JP2008251779A - Neutralizing and cleaning device, and neutralizing and cleaning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a neutralizing and cleaning device and a neutralizing and cleaning method by which chemical constituents adhered to the inside of a substrate processing apparatus can be reliably eliminated while reducing the amount of a liquid used for cleaning. <P>SOLUTION: The neutralizing and cleaning device 1 constitutes a circulation pathway of a diluting fluid between itself and the inside of the substrate processing apparatus 90. It adds a neutralizer to the diluting fluid while circulating the diluting fluid. Also, the neutralizing and cleaning device 1 measures a pH value of the circulated diluting fluid by a pH sensor 16 and continues to add the neutralizer until the measured value falls within the predetermined range of numeric values. Accordingly, consumption of the diluting liquid can be reduced by circulating the diluting liquid and the chemical constituents in the diluting liquid can be reliably neutralized on the basis of the measured value of the pH sensor 16. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a neutralization cleaning apparatus and a neutralization cleaning method for neutralizing and cleaning a chemical solution adhering to the inside of a substrate processing apparatus.

  2. Description of the Related Art Conventionally, there has been known a substrate processing apparatus that performs a chemical processing such as an etching process using a chemical solution or a chemical cleaning process on a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display device, or a glass substrate for a photomask. The substrate processing apparatus has a chemical solution tank for storing a chemical solution, and performs chemical treatment on the substrate by immersing the substrate in the chemical solution stored in the chemical solution tank. Such a substrate processing apparatus is disclosed in Patent Document 1, for example.

  When the chemical processing is repeatedly performed in the substrate processing apparatus, the chemical components are attached to each part in the substrate processing apparatus even after the chemical liquid is drained. For this reason, when discarding or recycling the substrate processing apparatus, it is necessary to clean the inside of the substrate processing apparatus in advance. Conventionally, for example, the inside of a substrate processing apparatus was cleaned by supplying pure water into the substrate processing apparatus in a shower-like manner, and draining while diluting a chemical component adhering to the inside of the substrate processing apparatus. .

JP 2007-53282 A

  However, with the conventional cleaning method described above, it has been difficult to reliably remove the chemical component adhering to the inside of the substrate processing apparatus. In particular, it is difficult for pure water to reach inside the drainage pipe and exhaust pipe of the substrate processing apparatus, and since these places cannot be visually confirmed, the chemical components adhering to these places are surely removed. It was difficult.

  Further, in the conventional cleaning method described above, since pure water supplied into the substrate processing apparatus is drained without being used secondarily, it is necessary to supply a large amount of pure water. In addition, since a large amount of pure water is drained together with the chemical components, the burden of detoxification treatment at the time of draining is large.

  The present invention has been made in view of such circumstances, and can reduce the amount of liquid used for cleaning processing and can reliably remove chemical components adhering to the inside of the substrate processing apparatus. It is an object of the present invention to provide a neutralization cleaning apparatus and a neutralization cleaning method for an apparatus.

  In order to solve the above-mentioned problem, the invention according to claim 1 is a neutralization cleaning apparatus for neutralizing and cleaning a chemical solution adhering to the inside of a substrate processing apparatus, wherein the substrate processing is performed by being connected to the substrate processing apparatus. A circulation path for the dilution liquid is formed with the apparatus, the circulation section for circulating the dilution liquid supplied into the substrate processing apparatus, a pH sensor for measuring the pH value of the dilution liquid in the circulation path, and the circulation A neutralizing agent supply unit for adding a neutralizing agent to the diluting liquid circulated by the unit, and a control unit for receiving the measurement value of the pH sensor and controlling the operation of the neutralizing agent supply unit, The control unit is characterized in that the neutralizing agent is continuously added by the neutralizing agent supply unit until the measured value of the pH sensor falls within a preset numerical range.

  The invention according to claim 2 is the neutralization cleaning apparatus according to claim 1, wherein the circulation unit collects the diluent from the drain pipe and the exhaust pipe of the substrate processing apparatus and supplies the diluted liquid to the substrate processing apparatus. The diluting liquid is supplied again.

  The invention according to claim 3 is the neutralization washing apparatus according to claim 1 or claim 2, wherein the neutralizer supply section includes an alkaline neutralizer supply section that supplies an alkaline neutralizer, It has an acidic neutralizing agent supply part which supplies an acidic neutralizing agent.

  The invention according to claim 4 is a neutralization cleaning apparatus for neutralizing and cleaning a chemical solution adhering to the inside of the substrate processing apparatus, and supplying a neutralizing agent for supplying a mist-like neutralizing agent to the inside of the substrate processing apparatus And a circulation unit configured to circulate a mist-like neutralizing agent supplied from the neutralizing agent supply unit by forming a circulation path between the unit and the substrate processing apparatus by being connected to the substrate processing apparatus, A pH sensor that measures the pH value of the circulating gas in the circulation path; and a control unit that receives the measurement value of the pH sensor and controls the operation of the neutralizing agent supply unit and the circulation unit. The mist neutralizer is supplied by the neutralizer supply unit and the mist neutralizer is circulated by the circulation unit until the measured value of the pH sensor falls within a preset numerical range. It is characterized by continuing.

  The invention according to claim 5 is the neutralization cleaning apparatus according to claim 4, wherein the circulation unit collects the mist-like neutralizing agent from the drain pipe and the exhaust pipe of the substrate processing apparatus while collecting the mist. It is characterized by circulating a neutralizing agent in the form of a ring.

  The invention according to claim 6 is the neutralization cleaning apparatus according to claim 4 or claim 5, wherein the neutralizing agent supply unit includes an alkaline neutralizing agent supply unit that supplies an alkaline neutralizing agent, It has an acidic neutralizing agent supply part which supplies an acidic neutralizing agent.

  The invention according to claim 7 is a neutralization cleaning method for neutralizing and cleaning the chemical solution adhering to the inside of the substrate processing apparatus, the first step of supplying a diluent to the inside of the substrate processing apparatus, and the substrate processing A second step of circulating the diluent between the inside of the apparatus and a predetermined circulation path, a third step of adding a neutralizing agent to the circulating diluent, and measuring the pH value of the circulating diluent And adding the neutralizing agent in the third step until the measured value in the fourth step falls within a preset numerical range.

