JP2001307873A - Organic electroluminescent display device and method of manufacturing the same - Google Patents
Organic electroluminescent display device and method of manufacturing the sameInfo
- Publication number
- JP2001307873A JP2001307873A JP2000120581A JP2000120581A JP2001307873A JP 2001307873 A JP2001307873 A JP 2001307873A JP 2000120581 A JP2000120581 A JP 2000120581A JP 2000120581 A JP2000120581 A JP 2000120581A JP 2001307873 A JP2001307873 A JP 2001307873A
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- JP
- Japan
- Prior art keywords
- layer
- barrier layer
- organic
- electrode
- organic electroluminescent
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
- H10K59/8731—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
(57)【要約】
【課題】封止不良を改善することで、大気中の水分や酸
素等の影響を極力除外し、経時劣化が少なく、初期性能
を長時間維持できる長寿命の有機EL表示素子を提供す
る。
【解決手段】基板1上に電極2と蛍光媒体3と対向電極
4と、少なくとも蛍光媒体と対向電極を覆う封止層5と
を設けた有機エレクトロルミネッセンス素子において、
前記封止層が少なくとも金属膜、または無機膜等からな
るバリア層6a、アクリル系モノマーまたはアクリル系
オリゴマー等からなる樹脂層7、バリア層6bを順次形
成した積層体であることを特徴とする有機エレクトロル
ミネッセンス表示素子。
(57) [Summary] [PROBLEMS] By improving sealing failure, the effect of moisture and oxygen in the air is eliminated as much as possible, and there is little deterioration over time, and a long-life organic EL display that can maintain initial performance for a long time. An element is provided. An organic electroluminescent device having an electrode, a fluorescent medium, a counter electrode, and a sealing layer covering at least the fluorescent medium and the counter electrode on a substrate.
The organic material, wherein the sealing layer is a laminate in which at least a barrier layer 6a made of a metal film or an inorganic film, a resin layer 7 made of an acrylic monomer or an acrylic oligomer, and a barrier layer 6b are sequentially formed. Electroluminescence display element.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、表示装置としての
発光型ディスプレイであり、フラットパネルディスプレ
イの一つである有機エレクトロルミネッセンス表示素子
及びその有機エレクトロルミネッセンス表示素子の製造
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light emitting display as a display device, and more particularly, to an organic electroluminescent display element which is one of flat panel displays and a method of manufacturing the organic electroluminescent display element.
【0002】以下の記載において「エレクトロルミネッ
センス」を「EL」と表記する。[0002] In the following description, "electroluminescence" is referred to as "EL".
【0003】[0003]
【従来の技術】有機EL表示素子は、自己発光型である
ため、これを用いたディスプレイは、高輝度、高視野角
を示し、かつ低電圧で駆動し得るという特徴を有する。2. Description of the Related Art Since an organic EL display element is of a self-luminous type, a display using the same has a feature that it has high luminance, a wide viewing angle, and can be driven at a low voltage.
【0004】有機EL表示素子は、基本的に、少なくと
も一つは有機物で構成される発光媒体を陽極と陰極で挟
持した構造を取り、両電極間に所定の電流を流すことに
より発光媒体が発光する。通常、陽極および陰極は、そ
れぞれ複数の電極ラインにより構成され、これら陽極ラ
インと陰極ラインとを互いに直交させて単純マトリック
スディスプレイを構成する。各陽極ラインと陰極ライン
との交点に存在する発光媒体は一つの画素を形成する。[0004] The organic EL display element basically has a structure in which at least one light emitting medium composed of an organic substance is sandwiched between an anode and a cathode, and a predetermined current is applied between the two electrodes so that the light emitting medium emits light. I do. Usually, each of the anode and the cathode is constituted by a plurality of electrode lines, and the anode line and the cathode line are orthogonal to each other to constitute a simple matrix display. The luminescent medium present at the intersection of each anode line and cathode line forms one pixel.
【0005】有機EL表示素子において、発光媒体およ
び陰極ラインを大気露出させたままにしておくと、これ
らは大気中の水分、酸素等によって劣化する。大気中の
水分、酸素等の影響により、例えば、発光媒体と電極と
の界面で剥離が生じたり、構成材料が変質してしまった
りする。この結果、ダークスポットと称する非発光領域
が生じたり、所定の品質の発光が維持できなくなったり
する。In an organic EL display element, if the light emitting medium and the cathode line are left exposed to the atmosphere, they are deteriorated by moisture, oxygen and the like in the atmosphere. Under the influence of moisture, oxygen, and the like in the atmosphere, for example, separation occurs at the interface between the light emitting medium and the electrode, or the constituent materials are altered. As a result, a non-light-emitting area called a dark spot occurs, or light emission of a predetermined quality cannot be maintained.
