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JP2006266883A - Probe unit and continuity test method - Google Patents

Probe unit and continuity test method Download PDF

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JP2006266883A
JP2006266883A JP2005085647A JP2005085647A JP2006266883A JP 2006266883 A JP2006266883 A JP 2006266883A JP 2005085647 A JP2005085647 A JP 2005085647A JP 2005085647 A JP2005085647 A JP 2005085647A JP 2006266883 A JP2006266883 A JP 2006266883A
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substrate
electrode
specimen
tip
probe unit
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俊▲隆▼ ▲吉▼野
Toshitaka Yoshino
Masahiro Sugiura
正浩 杉浦
Sanfun Cha
サンフン チャ
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Yamaha Corp
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Yamaha Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a probe unit for increasing the contact pressure with the electrode of a specimen and accurately aligning the electrode of a specimen to the contact section of a conductor. <P>SOLUTION: The probe unit aligned to the specimen by using an imaging optical system comprises a substrate; a plurality of conductors formed on the substrate; a contact section that is formed on each conductor, is positioned on the substrate, and comes into contact with the electrode of the specimen; and the edge of the substrate, where the distance from the contact section is shorter than that between the centers of mutually adjacent contact sections, the tip is positioned on a virtual straight line vertical to the arrangement direction of the plurality of contact sections, and the thickness of the tip is within the depth of field of the imaging optical system. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体集積回路や液晶パネル等の電子デバイスの電気的特性を検査するためのプローブユニット及び導通検査方法に関する。   The present invention relates to a probe unit and a continuity inspection method for inspecting electrical characteristics of electronic devices such as semiconductor integrated circuits and liquid crystal panels.

従来、基板から突出した接触部を有するプローブユニットで電子デバイスの導通を検査する方法が知られている。また微細な導線を基板上にめっきによって形成する方法が知られている。導線がめっきで形成された薄膜からなる場合、電子デバイスの電極に接触する導線の接触部が基板から突出していると電極と接触部との接触圧を大きくすることができない。また、電子デバイスの電極のピッチに応じて導線の接触部のピッチを狭くするために導線の幅を狭くすると、導線の接触部と電極との接触圧がさらに小さくなる。したがって、このようなプローブユニットでは、電子デバイスの電極が非晶性透明電極材料やアルミニウムから構成されている場合に電極の表面層を突き破って導線と電極とを確実に導通させるための接触圧を得ることができない。   Conventionally, a method for inspecting the continuity of an electronic device with a probe unit having a contact portion protruding from a substrate is known. There is also known a method of forming fine conductive wires on a substrate by plating. When the conductive wire is made of a thin film formed by plating, the contact pressure between the electrode and the contact portion cannot be increased if the contact portion of the conductive wire that contacts the electrode of the electronic device protrudes from the substrate. Further, if the width of the conducting wire is reduced in order to narrow the pitch of the contact portion of the conducting wire in accordance with the pitch of the electrode of the electronic device, the contact pressure between the contacting portion of the conducting wire and the electrode is further reduced. Therefore, in such a probe unit, when the electrode of the electronic device is made of an amorphous transparent electrode material or aluminum, the contact pressure for breaking through the surface layer of the electrode and making the conductive wire and the electrode conductive is ensured. Can't get.

特許文献1には、接触部が基板の端部から突出していないプローブユニットが開示されている。このプローブユニットの接触部と電子デバイスの電極とを位置合わせする工程では、電子デバイス電極とプローブユニットの接触部とを顕微鏡等で観察しながら正確に位置合わせすることが困難になる。なぜならば、基板の電子デバイス側の面に設けられた導線を基板の電子デバイス側から観察しようとすると、電子デバイスが載置される盤が邪魔になり、また、その導線を電子デバイスと反対側から観察しようとすると基板が邪魔になるからである。   Patent Document 1 discloses a probe unit in which a contact portion does not protrude from an end portion of a substrate. In the step of aligning the contact portion of the probe unit and the electrode of the electronic device, it is difficult to accurately align the electronic device electrode and the contact portion of the probe unit while observing with a microscope or the like. This is because, if the conductive wire provided on the surface of the substrate on the electronic device side is observed from the electronic device side of the substrate, the board on which the electronic device is placed becomes an obstacle, and the conductive wire is on the side opposite to the electronic device. This is because the substrate gets in the way when observing from above.

特許文献2には、電子デバイスに形成されたマークを観察しながらプローブユニットの接触部と電子デバイスの電極とを位置合わせする方法が開示されている。しかし、この方法では、位置合わせに用いるマークを予め電子デバイスに形成して置く必要があり、また、位置合わせに用いるマークの鮮明な像を得るために二重焦点カメラが必要になる。   Patent Document 2 discloses a method of aligning a contact portion of a probe unit and an electrode of an electronic device while observing a mark formed on the electronic device. However, in this method, it is necessary to previously form a mark used for alignment on an electronic device, and a double-focus camera is required to obtain a clear image of the mark used for alignment.

韓国公開特許公報2003−0023662号Korean Published Patent Publication No. 2003-0023662 特開平9−326426号公報Japanese Patent Laid-Open No. 9-326426

本発明は、上述した問題を解決するために創作されたものであって、検体の電極との接触圧を大きくすることができ、検体の電極とその電極に接触する導線の接触部とを正確に位置合わせすることができるプローブユニットを提供することを目的とする。   The present invention was created to solve the above-described problems, and can increase the contact pressure between the specimen electrode and the specimen electrode and the contact portion of the lead wire that contacts the electrode. It is an object of the present invention to provide a probe unit that can be aligned with each other.

上記目的を達成するため、本発明に係るプローブユニットは、結像光学系を用いて検体と位置合わせされるプローブユニットであって、基板と、前記基板上に形成される複数の導線と、前記導線のそれぞれに形成され前記基板上に位置し前記検体の電極に接触する接触部と、互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端の厚さが前記結像光学系の被写界深度以内の前記基板の縁部と、を備える。検体の電極と接触する接触部を基板上に形成することにより、検体の電極との接触圧を大きくすることができる。接触部から至近距離にあって複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置する場合、検体の電極と基板の縁部の先端とを顕微鏡等で観察しながら位置調整することによって検体の電極とプローブユニットの接触部とを間接的に正確に位置合わせすることができる。したがって、互いに隣り合う接触部の中心間距離より接触部からの距離が短く複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置するように基板を形成することにより、導線の接触部と検体の電極とを正確に位置合わせすることができる。また、顕微鏡等で検体の電極と同時に観察される基板の縁部の先端の厚さが薄いほど、顕微鏡等の結像光学系で検体の電極と基板の縁部の先端との鮮明な拡大画像を得ることができる。   In order to achieve the above object, a probe unit according to the present invention is a probe unit that is aligned with a specimen using an imaging optical system, and includes a substrate, a plurality of conductive wires formed on the substrate, An arrangement direction of the plurality of contact portions, which is formed on each of the conductive wires, is located on the substrate and contacts the electrode of the specimen, and the distance from the contact portion is shorter than the distance between the centers of the contact portions adjacent to each other. And an edge portion of the substrate having a thickness within the depth of field of the imaging optical system. By forming a contact portion in contact with the electrode of the specimen on the substrate, the contact pressure with the electrode of the specimen can be increased. When the tip of the edge of the substrate is located on a virtual straight line that is close to the contact portion and perpendicular to the arrangement direction of the plurality of contact portions, the specimen electrode and the tip of the edge of the substrate are observed with a microscope or the like. By adjusting the position, the electrode of the specimen and the contact portion of the probe unit can be indirectly accurately aligned. Therefore, by forming the substrate such that the tip of the edge of the substrate is positioned on a virtual straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions. The contact portion of the conducting wire and the electrode of the specimen can be accurately aligned. In addition, the thinner the tip of the edge of the substrate observed at the same time as the electrode of the specimen with a microscope or the like, the clearer the enlarged image of the electrode of the specimen and the tip of the edge of the board with the imaging optical system such as a microscope. Can be obtained.

上記目的を達成するため、本発明に係るプローブユニットは、基板と、前記基板上に形成される複数の導線と、前記導線のそれぞれに形成され前記基板上に位置し検体の電極に接触する接触部と、互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端に向かって薄くなるように前記導線側の面が傾斜している前記基板の縁部と、を備える。接触部から至近距離にあって複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置する場合、検体の電極と基板の縁部の先端とを顕微鏡等で観察しながら位置調整することによって検体の電極とプローブユニットの接触部とを間接的に正確に位置合わせすることができる。したがって、互いに隣り合う接触部の中心間距離より接触部からの距離が短く複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置するように基板を形成することにより、導線の接触部と検体の電極とを正確に位置合わせすることができる。また、顕微鏡等で検体の電極と同時に観察される基板の縁部の先端の厚さが結像光学系の被写界深度内で薄いほど、顕微鏡等の結像光学系で検体の電極と基板の縁部の先端との鮮明な拡大画像を得ることができる。したがって、検体の電極と同時に観察される基板の縁部の導線と反対側の面を、基板が先端に向かって薄くなるように傾斜させることにより、検体の電極と基板の縁部の先端との鮮明な拡大画像を得ることができる。   In order to achieve the above object, a probe unit according to the present invention includes a substrate, a plurality of conductive wires formed on the substrate, and a contact formed on each of the conductive wires and in contact with an electrode of a specimen. The tip is located on a virtual straight line that is shorter than the distance between the centers of the contact portions and the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions, and becomes thinner toward the tips. And an edge portion of the substrate on which the surface on the conductive wire side is inclined. When the tip of the edge of the substrate is located on a virtual straight line that is close to the contact portion and perpendicular to the arrangement direction of the plurality of contact portions, the specimen electrode and the tip of the edge of the substrate are observed with a microscope or the like. By adjusting the position, the electrode of the specimen and the contact portion of the probe unit can be indirectly accurately aligned. Therefore, by forming the substrate such that the tip of the edge of the substrate is positioned on a virtual straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions. The contact portion of the conducting wire and the electrode of the specimen can be accurately aligned. In addition, the thinner the tip of the edge of the substrate observed at the same time as the specimen electrode in the microscope or the like within the depth of field of the imaging optical system, the more the specimen electrode and substrate in the imaging optical system such as a microscope. It is possible to obtain a clear magnified image with the front end of the edge portion. Therefore, by inclining the surface opposite to the conductive wire at the edge of the substrate observed simultaneously with the electrode of the specimen so that the substrate becomes thinner toward the tip, the electrode of the specimen and the tip of the edge of the substrate are A clear enlarged image can be obtained.

