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JP2012069645A - Semiconductor light-emitting device and manufacturing method therefor - Google Patents

Semiconductor light-emitting device and manufacturing method therefor Download PDF

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JP2012069645A
JP2012069645A JP2010211971A JP2010211971A JP2012069645A JP 2012069645 A JP2012069645 A JP 2012069645A JP 2010211971 A JP2010211971 A JP 2010211971A JP 2010211971 A JP2010211971 A JP 2010211971A JP 2012069645 A JP2012069645 A JP 2012069645A
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semiconductor light
light emitting
emitting device
white member
manufacturing
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Atsushi Shiraishi
篤 白石
Yoshimasa Kinoshita
嘉将 木下
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Citizen Holdings Co Ltd
Citizen Electronics Co Ltd
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Citizen Holdings Co Ltd
Citizen Electronics Co Ltd
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Abstract

【課題】LED素子の側面を白色部材で埋めていても、製造が容易で発光効率の優れたLED装置を提供する。
【解決手段】回路基板22にLED素子21をフリップチップ実装する。LED素子21は側面を白色部材11で取り囲まれている。白色部材11は反射性微粒子とシリコーン樹脂からなるバインダを含有している。このときLED素子21の上面と白色部材11の上面とが略一致し、LED素子21及び白色部材11の上面に蛍光体層15がある。
【選択図】図1
Provided is an LED device that is easy to manufacture and has excellent luminous efficiency even if the side surface of the LED element is filled with a white member.
An LED element is flip-chip mounted on a circuit board. The LED element 21 is surrounded by a white member 11 on the side surface. The white member 11 contains a binder made of reflective fine particles and silicone resin. At this time, the upper surface of the LED element 21 and the upper surface of the white member 11 substantially coincide with each other, and the phosphor layer 15 is present on the upper surfaces of the LED element 21 and the white member 11.
[Selection] Figure 1

Description

本発明は、回路基板上に半導体発光素子をフリップチップ実装した半導体発光装置及びその製造方法に関する。   The present invention relates to a semiconductor light-emitting device in which a semiconductor light-emitting element is flip-chip mounted on a circuit board and a manufacturing method thereof.

半導体発光素子(以後とくに断らない限りLED素子と呼ぶ)を回路基板に実装した半導体発光装置(以後とくに断らない限りLED装置と呼ぶ)のなかで、LED素子の側面に反射部材を設けたLED装置が知られている(例えば特許文献1)。   2. Description of the Related Art Among semiconductor light emitting devices (hereinafter referred to as LED devices unless otherwise specified) in which a semiconductor light emitting element (hereinafter referred to as an LED device) is mounted on a circuit board, an LED device provided with a reflective member on the side surface of the LED element Is known (for example, Patent Document 1).

特許文献1の図1を図4に示す。図4は、反射剤入りの第1封止樹脂6がLEDチップ4(LED素子)の周囲を埋めるようにしたLED装置の断面図である。LEDチップ4は、セラミック材により作られたリフレクトケース1の中央に配置され、リフレクトケース1は四角錘状の開口2を備えている。LEDチップ4はリードフレーム3aにダイボンディングされ、LEDチップ4の上面電極はリードフレーム3bとボンディングワイヤ5により接続している。   FIG. 4 of Patent Document 1 is shown in FIG. FIG. 4 is a cross-sectional view of the LED device in which the first sealing resin 6 containing the reflective agent fills the periphery of the LED chip 4 (LED element). The LED chip 4 is disposed in the center of a reflector case 1 made of a ceramic material, and the reflector case 1 includes a square pyramid-shaped opening 2. The LED chip 4 is die-bonded to the lead frame 3 a, and the upper surface electrode of the LED chip 4 is connected to the lead frame 3 b by a bonding wire 5.

