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JP2005158132A - Magnetic head cleaning method and magnetic head using the same - Google Patents

Magnetic head cleaning method and magnetic head using the same Download PDF

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JP2005158132A
JP2005158132A JP2003393603A JP2003393603A JP2005158132A JP 2005158132 A JP2005158132 A JP 2005158132A JP 2003393603 A JP2003393603 A JP 2003393603A JP 2003393603 A JP2003393603 A JP 2003393603A JP 2005158132 A JP2005158132 A JP 2005158132A
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cleaning
magnetic head
magnetic core
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magnetic
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Tetsuya Kamimoto
徹也 紙本
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Abstract

【課題】磁気ヘッドの製造方法において、磁気ヘッドの磁気特性を劣化させない洗浄液を使用して、清浄度の高い高品質な磁気ヘッドが得ることができる洗浄、乾燥方法を提供する。
【解決手段】洗い工程に準水系洗浄剤を使用し、すすぎ工程に純水を使用し、基本周波数に変調周波数のスイープを掛け、さらに数種類の周波の超音波を用い振動を与え、洗浄、すすぎを施し、被洗浄物を高速回転させることで乾燥させることを特徴とする磁気ヘッドの洗浄、乾燥方法。
【選択図】図1
In a method for manufacturing a magnetic head, there is provided a cleaning and drying method capable of obtaining a high-quality magnetic head with high cleanliness by using a cleaning liquid that does not deteriorate the magnetic characteristics of the magnetic head.
SOLUTION: Using a semi-aqueous cleaning agent in the washing process, using pure water in the rinsing process, applying a sweep of the modulation frequency to the fundamental frequency, and further applying vibration using ultrasonic waves of several kinds of frequencies, washing and rinsing And drying the magnetic head by rotating the object to be cleaned at a high speed.
[Selection] Figure 1

Description

本発明は、磁気記録媒体に対する多量の磁気情報の記録・再生に適した磁気ヘッド及び製造方法に関するものであり、さらにこのような磁気ヘッド製造時における磁気ヘッド部材の加工工程で用いられる固定用ワックス、研削剤、切削剤及び加工工程にて発生する加工残渣を加工後洗浄除去するための、洗浄方法に関するものである。   The present invention relates to a magnetic head suitable for recording / reproducing a large amount of magnetic information on a magnetic recording medium and a manufacturing method thereof, and further, a fixing wax used in a process of processing a magnetic head member in manufacturing such a magnetic head. The present invention relates to a cleaning method for cleaning and removing grinding residues, cutting agents and processing residues generated in processing steps after processing.

磁気ヘッドの製造方法は、一対の磁気コア半体に巻線溝を形成し、さらにトラック幅を規定するトラック溝を形成する。次にギャップ対向面を研磨、必要に応じて磁性材等を形成し、その上にギャップ材をスパッタリングで形成する。そして一対の磁気コア半体をギャップ面で突き合わせ、磁気コア半体をギャップで接合し、一つの磁気コアブロックを作製する。その後、所定の厚みになるように磁気コアブロックを切断してヘッドチップを作製し、ベース接着・巻線等の処理を行い、磁気ヘッドが完成する。このように小さな磁気コア半体あるいは磁気コアブロックを高精度に加工するためには、治具にワックスで貼り付けて取扱うのが一般的である。したがって、少なくとも基板からの切り出し後、磁気コア半体、磁気コアブロックを治具から剥離し、磁気コア半体、磁気コアブロックに付着したワックス、研削剤、切削剤及び加工中に付着した加工残渣を除去する必要がある。   In the method of manufacturing a magnetic head, a winding groove is formed in a pair of magnetic core halves, and a track groove that defines a track width is further formed. Next, the gap facing surface is polished, a magnetic material or the like is formed as necessary, and a gap material is formed thereon by sputtering. Then, the pair of magnetic core halves are butted together at the gap surface, and the magnetic core halves are joined at the gap to produce one magnetic core block. Thereafter, the magnetic core block is cut to a predetermined thickness to produce a head chip, and processing such as base bonding and winding is performed to complete the magnetic head. In order to process such a small magnetic core half or magnetic core block with high accuracy, it is generally handled by attaching it to a jig with wax. Therefore, at least after cutting out from the substrate, the magnetic core half and the magnetic core block are peeled off from the jig, and the magnetic core half, the wax attached to the magnetic core block, the abrasive, the cutting agent, and the processing residue attached during processing Need to be removed.

前記洗浄方法の従来技術として、ワックスの除去方法として、塩化メチレン、トリクロロエチレン、トリクロロエタン等の塩素化炭化水素系有機溶媒の加熱または、超音波洗浄を行い、次いで、冷浴浸漬、最後に蒸気乾燥し仕上げる方法がとられている。また研削剤、切削剤及び加工中に付着した加工残渣除去法として、水溶性洗剤による超音波洗浄を行った後純水による超音波洗浄を行い、純水リンスし、イソプロピルアルコールによる超音波洗浄後、イソプロピルアルコールに浸漬し、イソプロピルアルコールで蒸気乾燥し仕上げるような磁気ヘッドの洗浄方法となっていた(例えば特許文献1参照。)。
特許第3171408号公報
As a conventional technique of the above-mentioned cleaning method, as a method for removing the wax, heating of a chlorinated hydrocarbon organic solvent such as methylene chloride, trichloroethylene, trichloroethane or ultrasonic cleaning is performed, followed by immersion in a cold bath and finally steam drying. The finishing method is taken. In addition, as a method of removing grinding agent, cutting agent and processing residue adhered during processing, after ultrasonic cleaning with water-soluble detergent, ultrasonic cleaning with pure water, rinsing with pure water, and ultrasonic cleaning with isopropyl alcohol The magnetic head was cleaned by dipping in isopropyl alcohol and steam-dried with isopropyl alcohol (see, for example, Patent Document 1).
Japanese Patent No. 3171408

