JP2002351097A - Method for cleaning electrophotographic photoreceptor base body - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for cleaning an electrophotographic photoreceptor by which the base body can be cleaned at low cost and low energy supply by improving the occurrence efficiency of an air bubble. SOLUTION: This method for cleaning the electrophotographic photoreceptor base body includes a brush washing process to brush the surface of the base body by using a cleaning liquid, an ultrasonic cleaning process based on the cavitation action of a ultra sonic wave, a shower cleaning process, an air bubble cleaning process to perform rinsing by discharging air bubbles from a nozzle to which compression air is supplied and to perform washing with washing water, and a drying process to dry moisture on the surface of the base body.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning an electrophotographic photoreceptor substrate, and more particularly to a function-separable organic photoreceptor cylindrical aluminum substrate for electrophotography and a seamless electrophotographic photoreceptor substrate formed by electroforming. And other methods for cleaning an electrophotographic photosensitive member substrate.

[0002]

2. Description of the Related Art In a function-separated organic photoreceptor cylindrical aluminum substrate for electrophotography, a kerosene-based residue adhered during cutting and a high-viscosity lubricant adhered during plastic working remain on the substrate surface as residues. ing. In addition, fingerprints may be attached during handling in the dust in the air and during transportation. Also in the electrophotographic photosensitive member seamless substrate formed by the electroforming process, when detached from the mold, fingerprints or the like are adhered due to handling or the like.

[0003] As a method of cleaning these substrates, a method of cleaning using a solvent, an alkali, an acid, a semi-aqueous detergent, an aqueous detergent, or the like is generally known. However, in recent years, in consideration of environmental problems such as destruction of the ozone layer, global warming, and water pollution, and the impact on the human body, there has been a tendency to completely eliminate chlorine-based solvents.
The trend has shifted to cleaning using water-based cleaning agents and the like.

As a method for removing the above-mentioned dirt, ultrasonic cleaning or bubbling has been widely adopted as a cleaning method. One of them is disclosed in JP-A-5-2162.
Japanese Patent Publication No. 54 (hereinafter referred to as Conventional Example 1) proposes a cleaning method in which bubbles are generated by air blowing and treated with a rinsing liquid. Further, Japanese Patent Application Laid-Open No. 6-19141 (hereinafter referred to as Conventional Example 2) proposes a method of cleaning a substrate by simultaneously performing the action of ultrasonic waves and the action of bubbles.

[0005]

However, in the cleaning method of the prior art 1, it is described that the deposits on the surface of the conductive substrate are removed by the generation of bubbles, but the bubbles are surely adhered to the substrate depending on the mounting direction of the nozzle. It is conceivable that the substrate surface becomes unevenly cleaned without contact. Further, according to Conventional Example 2, when the cleaning liquid is violated while transmitting the ultrasonic waves, the cavitation effect by the ultrasonic waves is weakened, and the cleaning effect is considered to be insufficient.

The present invention has been made to solve these problems. An electrophotographic photoreceptor capable of cleaning a substrate at a low cost and with a low energy supply by increasing the bubble generation efficiency. An object of the present invention is to provide a washing method.

[0007]

In order to solve the above-mentioned problems, a method for cleaning an electrophotographic photosensitive member substrate according to the present invention comprises a brush cleaning step of brushing the surface of the substrate using a cleaning solution, Ultrasonic cleaning step by cavitation action, shower cleaning step, rinsing cleaning by discharging bubbles from nozzles supplied with compressed air, and bubble cleaning step of cleaning with cleaning water, and drying the moisture on the surface of the substrate And a drying step. Therefore, by increasing the generation efficiency of bubbles, the substrate can be cleaned with low cost and low energy supply.

When the diameter of the bubbles is 3 to 60 mm, the surfactant can be taken in and diffused on the surface of the bubbles to obtain good cleaning properties.

Furthermore, at least 1000
Good cleaning properties can be obtained by contacting the substrate with air bubbles at a rate of at least twice / min for cleaning.

[0010] In addition, good cleaning performance can be obtained by discharging bubbles and performing cleaning at a bubble speed of 500 to 2000 mm / sec in contact with the substrate.

