JP2006522216A - 銀メッキ回路に適するように改良を受けさせたコーティング - Google Patents
銀メッキ回路に適するように改良を受けさせたコーティング Download PDFInfo
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- JP2006522216A JP2006522216A JP2006501235A JP2006501235A JP2006522216A JP 2006522216 A JP2006522216 A JP 2006522216A JP 2006501235 A JP2006501235 A JP 2006501235A JP 2006501235 A JP2006501235 A JP 2006501235A JP 2006522216 A JP2006522216 A JP 2006522216A
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- 239000011248 coating agent Substances 0.000 title claims abstract description 20
- 238000000576 coating method Methods 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 51
- 238000007747 plating Methods 0.000 claims abstract description 51
- 229910052709 silver Inorganic materials 0.000 claims abstract description 43
- 239000004332 silver Substances 0.000 claims abstract description 43
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229920000642 polymer Polymers 0.000 claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 11
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 10
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000012964 benzotriazole Substances 0.000 claims abstract description 3
- -1 benzimidazole compound Chemical class 0.000 claims abstract 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 40
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 22
- 229910052802 copper Inorganic materials 0.000 claims description 22
- 239000010949 copper Substances 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 11
- 229920006163 vinyl copolymer Polymers 0.000 claims description 9
- 229920006243 acrylic copolymer Polymers 0.000 claims description 8
- 238000002845 discoloration Methods 0.000 claims description 8
- 150000003852 triazoles Chemical class 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 230000007797 corrosion Effects 0.000 claims description 5
- 238000005260 corrosion Methods 0.000 claims description 5
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims 1
- 239000000243 solution Substances 0.000 abstract description 48
- 238000007654 immersion Methods 0.000 abstract description 19
- 238000005476 soldering Methods 0.000 abstract description 16
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 5
- 239000007864 aqueous solution Substances 0.000 abstract description 5
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 229910000679 solder Inorganic materials 0.000 description 13
- 239000002253 acid Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 239000000654 additive Substances 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 150000003839 salts Chemical group 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000000084 colloidal system Substances 0.000 description 4
- 150000002460 imidazoles Chemical class 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 150000002193 fatty amides Chemical class 0.000 description 3
- 230000002538 fungal effect Effects 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 2
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002459 sustained effect Effects 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- LWFUFLREGJMOIZ-UHFFFAOYSA-N 3,5-dinitrosalicylic acid Chemical compound OC(=O)C1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1O LWFUFLREGJMOIZ-UHFFFAOYSA-N 0.000 description 1