【0006】この問題を解決する方法として、例えば、
特開平5−36475号公報、特開平5−89959号
公報、特開平7−169567号公報等に記載されてい
るように、窒素雰囲気または不活性ガス雰囲気中で有機
EL表示素子を覆う気密ケース等を透光性絶縁基板上に
密着固定して大気中の水分、酸素等を遮断する技術が知
られている。As a method for solving this problem, for example,
As described in JP-A-5-36475, JP-A-5-89959, JP-A-7-169567, etc., an airtight case or the like that covers an organic EL display element in a nitrogen atmosphere or an inert gas atmosphere. A technique is known in which the substrate is closely fixed on a light-transmitting insulating substrate to block moisture, oxygen and the like in the atmosphere.
【0007】しかし、気密ケースは金属、またはガラス
で形成され、有機EL表示素子の厚み、重量の約1/2
〜1/3を占める。そこで、有機EL表示素子をさらに
薄型、軽量する場合、前記の有機EL表示素子を覆う気
密ケース等を取り除き、封止膜のみで完全に封止した方
が望ましい。However, the hermetic case is formed of metal or glass, and is about half the thickness and weight of the organic EL display element.
Occupies ~ 1/3. Therefore, when the organic EL display element is to be made thinner and lighter, it is preferable to remove the hermetic case or the like covering the organic EL display element and completely seal the organic EL display element only with the sealing film.
【0008】有機EL表示素子に電圧を印加した時に局
所的なショートが発生し、それに伴う発熱によって有機
層が蒸発する場合がある。そのエネルギーによって、封
止層中にピンホール、クラックが生じ、外部の水分、酸
素等の通り道となる場合がある。その為、封止層のみで
完全に封止を行った場合でも、大気中の水分、酸素等を
完全に遮断することができず、やはり、駆動時間の経過
に伴って、ダークスポットが生じたり、所定の品質の発
光が維持できなくなったりする。[0008] When a voltage is applied to the organic EL display element, a local short circuit may occur, and the heat generated thereby may cause the organic layer to evaporate. The energy may cause pinholes and cracks in the sealing layer, which may cause passage of external moisture, oxygen, and the like. Therefore, even when the sealing is completely performed only with the sealing layer, it is not possible to completely shut off moisture, oxygen, and the like in the air, and a dark spot may be generated as the driving time elapses. In some cases, light emission of a predetermined quality cannot be maintained.
【0009】[0009]
【発明が解決しようとする課題】本発明はこれらの問題
点を解決するためになされたものであり、封止不良を改
善することで、大気中の水分や酸素等の影響を極力除外
し、経時劣化が少なく、初期性能を長時間維持できる長
寿命の有機EL表示素子とその製造方法を提供するもの
である。SUMMARY OF THE INVENTION The present invention has been made in order to solve these problems. By improving the sealing failure, the effects of moisture and oxygen in the atmosphere are eliminated as much as possible. An object of the present invention is to provide a long-life organic EL display element capable of maintaining initial performance for a long time with little deterioration over time and a method of manufacturing the same.
【0010】[0010]
【課題を解決するための手段】本発明において上記目的
を達成するために、まず、請求項1においては、基板上
に電極と蛍光媒体と対向電極と、少なくとも蛍光媒体と
対向電極を覆う封止層とを設けた有機エレクトロルミネ
ッセンス素子において、前記封止層が少なくともバリア
層、樹脂層、バリア層を順次形成した積層体であること
を特徴とする有機エレクトロルミネッセンス表示素子で
ある。In order to achieve the above object of the present invention, first, in claim 1, an electrode, a fluorescent medium and a counter electrode on a substrate, and at least a sealing covering the fluorescent medium and the counter electrode are provided. The sealing layer is a laminated body in which at least a barrier layer, a resin layer, and a barrier layer are sequentially formed, wherein the sealing layer is a laminated body.
【0011】また、請求項2においては、請求項1に記
載の発明を前提とし、前記バリア層が少なくとも水蒸気
バリア性および/または酸素バリア性を有する金属膜、
または無機膜、あるいはそれらの積層膜であることを特
徴とする有機エレクトロルミネッセンス表示素子であ
る。According to a second aspect, based on the premise of the first aspect, the barrier layer has a metal film having at least a water vapor barrier property and / or an oxygen barrier property,
Or, it is an organic electroluminescent display element characterized by being an inorganic film or a laminated film thereof.
【0012】また、請求項3においては、請求項1およ
び請求項2に記載の発明を前提とし、前記樹脂層がアク
リル系モノマーまたはアクリル系オリゴマーであること
を特徴とする有機エレクトロルミネッセンス表示素子で
ある。According to a third aspect of the present invention, there is provided an organic electroluminescent display device according to the first and second aspects, wherein the resin layer is made of an acrylic monomer or an acrylic oligomer. is there.
【0013】また、請求項4においては、基板上に電極
と蛍光媒体と対向電極と、少なくとも蛍光媒体と対向電
極を覆う封止層とを設けた有機エレクトロルミネッセン
ス素子において、少なくとも、前記構造体をバリア層で
被覆する工程、前記バリア層を樹脂層で被覆する工程、
前記樹脂層を硬化する工程、前記樹脂層をバリア層で被
覆する工程を含むことを特徴とする有機エレクトロルミ
ネッセンス表示素子の製造方法である。According to a fourth aspect of the present invention, there is provided an organic electroluminescence device having an electrode, a fluorescent medium, a counter electrode, and a sealing layer covering at least the fluorescent medium and the counter electrode on a substrate. A step of coating with a barrier layer, a step of coating the barrier layer with a resin layer,
A method for manufacturing an organic electroluminescent display element, comprising a step of curing the resin layer and a step of covering the resin layer with a barrier layer.