Further, the discharge pressure of the bubbles is 0.05 to 0.3.
MPa and the flow rate of compressed air is 50-150NL
By performing cleaning by discharging bubbles under the conditions of / min, good cleaning properties can be obtained.

The washing water has a conductivity of 0.2 to 1.0 μm.
By using Ro water or ion-exchanged water of s / cm, there is no occurrence of stains or the like on the substrate, and good cleaning properties can be obtained.

Further, the capacity of the washing tank is 0.5 times or more.
Simultaneously circulating 1.5 times of the washing water removes the surfactant and the particles to obtain good washing properties.

Further, since at least one nozzle is provided for one base, uniform rinsing can be performed, and good cleaning properties can be obtained.

Further, the compressed air passes through a clean unit for removing fine particles of 0.01 to 3 μm, thereby removing foreign substances and the like mixed in the compressed air, thereby obtaining good cleaning properties.

The diameter of the nozzle is in the range of 1 / 2D to 1D with respect to the diameter D of the substrate. The nozzle has a discharge port of φ1 to φ3 mm on the circumferential side surface, so that the entire periphery of the substrate is formed. Enclosed with air bubbles, and good cleaning properties are obtained.

Furthermore, a sintered body is provided above the nozzle, and the bubble discharged from the sintered body has a diameter of 10 mm or less, whereby the effect of rinsing and cleaning is further improved.

Further, by providing the ultrasonic transmitter in the tank for performing the bubble cleaning step, the cleaning efficiency is improved by the interaction between the bubbles and the ultrasonic waves.

Further, when the temperature of the washing water is 18 to 40 ° C., the dissolving of the surfactant molecules on the surface of the substrate proceeds, and a good rinsing property can be obtained.

Further, by washing the substrate to be washed by swinging it up and down, the efficiency of contact of bubbles with the substrate is increased, and good washing properties are obtained.

Further, by mixing the compressed air and water to generate air bubbles and cleaning the substrate, the number of air bubbles is increased, and the number of times of contact of the air bubbles with the substrate is increased, so that good cleaning properties are obtained.

Further, by providing an air bubble collecting mechanism for collecting air bubbles into the substrate, all the air bubbles discharged from the nozzles can be taken into the substrate, and good cleaning properties can be obtained.

[0023]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for cleaning a photosensitive substrate for electrophotography according to the present invention comprises a brush cleaning step of brushing the surface of the substrate with a cleaning liquid, an ultrasonic cleaning step by ultrasonic cavitation action, and a shower. The method includes a cleaning step, a bubble cleaning step of discharging bubbles from a nozzle to which compressed air is supplied, performing rinsing cleaning, and cleaning with cleaning water, and a drying step of drying moisture on the substrate surface.

[0024]

FIG. 1 is a view showing a cleaning step of a cleaning method according to one embodiment of the present invention. As shown in FIG. 3A, in the brush cleaning in the first tank, a high-viscosity oil (such as polybutene) fixed and adhered to the inner and outer peripheral surfaces of the base 11.
The brush 12 removes the kerosene-based cutting oil.
At this time, a kerosene-based detergent and a neutral detergent are used as the washing liquid 13. In the second tank, as shown in FIG.
Two opposed ultrasonic transmitters 14 having a frequency of 75 to 200 kHz are mounted in the tank, and oil and the like in fine concave portions on the surface of the substrate are removed by cavitation action of the ultrasonic waves. In order to avoid pinholes and pitting on the surface of the substrate when transmitting ultrasonic waves, a mechanism for swinging and rotating the substrate in the tank is provided. As the cleaning liquid 15, a neutral detergent is used to remove oil on the surface of the substrate by the action of a surfactant. Next, as shown in FIG. 3C, in the third bath, the neutral detergent on the substrate surface is removed by washing with the shower 16.
The cleaning time is 60 to 90 sec, and the water pressure is 0.5 to 1.0 sec.
The cleaning is performed at a flow rate of 3.0 L / min or more at MPa. Then, as shown in (d) of the figure, in the fourth tank, rinsing and cleaning are performed by discharging bubbles from the nozzle 17 to remove the surfactant and attached matter on the substrate surface. In this step, as shown in FIG.
It removes fine particles of 3.0 μm, discharges large and small bubbles by a nozzle arranged under each substrate 11, and comes into contact with the substrate 11 by ascending to remove a surfactant and attached matter on the substrate surface. is there. At this time, since the detergent is taken in the bubbles, overflow of the rinsing water is performed. When the substrate is lifted after the end of the rinsing cleaning with bubbles, R
o The water is sprayed from the shower 18 installed above the washing tank with water or ion-exchanged water to rinse the surface of the substrate, thereby completely removing the oil. Then, in the fifth tank, as shown in (e) of the figure, this is a step of drying the water on the surface of the base 11, and the water temperature is controlled to 75 ± 5 ° C. The pulling speed is preferably about 10 mm / sec. The clean unit 19 shown in FIG.
As shown in FIG. 3, a regulator 19-1, a main line filter 19-2, and a mist separator 19-3 are provided.
, A micro mist separator 19-4, an over-removal filter 19-5, and a super mist separator 19-.
6 is included.

