JP2011195535A - 芳香族化合物製造方法 - Google Patents
芳香族化合物製造方法 Download PDFInfo
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- JP2011195535A JP2011195535A JP2010066077A JP2010066077A JP2011195535A JP 2011195535 A JP2011195535 A JP 2011195535A JP 2010066077 A JP2010066077 A JP 2010066077A JP 2010066077 A JP2010066077 A JP 2010066077A JP 2011195535 A JP2011195535 A JP 2011195535A
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- Prior art keywords
- catalyst
- reaction
- aromatic compound
- methane
- gas
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- 238000004519 manufacturing process Methods 0.000 title claims description 85
- 150000001491 aromatic compounds Chemical class 0.000 title claims description 75
- 239000003054 catalyst Substances 0.000 claims abstract description 194
- 238000006243 chemical reaction Methods 0.000 claims abstract description 132
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims abstract description 62
- 229910002091 carbon monoxide Inorganic materials 0.000 claims abstract description 57
- 238000006555 catalytic reaction Methods 0.000 claims abstract description 53
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 42
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- 238000011069 regeneration method Methods 0.000 claims abstract description 31
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- 239000001257 hydrogen Substances 0.000 claims abstract description 19
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims description 34
- 239000012495 reaction gas Substances 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 12
- 230000003197 catalytic effect Effects 0.000 abstract description 25
- 150000002431 hydrogen Chemical class 0.000 abstract description 4
- 230000001172 regenerating effect Effects 0.000 abstract description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 197
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- 230000000052 comparative effect Effects 0.000 description 42
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- 238000004458 analytical method Methods 0.000 description 17
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- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 4
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- 238000009825 accumulation Methods 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 2
- 239000011609 ammonium molybdate Substances 0.000 description 2
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- NMJORVOYSJLJGU-UHFFFAOYSA-N methane clathrate Chemical compound C.C.C.C.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O.O NMJORVOYSJLJGU-UHFFFAOYSA-N 0.000 description 2
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- 230000035484 reaction time Effects 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
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- 239000010937 tungsten Substances 0.000 description 2
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- 229910052725 zinc Inorganic materials 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
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- 239000005977 Ethylene Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
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- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
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- 150000001768 cations Chemical class 0.000 description 1