【0014】また、請求項5においては、請求項4に記
載の発明を前提とし、発光媒体の形成から封止層の形成
までを真空中で連続で行うことを特徴とする有機エレク
トロルミネッセンス表示素子の製造方法としたものであ
る。According to a fifth aspect of the present invention, based on the premise of the fourth aspect, an organic electroluminescent display element is characterized in that the steps from the formation of the light emitting medium to the formation of the sealing layer are continuously performed in a vacuum. This is a method of manufacturing.
【0015】[0015]
【発明の実施の形態】以下、本発明の有機EL表示素子
の一例を、基板上の電極が陽極、対向電極が陰極となる
場合の製造工程に従って詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, an example of an organic EL display device of the present invention will be described in detail according to a manufacturing process in which an electrode on a substrate is an anode and a counter electrode is a cathode.
【0016】先ず、透光性絶縁の基板上にスパッタリン
グ法等により透明導電膜を形成し、フォトリソグラフィ
ー法及びウエットエッチング法で透明導電膜をパターニ
ングし、複数の電極(陽極ライン)を形成する。First, a transparent conductive film is formed on a transparent insulating substrate by a sputtering method or the like, and the transparent conductive film is patterned by a photolithography method and a wet etching method to form a plurality of electrodes (anode lines).
【0017】本発明における基板としては、石英基板、
ガラス基板、プラスチック基板等が使用できる。As the substrate in the present invention, a quartz substrate,
A glass substrate, a plastic substrate, or the like can be used.
【0018】本発明における複数の陽極ラインの材料と
しては、ITO(インジウムスズ複合酸化物)やインジ
ウム亜鉛複合酸化物、亜鉛アルミニウム複合酸化物等の
透明電極材料が使用できる。As a material for the plurality of anode lines in the present invention, a transparent electrode material such as ITO (indium-tin composite oxide), indium-zinc composite oxide, and zinc-aluminum composite oxide can be used.
【0019】なお、抵抗を下げるために透明導電膜には
銅、クロム、アルミニウム、チタン等の金属もしくはこ
れらの積層物を補助電極として部分的に併設させること
ができる。また、陽極上に短絡防止用絶縁層を形成する
必要はないが、絶縁層がないことに限定するものではな
い。Incidentally, in order to reduce the resistance, a metal such as copper, chromium, aluminum and titanium or a laminate thereof can be partially provided as an auxiliary electrode in the transparent conductive film. Further, it is not necessary to form a short-circuit prevention insulating layer on the anode, but the invention is not limited to the absence of the insulating layer.
【0020】その後、発光媒体及び対向電極(陰極)を
蒸着する。対向電極蒸着時には、対向電極は予め形成さ
れた引き出し電極、一般的には電極(陽極ライン)を形
成すると同時にパターニングされた透明導電膜、に接続
される。引き出し電極は発光表示領域内側から外側に引
き出されている。Thereafter, a light emitting medium and a counter electrode (cathode) are deposited. At the time of deposition of the counter electrode, the counter electrode is connected to a lead electrode formed in advance, generally, a transparent conductive film which is patterned while forming an electrode (anode line). The extraction electrode is extended from the inside to the outside of the light emitting display area.
【0021】本発明における発光媒体は、蛍光物質を含
む単層膜、あるいは多層膜で形成することができる。The luminescent medium of the present invention can be formed of a single-layer film containing a fluorescent substance or a multilayer film.
【0022】多層膜で形成する場合の発光媒体構成例は
正孔注入輸送層、電子輸送性発光層または正孔輸送性発
光層、電子輸送層からなる2層構成や正孔注入輸送層、
発光層、電子輸送層からなる3層構成等がある。さらに
より多層で形成することも可能であり、各層を基板上に
順に成膜する。When the light-emitting medium is formed of a multilayer film, examples of the structure of the light-emitting medium include a hole injection / transport layer, an electron-transport light-emitting layer or a hole-transport light-emitting layer, and a two-layer structure including an electron-transport layer.
There is a three-layer structure including a light emitting layer and an electron transport layer. Further, it is also possible to form a multi-layer, and each layer is sequentially formed on a substrate.
