[go: up one dir, main page]

JP2009182216A - Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component - Google Patents

Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component Download PDF

Info

Publication number
JP2009182216A
JP2009182216A JP2008021055A JP2008021055A JP2009182216A JP 2009182216 A JP2009182216 A JP 2009182216A JP 2008021055 A JP2008021055 A JP 2008021055A JP 2008021055 A JP2008021055 A JP 2008021055A JP 2009182216 A JP2009182216 A JP 2009182216A
Authority
JP
Japan
Prior art keywords
hole
substrate
wiring board
electronic component
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008021055A
Other languages
Japanese (ja)
Inventor
Akihiro Sato
昭博 佐藤
Hideshige Iwabuchi
秀慈 岩渕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daisho Denshi Co Ltd
Original Assignee
Daisho Denshi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daisho Denshi Co Ltd filed Critical Daisho Denshi Co Ltd
Priority to JP2008021055A priority Critical patent/JP2009182216A/en
Publication of JP2009182216A publication Critical patent/JP2009182216A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Structure Of Printed Boards (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To develop a technique capable of securing such a non-through-hole (cavity) in a wiring circuit board for mounting of a small electronic component as to have a flat surface as the bottom of the hole on which such a small electronic component as a semiconductor element can be mounted and also capable of preventing or suppressing flowing of an adhesive from an adhesive layer for adhesion between wiring circuit boards into the non-through hole. <P>SOLUTION: In a method of manufacturing a wiring circuit board for mounting of an electronic component, a trapezoidal projection 14a is formed on a metallic pad 14 on a substrate 11 by pattern etching, the obtained substrate 11 with the projection and a wiring circuit board 12 having a through-hole 12c formed therein are joined to each other with an adhesive layer 13 disposed therebetween, the trapezoidal projection 14a is accommodated within a communication hole including the through-hole 12c of the wiring circuit board 12 and an opening 13a passed through the adhesive layer 13, and a non-through-hole 15 for mounting of a small electronic component, which hole has the trapezoidal projection 14a as its bottom, is secured in the communication hole. The wiring circuit board for mounting the electronic component and the wiring circuit board with the electronic component are also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、例えば発光素子といった半導体素子等である小型電子部品を搭載するためのキャビティ部(小型電子部品搭載用非貫通穴)をもつ電子部品搭載用配線基板の製造方法、電子部品搭載用配線基板、電子部品付き配線基板に関する。   The present invention relates to a method for manufacturing a wiring board for mounting an electronic component having a cavity (non-through hole for mounting a small electronic component) for mounting a small electronic component such as a semiconductor element such as a light emitting device, and wiring for mounting the electronic component The present invention relates to a substrate and a wiring substrate with electronic components.

図14に特許文献1で開示されている公知例を示す。
この方法は多層プリント配線板の層間接続用非貫通穴の形成に関するものであり、特に直径が0.4mm以下の小径非貫通穴を形成するものである。特許文献1の実施例1、2では、250μmの非貫通穴を形成する。
図14(a)に示すように、配線基板110に接着剤層120が貼り合わされ、配線基板110及び接着層120を貫通する貫通穴130が形成されている接着剤層付き配線基板100を作製する。この接着剤層付き配線基板100を貫通する貫通穴130は、層間接続用貫通穴を得るために形成されるものであり、配線基板110に形成された貫通穴111と、接着剤層120に配線基板110の貫通穴111と略同等の大きさで配線基板110の貫通穴111に対応する位置に形成された開口部121(貫通穴)とが互いに連通されたものである。例えば、配線基板110に接着剤層120を仮圧着した後、ドリル加工によって配線基板110及び接着剤層120を貫通する穴を形成する。この場合には配線基板110の貫通穴111と接着剤層120の貫通穴(開口部121)の位置と大きさが一致する。
FIG. 14 shows a known example disclosed in Patent Document 1.
This method relates to the formation of a non-through hole for interlayer connection of a multilayer printed wiring board, and particularly a small-diameter non-through hole having a diameter of 0.4 mm or less. In Examples 1 and 2 of Patent Document 1, a 250 μm non-through hole is formed.
As shown in FIG. 14A, the adhesive layer 120 is bonded to the wiring substrate 110, and the wiring substrate 100 with the adhesive layer in which the through hole 130 penetrating the wiring substrate 110 and the adhesive layer 120 is formed. . The through hole 130 penetrating the wiring board 100 with the adhesive layer is formed to obtain an interlayer connection through hole, and the through hole 111 formed in the wiring board 110 and the adhesive layer 120 are wired. An opening 121 (through hole) that is substantially the same size as the through hole 111 of the substrate 110 and is formed at a position corresponding to the through hole 111 of the wiring substrate 110 is communicated with each other. For example, after temporarily bonding the adhesive layer 120 to the wiring board 110, a hole penetrating the wiring board 110 and the adhesive layer 120 is formed by drilling. In this case, the position and the size of the through hole 111 of the wiring board 110 and the through hole (opening 121) of the adhesive layer 120 coincide with each other.

図14(d)に示すように、このような貫通穴130を加工した配線基板110と別の配線基板140(以下、基底側配線基板とも言う)とが加圧加熱積層接着される。基底側配線基板140には、予め、貫通穴130に対応する位置に金属パッド141と、導電性材料からなる外観ドーム状(半球状)の突起142とが設けられる。
金属パッド141は前記貫通穴130の断面よりも大きいサイズに設計される(図14(b)、(d))。図14(c)に示すように、この金属パッド141の中央に貫通穴130断面よりもサイズが小さい外観ドーム状の突起142が導電性ペースト印刷によって形成される。そして、図14(d)に示すように、前記金属パッド141及び前記突起142が形成された基底側配線基板140と、貫通穴130が加工された接着剤層付き配線基板100とを重ね合わせて加圧加熱し、積層接着することで、基底側配線基板140によって貫通穴130が非貫通とされて層間接続用非貫通穴150(以下、単に非貫通穴とも言う)が形成される。
特許文献1記載の技術は、突起142が、非貫通穴150内に接着剤が流出することを防止する機能を果たし、その結果、非貫通穴150内における、内層配線と外層配線との接続面積を充分に確保できるものである。
特開平07−015140号公報
As shown in FIG. 14D, the wiring board 110 in which such a through hole 130 is processed and another wiring board 140 (hereinafter, also referred to as a base-side wiring board) are laminated under pressure and heating. The base-side wiring board 140 is previously provided with a metal pad 141 and an external dome-shaped (hemispherical) protrusion 142 made of a conductive material at a position corresponding to the through hole 130.
The metal pad 141 is designed to have a size larger than the cross section of the through hole 130 (FIGS. 14B and 14D). As shown in FIG. 14C, a dome-like protrusion 142 having an appearance smaller than the cross section of the through hole 130 is formed at the center of the metal pad 141 by conductive paste printing. Then, as shown in FIG. 14D, the base-side wiring board 140 on which the metal pads 141 and the protrusions 142 are formed and the wiring board 100 with an adhesive layer in which the through holes 130 are processed are overlapped. By pressurizing and heating and laminating and bonding, the base-side wiring substrate 140 makes the through hole 130 non-penetrating, and an interlayer connection non-through hole 150 (hereinafter also simply referred to as non-through hole) is formed.
In the technique described in Patent Document 1, the protrusion 142 functions to prevent the adhesive from flowing into the non-through hole 150, and as a result, the connection area between the inner layer wiring and the outer layer wiring in the non-through hole 150. Can be secured sufficiently.
Japanese Patent Application Laid-Open No. 07-015140

この特許文献1記載の技術は、多層プリント配線板の層間接続を目的にしており、半導体素子等の小型電子部品の搭載には対応できない。
特許文献1記載の技術は、非貫通穴150内に小型電子部品を搭載することを目的としていないために層間接続の目的に合致するように非貫通穴150を小径にすることが意図されている。また、発光素子(半導体素子)等の面実装タイプの小型電子部品を配線基板に搭載するには、配線基板に実装用の平坦面が確保されている必要があるが、この点、特許文献1記載の技術では、ドーム状の突起142の存在が、非貫通穴150内への小型電子部品の搭載の障害となる。
非貫通穴150内に小型電子部品を搭載することは非貫通穴150の大きさおよび突起142の形状の点から不可能である。
The technique described in Patent Document 1 is intended for interlayer connection of multilayer printed wiring boards, and cannot support mounting of small electronic components such as semiconductor elements.
Since the technique described in Patent Document 1 is not intended to mount a small electronic component in the non-through hole 150, the non-through hole 150 is intended to have a small diameter so as to meet the purpose of interlayer connection. . Further, in order to mount a surface mount type small electronic component such as a light emitting element (semiconductor element) on a wiring board, it is necessary to secure a flat surface for mounting on the wiring board. In the described technique, the presence of the dome-shaped protrusion 142 becomes an obstacle to mounting a small electronic component in the non-through hole 150.
It is impossible to mount a small electronic component in the non-through hole 150 due to the size of the non-through hole 150 and the shape of the protrusion 142.

また、層間接続用非貫通穴は最大でも直径0.4mm程度の丸穴であるが、小型電子部品の搭載に必要となる非貫通穴150の大きさは層間接続用非貫通穴の2倍以上である。このように非貫通穴のサイズを層間接続の場合に比べて格段に大きくする場合、上記の公知例で示された非貫通穴内への接着剤の流出と言う問題が発生しやすくなることが判った。
非貫通穴150のサイズを大きくした場合、突起142による接着剤の流出防止を実現するには、ドーム状突起142のサイズも大きくすることになるが、導電性ペースト印刷によって形成されるドーム状突起142は、サイズが大きくなると所望の形状に形成することが難しくなる。このため、配線基板110における貫通穴111の開口部の口縁部とドーム状突起142の外周部との間のギャップが部分的に大きくなることがあり、非貫通穴内への接着剤の流出が生じやすくなるものと考えられる。
In addition, the non-through hole for interlayer connection is a round hole with a diameter of about 0.4 mm at the maximum, but the size of the non-through hole 150 required for mounting small electronic components is more than twice the size of the non-through hole for interlayer connection. It is. In this way, when the size of the non-through hole is greatly increased compared to the case of the interlayer connection, it has been found that the problem of the outflow of the adhesive into the non-through hole shown in the above known example is likely to occur. It was.
When the size of the non-through hole 150 is increased, to prevent the adhesive 142 from flowing out by the protrusion 142, the size of the dome-shaped protrusion 142 is also increased. However, the dome-shaped protrusion formed by conductive paste printing is used. 142 becomes difficult to form in a desired shape as the size increases. For this reason, the gap between the opening edge portion of the through hole 111 in the wiring substrate 110 and the outer peripheral portion of the dome-shaped protrusion 142 may partially increase, and the adhesive flows into the non-through hole. This is likely to occur.

上述のように、特許文献1に係る技術は、半導体素子等の小型電子部品の搭載に対応できるものではない。
また、これまで、半導体素子等の面実装タイプの小型電子部品の搭載に対応でき、しかも、一対の基板(特許文献1では配線基板110、140)を接着するための接着剤層の接着剤の、小型電子部品収納用の非貫通穴への流出を抑え、非貫通穴への接着剤の流出が小型電子部品の搭載に影響を与えることを簡単な構成により低コストで防止できる適切な技術が無く、その開発が求められていた。
As described above, the technique according to Patent Document 1 cannot cope with mounting of small electronic components such as semiconductor elements.
In addition, until now, it is possible to support mounting of surface mount type small electronic components such as semiconductor elements, and the adhesive layer adhesive for bonding a pair of substrates (wiring substrates 110 and 140 in Patent Document 1). Appropriate technology that can prevent the outflow of non-through holes for storing small electronic components and prevent the outflow of adhesive into non-through holes from affecting the mounting of small electronic components at a low cost There was no need to develop it.

本発明は、前記課題に鑑みて、小型電子部品搭載用非貫通穴(キャビティ部)の底部(穴底)に、半導体素子等の面実装タイプの小型電子部品を搭載できる充分な面積を確保した平坦な端面(キャビティ部底面)を得ることができ、しかも、小型電子部品搭載用非貫通穴内への接着剤の流出が発生しにくい電子部品搭載用配線基板の製造方法、電子部品搭載用配線基板、電子部品付き配線基板の提供を目的としている。   In view of the above problems, the present invention secures a sufficient area for mounting a surface mount type small electronic component such as a semiconductor element on the bottom (hole bottom) of a non-through hole (cavity portion) for mounting a small electronic component. Manufacturing method of wiring board for mounting electronic component, wiring board for mounting electronic component, which can obtain flat end surface (bottom surface of cavity portion) and hardly cause adhesive to flow into non-through hole for mounting small electronic component The purpose is to provide a wiring board with electronic components.