  The invention according to claim 8 is a neutralization cleaning method for neutralizing and cleaning the chemical solution adhering to the inside of the substrate processing apparatus, the first step of supplying a mist-like neutralizing agent to the inside of the substrate processing apparatus; And a second step of circulating a mist-like neutralizing agent between the inside of the substrate processing apparatus and a predetermined circulation path, and a third step of measuring the pH value of the circulating gas. The supply of the mist-like neutralizing agent and the circulation of the mist-like neutralizing agent in the second step are continued until the measured value in the third step falls within a preset numerical range. To do.

  According to the first aspect of the present invention, the neutralization cleaning apparatus is connected to the substrate processing apparatus so as to form a circulation path for the dilution liquid with the substrate processing apparatus and is supplied into the substrate processing apparatus. Circulating part for circulating the diluting liquid, pH sensor for measuring the pH value of the diluting liquid in the circulation path, neutralizing agent supplying part for adding a neutralizing agent to the diluting liquid circulated by the circulating part, and measurement of the pH sensor A controller that receives the value and controls the operation of the neutralizer supply unit, and the controller neutralizes by the neutralizer supply unit until the measured value of the pH sensor falls within a preset numerical range. Continue adding agent. For this reason, it is possible to reliably neutralize the chemical component in the diluent based on the measured value of the pH sensor while reducing the amount of the diluent used by circulating the diluent.

  In particular, according to the second aspect of the present invention, the circulation unit collects the diluent from the drain pipe and the exhaust pipe of the substrate processing apparatus and re-supplies the diluent to the substrate processing apparatus. For this reason, the circulation path of the dilution liquid is configured including the drainage pipe and the exhaust pipe, and the chemical component adhering to the inside of these pipes is also removed well.

  In particular, according to the invention described in claim 3, the neutralizing agent supply unit includes an alkaline neutralizing agent supply unit that supplies an alkaline neutralizing agent, and an acidic neutralizing agent supply unit that supplies an acidic neutralizing agent. And have. For this reason, the neutralization washing | cleaning apparatus can supply a suitable neutralizing agent according to the kind of chemical | medical solution used as removal object.

  According to the fourth aspect of the present invention, the neutralization cleaning apparatus is connected to the substrate processing apparatus and the neutralizing agent supply section that supplies the mist-shaped neutralizing agent to the inside of the substrate processing apparatus. A circulation path that constitutes a circulation path with the substrate processing apparatus, circulates the mist-like neutralizer supplied from the neutralizer supply section, a pH sensor that measures the pH value of the circulating gas in the circulation path, a control unit that receives the measured value of the pH sensor and controls the operation of the neutralizing agent supply unit and the circulation unit, and the control unit is in the middle until the measured value of the pH sensor falls within a preset numerical range. The supply of the mist-like neutralizing agent by the summing agent supply unit and the circulation of the mist-like neutralizing agent by the circulation unit are continued. For this reason, it is possible to distribute the neutralizing agent inside the substrate processing apparatus without using a diluent, and it is possible to reliably neutralize the chemical component based on the measured value of the pH sensor.

  In particular, according to the invention described in claim 5, the circulation unit circulates the mist neutralizer while recovering the mist neutralizer from the drain pipe and the exhaust pipe of the substrate processing apparatus. For this reason, the circulation path of the neutralizing agent is constituted including the drainage pipe and the exhaust pipe, and the chemical component adhering to the inside of these pipes is also well neutralized.

  In particular, according to the invention described in claim 6, the neutralizer supply section includes an alkaline neutralizer supply section that supplies an alkaline neutralizer and an acidic neutralizer supply section that supplies an acidic neutralizer. And have. For this reason, the neutralization washing | cleaning apparatus can supply a suitable neutralizing agent according to the kind of chemical | medical solution used as removal object.

  According to the seventh aspect of the present invention, the neutralization cleaning method includes a first step of supplying a diluent to the inside of the substrate processing apparatus, and dilution between the inside of the substrate processing apparatus and a predetermined circulation path. A second step of circulating the liquid, a third step of adding a neutralizing agent to the diluted diluent to be circulated, and a fourth step of measuring the pH value of the diluted diluent to be circulated. The addition of the neutralizing agent is continued until the measured value in the fourth step falls within a preset numerical range. For this reason, it is possible to reliably neutralize the chemical component in the diluent based on the measured value of the pH sensor while reducing the amount of the diluent used by circulating the diluent.

  According to the invention described in claim 8, the neutralization cleaning method includes a first step of supplying a mist-like neutralizing agent to the inside of the substrate processing apparatus, the inside of the substrate processing apparatus, and a predetermined circulation path. A second step of circulating a mist-like neutralizing agent between, and a third step of measuring the pH value of the circulating gas, the supply of the mist-like neutralizing agent in the first step and the second step The circulation of the mist-like neutralizing agent is continued until the measured value in the third step falls within a preset numerical range. For this reason, it is possible to distribute the neutralizing agent inside the substrate processing apparatus without using a diluent, and it is possible to reliably neutralize the chemical component based on the measured value of the pH sensor.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

<1. First Embodiment>
<1-1. Configuration and operation of substrate processing apparatus>
FIG. 1 is a diagram showing a configuration of a substrate processing apparatus 90 to be cleaned in the first embodiment of the present invention. The substrate processing apparatus 90 is an apparatus for performing chemical processing such as etching and chemical cleaning on the substrate W by immersing a plurality of substrates (hereinafter simply referred to as “substrate”) W in the chemical. It is. As shown in FIG. 1, the substrate processing apparatus 90 supplies a chemical solution to the chemical solution tank 91 that stores the chemical solution, a chamber 92 that stores the chemical solution tank 91, a lifter 93 that holds the substrate W, and the chemical solution tank 91. A chemical solution supply unit 94, a liquid discharge unit 95 that discharges liquid from the chemical solution tank 91 and the chamber 92, an exhaust unit 96 that exhausts air from the chamber 92, and a control unit 97 that controls the operation of each unit in the apparatus. ing.