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- CNEOGBIICRAWOH-UHFFFAOYSA-N methane;molybdenum Chemical compound C.[Mo] CNEOGBIICRAWOH-UHFFFAOYSA-N 0.000 description 1
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- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
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- RIAJLMJRHLGNMZ-UHFFFAOYSA-N triazanium;trioxomolybdenum;phosphate Chemical compound [NH4+].[NH4+].[NH4+].O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.[O-]P([O-])([O-])=O RIAJLMJRHLGNMZ-UHFFFAOYSA-N 0.000 description 1
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- B01J29/40—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of the pentasil type, e.g. types ZSM-5, ZSM-8 or ZSM-11, as exemplified by patent documents US3702886, GB1334243 and US3709979, respectively
- B01J29/48—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of the pentasil type, e.g. types ZSM-5, ZSM-8 or ZSM-11, as exemplified by patent documents US3702886, GB1334243 and US3709979, respectively containing arsenic, antimony, bismuth, vanadium, niobium tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
- C01B3/32—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air
- C01B3/34—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents
- C01B3/38—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen by reaction of gaseous or liquid organic compounds with gasifying agents, e.g. water, carbon dioxide, air by reaction of hydrocarbons with gasifying agents using catalysts
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- C07—ORGANIC CHEMISTRY
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- C07C2/76—Preparation of hydrocarbons from hydrocarbons containing a smaller number of carbon atoms by condensation of hydrocarbons with partial elimination of hydrogen
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- C01B2203/0227—Processes for making hydrogen or synthesis gas containing a reforming step containing a catalytic reforming step
- C01B2203/0238—Processes for making hydrogen or synthesis gas containing a reforming step containing a catalytic reforming step the reforming step being a carbon dioxide reforming step
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Abstract
【解決手段】低級炭化水素を触媒と接触反応させて芳香族炭化水素及び水素を得る反応工程と、前記反応工程で使用された触媒に水素を接触させることにより触媒活性を再生する再生工程を備え、前記反応工程と前記再生工程を繰り返すことにより芳香族炭化水素及び水素を製造する。前記反応工程において、前記低級炭化水素に一酸化炭素を添加し、反応温度を800℃より高くする。
【選択図】図1
Description
(参考例1)
本発明の参考例1に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して0.75%の一酸化炭素を添加し、780℃で触媒反応を行った。
・「ベンゼン収率(%)」=〔「生成したベンゼン量(mol)」/「メタン改質反応に供されたメタン量(mol)」〕×100
・「メタン転化率(%)」=〔「原料メタン流速」−「未反応のメタン流速」)/「原料メタン流速」〕×100
・「ベンゼン生成速度(nmol/g/s)」=「触媒1gあたり、1秒間に生成したベンゼンのnmol数」
前記反応ガスを供給する前の触媒の前処理は、触媒を空気気流下550℃まで昇温し、2時間維持した後、メタン20%:水素80%の前処理ガスに切り替えて、700℃まで昇温し、3時間維持した。その後、反応ガスに切り替えて所定の温度(780℃)まで昇温し触媒の評価を行った。
本発明の参考例2に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して6.4%の一酸化炭素を添加し、780℃で触媒反応を行った。
本発明の比較例1に係る芳香族化合物製造法では、触媒にメタンのみを接触反応させ、780℃で触媒反応を行い芳香族化合物と水素ガスを製造した。
本発明の比較例2に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して1.2%の二酸化炭素を添加し、780℃で触媒反応を行った。
本発明の比較例3に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の二酸化炭素を添加し、780℃で触媒反応を行った。
(参考例3)
本発明の参考例3に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して1.5%の一酸化炭素を添加し、780℃で触媒反応を行った。
本発明の参考例4に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の一酸化炭素を添加し、780℃で触媒反応を行った。
本発明の参考例5に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して11.9%の一酸化炭素を添加し、780℃で触媒反応を行った。