上記目的を達成するため、本発明に係るプローブユニットは、基板と、前記基板上に形成される複数の導線と、前記導線のそれぞれに形成され前記基板上に位置し検体の電極に接触する接触部と、互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端側が薄くなる段差が前記導線と反対側の面に形成されている前記基板の縁部と、を備える。接触部から至近距離にあって複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置する場合、検体の電極と基板の縁部の先端とを顕微鏡等で観察しながら位置調整することによって検体の電極とプローブユニットの接触部とを間接的に正確に位置合わせすることができる。したがって、互いに隣り合う接触部の中心間距離より接触部からの距離が短く複数の接触部の配列方向と垂直な仮想直線上に基板の縁部の先端が位置するように基板を形成することにより、導線の接触部と検体の電極とを正確に位置合わせすることができる。また、顕微鏡等で検体の電極と同時に観察される基板の縁部の先端の厚さが薄いほど、顕微鏡等の結像光学系で検体の電極と基板の縁部の先端との鮮明な拡大画像を得ることができる。したがって、検体の電極と同時に観察される基板の縁部の導線と反対側の面に、基板側が薄くなる段差を形成することにより、検体の電極と基板の縁部の先端との鮮明な拡大画像を得ることができる。   In order to achieve the above object, a probe unit according to the present invention includes a substrate, a plurality of conductive wires formed on the substrate, and a contact formed on each of the conductive wires and in contact with an electrode of a specimen. And a step where the tip is located on a virtual straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions, and the tip side becomes thinner. And an edge portion of the substrate formed on a surface opposite to the conductor. When the tip of the edge of the substrate is located on a virtual straight line that is close to the contact portion and perpendicular to the arrangement direction of the plurality of contact portions, the specimen electrode and the tip of the edge of the substrate are observed with a microscope or the like. By adjusting the position, the electrode of the specimen and the contact portion of the probe unit can be indirectly accurately aligned. Therefore, by forming the substrate such that the tip of the edge of the substrate is positioned on a virtual straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions. The contact portion of the conducting wire and the electrode of the specimen can be accurately aligned. In addition, the thinner the tip of the edge of the substrate observed at the same time as the electrode of the specimen with a microscope or the like, the clearer the enlarged image of the electrode of the specimen and the tip of the edge of the board with the imaging optical system such as a microscope. Can be obtained. Therefore, a clear enlarged image of the electrode of the specimen and the tip of the edge of the substrate is formed on the surface opposite to the conductor at the edge of the board, which is observed at the same time as the electrode of the specimen, so that the substrate side becomes thin. Can be obtained.

上記目的を達成するため、本発明に係る導通検査方法は、基板と導線を有するプローブユニットで検体の導通を検査する導通検査方法であって、前記基板の縁部の先端と前記検体の電極とを観察しながら位置合わせすることによって前記導線と前記電極とを位置合わせする段階を含む。検体の電極に対して直接プローブユニットを位置合わせすることにより、位置合わせのためのマークを検体に形成する必要がなくなる。   In order to achieve the above object, a continuity test method according to the present invention is a continuity test method for testing continuity of a specimen with a probe unit having a substrate and a conductor, and includes a tip of an edge of the substrate, an electrode of the specimen, Aligning the conductor and the electrode by aligning while observing. By aligning the probe unit directly with the electrode of the sample, it is not necessary to form a mark for alignment on the sample.

さらに本発明に係る導通検査方法によると、結像光学系の視野内の被写界深度内に前記基板の縁部の先端と前記電極とを同時に収めて前記基板の縁部の先端と前記検体の電極とを観察する。基板の縁部の先端と電極とを結像光学系の視野内の被写界深度内で同時に観察することにより、基板の縁部の先端と電極との鮮明な拡大像に基づいて検体の電極とプローブユニットの接触部とを正確に位置合わせすることができる。   Further, according to the continuity inspection method of the present invention, the tip of the edge of the substrate and the electrode are simultaneously accommodated within the depth of field in the field of view of the imaging optical system, and the tip of the edge of the substrate and the specimen Observe the electrodes. By observing the tip of the edge of the substrate and the electrode simultaneously within the depth of field in the field of view of the imaging optical system, the electrode of the specimen is based on a sharp enlarged image of the tip of the edge of the substrate and the electrode. And the contact portion of the probe unit can be accurately aligned.

以下、本発明の実施例をプローブユニットの構成、プローブユニットを用いた導通試験方法、プローブユニットの製造方法の順に説明する。
1.プローブユニットの構成
(第一実施例)
図1は、本発明によるプローブユニットの第一実施例を示す図である。図2は、本発明の第一実施例によるプローブユニットを用いた導通試験方法を示す図である。
Hereinafter, embodiments of the present invention will be described in the order of the configuration of the probe unit, the continuity test method using the probe unit, and the method of manufacturing the probe unit.
1. Configuration of probe unit (first embodiment)
FIG. 1 is a diagram showing a first embodiment of a probe unit according to the present invention. FIG. 2 is a diagram showing a continuity test method using the probe unit according to the first embodiment of the present invention.

図1及び図2に示すように、本発明の第一実施例によるプローブユニット1は、基板10と、基板10の表面上にLCD(Liquid Crystal Display)パネル等の検体6の電極60のピッチに合わせて狭小なピッチで並列して形成された複数の導線12とを備える。基板10は例えば絶縁性の不透明な材料からなる。導線12は、一定の膜厚を有する薄膜からなり、一定の幅を有し、基板10から突出しないように基板10上に形成されている。従って、各導線12の検体6の電極60と接触する接触部となる先端部16は、基板10上に形成される。プローブユニット1と検体6との位置合わせ時に観察される基板の縁部14の先端18は、基板10の導線12が形成される面に対して垂直な平面であって、基板10の接触部16の配列方向と垂直な方向、すなわち導線12の長手方向に伸びている。   As shown in FIGS. 1 and 2, the probe unit 1 according to the first embodiment of the present invention has a substrate 10 and a pitch of electrodes 60 of a specimen 6 such as an LCD (Liquid Crystal Display) panel on the surface of the substrate 10. And a plurality of conductors 12 formed in parallel at a narrow pitch. The substrate 10 is made of, for example, an insulating opaque material. The conducting wire 12 is made of a thin film having a certain thickness, has a certain width, and is formed on the substrate 10 so as not to protrude from the substrate 10. Accordingly, the distal end portion 16 serving as a contact portion that contacts the electrode 60 of the specimen 6 of each conductive wire 12 is formed on the substrate 10. The tip 18 of the edge portion 14 of the substrate observed when the probe unit 1 and the specimen 6 are aligned is a plane perpendicular to the surface of the substrate 10 on which the conducting wire 12 is formed, and the contact portion 16 of the substrate 10. Extending in the direction perpendicular to the arrangement direction, that is, the longitudinal direction of the conducting wires 12.

導線12の接触部16から至近距離にあって接触部16の配列方向と垂直な仮想直線上に基板の縁部14の先端18が位置する場合、検体6の電極60と先端18とを顕微鏡等の結像光学系で同時に観察しながら位置調整することによって検体6の電極60とプローブユニット1の接触部16とを間接的に正確に位置合わせすることができる。そこで、基板の縁部14の先端18と検体6の電極60とを顕微鏡等の視野内に同時に収めて観察するために、最も近い接触部16までの距離a及びbが互いに隣り合う導線12の接触部16の中心間距離dより短くかつ接触部16の配列方向に垂直な仮想直線x1、x2上に、縁部14の先端18を形成する。観察の作業性を考慮すると、仮想直線x1、x2と接触部16との距離a及びbを接触部16の中心間距離dの1/2以下に設定することが好ましく、0μm以上5μm以下に設定することがさらに好ましい。 When the tip 18 of the edge 14 of the substrate is located on a virtual straight line that is at a short distance from the contact portion 16 of the conducting wire 12 and perpendicular to the arrangement direction of the contact portion 16, the electrode 60 and the tip 18 of the specimen 6 are placed under a microscope or the like. By adjusting the position while simultaneously observing with the imaging optical system, the electrode 60 of the specimen 6 and the contact portion 16 of the probe unit 1 can be accurately aligned indirectly. Therefore, in order to simultaneously observe the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 within the field of view of a microscope or the like, the distances a and b to the nearest contact portion 16 are adjacent to each other of the conductors 12 adjacent to each other. The tip 18 of the edge 14 is formed on virtual straight lines x 1 and x 2 that are shorter than the distance d between the centers of the contact portions 16 and perpendicular to the arrangement direction of the contact portions 16. Considering the workability of observation, it is preferable to set the distances a and b between the virtual straight lines x 1 and x 2 and the contact part 16 to ½ or less of the distance d between the centers of the contact parts 16, and 0 μm or more and 5 μm or less. More preferably, it is set to.