このLEDチップ4は、エピタキシャル発光層から青色光が発光し、ZnSe基板から黄色光が発光する。この黄色光と青色光のうち側方に向う光は第1封止樹脂6の反射材で反射しLEDチップ4内へ戻される。下方に向う光はLEDチップ4の底面に形成された反射層(図示せず)で反射される。このようにして最終的に青色光及び黄色光の全てがLEDチップ4の上面から出射する。この結果、二色混合が効果的に行われ高輝度の白色光が得られる。   The LED chip 4 emits blue light from the epitaxial light emitting layer and emits yellow light from the ZnSe substrate. Of the yellow light and blue light, the light directed to the side is reflected by the reflective material of the first sealing resin 6 and returned to the LED chip 4. The downward light is reflected by a reflective layer (not shown) formed on the bottom surface of the LED chip 4. In this way, all of blue light and yellow light are finally emitted from the upper surface of the LED chip 4. As a result, two-color mixing is effectively performed, and high brightness white light is obtained.

特開2002−43625号公報 (図1)JP 2002-43625 A (FIG. 1)

特許文献1のLED装置は、LEDチップ4の上面と封止樹脂6の上面が一致している。上面同士を一致させる手法について特許文献1に記載はないが、ボンディングワイヤ5を損傷しないように封止樹脂6を配置させるには、ふつうディスペンサで正確な量の封止樹脂6を滴下するものと推定される。しかしながら精度の高い塗布は煩瑣であるばかりでなく、リフレクトケース1のようにLEDチップ4を囲む部材を必要とするので一般的でない。またこのLED装置はボンディングワイヤ5があるため発光効率を落としている。さらに近年の主流となっている青色(又は近紫外)発光ダイオードと蛍光体を備えるLED装置でもない。   In the LED device of Patent Document 1, the upper surface of the LED chip 4 and the upper surface of the sealing resin 6 coincide. Although there is no description in Patent Document 1 regarding a method for matching the upper surfaces, in order to dispose the sealing resin 6 so as not to damage the bonding wire 5, an accurate amount of the sealing resin 6 is usually dropped with a dispenser. Presumed. However, high-precision coating is not only troublesome, but is not common because it requires a member surrounding the LED chip 4 as in the case 1. In addition, this LED device has a low luminous efficiency due to the bonding wire 5. Furthermore, it is not an LED device including a blue (or near-ultraviolet) light emitting diode and a phosphor that have become mainstream in recent years.

そこで本発明は、これらの課題を解決するため、LED素子の側面を白色樹脂又は白色インクで埋めていても、製造が容易で発光効率の優れたLED装置及びその製造方法を提供することを目的とする。   Therefore, in order to solve these problems, the present invention aims to provide an LED device that is easy to manufacture and has excellent luminous efficiency even when the side surface of the LED element is filled with white resin or white ink, and a method for manufacturing the LED device. And

上記課題を解決するため本発明の半導体発光装置は、回路基板上に半導体発光素子を実装した半導体発光装置において、
前記半導体発光素子は前記回路基板上にフリップチップ実装され、
前記半導体発光素子の側面を取り囲む白色部材を備え、
該白色部材は反射性微粒子とバインダを含有し、
前記半導体発光素子の上面と前記白色部材の上面とが略一致したことを特徴とする。
In order to solve the above problems, a semiconductor light emitting device of the present invention is a semiconductor light emitting device in which a semiconductor light emitting element is mounted on a circuit board.
The semiconductor light emitting element is flip-chip mounted on the circuit board,
A white member surrounding a side surface of the semiconductor light emitting element;
The white member contains reflective fine particles and a binder,
The upper surface of the semiconductor light emitting element and the upper surface of the white member are substantially coincident with each other.

前記半導体発光素子及び前記白色部材の上面に蛍光体層を備えても良い。   A phosphor layer may be provided on the top surface of the semiconductor light emitting element and the white member.

前記白色部材の前記バインダが焼結するとガラス質となる無機バインダであっても良い。   An inorganic binder that becomes vitreous when the binder of the white member is sintered may be used.

前記白色部材のバインダがシリコーン樹脂であっても良い。   The binder of the white member may be a silicone resin.

前記半導体発光素子と前記回路基板の間隙に前記白色部材が充填されているのが好ましい。   It is preferable that the white member is filled in a gap between the semiconductor light emitting element and the circuit board.

