JP2004101453A - Characteristics measuring method and system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a characteristics measuring method for determining contact resistance exerting an influence on measurement data and improving the same. <P>SOLUTION: In a characteristic measuring method for measuring a characteristic value of a material to be measured or conducting electric processing, two probe pins are disposed at a space in the material to be measured, and a resistance value between two points where the measured material and the probe pins come into contact to determine whether or not the contact resistance between the probe pin and the measured material is equal to or larger than designated value. When the contact resistance is determined to be equal to or larger than the designated value, the contact resistance between the probe pin and the measured material is reduced. <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method and an apparatus for measuring a characteristic value of an object to be measured or performing an electrical treatment, and particularly to a contact between two different metals or a metal and a semiconductor when the metal and the semiconductor are brought into contact with each other. The present invention relates to a method and an apparatus for measuring characteristics for improving resistance.
[0002]
[Prior art]
In measuring characteristics of elements such as sensors, measurement is generally performed by a contact method using a probe pin. The measurement method will be described. One probe pin is brought into contact with an object to be measured, and characteristic values are measured or electric processing is performed through the probe pin.
[0003]
When the characteristics of an object to be measured are measured by a contact method using a probe pin, a barrier phase is formed by a reaction between the probe pin and the object to be measured, and the contact resistance due to the barrier phase adversely affects measurement data.
[0004]
In addition, contact resistance due to the oxide film is generated depending on the degree of oxidation of the contact surface or point of the probe or the object to be measured, and the contact resistance due to the oxide film also adversely affects the measurement data.
[0005]
Then, the two probe pins 110a and 110b are brought into contact with the device under test 102 (element) (see FIG. 3A), and the resistance between the probe pins is measured to confirm the contact resistance (FIG. B)), and thereafter, it is known that normal measurement and electrical processing are performed (see FIG. 3C) (for example, see Patent Document 1). As a result, the contact resistance between the two probe pins 110a and 110b can be confirmed, and the sensor characteristic value or electric processing can be performed after taking into account the contact resistance.
[0006]
[Patent Document 1]
JP-A-3-259737
[Problems to be solved by the invention]
However, the contact resistance of commercially available probe pins differs depending on the degree of oxidation and surface shape of the probe pins and the DUT, but is larger than a catalog value (on the order of 0.01Ω) and sometimes reaches several Ω.
[0008]
Then, in the current process, the measurement or the electric processing of the characteristic value of the gas sensor is performed in a state where the contact resistance is added to the actual resistance and the resistance is measured to be higher than the actual resistance value (the state where the contact resistance is placed). Then, a voltage drop occurs, and the influence on the measurement of the sensor characteristics and the electric processing is large, and the level is not negligible only by considering the contact resistance.
[0009]
A first object of the present invention is to provide a characteristic measuring method capable of judging and improving a contact resistance affecting measurement data.
[0010]
A second object of the present invention is to provide a characteristic measuring device capable of realizing the above method.
[0011]
[Means for Solving the Problems]
According to a first aspect of the present invention, in a characteristic measuring method for measuring a characteristic value of an object to be measured or performing electrical processing, two probe pins are arranged at a predetermined interval on the object to be measured and the object is measured. Measure the resistance value between two points where the measured object and the probe pin are in contact, and determine whether the contact resistance between the probe pin and the measured object is equal to or greater than a predetermined value based on the resistance value, When the contact resistance is determined to be equal to or greater than the predetermined value, the contact resistance between the probe pin and the device under test is reduced. As a result, the contact resistance that affects the measurement data is checked, and if the contact resistance is determined to be equal to or greater than the predetermined value, the contact resistance is reduced, so that the characteristics of the device under test can be measured more accurately.
[0012]
Further, in the characteristic measuring method, before determining whether a contact resistance between the probe pin and the object to be measured is equal to or more than a predetermined value based on a resistance value of the object to be measured, the probe pin and the object to be measured are determined. It is preferable to reduce the contact resistance with the measurement object. As a result, the characteristics of the device under test can be measured more accurately after the contact resistance affecting the measurement data is improved in advance.
[0013]
In the characteristic measuring method, it is preferable that the contact resistance is determined to be equal to or more than the predetermined value, and after the contact resistance is reduced, whether the contact resistance is equal to or more than the predetermined value is determined again. This makes it possible to more accurately measure the characteristics of the device under test while reliably improving the contact resistance that affects the measurement data.
[0014]
In the characteristic measuring method, it is preferable that a contact current between the probe pin and the device under test is reduced by applying a predetermined amount of current between the probe pins. By applying a predetermined amount of current to the device under test, a barrier such as an oxide film or a barrier film that causes contact resistance can be broken. Here, the predetermined amount of current refers to a current that is equal to or greater than the current flowing during characteristic measurement or electric processing.
[0015]
Further, in the characteristic measuring method, the predetermined amount of current is preferably 1 A or more. This is because a barrier such as an oxide film or a barrier film that causes contact resistance can be reliably broken at 1 A or more.
