid LR to the second gap G2 may be omitted. One or both of the recovery port 66D and the supply port 61D may be disposed below the corner portion K3.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 7 is a diagram illustrating an example of the liquid immersion member 3005 according to the fifth embodiment. In FIG. 7, the liquid immersion member 3005 includes a first member 305 having a first inner surface 305A and a second member 605 having a second inner surface 605A.

  In the present embodiment, the second gap G2 has a third portion B3 close to the substrate P and a fourth portion B4 above the third portion B3. The size of the second gap G2 in the fourth portion B4 is larger than the size of the second gap G2 in the third portion B3.

  In the present embodiment, the second inner surface 605A includes the seventh region A7 close to the substrate P, the eighth region A8 disposed above the seventh region A7, the upper end of the seventh region A7, and the lower end of the eighth region A8. And a ninth region A9 that faces the direction different from the seventh and eighth regions A7, A8.

  In the present embodiment, the third portion B3 includes a second gap G2 between the first outer surface 305C and the seventh region A7. The fourth portion B4 includes a second gap G2 between the first outer surface 305C and the eighth and ninth regions A8, A9.

  In the present embodiment, the ninth region A9 is inclined upward toward the outside with respect to the radial direction with respect to the optical path K (optical axis AX). The ninth region A9 may be substantially parallel to the XY plane.

  In the present embodiment, a recovery port 66E that recovers the liquid LQ in the second gap G2 facing the second gap G2 is disposed in the eighth region A8. The recovery port 66E may be disposed in the ninth region A9, or may be disposed in both the eighth region A8 and the ninth region A9.

  A supply port 61E that faces the second gap G2 and supplies the liquid LR to the second gap G2 may be disposed in the eighth region A8 instead of the recovery port 66E or together with the recovery port 66E. The supply port 61E may be disposed in the ninth region A9, or may be disposed in both the eighth region A8 and the ninth region A9.

  Note that one or both of the supply port 61E that supplies the liquid LQ to the second gap G2 and the recovery port 66E that recovers the liquids LQ and LR in the second gap G2 face the eighth and ninth regions A8 and A9. It may be arranged on at least a part of the two inner surfaces 605A.

  In the present embodiment, the second inner surface 605A has a corner portion K5 and a corner portion K6. The corner K5 is formed at the boundary between the seventh area A7 and the ninth area A9. The corner K6 is formed at the boundary between the ninth area A9 and the eighth area A8. The corner K5 is convex toward the first outer surface 305C. The corner K6 is recessed with respect to the first outer surface 305C.

  In the present embodiment, since the corner portion K5 is provided in the second gap G2, it is suppressed that the surface (interface) LG2 of the liquid LQ moves above the corner portion K5 in the second gap G2. . Accordingly, the liquid LQ in the second gap G2 is suppressed from flowing out of the space SP2 through the opening 25.

  In the present embodiment, one or both of the recovery port 66E that recovers the liquid LQ from the second gap G2 and the supply port 61E that supplies the liquid LR to the second gap G2 may be omitted. One or both of the recovery port 66D and the supply port 61D may be disposed below the corner portion K5.

  The liquid immersion member 3005 includes the first member 304 having the first outer surface 304C including the corner portions K3 and K4 described in the fourth embodiment, and the corner portions K5 and K6 described in the fifth embodiment. And a second member 605 having a second inner surface 605A.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 8 is a diagram illustrating an example of the first inner surface 306A of the first member 306 according to the sixth embodiment. For example, as shown in FIG. 8, the first inner surface 306A may have no corners. In FIG. 8, the first inner surface 306A is inclined such that the distance from the outer surface 7S gradually increases upward (opening 23). Also in the example illustrated in FIG. 8, the surface (interface) LG1 of the liquid LQ in the first gap G1 is prevented from moving upward (opening 23) by the surface tension of the liquid LQ. Therefore, the liquid LQ in the first gap G1 is suppressed from flowing out from the opening 23.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 9 is a diagram illustrating an example of the first outer surface 307C of the first member 307 and the second inner surface 607A of the second member 607 according to the seventh embodiment.

