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JP2005066507A - Rotating brush type glass substrate cleaning device - Google Patents

Rotating brush type glass substrate cleaning device Download PDF

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Publication number
JP2005066507A
JP2005066507A JP2003301249A JP2003301249A JP2005066507A JP 2005066507 A JP2005066507 A JP 2005066507A JP 2003301249 A JP2003301249 A JP 2003301249A JP 2003301249 A JP2003301249 A JP 2003301249A JP 2005066507 A JP2005066507 A JP 2005066507A
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Japan
Prior art keywords
brush
glass substrate
cleaning
type glass
substrate cleaning
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Pending
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JP2003301249A
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Japanese (ja)
Inventor
Hiroyuki Matsumoto
廣行 松本
Kazuo Hatake
一男 畠
Takehiro Hagiwara
武弘 萩原
Satoru Honda
覚 本多
Shingo Sugimoto
真吾 杉本
Hideo Horiike
英雄 堀池
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SPC Electronics Corp
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SPC Electronics Corp
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Priority to JP2003301249A priority Critical patent/JP2005066507A/en
Publication of JP2005066507A publication Critical patent/JP2005066507A/en
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Abstract

【目的】回転式ガラス基板洗浄装置において、回転ブラシに自己清浄機能を持たせ、異物の付着による清浄能力の低下を防止すると共に、ブラシとの接触により洗浄液も清浄化し、高品質の洗浄作業を実現すること。
【構成】ガラス基板2に接して回転する様に横架された円柱状のブラシ1と、このブラシ1に向かって洗浄液4を吹き付けられる様にブラシ1近傍に位置せしめられたシャワーノズル3とからなる回転ブラシ式ガラス基板洗浄装置において、ブラシ1の表面に光触媒物質を形成せしめると共に、ブラシ1近傍に紫外線光源5を位置せしめ、ブラシ1に向かって紫外線を照射し得る様にした。
【選択図】 図2
[Purpose] In a rotating glass substrate cleaning device, the rotating brush has a self-cleaning function to prevent deterioration of the cleaning ability due to adhesion of foreign substances, and cleaning liquid is also cleaned by contact with the brush for high-quality cleaning work. Realize.
[Structure] From a columnar brush 1 laid horizontally so as to rotate in contact with the glass substrate 2 and a shower nozzle 3 positioned near the brush 1 so that the cleaning liquid 4 can be sprayed toward the brush 1 In the rotating brush type glass substrate cleaning apparatus, the photocatalytic substance is formed on the surface of the brush 1 and the ultraviolet light source 5 is positioned in the vicinity of the brush 1 so that the brush 1 can be irradiated with ultraviolet rays.
[Selection] Figure 2

Description

この発明は、LCD、PDP、LTPS−TFTを含むFPD製造工程などにおいて用いられる回転ブラシ式ガラス基板洗浄装置に関するものである。   The present invention relates to a rotating brush type glass substrate cleaning apparatus used in an FPD manufacturing process including LCD, PDP, and LTPS-TFT.

FPD用などのガラス基板製造工程においては、搬送された被洗浄物であるガラス基板に回転するブラシを押し付けながら、ブラシに向かって洗浄液を吹き付け、洗浄液の洗浄力及びブラシが回転しながら基板に接触するときに生ずる物理力によって基板上の異物を取り除くことにより、洗浄処理を行うことがある。   In FPD and other glass substrate manufacturing processes, while pressing the rotating brush against the glass substrate that is the object to be cleaned, spray the cleaning solution toward the brush and contact the substrate while the cleaning power and brush rotate. In some cases, the cleaning process may be performed by removing the foreign matter on the substrate by the physical force generated during the process.