[0016]
According to a second aspect of the present invention, there is provided a characteristic measuring apparatus for measuring a characteristic value of an object to be measured or performing electrical processing, comprising: two probe pins arranged at a predetermined interval on the object to be measured; Resistance measuring means for measuring a resistance value between two points at which the object to be measured and the probe pin are in contact with each other; and whether a contact resistance between the probe pin and the object to be measured is equal to or more than a predetermined value based on the resistance value. And a contact resistance reducing unit that reduces a contact resistance between the probe pin and the device under test when the contact resistance is determined to be equal to or greater than the predetermined value. I do. With this apparatus, it is possible to more accurately measure the characteristics of the device under test while improving the contact resistance affecting the measurement data by the above method.
[0017]
BEST MODE FOR CARRYING OUT THE INVENTION
In a characteristic measuring device (1 in FIG. 1) for measuring characteristic values or performing electrical processing of a characteristic value of an object to be measured (2 in FIG. 1), two probe pins (1) are arranged at predetermined intervals on the object to be measured. 10a, 10b), a resistance measuring means (40 in FIG. 1) for measuring a resistance value between two points where the object to be measured contacts the probe pin, and the probe pin and the probe pin based on the resistance value. Judging means (81 in FIG. 1) for judging whether or not the contact resistance between the probe pin and the object to be measured is equal to or more than a predetermined value. By providing a contact resistance reducing means (50 in FIG. 1) for reducing the contact resistance between the probe pin and the object to be measured, it is possible to confirm the influence of the contact resistance between the probe pin and the object to be measured on the measurement data. Check that the resistance is small enough It is possible to accurately measure the characteristics of the object.
[0018]
【Example】
An embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a block diagram schematically showing the configuration of the characteristic measuring device according to the first embodiment of the present invention. The characteristic measuring device 1 is a device for measuring the resistance value of a device under test and the characteristic value of the device under two-point contact, and includes probe pins 10a and 10b, a mounting table 20, pressing mechanisms 30a and 30b, It has a resistance measuring unit 40, a contact resistance reducing unit 50, an electric processing unit 60, a characteristic measuring unit 70, and a computer 80.
[0019]
The probe pins 10a and 10b are spaced apart from each other at a predetermined interval, the object to be measured comes into contact with each of them, and the surfaces thereof are plated with gold.
[0020]
The mounting table 20 is a table for mounting the DUT 2 or the terminals or electrodes of the DUT 2 so as to facilitate the measurement.
[0021]
The pressing mechanisms 30a and 30b press or release the two probe pins 10a and 10b by moving the two probe pins 10a and 10b up and down on the DUT 2 mounted on the mounting table 20.
[0022]
The resistance measuring unit 40 is a unit that measures the resistance value of the device under test 2 (for example, a resistance measuring device).
[0023]
The contact resistance reducing means 50 is a means for reducing the contact resistance between the probe pins 10a and 10b and the device under test 2, and a predetermined amount of current (between the probe pins 10a and 10b via the device under test 2). (1A or more).
[0024]
The electrical processing means 60 is means for performing electrical processing (for example, aging processing for applying a constant voltage to activate the ceramic element of the sensor) to the device under test 2 via the probe pins 10a and 10b.
[0025]
The characteristic measuring unit 70 is a unit that measures a characteristic value of the device under test 2.
[0026]
The computer 80 has a determination unit 81 and a control unit 82.
[0027]
First, the judging means 81 determines whether the contact resistance between the probe pins 10a and 10b and the DUT 2 is equal to or greater than a predetermined value (threshold) based on the resistance value of the DUT 2 by the resistance measurement means 40. Determine whether or not. Secondly, after the contact resistance is reduced by the contact resistance reducing means 50, the determining means 81 again determines whether or not the contact resistance between the probe pins 10a and 10b and the DUT 2 is equal to or greater than a predetermined value. I do.
[0028]
First, the control unit 82 controls the characteristic measuring unit 70 to measure the characteristic value of the DUT 2 when the determining unit 81 determines that the contact resistance is smaller than the predetermined value. Second, the control means 82 controls the contact resistance reducing means 50 to reduce the contact resistance between the probe pins 10a and 10b and the device under test 2 before making the determination by the determining means 81. Thirdly, when the determining means 81 determines that the contact resistance is equal to or more than a predetermined value, the controlling means 82 gives the contact resistance reducing means 50 a contact resistance between the probe pins 10a and 10b and the DUT 2. Control to reduce. Fourth, the control means 82 controls the electric processing means 60 to perform electric processing (aging processing) on the device under test 2 when the judgment means 81 judges that the contact resistance is smaller than a predetermined value.
[0029]
The device under test 2 is, for example, a ceramic element (such as a sensor element) or a metal sensor bracket (see FIG. 4) that is electrically connected to the element and has a terminal (SUS, stainless steel, etc.) extending from the element. is there. The metal fitting 200 is thereafter integrated with the circuit to complete the gas sensor. In addition, the metal fitting itself cannot be separated after being integrated with the circuit, and will be discarded when the sensor characteristic becomes NG after integration. The evaluation of the sensor characteristics is performed.