  For example, as shown in FIG. 9, the first outer surface 307C and the second inner surface 607A may not have corners. In FIG. 9, the second inner surface 607A is inclined so that the distance from the first outer surface 307C gradually increases upward (opening 25). Also in the example illustrated in FIG. 9, the surface (interface) LG <b> 2 of the liquid LQ in the second gap G <b> 2 is suppressed from moving upward (opening 25) due to the surface tension of the liquid LQ. Accordingly, the liquid LQ in the second gap G2 is prevented from flowing out from the opening 25.

<Eighth Embodiment>
Next, an eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 10 is a diagram illustrating an example of the liquid immersion member 3008 according to the eighth embodiment. In FIG. 10, the liquid immersion member 3008 is provided on the upper part of the second gap G2, and includes a suppressing member 70 that suppresses the outflow of the liquid LQ from the second gap G2. In the present embodiment, the suppressing member 70 is connected to the first outer surface 308 </ b> C of the first member 308 and does not contact the second member 608. In the present embodiment, the suppressing member 70 is a plate-like member.

  The suppressing member 70 has a lower surface facing the second gap G2 (space SP2), an upper surface facing the opposite direction of the lower surface, and a side surface connecting the upper surface and the lower surface. In the present embodiment, the side surface of the suppressing member 70 faces the second inner surface 608A. The side surface of the suppressing member 70 faces the second inner surface 608A via the gap Gu. The gap Gu is smaller than the second gap G2. The second gap G2 (space SP2) is opened to the atmosphere via the gap Gu. Note that at least a part of the suppressing member 70 and the second member 608 may contact each other.

  In the present embodiment, the suppressing member 70 is connected to the first member 308, but may be connected to the second member 608. The suppressing member 70 connected to the second member 608 may be away from or in contact with the first member 308.

  In the present embodiment, the suppressing member 70 is disposed at a position higher than the central portion of the first outer surface 308C and the central portion of the second inner surface 608A in the Z-axis direction.

  In the present embodiment, at least a part of the surface of the suppressing member 70 is liquid repellent with respect to the liquid LQ in the second gap G2. At least the lower surface and side surfaces of the suppressing member 70 are liquid repellent with respect to the liquid LQ. The contact angle of the surface of the suppressing member 70 with respect to the liquid LQ is, for example, 90 degrees or more. The contact angle of the surface of the suppressing member 70 with respect to the liquid LQ may be, for example, 100 degrees or more, or 110 degrees or more.

  In the present embodiment, since the suppressing member 70 is disposed, the liquid LQ in the space SP2 (second gap G2) is suppressed from flowing out of the space SP2 through the opening 25.

  In addition, the suppressing member 70 can be applied to the first to seventh embodiments described above.

<Ninth Embodiment>
Next, a ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a view showing a part of the liquid immersion member 3009 according to the ninth embodiment, and FIG. 12 is a view of the liquid immersion member 3009 as viewed from below. 11 and 12, the liquid immersion member 3009 is disposed outside the first member 309 with respect to the optical path K (optical axis AX) and the first member 309 disposed at least at a part of the periphery of the last optical element 7. The second member 609 is disposed, and the third member 809 is disposed outside the second member 609 with respect to the optical path K (optical axis AX).

  The third member 809 has a third inner surface 809A that faces the second outer surface 609C of the second member 609, and a third lower surface 809B that can face the substrate P (object). A space SPc is formed between the third lower surface 809B and the substrate P. In the present embodiment, the size of the gap Gc between the third lower surface 809B and the upper surface of the substrate P is substantially equal to the size of the gap Gb between the second lower surface 609B and the upper surface of the substrate P. Note that the size of the gap Gc may be larger or smaller than the size of the gap Gb.

  In the present embodiment, at least a part of the immersion space LS2 for the liquid LP is formed on the third lower surface 809B side. In the present embodiment, the immersion space LS2 is formed by the liquid LP held between the third lower surface 809B and the substrate P (object).

  In the present embodiment, the liquid LP is the same type of liquid as the liquid LQ. That is, in the present embodiment, the liquid LP is water (pure water). The liquid LP may be a different type of liquid from the liquid LQ. For example, the liquid LP may be a liquid having a viscosity (viscosity) different from that of the liquid LQ. Further, the liquid LP may be a liquid having a transmittance (transmittance with respect to the exposure light EL) different from that of the liquid LQ.