図1はこの様な洗浄処理を行う回転ブラシ式ガラス基板洗浄装置の代表例の側面図であり、図中1は搬送されるガラス基板2の表裏面に接する様に横架された円柱状のブラシ、3は前記ブラシ1に向かって洗浄液4を吹き付けられる様にブラシ1近傍に設置されたシャワーノズルであり、シャワーノズル3から洗浄液4を吹き出しながらブラシ1を回転させると、洗浄液4がガラス基板2の表面に達すると共にその部分をブラシ1が摺動するので、洗浄液4の洗浄力及びブラシ1の摺接による物理力によって、ガラス基板2表面の異物は取り除かれることになる。なお、洗浄液4はフィルタリング及び新液の補充を逐次行いながら循環再利用される。
特開2001−171075 見当たらず。
FIG. 1 is a side view of a typical example of a rotating brush type glass substrate cleaning apparatus that performs such a cleaning process. In FIG. The brush 3 is a shower nozzle installed in the vicinity of the brush 1 so that the cleaning liquid 4 can be sprayed toward the brush 1. When the brush 1 is rotated while blowing the cleaning liquid 4 from the shower nozzle 3, the cleaning liquid 4 becomes a glass substrate. Since the brush 1 slides on the surface of the glass substrate 2 as soon as it reaches the surface of FIG. The cleaning liquid 4 is recycled and reused while sequentially performing filtering and replenishment with a new liquid.
JP2001-171075 I can't find it.

この様に、従来の回転ブラシ式ガラス基板洗浄装置においては、洗浄液4の洗浄力及びブラシ1の回転摺接により生じる物理力によってガラス基板2上の異物の除去が行われるのであるが、その際ガラス基板2から分離された異物の一部はブラシ1に付着し、そのままブラシ1に残留し、その付着量は時間と共に増加し、ガラス基板2に再付着してしまうこともあった。つまり、ブラシ1が時間の経過と共に汚染されることは避けられず、この種回転ブラシ式ガラス基板洗浄装置の洗浄能力は、ブラシ1のこの汚染現象によって序々に低下してしまうのが普通であった。又、洗浄液4の有機物除去能力は、洗浄液4中に含まれる洗剤の能力に頼っており、洗浄液4として非イオン水(DIW)を用いる場合には、有機物除去能力は期待できなかった。   In this way, in the conventional rotating brush type glass substrate cleaning apparatus, the foreign matter on the glass substrate 2 is removed by the cleaning force of the cleaning liquid 4 and the physical force generated by the rotational sliding contact of the brush 1. Some of the foreign matter separated from the glass substrate 2 adheres to the brush 1 and remains on the brush 1 as it is. The amount of the adhesion increases with time, and may adhere to the glass substrate 2 again. In other words, it is inevitable that the brush 1 is contaminated over time, and the cleaning ability of this type of rotating brush type glass substrate cleaning device is usually gradually lowered by this contamination phenomenon of the brush 1. It was. Moreover, the organic substance removing ability of the cleaning liquid 4 depends on the ability of the detergent contained in the cleaning liquid 4, and when non-ionized water (DIW) is used as the cleaning liquid 4, the organic substance removing ability cannot be expected.

本発明者は上記回転ブラシ式ガラス基板洗浄装置の問題点を解決せんとして研究を行った結果、光触媒の作用を利用することにより、ブラシ自体に自己清浄能力を持たせ、更にブラシと接触させることにより洗浄液も清浄化し、洗浄作業の継続によって洗浄能力を低下させることなく長期間にわたって所期の洗浄能力を維持し続けさせることが出来る回転ブラシ式ガラス基板洗浄装置を開発することに成功し、本発明としてここに提案するものである。   As a result of research conducted by the present inventor to solve the problems of the above-described rotating brush type glass substrate cleaning apparatus, the brush itself has a self-cleaning ability by using the action of the photocatalyst, and is further brought into contact with the brush. We have succeeded in developing a rotating brush-type glass substrate cleaning device that can clean the cleaning liquid and maintain the desired cleaning performance for a long time without deteriorating the cleaning performance by continuing the cleaning operation. It is proposed here as an invention.

