JP2000011466A - Sputter holder for optical recording medium and production of optical recording medium - Google Patents
Sputter holder for optical recording medium and production of optical recording mediumInfo
- Publication number
- JP2000011466A JP2000011466A JP10169755A JP16975598A JP2000011466A JP 2000011466 A JP2000011466 A JP 2000011466A JP 10169755 A JP10169755 A JP 10169755A JP 16975598 A JP16975598 A JP 16975598A JP 2000011466 A JP2000011466 A JP 2000011466A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- recording medium
- optical recording
- holder
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000004544 sputter deposition Methods 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 16
- 239000000919 ceramic Substances 0.000 claims abstract description 5
- 238000001746 injection moulding Methods 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 230000001133 acceleration Effects 0.000 abstract description 4
- 230000002093 peripheral effect Effects 0.000 abstract description 3
- 229920005992 thermoplastic resin Polymers 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 239000000243 solution Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 49
- 239000011241 protective layer Substances 0.000 description 15
- 239000010408 film Substances 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910001029 Hf alloy Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 229910052714 tellurium Inorganic materials 0.000 description 3
- -1 Al and Si Chemical class 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910007933 Si-M Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910008318 Si—M Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- 229910001215 Te alloy Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical group [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 229910052950 sphalerite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、光記録媒体用スパ
ッタホルダおよび光記録媒体の製造方法に関し、特に相
変化型光記録媒体の製造における生産性を向上させると
ともに、簡易なプロセスでスパッタ後の光記録媒体の反
り、チルト、加速度等の機械特性を改善し、歪みの少な
い光記録媒体を作製するための光記録媒体用スパッタホ
ルダおよびそれを用いた光記録媒体の製造方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sputter holder for an optical recording medium and a method for manufacturing an optical recording medium. The present invention relates to a sputter holder for an optical recording medium for producing an optical recording medium with less distortion by improving mechanical characteristics such as warpage, tilt, and acceleration of the optical recording medium, and a method for manufacturing an optical recording medium using the same.
【0002】[0002]
【従来の技術】光記録媒体は、成形された基板上に光学
的に記録再生可能な情報記録部を設け、文書やデータ等
のファイル用ディスクとして用いられている。光記録媒
体を高速で回転させながら、1μm程度に絞り込んだレ
ーザー光を照射し、焦点調整および位置検出を行いなが
ら、記録層からデータを読み出し、または記録層にデー
タを記録する。2. Description of the Related Art An optical recording medium is provided with an optical recording / reproducing information recording section on a molded substrate, and is used as a disk for files such as documents and data. While rotating the optical recording medium at high speed, a laser beam narrowed down to about 1 μm is irradiated to read data from the recording layer or record data on the recording layer while performing focus adjustment and position detection.
【0003】以下に、相変化型光記録媒体の具体的な記
録再生方法の例を示す。記録時には結晶状態の記録層に
集光したレーザーパルスを短時間照射し、記録層を部分
的に溶融する。溶融した部分は熱拡散により急冷され、
固化し、非晶状態の記録マークが形成される。この記録
マークの反射率を、例えば結晶状態よりも低く設定して
おくとその反射率差を利用して光学的に情報が再生でき
る。さらに、消去時には記録マーク部分にレーザー光を
照射し、記録層の融点以下、結晶化温度以上の温度に加
熱することによって非晶状態の記録マークを結晶化し、
もとの未記録状態に戻す。The following is an example of a specific recording / reproducing method for a phase change type optical recording medium. During recording, a focused laser pulse is applied to the crystalline recording layer for a short time to partially melt the recording layer. The melted part is quenched by heat diffusion,
It solidifies to form an amorphous recording mark. If the reflectance of the recording mark is set lower than, for example, the crystalline state, information can be optically reproduced using the reflectance difference. Further, at the time of erasing, the recording mark portion is irradiated with laser light, and the recording mark in the amorphous state is crystallized by heating to a temperature lower than the melting point of the recording layer and higher than the crystallization temperature,
Return to the original unrecorded state.
