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JP2003293136A - Amorphous hard carbon film and sliding member using the same - Google Patents

Amorphous hard carbon film and sliding member using the same

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Publication number
JP2003293136A
JP2003293136A JP2002100725A JP2002100725A JP2003293136A JP 2003293136 A JP2003293136 A JP 2003293136A JP 2002100725 A JP2002100725 A JP 2002100725A JP 2002100725 A JP2002100725 A JP 2002100725A JP 2003293136 A JP2003293136 A JP 2003293136A
Authority
JP
Japan
Prior art keywords
hard carbon
amorphous hard
carbon film
silicon
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002100725A
Other languages
Japanese (ja)
Inventor
Masaki Moronuki
正樹 諸貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Riken Corp
Original Assignee
Riken Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riken Corp filed Critical Riken Corp
Priority to JP2002100725A priority Critical patent/JP2003293136A/en
Publication of JP2003293136A publication Critical patent/JP2003293136A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sliding-Contact Bearings (AREA)
  • Pistons, Piston Rings, And Cylinders (AREA)

Abstract

(57)【要約】 (修正有) 【課題】耐摩耗性に優れるが相手材を摩耗しやすい高Si
含有アルミニウム合金に対して優れた摺動特性をもつ非
晶質硬質炭素皮膜およびた摺動部材を提供する。 【解決手段】CとHを主成分とする非晶質硬質炭素皮膜に
おいて、該非晶質硬質炭素皮膜中のH含有量が30〜5
0at%であり、Hを除いた残りの組成でCが90at%
以上であり、Siが5at%未満であり、珪素炭化物を含有す
る非晶質硬質炭素皮膜。さらに酸素を0.5〜2at%添
加すると摩擦係数が安定する。
(57) [Summary] (Modified) [Problem] High Si that has excellent wear resistance but easily wears the mating material
Provided is an amorphous hard carbon film having excellent sliding characteristics with respect to a contained aluminum alloy, and a sliding member. An amorphous hard carbon film containing C and H as main components has an H content of 30 to 5 in the amorphous hard carbon film.
0 at%, C is 90 at% in the remaining composition excluding H
Above, an amorphous hard carbon film containing less than 5 at% of Si and containing silicon carbide. Further, when 0.5 to 2 at% of oxygen is added, the friction coefficient is stabilized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、高濃度に珪素を
含有するアルミニウム合金を相手材として摺動した場合
すぐれた耐摩耗性、耐焼き付き性および耐凝着性を発揮
する非晶質硬質炭素皮膜とそれを用いた摺動部材に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an amorphous hard carbon which exhibits excellent wear resistance, seizure resistance and adhesion resistance when it is slid with an aluminum alloy containing silicon at a high concentration as a counter material. The present invention relates to a film and a sliding member using the film.

【0002】[0002]

【従来の技術】従来から、金属材料の表面処理方法とし
てめっき、窒化やPVD法、CVD法などにより形成さ
れるTiC、TiN等の金属炭化物、金属窒化物等の硬
質皮膜を工具、金型などの表面にコーティングして耐摩
耗性、耐焼き付き性を向上させている。しかしながら、
これらのコーティング層はHv2000〜3000と高硬
度ではあるが、摩擦係数が0.2〜0.8程度と大きい
ため、相手材との摩擦において摺動抵抗が増加し、コー
ティング皮膜の摩耗、相手材の損傷といった問題が生じ
る。
2. Description of the Related Art Conventionally, as a surface treatment method for metal materials, metal carbides such as TiC and TiN formed by plating, nitriding, PVD method, CVD method, etc., hard coatings such as metal nitrides, tools, dies The surface of is coated to improve wear resistance and seizure resistance. However,
These coating layers have a high hardness of Hv2000-3000, but have a large coefficient of friction of about 0.2-0.8, which increases the sliding resistance due to friction with the mating material, causing wear of the coating film and mating material. It causes problems such as damage.

【0003】プラズマやイオンビームを用いたCVD法
などにより形成される非晶質硬質炭素皮膜はHv約200
0〜6000と高い硬度を示すことから、耐摩耗性の良
い硬質コーティング材として注目されている。非晶質硬
質炭素皮膜はアモルファスカーボン膜、ダイヤモンドラ
イクカーボン膜、i−カーボン膜、水素化アモルファス
カーボン膜(a−C:H)等とも呼ばれ、非晶質(アモ
ルファス)状の炭素が主体の膜である。
An amorphous hard carbon film formed by a CVD method using plasma or an ion beam has an Hv of about 200.
Since it has a high hardness of 0 to 6000, it has been attracting attention as a hard coating material having good wear resistance. The amorphous hard carbon film is also called an amorphous carbon film, a diamond-like carbon film, an i-carbon film, a hydrogenated amorphous carbon film (a-C: H), etc., and is mainly composed of amorphous carbon. It is a film.

【0004】このような非晶質硬質炭素皮膜に関して以
下の技術が提案されている。特許第2971928号公
報では炭素と水素を主成分とし、水素の含有量が30〜
50at%であり、残りの組成が原子比で70〜90a
t%の炭素と残部珪素質物質よりなる珪素質を含んだ非
晶質薄膜で、疑似ダイヤモンドを含み高硬度で、相手材
がSUJ−2の場合に0.05以下の非常に低い摩擦係
数を有する硬質非晶質炭素―水素―珪素薄膜について開
示されている。珪素と炭素が結合し硬質な炭化珪素を形
成しているため、高硬度で耐摩耗性に優れるが、アルミ
ニウム合金など軟質材料が相手材の場合については言及
されていない。
The following techniques have been proposed for such an amorphous hard carbon film. In Japanese Patent No. 2971928, the main components are carbon and hydrogen, and the hydrogen content is 30-.
50 at% and the remaining composition is 70 to 90 a in atomic ratio
It is an amorphous thin film containing silicon of t% carbon and the balance siliconaceous material, has a high hardness including pseudo diamond, and has a very low friction coefficient of 0.05 or less when the mating material is SUJ-2. A hard amorphous carbon-hydrogen-silicon thin film having is disclosed. Since silicon and carbon are combined to form hard silicon carbide, it has high hardness and excellent wear resistance, but no mention is made of the case where a soft material such as an aluminum alloy is a mating material.

