JP2001108818A - Color filter substrate, method for manufacturing color filter substrate, liquid crystal device, method for manufacturing liquid crystal device, and electronic apparatus - Google Patents

Abstract

(57) [Summary] In a dark environment, light emitted from a fluorescent tube 301 is incident on a liquid crystal panel by a light guide plate 302, and the polarizing plate 1
14. After passing through the phase difference plate 113, the transflective electrode 102
, And is introduced into the liquid crystal layer 50 by being colored by the color filter 104. The light introduced into the liquid crystal layer 50 is emitted to the observation side of the liquid crystal panel via the phase difference plate 213 and the polarizing plate 214 in this order. On the other hand, in a bright environment, light incident from the observation side is reflected by the polarizing plate 214 and the liquid crystal layer 5.
After passing through 0, it is colored by the color filter 104,
The light is reflected by the transflective electrode 102 and emitted again to the observation side.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate having a colored layer formed on a metal and a method of manufacturing the same, and further relates to a liquid crystal device using these substrates, a method of manufacturing the same, and an electronic apparatus using the liquid crystal device.

[0002]

2. Description of the Related Art As is well known, in a liquid crystal device, a liquid crystal itself does not emit light, but performs display or the like simply by changing a light path. For this reason, the liquid crystal device must have a configuration in which light is always incident on the panel in some form. In this regard, display devices using other methods, such as an electroluminescence display device and a plasma display, are required. Are very different. Here, in a liquid crystal device, a type in which light incident from a light source or the like provided on the back side of the panel passes through the panel and emits to the observation side is called a transmission type, while external light or the like incident from the observation side is transmitted by the panel. The type that is reflected and emitted to the observation side is called a reflection type.

In the reflection type, the amount of external light incident from the observation side is not so large as compared with the amount of light from the light source disposed on the back side of the panel. In the reflection type, light is incident on the panel and reflected. Because it has a double route,
The amount of light attenuation in each part is large, and the amount of light emitted to the observation side is smaller than that in the transmission type. For this reason, the reflective screen generally has a darker display screen than the transmissive type,
There is a disadvantage that.

[0004] However, the reflection type has many advantages over the above-mentioned disadvantages, such as the fact that display is possible without a light source with large power consumption and that the visibility is high even outdoors where sunlight is applied. For this reason, reflective liquid crystal devices have become widespread mainly in portable electronic devices and the like.

[0005] The simple reflection type has an essential problem that the display cannot be visually recognized by the user when there is almost no external light. As one measure for solving this problem, a so-called transflective liquid crystal device has been proposed. In a liquid crystal device, in a bright place, a reflective type is mainly used by using external light in the same manner as in a normal reflective type, while in a dark place, a light source provided on the back side of the panel is turned on to provide a transmissive type. It is used supplementarily to make it visible at any place. Further, in recent years, color display is required for portable electronic devices, OA devices, and the like. Therefore, even in a transflective liquid crystal device, colorization is often required.

A transflective liquid crystal device capable of color display as described above is disclosed, for example, in Japanese Patent Application Laid-Open No. 7-31891.
No. 9 discloses this. In the liquid crystal device described in this publication, a pixel electrode serving also as a transflective film is provided on the inner surface of the liquid crystal layer, and the birefringence effect of the liquid crystal layer and the retardation plate and the observation side and the rear side of the liquid crystal panel The color display is performed by coloring the light by the light analyzing action of the provided polarizing plate. In this configuration, since the transflective film is provided on the inner surface of the liquid crystal layer, compared with the configuration provided on the outside of the liquid crystal layer,
A double image due to parallax, blurring of display, and the like are prevented, and very bright colored light is obtained.

[0007]

DISCLOSURE OF THE INVENTION However, this liquid crystal device has a problem that the color reproducibility is poor because the light is colored by the birefringence effect and the light analyzing effect.

The present invention has been made in view of the above problems, and a first object of the present invention is to provide a transflective or reflective liquid crystal device having improved color reproducibility.

The transflective film is generally made of aluminum or an aluminum alloy containing aluminum as a main component, as is clear from the above-mentioned publication. If a colored layer such as a color filter or a light-shielding layer is directly formed on such a semi-transmissive reflective film, the surface of aluminum may be deteriorated during the formation process, and the reflective characteristics may be adversely affected. For example, when a colored layer is formed by an etching method, the surface of aluminum may be damaged by an etchant. Further, even when the colored layer is formed by the colored sensitizing material method, the surface of aluminum may be damaged during the development of the colored sensitized material.

Accordingly, a second object of the present invention is to provide a color filter substrate in which destruction and deterioration of aluminum used as a semi-transmissive reflective film or a metal film of a reflective electrode are prevented by a simple process in the step of forming a colored layer. And a liquid crystal device and a method for manufacturing the same.

First, the color filter substrate of the present invention is applied to a liquid crystal device for achieving the first object.
A color filter substrate having a metal film between a substrate and a coloring layer, wherein the metal film and the coloring layer are separated by a protective film provided between the metal film and the coloring layer. It is characterized by.

According to the present invention, since the metal film and the coloring layer are separated by the protective film, the surface of the metal film does not deteriorate when the coloring layer is formed. Therefore, a color filter substrate having a good reflection characteristic of the metal film is realized.

Here, an oxide film of a metal film can be used as the protective film. At this time, the oxide film of the metal film is preferably an anodic oxide film. This is because the anodic oxidation method can easily control the thickness of the oxide film and can form a dense oxide film with few defects such as pinholes. Further, by appropriately controlling the film thickness, a colored layer can be formed by an electrodeposition method.

As other examples of the protective film, an oxide other than the metal oxide, an organic insulating film, or a nitride can be used. Examples of the oxide other than the metal oxide include silicon oxide such as SiO ₂ , the organic insulating film include an acrylic resin, and the nitride includes silicon nitride typified by Si ₃ N ₄ . In the case where an oxide other than the oxide of the metal film material is used as the protective film, a decrease in the reflectance is suppressed due to the small refractive index.In the case where an organic insulating film is used, spin coating and roll coating are used. In the case of using a nitride in which a protective film can be easily formed by coating or the like, there is an advantage that a decrease in reflectance is suppressed due to a small refractive index.

Further, a protective film may be formed by appropriately combining two or more kinds of films selected from the above-described metal oxide films, other oxide films, organic insulating films and nitride films.

As the metal film, a metal film containing aluminum, silver, chromium or the like as a main component is used. In the case where a metal film containing aluminum as a main component is used, a metal film with high reflectance is realized by using an inexpensive material. In addition, since an oxide film can be formed by anodic oxidation of aluminum, a protective film of an oxide film can be easily formed. The content ratio of aluminum in the metal film is preferably 85% by weight or more. When a metal film containing silver as a main component is used, a metal film having a very high reflectance can be realized. The proportion of silver in the metal film is preferably at least 85% by weight.

Next, in order to apply the present invention to a liquid crystal device for achieving the first object, a method of manufacturing a color filter substrate according to the present invention is directed to a color filter substrate having a metal film between the substrate and the colored layer. Wherein the method includes a step of forming a protective film on the metal film, and a step of forming a colored layer on the protective film. In such a method of manufacturing a color filter substrate, for the same reason as the above color filter substrate, a color filter substrate having a good reflection characteristic of the metal film without deteriorating the metal film surface in the step of forming the colored layer. Realize.

Here, the step of forming the protective film includes:
And oxidizing the metal film. Preferably, the metal film is anodized. This is because the anodic oxidation method can easily control the thickness of the oxide film and can form a dense oxide film with few defects such as pinholes. Further, by appropriately controlling the film thickness, a colored layer can be formed by an electrodeposition method.
Other components are the same as those of the color filter substrate.

The gist of the liquid crystal device of the present invention is as follows.
First and second substrates, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the second substrate on the liquid crystal layer side, from the first substrate side. A liquid crystal device having a metal film that reflects incident light and a coloring layer provided on the liquid crystal side of the metal film, wherein the metal film and the coloring layer are formed of the coloring layer and the metal film. That is, they are separated by a protective film provided therebetween. According to this liquid crystal device, since the color filter substrate is provided, the surface of the metal film does not deteriorate when the colored layer is formed. Therefore, the reflection characteristics of the metal film are improved.

In this embodiment of the liquid crystal device, the protective film comprises:
Including an oxide film of a metal film. At this time, the oxide film of the metal film is preferably an anodic oxide film. According to this aspect, the thickness of the oxide film can be easily controlled by the anodic oxidation method, and a dense oxide film with few defects such as pinholes can be formed.

Next, the gist of the method for manufacturing a liquid crystal device of the present invention is as follows. First and second substrates, a liquid crystal layer sandwiched between the first and second substrates, A method for manufacturing a liquid crystal device, comprising: a metal film formed on a surface on a side of the liquid crystal layer and reflecting light incident from the first substrate side; and a coloring layer provided on the liquid crystal side of the metal film. A step of forming a protective film on the metal film; and a step of forming a colored layer on the protective film. According to this manufacturing method, since the method for manufacturing the color filter substrate is provided, the surface of the metal film does not deteriorate when the colored layer is formed. Therefore, the reflection characteristics of the metal film are improved.