なお、前記特許文献1(特開2001−171075)には光触媒層が形成されたローラーが開示されているが、これは印刷装置においてローラーの親水性を向上させて均一な水膜を形成させる為のものであり、光触媒の作用を利用するものではあるが、本発明とは目的、構成、作用が全く異なるものである。   In addition, although the roller in which the photocatalyst layer was formed is indicated by the said patent document 1 (Unexamined-Japanese-Patent No. 2001-171075), in order to improve the hydrophilic property of a roller and to form a uniform water film in a printing apparatus. Although utilizing the action of the photocatalyst, the object, structure and action are completely different from those of the present invention.

ガラス基板2に接して回転する様に横架された円柱状のブラシ1と、このブラシ1に向かって洗浄液4を吹き付けられる様にブラシ1近傍に位置せしめられたシャワーノズル3とからなる回転ブラシ式ガラス基板洗浄装置において、ブラシ1の表面に光触媒物質を形成せしめると共に、ブラシ1近傍に紫外線光源5を位置せしめ、ブラシ1に向かって紫外線を照射し得る様にすることにより上記課題を解決した。   A rotating brush comprising a columnar brush 1 laid horizontally so as to rotate in contact with the glass substrate 2 and a shower nozzle 3 positioned in the vicinity of the brush 1 so that the cleaning liquid 4 can be sprayed toward the brush 1. In the type glass substrate cleaning apparatus, the above-mentioned problem is solved by forming a photocatalytic substance on the surface of the brush 1 and positioning the ultraviolet light source 5 in the vicinity of the brush 1 so that the brush 1 can be irradiated with ultraviolet rays. .

光触媒の作用により、ブラシは自己清浄能力を持つことになり、常に清浄な状態を保ち、洗浄能力の低下がなくなり、その寿命も伸びる。又、自己清浄能力を持つブラシと接触することにより、洗浄液も清浄化され、洗浄能力が向上し、その劣化が防止されるだけではなく、有機物除去能力を持つに至る。従って、洗浄液として非イオン水(DIW)を用いるときでも、有機物を除去することが可能となる。   Due to the action of the photocatalyst, the brush has a self-cleaning ability, which is always kept in a clean state, the cleaning ability is not lowered, and its life is extended. Further, by contacting with a brush having a self-cleaning ability, the cleaning liquid is also cleaned, the cleaning ability is improved, and the deterioration is not only prevented, but the organic matter removing ability is provided. Therefore, even when non-ionized water (DIW) is used as the cleaning liquid, organic substances can be removed.

ブラシ表面に光触媒物質を形成せしめると共に、ブラシ近傍に紫外線光源を位置せしめ、前記光触媒物質に紫外線を照射する様にした点に本発明の本質的特徴が存在する。   The essential feature of the present invention resides in that a photocatalytic substance is formed on the brush surface, an ultraviolet light source is positioned in the vicinity of the brush, and the photocatalytic substance is irradiated with ultraviolet rays.

図2はこの発明に係る回転ブラシ式ガラス基板洗浄装置の一実施例の側面図であり、図中1は搬送されるガラス基板2の表裏面に接する様に横架された一対の円柱状のブラシ、3は前記ブラシ1に向かって洗浄液4を吹き付けられる様に、ブラシ1近傍に設置されたシャワーノズルであり、これら構成は従来の回転ブラシ式ガラス基板洗浄装置と基本的に同じである。   FIG. 2 is a side view of an embodiment of a rotating brush type glass substrate cleaning apparatus according to the present invention. In FIG. 2, reference numeral 1 denotes a pair of columnar columns horizontally mounted so as to be in contact with the front and back surfaces of the glass substrate 2 to be conveyed. Brushes 3 are shower nozzles installed in the vicinity of the brush 1 so that the cleaning liquid 4 is sprayed toward the brush 1, and these configurations are basically the same as those of a conventional rotating brush type glass substrate cleaning apparatus.

