JP2003215606A - Liquid crystal display and manufacturing method for the liquid crystal display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a liquid crystal display which can be improved in manufacture yield and has superior display quality and a manufacturing method for the liquid crystal display. <P>SOLUTION: This liquid crystal display has a liquid crystal display panel having a liquid crystal composition held between a couple of substrates. One substrate has a liquid crystal injection hole region 32 for injecting the liquid crystal composition between the couple of substrates. The liquid crystal injection region 32 comprises a 1st region 131 where color filter layers of a plurality of colors are exposed and a 2nd region 132 formed of a black resist layer. The 1st region 131R comprises a red region 131 where a red color filter layer is exposed, a green region 131G where a green color filter layer is exposed, and a blue region 131B where a blue color filter layer is exposed. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing a liquid crystal display device, and more particularly, to a color liquid crystal display having a light shielding layer that shields a peripheral region along an outer periphery of a display region for displaying an image. The present invention relates to a device and a method for manufacturing the liquid crystal display device.

[0002]

2. Description of the Related Art At present, a liquid crystal display device of active matrix drive which is generally used is, for example, a thin film transistor (TFT) having a semiconductor layer of amorphous silicon (a-Si) and a pixel electrode connected to the TFT. And an opposing substrate provided with a counter electrode arranged to face the array substrate, a color filter layer, and the like, and a liquid crystal composition is sandwiched between the two substrates. Has been done.

The array substrate and the counter substrate are fixed around their periphery by an adhesive applied except the liquid crystal injection port. The liquid crystal injection port is sealed with a sealant. Spacers are arranged between these substrates,
The gap between the substrates is kept constant.

Among these, the liquid crystal display device for color display is
In a display region for displaying an image, a color filter layer including red (R), green (G), and blue (B) colored layers arranged for each pixel of one of the two glass substrates is provided. ing.

In these liquid crystal display devices, a light shielding layer is provided in the light shielding area around the display area. This light-shielding layer is often provided on a substrate having a color filter layer. In particular, by providing both the color filter layer and the light shielding layer on the array substrate, it is possible to improve the aperture ratio of the pixel portion and obtain a liquid crystal display device with high transmittance.

As described above, in the structure in which the color filter layer and the light shielding layer are provided on the same substrate, the black resist is processed by the photolithography process to form the light shielding layer.

[0007]

However, in order to secure a sufficient light-shielding property, the light-shielding layer provided in the light-shielding region is
The film thickness is thick. The liquid crystal injection port region where the liquid crystal injection port is provided is included in the light blocking region. However, when the liquid crystal injection port region is also formed of the same light blocking layer to secure sufficient light blocking property, the liquid crystal injection port region is also formed. The cross-sectional area of is extremely small. For this reason, the time required to inject the liquid crystal composition becomes long, resulting in a decrease in manufacturing yield.

On the other hand, when the liquid crystal inlet region is formed of the blue color filter layer having the lowest transmittance among the color filter layers, the blue color filter layers and the black resist layers are alternately arranged. In this case, the liquid crystal injection port region appears to be colored blue, which causes a problem of reduced visibility.

As described above, when the liquid crystal injection port region included in the light-shielding region is formed of the black resist layer like other light-shielding regions, there arises a problem that the manufacturing yield is lowered. Further, when the liquid crystal injection port region is formed of only the blue color filter layer or the blue color filter layer and the black resin resist layer, the problem that the visibility of the light shielding region is deteriorated is caused.

Therefore, the present invention has been made in view of the above-mentioned problems, and an object thereof is to improve the manufacturing yield and to provide a liquid crystal display device having excellent display quality and a liquid crystal display device of this liquid crystal display device. It is to provide a manufacturing method.

[0011]

A liquid crystal display device according to a first aspect of the present invention is a liquid crystal display device constituted by sandwiching a liquid crystal composition between a pair of substrates, wherein one of the pair of substrates is provided. Substrate is provided with a liquid crystal injection port region for injecting the liquid crystal composition between the pair of substrates, the liquid crystal injection port region having a first region exposing color filter layers of a plurality of colors, and a black resist. And a second region composed of layers.

A method of manufacturing a liquid crystal display device according to a second aspect of the present invention is the method of manufacturing a liquid crystal display device, wherein a liquid crystal composition is sandwiched between a pair of substrates. Forming a display area for displaying an image on the substrate, and forming a light-shielding area arranged along the outer periphery of the display area, and injecting the liquid crystal composition between the pair of substrates. The liquid crystal inlet area for
In the display area forming step, a first area exposing the color filter layers of a plurality of colors is formed, and in the light shielding area forming step, a second area made of a black resist layer is formed. And

[0013]

DETAILED DESCRIPTION OF THE INVENTION A liquid crystal display device according to an embodiment of the present invention and a method of manufacturing the liquid crystal display device will be described below with reference to the drawings.