In this aspect of the manufacturing method, the step of forming the protective film includes a step of oxidizing the metal film. Preferably, the metal film is anodized. This is because the anodic oxidation method can easily control the thickness of the oxide film and can form a dense oxide film with few defects such as pinholes. Further, by appropriately controlling the film thickness, a colored layer can be formed by an electrodeposition method. Other components are the same as those of the color filter substrate and the method of manufacturing the same.

Further, the gist of the electronic device of the present invention is that the first and second substrates, a liquid crystal layer sandwiched between the first and second substrates, and the liquid crystal layer side of the second substrate An electronic device comprising, as a display unit, a liquid crystal device formed on a surface of the substrate and having a metal film that reflects light incident from the first substrate side and a coloring layer provided on the liquid crystal side of the metal film. The metal film and the colored layer are separated from each other by a protective film provided between the colored layer and the metal film. According to this electronic device, since the liquid crystal device is provided, an electronic device capable of displaying a good image can be realized.

Next, in the present invention, the first object,
Further, a specific liquid crystal device for achieving the second object will be described. First, in order to achieve the first object, a first liquid crystal device of the present invention comprises first and second transparent substrates and a liquid crystal sandwiched between the first and second substrates. A transparent electrode formed on a surface of the first substrate on the liquid crystal layer side, a transflective electrode formed on a surface of the second substrate on the liquid crystal layer side, and the transflective electrode And a colored layer formed on the upper surface of the substrate.

According to the first liquid crystal device, in the transmissive display, light is incident from the second substrate side, passes through the transflective electrode, passes through the colored layer and the liquid crystal layer, and then passes through the first liquid crystal layer. On the other hand, in the reflection type display, after being incident from the first substrate side, the light is reflected by the semi-transmissive reflective electrode through the liquid crystal layer and the colored layer in order, and the current path is traced backward. Light is emitted from the first substrate side. For this reason, in both the transmissive display and the reflective display, light transmits through the colored layer, so that the first object of improving color reproducibility is achieved. Further, since the transflective electrode is formed on the liquid crystal layer side of the second substrate, the distance from the liquid crystal layer is small. For this reason, in the reflective display, there is no occurrence of a double image or display bleeding due to parallax.

In such a liquid crystal device, an illumination device such as a backlight may be provided on the second substrate on the side opposite to the liquid crystal side. With such an illuminating device, light from the illuminating device transmits through the transflective electrode, so that a bright display using a transmissive display can be performed even in a dark place.

As the transflective electrode, for example, a metal mainly composed of aluminum, silver, chromium or the like is used.
When a film having a thickness of about 15 to 20 nm is used, a film having a reflectance of about 85% and a transmittance of about 10% can be obtained. Here, in particular, when a metal mainly containing aluminum is used, an inexpensive transflective electrode having high reflectance can be realized. When a metal containing aluminum as a main component is used, the content ratio of aluminum in the metal is desirably 85% by weight or more.

In one aspect of the first liquid crystal device, a protective film is formed between the colored layer and the transflective electrode. According to this aspect, since the colored layer and the transflective electrode are separated by the protective film, the destruction and deterioration of aluminum used as the transflective electrode can be prevented by a simple process in the process of forming the colored layer. The second object of the present invention is achieved.

Here, it is desirable that the protective film is an anodic oxide film of a metal constituting the transflective electrode. This is because the thickness of the anodic oxide film can be easily controlled, and the anodic oxide film can be formed densely with few defects such as pinholes. Further, by appropriately controlling the film thickness, the colored layer can be formed by a so-called electrodeposition method.

As another example of the protective film, an oxide film other than the metal constituting the transflective electrode, a nitride film, or an organic insulating film may be used. Here, the oxide film is Si
A silicon oxide such as O _2, and a silicon nitride typified by Si ₃ N ₄ as the nitride film;
Any of them can be formed by a chemical vapor deposition method. On the other hand, the organic insulating film includes an acrylic resin and the like, and can be formed by a spin coating method, a roll coating method, or the like.

Further, a protective film may be formed by appropriately combining two or more of a metal oxide film constituting the semi-transmissive reflective electrode and other oxide films, organic insulating films and nitride films. . By doing so, the thickness of the protective film becomes small, and a decrease in reflectance is suppressed as much as possible.

In another aspect of the first liquid crystal device, the transflective electrode has a slit-shaped opening, and the colored layer corresponds to a position where the slit is provided. It is formed. According to this aspect, in the transmissive display, light is transmitted (passed) through the slit, and is emitted from the first substrate side through the coloring layer and the liquid crystal layer in this order. At this time, since the colored layer is formed corresponding to the position where the slit is provided, light passing through the slit is colored by the colored layer, so that color reproducibility in a transmissive display is improved. Becomes

As a driving method of the first liquid crystal device, various methods such as an active matrix method can be applied in addition to a passive matrix method. When the active matrix method is applied, first, the following mode can be considered. That is, in one aspect of the first liquid crystal device to which the active matrix method is applied, the transflective electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. According to this aspect, the transflective electrode
Since the switching element is also used as a pixel electrode and a switching element is connected to each pixel electrode, an ON pixel and an OFF pixel can be electrically separated by the switching element. For this reason, contrast and response are good,
In addition, high-definition display can be easily achieved.

Next, in another aspect of the first liquid crystal device to which the active matrix system is applied, the transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. According to this aspect, the transparent electrode is also used as the pixel electrode, and the switching element is connected to each pixel electrode.
Similarly, the ON pixel and the OFF pixel can be electrically separated by the switching element, so that the contrast, the response, and the like are good, and a high-definition display can be easily achieved.

The switching elements in these embodiments include a TFD (Thin Film Diode) element and a TFT.
Various elements such as a (Thin Film Transistor) element can be applied.

The first object is also achieved by a first electronic device having the above-described first liquid crystal device. According to the first electronic apparatus, in both the transmissive display and the reflective display, the color reproducibility is improved, and the liquid crystal device performs a display that does not generate a double image or a blur due to parallax. Various electronic devices provided with are realized. Such an electronic device can realize high-quality display regardless of ambient light even in a bright place or a dark place.

Next, in order to achieve the first object,
According to a second liquid crystal device of the present invention, there are provided first and second substrates having transparency, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer side of the first substrate. A first transparent electrode formed on a surface of the second substrate, a semi-transmissive reflective film formed on a surface of the second substrate on the liquid crystal layer side, and a colored layer formed on an upper surface of the semi-transmissive reflective film; A second transparent electrode formed on the upper surface of the coloring layer.

According to the second liquid crystal device, in the transmissive display, light enters from the second substrate side and passes through the transflective film, and then the colored layer, the second transparent electrode, and the liquid crystal layer. In the reflection type display, while the light is emitted from the first substrate side, the light is incident from the first substrate side, and then reflected by the semi-transmissive reflection film through the liquid crystal layer, the second transparent electrode, and the colored layer in this order. Then, the light is emitted from the first substrate side by following the path that has just come. For this reason, in both the transmissive display and the reflective display, light passes through the colored layer, so that color reproducibility is improved, and the first object is achieved as in the first liquid crystal device. Will be done. Further, since the transflective film is formed on the liquid crystal layer side of the second substrate, the distance from the liquid crystal layer is small. For this reason, in the reflective display, there is no occurrence of a double image or display bleeding due to parallax.

Further, in the second liquid crystal device, similarly to the first liquid crystal device, an illumination device may be provided on the second substrate on the side opposite to the liquid crystal side. When the illumination device is provided in this manner, light from the illumination device transmits through the transflective film, so that a bright display using a transmissive display can be performed even in a dark place.

In one aspect of the second liquid crystal device, a protective film is formed between the colored layer and the transflective film. According to this aspect, the coloring layer and the transflective film are separated by the protective film. Therefore, also in this embodiment, the second object of preventing the destruction / deterioration of aluminum used as the transflective film by a simple process in the process of forming the colored layer is achieved.

Here, it is desirable that the protective film is an anodic oxide film of a metal constituting the transflective film.
This is because the thickness of the anodic oxide film can be easily controlled, and the anodic oxide film can be formed densely with few defects such as pinholes. Further, by appropriately controlling the film thickness, the colored layer can be formed by a so-called electrodeposition method. As another example of the protective film, an oxide film other than the metal oxide constituting the semi-transmissive reflective film, a nitride film, or an organic insulating film may be used. They may be appropriately combined.

In another aspect of the second liquid crystal device, a slit-shaped opening is provided in the transflective film, and the colored layer corresponds to a position where the slit is provided. It is formed. According to this aspect, in the transmissive display, light transmits (passes) through the slit and exits from the first substrate side through the coloring layer, the second transparent electrode, and the liquid crystal layer in this order. At this time, since the colored layer is formed corresponding to the position where the slit is provided, light passing through the slit is colored by the colored layer, so that color reproducibility in a transmissive display is improved. Becomes

Further, when compared with the structure in which the transflective electrode is provided with a slit as in the first liquid crystal device,
Since the second transparent electrode exists in the opening of the slit, an electric field is also applied to the opening of the slit. For this reason, the liquid crystal molecules located in the slit portion are aligned without being caused by the leakage electric field from the edge of the slit, so that light having no optical rotation is prevented from passing through the slit, thereby improving the display quality. The Rukoto. Further, the slit can be formed without depending on the pixel or dot formation area.