本発明は、上記課題を解決するため、以下の手段を提供する。
第1の発明は、基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、前記基板に前記配線基板の前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドを設ける工程と、該金属パッドの中央部を除く部分をハーフエッチングして薄くすることにより、エッチングする部分の内側に、前記配線基板の前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成する工程と、次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法を提供する。
第2の発明は、基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、前記基板に前記配線基板の前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドを設ける工程と、該金属パッドの中央部をパターンめっき法によって厚くして前記配線基板の前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成する工程と、次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法を提供する。
第3の発明は、基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、金属層を部分的にハーフエッチングして薄くすることにより、前記金属層のエッチングする部分を除く箇所に、前記配線基板の前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を有する前記基板を得る工程と、次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法を提供する。
第4の発明は、基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、前記基板が金属層であり、この基板の一部をパターンめっき法によって厚くして、前記配線基板の前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成し、前記台状突部を有する前記基板を得る工程と、次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法を提供する。
第5の発明は、第1〜4のいずれかの発明の電子部品搭載用配線基板の製造方法において、前記ハーフエッチング又は前記パターンめっき法によって、前記台状突部に、前記接着剤層の厚さの10%以上の突出寸法を確保することを特徴とする電子部品搭載用配線基板の製造方法を提供する。
第6の発明は、前記配線基板の前記貫通穴が、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることを特徴とする第1〜5のいずれかの発明の電子部品搭載用配線基板の製造方法を提供する。
第7の発明は、さらに、前記小型電子部品搭載用非貫通穴の内面にめっき層を形成する工程を具備することを特徴とする第1〜6のいずれかの発明の電子部品搭載用配線基板の製造方法を提供する。
第8の発明は、基板に小型電子部品収納用の貫通穴を有する配線基板が接着剤層を介して接着され、前記基板には、前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドが設けられ、この金属パッドの中央部の、前記配線基板の前記貫通穴に対応する位置に、前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部が突設されており、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記台状突部が収納され、しかも、前記連通穴内に前記台状突部を穴底とする小型電子部品搭載用非貫通穴が確保されていることを特徴とする電子部品搭載用配線基板を提供する。
第9の発明は、基板に小型電子部品収納用の貫通穴を有する配線基板が接着剤層を介して接着され、前記基板が金属層であり、前記基板には、前記配線基板の前記貫通穴に対応する位置に、前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部が突設されており、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記台状突部が収納され、しかも、前記連通穴内に前記台状突部を穴底とする小型電子部品搭載用非貫通穴が確保されていることを特徴とする電子部品搭載用配線基板を提供する。
第10の発明は、前記台状突部は、前記端面から前記基板における該台状突部の突出基端側へ行くにしたがって、その外周面が外側に拡がるテーパ形状になっていることを特徴とする第8又は9の発明の電子部品搭載用配線基板を提供する。
第11の発明は、前記配線基板の前記貫通穴が、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることを特徴とする第8〜10のいずれかの発明の電子部品搭載用配線基板を提供する。
第12の発明は、前記小型電子部品搭載用非貫通穴の内面にめっき層が形成されていることを特徴とする第8〜11のいずれかの発明の電子部品搭載用配線基板を提供する。
第13の発明は、第8〜11のいずれかの発明の電子部品搭載用配線基板の前記台状突部の前記端面に直接、あるいは、前記小型電子部品搭載用非貫通穴の内面に形成されためっき層の内の前記台状突部の前記端面に形成された部分に小型電子部品が搭載され、前記小型電子部品が、前記配線基板の配線にワイヤボンディングによって電気的に接続されていることを特徴とする電子部品付き配線基板を提供する。
The present invention provides the following means in order to solve the above problems.
A first invention is a method for manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring board having a through hole to the substrate through an adhesive layer, A step of providing a metal pad larger than a cross section perpendicular to the central axis of the through hole of the wiring board on the inside of the portion to be etched by half-etching and thinning a portion excluding the central portion of the metal pad A step of forming a plate-like protrusion having a flat surface that is substantially the same as the cross-section of the through-hole of the wiring board and can be accommodated in the through-hole, and having an end surface on the protruding tip side; And the wiring board through the adhesive layer, the through hole of the wiring board and the opening formed in the adhesive layer are in communication holes formed in communication with each other. Storing the trapezoidal protrusion With, as a non-penetrating the communicating holes, to provide a method of manufacturing an electronic parts mounting wiring board, characterized by comprising a step of obtaining the non-through hole for small electronic parts mounting.
A second invention is a method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring board having a through hole to the substrate through an adhesive layer, A step of providing a metal pad larger than a cross section perpendicular to the central axis of the through hole of the wiring board, and thickening a central portion of the metal pad by a pattern plating method to form the cross section of the through hole of the wiring board. And a step of forming a trapezoidal protrusion having a flat surface of a size that can be accommodated in the through hole as an end surface on the protruding tip side, and then the substrate and the wiring substrate through the adhesive layer The through-holes of the wiring board and the openings formed in the adhesive layer are accommodated in the communication holes formed by communicating with each other, and the base-like protrusions of the substrate are accommodated in the communication holes. Non-penetrating, the small size To provide a manufacturing method of the electronic component mounting wiring board, characterized by comprising a step of obtaining a non-through hole for the child component mounting.
A third invention is a method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring board having a through hole to the substrate through an adhesive layer, the metal layer Can be accommodated in the through-hole at a portion other than the portion to be etched of the metal layer, approximately equal to a cross section perpendicular to the central axis of the through-hole of the wiring board, at a portion other than the portion to be etched. A step of obtaining the substrate having a trapezoidal protrusion having a flat surface of a large size as an end surface on the protruding tip side, and then bonding the substrate and the wiring substrate via the adhesive layer, The board-shaped protrusion of the substrate is accommodated in a communication hole in which the through hole of the wiring board and the opening formed in the adhesive layer are in communication with each other, and the communication hole is made non-penetrating to reduce the size. Non-through holes for mounting electronic components To provide a manufacturing method of the electronic component mounting wiring board, characterized by comprising the that step.
A fourth invention is a method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring board having a through hole to the substrate through an adhesive layer, Is a metal layer, and a portion of the substrate is thickened by pattern plating, and is flat and has a size that is substantially the same as a cross section perpendicular to the central axis of the through hole of the wiring board and that can be accommodated in the through hole. Forming a table-like protrusion having an end surface on the protruding tip side to obtain the substrate having the table-like protrusion, and then bonding the substrate and the wiring board through the adhesive layer Thus, the base-like protrusion of the substrate is accommodated in a communication hole in which the through-hole of the wiring board and the opening formed in the adhesive layer communicate with each other, and the through-hole is not penetrated. As a non-through hole for mounting the small electronic component To provide a manufacturing method of the electronic component mounting wiring board, characterized by comprising a degree.
5th invention is a manufacturing method of the wiring board for electronic component mounting of any one of 1st-4th invention, The thickness of the said adhesive bond layer is formed in the said base-like protrusion by the said half etching or the said pattern plating method. The present invention provides a method for manufacturing an electronic component mounting wiring board characterized by securing a protruding dimension of 10% or more of the height.
A sixth invention is characterized in that the through hole of the wiring board is a round hole having a diameter of 0.8 mm or more, or a square hole having a side length of 0.8 mm or more. A method for manufacturing an electronic component mounting wiring board according to any one of the inventions is provided.
The seventh invention further comprises a step of forming a plating layer on the inner surface of the non-through hole for mounting the small electronic component, wherein the wiring board for mounting electronic component according to any one of the first to sixth inventions A manufacturing method is provided.
According to an eighth aspect of the present invention, a wiring board having a through hole for storing a small electronic component is bonded to a substrate via an adhesive layer, and the substrate has a metal larger than a cross section perpendicular to the central axis of the through hole. A pad is provided, and a flat surface having a size that is substantially the same as the cross-section of the through-hole and that can be accommodated in the through-hole is projected at a position corresponding to the through-hole of the wiring board at the center of the metal pad. A trapezoidal protrusion is provided as an end surface on the front end side, and the trapezoidal protrusion is in a communication hole in which the through hole of the wiring board and the opening formed in the adhesive layer communicate with each other. Is provided, and a non-through hole for mounting a small electronic component having the base-shaped protrusion as a hole bottom is secured in the communication hole.
According to a ninth aspect of the present invention, a wiring board having a through hole for accommodating a small electronic component is bonded to a board via an adhesive layer, the board is a metal layer, and the board includes the through hole of the wiring board. A base-like projecting portion having a flat surface that is substantially the same as a cross section perpendicular to the central axis of the through hole and that can be accommodated in the through hole is provided at a position corresponding to the end surface on the protruding tip side. And the base-like protrusion is housed in a communication hole in which the through hole of the wiring board and the opening formed in the adhesive layer are in communication with each other, and the base-like protrusion is in the communication hole. Provided is a wiring board for mounting an electronic component, characterized in that a non-through hole for mounting a small electronic component having a hole bottom is secured.
According to a tenth aspect of the invention, the trapezoidal protrusion has a tapered shape in which an outer peripheral surface extends outward as it goes from the end surface to the protruding proximal end side of the trapezoidal protrusion on the substrate. An electronic component mounting wiring board according to the eighth or ninth invention is provided.
In an eleventh aspect of the invention, the through hole of the wiring board is a round hole having a diameter of 0.8 mm or more, or a square hole having a side length of 0.8 mm or more. An electronic component mounting wiring board according to any one of the inventions is provided.
A twelfth aspect of the present invention provides the electronic component mounting wiring board according to any one of the eighth to eleventh aspects, wherein a plating layer is formed on an inner surface of the non-through hole for mounting the small electronic component.
A thirteenth aspect of the invention is formed directly on the end surface of the base-like protrusion of the electronic component mounting wiring board of any of the eighth to eleventh aspects or on the inner surface of the non-through hole for mounting the small electronic component. A small electronic component is mounted on a portion of the plated layer formed on the end surface of the plate-like protrusion, and the small electronic component is electrically connected to the wiring of the wiring board by wire bonding. A wiring board with electronic components is provided.

本発明(第1〜13の発明)では、配線基板と基板とが接着剤層を介して接着され、配線基板に形成されている貫通穴と接着剤層に形成されている開口部とが互いに連通してなる連通穴内に、基板に突設(基板に設けた金属パッドに突設、あるいは、基板に直接突設)された台状突部を収納し、連通穴の片端側を基板あるいは台状突部によって塞いで非貫通とする。これにより、連通穴の内、台状突部の突出先端側の端面から基板とは反対の側に位置する部分が、小型電子部品を収納(搭載)するための小型電子部品搭載用非貫通穴となる。台状突部(詳細には、その突出先端側の端面)を穴底とする小型電子部品搭載用非貫通穴を持つ電子部品搭載用配線基板が得られる。   In the present invention (first to thirteenth inventions), the wiring substrate and the substrate are bonded via an adhesive layer, and the through hole formed in the wiring substrate and the opening formed in the adhesive layer are mutually connected. In the communication hole formed in communication, the base-like protrusion protruding from the substrate (projecting from the metal pad provided on the substrate or directly protruding from the substrate) is stored, and one end of the communication hole is placed on the substrate or the base. It is blocked by a protruding part and made non-penetrating. As a result, the portion of the communication hole located on the side opposite to the substrate from the end surface on the protruding tip side of the trapezoidal projection is a non-through hole for mounting a small electronic component for storing (mounting) the small electronic component. It becomes. An electronic component mounting wiring board having a non-through hole for mounting a small electronic component having a base-like protrusion (specifically, an end surface on the protruding tip side) as a hole bottom is obtained.

台状突部の突出先端側の端面は、基板に沿って延在する平坦面であり、小型電子部品搭載用非貫通穴の中心軸線に対して垂直の平坦面になっている。本発明に係る電子部品搭載用配線基板は、小型電子部品搭載用非貫通穴の穴底に、台状突部の端面によって、小型電子部品を搭載するための平坦な底面(以下、電子部品搭載面とも言う)を確実に得ることができ、半導体素子等の面実装タイプの小型電子部品の搭載に好適である。
電子部品搭載面は、台状突部の端面自体の他、台状突部の端面に形成しためっき(めっき層)の表面であっても良い。
The end surface on the projecting tip side of the trapezoidal protrusion is a flat surface extending along the substrate, and is a flat surface perpendicular to the central axis of the non-through hole for mounting a small electronic component. An electronic component mounting wiring board according to the present invention has a flat bottom surface (hereinafter referred to as electronic component mounting) for mounting a small electronic component on the bottom of a non-through hole for mounting a small electronic component by an end surface of a trapezoidal protrusion. (Also referred to as a surface) can be obtained with certainty, and is suitable for mounting a surface mount type small electronic component such as a semiconductor element.
The electronic component mounting surface may be the surface of the plating (plating layer) formed on the end surface of the trapezoidal protrusion in addition to the end surface itself of the trapezoidal protrusion.

基板と配線基板とを接着して一体化させる接着剤層には、断面サイズ(大きさ)が配線基板の貫通穴と略同等の開口部(貫通穴)が形成される。この開口部の断面サイズ(該開口部の中心軸線に垂直の断面のサイズ)は、台状突部の端面と一致、あるいは、僅かに大きくする。
そして、本発明では、配線基板に形成されている貫通穴と接着剤層に形成されている開口部とを互いに連通させて連続する一本の穴とした連通穴内に、台状突部を収納する。
In the adhesive layer that bonds and integrates the substrate and the wiring substrate, an opening (through hole) having a cross-sectional size (size) substantially equal to the through hole of the wiring substrate is formed. The cross-sectional size of the opening (the size of the cross section perpendicular to the central axis of the opening) coincides with or slightly increases the end surface of the trapezoidal protrusion.
In the present invention, the trapezoidal protrusion is housed in a communication hole that is a continuous hole that connects the through hole formed in the wiring board and the opening formed in the adhesive layer to each other. To do.

本発明に係る電子部品搭載用配線基板の製造方法によって得られる電子部品搭載用配線基板、第8、第9の発明に係る電子部品搭載用配線基板にあっては、接着剤層の開口部内に台状突部の全体が収納されて台状突部の端面が開口部内に位置する構成、台状突部の突出先端の端面が接着剤層と配線基板との境界に位置する構成、台状突部の突出先端が接着剤層の開口部から配線基板の貫通穴内に突出して、台状突部の端面が貫通穴内に位置する構成が採用される。小型電子部品搭載用非貫通穴としては、配線基板の貫通穴のみによって構成される場合と、配線基板の貫通穴と接着剤層の開口部とによって構成される場合とがある。そして、本発明にあっては、台状突部及び配線基板の貫通穴の寸法関係によって、台状突部の外周全周にわたって配線基板が接するか、あるいは、台状突部の外周と配線基板とが僅かな離隔距離(接着剤層の厚さよりも小さい距離)を以て接近配置されるようにする。これにより、小型電子部品搭載用非貫通穴への接着剤層の接着剤の流出(染み出し)を防止又は抑制する。   In the electronic component mounting wiring board obtained by the manufacturing method of the electronic component mounting wiring board according to the present invention, and the electronic component mounting wiring board according to the eighth and ninth inventions, the opening is formed in the adhesive layer. A configuration in which the whole of the trapezoidal protrusion is stored and the end surface of the trapezoidal protrusion is located in the opening, a configuration in which the end surface of the protruding tip of the trapezoidal protrusion is located at the boundary between the adhesive layer and the wiring board, the trapezoid A configuration is adopted in which the protruding tip of the protrusion protrudes from the opening of the adhesive layer into the through hole of the wiring board, and the end surface of the trapezoidal protrusion is positioned in the through hole. The non-through hole for mounting a small electronic component may be constituted by only a through hole of the wiring board or may be constituted by a through hole of the wiring board and an opening of the adhesive layer. In the present invention, depending on the dimensional relationship between the trapezoidal protrusion and the through hole of the wiring board, the wiring board contacts the entire outer periphery of the trapezoidal protrusion, or the outer periphery of the trapezoidal protrusion and the wiring board Are arranged close to each other with a slight separation distance (distance smaller than the thickness of the adhesive layer). Thereby, the outflow (seepage) of the adhesive of the adhesive layer to the non-through hole for mounting the small electronic component is prevented or suppressed.

また、本発明に係る電子部品搭載用配線基板の製造方法では、基板に形成された金属パッド又は金属層のハーフエッチング、あるいは、前記金属パッド又は金属層へのパターンめっきによって、台状突部を形成するので、平坦な端面を有する台状突部を容易に形成できる。これにより、半導体素子等の面実装タイプの小型電子部品の搭載を容易に実現できる。
ハーフエッチングあるいはパターンめっきによって台状突部を形成する構成であれば、例えば穴開きフィルム等のマスク、レジスト樹脂の使用などによって、所望の形状、大きさの端面を持つ台状突部を確実に得ることができる。台状突部の端面の大きさのコントロールも容易である。配線基板における貫通穴の断面の大きさ(断面寸法)に鑑みて、台状突部の端面の大きさを設定することで、小型電子部品搭載用非貫通穴への接着剤の流出の防止又は抑制を実現できる。半導体素子等の小型電子部品を搭載することに鑑みて、小型電子部品搭載用非貫通穴を、層間接続用の非貫通穴よりも格段に大きい断面寸法(例えば、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴)で形成した場合でも、小型電子部品搭載用非貫通穴への接着剤の流出を防止又は抑制できる。
In the method for manufacturing an electronic component mounting wiring board according to the present invention, the trapezoidal protrusion is formed by half-etching a metal pad or a metal layer formed on the substrate or pattern plating on the metal pad or the metal layer. Since it forms, the base-shaped protrusion which has a flat end surface can be formed easily. As a result, it is possible to easily realize mounting of a surface mount type small electronic component such as a semiconductor element.
If it is a configuration that forms a trapezoidal protrusion by half-etching or pattern plating, for example, by using a mask such as a perforated film, a resist resin, etc., the trapezoidal protrusion having an end surface of a desired shape and size can be reliably obtained. Obtainable. The size of the end face of the trapezoidal protrusion can be easily controlled. In view of the cross-sectional size (cross-sectional dimension) of the through hole in the wiring board, by setting the size of the end surface of the trapezoidal protrusion, it is possible to prevent the adhesive from flowing out to the non-through hole for mounting a small electronic component or Suppression can be realized. In view of mounting small electronic components such as semiconductor elements, the cross-sectional dimensions of the non-through holes for mounting small electronic components are much larger than the non-through holes for interlayer connection (for example, round holes with a diameter of 0.8 mm or more) Alternatively, even when formed with a square hole having a side length of 0.8 mm or more, it is possible to prevent or suppress the outflow of the adhesive to the non-through hole for mounting a small electronic component.

本発明によれば、小型電子部品搭載用非貫通穴の穴底に小型電子部品を搭載するための平坦面(電子部品搭載面)を確実に確保でき、半導体素子等の面実装タイプの小型電子部品の搭載を実現できる。
また、台状突部によって接着剤層から小型電子部品搭載用非貫通穴内への接着剤の流出を防止あるいは抑制することができ、電子部品搭載面に小型電子部品を搭載する作業に、小型電子部品搭載用非貫通穴内に流入した接着剤が影響を与えることを防止できる。その結果、本発明では、簡単な構成により、低コストで、接着剤層から小型電子部品搭載用非貫通穴内に流入する接着剤が、電子部品搭載面に小型電子部品を搭載する作業に影響を与えるといった不都合を防止できる。
また、接着剤層から小型電子部品搭載用非貫通穴内に流入した接着剤が、電子部品搭載面に小型電子部品を搭載する作業に影響を与えるといった不都合を回避するために、電子部品搭載面を無用に大型化して、小型電子部品搭載用非貫通穴内面と小型電子部品との間の距離を大きく確保するといった対策が不要となり、電子部品搭載用配線基板の大型化を回避できる。
According to the present invention, a flat surface (electronic component mounting surface) for mounting a small electronic component on the bottom of a non-through hole for mounting a small electronic component can be reliably secured, and a surface mount type small electronic device such as a semiconductor element can be secured. Mounting of parts can be realized.
Also, the trapezoidal protrusion can prevent or suppress the outflow of the adhesive from the adhesive layer into the non-through hole for mounting the small electronic component, so that the small electronic component can be used for mounting the small electronic component on the electronic component mounting surface. It is possible to prevent the adhesive that has flowed into the non-through hole for component mounting from affecting. As a result, in the present invention, the adhesive that flows from the adhesive layer into the non-through hole for mounting the small electronic component has an influence on the operation of mounting the small electronic component on the electronic component mounting surface at a low cost with a simple configuration. The inconvenience of giving can be prevented.
In addition, in order to avoid the disadvantage that the adhesive flowing into the non-through hole for mounting the small electronic component from the adhesive layer affects the work of mounting the small electronic component on the electronic component mounting surface, Measures such as unnecessarily increasing the size and ensuring a large distance between the inner surface of the non-through hole for mounting the small electronic component and the small electronic component are not required, and an increase in the size of the wiring board for mounting the electronic component can be avoided.