  The chemical solution tank 91 is made of a corrosion-resistant material such as quartz and stores the chemical solution therein. A pair of chemical liquid discharge nozzles 91 a for discharging the chemical liquid toward the inside of the chemical liquid tank 91 is provided at the bottom of the chemical liquid tank 91. The chemical solution discharge nozzle 91a has a plurality of discharge ports (not shown), and stores the chemical solution in the chemical solution tank 91 by discharging the chemical solution from the plurality of discharge ports. In addition, an outer tank 91 b for collecting the chemical liquid overflowed from the chemical liquid tank 91 is provided at the upper end portion of the outer peripheral surface of the chemical liquid tank 91. For this reason, the chemical | medical solution stored to the upper part of the chemical | medical solution tank 91 overflows from the upper part of the chemical | medical solution tank 91, and is collect | recovered by the outer tank 91b.

  The chamber 92 is composed of an airtight member and accommodates a chemical solution tank 91 therein. An openable / closable shutter 92 a is provided on the upper portion of the chamber 92. The shutter 92a is slid by a drive mechanism (not shown) to switch between a state in which the opening 92b above the chamber 92 is opened and a state in which the opening 92b is closed. When the shutter 92a is opened, the substrate W can be carried in and out through the opening 92b. When the shutter 92a is closed, the inside of the chamber 92 is sealed, and the atmosphere in the chamber 92 containing the chemical component is prevented from diffusing outside the chamber 92.

  The lifter 93 is a transport mechanism for transporting the substrate W up and down inside the chamber 92. The lifter 93 has three holding bars 93a extending in a horizontal direction (a direction perpendicular to the paper surface in FIG. 1), and the substrate W stands upright on a plurality of holding grooves carved in each holding bar 93a. Held in. The lifter 93 is moved up and down by a predetermined drive mechanism. When the lifter 93 is moved up and down with the substrate W placed on the lifter 93, the substrate W is transported up and down between the immersion position in the chemical solution tank 91 and the pulling position above the chemical solution tank 91. .

  The chemical liquid supply unit 94 is a piping system for supplying the chemical liquid to the chemical liquid discharge nozzle 91 a of the chemical liquid tank 91. The chemical liquid supply unit 94 includes a chemical liquid supply source 94a, a chemical liquid supply pipe 94b that connects the chemical liquid supply source 94a and the chemical liquid discharge nozzle 91a, and a valve 94c provided on the chemical liquid supply pipe 94b. When the valve 94c is opened, the chemical solution is supplied from the chemical solution supply source 94a to the chemical solution discharge nozzle 91a via the chemical solution supply pipe 94b, and the chemical solution is discharged from the plurality of discharge ports of the chemical solution discharge nozzle 91a toward the inside of the chemical solution tank 91. The The chemical solution supplied from the chemical solution supply source 94a may be an acidic chemical solution such as hydrofluoric acid or caroic acid (a mixed solution of sulfuric acid and hydrogen peroxide solution), or may be an alkaline chemical solution such as ammonia water. Good.

  The drainage unit 95 is a piping system for draining liquid from the chemical tank 91 or the chamber 92. The drainage unit 95 includes a drainage pipe 95 a connected to the bottom of the chemical tank 91, a drainage pipe 95 b connected to the outer tank 91 b, and a drainage pipe 95 c connected to the bottom of the chamber 92. is doing. Valves 95d, 95e, and 95f are provided on the drainage pipes 95a, 95b, and 95c, respectively. Further, the drainage pipe 95a and the drainage pipe 95b merge into one drainage pipe 95g on the downstream side. Further, the downstream ends of the drainage pipe 95c and the drainage pipe 95g are connected to the drainage line via a detoxification mechanism in the factory. Therefore, when the valves 95d, 95e, and 95f are opened, the liquid in the chemical tank 91, the outer tank 91b, and the chamber 92 is sent to the detoxification mechanism in the factory through the drain pipes 95a, 95b, 95c, and 95g. And is discharged to the drainage line after detoxification treatment.

  The exhaust part 96 has an exhaust duct 96a formed on the side of the chamber 92, an exhaust pipe 96b connected to the downstream side of the exhaust duct 96a, and a valve provided on the exhaust pipe 96b. Further, the downstream end of the exhaust pipe 96b is connected to an exhaust line via a harmless mechanism in the factory. Therefore, when the valve 96c is opened, the gas in the chamber 92 is supplied to the harmless mechanism in the factory through the exhaust duct 96a and the exhaust pipe 96b, and is discharged to the exhaust line after the harmless treatment.

  The control unit 97 is electrically connected to the valves 94c, 95d, 95e, 95f, and 96c, and controls these operations. The control unit 97 is configured by, for example, a computer having a CPU and a memory, and controls the above-described units when the computer operates according to an instruction input from an operator and a program installed in the computer.

  In such a substrate processing apparatus 90, when processing the substrate W, first, the valve 94c is opened to store the chemical in the chemical tank 91, and the chemical overflows from the upper part of the chemical tank 91 to the outer tank 91b. State. Then, the shutter 92 a of the chamber 92 is opened, and the unprocessed substrate W is placed on the lifter 93 and the lifter 93 is lowered, so that the substrate W is immersed in the chemical solution stored in the chemical solution tank 91. The substrate W is subjected to a predetermined chemical treatment by being immersed in the chemical. Thereafter, when a predetermined time elapses, the lifter 93 is raised to pull up the substrate W, and the chemical treatment for the set of substrates W is completed.

  In such a substrate processing apparatus 90, when a chemical process is repeatedly performed, a chemical component adheres to each part of the substrate processing apparatus 90. For example, a relatively high concentration chemical solution component adheres to a portion where the chemical solution directly contacts, such as the inner wall of the chemical solution tank 91 and the drainage pipes 95a, 95b, and 95g. Further, the mist of the chemical solution scatters to places where the chemical solution does not normally contact such as the outer wall of the chemical solution tank 91, the inner wall of the chamber 92, the exhaust duct 96a, and the exhaust pipe 96b. Concentrated chemical components adhere. For this reason, when the substrate processing apparatus 90 is discarded or recycled, it is necessary to clean each part in the apparatus.