As the driving method of the second liquid crystal device, various methods such as an active matrix method can be applied in addition to the passive matrix method as in the first liquid crystal device. Among these, in one aspect to which the active matrix method is applied, the second transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. According to this aspect, since the second transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode, the ON pixel and the OFF pixel can be electrically separated by the switching element. . For this reason, the contrast and the response are good, and a high-definition display can be easily achieved.

Next, in another aspect of the second liquid crystal device to which the active matrix system is applied, the first transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. I have. According to this aspect, the first transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. Similarly, the ON pixel and the OFF pixel are electrically connected by the switching element. It can be separated, so that the contrast and the response are good, and a high-definition display can be easily achieved. Furthermore, the switching element is provided not on the second substrate side where the coloring layer is formed below the second transparent electrode but on the first substrate side where the first transparent electrode is formed. It is not necessary to consider the heat resistance of the colored layer in the manufacturing process. Therefore, the degree of freedom in the manufacturing process of the switching element can be increased. Note that various elements such as a TFT element and a TFD element can be used as the switching element in these aspects, similarly to the first liquid crystal device.

The first object is also achieved by a second electronic device having the above-mentioned second liquid crystal device. According to the second electronic apparatus, in both the transmissive display and the reflective display, the color reproducibility is improved, and the liquid crystal device performs a display without generating a double image or a blur due to parallax. Various electronic devices provided with are realized. Such an electronic device can realize high-quality display regardless of ambient light even in a bright place or a dark place.

Next, in order to simultaneously achieve the first and second objects, the third liquid crystal device of the present invention comprises a first liquid crystal device and a second liquid crystal device interposed between the first and second substrates. A sandwiched liquid crystal layer, a transparent electrode formed on the surface of the first substrate on the liquid crystal layer side, a reflective electrode formed on a surface of the second substrate on the liquid crystal layer side, and the reflective electrode And a colored layer formed on the upper surface of the protective film.

According to the third liquid crystal device, after the light enters from the first substrate side, the light is reflected by the reflection electrode through the liquid crystal layer, the coloring layer, and the protective film in order, and follows the current path in reverse. Then, the light is emitted from the first substrate side. At this time, the light is colored by the colored layer formed on the upper surface of the reflective electrode via the protective film,
The above-mentioned first object of improving color reproducibility is achieved. At the same time, since the colored layer and the reflective electrode are separated by the protective film formed therebetween, in the process of forming the colored layer, destruction / deterioration of aluminum used as the reflective electrode is prevented by a simple process. The second object is achieved. Furthermore, since the reflective electrode is formed on the liquid crystal layer side of the second substrate, the distance between the reflective electrode and the liquid crystal layer is small. For this reason,
It is possible to prevent a double image, display bleeding, and the like due to parallax.

Here, it is desirable that the protective film is an anodic oxide film of a metal constituting the reflective electrode. This is because the thickness of the anodic oxide film can be easily controlled, and the anodic oxide film can be formed densely with few defects such as pinholes. Further, by appropriately controlling the film thickness, the colored layer can be formed by a so-called electrodeposition method. In addition, as another example of the protective film, an oxide film other than the metal constituting the transflective film,
A nitride film or an organic insulating film may be used, or two or more of these films may be appropriately combined.

As the driving method of the third liquid crystal device, various types such as an active matrix method can be applied in addition to the passive matrix method, similarly to the first and second liquid crystal devices. Among these, in one aspect to which the active matrix method is applied, the reflection electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. According to this aspect,
Since the reflection electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode, the ON pixel and the OFF pixel can be electrically separated by the switching element. For this reason, the contrast and the response are good, and a high-definition display can be easily achieved.

Next, in another aspect of the third liquid crystal device to which the active matrix system is applied, the transparent electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. According to this aspect, the transparent electrode is also used as the pixel electrode, and the switching element is connected to each pixel electrode.
Similarly, the ON pixel and the OFF pixel can be electrically separated by the switching element, so that the contrast, the response, and the like are good, and a high-definition display can be easily achieved. It should be noted that various elements such as a TFT element and a TFD element can be applied as the switching element in these aspects, similarly to the first and second liquid crystal devices.

The first and second objects are also achieved by a third electronic device having the above-described third liquid crystal device. According to the third electronic apparatus, various types of electronic apparatuses including a liquid crystal device that performs display without increasing double images and bleeding due to parallax while improving color reproducibility in a reflective display. Is realized.

[0053]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the best mode for carrying out the present invention will be described for each embodiment with reference to the drawings.

(First Embodiment) First, a liquid crystal device according to a first embodiment of the present invention will be described. This liquid crystal device is a transflective liquid crystal device that performs only reflective display in a bright place, and also uses transmissive display in a dark place.
FIG. 1 is a schematic sectional view showing the configuration of the liquid crystal device.

In this figure, the liquid crystal device has a configuration in which a liquid crystal layer 50 is sealed between two transparent substrates 101 and 201 by a frame-shaped sealing material 52. The liquid crystal layer 50 is a nematic liquid crystal having a predetermined twist angle. Here, the substrate 201 on the upper side (observation side) in FIG.
A transparent electrode 207 made of ITO (Indium Tin Oxide) or the like is formed on the inner surface of the substrate in a shape described later. An alignment film 212 is further formed on the surface of the transparent electrode 207, and rubbing is performed in a predetermined direction.

On the other hand, a semi-transmissive reflective electrode 102 made of, for example, aluminum is formed on the inner surface of the lower substrate 101 in FIG. Here, since the transflective electrode 102 in this embodiment is formed to have a relatively small thickness of 15 to 20 nm, the reflectivity is about 85%, and the transmissivity is about 10%. Function as a transflective film. That is, the transflective electrode 102 reflects the light incident from the liquid crystal layer 50 side (upper side) and re-introduces the light into the liquid crystal layer 50, while the substrate 101
The light incident from the side (lower side) is transmitted and introduced into the liquid crystal layer 50. Note that such a transflective film is also realized by a configuration in which a slit is provided in the transflective electrode 102 and opened as described later.

Next, a protective film 103 and a color filter 104 are sequentially formed on the upper surface of the transflective electrode 102 as described later. Here, in the color filter 104, for example, three colors of R (red), G (green), and B (blue) are arranged in a predetermined pattern. A flattening film 106 made of an organic film or the like is formed on the upper surface of the color filter 104 in order to eliminate a step. And
An alignment film 112 is further formed on the surface of the flattening film 106, and rubbing is performed in a predetermined direction.

On the outer surface of the upper substrate 201, a retardation plate 213 and a polarizing plate 214 are arranged in this order when viewed from the substrate 201 side. On the other hand, under the LCD panel,
That is, the retardation plate 113 and the polarizing plate 114 are sequentially arranged outside the lower substrate 101 when viewed from the substrate 101 side. Further, a backlight including a fluorescent tube 301 that emits white light and a light guide plate 302 having an incident end face along the fluorescent tube 301 is disposed below the polarizing plate 114. Among them, the light guide plate 302 is a transparent body such as an acrylic resin plate having a rough surface for light scattering formed on the entire back surface or a printed layer for scattering, and the white light of the fluorescent tube 301 as a light source. Is received on the incident end face, and substantially uniform light is emitted from the surface (the upper face in the figure). In addition, as the backlight, LED
(Light emitting diode), EL (electroluminescence), or the like can be used.

Next, with respect to the display of the liquid crystal device having such a configuration, first, the reflection type display will be described. In the reflective display, external light is transmitted through the polarizing plate 214 and the retardation plate 21.
3 sequentially pass through the liquid crystal layer 50 and the color filter 104, are reflected by the transflective electrode 102, follow the current path in reverse, and exit from the polarizing plate 214 again. At this time, passing (bright state) and absorption (dark state) of the polarizing plate 214 and brightness between them are controlled in accordance with the voltage applied to the liquid crystal layer 50.

Next, the transmission type display in this liquid crystal device will be described. In the transmissive display, the light from the backlight enters a predetermined polarization state by sequentially transmitting through a polarizing plate 114 and a phase difference plate 113, passes through a semi-transmissive reflective electrode 102, and passes through a color filter 104 and a liquid crystal layer 50.
After passing through the phase difference plate 213, the polarizing plate 214
Emitted from At this time, passing (bright state) and absorption (dark state) of the polarizing plate 214 and brightness between them are controlled in accordance with the voltage applied to the liquid crystal layer 50.

According to such a liquid crystal device, the light is transmitted through the color filter 104 in both the reflection type display and the transmission type display, so that the color reproducibility can be improved. Further, the transflective electrode 102 is connected to the lower substrate 10.
1, that is, on the liquid crystal layer side, the distance from the liquid crystal layer 50 is small. For this reason, in a reflective display, occurrence of a double image, display blur, or the like due to parallax is prevented.

In this liquid crystal device, since light from the backlight passes through the transflective electrode, a bright display using a transmissive display can be performed even in a dark place. In some places, bright display by reflective display is possible, and power consumption is reduced by turning off the backlight.

A front light may be provided on the upper surface of the upper substrate 201 instead of the backlight, and a mechanism for taking in external light may be provided below the lower substrate 101. In this configuration, in a bright place, a transmissive display is mainly performed, while in a dark place, a reflective display is mainly performed.

(Mode of Lower Substrate, Manufacturing Process, etc.) Here, the mode and manufacturing process of the substrate 101 on which the transflective electrode 102, the protective film 103, and the color filter 104 are sequentially formed will be described. FIG.
1 is a cross-sectional view showing a configuration example of a color filter 10
FIG. 4 is a diagram showing a state where up to 4 are formed. The manufacturing process up to this state will be briefly described below.

