JP2000022487A - Piezoelectric element and method of manufacturing the same - Google Patents
Piezoelectric element and method of manufacturing the sameInfo
- Publication number
- JP2000022487A JP2000022487A JP18667298A JP18667298A JP2000022487A JP 2000022487 A JP2000022487 A JP 2000022487A JP 18667298 A JP18667298 A JP 18667298A JP 18667298 A JP18667298 A JP 18667298A JP 2000022487 A JP2000022487 A JP 2000022487A
- Authority
- JP
- Japan
- Prior art keywords
- piezoelectric body
- thiol
- terminal
- layer
- silver
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000010931 gold Substances 0.000 claims abstract description 92
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 55
- 229910052737 gold Inorganic materials 0.000 claims abstract description 55
- 229910052709 silver Inorganic materials 0.000 claims abstract description 47
- 239000004332 silver Substances 0.000 claims abstract description 47
- 230000001070 adhesive effect Effects 0.000 claims abstract description 41
- 239000000853 adhesive Substances 0.000 claims abstract description 40
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 33
- 125000003396 thiol group Chemical class [H]S* 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 10
- 239000002904 solvent Substances 0.000 claims description 5
- 238000007865 diluting Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 45
- 239000013078 crystal Substances 0.000 abstract description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- 239000011651 chromium Substances 0.000 description 22
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 230000008569 process Effects 0.000 description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 12
- 229910052804 chromium Inorganic materials 0.000 description 12
- 125000000962 organic group Chemical group 0.000 description 12
- 238000012545 processing Methods 0.000 description 10
- 239000010453 quartz Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000005304 joining Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000010953 base metal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、圧電体のマウント
部に端子が接合された圧電素子およびその製造方法に関
するものである。さらに詳しくは、圧電体のマウント部
と端子とを導電性接着剤で接合する際の表面処理技術に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a piezoelectric element in which terminals are joined to a mount portion of a piezoelectric body, and a method for manufacturing the same. More particularly, the present invention relates to a surface treatment technique for joining a mount portion of a piezoelectric body and a terminal with a conductive adhesive.
【0002】[0002]
【従来の技術】圧電振動子あるいは発振器などの圧電素
子では、水晶片などといった圧電体(圧電振動片)のマ
ウント部に端子が導電性接着剤によって接合された構成
になっている。このような圧電素子において、圧電体の
マウント部の表面は、従来、銀で被覆され、かつ、端子
の表面はニッケルで被覆されている。2. Description of the Related Art A piezoelectric element such as a piezoelectric vibrator or an oscillator has a structure in which terminals are joined to a mount portion of a piezoelectric body (piezoelectric vibrating piece) such as a quartz piece by a conductive adhesive. In such a piezoelectric element, the surface of the mount portion of the piezoelectric body is conventionally covered with silver, and the surface of the terminal is covered with nickel.
【0003】圧電素子に対しては、小型・薄型化、共振
周波数の高精度化・高安定化、CI値(クリスタルイン
ピーダンス/振動子の機械的振動を抵抗、容量、インダ
クタンスの直列共振回路とこの直列共振回路に対する並
列容量とによって等価回路として表したときの抵抗の
値)の低減、電気的特性面の向上、機械的強度の向上な
どといった要求がある。これらの要求のうち、高精度化
や電気的特性面での信頼性の向上については、圧電体の
マウント部の表面を金または銀などの貴金属層で被覆す
る一方、端子の表面も金または銀などの貴金属層で被覆
することによって達成することができる。For a piezoelectric element, a small and thin piezoelectric element, a high-precision and stable resonance frequency, and a CI value (crystal impedance / mechanical vibration of a vibrator are connected to a series resonance circuit of resistance, capacitance, and inductance). There is a demand for reduction of the resistance value when expressed as an equivalent circuit by the parallel capacitance with respect to the series resonance circuit), improvement of electrical characteristics, improvement of mechanical strength, and the like. Among these demands, to improve the accuracy and reliability in terms of electrical characteristics, the surface of the mount of the piezoelectric body is covered with a noble metal layer such as gold or silver, and the surface of the terminal is also made of gold or silver. It can be achieved by coating with a noble metal layer such as
【0004】[0004]
【発明が解決しようとする課題】しかしながら、圧電体
のマウント部および端子の表面を金または銀などの貴金
属層で被覆すると、高精度化や電気的特性面での信頼性
を向上させることができても、金または銀は導電性接着
剤との密着性が悪いため、接合部分の機械的強度が低下
するという問題点がある。しかも、小型・薄型化を図る
ために、圧電体のマウント部と端子との接合面積を小さ
くすると、その分、接合部分の機械的強度が低下するの
で、圧電体のマウント部および端子の表面を金または銀
で被覆したときの接合部分の機械的強度の低下はより顕
著になる。However, when the surfaces of the mount portion and the terminals of the piezoelectric body are covered with a noble metal layer such as gold or silver, it is possible to improve the accuracy and to improve the reliability in terms of electrical characteristics. Even so, gold or silver has a problem that the mechanical strength of the joint decreases due to poor adhesion to the conductive adhesive. In addition, if the bonding area between the mounting portion of the piezoelectric body and the terminal is reduced in order to reduce the size and thickness, the mechanical strength of the bonding portion is reduced accordingly, so that the surface of the mounting portion of the piezoelectric body and the surface of the terminal are reduced. The reduction in mechanical strength of the joint when coated with gold or silver is more pronounced.
【0005】そこで、本発明の課題は、圧電体のマウン
ト部および端子の表面を金または銀からなる貴金属層で
被覆しても、接合部分の機械的強度が低下しない圧電素
子およびその製造方法を実現することにある。Accordingly, an object of the present invention is to provide a piezoelectric element and a method of manufacturing the same, which do not reduce the mechanical strength of the joint even when the surfaces of the mount and the terminal of the piezoelectric body are coated with a noble metal layer made of gold or silver. Is to make it happen.
【0006】[0006]
【課題を解決するための手段】上記課題を解決するた
め、本発明では、圧電体と、該圧電体のマウント部に導
電性接着剤によって接合された端子とを有する圧電素子
において、前記圧電体のマウント部および前記端子は、
表面が金または銀からなる貴金属層で被覆されていると
ともに、前記圧電体のマウント部および前記端子のうち
の少なくとも一方の前記貴金属層表面にはチオール処理
膜が形成されていることを特徴とする。According to the present invention, there is provided a piezoelectric element having a piezoelectric element and a terminal joined to a mount portion of the piezoelectric element by a conductive adhesive. The mounting part and the terminal
The surface is covered with a noble metal layer made of gold or silver, and a thiol-treated film is formed on the surface of the noble metal layer of at least one of the mount portion of the piezoelectric body and the terminal. .