<1-2. Configuration of neutralization cleaning device>
Next, the neutralization cleaning apparatus 1 for neutralizing and cleaning the inside of the substrate processing apparatus 90 when the substrate processing apparatus 90 is discarded or recycled will be described. FIG. 2 is a diagram illustrating a configuration of the neutralization cleaning apparatus 1 according to the first embodiment. As shown in FIG. 2, the neutralization cleaning apparatus 1 mainly includes a dilution liquid circulation unit 10 that circulates a dilution liquid for diluting a chemical component adhering to the inside of the substrate processing apparatus 90, and neutralizes the dilution liquid. The neutralizing agent supply part 20 which supplies the neutralizing agent for performing, and the control part 30 which carries out operation control of each part in the neutralization washing | cleaning apparatus 1 are provided.

  The diluting liquid circulation unit 10 includes a coupler 11 connected to the drainage unit 95 or the exhaust unit 96 of the substrate processing apparatus 90, a circulation nozzle 12 installed toward the chemical solution tank 91 or the chamber 92, and the coupler 11 and the circulation nozzle. And a circulation pipe 13 connecting between the two. A filter 14, a circulation pump 15, and a pH sensor 16 are provided in order from the upstream side along the path of the circulation pipe 13. For this reason, when the coupler 11 and the circulation nozzle 12 are respectively connected to the substrate processing apparatus 90 and the circulation pump 15 is operated, the diluted solution recovered by the coupler 11 passes through the circulation pipe 13 and is returned to the chemical solution tank 91 or the chamber 92. Supplied. In the middle of the path of the circulation pipe 13, the diluent is filtered by the filter 14, and the pH value is measured by the pH sensor 16.

  The neutralizing agent supply unit 20 includes a neutralizing agent supply source 21, a neutralizing agent supply pipe 22 that supplies the neutralizing agent, and a neutralizing agent supply nozzle 23 that discharges the neutralizing agent to the chemical tank 91 or the chamber 92. And have. The neutralizing agent supply source 21 has an alkaline neutralizing agent supply source 211 for supplying an alkaline neutralizing agent and an acidic neutralizing agent supply source 212 for supplying an acidic neutralizing agent. As the alkaline neutralizing agent, for example, a low concentration alkaline solution such as dilute aqueous ammonia, dilute sodium hydroxide aqueous solution, dilute potassium hydroxide aqueous solution or the like is used. Moreover, as an acidic neutralizer, low concentration acidic solutions, such as dilute hydrochloric acid and dilute sulfuric acid, are used, for example.

  The alkaline neutralizing agent supply source 211 is connected to the neutralizing agent supply pipe 22 via a valve 211a and a replenishing pump 211b, and the acidic neutralizing agent supply source 212 is connected via a valve 212a and a replenishing pump 212b. The neutralizer supply pipe 22 is connected. For this reason, when the valve 212a is closed and the valve 211a is opened and the replenishment pump 211b is operated, the alkaline neutralization from the alkaline neutralizer supply source 211 to the neutralizer supply nozzle 23 via the neutralizer supply pipe 22 is performed. The agent is supplied, and the alkaline neutralizer is discharged from the neutralizer supply nozzle 23 into the chemical tank 91 or the chamber 92. When the valve 211a is closed and the valve 212a is opened and the replenishing pump 212b is operated, the acidic neutralizer is supplied from the acidic neutralizer supply source 212 to the neutralizer supply nozzle 23 via the neutralizer supply pipe 22. Is supplied, and the acidic neutralizer is discharged from the neutralizer supply nozzle 23 into the chemical tank 91 or the chamber 92.

  Thus, the neutralizing agent supply source 21 can switch and supply the alkaline neutralizing agent and the acidic neutralizing agent. For this reason, the neutralizer supply part 20 can supply an alkaline neutralizer or an acidic neutralizer appropriately according to the kind of chemical | medical solution which should be neutralized.

  The control unit 30 is electrically connected to the circulation pump 15, the pH sensor 16, the neutralizing agent supply source 21 (more specifically, the valves 211a and 212a and the replenishing pumps 211b and 212b in the neutralizing agent supply source 21). It is connected to the. The control unit 30 receives the measurement value of the pH sensor 16 and controls the operation of the circulation pump 15 and the neutralizing agent supply source 21. In particular, the control unit 30 controls the timing of supplying and stopping the neutralizing agent by controlling the opening and closing of the valves 211a and 212a and the operation of the replenishing pumps 211b and 212b based on the measured values received from the pH sensor 16. be able to. The control unit 30 includes, for example, a computer having a CPU and a memory, and performs the above-described control by the computer operating according to an instruction input from an operator and a program installed in the computer.

  Further, in the neutralization cleaning device 1, the filter 14, the circulation pump 15, the pH sensor 16, the neutralizing agent supply source 21, and the control unit 30 are accommodated and integrated in the main body box 40. For this reason, the neutralization cleaning apparatus 1 has an easy-to-handle configuration in which only the coupler 11, the circulation nozzle 12, and the neutralizing agent supply nozzle 23 connected to the substrate processing apparatus 90 are disposed outside the main body box 40. Yes.

<1-3. Cleaning work>
Subsequently, the cleaning operation of the substrate processing apparatus 90 performed using the neutralization cleaning apparatus 1 when the substrate processing apparatus 90 is discarded or recycled will be described with reference to the flowchart of FIG. 3 and FIGS. 4 and 5. explain. In addition, it is assumed that a relatively high concentration of chemical solution components are attached to the inner wall of the chemical solution tank 91 of the substrate processing apparatus 90 and the drainage pipes 95a, 95b, and 95g. "Area". Also, it is assumed that a low concentration chemical component has adhered to the outer wall of the chemical bath 91 of the substrate processing apparatus 90, the inner wall of the chamber 92, the exhaust duct 96a, and the exhaust pipe 96b after many years of use. These parts are hereinafter referred to as “low density areas”.

  As shown in FIG. 4, first, the operator connects the neutralization cleaning apparatus 1 to the high concentration area of the substrate processing apparatus 90 (step S1). That is, the downstream end of the drainage pipe 95g extending from the high concentration area of the substrate processing apparatus 90 is sealed, and the coupler 11 of the neutralization cleaning apparatus 1 is connected to the downstream end of the drainage pipe 95g. . In addition, the operator installs the circulation nozzle 12 of the neutralization cleaning apparatus 1 toward the inside of the chemical solution tank 91 of the substrate processing apparatus 90. As a result, a diluting liquid circulation path is formed between the high concentration area of the substrate processing apparatus 90 and the diluting liquid circulating section 10 of the neutralization cleaning apparatus 1.