  In the present embodiment, the immersion space LS2 is smaller than the immersion space LS1. In the present embodiment, the size of the immersion space LS2 in the XY plane is smaller than the size of the immersion space LS1. In the present embodiment, the volume (weight) of the liquid LP that forms the immersion space LS2 is smaller than the volume (weight) of the liquid LQ that forms the immersion space LS1.

  In the present embodiment, the size of the gap G3 between the second outer surface 609C of the second member 609 and the third inner surface 809A of the third member 809 is smaller than the size of the gap G2. Note that the second outer surface 609C of the second member 609 and at least a part of the third inner surface 809A of the third member 809 may contact each other.

  In the present embodiment, the third member 809 has a supply port 75 that supplies the liquid LP for forming the immersion space LS2, and a recovery port 76 that recovers at least a part of the liquid LP from the supply port 75. . In this embodiment, the supply port 75 is arrange | positioned so that the board | substrate P may oppose. In the present embodiment, the recovery port 76 is arranged so that the substrate P faces the substrate. In the present embodiment, the supply port 75 and the recovery port 76 are disposed on the third lower surface 809 </ b> B of the third member 809. In the present embodiment, the recovery port 76 is disposed around the supply port 75 on the third lower surface 809B.

  The supply port 75 is connected to a liquid supply apparatus that can supply the liquid LP. The recovery port 76 is connected to a liquid recovery apparatus that can recover the liquid. The liquid supply device and the liquid recovery device are controlled by the control device 5. In parallel with the supply of the liquid LP from the supply port 75, the liquid LP is recovered from the recovery port 76, whereby an immersion space LS2 is formed between the third member 809 and the substrate P with the liquid LP. The

  As shown in FIG. 12, in the present embodiment, the third member 809 is arranged in the Y-axis direction (scanning direction) with respect to the optical path K (optical axis AX). In the present embodiment, the third member 809 is disposed on each of the + Y side and the −Y side with respect to the optical path K (optical axis AX). The immersion space LS2 is formed on each of the + Y side and the −Y side of the immersion space LS1.

  In the present embodiment, for example, when the substrate P moves in the XY plane in a state where the immersion space LS1 is formed, the liquid LQ in the immersion space LS1 is on the second lower surface 609B side of the second member 609. Among the spaces, the light path K is guided to a part of the space on the + Y side and a part of the space on the −Y side. In the following description, a part of the space is appropriately referred to as guidance space GPS.

  In the present embodiment, when the substrate P moves in the XY plane with the immersion space LS1 formed, the first lower surface 309B and the second lower surface are so guided that the liquid LQ is guided to the guidance space GPS. The shape of 609B (porous member 63) is defined. In the present embodiment, the immersion space LS2 is formed so as to be adjacent to the guidance space GPS.

  For example, at least part of the liquid LQ in the immersion space LS1 may flow out of the space SPb that the second lower surface 609B of the second member 609 faces due to the movement condition of the substrate P and the like. In the present embodiment, the liquid LQ in the space SPb is likely to flow out of the space SPb from the guidance space GPS.

  In the present embodiment, the immersion space LS2 is formed so as to be adjacent to the guidance space GPS. Accordingly, the liquid LQ that has flowed out of the space SPb (guidance space GPS) comes into contact with the liquid LP in the immersion space LS2. Further, the liquid LQ that has flowed out is integrated with the liquid LP in the immersion space LS2. The liquid LQ that has flowed out of the space SPb is recovered from the recovery port 76 together with the liquid LP of the immersion space LS2. Thereby, even if the liquid LQ flows out from the space SPb, the outflowing liquid LQ is suppressed from flowing out of the space SPc.

  As described above, according to the present embodiment, since the third member 809 for forming the immersion space LS2 is provided outside the second member 609 with respect to the optical path K, the liquid LQ flowing out from the space SPb is provided. Can be captured by the immersion space LS2. Therefore, the liquid LQ is prevented from flowing out of the space SPc.

  Note that the structures of the first to eighth embodiments described above can be applied to the portion facing the space between the first member 309 and the second member 609.

Further, when a space is also formed between the second member 609 and the third member 809, the first embodiment described above is formed on the portion of the second member 609 and the third member 809 facing the space. The structure of the first member (30 etc.) and the second member (60 etc.) of the eighth embodiment may be applied.

