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JP2012170828A - 基板洗浄装置 - Google Patents

基板洗浄装置 Download PDF

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Publication number
JP2012170828A
JP2012170828A JP2011031827A JP2011031827A JP2012170828A JP 2012170828 A JP2012170828 A JP 2012170828A JP 2011031827 A JP2011031827 A JP 2011031827A JP 2011031827 A JP2011031827 A JP 2011031827A JP 2012170828 A JP2012170828 A JP 2012170828A
Authority
JP
Japan
Prior art keywords
cleaning
substrate
cleaning liquid
liquid
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2011031827A
Other languages
English (en)
Japanese (ja)
Inventor
Kazuo Jodai
和男 上代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP2011031827A priority Critical patent/JP2012170828A/ja
Priority to KR1020110094675A priority patent/KR20120094823A/ko
Priority to TW100133707A priority patent/TWI452622B/zh
Publication of JP2012170828A publication Critical patent/JP2012170828A/ja
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Liquid Crystal (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2011031827A 2011-02-17 2011-02-17 基板洗浄装置 Withdrawn JP2012170828A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011031827A JP2012170828A (ja) 2011-02-17 2011-02-17 基板洗浄装置
KR1020110094675A KR20120094823A (ko) 2011-02-17 2011-09-20 기판 세정 장치
TW100133707A TWI452622B (zh) 2011-02-17 2011-09-20 Substrate cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011031827A JP2012170828A (ja) 2011-02-17 2011-02-17 基板洗浄装置

Publications (1)

Publication Number Publication Date
JP2012170828A true JP2012170828A (ja) 2012-09-10

Family

ID=46885600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011031827A Withdrawn JP2012170828A (ja) 2011-02-17 2011-02-17 基板洗浄装置

Country Status (3)

Country Link
JP (1) JP2012170828A (zh)
KR (1) KR20120094823A (zh)
TW (1) TWI452622B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111463152A (zh) * 2020-04-17 2020-07-28 重庆芯洁科技有限公司 半导体衬底的高压水洗设备及其使用方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009147260A (ja) * 2007-12-18 2009-07-02 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2009248069A (ja) * 2008-04-11 2009-10-29 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111463152A (zh) * 2020-04-17 2020-07-28 重庆芯洁科技有限公司 半导体衬底的高压水洗设备及其使用方法
CN111463152B (zh) * 2020-04-17 2023-03-14 重庆芯洁科技有限公司 半导体衬底的高压水洗设备及其使用方法

Also Published As

Publication number Publication date
TW201236075A (en) 2012-09-01
TWI452622B (zh) 2014-09-11
KR20120094823A (ko) 2012-08-27

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Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20140513