【0007】本発明で用いたチオールは、R−SH(但
し、Rはアルキル基などの有機基であり、好ましくは炭
素数が3以上のアルキル基、あるいは、樹脂成分と化学
吸着や結合を行なう官能機能を有する有機基)で表され
る。このチオールを金属膜などの表面に付着させておく
と、金属膜表面と樹脂との密着性が向上する。その理由
として、チオールは金属膜表面に錯体を形成することに
よりチオール基を金属膜の方に向け、樹脂成分との親和
性が高い有機基を外側に向けているためと考えられる。
従って、金あるいは銀といった貴金属層に導電性接着剤
を直接塗布した場合には密着性が悪くても、貴金属層の
表面にチオール処理膜を形成しておけば、貴金属層と導
電性接着剤との密着性が向上する。それ故、圧電体のマ
ウント部および端子の双方が金または銀からなる貴金属
層で被覆されていても、圧電体のマウント部と端子とを
導電性接着剤を介して高い機械的強度をもって接合する
ことができる。[0007] The thiol used in the present invention is R-SH (where R is an organic group such as an alkyl group, preferably an alkyl group having 3 or more carbon atoms, or performs chemical adsorption or bonding with a resin component). Organic group having a functional function). If the thiol is adhered to the surface of a metal film or the like, the adhesion between the metal film surface and the resin is improved. It is considered that the reason is that the thiol forms a complex on the surface of the metal film to direct the thiol group toward the metal film and to direct the organic group having high affinity to the resin component to the outside.
Therefore, even if adhesion is poor when a conductive adhesive is directly applied to a noble metal layer such as gold or silver, if a thiol-treated film is formed on the surface of the noble metal layer, the noble metal layer and the conductive adhesive Adhesion is improved. Therefore, even if both the mount portion and the terminal of the piezoelectric body are covered with a noble metal layer made of gold or silver, the mount portion and the terminal of the piezoelectric body are joined with a high mechanical strength via the conductive adhesive. be able to.
【0008】本発明において、チオール処理膜は、前記
圧電体のマウント部および前記端子の一方の貴金属層表
面に形成されていてもよいが、前記圧電体のマウント部
および前記端子の双方の貴金属層表面に形成されている
ことが好ましい。In the present invention, the thiol-treated film may be formed on the surface of the noble metal layer of one of the mount portion of the piezoelectric body and the terminal. It is preferably formed on the surface.
【0009】本発明に係る圧電振動子を製造するには、
前記圧電体のマウント部および前記端子の表面を金また
は銀からなる貴金属層で被覆した以降、前記圧電体のマ
ウント部および前記端子のうちの少なくとも一方に塗布
した導電性接着剤によって前記圧電体のマウント部と前
記端子とを接合する前に、前記圧電体のマウント部およ
び前記端子のうちの少なくとも一方の前記貴金属層表面
にチオール処理膜を形成しておく。To manufacture the piezoelectric vibrator according to the present invention,
After the surfaces of the mounting portion of the piezoelectric body and the terminals are covered with a noble metal layer made of gold or silver, the conductive body is applied with a conductive adhesive applied to at least one of the mounting portion of the piezoelectric body and the terminals. Before joining the mounting portion and the terminal, a thiol-treated film is formed on the surface of the noble metal layer of at least one of the mounting portion of the piezoelectric body and the terminal.
【0010】ここで、前記チオール処理膜の形成は、前
記圧電体のマウント部および前記端子の双方の前記貴金
属層表面に対して行っておくことが好ましい。Here, it is preferable that the thiol-treated film is formed on the surface of the noble metal layer on both the mounting portion of the piezoelectric body and the terminal.
【0011】このようなチオール処理膜の形成は、当該
チオール処理膜を形成すべき前記貴金属層表面に対し
て、たとえば、チオールを溶剤で希釈した処理液を接触
させることにより行うことができる。本発明において、
処理液を貴金属層に接触させるだけでもチオールは貴金
属層に付着し、かつ、チオールはあくまで貴金属層の表
面に単分子層を形成する程度に付着させるだけで貴金属
層の表面改質を行う。従って、圧電体のマウント部と導
電性接着剤との界面、あるいは端子と導電性接着剤との
界面にチオール処理膜が介在していても、圧電体のマウ
ント部と端子との間の電気的な接続に支障がない。The formation of such a thiol-treated film can be performed by, for example, contacting the surface of the noble metal layer on which the thiol-treated film is to be formed with a treatment solution obtained by diluting thiol with a solvent. In the present invention,
The thiol adheres to the noble metal layer only by bringing the treatment liquid into contact with the noble metal layer, and the surface modification of the noble metal layer is performed by merely attaching the thiol to the surface of the noble metal layer to form a monomolecular layer. Therefore, even if the thiol-treated film is interposed at the interface between the piezoelectric body mount portion and the conductive adhesive or the interface between the terminal and the conductive adhesive, the electrical connection between the piezoelectric body mount portion and the terminal is possible. There is no problem with proper connection.
【0012】[0012]
【発明の実施の形態】以下に、図面を参照して、本発明
の好適な実施の形態を説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings.
【0013】図1は、圧電素子の全体構成を示す斜視図
である。図2(A)は、本発明を適用した圧電素子にお
いて、電極膜を形成した圧電体を一方の腕部の側からみ
た斜視図、(B)は、他方の腕部の側からみた斜視図、
(C)は基部の方からみた側面図である。FIG. 1 is a perspective view showing the overall structure of the piezoelectric element. 2A is a perspective view of a piezoelectric element on which an electrode film is formed in a piezoelectric element to which the present invention is applied, as viewed from one arm side, and FIG. 2B is a perspective view as viewed from the other arm side. ,
(C) is a side view as seen from the base.
【0014】[圧電素子の全体構造]図1に示すよう
に、音叉型の水晶振動子1(圧電素子)は、基部21か
ら第1および第2の腕部22、23が同一方向に並列し
て延びる音叉型の平面形状を有する薄板状の水晶片から
なる圧電体2と、この圧電体2の基部21に形成されて
いるマウント部51、52に対して2本の内部端子31
がそれぞれ導電性接着剤50によって接続されたステム
30と、圧電体2を収納したケース35とから構成さ
れ、このケース35とステム30とによって内部が気密
状態に保たれている。[Overall Structure of Piezoelectric Element] As shown in FIG. 1, in a tuning-fork type quartz vibrator 1 (piezoelectric element), first and second arms 22 and 23 are arranged in parallel from a base 21 in the same direction. Body 2 formed of a thin plate-shaped quartz piece having a tuning-fork-shaped planar shape extending therefrom, and two internal terminals 31 for mounting portions 51 and 52 formed on a base 21 of the piezoelectric body 2.
Are composed of a stem 30 connected by a conductive adhesive 50 and a case 35 accommodating the piezoelectric body 2, and the case 35 and the stem 30 keep the inside airtight.
