JP2007217748A - Method for depositing spray deposit film on machinable ceramic substrate - Google Patents
Method for depositing spray deposit film on machinable ceramic substrate Download PDFInfo
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- 239000000919 ceramic Substances 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 title claims abstract description 59
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000000151 deposition Methods 0.000 title claims abstract description 7
- 239000007921 spray Substances 0.000 title abstract description 7
- 238000007751 thermal spraying Methods 0.000 claims abstract description 14
- 238000001816 cooling Methods 0.000 claims abstract description 12
- 239000000843 powder Substances 0.000 claims abstract description 6
- 238000005507 spraying Methods 0.000 claims description 18
- 238000007664 blowing Methods 0.000 abstract description 6
- 238000003466 welding Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000005336 cracking Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000005524 ceramic coating Methods 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910000505 Al2TiO5 Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Abstract
Description
本発明は、マシナブルセラミックス基板への溶射皮膜の形成方法に関するもので、特に、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下のマシナブルセラミックス基板への溶射皮膜の形成方法に関する。 The present invention relates to a method for forming a thermal spray coating on a machinable ceramic substrate, and more particularly to a method for forming a thermal spray coating on a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less.
従来から、セラミックス基板へ皮膜を形成する方法としては、スクリーン印刷法、スパッタリング法、蒸着法、溶射による方法等が用いられている。 Conventionally, as a method of forming a film on a ceramic substrate, a screen printing method, a sputtering method, a vapor deposition method, a thermal spraying method, and the like are used.
このうち、溶射によりセラミックス基板へ皮膜を形成する方法は、大面積の皮膜が得られるという利点があるものの、セラミックス基板と皮膜との密着強度が小さいため皮膜が剥離したり、割れるという問題点があった。 Of these, the method of forming a film on a ceramic substrate by thermal spraying has the advantage that a large-area film can be obtained, but there is a problem that the film peels off or cracks because the adhesion strength between the ceramic substrate and the film is small. there were.
このような問題点を改善するために、セラミックス基板表面を粗面化してから皮膜を形成したり、セラミック基板と皮膜の間に中間層を介在させてセラミックス基板と皮膜との密着強度を改善する技術が提案されている。（例えば、特許文献１を参照。）
ところで、近年、種々のセラミックス基板への溶射皮膜の形成に対する要望が高まってきており、特に、機械加工が容易なマシナブルセラミックス基板への溶射皮膜の形成に対する要求が高まってきている。 Incidentally, in recent years, there has been an increasing demand for the formation of thermal spray coatings on various ceramic substrates, and in particular, there has been an increasing demand for the formation of thermal spray coatings on machinable ceramic substrates that are easy to machine.
このような要求に対して、従来技術を適用して溶射皮膜を形成した場合、溶射皮膜の剥離や割れは改善できるものの、溶射中もしくは後にマシナブルセラミックス基板自体が割れるという新たな問題が生じてきた。
この問題は、特に、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下という、厚さが薄く、剛性の低いマシナブルセラミックス基板へ溶射皮膜を形成した場合に顕著に発生していた。
In response to such demands, when the conventional technology is applied to form a sprayed coating, although the peeling and cracking of the sprayed coating can be improved, a new problem arises that the machinable ceramic substrate itself breaks during or after spraying. It was.
This problem was particularly noticeable when a sprayed coating was formed on a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less and a thin thickness and low rigidity.
したがって本発明の目的は、厚さが薄く、剛性の低いマシナブルセラミックス基板であっても、溶射皮膜の剥離や割れがなく、かつ、溶射中もしくは後にマシナブルセラミックス基板自体が割れることがない溶射皮膜の形成方法を提供することである。 Accordingly, it is an object of the present invention to prevent thermal spray coating from peeling or cracking even if it is a thin and low rigidity machinable ceramic substrate, and the machinable ceramic substrate itself is not cracked during or after thermal spraying. It is to provide a method for forming a film.