【0004】この記録層材料としては、テルルなどを主
成分とするGe2 Sb2 Te5 などの合金(N.Yamada e
t al, Proc. Int. Symp. on Optical Memory 1987 p61-
66)が知られている。これらTe合金を記録層とした光
記録媒体では、結晶化速度が速く、照射パワーを変調す
るだけで、円形の1ビームによる高速のオーバーライト
が可能である。これらの記録層を使用した光記録媒体で
は、通常、記録層の両面に耐熱性と透光性を有する誘電
体層を設け、記録時に記録層に変形、開孔が発生するこ
とを防いでいる。[0004] As the recording layer material, an alloy such as Ge 2 Sb 2 Te 5 as a main component and tellurium (N.Yamada e
t al, Proc.Int.Symp.on Optical Memory 1987 p61-
66) are known. Such an optical recording medium having a Te alloy as a recording layer has a high crystallization speed and can perform high-speed overwriting with one circular beam only by modulating the irradiation power. In optical recording media using these recording layers, usually, a heat-resistant and light-transmitting dielectric layer is provided on both sides of the recording layer to prevent the recording layer from being deformed and opened during recording. .
【0005】[0005]
【発明が解決しようとする課題】このような光記録媒体
の製造は、一般にアウターおよびインナーマスクを用い
て基板をホルダに固定し、スパッタ等の方法で記録膜、
保護膜等を形成することによって行われる。その後、オ
ーバーコート等の工程を経て光記録媒体が製造される
が、スパッタ時における膜応力等により製造される光記
録媒体の機械特性が悪化しないよう管理することが製造
上重要であった。In the production of such an optical recording medium, generally, a substrate is fixed to a holder using an outer mask and an inner mask, and a recording film is formed by a method such as sputtering.
This is performed by forming a protective film or the like. Thereafter, the optical recording medium is manufactured through a process such as overcoating, and it is important in manufacturing to manage the optical recording medium to be manufactured so that the mechanical characteristics of the manufactured optical recording medium are not deteriorated due to the film stress at the time of sputtering.
【0006】近年における光記録媒体の製造において、
生産効率向上のため、短タクト化を目的にスパッタ時間
を短縮化させる傾向にあるが、スパッタ時間の短縮はス
パッタパワーを上昇させることにより行われることが多
い。特に誘電体層を有する光記録媒体では誘電体層を高
周波(RF)電源を用いたスパッタにより形成するが、
スパッタパワーを上昇させると、この誘電体層の成膜時
に基板表面温度が上昇することにより、樹脂基板の歪み
が大きくなるという問題が生じていた。この問題は他の
層、例えば記録層の形成においても同様である。In recent years, in the production of optical recording media,
In order to improve production efficiency, the sputtering time tends to be shortened for the purpose of shortening the tact time, but the sputtering time is often shortened by increasing the sputtering power. In particular, in an optical recording medium having a dielectric layer, the dielectric layer is formed by sputtering using a radio frequency (RF) power supply.
When the sputter power is increased, the substrate surface temperature increases during the formation of the dielectric layer, causing a problem that the distortion of the resin substrate increases. This problem also applies to the formation of another layer, for example, a recording layer.
【0007】このため、スパッタ時の基板温度を低くす
るため、スパッタパワーを低下させる方法や、基板とタ
ーゲットの間隔を大きくする方法によって基板表面温度
の上昇を抑えることが考えられる。しかし、基板温度を
下げるためには大幅にスパッタレートを下げる必要があ
り、生産効率が極端に悪化する。また、基板をスパッタ
時に強制的に冷却することも考えられるが、冷却装置が
必要となるためプロセスが複雑となるという欠点を有す
る。Therefore, in order to lower the substrate temperature during sputtering, it is conceivable to suppress the rise in the substrate surface temperature by a method of lowering the sputtering power or a method of increasing the distance between the substrate and the target. However, in order to lower the substrate temperature, it is necessary to greatly reduce the sputter rate, and the production efficiency is extremely deteriorated. It is also conceivable to forcibly cool the substrate at the time of sputtering, but it has a drawback that the process becomes complicated because a cooling device is required.