【0015】図2(A)、(B)に示すように、圧電体
2の表面には、上面および下面のそれぞれに所定のギャ
ップ10を隔てて2つの電極膜41、42が分割形成さ
れ、これらの電極膜41、42の各々にステム30の外
部端子33(図1参照)から交流電圧を印加することに
よって腕部22、23が所定の周波数で振動する。As shown in FIGS. 2A and 2B, two electrode films 41 and 42 are separately formed on the surface of the piezoelectric body 2 with a predetermined gap 10 on the upper surface and the lower surface, respectively. By applying an AC voltage to each of the electrode films 41 and 42 from the external terminal 33 (see FIG. 1) of the stem 30, the arms 22 and 23 vibrate at a predetermined frequency.
【0016】電極膜41、42は、詳しくは後述する
が、クロム層からなる下地金属膜と金電極層との2層構
造になっている。また、腕部22、23では各電極膜4
1、42間のギャップ10が極めて狭いため、電極膜4
1、42間で短絡が発生するおそれがあるので、電極膜
41、42の表面に表面保護膜(図示せず。)を形成す
る場合もある。As will be described in detail later, the electrode films 41 and 42 have a two-layer structure of a base metal film made of a chromium layer and a gold electrode layer. In the arms 22 and 23, each electrode film 4
Since the gap 10 between the electrodes 1 and 42 is extremely narrow, the electrode film 4
Since there is a possibility that a short circuit may occur between the first and second electrodes 42, a surface protection film (not shown) may be formed on the surfaces of the electrode films 41 and 42.
【0017】圧電体2では、上面と下面との間で各電極
膜41、42同士を接続するために各側端面にも電極膜
41、42が形成されている。但し、側端面においても
所定の箇所では、電極膜41、42の間を絶縁分離する
必要があるので、たとえば、腕部22、23のつけ根部
分に挟まれた又部24の内側の側端面にはかなり幅広の
ギャップ11が形成されている。また、図2(C)に示
すように、圧電体2の基部21には、各内部端子31を
導電性接着剤50によってそれぞれ電極膜41、42に
接続するマウント部51、52が形成され、この基部2
1の側端面210には、電極膜41、42のいずれも形
成されておらず、側端面210全体がギャップ12とし
て機能している。ここで、導電性接着剤50は、いわゆ
る銀ペーストなどであり、樹脂成分に銀などの導電粒子
が配合されている。また、各内部端子31をマウント部
51、52に接合するにあたっては、導電性接着剤50
を単独で使用する場合の他、導電性接着剤50と導電性
を有しない接着剤(非導電性接着剤)とを併用し、その
機械的強度を高めることもある。In the piezoelectric body 2, the electrode films 41 and 42 are also formed on each side end surface to connect the electrode films 41 and 42 between the upper surface and the lower surface. However, since it is necessary to insulate and separate the electrode films 41 and 42 at predetermined locations on the side end surfaces, for example, the side end surfaces between the base portions of the arm portions 22 and 23 may be provided on the side end surfaces inside. Has a considerably wide gap 11 formed therein. Further, as shown in FIG. 2C, mount portions 51 and 52 are formed on the base portion 21 of the piezoelectric body 2 to connect the internal terminals 31 to the electrode films 41 and 42 by the conductive adhesive 50, respectively. This base 2
Neither of the electrode films 41 and 42 is formed on the first side end surface 210, and the entire side end surface 210 functions as the gap 12. Here, the conductive adhesive 50 is a so-called silver paste or the like, and conductive particles such as silver are compounded in the resin component. In joining each of the internal terminals 31 to the mount portions 51 and 52, the conductive adhesive 50 is used.
May be used alone, or the mechanical strength of the conductive adhesive 50 and the non-conductive adhesive (non-conductive adhesive) may be increased in combination.
【0018】[接合部分の構成]図3は、水晶振動子1
におけるマウント部と内部端子との接合構造を拡大して
示す断面図である。[Structure of Joining Portion] FIG.
FIG. 4 is an enlarged cross-sectional view showing a joint structure between a mount portion and an internal terminal in FIG.
【0019】図3に示すように、本形態の水晶振動子1
では、その電気的特性などを向上させるために、マウン
ト部51、52(電極膜)は、下地膜としてのクロム層
Crの表面を金層Auまたは銀Agからなる貴金属層で
被覆するとともに、内部端子31についてもその芯材の
表面に下地膜として形成したニッケル層Niの表面を金
層Auまたは銀Agからなる貴金属層で被覆してある。
但し、マウント部51、52(電極膜)の表面、あるい
は内部端子31の表面が金層Auまたは銀層Agからな
る貴金属層で被覆されていると、内部端子31とマウン
ト部51、52(電極膜)をそのまま導電性接着剤50
で接合しようにも、導電性接着剤50の樹脂成分と金層
Auまたは銀層Agからなる貴金属層との密着性が悪い
ので、十分な接合強度が得られない。そこで、本形態で
は、圧電体2のマウント部51、52および内部端子3
1の貴金属層(金層Auまたは銀層Ag)表面にはチオ
ール処理膜60、61が形成されている。従って、導電
性接着剤50と圧電体のマウント部51、52とはチオ
ール処理膜60を介して接着されているので、密着性に
優れている。また、導電性接着剤50と内部端子31と
はチオール処理膜61を介して接着されているので、密
着性に優れている。それ故、圧電体2のマウント部5
1、52と内部端子31とは導電性接着剤50によって
十分な機械的強度をもって接合されている。As shown in FIG. 3, the crystal resonator 1 of the present embodiment
Then, in order to improve the electrical characteristics and the like, the mount portions 51 and 52 (electrode films) cover the surface of the chromium layer Cr as a base film with a noble metal layer made of a gold layer Au or silver Ag. As for the terminal 31, the surface of the nickel layer Ni formed as a base film on the surface of the core material is covered with a noble metal layer made of a gold layer Au or silver Ag.
However, if the surfaces of the mount portions 51 and 52 (electrode films) or the surfaces of the internal terminals 31 are covered with a noble metal layer composed of a gold layer Au or a silver layer Ag, the internal terminals 31 and the mount portions 51 and 52 (electrodes) Film) as conductive adhesive 50
However, since the adhesion between the resin component of the conductive adhesive 50 and the noble metal layer composed of the gold layer Au or the silver layer Ag is poor, sufficient bonding strength cannot be obtained. Therefore, in this embodiment, the mounting portions 51 and 52 of the piezoelectric body 2 and the internal terminals 3
On the surface of one noble metal layer (gold layer Au or silver layer Ag), thiol-treated films 60 and 61 are formed. Accordingly, since the conductive adhesive 50 and the mount portions 51 and 52 of the piezoelectric body are bonded via the thiol-treated film 60, the adhesion is excellent. Further, since the conductive adhesive 50 and the internal terminals 31 are adhered via the thiol-treated film 61, the adhesion is excellent. Therefore, the mounting portion 5 of the piezoelectric body 2
1, 52 and the internal terminal 31 are joined by a conductive adhesive 50 with sufficient mechanical strength.