一方、本実施例においては、ブラシ1の表面には酸化チタンなどの光触媒物質が形成されていると共に、ブラシ1の近傍には蛍光灯などの紫外線光源5が位置せしめられ、前記光触媒物質に向かって紫外線を照射できる様になっている。なお、ブラシ1表面への光触媒物質の形成は、ブラシ1の原料素材中に光触媒物質粉末を練り込んだり、ブラシ1の表面に光触媒物質をコーティングするなど、従来から知られている適宜手段によって行うことが出来る。   On the other hand, in the present embodiment, a photocatalytic material such as titanium oxide is formed on the surface of the brush 1, and an ultraviolet light source 5 such as a fluorescent lamp is positioned in the vicinity of the brush 1 toward the photocatalytic material. Can be irradiated with ultraviolet rays. The formation of the photocatalytic substance on the surface of the brush 1 is performed by a conventionally known appropriate means such as kneading the photocatalytic substance powder in the raw material of the brush 1 or coating the surface of the brush 1 with the photocatalytic substance. I can do it.

この実施例は上記の通りの構成を有するものであり、従来の回転ブラシ式ガラス基板洗浄装置と同様、シャワーノズル3から洗浄液4を吹き出しながらブラシ1を回転させると、洗浄液4はブラシ1を介してガラス基板2の表面に達し、洗浄液4の洗浄力及びブラシ1の摺接による物理力により、ガラス基板2表面に付着している異物は取り除かれる。このとき、ブラシ1には光触媒物質が形成されており、これに向かって紫外線光源5から紫外線が照射されているので、光触媒の作用によってブラシ1自体の清浄化が行われる。又、このブラシ1との接触によって洗浄液4も清浄化され、ブラシ1及び洗浄液4が共に清浄化された状態でガラス基板2表面の異物の除去を行うことになる。なお、光触媒の作用によりブラシ1の親水性も向上し、ブラシ1により多量の洗浄液4が付着する様になり、これにより洗浄作業はより一層効率的に行われる。又、光触媒の作用により洗浄液4には有機物除去能力も付与されるので、洗浄液4として非イオン水(DIW)を用いる場合にも、有機物を除去することが可能となる。   This embodiment has the above-described configuration. When the brush 1 is rotated while the cleaning liquid 4 is blown from the shower nozzle 3 as in the conventional rotating brush type glass substrate cleaning apparatus, the cleaning liquid 4 passes through the brush 1. The foreign matter adhering to the surface of the glass substrate 2 is removed by the cleaning force of the cleaning liquid 4 and the physical force by the sliding contact of the brush 1. At this time, since the photocatalytic substance is formed on the brush 1 and the ultraviolet light source 5 is irradiated toward the photocatalyst, the brush 1 itself is cleaned by the action of the photocatalyst. Further, the cleaning liquid 4 is also cleaned by the contact with the brush 1, and foreign matters on the surface of the glass substrate 2 are removed in a state where both the brush 1 and the cleaning liquid 4 are cleaned. The hydrophilicity of the brush 1 is also improved by the action of the photocatalyst, and a large amount of the cleaning liquid 4 adheres to the brush 1, whereby the cleaning operation is performed more efficiently. In addition, since the cleaning liquid 4 is also provided with an organic substance removing ability by the action of the photocatalyst, the organic substance can be removed even when non-ion water (DIW) is used as the cleaning liquid 4.

この様に、この発明に係る回転ブラシ式ガラス基板洗浄装置においては、光触媒の作用によってブラシへ自己清浄能力が付与されるので、時間の経過に伴うブラシ及び洗浄液の機能低下及び劣化が起こりにくく、長期間にわたって高い品質を保持しながらガラス基板表面の洗浄作業を行うことが出来る。   In this way, in the rotating brush type glass substrate cleaning apparatus according to the present invention, since the self-cleaning ability is imparted to the brush by the action of the photocatalyst, the function and deterioration of the brush and the cleaning liquid are less likely to occur over time, The glass substrate surface can be cleaned while maintaining high quality over a long period of time.