また、基板の縁部14の先端18の厚さが薄いほど、結像光学系で先端18と検体6の電極60との鮮明な拡大画像が得られる。そこで、基板の縁部14の先端18と検体6の電極60とを結像光学系の視野内の被写界深度内に同時に収めて、同時に鮮明な画像で観察するために、基板の縁部14の先端18の厚さを例えば200μm以内にする。望ましくは、基板の縁部14の先端18の厚さと導線12の厚さの合計を350μm以内にする。   Further, the thinner the tip 18 of the edge 14 of the substrate is, the clearer the enlarged image of the tip 18 and the electrode 60 of the specimen 6 is obtained in the imaging optical system. Therefore, in order to simultaneously fit the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 within the depth of field within the field of view of the imaging optical system, and simultaneously observe a clear image, the edge of the substrate The thickness of the tip 18 of 14 is made into 200 micrometers or less, for example. Desirably, the sum of the thickness of the tip 18 of the edge 14 of the substrate and the thickness of the conductor 12 is within 350 μm.

本実施例によると、検体6の電極60に接触する接触部16を基板10上に形成することにより、接触部16と電極60との接触圧を大きくすることができる。
また本実施例によると、導線12の接触部16からの距離a、bが隣り合う接触部16の中心間距離dより短く接触部16の配列方向と垂直な仮想直線x1、x2上に先端18が位置するように基板の縁部14を形成することにより、先端18と検体6の電極60とを結像光学系の視野内に同時に収めて観察しながら位置調整し、検体6の電極60とプローブユニット1の接触部16とを間接的に正確に位置合わせすることができる。また、基板の縁部14の先端18の厚さを200μm以内に薄くすることにより、結像光学系の被写界深度内で検体6の電極60と基板の縁部14の先端18とを同時に鮮明な画像で観察することができる。また、基板の先端18と検体6の電極60とを基板10の両端のそれぞれで位置合わせすることができるため、導線12の配列方向と電極60の配列方向とが平行になるようにプローブユニット1の検体6に対する傾きを補正できる。
According to the present embodiment, the contact pressure between the contact portion 16 and the electrode 60 can be increased by forming the contact portion 16 in contact with the electrode 60 of the specimen 6 on the substrate 10.
Further, according to the present embodiment, the distances a and b from the contact portion 16 of the conducting wire 12 are shorter than the center-to-center distance d of the adjacent contact portions 16 and are on the imaginary straight lines x 1 and x 2 perpendicular to the arrangement direction of the contact portions 16. By forming the edge portion 14 of the substrate so that the tip 18 is positioned, the tip 18 and the electrode 60 of the specimen 6 are simultaneously placed in the field of view of the imaging optical system, and the position of the specimen 6 is adjusted while observing. 60 and the contact part 16 of the probe unit 1 can be indirectly accurately aligned. Further, by reducing the thickness of the tip 18 of the edge portion 14 of the substrate to within 200 μm, the electrode 60 of the specimen 6 and the tip 18 of the edge portion 14 of the substrate are simultaneously placed within the depth of field of the imaging optical system. A clear image can be observed. In addition, since the tip 18 of the substrate and the electrode 60 of the specimen 6 can be aligned at both ends of the substrate 10, the probe unit 1 is arranged so that the arrangement direction of the conducting wires 12 and the arrangement direction of the electrodes 60 are parallel to each other. The inclination with respect to the specimen 6 can be corrected.

さらに本実施例によると、基板の縁部14の先端18と検体6の電極60とを同時に観察することにより電極60とプローブユニット1の接触部16とを正確かつ容易に位置合わせすることができるので、検体6に位置合わせのためのマークを付けておく必要がない。また、基板の縁部14の先端18と電極60とが結像光学系の被写界深度内に収まるように先端18の厚さを設定することにより、基板の縁部14の先端18と電極60とを同時に鮮明な像で観察することができるので、鮮明な像を得るために画像処理を行ったり二重焦点カメラを用いる必要がない。従って、検体の製造システムを簡素化し、製造コストを低減することができる。   Furthermore, according to the present embodiment, the electrode 60 and the contact portion 16 of the probe unit 1 can be accurately and easily aligned by simultaneously observing the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6. Therefore, there is no need to mark the specimen 6 for alignment. Further, by setting the thickness of the tip 18 so that the tip 18 of the edge 14 of the substrate and the electrode 60 are within the depth of field of the imaging optical system, the tip 18 and the electrode of the edge 14 of the substrate are set. Therefore, it is not necessary to perform image processing or use a double focus camera in order to obtain a clear image. Therefore, the sample manufacturing system can be simplified and the manufacturing cost can be reduced.

(第二から第五実施例)
図3から図6は、本発明によるプローブユニットの第二から第五実施例を示す図である。
本発明の第二実施例では、図3に示すように、基板10の接触部16側の二つの角部が除去され、導線12の長手方向に対して傾斜した方向に伸びる第二端面22が基板の縁部14に形成されている。この第二端面22と基板10の導線12の接触部16側の端面21とが交わる部位18が、検体の電極とともに観察される部位であり、請求項に記載の縁部の先端に相当する。
(Second to fifth embodiments)
3 to 6 are views showing second to fifth embodiments of the probe unit according to the present invention.
In the second embodiment of the present invention, as shown in FIG. 3, two corners on the contact portion 16 side of the substrate 10 are removed, and a second end face 22 extending in a direction inclined with respect to the longitudinal direction of the conducting wire 12 is formed. It is formed on the edge 14 of the substrate. A portion 18 where the second end surface 22 and the end surface 21 on the contact portion 16 side of the conductive wire 12 of the substrate 10 intersect is a portion that is observed together with the electrode of the specimen, and corresponds to the tip of the edge portion recited in the claims.

本発明の第三実施例では、図4に示すように、半楕円状の切り欠き部24が基板の縁部14の接触部16近傍にそれぞれ形成されている。各切り欠き部24の導線12に最も近い部位18が、検体の電極とともに観察される部位であり、請求項に記載の縁部の先端に相当する。各切り欠き部24の導線12に最も近い部位は接触部16の配列方向に並んでいる。   In the third embodiment of the present invention, as shown in FIG. 4, a semi-elliptical cutout portion 24 is formed in the vicinity of the contact portion 16 of the edge portion 14 of the substrate. The portion 18 of each notch 24 that is closest to the conducting wire 12 is a portion that is observed together with the electrode of the specimen, and corresponds to the tip of the edge portion recited in the claims. The portion of each notch 24 that is closest to the conducting wire 12 is arranged in the arrangement direction of the contact portions 16.

本発明の第四実施例では、図5に示すように、V字状の切り欠き部26が、基板10の最も外側にある導線12aの接触部16aと導線12aと隣り合う導線12bの接触部16bとの間に位置するように基板の縁部14に形成されている。切り欠き部26の最も内側の部位18が、結像光学系で検体の電極とともに観察される部位であり、請求項に記載の縁部の先端に相当する。   In the fourth embodiment of the present invention, as shown in FIG. 5, the V-shaped cutout portion 26 has a contact portion 16a of the lead wire 12a on the outermost side of the substrate 10 and a contact portion of the lead wire 12b adjacent to the lead wire 12a. It is formed in the edge part 14 of a board | substrate so that it may be located between 16b. The innermost portion 18 of the notch 26 is a portion that is observed together with the electrode of the specimen in the imaging optical system, and corresponds to the tip of the edge portion recited in the claims.

本発明の第五実施例では、図6に示すように、基板10を貫通する2つの貫通孔28が基板10の接触部16近傍に接触部16の配列方向に並んで形成されている。貫通孔28を囲む基板10の縁部の最も内側に位置する部位18が、結像光学系で検体の電極とともに観察される部位であり、請求項に記載の縁部の先端に相当する。   In the fifth embodiment of the present invention, as shown in FIG. 6, two through holes 28 penetrating the substrate 10 are formed in the vicinity of the contact portion 16 of the substrate 10 in the arrangement direction of the contact portion 16. The part 18 located on the innermost side of the edge of the substrate 10 surrounding the through hole 28 is a part observed together with the electrode of the specimen in the imaging optical system, and corresponds to the tip of the edge described in the claims.

検体の電極とともに観察される基板の縁部14の先端を、導線12の接触部16から至近距離にあって接触部16の配列方向と垂直な仮想直線上に位置するように形成するには、基板10の導線12から至近距離にある部位を加工する必要がある。この加工工程は、導線12から至近距離にある部位を加工するため、導線12を破壊する危険性を伴う。本発明の第二から第五実施例によると、基板の縁部14の導線12から至近距離にある局所部位18を検体の電極とともに観察される部位とし、請求項に記載の縁部の先端とすることにより、基板の縁部14の局所部位に対応する付近のみ基板10を加工すればよく、基板10の導線12から至近距離にある部位を局所的に加工すればよい。従って、基板10の縁部を加工する工程で導線12が破壊されにくくなり、プローブユニット1の歩留まりが向上する。   In order to form the tip of the edge portion 14 of the substrate observed together with the electrode of the specimen so as to be positioned on a virtual straight line at a short distance from the contact portion 16 of the conducting wire 12 and perpendicular to the arrangement direction of the contact portion 16, It is necessary to process a part at a close distance from the conductive wire 12 of the substrate 10. This processing step involves a risk of destroying the lead wire 12 because a part at a close distance from the lead wire 12 is processed. According to the second to fifth embodiments of the present invention, the local portion 18 at a close distance from the conductive wire 12 of the edge portion 14 of the substrate is set as a portion to be observed together with the electrode of the specimen, Thus, the substrate 10 may be processed only in the vicinity corresponding to the local portion of the edge 14 of the substrate, and the portion at a close distance from the conductive wire 12 of the substrate 10 may be processed locally. Accordingly, the conductor 12 is not easily broken in the process of processing the edge of the substrate 10, and the yield of the probe unit 1 is improved.