以下、本発明を実施した電子部品搭載用配線基板の製造方法、電子部品搭載用配線基板、電子部品付き配線基板について、図面を参照して説明する。   Hereinafter, a method for manufacturing an electronic component mounting wiring board, an electronic component mounting wiring board, and an electronic component-equipped wiring board embodying the present invention will be described with reference to the drawings.

(第1実施形態)
まず、本発明の第1実施形態を説明する。
図1は、本発明に係る1実施形態の電子部品搭載用配線基板10(以下、単に、搭載用配線基板とも言う)の構造を示す図、図2(a)、(b)は前記搭載用配線基板を構成する配線基板の製造手法の一例を説明する図、図3(a)、(b)、(c)、図4は本発明に係る1実施形態の電子部品搭載用配線基板10の製造方法を説明する図、図5は図1の搭載用配線基板10の小型電子部品搭載用非貫通穴15(キャビティ部。以下、単に、非貫通穴とも言う)の内面にめっき層191を形成した構成の電子部品搭載用配線基板10A(以下、単に、搭載用配線基板とも言う)を示す図である。
なお、本明細書においては、図1〜図5において、上側を上、下側を下として説明するが、これは本発明の構成要素の相対関係を簡単に説明するために便宜的に「上」、「下」を規定したものであり、本発明を実施する場合の製造時や使用時の方向を限定するものではない。
(First embodiment)
First, a first embodiment of the present invention will be described.
FIG. 1 is a view showing a structure of an electronic component mounting wiring board 10 (hereinafter also simply referred to as a mounting wiring board) according to an embodiment of the present invention, and FIGS. FIGS. 3A, 3B, 3C, and 4 are diagrams for explaining an example of a method for manufacturing a wiring board constituting the wiring board. FIGS. FIG. 5 is a diagram for explaining a manufacturing method, and FIG. 5 is a plan view of forming a plating layer 191 on the inner surface of a non-through hole 15 for mounting a small electronic component of the mounting wiring board 10 of FIG. FIG. 6 is a diagram showing an electronic component mounting wiring board 10A (hereinafter also simply referred to as a mounting wiring board) having the above-described configuration.
In this specification, in FIGS. 1 to 5, the upper side is described as the upper side, and the lower side is set as the lower side. This is simply described as “upper” for the sake of simplicity. ”And“ below ”are defined, and do not limit the direction during production or use when the present invention is carried out.

図1において符号11は基板、12は配線基板、13は接着剤層である。
また、符号14は基板11に設けられた金属パッドである。
前記搭載用配線基板10は、基板11と配線基板12とを接着剤層13を介して接着し、配線基板12を貫通する貫通穴12cと接着剤層13を貫通する開口部13aとが連通してなる連通穴16(図4参照)内に、金属パッド14に突設されている台状突部14aを収納し、連通穴16内に前記台状突部14aを穴底とする非貫通穴15を確保した構成になっている。
In FIG. 1, reference numeral 11 is a substrate, 12 is a wiring substrate, and 13 is an adhesive layer.
Reference numeral 14 denotes a metal pad provided on the substrate 11.
In the mounting wiring board 10, the board 11 and the wiring board 12 are bonded via an adhesive layer 13, and a through hole 12 c that penetrates the wiring board 12 and an opening 13 a that penetrates the adhesive layer 13 communicate with each other. The base-like protrusion 14a protruding from the metal pad 14 is accommodated in the communication hole 16 (see FIG. 4), and the non-through hole has the base-like protrusion 14a as the bottom of the hole in the communication hole 16. 15 is secured.

非貫通穴15に収納する小型電子部品18としては、例えば、発光素子、トランジスタ、電界効果トランジスタ(FET)、サイリスタ(SCR)等の半導体素子や、抵抗素子等を挙げることができる。
この搭載用配線基板10は、小型電子部品18を、台状突部14aの基板11からの突出先端に形成された平坦な端面14b(平坦面)に面実装して搭載される。
Examples of the small electronic component 18 accommodated in the non-through hole 15 include a semiconductor element such as a light emitting element, a transistor, a field effect transistor (FET), and a thyristor (SCR), a resistance element, and the like.
The mounting wiring board 10 is mounted by mounting the small electronic component 18 on a flat end surface 14b (flat surface) formed at the leading end of the base protrusion 14a protruding from the substrate 11.

ここでは小型電子部品18として発光素子を採用した構成を例示する。以下、小型電子部品18を、符号18を用いて発光素子18と称して説明する場合がある。
但し、小型電子部品18としては発光素子以外のものも採用可能であり、発光素子に代えて、例えば、既述のトランジスタ、電界効果トランジスタ(FET)、サイリスタ(SCR)等の半導体素子、抵抗素子を用いても良いことは言うまでもない。
Here, a configuration in which a light emitting element is employed as the small electronic component 18 is illustrated. Hereinafter, the small electronic component 18 may be referred to as a light emitting element 18 using the reference numeral 18 in some cases.
However, as the small electronic component 18, a component other than the light emitting element can be used. Instead of the light emitting element, for example, a semiconductor element such as the above-described transistor, a field effect transistor (FET), a thyristor (SCR), or a resistive element. It goes without saying that can be used.

発光素子18は、非貫通穴15の片端(台状突部14aとは反対の側の端部)の開口部に臨む側に発光部を有し、この発光部から、基板11とは反対の側へ出力光を出射する。   The light emitting element 18 has a light emitting portion on the side facing the opening of one end of the non-through hole 15 (the end opposite to the trapezoidal protrusion 14 a), and the light emitting portion is opposite to the substrate 11. Output light to the side.

基板11は、電気絶縁性の絶縁樹脂板であり、例えば、プリント配線板用ガラス布エポキシ基板等を使用できる。
また、基板11としては、その両面あるいは片面に、配線が形成されているものも採用可能である。
The substrate 11 is an electrically insulating insulating resin plate, and for example, a glass cloth epoxy substrate for a printed wiring board can be used.
Moreover, as the board | substrate 11, what has wiring formed in the both surfaces or one side is also employable.

この基板11の片面には、金属パッド14が設けられている。
前記金属パッド14は、基板11の片面に沿って延在する層状に形成されている。金属パッド14の中央部には、台状突部14aが突設されている。
以下、台状突部14aが突設された金属パッド14付きの基板11を、符号11Aを付して突部付き基板とも言う。
A metal pad 14 is provided on one surface of the substrate 11.
The metal pad 14 is formed in a layer extending along one surface of the substrate 11. A trapezoidal protrusion 14 a is projected from the center of the metal pad 14.
Hereinafter, the board | substrate 11 with the metal pad 14 in which the base-shaped protrusion 14a was protrudingly provided is also called the board | substrate with a protrusion by attaching | subjecting the code | symbol 11A.

台状突部14aは、金属パッド14から基板11とは反対の側に突出しており、その突出先端側に平坦な端面14bを有している。ここで、平坦な端面14b、とは、基板11の両面に沿う平面状であることを意味する。換言すれば、配線基板12の貫通穴12c、搭載用配線基板10の非貫通穴15の中心軸線に直交する平面である。
電子部品搭載面として機能する端面14bが平坦であることは、この端面14bに面実装される発光素子18の姿勢、出射光の出射方向の設定に有利であり、所望の出射方向を確実に得ることができる。
The trapezoidal protrusion 14a protrudes from the metal pad 14 on the side opposite to the substrate 11, and has a flat end surface 14b on the protruding tip side. Here, the flat end surface 14 b means a flat shape along both surfaces of the substrate 11. In other words, it is a plane orthogonal to the central axis of the through hole 12 c of the wiring board 12 and the non-through hole 15 of the mounting wiring board 10.
The flat end surface 14b functioning as the electronic component mounting surface is advantageous for setting the posture of the light emitting element 18 mounted on the end surface 14b and the emitting direction of the emitted light, and reliably obtaining a desired emitting direction. be able to.

台状突部14aは、金属パッド14に形成された金属製の突起である。
図1に例示する台状突部14aは、具体的には、金属パッド14の中央部の台状突部14aの形成部位の周囲を例えばハーフエッチング(後述)等によって薄くして、金属パッド14の一部を突起状に形成した部分である。
The trapezoidal protrusion 14 a is a metal protrusion formed on the metal pad 14.
Specifically, the base-like protrusion 14a illustrated in FIG. 1 is thinned by, for example, half etching (described later) or the like around the portion where the base-like protrusion 14a in the center of the metal pad 14 is formed. This is a part in which a part of is formed in a protruding shape.

図2(b)に示すように、配線基板12は、電気絶縁性の絶縁樹脂層12aの両面又は片面(図示例では両面)に配線12bが形成されたものである。また、この配線基板12には、搭載用配線基板10に非貫通穴15を確保するための貫通穴12cが形成されている。   As shown in FIG. 2B, the wiring board 12 has wirings 12b formed on both surfaces or one surface (both surfaces in the illustrated example) of an electrically insulating resin layer 12a. Further, the wiring board 12 is formed with a through hole 12 c for securing the non-through hole 15 in the mounting wiring board 10.

この配線基板12を得るには、例えば、図2(a)、(b)に示すように、絶縁樹脂層12aの両面に銅箔12dが被着されてなる銅張り基板12e(両面銅張り基板)の前記銅箔12dをパターンエッチングして両面の配線12bを形成する。貫通穴12cは、配線基板12に接着剤層13を積層した状態(図4参照)でドリル等を用いて配線基板12と接着剤層13とを貫通する穴を開けることで形成するか、あるいは、接着剤層13を設ける前の配線基板12にドリル等によって形成する。   In order to obtain the wiring substrate 12, for example, as shown in FIGS. 2A and 2B, a copper-clad substrate 12e (a double-sided copper-clad substrate) in which a copper foil 12d is deposited on both surfaces of an insulating resin layer 12a. The copper foil 12d is subjected to pattern etching to form wirings 12b on both sides. The through hole 12c is formed by drilling a hole that penetrates the wiring board 12 and the adhesive layer 13 using a drill or the like in a state where the adhesive layer 13 is laminated on the wiring board 12 (see FIG. 4), or The wiring layer 12 is formed with a drill or the like before the adhesive layer 13 is provided.

絶縁樹脂層12aとしては、例えば、プリント配線板用ガラス布エポキシ基板、更に発光素子18の出力光の反射率を向上させるために酸化チタン等の白色顔料を充填剤として加えた白色ガラス布エポキシ基板等を使用できる。
なお、図2(a)、(b)以外の図面では、絶縁樹脂層12a、配線12bの図示を省略して、配線基板12の図示を簡略化している。
As the insulating resin layer 12a, for example, a glass cloth epoxy substrate for a printed wiring board, and a white glass cloth epoxy substrate to which a white pigment such as titanium oxide is added as a filler in order to improve the reflectance of the output light of the light emitting element 18 is used. Etc. can be used.
In the drawings other than FIGS. 2A and 2B, the insulating resin layer 12a and the wiring 12b are not shown, and the wiring board 12 is simplified.

基板11、配線基板12の絶縁樹脂層12aの厚さは50μm〜1.6mmの範囲であり、非貫通穴15の深さや製品(搭載用配線基板10、電子部品付き配線基板19)全体の剛性等の点から適宜厚さが選択される。   The thickness of the insulating resin layer 12a of the substrate 11 and the wiring substrate 12 is in the range of 50 μm to 1.6 mm, and the depth of the non-through hole 15 and the rigidity of the entire product (the wiring substrate 10 for mounting and the wiring substrate 19 with electronic components). The thickness is appropriately selected from the above points.

接着剤層13の材料としては、例えば、エポキシ系接着剤、ポリアミドイミド系接着剤、エポキシ変性ポリアミド系接着剤であり、接着剤層13としては、これら材料の内のいずれかによって形成された接着フィルム(Bステージフィルム)等を採用できる。   Examples of the material of the adhesive layer 13 include an epoxy adhesive, a polyamideimide adhesive, and an epoxy-modified polyamide adhesive, and the adhesive layer 13 is an adhesive formed by any of these materials. A film (B stage film) or the like can be employed.

配線基板12の貫通穴12c及び接着剤層13の開口部13aは、発光素子(例えば発光ダイオード)といった半導体素子等の面実装タイプの小型電子部品18の非貫通穴15への収納、搭載に鑑みて、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることが好ましい。   The through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 are considered in view of housing and mounting in a non-through hole 15 of a surface mount type small electronic component 18 such as a semiconductor element such as a light emitting element (for example, a light emitting diode). Thus, a round hole having a diameter of 0.8 mm or more or a square hole having a side length of 0.8 mm or more is preferable.

配線基板12の貫通穴12c及び接着剤層13の開口部13aは、その断面(開口部13aの中心軸線に垂直の断面。開口部13aの断面を指す場合、以下も同じ)が、台状突部14aの端面14bよりも僅かに大きい大きさに形成されている。換言すれば、台状突部14aの端面14bは、開口部13a内に収納可能な大きさに形成される。図1に例示した搭載用配線基板10にあっては、台状突部14aが接着剤層13の開口部13a内に収納され、台状突部14aの端面14bは、接着剤層13の開口部13aの中心軸線方向中央部に位置している。   The through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 have a cross section (a cross section perpendicular to the central axis of the opening 13a. The same applies to the cross section of the opening 13a). It is formed in a size slightly larger than the end surface 14b of the portion 14a. In other words, the end surface 14b of the trapezoidal protrusion 14a is formed in a size that can be stored in the opening 13a. In the mounting wiring substrate 10 illustrated in FIG. 1, the trapezoidal protrusion 14 a is accommodated in the opening 13 a of the adhesive layer 13, and the end surface 14 b of the trapezoidal protrusion 14 a is the opening of the adhesive layer 13. It is located at the center in the central axis direction of the portion 13a.

図1に例示した搭載用配線基板10の非貫通穴15は、具体的には、配線基板12の貫通穴12cと、接着剤層13の開口部13aの中心軸線方向において台状突部14aが存在しない部分(つまり、図1において、台状突部14aの端面14bよりも上側の部分)とによって構成されている。台状突部14aの端面14bが、非貫通穴15の穴底面となっている。   Specifically, the non-through hole 15 of the mounting wiring board 10 illustrated in FIG. 1 has a trapezoidal protrusion 14 a in the central axis direction of the through hole 12 c of the wiring board 12 and the opening 13 a of the adhesive layer 13. It is comprised by the part which does not exist (that is, the part above the end surface 14b of the base-like protrusion 14a in FIG. 1). The end surface 14 b of the trapezoidal protrusion 14 a is a hole bottom surface of the non-through hole 15.

但し、本発明においては、搭載用配線基板10の非貫通穴15としては、上述のように、台状突部14aの端面14bが、接着剤層13の開口部13a内に位置する構成に限定されない。例えば、台状突部14aの端面14bが、配線基板12と接着剤層13との境界に位置するか、あるいは、台状突部14aの基板11からの突出先端が配線基板12の貫通穴12c内に位置して、非貫通穴15が、配線基板12の貫通穴12cのみによって形成された構成であっても良い。   However, in the present invention, the non-through hole 15 of the mounting wiring board 10 is limited to a configuration in which the end surface 14b of the trapezoidal protrusion 14a is located in the opening 13a of the adhesive layer 13 as described above. Not. For example, the end surface 14b of the trapezoidal protrusion 14a is located at the boundary between the wiring substrate 12 and the adhesive layer 13, or the protruding tip of the trapezoidal protrusion 14a from the substrate 11 is the through hole 12c of the wiring substrate 12. A configuration in which the non-through hole 15 is formed only by the through hole 12 c of the wiring board 12 may be employed.

電子部品付き配線基板19は、小型電子部品18を、搭載用配線基板10の台状突部14aの端面14に接着剤を用いた接着等によって固定して面実装することで組み立てることができる。
台状突部14aに搭載した小型電子部品18は、ワイヤボンディングによって、配線基板12の配線12b(但し、配線基板12の接着剤層13とは反対の側の面に形成された配線12b)と電気的に接続する。図中、符号193はボンディングワイヤである。
The electronic component-attached wiring board 19 can be assembled by surface-mounting the small electronic component 18 by fixing it to the end face 14 of the mount-like protrusion 14a of the mounting wiring board 10 by bonding using an adhesive or the like.
A small electronic component 18 mounted on the trapezoidal protrusion 14a is connected to the wiring 12b of the wiring board 12 (however, the wiring 12b formed on the surface opposite to the adhesive layer 13 of the wiring board 12) by wire bonding. Connect electrically. In the figure, reference numeral 193 denotes a bonding wire.