- ZXVONLUNISGICL-UHFFFAOYSA-N 4,6-dinitro-o-cresol Chemical group CC1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1O ZXVONLUNISGICL-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 229920005692 JONCRYL® Polymers 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 229940058303 antinematodal benzimidazole derivative Drugs 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005002 finish coating Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- HKIOYBQGHSTUDB-UHFFFAOYSA-N folpet Chemical group C1=CC=C2C(=O)N(SC(Cl)(Cl)Cl)C(=O)C2=C1 HKIOYBQGHSTUDB-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2202/00—Metallic substrate
- B05D2202/40—Metallic substrate based on other transition elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/07—Electric details
- H05K2201/0753—Insulation
- H05K2201/0769—Anti metal-migration, e.g. avoiding tin whisker growth
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Laminated Bodies (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
本発明は、いろいろな表面、特に銅表面が示すはんだ付け性の持続を向上させるコーティングとして浸漬もしくは無電解銀コーティングを用いることを提案するものである。また、そのような浸漬銀コーティングを付着させるに好適な組成物も開示する。本新規銀メッキ方法は、通常の銀付着物が示す耐エレクトロマイグレーション性よりも高い耐エレクトロマイグレーション性を示す銀メッキを生じさせる。この提案する方法は、表面、特に銅表面およびプリント基板上の連結領域のはんだ付け性を有効に持続させるに適した用途が広くて低コストの方法である。
(発明の詳細な説明)
本発明は、金属表面、特に銅表面のはんだ付け性を持続かつ向上させる方法を提案するものである。この提案する方法は下記の段階を含んで成る:
a)当該金属表面を奇麗にし、
b)場合により、前記金属表面にエッチングを受けさせ、
c)前記金属表面を銀メッキ溶液(この溶液は、
1. 可溶銀イオン源、
2. 酸、
3. 場合により、脂肪アミン、脂肪アミド、第四級塩、両性塩、樹脂状アミン、樹脂状アミド、脂肪酸、樹脂状酸およびこれらの混合物から成る群から選択した添加剤、
4. 場合により、イミダゾール、ベンズイミダゾールもしくはイミダゾール誘導体またはトリアゾール誘導体、
5. 場合により、酸化剤、
を含んで成る)で処理し、そして
d)前記浸漬銀メッキした表面をビニルポリマーもしくはコポリマーの水溶液、アクリルポリマーもしくはコポリマーの水溶液およびこれらの混合物から成る群から選択した材料と場合によりトリアゾール、イミダゾールおよびこれらの誘導体から成る群から選択した化合物を含有して成る溶液で処理する。
れる。印刷回路用途では表面が金属線結合可能(wire bondable)になる。
ことを見いだした。そのようなポリマー溶液は、一般に、1種以上のビニルポリマーもしくはコポリマーの水溶液および/または1種以上のアクリルポリマーもしくはコポリマーの水溶液ばかりでなく好適には抗菌・カビ剤およびトリアゾールもしくはイミダゾール型の化合物を含有して成る。そのようなポリマーコーティング溶液(polymer coating solution)を好適には後の処理段階で加える。
1. DP6−4586(商標)(Allied Colloids Limitedから入手可能)をタンクに加えて撹拌を開始し、
2. 撹拌を行ないながらGLASCOL(商標)(Allied Colloidsから入手可能)を前記タンクに加え、
3. 撹拌を行ないながらMergal(商標)(Riedel−deHaenから入手可能)溶液を前記タンクに加え、
4. 撹拌を行ないながらIrgamet(商標)(Ciba Geigyから入手可能)を前記タンクに加え、
5. アンモニアを前記タンクにpHが9−10になるまで加えた後の混合物を少なくとも1時間撹拌し、そして
6. 脱イオン水を前記混合物に加えることで、固体の全部が完全に溶解しかつ前記混合物が均一であることを確保する。撹拌を更に30分間継続する。
Claims (13)
- 金属表面のはんだ付け性を維持させながら前記金属表面の変色への耐性を向上させる方法であって、
a)前記金属表面を浸漬もしくは無電解銀メッキ溶液に接触させることで前記金属表面の上に銀メッキを生じさせた後、
b)その銀メッキされた表面をビニルコポリマー、アクリルコポリマー、ビニルポリマー、アクリルポリマーおよびこれらの混合物から成る群から選択した材料を含有して成るポリマーコーティング溶液に接触させる、
段階を含んで成る方法。 - 前記金属表面が銅を含んで成る請求項1記載の方法。
- 前記ビニルコポリマーもしくはビニルポリマーを前記溶液に20−50重量パーセントの総量で存在させる請求項1記載の方法。
- 前記ビニルコポリマーもしくはビニルポリマーを前記溶液に30−45重量パーセントの総量で存在させる請求項1記載の方法。
- 前記アクリルコポリマーもしくはアクリルポリマーを前記溶液に5−30重量パーセントの総量で存在させる請求項1記載の方法。
- 前記アクリルコポリマーもしくはアクリルポリマーを前記溶液に30−45重量パーセントの総量で存在させる請求項1記載の方法。
- 前記コーティング溶液がまたトリアゾール、イミダゾールおよびこれらの組み合わせから成る群から選択した化合物も含有して成る請求項1記載の方法。
- 前記トリアゾールまたはイミダゾール化合物をベンゾトリアゾール、ベンズイミダゾール、イミダゾール、ヒスチジンおよびこれらの組み合わせから成る群から選択する請求項7記載の方法。
- 前記トリアゾールまたはイミダゾール化合物を前記溶液に0.5−5重量パーセントの量で存在させる請求項7記載の方法。