(第六実施例)
図7は、本発明によるプローブユニットの第五実施例を示す図である。
図7に示すように、本発明の第五実施例によるプローブユニット1は、第一実施例と同様に、基板10と、基板10上に形成された複数の導線12とを備える。各導線12は、基板10から突出しないように基板10上に形成されている。各導線12の先端部16は、検体の電極と接触する接触部となる。
(Sixth embodiment)
FIG. 7 is a view showing a fifth embodiment of the probe unit according to the present invention.
As shown in FIG. 7, the probe unit 1 according to the fifth embodiment of the present invention includes a substrate 10 and a plurality of conductive wires 12 formed on the substrate 10 as in the first embodiment. Each conducting wire 12 is formed on the substrate 10 so as not to protrude from the substrate 10. The distal end portion 16 of each conducting wire 12 serves as a contact portion that comes into contact with the electrode of the specimen.

本実施例では、基板10の導線12の長手方向に伸びる辺の近傍には、先端側ほど基板10が薄くなるように傾斜した傾斜面30が、基板10の導線12が形成される面と反対側に形成されている。傾斜面30と基板10の導線12が形成される面とが交わる部位18が、プローブユニット1と検体6との位置合わせ時に観察される部位であり、請求項に記載の縁部の先端に相当する。さらに基板の縁部14の先端18と検体の電極とを結像光学系の視野内に同時に収めて観察するため、最も近い接触部16までの距離a及びbが互いに隣り合う接触部16の中心間距離dより短くかつ接触部16の配列方向に垂直な仮想直線x1、x2上に、基板10の縁部の先端18を形成する。傾斜面30は例えば、傾斜面30の形状に合わせて作製された砥石を用いて基板の角部を除去することにより、形成できる。 In this embodiment, an inclined surface 30 that is inclined so that the substrate 10 becomes thinner toward the tip side is opposite to the surface of the substrate 10 on which the conductor 12 is formed, in the vicinity of the side extending in the longitudinal direction of the conductor 12 of the substrate 10. Formed on the side. A portion 18 where the inclined surface 30 and the surface on which the conductive wire 12 of the substrate 10 is formed is a portion that is observed when the probe unit 1 and the specimen 6 are aligned, and corresponds to the tip of the edge portion according to claim. To do. Further, since the tip 18 of the edge 14 of the substrate and the electrode of the specimen are simultaneously accommodated in the field of view of the imaging optical system, the distances a and b to the nearest contact portion 16 are the centers of the contact portions 16 adjacent to each other. The tip 18 of the edge of the substrate 10 is formed on virtual straight lines x 1 and x 2 that are shorter than the distance d and perpendicular to the arrangement direction of the contact portions 16. The inclined surface 30 can be formed, for example, by removing the corners of the substrate using a grindstone manufactured according to the shape of the inclined surface 30.

本実施例によると、導線12の接触部16からの距離a、bが互いに隣り合う接触部16の中心間距離dより短く接触部16の配列方向と垂直な仮想直線x1、x2上に、先端18が位置するように基板の縁部14を形成することにより、先端18と検体の電極とを結像光学系の視野内に同時に収めて観察しながら位置調整し、検体の電極とプローブユニット1の接触部16とを間接的に正確に位置合わせすることができる。さらに、基板10が厚い場合でも、基板の縁部14が先端18に向かって薄くなるように基板の縁部14の導線12と反対側の面を傾斜させることにより、基板の縁部14の先端18と検体の電極とを結像光学系の視野内の被写界深度内に同時に収めて、同時に鮮明な画像で観察することができる。 According to the present embodiment, the distances a and b from the contact portion 16 of the conducting wire 12 are shorter than the center-to-center distance d between the contact portions 16 adjacent to each other, and on the virtual straight lines x 1 and x 2 perpendicular to the arrangement direction of the contact portions 16. By forming the edge portion 14 of the substrate so that the tip 18 is positioned, the tip 18 and the specimen electrode are simultaneously placed in the field of view of the imaging optical system, and the position is adjusted while observing. The contact portion 16 of the unit 1 can be accurately aligned indirectly. Further, even when the substrate 10 is thick, the front end of the substrate edge 14 is inclined by inclining the surface of the substrate edge 14 opposite to the conductor 12 so that the edge 14 of the substrate becomes thinner toward the tip 18. 18 and the electrode of the specimen can be simultaneously accommodated within the depth of field within the field of view of the imaging optical system, and a clear image can be observed at the same time.

(第七及び第八実施例)
図8は、本発明によるプローブユニットの第七及び第八実施例を示す正面図である。
本発明の第七実施例では、図8(A)に示すように、基板10の導線12の長手方向に伸びる辺の近傍には、先端側ほど基板10を薄くする凹面32が、基板10の導線12が形成される面と反対側に形成されている。凹面32と基板10の導線12が形成される面とが交わる部位が、プローブユニット1と検体6との位置合わせ時に観察される部位であり、請求項に記載の縁部の先端に相当する。
(Seventh and eighth examples)
FIG. 8 is a front view showing seventh and eighth embodiments of the probe unit according to the present invention.
In the seventh embodiment of the present invention, as shown in FIG. 8A, in the vicinity of the side extending in the longitudinal direction of the conducting wire 12 of the substrate 10, a concave surface 32 that makes the substrate 10 thinner toward the tip side is formed. It is formed on the side opposite to the surface on which the conducting wire 12 is formed. A portion where the concave surface 32 and the surface on which the conductive wire 12 of the substrate 10 is formed is a portion that is observed when the probe unit 1 and the specimen 6 are aligned, and corresponds to the tip of the edge portion recited in the claims.

本発明の第八実施例では、図8(B)に示すように、基板10の導線12の長手方向に伸びる辺の近傍には、先端側ほど基板10が薄くなるように傾斜した傾斜面30が、基板10の導線12が形成される面と反対側に形成されている。傾斜面30と基板10の導線12が形成される面とに接し、基板10の導線12が形成される面に対して垂直であって、基板10の導線12の長手方向に伸びている端面18が、プローブユニット1と検体6との位置合わせ時に観察される部位であり、請求項に記載の縁部の先端に相当する。   In the eighth embodiment of the present invention, as shown in FIG. 8B, in the vicinity of the side extending in the longitudinal direction of the conductive wire 12 of the substrate 10, the inclined surface 30 is inclined so that the substrate 10 becomes thinner toward the tip side. Is formed on the opposite side of the surface of the substrate 10 on which the conducting wire 12 is formed. An end face 18 that is in contact with the inclined surface 30 and the surface on which the conductive wire 12 of the substrate 10 is formed, is perpendicular to the surface on which the conductive wire 12 of the substrate 10 is formed, and extends in the longitudinal direction of the conductive wire 12 of the substrate 10. Is a portion observed when the probe unit 1 and the specimen 6 are aligned, and corresponds to the tip of the edge portion recited in the claims.

(第九実施例)
図9は、本発明によるプローブユニットの第九実施例を示す図である。
図9に示すように、本発明の第九実施例によるプローブユニット1は、第一実施例と同様に、基板10と、基板10上に形成された複数の導線12とを備える。各導線12は、基板10から突出しないように基板10上に形成されている。各導線12の先端部16は、検体の電極と接触する接触部となる。
(Ninth Example)
FIG. 9 is a view showing a ninth embodiment of the probe unit according to the present invention.
As shown in FIG. 9, the probe unit 1 according to the ninth embodiment of the present invention includes a substrate 10 and a plurality of conductive wires 12 formed on the substrate 10 as in the first embodiment. Each conducting wire 12 is formed on the substrate 10 so as not to protrude from the substrate 10. The distal end portion 16 of each conducting wire 12 serves as a contact portion that comes into contact with the electrode of the specimen.

本実施例では、基板10の導線12の長手方向に伸びる辺の近傍には、先端側ほど基板10が薄くなる段差面34が、基板10の導線12が形成される面と反対側に形成されている。傾斜面30と基板10の導線12が形成される面とに接し、基板10の導線12が形成される面に対して垂直であって、基板10の導線12の長手方向に伸びている端面18が、プローブユニット1と検体6との位置合わせ時に観察される部位であり、請求項に記載の縁部の先端に相当する。さらに基板の縁部14の先端18と検体の電極とを結像光学系の視野内に同時に収めて観察するために、最も近い接触部16までの距離a、bが互いに隣り合う接触部16の中心間距離dより短くかつ接触部16の配列方向に垂直な仮想直線x1、x2上に、基板10の縁部の先端18を形成する。 In the present embodiment, a stepped surface 34 in which the substrate 10 becomes thinner toward the tip side is formed on the opposite side of the surface of the substrate 10 on which the conducting wire 12 is formed, in the vicinity of the side extending in the longitudinal direction of the conducting wire 12 of the substrate 10. ing. An end face 18 that is in contact with the inclined surface 30 and the surface on which the conductive wire 12 of the substrate 10 is formed, is perpendicular to the surface on which the conductive wire 12 of the substrate 10 is formed, and extends in the longitudinal direction of the conductive wire 12 of the substrate 10. Is a portion observed when the probe unit 1 and the specimen 6 are aligned, and corresponds to the tip of the edge portion recited in the claims. Further, in order to simultaneously observe the tip 18 of the edge 14 of the substrate and the electrode of the specimen within the visual field of the imaging optical system, the distances a and b to the nearest contact portion 16 are adjacent to each other. The tip 18 of the edge of the substrate 10 is formed on virtual straight lines x 1 and x 2 that are shorter than the center distance d and perpendicular to the arrangement direction of the contact portions 16.