上記課題を解決するため本発明の半導体発光装置の製造方法は、回路基板上に半導体発光素子を実装した半導体発光装置の製造方法において、
前記回路基板が連結した集合基板を準備する準備工程と、
該集合基板に前記半導体発光素子をフリップチップ実装する実装工程と、
前記集合基板の全面に反射性微粒子を含有する白色部材を塗布する塗布工程と、
該白色部材を研磨する研磨工程と、
前記半導体発光装置を単個に分離する個片化工程と
を備えることを特徴とする。
In order to solve the above problems, a method for manufacturing a semiconductor light emitting device of the present invention is a method for manufacturing a semiconductor light emitting device in which a semiconductor light emitting element is mounted on a circuit board.
A preparation step of preparing a collective substrate connected to the circuit board;
A mounting step of flip-chip mounting the semiconductor light emitting element on the collective substrate;
An application step of applying a white member containing reflective fine particles to the entire surface of the aggregate substrate;
A polishing step of polishing the white member;
And a singulation process for separating the semiconductor light emitting device into a single piece.

前記研磨工程の後に蛍光体を含有した蛍光樹脂を塗布する蛍光樹脂塗布工程を備えていても良い。   A fluorescent resin application step of applying a fluorescent resin containing a phosphor after the polishing step may be provided.

前記蛍光樹脂塗布工程の後に前記蛍光樹脂を研磨する蛍光樹脂研磨工程を備えても良い。   A fluorescent resin polishing step for polishing the fluorescent resin may be provided after the fluorescent resin coating step.

前記個片化工程の前に透明樹脂を塗布する透明樹脂塗布工程を備えても良い。   You may provide the transparent resin application | coating process which apply | coats transparent resin before the said singulation process.

前記白色部材のバインダが焼結するとガラス質となる無機バインダであっても良い。   An inorganic binder that becomes glassy when the binder of the white member is sintered may be used.

前記白色部材のバインダがシリコーン樹脂であっても良い。   The binder of the white member may be a silicone resin.

本発明の半導体発光層装置は、反射性微粒子を含有した白色部材で回路基板上にフリップチップ実装した半導体発光素子の周囲を埋め、半導体発光素子と白色部材の上面同士を略一致させている。フリップチップ実装した半導体発光素子は上側(出射側)が透明基板、下側(実装側)が半導体層となる。この結果、接続用のボンディングワイヤが不要となるばかりでなく、白色部材を簡易な塗布法で配置しても研磨によって白色部材の上面と透明基板の上面とを簡単に一致させることができる。さらにボンディングワイヤによる光の損失もなくなっている。以上のように本発明の半導体発光装置は、半導体発光素子の側面を白色部材で埋めていても製造が容易で発光効率が良い。   In the semiconductor light emitting layer device of the present invention, the periphery of the semiconductor light emitting element flip-chip mounted on the circuit board is filled with the white member containing the reflective fine particles, and the upper surfaces of the semiconductor light emitting element and the white member are substantially matched. In the flip-chip mounted semiconductor light emitting device, the upper side (outgoing side) is a transparent substrate and the lower side (mounting side) is a semiconductor layer. As a result, not only is the bonding wire for connection unnecessary, but even if the white member is arranged by a simple coating method, the upper surface of the white member and the upper surface of the transparent substrate can be easily matched by polishing. Furthermore, there is no loss of light due to the bonding wire. As described above, the semiconductor light emitting device of the present invention is easy to manufacture and has high luminous efficiency even when the side surface of the semiconductor light emitting element is filled with the white member.

本発明の半導体発装置の製造方法は、回路基板が連結した集合基板に半導体発光素子をフリップチップ実装し、集合基板の全面に反射性微粒子を含有する白色部材を塗布してから、白色部材の上面を研磨し半導体発光素子の上面を露出させている。以上のように本発明の半導体発光装置は、半導体発光素子の側面を白色部材で埋める際に集合基板に対し塗布及び研磨を行うため製造が容易であり、前述のようにボンディングワイヤがないので発光効率を損なうことがない。   In the method for manufacturing a semiconductor light emitting device of the present invention, a semiconductor light emitting element is flip-chip mounted on a collective substrate to which circuit boards are connected, and a white member containing reflective fine particles is applied to the entire surface of the collective substrate. The upper surface is polished to expose the upper surface of the semiconductor light emitting device. As described above, the semiconductor light-emitting device of the present invention is easy to manufacture because it coats and polishes the collective substrate when the side surface of the semiconductor light-emitting element is filled with a white member. There is no loss of efficiency.