この発明は上述の通り、光触媒の作用を利用して効率よくガラス基板表面の洗浄作業を行うものであり、LCD、PDP、LTD−TFTを含む各種FPD製造工程において極めて高い利用可能性を有するものである。   As described above, the present invention efficiently cleans the surface of a glass substrate using the action of a photocatalyst, and has extremely high applicability in various FPD manufacturing processes including LCD, PDP, and LTD-TFT. It is.

従来の回転ブラシ式ガラス基板洗浄装置の代表例の側面図。The side view of the typical example of the conventional rotating brush type glass substrate cleaning apparatus. この発明に係る回転ブラシ式ガラス基板洗浄装置の一実施例の側面図。The side view of one Example of the rotating brush type glass substrate cleaning apparatus which concerns on this invention.

符号の説明Explanation of symbols

1 ブラシ
2 ガラス基板
3 シャワーノズル
4 洗浄液
5 紫外線光源
1 brush 2 glass substrate 3 shower nozzle 4 cleaning solution 5 ultraviolet light source

Claims (3)

ガラス基板2に接して回転する様に横架された円柱状のブラシ1と、このブラシ1に向かって洗浄液4を吹き付けられる様にブラシ1近傍に位置せしめられたシャワーノズル3とからなる回転ブラシ式ガラス基板洗浄装置において、ブラシ1の表面に光触媒物質を形成せしめると共に、ブラシ1近傍に紫外線光源5を位置せしめ、ブラシ1に向かって紫外線を照射し得る様にしたことを特徴とする回転ブラシ式ガラス基板洗浄装置。 A rotating brush comprising a columnar brush 1 laid horizontally so as to rotate in contact with the glass substrate 2 and a shower nozzle 3 positioned in the vicinity of the brush 1 so that the cleaning liquid 4 can be sprayed toward the brush 1. In the type glass substrate cleaning apparatus, a photocatalytic substance is formed on the surface of the brush 1 and an ultraviolet light source 5 is positioned in the vicinity of the brush 1 so that ultraviolet rays can be irradiated toward the brush 1. Type glass substrate cleaning equipment. 光触媒物質が酸化チタンであることを特徴とする請求項1記載の回転ブラシ式ガラス基板洗浄装置。 2. The rotating brush type glass substrate cleaning apparatus according to claim 1, wherein the photocatalytic substance is titanium oxide. 紫外線光源5が蛍光灯であることを特徴とする請求項1記載の回転ブラシ式ガラス基板洗浄装置。

2. The rotating brush type glass substrate cleaning apparatus according to claim 1, wherein the ultraviolet light source is a fluorescent lamp.

JP2003301249A 2003-08-26 2003-08-26 Rotating brush type glass substrate cleaning device Pending JP2005066507A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100724614B1 (en) 2006-01-09 2007-06-04 주식회사 티엔텍 Dissimilar Layer Initial Peeling Equipment on Glass Surface
JP2008011706A (en) * 2006-07-01 2008-01-24 Kyowa Machinery Co Ltd Cleaning device for egg washing apparatus
KR101163584B1 (en) * 2009-04-08 2012-07-09 세메스 주식회사 Apparatus for cleaning substrate using brush
JP2023534479A (en) * 2020-07-17 2023-08-09 インベンテイオ・アクテイエンゲゼルシヤフト Handrail processing equipment for passenger transportation facilities

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100724614B1 (en) 2006-01-09 2007-06-04 주식회사 티엔텍 Dissimilar Layer Initial Peeling Equipment on Glass Surface
JP2008011706A (en) * 2006-07-01 2008-01-24 Kyowa Machinery Co Ltd Cleaning device for egg washing apparatus
KR101163584B1 (en) * 2009-04-08 2012-07-09 세메스 주식회사 Apparatus for cleaning substrate using brush
JP2023534479A (en) * 2020-07-17 2023-08-09 インベンテイオ・アクテイエンゲゼルシヤフト Handrail processing equipment for passenger transportation facilities
JP7707278B2 (en) 2020-07-17 2025-07-14 インベンテイオ・アクテイエンゲゼルシヤフト Handrail processing equipment for passenger transport facilities

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