【0023】正孔注入輸送材料の例としては、銅フタロ
シアニン、テトラ(t−ブチル)銅フタロシアニン等の
金属フタロシアニン類及び無金属フタロシアニン類、キ
ナクリドン化合物、1,1−ビス(4−ジ−p−トリル
アミノフェニル)シクロヘキサン、N,N’−ジフェニ
ル−N,N’−ビス(3−メチルフェニル)−1,1’
−ビフェニル−4,4’−ジアミン、N,N’−ジ(1
−ナフチル)−N,N’−ジフェニル−1,1’−ビフ
ェニル−4,4’−ジアミン等の芳香族アミン系低分子
正孔注入輸送材料やポリ(パラフェニレンビニレン)、
ポリアニリン、ポリチオフェン誘導体等の高分子正孔輸
送材料、その他既存の正孔輸送材料の中から選ぶことが
できる。Examples of the hole injecting and transporting material include metal phthalocyanines such as copper phthalocyanine and tetra (t-butyl) copper phthalocyanine, and metal-free phthalocyanines, quinacridone compounds, 1,1-bis (4-di-p- Tolylaminophenyl) cyclohexane, N, N′-diphenyl-N, N′-bis (3-methylphenyl) -1,1 ′
-Biphenyl-4,4'-diamine, N, N'-di (1
-Naphthyl) -N, N'-diphenyl-1,1'-biphenyl-4,4'-diamine and other aromatic amine-based low-molecular-weight hole injecting and transporting materials, poly (paraphenylenevinylene),
It can be selected from polymeric hole transport materials such as polyaniline and polythiophene derivatives, and other existing hole transport materials.
【0024】発光材料の例としては、9,10−ジアリ
ールアントラセン誘導体、ピレン、コロネン、ペリレ
ン、ルブレン、1,1,4,4−テトラフェニルブタジ
エン、トリス(8−キノリノラート)アルミニウム錯
体、トリス(4−メチル−8−キノリノラート)アルミ
ニウム錯体、ビス(8−キノリノラート)亜鉛錯体、ト
リス(4−メチル−5−トリフルオロメチル−8−キノ
リノラート)アルミニウム錯体、トリス(4−メチル−
5−シアノ−8−キノリノラート)アルミニウム錯体、
ビス(2−メチル−5−トリフルオロメチル−8−キノ
リノラート)[4−(4−シアノフェニル)フェノラー
ト]アルミニウム錯体、ビス(2−メチル−5−シアノ
−8−キノリノラート)[4−(4−シアノフェニル)
フェノラート]アルミニウム錯体、トリス(8−キノリ
ノラート)スカンジウム錯体、ビス〔8−(パラ−トシ
ル)アミノキノリン〕亜鉛錯体及びカドミウム錯体、
1,2,3,4−テトラフェニルシクロペンタジエン、
ペンタフェニルシクロペンタジエン、ポリ−2,5−ジ
ヘプチルオキシ−パラ−フェニレンビニレン、クマリン
系蛍光体、ペリレン系蛍光体、ピラン系蛍光体、アンス
ロン系蛍光体、ポルフィリン系蛍光体、キナクリドン系
蛍光体、N,N’−ジアルキル置換キナクリドン系蛍光
体、ナフタルイミド系蛍光体、N,N’−ジアリール置
換ピロロピロール系蛍光体等の低分子材料、ポリパラビ
ニレン誘導体、ポリフルオレン誘導体等の高分子材料、
その他既存の発光材料を用いることができる。Examples of light emitting materials include 9,10-diarylanthracene derivatives, pyrene, coronene, perylene, rubrene, 1,1,4,4-tetraphenylbutadiene, tris (8-quinolinolato) aluminum complex, tris (4 -Methyl-8-quinolinolate) aluminum complex, bis (8-quinolinolate) zinc complex, tris (4-methyl-5-trifluoromethyl-8-quinolinolate) aluminum complex, tris (4-methyl-
5-cyano-8-quinolinolate) aluminum complex,
Bis (2-methyl-5-trifluoromethyl-8-quinolinolate) [4- (4-cyanophenyl) phenolate] aluminum complex, bis (2-methyl-5-cyano-8-quinolinolate) [4- (4- Cyanophenyl)
Phenolate] aluminum complex, tris (8-quinolinolate) scandium complex, bis [8- (para-tosyl) aminoquinoline] zinc complex and cadmium complex,
1,2,3,4-tetraphenylcyclopentadiene,
Pentaphenylcyclopentadiene, poly-2,5-diheptyloxy-para-phenylenevinylene, coumarin-based phosphor, perylene-based phosphor, pyran-based phosphor, anthrone-based phosphor, porphyrin-based phosphor, quinacridone-based phosphor, Low molecular materials such as N, N'-dialkyl-substituted quinacridone-based phosphors, naphthalimide-based phosphors, N, N'-diaryl-substituted pyrrolopyrrole-based phosphors, and high-molecular materials such as polyparavinylene derivatives and polyfluorene derivatives;
Other existing light emitting materials can be used.
【0025】有機電子輸送材料の例としては、2−(4
−ビフィニルイル)−5−(4−t−ブチルフェニル)
−1,3,4−オキサジアゾール、2,5−ビス(1−
ナフチル)−1,3,4−オキサジアゾール、およびオ
キサジアゾール誘導体やビス(10−ヒドロキシベンゾ
[h]キノリノラート)ベリリウム錯体、トリアゾール
化合物等が挙げられる。Examples of the organic electron transporting material include 2- (4
-Bifinylyl) -5- (4-t-butylphenyl)
-1,3,4-oxadiazole, 2,5-bis (1-
Naphthyl) -1,3,4-oxadiazole, oxadiazole derivatives, bis (10-hydroxybenzo [h] quinolinolate) beryllium complexes, triazole compounds and the like.