  Moreover, you may provide the 3rd member for forming the immersion space LS2 in the above-mentioned 1st Embodiment-8th Embodiment.

  Note that the various modifications described in at least one of the first to ninth embodiments described above can be applied to other embodiments.

  As described above, the control device 5 includes a computer system including a CPU and the like. The control device 5 includes an interface capable of executing communication between the computer system and an external device. The storage device 6 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 6 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 5. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various kinds of information including programs recorded in the storage device 6 can be read by the control device (computer system) 5. In the storage device 6, a liquid that exposes the substrate with the exposure light to the control device 5 through the first liquid filled in the optical path of the exposure light between the emission surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the immersion exposure apparatus is recorded.

  In accordance with the above-described embodiment, the program recorded in the storage device 6 causes the control device 5 to have a first facing at least a part of the outer surface of the optical member disposed around the exit surface via the first gap. A first member having an inner surface and a first lower surface capable of facing the substrate facing the emission surface, and a second member disposed on the outer side of the first member with respect to the optical path and having a second lower surface capable of facing the object From the first supply port arranged in one or both of the first supply port, from the first recovery port arranged in one or both of the first member and the second member, from the first supply port By collecting at least a part of the first liquid, supplying the first liquid from the first supply port, and collecting the first liquid from the first recovery port, the exposure light between the emission surface and the substrate is recovered. Forming a first immersion space for the first liquid so that the optical path is filled with the first liquid; Exposing the substrate through the first liquid in the first immersion space, and from the second supply port facing the second gap between the first member and the second member to the second gap. Two liquids may be supplied.

  Further, the program recorded in the storage device 6 is opposed to the outer surface of the optical member arranged at least partially around the exit surface via the first gap in the control device 5 according to the above-described embodiment. A first member having a first inner surface and a first lower surface on which the substrate facing the emission surface can be opposed, and a second member disposed on the outer side of the first member with respect to the optical path and having a second lower surface on which an object can be opposed. From the first supply port arranged in one or both of the members, supply the first liquid, and from the first recovery port arranged in one or both of the first member and the second member, from the first supply port Exposure light between the exit surface and the substrate by recovering at least a part of the first liquid, supplying the first liquid from the first supply port, and recovering the first liquid from the first recovery port Forming the first immersion space of the first liquid so that the optical path of the first liquid is filled with the first liquid. And exposing the substrate through the first liquid in the first immersion space, and from the second recovery port facing the second gap between the first member and the second member, The first liquid may be recovered.

  Further, the program recorded in the storage device 6 is opposed to the outer surface of the optical member arranged at least partially around the exit surface via the first gap in the control device 5 according to the above-described embodiment. A first member having a first inner surface and a first lower surface on which the substrate facing the emission surface can be opposed, and a second member disposed on the outer side of the first member with respect to the optical path and having a second lower surface on which an object can be opposed. From the first supply port arranged in one or both of the members, supply the first liquid, and from the first recovery port arranged in one or both of the first member and the second member, from the first supply port Exposure light between the exit surface and the substrate by recovering at least a part of the first liquid, supplying the first liquid from the first supply port, and recovering the first liquid from the first recovery port Forming the first immersion space of the first liquid so that the optical path of the first liquid is filled with the first liquid. The method comprising, the method comprising: exposing a substrate through a first liquid in the first liquid immersion space, may be executed. In this case, one or both of the first inner surface and the second inner surface may have corner portions.

  When the program stored in the storage device 6 is read into the control device 5, various devices of the exposure apparatus EX such as the substrate stage 2 and the liquid immersion member 3 cooperate to form the liquid immersion space LS1. In this state, various processes such as immersion exposure of the substrate P are executed.

  In each of the above-described embodiments, the optical path K on the exit surface 7R side (image surface side) of the terminal optical element 7 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 7 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, U.S. Pat. No. 6,611,316 on the substrate via the projection optical system, and the substrate is subjected to one scanning exposure. An exposure apparatus that double-exposes one shot area almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In addition, the exposure apparatus EX includes a twin stage having a plurality of substrate stages as disclosed in, for example, US Pat. No. 6,341,007, US Pat. No. 6,208,407, and US Pat. No. 6,262,796. It may be a mold exposure apparatus. For example, when the exposure apparatus EX includes two substrate stages, an object that can be arranged to face the emission surface 7 is one substrate stage, a substrate held on the substrate holding portion of the one substrate stage, It includes at least one of the substrates held by the substrate holding part of the other substrate stage and the other substrate stage.