しかしながら上記のような従来の磁気ヘッド洗浄方法では、ワックス除去洗浄及び蒸気乾燥に使用する塩素炭化水素系有機溶媒及び研削剤、切削剤、加工残渣除去洗浄に使用する水溶性洗剤は、磁気ヘッドの磁気特性に悪影響を及ぼす可能性が高く、磁気ヘッドとしての品質が低下してしまう。   However, in the conventional magnetic head cleaning method as described above, the chlorinated hydrocarbon organic solvent used for the wax removal cleaning and the steam drying, the abrasive, the cutting agent, and the water-soluble detergent used for the processing residue removal cleaning are used for the magnetic head. The possibility of adversely affecting the magnetic characteristics is high, and the quality of the magnetic head is deteriorated.

本発明は上記従来の問題点を解決するもので、磁気ヘッドの磁気特性を劣化させない洗浄液を使用して清浄度の高い高品質な磁気ヘッドが得られる磁気ヘッドの洗浄方法を提供することを目的とする。   SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems, and to provide a magnetic head cleaning method capable of obtaining a high-quality magnetic head with high cleanliness using a cleaning liquid that does not deteriorate the magnetic characteristics of the magnetic head. And

この目的を達成するために本発明の洗浄方法は、被洗浄物を洗浄液に浸漬し、超音波洗浄を行う粗洗浄1工程及び粗洗浄2工程と、被洗浄物を洗浄液に浸漬し、超音波にて、被洗浄物に付着する洗浄液を除去するすすぎ工程と、被洗浄物を洗浄液に浸漬し、超音波にて、被洗浄物に付着している残渣をさらに洗浄する仕上洗浄工程と、被洗浄物を乾燥する工程を備えている工程において、粗洗浄1工程が、非イオン界面活性剤を成分とした水系洗浄剤を使用し、粗洗浄2工程が、脂肪族炭化水素と非イオン界面活性剤を成分とした準水系洗浄剤を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、すすぎ工程が、0.1MΩ・cm以上の純水を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、仕上洗浄工程が、15MΩ・cm以上でかつ溶存酸素量1ppm以下の純水を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、乾燥工程が、被洗浄物を高速回転させる構成を有している。   In order to achieve this object, the cleaning method of the present invention includes a rough cleaning 1 step and a rough cleaning 2 step in which an object to be cleaned is immersed in a cleaning liquid and ultrasonic cleaning, and an object to be cleaned is immersed in a cleaning liquid. The rinsing process for removing the cleaning liquid adhering to the object to be cleaned, the finish cleaning process for immersing the object to be cleaned in the cleaning liquid, and further cleaning the residue adhering to the object to be cleaned with ultrasonic waves, In the process that includes the process of drying the washed product, one coarse cleaning process uses an aqueous cleaning agent containing a nonionic surfactant as a component, and two coarse cleaning processes consist of aliphatic hydrocarbons and nonionic surfactants. In the ultrasonic, in the ultrasonic, the modulation frequency is swept to the modulation frequency, the frequency is continuously fluctuated with a certain width, and vibrations of several kinds of frequencies are given simultaneously or sequentially, Rinsing process is 0.1MΩ · cm Using the above pure water, in ultrasonic, the fundamental frequency is swept by the modulation frequency, the frequency is continuously changed with a certain width, and vibrations of several kinds of frequencies are given simultaneously or sequentially, Using pure water of 15 MΩ · cm or more and dissolved oxygen content of 1 ppm or less, in ultrasonic, the fundamental frequency is swept by the modulation frequency, the frequency is continuously fluctuated by a certain width, and several types of frequency are simultaneously or sequentially The drying process has a configuration in which the object to be cleaned is rotated at a high speed.

この構成により、磁気ヘッドの磁気特性を劣化させない洗浄液を使用して清浄度の高い高品質な磁気ヘッドが得られる。また、さらに清浄度の高い洗浄とする手段を説明する。
また、洗浄工程及びすすぎ工程において、超音波を与える場合、被洗浄物洗浄面を超音波放射方向に対して45°を限界として傾ける構成とすることより、清浄度を大幅に向上させることが可能となる。
With this configuration, a high-quality magnetic head with high cleanliness can be obtained using a cleaning liquid that does not deteriorate the magnetic characteristics of the magnetic head. Further, a means for cleaning with higher cleanliness will be described.
In addition, when applying ultrasonic waves in the cleaning process and the rinsing process, it is possible to greatly improve the cleanliness by adopting a configuration in which the cleaning surface of the object to be cleaned is inclined at 45 ° with respect to the ultrasonic radiation direction. It becomes.

本発明は、磁気ヘッドの磁気特性を劣化させない洗浄液を使用して清浄度の高い高品質な磁気ヘッドが得ることができるという優れた効果が得られる。   The present invention provides an excellent effect that a high-quality magnetic head with high cleanliness can be obtained by using a cleaning liquid that does not deteriorate the magnetic characteristics of the magnetic head.