An experimental example of this embodiment will be described below. [Experiment 1] Experiment 1 was performed using the cleaning apparatus having the configuration shown in FIG. The substrate is cleaned in the first, second, and third tanks, the rinsing is performed by discharging bubbles in the fourth tank, and the electric conduction of the rinsing water in the fifth tank is performed in order to confirm the cleaning property of the bubbles. The rate was measured, and the change before and after washing was confirmed. The results are shown in Table 1 below. For the measurement of the electric conductivity, CP-21PW manufactured by Toa Denpa Kogyo KK was used. As for evaluation of coating quality, coating of three layers of a UL layer, a CGL layer, and a CTL layer was performed, and coating film defects were evaluated.

[0026]

[Table 1]

[Experimental Example 2] An experimental example 2 was performed using the cleaning apparatus having the configuration shown in FIG. The substrate is washed in the first, second, and third tanks, rinsed by discharging bubbles in the fourth tank, cleaning is performed by changing the conditions for discharging bubbles, and measurement of oil remaining on the substrate is performed. went. The results are shown in Table 2 below. The condition is that the rinsing time is 90 sec.
For oil measurement, a Fourier transform infrared spectrophotometer JIR-100 manufactured by JEOL Ltd. was used. As for evaluation of coating quality, coating of three layers of a UL layer, a CGL layer, and a CTL layer was performed, and coating film defects were evaluated. The image evaluation was carried out by mounting on a copier imagiFM-200 manufactured by Ricoh Co., Ltd.

[0028]

[Table 2]

[Experimental Example 3] Experimental example 3 was performed using the cleaning apparatus having the structure shown in FIG. The substrate was washed in the first, second, and third tanks, rinsed by discharging bubbles in the fourth tank, and evaluated based on the difference in the method of cleaning bubbles discharged (see Experimental Example 3). FIG. 4A illustrates an A method in which two bases 11 are cleaned with bubbles discharged from one nozzle 17 having a plurality of discharge ports, and FIG. 4B illustrates two bases. No. 1 having a plurality of discharge ports for each of 11
This is a B method in which cleaning is performed with bubbles discharged from No. 7. FIG. 4C shows a C method in which each of the two bases 11 is washed with air bubbles discharged from a nozzle 17 having one discharge port, and FIG. This is a D method in which each of the nozzles 11 is cleaned with bubbles discharged from a nozzle 17 provided with a sintered body 20 at a discharge portion. Further, FIG. 4E shows an E type in which the bubbles ejected from each nozzle 17 are washed by the bubbles collected in each substrate 11 by a bubble collecting mechanism 21 provided so as to collect around the corresponding substrate 11. FIG. 4F shows an F system in which an ultrasonic transmitter 22 is provided in the same tank. The results are shown in Table 3 below.

[0030]

[Table 3]

Comparative Example 1 Comparative Example 1 was performed using the cleaning apparatus having the configuration shown in FIG. In the first tank, the second tank, and the third tank, the base is washed, and in the fourth tank, the rinsing washing by discharging the bubbles according to the present embodiment and the rinsing washing by the ultrasonic wave are performed, and the residual oil content on the base is measured. Carried out. The conditions for rinsing with air bubbles were as follows: cleaning time 90 sec, air pressure 0.1 M
Pa and the air flow rate were 50 NL / min. The conditions for rinsing and washing with ultrasonic waves were set to a washing time of 90 sec and a frequency of 100 kHz. The results are shown in Table 4 below.