First, a transflective electrode 1 made of aluminum is placed on a substrate 101 made of transparent glass or the like.
02 is formed. Second, the semi-transmissive reflective electrode 102 is anodized to form an oxide film on its surface,
03. Here, as the anodizing chemical solution, for example, a solution containing 1 to 10% by weight of ammonium salicylate and 20 to 80% by weight of ethylene glycol is used.
At this time, the formation voltage may be set within the range of 5 to 250 V, and the current density may be set within the range of 0.001 mA / cm ² , depending on the desired film thickness. As the anodizing chemical solution, a substance other than the above-mentioned composition can be used. The conditions of the formation voltage and the current density are appropriately set according to the formation solution. And third, R (red), G (green),
A color filter 104 of B (blue) is formed by a coloring material method. Here, as the arrangement of the color filters 104, for example, an arrangement in a stripe shape, a mosaic shape, a triangle shape, or the like is selected and used depending on the application.

Here, the substrate 101 is not limited to glass, and for example, a flexible substrate such as plastic can be used. Further, the protective film 103 is not limited to the anodic oxide film, and may be, for example, SiO ₂ or Si ₃ N ₄ formed by a chemical vapor deposition method, or an organic film formed by spin coating or roll coating. An insulating film or the like can be used. In particular, the transflective electrode 102
In the case where is used as a pixel electrode, since anodic oxidation is difficult, it is effective to use SiO ₂ , Si ₃ N ₄ , or an organic insulating film as the protective film 103.

The method of forming the color filter 104 is not limited to the color sensitive material method, but can be formed by, for example, a dyeing method, a transfer method, a printing method, or the like.
In addition, the color filter 104 may be formed by an electrodeposition method by making the thickness of the protective film 103 formed by anodic oxidation sufficiently thin within a range capable of protecting the transflective electrode 102. It is possible.

The transflective electrode 102 is not limited to aluminum, but may be a metal containing silver as a main component. However, as the protective film 103, SiO ₂ , Si ₃ N ₄ , or an organic insulating film formed by a chemical vapor deposition method is used. Further, in the substrate 101, the protective film 103 may be configured as a multilayer film as follows, instead of a single layer. FIG. 3 is a cross-sectional view of the substrate according to this configuration, showing a state in which up to the color filter 104 is formed. The manufacturing process up to this state will be briefly described.

In this configuration example, first, a transflective electrode 102 made of aluminum is formed on a substrate 101 made of glass or the like. Second, the semi-transmissive reflective electrode 102 is similarly anodized to form an anodized film 103 on the surface thereof.
a is formed. The conditions for anodic oxidation are the same as those described above. Third, the SiO ₂ film 103b is formed by using a chemical vapor deposition method. Therefore, in this configuration, the anodic oxide film 103a and the SiO ₂ film 103b
The combination of the above becomes the protective film 103. And the fourth
Next, a color filter 104 is formed by a coloring material method.

In this configuration example, the anodic oxide film 103
a and the SiO ₂ film 103b are combined into a protective film 10
3, but it is also possible to use a combination of an SiO ₂ film instead of the anodic oxide film 103a and Si ₃ N ₄ instead of the SiO ₂ film 103b.
It is also possible to use an organic insulating film. In addition, a combination of three or more layers can be used. However, in view of the fact that the manufacturing process is complicated and the reflectivity is reduced,
It is believed that it is preferable to keep the combination of two or three layers.

In addition, even when the protective film 103 is formed of a multilayer film, the transflective electrode
A metal containing silver as a main component may be used. However, since anodic oxidation becomes difficult, a combination of SiO ₂ , Si ₃ N ₄ , an organic insulating film, and the like is used.

Further, a light-shielding layer may be formed on a portion of the substrate 101 where the color filter 104 is not formed. FIG. 4 is a cross-sectional view of the substrate according to this configuration,
FIG. 4 is a diagram illustrating a state where a color filter 104 and a light shielding layer 105 are formed. Here, the light-blocking layer 105 is provided to prevent light leakage from a non-display portion in the liquid crystal device and to prevent a decrease in contrast. Further, in an active matrix type liquid crystal device in which a switching element is connected to a pixel electrode, a light shielding layer 105 is provided.
Has also a role of preventing deterioration of the switching element due to light leakage current. Then, the light shielding layer 105
Is a color filter 10 made of a highly light-shielding metal such as chrome or a color resist in which a black pigment is dispersed.
4 or R (red), G
By overlapping the (green) and B (blue) color filters 104, they can be formed by the color filters 104 themselves.

Further, in the configuration example in which the light-shielding layer 105 is provided, as shown in FIG. 5, the protective film 103 is formed by appropriately forming an anodic oxide film, a SiO ₂ film, a Si ₃ N ₄ film, and an organic insulating film. It may be constituted by the films 103a and 103b which are overlapped. This is as described above.

In FIG. 2 to FIG. 5, the substrate 101 on which the color filter 104 and the light shielding layer 105 are formed
After the planarizing film 106 and the alignment film 112 are formed, the structure is applied to a liquid crystal device.

Although the light-shielding layer 105 is omitted in FIG. 1, it is of course preferable to provide the light-shielding layer 105 because it is effective in terms of increasing contrast and preventing deterioration of the switching element. Although the protective film 103 is a single layer in FIG. 1, as described above, a multi-layer film in which an anodic oxide film, an SiO ₂ film, a Si ₃ N ₄ film, and an organic insulating film are appropriately stacked may be used. The same applies to points.

In addition, in the above description, three colors of R (red), G (green), and B (blue) are used as the color filters 104. However, the present invention is not limited to this. For example, Y (yellow), Three colors of M (magenta) and C (cyan) may be used. Here, the transflective electrode 102 has been particularly described as being unpatterned. However, it should be noted that, as described later, the transflective electrode 102 may be patterned into a predetermined shape or may not be patterned. .

In such a substrate 101, the color filter 104 and the light shielding layer 105 are
2 is separated by the protective film 103, so that in the process of forming the color filter 104 and the light shielding layer 105, destruction and deterioration of aluminum used as the transflective electrode 102 can be prevented by a simple process. Becomes

(In the case where a slit is provided in the reflective electrode) Next, the above-mentioned semi-transmissive reflective electrode 102 is not formed with a relatively thin aluminum film, but is provided with a slit to form a semi-transmissive reflective film. The configuration in that case will be described. FIG. 6 is a plan view showing a partial structure of the liquid crystal device. Here, the illustrated configuration example is a case of a passive matrix type liquid crystal device. On the inner surface of the upper substrate, a transparent electrode 207 has a stripe shape, and a plurality of transparent electrodes 207 extend in the horizontal direction in the drawing. On the other hand, the transflective electrode 1 is formed on the inner surface of the lower substrate.
A plurality of stripes 02 are formed in a stripe shape, extending in the vertical direction in the figure.

Here, one dot is constituted by an area overlapping one of the transflective electrodes 102 assigned to R (red), G (green), and B (blue) and one of the transparent electrodes 207. In addition, one pixel having a substantially square shape is formed by three adjacent RGB dots. Further, the transflective electrode 102 is provided with four rectangular slits 1102 for each dot, and in a transmissive display, light is transmitted through the slits 1102.

Since the translucent reflective electrode 102 has a rectangular slit 1102, the slit 11
02 due to the short side 1102a (the component in the substrate is slit 1
The oblique electric field (parallel to the longitudinal direction of 102)
02 is weakened according to the length of the long side 1102b. That is, due to the long side 1102b (the component in the substrate is the slit 11
The motion of the liquid crystal molecules existing near the slit is controlled by the oblique electric field (perpendicular to the longitudinal direction of O.2). For this reason, the oblique electric field due to the short side 1102a is generated by the long side 1102b.
And the liquid crystal alignment failure due to the oblique electric field due to the slit 1102 can be reduced as a whole, and further, the oblique electric field due to the long side 1102b can be positively reduced. It can be used. As a result, display defects are reduced, and the threshold voltage at the time of driving the liquid crystal is reduced, so that power consumption can be reduced.

Such a rectangular slit 1102 is
It can be easily formed by a photo step / etching step / peeling step using a resist. That is, when the transflective electrode 102 is formed and then patterned into a predetermined shape, the slit 1102 is formed at the same time. Here, the width of the slit 1102 is preferably 0.01 μm or more and 20 μm or less, and particularly preferably 4 μm or less. With such a width,
It is difficult for the naked eye to identify the slit 1102, and a transflective film is formed that simultaneously realizes the reflective display and the transmissive display while suppressing the deterioration of the display quality due to the formation of the slit 1102. . Also, slit 1
102 is 5% or more 30 with respect to the transflective electrode 102
% Is preferable. By setting such a ratio, it is possible to suppress a decrease in brightness in the reflective display, and to realize a transmissive display by light introduced into the liquid crystal layer 50 (see FIG. 1) through the slit 1102. Become.

The transflective electrodes 102 are formed in a plurality of stripes at predetermined intervals, and the slits 1102 are formed along the longitudinal direction of the transflective electrode 102 (therefore, the vertical direction in FIG. 6). Have been.
Therefore, if the oblique electric field caused by the slit 1102 is dealt with, the oblique electric field caused by the gap 102b of the transflective electrode 102 can be dealt with at the same time.