次に、本発明に係る1実施形態の電子部品搭載用配線基板10の製造方法を説明する。
この製造方法は、前記基板11に金属パッド14を設ける工程(以下、金属パッド形成工程とも言う。図3(a)、(b)参照)と、前記金属パッド14の外周部をハーフエッチングしてエッチング部分の内側に台状突部14aを形成する工程(図3(b)、(c)参照。台状突部形成工程。以下、ハーフエッチング工程とも言う。)と、台状突部14aを形成した基板11(突部付き基板11A)と貫通穴12cを持つ配線基板12とを接着剤層13を介して接着する工程(以下、接着工程とも言う。図4参照)とを具備している。
接着工程では、前記配線基板12の前記貫通穴12cと前記接着剤層13の開口部13aとが互いに連通してなる連通穴16に前記台状突部14aを収納し、前記連通穴16を前記突部付き基板11Aによって非貫通とすることで前記非貫通穴15を得る。これにより、非貫通穴15を有する搭載用配線基板10が得られる。
Next, a method for manufacturing the electronic component mounting wiring board 10 according to the embodiment of the present invention will be described.
In this manufacturing method, a metal pad 14 is provided on the substrate 11 (hereinafter also referred to as a metal pad forming process; see FIGS. 3A and 3B), and the outer periphery of the metal pad 14 is half-etched. A step of forming a trapezoidal protrusion 14a on the inner side of the etched portion (see FIGS. 3B and 3C, a trapezoidal protrusion forming step, hereinafter also referred to as a half-etching step), and a trapezoidal protrusion 14a. A step of bonding the formed substrate 11 (substrate 11A with protrusions) and the wiring substrate 12 having the through holes 12c through the adhesive layer 13 (hereinafter also referred to as an adhesion step; see FIG. 4). .
In the bonding step, the base protrusion 14a is accommodated in a communication hole 16 in which the through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 communicate with each other, and the communication hole 16 is The non-penetrating hole 15 is obtained by making the non-penetrating by the substrate with projection 11A. Thereby, the mounting wiring board 10 having the non-through holes 15 is obtained.

図3(a)、(b)に示す金属パッド形成工程では、例えば、絶縁樹脂層である基板11の両面に銅箔11b(電解銅箔)が被着されてなる銅張り基板111について、この銅張り基板111の銅箔11bをパターンエッチング法によりパターニングして、基板11の片面(片方の主面)に金属パッド14を形成する。これにより、金属パッド14が形成された基板11(以下、パッド付き基板112とも言う)を得る。   In the metal pad forming process shown in FIGS. 3A and 3B, for example, a copper-clad substrate 111 in which a copper foil 11b (electrolytic copper foil) is deposited on both surfaces of a substrate 11 that is an insulating resin layer. The copper foil 11b of the copper-clad substrate 111 is patterned by a pattern etching method to form a metal pad 14 on one side (one main surface) of the substrate 11. Thereby, the substrate 11 on which the metal pad 14 is formed (hereinafter, also referred to as a padded substrate 112) is obtained.

金属パッド14は、基板11の主面において、前記配線基板12の貫通穴12cの断面よりもやや大きいサイズ、つまり、基板11の主面において配線基板12の貫通穴12cの断面よりも大きい面積の領域に層状に形成する。また、基板11の主面における金属パッド14の形成位置、形成範囲は、台状突部14aを形成した基板11(突部付き基板11A)と配線基板12とを接着剤層13を介して接着して搭載用配線基板10を組み立てたときに、基板11の主面における前記配線基板12の貫通穴12aの延長上に位置する領域全体を含み、しかも、該領域の外周全周にわたって当該領域よりも外側に張り出す部分を有するようにする。
金属パッド14の形状(図1、図3(a)、(b)において、上側から見た平面視形状)は、特には限定は無いが、例えば円形あるいは矩形とする。また、金属パッド14のサイズ(基板11の主面における形成範囲)は、配線基板12の貫通穴12aの断面の面積の120〜1000%であることが好ましく、120〜400%程度であることがより好ましい。
The metal pad 14 has a size slightly larger than the cross section of the through hole 12c of the wiring board 12 on the main surface of the substrate 11, that is, an area larger than the cross section of the through hole 12c of the wiring board 12 on the main surface of the substrate 11. A layer is formed in the region. In addition, the metal pad 14 is formed on the main surface of the substrate 11 in the formation position and the formation range is that the substrate 11 (substrate 11A with protrusions) on which the base protrusion 14a is formed and the wiring substrate 12 are bonded via the adhesive layer 13. Then, when the mounting wiring board 10 is assembled, the entire area located on the extension of the through hole 12a of the wiring board 12 on the main surface of the board 11 is included, and moreover, from the area over the entire outer periphery of the area Also have a part protruding outward.
The shape of the metal pad 14 (planar shape seen from above in FIGS. 1, 3A and 3B) is not particularly limited, but is, for example, circular or rectangular. Further, the size of the metal pad 14 (formation range on the main surface of the substrate 11) is preferably 120 to 1000% of the cross-sectional area of the through hole 12a of the wiring substrate 12, and is preferably about 120 to 400%. More preferred.

なお、銅箔11bのパターニングの際に、金属パッド14とともに、基板11の片面あるいは両面に配線(配線パターン)を形成しても良い。
また、基板11の片面の金属パッド14のみを形成する点では片面銅張り基板を用いることも可能である。
In the patterning of the copper foil 11b, wiring (wiring pattern) may be formed on one side or both sides of the substrate 11 together with the metal pad 14.
In addition, a single-sided copper-clad substrate can be used in that only the metal pad 14 on one side of the substrate 11 is formed.

図3(c)に示すように、台状突部形成工程(ハーフエッチング工程)では、パターンエッチング法によって、金属パッド14の内、その中央部の台状突部14aの形成部位を除く部分を薄くする(ハーフエッチング)。これにより、金属パッド14に段差を形成する。その結果、エッチングした部分の内側に台状突部14aが形成される。
台状突部14aが形成されることで突部付き基板11Aが得られる。
As shown in FIG. 3C, in the trapezoidal protrusion forming step (half-etching step), a portion of the metal pad 14 excluding the formation portion of the central protrusion 14a is formed by pattern etching. Thin (half etching). Thereby, a step is formed in the metal pad 14. As a result, a trapezoidal protrusion 14a is formed inside the etched portion.
By forming the table-like protrusion 14a, the substrate with protrusion 11A is obtained.

台状突部14aは、前記配線基板12の前記貫通穴12cの断面と略同等の大きさの平坦な端面14bを持つ突起状に形成する。
但し、端面14bは、貫通穴12c内に収納可能な大きさとする。
台状突部14aは、その端面14bの形状及びサイズ(大きさ)が配線基板12の貫通穴12cの断面と一致するか、端面14bの大きさが配線基板12の貫通穴12cの断面よりも僅かに小さくなっているようにする。
The trapezoidal protrusion 14 a is formed in a protruding shape having a flat end surface 14 b having a size substantially equal to the cross section of the through hole 12 c of the wiring board 12.
However, the end surface 14b has a size that can be accommodated in the through hole 12c.
The trapezoidal protrusion 14 a has a shape and size (size) of the end face 14 b that matches the cross section of the through hole 12 c of the wiring board 12, or the size of the end face 14 b is larger than the cross section of the through hole 12 c of the wiring board 12. Make it slightly smaller.

台状突部14aの端面14bが配線基板12の貫通穴12cの断面よりも僅かに小さい大きさである場合、前記端面14bの形状は、配線基板12の貫通穴12cの断面と同じ形状であることが好ましい。この場合、台状突部14aの端面14bの形状が配線基板12の貫通穴12c断面形状と異なる場合に比べて、台状突部14aの外周と配線基板12との間に局所的に大きい隙間が発生するといった不都合が生じにくくなるため、接着剤層13から非貫通穴15内への接着剤の流出の防止、抑制に有利である。
例えば、丸穴である貫通穴12cに対してその直径の90%以上の直径を持つ円形、角穴である貫通穴12cに対して一辺の長さが貫通穴12cの90%以上である角形に形成する。台状突部14aは、その端面14bが、貫通穴12cの断面寸法よりも10%だけ小さい寸法、あるいは、それよりも大きい大きい寸法(つまり貫通穴12cの断面の90%以上の相似形)に形成する。
When the end surface 14b of the trapezoidal protrusion 14a is slightly smaller than the cross section of the through hole 12c of the wiring substrate 12, the shape of the end surface 14b is the same as the cross section of the through hole 12c of the wiring substrate 12. It is preferable. In this case, compared to the case where the shape of the end surface 14b of the trapezoidal protrusion 14a is different from the cross-sectional shape of the through hole 12c of the wiring board 12, a locally large gap is formed between the outer periphery of the trapezoidal protrusion 14a and the wiring board 12. This is advantageous in preventing and suppressing the outflow of the adhesive from the adhesive layer 13 into the non-through hole 15.
For example, a circular hole having a diameter of 90% or more of the diameter of the through hole 12c, which is a round hole, or a square having a length of one side of the through hole 12c, which is a square hole, of 90% or more of the through hole 12c. Form. The end surface 14b of the trapezoidal protrusion 14a has a size that is 10% smaller than the cross-sectional dimension of the through hole 12c, or a larger dimension that is larger than that (that is, a similar shape of 90% or more of the cross section of the through hole 12c). Form.

金属パッド14における台状突部14aの突出寸法(ここでは外周ランド部14dからの突出寸法)は、接着剤層13の厚さ(但し、基板11と配線基板12とを接着するための加圧、加熱前の厚さ)の10%以上、より好ましくは50%以上であることが好ましい。
なお、接着剤層13の厚さは15μm〜100μmの間から選択される。また、厚さが30μm〜70μmの範囲のものが好適である。
The protrusion dimension of the base protrusion 14a on the metal pad 14 (here, the protrusion dimension from the outer peripheral land part 14d) is the thickness of the adhesive layer 13 (however, pressure applied to bond the substrate 11 and the wiring substrate 12) , Thickness before heating) is preferably 10% or more, more preferably 50% or more.
Note that the thickness of the adhesive layer 13 is selected from 15 μm to 100 μm. Moreover, the thing of the range whose thickness is 30 micrometers-70 micrometers is suitable.

また、台状突部14aの突出寸法は、例えば、基板11と配線基板12とを接着剤層13を介して貼り合わせて接着したときに、台状突部14aの端面14bが接着剤層13の開口部13a内あるいは接着剤層13と配線基板12との境界に配置され、台状突部14aが配線基板12の貫通穴12c内に入り込まないように設定する。この場合、配線基板12の貫通穴12c全体を小型電子部品18を収納するための非貫通穴15として活用できる。   The protrusion dimension of the trapezoidal protrusion 14a is such that, for example, when the substrate 11 and the wiring board 12 are bonded and bonded together via the adhesive layer 13, the end surface 14b of the trapezoidal protrusion 14a is bonded to the adhesive layer 13. It is set so that the trapezoidal protrusion 14a does not enter the through hole 12c of the wiring board 12 in the opening 13a or at the boundary between the adhesive layer 13 and the wiring board 12. In this case, the entire through hole 12c of the wiring board 12 can be used as the non-through hole 15 for accommodating the small electronic component 18.

台状突部14aは、端面14bが配線基板12の貫通穴12c内に位置する突出寸法であっても良いが、接着剤層13の厚さに鑑みて、貫通穴12cの長さ(中心軸線方向の寸法)の80%以上を非貫通穴15として利用できるように、突出寸法を設定することが好ましい。   Although the protrusion 14a may have a protruding dimension in which the end surface 14b is located in the through hole 12c of the wiring board 12, the length of the through hole 12c (the central axis) in consideration of the thickness of the adhesive layer 13 The projecting dimension is preferably set so that 80% or more of the dimension in the direction) can be used as the non-through hole 15.

接着工程では、台状突部14aを形成した基板11(突部付き基板11A)と貫通穴12cを形成した配線基板12とを接着剤層13を介して重ねて、加圧加熱によって接着(貼り合わせ)して、一体化する。
接着剤層13は、基板11の台状突部14aが突設された側の面のみならず、前記金属パッド14の内の台状突部22の外側にフランジ状に張り出した部分である外周ランド部14dにも重ね合わせるようにして接着される。
In the bonding step, the substrate 11 (substrate 11A with protrusions) on which the base-like protrusions 14a are formed and the wiring substrate 12 on which the through holes 12c are formed are stacked via the adhesive layer 13 and bonded (bonded) by pressure heating. And integrate.
The adhesive layer 13 is not only the surface of the substrate 11 on which the base-like protrusion 14a is protruded, but also the outer periphery that is a portion that protrudes in the form of a flange on the outside of the base-like protrusion 22 in the metal pad 14. It is also bonded so as to overlap the land portion 14d.

基板11(突部付き基板11A)と配線基板12とは、図4に示すように、配線基板12に接着フィルム(接着剤層13)を貼合した後、この接着フィルムを介して互いに接着するか、あるいは、基板11に接着フィルム(接着剤層13)を貼合した後、この接着フィルムを介して互いに接着することが作業性の点で好ましい。
また、接着剤層13は、例えば、配線基板12あるいは基板11への樹脂材料の塗布によって形成しても良い。
As shown in FIG. 4, the substrate 11 (substrate 11A with protrusions) and the wiring substrate 12 are bonded to each other through the adhesive film after an adhesive film (adhesive layer 13) is bonded to the wiring substrate 12. Or after bonding an adhesive film (adhesive layer 13) to the substrate 11, it is preferable from the viewpoint of workability to adhere to each other via this adhesive film.
Further, the adhesive layer 13 may be formed, for example, by applying a resin material to the wiring substrate 12 or the substrate 11.

接着フィルム、塗膜のいずれの場合も、接着剤層13には、断面形状及び大きさが配線基板12の貫通穴12cの断面と同等の開口部13a(貫通穴)を形成する。
そして、搭載用配線基板10の組み立て(製造)にあっては、基板11と配線基板12とを接着剤層13を介して貼り合わせる際に、接着剤層13の開口部13aを配線基板12の貫通穴12cに位置合わせして、前記開口部13aと前記貫通穴12cとが連続する一本の穴を形成するようにする(一例として図4参照)。
In both cases of the adhesive film and the coating film, the adhesive layer 13 is formed with an opening 13a (through hole) having the same cross-sectional shape and size as the cross section of the through hole 12c of the wiring board 12.
In assembling (manufacturing) the mounting wiring substrate 10, when the substrate 11 and the wiring substrate 12 are bonded together via the adhesive layer 13, the opening 13 a of the adhesive layer 13 is formed on the wiring substrate 12. In alignment with the through hole 12c, a single hole in which the opening 13a and the through hole 12c are continuous is formed (see FIG. 4 as an example).

配線基板12に設けた接着剤層13を利用して、配線基板12と基板11との接着を行う場合は、例えば、配線基板12の貫通穴12cのドリル加工の際に、ドリルを接着剤層13に貫通させて貫通穴12cとともに接着剤層13の開口部13aも形成することで、接着剤層13に貫通穴12cに形状及びサイズが一致する開口部13aを容易に形成できる。
但し、配線基板12に、予め開口部13aを形成しておいた接着フィルムを貼り合わせることも可能である。
When bonding the wiring substrate 12 and the substrate 11 using the adhesive layer 13 provided on the wiring substrate 12, for example, when drilling the through hole 12c of the wiring substrate 12, the drill is used as the adhesive layer. By forming the opening 13a of the adhesive layer 13 together with the through hole 12c through the through hole 13, the opening 13a having the same shape and size as the through hole 12c can be easily formed in the adhesive layer 13.
However, an adhesive film in which the opening 13a is formed in advance can be bonded to the wiring board 12.

基板11に設けた接着剤層13を利用して、配線基板12と基板11との接着を行う手順の場合は、予め開口部13aを形成しておいた接着フィルムの基板11への貼り合わせなどにより、基板11に積層した接着剤層13の開口部13a内側に台状突部14aが配置された状態とした後、接着剤層13を介した基板11と配線基板12との貼り合わせを行う。   In the case of a procedure for bonding the wiring substrate 12 and the substrate 11 using the adhesive layer 13 provided on the substrate 11, an adhesive film having an opening 13 a formed thereon is bonded to the substrate 11. Thus, after the base-like protrusion 14a is disposed inside the opening 13a of the adhesive layer 13 laminated on the substrate 11, the substrate 11 and the wiring substrate 12 are bonded together via the adhesive layer 13. .