[0032]

[Table 4]

In the present embodiment described above, the bubbles are discharged from the nozzles, so that the bubbles are reliably brought into contact with the substrate.
It removes deposits and surfactants on the substrate.
By discharging and contacting bubbles having a size of 3 to 60 mm as the size of the bubbles, the surfactant is taken into the surface of the bubbles and diffused, so that good cleaning properties can be obtained. Further, the number of times of contact of the air bubbles with the substrate is 1000 times or more per minute, and by contacting the air with the substrate, good cleaning properties can be obtained. As a result of measuring the residual oil content of the substrate, one substrate (φ30
× 340) is a measured value of 0.005 mg,
No coating film defects occurred after coating. Regarding the measurement of the number of times of contact, see NAC Corporation: High Speed Video HVS-1.
000 was used. The residual oil content was measured by infrared spectroscopy (IR), and a JEOL Fourier transform infrared spectrophotometer JIR-100 was used as an apparatus.
The cleaning performance is improved by discharging the bubbles and bringing them into contact with the substrate, but the flow rate of the bubbles determines the cleaning effect. When rinsing was performed at a bubble flow rate of 500 mm / sec or more, good cleaning properties were obtained at 90 sec. When cleaning is performed at a bubble flow rate of 500 mm / sec or less, it is necessary to use 300
It took more than sec. 500mm / s flow rate of bubbles
ec has the effect of shortening the cleaning tact.

The pressure at which the bubbles are discharged is set at 0.1.
By using a clean air flow rate of 50 to 150 NL / min at a pressure of 0.5 to 0.3 MPa, the number of times of contact with the substrate is large and good cleaning properties can be obtained. 0.3M discharge pressure
When the pressure is equal to or higher than Pa, bubbles tend to spread in water, so that the number of times of contact with the substrate is reduced and the cleaning property is deteriorated. As for the air flow rate, the same result as described above is obtained.

Further, as the cleaning water shown in FIG. 2, Ro water or ion-exchanged water having an electric conductivity of 0.2 to 1.0 μs / cm is used. In particular, in a seamless belt substrate formed by an electroforming process, an R of 0 μs / cm or more is used.
o When rinsing and washing in water or ion exchanged water,
The occurrence of stains on the substrate has been confirmed. When rinsing and washing were performed within the range of electric conductivity, no stain was generated on the substrate, and good washing properties were obtained.

When rinsing and washing are performed with air bubbles, the air bubbles take in a surfactant and rise to burst on the water surface.
At that time, the surfactant diffuses and floats on the water surface. The circulation of the rinsing water is performed to remove the floating surfactant. The circulation amount is 0.5 to 1.5 times the tank volume. When circulating, Ro water or ion-exchanged water is passed through a filter to remove surfactants and particles, whereby good cleaning properties are obtained. When rinsing and washing are performed at a circulation amount of 0.5 times or less, the electrical conductivity of the rinsing water increases, and the detergent is accumulated, so that good washing properties cannot be obtained. If the circulation amount is more than 5 times, the flow direction of the discharged bubbles changes, so that the number of times of contact with the substrate is reduced, and good cleaning properties cannot be obtained.

Further, as shown in FIGS. 2 and 4 (b) to 4 (f), the nozzle for discharging bubbles is a cleaning method having one nozzle per substrate so that the bubbles can be reliably contacted. For this purpose, the center of the base and the center of the nozzle are mounted on the lower part of the base in alignment. As an effect, by wrapping the entire circumference of the base with air bubbles and bringing them into contact, uniform rinsing and cleaning can be performed, and good cleaning properties can be obtained. If the center of the substrate is displaced from the center of the nozzle, the contact of the bubbles with the substrate becomes uneven, and the surfactant on the surface of the substrate cannot be removed.