【0020】ここで用いたチオール処理膜60、61
は、後述するように、内部端子31および圧電体2のマ
ウント部51、52に対して、チオールを溶剤で希釈し
た処理液を接触させることにより付着させた単分子膜で
ある。ここで用いたチオールは、R−SH(但し、Rは
アルキル基などの有機基であり、好ましくは炭素数が3
以上のアルキル基、あるいは樹脂成分と化学吸着や結合
を行なう官能機能を有する有機基)で表され、単分子層
を形成しただけでも、金層Auまたは銀層Agの表面と
錯体を形成することによりチオール基SHを金層Auま
たは銀層Agの表面の方に向け、樹脂との親和性が高い
有機基を外側に向けているため、導電性接着剤50と圧
電体2のマウント部51、52と密着性、および導電性
接着剤50と内部端子31との密着性を高めているもの
と考えられえる。すなわち、チオールは、導電性接着剤
の樹脂成分との親和性が高い有機基を外側に向けてお
り、導電性接着剤の樹脂成分の有機鎖とチオールの有機
鎖とが絡まっているため密着性が高いと考えられる。あ
るいは、導電性接着剤の樹脂成分とチオールの有機基と
の化学吸着や結合が生じているため密着性が高いとも考
えられる。それ故、チオールとしては、R−SHで表し
たときのRが、炭素数が3以上のアルキル基であること
が好ましく、直鎖が長いほど導電性接着剤の樹脂成分と
の親和性が高い。また、チオールの有機基としては、導
電性接着剤の樹脂成分と化学吸着や結合を行なう官能機
能を有する有機基であっても、導電性接着剤の樹脂成分
との密着性が高い。The thiol-treated films 60 and 61 used here
Is a monomolecular film that is adhered to the internal terminals 31 and the mounting portions 51 and 52 of the piezoelectric body 2 by contacting a processing solution obtained by diluting thiol with a solvent, as described later. The thiol used here is R-SH (where R is an organic group such as an alkyl group, and preferably has 3 carbon atoms).
The above alkyl group or an organic group having a functional function of chemically adsorbing or bonding to a resin component), and forming a complex with the surface of the gold layer Au or the silver layer Ag even if only a monomolecular layer is formed. , The thiol group SH is directed toward the surface of the gold layer Au or the silver layer Ag, and the organic group having a high affinity for the resin is directed outward, so that the conductive adhesive 50 and the mounting portion 51 of the piezoelectric body 2 It can be considered that the adhesion between the conductive adhesive 52 and the internal terminal 31 is improved. That is, the thiol has an organic group having a high affinity for the resin component of the conductive adhesive directed outward, and the organic chain of the resin component of the conductive adhesive and the organic chain of the thiol are entangled, so that the thiol has an adhesive property. Is considered high. Alternatively, it is considered that the adhesion is high because the resin component of the conductive adhesive and the organic group of the thiol are chemically adsorbed or bonded. Therefore, as the thiol, R when represented by R-SH is preferably an alkyl group having 3 or more carbon atoms, and the longer the straight chain, the higher the affinity with the resin component of the conductive adhesive. . Further, even if the organic group of the thiol is an organic group having a functional function of chemically adsorbing or bonding to the resin component of the conductive adhesive, the adhesion to the resin component of the conductive adhesive is high.
【0021】[水晶振動子1の製造方法の概略]このよ
うな構成の水晶振動子1の製造方法を、図4を参照して
説明する。図4には、圧電体2の2本の腕部22、23
に相当する部分の断面を表してある。[Outline of Method of Manufacturing Crystal Resonator 1] A method of manufacturing the crystal resonator 1 having such a configuration will be described with reference to FIG. FIG. 4 shows two arms 22 and 23 of the piezoelectric body 2.
2 shows a cross section of a portion corresponding to.
【0022】まず、図4(A)に示すように切り出した
水晶のウエーハWに研磨加工、洗浄を行った後、図4
(B)に示すように、クロム層Crおよび金層Auをそ
れぞれ数百オングストロームの膜厚でスパッタ法や蒸着
法により形成する。ここでクロム層Crを形成するのは
金層Auだけでは水晶のウエーハWに対する密着性が悪
いからである。First, as shown in FIG. 4A, a wafer W of a cut crystal is polished and cleaned, and
As shown in (B), a chromium layer Cr and a gold layer Au are formed with a thickness of several hundred angstroms by a sputtering method or a vapor deposition method. Here, the chromium layer Cr is formed because the adhesion of the crystal to the wafer W is poor only with the gold layer Au.
【0023】次に、液状のフォトレジストPR1を金層
Auの表面に塗布した後、フォトレジストPR1を音叉
形状のパターンに露光、現像し、図4(C)に示すよう
に、音叉外形のレジストマスクM1を形成する。次に、
レジストマスクM1を介して金層Auおよびクロム層C
rにエッチングを行い、図4(D)に示すように、金層
Auおよびクロム層Crを音叉形状に残す。次に、金層
Auおよびクロム層CrをマスクとしてウエーハWにフ
ッ酸およびフッ化アンモニウムを用いたエッチング液で
エッチングを行い、図4(E)に示すように、水晶を音
叉形状に成形する。この水晶片が圧電体2である。Next, after applying a liquid photoresist PR1 on the surface of the gold layer Au, the photoresist PR1 is exposed and developed into a pattern of a tuning fork shape, and as shown in FIG. A mask M1 is formed. next,
Gold layer Au and chromium layer C via resist mask M1
r is etched to leave the gold layer Au and the chromium layer Cr in a tuning fork shape, as shown in FIG. Next, the wafer W is etched with an etchant using hydrofluoric acid and ammonium fluoride using the gold layer Au and the chromium layer Cr as a mask, and quartz is formed into a tuning fork shape as shown in FIG. This crystal blank is the piezoelectric body 2.
【0024】次に、圧電体2上のレジストマスクM1、
金層Auおよびクロム層Crを全て除去し、図4(F)
に示すように、改めて、電極膜41、42およびマウン
ト部51、52を形成するためのクロム層Crおよび金
層Au(または銀層Ag)をスパッタ法により形成す
る。なお、図示を省略するが、この工程では、後述する
周波数調整のための錘部分を圧電体2の腕部22、23
先端側に金層(または銀層)として形成しておく(金属
膜形成工程)。Next, a resist mask M1 on the piezoelectric body 2,
The gold layer Au and the chromium layer Cr are all removed, and FIG.
As shown in FIG. 5, a chromium layer Cr and a gold layer Au (or silver layer Ag) for forming the electrode films 41 and 42 and the mount portions 51 and 52 are formed again by the sputtering method. Although not shown, in this step, weight portions for frequency adjustment, which will be described later, are attached to the arms 22 and 23 of the piezoelectric body 2.