上記課題を解決するべく鋭意研究を推し進める過程で、本発明者らは、溶射により皮膜を形成する工程の前に、前記マシナブルセラミックス基板を加熱治具等で均一加熱する予熱工程と、前記セラミックス皮膜に冷却用空気を吹き付けることでセラミックス基板の表裏面の温度差を解消することが可能となるとの知見のもとに本発明を完成した。 In the process of pursuing diligent research to solve the above problems, the present inventors have conducted a preheating step of uniformly heating the machinable ceramic substrate with a heating jig or the like before the step of forming a coating by thermal spraying, and the ceramics. The present invention has been completed based on the knowledge that it is possible to eliminate the temperature difference between the front and back surfaces of the ceramic substrate by blowing cooling air onto the film.
すなわち、前記した本発明の目的は、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下のマシナブルセラミックス基板への溶射皮膜の形成方法であって、前記基板を予熱する工程と、前記基板に溶射によりセラミックス粉を溶着してセラミックス皮膜を形成する工程と、前記セラミックス皮膜に冷却用空気を吹き付ける工程と、を含むことを特徴とするマシナブルセラミックス基板への溶射皮膜の形成方法によって達成される。 That is, the object of the present invention is a method for forming a sprayed coating on a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less, the step of preheating the substrate, It is achieved by a method for forming a thermal spray coating on a machinable ceramic substrate, comprising: a step of depositing ceramic powder by thermal spraying to form a ceramic coating; and a step of blowing cooling air to the ceramic coating. .
本発明によれば、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下という、厚さが薄く、剛性の低いマシナブルセラミックス基板へ溶射皮膜を形成した場合であっても、溶射皮膜の剥離や割れがなく、かつ、溶射中もしくは後にマシナブルセラミックス基板自体が割れることがない溶射皮膜の形成方法が得られる。 According to the present invention, even when a thermal spray coating is formed on a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less and a thin thickness and low rigidity, A method of forming a thermal spray coating without cracking and without causing the machinable ceramic substrate itself to crack during or after thermal spraying is obtained.
本発明では、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下のマシナブルセラミックス基板への溶射皮膜の形成方法であって、前記基板を予熱する工程と、前記基板に溶射によりセラミックス粉を溶着してセラミックス皮膜を形成する工程と、前記セラミックス皮膜に冷却用空気を吹き付ける工程と、を含むことを特徴とするマシナブルセラミックス基板への溶射皮膜の形成方法を提案している。 In the present invention, a method for forming a sprayed coating on a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less, comprising preheating the substrate and depositing ceramic powder on the substrate by spraying. A method of forming a thermal sprayed coating on a machinable ceramic substrate, which includes a step of forming a ceramic coating and a step of blowing cooling air onto the ceramic coating.
図１に、本発明に係る溶射皮膜の形成方法の概略構成断面図を示した。ここで、１は、本発明に係る厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下のマシナブルセラミックス基板であり、マシナブルセラミックス基板１に溶射ガン３によりセラミックス粉を溶着してセラミックス皮膜２を形成し、セラミックス皮膜２に冷却用空気４を吹き付けている。
FIG. 1 shows a schematic cross-sectional view of a method for forming a thermal spray coating according to the present invention. Here, 1 is a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less according to the present invention.
ここで、本発明に係るセラミックス基板を、厚さ１０ｍｍ以下で、かつ、ヤング率が１００ＧＰa以下のマシナブルセラミックス基板とした理由は、厚さが１０ｍｍを越えて厚い場合、または、ヤング率が１００ＧＰaを越えて剛性が大きい場合は、溶射中もしくは後にマシナブルセラミックス基板自体が割れるというか課題が発生しないからである。 Here, the reason why the ceramic substrate according to the present invention is a machinable ceramic substrate having a thickness of 10 mm or less and a Young's modulus of 100 GPa or less is that the thickness exceeds 10 mm or the Young's modulus is 100 GPa. This is because if the rigidity is high beyond the range, the machinable ceramic substrate itself will not break during or after thermal spraying.