接着工程にて、基板11(突部付き基板11A)と配線基板12との接着が完了すると、前記配線基板12の前記貫通穴12cと前記接着剤層13の開口部13aとが互いに連通してなる連通穴16の片端が突部付き基板11Aによって塞がれて非貫通となる。これにより、小型電子部品搭載用非貫通穴15が得られる。   When the bonding between the substrate 11 (substrate 11A with protrusions) and the wiring substrate 12 is completed in the bonding step, the through hole 12c of the wiring substrate 12 and the opening 13a of the adhesive layer 13 communicate with each other. One end of the communication hole 16 is blocked by the protruding substrate 11A and becomes non-penetrating. Thereby, the non-through hole 15 for mounting a small electronic component is obtained.

接着工程においては、突部付き基板11Aと配線基板12とを接着剤層13を介して接着するとき、前記配線基板12の前記貫通穴12cと前記接着剤層13の開口部13aとが互いに連通してなる連通穴16内に台状突部14aを収納する。
このとき、配線基板12の接着剤層13側の面における貫通穴12cの開口部の口縁部と台状突部14a(詳細には台状突部14aの外周面(外周の側面)、あるいは該外周面と端面14bとの境界の稜線)とは、互いに当接するか、あるいは、接近配置される。このため、この接着工程の加圧加熱による接着剤層13から非貫通穴15内への接着剤の流出(染み出し)を防止あるいは抑制することができる。その結果、台状突部14aの端面14bへの小型電子部品18の搭載作業に接着剤が影響することを防止でき、小型電子部品18の搭載作業を効率良く行える。
In the bonding step, when the substrate with protrusions 11A and the wiring substrate 12 are bonded via the adhesive layer 13, the through hole 12c of the wiring substrate 12 and the opening 13a of the adhesive layer 13 communicate with each other. The trapezoidal protrusion 14a is accommodated in the communication hole 16 formed as described above.
At this time, the opening edge of the through hole 12c on the surface of the wiring board 12 on the adhesive layer 13 side and the trapezoidal protrusion 14a (specifically, the outer peripheral surface (the outer peripheral side surface) of the trapezoidal protrusion 14a, or Ridgeline at the boundary between the outer peripheral surface and the end surface 14b) or abut each other. For this reason, it is possible to prevent or suppress the outflow (exudation) of the adhesive from the adhesive layer 13 into the non-through hole 15 due to the pressure heating in the adhesion process. As a result, it is possible to prevent the adhesive from affecting the mounting operation of the small electronic component 18 on the end surface 14b of the base protrusion 14a, and the mounting operation of the small electronic component 18 can be performed efficiently.

また、この製造方法によれば、前記台状突部14aとして、前記端面14bから前記基板11における該台状突部14aの突出基端側(基板11側)へ行くにしたがって、その外周面14cが外側に拡がるテーパ形状になっているものを容易に得ることができる。
台状突部14aの外周面14cは、前記金属パッド14の外周ランド部14dから斜めに立ち上がる傾斜面になっている。
In addition, according to this manufacturing method, the outer peripheral surface 14c of the trapezoidal protrusion 14a extends from the end surface 14b toward the protruding base end side (substrate 11 side) of the trapezoidal protrusion 14a in the substrate 11. It is possible to easily obtain a taper that extends outward.
The outer peripheral surface 14c of the trapezoidal protrusion 14a is an inclined surface that rises obliquely from the outer peripheral land portion 14d of the metal pad 14.

この構造(形状)の台状突部14aであれば、接着工程において、接着剤層13の開口部13aの口縁部が台状突部14aの外周面14cに当接することで、台状突部14aに対する接着剤層13の位置決めを実現できるようになる。その結果、配線基板12における貫通穴12cの口縁部と台状突部14a(詳細には台状突部14aの外周面(外周の側面)、あるいは該外周面と端面14bとの境界の稜線)とを互いに当接、あるいは、両者の間の距離が非常に小さい状態で接近配置させた状態を確実に得ることができる。   With the trapezoidal protrusion 14a having this structure (shape), the edge of the opening 13a of the adhesive layer 13 is brought into contact with the outer peripheral surface 14c of the trapezoidal protrusion 14a in the bonding step, so that the trapezoidal protrusion Positioning of the adhesive layer 13 with respect to the portion 14a can be realized. As a result, the edge of the through hole 12c and the base-like protrusion 14a in the wiring board 12 (specifically, the outer peripheral surface (outer peripheral side surface) of the base-like protrusion 14a, or the ridgeline at the boundary between the outer peripheral surface and the end face 14b) ) Are in contact with each other, or in a state where the distance between the two is close to each other with a very small distance.

なお、本発明は、台状突部14aの外周面14cの外周ランド部14dに対する傾斜角度が大きく、台状突部14aの突出基端側(基板11側)と突出先端側(端面14b側)とのサイズの違いが非常に小さい場合、接着剤層13の開口部13aの口縁部が台状突部14aの外周面14cに重ならず、金属パッド14の外周ランド部14dのみに接着される構成も採り得る。   In the present invention, the inclination angle of the outer peripheral surface 14c of the trapezoidal protrusion 14a with respect to the outer peripheral land portion 14d is large, and the protruding base end side (substrate 11 side) and the protruding distal end side (end surface 14b side) of the trapezoidal protrusion 14a. When the difference in size is very small, the edge of the opening 13a of the adhesive layer 13 does not overlap the outer peripheral surface 14c of the base-like protrusion 14a, and is bonded only to the outer peripheral land 14d of the metal pad 14. It is also possible to adopt a configuration.

搭載用配線基板10を製造した後、図5に示すように、この搭載用配線基板10の非貫通穴15の内面に、その全面を覆う金属膜であるめっき層191を形成(めっきを形成する工程)しても良い。このめっき層191を形成した搭載用配線基板に、図5中符号10Aを付す。   After the mounting wiring board 10 is manufactured, as shown in FIG. 5, a plating layer 191 which is a metal film covering the entire surface is formed on the inner surface of the non-through hole 15 of the mounting wiring board 10 (plating is formed). Process). Reference numeral 10A in FIG. 5 is attached to the mounting wiring board on which the plating layer 191 is formed.

前記搭載用配線基板10Aにあっては、めっき層191の内側空間(内側非貫通穴192)が、小型電子部品搭載用の非貫通穴192(小型電子部品搭載用非貫通穴。キャビティ部)として機能する。めっき層191の内、台状突部14aの端面14bに形成された部分は、非貫通穴192の平坦な穴底面を形成する。この穴底面が電子部品搭載面194として機能する。電子部品搭載面194に小型電子部品18を固定して搭載することで電子部品付き配線基板19Aが得られる。   In the mounting wiring board 10A, the inner space (inner non-through hole 192) of the plating layer 191 serves as a non-through hole 192 for mounting small electronic components (non-through hole for mounting small electronic components, cavity portion). Function. A portion of the plating layer 191 formed on the end surface 14 b of the trapezoidal protrusion 14 a forms a flat bottom surface of the non-through hole 192. The bottom surface of the hole functions as an electronic component mounting surface 194. A wiring board 19A with an electronic component is obtained by fixing and mounting the small electronic component 18 on the electronic component mounting surface 194.

めっき層191は、非貫通穴192内に搭載された発光素子18からの出力光を反射する、反射膜として機能する。
また、めっき層191の内側の非貫通穴192(内側非貫通穴)は、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることが好ましい。
このめっき層191としては、例えば、銀(Ag)等の金属膜が好適である。例えば、非貫通穴15内面に形成した膜厚5〜15μm(10μm狙い)のNiめっきに重ねるようにして、膜厚3〜12μm(5μm狙い)のAgめっきを形成してなる構成のもの等を採用できる。また、このめっき層191としては、光沢剤の添加によって、反射率を高めたものも採用できる。
The plating layer 191 functions as a reflective film that reflects output light from the light emitting element 18 mounted in the non-through hole 192.
Further, the non-through hole 192 (inner non-through hole) inside the plating layer 191 is preferably a round hole having a diameter of 0.8 mm or more, or a square hole having a side length of 0.8 mm or more.
As the plating layer 191, for example, a metal film such as silver (Ag) is suitable. For example, a structure in which an Ag plating with a film thickness of 3 to 12 μm (targeting 5 μm) is formed so as to overlap with a Ni plating with a film thickness of 5 to 15 μm (targeting 10 μm) formed on the inner surface of the non-through hole 15. Can be adopted. Moreover, as this plating layer 191, the thing which raised the reflectance by addition of a brightener can also be employ | adopted.

(第2実施形態)
次に、本発明の第2実施形態を図6(a)、(b)、図7を参照して説明する。
この実施形態は、パターンめっき法によって台状突部22を形成する点が、既述の第1実施形態の搭載用配線基板10の製造方法と異なる点であり、それ以外の構成(金属パッド形成工程、接着工程)は、既述の搭載用配線基板10の製造方法と同様である。
なお、図中、図1〜図5と共通の構成部分には共通の符号を付し、説明を簡略化する。
(Second Embodiment)
Next, a second embodiment of the present invention will be described with reference to FIGS. 6 (a), 6 (b), and 7. FIG.
This embodiment is different from the manufacturing method of the mounting wiring board 10 of the first embodiment described above in that the trapezoidal protrusion 22 is formed by the pattern plating method, and other configurations (metal pad formation) Steps and bonding steps) are the same as the method for manufacturing the mounting wiring board 10 described above.
In the figure, the same components as those in FIGS. 1 to 5 are denoted by the same reference numerals, and the description will be simplified.

この実施形態の搭載用配線基板の製造方法は、既述の搭載用配線基板10の製造方法と同様に、まず、図6(a)に示すように、前記基板11に金属パッド21を設ける工程(金属パッド形成工程)を行い、次いで、図6(b)に示すように、金属パッド21の中央部をパターンめっき法によって厚くして、突出先端側に平坦な端面23(平坦面)を持つ台状突部22を形成する工程(台状突部形成工程。以下、パターンめっき工程とも言う)を行う。
このパターンめっき工程にて台状突部22を形成した基板11を、以下、符号11Bを付して突部付き基板とも言う。
In the manufacturing method of the mounting wiring board of this embodiment, as in the manufacturing method of the mounting wiring board 10 described above, first, as shown in FIG. Next, as shown in FIG. 6B, the central portion of the metal pad 21 is thickened by pattern plating to have a flat end surface 23 (flat surface) on the protruding tip side. A step of forming the trapezoidal protrusion 22 (a trapezoidal protrusion forming step, hereinafter also referred to as a pattern plating step) is performed.
Hereinafter, the substrate 11 on which the table-like protrusions 22 are formed in this pattern plating step is also referred to as a substrate with protrusions by attaching a reference numeral 11B.

次に、パターンめっき工程にて得た基板11(突部付き基板11B)を、接着剤層13を介して配線基板12と接着して一体化する工程(接着工程)を行う(図7参照)。この工程にて台状突部22を連通穴16内に収納する。この接着工程が完了することで、図7に示すように、非貫通穴15を有する搭載用配線基板20が得られる。台状突部22の端面23が、非貫通穴15の穴底面として機能する。なお、基板11を接着剤層13を介して配線基板12と接着する手法としては、第1実施形態にて採用可能な手法を同様に適用できる。   Next, a step (bonding step) of bonding and integrating the substrate 11 (substrate 11B with protrusions) obtained in the pattern plating step with the wiring substrate 12 through the adhesive layer 13 is performed (see FIG. 7). . In this step, the trapezoidal protrusion 22 is accommodated in the communication hole 16. By completing this bonding step, a mounting wiring board 20 having non-through holes 15 is obtained as shown in FIG. The end surface 23 of the trapezoidal protrusion 22 functions as the bottom surface of the non-through hole 15. As a technique for bonding the substrate 11 to the wiring board 12 via the adhesive layer 13, a technique that can be employed in the first embodiment can be similarly applied.

図6(b)、図7に示すように、パターンめっき工程では、台状突部22を、第1実施形態にて説明した台状突部14aと同様に、配線基板12の貫通穴12cの断面寸法と略同等の大きさの平坦な端面23を有する突起状に形成する。また、パターンめっき工程では、台状突部22として、その外周面24(外周の側面)が、前記金属パッド21が台状突部22の外側にフランジ状に張り出した部分である外周ランド部14dに対して垂直になっているものが得られる。   As shown in FIGS. 6B and 7, in the pattern plating process, the table-like protrusions 22 are formed in the through holes 12 c of the wiring board 12 in the same manner as the table-like protrusions 14 a described in the first embodiment. It is formed in a protruding shape having a flat end surface 23 having a size substantially equal to the cross-sectional dimension. Further, in the pattern plating step, the outer peripheral surface 24 (outer peripheral side surface) of the base-like protrusion 22 is an outer peripheral land part 14 d where the metal pad 21 protrudes outside the base-like protrusion 22 in a flange shape. That is perpendicular to.

台状突部14aは、金属パッド14からの突出寸法を、接着剤層13の厚さ(但し、基板11と配線基板12とを接着するための加圧、加熱前の厚さ)の10%以上、より好ましくは50%以上とすることが好ましい。但し、この突出寸法は、貫通穴12cの長さ(中心軸線方向の寸法)の80%以上を非貫通穴15として利用できるように設定することが好ましい。
この突出寸法及び外周面24の形状を除いて、台状突部22のサイズ及び形状(端面23の大きさ及び形状を含む)の、配線基板12の貫通穴12c及び接着剤層13の開口部13aとの関係は、第1実施形態の台状突部14aと同様である。
The base protrusion 14a has a protruding dimension from the metal pad 14 that is 10% of the thickness of the adhesive layer 13 (however, the pressure before bonding the substrate 11 and the wiring substrate 12 and the thickness before heating). Above, more preferably 50% or more. However, this projecting dimension is preferably set so that 80% or more of the length of the through hole 12 c (the dimension in the central axis direction) can be used as the non-through hole 15.
Except for the projecting dimensions and the shape of the outer peripheral surface 24, the through holes 12c of the wiring board 12 and the openings of the adhesive layer 13 have the same size and shape (including the size and shape of the end surface 23) of the trapezoidal protrusion 22. The relationship with 13a is the same as the trapezoidal protrusion 14a of the first embodiment.

図7に示す搭載用配線基板20についても、小型電子部品18を台状突部22の端面23に搭載することで、電子部品付き配線基板20Aを組み立てることができる。小型電子部品18は、台状突部22の端面23に、接着剤を用いた接着等によって固定して面実装する。
台状突部22に搭載した小型電子部品18は、図1、図5に例示した電子部品付き配線基板19、19Aと同様に、ワイヤボンディングによって、配線基板12の配線12b(但し、配線基板12の接着剤層13とは反対の側の面に形成された配線12b。図7中図示略)と電気的に接続する。
また、この搭載用配線基板20についても、その非貫通穴15内面を覆うめっき層を形成すること、めっき層の内側の非貫通穴内に小型電子部品18を搭載して電子部品付き配線基板を得ること、が可能であることは言うまでも無い。
Also for the mounting wiring board 20 shown in FIG. 7, by mounting the small electronic component 18 on the end surface 23 of the table-like protrusion 22, the wiring board 20 </ b> A with the electronic component can be assembled. The small electronic component 18 is surface-mounted by being fixed to the end surface 23 of the trapezoidal protrusion 22 by bonding or the like using an adhesive.
The small electronic component 18 mounted on the trapezoidal protrusion 22 is connected to the wiring 12b of the wiring board 12 by wire bonding (however, the wiring board 12) as in the case of the wiring boards 19 and 19A with electronic parts illustrated in FIGS. The wiring 12b formed on the surface opposite to the adhesive layer 13 is electrically connected to the wiring 12b (not shown in FIG. 7).
Also, with respect to the mounting wiring board 20, a plating layer covering the inner surface of the non-through hole 15 is formed, and a small electronic component 18 is mounted in the non-through hole inside the plating layer to obtain a wiring board with an electronic component. Needless to say, this is possible.

(基板として金属層を用いる態様)
次に、図8〜図11(a)、(b)を参照して、基板31、41として金属層(金属箔あるいは金属板)を用いた構成(第3、第4実施形態)について説明する。
なお、図中、図1〜図4と共通の構成部分には共通の符号を付し、説明を簡略化する。
図8、図10に示す搭載用配線基板30、40は、基板31、41、台状突部32、42以外の構成については、既述の搭載用配線基板10、20と同様である。
基板31、41としては、例えば、アルミニウム、銅、ニッケル、それらの合金、あるいはSUSなどの金属層(金属箔あるいは金属板)を使用する。
(Aspect using a metal layer as a substrate)
Next, with reference to FIGS. 8 to 11A and 11B, configurations (third and fourth embodiments) in which metal layers (metal foil or metal plate) are used as the substrates 31 and 41 will be described. .
In the figure, the same components as those in FIGS. 1 to 4 are denoted by the same reference numerals, and the description will be simplified.
The mounting wiring boards 30 and 40 shown in FIGS. 8 and 10 are the same as the mounting wiring boards 10 and 20 described above except for the substrates 31 and 41 and the trapezoidal protrusions 32 and 42.
As the substrates 31 and 41, for example, aluminum, copper, nickel, alloys thereof, or a metal layer (metal foil or metal plate) such as SUS is used.