【0026】発光媒体は真空蒸着法により形成すること
ができる。発光媒体の膜厚は、単層または積層により形
成する場合においても1μm以下であり、好ましくは5
0〜150nmである。The luminous medium can be formed by a vacuum deposition method. The thickness of the luminescent medium is 1 μm or less even when it is formed as a single layer or a stacked layer, and preferably 5 μm or less.
0 to 150 nm.
【0027】陰極材料としては電子注入効率の高い物質
を用いる。具体的にはMg,Al,Yb等の金属単体を
用いたり、発光媒体と接する界面にLiや酸化Li,L
iF等の化合物を1nm程度挟んで、安定性・導電性の
高いAlやCuを積層して用いる。As the cathode material, a substance having a high electron injection efficiency is used. Specifically, a single metal such as Mg, Al, or Yb may be used, or Li or oxidized Li, L
Al and Cu having high stability and conductivity are stacked and used with a compound such as iF sandwiched by about 1 nm.
【0028】または電子注入効率と安定性を両立させる
ため、低仕事関数なLi,Mg,Ca,Sr,La,C
e,Er,Eu,Sc,Y,Yb等の金属1種以上と、
安定なAg,Al,Cu等の金属元素との合金系が用い
られる。具体的にはMgAg,AlLi,CuLi等の
合金が使用できる。Alternatively, in order to achieve both electron injection efficiency and stability, low work functions of Li, Mg, Ca, Sr, La, C
one or more metals such as e, Er, Eu, Sc, Y, Yb;
An alloy system with a stable metal element such as Ag, Al, or Cu is used. Specifically, alloys such as MgAg, AlLi, and CuLi can be used.
【0029】対向電極(陰極)の形成方法は、材料に応
じて、抵抗加熱蒸着法、電子ビーム蒸着法、反応性蒸着
法、イオンプレーティング法、スパッタリング法を用い
ることができる。陰極の厚さは、10nm〜1μm程度
が望ましい。As a method for forming the counter electrode (cathode), a resistance heating evaporation method, an electron beam evaporation method, a reactive evaporation method, an ion plating method, or a sputtering method can be used depending on the material. The thickness of the cathode is desirably about 10 nm to 1 μm.
【0030】最後に、発光媒体や陰極の大気中の水分、
酸素による劣化を抑制する為、前記構造体上に封止層を
順次形成する。先ず、バリア層を積層し、前記構造体を
完全に被覆する。バリア層は水蒸気バリア性および/ま
たは酸素バリア性を有する金属膜、または無機膜あるい
はそれらの積層膜で構成される。積層膜の場合には、有
機層との組み合わせでも差し支えない。導電性のバリア
膜を使用する場合には、陰極を短絡しないよう注意が必
要である。Finally, the moisture in the atmosphere of the luminescent medium and the cathode,
In order to suppress deterioration due to oxygen, a sealing layer is sequentially formed on the structure. First, a barrier layer is laminated to completely cover the structure. The barrier layer is formed of a metal film having a water vapor barrier property and / or an oxygen barrier property, an inorganic film, or a laminated film thereof. In the case of a laminated film, a combination with an organic layer may be used. When using a conductive barrier film, care must be taken not to short-circuit the cathode.
【0031】本発明で用いられる金属膜としては、アル
ミニウム、マグネシウム、銅等を使用することができ
る。As the metal film used in the present invention, aluminum, magnesium, copper or the like can be used.
【0032】本発明で用いられる無機膜としては、酸化
アルミニウム、酸化マグネシウム、酸化シリコン等の酸
化物、あるいはフッ化アルミニウム、フッ化マグネシウ
ム等のフッ化物、あるいは窒化アルミニウム、窒化シリ
コン等の窒化物を使用することができる。As the inorganic film used in the present invention, oxides such as aluminum oxide, magnesium oxide and silicon oxide, fluorides such as aluminum fluoride and magnesium fluoride, and nitrides such as aluminum nitride and silicon nitride are used. Can be used.
【0033】バリア層の形成方法は、材料に応じて、抵
抗加熱蒸着法、電子ビーム蒸着法、反応性蒸着法、イオ
ンプレーティング法、スパッタリング法を用いることが
できる。封止の厚さは、水蒸気バリア性および/または
酸素バリア性が十分にあれば制限はないが、0.1μm〜
100μm程度、好ましくは0.1 μm〜10μm程度が
望ましい。As a method of forming the barrier layer, a resistance heating evaporation method, an electron beam evaporation method, a reactive evaporation method, an ion plating method, and a sputtering method can be used depending on the material. The thickness of the seal is not limited as long as it has a sufficient water vapor barrier property and / or oxygen barrier property.
About 100 μm, preferably about 0.1 μm to 10 μm is desirable.