ここで、本発明のマシナブルセラミックスとは、機械加工が容易なセラミックスのことであり、例えば、雲母を含有するマシナブルセラミックスやアルミニウムチタネート結晶を含むマシナブルセラミックス等が知られている。
最近では、米国コーニング社製のマコール（登録商標名である。）や住金セラミックス社製のホトベール（登録商標名である。）等が、その機械加工性と優れた物性から広く使われるようになってきている。
Here, the machinable ceramics of the present invention are ceramics that can be easily machined. For example, machinable ceramics containing mica and machinable ceramics containing aluminum titanate crystals are known.
Recently, McCor (registered trademark name) manufactured by Corning in the United States and Photovale (registered trademark name) manufactured by Sumikin Ceramics Co., Ltd. are widely used due to their machinability and excellent physical properties. It is coming.
ところが、マシナブルセラミックスは、機械加工性に優れているものの、アルミナセラミックスと比較すると、ヤング率は１００ＧＰa以下とアルミナセラミックス（３９０ＧＰa）の１／４と剛性が小さく、さらに、強度は１５０ＧＰa以下とアルミナセラミックス（３４０ＧＰa）の半分以下である。
さらには、熱伝導率は１．７Ｗ／ｍ・Ｋとアルミナセラミックス（２９Ｗ／ｍ・Ｋ）と比較して著しく小さい。
However, although machinable ceramics are excellent in machinability, compared to alumina ceramics, Young's modulus is 100 GPa or less, 1/4 of alumina ceramics (390 GPa) and rigidity is small, and strength is 150 GPa or less. It is less than half of ceramics (340GPa).
Furthermore, the thermal conductivity is 1.7 W / m · K, which is significantly smaller than that of alumina ceramics (29 W / m · K).
したがって、このような熱伝導率の小さいマシナブルセラミックス基板へ溶射皮膜を形成した場合、基板の表裏面での温度差が原因で、プラズマジェットによる予熱中もしくは、溶射中にマシナブルセラミックス基板自体が割れることが多発していた。 Therefore, when a thermal spray coating is formed on a machinable ceramic substrate having such a low thermal conductivity, the machinable ceramic substrate itself is preheated by plasma jet or during thermal spraying due to the temperature difference between the front and back surfaces of the substrate. Cracking frequently occurred.
本発明で、基板を均一加熱する予熱工程を含む理由は、予熱により基板の水分や汚れを除去すると共に、溶射皮膜の密着力を向上させるためであり、さらには、基板の急激な温度上昇変化を抑制して溶射時の基板の割れを防止するためである。
本発明における基板を均一加熱する予熱工程では、基板を溶射工程にかける前に、加熱乾燥機に置いて予熱する方法や、基板に加熱治具を取り付けて予熱する方法などを用いることができる。
In the present invention, the reason for including a preheating step for uniformly heating the substrate is to remove moisture and dirt on the substrate by preheating and to improve the adhesion of the thermal spray coating, and further, a rapid temperature rise change of the substrate This is to suppress cracking of the substrate during thermal spraying.
In the preheating step of uniformly heating the substrate in the present invention, a method of preheating by placing in a heating dryer before the substrate is subjected to a thermal spraying process, a method of preheating by attaching a heating jig to the substrate, or the like can be used.
また、本発明におけるセラミックス皮膜に冷却用空気を吹き付ける工程とは、より具体的には、圧縮空気を通常のノズルから噴射させる方法や、より溶射部分へのスポット冷却を可能とするボルテック効果を利用したノズル等を利用することができる。これらの方法を用いて、ワーク内(即ち、溶射を施す面内)の温度分布を５０℃以下とすることが、特に好ましい。
このように、溶射したセラミックス皮膜に冷却用空気を吹き付けることで、ワーク内及び基板の表裏面での温度差を解消できる作用がある。
Further, the step of blowing cooling air to the ceramic film in the present invention more specifically uses a method of spraying compressed air from a normal nozzle or a vortex effect that enables spot cooling to the sprayed portion. The nozzle etc. which were made can be utilized. Using these methods, it is particularly preferable that the temperature distribution in the workpiece (that is, in the surface to be sprayed) is 50 ° C. or less.