  The exposure apparatus EX includes a substrate stage and a measuring instrument (measurement) without holding the substrate as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application No. 1713113. An exposure apparatus including a measurement stage on which a member is mounted may be used. In that case, the object capable of forming an immersion space between the last optical element 7 and the immersion member includes at least one of a substrate stage and a measurement stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaping mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in US Pat. No. 6,778,257 ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 13, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Liquid immersion member, 5 ... Control apparatus, 6 ... Memory | storage device, 7 ... Terminal optical element, 7R ... Outlet surface, 7S ... Outer surface, 30 ... 1st member, 31 ... Supply port, 30A ... 1st inner surface, 30B ... 1st lower surface, 30C ... 1st outer surface, 60A ... 2nd inner surface, 60B ... 2nd lower surface,
60 ... second member, 61 ... supply port, 62 ... collection port, 66 ... collection port, 809 ... third member, AX ... optical axis, EL ... exposure light, EX ... exposure device, G1 ... first gap, G2 ... Second gap, IL ... illumination system, K ... optical path, K1-K6 ... corner, A1-A9 ... region, B1-B4 ... part, LQ ... liquid, LS1 ... immersion space, LS2 ... immersion space, P ... Substrate, SP1 ... space, SP2 ... space, SPa ... space, SPb ... space

Claims (42)