  Further, the operator installs the neutralizing agent supply nozzle 23 of the neutralization cleaning device 1 and the diluent supply nozzle 81 for supplying the diluent toward the inside of the chemical solution tank 91. The diluent supply nozzle 81 is connected to a diluent supply source 83 via a diluent supply pipe 82, and a valve 84 is provided on the diluent supply pipe 82. As the diluent, for example, pure water or industrial water can be used. As the diluent supply source 83, a pure water supply source or an industrial water supply source provided as a utility in the factory may be used.

  When the above connection work is completed, the worker then opens the valve 84. As a result, the diluent is supplied from the diluent supply source 83 to the inside of the chemical tank 91 via the diluent supply pipe 82 and the diluent supply nozzle 81, and the diluent is stored inside the chemical tank 91 (step S2). ). Thereafter, the operator opens the valves 95d and 95e of the substrate processing apparatus 90 and operates the circulation pump 15 of the neutralization cleaning apparatus 1 to supply the diluted solution stored in the chemical solution tank 91 through the circulation pipe 13. (Step S3). The operator closes the valve 84 and stops supplying the diluting liquid when the diluting liquid is well circulated.

  The chemical liquid components adhering to the inner wall of the chemical liquid tank 91 and the drainage pipes 95a, 95b, and 95g are released from the adhering surface by the flow of the diluted liquid and mixed into the diluted liquid. Thereby, a chemical | medical solution component is diluted. Moreover, the neutralization washing | cleaning apparatus 1 measures the pH value of the diluting liquid circulated with the pH sensor 16, and based on the measured pH value, an alkaline neutralizing agent or an acidic neutralizing agent is supplied from the neutralizing agent supply source 21. Supply (step S4). That is, when the measured value of the pH sensor 16 is relatively low (the diluted solution is acidic), an alkaline neutralizer is supplied from the neutralizer supply unit 20, and the measured value of the pH sensor 16 is relatively low. When it is high (the diluted solution is alkaline), an acidic neutralizer is supplied from the neutralizer supply unit 20. Specifically, one of the valves 211a and 212a of the neutralizing agent supply source 21 is opened by an instruction from the control unit 30, and one of the replenishing pumps 211b and 212b is operated, whereby the neutralizing agent is operated. Is supplied. The neutralizing agent is discharged from the neutralizing agent supply nozzle 23 and added to the diluted solution in the chemical solution tank 91.

  In addition, the pH sensor 16 of the neutralization cleaning device 1 continues to measure the pH value of the diluted solution and transmits the measured value to the control unit 30. The control unit 30 determines whether or not the measured value received from the pH sensor 16 is within a preset numerical range (step S5). If the measured value is out of the numerical range, the control unit 30 continues to neutralize in step S14. Add the agent. On the other hand, when the measured value received from the pH sensor 16 falls within a predetermined numerical range, the control unit 30 determines that neutralization of the diluent has been completed, stops the replenishment pumps 211b and 212b, and sets the valve The supply of the neutralizing agent from the neutralizing agent supply source 21 is stopped by closing the 211a and 212a.

  When neutralization of the diluted solution is completed, the neutralization cleaning device 1 temporarily stops the circulation pump 15. And an operator removes the circulation nozzle 12 from the chemical | medical solution tank 91, and connects it to the drainage line in a factory. The neutralization cleaning apparatus 1 operates the circulation pump 15 again to discharge the diluted solution to the drain line (step S6). Since the diluted solution has been neutralized in the above steps S4 to S5, it can be discharged to the drain line without going through the detoxification mechanism in the factory. Thus, the cleaning process for the high concentration area of the substrate processing apparatus 90 is completed.

  Subsequently, the operator reconnects the neutralization cleaning apparatus 1 to the low concentration area of the substrate processing apparatus 90 (step S7). That is, as shown in FIG. 5, the downstream end of the drainage pipe 95c and the exhaust pipe 96b extending from the low concentration area of the substrate processing apparatus 90 is sealed, and the coupler 11 of the neutralization cleaning apparatus 1 is drained. It connects to the downstream end of the liquid pipe 95g and the exhaust pipe 96b. Further, the operator installs the circulation nozzle 12 of the neutralization cleaning apparatus 1 between the inner wall of the chamber 92 and the outer wall of the chemical solution tank 91. Thereby, a diluting liquid circulation path is formed between the low concentration area of the substrate processing apparatus 90 and the diluting liquid circulating section 10 of the neutralization cleaning apparatus 1. In addition, the operator installs the neutralizing agent supply nozzle 23 and the diluent supply nozzle 81 between the inner wall of the chamber 92 and the outer wall of the chemical solution tank 91.

  Next, the operator opens the valve 84. As a result, the diluent is supplied from the diluent supply source 83 into the chamber 92 through the diluent supply pipe 82 and the diluent supply nozzle 81, and the diluent is stored in the chamber 92 (step S8). Thereafter, the operator opens the valves 95f and 96c of the substrate processing apparatus 90 and operates the circulation pump 15 of the neutralization cleaning apparatus 1 to supply the diluted solution stored in the chamber 92 through the circulation pipe 13. Circulate (step S9). The operator closes the valve 84 and stops supplying the diluting liquid when the diluting liquid is well circulated.

  The chemical component adhering to the outer wall of the chemical bath 91, the inner wall of the chamber 92, the inside of the exhaust duct 96a, and the inside of the exhaust pipe 96b is released from the adhering surface by the flow of the diluting solution and mixed in the diluting solution. Thereby, a chemical | medical solution component is diluted. Moreover, the neutralization washing | cleaning apparatus 1 measures the pH value of the diluting liquid circulated with the pH sensor 16, and based on the measured pH value, an alkaline neutralizing agent or an acidic neutralizing agent is supplied from the neutralizing agent supply source 21. Supply (step S10). That is, when the measured value of the pH sensor 16 is relatively low (the diluted solution is acidic), an alkaline neutralizer is supplied from the neutralizer supply unit 20, and the measured value of the pH sensor 16 is relatively low. When it is high (the diluted solution is alkaline), an acidic neutralizer is supplied from the neutralizer supply unit 20. Specifically, one of the valves 211a and 212a of the neutralizing agent supply source 21 is opened by an instruction from the control unit 30, and one of the replenishing pumps 211b and 212b is operated, whereby the neutralizing agent is operated. Is supplied. The neutralizing agent is discharged from the neutralizing agent supply nozzle 23 and added to the diluted solution in the chemical solution tank 91.