【0005】珪素含有アルミニウム合金の場合、共晶点
である12.7wt%を境にして合金組織が変化する。
珪素が12.7wt%以上に高濃度に入った過共晶Al
−Si合金は溶製時に最初に大きな珪素が析出し、1
2.7wt%以下の亜共晶の場合には最初に純アルミニ
ウムに近いα固溶体が析出する。珪素は非常に硬いため
これを含有するアルミニウム合金は析出した珪素により
耐摩耗性に優れるという特長があるが、珪素含有量の多
いアルミニウム合金を相手材とした場合には、非晶質硬
質炭素皮膜が摩滅してしまう。
In the case of a silicon-containing aluminum alloy, the alloy structure changes at the eutectic point of 12.7 wt%.
Hypereutectic Al with high concentration of silicon of 12.7 wt% or more
-Si alloy has a large amount of silicon that is deposited first during melting.
In the case of a hypoeutectic of 2.7 wt% or less, α solid solution similar to pure aluminum is first deposited. Since silicon is extremely hard, the aluminum alloy containing it has the feature that it is excellent in wear resistance due to the precipitated silicon. However, when an aluminum alloy with a high silicon content is used as the counterpart material, an amorphous hard carbon film is used. Will wear out.

【0006】特許第2889116号公報では珪素およ
び窒素を適量含有する非晶質硬質炭素膜で基材との密着
性に優れ、耐摩耗性と摺動特性(摩擦係数)に優れた非
晶質炭素膜が得られることが開示されている。この非晶
質硬質炭素膜中の珪素および窒素の含有量は、良好な密
着性と耐摩耗性を得るという観点から決められている。
In Japanese Patent No. 2889116, an amorphous hard carbon film containing appropriate amounts of silicon and nitrogen has excellent adhesion to a base material, and has excellent wear resistance and sliding characteristics (friction coefficient). It is disclosed that a membrane is obtained. The contents of silicon and nitrogen in this amorphous hard carbon film are determined from the viewpoint of obtaining good adhesion and wear resistance.

【0007】特開昭61−163273号では少なくと
も一層が珪素を含有するダイヤモンド膜である耐摩耗部
材が開示されている。このダイヤモンド膜は珪素を添加
することによりSiCが生成され、密着性の良い高硬度
の膜とすることができることが開示されている。
Japanese Unexamined Patent Publication (Kokai) No. 61-163273 discloses an abrasion resistant member in which at least one layer is a diamond film containing silicon. It is disclosed that this diamond film can be made into a film of high hardness with good adhesion because SiC is generated by adding silicon.

【0008】特開平11−166625号では、Si、
Ti、W、Cr、Mo、Nb、Vなどの元素を含んだダ
イヤモンドライクカーボン皮膜をコーティングした耐ア
ルミニウム凝着性に優れたピストンリングが開示されて
いる。
In Japanese Patent Laid-Open No. 11-166625, Si,
A piston ring excellent in aluminum adhesion resistance is disclosed, which is coated with a diamond-like carbon film containing elements such as Ti, W, Cr, Mo, Nb, and V.

【0009】特開2001−280497号では、Si
含有量が7〜20wt%のアルミニウム合金からなるシ
リンダとSi、Ti、W、Cr、Mo、NbおよびVの
群から選ばれた1又は2種以上の元素の炭化物が分散
し、その含有比率が5〜40at%であり、皮膜硬度が
Hv700〜2000の範囲のダイヤモンドライクカーボ
ンからなる硬質皮膜をコーティングしたピストンリング
との組み合わせについて開示されている。ここでSiな
どの含有比率は硬質皮膜全体に対する原子比率であるの
で、硬質皮膜の元素を水素と、水素以外の成分に分ける
と、後者に対するSiなどの含有量を表わすと5〜40
at%より多くなる。
In Japanese Patent Laid-Open No. 2001-280497, Si
A cylinder made of an aluminum alloy having a content of 7 to 20 wt% and carbides of one or more elements selected from the group of Si, Ti, W, Cr, Mo, Nb and V are dispersed, and the content ratio is 5 to 40 at% and the film hardness is
A combination with a piston ring coated with a hard coating made of diamond-like carbon in the range of Hv 700-2000 is disclosed. Here, since the content ratio of Si and the like is an atomic ratio with respect to the entire hard coating, if the elements of the hard coating are divided into hydrogen and components other than hydrogen, the content of Si and the like in the latter is expressed as 5 to 40.
It will be more than at%.

【0010】[0010]

【発明が解決しようとする課題】純アルミニウムやアル
ミニウム合金は軽量であるため、自動車部品に使用する
と低燃費化が図れるなどの利点があるが、比較的軟質で
あるため、摺動中に相手材に凝着し、焼き付きを発生し
やすいという問題がある。純アルミニウムやアルミニウ
ム合金を摺動部材として考える場合には耐摩耗性、耐焼
き付き性に加えて耐凝着性も重要である。
Since pure aluminum and aluminum alloys are lightweight, they have the advantage of reducing fuel consumption when used for automobile parts. However, there is a problem that it is apt to stick to the surface and cause seizure. When considering pure aluminum or aluminum alloy as a sliding member, in addition to wear resistance and seizure resistance, adhesion resistance is also important.