A liquid crystal display device according to an embodiment of the present invention, for example, an active matrix type liquid crystal display device includes a liquid crystal display panel 10.

(First Embodiment) That is, the liquid crystal display panel 10 according to the first embodiment, as shown in FIGS. 1 and 2, includes an array substrate 100 and the array substrate 10.
Counter substrate 200 and array substrate 10 which are arranged to face each other.
0 and the liquid crystal composition 30 disposed between the counter substrate 200
It has 0 and. In such a liquid crystal display panel 10, the display area 102 for displaying an image is the array substrate 1
00 and the counter substrate 200 are formed in a region surrounded by the outer edge seal member 106. The peripheral region 104 along the outer periphery of the display region 102 has a light-shielding region formed in a frame shape.

In the display area 102, the array substrate 10
0 is m arranged in a matrix as shown in FIG.
× n pixel electrodes 151, m scanning lines Y1 to Ym formed along the row direction of these pixel electrodes 151, and n signal lines X1 to X1 formed along the column direction of these pixel electrodes 151. Xn, m × n thin film transistors, that is, pixel TFTs 121 arranged as switching elements near the intersections of the scanning lines Y1 to Ym and the signal lines X1 to Xn, corresponding to the m × n pixel electrodes 151. .

In the peripheral area 104, the array substrate 100 includes the scanning line driving circuit 18 for driving the scanning lines Y1 to Ym and the signal line driving circuit 1 for driving the signal lines X1 to Xn.
9 and so on.

As shown in FIG. 2, the liquid crystal capacitance CL is formed by the pixel electrode 151, the counter electrode 204, and the liquid crystal layer 300 sandwiched between these electrodes. Further, the auxiliary capacitance Cs is electrically formed in parallel with the liquid crystal capacitance CL. The auxiliary capacitance Cs is formed by a pair of electrodes, which are opposed to each other via an insulating film, that is, the auxiliary capacitance electrode 61 having the same potential as the pixel electrode 151, and the auxiliary capacitance line 52 set to a predetermined potential. .

This liquid crystal display device, as shown in FIG.
A transmissive liquid crystal display panel 10 in which a liquid crystal composition 300 is sandwiched between an array substrate 100 and a counter substrate 200, and a backlight unit 400 for illuminating the liquid crystal display panel 10 from the back side are provided.

Array substrate 100 of liquid crystal display panel 10
Are pixel TFTs formed on the transparent insulating substrate 11 such as a glass substrate in the display region 102 so as to correspond to a plurality of pixels arranged in a matrix.
121, the color filter layer 24 (R, G, B) formed so as to cover the display region 102 including the pixel TFT 121, and the pixel electrode 1 arranged on the color filter layer 24 for each pixel.
51, a plurality of columnar spacers 31 formed on the color filter layer 24, and an alignment film 13A formed so as to cover the entire plurality of pixel electrodes 151. Further, the array substrate 100 surrounds the outer periphery of the display region 102 in the peripheral region 104, and shields the light shielding region 41 of the transparent substrate 11.
The light-shielding layer SP is provided at.

The color filter layer 24 is arranged for each pixel of green (G), blue (B) and red (R). These color filter layers 24 respectively transmit light of green, blue, and red color components.
It is composed of a colored colored resin layer.

The pixel electrode 151 is made of ITO (Indium Tin Oxide) formed on the color filter layers 24G, 24B and 24R assigned to each pixel.
It is formed of a light-transmissive conductive member such as. The pixel electrodes 151 are connected to the pixel TFTs 121 via the through holes 26 penetrating the color filter layers 24.

Each pixel TFT 121 is connected to a scanning line formed along a row of pixel electrodes 151 and a signal line formed along a column of pixel electrodes 151, and is turned on by a driving voltage from the scanning line to generate a signal. A voltage is applied to the pixel electrode 151.

As shown in more detail in FIG. 4, in the array substrate 100, the scanning lines Y formed along the rows of the pixel electrodes 151 and the signal lines X formed along the columns of the pixel electrodes 151. The pixel TFT 121 is provided near the intersection of the scanning line Y and the signal line X corresponding to the pixel electrode 151.