本実施例によると、導線12の接触部16からの距離a、bが互いに隣り合う接触部16の中心間距離dより短く接触部16の配列方向と垂直な仮想直線x1、x2上に先端18が位置するように基板の縁部14を形成することにより、先端18と検体の電極とを結像光学系の視野内に同時に収めて観察しながら位置調整し、検体の電極とプローブユニット1の接触部16とを間接的に正確に位置合わせすることができる。さらに、基板10が厚い場合でも、先端18側ほど基板の縁部14が薄くなるように基板の縁部14の導線12と反対側を階段状に形成することにより、先端18と検体の電極とを結像光学系の視野内の被写界深度内に同時に収めて、同時に鮮明な画像で観察することができる。 According to the present embodiment, the distances a and b from the contact portion 16 of the conducting wire 12 are shorter than the center-to-center distance d between the contact portions 16 adjacent to each other, and on the virtual straight lines x 1 and x 2 perpendicular to the arrangement direction of the contact portions 16. By forming the edge portion 14 of the substrate so that the tip 18 is located, the tip 18 and the electrode of the specimen are simultaneously placed in the field of view of the imaging optical system, and the position is adjusted while observing. One contact portion 16 can be accurately aligned indirectly. Further, even when the substrate 10 is thick, the tip 18 and the electrode of the specimen are formed in a stepped manner on the side opposite to the conductive wire 12 of the edge 14 of the substrate so that the edge 14 of the substrate becomes thinner toward the tip 18 side. At the same time within the depth of field within the field of view of the imaging optical system, and at the same time, a clear image can be observed.

2.導通試験方法
(第一実施例)
図2及び図10を参照して、本発明による導通試験方法の第一実施例を説明する。
2. Continuity test method (first example)
A first embodiment of the continuity test method according to the present invention will be described with reference to FIGS.

図2に示すように、プローブユニット1を検体6の導通検査に使用する際、基板10をプローブベース4に取り付けることによりプローブユニット1をプローブベース4に固定し、プローブヘッド5を構成する。一方図10に示すように、検体6は、その検体6とプローブユニット1との位置合わせのために電極60の配列方向及び長手方向に移動可能なテーブル7に載置される。プローブユニット1の検体6と反対側には、検体6の上面に垂直な方向から基板の縁部14の先端18と検体6の電極60とを観察できる位置にカメラ8を配置する。カメラ8はモニタ9に接続され、カメラ8で撮影した画像はモニタ9に映し出される。なお、カメラ8の代わりに顕微鏡等で基板の縁部14の先端18と検体6の電極60とを観察してもよい。プローブヘッド5は、導通検査時にプローブユニット1が検体6に対して所定の角度で接触する姿勢で昇降機能を有する導通検査装置本体(図示せず)に取り付けられる。各導線12の接触部16と反対の一端には、導通検査装置本体と接続されているフレキシブルプリント基板3が接合される。   As shown in FIG. 2, when the probe unit 1 is used for the continuity test of the specimen 6, the probe unit 1 is fixed to the probe base 4 by attaching the substrate 10 to the probe base 4, thereby configuring the probe head 5. On the other hand, as shown in FIG. 10, the specimen 6 is placed on a table 7 that is movable in the arrangement direction and the longitudinal direction of the electrodes 60 in order to align the specimen 6 and the probe unit 1. On the opposite side of the probe unit 1 from the sample 6, the camera 8 is arranged at a position where the tip 18 of the edge 14 of the substrate and the electrode 60 of the sample 6 can be observed from a direction perpendicular to the upper surface of the sample 6. The camera 8 is connected to a monitor 9 and an image taken by the camera 8 is displayed on the monitor 9. Note that the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 may be observed with a microscope or the like instead of the camera 8. The probe head 5 is attached to a continuity test apparatus main body (not shown) having a lifting function in such a posture that the probe unit 1 contacts the sample 6 at a predetermined angle during the continuity test. The flexible printed circuit board 3 connected to the continuity testing device main body is joined to one end of each conductive wire 12 opposite to the contact portion 16.

検査でははじめに、導通検査装置本体によって、プローブユニット1の導線12が検体6の電極60と一対一に対応するようにプローブヘッド5を検体6に対して降下させる。次に、基板の縁部14の先端18と検体6の電極60とをプローブユニット1の検体6の反対側からカメラ8によって撮影し、その撮影された画像をモニタ9に映し出して観察する。このとき、接触部16からの距離が短く接触部16の配列方向と垂直な仮想直線上に基板の縁部14の先端18が位置し、その先端18の厚さがカメラ8の視野内の被写界深度内に収まるほどに薄く形成されているため、基板の縁部14の先端18と検体6の電極60とをカメラ8の視野内の被写界深度内に同時に収めて、両者の鮮明な画像を得ることができる。次に、モニタ9を観察しながら基板10の両側の縁部14の先端18と検体6の電極60との距離が所定の長さになるようにテーブル7を移動させて位置調整することにより、電極60と導線12の接触部16とを間接的に位置合わせする。具体的には例えば、基板10の縁部の先端18と最も外側に形成された導線12との距離が導線12の中心間距離の2分の1に設定されている場合、基板10の縁部の先端18が隣り合う電極60の中間に位置するように、検体6とプローブユニット1とを位置調整する。なお、基板の縁部14の先端18と検体6の電極60との距離をマイクロメータを用いて測定しながら位置調整することにより、より高精度に位置合わせすることができる。接触部16と電極60との位置合わせ後、プローブユニット1を検体6に対してオーバードライブさせ、フレキシブルプリント基板3を介して検査信号をプローブユニット1に入力して検体6の導通検査を行う。   In the inspection, first, the probe head 5 is lowered with respect to the specimen 6 so that the conducting wire 12 of the probe unit 1 corresponds to the electrode 60 of the specimen 6 on a one-to-one basis. Next, the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 are photographed by the camera 8 from the opposite side of the specimen 6 of the probe unit 1, and the photographed image is displayed on the monitor 9 and observed. At this time, the tip 18 of the edge 14 of the substrate is located on a virtual straight line that is short from the contact portion 16 and perpendicular to the arrangement direction of the contact portion 16, and the thickness of the tip 18 is within the field of view of the camera 8. Since it is formed thin enough to be within the depth of field, the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 are simultaneously placed within the depth of field within the field of view of the camera 8 so that both are clear. Can be obtained. Next, by observing the monitor 9, the table 7 is moved and adjusted so that the distance between the tip 18 of the edge 14 on both sides of the substrate 10 and the electrode 60 of the specimen 6 becomes a predetermined length. The electrode 60 and the contact part 16 of the conducting wire 12 are indirectly aligned. Specifically, for example, when the distance between the tip 18 of the edge of the substrate 10 and the outermost conductive wire 12 is set to one half of the distance between the centers of the conductive wires 12, the edge of the substrate 10 The position of the specimen 6 and the probe unit 1 is adjusted so that the tip 18 is positioned between the adjacent electrodes 60. The position can be adjusted with higher accuracy by adjusting the position while measuring the distance between the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 using a micrometer. After the alignment between the contact portion 16 and the electrode 60, the probe unit 1 is overdriven with respect to the specimen 6, and a test signal is input to the probe unit 1 via the flexible printed circuit board 3 to perform a continuity test of the specimen 6.

本実施例によると、基板の縁部14の先端18と検体6の電極60とを同時に観察しながら位置調整することにより、導線12の接触部16と検体6の電極60とを間接的に正確に位置合わせすることができるため、検体6に位置合わせのためのマークを付けておく必要がない。また、基板の縁部14の先端18と検体6の電極60とをカメラ8の視野内の被写界深度内に同時に収めて、両者の鮮明な画像を得ることができるため、その基板の縁部14の先端18と電極60との鮮明な画像に基づいてプローブユニット1の接触部16と検体6の電極60とを正確に位置合わせすることができる。基板の縁部14の先端18と検体6の電極60との鮮明な画像を得ることができることにより、鮮明な像を得るために画像処理を行ったり二重焦点カメラを用いる必要がない。   According to the present embodiment, the position of the front end 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 are adjusted while observing them simultaneously, so that the contact portion 16 of the lead 12 and the electrode 60 of the specimen 6 are indirectly accurate. Therefore, it is not necessary to mark the specimen 6 for alignment. In addition, since the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 can be simultaneously accommodated within the depth of field within the field of view of the camera 8 and a clear image of both can be obtained, the edge of the substrate can be obtained. The contact portion 16 of the probe unit 1 and the electrode 60 of the specimen 6 can be accurately aligned based on a clear image of the tip 18 of the portion 14 and the electrode 60. Since a clear image of the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6 can be obtained, there is no need to perform image processing or use a double focus camera in order to obtain a clear image.

(第二実施例)
本発明による導通試験方法の第二実施例は、突出したブロック状の電極を有する検体を検査するための導通試験方法である。図11は、本発明による導通試験方法の第二実施例を示す図である。
(Second embodiment)
The second embodiment of the continuity test method according to the present invention is a continuity test method for examining a specimen having a protruding block-like electrode. FIG. 11 is a diagram showing a second embodiment of the continuity test method according to the present invention.

図11に示すように本実施例では、プローブユニット1の接触部16が接触する検体6の電極60は、検体6の配線62から突出しており、線状でなく、幅が配線62より狭いブロック状である。この電極60と接触部16との最終的な位置合わせではまず、プローブユニット1の基板10側から基板の縁部14の先端18と検体6の電極60とを同時に観察しながら、先端18と電極60とを電極の配列方向(図のX1、X2方向)に位置合わせする。それと同時に、プローブユニット1の基板10側から基板10の接触部側端部36と検体6とを観察して基板10の接触部側端部36が電極60上に位置するようにプローブユニット1又は検体6を配線62の長手方向(図のY1、Y2方向)に移動させ、導線12の接触部16と電極60とを配線62の長手方向に位置合わせする。   As shown in FIG. 11, in this embodiment, the electrode 60 of the specimen 6 that contacts the contact portion 16 of the probe unit 1 protrudes from the wiring 62 of the specimen 6, and is not linear but is a block whose width is narrower than that of the wiring 62. Is. In the final alignment between the electrode 60 and the contact portion 16, first, while simultaneously observing the tip 18 of the edge 14 of the substrate 14 and the electrode 60 of the specimen 6 from the substrate 10 side of the probe unit 1, 60 is aligned in the electrode arrangement direction (X1, X2 direction in the figure). At the same time, the probe unit 1 or the contact unit side end 36 of the substrate 10 and the sample 6 are observed from the substrate 10 side of the probe unit 1 so that the contact unit side end 36 of the substrate 10 is positioned on the electrode 60. The specimen 6 is moved in the longitudinal direction of the wiring 62 (Y1, Y2 direction in the figure), and the contact portion 16 of the conducting wire 12 and the electrode 60 are aligned with the longitudinal direction of the wiring 62.