【0011】炭素と水素を主成分とする非晶質硬質炭素
皮膜に珪素を添加すると、硬度が上昇し耐摩耗性に優
れ、低摩擦係数の摺動皮膜が得られることは従来より知
られている。しかしながら、従来の知見を調べると、S
iなど添加前の非晶質硬質炭素皮膜の硬度はHv800と
低硬度のものであり、Hv2000以上の高硬度のもので
はない。本発明者らはこのような高硬度を有する非晶質
硬質炭素皮膜について研究したところ、(イ)添加する珪
素量によって耐摩耗性が大きく変化する;(ロ)添加する
珪素量が5at%を越えると硬度が低下し、耐摩耗性が
悪くなる;このような炭素と水素を主成分とし、少量の
珪素を添加した非晶質硬質炭素皮膜は鉄系基材に対して
密着性が悪いという問題を見出した。したがって、本発
明はアルミニウムやアルミニウム合金を相手材とする高
硬度非晶質硬質炭素皮膜のもつすぐれた耐摩耗性をでき
るだけ損なわないで耐凝着性、耐スカッフ性、および密
着性に優れた非晶質硬質炭素皮膜およびそれを用いた摺
動部材を提供することを課題とする。
It has been conventionally known that when silicon is added to an amorphous hard carbon film containing carbon and hydrogen as main components, hardness increases, abrasion resistance is excellent, and a sliding film having a low friction coefficient is obtained. There is. However, when examining the conventional findings, S
The hardness of the amorphous hard carbon film before addition such as i is as low as Hv800, and not as high as Hv2000 or higher. The inventors of the present invention have studied the amorphous hard carbon film having such a high hardness, and (a) the wear resistance changes greatly depending on the amount of silicon added; (b) the amount of silicon added is 5 at%. If it exceeds, the hardness decreases and the wear resistance deteriorates; such an amorphous hard carbon film containing carbon and hydrogen as main components and a small amount of silicon has poor adhesion to an iron-based substrate. I found a problem. Therefore, the present invention is a non-stick material excellent in adhesion resistance, scuff resistance, and adhesion without impairing the excellent wear resistance of the high hardness amorphous hard carbon coating with aluminum or aluminum alloy as the counterpart material. An object is to provide a crystalline hard carbon film and a sliding member using the same.

【0012】[0012]

【課題を解決するための手段】本発明は前記課題を解決
すべくなされたもので、本発明に係る非晶質硬質炭素皮
膜は、炭素と水素を主成分とする非晶質硬質炭素皮膜で
あって、該非晶質硬質炭素皮膜中の水素含有量が30〜
50at%であり、水素を除いた残りの組成で炭素が9
0at%以上であり、珪素が5at%未満であり、珪素
炭化物を含有することを特徴とする。また本発明に係る
摺動部材は、基材と、該基材部表面に形成した中間層
と、該中間層上に形成された炭素と水素を主成分とする
非晶質硬質炭素皮膜であって、該非晶質硬質炭素皮膜中
の水素含有量が30〜50at%であり、水素を除いた
残りの組成で炭素が90at%以上であり、珪素が5a
t%未満であり、珪素炭化物を含有する非晶質硬質炭素
皮膜と、からなる。
The present invention has been made to solve the above problems, and an amorphous hard carbon film according to the present invention is an amorphous hard carbon film containing carbon and hydrogen as main components. And the hydrogen content in the amorphous hard carbon coating is 30 to
It is 50 at% and carbon is 9 in the remaining composition except hydrogen.
It is characterized in that it is 0 at% or more, silicon is less than 5 at%, and contains silicon carbide. Further, the sliding member according to the present invention is a substrate, an intermediate layer formed on the surface of the substrate, and an amorphous hard carbon film mainly composed of carbon and hydrogen formed on the intermediate layer. The amorphous hard carbon film has a hydrogen content of 30 to 50 at%, and the remaining composition excluding hydrogen is 90 at% or more of carbon and 5 a of silicon.
and an amorphous hard carbon coating containing silicon carbide.

【0013】本発明に係る非晶質硬質炭素皮膜は鉄系基
材との密着性に優れ、珪素含有アルミニウム合金を相手
材とした場合の耐スカッフ性、耐摩耗性を両立させたも
のである。皮膜中の水素含有量はERDA(Elastic Recoil
Detection Analysis)により測定でき、低摩擦係数、
耐アルミニウム凝着性の点から30〜50at%が好ま
しい。水素を除いた組成および結合状態はESCA(Electro
n Spectroscopy for Chemical Analysis)により測定可
能で、珪素は炭素と結合し主としてSiCなどの炭化物
として存在し、その含有量(水素を除いた全成分を10
0とした含有量、以下同じ)は珪素含有アルミニウム合
金材相手の耐スカッフ性と耐摩耗性を両立させる点から
5at%未満(0%を除く)とすることが必要であり、
2〜4at%とすることが好ましい。水素を除いた全成
分は上記のC,Siの他に原料の不純物もしくは成膜中
の随伴元素であるO,Feなどである。
The amorphous hard carbon coating according to the present invention has excellent adhesion to an iron-based substrate and has both scuff resistance and wear resistance when a silicon-containing aluminum alloy is used as a mating material. . The hydrogen content in the coating is ERDA (Elastic Recoil
Detection Analysis), low friction coefficient,
From the viewpoint of aluminum adhesion resistance, 30 to 50 at% is preferable. The composition and bonding state excluding hydrogen are ESCA (Electro
It can be measured by n Spectroscopy for Chemical Analysis), and silicon is present mainly as carbides such as SiC by combining with carbon, and its content (total components except hydrogen is 10%).
The content of 0, the same below) must be less than 5 at% (excluding 0%) from the viewpoint of achieving both scuff resistance and wear resistance of the silicon-containing aluminum alloy material partner,
It is preferably set to 2 to 4 at%. In addition to C and Si described above, all components except hydrogen are impurities of raw materials or O and Fe which are accompanying elements during film formation.