本発明の実施形態におけるLED装置の断面図。Sectional drawing of the LED apparatus in embodiment of this invention. 図1の部分拡大図。The elements on larger scale of FIG. 図1に示したLED装置の製造方法の説明図。Explanatory drawing of the manufacturing method of the LED apparatus shown in FIG. 従来のLED装置の断面図。Sectional drawing of the conventional LED device.

以下、添付図1〜3を参照しながら本発明の好適な実施形態について詳細に説明する。なお図面の説明において、同一または相当要素には同一の符号を付し、重複する説明は省略する。また説明のため部材の縮尺は適宜変更している。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to FIGS. In the description of the drawings, the same or equivalent elements will be denoted by the same reference numerals, and redundant description will be omitted. For the sake of explanation, the scale of the members is changed as appropriate.

図1は本実施形態のLED装置(半導体発光装置)の断面図である。LED装置10(半導体発光装置)は、回路基板22上にLED素子21(半導体発光素子)をフリップチップ実装している。回路基板22において板材20上面に形成された電極17はスルーホール18を介して板材20の下面に形成された電極19と接続している。LED素子21ではサファイア基板12の下面に半導体層13が形成され、半導体層13に2個のバンプ14が付着している。半導体層13は発光層を備えたダイオードであり、それぞれのバンプ14はアノードとカソードに相当する。バンプ14は金属共晶接合により電極17と接続している。   FIG. 1 is a cross-sectional view of the LED device (semiconductor light emitting device) of this embodiment. In the LED device 10 (semiconductor light emitting device), an LED element 21 (semiconductor light emitting element) is flip-chip mounted on a circuit board 22. The electrode 17 formed on the upper surface of the plate material 20 in the circuit board 22 is connected to the electrode 19 formed on the lower surface of the plate material 20 through the through hole 18. In the LED element 21, a semiconductor layer 13 is formed on the lower surface of the sapphire substrate 12, and two bumps 14 are attached to the semiconductor layer 13. The semiconductor layer 13 is a diode provided with a light emitting layer, and each bump 14 corresponds to an anode and a cathode. The bumps 14 are connected to the electrodes 17 by metal eutectic bonding.

酸化チタン(反射性微粒子)をシリコーン樹脂(バインダ)に混練し加熱硬化させた白色シリコーン樹脂11(白色部材)がLED素子21の側面を取り囲んでいる。またLED素子21と回路基板22の間隙にも白色シリコーン樹脂11が充填されている。LED素子21の上面と白色シリコーン樹脂11の上面とは一致している。LED素子21及び白色シリコーン樹脂11の上面に蛍光体層15がある。蛍光体層15には透明樹脂層16が積層している。   A white silicone resin 11 (white member) obtained by kneading titanium oxide (reflective fine particles) with a silicone resin (binder) and heat-curing surrounds the side surface of the LED element 21. The white silicone resin 11 is also filled in the gap between the LED element 21 and the circuit board 22. The upper surface of the LED element 21 and the upper surface of the white silicone resin 11 coincide. There is a phosphor layer 15 on the upper surface of the LED element 21 and the white silicone resin 11. A transparent resin layer 16 is laminated on the phosphor layer 15.

板材20は、厚さが数百μmで、熱伝導性を考慮して樹脂、セラミック、金属から選ぶ。電極17,19は、例えば20μm程度の銅箔上にニッケル層と金層を積層したものである。板材20が樹脂の場合、スルーホール18は熱伝導性をよくするため内部を金属ペーストで埋めておくと良い。サファイア基板12は厚さが80〜120μm、半導体層13は厚さが7μm程度であり、バンプ14は電解メッキ法で形成すれば厚さが10〜30μm程度になる。LED素子21から下方向に出射した光を効率良く上方に向けるには、LED素子21と回路基板22の間に充填された白色シリコーン樹脂11は厚さが30μm以上あることが好ましい。蛍光体層15は厚さが100μm程度、透明樹脂層16は厚さが数十μmである。   The plate member 20 has a thickness of several hundred μm and is selected from resin, ceramic, and metal in consideration of thermal conductivity. The electrodes 17 and 19 are formed by laminating a nickel layer and a gold layer on a copper foil of about 20 μm, for example. When the plate material 20 is resin, the through hole 18 is preferably filled with a metal paste to improve thermal conductivity. The sapphire substrate 12 has a thickness of 80 to 120 μm, the semiconductor layer 13 has a thickness of about 7 μm, and the bump 14 has a thickness of about 10 to 30 μm if formed by electrolytic plating. In order to efficiently direct light emitted downward from the LED element 21 upward, the white silicone resin 11 filled between the LED element 21 and the circuit board 22 preferably has a thickness of 30 μm or more. The phosphor layer 15 has a thickness of about 100 μm, and the transparent resin layer 16 has a thickness of several tens of μm.