(第3実施形態)
本発明に係る第3実施形態を図8、図9(a)、(b)を参照して説明する。
まず、図8に示す搭載用配線基板30について説明する。
この搭載用配線基板30の基板31には台状突部32が突設されている。この台状突部32の突出先端側の端面33は、配線基板12の貫通穴12cの断面寸法と略同等の大きさになっている。搭載用配線基板30において、基板31は接着剤層13を介して配線基板12と接着して一体化されている。また、連通穴16内に基板31の台状突部32が収納されている。図示例では、台状突部32を、接着剤層13の開口部13aのみに収納している。
接着剤層13は、基板31の台状突部32が突設されている面の内、台状突部32を避けた部分に接合して接着されている。
(Third embodiment)
A third embodiment according to the present invention will be described with reference to FIGS. 8, 9A and 9B.
First, the mounting wiring board 30 shown in FIG. 8 will be described.
On the substrate 31 of the mounting wiring board 30, a table-like protrusion 32 is provided so as to protrude. An end surface 33 on the projecting tip side of the trapezoidal protrusion 32 has a size substantially equal to the cross-sectional dimension of the through hole 12 c of the wiring board 12. In the mounting wiring board 30, the board 31 is bonded and integrated with the wiring board 12 through the adhesive layer 13. Further, the base-like protrusion 32 of the substrate 31 is accommodated in the communication hole 16. In the illustrated example, the trapezoidal protrusion 32 is accommodated only in the opening 13 a of the adhesive layer 13.
The adhesive layer 13 is bonded and bonded to a portion of the surface of the substrate 31 where the trapezoidal protrusions 32 are provided so as to avoid the trapezoidal protrusions 32.

この搭載用配線基板30を製造する製造方法は、まず、図9(a)、(b)に示すように、金属箔等のシート状の金属層である基板31を部分的にエッチングにより薄くして(ハーフエッチング)台状突部32を形成する工程(台状突部形成工程。以下、ハーフエッチング工程とも言う)を行う。このハーフエッチング工程では、パターンエッチング法によって基板31の所望位置に台状突部32を形成する。台状突部32を有する基板31が得られる。エッチングせずに残した部分が、ハーフエッチングによって薄くした部分(板状部36)に対して突出する突起状の台状突部32となる。   In the manufacturing method for manufacturing the mounting wiring board 30, first, as shown in FIGS. 9A and 9B, a substrate 31 which is a sheet-like metal layer such as a metal foil is partially thinned by etching. (Half etching) A step of forming the trapezoidal protrusion 32 (trapezoidal protrusion forming step, hereinafter also referred to as a half etching step) is performed. In this half etching process, the trapezoidal protrusion 32 is formed at a desired position on the substrate 31 by a pattern etching method. A substrate 31 having a trapezoidal protrusion 32 is obtained. The portion left without being etched becomes a protruding table-like protrusion 32 that protrudes from the portion (plate-like portion 36) thinned by half etching.

台状突部32の基板31における突出寸法(板状部36からの突出寸法)は、接着剤層13の厚さ(但し、突部付き基板31Aと配線基板12とを接着するための加圧、加熱前の厚さ)の10%以上、より好ましくは50%以上とすることが好ましい。但し、この突出寸法は、貫通穴12cの長さ(中心軸線方向の寸法)の80%以上を非貫通穴15として利用できるように設定することが好ましい。
この突出寸法以外、台状突部32のサイズ及び形状(端面33の大きさ及び形状を含む)の、配線基板12の貫通穴12c、接着剤層13の開口部13aとの関係は、第1実施形態の搭載用配線基板10の台状突部14aと同様である。
The protrusion dimension of the base protrusion 32 on the substrate 31 (protrusion dimension from the plate-like portion 36) is the thickness of the adhesive layer 13 (however, pressure applied to bond the protrusion-provided substrate 31A and the wiring substrate 12). , Thickness before heating) is preferably 10% or more, more preferably 50% or more. However, this projecting dimension is preferably set so that 80% or more of the length of the through hole 12 c (the dimension in the central axis direction) can be used as the non-through hole 15.
Other than this protruding dimension, the relationship between the size and shape of the trapezoidal protrusion 32 (including the size and shape of the end face 33) with the through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 is as follows. This is the same as the trapezoidal protrusion 14a of the mounting wiring board 10 of the embodiment.

次に、ハーフエッチング工程にて得た突部付き基板31Aを、接着剤層13を介して配線基板12と接着して一体化する工程(接着工程)を行う。このとき、配線基板12の貫通穴12cと接着剤層13の開口部13aとが連通してなる連通穴16内に、基板31の台状突部32を収納する。これにより、突部付き基板31Aの台状突部32を穴底とする非貫通穴35(小型電子部品搭載用非貫通穴)が形成され、搭載用配線基板30が組み立てられる。
非貫通穴35は、連通穴16の中心軸線に沿った方向において台状突部32が存在しない部分、つまり、図8において台状突部32の端面33から上側の部分であり、台状突部32の端面33を穴底面とするものである。
Next, the process (adhesion process) of adhering and integrating the substrate with protrusions 31A obtained in the half etching process with the wiring board 12 through the adhesive layer 13 is performed. At this time, the trapezoidal protrusion 32 of the substrate 31 is accommodated in the communication hole 16 in which the through hole 12c of the wiring substrate 12 and the opening 13a of the adhesive layer 13 are communicated. Thereby, a non-through hole 35 (non-through hole for mounting a small electronic component) having the base protrusion 32 of the substrate with protrusion 31A as a hole bottom is formed, and the mounting wiring board 30 is assembled.
The non-through hole 35 is a portion where the trapezoidal protrusion 32 does not exist in the direction along the central axis of the communication hole 16, that is, a portion above the end surface 33 of the trapezoidal protrusion 32 in FIG. The end surface 33 of the portion 32 is the bottom surface of the hole.

図8に示す台状突部32の外周面34(外周の側面)は、基板31の内、ハーフエッチングによって薄くした板状部分(板状部36)から斜めに立ち上がる傾斜面になっている。前記台状突部32は、前記端面33から前記基板31における該台状突部32の突出基端側(板状部36側)へ行くにしたがって、その外周面34が外側に拡がるテーパ形状になっている。このため、接着工程の際に、接着剤層13の開口部13aの口縁部が台状突部32の外周面34に当接することで、台状突部32に対する接着剤層13の位置決めを実現できるようになる。接着剤層13を片面に設けた配線基板12を突部付き基板31Aに接着する手順の場合は、突部付き基板31Aに対する配線基板12の位置合わせが容易になる。その結果、配線基板12における貫通穴12cの口縁部と台状突部32(詳細には台状突部32の外周面34、あるいは該外周面34と端面33との境界の稜線)とを互いに当接、あるいは、両者の間の距離が非常に小さい状態で接近配置させた状態を確実に得ることができる。   The outer peripheral surface 34 (outer peripheral side surface) of the trapezoidal protrusion 32 shown in FIG. 8 is an inclined surface that rises obliquely from a plate-like portion (plate-like portion 36) thinned by half etching in the substrate 31. The trapezoidal protrusion 32 has a tapered shape in which the outer peripheral surface 34 expands outward as it goes from the end surface 33 toward the protruding proximal end side (the plate-like portion 36 side) of the trapezoidal protrusion 32 on the substrate 31. It has become. For this reason, in the bonding step, the edge of the opening 13a of the adhesive layer 13 abuts on the outer peripheral surface 34 of the trapezoidal protrusion 32, thereby positioning the adhesive layer 13 with respect to the trapezoidal protrusion 32. Can be realized. In the procedure of adhering the wiring board 12 provided with the adhesive layer 13 on one side to the substrate with projections 31A, the positioning of the wiring substrate 12 with respect to the substrate with projections 31A becomes easy. As a result, the edge portion of the through hole 12c in the wiring board 12 and the base-like protrusion 32 (specifically, the outer peripheral surface 34 of the base-like protrusion 32 or the ridgeline at the boundary between the outer peripheral surface 34 and the end surface 33). It is possible to reliably obtain a state in which they are brought into contact with each other or arranged close to each other with a very small distance between them.

なお、本発明は、台状突部32の外周面34の板状部36に対する傾斜角度が大きく、台状突部32の突出基端側(板状部36側)と突出先端側(端面33側)との間のサイズの違いが小さい場合、接着剤層13の開口部13aの口縁部が台状突部32の外周面34に重ならず、直接、基板31の板状部36のみに接着する構成も採り得る。   In the present invention, the inclination angle of the outer peripheral surface 34 of the table-like protrusion 32 with respect to the plate-like part 36 is large, and the protruding base end side (plate-like part 36 side) and the protruding tip side (end surface 33) of the table-like protrusion 32 are provided. When the difference in size between the adhesive layer 13 and the side edge is small, the edge of the opening 13a of the adhesive layer 13 does not overlap the outer peripheral surface 34 of the base-like protrusion 32, and only the plate-like part 36 of the substrate 31 is directly provided. The structure which adhere | attaches to can also be taken.

(第4実施形態)
次に本発明に係る第4実施形態を、図10、図11(a)、(b)を参照して説明する。
図10に示す搭載用配線基板40は、図11(a)、(b)に示すように、基板41の片面の一部をパターンめっき法によって厚くして突起状の台状突部42(金属層)を突設してなる突部付き基板41Aを接着剤層13を介して配線基板12と接着して一体化し、連通穴16内に台状突部42を収納した構成になっている。図示例では、台状突部42を、接着剤層13の開口部13aのみに収納している。
接着剤層13は、基板41の台状突部42が突設されている面の内、台状突部42を避けた部分に接合して接着されている。
(Fourth embodiment)
Next, a fourth embodiment according to the present invention will be described with reference to FIGS. 10, 11A and 11B.
As shown in FIGS. 11A and 11B, the mounting wiring board 40 shown in FIG. 10 has a projection-like trapezoidal protrusion 42 (metal) by thickening a part of one surface of the substrate 41 by pattern plating. A substrate 41A having a protrusion formed by protruding a layer) is bonded and integrated with the wiring substrate 12 via the adhesive layer 13, and the base protrusion 42 is accommodated in the communication hole 16. In the illustrated example, the trapezoidal protrusion 42 is accommodated only in the opening 13 a of the adhesive layer 13.
The adhesive layer 13 is bonded and bonded to a portion of the substrate 41 where the trapezoidal protrusions 42 are provided so as to avoid the trapezoidal protrusions 42.

この搭載用配線基板40を製造する製造方法は、まず、図11(a)、(b)に示すように、金属箔等のシート状の金属層である基板41の片面の一部をパターンめっき法によって厚くして台状突部42を形成する工程(台状突部形成工程。以下、パターンめっき工程とも言う)を行い、突部付き基板41Aを得る。   In the manufacturing method for manufacturing the mounting wiring substrate 40, first, as shown in FIGS. 11A and 11B, a part of one surface of the substrate 41 which is a sheet-like metal layer such as a metal foil is subjected to pattern plating. A step of forming the trapezoidal protrusion 42 by a method (a trapezoidal protrusion forming step; hereinafter also referred to as a pattern plating step) is performed to obtain a substrate 41A with a protrusion.

台状突部42の基板41からの突出寸法は、接着剤層13の厚さ(但し、突部付き基板41Aと配線基板12とを接着するための加圧、加熱前の厚さ)の10%以上、より好ましくは50%以上とすることが好ましい。但し、この突出寸法は、貫通穴12cの長さ(中心軸線方向の寸法)の80%以上を非貫通穴15として利用できるように設定することが好ましい。
この突出寸法以外、台状突部42のサイズ及び形状(突出先端側の端面43の大きさ、形状を含む)の、配線基板12の貫通穴12c、接着剤層13の開口部13aとの関係は、第2実施形態の搭載用配線基板20の台状突部22と同様である。台状突部42の端面43は、配線基板12の貫通穴12cの中心軸線に直交する平坦面となっている。
The protruding dimension of the trapezoidal protrusion 42 from the substrate 41 is 10 of the thickness of the adhesive layer 13 (however, the thickness before pressing and heating for bonding the substrate 41A with protrusion and the wiring board 12). % Or more, more preferably 50% or more. However, this projecting dimension is preferably set so that 80% or more of the length of the through hole 12 c (the dimension in the central axis direction) can be used as the non-through hole 15.
Other than the protruding dimensions, the relationship between the size and shape of the trapezoidal protrusion 42 (including the size and shape of the end face 43 on the protruding tip side) with the through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 These are the same as the trapezoidal protrusion 22 of the mounting wiring board 20 of the second embodiment. The end surface 43 of the trapezoidal protrusion 42 is a flat surface orthogonal to the central axis of the through hole 12 c of the wiring substrate 12.

次に、パターンめっき工程によって得た突部付き基板41Aを、接着剤層13を介して配線基板12(配線付き基板12A)と接着して一体化する工程(接着工程)を行う。
このとき、配線基板12の貫通穴12cと接着剤層13の開口部13aとが連通してなる連通穴16内に、突部付き基板41Aの台状突部42を収納する。これにより、図10に示すように、連通穴16に、台状突部42を穴底とする非貫通穴45(小型電子部品搭載用非貫通穴)が形成され、搭載用配線基板40が組み立てられる。台状突部42の端面43が非貫通穴45の穴底面となる。
Next, the process (adhesion process) of adhering and integrating the substrate 41A with protrusions obtained by the pattern plating process with the wiring board 12 (substrate 12A with wiring) via the adhesive layer 13 is performed.
At this time, the trapezoidal protrusion 42 of the board 41A with the protrusion is housed in the communication hole 16 in which the through hole 12c of the wiring board 12 and the opening 13a of the adhesive layer 13 are in communication. As a result, as shown in FIG. 10, a non-through hole 45 (non-through hole for mounting a small electronic component) having the base protrusion 42 as a bottom is formed in the communication hole 16, and the mounting wiring board 40 is assembled. It is done. The end surface 43 of the trapezoidal protrusion 42 becomes the hole bottom surface of the non-through hole 45.

図8、図10に示す第3、第4実施形態の搭載用配線基板30、40の場合、金属製の基板31、41によって高い放熱性が得られるため、台状突部32、42の端面33、43上に小型電子部品18を搭載して、電子部品付き配線基板30A、40Aを組み立てた場合、小型電子部品18からの発熱を効率良く放熱させることができる。
台状突部32、42が金属製であることも、高い放熱性の確保に有効に寄与することは言うまでも無い。
In the case of the mounting wiring boards 30 and 40 according to the third and fourth embodiments shown in FIGS. 8 and 10, since high heat dissipation is obtained by the metal boards 31 and 41, the end faces of the trapezoidal protrusions 32 and 42. When the small electronic components 18 are mounted on the 33 and 43 and the wiring boards 30A and 40A with electronic components are assembled, heat generated from the small electronic components 18 can be efficiently dissipated.
Needless to say, the trapezoidal protrusions 32 and 42 are also made of metal, which effectively contributes to ensuring high heat dissipation.

図12は、図8に示す搭載用配線基板30の非貫通穴35内にその内面を覆うめっき層195を形成した構成(小型電子部品搭載用配線基板30B)を示す。小型電子部品搭載用配線基板30Aにあっては、めっき層195の内側に、小型電子部品搭載用の空間である非貫通穴196(電子部品搭載用非貫通穴。キャビティ部)が確保される。また、図12は、前記めっき層195の内の前記台状突部32の端面33に形成された部分に小型電子部品18を搭載した構成の電子部品付き配線基板30Cを例示する。
前記小型電子部品18は、ワイヤボンディングによって配線付き基板12Aの配線12bと電気的に接続している。図中、符号193はボンディングワイヤである。
FIG. 12 shows a configuration (wiring board 30B for mounting small electronic components) in which a plating layer 195 covering the inner surface is formed in the non-through hole 35 of the mounting wiring board 30 shown in FIG. In the small electronic component mounting wiring board 30 </ b> A, a non-through hole 196 (non-through hole for electronic component mounting, cavity portion), which is a space for mounting a small electronic component, is secured inside the plating layer 195. FIG. 12 illustrates a wiring board 30C with an electronic component having a configuration in which the small electronic component 18 is mounted on a portion of the plating layer 195 formed on the end surface 33 of the trapezoidal protrusion 32.
The small electronic component 18 is electrically connected to the wiring 12b of the substrate with wiring 12A by wire bonding. In the figure, reference numeral 193 denotes a bonding wire.