【0014】上記非晶質硬質炭素皮膜を成膜した摺動部
材においては基材との十分な密着性を確保するために
は、珪素、クロム、タングステン、チタンおよびそれら
の合金およびそれらの炭化物からなる群から選ばれた中
間層を使用すると良い。特に鉄系基材の場合にはクロ
ム、チタンなどが好適である。尚、基材には通常鉄系合
金を使用する。本発明の非晶質硬質炭素皮膜をコンプレ
ッサ用ベーンなどに適用する場合にはSKH51材に焼
き入れ焼き戻し熱処理を行ったものを使用することがで
きる。また燃料噴射ポンプ用プランジャなどの場合には
SKD11材、SUJ2材に焼き入れ焼き戻し熱処理を
行ったものを使用することができる。また本発明の非晶
質硬質炭素皮膜をピストンリングに適用する場合には炭
素鋼、ばね鋼やSUS440B材などを基材として使用
することができる。さらに基材表面に窒化層、Crめっ
き皮膜、窒化クロム、窒化チタンなどの皮膜が形成され
たものでも良い。
In order to secure sufficient adhesion to the base material in the sliding member having the above amorphous hard carbon film formed thereon, silicon, chromium, tungsten, titanium and their alloys and their carbides are used. It is preferable to use an intermediate layer selected from the group consisting of Particularly, in the case of an iron-based base material, chromium, titanium and the like are suitable. An iron alloy is usually used as the base material. When the amorphous hard carbon film of the present invention is applied to a compressor vane or the like, a SKH51 material that has been subjected to quenching and tempering heat treatment can be used. Further, in the case of a fuel injection pump plunger or the like, a SKD11 material or SUJ2 material that has been subjected to quenching and tempering heat treatment can be used. Further, when the amorphous hard carbon coating of the present invention is applied to the piston ring, carbon steel, spring steel, SUS440B material or the like can be used as the base material. Further, a material having a nitride layer, a Cr plating film, a film of chromium nitride, titanium nitride or the like formed on the surface of the substrate may be used.

【0015】また本発明に係る非晶質硬質炭素皮膜中で
珪素は主としてSiCなどの炭化物として存在するが、
成膜中に微量の酸素を添加することにより、珪素の一部
がSiOxなどの酸化物となることがESCA分析により確
認できる。このようにして生成された珪素酸化物が存在
した方が相手材との摺動において摩擦係数が小さく、安
定する。皮膜中に含まれる珪素が摺動により表面に露出
すると、摩擦熱により周囲の雰囲気と反応して珪素酸化
物が生成される。表面で珪素酸化物が形成されるまでの
間、摩擦係数は不安定となるが、あらかじめ膜中に珪素
酸化物が適量含有されている場合にはこのような摩擦係
数の不安定な挙動は軽減される。このような観点から珪
素炭化物と珪素酸化物の比率を適当に調整し、良好な摺
動特性を得るためには、酸素添加量は0.5〜2at%
が好ましい。
In the amorphous hard carbon film according to the present invention, silicon mainly exists as carbides such as SiC,
It can be confirmed by ESCA analysis that a part of silicon becomes an oxide such as SiOx by adding a slight amount of oxygen during the film formation. The presence of the silicon oxide thus generated has a smaller friction coefficient and becomes stable in sliding with the mating material. When silicon contained in the film is exposed on the surface by sliding, frictional heat reacts with the surrounding atmosphere to generate silicon oxide. The friction coefficient becomes unstable until silicon oxide is formed on the surface, but if the film contains a proper amount of silicon oxide in advance, such unstable behavior of the friction coefficient is reduced. To be done. From this point of view, in order to properly adjust the ratio of silicon carbide and silicon oxide and obtain good sliding characteristics, the amount of oxygen added is 0.5 to 2 at%.
Is preferred.

【0016】本発明に係る非晶質硬質炭素皮膜の厚さは
特に制限されず一般には0.5〜10μmが好ましい。
The thickness of the amorphous hard carbon coating according to the present invention is not particularly limited, and generally 0.5 to 10 μm is preferable.

【0017】[0017]

【作用】非晶質硬質炭素皮膜の組成が決定された場合、
その硬度は炭素原子どうしの結合状態により左右され、
Hv2000〜6000の範囲で変動する。この範囲の高
硬度非晶質硬質炭素膜にSiを5at%強添加すると、
皮膜の性質は金属炭化物による影響を受けて、硬度はHv
1500以下に減少する。しかしながらSi添加量を5
at%未満とすると、硬度の低下は僅かであり、上記硬
度範囲は実質的に維持され、しかも耐凝着性、耐焼き付
き性および密着性は著しく改善される。
[Function] When the composition of the amorphous hard carbon film is determined,
Its hardness depends on the bonding state of carbon atoms,
It varies in the range of Hv2000 to 6000. If Si is added to the high hardness amorphous hard carbon film in this range in an amount of 5 at% or more,
The properties of the coating are affected by metal carbides, and the hardness is Hv
Reduced to 1500 or less. However, the amount of Si added should be 5
When the content is less than at%, the hardness is slightly reduced, the above hardness range is substantially maintained, and the adhesion resistance, seizure resistance and adhesion are remarkably improved.

【0018】[0018]

【実施例】以下、図面に示す実施例についてさらに詳細
に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments shown in the drawings will be described in more detail below.

【0019】図1は本発明に係る非晶質硬質炭素皮膜を
表面に形成した摺動部材の断面を模式的に示したもので
ある。基材1上に密着性を確保するため珪素、クロム、
タングステン、チタンおよびそれらの合金およびそれら
の炭化物からなる群から選ばれたものを中間層2として
好ましくは0.3〜1μmの厚さに形成する。さらにそ
の上に炭素と水素を主成分とし、水素含有量が30〜5
0at%であり、水素を除いた残りの組成で炭素が90
at%以上であり、珪素が5at%未満であり、珪素炭
化物を含有する非晶質硬質炭素皮膜3を形成する。
FIG. 1 schematically shows a cross section of a sliding member having an amorphous hard carbon film according to the present invention formed on the surface thereof. Silicon, chromium,
A material selected from the group consisting of tungsten, titanium, their alloys, and their carbides is formed as the intermediate layer 2 preferably to a thickness of 0.3 to 1 μm. Furthermore, the main components are carbon and hydrogen, and the hydrogen content is 30-5.
It is 0 at% and carbon is 90 in the remaining composition except hydrogen.
At least at% and less than 5 at% of silicon, the amorphous hard carbon film 3 containing silicon carbide is formed.