A gold layer (or silver layer) is formed on the tip side (metal film forming step).
【0025】次に、図4(F)に示すように、圧電体2
の金層Au(または銀層Ag)の表面に液状のフォトレ
ジストPR2を塗布する。(レジスト塗布工程)。Next, as shown in FIG.
A liquid photoresist PR2 is applied to the surface of the gold layer Au (or silver layer Ag). (Resist coating step).
【0026】次に、図4(G)に示すように、フォトレ
ジストPR2を各電極膜41、42およびマウント部5
1、52のパターン形状に露光、現像し、各電極膜4
1、42およびマウント部51、52の外形をしたレジ
ストマスクM2を形成する(露光・現像工程)。Next, as shown in FIG. 4G, a photoresist PR2 is applied to each of the electrode films 41 and 42 and the
Exposure and development to the pattern shape of 1, 52, each electrode film 4
A resist mask M2 having the outer shapes of the reference numerals 1 and 42 and the mount portions 51 and 52 is formed (exposure / development step).
【0027】次に、図4(H)に示すように、レジスト
マスクM2を介して金層Au(または銀層Ag)および
クロム層Crにエッチングを行う。しかる後に、レジス
トマスクM2を除去する。その結果、図2(A)、
(B)、(C)を参照して説明したように、金層Au
(または銀層Ag)およびクロム層Crは電極膜41、
42およびマウント部51、52のパターン形状に残さ
れ、クロム層Crからなる下地金属膜と金層Au(また
は銀層Ag)とからなる電極膜41、42およびマウン
ト部51、52を形成できる(パターニング工程)。Next, as shown in FIG. 4H, the gold layer Au (or silver layer Ag) and the chromium layer Cr are etched through the resist mask M2. Thereafter, the resist mask M2 is removed. As a result, FIG.
As described with reference to (B) and (C), the gold layer Au
(Or silver layer Ag) and chromium layer Cr are electrode film 41,
The electrode films 41 and 42 and the mount portions 51 and 52 made of the base metal film made of the chromium layer Cr and the gold layer Au (or the silver layer Ag) can be formed while being left in the pattern shape of the base portion 42 and the mount portions 51 and 52 ( Patterning step).
【0028】次に、表面保護膜の形成工程を行う(図4
(I))。Next, a step of forming a surface protective film is performed (FIG. 4).
(I)).
【0029】このようにして電極膜41、42およびマ
ウント部51、52を形成した圧電体2については、す
ぐにマウント工程を行わず、図5(A)に示すように、
チオールをアルコールやケトンなどの溶剤で溶かした処
理液L1に浸漬し、しかる後に、図5(B)に示すよう
に、処理液L1に用いた溶剤と同一の溶剤、たとえばア
ルコールL2に圧電体2を浸漬することににより、圧電
体2を軽く濯いで圧電体2の表面から余剰な処理液L1
を除去する。しかる後に乾燥を行う。ここで用いたチオ
ールは、R−SH(但し、Rはアルキル基などの有機基
であり、好ましくは炭素数が3以上のアルキル基、ある
いは樹脂成分と化学吸着や結合を行なう官能機能を有す
る有機基)で表され、圧電体2を処理液L1に浸漬した
だけでも、図3に示したように、チオールがチオール処
理膜60として金層Au(または銀層Ag)の表面に付
着する(チオールの付着処理)。With respect to the piezoelectric body 2 on which the electrode films 41 and 42 and the mounting portions 51 and 52 have been formed in this manner, the mounting process is not immediately performed, and as shown in FIG.
The thiol is immersed in a processing solution L1 in which a thiol is dissolved in a solvent such as alcohol or ketone. Thereafter, as shown in FIG. 5B, the piezoelectric substance 2 is immersed in the same solvent as the processing liquid L1, for example, alcohol L2. Is immersed, the piezoelectric body 2 is lightly rinsed, and the excess processing liquid L1 is removed from the surface of the piezoelectric body 2.
Is removed. Thereafter, drying is performed. The thiol used here is R-SH (where R is an organic group such as an alkyl group, preferably an alkyl group having 3 or more carbon atoms, or an organic group having a functional function of chemically adsorbing or bonding with a resin component). The thiol adheres to the surface of the gold layer Au (or silver layer Ag) as the thiol-treated film 60 as shown in FIG. 3 by simply immersing the piezoelectric body 2 in the processing liquid L1 (thiol). Adhesion treatment).
【0030】また、図3に示すように、内部端子31に
ついても、その下地金属膜として、ニッケル層Ni単
独、あるいは銅層とニッケル層とを形成した後、金層A
u(または銀層Ag)を被覆する。そして、圧電体2と
同様、図5(A)を参照して説明した処理液L1に内部
端子31を浸漬し、しかる後に、図5(B)に示すアル
コールL2などに浸漬することにより、内部端子31の
表面から余剰な処理液L1を除去した後、乾燥を行う。
その結果、図3に示すように、内部端子31の表面を覆
う金層Au(または銀層Ag)の表面にチオール処理膜
61が形成される(チオールの付着処理)。As shown in FIG. 3, also for the internal terminal 31, as a base metal film, a nickel layer Ni alone or a copper layer and a nickel layer are formed, and then a gold layer A is formed.
u (or silver layer Ag). Then, similarly to the piezoelectric body 2, the internal terminals 31 are immersed in the treatment liquid L1 described with reference to FIG. 5A, and then immersed in alcohol L2 or the like shown in FIG. After removing excess processing liquid L1 from the surface of the terminal 31, drying is performed.
As a result, as shown in FIG. 3, a thiol-processed film 61 is formed on the surface of the gold layer Au (or silver layer Ag) covering the surface of the internal terminal 31 (thiol attachment process).
【0031】このようにしてチオール処理膜60、61
を形成し終えた圧電体2と内部端子31については、図
3および図6に示すように、マウント工程として、基部
21に形成されているマウント部51、52にステム3
0の内部端子31を導電性接着剤50で電気的および機
械的に接続する。In this manner, the thiol-treated films 60, 61
As shown in FIG. 3 and FIG. 6, the stem 3 is mounted on the mounting portions 51 and 52 formed on the base 21 as shown in FIGS.
0 internal terminals 31 are electrically and mechanically connected by a conductive adhesive 50.
【0032】それには、圧電体2のマウント部51、5
2の金層Au(または銀層Ag)の表面、および内部端
子31の金層Au(または銀層Ag)の表面のうちの一
方、あるいは両方に導電性接着剤50を塗布する。しか
る後に、圧電体2のマウント部51、52に導電性接着
剤50を介して内部端子31を重ね、硬化処理を行う。
このようにして、チオールの付着処理済の金層Au(ま
たは銀層Ag)で被覆された圧電体2のマウント部5
1、52と、チオールの付着処理済の金層Au(または
銀層Ag)で被覆された内部端子31とは、導電性接着
剤50によって接合される。The mounting portions 51, 5 and 5 of the piezoelectric body 2
The conductive adhesive 50 is applied to one or both of the surface of the gold layer Au (or silver layer Ag) and the surface of the gold layer Au (or silver layer Ag) of the internal terminal 31. Thereafter, the internal terminals 31 are stacked on the mount portions 51 and 52 of the piezoelectric body 2 via the conductive adhesive 50, and a hardening process is performed.