図2によりLED装置10から出射する光の様子を説明する。図2は図1のAで囲んだ領域の拡大図に、半導体層13から出射した青色の光線L1,L2を書き加えたものである。半導体層13から出射する青色光のうち光線L1は、サファイア基板12、蛍光体層15及び透明樹脂層16を通りLED装置10から出射する。光線L2はサファイア基板12の側面を抜け白色シリコーン樹脂11に侵入し、ここで反射性微粒子により反射し再びサファイア基板12に戻り、蛍光体層15と透明樹脂層16を通りLED装置10から出射する。下に向った光線(図示せず)は、下方の白色シリコーン樹脂11、バンプ14、又はフリップチップ実装用LED素子21の反射層(図示せず、フリップチップ実装用LED素子は反射層を備えることが多い)で反射し上に向う。以上のようにLED素子21の半導体層13から出射した光線L1,L2等は、吸収などの損失を除きサファイア基板の上面を通ってLED装置10から出射する。蛍光体層15では青色光の一部が蛍光体により波長変換され、この波長変換された光と青色光の加色混合により白色化する。なお
蛍光体層15の発光は等方的であるが下に向った光線は前述の青色光と同様にして上に向う。
The state of light emitted from the LED device 10 will be described with reference to FIG. FIG. 2 is obtained by adding blue light beams L1 and L2 emitted from the semiconductor layer 13 to the enlarged view of the region surrounded by A in FIG. Of the blue light emitted from the semiconductor layer 13, the light ray L <b> 1 is emitted from the LED device 10 through the sapphire substrate 12, the phosphor layer 15, and the transparent resin layer 16. The light beam L2 passes through the side surface of the sapphire substrate 12 and enters the white silicone resin 11, where it is reflected by the reflective fine particles, returns to the sapphire substrate 12 again, passes through the phosphor layer 15 and the transparent resin layer 16, and is emitted from the LED device 10. . A downward light beam (not shown) is reflected on the lower white silicone resin 11, the bump 14, or the LED chip 21 for flip chip mounting (not shown, the LED chip for flip chip mounting includes a reflecting layer). ) And reflect upwards. As described above, the light beams L1, L2 and the like emitted from the semiconductor layer 13 of the LED element 21 are emitted from the LED device 10 through the upper surface of the sapphire substrate except for losses such as absorption. In the phosphor layer 15, part of the blue light is wavelength-converted by the phosphor, and whitened by additive mixing of the wavelength-converted light and the blue light. The light emitted from the phosphor layer 15 is isotropic, but the downward light beam is directed upward in the same manner as the blue light described above.

図3により本実施形態のLED装置10の製造方法を説明する。図3はLED装置10の製造方法の説明図である。(a)は回路基板22(番号は図示せず)が連結した集合基板23を準備する準備工程である。集合基板23は大判の板材20に多数の回路基板領域を備え、各回路基板領域には電極17、スルーホール18(図示せず)と、電極19(図示せず)が形成されている。   A method of manufacturing the LED device 10 of this embodiment will be described with reference to FIG. FIG. 3 is an explanatory diagram of a method for manufacturing the LED device 10. (A) is a preparatory process for preparing a collective board 23 connected with a circuit board 22 (numbers not shown). The collective substrate 23 is provided with a large number of circuit board regions on a large plate member 20, and an electrode 17, a through hole 18 (not shown), and an electrode 19 (not shown) are formed in each circuit board region.