【0020】基材1としてSKH51材を使用し、RF
マグネトロンスパッタリング法によりCr中間層2を形
成し、その後プラズマCVD法により高硬度、低摩擦係
数を呈し、さらに耐アルミニウム凝着性、耐摩耗性に優
れた非晶質硬質炭素皮膜3を形成する。真空チャンバー
11(図2)の中央に配設した回転機構(図示せず)付
きの基板ホルダー12上に試料13(材質SKH51)
を置き、真空チャンバー11内を排気口14に接続され
た真空ポンプ(図示せず)により、到達真空度9.3E
−5Pa(7.0E−7torr)まで排気する。
SKH51 material is used as the base material 1 and RF
A Cr intermediate layer 2 is formed by a magnetron sputtering method, and then an amorphous hard carbon film 3 having a high hardness and a low friction coefficient and having excellent aluminum adhesion resistance and abrasion resistance is formed by a plasma CVD method. A sample 13 (material SKH51) is placed on a substrate holder 12 with a rotation mechanism (not shown) arranged in the center of the vacuum chamber 11 (FIG. 2).
And a vacuum pump (not shown) connected to the exhaust port 14 inside the vacuum chamber 11 achieves an ultimate vacuum of 9.3E.
Exhaust to -5 Pa (7.0E-7 torr).

【0021】次にガス導入口よりアルゴンガスを所定流
量導入して真空チャンバー11内の圧力を0.665P
a(5mtorr)に調整する。そして基板ホルダー1
2に接続したバイアス電源19から試料13に13.5
6MHzの高周波電力(RF電力)を印加して、プラズ
マ放電を励起する。このようにして励起されたアルゴン
イオンのイオン衝撃による試料13のクリーニングを行
う。
Next, a predetermined flow rate of argon gas is introduced from the gas inlet to adjust the pressure in the vacuum chamber 11 to 0.665P.
Adjust to a (5 mtorr). And board holder 1
13.5 from the bias power source 19 connected to 2 to the sample 13
A high frequency power (RF power) of 6 MHz is applied to excite the plasma discharge. The sample 13 is cleaned by the ion bombardment of the argon ions thus excited.

【0022】次にアルゴンガスの流量を増やして圧力を
1.33Paに調整した後、シャッター18を閉じた状
態でクロムターゲット17にターゲットバイアス電源1
6からRF電力を印加してプリスパッタを所定時間行
い、シャッター18を開けて試料13の表面に厚さ0.
3μm程度のクロム中間層2を形成する。クロム中間層
2形成後はシャッター18を閉じて、アルゴンガスを止
める。
Next, after increasing the flow rate of the argon gas to adjust the pressure to 1.33 Pa, the target bias power source 1 is applied to the chromium target 17 with the shutter 18 closed.
6, RF power is applied to perform pre-sputtering for a predetermined time, the shutter 18 is opened, and the thickness of the surface of the sample 13 is reduced to 0.
A chromium intermediate layer 2 having a thickness of about 3 μm is formed. After forming the chromium intermediate layer 2, the shutter 18 is closed to stop the argon gas.

【0023】次に真空チャンバー11内にアセチレン
(C22)ガス、テトラメチルシラン(TMS)ガスを
分圧比でC22:TMS=1:0〜1:1にて導入し、
圧力を1.33Pa(10mtorr)に調整する。こ
の状態で基板ホルダー12を介してバイアス電源19か
ら試料13にRF電力を印加し、プラズマを発生させ分
解したイオンにより非晶質炭素皮膜を形成する。このと
きアセチレンとテトラメチルシランの流量比を調整し
て、Si/(Si+C)比を調整する。皮膜の水素含有
量はERDA分析から36.5〜43.5at%であ
り、水素を除いた炭素含有量はESCA分析から90〜
98at%であった。また成膜時にアセチレン、テトラ
メチルシランに加えて酸素を数sccm程度微量導入す
ることにより珪素炭化物と珪素酸化物の両方を含有する
非晶質硬質炭素皮膜とすることができる。
Next, acetylene (C 2 H 2 ) gas and tetramethylsilane (TMS) gas are introduced into the vacuum chamber 11 at a partial pressure ratio of C 2 H 2 : TMS = 1: 0 to 1: 1.
Adjust the pressure to 1.33 Pa (10 mtorr). In this state, RF power is applied to the sample 13 from the bias power source 19 through the substrate holder 12 to generate plasma and form an amorphous carbon film by the decomposed ions. At this time, the Si / (Si + C) ratio is adjusted by adjusting the flow rate ratio of acetylene and tetramethylsilane. The hydrogen content of the coating is 36.5-43.5 at% according to ERDA analysis, and the carbon content excluding hydrogen is 90-from ESCA analysis.
It was 98 at%. Further, by introducing a small amount of oxygen at about several sccm in addition to acetylene and tetramethylsilane during film formation, an amorphous hard carbon film containing both silicon carbide and silicon oxide can be obtained.