本実施例によると、検体6の電極60がブロック状であっても、基板の縁部14の先端18と検体6の電極60とを観察することにより電極の配列方向に導線12と検体6の電極60とを位置合わせすると同時に、基板10の接触部側端部36と検体6とを位置合わせすることにより配線62の長手方向に導線12の接触部16と電極60とを位置合わせでき、接触部16と電極60とを容易かつ正確に位置合わせすることができる。   According to the present embodiment, even if the electrode 60 of the specimen 6 is in a block shape, by observing the tip 18 of the edge 14 of the substrate and the electrode 60 of the specimen 6, the conductor 12 and the specimen 6 are arranged in the electrode arrangement direction. Simultaneously with the alignment of the electrode 60, the contact portion 16 of the lead wire 12 and the electrode 60 can be aligned in the longitudinal direction of the wiring 62 by aligning the contact portion side end 36 of the substrate 10 and the specimen 6. The part 16 and the electrode 60 can be easily and accurately aligned.

(第三実施例)
本発明による導通試験方法の第三実施例は、より小さいブロック状の電極を有する検体を検査するための導通試験方法である。図12は、本発明による導通試験方法の第三実施例を示す図である。
(Third embodiment)
The third embodiment of the continuity test method according to the present invention is a continuity test method for examining a specimen having a smaller block-like electrode. FIG. 12 is a diagram showing a third embodiment of the continuity test method according to the present invention.

図12に示すように本実施例では、検体6の電極60は、検体6の配線62から突出しており、第二実施例より配線62の長手方向の長さがさらに小さいブロック状である。この電極60と導線12の接触部16との最終的な位置合わせではまず、基板の縁部14の先端18と検体6の配線62とを観察しながらプローブユニット1又は検体6を移動させ、先端18と配線62とを電極の配列方向に位置合わせする。次に、基板10の接触部側端部36と検体6とを同時に観察しながら、基板10の接触部側端部36が電極60に対応するようプローブユニット1又は検体6を配線62の長手方向に移動させ、導線12の接触部16と電極60とを配線62の長手方向に位置合わせする。   As shown in FIG. 12, in this embodiment, the electrode 60 of the specimen 6 protrudes from the wiring 62 of the specimen 6 and has a block shape in which the length of the wiring 62 in the longitudinal direction is further smaller than that of the second embodiment. In the final alignment between the electrode 60 and the contact portion 16 of the conducting wire 12, first, the probe unit 1 or the sample 6 is moved while observing the tip 18 of the edge 14 of the substrate and the wiring 62 of the sample 6, and the tip 18 and the wiring 62 are aligned in the arrangement direction of the electrodes. Next, while simultaneously observing the contact portion side end portion 36 of the substrate 10 and the sample 6, the probe unit 1 or the sample 6 is placed in the longitudinal direction of the wiring 62 so that the contact portion side end portion 36 of the substrate 10 corresponds to the electrode 60. The contact portion 16 of the conductive wire 12 and the electrode 60 are aligned in the longitudinal direction of the wiring 62.

3.プローブユニットの製造方法
(第一実施例)
本発明によるプローブユニットの製造方法の第一実施例は、本発明によるプローブユニットの第一実施例を製造するための方法である。
3. Probe unit manufacturing method (first embodiment)
The first embodiment of the method for manufacturing the probe unit according to the present invention is a method for manufacturing the first embodiment of the probe unit according to the present invention.

図13から図18は、本発明によるプローブユニットの製造方法の第一実施例を示す図である。
はじめに図13に示すように、一枚の基板10から六つのプローブユニットを作製するために、その六つのプローブユニットをそれぞれ構成する複数の導線12を基板10の表面上に形成する。基板10には例えば幅76.2mm、長さ76.2mm、厚さ1.25mm以上2mm以下の正方形基板を用い、ガラス板、合成樹脂板、セラミック板、シリコン板、金属板などを用いる。このうちガラス板、ならびにジルコニア、アルミナなどからなるセラミック板などの絶縁性基板を用いることが好ましい。金属板などの導電性基板を用いる場合は、その導電性の基板本体の導線12を形成する側の面に絶縁層を形成した基板10を使用する。
FIGS. 13 to 18 are views showing a first embodiment of a method for manufacturing a probe unit according to the present invention.
First, as shown in FIG. 13, in order to produce six probe units from one substrate 10, a plurality of conductive wires 12 that respectively constitute the six probe units are formed on the surface of the substrate 10. For example, a square substrate having a width of 76.2 mm, a length of 76.2 mm, and a thickness of 1.25 mm to 2 mm is used as the substrate 10, and a glass plate, a synthetic resin plate, a ceramic plate, a silicon plate, a metal plate, or the like is used. Among these, it is preferable to use an insulating substrate such as a glass plate and a ceramic plate made of zirconia, alumina or the like. When a conductive substrate such as a metal plate is used, the substrate 10 having an insulating layer formed on the surface of the conductive substrate main body on which the conductive wires 12 are formed is used.

導線12の具体的な形成方法は例えば、はじめに基板10の表面全体にめっき下地層を形成する。次に、形成しようとする導線12に対応する部分のみめっき下地層を露出させてそれ以外の部分をレジストで被覆し、露出しためっき下地層の表面に金属めっきを施す。最後に導線部分以外の不要なめっき下地層及びレジストを除去する。この他、フォトエッチングによるパターニング、基板上への導電性ペーストの印刷など既知のパターニング方法を用いることにより、めっき下地層を予め導線12のパターンに形成してから金属めっきを行ってもよい。導線12が適当な硬さ及び弾性を有するようにするために、めっきする金属材料として例えばNi、Ni−W、NiFeなどのニッケル合金または金属ガラスを用いる。なお、基板10を補強するための基礎板に基板10を貼り付けて固定してから、基板10上に導線12を形成してもよい。   For example, a specific method of forming the conductive wire 12 is to form a plating base layer on the entire surface of the substrate 10 first. Next, the plating base layer is exposed only at a portion corresponding to the conductive wire 12 to be formed, and the other portions are covered with a resist, and the exposed plating base layer is subjected to metal plating. Finally, unnecessary plating underlayers and resist other than the conductive wire portion are removed. In addition, metal plating may be performed after the plating base layer is formed in the pattern of the conductive wire 12 in advance by using a known patterning method such as patterning by photoetching or printing of conductive paste on the substrate. In order to make the conducting wire 12 have appropriate hardness and elasticity, a nickel alloy such as Ni, Ni-W, NiFe or a metallic glass is used as a metal material to be plated. Note that the conductive wire 12 may be formed on the substrate 10 after the substrate 10 is attached and fixed to a base plate for reinforcing the substrate 10.

次に図14に示すように、導線12を含む基板10の表面全体を被覆するように保護膜44を形成する。この保護膜44には例えばエポキシ樹脂、ウレタン樹脂、金属、ガラスなどを用い、基板10を導線12と反対側の面から除去するときに導線12を保護し、かつ導線12から保護膜44を除去するときに導線12に損傷を与えない材料を用いる。なお、保護膜44は必ずしも形成せずともよい。   Next, as shown in FIG. 14, a protective film 44 is formed so as to cover the entire surface of the substrate 10 including the conductive wire 12. For example, epoxy resin, urethane resin, metal, glass or the like is used for the protective film 44, and the conductive wire 12 is protected when the substrate 10 is removed from the surface opposite to the conductive wire 12, and the protective film 44 is removed from the conductive wire 12. In this case, a material that does not damage the conductive wire 12 is used. Note that the protective film 44 is not necessarily formed.

次に図15に示すように、基板10を導線12と反対側の面から研磨などにより除去し、結像光学系で基板の縁部の先端と検体の電極との鮮明な画像が得られる程度の所定の厚さに基板10を加工する。基板10の除去加工の方法としては、例えばサンドブラスト加工、切削加工、研削加工、化学エッチング加工、ドライエッチング加工、ホーニング加工、レーザ加工などがある。なお、予め所定の厚さを有する基板10に直接導線12を形成すれば、本工程を省略することができる。   Next, as shown in FIG. 15, the substrate 10 is removed from the surface opposite to the conductor 12 by polishing or the like, and a sharp image of the tip of the edge of the substrate and the electrode of the specimen can be obtained by the imaging optical system. The substrate 10 is processed to a predetermined thickness. Examples of the method for removing the substrate 10 include sand blasting, cutting, grinding, chemical etching, dry etching, honing, and laser processing. In addition, if the conducting wire 12 is directly formed on the substrate 10 having a predetermined thickness in advance, this step can be omitted.

次に図16に示すように、保護膜44を除去する。保護膜44が金属である場合にはエッチングを用いて除去する。保護膜44が樹脂である場合には加温したN−メチルピロリドンなどによる溶解、アッシング、ドライエッチングなどを用いて除去する。保護膜44が炭酸カルシウムなどの無機物の場合には硝酸による溶解などにより除去する。   Next, as shown in FIG. 16, the protective film 44 is removed. When the protective film 44 is a metal, it is removed by etching. When the protective film 44 is a resin, the protective film 44 is removed by dissolution with warmed N-methylpyrrolidone or the like, ashing, dry etching, or the like. When the protective film 44 is an inorganic substance such as calcium carbonate, it is removed by dissolution with nitric acid.