In this manner, the mount 5 of the piezoelectric body 2 covered with the gold layer Au (or silver layer Ag) to which the thiol has been attached is applied.
The internal terminals 31 covered with a gold layer Au (or a silver layer Ag) to which thiol has been attached are bonded by a conductive adhesive 50.
【0033】次に、この段階での圧電体2の周波数調整
を圧電体2の腕部22、23先端に形成してある錘部分
へのレーザトリミングにより行った後、真空チャンバー
内でケース35へステム30を圧入し(封止工程)、水
晶振動子1を製造する。しかる後には、水晶振動子1の
特性検査を行う(検査工程)。Next, the frequency adjustment of the piezoelectric body 2 at this stage is performed by laser trimming the weights formed at the tips of the arms 22 and 23 of the piezoelectric body 2 and then to the case 35 in the vacuum chamber. The stem 30 is press-fitted (sealing step) to manufacture the crystal unit 1. Thereafter, the characteristic inspection of the crystal unit 1 is performed (inspection step).
【0034】[その他の実施例およびそれらの評価結
果]上記の形態では、圧電体2のマウント部51、52
および内部端子31の双方にチオールの付着処理を行っ
たが、いずれか一方のみにチオールの付着処理を行って
もよい。[Other Examples and Their Evaluation Results] In the above embodiment, the mounting portions 51 and 52 of the piezoelectric body 2
Although the thiol attachment process has been performed on both the internal terminals 31 and the internal terminals 31, the thiol attachment process may be performed on only one of them.
【0035】ここまでは、圧電素子の一例として、圧電
体が音叉型の水晶振動子で説明した。次に、チオール付
着処理は同じで、チオール付着処理の効果が大きい図7
に示すような、圧電体が矩形状の厚みすべり水晶振動子
での評価結果を説明する。Up to this point, as an example of the piezoelectric element, a tuning fork type quartz resonator has been used for the piezoelectric body. Next, the thiol attachment process is the same, and the effect of the thiol attachment process is large.
The evaluation result of a thickness-sliding quartz crystal resonator having a rectangular piezoelectric body as shown in FIG.
【0036】表1には本発明の各実施例並びに比較例に
係る水晶振動子の構成、およびそれらの評価結果を示し
てある。Table 1 shows the configurations of the quartz resonators according to the examples and comparative examples of the present invention, and the evaluation results thereof.
【0037】[0037]
【表1】 [Table 1]
【0038】ここで、圧電体2としては、マウント部5
1、52を金層Auで被覆したものを用い、内部端子3
1としては金層Auあるいは銀層Agで覆ったものを用
いた。また、圧電体2と内部端子31との接合面積を
0.72mm2 および0.36mm2 とした場合のそれ
ぞれについて、チオールの付着処理を圧電体2の側およ
び内部端子31の側の双方に行った試料(実施例1〜
4)、チオールの付着処理を圧電体2の側のみに行い、
内部端子31の側には行わない試料(実施例5〜8)、
およびチオールの付着処理を内部端子31の側のみに行
い、圧電体2の側には行わない試料(実施例9〜12)
を製作し、それぞれについて、125℃1000時間放
置後の共振周波数のシフト量(Δf)並びにCI値のシ
フト量(ΔCI)、600gの治具中に水晶振動子を収
納して高さ125cmのところからの落下を100回繰
り返した後の共振周波数のシフト量(Δf)並びにCI
値のシフト量(ΔCI)を計測した。また、100個の
試料のうち、圧電体から端子が剥離した数(剥離発生
率)も評価した。Here, as the piezoelectric body 2, the mount 5
1 and 52 coated with a gold layer Au are used.
As No. 1, one covered with a gold layer Au or a silver layer Ag was used. Further, in each of the cases where the bonding area between the piezoelectric body 2 and the internal terminal 31 was set to 0.72 mm 2 and 0.36 mm 2 , the thiol attachment processing was performed on both the piezoelectric body 2 side and the internal terminal 31 side. Sample (Examples 1 to 3)
4), the thiol attachment process is performed only on the piezoelectric body 2 side,
Samples not performed on the side of the internal terminal 31 (Examples 5 to 8),
And a sample in which thiol attachment processing is performed only on the side of the internal terminal 31 but not on the side of the piezoelectric body 2 (Examples 9 to 12)
And the shift amount of the resonance frequency (Δf) and the shift amount of the CI value (ΔCI) after leaving at 125 ° C. for 1000 hours. The quartz oscillator was housed in a jig of 600 g and the height was 125 cm. Amount (Δf) of resonance frequency after 100 times of falling from
The value shift amount (ΔCI) was measured. In addition, the number of peeled terminals from the piezoelectric body (peeling occurrence rate) among the 100 samples was also evaluated.
【0039】なお、比較例としては、圧電体02の側に
は金層Auまたは銀層Agを形成する一方、内部端子3
1の方には金層Au、銀層Agあるいはニッケル層Ni
を形成し、いずれの側にもチオールの付着処理を行わな
かった試料(比較例1〜6)を製作した。As a comparative example, a gold layer Au or a silver layer Ag was formed on the piezoelectric body 02 side while the internal terminals 3 were formed.
The gold layer Au, silver layer Ag or nickel layer Ni
Was formed, and samples (Comparative Examples 1 to 6) in which the thiol attachment treatment was not performed on either side were produced.
【0040】その結果、表1からわかるように、落下試
験において、本発明の実施例1〜8では、圧電体2から
内部端子31が剥離した数(剥離発生率)が0個である
のに対して、比較例のうち、金層Auあるいは銀層Ag
を形成して電気的な特性を向上させた比較例1〜4で
は、圧電体2から内部端子31が剥離した数(剥離発生
率)が5個〜16個もある。また、内部端子31にニッ
ケル層Niを形成した比較例5、6でも、圧電体2から
内部端子31が剥離した数(剥離発生率)が1個、3個
ある。それ故、本発明によれば、圧電体2と内部端子3
1との接合部分の機械的な強度が大幅に向上することが
確認できた。As a result, as can be seen from Table 1, in the drop test, in Examples 1 to 8 of the present invention, the number of peeling of the internal terminal 31 from the piezoelectric body 2 (peeling occurrence rate) was 0. On the other hand, among the comparative examples, the gold layer Au or the silver layer Ag was used.