【0034】次に、バリア層上に樹脂層を形成する。樹
脂層には、熱硬化性樹脂、光硬化性樹脂、または電子線
硬化性樹脂等が使用できる。ただし、樹脂の選定には、
成膜時に溶剤により発光媒体を溶解しない、硬化時に熱
で発光媒体を破壊しない等を留意する必要がある。そこ
で、樹脂層形成には、溶剤を使用しない真空成膜法を使
用する方が好ましい。また、樹脂には、発光媒体を破壊
しない熱で硬化できるフェノール樹脂、不飽和ポリエス
テル、けい素樹脂等の熱硬化性樹脂、あるいは硬化時に
発光媒体に影響を与えない光硬化性樹脂、または電子線
硬化性樹脂を使用することができる。特に、樹脂には、
真空中で成膜できる、光、または電子線で硬化するとい
う二点からアクリルモノマーまたはアクリルオリゴマー
を使用することが好ましい。Next, a resin layer is formed on the barrier layer. For the resin layer, a thermosetting resin, a photocurable resin, an electron beam curable resin, or the like can be used. However, when selecting the resin,
Care must be taken not to dissolve the luminescent medium with a solvent during film formation, and not to destroy the luminescent medium with heat during curing. Therefore, it is more preferable to use a vacuum film forming method without using a solvent for forming the resin layer. In addition, the resin includes a thermosetting resin such as a phenol resin, an unsaturated polyester, and a silicon resin that can be cured by heat without destroying the light emitting medium, a photocurable resin that does not affect the light emitting medium when cured, or an electron beam. A curable resin can be used. In particular, for resin,
It is preferable to use an acrylic monomer or an acrylic oligomer because it can be formed in a vacuum and is cured with light or an electron beam.
【0035】光硬化性樹脂、または電子線硬化性樹脂に
は、脂肪族アクリレート、脂環式アクリレート、芳香族
アクリレート、OH基またはアリル基またはグリシジル
基またはカルボキシル基またはクロモ基またはブロモ基
等を含有する官能基含有アクリレート、リン型アクリレ
ート、金属型アクリレート等の樹脂モノマーまたはオリ
ゴマーを使用することができる。または、前記アクリレ
ートと同じ骨格のメタクリレートを使用することもでき
る。または、ピロリドン、酢酸ビニル等の樹脂モノマー
またはオリゴマーを使用することができる。なお、硬化
促進のために、重合開始剤等を併用混入しても良い。The photo-curable resin or the electron beam-curable resin contains an aliphatic acrylate, an alicyclic acrylate, an aromatic acrylate, an OH group or an allyl group, a glycidyl group, a carboxyl group, a chromo group, or a bromo group. Resin monomers or oligomers such as functional group-containing acrylates, phosphorus acrylates and metal acrylates can be used. Alternatively, a methacrylate having the same skeleton as the acrylate may be used. Alternatively, resin monomers or oligomers such as pyrrolidone and vinyl acetate can be used. In addition, a polymerization initiator or the like may be mixed and used together to promote curing.
【0036】樹脂層の形成方法には、材料に応じて、抵
抗加熱蒸着法、フラッシュ蒸着法、電子ビーム蒸着法、
スパッタリング法を用いることができる。成膜後、所定
の方法で硬化させる。成膜後、真空中で硬化を行うこと
が好ましい。The resin layer may be formed according to the material by resistance heating evaporation, flash evaporation, electron beam evaporation,
A sputtering method can be used. After the film is formed, it is cured by a predetermined method. After film formation, curing is preferably performed in a vacuum.
【0037】次に、樹脂層上に再度前記バリア層を形成
する。Next, the barrier layer is formed again on the resin layer.
【0038】こうして作製された有機EL表示素子にお
いて、電圧を印加した場合にショートによる発熱が生
じ、そのエネルギーによって第一のバリア層が破壊さ
れ、水蒸気や酸素の通り道になるピンホールやクラック
が発生しても、樹脂層でピンホールやクラックが遮断さ
れる。この為、第二のバリア層により、第一のバリア層
から繋がるピンホールやクラックは外気と接触しない。In the organic EL display device thus manufactured, when a voltage is applied, heat is generated due to a short circuit, and the energy causes the first barrier layer to be destroyed, thereby generating pinholes and cracks through which water vapor and oxygen pass. Even so, pinholes and cracks are blocked by the resin layer. Therefore, the pinholes and cracks connected from the first barrier layer do not come into contact with the outside air due to the second barrier layer.
【0039】封止層は、バリア層/樹脂層/バリア層か
らなる3層に限定する物ではなく、4層以上積層しても
良い。The sealing layer is not limited to three layers consisting of the barrier layer / resin layer / barrier layer, but may be four or more layers.
【0040】なお、上記記載の材料及び形成方法を用
い、基板上の電極が陰極、対向基板が陽極となる有機E
L表示素子の製造も可能なことは言うまでもない。In addition, using the above-described materials and forming method, an organic electrode having an electrode on a substrate serving as a cathode and an opposing substrate serving as an anode is used.
It goes without saying that the L display element can be manufactured.