Furthermore, the array substrate 100 has a liquid crystal capacitance C.
An auxiliary capacitance electrode 61 having the same potential as the pixel electrode 151, which is arranged to face the pixel electrode 151 in order to form an auxiliary capacitance CS electrically parallel to L, and an auxiliary capacitance line 52 set to a predetermined potential. It has and.

The signal line X is arranged so as to be substantially orthogonal to the scanning line Y and the auxiliary capacitance line 52 via the interlayer insulating film 76. The auxiliary capacitance line 52 is formed of the same material in the same layer as the scanning line Y and is formed substantially parallel to the scanning line Y. A part of the auxiliary capacitance line 52 is arranged to face the auxiliary capacitance electrode 61 via the gate insulating film 62. The auxiliary capacitance electrode 61 is formed of an impurity-doped polysilicon film.

Wiring portions such as the signal lines X, the scanning lines Y, and the auxiliary capacitance lines 52 are formed of a light-shielding low-resistance material such as aluminum or molybdenum-tungsten. In this embodiment, the scanning line Y and the auxiliary capacitance line 52 are made of molybdenum-tungsten, and the signal line X is mainly made of aluminum.

The pixel TFT 121 has a semiconductor layer 11 formed of a polysilicon film in the same layer as the auxiliary capacitance electrode 61.
Have two. The semiconductor layer 112 is the glass substrate 1
Drain region 112 that is formed on the undercoating layer 60 that is formed on the first region and is formed by doping impurities on both sides of the channel region 112C.
It has a D and a source region 112S. This pixel TF
T121 is the semiconductor layer 112 via the gate insulating film 62.
Of the gate electrode 63 integrated with the scanning line Y arranged to face
Is equipped with.

The drain electrode 88 of the pixel TFT 121 is
It is formed integrally with the signal line X and is electrically connected to the drain region 112D of the semiconductor layer 112 via a contact hole 77 penetrating the gate insulating film 62 and the interlayer insulating film 76. The source electrode 89 of the pixel TFT 121 has a source region 112 of the semiconductor layer 112 via a contact hole 78 penetrating the gate insulating film 62 and the interlayer insulating film 76.
It is electrically connected to S.

The color filter layers 24 (R, G, B) colored red (R), green (G), and blue (B), respectively, are disposed on the interlayer insulating film 76. The pixel electrode 151 is
It is disposed on the color filter layer 24. Pixel electrode 1
51 is electrically connected to the source electrode 89 of the pixel TFT 121 via the through hole 26 formed in the color filter layer 24 (R, G, B).

The auxiliary capacitance electrode 61 is electrically connected to a contact electrode 80 formed of the same material as the signal line X via a contact hole 79 penetrating the gate insulating film 62 and the interlayer insulating film 76. Pixel electrode 151
Are electrically connected to the contact electrode 80 through a contact hole 81 penetrating the color filter layer 24. Thereby, the source electrode 8 of the pixel TFT 121
9, the pixel electrode 30, and the auxiliary capacitance electrode 61 have the same potential.

As shown in FIG. 3, the light-shielding layer SP includes a light-shielding region 4 provided in a frame shape along the outer periphery of the display region 102.
In No. 1, it is formed of a colored resin material having a light blocking property for blocking the transmission of light, for example, a black resist layer. Further, the columnar spacer 31 is formed of a resin resist. For example, when the columnar spacer 31 is formed of black resin, it is formed of the same material in the same process as the light shielding layer SP. As a result, it is possible to prevent an increase in the number of manufacturing steps and reduce manufacturing costs. Further, it may be formed of a transparent resin or a colored resin forming the color filter layer 24 (R, G, B).

In the display region 40, the columnar spacer 31 has a light-shielding wiring portion (for example, a scanning line or an auxiliary capacitance line formed of a molybdenum-tungsten alloy film, and a signal line formed of aluminum). Etc.) on each color filter layer 24 (R, G, B).

The alignment film 13A aligns liquid crystal molecules contained in the liquid crystal composition 300 with respect to the array substrate 100 in a predetermined direction.

The counter substrate 120 has a counter electrode 22 formed on a transparent insulating substrate 21 such as a glass substrate, and an alignment film 13B covering the counter electrode 22. The counter electrode 22 is formed of a light-transmissive conductive member such as ITO that is arranged so as to face the entire pixel electrode 151 on the array substrate 110 side in common. The alignment film 13B aligns liquid crystal molecules contained in the liquid crystal composition 300 in a predetermined direction with respect to the counter substrate 200.