本発明は、被洗浄物を洗浄液に浸漬し、超音波洗浄を行う粗洗浄1工程及び粗洗浄2工程と、被洗浄物を洗浄液に浸漬し、超音波にて、被洗浄物に付着する洗浄液を除去するすすぎ工程と、被洗浄物を洗浄液に浸漬し、超音波にて、被洗浄物に付着している残渣をさらに洗浄する仕上洗浄工程と、被洗浄物を乾燥する工程を備えている工程において、粗洗浄1工程が、非イオン界面活性剤を成分とした水系洗浄剤を使用し、粗洗浄2工程が、脂肪族炭化水素と非イオン界面活性剤を成分とした準水系洗浄剤を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、洗浄物に付着している汚れの脱離を促進し、すすぎ工程が、0.1MΩ・cm以上の純水を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、洗浄物に付着している汚れの脱離を促進し、再付着汚れを除去、洗浄剤を除去し、仕上洗浄工程が、15MΩ・cm以上でかつ溶存酸素量1ppm以下の純水を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、洗浄物に残留している汚れを除去し、乾燥工程が、被洗浄物にクリーンエアーを吹き付けることにより高速回転させることによってなされていることしたものであり、磁気ヘッドの磁気特性を劣化させない洗浄液を使用して清浄度の高い高品質な磁気ヘッドが得られるという作用を有する。   The present invention includes a rough cleaning 1 step and a rough cleaning 2 step in which an object to be cleaned is immersed in a cleaning liquid and ultrasonic cleaning, and a cleaning liquid in which the object to be cleaned is immersed in the cleaning liquid and adhered to the object to be cleaned with ultrasonic waves. A rinsing process for removing the object, a finish cleaning process for immersing the object to be cleaned in a cleaning liquid, and further cleaning the residue adhering to the object to be cleaned with an ultrasonic wave, and a process for drying the object to be cleaned In the process, the coarse cleaning 1 step uses an aqueous detergent containing a nonionic surfactant as a component, and the coarse washing 2 step uses a semi-aqueous detergent containing an aliphatic hydrocarbon and a nonionic surfactant as components. When using ultrasonic waves, sweep the modulation frequency to the fundamental frequency, continuously fluctuate the frequency with a constant width, and give vibrations of several types of frequencies simultaneously or sequentially to remove dirt adhering to the cleaning object. The rinsing process is 0.1MΩ Using pure water of cm or more, in ultrasonic waves, apply a sweep of the modulation frequency to the fundamental frequency, continuously fluctuate the frequency with a certain width, and give vibrations of several kinds of frequencies simultaneously or sequentially, and adhere to the cleaning object The removal of dirt is promoted, the reattachment dirt is removed, the cleaning agent is removed, and the final cleaning process uses pure water with 15 MΩ · cm or more and dissolved oxygen content of 1 ppm or less. Applying a sweep of the modulation frequency to the fundamental frequency, continuously changing the frequency with a certain width, and simultaneously giving vibrations of several kinds of frequencies simultaneously or sequentially, removing dirt remaining on the cleaning object, and the drying process This is done by rotating the cleaning object at high speed by blowing clean air, and using a cleaning solution that does not deteriorate the magnetic characteristics of the magnetic head, An effect that the quality of the magnetic head is obtained.

以下、本発明の実施の形態について、図1から図3を用いて説明するが、本発明はこれらの実施例に限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 3, but the present invention is not limited to these examples.

(実施の形態1)
まず、ここで洗浄する磁気コア半体について説明する。図2は本発明の磁気コア半体の状態を説明した図である。図2で示すように、加工が完了した治具3にワックス4で接着された磁気コア半体2を加熱し、ワックスを軟化させ、治具3より剥離する。このとき、磁気コア半体2には、ワックス4とそれ以前の加工によって使用した研削剤、切削剤及び付着した加工残渣が表面に付着している。
(Embodiment 1)
First, the magnetic core half to be cleaned here will be described. FIG. 2 is a diagram illustrating the state of the magnetic core half according to the present invention. As shown in FIG. 2, the magnetic core half 2 bonded with the wax 4 to the jig 3 that has been processed is heated to soften the wax and peel from the jig 3. At this time, the magnetic core half 2 has the wax 4 and the abrasive, cutting agent, and attached processing residue used in previous processing attached to the surface.

次に、剥離した磁気コア半体の洗浄方法について説明する。図1は本発明の洗浄方法の概略図であり、また、表1は各工程における洗浄方法と使用する洗浄剤の一覧である。   Next, a method for cleaning the peeled magnetic core half will be described. FIG. 1 is a schematic view of the cleaning method of the present invention, and Table 1 is a list of cleaning methods and cleaning agents used in each step.

Figure 2005158132
Figure 2005158132

図1において、10は粗洗浄1工程、20は粗洗浄2工程、30はすすぎ工程、40は仕上洗浄工程、50は乾燥工程を模式的に示し、磁気ヘッドの製造工程において数回行う洗浄工程全てに本実施の形態の洗浄方法を用いてもよいし、そのうち少なくとも1回の洗浄工程に本実施の形態の洗浄方法を用いてもよい。   In FIG. 1, 10 is a rough cleaning process, 20 is a rough cleaning process, 30 is a rinsing process, 40 is a finish cleaning process, and 50 is a drying process. The cleaning process is performed several times in the magnetic head manufacturing process. The cleaning method of the present embodiment may be used for all, or the cleaning method of the present embodiment may be used for at least one cleaning step.