【0024】表1は原料ガス中のSi、Cの割合と、ES
CA分析による珪素含有量、硬度、耐摩耗性、耐アルミニ
ウム凝着性の関係について示したものである。なお、耐
摩耗性は後述のピンオンディスク試験(相手材−A39
0)、耐アルミニウム凝着性は後述のピンオンディスク
試験で行った。
Table 1 shows the ratio of Si and C in the source gas and ES
It shows the relationship among silicon content, hardness, wear resistance and aluminum adhesion resistance by CA analysis. The wear resistance is measured by the pin-on-disk test (counterpart material-A39
0), the aluminum adhesion resistance was measured by the pin-on-disc test described later.

【0025】[0025]

【表 1】 【table 1】

【0026】図2はアセチレン、テトラメチルシランを
原料としたRFプラズマCVD法により生成した場合の
原料ガス中のSi/(Si+C)比と摩耗試験時の摩耗
体積の関係を示したものである。摩擦摩耗試験はピンオ
ンディスク試験法により行い、SUS440B相当材を
ガス窒化したピン先端を半径20mmの曲率(断面は
3.5mm×5mm)で鏡面仕上げした表面に非晶質硬
質炭素皮膜を形成し、珪素を高濃度に含有する過共晶ア
ルミニウム−珪素―銅系合金A390材(AA規格 S
i16.0〜18.0、Cu4.0〜5.0、Fe0.
5以下、Mn0.5以下、Mg0.45〜0.65、Z
n0.1以下、Ti0.2以下、その他各0.1以下で
計0.2以下 残部Al(wt%))のディスクを相手
材とし、荷重98.1N、周速0.5m/sec、摺動
径100mmで240分間行った。潤滑は100℃に加
熱したモーターオイルP20(ベースオイル)を使用し
た。
FIG. 2 shows the relationship between the Si / (Si + C) ratio in the raw material gas and the wear volume in the wear test when the material was produced by the RF plasma CVD method using acetylene or tetramethylsilane as the raw material. The friction and wear test is carried out by the pin-on-disc test method. An amorphous hard carbon film is formed on the surface of the pin, which is obtained by gas nitriding a material equivalent to SUS440B, and is mirror-finished with a radius of curvature of 20 mm (cross section 3.5 mm x 5 mm) , A hypereutectic aluminum-silicon-copper alloy A390 material containing a high concentration of silicon (AA standard S
i16.0 to 18.0, Cu4.0 to 5.0, Fe0.
5 or less, Mn 0.5 or less, Mg 0.45 to 0.65, Z
n 0.1 or less, Ti 0.2 or less, other 0.1 or less, total 0.2 or less, balance Al (wt%) disk as a mating material, load 98.1 N, peripheral speed 0.5 m / sec, sliding It was carried out for 240 minutes at a radius of 100 mm. For lubrication, motor oil P20 (base oil) heated to 100 ° C. was used.

【0027】図2から実施例1によるSi/(Si+
C)=約4%付近で摩耗体積は極小となり、皮膜硬度は
Hv2500程度である。Si/(Si+C)比が4%以
下では皮膜硬度は高いが応力が大きいため、自己破壊的
に摩耗が進む。比較例1のSi/(Si+C)比=10
%の場合には皮膜硬度がHv1500と低下するため摩耗
体積も増加する。さらに比較例2でSi/(Si+C)
比=15%の場合にはさらに皮膜硬度がHv1000程度
まで下がるため摩耗体積はさらに増大する。
From FIG. 2, Si / (Si + according to the first embodiment
C) = around 4%, the wear volume becomes minimal and the film hardness is
It is about Hv 2500. When the Si / (Si + C) ratio is 4% or less, the film hardness is high but the stress is large, so that the wear progresses in a self-destructive manner. Si / (Si + C) ratio of Comparative Example 1 = 10
%, The coating hardness decreases to Hv1500, and the wear volume also increases. Furthermore, in Comparative Example 2, Si / (Si + C)
When the ratio is 15%, the coating hardness further decreases to around Hv1000, and the wear volume further increases.

【0028】図3はA390材を相手材とした場合のス
カッフ試験の結果について示したものである。スカッフ
試験はピンオンディスク試験法により行い、SKH51
材のピン先端を半径20mmの曲率(断面は3.5mm
×5mm)で鏡面仕上げした表面に非晶質硬質炭素皮膜
を形成し、アルミニウム合金材料であるA390材のデ
ィスクを相手材とし、周速8m/secで初期荷重1M
Paから0.2MPaステップ(30秒保持)で昇圧さ
せて行った。尚、潤滑は100℃に加熱したモーターオ
イルP20(ベースオイル)を使用した。珪素含有量が
4at%の実施例1では23MPa付近まで摩擦係数の
増加はみられず、スカッフが発生していない。珪素含有
量が5at%の比較例1では約17MPa付近で摩擦係
数は増加し、スカッフが発生している。さらに珪素含有
量が25at%と多い比較例2では約13MPa付近で
スカッフが発生する。したがって、珪素含有量が4at
%と少ない方が耐摩耗性と耐スカッフ性の両方の特性が
優れていることがわかる。
FIG. 3 shows the results of the scuffing test when the A390 material was used as the mating material. The scuff test is performed by the pin-on-disk test method, and SKH51
The tip of the material pin has a radius of curvature of 20 mm (cross section is 3.5 mm
X 5 mm) to form an amorphous hard carbon film on the mirror-finished surface, using a disc of aluminum alloy material A390 as a mating material, and an initial load of 1 M at a peripheral speed of 8 m / sec.
The pressure was increased from Pa in 0.2 MPa steps (holding for 30 seconds). For lubrication, motor oil P20 (base oil) heated to 100 ° C. was used. In Example 1 in which the silicon content was 4 at%, no increase in the friction coefficient was observed up to around 23 MPa, and scuffing did not occur. In Comparative Example 1 in which the silicon content is 5 at%, the friction coefficient increases and scuffing occurs at around 17 MPa. Furthermore, in Comparative Example 2 in which the silicon content is as high as 25 at%, scuffing occurs around 13 MPa. Therefore, the silicon content is 4 at
It can be seen that the smaller the percentage, the better the wear resistance and scuff resistance.