  In addition, the pH sensor 16 of the neutralization cleaning device 1 continues to measure the pH value of the diluted solution and transmits the measured value to the control unit 30. The control unit 30 determines whether or not the measured value received from the pH sensor 16 is within a preset numerical range (step S11). If the measured value is out of the numerical range, the control unit 30 continues to neutralize step S10. Add the agent. On the other hand, when the measured value received from the pH sensor 16 falls within a predetermined numerical range, the control unit 30 determines that neutralization of the diluent has been completed, stops the replenishment pumps 211b and 212b, and sets the valve The supply of the neutralizing agent from the neutralizing agent supply source 21 is stopped by closing the 211a and 212a.

  When neutralization of the diluted solution is completed, the neutralization cleaning device 1 temporarily stops the circulation pump 15. Then, the operator removes the circulation nozzle 12 from the chamber 92 and connects it to the drain line in the factory. The neutralization cleaning apparatus 1 operates the circulation pump 15 again to discharge the diluted liquid to the drain line (step S12). Since the diluted solution has been neutralized in the above steps S10 to S11, it can be discharged to the drain line without going through the detoxification mechanism in the factory. Thus, the cleaning process for the low concentration area of the substrate processing apparatus 90 is completed.

  As described above, the neutralization cleaning apparatus 1 constitutes a circulation path for the dilution liquid with the inside of the substrate processing apparatus 90, and adds the neutralizing agent to the dilution liquid while circulating the dilution liquid. And the chemical | medical solution component adhering to the inside of the substrate processing apparatus 90 is removed by discharging | emitting the neutralized dilution liquid. For this reason, the usage-amount of a dilution liquid can be reduced by circulating a dilution liquid, and a dilution liquid can be drained without going through a harmless mechanism.

  Moreover, the neutralization washing | cleaning apparatus 1 measures the pH value of the diluting liquid circulated, and continues addition of the neutralizing agent until the measured value enters in a predetermined numerical range. For this reason, the chemical | medical solution component in a dilution liquid can be neutralized reliably. Further, the neutralization cleaning apparatus 1 connects the coupler 11 to the downstream ends of the drainage pipes 95c and 95g and the exhaust pipe 96b of the substrate processing apparatus 90. For this reason, the circulation path of the diluent is configured including the drainage pipes 95a, 95b, 95c, and 95g, the exhaust duct 96a, and the exhaust pipe 96b, and the chemical solution components adhering to the inside of these pipes are also removed well. .

<2. Second Embodiment>
<2-1. Configuration of neutralization cleaning device>
FIG. 6 is a diagram showing a configuration of the neutralization cleaning apparatus 2 according to the second embodiment of the present invention. The neutralization cleaning apparatus 2 is an apparatus for cleaning each part of the substrate processing apparatus 90 similar to the first embodiment. As shown in FIG. 6, the neutralization cleaning device 2 mainly includes a neutralizing agent supply unit 50 for supplying a mist-like neutralizing agent and a neutralizing agent for circulating the mist-like neutralizing agent. A circulation unit 60 and a control unit 70 for controlling the operation of each unit in the neutralization cleaning apparatus 2 are provided.

  The neutralizing agent supply unit 50 connects the neutralizing agent supply source 51, the neutralizing agent supply pipe 52 for feeding the neutralizing agent, and the neutralizing agent supply pipe 52 to the chemical solution supply pipe 94b of the substrate processing apparatus 90. And a connecting portion 53. The neutralizer supply source 51 includes an alkaline neutralizer supply source 511 for supplying an alkaline neutralizer and an acidic neutralizer supply source 512 for supplying an acidic neutralizer. . As the alkaline neutralizing agent, for example, a low concentration alkaline solution such as dilute aqueous ammonia, dilute sodium hydroxide aqueous solution, dilute potassium hydroxide aqueous solution or the like is used. Moreover, as an acidic neutralizer, low concentration acidic solutions, such as dilute hydrochloric acid and dilute sulfuric acid, are used, for example.

  The alkaline neutralizing agent supply source 511 is connected to the neutralizing agent supply pipe 52 via a valve 511a and a replenishing pump 511b, and the acidic neutralizing agent supply source 512 is connected via a valve 512a and a replenishing pump 512b. The neutralizer supply pipe 52 is connected. A mist generating unit 521 for misting the neutralizing agent is provided on the neutralizing agent supply pipe 52. The mist production | generation part 521 is realizable with the mechanism which grind | pulverizes a neutralizer into a micro droplet, for example by mixing a compressed gas with a neutralizer. When the valve 512a is closed and the valve 511a is opened and the replenishing pump 511b and the mist generating unit 521 are operated, the alkaline neutralizing agent is supplied from the alkaline neutralizing agent supply source 511 to the neutralizing agent supply pipe 52 to generate mist. In the part 521, a mist-like alkaline neutralizing agent is generated. Further, when the valve 511a is closed and the valve 512a is opened and the replenishment pump 512b and the mist generator 521 are operated, the acidic neutralizer is supplied from the acidic neutralizer supply source 512 to the neutralizer supply pipe 52, In the mist generating unit 521, a mist-like acid neutralizing agent is generated.

  Thus, the neutralizing agent supply part 50 can switch and supply a mist-like alkaline neutralizing agent and a mist-like acidic neutralizing agent. For this reason, the neutralizing agent supply part 50 can supply appropriately a mist-like alkaline neutralizing agent or a mist-like acidic neutralizing agent according to the kind of chemical | medical solution which should be neutralized.

  The neutralizer circulation unit 60 includes a coupler 61 connected to the drainage unit 95 or the exhaust unit 96 of the substrate processing apparatus 90, and a circulation pipe 62 extending from the coupler 61. A circulation pump 63 and a pH sensor 64 are provided in the middle of the circulation pipe 62, and the downstream end of the circulation pipe 62 is connected to the neutralizing agent supply pipe 52. For this reason, when the coupler 61 is connected to the substrate processing apparatus 90 and the circulation pump 63 is operated, the mist of the neutralizing agent supplied into the substrate processing apparatus 90 causes the circulation pipe 62 and the neutralizing agent supply pipe 52 to flow. Through the chamber 92. Further, the pH sensor 64 measures the pH value of the circulating gas in the course of the circulation pipe 62.