【0041】[0041]
【実施例】[実施例1]本発明の実施例を図1に従って
説明する。まず、ガラスからなる基板1上にスパッタリ
ング法で陽極としてITO膜を形成した。さらに、透明
性と導電性を向上させるために、空気中230℃で1時
間加熱処理を行い、ITO膜を結晶化した。[Embodiment 1] An embodiment of the present invention will be described with reference to FIG. First, an ITO film was formed as an anode on a substrate 1 made of glass by a sputtering method. Further, in order to improve transparency and conductivity, a heat treatment was performed in air at 230 ° C. for 1 hour to crystallize the ITO film.
【0042】次に、フォトリソグラフィー法およびウェ
ットエッチング法によってITO膜2をパターンニング
し、電極(陽極)2を形成した。Next, the ITO film 2 was patterned by photolithography and wet etching to form an electrode (anode) 2.
【0043】次に、有機発光媒体層3として銅フタロシ
アニン、N,N’−ジ(1−ナフチル)−N,N’−ジ
フェニル−1,1’−ビフェニル−4,4’−ジアミ
ン、トリス(8−キノリノラート)アルミニウム錯体を
順に、10nm、40nm、50nmの膜厚で真空蒸着
し、次に対向電極(陰極)4としてMgAgを基板回転
しながら二元共蒸着した。Next, copper phthalocyanine, N, N'-di (1-naphthyl) -N, N'-diphenyl-1,1'-biphenyl-4,4'-diamine, tris ( 8-Quinolinolato) aluminum complex was sequentially vacuum-deposited with a film thickness of 10 nm, 40 nm, and 50 nm, and then MgAg as a counter electrode (cathode) 4 was binary co-deposited while rotating the substrate.
【0044】次に、封止層5を形成する。先ず、バリア
層6aとしてSiO2 、Alを順に、200nm、20
0nmの膜厚で真空蒸着した。Next, a sealing layer 5 is formed. First, SiO 2 and Al are sequentially formed as the barrier layer 6a to a thickness of 200 nm
Vacuum evaporation was performed at a film thickness of 0 nm.
【0045】次に、バリア層6a上に樹脂層7としてポ
リエチレングリコールアクリレートを2μmの膜厚で真
空蒸着し、真空中で電子線硬化行った。電子線硬化条件
は電子照射量10Mrad、加速電圧120kVで行った。Next, polyethylene glycol acrylate was vacuum-deposited to a thickness of 2 μm as a resin layer 7 on the barrier layer 6a, and electron beam curing was performed in a vacuum. The electron beam curing was performed at an electron irradiation amount of 10 Mrad and an acceleration voltage of 120 kV.
【0046】次に、樹脂層7上にバリア層6bとしてA
l、SiO2 を順に、200nm、200nmの膜厚で
真空蒸着した。Next, A is formed on the resin layer 7 as a barrier layer 6b.
1 and SiO 2 were sequentially vacuum deposited to a thickness of 200 nm and 200 nm.
【0047】得られた有機EL表示素子はダークスポッ
トの拡大は観察されず、初期輝度300cd/m2 で半
減寿命6000時間であった。寿命測定中に発生した直
径約1μm以下の微小のダークスポットも拡大はしなか
った。In the obtained organic EL display element, enlargement of a dark spot was not observed, and the initial luminance was 300 cd / m 2 and the half-life was 6000 hours. Even a minute dark spot having a diameter of about 1 μm or less generated during the life measurement did not expand.
【0048】[実施例2]実施例1と同様な工程で作製
した有機EL表示素子で樹脂層としてエポキシエステル
70PA(共栄化学(株)製)を2μmの膜厚で真空蒸
着し、すぐに電子線硬化行った。電子線硬化条件は電子
照射量20Mrad、加速電圧200kVで行った。得られ
た有機EL表示素子はダークスポットの拡大は観察され
ず、初期輝度300cd/m2 で半減寿命4000時間
であった。寿命測定中に発生した直径約1μm以下の微
小のダークスポットも拡大はしなかった。[Example 2] Epoxy ester 70PA (manufactured by Kyoei Chemical Co., Ltd.) was vacuum-deposited with a thickness of 2 μm as a resin layer on the organic EL display element manufactured in the same process as in Example 1, and immediately the electron Wire curing was performed. The electron beam curing was performed at an electron irradiation amount of 20 Mrad and an acceleration voltage of 200 kV. In the obtained organic EL display element, enlargement of a dark spot was not observed, and the initial luminance was 300 cd / m 2 and the half-life was 4000 hours. Even a minute dark spot having a diameter of about 1 μm or less generated during the life measurement did not expand.
【0049】[比較例]実施例1と同様な工程で作製し
た有機EL表示素子で樹脂層を成膜せずに、単にバリア
層をSiO2、Alを200nm、200nmの膜厚で順次
真空蒸着した。得られた有機EL表示素子は測定当初は
ダークスポットの発生は観察されなかった、しかし、寿
命測定中にダークスポットが発生、拡大し、表示品質が
著しく悪くなった。初期輝度300cd/m2 で半減寿
命2000時間であった。[Comparative Example] In the organic EL display element manufactured in the same process as in Example 1, without forming a resin layer, the barrier layer was simply vacuum-deposited with SiO 2 and Al in order of 200 nm and 200 nm in thickness. did. No dark spots were observed in the obtained organic EL display element at the beginning of the measurement, but dark spots were generated and enlarged during the lifetime measurement, and the display quality was significantly deteriorated. The half life was 2,000 hours at an initial luminance of 300 cd / m 2 .