In this way, by blowing cooling air to the thermally sprayed ceramic film, there is an effect of eliminating the temperature difference between the workpiece and the front and back surfaces of the substrate.
以下に、本発明を実施例と比較例によりさらに詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples.
〔実施例〕
大きさφ３００ｍｍで、厚さ５ｍｍで、かつ、ヤング率が６５．７ＧＰaの住金セラミックス社製のホトベール（登録商標名である。）をマシナブルセラミックス基板として準備した。これに、ブラスト処理を実施し、Ｒmaxで少なくとも５μm以上となるまで粗面化処理を実施する。その後、このセラミックス基板を温度制御可能な加熱治具上で１５０℃にて予熱を実施した後に、酸化アルミニウム粉末をプラズマ溶射して５００μmの厚さのセラミックス皮膜を得た。この際、溶射したセラミックス皮膜に溶射ガンの動きに併せて瞬時に冷却用空気（毎分２００リットル）を吹き付けた。（図１を参照。）
得られた酸化アルミニウムからなるセラミックス皮膜には、反りや割れは発生しなかった。さらに、マシナブルセラミックス基板には、クラックの発生もなく、割れたりしなかった。
〔Example〕
A photo veil (registered trademark name) manufactured by Sumikin Ceramics Co., Ltd. having a size of 300 mm, a thickness of 5 mm, and a Young's modulus of 65.7 GPa was prepared as a machinable ceramic substrate. A blasting process is performed on this, and a roughening process is performed until Rmax is at least 5 μm or more. Thereafter, the ceramic substrate was preheated at 150 ° C. on a temperature-controllable heating jig, and then aluminum oxide powder was plasma sprayed to obtain a ceramic film having a thickness of 500 μm. At this time, cooling air (200 liters per minute) was instantaneously blown onto the sprayed ceramic film in accordance with the movement of the spray gun. (See Figure 1)
No warpage or cracking occurred in the obtained ceramic film made of aluminum oxide. Furthermore, the machinable ceramic substrate did not crack and did not break.
〔比較例〕
溶射時に形成されたセラミックス皮膜に冷却用空気を吹き付けなかった以外は、実施例と同様にしてマシナブルセラミックス基板へ溶射皮膜の形成を行った。その結果、マシナブルセラミックス基板自体が、粉々に割れてしまった。
[Comparative example]
A sprayed coating was formed on a machinable ceramic substrate in the same manner as in the example except that the cooling air was not blown onto the ceramic coating formed at the time of thermal spraying. As a result, the machinable ceramic substrate itself was broken into pieces.
以上から明らかなように、厚さが薄く、剛性の低いマシナブルセラミックス基板へ溶射皮膜を形成した場合であっても、溶射皮膜の剥離や割れがなく、かつ、溶射後にマシナブルセラミックス基板自体が割れることがない溶射皮膜の形成方法が本発明により得られることが確認できた。 As is apparent from the above, even when a sprayed coating is formed on a thin, low-rigidity machinable ceramic substrate, there is no peeling or cracking of the sprayed coating, and the machinable ceramic substrate itself is not sprayed after spraying. It has been confirmed that the present invention provides a method for forming a sprayed coating that does not break.