In the immersion exposure apparatus, an immersion member disposed on at least a part of the periphery of an optical member having an exit surface from which exposure light is emitted and an outer surface disposed around the exit surface,
At least a portion has a first inner surface that faces the outer surface through a first gap, and a first lower surface that can face an object that faces the ejection surface, and the first liquid is disposed on the ejection surface side. A first member forming one immersion space;
A second member disposed outside the first member with respect to the optical path and having a second lower surface to which the object can face;
A first supply port that is disposed on one or both of the first member and the second member and supplies the first liquid;
A first recovery port disposed on one or both of the first member and the second member and recovering at least a portion of the first liquid from the first supply port;
A liquid immersion member comprising: a second supply port that faces a second gap between the first member and the second member and supplies a second liquid to the second gap.   The liquid immersion member according to claim 1, wherein the second supply port is disposed in one or both of the first member and the second member.   The liquid immersion member according to claim 1, further comprising a second recovery port that faces the second gap and collects one or both of the first liquid and the second liquid in the second gap. In the immersion exposure apparatus, an immersion member disposed on at least a part of the periphery of an optical member having an exit surface from which exposure light is emitted and an outer surface disposed around the exit surface,
At least a portion has a first inner surface that faces the outer surface through a first gap, and a first lower surface that can face an object that faces the ejection surface, and the first liquid is disposed on the ejection surface side. A first member forming one immersion space;
A second member disposed outside the first member with respect to the optical path and having a second lower surface to which the object can face;
A first supply port that is disposed on one or both of the first member and the second member and supplies the first liquid;
A first recovery port disposed on one or both of the first member and the second member and recovering at least a portion of the first liquid from the first supply port;
A liquid immersion member, comprising: a second recovery port that faces a second gap between the first member and the second member and collects the first liquid in the second gap.   The liquid immersion member according to claim 3 or 4, wherein the second recovery port is disposed in one or both of the first member and the second member. The first gap has a first portion close to the object and a second portion above the first portion;
The liquid immersion member according to any one of claims 1 to 5, wherein a dimension of the second part is larger than a dimension of the first part. The first gap is formed between the outer surface of the optical member and the first inner surface of the first member;
The first inner surface is disposed so as to connect a first region close to the object, a second region disposed above the first region, and an upper end of the first region and a lower end of the second region. The liquid immersion member according to any one of claims 1 to 6, further comprising a third region facing a direction different from the first and second regions.   The liquid immersion member according to claim 7, wherein the third region is inclined upward toward the outside with respect to a radiation direction with respect to the optical path.   The liquid immersion member according to claim 7 or 8, wherein the first supply port is disposed in the first region. The second gap has a third portion close to the object and a fourth portion above the third portion;
11. The liquid immersion member according to claim 1, wherein a dimension of the fourth part is larger than a dimension of the third part. The second gap is formed between a first outer surface of the first member and a second inner surface of the second member;
The first outer surface is disposed so as to connect a fourth region close to the object, a fifth region disposed above the fourth region, and an upper end of the fourth region and a lower end of the fifth region. The liquid immersion member according to any one of claims 1 to 10, further comprising a sixth region facing a direction different from the fourth and fifth regions.   The liquid immersion member according to claim 11, further comprising a second recovery port that is disposed in one or both of the fifth region and the sixth region and recovers the first liquid in the second gap.   The liquid immersion member according to claim 11, further comprising a second supply port that is disposed in one or both of the fifth region and the sixth region and supplies the second liquid to the second gap.   The liquid immersion member according to any one of claims 11 to 13, wherein the sixth region is inclined upward inward with respect to a radiation direction with respect to the optical path. The second gap is formed between a first outer surface of the first member and a second inner surface of the second member;
The second inner surface is disposed so as to connect a seventh region close to the object, an eighth region disposed above the seventh region, and an upper end of the seventh region and a lower end of the eighth region. The liquid immersion member according to any one of claims 1 to 14, further comprising a ninth region facing a direction different from the seventh and eighth regions.   The liquid immersion member according to claim 15, further comprising a third recovery port that is disposed in one or both of the eighth region and the ninth region and recovers the first liquid in the second gap.   17. The liquid immersion member according to claim 15, further comprising a third supply port that is disposed in one or both of the eighth region and the ninth region and supplies the second liquid to the second gap.   The liquid immersion member according to any one of claims 15 to 17, wherein the ninth region is inclined upward toward the outside with respect to a radial direction with respect to the optical path. In the immersion exposure apparatus, an immersion member disposed on at least a part of the periphery of an optical member having an exit surface from which exposure light is emitted and an outer surface disposed around the exit surface,
At least a portion has a first inner surface that faces the outer surface through a first gap, and a first lower surface that can face an object that faces the ejection surface, and the first liquid is disposed on the ejection surface side. A first member forming one immersion space;
A second surface disposed outside the first member with respect to the optical path and having a second inner surface facing the first outer surface of the first member via a second gap and a second lower surface capable of facing the object. Members,
A first supply port that is disposed on one or both of the first member and the second member and supplies the first liquid;
A first recovery port disposed on one or both of the first member and the second member and recovering at least a portion of the first liquid from the first supply port;