Array substrate 1 in liquid crystal display panel 10
A polarizing plate PL1 is provided on the surface of 00, and a polarizing plate PL2 is provided on the surface of the counter substrate 200.

In such a liquid crystal display device, the light emitted from the backlight unit 400 illuminates the liquid crystal display panel 10 from the back side of the array substrate 100. The light that has passed through the polarizing plate PL1 on the array substrate 100 side of the liquid crystal display panel 10 and enters the inside of the liquid crystal display panel 10 is modulated through the liquid crystal composition 300, and the counter substrate 2
It is selectively transmitted by the polarizing plate PL2 on the 00 side. As a result, a color image is displayed in the display area 102.

By the way, the array substrate 100 is provided with a liquid crystal injection port region 32 for injecting the liquid crystal composition 300 between the array substrate 100 and the counter substrate 200 in the light shielding region 41. The liquid crystal injection area 32 is composed of a first area exposing the color filter layers 24 (R, G, B) of a plurality of colors and a second area made of a black resist layer. It is desirable that the total areas of the first region and the second region are formed to be substantially equal.

That is, in the liquid crystal display device according to the first embodiment, as shown in FIG.
The liquid crystal injection port area 32 arranged in the first area is the first area 131.
And a second region 132. The first region 131 includes a red region 131R exposing the red color filter layer 24R on the outermost surface and a green color filter layer 2
A green region 131G exposing 4G on the outermost surface and a blue region 131B exposing blue color filter layer 24B on the outermost surface
And are formed by.

Red area 131R, green area 131G, and
The blue region 131B is composed of a single red color filter layer, a green color filter layer, and a blue color filter layer, respectively. Moreover, these red areas 13
The 1R, green region 131G, and blue region 131B are formed so that their total areas are substantially equal.
The red region 131R, the green region 131G, and the blue region 131B are formed of the same material as the color filter layers 24 (R, G, B) arranged in the display region 102.

On the other hand, the second region 132 is composed of the same black resist layer as the light shielding layer SP of the light shielding region 41. In the liquid crystal inlet region 32, these first regions 1
31 and the second region 132 are formed in a stripe shape substantially parallel to the liquid crystal injection direction. Further, the first region 131 and the second region 132 are alternately arranged with substantially the same width. As a result, in the liquid crystal injection port region 32, the total areas of the first region 131 and the second region 132 become substantially the same.

When the liquid crystal injection area 32 is formed of only the blue color filter layer 24B, the light shielding area 41 is visually recognized as blue, which may deteriorate the display quality. Also,
The liquid crystal injection port region 32 is provided with a light-shielding layer S made of a black resist layer.
When only P is formed, the light-shielding layer SP has a large film thickness, so that the cross-sectional area of the liquid crystal injection port becomes small. Therefore, the liquid crystal injection time becomes long, which may reduce the manufacturing yield.

Therefore, in the above-described first embodiment,
The liquid crystal injection port region 32 is formed by the first color filter layers 131 (R, G, B) having a single-layer structure and having a plurality of colors.
Region 131 and the second formed by the black resist layer
It is formed by the region 132.

As described above, by providing the first region 131 formed of the color filter layer having a single-layer structure, it is possible to partially enlarge the cross-sectional area of the liquid crystal injection port. In addition, the first region 1 in the liquid crystal injection port region 32
31 and the second region 132 are formed in a stripe shape substantially parallel to the liquid crystal injection direction. Therefore, the resistance at the time of injecting the liquid crystal composition can be suppressed, and the liquid crystal injection time can be shortened. Therefore, the manufacturing yield can be improved.

The total areas of the color filter layers 131 (R, G, B) of each color forming the first region 131 are almost the same. For this reason, the transmittance is higher than that of the case where only the blue color filter layer is used, so that it looks bright.
It is possible to prevent the region 131 from being colored in a specific color, and it is possible to improve the display quality. Also, the first
By alternately providing the second regions 132 formed of the black resist layer in addition to the regions 131, it is possible to visually recognize the entire region as black and to secure a sufficiently high light-shielding property.

The color filter layers 131 (R, G, B) forming the first area 131 can be formed simultaneously with the color filter layers 24 (R, G, B) in the display area 102. Is. Further, the black resist layer forming the second region 132 can be formed at the same time as the light shielding layer SP in the light shielding region 41. Therefore, it is possible to reduce the manufacturing cost without increasing the manufacturing process.

Next, a method of manufacturing the above-mentioned liquid crystal display panel 10 will be described.