【0050】[0050]
【発明の効果】本発明によれば、バリア層、樹脂層、バ
リア層を順次積層した封止層によって前記構造体を完全
に被覆することで、電圧を印加した場合にショートによ
る発熱が生じ、そのエネルギーによって第一のバリア層
が破壊され、水蒸気や酸素の通り道になるピンホールや
クラックが発生しても、樹脂層でピンホールやクラック
が遮断される。この為、第二のバリア層により、第一の
バリア層から繋がるピンホールやクラックは外気と接触
しない。よって、水分や外気等の影響を極力除外し、経
時劣化が少なく、初期性能を長時間維持できる長寿命の
有機EL表示素子とその製造方法を提供することができ
る。According to the present invention, by completely covering the structure with a sealing layer in which a barrier layer, a resin layer, and a barrier layer are sequentially laminated, when a voltage is applied, heat is generated due to a short circuit, Even if the first barrier layer is destroyed by the energy and a pinhole or a crack which becomes a passage for water vapor or oxygen is generated, the resin layer blocks the pinhole or the crack. Therefore, the pinholes and cracks connected from the first barrier layer do not come into contact with the outside air due to the second barrier layer. Accordingly, it is possible to provide a long-life organic EL display element capable of minimizing the influence of moisture, outside air, and the like, reducing deterioration with time, and maintaining initial performance for a long time, and a method of manufacturing the same.
【0051】[0051]
【図1】本発明の有機EL表示素子の一例の断面の構造
を示す説明図である。FIG. 1 is an explanatory diagram showing a cross-sectional structure of an example of an organic EL display element of the present invention.
1 透光性絶縁基板 2 電極(陽極) 3 有機発光媒体 4 対向基板(陰極) 5 封止層 6a バリア層 6b バリア層 7 樹脂層 REFERENCE SIGNS LIST 1 translucent insulating substrate 2 electrode (anode) 3 organic luminescent medium 4 opposing substrate (cathode) 5 sealing layer 6 a barrier layer 6 b barrier layer 7 resin layer
Claims (5)
なくとも蛍光媒体と対向電極を覆う封止層とを設けた有
機エレクトロルミネッセンス素子において、 前記封止層が少なくともバリア層、樹脂層、バリア層を
順次形成した積層体であることを特徴とする有機エレク
トロルミネッセンス表示素子。1. An organic electroluminescent device comprising a substrate provided with an electrode, a fluorescent medium, a counter electrode, and a sealing layer covering at least the fluorescent medium and the counter electrode, wherein the sealing layer comprises at least a barrier layer, a resin layer, An organic electroluminescent display element, which is a laminate in which barrier layers are sequentially formed.
および/または酸素バリア性を有する金属膜、または無
機膜、あるいはそれらの積層膜であることを特徴とする
請求項1に記載の有機エレクトロルミネッセンス表示素
子。2. The organic electroluminescent display according to claim 1, wherein the barrier layer is a metal film having at least a water vapor barrier property and / or an oxygen barrier property, an inorganic film, or a laminated film thereof. element.
クリル系オリゴマーからなることを特徴とする請求項1
および請求項2に記載の有機エレクトロルミネッセンス
表示素子。3. The method according to claim 1, wherein the resin layer is made of an acrylic monomer or an acrylic oligomer.
And the organic electroluminescent display device according to claim 2.
なくとも蛍光媒体と対向電極を覆う封止層とを設けた有
機エレクトロルミネッセンス素子において、 少なくとも、前記構造体をバリア層で被覆する工程、前
記バリア層を樹脂層で被覆する工程、前記樹脂層を硬化
する工程、前記樹脂層をバリア層で被覆する工程を含む
ことを特徴とする有機エレクトロルミネッセンス表示素
子の製造方法。4. An organic electroluminescence device having an electrode, a fluorescent medium and a counter electrode on a substrate and a sealing layer covering at least the fluorescent medium and the counter electrode, wherein at least the structure is covered with a barrier layer. And a step of coating the barrier layer with a resin layer, a step of curing the resin layer, and a step of coating the resin layer with a barrier layer.
空中で連続で行うことを特徴とする請求項4に記載の有
機エレクトロルミネッセンス表示素子の製造方法。5. The method according to claim 4, wherein the steps from the formation of the light emitting medium to the formation of the sealing layer are continuously performed in a vacuum.
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| JP2000120581A JP2001307873A (en) | 2000-04-21 | 2000-04-21 | Organic electroluminescent display device and method of manufacturing the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000120581A JP2001307873A (en) | 2000-04-21 | 2000-04-21 | Organic electroluminescent display device and method of manufacturing the same |
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|---|---|
| JP2001307873A true JP2001307873A (en) | 2001-11-02 |
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ID=18631366
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