1は本実施の形態の洗浄方法で洗浄される被洗浄物で、図2の構成においては磁気コア半体2に相当する。各工程において使用する器具として11は粗洗浄1工程10において被洗浄物1を洗浄する洗浄槽、21は粗洗浄工程10後の粗洗浄2工程20において被洗浄物1を洗浄する洗浄槽、31は洗浄工程20後のすすぎ工程30において被洗浄物1を濯ぐすすぎ槽、41はすすぎ工程30後の仕上洗浄工程40において被洗浄物1を仕上洗浄する洗浄槽、51は仕上洗浄工程40後の乾燥工程50において被洗浄物を乾燥させる乾燥槽、13、23、43及び33は洗浄槽11、12、41及びすすぎ槽31内に充填してある洗浄剤で、使用する洗剤は表1に示した。12、22、42、32は洗浄槽11、21,41及びすすぎ槽31に超音波振動を与え洗浄剤13、23、43及び33を振動させる超音波振動部、53は乾燥槽51内に充填された不純物や塵などを含まないクリーンエアーである。   Reference numeral 1 denotes an object to be cleaned by the cleaning method of the present embodiment, which corresponds to the magnetic core half 2 in the configuration of FIG. As a tool used in each process, 11 is a cleaning tank for cleaning the object to be cleaned 1 in the rough cleaning 1 process 10, 21 is a cleaning tank for cleaning the object to be cleaned 1 in the rough cleaning 2 process 20 after the rough cleaning process 10, 31 Is a rinsing tank for rinsing the object to be cleaned 1 in the rinsing process 30 after the cleaning process 20, 41 is a cleaning tank for finishing and cleaning the object 1 in the finishing cleaning process 40 after the rinsing process 30, and 51 is after the finishing cleaning process 40. The drying tanks for drying the objects to be cleaned in the drying step 50, 13, 23, 43 and 33 are cleaning agents filled in the cleaning tanks 11, 12, 41 and the rinsing tank 31, and the detergents used are shown in Table 1. Indicated. 12, 22, 42, and 32 are ultrasonic vibration units that vibrate the cleaning agents 13, 23, 43, and 33 by applying ultrasonic vibrations to the cleaning tanks 11, 21, 41 and the rinsing tank 31, and 53 is filled in the drying tank 51. Clean air that does not contain impurities and dust.

以上のように構成された本実施の形態の磁気ヘッドの洗浄方法について、以下その動作について説明する。まず、粗洗浄1工程10について説明する。磁気コア半体2などの被洗浄物1を、洗浄槽11内の洗浄剤13に浸す。次に超音波振動部12を作動させて洗浄槽11に振動を与え、洗浄剤13に振動を与えて被洗浄物1を洗浄する。洗浄剤13は水系洗剤で、好ましくは成分が非イオン界面活性剤と有機アミンと水で構成される。超音波振動部12は基本周波数に変調周波数のスイープを掛け、定在波の発生を防止し、洗浄力のムラを無くし、対象とする汚れの大きさにより、超音波により液中に発生するキャビテーションの大きさを選択し、基本周波数を数種類同時に発振する、例えば汚れの大きさが2000nm〜3000nmの場合は20kHz〜35kHz、1000nm〜2000nmの場合は36kHz〜60kHz、500nm〜1000nmの場合は61kHz〜90kHz、100nm〜500nmの場合は91kHz〜150kHzとするのが好ましい。この振動により被洗浄物1である磁気コア半体2のコアブロックに付着している、研削剤、切削剤や加工によって付着した加工残渣分の脱離を促進する。   The operation of the magnetic head cleaning method of the present embodiment configured as described above will be described below. First, the rough cleaning 1 step 10 will be described. The object to be cleaned 1 such as the magnetic core half 2 is immersed in the cleaning agent 13 in the cleaning tank 11. Next, the ultrasonic vibration unit 12 is operated to vibrate the cleaning tank 11, and the cleaning agent 13 is vibrated to clean the article 1 to be cleaned. The cleaning agent 13 is an aqueous detergent, and the components are preferably composed of a nonionic surfactant, an organic amine, and water. The ultrasonic vibration unit 12 applies a sweep of the modulation frequency to the fundamental frequency, prevents the occurrence of standing waves, eliminates unevenness in cleaning power, and causes cavitation generated in the liquid by ultrasonic waves depending on the size of the target dirt. For example, 20 kHz to 35 kHz when the size of the dirt is 2000 nm to 3000 nm, 36 kHz to 60 kHz when 1000 nm to 2000 nm, and 61 kHz to 90 kHz when 500 nm to 1000 nm is selected. In the case of 100 nm to 500 nm, it is preferably 91 kHz to 150 kHz. This vibration promotes detachment of a grinding residue, a cutting agent, and a processing residue attached by processing, which are attached to the core block of the magnetic core half 2 that is the object to be cleaned 1.