図10に示す搭載用配線基板40についても、同様に、非貫通穴45内面を覆うめっき層を形成し、めっき層の内側に、小型電子部品搭載用の空間である非貫通穴を確保した構成とすること、非貫通穴内に小型電子部品を搭載(詳細には、台状突部42の端面43に形成されためっき層に小型電子部品18を搭載)して電子部品付き配線基板を組み立てること、が可能である。   Similarly, for the mounting wiring board 40 shown in FIG. 10, a plating layer that covers the inner surface of the non-through hole 45 is formed, and a non-through hole that is a space for mounting a small electronic component is secured inside the plating layer. A small electronic component is mounted in the non-through hole (specifically, the small electronic component 18 is mounted on the plating layer formed on the end face 43 of the base protrusion 42) and the wiring board with the electronic component is assembled. Is possible.

また、上述のように、非貫通穴35、45内面を覆うめっき層を形成する場合、めっき層の内側に、小型電子部品搭載用の空間である非貫通穴(電子部品搭載用非貫通穴)として、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴を確保することが好ましい。めっき層としては、例えば、図5を参照して説明した電子部品付き配線基板19Aのめっき層191と同様のものを採用できる。   In addition, as described above, when the plating layer covering the inner surfaces of the non-through holes 35 and 45 is formed, a non-through hole that is a space for mounting a small electronic component (non-through hole for mounting an electronic component) is formed inside the plating layer. It is preferable to secure a round hole with a diameter of 0.8 mm or more, or a square hole with a side length of 0.8 mm or more. As the plating layer, for example, the same layer as the plating layer 191 of the wiring board 19A with an electronic component described with reference to FIG. 5 can be adopted.

上述のように、搭載用配線基板30、40の非貫通穴35、45内にその内面を覆うめっき層を形成した場合でも、金属製の基板31、41によって高い放熱性が得られる。これにより、小型電子部品18からの発熱を効率良く放熱させることができる。   As described above, even when the plating layer covering the inner surface is formed in the non-through holes 35 and 45 of the mounting wiring boards 30 and 40, high heat dissipation is obtained by the metal substrates 31 and 41. Thereby, the heat generated from the small electronic component 18 can be efficiently radiated.

(実施例1)
三菱ガス化学(株)製CCL−820WDIの絶縁樹脂板の両面に厚さ35μmの銅箔を被着してなる、板厚0.06mmの両面板(銅張り基板)を用意し、パターン形成に使用する露光アライメント用のガイド穴を前記両面板の四隅に加工し、エッチング用ドライフィルムのラミネート〜露光〜エッチングを行い、両面に配線パターンを形成して、配線パターン付きの基板(パッド付き基板。以下、配線パターン形成基板とも言う。)を得た。前記配線パターンには、配線パターン形成基板に接着剤層を介して接着する貫通穴付き配線板(後述。配線基板)の貫通穴の断面よりも広い金属パッド(ランド部)が形成されている。この金属パッドの形成位置は、製造する電子部品搭載用配線基板の非貫通穴(以下、キャビティ部とも言う)の形成位置に対応させて設定してある。
Example 1
Prepare a double-sided board (copper-clad board) with a thickness of 0.06mm, which is made by depositing 35μm-thick copper foil on both sides of CCL-820WDI insulating resin board made by Mitsubishi Gas Chemical Co., Ltd. A guide hole for exposure alignment to be used is processed into the four corners of the double-sided plate, and a dry film for etching is laminated to exposed to etched to form a wiring pattern on both sides, and a substrate with a wiring pattern (substrate with a pad). Hereinafter, it is also referred to as a wiring pattern formation substrate. In the wiring pattern, a metal pad (land portion) wider than a cross-section of a through hole of a wiring board with a through hole (described later, a wiring board) bonded to the wiring pattern forming substrate through an adhesive layer is formed. The formation position of the metal pad is set corresponding to the formation position of a non-through hole (hereinafter also referred to as a cavity portion) of the electronic component mounting wiring board to be manufactured.

次に、前記金属パッドにおいて台状突部を形成するために、前記配線パターン形成基板の表面にエッチング用ドライフィルムのラミネート〜露光〜現像を行い、ケミカルエッチング液と接触させて、金属パッドにおける台状突部の形成位置以外の部分を20μmの厚さまでエッチングした。これにより、エッチングにより薄くした部分に比べて15μm高い(薄くした部分からの突出寸法が15μm)台状突部を形成した。金属パッドに15μmの段差を得た。その後、ドライフィルムを剥離した。   Next, in order to form a trapezoidal protrusion on the metal pad, the surface of the wiring pattern forming substrate is laminated to a dry etching film, exposed to developed, and brought into contact with a chemical etching solution to form a base on the metal pad. The portions other than the formation positions of the protrusions were etched to a thickness of 20 μm. As a result, a trapezoidal protrusion was formed that was 15 μm higher than the portion thinned by etching (the projecting dimension from the thinned portion was 15 μm). A step of 15 μm was obtained on the metal pad. Thereafter, the dry film was peeled off.

次いで、配線パターン形成基板に貼り付ける貫通穴付き配線板(配線基板)の加工を行った。
三菱ガス化学(株)製CCL−820WDIの絶縁樹脂板の両面に厚さ18μmの銅箔を被着してなる板厚0.06mmの両面板コア材(銅張り基板)に、エッチング用ドライフィルムのラミネート〜露光〜エッチングを行い、両面に配線パターンを形成して配線基板を得た。この配線基板に、接着フィルムとして厚さ0.025mmの日立化成工業(株)製AS−3000を仮接着した。仮接着は真空ラミネータ−を使用し、圧力0.75Mpa/cm,温度120℃、時間45秒で行った。次に、配線基板及び接着フィルムのキャビティ部となる箇所にルーター加工にて開口サイズ1.05×1.05mmの貫通穴(角穴)を開けた。
次に、金属パッドに台状突部を段差状に形成した配線パターン形成基板と接着フィルムとを貼り合わせ、開口部の加工を行った配線基板の前記接着フィルム層を介して積層接着するために、ピンラミネーション法を用いた多段プレスで位置合せを行い本接着を行った。得られた搭載用配線基板においては、貫通穴付き配線板の貫通穴と接着フィルムの開口部とが連通してなる連通穴に台状突部を収納している。また、台状突部は、接着フィルムの開口部を貫通して、貫通穴付き配線板の貫通穴に達している。
Subsequently, the through-holed wiring board (wiring board) attached to the wiring pattern forming substrate was processed.
A dry film for etching is applied to a core material (copper-clad substrate) with a thickness of 0.06 mm, which is obtained by depositing 18 μm thick copper foil on both sides of an insulating resin plate of CCL-820WDI manufactured by Mitsubishi Gas Chemical Co., Ltd. Lamination, exposure, and etching were performed, and a wiring pattern was formed on both surfaces to obtain a wiring board. AS-3000 manufactured by Hitachi Chemical Co., Ltd. having a thickness of 0.025 mm was temporarily bonded to this wiring board as an adhesive film. The temporary bonding was performed using a vacuum laminator at a pressure of 0.75 Mpa / cm 2 , a temperature of 120 ° C., and a time of 45 seconds. Next, a through-hole (square hole) having an opening size of 1.05 × 1.05 mm was formed by router processing in a portion to be a cavity portion of the wiring board and the adhesive film.
Next, in order to laminate and bond the wiring pattern forming substrate formed with stepped protrusions on the metal pad and the adhesive film through the adhesive film layer of the wiring substrate in which the opening has been processed Alignment was performed with a multi-stage press using a pin lamination method, and this bonding was performed. In the mounting wiring board obtained, the base-like protrusions are housed in communication holes formed by communication between the through holes of the wiring board with through holes and the openings of the adhesive film. The trapezoidal protrusion penetrates through the opening of the adhesive film and reaches the through hole of the wiring board with the through hole.

接着後の状態を確認したところ、従来の製造方法では確認された開口部への接着フィルムの染み出しは見られなかった。また、キャビティ部内面についてデスミア処理〜めっきを行い断面観察を実施したが、キャビティ部内面に形成しためっき層の膜厚はほぼ均一で、めっき層の内側に凹凸の無い滑らかな内面が得られた。
冷熱サイクル試験を、−65℃で30分、125℃で30分のサイクルにて実施した結果、1000サイクルでも抵抗値の変化がなかった。断面観察の実施では剥離、クラックも全くなく安定した形状であった。
As a result of confirming the state after the adhesion, no bleeding of the adhesive film into the opening confirmed in the conventional production method was observed. In addition, although the cross section was observed by performing desmear treatment to plating on the inner surface of the cavity portion, the thickness of the plating layer formed on the inner surface of the cavity portion was almost uniform, and a smooth inner surface without unevenness was obtained on the inner side of the plating layer. .
The cold cycle test was performed at a cycle of −65 ° C. for 30 minutes and at 125 ° C. for 30 minutes. As a result, the resistance value did not change even after 1000 cycles. In the cross-sectional observation, there was no peeling or cracking, and the shape was stable.

(比較例1)
金属パッドへの段差状の台状突部の形成を行うことなく、その他の工程は実施例1と同じ条件で配線パターン形成基板と開口部を形成した配線基板とを接着した。その結果、図13に示すように、配線基板の開口部内に、その内面から約70μmの範囲に接着フィルム(図中符号13)の染み出しが観察された。
また、キャビティ部内面についてデスミア処理〜めっきを行った。前記接着フィルムの表面のめっき膜厚は薄い傾向があり、上述と同じ条件の冷熱サイクル試験を実施した結果、200サイクルで抵抗値の上昇が認められた。
(Comparative Example 1)
Without forming the stepped protrusions on the metal pads, the other steps were to bond the wiring pattern forming substrate and the wiring substrate on which the opening was formed under the same conditions as in Example 1. As a result, as shown in FIG. 13, the bleeding of the adhesive film (reference numeral 13 in the figure) was observed in the opening of the wiring board within a range of about 70 μm from the inner surface.
Moreover, the desmear process-plating was performed about the cavity part inner surface. The plating film thickness on the surface of the adhesive film tended to be thin, and as a result of carrying out a cooling / heating cycle test under the same conditions as described above, an increase in resistance value was observed at 200 cycles.

本発明に係る第1実施形態の電子部品搭載用配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the wiring board for electronic component mounting of 1st Embodiment which concerns on this invention. 図1の電子部品搭載用配線基板の配線基板を製造する手法を説明する図であって、(a)は配線基板を得るために用いる銅張り基板(両面銅張り基板)を示す断面図、(b)は図2(a)の銅張り基板に配線、貫通穴を形成して得た配線基板の詳細を示す図である。It is a figure explaining the method of manufacturing the wiring board of the wiring board for electronic component mounting of FIG. 1, Comprising: (a) is sectional drawing which shows the copper clad board (double-sided copper clad board) used in order to obtain a wiring board, FIG. 3B is a diagram showing details of a wiring board obtained by forming wirings and through holes in the copper-clad board of FIG. 図1の電子部品搭載用配線基板の製造方法の一例を説明する図であって、(a)は図1の電子部品搭載用配線基板の基板を得るために用いる銅張り基板を示す断面図、(b)は図3(a)の銅張り基板の銅箔のパターンエッチング法によって配線パターン及び金属パッドを形成してなるパッド付き基板を示す図、(c)は図3(b)のパッド付き基板の金属パッドにパターンエッチング法によって台状突部を形成してなる突部付き基板を示す図である。It is a figure explaining an example of the manufacturing method of the wiring board for electronic component mounting of FIG. 1, (a) is sectional drawing which shows the copper-clad board | substrate used in order to obtain the board | substrate of the electronic component mounting wiring board of FIG. (B) is a figure which shows the board | substrate with a pad formed by forming a wiring pattern and a metal pad by the pattern etching method of the copper foil of the copper clad board | substrate of Fig.3 (a), (c) is with a pad of FIG.3 (b). It is a figure which shows the board | substrate with a protrusion formed by forming a base-shaped protrusion on the metal pad of a board | substrate by the pattern etching method. 図1の電子部品搭載用配線基板の製造方法の一例を説明する図であって、図3(b)にて得られたパッド付き基板と貫通穴が形成された配線基板とを接着剤層を介して接着する工程を示す図である。It is a figure explaining an example of the manufacturing method of the wiring board for electronic component mounting of FIG. 1, Comprising: A board | substrate with a pad obtained in FIG.3 (b), and the wiring board in which the through-hole was formed are bonded with an adhesive layer. It is a figure which shows the process bonded through. 図1の電子部品搭載用配線基板の小型電子部品搭載用非貫通穴の内面にめっき層を形成した構成を示す断面図である。It is sectional drawing which shows the structure which formed the plating layer in the inner surface of the non-through-hole for small electronic component mounting of the wiring board for electronic component mounting of FIG. 本発明に係る第2実施形態の電子部品搭載用配線基板の製造方法を説明する図であって、(a)はパッド付き基板を示す図、(b)は図6(a)のパッド付き基板の金属パッドに台状突部を形成してなる突部付き基板を示す図である。It is a figure explaining the manufacturing method of the wiring board for electronic component mounting of 2nd Embodiment which concerns on this invention, Comprising: (a) is a figure which shows a board | substrate with a pad, (b) is a board | substrate with a pad of Fig.6 (a). It is a figure which shows the board | substrate with a protrusion formed by forming a base-like protrusion on the metal pad. 本発明に係る第2実施形態の電子部品搭載用配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the wiring board for electronic component mounting of 2nd Embodiment which concerns on this invention. 本発明に係る第3実施形態の電子部品搭載用配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the wiring board for electronic component mounting of 3rd Embodiment which concerns on this invention. 本発明に係る第3実施形態の電子部品搭載用配線基板の製造方法を説明する図であって、(a)は図8の電子部品搭載用配線基板の基板(突部付き基板)を形成するための金属層(金属箔)を示す図、(b)は図9(a)の金属層にハーフエッチングによって台状突部を形成してなる突部付き基板を示す図である。It is a figure explaining the manufacturing method of the wiring board for electronic component mounting of 3rd Embodiment which concerns on this invention, Comprising: (a) forms the board | substrate (board | substrate with a protrusion) of the electronic component mounting wiring board of FIG. The figure which shows the metal layer (metal foil) for this, (b) is a figure which shows the board | substrate with a protrusion formed by forming a trapezoid protrusion in the metal layer of Fig.9 (a) by half etching. 本発明に係る第4実施形態の電子部品搭載用配線基板の構造を示す断面図である。It is sectional drawing which shows the structure of the wiring board for electronic component mounting of 4th Embodiment concerning this invention. 本発明に係る第4実施形態の電子部品搭載用配線基板の製造方法を説明する図であって、(a)は図10の電子部品搭載用配線基板の基板(突部付き基板)を形成するための金属層(金属箔)を示す図、(b)は図11(a)の金属層にハーフエッチングによって台状突部を形成してなる突部付き基板を示す図である。It is a figure explaining the manufacturing method of the wiring board for electronic component mounting of 4th Embodiment which concerns on this invention, Comprising: (a) forms the board | substrate (board | substrate with a protrusion) of the electronic component mounting wiring board of FIG. The figure which shows the metal layer (metal foil) for this, (b) is a figure which shows the board | substrate with a protrusion formed by forming a trapezoid protrusion in the metal layer of Fig.11 (a) by half etching. 図8の電子部品搭載用配線基板の小型電子部品搭載用非貫通穴の内面にめっき層を形成した構成を示す断面図である。It is sectional drawing which shows the structure which formed the plating layer in the inner surface of the non-through-hole for small electronic component mounting of the wiring board for electronic component mounting of FIG. 比較例1における、配線基板の開口部内への接着フィルムの染み出し状態を示す図である。It is a figure which shows the oozing-out state of the adhesive film in the opening part of a wiring board in the comparative example 1. (a)〜(d)は、層間接続用非貫通穴を持つ多層プリント配線板の製造方法を説明する図である。(A)-(d) is a figure explaining the manufacturing method of the multilayer printed wiring board which has a non-through-hole for interlayer connection.