Further, the slit 1102 is formed in the transparent electrode 2
07 to a position facing the gap 207b. Therefore, the short side 1102a of the slit 1102
Is located out of the region to which a voltage is applied between the transflective electrode 102 and the transparent electrode 207, so that the liquid crystal alignment defect caused by the short side 1102a of the slit 1102, which causes the liquid crystal alignment defect, is remarkable. It will be reduced to. From this point of view, the slit 1102 is
It may extend over multiple dots, and furthermore,
It may extend outside the display area.

Note that, in FIG.
Although illustration of the light-shielding layer 105 is omitted, in practice,
The color filter 104 is formed on the upper surface of the transflective electrode 102 separated by the protective film 103 and at least in a region where the transparent electrode 207 intersects. For this reason,
The light transmitted through the slit 1102 is reflected by the color filter 104.
Is colored. Further, the light shielding layer 105
Is a region of the substrate 101 where the color filter 104 is not formed, for example, the gap 1 between the transflective electrodes 102.
02b, a region facing the gap 207b of the transparent electrode 207, or the like.

As described above, when the transflective electrode 102 is formed as a transflective film by providing the slit 1102, a metal film such as aluminum can be formed without reducing the film thickness. Further, since the light is transmitted (passed) through the slit and colored by the color filter, the color reproducibility in the transmissive display can be improved.

(Relationship Between Electrode Shape and Color Filter Forming Position) Here, the transflective electrode 102 formed on the substrate 101 and the transparent electrode 207 formed on the substrate 201
Will be described in relation to the formation position of the color filter 104.

First, the case where the liquid layer device is of a passive matrix type will be described. In this configuration example,
As shown in FIG. 7, a plurality of transflective electrodes 102 are formed in stripes on the inner surface of the lower substrate, and a plurality of transparent electrodes 207 are formed in stripes on the inner surface of the upper substrate. Both electrodes are arranged so as to be orthogonal to each other. The color filter 104 is formed so as to correspond to each intersection of the transflective electrode 102 and the transparent electrode 207. In such a configuration, when a potential difference occurs between the two electrodes, the liquid crystal layer 50 (see FIG. 1) is driven according to the electric field strength.

Next, if the liquid crystal device is an active matrix type, a two-terminal switching element represented by a TFD element, a three-terminal switching element represented by a TFT element, or the like may be used as a switching element. it can. Here, the switching element may be provided on the upper substrate 101 (see FIG. 1), or may be provided on the lower substrate 2.
01 (see FIG. 1). Therefore, there are a total of four combinations of the switching element and the substrate on which the switching element is formed, and each combination will be described below.

First, as a first combination, a case where a TFD element is used as a switching element, and a case where this TFD element is formed on the lower substrate 101 will be described. FIG. 8 shows a configuration example in this case. In this configuration example, the transflective electrode 10 on the inner surface of the lower substrate 101
2 are formed as rectangular pixel electrodes and arranged in a matrix. Here, the transflective electrode 102 belonging to the same column is a TFD element 420 formed on the substrate 101.
, Are commonly connected to one data line 422 also formed on the substrate 101. Therefore, the data lines 422 are formed by the number of columns in the matrix arrangement of the transflective electrodes 102. On the other hand, on the inner surface of the upper substrate 201, a plurality of transparent electrodes 207 are formed as stripe-shaped scanning lines extending in the row direction, and one transparent electrode 207 is formed of the transflective electrode 102 which is a pixel electrode. They are arranged so as to intersect one row. The color filter 104 has a protective film 103 on the upper surface of the transflective electrode 102 corresponding to each intersecting position between the transflective electrode 102 serving as a pixel electrode and the transparent electrode 207.
Is formed through the above.

Next, as a second combination, a case where a TFD element is used as a switching element, and a case where this TFD element is formed on the upper substrate 201 will be described. In this configuration example, the relationship between the transflective electrode 102 and the transparent electrode 207 in FIG. 8 is replaced. That is, as shown in parentheses in FIG. 8, the transparent electrode 207 is formed on the inner surface of the upper substrate 201.
Are formed as rectangular pixel electrodes, are arranged in a matrix, and belong to the same column.
Are commonly connected to one data line 422 also formed on the substrate 201 via each TFD element 420 formed on the substrate 201. On the other hand, on the inner surface of the lower substrate 201, a plurality of semi-transmissive reflective electrodes 102 are formed as stripe-shaped scanning lines extending in the row direction, and one semi-transmissive reflective electrode 102 is formed as a transparent pixel electrode. The electrodes 207 are arranged so as to intersect one row of the electrodes 207. The color filter 104 includes the transparent electrode 2 serving as a pixel electrode.
A configuration is formed on the upper surface of the transflective electrode 102 via the protective film 103, corresponding to each intersection position between the transflective electrode 07 and the transflective electrode 102.

Next, as a third combination, a case where a TFT element is used as a switching element, and a case where this TFT element is formed on the lower substrate 101 will be described. FIG. 9 shows a configuration example in this case. In this configuration example, the transflective electrode 1 on the inner surface of the lower substrate 101
02 is formed as a rectangular pixel electrode and arranged in a matrix. On the substrate 101, data lines 442 are formed in the column direction, and scanning lines 444 are formed in the row direction. Further, the data line 442 and the scanning line 444
A TFT element 440 is provided corresponding to the intersection with.
Specifically, the source of the TFT element 440 is the data line 442
The drain is connected to the transflective electrode 102 which is a pixel electrode,
The gates are connected to the scanning lines 444, respectively. on the other hand,
The transparent electrode 207 is formed on one surface of the upper substrate 201 so as to face all of the transflective electrode 102 serving as a pixel electrode. The color filter 104 corresponds to the position where the transflective electrode 102 serving as the pixel electrode is formed.
The structure is formed on the upper surface of the transflective electrode 102 via the protective film 103.

Finally, as a fourth combination, a case where a TFT element is used as a switching element, and a case where this TFT element is formed on the upper substrate 201 will be described. In this configuration example, the relationship between the transflective electrode 102 and the transparent electrode 207 in FIG. 9 is replaced. That is, as shown in parentheses in FIG. 9, the transparent electrode 207 is formed on the inner surface of the upper substrate 201.
Are formed as rectangular pixel electrodes and arranged in a matrix. On the substrate 201, data lines 442 are formed in the column direction, and scanning lines 444 are formed in the row direction. Further, a TFT element 440 is provided corresponding to the intersection of the data line 442 and the scanning line 444. On the other hand, on the inner surface of the lower substrate 101, the transflective electrode 102
It is formed on one surface so as to face all of the transparent electrodes 207 as pixel electrodes. Then, the color filter 104
The configuration is such that the transparent electrode 207 is formed on the upper surface of the transflective electrode 102 via the protective film 103 in correspondence with the position where the transparent electrode 207 as the pixel electrode is formed.

Although FIGS. 8 and 9 are simplified for convenience of description, they are actually configured as follows.

(TFD Element) First, the details of the TFD element 420 will be described by taking a case where the TFD element 420 is formed on the lower substrate as an example. FIG. 10 shows the TFD element 42.
FIG. 11 is a plan view showing a layout around 0, and FIG. 11 is a cross-sectional view taken along line BB ′ of FIG. As shown in these figures, the TFD element 420
The first metal film 432, the insulating film 434, and the second metal film 4 are sequentially formed from the insulating film 430 side with the insulating film 430 formed thereon as a base.
36, and adopts a metal-insulator-metal sandwich structure. With this structure, the TFD element 420 has positive and negative bidirectional diode switching characteristics. In addition, the first metal film 4 constituting the TFD element 420
32 is formed as a scanning line 422 as it is,
The second metal film 436 is connected to the transflective electrode 102. 8 and 10, the TFD element 42
Although 0 is connected to the data line 422, it may be connected to the scanning line.

On the other hand, as described above, the substrate 101 has insulating properties and transparency, and is made of, for example, glass or plastic. Here, the reason why the insulating film 430 is provided is to prevent the first metal film 432 from peeling off from the base by heat treatment after the deposition of the second metal film 436, and to diffuse impurities into the first metal film 432. This is to prevent it. Therefore, when these do not cause a problem, the insulating film 430 can be omitted.

The first metal film 432 is a conductive metal thin film and is made of, for example, tantalum alone or a tantalum alloy. The insulating film 434 is, for example, a first metal film 432
Is formed by anodic oxidation of the surface in an electrolytic solution. The second metal film 434 is a conductive metal thin film,
For example, it is composed of chromium alone or a chromium alloy.

When a liquid crystal device is actually constructed, the surface of the transflective electrode 102 is coated with SiO ₂ or Si ₃
A protective film 103 made of N ₄ , an organic insulating film or the like is formed, and a color filter 104 and the like are formed so as to cover the transflective electrode 102.

As described above, the TFD is applied to the transflective electrode 102.
In the configuration in which the element 420 is connected, when a scanning signal is supplied to the transparent electrode 207 (see FIG. 8) serving as a scanning line and a data signal is supplied to the data line 422, the transflective reflection connected to the TFD element 420 is performed. Predetermined charges are accumulated in the liquid crystal layer 50 sandwiched between the electrode 102 and the data line 422 opposed thereto. Even after the charge is accumulated, a non-selection voltage is applied to make the TFD element 420 non-conductive.
Is sufficiently high, charge accumulation is maintained. When the amount of charge stored in the liquid crystal layer 50 is controlled by driving each TFD element 420 in this manner, the alignment state of the liquid crystal changes for each pixel, so that predetermined information can be displayed.