(b)は集合基板23にLED素子21をフリップチップ実装する実装工程である。一個ずつLED素子21を集合基板23上に配置してもよいし、予め回路基板23の電極ピッチにあわせて粘着シート上にLED素子21を配列させ、この粘着シートを集合基板23に重ね、多数のLED素子21を一括して集合基板23に配置しても良い。LED21の配置が完了したらLED素子21を加圧及び加熱し電極17に接合する。   (B) is a mounting process in which the LED elements 21 are flip-chip mounted on the collective substrate 23. The LED elements 21 may be arranged one by one on the collective substrate 23, or the LED elements 21 are arranged on the adhesive sheet in advance according to the electrode pitch of the circuit board 23, and this adhesive sheet is stacked on the collective substrate 23. The LED elements 21 may be collectively arranged on the collective substrate 23. When the arrangement of the LED 21 is completed, the LED element 21 is pressurized and heated to be joined to the electrode 17.

(c)は集合基板23の全面に反射性微粒子を含有する白色シリコーン樹脂11を塗布する塗布工程である。白色シリコーン樹脂11はLED素子21を覆って良いので、スキージを使って集合基板23に白色シリコーン樹脂11を配置しても良い。最後に白色シリコーン樹脂を150℃程度に加熱し硬化させる。   (C) is an application process in which the white silicone resin 11 containing reflective fine particles is applied to the entire surface of the collective substrate 23. Since the white silicone resin 11 may cover the LED element 21, the white silicone resin 11 may be disposed on the collective substrate 23 using a squeegee. Finally, the white silicone resin is heated to about 150 ° C. and cured.

(d)は白色シリコーン樹脂11を研磨する研磨工程である。白色シリコーン樹脂11がLED素子21の上面に一致するまで研磨する。このときLED素子21の上面を多少研磨しても良い。   (D) is a polishing step for polishing the white silicone resin 11. Polishing is performed until the white silicone resin 11 coincides with the upper surface of the LED element 21. At this time, the upper surface of the LED element 21 may be slightly polished.

(e)は蛍光体を含有した蛍光樹脂を塗布し蛍光体層15を形成する蛍光樹脂塗布工程である。蛍光体はYAG等の黄色蛍光体、又は珪酸塩系の緑色蛍光体と窒化物系の赤色蛍光体を組み合わせたものであり、バインダはシリコーンで良い。蛍光樹脂は塗布後、150℃程度で硬化させる。   (E) is a fluorescent resin coating process in which a fluorescent resin containing a phosphor is applied to form the phosphor layer 15. The phosphor is a yellow phosphor such as YAG, or a combination of a silicate green phosphor and a nitride red phosphor, and the binder may be silicone. The fluorescent resin is cured at about 150 ° C. after application.

(f)は蛍光体層15を研磨する蛍光樹脂研磨工程である。LED装置10の発光色(白色の色座標)は蛍光体の量に大きく影響されるので蛍光体層15の研磨で厚さを調整する。また蛍光体として珪酸塩系の緑色蛍光体と窒化物系の赤色蛍光体を組み合わせた場合、LED素子21のピーク波長の影響にも配慮する必要がある。   (F) is a fluorescent resin polishing step for polishing the phosphor layer 15. Since the emission color (white color coordinate) of the LED device 10 is greatly influenced by the amount of the phosphor, the thickness is adjusted by polishing the phosphor layer 15. Further, when a silicate green phosphor and a nitride red phosphor are combined as the phosphor, it is necessary to consider the influence of the peak wavelength of the LED element 21.

(g)は透明樹脂を塗布し透明樹脂層16を形成する透明樹脂塗布工程である。透明樹脂層16は蛍光体層15の機械的保護とともにガスバリヤとしも機能する。透明樹脂はシリコーンで良く、塗布後硬化させる。   (G) is a transparent resin coating process in which a transparent resin is applied to form the transparent resin layer 16. The transparent resin layer 16 functions as a gas barrier as well as mechanical protection of the phosphor layer 15. The transparent resin may be silicone and is cured after application.

(h)は集合基板20からLED装置10を単個に分離する個片化工程である。透明樹脂層16まで形成された集合基板23をダイシング装置により切断しLED装置10を個片化する。   (H) is a singulation process for separating the LED device 10 into a single piece from the collective substrate 20. The collective substrate 23 formed up to the transparent resin layer 16 is cut by a dicing device to divide the LED device 10 into individual pieces.