次に図17に示すように、基板の完成形の輪郭を形成するための位置(図に示す破線)で基板10を分割し、基板10をプローブユニットに対応する部位とそれ以外の不要部位とに分離すると、図18に示すように一枚の基板10から六つのプローブユニット1を作製することができる。導線12の接触部16からの距離が互いに隣り合う接触部16の中心間距離より短く接触部16の配列方向と垂直な仮想直線上に先端18が位置する基板の縁部14を含む基板の完成形の輪郭を形成するように、基板10の分割位置を設定する。   Next, as shown in FIG. 17, the substrate 10 is divided at a position (dashed line shown in the figure) for forming a finished contour of the substrate, and the substrate 10 is divided into a portion corresponding to the probe unit and other unnecessary portions. As shown in FIG. 18, six probe units 1 can be manufactured from one substrate 10. Completion of the substrate including the edge portion 14 of the substrate where the tip 18 is located on a virtual straight line whose distance from the contact portion 16 of the conducting wire 12 is shorter than the distance between the centers of the adjacent contact portions 16 and perpendicular to the arrangement direction of the contact portions 16. The division position of the substrate 10 is set so as to form a contour of the shape.

基板10の具体的な分割方法は、まず基板10の導線12と反対側の面をガラス基板にUVテープなどで貼り付ける。次に、基板10が貼り付けられたガラス基板を切断装置にセットし、六つのプローブユニット1を構成する複数の導線12に基づいて基板10と切断装置とを位置合わせする。次に切断装置の切断砥石によって、図17に示す破線に従って基板10の導線12側からUVテープまでを切断する。切断後、UVテープから基板10を剥離して、基板10をプローブユニット1に対応する部位とそれ以外の不要部位とに分離する。他の分割方法としては、例えばサンドブラスト加工、切削加工、研削加工、化学エッチング加工、ドライエッチング加工、ホーニング加工、レーザ加工などがある。なお、保護膜44を除去する前に、基板10を分割してもよい。また、基板10に導線12を形成した後、基板の完成形の輪郭を形成するための位置に従って基板10に導線12側から切れ込みを入れ、基板10を導線12と反対側から切れ込みに至るまで研磨して薄く加工することにより、基板10をプローブユニット1に対応する部位と不要部位とに分割してもよい。   As a specific method for dividing the substrate 10, first, the surface of the substrate 10 opposite to the conductive wire 12 is attached to a glass substrate with UV tape or the like. Next, the glass substrate on which the substrate 10 is bonded is set in a cutting device, and the substrate 10 and the cutting device are aligned based on the plurality of conductive wires 12 constituting the six probe units 1. Next, from the conductive wire 12 side of the substrate 10 to the UV tape is cut according to the broken line shown in FIG. After cutting, the substrate 10 is peeled from the UV tape, and the substrate 10 is separated into a portion corresponding to the probe unit 1 and other unnecessary portions. Other division methods include, for example, sandblasting, cutting, grinding, chemical etching, dry etching, honing, and laser processing. Note that the substrate 10 may be divided before the protective film 44 is removed. In addition, after forming the conductive wire 12 on the substrate 10, the substrate 10 is cut from the conductive wire 12 side according to the position for forming the finished contour of the substrate, and the substrate 10 is polished from the opposite side to the conductive wire 12 until it is cut. Then, the substrate 10 may be divided into a part corresponding to the probe unit 1 and an unnecessary part by thinly processing.

完成したプローブユニット1には、図2に示すように、導線12の接触部16と反対側の一端にフレキシブル基板3を異方性導電膜(ACF)などを介して接合する。   As shown in FIG. 2, the flexible substrate 3 is joined to the completed probe unit 1 at one end opposite to the contact portion 16 of the conducting wire 12 through an anisotropic conductive film (ACF) or the like.

(第二実施例)
本発明によるプローブユニットの製造方法の第二実施例は、本発明によるプローブユニットの第二から第五実施例のいずれかを製造するための方法である。
図19から図24は、本発明によるプローブユニットの製造方法の第二実施例を示す図である。
(Second embodiment)
The second embodiment of the method for manufacturing a probe unit according to the present invention is a method for manufacturing any one of the second to fifth embodiments of the probe unit according to the present invention.
19 to 24 are views showing a second embodiment of the method of manufacturing the probe unit according to the present invention.

はじめに図19に示すように、基板10の六つの完成形の輪郭を形成するための凹部40を基板10の一面に基板10の最終的な厚さより深く形成する。凹部40の形成方法としては、例えばフライス加工などの機械加工や、レジストパターンを用いたドライエッチング加工、サンドブラスト加工、イオンミリングなどがある。基板10の完成形の輪郭には、基板の縁部に形成される切り欠き部又は貫通孔の輪郭が含まれる。レジストパターン形状の調整などにより凹部40を任意の形状にすることができるので、必要に応じて切り欠き部の輪郭を形成するための凹部40、又は貫通孔の輪郭を形成するための凹部40を形成することができる。図には本発明によるプローブユニットの第二実施例の輪郭を示している。なお、凹部40は基板10の完成形の輪郭の少なくとも一部を形成するための形状に形成すればよく、基板10の表面を横断するような形状にしてもよい。   First, as shown in FIG. 19, recesses 40 for forming the six completed contours of the substrate 10 are formed on one surface of the substrate 10 deeper than the final thickness of the substrate 10. Examples of the method for forming the recess 40 include mechanical processing such as milling, dry etching processing using a resist pattern, sand blast processing, and ion milling. The contour of the completed shape of the substrate 10 includes the contour of the notch or the through hole formed at the edge of the substrate. Since the concave portion 40 can be formed into an arbitrary shape by adjusting the resist pattern shape or the like, the concave portion 40 for forming the contour of the notch portion or the concave portion 40 for forming the contour of the through hole as necessary. Can be formed. The figure shows the outline of a second embodiment of the probe unit according to the present invention. The concave portion 40 may be formed in a shape for forming at least a part of the contour of the completed shape of the substrate 10, or may be formed so as to cross the surface of the substrate 10.

凹部40を形成する基板10の構成は第一実施例に準じる。基板10にセラミック板を用いる場合、基板10を焼成する以前に凹部40を加工してもよい。基板10に金属板を用いる場合、予め凹部40が形成された基板10を成形するための鋳型を作製し、その鋳型を用いた鋳造により凹部40を形成してもよい。基板10にシリコン板を用いる場合、異方性エッチングにより凹部40を形成してもよい。   The configuration of the substrate 10 on which the recess 40 is formed conforms to the first embodiment. When a ceramic plate is used for the substrate 10, the recess 40 may be processed before the substrate 10 is fired. When a metal plate is used for the substrate 10, a mold for molding the substrate 10 in which the recess 40 is formed in advance may be produced, and the recess 40 may be formed by casting using the mold. When a silicon plate is used for the substrate 10, the recess 40 may be formed by anisotropic etching.

次に図20に示すように、基板10の六つの完成形に対応する部位上に、複数の導線12を形成する。導線12の具体的な形成方法は第一実施例に準じる。なお、基板10に凹部40を形成する前に導線12を形成した後、基板10に凹部40を形成してもよい。   Next, as shown in FIG. 20, a plurality of conductive wires 12 are formed on portions corresponding to the six completed forms of the substrate 10. A specific method of forming the conducting wire 12 is the same as that of the first embodiment. Note that the recess 40 may be formed in the substrate 10 after the conductor 12 is formed before the recess 40 is formed in the substrate 10.

次に図21に示すように、第一実施例に準じて、導線12を含む基板10の表面全体を被覆するように保護膜44を形成する。このとき、凹部40内が保護膜44で埋められる。
次に図22に示すように、基板10を導線12と反対側の面から研磨などにより除去し、保護膜44に至るまで基板10を所定の厚さに加工する。この加工により、凹部40は基板10を貫通する貫通部となる。この貫通部の形成により、基板10は六つの完成形に対応する部位11とそれ以外の不要部位13とに分けられつつ、完成形に対応する部位11及び不要部位13同士が保護膜44により連結され分離しない状態になる。基板10の具体的な除去加工の方法は、第一実施例に準じる。
Next, as shown in FIG. 21, according to the first embodiment, a protective film 44 is formed so as to cover the entire surface of the substrate 10 including the conductive wire 12. At this time, the recess 40 is filled with the protective film 44.
Next, as shown in FIG. 22, the substrate 10 is removed from the surface opposite to the conductor 12 by polishing or the like, and the substrate 10 is processed to a predetermined thickness until reaching the protective film 44. By this processing, the recess 40 becomes a penetrating portion that penetrates the substrate 10. By forming the through portion, the substrate 10 is divided into six parts 11 corresponding to the completed form and other unnecessary parts 13, and the part 11 corresponding to the completed form and the unnecessary part 13 are connected by the protective film 44. And will not be separated. The specific method for removing the substrate 10 is in accordance with the first embodiment.

次に図23に示すように、第一実施例に準じて保護膜44を除去する。本実施例では、基板10から保護膜44を除去すると、基板10の不要部位13から六つの完成形に対応する部位11が分離する。基板10の不要部位13から六つの完成形に対応する部位11が分離すると、図24に示すように、基板の縁部14に切り欠き部24が形成されている基板10上に複数の導線12が配列されているプローブユニット1が完成する。   Next, as shown in FIG. 23, the protective film 44 is removed according to the first embodiment. In this embodiment, when the protective film 44 is removed from the substrate 10, the portions 11 corresponding to the six completed shapes are separated from the unnecessary portion 13 of the substrate 10. When the portions 11 corresponding to the six completed shapes are separated from the unnecessary portion 13 of the substrate 10, as shown in FIG. 24, the plurality of conductive wires 12 are formed on the substrate 10 in which the notches 24 are formed in the edge portion 14 of the substrate. The probe unit 1 in which is arranged is completed.