In the manufacturing process of the array substrate 100, first,
A silicon nitride film and a silicon oxide film are successively formed by a CVD method on a glass substrate 11 having a thickness of 0.7 mm to form an undercoating layer 60 having a two-layer structure.

Then, an amorphous silicon film is formed on the undercoating layer 60 by the CVD method or the like. Then, this amorphous silicon film is irradiated with an excimer laser beam and annealed to be polycrystallized. After that, the polycrystallized silicon film, that is, the polysilicon film 112 is patterned by a photolithography process to form a semiconductor layer of the TFT 121 and an auxiliary capacitance electrode 61.

Then, a silicon oxide film is formed on the entire surface by the CVD method to form a gate insulating film 62. Then, tantalum (Ta), chromium (Cr), aluminum (Al), molybdenum (Mo), tungsten (W), and the like are formed on the entire surface of the gate insulating film 62 by a sputtering method.
A simple substance such as copper (Cu), a laminated film of these, or an alloy film thereof (in this embodiment, Mo-W).
An alloy film) is formed and patterned into a predetermined shape by a photolithography process. As a result, the scanning line Y, the auxiliary capacitance line 52, and the gate electrode 63 integrated with the scanning line Y are formed.
And various wirings are formed.

Then, using the gate electrode 63 as a mask,
Impurities are implanted into the polysilicon film 112 by an ion implantation method or an ion doping method. As a result, the TFT 12
One drain region 112D and one source region 112S are formed. Then, the entire substrate is annealed to activate the impurities.

Then, a silicon oxide film is formed on the entire surface by the CVD method to form an interlayer insulating film 76.

Then, by a photolithography process,
The TFT penetrates through the gate insulating film 62 and the interlayer insulating film 76.
The contact hole 77 reaching the drain region 112D of 121 and the contact hole 7 reaching the source region 112S.
8 and a contact hole 79 reaching the auxiliary capacitance electrode 61
And form.

Subsequently, Ta, Cr, Al, Mo, W, C are formed on the entire surface of the interlayer insulating film 76 by the sputtering method.
A simple substance such as u, a laminated film of these, or an alloy film of these (a laminated film of Mo—Al in this embodiment) is formed and patterned into a predetermined shape by a photolithography process. As a result, the signal line X is formed and the drain electrode 88 of the TFT 121 is formed integrally with the signal line X. At the same time, the source electrode 89 of the TFT 121 and the contact electrode 80 that contacts the auxiliary capacitance electrode 61 are formed.

Subsequently, a UV curable acrylic resin resist CG-2 in which a green pigment is dispersed by a spinner is used.
000 (manufactured by Fuji Film Orin Co., Ltd.) is applied to the entire surface of the substrate. Then, this resist film is exposed with a light exposure amount of 100 mJ / cm ² at a wavelength of 365 nm through a photomask that irradiates the portion corresponding to the green pixel with light. Then, the resist film is developed with a 1% KOH aqueous solution for about 20 seconds, washed with water, and then baked. As a result, the green color filter layer 24G is formed.

Then, by repeating the same steps, a UV-curable acrylic resin resist CB-2000 (Fuji Film Orin Co., Ltd.) in which a blue pigment is dispersed.
Color filter layer 24B made of) and an ultraviolet curable acrylic resin resist CR in which a red pigment is dispersed.
A red color filter layer 24R made of -2000 (manufactured by Fuji Film Orin Co., Ltd.) is formed.

In the step of forming the green color filter layer 24G, the liquid crystal injection port region 32 in the light shielding region 41 is formed.
Then, the green region 131G of the first region 131 is formed in an island shape with the same green resin resist. In the step of forming the blue color filter layer 24B, the blue region 131B of the first region 131 is formed in an island shape by the same blue resin resist in the liquid crystal injection port region 32 in the light shielding region 41. In the step of forming the red color filter layer 24R, the red region 131R of the first region 131 is formed in an island shape in the liquid crystal injection port region 32 in the light shielding region 41 by the same red resin resist. These green area 131G, blue area 131B,
The red region 131R and the red region 131R each have a single-layer structure, and the resin resist of each color serves as the outermost surface layer.

In the process of forming these color filter layers 24, the through holes 26 that contact the switching elements 121 and the pixel electrodes 151 are also formed at the same time. Further, a contact hole 81 for contacting the pixel electrode 151 and the contact electrode 80 is also formed at the same time.

Subsequently, an ITO film having a thickness of 1500 angstrom is formed on the color filter layer 24 by a sputtering method, and is patterned into a predetermined pixel pattern by a photolithography process, so that the pixel electrode contacting the switching element 121 is formed. 151 is formed.