本実施形態では、白色リコーン樹脂11の塗布工程(c)の後に白色シリコーン樹脂11の研磨工程(d)を備えていた。研磨工程(d)は、高精度のディスペンサで塗布量を制御し、白色シリコーン樹脂11の上面とLED素子21の上面を略一致させれば省くことができる。同様に本実施形態では蛍光樹脂塗布工程(e)後の蛍光樹脂研磨工程(f)も精度の高いディスペンサを使えば省略できる。しかしながら本実施形態のように集合基板によるLED装置の製造方法は、多数のLED素子を一括加工できるので研磨工程は大きな負荷とはならない。透明樹脂層16及び透明樹脂塗布工程(g)も、蛍光体層15の強度が充分で蛍光体の耐環境性(特に水分)が高い場合は省略できる。   In this embodiment, the white silicone resin 11 polishing step (d) is provided after the white corn resin 11 coating step (c). The polishing step (d) can be omitted if the application amount is controlled with a high-precision dispenser and the upper surface of the white silicone resin 11 and the upper surface of the LED element 21 are substantially matched. Similarly, in this embodiment, the fluorescent resin polishing step (f) after the fluorescent resin coating step (e) can be omitted if a highly accurate dispenser is used. However, in the manufacturing method of the LED device using the collective substrate as in this embodiment, a large number of LED elements can be processed at once, so that the polishing process does not become a heavy load. The transparent resin layer 16 and the transparent resin coating step (g) can also be omitted when the strength of the phosphor layer 15 is sufficient and the environment resistance (particularly moisture) of the phosphor is high.

本実施形態では白色部材としてバインダをシリコーン樹脂としていた。白色部材としてはオルガノポリシロキサンのように焼結するとガラス質となる無機バインダと反射性微粒子とを混練し固化した白色セラミックインクでも良い。この白色セラミックインクは触媒により150℃程度で硬化する。また白色セラミックインクはバインダが無機質であるため光劣化が少ないという特徴もある。   In this embodiment, the binder is a silicone resin as the white member. The white member may be a white ceramic ink obtained by kneading and solidifying an inorganic binder that becomes glassy when sintered, such as organopolysiloxane, and reflective fine particles. This white ceramic ink is cured at about 150 ° C. by a catalyst. The white ceramic ink is also characterized by little light degradation because the binder is inorganic.

本実施形態ではLED素子21は青色光を発光していたが、LED素子21は近紫外光を発光しても良い。この場合、蛍光体層15には青色蛍光体、緑色蛍光体及び赤色蛍光体を混錬しておく。このとき可視光は演色性が向上するばかりでなく、発光部位がLED素子21の上面だけになるので方位角による色ムラが低減する。また白色が不要な場合は蛍光体層15はなくても良い。   In the present embodiment, the LED element 21 emits blue light, but the LED element 21 may emit near ultraviolet light. In this case, the phosphor layer 15 is kneaded with a blue phosphor, a green phosphor and a red phosphor. At this time, not only the color rendering property of visible light is improved, but also the color emission due to the azimuth angle is reduced because the light emitting portion is only the upper surface of the LED element 21. Further, when white is not required, the phosphor layer 15 may be omitted.

10…LED装置(半導体発光装置)、
11…白色シリコーン樹脂(白色部材)、
12…サファイア基板、
13…半導体層、
14…バンプ、
15…蛍光体層、
16…透明樹脂層、
17,19…電極、
18…スルーホール、
20…板材、
21…LED素子(半導体発光素子)、
22…回路基板、
23…集合基板、
L1,L2…光線。
10 ... LED device (semiconductor light-emitting device),
11 ... White silicone resin (white member),
12 ... sapphire substrate,
13 ... semiconductor layer,
14 ... Bump,
15 ... phosphor layer,
16 ... Transparent resin layer,
17, 19 ... electrodes,
18 ... Through hole,
20 ... plate material,
21 ... LED element (semiconductor light emitting element),
22 ... circuit board,
23 ... Collective board,
L1, L2 ... rays.