Further, regarding air that generates air bubbles,
As shown in FIGS. 2 and 3, compressed air is passed through the clean unit 19, and bubbles are generated using the passed air. The clean unit 19 is a device for removing oil, foreign matter, rust, odor, and the like mixed in the compressed air, and a good rinsing property can be obtained by using a unit manufactured by SMC Corporation. This clean unit 19
When rinsing and washing are performed only with compressed air without passing through, the electric conductivity of the rinsing water and the particles in the liquid are sharply increased, so that good washing properties cannot be obtained.

Further, as shown in FIG. 5, as a nozzle shape for discharging bubbles, with respect to the diameter φD of the base 11,
The diameter of the nozzle 17 is in the range of ＤD to 1D, and the side of the nozzle
Each of the nozzles has a discharge port having a diameter of φ1 to φ3 mm of the discharge port 23. By discharging the bubbles, the bubbles wrap around the entire periphery of the substrate and come into contact with the substrate, so that good cleaning properties can be obtained. When the nozzle diameter is 1D or more, bubbles expand in water and contact with the substrate decreases, and good cleaning properties cannot be obtained.
When air bubbles are discharged with a nozzle diameter of 1 / 2D or less, the air bubbles enter the inner surface of the substrate and contact of the air bubbles on the outer periphery of the substrate is reduced, so that good cleaning properties cannot be obtained.

As shown in FIG. 6, a bubble discharge port made of a sintered body 20 is provided above the nozzle 17 for discharging bubbles. Discharge innumerably. The air bubbles having a diameter of 10 mm or less enter the inner surface of the substrate to perform rinsing and cleaning of the inner surface of the substrate, and are effective in rinsing and cleaning of the inner surface of the substrate. In this way, the combination of the nozzle 17 and the sintered body 20 simultaneously discharges air bubbles of 10 mm or less and air bubbles of about 30 mm, thereby further improving the rinsing efficiency. With this combination, the cleaning tact can be shortened.

Further, as shown in FIG. 4F, an ultrasonic oscillator 22 and a nozzle 17 for discharging air bubbles are provided in the cleaning tank.
After the immersion of the substrate, the substrate is cleaned by ultrasonic waves to remove fine deposits on the surface of the substrate by cavitation. Subsequently, after stopping the ultrasonic wave, the bubbles are discharged, and the bubbles are brought into contact with the substrate to remove the surfactant and the attached matter on the surface of the substrate.
By making the action of the ultrasonic wave and the action of the bubble act alternately, the oil remaining on the substrate surface is below the detection limit (0.001 mg).
/ No more than).

Further, by setting the temperature of the rinsing water to 30 to 40 ° C., the dissolving of the surfactant molecules on the surface of the substrate proceeds, and a good rinsing property can be obtained by this action.

Further, by generating bubbles and contacting the substrate, the surfactant and the attached matter are removed, but by shaking the substrate, the contact efficiency of the bubbles is increased, and good cleaning properties are obtained.

As a method of producing air bubbles, as shown in FIG. 7, by mixing compressed air and water in a nozzle, the number of air bubbles is increased, the number of times of contact with the substrate is increased, and good cleaning performance is obtained. Is obtained. The nozzle is Spraying Systems Co., Ltd. Model: 1 / 4JS PNEU
MATIC. ATOMIZING. NOZZLE was used.

Further, by producing bubbles, contacting the substrate, and rinsing and washing, the oil remaining on the substrate is
0.2 mg / l or less, and good cleanability without coating film defects can be obtained. When the amount is larger than 0.02 mg / line, a coating film defect called cissing occurs.

As shown in FIG. 4 (e), in order to ensure that the bubbles come into contact with the substrate and to enhance the flow action of the bubbles, a bubble collecting mechanism 21 formed of a cylindrical tube outside the substrate 11 as shown in FIG. To increase air bubble collection. The lower portion of the bubble collecting mechanism 21 is formed in a tapered shape.
As an effect, by installing the bubble collecting mechanism 21, 100% of the bubbles discharged from the nozzle 17 can be taken in and the bubbles can be brought into contact with the base 11. At this time, the bubbles pass through the inside of the bubble collecting mechanism 21 and the outside of the base 11, and the flow speed of the bubbles can be made two to three times faster, and this action provides good cleaning properties.