符号の説明Explanation of symbols

10…電子部品搭載用配線基板、11…基板、11A、11B…突部付き基板、11b…銅箔、11c…配線パターン、111…銅張り基板(両面銅張り基板)、112…パッド付き基板、12…配線基板、12a…絶縁樹脂層、12b…配線、12c…貫通穴、13…接着剤、13a…開口部、14…金属パッド、14a…台状突部、14b…端面、14c…外周面、14d…外周ランド部、15…非貫通穴、16…連通穴、18…小型電子部品、19、19A…電子部品付き配線基板、191…めっき層、192…内側非貫通穴、913…ボンディングワイヤ、194…電子部品搭載面、20…電子部品搭載用配線基板、20A…電子部品付き配線基板、21…金属パッド、22…台状突部、23…端面、24…外周面、30…電子部品搭載用配線基板、30A…電子部品付き配線基板、30B…電子部品搭載用配線基板、30C…電子部品付き配線基板、31…基板、31A…突部付き基板、32…台状突部、33…端面、34…外周面、35…非貫通穴、36…板状部、40…電子部品搭載用配線基板、40A…電子部品付き配線基板、41…基板、41A…突部付き基板、42…台状突部、43…端面、44…外周面、45…非貫通穴。   DESCRIPTION OF SYMBOLS 10 ... Wiring board for electronic component mounting, 11 ... Board, 11A, 11B ... Board with protrusion, 11b ... Copper foil, 11c ... Wiring pattern, 111 ... Copper-clad board (double-sided copper-clad board), 112 ... Substrate with pad, DESCRIPTION OF SYMBOLS 12 ... Wiring board, 12a ... Insulating resin layer, 12b ... Wiring, 12c ... Through-hole, 13 ... Adhesive, 13a ... Opening part, 14 ... Metal pad, 14a ... Trapezoidal protrusion, 14b ... End face, 14c ... Outer peripheral surface 14d ... outer peripheral land, 15 ... non-through hole, 16 ... communication hole, 18 ... small electronic component, 19, 19A ... wiring board with electronic component, 191 ... plated layer, 192 ... inner non-through hole, 913 ... bonding wire 194 ... Electronic component mounting surface, 20 ... Electronic component mounting wiring board, 20A ... Electronic component mounting wiring board, 21 ... Metal pad, 22 ... Platform projection, 23 ... End face, 24 ... Outer peripheral surface, 30 ... Electronic component Mounting wiring board, 30A ... wiring board with electronic components, 30B ... wiring board for mounting electronic components, 30C ... wiring board with electronic components, 31 ... substrate, 31A ... substrate with protrusions, 32 ... trapezoidal protrusion, 33 ... End surface, 34 ... outer peripheral surface, 35 ... non-through hole, 36 ... plate-like portion, 40 ... wiring board for mounting electronic components, 40A ... wiring substrate with electronic components, 41 ... substrate, 41A ... substrate with protruding portions, 42 ... stand -Like protrusions, 43 ... end faces, 44 ... outer peripheral surfaces, 45 ... non-through holes.

Claims (13)

基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、
前記基板に前記配線基板の前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドを設ける工程と、
該金属パッドの中央部を除く部分をハーフエッチングして薄くすることにより、エッチングする部分の内側に、前記配線基板の前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成する工程と、
次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法。
A method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring substrate having a through hole to the substrate through an adhesive layer,
Providing the substrate with a metal pad larger than a cross section perpendicular to the central axis of the through hole of the wiring board;
By half-etching and thinning the portion excluding the central portion of the metal pad, inside the portion to be etched, the cross section of the through hole of the wiring board is approximately the same size as the cross section of the through hole. Forming a trapezoidal protrusion having a flat surface as an end surface on the protruding tip side;
Next, by bonding the substrate and the wiring substrate through the adhesive layer, the through hole of the wiring substrate and the opening formed in the adhesive layer are in a communication hole formed to communicate with each other. And manufacturing the wiring board for mounting an electronic component, comprising the step of accommodating the base-like protrusion of the substrate and obtaining the non-through hole for mounting the small electronic component by making the communication hole non-through. Method.
基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、
前記基板に前記配線基板の前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドを設ける工程と、
該金属パッドの中央部をパターンめっき法によって厚くして前記配線基板の前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成する工程と、
次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法。
A method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring substrate having a through hole to the substrate through an adhesive layer,
Providing the substrate with a metal pad larger than a cross section perpendicular to the central axis of the through hole of the wiring board;
The central portion of the metal pad is thickened by a pattern plating method, and a trapezoidal shape having a flat surface that is substantially the same as the cross section of the through hole of the wiring board and that can be accommodated in the through hole is an end surface on the protruding tip side. Forming a protrusion; and
Next, by bonding the substrate and the wiring substrate through the adhesive layer, the through hole of the wiring substrate and the opening formed in the adhesive layer are in a communication hole formed to communicate with each other. And manufacturing the wiring board for mounting an electronic component, comprising the step of accommodating the base-like protrusion of the substrate and obtaining the non-through hole for mounting the small electronic component by making the communication hole non-through. Method.
基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、
金属層を部分的にハーフエッチングして薄くすることにより、前記金属層のエッチングする部分を除く箇所に、前記配線基板の前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成し、前記台状突部を有する前記基板を得る工程と、
次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法。
A method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring substrate having a through hole to the substrate through an adhesive layer,
The metal layer is partially half-etched and thinned, so that a portion of the metal layer except the portion to be etched is substantially equivalent to a cross section perpendicular to the central axis of the through-hole of the wiring board in the through-hole. Forming a table-like protrusion having a flat surface of a size that can be stored as an end surface on the protruding tip side, and obtaining the substrate having the table-like protrusion; and
Next, by bonding the substrate and the wiring substrate through the adhesive layer, the through hole of the wiring substrate and the opening formed in the adhesive layer are in a communication hole formed to communicate with each other. And manufacturing the wiring board for mounting an electronic component, comprising the step of accommodating the base-like protrusion of the substrate and obtaining the non-through hole for mounting the small electronic component by making the communication hole non-through. Method.
基板に貫通穴を有する配線基板を接着剤層を介して接着して小型電子部品搭載用非貫通穴を有する電子部品搭載用配線基板を製造する方法であって、
前記基板が金属層であり、この基板の一部をパターンめっき法によって厚くして、前記配線基板の前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部を形成する工程と、
次いで、前記基板と前記配線基板とを前記接着剤層を介して接着することで、前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記基板の前記台状突部を収納するとともに、前記連通穴を非貫通として、前記小型電子部品搭載用非貫通穴を得る工程とを具備することを特徴とする電子部品搭載用配線基板の製造方法。
A method of manufacturing an electronic component mounting wiring board having a non-through hole for mounting a small electronic component by bonding a wiring substrate having a through hole to the substrate through an adhesive layer,
The substrate is a metal layer, and a part of the substrate is thickened by a pattern plating method so that the substrate can be accommodated in the through hole with a cross section perpendicular to the central axis of the through hole of the wiring substrate. Forming a trapezoidal protrusion having the flat surface of the protrusion as the end surface on the protruding tip side;
Next, by bonding the substrate and the wiring substrate through the adhesive layer, the through hole of the wiring substrate and the opening formed in the adhesive layer are in a communication hole formed to communicate with each other. And manufacturing the wiring board for mounting an electronic component, comprising the step of accommodating the base-like protrusion of the substrate and obtaining the non-through hole for mounting the small electronic component by making the communication hole non-through. Method.
請求項1〜4のいずれかに記載の電子部品搭載用配線基板の製造方法において、前記ハーフエッチング又は前記パターンめっき法によって、前記台状突部に、前記接着剤層の厚さの10%以上の突出寸法を確保することを特徴とする電子部品搭載用配線基板の製造方法。   In the manufacturing method of the electronic component mounting wiring board according to any one of claims 1 to 4, 10% or more of the thickness of the adhesive layer is formed on the trapezoidal protrusion by the half etching or the pattern plating method. The manufacturing method of the wiring board for electronic component mounting characterized by ensuring the protrusion dimension of this. 前記配線基板の前記貫通穴が、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることを特徴とする請求項1〜5のいずれかに記載の電子部品搭載用配線基板の製造方法。   The said through hole of the said wiring board is a round hole with a diameter of 0.8 mm or more, or a square hole with the length of one side of 0.8 mm or more. A method of manufacturing a wiring board for mounting electronic components. さらに、前記小型電子部品搭載用非貫通穴の内面にめっき層を形成する工程を具備することを特徴とする請求項1〜6のいずれかに記載の電子部品搭載用配線基板の製造方法。   Furthermore, the manufacturing method of the wiring board for electronic component mounting in any one of Claims 1-6 which comprises the process of forming a plating layer in the inner surface of the said small through-hole for electronic component mounting. 基板に小型電子部品収納用の貫通穴を有する配線基板が接着剤層を介して接着され、
前記基板には、前記貫通穴のその中心軸線に垂直の断面よりも大きい金属パッドが設けられ、この金属パッドの中央部の、前記配線基板の前記貫通穴に対応する位置に、前記貫通穴の前記断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部が突設されており、
前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記台状突部が収納され、しかも、前記連通穴内に前記台状突部を穴底とする小型電子部品搭載用非貫通穴が確保されていることを特徴とする電子部品搭載用配線基板。
A wiring board having a through hole for storing small electronic components is bonded to the board via an adhesive layer,
The substrate is provided with a metal pad larger than a cross section perpendicular to the central axis of the through hole, and the through hole is formed at a position corresponding to the through hole of the wiring board at the center of the metal pad. A table-like protrusion is provided that has a flat surface that is substantially the same as the cross section and that can be accommodated in the through hole, and has an end surface on the protruding tip side.
The trapezoidal protrusion is accommodated in a communication hole in which the through hole of the wiring board and the opening formed in the adhesive layer communicate with each other, and the trapezoidal protrusion is formed in the communication hole. A wiring board for mounting electronic parts, wherein a non-through hole for mounting a small electronic part is secured as a bottom.
基板に小型電子部品収納用の貫通穴を有する配線基板が接着剤層を介して接着され、
前記基板が金属層であり、前記基板には、前記配線基板の前記貫通穴に対応する位置に、前記貫通穴のその中心軸線に垂直の断面と略同等で前記貫通穴内に収納可能な大きさの平坦面を突出先端側の端面とする台状突部が突設されており、
前記配線基板の前記貫通穴と前記接着剤層に形成された開口部とが互いに連通してなる連通穴内に前記台状突部が収納され、しかも、前記連通穴内に前記台状突部を穴底とする小型電子部品搭載用非貫通穴が確保されていることを特徴とする電子部品搭載用配線基板。
A wiring board having a through hole for storing small electronic components is bonded to the board via an adhesive layer,
The substrate is a metal layer, and the substrate has a size corresponding to the through-hole of the wiring substrate and can be accommodated in the through-hole with a cross section perpendicular to the central axis of the through-hole. The base-like protrusion which makes the flat surface of
The trapezoidal protrusion is accommodated in a communication hole in which the through hole of the wiring board and the opening formed in the adhesive layer communicate with each other, and the trapezoidal protrusion is formed in the communication hole. A wiring board for mounting electronic parts, wherein a non-through hole for mounting a small electronic part is secured as a bottom.
前記台状突部は、前記端面から前記基板における該台状突部の突出基端側へ行くにしたがって、その外周面が外側に拡がるテーパ形状になっていることを特徴とする請求項8又は9記載の電子部品搭載用配線基板。   9. The taper-like protrusion has a taper shape in which an outer peripheral surface of the base-like protrusion expands outward as it goes from the end face toward the protruding base end side of the base-like protrusion on the substrate. 9. A wiring board for mounting electronic components according to 9. 前記配線基板の前記貫通穴が、直径0.8mm以上の丸穴、あるいは、一辺の長さが0.8mm以上の角穴であることを特徴とする請求項8〜10のいずれかに記載の電子部品搭載用配線基板。   The said through hole of the said wiring board is a round hole with a diameter of 0.8 mm or more, or a square hole with one side length of 0.8 mm or more. Wiring board for mounting electronic components. 前記小型電子部品搭載用非貫通穴の内面にめっき層が形成されていることを特徴とする請求項8〜11のいずれかに記載の電子部品搭載用配線基板。   The wiring board for mounting electronic components according to claim 8, wherein a plating layer is formed on an inner surface of the non-through hole for mounting the small electronic components. 請求項8〜11のいずれかに記載の電子部品搭載用配線基板の前記台状突部の前記端面に直接、あるいは、前記小型電子部品搭載用非貫通穴の内面に形成されためっき層の内の前記台状突部の前記端面に形成された部分に小型電子部品が搭載され、
前記小型電子部品が、前記配線基板の配線にワイヤボンディングによって電気的に接続されていることを特徴とする電子部品付き配線基板。
The inside of the plating layer formed in the said end surface of the said base-like protrusion part of the wiring board for electronic component mounting in any one of Claims 8-11 or the inner surface of the said non-through hole for small electronic component mounting. A small electronic component is mounted on a portion formed on the end face of the trapezoidal protrusion,
The wiring board with electronic parts, wherein the small electronic parts are electrically connected to the wiring of the wiring board by wire bonding.
JP2008021055A 2008-01-31 2008-01-31 Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component Pending JP2009182216A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008021055A JP2009182216A (en) 2008-01-31 2008-01-31 Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008021055A JP2009182216A (en) 2008-01-31 2008-01-31 Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component

Publications (1)

Publication Number Publication Date
JP2009182216A true JP2009182216A (en) 2009-08-13

Family

ID=41035932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008021055A Pending JP2009182216A (en) 2008-01-31 2008-01-31 Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component

Country Status (1)

Country Link
JP (1) JP2009182216A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014017410A (en) * 2012-07-10 2014-01-30 Hitachi Chemical Co Ltd Multilayer wiring board and manufacturing method of the same
JP2014067975A (en) * 2012-09-27 2014-04-17 Hitachi Chemical Co Ltd Method for manufacturing multilayer wiring board

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09307198A (en) * 1996-05-10 1997-11-28 Ibiden Co Ltd Electronic component mounting substrate
JP2004319644A (en) * 2003-04-14 2004-11-11 Sumitomo Metal Electronics Devices Inc High heat dissipation type plastic package and manufacturing method thereof
JP2005136224A (en) * 2003-10-30 2005-05-26 Asahi Kasei Electronics Co Ltd Light emitting diode lighting module
JP2006229120A (en) * 2005-02-21 2006-08-31 Sumitomo Metal Electronics Devices Inc High heat-radiation plastic package and its manufacturing method
JP2006287126A (en) * 2005-04-04 2006-10-19 Toyoda Gosei Co Ltd Led lamp and its unit sheet manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09307198A (en) * 1996-05-10 1997-11-28 Ibiden Co Ltd Electronic component mounting substrate
JP2004319644A (en) * 2003-04-14 2004-11-11 Sumitomo Metal Electronics Devices Inc High heat dissipation type plastic package and manufacturing method thereof
JP2005136224A (en) * 2003-10-30 2005-05-26 Asahi Kasei Electronics Co Ltd Light emitting diode lighting module
JP2006229120A (en) * 2005-02-21 2006-08-31 Sumitomo Metal Electronics Devices Inc High heat-radiation plastic package and its manufacturing method
JP2006287126A (en) * 2005-04-04 2006-10-19 Toyoda Gosei Co Ltd Led lamp and its unit sheet manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014017410A (en) * 2012-07-10 2014-01-30 Hitachi Chemical Co Ltd Multilayer wiring board and manufacturing method of the same
JP2014067975A (en) * 2012-09-27 2014-04-17 Hitachi Chemical Co Ltd Method for manufacturing multilayer wiring board

Similar Documents

Publication Publication Date Title
JP5188256B2 (en) Capacitor component manufacturing method
WO1991016726A1 (en) Multilayer circuit board for mounting ic and manufacture thereof
JP2016063130A (en) Printed wiring board and semiconductor package
JP2011091308A (en) Printed wiring board
JP2017107933A (en) Wiring board and method of manufacturing the same
JP2008124247A (en) Component built-in substrate and manufacturing method thereof
JP4401241B2 (en) Standoff / mask structure for electrical interconnection
JP2017228720A (en) Wiring board and wiring board manufacturing method
KR20050033821A (en) Semiconductor device and method of fabricating the same
CN201247772Y (en) Circuit board
JP2009182216A (en) Method of manufacturing wiring circuit board for mounting electronic component, the wiring circuit board for mounting electronic component, and wiring circuit board with the electronic component
JP5006252B2 (en) Wiring board manufacturing method and wiring board
JP4863076B2 (en) Wiring board and manufacturing method thereof
JP2011258663A (en) Wiring board and method for manufacturing wiring board
JP2007250608A (en) Circuit board having hollow portion, method for manufacturing the same, and method for manufacturing a circuit device using the same
JP2007173727A (en) Method of manufacturing wiring board
KR100693146B1 (en) Manufacturing method of multilayer printed circuit board
KR100699240B1 (en) Element-embedded printed circuit board and its manufacturing method
JP2018207079A (en) Printed wiring board and manufacturing method therefor
JPH09199632A (en) Electronic component mounting substrate and its fabrication method
JP2012023100A (en) Wiring board equipped with buried component, and method of manufacturing wiring board equipped with buried component
JP2004200608A (en) Printed wiring board, and manufacturing method thereof
JP3203176B2 (en) Hybrid integrated circuit device and method of manufacturing the same
JP2007115954A (en) Multilayer printed wiring board and manufacturing method thereof
JP2018207080A (en) Printed wiring board and manufacturing method therefor

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20101015

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120113

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120117

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120529