【0029】図3の比較例3は非晶質硬質炭素皮膜を形
成していない未処理のSKH51材のスカッフ特性を示
したものであるが、9MPa付近の低面圧で摩擦係数が
急増し、スカッフが発生していることがわかる。また比
較例4はアークイオンプレーティング法により形成した
CrN皮膜であるが、図3中に示したスカッフ特性は約
10MPa付近でスカッフが発生しており、珪素含有量
25at%の比較例2と同等の荷重でスカッフが発生し
ていることがわかる。
Comparative Example 3 in FIG. 3 shows the scuffing characteristics of the untreated SKH51 material on which the amorphous hard carbon coating is not formed. The friction coefficient sharply increases at a low surface pressure near 9 MPa, It can be seen that scuffing has occurred. Comparative Example 4 is a CrN film formed by the arc ion plating method, but the scuffing characteristic shown in FIG. 3 has scuffing at around 10 MPa, which is equivalent to Comparative Example 2 having a silicon content of 25 at%. It can be seen that the scuff is generated under the load.

【0030】表2は珪素含有量を4at%とした場合の
酸素添加量の影響について示したものである。酸素添加
しない実施例1の場合にはオイル中での摩擦係数は0.
11程度とやや大きいが酸素を0.5at%添加した実施
例2の場合には硬度はHv1500程度に低下し、耐摩耗
性は若干悪くなるが、スカッフ発生荷重は18MPa程
度あり良好であり、摩擦係数も0.07と若干下がる。
さらに酸素を2at%添加した実施例3では摩耗体積は
増加するものの、スカッフ発生荷重は14MPa程度あ
り、摩擦係数は0.05と下がる。したがって適量の珪
素を含有させた非晶質硬質炭素皮膜に0.5〜2at%
程度の酸素を添加すると耐摩耗性、耐スカッフ性に優
れ、摩擦係数の小さな皮膜とすることができる。
Table 2 shows the influence of the oxygen addition amount when the silicon content is 4 at%. In the case of Example 1 in which oxygen was not added, the friction coefficient in oil was 0.
In the case of Example 2 in which 0.5 at% oxygen was added, the hardness was reduced to about Hv1500 and the wear resistance was slightly deteriorated, but the scuffing load was about 18 MPa and the friction was good. The coefficient also decreases slightly to 0.07.
Further, in Example 3 in which 2 at% of oxygen is added, the wear volume increases, but the scuffing load is about 14 MPa, and the friction coefficient decreases to 0.05. Therefore, 0.5 to 2 at% is applied to the amorphous hard carbon coating containing a proper amount of silicon.
By adding a certain amount of oxygen, a film having excellent wear resistance and scuffing resistance and a small friction coefficient can be formed.

【0031】[0031]

【表 2】 [Table 2]

【0032】表3は中間層によるSKH51基材へ前述
の実施例1と同様の非晶質硬質炭素皮膜を形成し、スク
ラッチ試験により臨界荷重値で密着性を評価したもので
ある。スパッタリングによるクロム中間層を適用した実
施例4やチタン中間層を適用した実施例5では中間層な
しの比較例5に比べ臨界荷重値の値が大きく密着性が高
いことがわかる。
Table 3 shows the results obtained by forming an amorphous hard carbon coating similar to that of the above-mentioned Example 1 on the SKH51 substrate with the intermediate layer and evaluating the adhesion by the critical load value by the scratch test. It can be seen that in Example 4 in which the chromium intermediate layer by sputtering and Example 5 in which the titanium intermediate layer is applied, the critical load value is larger and the adhesion is higher than in Comparative Example 5 without the intermediate layer.

【0033】[0033]

【表 3】 [Table 3]

【0034】[0034]

【発明の効果】珪素添加量を5at%未満に調整した非
晶質硬質炭素皮膜で表面を被覆した摺動部材は、アルミ
ニウム材料や珪素含有アルミニウム合金などの材料に対
して摺動させると、スカッフ発生荷重が高くなり、焼き
付きにくくなり、耐摩耗性にも優れる。さらに、本発明
の非晶質硬質炭素皮膜は鉄系基材に対する密着性がすぐ
れる。また、酸素添加量を0.5〜2at%とすること
により摩擦係数を低減することができる。さらにスパッ
タリングによるクロム、チタン中間層を適用することに
より、鉄系基材への密着性を高めることができる。
EFFECTS OF THE INVENTION A sliding member whose surface is coated with an amorphous hard carbon film in which the amount of silicon added is adjusted to less than 5 at% has a scuffing property when slid against a material such as an aluminum material or a silicon-containing aluminum alloy. The generated load is high, it is difficult to seize, and it has excellent wear resistance. Furthermore, the amorphous hard carbon coating of the present invention has excellent adhesion to iron-based substrates. Further, the coefficient of friction can be reduced by setting the amount of oxygen added to 0.5 to 2 at%. Further, by applying an intermediate layer of chromium and titanium by sputtering, it is possible to improve the adhesion to the iron-based base material.

【0035】以上述べたように本発明に係る非晶質硬質
炭素皮膜は純アルミニウムやアルミニウム合金を相手材
に対して耐摩耗性と耐スカッフ性を両立させることが可
能となる。実施例中では相手材が過共晶アルミニウム−
珪素−銅合金であるA390について示したが、亜共晶
アルミニウム−珪素−銅系合金であるADC10,12
などの場合にも本発明による非晶質硬質皮膜は同様の効
果が期待できる。
As described above, the amorphous hard carbon coating according to the present invention makes it possible to achieve both wear resistance and scuff resistance with respect to the mating material of pure aluminum or aluminum alloy. In the examples, the mating material was hypereutectic aluminum-
Although A390 which is a silicon-copper alloy is shown, ADC10, 12 which is a hypoeutectic aluminum-silicon-copper alloy is used.
In such cases, the amorphous hard coating according to the present invention can be expected to have the same effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】本発明の非晶質硬質炭素皮膜の耐摩耗性につい
て示した図である。
FIG. 2 is a diagram showing the wear resistance of the amorphous hard carbon coating of the present invention.