次に粗洗浄2工程20について説明する。粗洗浄1工程10により洗浄が完了した被洗浄物1を、洗浄槽21内の洗浄剤13に浸す。次に超音波振動部22を作動させて洗浄槽21に振動を与え、洗浄剤23に振動を与えて被洗浄物1を洗浄する。洗浄剤23は準水系洗剤で、好ましくは成分が脂肪族炭化水素(主成分)と非イオン界面活性剤で構成される。超音波振動部22は、粗洗浄1工程10と同様な考え方で、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時に数種類の周波の振動を与え、被洗浄物1である磁気コア半体2のコアブロックに付着している、ワックスや加工によって付着した加工残渣分の脱離を促進する。   Next, the rough cleaning 2 step 20 will be described. The object to be cleaned 1 that has been cleaned in the rough cleaning 1 step 10 is immersed in the cleaning agent 13 in the cleaning tank 21. Next, the ultrasonic vibration part 22 is operated to vibrate the cleaning tank 21, and the cleaning agent 23 is vibrated to wash the article 1 to be cleaned. The cleaning agent 23 is a semi-aqueous detergent, preferably composed of an aliphatic hydrocarbon (main component) and a nonionic surfactant. The ultrasonic vibration part 22 applies the sweep of the modulation frequency to the fundamental frequency, continuously fluctuates the frequency with a constant width, and gives vibrations of several kinds of frequencies at the same time, based on the same concept as the rough cleaning 1 step 10. It promotes the detachment of the processing residue attached to the core block of the magnetic core half 2 which is the object 1 and attached by wax or processing.

次に、すすぎ工程について説明する。粗洗浄2工程20により洗浄が完了した被洗浄物1を、すすぎ槽31の洗浄剤33に浸す。次に超音波振動部32を作動させてすすぎ槽31に振動を与え、洗浄剤33に振動を与えて被洗浄物1をすすぐ、洗浄剤33は純水で、好ましくは、0.1MΩ・cm以上の純水で構成される。超音波振動部32は、粗洗浄1工程10と同様な考え方で、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時に数種類の周波の振動を与え、洗浄物に付着している汚れの脱離を促進し、再付着汚れを除去、洗浄剤を除去する。   Next, the rinsing process will be described. The object to be cleaned 1 that has been cleaned in the rough cleaning 2 step 20 is immersed in the cleaning agent 33 in the rinsing tank 31. Next, the ultrasonic vibration unit 32 is operated to apply vibration to the rinsing tank 31 and to apply vibration to the cleaning agent 33 to rinse the article 1 to be cleaned. The cleaning agent 33 is pure water, preferably 0.1 MΩ · cm. Consists of the above pure water. The ultrasonic vibration unit 32 applies the sweep of the modulation frequency to the fundamental frequency, continuously fluctuates the frequency with a certain width, and gives vibrations of several kinds of frequencies at the same time. Accelerates the removal of dirt adhering to the surface, removes reattached dirt, and removes cleaning agents.

次に仕上洗浄工程40について説明する。すすぎ工程30によりすすぎが完了した被洗浄物1を、洗浄槽41内の洗浄剤43に浸す。次に超音波振動部42を作動させて洗浄槽41に振動を与え、洗浄剤43に振動を与えて被洗浄物1を洗浄する。洗浄剤43は純水で、好ましくは15MΩ・cm以上でかつ溶存酸素量1ppm以下で構成される。超音波振動部42は、粗洗浄1工程10と同様な考え方で、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時に数種類の周波の振動を与え、被洗浄物1である磁気コア半体2のコアブロックに付着している、粗洗浄工程では取除くことのできなかった渣分の脱離を促進する。   Next, the finish cleaning process 40 will be described. The article to be cleaned 1 that has been rinsed in the rinsing step 30 is immersed in the cleaning agent 43 in the cleaning tank 41. Next, the ultrasonic vibration unit 42 is operated to vibrate the cleaning tank 41 and the cleaning agent 43 is vibrated to clean the article 1 to be cleaned. The cleaning agent 43 is pure water, preferably 15 MΩ · cm or more and a dissolved oxygen amount of 1 ppm or less. The ultrasonic vibration unit 42 is based on the same concept as in the first step 10 of rough cleaning, applies a sweep of the modulation frequency to the fundamental frequency, continuously fluctuates the frequency with a certain width, and simultaneously gives vibrations of several types of frequencies to be cleaned. The removal of the residue attached to the core block of the magnetic core half 2 which is the object 1 and which could not be removed in the rough cleaning step is promoted.

次に、乾燥工程50について説明する。仕上洗浄工程40で仕上洗浄が完了した被洗浄物1は、乾燥槽51内にて、クリーンエアー53を吹き付けることにより、仕上洗浄工程40で付着した洗浄剤43を飛ばし乾燥させる。なお、被洗浄物1は回転台座52の上に固定され、被洗浄物1を1分当たり1000〜4000回転の高速回転させることにより、被洗浄物1に付着した洗浄剤43(純水)が、クリーンエアー53及び遠心力によって、飛ばされ、極めて短時間のうちに除去される。   Next, the drying process 50 will be described. The to-be-cleaned object 1 that has been subjected to finish cleaning in the finish cleaning step 40 is blown out of the cleaning agent 43 adhered in the finish cleaning step 40 by blowing clean air 53 in the drying tank 51 and dried. The object to be cleaned 1 is fixed on the rotating pedestal 52, and the cleaning agent 43 (pure water) adhering to the object 1 to be cleaned is rotated by rotating the object 1 to be cleaned at a high speed of 1000 to 4000 revolutions per minute. It is blown away by clean air 53 and centrifugal force, and is removed in a very short time.