【0008】また、記録マークの大きさをより小さくし
て光記録媒体の高密度化を達成するために、レーザー光
をより絞り込める大きな開口数を持つ光ヘッドがドライ
ブに採用されようとしている。さらにはより大きな開口
数の光ヘッドを使用しても安定な記録再生を行えるよう
光記録媒体の基板はこれまでCDやCD−ROMで用い
られてきた1.2mm厚基板から0.6mm厚へと薄く
する方向にある。そのため、記録再生時のフォーカシン
グやトラッキングに影響を与える基板の機械特性は今ま
で以上に厳しく管理する必要が生じている。Further, in order to achieve a higher density of an optical recording medium by reducing the size of a recording mark, an optical head having a large numerical aperture capable of narrowing a laser beam is being used in a drive. Furthermore, the substrate of the optical recording medium has been changed from a 1.2 mm thick substrate used in CDs and CD-ROMs to a 0.6 mm thick so that stable recording and reproduction can be performed even when an optical head having a larger numerical aperture is used. In the direction of thinning. For this reason, it is necessary to more strictly manage the mechanical properties of the substrate which affect focusing and tracking during recording and reproduction.
【0009】本発明の課題は上述した問題点を改良し、
光記録媒体の製造における生産性を向上させるととも
に、設備的に大幅な改良をともなうことなく、簡易なプ
ロセスでスパッタ後の基板の反り、チルト、加速度等の
機械特性を改善し、歪みの少ない光記録媒体を製造する
ための光記録媒体用スパッタホルダおよび光記録媒体の
製造方法を提供することを目的とする。An object of the present invention is to improve the above-mentioned problems,
While improving the productivity in the production of optical recording media and improving the mechanical properties such as warpage, tilt, and acceleration of the sputtered substrate with a simple process without significant improvement in equipment, An object of the present invention is to provide a sputter holder for an optical recording medium for manufacturing a recording medium and a method for manufacturing an optical recording medium.
【0010】[0010]
【課題を解決するための手段】前記課題を解決するため
に、本発明は下記の構成からなる。すなわち、本発明の
光記録媒体用スパッタホルダは、スパッタ時に光記録媒
体基板を保持するためのホルダであって、該基板を保持
するホルダの基板に接触する部位が多孔質であることを
特徴とするものである。Means for Solving the Problems To solve the above problems, the present invention comprises the following constitutions. That is, the optical recording medium sputter holder of the present invention is a holder for holding an optical recording medium substrate during sputtering, wherein a portion of the holder that holds the substrate that contacts the substrate is porous. Is what you do.
【0011】また、本発明の光記録媒体の製造方法は、
光記録媒体基板をホルダで保持してスパッタを行う光記
録媒体の製造方法であって、該基板を保持するホルダの
基板に接触する部位が多孔質となっていることを特徴と
ものである。Further, the method for manufacturing an optical recording medium according to the present invention comprises:
What is claimed is: 1. A method for manufacturing an optical recording medium in which an optical recording medium substrate is sputtered while being held by a holder, wherein a portion of the holder which holds the substrate, which is in contact with the substrate, is porous.
【0012】[0012]
【発明の実施の形態】以下、本発明について、図面に示
す実施例を参照しながらさらに詳しく説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail with reference to embodiments shown in the drawings.
【0013】図1は、本発明のスパッタホルダの一実施
態様を示す断面図であり、図2は、図1のA−B切断平
面図である。また、図3は従来のスパッタホルダの断面
図である。FIG. 1 is a sectional view showing an embodiment of the sputter holder of the present invention, and FIG. 2 is a plan view cut along AB of FIG. FIG. 3 is a sectional view of a conventional sputter holder.
【0014】光記録媒体用のスパッタホルダは、図3に
示すように、一般に記録媒体基板1を同じ高さの外周と
内周部分でアウターマスク2およびセンターマスク3に
よりホルダ4に保持し、基板1を水平な状態に保つよう
な構造となっている。また、基板1とホルダ4の接触す
る面が少なくなるようホルダ4は窪み部5を有する構造
となっている。As shown in FIG. 3, a sputter holder for an optical recording medium generally holds a recording medium substrate 1 on a holder 4 by an outer mask 2 and a center mask 3 at the outer periphery and the inner periphery at the same height. 1 is kept in a horizontal state. Also, the holder 4 has a structure having a recessed portion 5 so that the surface where the substrate 1 contacts the holder 4 is reduced.