In Comparative Examples 1 to 4 in which the electrical characteristics are improved by forming the above, the number of peeling of the internal terminal 31 from the piezoelectric body 2 (peeling occurrence rate) is as many as 5 to 16. Also, in Comparative Examples 5 and 6, in which the nickel layer Ni was formed on the internal terminal 31, the number of the internal terminals 31 peeled from the piezoelectric body 2 (peeling occurrence rate) was one or three. Therefore, according to the present invention, the piezoelectric body 2 and the internal terminal 3
It was confirmed that the mechanical strength of the joint portion with No. 1 was significantly improved.
【0041】また、表1からわかるように、本発明の実
施例9〜12では、圧電体2から内部端子31が剥離し
た数(剥離発生率)が2個〜14個であるが、対応する
比較例1〜4での発生率と比較すれば少ない傾向にあ
る。従って、チオールの付着処理を内部端子31の側の
みに行い、圧電体2の側には行わない場合(実施例9〜
12)であっても、チオールの付着処理を一切行わない
場合と比較すると、機械的強度が向上していることがわ
かる。Further, as can be seen from Table 1, in Examples 9 to 12 of the present invention, the number of peeling of the internal terminals 31 from the piezoelectric body 2 (peeling occurrence rate) is 2 to 14, but it corresponds. When compared with the incidence rates in Comparative Examples 1 to 4, there is a tendency to be small. Therefore, the case where the thiol attachment processing is performed only on the internal terminal 31 side and not performed on the piezoelectric body 2 side (Examples 9 to 9)
Even in the case of 12), it can be seen that the mechanical strength is improved as compared with the case where no thiol attachment treatment is performed.
【0042】また、落下試験前後における共振周波数の
シフト量(Δf)並びにCI値のシフト量(ΔCI)か
らみても、本発明を適用すれば、小さく抑えることがで
きる。Also, the shift amount of the resonance frequency (Δf) and the shift amount of the CI value (ΔCI) before and after the drop test can be suppressed to a small value by applying the present invention.
【0043】それ故、機械的強度(落下試験)について
は、チオールの付着処理を圧電体2の側および内部端子
31の側の双方に行った試料(実施例1〜4)が最も優
れ、以下、チオールの付着処理を圧電体2の側のみに行
い、内部端子31の側には行わない試料(実施例5〜
8)、チオールの付着処理を内部端子31の側のみに行
い、圧電体2の側には行わない試料(実施例9〜12)
の順にその効果が減少していくといえる。なお、チオー
ルの付着処理を圧電体2の側および内部端子31の側の
いずれに対しても行わなかった試料(比較例1〜6)の
間では、銀層Agとニッケル層Niとの組合せが最も機
械的強度が高く、以下、金層Auと銀層Agとの組合
せ、金層Auと金層Auとの組合せの順に機械的強度が
低下している傾向にある。Therefore, with regard to the mechanical strength (drop test), the samples (Examples 1 to 4) in which the thiol attachment treatment was performed on both the piezoelectric body 2 side and the internal terminal 31 side were the most excellent. And a sample in which the thiol attachment process is performed only on the piezoelectric body 2 side and is not performed on the internal terminal 31 side (Examples 5 to 5).
8) Samples in which thiol attachment processing is performed only on the internal terminal 31 side and not performed on the piezoelectric body 2 side (Examples 9 to 12)
It can be said that the effect decreases in the order of. In addition, the combination of the silver layer Ag and the nickel layer Ni was not found between the samples (Comparative Examples 1 to 6) in which the thiol attachment treatment was not performed on either the piezoelectric body 2 side or the internal terminal 31 side. The mechanical strength is highest, and thereafter, the mechanical strength tends to decrease in the order of the combination of the gold layer Au and the silver layer Ag and the combination of the gold layer Au and the gold layer Au.
【0044】また、電気的特性の安定性(放置試験)に
ついては、圧電体2および内部端子31の材質の影響が
支配的であり、金層Auと金層Auの組合せが最も優
れ、以下、金層Auと銀層Agとの組合せ、銀層Agと
ニッケル層Niに組合せの順に低下していく。なお、電
気的特性の安定性に対しては、チオールの付着処理の効
果はやや確認できる程度である。Further, regarding the stability of the electrical characteristics (standing test), the influence of the materials of the piezoelectric body 2 and the internal terminals 31 is dominant, and the combination of the gold layer Au and the gold layer Au is most excellent. The combination of the gold layer Au and the silver layer Ag and the combination of the silver layer Ag and the nickel layer Ni decrease in this order. It should be noted that the effect of the thiol attachment treatment can be slightly confirmed with respect to the stability of the electrical characteristics.
【0045】[0045]
【発明の効果】以上説明したように、本発明に係る圧電
素子およびその製造方法では、圧電体のマウント部およ
び端子を覆う金または銀からなる貴金属層の表面にチオ
ール処理膜が形成されているので、圧電体のマウント部
と端子とを導電性接着剤によって高い機械的強度をもっ
て接合することができる。それ故、圧電体のマウント部
と端子との接合面積を縮小して、圧電素子の小型・薄型
化を図ることも可能である。また、圧電体のマウント部
および端子の表面を銀あるいは金で被覆しても、接合部
分の機械的強度が低下しないので、電気的特性面での信
頼性を向上させることもできる。As described above, in the piezoelectric element and the method of manufacturing the same according to the present invention, the thiol-treated film is formed on the surface of the noble metal layer made of gold or silver which covers the mounting portion and the terminals of the piezoelectric body. Therefore, the mounting portion of the piezoelectric body and the terminal can be joined with a high mechanical strength by the conductive adhesive. Therefore, it is possible to reduce the bonding area between the mounting portion of the piezoelectric body and the terminal, and to reduce the size and thickness of the piezoelectric element. Further, even if the surfaces of the mount portion and the terminals of the piezoelectric body are covered with silver or gold, the mechanical strength of the joint does not decrease, so that the reliability in terms of electrical characteristics can be improved.
【図1】圧電素子の全体構成を示す斜視図である。FIG. 1 is a perspective view showing an overall configuration of a piezoelectric element.
【図2】(A)は、電極膜を形成した圧電体を一方の腕
端の方からみた斜視図、(B)は他方の腕端の方からみ
た斜視図、(C)は基部の方からみた側面図である。2A is a perspective view of a piezoelectric body on which an electrode film is formed as viewed from one arm end, FIG. 2B is a perspective view of the piezoelectric body viewed from the other arm end, and FIG. It is the side view seen from.
【図3】本発明を適用した水晶振動子におけるマウント
部と内部端子との接合構造を拡大して示す断面図であ
る。FIG. 3 is an enlarged cross-sectional view showing a joint structure between a mount portion and an internal terminal in a crystal unit to which the present invention is applied.
【図4】本発明を適用した圧電素子の製造方法におい
て、圧電体に電極膜などを形成するまでの工程図であ
る。FIG. 4 is a process chart until an electrode film or the like is formed on a piezoelectric body in a method for manufacturing a piezoelectric element to which the present invention is applied.