[0030]
The operation of the first embodiment will be described with reference to the drawings. FIG. 2 is a schematic diagram for explaining an example of the operation of the characteristic measuring device according to the first embodiment of the present invention.
[0031]
First, the device under test 2 (elements, terminals) is placed on a mounting table, and the probe pins 10a and 10b are lowered to the device under test 2 to make two-point contact (see FIG. 2A).
[0032]
Next, a current (1 A or more) is passed between the probe pins 10a and 10b (see FIG. 2B). As a result, a barrier such as an oxide film or a barrier film that causes contact resistance between the probe pins 10a and 10b and the DUT 2 is destroyed (removed).
[0033]
Next, the resistance of the object to be measured is measured to check whether the contact resistance is sufficiently small (see FIG. 2C). In most of the DUTs 2, the contact resistance affecting measurement data is improved (sufficiently reduced) by the current processing of FIG. 2B. If the contact resistance has not been improved, the current processing of FIG. 2B is performed again, and the confirmation of the contact resistance of FIG. 2C is performed again. If the contact resistance is not improved even if the current processing of FIG. 2B is performed many times, the measured object becomes a defective product (NG product).
[0034]
Finally, when it is confirmed that the contact resistance has been improved, the characteristics are measured or electric processing is performed (see FIG. 2D).
[0035]
As another embodiment, the present invention can be applied to a relay (a relay that operates or controls a device connected to the same or another electric circuit by opening and closing an electric contact). That is, in a characteristic measuring device that measures a characteristic value of an object to be measured and has a relay on a wiring related to the measurement, a current application unit that applies a current of 1 A or more when an electrical contact of the relay is connected; Determining means for checking whether the contact resistance of the electrical contact of the relay is equal to or greater than a predetermined value. Thereby, the contact resistance (contact resistance) of the relay portion which affects the measurement data can be improved. If the contact resistance does not improve, it can be improved by replacing it with a new relay.
[0036]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to this invention, the influence which the contact resistance between a probe pin and a to-be-measured object gives to measurement data can be confirmed, and when contact resistance is large, contact resistance can be improved.
[0037]
Further, according to the present invention, the characteristics of the device under test can be measured more accurately after the contact resistance affecting the measurement data is improved in advance.
[0038]
Furthermore, according to the present invention, by flowing a current of 1 A or more, a barrier such as an oxide film or a barrier film that causes contact resistance can be destroyed (removed), so that the contact resistance can be reduced.
[Brief description of the drawings]
FIG. 1 is a block diagram schematically showing a configuration of a characteristic measuring device according to a first embodiment of the present invention.
FIG. 2 is a schematic diagram for explaining an example of an operation of the characteristic measuring device according to the first embodiment of the present invention.
FIG. 3 is a schematic diagram for explaining an example of an operation of a characteristic measuring device according to an example of the related art.
FIG. 4 is a side view schematically showing the configuration of a single metal fitting of the gas sensor.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Characteristic measuring apparatus 2, 102 Device under test 10a, 10b, 110a, 110b Probe pin 20 Mounting table 30a, 30b Pressing mechanism 40 Resistance measuring means 50 Contact resistance reducing means 60 Electric processing means 70 Characteristic measuring means 80 Computer 81 Judgment means 82 Control means 200 Metal fitting alone (gas sensor)
201 Element part 202 Heater part 203 Terminal part 204 Body part 205 Protector 206 Through hole

Claims (6)

In the characteristic measurement method of measuring the characteristic value of the measured object or performing the electrical processing,
Disposing two probe pins at a predetermined interval on the device under test and measuring a resistance value between two points at which the device under test and the probe pins are in contact with each other;
Determine whether the contact resistance between the probe pin and the device under test is equal to or greater than a predetermined value based on the resistance value,
If the contact resistance is determined to be equal to or more than the predetermined value, reduce the contact resistance between the probe pin and the device under test,
A characteristic measuring method characterized in that: Before determining whether the contact resistance between the probe pin and the DUT is equal to or greater than a predetermined value based on the resistance value of the DUT, the contact resistance between the probe pin and the DUT is determined. The characteristic measuring method according to claim 1, wherein the characteristic is reduced. 3. The characteristic measuring method according to claim 1, wherein the contact resistance is determined to be equal to or more than the predetermined value, and after the contact resistance is reduced, it is determined whether the contact resistance is equal to or more than the predetermined value. 4. The characteristic measuring method according to claim 2, wherein a contact resistance between the probe pin and the device under test is reduced by applying a predetermined amount of current between the probe pins. The method according to claim 4, wherein the predetermined amount of current is 1A or more. In a characteristic measuring device that performs measurement or electrical processing of a characteristic value of a device under test,
Two probe pins arranged at a predetermined interval on the device under test,
Resistance measuring means for measuring a resistance value between two points where the object to be measured and the probe pin are in contact with each other;
Judgment means for judging whether or not the contact resistance between the probe pin and the device under test is equal to or more than a predetermined value based on the resistance value,
When the contact resistance is determined to be equal to or greater than the predetermined value, a contact resistance reducing unit that reduces a contact resistance between the probe pin and the device under test,
A characteristic measuring device comprising:

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