なお、上述の第一実施例による製造方法を行った後、基板の縁部に切り欠き部又は貫通孔を形成すれば、本実施例で製造されるプローブユニット1と同様なプローブユニットを製造することができる。   In addition, after performing the manufacturing method by the above-mentioned 1st Example, if a notch part or a through-hole is formed in the edge part of a board | substrate, the probe unit similar to the probe unit 1 manufactured by a present Example will be manufactured. be able to.

(第三実施例)
本発明によるプローブユニットの製造方法の第三実施例は、本発明によるプローブユニットの第六から第九実施例を製造するための方法である。
図25は、本発明によるプローブユニットの製造方法の第三実施例を示す正面図である。
(Third embodiment)
The third embodiment of the probe unit manufacturing method according to the present invention is a method for manufacturing the sixth to ninth embodiments of the probe unit according to the present invention.
FIG. 25 is a front view showing a third embodiment of the probe unit manufacturing method according to the present invention.

はじめに、第一実施例の製造方法に準じて、一枚の基板10から複数のプローブユニットを作製する。
次に図25に示すように、基板の縁部14の導線12と反対側から砥石38を用いて基板の縁部14の一部を除去し、基板の縁部14を所定の形状に加工する。具体的にはまず、プローブユニット1の導線12側をUVテープによってガラス基板に貼り付け、そのガラス基板を切断装置にセットし、基板の縁部14の導線12と反対側の一部を切断装置に設けられた砥石38によって除去する。このとき図25(A)、(C)に示すように、先端ほど細くなるように傾斜している砥石38を用いれば、先端18に向かうほど基板10が薄くなるように傾斜した傾斜面が基板の縁部14に形成される。図25(B)に示すように、先端に凸面を有する砥石38を用いれば、先端18に向かうほど基板10が薄くなるように傾斜した凹面32が基板の縁部14に形成される。図25(C)に示すように、角柱状の砥石38を用いれば、先端18側を薄くする段差面34が基板の縁部14に形成される。
First, a plurality of probe units are produced from one substrate 10 according to the manufacturing method of the first embodiment.
Next, as shown in FIG. 25, a part of the edge 14 of the substrate is removed from the opposite side of the edge 14 of the substrate from the conductive wire 12 by using a grindstone 38, and the edge 14 of the substrate is processed into a predetermined shape. . Specifically, first, the conducting wire 12 side of the probe unit 1 is attached to a glass substrate with UV tape, the glass substrate is set in a cutting device, and a part of the edge 14 of the substrate opposite to the conducting wire 12 is cut off. It removes with the grindstone 38 provided in. At this time, as shown in FIGS. 25A and 25C, if a grindstone 38 that is inclined so as to become thinner toward the tip is used, an inclined surface that is inclined so that the substrate 10 becomes thinner toward the tip 18 is formed. Formed on the edge 14 of the. As shown in FIG. 25B, when a grindstone 38 having a convex surface at the tip is used, a concave surface 32 that is inclined so that the substrate 10 becomes thinner toward the tip 18 is formed on the edge 14 of the substrate. As shown in FIG. 25C, when a prismatic grindstone 38 is used, a stepped surface 34 that thins the tip 18 side is formed on the edge 14 of the substrate.

なお、本実施例によって得られたプローブユニット1にさらに切り欠き又は貫通孔を形成してもよい。   Note that a notch or a through hole may be further formed in the probe unit 1 obtained in this embodiment.

(A)は本発明によるプローブユニットの第一実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 1st Example of the probe unit by this invention, (B) is the front view. (A)は本発明の第一実施例によるプローブユニットを用いた導通試験方法を示す平面図であり、(B)はその側面図である。(A) is a top view which shows the continuity test method using the probe unit by 1st Example of this invention, (B) is the side view. (A)は本発明によるプローブユニットの第二実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 2nd Example of the probe unit by this invention, (B) is the front view. (A)は本発明によるプローブユニットの第三実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 3rd Example of the probe unit by this invention, (B) is the front view. (A)は本発明によるプローブユニットの第四実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 4th Example of the probe unit by this invention, (B) is the front view. (A)は本発明によるプローブユニットの第五実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 5th Example of the probe unit by this invention, (B) is the front view. (A)は本発明によるプローブユニットの第六実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 6th Example of the probe unit by this invention, (B) is the front view. 本発明によるプローブユニットの第七及び第八実施例を示す正面図である。It is a front view which shows the 7th and 8th Example of the probe unit by this invention. (A)は本発明によるプローブユニットの第九実施例を示す平面図であり、(B)はその正面図である。(A) is a top view which shows the 9th Example of the probe unit by this invention, (B) is the front view. 本発明による導通試験方法の第一実施例を示す模式図である。It is a schematic diagram which shows the 1st Example of the continuity test method by this invention. (A)は本発明による導通試験方法の第二実施例を示す平面図であり、(B)はその側面図である。(A) is a top view which shows the 2nd Example of the continuity test method by this invention, (B) is the side view. 本発明による導通試験方法の第三実施例を示す側面図である。It is a side view which shows the 3rd Example of the continuity test method by this invention. (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第一実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 1st Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). (A)は本発明によるプローブユニットの製造方法の第二実施例を示す平面図であり、(B)は(A)のc−c線断面図である。(A) is a top view which shows the 2nd Example of the manufacturing method of the probe unit by this invention, (B) is the cc sectional view taken on the line of (A). 本発明によるプローブユニットの製造方法の第三実施例を示す正面図である。It is a front view which shows the 3rd Example of the manufacturing method of the probe unit by this invention.

符号の説明Explanation of symbols

1 プローブユニット、6 検体、10 基板、12 導線、14 基板の縁部、16 接触部、18 先端、60 電極、a 接触部から基板の縁部の先端までの距離、b 接触部から基板の縁部の先端までの距離、d 接触部の中心間距離   1 probe unit, 6 specimens, 10 substrate, 12 conductor, 14 substrate edge, 16 contact portion, 18 tip, 60 electrodes, a distance from contact portion to tip of substrate edge, b contact portion to substrate edge The distance to the tip of the part, d The distance between the centers of the contact parts

Claims (5)

結像光学系を用いて検体と位置合わせされるプローブユニットであって、
基板と、
前記基板上に形成される複数の導線と、
前記導線のそれぞれに形成され前記基板上に位置し前記検体の電極に接触する接触部と、
互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端の厚さが前記結像光学系の被写界深度以内の前記基板の縁部と、
を備えることを特徴とするプローブユニット。
A probe unit that is aligned with a specimen using an imaging optical system,
A substrate,
A plurality of conductive wires formed on the substrate;
A contact portion formed on each of the conductive wires and positioned on the substrate and in contact with the electrode of the specimen;
The tip is located on an imaginary straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions, and the thickness of the tip is the imaging optical system The edge of the substrate within a depth of field of
A probe unit comprising:
基板と、
前記基板上に形成される複数の導線と、
前記導線のそれぞれに形成され前記基板上に位置し検体の電極に接触する接触部と、
互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端に向かって薄くなるように前記導線と反対側の面が傾斜している前記基板の縁部と、
を備えることを特徴とするプローブユニット。
A substrate,
A plurality of conductive wires formed on the substrate;
A contact portion formed on each of the conductive wires and positioned on the substrate and in contact with the electrode of the specimen;
The lead wire is arranged such that the tip is located on a virtual straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions, and becomes thinner toward the tip. An edge of the substrate having an inclined surface opposite to the substrate;
A probe unit comprising:
基板と、
前記基板上に形成される複数の導線と、
前記導線のそれぞれに形成され前記基板上に位置し検体の電極に接触する接触部と、
互いに隣り合う前記接触部の中心間距離より前記接触部からの距離が短く前記複数の接触部の配列方向と垂直な仮想直線上に先端が位置し、前記先端側が薄くなる段差が前記導線と反対側の面に形成されている前記基板の縁部と、
を備えることを特徴とするプローブユニット。
A substrate,
A plurality of conductive wires formed on the substrate;
A contact portion formed on each of the conductive wires and positioned on the substrate and in contact with the electrode of the specimen;
The tip is located on an imaginary straight line that is shorter than the distance between the centers of the contact portions adjacent to each other and is perpendicular to the arrangement direction of the plurality of contact portions, and the step where the tip side is thinner is opposite to the conductor. An edge of the substrate formed on the side surface;
A probe unit comprising:
基板と導線を有するプローブユニットで検体の導通を検査する導通検査方法であって、
前記基板の縁部の先端と前記検体の電極とを観察しながら位置合わせすることによって前記導線と前記電極とを位置合わせする段階を含むことを特徴とする導通検査方法。
A continuity test method for testing continuity of a specimen with a probe unit having a substrate and a conductor,
A continuity testing method comprising the step of aligning the conductive wire and the electrode by aligning the tip of the edge of the substrate and the electrode of the specimen while observing them.
結像光学系の視野内の被写界深度内に前記基板の縁部の先端と前記電極とを同時に収めて前記基板の縁部の先端と前記検体の電極とを観察することを特徴とする請求項4に記載の導通検査方法。



The tip of the edge of the substrate and the electrode are simultaneously accommodated within the depth of field within the field of view of the imaging optical system, and the tip of the edge of the substrate and the electrode of the specimen are observed. The continuity inspection method according to claim 4.



JP2005085647A 2005-03-24 2005-03-24 Probe unit and continuity test method Pending JP2006266883A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102879926A (en) * 2012-09-19 2013-01-16 深圳市华星光电技术有限公司 Type setting structure for sharing jig by two display panels and method of type setting structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102879926A (en) * 2012-09-19 2013-01-16 深圳市华星光电技术有限公司 Type setting structure for sharing jig by two display panels and method of type setting structure
CN102879926B (en) * 2012-09-19 2014-12-10 深圳市华星光电技术有限公司 Type setting structure for sharing jig by two display panels and method of type setting structure

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