Then, a photosensitive acrylic black resin material (NN manufactured by JSR Corporation) was formed on the surface of the substrate by a spinner.
700) is applied. Then, after drying this resin material at 90 ° C. for 10 minutes, using a photomask having a predetermined pattern shape, a wavelength of 365 nm and 100 mJ / cm ²
With the exposure amount of. And this resin material is adjusted to pH 1
Develop with an alkaline aqueous solution of 1.5 and bake at 200 ° C. for 60 minutes. As a result, the columnar spacer 31 and the frame-shaped light shielding layer SP surrounding the display area 102 are formed, and at the same time, the stripe-shaped second region 13 is formed in the liquid crystal injection port region 32.
Form 2.

As a result, the liquid crystal injection port region 32 having the first region 131 and the second region 132 having the pattern as shown in FIG. 5 is formed.

Then, an alignment film material such as polyimide AL-3046 (manufactured by JSR Corporation) is applied on the entire surface of the substrate to a film thickness of 500 angstroms and baked to form an alignment film 13A.
To form.

As a result, the TFT array substrate 100 is formed.

On the other hand, in the manufacturing process of the counter substrate 200, first, an ITO film is formed on the glass substrate 21 having a thickness of 0.7 mm by the sputtering method to form the counter electrode 22. Then, an alignment film material such as polyimide having a film thickness of 500 angstroms is applied to the entire surface of the transparent substrate 21 so as to cover the counter electrode 22, and the alignment film 13 is baked.
Form B.

As a result, the counter substrate 200 is formed.

In the manufacturing process of the liquid crystal display panel 10, the outer edge seal member 106 is printed and applied along the outer edge of the array substrate 100 so as to surround the liquid crystal accommodation space while leaving the liquid crystal inlet 32, and further, the counter electrode is applied from the array substrate 100. An electrode transition material for applying a voltage to the outer peripheral sealing member 106
It is formed on the electrode transfer electrode around the electrode. Then, the alignment film 13 A of the array substrate 100 and the alignment film 13 of the counter substrate 200
The array substrate 100 and the counter substrate 200 are arranged such that B and B face each other, and the outer edge sealing member 106 is cured by heating to bond the both substrates. Outer edge sealing member 10
6 is, for example, a thermosetting epoxy adhesive.

Subsequently, the liquid crystal composition ZLI-4792 (M
300 (manufactured by ERCK) is injected from the liquid crystal injection port 32, and the liquid crystal injection port 32 is sealed with an injection port sealing member 33 which is a thermosetting epoxy adhesive.

A liquid crystal display panel is manufactured by the above manufacturing method.

In the active matrix type color liquid crystal display device manufactured as described above, the optical density of the light shielding region 41 including the liquid crystal injection port region 32 was sufficiently high in practical use, and a good black level was obtained. In particular, the liquid crystal injection area 32 is
There was no color, and the visibility was improved.

The present invention is not limited to the above-mentioned embodiments, but various modifications can be made. Other embodiments of the present invention will be described below.

(Second Embodiment) The liquid crystal display device according to the second embodiment has the same basic structure as that of the first embodiment described above, but the structure of the liquid crystal injection port region 32 is different. Slightly different. That is, as shown in FIG.
The liquid crystal injection port area 32 arranged in the first area is the first area 131.
And a second region 132. The first region 131 includes a red region 131R exposing the red color filter layer 24R on the outermost surface and a green color filter layer 2
A green region 131G exposing 4G on the outermost surface and a blue region 131B exposing blue color filter layer 24B on the outermost surface
And are formed by.

The red color filter layer forming the red area 131R and the green color filter layer forming the green area 131G are laminated on the blue color filter layer forming the blue area 131B. Blue area 131
B is a single layer structure having only a blue color filter layer.

These red area 131R, green area 131G,
The blue areas 131B are formed so that their total areas are substantially equal. These red areas 131R,
The green area 131G and the blue area 131B are the display area 1
02 arranged on each color filter layer 24 (R, G,
It is made of the same material as B).

On the other hand, the second region 132 is composed of the same black resist layer as the light shielding layer SP of the light shielding region 41. In the liquid crystal inlet region 32, these first regions 1
31 and the second region 132 are formed in a stripe shape substantially parallel to the liquid crystal injection direction. Further, the first region 131 and the second region 132 are alternately arranged with substantially the same width. As a result, in the liquid crystal injection port region 32, the total areas of the first region 131 and the second region 132 become substantially the same.