The TFD element 420 is an example of a two-terminal non-linear element.
The present invention is also applicable to devices using a diode device structure, such as an nsulator, or a device in which these devices are connected in series or parallel in the opposite direction.

The above is the case where the TFD element 420 is formed on the lower substrate. However, when the TFD element 420 is formed on the upper substrate, the transparent electrode is used instead of the transflective electrode 102 as described above. 207 is formed as a pixel electrode (see parentheses in FIGS. 10 and 11).

(TFT Element) Next, the details of the TFT element 440 will be described by taking as an example the case where the TFT element 440 is formed on the lower substrate. FIG.
FIG. 13 is a plan view showing a layout around 0, and FIG. 13 is a cross-sectional view taken along line CC ′ of FIG.

In these figures, the polysilicon layer 452 located immediately above the substrate 101 constitutes the active layer (source / drain / channel region) of the TFT element 440, and the surface thereof has a gate insulating film. 453 are formed by a thermal oxidation process. Further, the scanning lines 44 made of polysilicon or the like are formed on the surface of the gate insulating film 453.
4 is formed, and thereafter, a first interlayer insulating film 454 is formed. Here, the contact hole 455 is formed in the source region of the TFT element 440, whereby the first interlayer insulating film 454 and the gate insulating film 453 are opened,
Here, a data line 442 made of aluminum or the like is formed to achieve connection with the source region. After the data lines 442 are formed, a second interlayer insulating film 456 is further formed. Here, contact hole 4
57 is formed in the drain region of the TFT element 440,
As a result, the first interlayer insulating film 454, the second interlayer insulating film 456, and the gate insulating film 453 are opened.
The transflective electrode 102 made of aluminum or the like is formed as a pixel electrode, and is connected to the drain region.

When an actual liquid crystal device is constructed, SiO ₂ or Si ₃
A protective film 103 made of N ₄ , an organic insulating film or the like is formed, and a color filter 104 and the like are formed so as to cover the region of the transflective electrode 102. In addition, in order to prevent leakage of electric charges accumulated in the liquid crystal layer, a storage capacitor is provided for each transflective electrode 102 serving as a pixel electrode, and is added in parallel to the liquid crystal layer. Is omitted.

As described above, the transflective electrode 102 has a TFT
In a structure in which the elements 440 are connected, when a scan voltage is applied through the scan line 444, the TFT element 440 is turned on. For this reason, the image signal applied to the data line 442 is supplied to the transflective electrode 102 serving as a pixel electrode via the TFT element 440, and the transflective electrode 102 and the transparent electrode 207 facing the transflective electrode 102 Therefore, the data is written in the sandwiched liquid crystal layer 50. Then, even if the application of the scanning voltage is stopped and the TFT element 440 is turned off, the writing is maintained. Therefore, even with such a configuration, since the alignment state of the liquid crystal changes for each pixel, predetermined information can be displayed. The illustrated TFT element 440
Is merely an example, and various forms are applicable.

In the above description, the TFT element 440 is formed on the lower substrate. However, when the TFT element 440 is formed on the upper substrate, the transparent electrode is used instead of the transflective electrode 102 as described above. 207 is formed as a pixel electrode (see parentheses in FIGS. 12 and 13).

As described above, while the transflective electrode 102 is formed as a pixel electrode, the TFD element 420 and the TFT
When driven via a switching element such as the element 440, the ON pixel and the OFF pixel are electrically separated by the switching element, so that high-definition display with good contrast and response and the like is possible.

(Second Embodiment) Next, a liquid crystal device according to a second embodiment of the present invention will be described. This liquid crystal device is a transflective liquid crystal device that performs only reflective display in a bright place, and also uses transmissive display in a dark place.
FIG. 14 is a schematic sectional view showing the configuration of this liquid crystal device.

The difference between the liquid crystal device shown in this figure and the first embodiment shown in FIG. 1 is as follows. That is, the transflective electrode 102 in the first embodiment serves both as the electrode of the liquid crystal device and the transflective film, but the second embodiment differs in that these functions are separated. Are different. For this reason, a transflective film 122 is formed on the inner surface of the lower substrate 101 in FIG. Since the transflective film 122 does not function as an electrode of the liquid crystal device, it does not need to be patterned. The semi-transmissive reflective film 122 is, for example, similar to the transflective electrode 102 in the first embodiment, for example,
It is also realized by forming aluminum or the like with a relatively thin film thickness of 15 to 20 nm, or by forming a slit as described above.

Next, the protective film 103 and the color filter 104 are formed on the upper surface of the transflective film 122 as described above (as described with reference to FIGS. 2 to 5). On the upper surface, a planarizing film 106
Are formed. On the surface of the flattening film 106, a transparent electrode 107 such as ITO is formed in a predetermined shape. Then, an alignment film 112 is further formed on the surface of the transparent electrode 107, and rubbing is performed in a predetermined direction. The rest is the same as in the first embodiment, and a description thereof will be omitted.

Next, the display of the liquid crystal device according to this configuration will be described first with reference to the reflection type display. In the reflective display, external light is transmitted through the polarizing plate 214 and the retardation plate 213 in order, passes through the liquid crystal layer 50 and the color filter 104, is reflected by the transflective film 122, and reverses the current path. The light exits from the polarizing plate 214 again. At this time, passing (bright state) and absorption (dark state) of the polarizing plate 214 and brightness between them are controlled according to the voltage applied to the liquid crystal layer 50.

Next, the transmission type display in this liquid crystal device will be described. In the transmissive display, the light from the backlight is transmitted through the polarizing plate 114 and the retardation plate 113 in order to be in a predetermined polarization state.
After passing through the liquid crystal layer 22 and being introduced into the color filter 104 and the liquid crystal layer 50, and passing through the liquid crystal layer 50, the light passes through the phase difference plate 213 and exits from the polarizing plate 214. At this time, the liquid crystal layer 5
In accordance with the applied voltage to 0, the light passing through (bright state) and the absorption (dark state) of the polarizing plate 214 and the brightness between them are controlled.

According to such a liquid crystal device, in both the reflection type display and the transmission type display, as in the first embodiment, light passes through the colored layer, so that the color reproducibility can be improved. Further, the transflective film 122 is provided on the lower substrate 10.
1, that is, on the liquid crystal layer side, the distance from the liquid crystal layer 50 is small. For this reason, as in the first embodiment, it is possible to prevent the occurrence of a double image or display bleeding due to parallax in the reflective display. Further, in this liquid crystal device, since light from the backlight is transmitted through the transflective electrode, even in a dark place, a bright display using a transmissive display can be performed, while in a bright place. This is the same as in the first embodiment in that a bright display can be achieved by the reflective display and power consumption can be reduced by turning off the backlight.

Here, in the first embodiment, since the color filter 104 exists between the transflective electrode 102 (see FIG. 1) and the transflective electrode 102, the color filter 104 is applied to the liquid crystal layer 50 by the transflective electrode 102. Electric field is weakened. For this reason, in the first embodiment, there is a problem that a driving voltage becomes relatively high or a liquid crystal having a small threshold voltage is required. On the other hand, in the second embodiment, the transparent electrode 107 is formed on the color filter 104 (via the flattening film 106), and a voltage is applied thereto. The problem in the embodiment will be solved.

In the first embodiment, it is necessary to pattern the transflective electrode 102 into a shape corresponding to the driving method and the switching element to be used. There is no need to pattern into a specific shape. Instead, the transparent electrode 1
It is necessary to form 07 in a shape corresponding to the driving method and the switching element to be used.

(Form of Lower Substrate, Manufacturing Process, etc.) Next, the mode, manufacturing process, and the like of the substrate 101 on which the transflective film 122, the protective film 103, the color filter 104, and the like are formed will be described. FIG. 15A is a cross-sectional view illustrating a configuration example of the substrate 101, and is a diagram illustrating a state where the transparent electrode 107 is formed.

Here, for the transflective film 122, aluminum or the like is used similarly to the transflective electrode 102 in the first embodiment. The protection film 103 and the color filter 104 are formed in the same manner as in the first embodiment.

Next, the flattening film 106 is made of an organic film or the like, and eliminates a step due to the formation of the color filter 104, eliminates alignment defects in a liquid crystal device, and plays a role in preventing image quality deterioration. It fulfills. If this is not a problem, the flattening film 106 is unnecessary. Further, the transparent electrode 107 is made of ITO or the like, and is patterned into a predetermined shape on the surface flattened by the flattening film 106.

Further, in such a substrate 101,
As shown in FIG. 15B, a light shielding layer 105 may be formed in a gap between the color filters 104. In this configuration example, the flattening film 106 is a color filter 1
It is provided to eliminate a step due to the light shielding layer 105 and the light shielding layer 105.

Here, in each of the configurations shown in FIGS. 15A and 15B, the transparent electrode 107 is patterned into a predetermined
The present invention is applied to a liquid crystal device of an active matrix system using a two-terminal switching element such as the TFD element 420 described above.