【図3】本発明の非晶質硬質炭素皮膜の耐スカッフ性に
ついて示した図である。
FIG. 3 is a diagram showing scuff resistance of the amorphous hard carbon coating of the present invention.

【図4】本発明の非晶質硬質炭素皮膜を形成するための
装置図である。
FIG. 4 is an apparatus diagram for forming an amorphous hard carbon film of the present invention.

【符号の説明】[Explanation of symbols]

1・・・基材 2・・・中間層 3・・・非晶質硬質炭素皮膜 11・・・真空チャンバー 12・・・基板ホルダー 13・・・試料 14・・・排気口 15・・・ガス導入口 16・・・ターゲットバイアス電源 17・・・ターゲット 18・・・シャッター 1 ... Base material 2 ... Middle layer 3 ... Amorphous hard carbon film 11 ... Vacuum chamber 12 ... Board holder 13 ... Sample 14 ... Exhaust port 15 ... Gas inlet 16 ... Target bias power supply 17 ... Target 18 ... Shutter

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3J011 QA04 SB12 SB13 SB14 SE02 3J044 AA02 BB19 BB28 BB30 BB33 BC06 4K029 AA02 BA02 BA07 BA17 BB02 BD04 DC39 FA01 4K030 BA27 BA28 CA02 FA01 HA04 LA01 LA23    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 3J011 QA04 SB12 SB13 SB14 SE02                 3J044 AA02 BB19 BB28 BB30 BB33                       BC06                 4K029 AA02 BA02 BA07 BA17 BB02                       BD04 DC39 FA01                 4K030 BA27 BA28 CA02 FA01 HA04                       LA01 LA23

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】炭素と水素を主成分とする非晶質硬質炭素
皮膜において、該非晶質硬質炭素皮膜中の水素含有量が
30〜50at%であり、水素を除いた残りの組成で炭
素が90at%以上であり、珪素が5at%未満であり、
珪素炭化物を含有することを特徴とする非晶質硬質炭素
皮膜。
1. An amorphous hard carbon film containing carbon and hydrogen as main components, wherein the hydrogen content in the amorphous hard carbon film is 30 to 50 at%, and carbon remains in the remaining composition except hydrogen. 90 at% or more, silicon is less than 5 at%,
An amorphous hard carbon film containing silicon carbide.
【請求項2】基材と、該基材摺動部表面に形成した中間
層と、該中間層上に形成した炭素と水素を主成分とする
非晶質硬質炭素皮膜であって、該非晶質硬質炭素皮膜中
の水素含有量が30〜50at%であり、水素を除いた
残りの組成で炭素が90at%以上であり、珪素が5a
t%未満であり、珪素炭化物を含有する非晶質硬質炭素
皮膜と、からなる摺動部材。
2. A base material, an intermediate layer formed on the surface of a sliding portion of the base material, and an amorphous hard carbon film mainly composed of carbon and hydrogen formed on the intermediate layer, the amorphous hard carbon film comprising: The hydrogen content in the hard carbon coating is 30 to 50 at%, the remaining composition excluding hydrogen is 90 at% or more of carbon, and the silicon content is 5 a.
A sliding member comprising an amorphous hard carbon film containing less than t% and containing silicon carbide.
【請求項3】炭素と水素を主成分とする非晶質硬質炭素
皮膜において、該非晶質硬質炭素皮膜中の水素含有量が
30〜50at%であり、水素を除いた残りの組成で炭
素が90at%以上であり、珪素が5at%未満であ
り、酸素が0.5〜2at%であり、珪素炭化物および
珪素酸化物を含有することを特徴とする非晶質硬質炭素
皮膜。
3. An amorphous hard carbon film containing carbon and hydrogen as main components, wherein the hydrogen content in the amorphous hard carbon film is 30 to 50 at%, and carbon remains in the remaining composition excluding hydrogen. 90 at% or more, silicon is less than 5 at%, oxygen is 0.5 to 2 at%, and a silicon carbide and a silicon oxide are contained, and an amorphous hard carbon film is characterized.
【請求項4】基材と、該基材摺動部表面に形成した中間
層と、該中間層上に形成した炭素と水素を主成分とする
非晶質硬質炭素皮膜であって、該非晶質硬質炭素皮膜中
の水素含有量が30〜50at%であり、水素を除いた
残りの組成で炭素が90at%以上であり、珪素が5a
t%未満であり、酸素が0.5〜2at%であり、珪素
炭化物および珪素酸化物を含有する非晶質硬質炭素皮膜
と、からなる摺動部材。
4. A base material, an intermediate layer formed on the surface of a sliding portion of the base material, and an amorphous hard carbon film mainly composed of carbon and hydrogen formed on the intermediate layer, the amorphous hard carbon film comprising: The hydrogen content in the hard carbon coating is 30 to 50 at%, the remaining composition excluding hydrogen is 90 at% or more of carbon, and the silicon content is 5 a.
A sliding member comprising an amorphous hard carbon film containing less than t%, oxygen of 0.5 to 2 at%, and containing silicon carbide and silicon oxide.
【請求項5】前記中間層が珪素、クロム、タングステ
ン、チタンおよびそれらの合金およびそれらの炭化物か
らなる群から選ばれたものであることを特徴とする請求
項2または4記載の摺動部材。
5. The sliding member according to claim 2, wherein the intermediate layer is selected from the group consisting of silicon, chromium, tungsten, titanium, alloys thereof, and carbides thereof.
JP2002100725A 2002-04-03 2002-04-03 Amorphous hard carbon film and sliding member using the same Pending JP2003293136A (en)

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