【図5】(A)、(B)はそれぞれ、本発明を適用した
圧電素子の製造方法において、チオールの付着処理の様
子を示す説明図、およびその濯ぎ処理の様子を示す説明
図である。FIGS. 5A and 5B are an explanatory diagram showing a state of a thiol attachment process and an explanatory diagram showing a state of a rinsing process in a method of manufacturing a piezoelectric element to which the present invention is applied.
【図6】本発明を適用した圧電素子の製造方法におい
て、圧電体に電極膜などを形成した以降の工程図であ
る。FIG. 6 is a process drawing after an electrode film and the like are formed on a piezoelectric body in a method for manufacturing a piezoelectric element to which the present invention is applied.
【図7】図1に示す圧電素子とは別のタイプの圧電素子
の全体構成を示す斜視図である。FIG. 7 is a perspective view showing the overall configuration of another type of piezoelectric element different from the piezoelectric element shown in FIG.
1 水晶振動子(圧電素子) 21 圧電素子の基部 22、23 圧電素子の腕部 30 端子 31 端子の内部端子 35 ケース 41、42 電極膜 50 導電性接着剤 51、52 マウント部 60、61 チオール処理膜 L1 処理液 L2 濯ぎ用のアルコール DESCRIPTION OF SYMBOLS 1 Quartz crystal resonator (piezoelectric element) 21 Base part of piezoelectric element 22, 23 Arm part of piezoelectric element 30 Terminal 31 Internal terminal of terminal 35 Case 41, 42 Electrode film 50 Conductive adhesive 51, 52 Mounting part 60, 61 Thiol treatment Membrane L1 Treatment liquid L2 Alcohol for rinsing
Claims (5)
性接着剤によって接合された端子とを有する圧電素子に
おいて、 前記圧電体のマウント部および前記端子は、表面が金ま
たは銀からなる貴金属層で被覆されているとともに、 前記圧電体のマウント部および前記端子のうちの少なく
とも一方の前記貴金属層表面にはチオール処理膜が形成
されていることを特徴とする圧電素子。1. A piezoelectric element having a piezoelectric body and a terminal joined to a mount portion of the piezoelectric body by a conductive adhesive, wherein a surface of the mount portion and the terminal of the piezoelectric body is made of gold or silver. A piezoelectric element covered with a noble metal layer, and a thiol-treated film is formed on a surface of the noble metal layer of at least one of the mount portion and the terminal of the piezoelectric body.
ト部および前記端子の双方の前記貴金属層表面にチオー
ル処理膜が形成されていることを特徴とする圧電素子。2. The piezoelectric element according to claim 1, wherein a thiol-treated film is formed on the surface of the noble metal layer on both the mount portion and the terminal of the piezoelectric body.
性接着剤によって接合された端子とを有する圧電素子の
製造方法において、 前記圧電体のマウント部および前記端子の表面を金また
は銀からなる貴金属層で被覆した以降、前記圧電体のマ
ウント部および前記端子のうちの少なくとも一方に塗布
した導電性接着剤によって前記圧電体のマウント部と前
記端子とを接合する前に、前記圧電体のマウント部およ
び前記端子のうちの少なくとも一方の前記貴金属層表面
にチオール処理膜を形成しておくことを特徴とする圧電
素子の製造方法。3. A method for manufacturing a piezoelectric element having a piezoelectric body and a terminal joined to a mount of the piezoelectric body by a conductive adhesive, wherein the surface of the mount of the piezoelectric body and the surface of the terminal are made of gold or silver. After being covered with a noble metal layer consisting of, the piezoelectric body is bonded to the terminal and the terminal by a conductive adhesive applied to at least one of the mount portion and the terminal of the piezoelectric body. A thiol-treated film is formed on the surface of the noble metal layer of at least one of the mount portion and the terminal.
の形成は、前記圧電体のマウント部および前記端子の双
方の前記貴金属層表面に対して行うことを特徴とする圧
電素子の製造方法。4. The method for manufacturing a piezoelectric element according to claim 3, wherein the formation of the thiol-treated film is performed on the surface of the noble metal layer on both the mounting portion of the piezoelectric body and the terminal.
ル処理膜の形成は、当該チオール処理膜を形成すべき前
記貴金属層表面に対して、チオールを溶剤で希釈した処
理液を接触させることにより行うことを特徴とする圧電
素子の形成方法。5. The thiol-treated film according to claim 3, wherein the thiol-treated film is formed by bringing a treatment liquid obtained by diluting thiol with a solvent into contact with the surface of the noble metal layer on which the thiol-treated film is to be formed. A method for forming a piezoelectric element, comprising:
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005223088A (en) * | 2004-02-04 | 2005-08-18 | Stanley Electric Co Ltd | Semiconductor device manufacturing method and semiconductor device |
JP2008011283A (en) * | 2006-06-30 | 2008-01-17 | Citizen Miyota Co Ltd | Airtight terminal for press-fitting cylinder-type piezoelectric vibrator, press-fitting type piezoelectric vibrator, and method for manufacturing airtight terminal |
WO2009031258A1 (en) * | 2007-09-03 | 2009-03-12 | Nihon Dempa Kogyo Co., Ltd. | Crystal device and method for manufacturing crystal device |
JP2010264659A (en) * | 2009-05-14 | 2010-11-25 | Ulvac Japan Ltd | Implement and method of manufacturing the same |
JP2015072978A (en) * | 2013-10-02 | 2015-04-16 | Tdk株式会社 | Piezoelectric element and method of manufacturing piezoelectric element |
-
1998
- 1998-07-01 JP JP18667298A patent/JP3702656B2/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005223088A (en) * | 2004-02-04 | 2005-08-18 | Stanley Electric Co Ltd | Semiconductor device manufacturing method and semiconductor device |
JP2008011283A (en) * | 2006-06-30 | 2008-01-17 | Citizen Miyota Co Ltd | Airtight terminal for press-fitting cylinder-type piezoelectric vibrator, press-fitting type piezoelectric vibrator, and method for manufacturing airtight terminal |
WO2009031258A1 (en) * | 2007-09-03 | 2009-03-12 | Nihon Dempa Kogyo Co., Ltd. | Crystal device and method for manufacturing crystal device |
JP2009060479A (en) * | 2007-09-03 | 2009-03-19 | Nippon Dempa Kogyo Co Ltd | Quartz device and method of manufacturing quartz device |
US8261427B2 (en) | 2007-09-03 | 2012-09-11 | Nihon Dempa Kogyo Co., Ltd. | Methods for manufacturing crystal devices |
JP2010264659A (en) * | 2009-05-14 | 2010-11-25 | Ulvac Japan Ltd | Implement and method of manufacturing the same |
JP2015072978A (en) * | 2013-10-02 | 2015-04-16 | Tdk株式会社 | Piezoelectric element and method of manufacturing piezoelectric element |
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