本発明の参考例6に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して20%の一酸化炭素を添加し、780℃で触媒反応を行った。
(実施例1)
本発明の実施例1に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の一酸化炭素を添加し、820℃で触媒反応を行った。さらに、1時間の触媒反応(反応工程)と3時間の触媒再生反応(再生工程)を交互に行った。
本発明の比較例4に係る芳香族化合物製造法は、触媒にメタンのみを接触反応させ、820℃で触媒反応を行い芳香族化合物と水素ガスを製造した。1時間の触媒反応(反応工程)と3時間の触媒再生反応(再生工程)を交互に行った。
本発明の比較例5に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して1.5%の二酸化炭素を添加し、820℃で触媒反応を行った。さらに、1時間の触媒反応(反応工程)と3時間の触媒再生反応(再生工程)を交互に行った。
(実施例2)
本発明の実施例2に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の一酸化炭素を添加し、890℃で触媒反応を行った。
本発明の実施例3に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の一酸化炭素を添加し、870℃で触媒反応を行った。
本発明の実施例4に係る芳香族化合物製造法は、触媒にメタンを接触反応させて芳香族化合物と水素ガスを製造する方法において、反応ガスに対して3.0%の一酸化炭素を添加し、850℃で触媒反応を行った。
本発明の比較例6に係る芳香族化合物製造法では、触媒にメタンのみを接触反応させ、890℃で触媒反応を行い芳香族化合物と水素ガスを製造した。
本発明の比較例7に係る芳香族化合物製造法では、触媒にメタンのみを接触反応させ、870℃で触媒反応を行い芳香族化合物と水素ガスを製造した。
本発明の比較例8に係る芳香族化合物製造法では、触媒にメタンのみを接触反応させ、850℃で触媒反応を行い芳香族化合物と水素ガスを製造した。
また、コーク(C)が生成する反応は(2)式による反応であると考えられる。
また、(1)式と逆の反応によりメタンを生成する反応も生じる((3)式に示す)。
反応ガスに二酸化炭素(CO2)を添加した場合、(4)式に示すようにコーク除去反応が起こると考えられる。
また、(5)式に示すように、二酸化炭素は、メタンと反応して水素を生成すると考えられる。
したがって、反応ガスに二酸化炭素を添加した場合、(5)式に示した反応により、水素が発生する。(1)式で示したベンゼン生成反応は平衡反応であり、発生した水素により平衡が移動しベンゼンの生成が抑制されてしまうものと考えられる。
一方、一酸化炭素(CO)を添加することにより、上記(5)式の逆反応が起こり、二酸化炭素が生成する。この二酸化炭素により(4)式で示したコーク除去反応が起こることで、触媒活性の低下を抑制することができるものと考えられる。そして、(5)式の逆反応により水素が消費されることにより、(1)式において平衡が移動し、ベンゼンの生成が促進されるものと考えられる。
(7)式で生成した酸素原子(O)により、反応器中の水素が消費されることにより、(1)式において平衡が移動しベンゼンの生成が促進されるものと考えられる。
Claims (4)
- 低級炭化水素を触媒に接触反応させ、芳香族炭化水素を主成分とする芳香族化合物及び水素を製造する方法であって、
前記低級炭化水素に一酸化炭素を添加し、反応温度を800℃より高くして前記触媒に接触反応させる
ことを特徴とする芳香族化合物製造方法。 - 前記一酸化炭素濃度は、反応ガスに対して0.75%〜20%である
ことを特徴とする請求項1に記載の芳香族化合物製造方法。 - 前記反応温度は、820℃以上である
ことを特徴とする請求項1または請求項2に記載の芳香族化合物製造方法。 - 前記低級炭化水素を前記触媒と接触反応させる反応工程と、前記反応工程で使用された触媒を再生する再生工程を繰り返すことにより前記芳香族化合物を製造する
ことを特徴とする請求項1から請求項3のいずれか1項に記載の芳香族化合物製造方法。
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JP2010066077A JP2011195535A (ja) | 2010-03-23 | 2010-03-23 | 芳香族化合物製造方法 |
PCT/JP2011/052809 WO2011118279A1 (ja) | 2010-03-23 | 2011-02-10 | 芳香族化合物製造方法 |
SG2012065892A SG183931A1 (en) | 2010-03-23 | 2011-02-10 | Method of manufacture of aromatic compound |
US13/636,257 US20130012747A1 (en) | 2010-03-23 | 2011-02-10 | Method of manufacture of aromatic compound |
CN2011800150268A CN102811983A (zh) | 2010-03-23 | 2011-02-10 | 芳族化合物的制备方法 |
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RU2523801C1 (ru) * | 2013-03-29 | 2014-07-27 | ФЕДЕРАЛЬНОЕ ГОСУДАРСТВЕННОЕ БЮДЖЕТНОЕ УЧРЕЖДЕНИЕ НАУКИ ИНСТИТУТ ОРГАНИЧЕСКОЙ ХИМИИ им. Н.Д. ЗЕЛИНСКОГО РОССИЙСКОЙ АКАДЕМИИ НАУК (ИОХ РАН) | Способ получения ароматических углеводородов |
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2011
- 2011-02-10 CN CN2011800150268A patent/CN102811983A/zh active Pending
- 2011-02-10 SG SG2012065892A patent/SG183931A1/en unknown
- 2011-02-10 WO PCT/JP2011/052809 patent/WO2011118279A1/ja active Application Filing
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RU2523801C1 (ru) * | 2013-03-29 | 2014-07-27 | ФЕДЕРАЛЬНОЕ ГОСУДАРСТВЕННОЕ БЮДЖЕТНОЕ УЧРЕЖДЕНИЕ НАУКИ ИНСТИТУТ ОРГАНИЧЕСКОЙ ХИМИИ им. Н.Д. ЗЕЛИНСКОГО РОССИЙСКОЙ АКАДЕМИИ НАУК (ИОХ РАН) | Способ получения ароматических углеводородов |
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WO2011118279A1 (ja) | 2011-09-29 |
CN102811983A (zh) | 2012-12-05 |
SG183931A1 (en) | 2012-10-30 |
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