In the structure shown in FIG. 15A or FIG. 15B, the structure shown in FIG. 15C or FIG. 15D may be employed without patterning the transparent electrode 107. Such a configuration is similar to the TFT element 4 described above.
A three-terminal switching element such as 40
1 is applied to the active matrix type liquid crystal device.

Further, as shown in FIGS. 3 and 5, the protective film 103 in FIGS. 15A to 15D is formed by appropriately stacking an anodic oxide film, a SiO ₂ film, a Si ₃ N ₄ film, and an organic insulating film. It may be constituted by the combined films 103a and 103b. These configurations are shown in FIGS.
It is shown in FIG. 16D.

Then, the substrates shown in FIGS. 15 and 16, that is, the color filter 104 and the light shielding layer 10 are formed.
5. An alignment film 112 (see FIG. 14) is formed on the substrate 101 on which the flattening film 106 and the transparent electrode 107 are formed.
It will be applied to a liquid crystal device.

Although the light-shielding layer 105 is omitted in FIG. 14, it is needless to say that the light-shielding layer 105 is preferably provided because it is effective in increasing the contrast and preventing the deterioration of the switching element. Further, in FIG. 15, although the protective film 103 is a single layer, as described above, the protective film 103 may be a multilayer film in which an SiO ₂ film, a Si ₃ N ₄ film, and an organic insulating film are appropriately laminated. The same is true. In addition, in the above description, as the color filter 104, R
(Red), G (Green), and B (Blue) are used, but the present invention is not limited to this. For example, Y (Yellow), M (Magenta),
The same applies to the point that three colors of C (cyan) may be used.

As described above, also in the second embodiment, the color filter 104 and the light shielding layer 105 are formed by the transflective film 122.
Are separated from each other by the protective film 103. Therefore, in the process of forming the color filter 104 and the light shielding layer 105,
It is possible to prevent the destruction and deterioration of aluminum used as the transflective film 122 by a simple process.

(When a slit is provided in the transflective film)
In the second embodiment, the transflective film 122 does not function as an electrode of a liquid crystal device, but merely functions to transmit and reflect light. For this reason, when a slit is provided in the transflective film 122, the first
There are fewer restrictions on the shape of the slit as compared with the embodiment. That is, the electrode function of the liquid crystal device is performed by the transparent electrode 107 formed on the color filter 104.
Regardless of the shape of the slit in the transflective film 122, any alignment defect of the liquid crystal does not occur. Also, the position where the slit is formed does not need to correspond to a pixel or a dot. For this reason, in the present embodiment, when a slit is formed in the transflective film 122, it is considered sufficient to define the area ratio with respect to the transflective film 122 and to form the slit in a size that cannot be discerned by the naked eye. . The area ratio, the size of the slit, and the like are as described in the first embodiment.

(Relationship Between Electrode Shape and Color Filter Forming Position) Next, in the second embodiment, the lower substrate 10
1, the shape of the transparent electrode 107 formed on the upper substrate 201 and the shape of the transparent electrode 207 formed on the upper substrate 201 are related to the formation position of the color filter 104. Even if there is, the transflective electrode 1 in the first embodiment
02 may be replaced with the transparent electrode 107 in the second embodiment. This concept of replacement is similarly applied to a combination of a switching element and a substrate on which the switching element is formed in an active matrix type liquid crystal device.

However, in the second embodiment, unlike the first embodiment, after the color filter 104 is formed, the transparent electrode 107 functioning as the electrode of the liquid crystal device is formed. That is, after the color filter 104 is formed in the determined region, the transparent electrode 107 is formed in a stripe shape or as a rectangular pixel electrode corresponding to this region. Therefore, when the switching element is formed on the lower substrate 101, if the manufacturing process is not devised, after the color filter 104 is formed, the switching element may be formed in consideration of the heat resistance of the color filter 104 and the like. There is a case that must be done. On the other hand, when the switching element is formed on the upper substrate 201, such consideration is not necessary, and thus the degree of freedom in the manufacturing process of the switching element can be increased. It should be noted that various elements such as a TFT element and a TFD element can be applied as the switching element, as described in the first embodiment. When driven using the switching element in this manner, the ON pixel and the OFF pixel are electrically separated by the switching element,
Good contrast and response, and high-definition display are possible. The rest is the same as in the first embodiment, and a description thereof will be omitted.

(Third Embodiment) Next, a liquid crystal device according to a third embodiment of the present invention will be described. This liquid crystal device is a reflection type liquid crystal device.

FIG. 17 is a schematic sectional view showing the structure of this liquid crystal device. The difference between the liquid crystal device shown in this figure and the first embodiment shown in FIG. 1 is as follows. That is, first, since the liquid crystal device is a reflection type, a backlight used for a transmission type display is not provided. Secondly, in the first and second embodiments, the transflective electrode 102 formed on the inner surface of the lower substrate 101 is a transflective film.
Has only a function as a reflection film literally.

In such a liquid crystal device, external light is transmitted through the polarizing plate 214 and the retardation plate 213 in this order, and
0, after passing through the color filter 104, the reflective electrode 14
The light is reflected by 2 and follows the path that has just come back, and exits again from the polarizing plate 214. At this time, passing (bright state) and absorption (dark state) of the polarizing plate 214 and brightness between them are controlled in accordance with the voltage applied to the liquid crystal layer 50.

According to such a liquid crystal device, in the reflective display, as in the first and second embodiments, light passes through the colored layer, so that color reproducibility is improved, and furthermore, the reflective electrode Since 142 is formed on the inner surface of the lower substrate 101, that is, on the liquid crystal layer side, the distance from the liquid crystal layer 50 is small. For this reason, as in the first embodiment, it is possible to prevent the occurrence of a double image or display bleeding due to parallax in the reflective display.

In the third embodiment, as the reflection electrode 142 formed on the inner surface of the lower substrate, a metal film containing aluminum, silver, chromium, or the like as a main component can be used. When a metal film containing aluminum as a main component is used, the reflective electrode 142 can be formed at low cost. In this case, aluminum can form an oxide film by anodic oxidation, so that the oxide film can be used as the protective film 103. In this case, the content ratio of aluminum in the metal film is preferably 85% by weight or more.

As the reflection electrode 142, a metal film containing silver as a main component can be used. When a metal film containing silver as a main component is used, the reflectance of the reflective electrode 142 can be extremely high. In this case, the content ratio of silver in the metal film is preferably 85% by weight or more. However, in this case, instead of the anodic oxide film, SiO ₂ , Si ₃ N ₄ , or an organic insulating film is used as the protective film 103.

It should be noted that such a reflective electrode 142 is the same as the transflective reflective electrode 102 described with reference to FIGS.
It is formed in the same manner as described above. The same applies to the protective film 103, the color filter 104, and the like. Therefore, in such a substrate 101, the color filter 104
Is separated from the reflective electrode 142 by the protective film 103, so that in the process of forming the color filters 104, the destruction and deterioration of aluminum used as the reflective electrode 142 can be prevented by a simple process. .

Since the liquid crystal device of the third embodiment is of a reflection type, the lower substrate 101 does not require transparency. Therefore, as the substrate 101, besides glass or plastic, for example, a silicon substrate or the like having an insulating film formed on the surface may be used.

Also, in the third embodiment, the lower substrate 1
01 and the upper substrate 201
Regarding the shape of the transparent electrode 207 formed in the first embodiment, the semi-transmissive reflective electrode 1 in the first embodiment can be used regardless of whether it is a passive matrix type or an active matrix type.
02 may be replaced with the transparent electrode 142 in this embodiment. The concept of the substitution is the same for a combination of a switching element and a substrate on which the switching element is formed in an active matrix type liquid crystal device. At this time, as the switching element, T
As described in the first embodiment, various elements such as an FT element and a TFD element can be applied. When driving is performed using the switching element in this manner, an ON pixel and an OFF pixel are electrically separated by the switching element, so that a high-definition display with good contrast and response and the like is possible.

The other points are the same as in the first embodiment, and the description thereof is omitted.

(Electronic Apparatus) Next, an electronic apparatus including the liquid crystal device according to any one of the first to third embodiments will be described. The above-described liquid crystal device shown in FIG. 1, FIG. 14, or FIG. 17 is suitable for a display portion of a portable electronic device because it is used in various environments and consumes low power. Therefore, an example of such an electronic device is described below.
I will show you one.

FIG. 18A shows a portable information device.
A display unit 71 is provided above the portable information device main body, and an input unit 73 is provided below the portable information device main body. The display unit 7
In most cases, a so-called touch panel is provided on the front surface of the touch panel 1. With a normal touch panel, the display is difficult to see due to the large surface reflection. Therefore, in the related art, a transmissive liquid crystal device is often used for a display unit, even if it is a portable type. However, the transmissive liquid crystal device consumes a large amount of power because it always uses a backlight, and therefore has a short battery life. Even in such a case, the first to third
When the liquid crystal device according to the embodiment is used as the display unit 71 of the portable information device, the display can be bright and vivid and the power consumption can be reduced in both the reflective type and the transflective type.

FIG. 18B shows a mobile phone. A display unit 74 is provided on the upper front part of the mobile phone body. A mobile phone is used in any environment whether indoor or outdoor. Cellular phones are often used, especially in cars, but are very dark at night. Therefore, a liquid crystal device used in a mobile phone is mainly a reflection type display device with low power consumption and, if necessary, a transflective type liquid crystal device capable of transmission type display using an auxiliary light such as a backlight. desirable. For this reason, when the liquid crystal devices according to the first and second embodiments are used as the display unit 74 of the mobile phone, it is possible to obtain a display that is brighter and has a higher contrast ratio as compared with the related art in both the reflective display and the transmissive display. it can.