Claims (11)

回路基板上に半導体発光素子を実装した半導体発光装置において、
前記半導体発光素子は前記回路基板上にフリップチップ実装され、
前記半導体発光素子の側面を取り囲む白色部材を備え、
該白色部材は反射性微粒子とバインダを含有し、
前記半導体発光素子の上面と前記白色部材の上面とが略一致したことを特徴とする半導体発光装置。
In a semiconductor light emitting device in which a semiconductor light emitting element is mounted on a circuit board,
The semiconductor light emitting element is flip-chip mounted on the circuit board,
A white member surrounding a side surface of the semiconductor light emitting element;
The white member contains reflective fine particles and a binder,
A semiconductor light-emitting device, wherein an upper surface of the semiconductor light-emitting element and an upper surface of the white member substantially coincide with each other.
前記半導体発光素子及び前記白色部材の上面に蛍光体層を備えることを特徴とする請求項1に記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, further comprising a phosphor layer on top surfaces of the semiconductor light emitting element and the white member. 前記白色部材の前記バインダが焼結するとガラス質となる無機バインダであることを特徴とする請求項1又は2に記載の半導体発光装置。   The semiconductor light-emitting device according to claim 1, wherein the white light-emitting member is an inorganic binder that becomes glassy when sintered. 前記白色部材のバインダがシリコーン樹脂であることを特徴とする請求項1又は2に記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the binder of the white member is a silicone resin. 前記半導体発光素子と前記回路基板の間隙に前記白色部材が充填されていることを特徴とする請求項1から4のいずれか一項に記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the white member is filled in a gap between the semiconductor light emitting element and the circuit board. 上記課題を解決するため本発明の半導体発光装置の製造方法は、回路基板上に半導体発光素子を実装した半導体発光装置の製造方法において、
前記回路基板が連結した集合基板を準備する準備工程と、
該集合基板に前記半導体発光素子をフリップチップ実装する実装工程と、
前記集合基板の全面に反射性微粒子を含有する白色部材を塗布する塗布工程と、
該白色部材を研磨する研磨工程と、
前記半導体発光装置を単個に分離する個片化工程と
を備えることを特徴とする半導体発光装置の製造方法。
In order to solve the above problems, a method for manufacturing a semiconductor light emitting device of the present invention is a method for manufacturing a semiconductor light emitting device in which a semiconductor light emitting element is mounted on a circuit board.
A preparation step of preparing a collective substrate connected to the circuit board;
A mounting step of flip-chip mounting the semiconductor light emitting element on the collective substrate;
An application step of applying a white member containing reflective fine particles to the entire surface of the aggregate substrate;
A polishing step of polishing the white member;
A method for manufacturing a semiconductor light emitting device, comprising: a step of separating the semiconductor light emitting device into a single piece.
前記研磨工程の後に蛍光体を含有した蛍光樹脂を塗布する蛍光樹脂塗布工程を備えることを特徴とする請求項6に記載の半導体発光装置の製造方法。   The method for manufacturing a semiconductor light emitting device according to claim 6, further comprising a fluorescent resin application step of applying a fluorescent resin containing a phosphor after the polishing step. 前記蛍光樹脂塗布工程の後に前記蛍光樹脂を研磨する蛍光樹脂研磨工程を備えることを特徴とする請求項7に記載の半導体発光装置の製造方法。   The method for manufacturing a semiconductor light emitting device according to claim 7, further comprising a fluorescent resin polishing step of polishing the fluorescent resin after the fluorescent resin application step. 前記個片化工程の前に透明樹脂を塗布する透明樹脂塗布工程を備えることを特徴とする請求項6から8のいずれか一項に記載の半導体発光装置の製造方法。   The method for manufacturing a semiconductor light-emitting device according to claim 6, further comprising a transparent resin application step of applying a transparent resin before the individualization step. 前記白色部材のバインダが焼結するとガラス質となる無機バインダであることを特徴とする請求項6から9いずれか一項に記載の半導体発光装置の製造方法。   10. The method for manufacturing a semiconductor light emitting device according to claim 6, wherein the binder of the white member is an inorganic binder that becomes vitreous when sintered. 10. 前記白色部材のバインダがシリコーン樹脂であることを特徴とする請求項6から9いずれか一項に記載の半導体発光装置の製造方法。
The method for manufacturing a semiconductor light-emitting device according to claim 6, wherein the binder of the white member is a silicone resin.
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