１；マシナブルセラミックス基板
２；セラミックス皮膜
３；溶射ガン
４；冷却用空気
1; Machinable
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2012513282A (en) * | 2009-04-24 | 2012-06-14 | サン−フン ハ | Cooking container and processing method thereof |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6247470A (en) * | 1985-08-23 | 1987-03-02 | Toshiba Corp | Formation of thermally sprayed coating on inside surface of cylinder |
| JPS6379777A (en) * | 1986-09-24 | 1988-04-09 | 科学技術庁金属材料技術研究所長 | Method for manufacturing coatings on ceramic substrates |
| JPH04346649A (en) * | 1991-05-24 | 1992-12-02 | Matsushita Electric Ind Co Ltd | Method and apparatus for plasma spraying |
| JPH06122956A (en) * | 1992-10-13 | 1994-05-06 | Matsushita Electric Ind Co Ltd | Plasma spraying method and spray coating apparatus |
| JPH07316773A (en) * | 1994-05-30 | 1995-12-05 | Nippon Alum Co Ltd | Thermally sprayed alumina film having electrical insulation characteristic and its production |
| JPH09201761A (en) * | 1996-01-29 | 1997-08-05 | Noritake Co Ltd | Polishing process method of compound material |
| WO2000000328A1 (en) * | 1998-06-30 | 2000-01-06 | Nikon Corporation | Surface plate |
| JP2002249864A (en) * | 2000-04-18 | 2002-09-06 | Ngk Insulators Ltd | Halogen gas plasma resistant member and production method therefor |
| JP2004079861A (en) * | 2002-08-21 | 2004-03-11 | Taiheiyo Cement Corp | Electrostatic chuck |
| WO2005021830A2 (en) * | 2003-08-22 | 2005-03-10 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic article having corrosion-resistant layer and method for forming same |
| JP2005097016A (en) * | 2003-09-22 | 2005-04-14 | Mitsui Kozan Material Kk | High strength glass/fluorine phlogopite-based machinable ceramic and its production method |
-
2006
- 2006-02-16 JP JP2006039323A patent/JP2007217748A/en active Pending
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6247470A (en) * | 1985-08-23 | 1987-03-02 | Toshiba Corp | Formation of thermally sprayed coating on inside surface of cylinder |
| JPS6379777A (en) * | 1986-09-24 | 1988-04-09 | 科学技術庁金属材料技術研究所長 | Method for manufacturing coatings on ceramic substrates |
| JPH04346649A (en) * | 1991-05-24 | 1992-12-02 | Matsushita Electric Ind Co Ltd | Method and apparatus for plasma spraying |
| JPH06122956A (en) * | 1992-10-13 | 1994-05-06 | Matsushita Electric Ind Co Ltd | Plasma spraying method and spray coating apparatus |
| JPH07316773A (en) * | 1994-05-30 | 1995-12-05 | Nippon Alum Co Ltd | Thermally sprayed alumina film having electrical insulation characteristic and its production |
| JPH09201761A (en) * | 1996-01-29 | 1997-08-05 | Noritake Co Ltd | Polishing process method of compound material |
| WO2000000328A1 (en) * | 1998-06-30 | 2000-01-06 | Nikon Corporation | Surface plate |
| JP2002249864A (en) * | 2000-04-18 | 2002-09-06 | Ngk Insulators Ltd | Halogen gas plasma resistant member and production method therefor |
| JP2004079861A (en) * | 2002-08-21 | 2004-03-11 | Taiheiyo Cement Corp | Electrostatic chuck |
| WO2005021830A2 (en) * | 2003-08-22 | 2005-03-10 | Saint-Gobain Ceramics & Plastics, Inc. | Ceramic article having corrosion-resistant layer and method for forming same |
| JP2007503374A (en) * | 2003-08-22 | 2007-02-22 | サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド | Ceramic article having a corrosion-resistant layer, semiconductor processing apparatus incorporating the same, and method of forming the same |
| JP2005097016A (en) * | 2003-09-22 | 2005-04-14 | Mitsui Kozan Material Kk | High strength glass/fluorine phlogopite-based machinable ceramic and its production method |
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| JP2012513282A (en) * | 2009-04-24 | 2012-06-14 | サン−フン ハ | Cooking container and processing method thereof |
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