  The control unit 70 includes the neutralizing agent supply source 51 (more specifically, the valves 511a and 512a and the replenishing pumps 511b and 512b in the neutralizing agent supply source 51), the mist generation unit 521, the circulation pump 63, and The pH sensor 64 is electrically connected. The control unit 70 receives the measurement value of the pH sensor 64 and controls the operations of the neutralizing agent supply source 51, the mist generation unit 521, and the circulation pump 63. In particular, the control unit 70 controls the timing of supplying and stopping the neutralizing agent by controlling the opening and closing of the valves 511a and 512a and the operation of the pumps 511b and 512b based on the measured value received from the pH sensor 64. Can do. The control unit 70 is configured by, for example, a computer having a CPU and a memory, and performs the above-described control by the computer operating according to an instruction input from an operator and a program installed in the computer.

  Further, in the neutralization cleaning apparatus 2, the neutralizing agent supply source 51, the mist generation unit 521, the circulation pump 63, the pH sensor 64, and the control unit 70 are accommodated and integrated in the main body box 80. . For this reason, the neutralization cleaning apparatus 2 has an easy-to-handle configuration in which only the connection portion 53 and the coupler 61 connected to the substrate processing apparatus 90 are disposed outside the main body box 40.

<2-2. Cleaning work>
Subsequently, a cleaning operation of the substrate processing apparatus 90 performed using the neutralization cleaning apparatus 2 when the above-described substrate processing apparatus 90 is discarded or recycled will be described with reference to the flowchart of FIG. 7 and FIG.

  As shown in FIG. 8, the operator first connects the neutralization cleaning apparatus 2 to the substrate processing apparatus 90 (step S21). That is, the downstream ends of the drainage pipes 95c and 95g and the exhaust pipe 96b of the substrate processing apparatus 90 are sealed, and the coupler 61 of the neutralization cleaning apparatus 2 is connected downstream of the drainage pipes 95c and 95g and the exhaust pipe 96b. Connect to the end of the side. Further, the operator disconnects the chemical solution supply pipe 94b of the substrate processing apparatus 90 from the chemical solution supply source 94a, and connects the connection portion 53 of the neutralization cleaning apparatus 2 to the chemical solution supply pipe 94b. The shutter 92a of the substrate processing apparatus 90 is closed, and the inside of the chamber 92 is sealed.

  When the above connection work is completed and the operator performs a predetermined start operation, the neutralization cleaning device 2 supplies either one of the alkaline neutralizer and the acidic neutralizer from the neutralizer supply source 51. (Step S22). An operator selects which neutralizing agent to supply according to the kind of chemical | medical solution used as washing | cleaning object. For example, when the chemical solution is an acidic chemical solution, an alkaline neutralizer is supplied, and when the chemical solution is an alkaline chemical solution, an acidic neutralizer may be supplied. Specifically, one of the valves 211a and 212a of the neutralizing agent supply source 21 is opened by an instruction from the control unit 30, and one of the replenishing pumps 211b and 212b is operated, whereby the neutralizing agent is operated. Is supplied. The neutralizing agent is misted in the mist generating unit 521. The generated mist-like neutralizing agent is discharged into the chamber 92 through the neutralizing agent supply pipe 52, the chemical liquid supply pipe 94b, and the chemical liquid discharge nozzle 91a.

  Further, the operator opens the valves 95d, 95e, 95f, and 96c of the substrate processing apparatus 90 and operates the circulation pump 63 of the neutralization cleaning apparatus 2 so that the mist-like neutralizing agent supplied into the chamber 92 is obtained. Is circulated through the circulation pipe 62, the neutralizing agent supply pipe 52, and the chemical solution supply pipe 94b (step S23). The mist-like neutralizing agent includes the inner wall of the chemical liquid tank 91, the outer wall of the chemical liquid tank 91, the inner wall of the chamber 92, the drainage pipes 95a, 95b, 95c, and 95g, the exhaust duct 96a, and the exhaust pipe 96b. To neutralize the chemical components adhering to these parts.

  Further, the pH sensor 64 of the neutralization cleaning device 2 measures the pH value of the circulating gas and transmits the measured value to the control unit 70. The controller 70 determines whether or not the measured value received from the pH sensor 64 is within a preset numerical range (step S24). If the measured value is out of the numerical range, the control unit 70 continues to neutralize step S22. The supply of the agent and the circulation of the neutralizing agent in step S23 are repeated. When the measurement value received from the pH sensor 64 falls within a predetermined numerical range, the control unit 70 determines that neutralization of the chemical solution inside the substrate processing apparatus 90 has been completed, and The supply and the circulation of the neutralizing agent are stopped, and the cleaning process of the substrate processing apparatus 90 is finished.

  As described above, the neutralization cleaning apparatus 2 forms a circulation path with the inside of the substrate processing apparatus 90 and measures the pH value of the circulating gas with the pH sensor 64 while circulating the mist neutralizer. To do. Then, the supply and circulation of the mist-like neutralizing agent are continued until the measured value of the pH sensor 64 falls within a predetermined numerical range. For this reason, the neutralizing agent can be distributed inside the substrate processing apparatus 90 without using a diluent, and the chemical component can be reliably neutralized based on the measured value of the pH sensor 64.

  Further, the neutralization cleaning apparatus 2 connects the coupler 61 to the downstream ends of the drainage pipes 95c and 95g and the exhaust pipe 96b of the substrate processing apparatus 90. For this reason, the circulation path of the neutralizing agent is configured including the drainage pipes 95a, 95b, 95c, and 95g, the exhaust duct 96a, and the exhaust pipe 96b, and the chemical component adhering to the inside of these pipes is also well neutralized. Is done.

<3. Modification>
As mentioned above, although main embodiment of this invention was described, this invention is not limited to said example. For example, in the first embodiment described above, the diluting liquid to be circulated is supplied into the substrate processing apparatus 90 via the circulation nozzle 12, but the downstream end of the circulation pipe 13 is connected to the chemical liquid supply pipe 94b. The diluting liquid to be circulated may be supplied into the substrate processing apparatus 90 through the chemical liquid discharge nozzle 91a. Further, the downstream end of the neutralizer supply pipe 22 of the neutralizer supply section 20 is connected to the chemical liquid supply pipe 94b so that the neutralizer is supplied into the substrate processing apparatus 90 through the chemical liquid discharge nozzle 91a. It may be.