According to the second embodiment as described above, in addition to the effects of the first embodiment described above, it is possible to further improve the optical density of the liquid crystal injection port region 32. That is, the red color filter layer and the green color filter layer having a relatively high transmittance are stacked on the blue color filter layer having a relatively high transmittance. Therefore, it is possible to form the liquid crystal injection port region 32 having a black level comparable to that of the black resist layer forming the light shielding layer SP.

As described above, in the first region 131, the layered region of the blue color filter layer and the red color filter layer (red region 131R), and the layered region of the blue color filter layer and the green color filter layer (green). Area 131
The best black level is obtained when the area ratios of G) and the area of only the blue color filter layer (blue area 131B) are substantially equal.

Further, since a part of the first region 131 has a laminated structure, the cross-sectional area of the liquid crystal injection port is slightly smaller than that of the first embodiment, but there is a sufficient margin for the liquid crystal injection time. In addition, it is possible to further improve the visibility by selecting the pattern as shown in the second embodiment.

In the second embodiment, the display area 10
The color filter layers 24 (R, G, B) arranged in No. 2 and the color filter layers of each color arranged in the liquid crystal injection port region 32 are formed in the following order.

First, a blue color filter layer is formed. In the liquid crystal injection port area 32, the blue color filter layer is disposed over the entire area corresponding to the first area 131. Then, a green color filter layer is formed. At this time, in the liquid crystal injection port region 32, the green color filter layer is laminated in an island shape on the blue color filter layer so as to correspond to the green region 131G. Then, a red color filter layer is formed. At this time, in the liquid crystal injection port region 32, the red color filter layer is laminated in an island shape on the blue color filter layer so as to correspond to the red region 131R.

As a result, the first region 131 of the liquid crystal injection port region 32 is formed. The second region 132 is formed similarly to the first embodiment. In this way, the liquid crystal injection port region 32 having a pattern as shown in FIG. 6 is formed.

In the active matrix type color liquid crystal display device manufactured as described above, the optical density of the light shielding area 41 including the liquid crystal injection area 32 was sufficiently high in practical use, and a good black level was obtained. In particular, the liquid crystal injection area 32 is
There was no color, and the visibility was improved. Although the liquid crystal injection time was twice as long as that in the first embodiment, it was at a level without any problem in manufacturing.

(Third Embodiment) As shown in FIG. 7, the liquid crystal display device according to the third embodiment has an array substrate 1
00 and a counter substrate 200 sandwiching a liquid crystal composition 300, and a backlight unit 400 for illuminating the liquid crystal display panel 10 from the back side.
And are equipped with.

Array substrate 100 of liquid crystal display panel 10
Are pixel TFTs 121 formed on the transparent insulating substrate 11 such as a glass substrate in the display region 102 so as to respectively correspond to a plurality of pixels arranged in a matrix.
An insulating layer 25 formed to cover the display region 102 including the pixel TFT 121, a pixel electrode 151 arranged on the insulating layer 25 for each pixel, a plurality of columnar spacers 31 formed on the insulating layer 25, and a plurality of pixels. The alignment film 13A is formed so as to cover the entire electrode 151.

The counter substrate 120 is a color filter layer 24 formed by being allocated for each pixel in the display region 102 on the transparent insulating substrate 21 such as a glass substrate.
(R, G, B). In addition, the counter substrate 120
Has a counter electrode 22 common to all pixels formed on the color filter layer 24 (R, G, B), and an alignment film 13B covering the counter electrode 22. Further, the counter substrate 200 is provided in the peripheral area 104 in the display area 1
A light-shielding layer SP that surrounds the outer periphery of 02 and is disposed in the light-shielding region 41 of the transparent substrate 12 is provided.

The liquid crystal injection area 32 has the same pattern as that of the first embodiment described with reference to FIG. 5 or the second embodiment described with reference to FIG.
It is formed on the 0 side. That is, the liquid crystal injection area 32
Is a color filter layer 24 (R,
G, B), a first region 131 formed at the same time, and a second region 132 formed at the same time as the light shielding layer SP of the light shielding region 41.
It is composed of and.

With the color display type active matrix liquid crystal display device thus formed, the same effects as those of the above-described first and second embodiments were obtained.

As described above, according to the liquid crystal display device and the method for manufacturing the liquid crystal display device, a frame-shaped light-shielding region along the periphery of the display region and an optical region of the liquid crystal injection port included in the light-shielding region are formed. It is possible to improve the density and display quality.