FIG. 18C shows a watch. A display 76 is provided at the center of the watch body. An important aspect in watch applications is luxury. The liquid crystal device according to the first to third embodiments is replaced with a display unit 76 of a watch.
Is used, the color change is small because the characteristic change due to the wavelength of light is small. For this reason, a very high-quality display can be obtained as compared with the conventional watch.

The liquid crystal device according to the embodiment of the present invention
The present invention can be used as various display devices capable of performing bright and high-quality display in a dark place or a bright place, and further, can be used as a display unit of various electronic devices. Examples of electronic equipment in which such a liquid crystal device is used include a liquid crystal television, a viewfinder type or a monitor direct-view type video tape recorder, a car navigation device, a calculator, and a PDA.
(Personal information terminals), pagers, word processors,
Examples include a workstation, a videophone, a POS terminal, a device equipped with a touch panel, and the like.

The liquid crystal device of the present invention is not limited to the above-described embodiments, but can be modified within the scope not departing from the gist or idea of the invention, which can be read from the claims and the entire specification. A liquid crystal device accompanying such a change is also included in the technical scope of the present invention.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing a configuration of a liquid crystal device according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view illustrating an example of a substrate configuration according to the embodiment.

FIG. 3 is a cross-sectional view for explaining another example of the substrate configuration in the embodiment.

FIG. 4 is a cross-sectional view for explaining another example of the substrate configuration in the embodiment.

FIG. 5 is a cross-sectional view for explaining another example of the substrate configuration in the embodiment.

FIG. 6 is a plan view showing an example of a reflective electrode provided with a slit in the embodiment.

FIG. 7 is a plan view showing an example of a specific configuration of a reflection electrode in the embodiment.

FIG. 8 is a plan view showing another example of the specific configuration of the reflective electrode in the embodiment.

FIG. 9 is a plan view showing another example of the specific configuration of the reflective electrode in the embodiment.

FIG. 10 is a plan view showing a layout around a pixel electrode when a TFD element is used in the embodiment.

11 is a sectional view taken along line B-B 'of FIG.

FIG. 12 is a plan view showing a layout around a pixel electrode when a TFT element is used in the example.

13 is a sectional view taken along line C-C 'of FIG.

FIG. 14 is a schematic sectional view illustrating a configuration of a liquid crystal device according to a second embodiment of the present invention.

FIG. 15A is a cross-sectional view for explaining an example of the substrate configuration in the embodiment. FIG. 2B is a cross-sectional view for explaining another example of the substrate configuration in the embodiment. C is
It is sectional drawing for demonstrating the other example of the board | substrate structure in the example. D is a cross-sectional view for explaining another example of the substrate configuration in the embodiment.

FIG. 16A is a cross-sectional view for explaining another example of the substrate configuration in the embodiment. FIG. 2B is a cross-sectional view for explaining another example of the substrate configuration in the embodiment. C
FIG. 3 is a cross-sectional view for explaining another example of the substrate configuration in the embodiment. D is a cross-sectional view for explaining another example of the substrate configuration in the embodiment.

FIG. 17 is a schematic sectional view illustrating a configuration of a liquid crystal device according to a third embodiment of the present invention.

FIG. 18A is a schematic perspective view of a portable information device using the liquid crystal device according to the embodiment. FIG. 1B is a schematic perspective view of a mobile phone using the liquid crystal device according to the embodiment. FIG. 1C is a schematic perspective view of a watch using the liquid crystal device according to the embodiment.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/00 335 G09F 9/00 335Z 5G435 342 342Z 9/30 349 9/30 349A (72) Inventor Takizawa Keiji Suwa-shi, Nagano 3-3-5 Yamato F-term (reference) in Seiko Epson Corporation 2H048 BA62 BB02 BB14 BB28 BB37 BB43 2H090 HA03 HB03X HB06X HB07X HC09 HD06 KA05 LA01 LA04 LA15 2H091 FA02Y FA45 FG07 FC02 FA04 GA13 GA16 HA07 LA13 2H092 GA13 HA05 JA24 JB05 JB07 JB57 MA24 NA01 PA08 PA12 QA07 5C094 AA08 AA36 BA02 BA12 BA43 CA19 CA24 DA13 EB02 ED03 HA10 5G435 AA04 AA07 BB12 CC12 EE22 EE25 GG12 LL07

Claims (28)

[Claims] 1. A color filter substrate having a metal film between a substrate and a coloring layer, wherein the metal film and the coloring layer are formed by a protective film provided between the metal film and the coloring layer. A color filter substrate, which is separated. 2. The color filter substrate according to claim 1, wherein the protection film includes an oxide film of the metal film. 3. A method for manufacturing a color filter substrate having a metal film between a substrate and a colored layer, comprising: forming a protective film on the metal film; and forming a colored layer on the protective film. And a method of manufacturing a color filter substrate. 4. The method of claim 3, wherein forming the protective film includes oxidizing the metal film. 5. A liquid crystal layer sandwiched between the first and second substrates, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the second substrate on the liquid crystal layer side. 1. A liquid crystal device comprising: a metal film that reflects light incident from the substrate side of 1; and a coloring layer provided on the liquid crystal side of the metal film, wherein the metal film and the coloring layer include the coloring layer A liquid crystal device, wherein the liquid crystal device is separated by a protective film provided between the liquid crystal device and the metal film. 6. The liquid crystal device according to claim 5, wherein the protection film includes an oxide film of the metal film. 7. A liquid crystal layer sandwiched between the first and second substrates, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the second substrate on the liquid crystal layer side, wherein 1. A method for manufacturing a liquid crystal device, comprising: a metal film that reflects light incident from the substrate side of claim 1; and a colored layer provided on the liquid crystal side of the metal film, wherein a protective film is formed on the metal film. And a step of forming a colored layer on the protective film. 8. The method according to claim 7, wherein forming the protective film includes oxidizing the metal film. 9. A first and second substrate, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the second substrate on the liquid crystal layer side, wherein 1. An electronic apparatus comprising, as a display unit, a liquid crystal device having a metal film that reflects light incident from the substrate side of 1 and a coloring layer provided on the liquid crystal side of the metal film, wherein the metal film and the coloring layer Wherein the electronic device is separated by a protective film provided between the coloring layer and the metal film. 10. A first and second substrate having transparency, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the first substrate on the liquid crystal layer side. A transparent electrode, a transflective electrode formed on a surface of the second substrate facing the liquid crystal layer, and a colored layer formed on an upper surface of the transflective electrode. apparatus. 11. The liquid crystal device according to claim 10, wherein a protective film is formed between the coloring layer and the transflective electrode. 12. The liquid crystal device according to claim 11, wherein the protective film is a metal anodic oxide film forming the transflective electrode. 13. The semi-transmissive reflective electrode is provided with a slit-shaped opening, and the coloring layer is formed corresponding to a position where the opening is provided. 11. The liquid crystal device according to 10. 14. The liquid crystal device according to claim 10, wherein the transflective electrode is also used as a pixel electrode, and a switching element is connected to each pixel electrode. 15. The liquid crystal device according to claim 10, wherein the transparent electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. 16. An electronic apparatus comprising the liquid crystal device according to claim 10. 17. A first and second substrate having transparency, a liquid crystal layer sandwiched between the first and second substrates, and a liquid crystal layer formed on a surface of the first substrate on the liquid crystal layer side. A first transparent electrode, a semi-transmissive reflective film formed on a surface of the second substrate on the liquid crystal layer side, a colored layer formed on an upper surface of the semi-transmissive reflective film, and an upper surface of the colored layer And a second transparent electrode formed on the liquid crystal device. 18. The method according to claim 1, wherein a protective film is formed between the colored layer and the transflective film.
8. The liquid crystal device according to 7. 19. The liquid crystal device according to claim 18, wherein the protective film is an anodic oxide film of a metal constituting the transflective film. 20. The transflective film, wherein a slit-shaped opening is provided, and the coloring layer is formed corresponding to a position where the opening is provided. Item 18. The liquid crystal device according to item 17. 21. The liquid crystal device according to claim 17, wherein the second transparent electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. 22. The liquid crystal device according to claim 17, wherein the first transparent electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. 23. An electronic apparatus comprising the liquid crystal device according to claim 17. 24. A first and second substrate, a liquid crystal layer sandwiched between the first and second substrates, and a transparent electrode formed on a surface of the first substrate on the liquid crystal layer side. A reflective electrode formed on a surface of the second substrate on the liquid crystal layer side; a protective film for protecting the reflective electrode; and a colored layer formed on an upper surface of the protective film. Liquid crystal device. 25. The protection film according to claim 24, wherein the protection film is an anodic oxide film of a metal constituting the reflection electrode.
3. The liquid crystal device according to claim 1. 26. The liquid crystal device according to claim 24, wherein the reflection electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. 27. The liquid crystal device according to claim 24, wherein the transparent electrode is also used as a pixel electrode, and a switching element is connected to each of the pixel electrodes. 28. An electronic apparatus comprising the liquid crystal device according to claim 24.