以上のように本実施の形態によれば、洗浄工程10、20,40及びすすぎ工程30において従来の様な塩素炭化水素系有機溶媒を用いず、水系洗剤、準水系洗剤、純水などにより洗浄及びすすぎを行うようにしたので、磁気ヘッドの磁気特性を劣化させない高品質な磁気ヘッドが得られるものである。   As described above, according to the present embodiment, the cleaning steps 10, 20, 40 and the rinsing step 30 do not use a conventional chlorine hydrocarbon organic solvent, but are cleaned with an aqueous detergent, a semi-aqueous detergent, pure water, or the like. In addition, since rinsing is performed, a high-quality magnetic head that does not deteriorate the magnetic characteristics of the magnetic head can be obtained.

(実施の形態2)
以下、実施の形態2として、さらに清浄度の高い洗浄とする手段を説明する。
(Embodiment 2)
Hereinafter, as a second embodiment, a means for cleaning with a higher cleanliness will be described.

図3本発明の磁気コア半体と放射方向との関係を示した図である。図3で示すように、洗浄工程10、20、40及びすすぎ工程30において、超音波を与える場合、磁気コア半体2の洗浄面6を超音波放射方向5に対する角度θを種々変化させ洗浄性を評価した結果を表2に示す。   3 is a diagram showing the relationship between the magnetic core half of the present invention and the radiation direction. As shown in FIG. 3, when ultrasonic waves are applied in the cleaning steps 10, 20, and 40 and the rinsing step 30, the cleaning surface 6 of the magnetic core half 2 is changed in various angles θ with respect to the ultrasonic radiation direction 5 to perform cleaning. Table 2 shows the results of the evaluation.

Figure 2005158132
Figure 2005158132

表2で示すように角度θが0°〜45°の範囲にて、清浄度が大幅に向上している。ここで、洗浄性とは、洗浄乾燥後の被洗浄物表面の光学顕微鏡観察による残留物の有無、及び洗浄乾燥後の被洗浄物の残留油分量にて評価している。評価基準は、○:残留物無、残留油分無(検出限界以下)、△:残留物無、残留油分有、×:残留物有である。   As shown in Table 2, the cleanliness is greatly improved when the angle θ is in the range of 0 ° to 45 °. Here, the detergency is evaluated by the presence or absence of a residue by observation with an optical microscope on the surface of the object to be cleaned after cleaning and drying, and the amount of residual oil in the object to be cleaned after cleaning and drying. Evaluation criteria are: ○: no residue, no residual oil (below detection limit), Δ: no residue, residual oil, x: residual.

ここで、超音波放射方向5に対する角度θを0°〜45°とすることにより、超音波振動部から放射された、超音波(振動)が洗浄剤中を伝わり、洗浄剤液面に達し、さらに液面にて反射した超音波(振動)が被洗浄物表面に効果的に作用し洗浄性が向上すると考える。   Here, by setting the angle θ with respect to the ultrasonic radiation direction 5 to 0 ° to 45 °, the ultrasonic wave (vibration) radiated from the ultrasonic vibration part is transmitted through the cleaning agent and reaches the cleaning agent liquid surface, Furthermore, it is considered that the ultrasonic wave (vibration) reflected from the liquid surface effectively acts on the surface of the object to be cleaned and the cleaning property is improved.

また、超音波放射方向5に対する角度θを60°〜90°とすると、被洗浄物を洗浄槽(洗浄剤)に入れる際にまわりの空気等を巻き込み被洗浄物表面に残留してしまい、この残留した空気等にて、超音波振動部から放射された、超音波(振動)が遮断され、洗浄性が劣化すると考える。   Further, if the angle θ with respect to the ultrasonic radiation direction 5 is 60 ° to 90 °, the surrounding air is entrained when the object to be cleaned is put into the cleaning tank (cleaning agent) and remains on the surface of the object to be cleaned. It is considered that the ultrasonic wave (vibration) radiated from the ultrasonic vibration part is blocked by the remaining air or the like, and the detergency is deteriorated.

以上のように本実施の形態によれば、洗浄工程10、20、40及びすすぎ工程30において、被洗浄物1の角度を超音波放射方向に対して0°〜45°の範囲にすることにより、さらに清浄度の高い高品質な磁気ヘッドが得ることができる。   As described above, according to the present embodiment, in the cleaning steps 10, 20, 40 and the rinsing step 30, the angle of the object to be cleaned 1 is in the range of 0 ° to 45 ° with respect to the ultrasonic radiation direction. In addition, a high-quality magnetic head with higher cleanliness can be obtained.