Further, the first region of the liquid crystal injection port region is formed in the same step with the same material as the color filter layer arranged in the display region, and the liquid crystal is formed in the same step with the same material as the light shielding layer of the light shielding region. A second area of the inlet area is formed. Therefore, the manufacturing cost can be reduced without increasing the number of manufacturing steps. Further, since the film thickness of the first region is smaller than that of the black resist layer forming the light shielding layer, the cross-sectional area of the liquid crystal injection port can be enlarged and the liquid crystal injection time can be shortened.

[0089]

As described above, according to the present invention, it is possible to provide a liquid crystal display device having an improved display yield and excellent display quality, and a method for manufacturing the liquid crystal display device.

[Brief description of drawings]

FIG. 1 is a diagram schematically showing a structure of a liquid crystal display panel applied to a liquid crystal display device according to an embodiment of the present invention.

FIG. 2 is a circuit block diagram schematically showing a configuration of the liquid crystal display panel shown in FIG.

FIG. 3 is a cross-sectional view schematically showing the structure of the liquid crystal display device according to the first embodiment of the present invention.

4 is a cross-sectional view schematically showing a structure of an array substrate which constitutes the liquid crystal display device shown in FIG.

FIG. 5 is a plan view schematically showing a structure of a display region and a light shielding region of the liquid crystal display device according to the first embodiment of the present invention.

6A and 6B are a plan view and a side view schematically showing a structure of a display area and a light shielding area of a liquid crystal display device according to a second embodiment of the present invention.

FIG. 7 is a sectional view schematically showing a structure of a liquid crystal display device according to a third embodiment of the present invention.

[Explanation of symbols]

10 ... Liquid crystal display panel 24 (R, G, B) ... Color filter layer 31 ... Columnar spacer 41 ... Shading area 100 ... Array substrate 102 ... Display area 131 ... First area 132 ... second area 200 ... Counter substrate 300 ... Liquid crystal composition SP ... Shading layer

Continued front page    F term (reference) 2H048 BA11 BA45 BA48 BB02 BB07                       BB08 BB44                 2H089 KA15 LA22 LA28 LA41 MA03Y                       NA24 NA37 NA55 NA56 NA60                       TA09 TA12                 2H091 FA02Y FA34Y FC10 FC26                       FC29 FC30 GA08 GA09 GA13                       LA03 LA11 LA12 LA13 LA15

Claims (9)

[Claims] 1. A liquid crystal display device constituted by sandwiching a liquid crystal composition between a pair of substrates, wherein one substrate of the pair of substrates injects the liquid crystal composition between the pair of substrates. A liquid crystal injection port region, the liquid crystal injection port region including a first region exposing the color filter layers of a plurality of colors and a second region formed of a black resist layer. Display device. 2. The liquid crystal according to claim 1, wherein the first region is formed by exposing a red color filter layer, a green color filter layer, and a blue color filter layer, respectively. Display device. 3. The liquid crystal display according to claim 2, wherein the total areas of the respective regions exposing the red color filter layer, the green color filter layer and the blue color filter layer are substantially equal to each other. apparatus. 4. The liquid crystal display device according to claim 2, wherein the red color filter layer and the green color filter layer are stacked on the blue color filter layer. 5. The liquid crystal according to claim 1, wherein the light-shielding region arranged along the outer periphery of the display region includes the same light-shielding layer as the black resist layer forming the second region. Display device. 6. The first region and the second region are each formed in a stripe shape substantially parallel to the liquid crystal injection direction,
The liquid crystal display device according to claim 1, wherein the liquid crystal display devices are arranged alternately. 7. One of the substrates includes a scanning line arranged in a row direction, a signal line arranged in a column direction, and a switching element arranged near an intersection of the scanning line and the signal line. The liquid crystal display device according to claim 1, further comprising: a pixel electrode connected to the switching element and formed in a matrix. 8. The liquid crystal display device according to claim 1, wherein the one substrate is provided with a counter electrode common to all pixels. 9. A method of manufacturing a liquid crystal display device, comprising a liquid crystal composition sandwiched between a pair of substrates, wherein a display region for displaying an image is formed on one of the pair of substrates. A step of forming a light-shielding area arranged along the outer periphery of the display area, wherein a liquid crystal injection port area for injecting the liquid crystal composition between the pair of substrates is formed in the display area forming step. A liquid crystal display device, comprising: forming a first region exposing a plurality of color filter layers, and forming a second region made of a black resist layer in the light-shielding region forming step. Production method.