Further, after rinsing and cleaning by contact of bubbles in the cleaning tank, the generation of bubbles is stopped when the substrate is lifted. Ro water or ion-exchanged water is sprayed onto the surface of the rinsing water by a shower, which is installed above the cleaning tank to prevent the contamination floating on the surface of the rinsing water from adhering when the substrate is lifted. By this action, the surface of the substrate is cleaned, and after coating, a substrate free of coating film defects can be obtained.

It should be noted that the present invention is not limited to the above-described embodiment, and it goes without saying that various modifications and substitutions can be made within the scope of the claims.

[0049]

As described above, the method of cleaning a photoreceptor substrate for electrophotography according to the present invention comprises a brush cleaning step of brushing the surface of the substrate with a cleaning liquid, and an ultrasonic cleaning by cavitation action of ultrasonic waves. Step, a shower cleaning step, a bubble cleaning step of performing rinsing cleaning by discharging bubbles from a nozzle to which compressed air is supplied, and cleaning with cleaning water, and a drying step of drying moisture on the substrate surface. There are features. Therefore, by increasing the generation efficiency of bubbles, the substrate can be cleaned with low cost and low energy supply.

When the diameter of the bubbles is 3 to 60 mm, the surfactant can be taken in and diffused on the surface of the bubbles to obtain good cleaning properties.

Furthermore, at least 1000
Good cleaning properties can be obtained by contacting the substrate with air bubbles at a rate of at least twice / min for cleaning.

Further, good cleaning properties can be obtained by discharging bubbles and performing cleaning at a bubble speed of 500 to 2000 mm / sec in contact with the substrate.

Further, the discharge pressure of the bubbles is 0.05 to 0.3.
MPa and the flow rate of compressed air is 50-150NL
By performing cleaning by discharging bubbles under the conditions of / min, good cleaning properties can be obtained.

The washing water has a conductivity of 0.2 to 1.0 μm.
By using Ro water or ion-exchanged water of s / cm, there is no occurrence of stains or the like on the substrate, and good cleaning properties can be obtained.

Further, the capacity of the washing tank is 0.5 times or more.
Simultaneously circulating 1.5 times of the washing water removes the surfactant and the particles to obtain good washing properties.

Further, since at least one nozzle is provided for one base, uniform rinsing and cleaning can be performed, and good cleaning properties can be obtained.

Further, the compressed air passes through a clean unit for removing fine particles having a size of 0.01 to 3 μm, thereby removing foreign substances and the like mixed in the compressed air and obtaining good cleaning properties.

The diameter of the nozzle is in the range of 1 / 2D to 1D with respect to the diameter D of the substrate, and the nozzle has a discharge port of φ1 to φ3 mm on the circumferential side surface, so that the entire periphery of the substrate is formed. Enclosed with air bubbles, and good cleaning properties are obtained.

Further, a sintered body is provided above the nozzle, and the diameter of bubbles discharged from the sintered body is 10 mm or less, so that the effect of rinsing and cleaning is further improved.

Further, by providing the ultrasonic transmitter in the tank for performing the bubble cleaning step, the cleaning efficiency is improved by the interaction between the bubbles and the ultrasonic waves.

Further, when the temperature of the washing water is from 18 to 40 ° C., the dissolution of the surfactant molecules on the surface of the substrate proceeds, so that a good rinsing property can be obtained.

Further, the substrate to be cleaned is swung up and down for cleaning, whereby the contact efficiency of bubbles with the substrate is increased, and good cleaning properties are obtained.

Further, by mixing the compressed air and water to generate air bubbles and cleaning the substrate, the number of air bubbles is increased and the number of times of contact of the air bubbles with the substrate is increased, so that good cleaning properties are obtained.

Further, by providing a bubble collecting mechanism for collecting bubbles into the substrate, all the bubbles discharged from the nozzles can be taken into the substrate, and good cleaning properties can be obtained.

[Brief description of the drawings]

FIG. 1 is a view showing a cleaning step of a cleaning method according to one embodiment of the present invention.

FIG. 2 is a diagram showing details of a bubble cleaning step.

FIG. 3 is a block diagram illustrating a configuration of a clean unit in FIG. 2;

FIG. 4 is a view showing a bubble cleaning step by various methods.