- 前記ポリマーコーティング溶液が更にアンモニアも含有して成る請求項1記載の方法。
- 銀で被覆された基材の表面が起こす変色および腐食を防止するに適したアルカリ性ポリマー水溶液であって、ビニルコポリマー、アクリルコポリマー、ビニルポリマー、アクリルポリマーおよびこれらの混合物から成る群から選択される材料を含んで成るアルカリ性ポリマー水溶液。
- 前記コポリマーもしくはポリマーが該溶液に25−50重量パーセントの量で存在する請求項11記載のポリマーコーティング溶液。
- 該ポリマー溶液がまたトリアゾール、イミダゾールおよびこれらの組み合わせから成る群から選択される化合物も含有して成る請求項11記載のアルカリ性ポリマーコーティング溶液。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/412,932 US6773757B1 (en) | 2003-04-14 | 2003-04-14 | Coating for silver plated circuits |
PCT/US2004/007773 WO2004094682A2 (en) | 2003-04-14 | 2004-03-15 | Improved coating for silver plated circuits |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006522216A true JP2006522216A (ja) | 2006-09-28 |
Family
ID=32825072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2006501235A Pending JP2006522216A (ja) | 2003-04-14 | 2004-03-15 | 銀メッキ回路に適するように改良を受けさせたコーティング |
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US (1) | US6773757B1 (ja) |
EP (1) | EP1613440B1 (ja) |
JP (1) | JP2006522216A (ja) |
CN (1) | CN100371089C (ja) |
ES (1) | ES2656779T3 (ja) |
TW (1) | TWI241872B (ja) |
WO (1) | WO2004094682A2 (ja) |
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JP2008541453A (ja) * | 2005-05-10 | 2008-11-20 | ダウ・コーニング・コーポレイション | 電子デバイスにおけるエレクトロマイグレーションを最小限に抑えるための方法 |
JP2012504705A (ja) * | 2008-10-02 | 2012-02-23 | マクダーミッド インコーポレーテッド | 表面のはんだ付け性を向上させる方法 |
JP2015088657A (ja) * | 2013-10-31 | 2015-05-07 | 三菱化学株式会社 | Led用リードフレーム被膜形成用組成物、led用リードフレーム被膜の形成方法、リードフレームの保護方法、led用リードフレーム、ledパッケージとその製造方法、ledとその製造方法 |
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JP5095909B2 (ja) * | 2003-06-24 | 2012-12-12 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 触媒組成物および析出方法 |
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-
2003
- 2003-04-14 US US10/412,932 patent/US6773757B1/en not_active Expired - Lifetime
-
2004
- 2004-03-12 TW TW093106664A patent/TWI241872B/zh not_active IP Right Cessation
- 2004-03-15 CN CNB2004800098108A patent/CN100371089C/zh not_active Expired - Lifetime
- 2004-03-15 WO PCT/US2004/007773 patent/WO2004094682A2/en active Application Filing
- 2004-03-15 EP EP04720786.5A patent/EP1613440B1/en not_active Expired - Lifetime
- 2004-03-15 JP JP2006501235A patent/JP2006522216A/ja active Pending
- 2004-03-15 ES ES04720786.5T patent/ES2656779T3/es not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008541453A (ja) * | 2005-05-10 | 2008-11-20 | ダウ・コーニング・コーポレイション | 電子デバイスにおけるエレクトロマイグレーションを最小限に抑えるための方法 |
JP2012504705A (ja) * | 2008-10-02 | 2012-02-23 | マクダーミッド インコーポレーテッド | 表面のはんだ付け性を向上させる方法 |
JP2015088657A (ja) * | 2013-10-31 | 2015-05-07 | 三菱化学株式会社 | Led用リードフレーム被膜形成用組成物、led用リードフレーム被膜の形成方法、リードフレームの保護方法、led用リードフレーム、ledパッケージとその製造方法、ledとその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US6773757B1 (en) | 2004-08-10 |
EP1613440A2 (en) | 2006-01-11 |
CN1774304A (zh) | 2006-05-17 |
EP1613440A4 (en) | 2006-11-02 |
CN100371089C (zh) | 2008-02-27 |
TWI241872B (en) | 2005-10-11 |
WO2004094682A3 (en) | 2005-01-20 |
ES2656779T3 (es) | 2018-02-28 |
EP1613440B1 (en) | 2017-11-15 |
WO2004094682B1 (en) | 2005-02-17 |
TW200425810A (en) | 2004-11-16 |
WO2004094682A2 (en) | 2004-11-04 |
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