なお、以上の説明では、洗浄剤23は主成分を脂肪族炭化水素としたが、洗浄剤13は主成分を非イオン界面活性剤としても同様の効果が得られる。また、粗洗浄1工程、粗洗浄2工程において、洗浄剤13、23を減圧等により脱気して、使用しても同様な効果が得られる。また、乾燥工程において、クリーンエアー53としたが、高純度窒素ガスとしても同様の効果が得られる。また、粗洗浄1工程10、粗洗浄2工程20、すすぎ工程30、仕上洗浄工程40において、洗浄槽11、21、41及びすすぎ槽31は各1槽としたが、多槽構成としても同様の効果が得られる。また、洗浄工程10、20、40すすぎ工程30において、基本周波数を数種類同時に発振するとしたが、数種類の基本周波数を順次あるいは交互に発振しても同様の効果が得られる。   In the above description, the cleaning agent 23 has an aliphatic hydrocarbon as a main component, but the cleaning agent 13 can obtain the same effect even when the main component is a nonionic surfactant. In addition, the same effect can be obtained even when the cleaning agents 13 and 23 are degassed under reduced pressure or the like in the first and second rough cleaning steps. Further, although the clean air 53 is used in the drying process, the same effect can be obtained by using high purity nitrogen gas. Further, in the rough cleaning 1 step 10, the rough cleaning 2 step 20, the rinsing step 30, and the finish cleaning step 40, each of the cleaning tanks 11, 21, 41 and the rinsing tank 31 is one tank. An effect is obtained. In the cleaning steps 10, 20, and 40, the rinsing step 30 oscillates several types of fundamental frequencies at the same time, but the same effect can be obtained by oscillating several types of fundamental frequencies sequentially or alternately.

本発明にかかる磁気ヘッドの洗浄方法、製造方法及びそれを用いた磁気ヘッドは、磁気ヘッド製造時における磁気ヘッド部材の、加工工程で用いられる固定用ワックス、研削剤、切削剤及び加工工程にて発生する加工残渣を、加工後洗浄除去するための、洗浄方法等として有用である。   A magnetic head cleaning method, a manufacturing method, and a magnetic head using the same according to the present invention include a fixing wax, an abrasive, a cutting agent, and a processing step used in a processing step of a magnetic head member at the time of manufacturing the magnetic head. It is useful as a cleaning method for removing generated processing residues by cleaning after processing.

本発明の実施の形態における洗浄方法の概略図Schematic of the cleaning method in the embodiment of the present invention 本発明の実施の形態における磁気コア半体の状態説明図State explanatory drawing of the magnetic core half in the embodiment of the present invention 本発明の実施の形態における磁気コア半体と放射方向との関係を示す図The figure which shows the relationship between the magnetic core half body and radiation | emission direction in embodiment of this invention

符号の説明Explanation of symbols

1 洗浄物
2 磁気コア半体
3 治具
4 ワックス
5 放射方向
6 洗浄面
10 粗洗浄1工程
11 洗浄槽
12 超音波振動部
13 洗浄剤
20 粗洗浄2工程
21 洗浄槽
22 超音波振動部
23 洗浄剤
30 すすぎ工程
31 すすぎ槽
32 超音波振動
33 洗浄剤
40 仕上洗浄工程
41 洗浄槽
42 超音波振動部
43 洗浄剤
50 乾燥工程
51 乾燥槽
52 高速回転座
53 クリーンエアー
DESCRIPTION OF SYMBOLS 1 Washing thing 2 Magnetic core half body 3 Jig 4 Wax 5 Radiation direction 6 Cleaning surface 10 Rough cleaning 1 process 11 Cleaning tank 12 Ultrasonic vibration part 13 Cleaning agent 20 Rough cleaning 2 process 21 Cleaning tank 22 Ultrasonic vibration part 23 Cleaning Agent 30 Rinse process 31 Rinse tank 32 Ultrasonic vibration 33 Cleaning agent 40 Finish cleaning process 41 Cleaning tank 42 Ultrasonic vibration part 43 Cleaning agent 50 Drying process 51 Drying tank 52 High-speed rotating seat 53 Clean air

Claims (5)