One or both of the first inner surface and the second inner surface is a liquid immersion member having a corner portion.   The liquid immersion member according to any one of Claims 1 to 19, wherein a dimension between the second lower surface and the upper surface of the object is smaller than a dimension between the first lower surface and the upper surface of the object.   21. The liquid immersion member according to claim 1, further comprising a support device that movably supports the second member with respect to the first member.   The liquid immersion member according to any one of claims 1 to 21, further comprising a suppressing member that is disposed on an upper portion of the second gap and suppresses the outflow of liquid from the second gap.   The liquid immersion member according to claim 22, wherein at least a part of the surface of the suppressing member is liquid repellent with respect to the liquid in the second gap.   The liquid immersion member according to any one of claims 1 to 23, wherein the first supply port is disposed on the first member so as to face the optical path.   The liquid immersion member according to any one of claims 1 to 24, wherein the first supply port is disposed in the first member so that the object is opposed to the first supply port.   The liquid immersion member according to any one of claims 1 to 25, wherein the first recovery port is disposed in the second member so that the object is opposed to the first recovery port.   The liquid immersion member according to any one of claims 1 to 26, wherein the first recovery port includes a hole of a porous member arranged in an opening formed in the second member so as to face the object.   28. The liquid immersion member according to claim 27, wherein the second lower surface includes a lower surface of the porous member.   The liquid immersion member according to any one of claims 1 to 28, wherein at least a part of the first liquid immersion space is formed on the second lower surface side of the second member.   A third member that is disposed outside the second member with respect to the optical path, has a third lower surface on which the object can face, and at least a part of the second immersion space is formed on the third lower surface side. The liquid immersion member according to any one of claims 1 to 29. A fourth supply port that is disposed in the third member and supplies a liquid for forming the second immersion space;
The liquid immersion member according to claim 30, further comprising: a fourth recovery port that is disposed in the third member and recovers at least a part of the liquid from the third supply port.   32. The liquid immersion member according to claim 31, wherein the fourth recovery port recovers the liquid that has flowed out of the space facing the second lower surface of the second member together with the liquid in the second liquid immersion space. An immersion exposure apparatus that exposes a substrate with exposure light through a first liquid,
An immersion exposure apparatus comprising the immersion member according to any one of claims 1 to 32. Exposing the substrate using the immersion exposure apparatus of claim 33;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with the exposure light through a first liquid filled in an optical path of the exposure light between an exit surface of an optical member from which the exposure light is emitted and the substrate,
A first inner surface facing the outer surface of the optical member, at least a part of which is disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. A first member having a first supply port disposed on one or both of the first member and the second member disposed on the outside of the first member with respect to the optical path and having a second lower surface that can face the object; Supplying a first liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space;
An exposure method comprising: supplying a second liquid to the second gap from a second supply port facing a second gap between the first member and the second member. An exposure method for exposing the substrate with the exposure light through a first liquid filled in an optical path of the exposure light between an exit surface of an optical member from which the exposure light is emitted and the substrate,
At least a portion has a first inner surface facing the outer surface of the optical member disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. From the first supply port disposed on one or both of the first member and the second member that is disposed outside the first member with respect to the optical path and has a second lower surface on which the object can be opposed, Supplying one liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space;
An exposure method comprising: recovering the first liquid in the second gap from a second recovery port facing a second gap between the first member and the second member. An exposure method for exposing the substrate with the exposure light through a first liquid filled in an optical path of the exposure light between an exit surface of an optical member from which the exposure light is emitted and the substrate,
At least a portion has a first inner surface facing the outer surface of the optical member disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. From the first supply port disposed on one or both of the first member and the second member that is disposed outside the first member with respect to the optical path and has a second lower surface on which the object can be opposed, Supplying one liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space,
An exposure method in which one or both of the first inner surface and the second inner surface have corners. Exposing the substrate using the exposure method according to any one of claims 35 to 37;
Developing the exposed substrate. A device manufacturing method. Control of an immersion exposure apparatus that exposes the substrate with the exposure light via a first liquid filled in an optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing
A first inner surface facing the outer surface of the optical member, at least a part of which is disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. A first member having a first supply port disposed on one or both of the first member and the second member disposed on the outside of the first member with respect to the optical path and having a second lower surface that can face the object; Supplying a first liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space;
A program for executing supply of a second liquid to the second gap from a second supply port facing a second gap between the first member and the second member. Control of an immersion exposure apparatus that exposes the substrate with the exposure light via a first liquid filled in an optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing
At least a portion has a first inner surface facing the outer surface of the optical member disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. From the first supply port disposed on one or both of the first member and the second member that is disposed outside the first member with respect to the optical path and has a second lower surface on which the object can be opposed, Supplying one liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space;
A program for executing recovery of the first liquid in the second gap from a second recovery port facing a second gap between the first member and the second member. Control of an immersion exposure apparatus that exposes the substrate with the exposure light via a first liquid filled in an optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing
At least a portion has a first inner surface facing the outer surface of the optical member disposed around the emission surface via a first gap, and a first lower surface capable of facing the substrate facing the emission surface. From the first supply port disposed on one or both of the first member and the second member that is disposed outside the first member with respect to the optical path and has a second lower surface on which the object can be opposed, Supplying one liquid;
Recovering at least a portion of the first liquid from the first supply port from a first recovery port disposed in one or both of the first member and the second member;
By supplying the first liquid from the first supply port and collecting the first liquid from the first collection port, the optical path of the exposure light between the emission surface and the substrate is the first liquid. Forming a first immersion space for the first liquid to be filled with
Exposing the substrate through the first liquid in the first immersion space; and
One or both of the first inner surface and the second inner surface have a corner portion.   The computer-readable recording medium which recorded the program as described in any one of Claims 39-41.

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