  In the first embodiment, the diluent is supplied using the diluent supply nozzle 81 that is separate from the neutralizer supply device. However, the diluent supply nozzle for supplying the diluent is used. You may comprise as a part of neutralization washing | cleaning apparatus 1. FIG.

  Further, the configuration of the substrate processing apparatus to be cleaned is not limited to the above example, and any substrate processing apparatus can be used as long as it can store the diluting liquid or can configure the circulation path of the mist-like neutralizing agent.

  In the first and second embodiments described above, the cleaning operation when the substrate processing apparatus is discarded or recycled has been described. However, the same cleaning operation may be performed during periodic apparatus maintenance.

It is the figure which showed the structure of the substrate processing apparatus used as cleaning object. It is the figure which showed the structure of the neutralization washing | cleaning apparatus which concerns on 1st Embodiment. It is the flowchart which showed the flow of the neutralization washing | cleaning operation | work which concerns on 1st Embodiment. It is the figure which showed the state which connected the neutralization washing | cleaning apparatus which concerns on 1st Embodiment to the high concentration area of the substrate processing apparatus. It is the figure which showed the state which connected the neutralization washing | cleaning apparatus which concerns on 1st Embodiment to the low concentration area of the substrate processing apparatus. It is the figure which showed the structure of the neutralization washing apparatus which concerns on 2nd Embodiment. It is the flowchart which showed the flow of the neutralization washing | cleaning operation | work which concerns on 2nd Embodiment. It is the figure which showed the state which connected the neutralization washing | cleaning apparatus which concerns on 2nd Embodiment to the substrate processing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 2 Neutralization washing apparatus 10 Dilution liquid circulation part 13 Circulation piping 16 pH sensor 20 Neutralizing agent supply part 211 Alkaline neutralizing agent supply source 212 Acidic neutralizing agent supply source 30 Control part 50 Neutralizing agent supply part 511 Alkaline inside Japanese traditional medicine supply source 512 Acid neutralizing agent supply source 521 Mist generation part 60 Neutralizing agent circulation part 62 Circulation piping 64 pH sensor 70 Control part 90 Substrate processing apparatus 91 Chemical solution tank 92 Chamber W Substrate

Claims (8)

A neutralization cleaning apparatus for neutralizing and cleaning chemicals adhering to the inside of a substrate processing apparatus,
A circulation unit configured to circulate the dilution liquid supplied into the substrate processing apparatus by forming a circulation path of the dilution liquid between the substrate processing apparatus by being connected to the substrate processing apparatus;
A pH sensor for measuring the pH value of the diluent in the circulation path;
A neutralizer supply section for adding a neutralizer to the diluent circulated by the circulation section;
A control unit that receives the measurement value of the pH sensor and controls the operation of the neutralizing agent supply unit;
With
The said control part continues the addition of the neutralizing agent by the said neutralizing agent supply part until the measured value of the said pH sensor enters in the numerical value range set beforehand, The neutralization washing | cleaning apparatus characterized by the above-mentioned. The neutralization washing apparatus according to claim 1,
The neutralization cleaning apparatus, wherein the circulation unit collects the diluting liquid from the drainage pipe and the exhaust pipe of the substrate processing apparatus and supplies the diluting liquid again to the substrate processing apparatus. The neutralization washing apparatus according to claim 1 or 2,
The neutralizing agent supplying unit has an alkaline neutralizing agent supplying unit for supplying an alkaline neutralizing agent and an acidic neutralizing agent supplying unit for supplying an acidic neutralizing agent. . A neutralization cleaning apparatus for neutralizing and cleaning chemicals adhering to the inside of a substrate processing apparatus,
A neutralizer supply section for supplying a mist-like neutralizer into the substrate processing apparatus;
A circulation unit that constitutes a circulation path with the substrate processing apparatus by being connected to the substrate processing apparatus, and circulates a mist-like neutralizing agent supplied from the neutralizing agent supply unit;
A pH sensor for measuring the pH value of the circulating gas in the circulation path;
A control unit that receives the measurement value of the pH sensor and controls the operation of the neutralizing agent supply unit and the circulation unit;
With
The control unit supplies the mist-like neutralizing agent by the neutralizing agent supply unit and circulates the mist-like neutralizing agent by the circulation unit until the measured value of the pH sensor falls within a preset numerical range. The neutralization washing apparatus characterized by continuing. The neutralization washing apparatus according to claim 4,
The neutralization cleaning apparatus, wherein the circulation unit circulates a mist-like neutralizing agent while collecting the mist-like neutralizing agent from a drain pipe and an exhaust pipe of the substrate processing apparatus. The neutralization washing apparatus according to claim 4 or 5,
The neutralizing agent supplying unit has an alkaline neutralizing agent supplying unit for supplying an alkaline neutralizing agent and an acidic neutralizing agent supplying unit for supplying an acidic neutralizing agent. . A neutralization cleaning method for neutralizing and cleaning chemicals adhering to the inside of a substrate processing apparatus,
A first step of supplying a diluent into the substrate processing apparatus;
A second step of circulating a diluent between the inside of the substrate processing apparatus and a predetermined circulation path;
A third step of adding a neutralizing agent to the circulating diluent;
A fourth step of measuring the pH value of the diluted diluent to be circulated;
With
The neutralization cleaning method, characterized in that the addition of the neutralizing agent in the third step is continued until the measured value in the fourth step falls within a preset numerical range. A neutralization cleaning method for neutralizing and cleaning chemicals adhering to the inside of a substrate processing apparatus,
A first step of supplying a mist-like neutralizing agent into the substrate processing apparatus;
A second step of circulating a mist-like neutralizing agent between the inside of the substrate processing apparatus and a predetermined circulation path;
A third step of measuring the pH value of the circulating gas;
With
The supply of the mist neutralizer in the first step and the circulation of the mist neutralizer in the second step are continued until the measured value in the third step falls within a preset numerical range. The neutralization washing method characterized by the above-mentioned.

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