被洗浄物を洗浄液に浸漬し、超音波洗浄を行う洗い工程と、被洗浄物を洗浄液に浸漬し、超音波にて、被洗浄物に付着する洗浄液を除去するすすぎ工程と、すすがれた被洗浄物を乾燥する工程を備えている工程において、洗い工程が、非イオン界面活性剤を主成分とした準水系洗浄剤を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、洗浄物に付着している汚れの脱離を促進し、すすぎ工程が、5MΩ・cm以上の純水を使用し、超音波においては、基本周波数に変調周波数のスイープを掛け、周波数を一定の巾で連続変動させ、さらに同時あるいは順次数種類の周波の振動を与え、洗浄物に付着している汚れの脱離を促進し、再付着汚れを除去、洗浄剤を除去し、乾燥工程が、被洗浄物を高速回転させることによってなされていることを特徴とする磁気ヘッドの洗浄方法。 A washing process in which the object to be cleaned is immersed in the cleaning liquid and ultrasonic cleaning is performed, a rinsing process in which the object to be cleaned is immersed in the cleaning liquid and the cleaning liquid adhering to the object to be cleaned is ultrasonically removed, and a rinsed object In the process including the process of drying the washed product, the washing process uses a semi-aqueous detergent mainly composed of a nonionic surfactant, and in ultrasonic, the fundamental frequency is subjected to a sweep of the modulation frequency, The frequency is continuously varied within a certain width, and vibrations of several kinds of frequencies are applied simultaneously or sequentially to promote the removal of dirt adhering to the cleaning object, and the rinsing process uses pure water of 5 MΩ · cm or more. In the case of ultrasonic waves, the fundamental frequency is swept by the modulation frequency, the frequency is continuously fluctuated by a certain width, and vibrations of several types of frequencies are given simultaneously or sequentially to remove dirt adhering to the cleaning object. Promote Removing the fouling, the detergent is removed, the drying process is a method of cleaning a magnetic head, characterized by being made by high speed rotation of the object to be cleaned. 被洗浄物洗浄面を超音波放射方向に対して45°を限度として傾けたことを特徴とする請求項1に記載の磁気ヘッドの洗浄方法。 2. A method of cleaning a magnetic head according to claim 1, wherein the cleaning surface of the object to be cleaned is tilted with respect to the ultrasonic radiation direction with a limit of 45 [deg.]. 一対の磁気コア半体に少なくとも一方に巻線溝を形成し、トラック幅を規定するトラック溝を形成し、次にギャップ対向面を研磨し、ギャップ対向面にギャップ材を形成し、一対の磁気コア半体をギャップ面で突き合わせ、磁気コア半体をギャップで接合し、一つの磁気コアブロックを作製する磁気ヘッドの製造工程における洗浄工程に請求項1または請求項2に記載の洗浄方法を用いたことを特徴とする磁気ヘッド。 Form a winding groove on at least one of the pair of magnetic core halves, form a track groove that defines the track width, then polish the gap facing surface, form a gap material on the gap facing surface, The cleaning method according to claim 1 or 2 is used for a cleaning step in a manufacturing process of a magnetic head in which the core halves are butted at the gap surface and the magnetic core halves are joined by the gap to produce one magnetic core block. A magnetic head characterized by 一対の磁気コア半体に少なくとも一方に巻線溝を形成し、トラック幅を規定するトラック溝を形成し、次にギャップ対向面を研磨し、少なくとも一方のギャップ対向面に金属磁性材膜を形成し、その上にギャップ材を形成し、一対の磁気コア半体をギャップ面で突き合わせ、磁気コア半体をギャップで接合し、一つの磁気コアブロックを作製する磁気ヘッドの製造工程における洗浄工程に請求項1または請求項2に記載の洗浄方法を用いたことを特徴とする磁気ヘッド。 Form a winding groove on at least one of a pair of magnetic core halves, form a track groove that defines the track width, then polish the gap facing surface and form a metal magnetic material film on at least one gap facing surface In the cleaning process of the magnetic head manufacturing process, a gap material is formed thereon, a pair of magnetic core halves are butted at the gap surface, and the magnetic core halves are joined by a gap, thereby producing one magnetic core block. A magnetic head using the cleaning method according to claim 1. 一対の磁気コア半体に少なくとも一方に巻線溝を形成し、非磁性基板により金属磁性膜を挟み込んでなる一対の磁気コア半体を、ギャップ面で突き合わせ、磁気コア半体をギャップで接合し、一つの磁気コアブロックを作製する磁気ヘッドの製造工程における洗浄工程に請求項1または請求項2に記載の洗浄方法を用いたことを特徴とする磁気ヘッド。 A pair of magnetic core halves are formed with a winding groove formed in at least one of them, a pair of magnetic core halves formed by sandwiching a metal magnetic film with a non-magnetic substrate are abutted on the gap surface, and the magnetic core halves are joined with a gap. A magnetic head using the cleaning method according to claim 1 or 2 in a cleaning step in a manufacturing process of a magnetic head for producing one magnetic core block.
JP2003393603A 2003-11-25 2003-11-25 Magnetic head cleaning method and magnetic head using the same Pending JP2005158132A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102172587A (en) * 2011-03-02 2011-09-07 天津源天晟光伏设备有限公司 Method for cleaning quartz crystal product after curing and before encapsulating
CN102553855A (en) * 2011-12-31 2012-07-11 慈溪市东南复合材料有限公司 Cleaning process for air-conditioner thermostatic expansion valve air box
CN102989715A (en) * 2012-12-06 2013-03-27 中国科学院长春光学精密机械与物理研究所 Treatment method for dark ultraviolet optical film substrate
CN105583186A (en) * 2015-12-21 2016-05-18 中国科学院长春光学精密机械与物理研究所 Cleaning method for extreme ultraviolet optic substrate
CN111744879A (en) * 2020-06-24 2020-10-09 常州光晶光电科技有限公司 Piezoelectric quartz sensor white piece processing equipment and process thereof
US10854240B1 (en) 2013-02-28 2020-12-01 Seagate Technology Llc Method of cleaning magnetic head sliders

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102172587A (en) * 2011-03-02 2011-09-07 天津源天晟光伏设备有限公司 Method for cleaning quartz crystal product after curing and before encapsulating
CN102553855A (en) * 2011-12-31 2012-07-11 慈溪市东南复合材料有限公司 Cleaning process for air-conditioner thermostatic expansion valve air box
CN102553855B (en) * 2011-12-31 2014-03-12 慈溪市东南复合材料有限公司 Cleaning process for air-conditioner thermostatic expansion valve air box
CN102989715A (en) * 2012-12-06 2013-03-27 中国科学院长春光学精密机械与物理研究所 Treatment method for dark ultraviolet optical film substrate
US10854240B1 (en) 2013-02-28 2020-12-01 Seagate Technology Llc Method of cleaning magnetic head sliders
CN105583186A (en) * 2015-12-21 2016-05-18 中国科学院长春光学精密机械与物理研究所 Cleaning method for extreme ultraviolet optic substrate
CN111744879A (en) * 2020-06-24 2020-10-09 常州光晶光电科技有限公司 Piezoelectric quartz sensor white piece processing equipment and process thereof

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