FIG. 5 is a diagram showing the relationship between the diameter of a base and the diameter of a nozzle.

FIG. 6 is a view showing an example in which a sintered body is provided above a nozzle.

FIG. 7 is a diagram showing an example in which water is mixed in compressed air supplied to a nozzle.

[Explanation of symbols]

11; substrate, 12; brush, 13, 15;
4,22; ultrasonic transmitter, 16, 18; shower, 1
7; nozzle, 19; clean unit, 20; sintered body,
21; bubble collection mechanism.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G03G 5/10 G03G 5/10 B (72) Inventor Yasuhide Takashita 1-3-3 Nakamagome, Ota-ku, Tokyo No. 6 Inside Ricoh Co., Ltd. (72) Inventor Tatsushi Mayahara 1-3-6 Nakamagome, Ota-ku, Tokyo F-term inside Ricoh Co., Ltd. (Reference) 2H068 AA54 EA05 3B116 AA46 BA02 BB02 BB21 BB83 BB90 CC01 CC03 CD22 3B201 AA46 BA02 BB02 BB21 BB83 BB88 BB90 BB94 CC01 CC11 CD22

Claims (16)

[Claims] 1. A method for cleaning a substrate of an electrophotographic photoreceptor, comprising: a brush cleaning step of brushing the surface of the substrate with a cleaning liquid; an ultrasonic cleaning step by ultrasonic cavitation; a shower cleaning step; A photoconductor for electrophotography, comprising: a bubble cleaning step of discharging bubbles from a nozzle to which compressed air is supplied, performing rinsing cleaning, and cleaning with cleaning water; and a drying step of drying moisture on a substrate surface. A method for cleaning a substrate. 2. The method according to claim 1, wherein the bubbles have a diameter of 3 to 60 mm. 3. The method according to claim 2, wherein the air bubble cleaning step comprises at least 1000
2. The method for cleaning an electrophotographic photoreceptor substrate according to claim 1, wherein the cleaning is performed by bringing the bubbles into contact with the substrate at a rate of not less than twice / min. 4. The method of cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein the cleaning is performed at a bubble velocity of 500 to 2000 mm / sec by discharging the bubbles and contacting the substrate. 5. The discharge pressure of the bubble is 0.05 to 0.3.
MPa, and the flow rate of the compressed air is 50 to 150 NL.
The method for cleaning an electrophotographic photosensitive member substrate according to any one of claims 1 to 4, wherein the cleaning is performed by discharging the bubbles under a condition of / min. 6. The cleaning water has a conductivity of 0.2 to 1.0 μm.
It is Ro water or ion exchange water between s / cm.
5. The method for cleaning a photoreceptor substrate for electrophotography according to any one of 5. 7. 0.5 to 1.5 times the capacity of the washing tank.
The method for cleaning an electrophotographic photosensitive member substrate according to any one of claims 1 to 6, wherein the cleaning water is circulated twice as much. 8. The method for cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein at least one nozzle is provided for one substrate. 9. The compressed air passes through a clean unit that removes fine particles of 0.01 to 3 μm.
5. The method for cleaning a photoreceptor substrate for electrophotography according to any one of 5. 10. The nozzle according to claim 1, wherein the diameter of the nozzle is in the range of 1 / 2D to 1D with respect to the diameter D of the base, and the nozzle has a discharge port of φ1 to φ3 mm on a circumferential side surface.
9. The method for cleaning an electrophotographic photosensitive member substrate according to any one of items 9. 11. The cleaning of the electrophotographic photosensitive member substrate according to claim 1, wherein a sintered body is provided above the nozzle, and the diameter of bubbles discharged from the sintered body is 10 mm or less. Method. 12. The method for cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein an ultrasonic transmitter is provided in a tank for performing the bubble cleaning step. 13. The method for cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein the temperature of the cleaning water is 18 to 40 ° C. 14. The method of cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein the substrate to be cleaned is swung up and down for cleaning. 15. The method for cleaning an electrophotographic photosensitive member substrate according to claim 1, wherein the substrate is washed by mixing the compressed air and water to generate air bubbles. 16. The method according to claim 1, further comprising an air bubble collecting mechanism for collecting the air bubbles into the substrate.