【0015】本発明のホルダにおいては、例えば図1に
示すように、ホルダ4の基板1と接触する面に多孔質部
材6を存在せしめたことを特徴とする。The holder according to the present invention is characterized in that, as shown in FIG. 1, for example, a porous member 6 is provided on the surface of the holder 4 which comes into contact with the substrate 1.
【0016】通常、基板1はスパッタ膜の応力による反
りが発生するが、水平な多孔質部材6に基板1を吸着さ
せてスパッタすることにより、スパッタ膜の応力による
基板1の歪みが低減され、機械特性の良好な光記録媒体
が得られるのである。Usually, the substrate 1 is warped due to the stress of the sputtered film. However, by adsorbing the substrate 1 on the horizontal porous member 6 and sputtering, the distortion of the substrate 1 due to the stress of the sputtered film is reduced. An optical recording medium having good mechanical properties can be obtained.
【0017】基板1と接触するホルダ4の面を多孔質部
材6とする部位については、基板に接するホルダ4の面
の全てを多孔質部材で構成させてもよく、また、ある一
部の機械特性を改善するためにホルダの一部分だけを多
孔質部材で構成させてもよい。With respect to the portion of the holder 4 which is in contact with the substrate 1 as the porous member 6, the entire surface of the holder 4 which is in contact with the substrate may be constituted by a porous member. In order to improve the characteristics, only a part of the holder may be made of a porous member.
【0018】多孔質部材の材質としては、例えば、セラ
ミックスなどが適用できる。As the material of the porous member, for example, ceramics can be used.
【0019】本発明に係る光記録媒体は、基板上に少な
くとも記録層と保護層を有するものである。好ましく
は、複数の積層構造に構成されており、例えば基板上に
第1層(第1保護層)/第2層(記録層)/第3層(第
2保護層)/第4層(反射層)をこの順に設けた積層構
成、または第1層(第1保護層)/第2層(記録層)/
第3層(第2保護層)/第4層(光吸収層)/第5層
(反射層)などが挙げられる。The optical recording medium according to the present invention has at least a recording layer and a protective layer on a substrate. Preferably, it has a plurality of laminated structures, for example, a first layer (first protective layer) / second layer (recording layer) / third layer (second protective layer) / fourth layer (reflection) on a substrate. Layers) in this order, or a first layer (first protective layer) / second layer (recording layer) /
Third layer (second protective layer) / fourth layer (light absorbing layer) / fifth layer (reflective layer) and the like.
【0020】第1および第2保護層の効果は、記録層の
腐食防止、記録時に基板、記録層などの熱による変形で
生じる記録特性の劣化防止、光学的な干渉効果により再
生時の信号コントラストを改善する効果がある。この場
合の第1保護層の厚さは、通常50nm〜400nmと
される。第2保護層の厚さは10nm〜100nmであ
ることが、書換の繰り返しによる記録特性の劣化が少な
く、また消去パワーのパワー・マージンが広い点で優れ
ているので好ましい。The effects of the first and second protective layers are as follows: prevention of corrosion of the recording layer, prevention of deterioration of recording characteristics caused by heat deformation of the substrate and the recording layer during recording, and signal contrast at the time of reproduction due to an optical interference effect. Has the effect of improving. In this case, the thickness of the first protective layer is usually 50 nm to 400 nm. The thickness of the second protective layer is preferably 10 nm to 100 nm, because it is excellent in that the recording characteristics are not deteriorated due to rewriting repeatedly and the power margin of the erasing power is wide.
【0021】このような保護層としては、ZnS、Si
O2 、Ta2 O5 、ITO、ZrC、TiC、MgF2
などの無機膜やそれらの混合膜が使用できる。特にZn
SとSiO2 およびZnSとMgF2 の混合膜は長期保
存信頼性に優れており、さらに記録消去時の劣化を抑制
するので好ましい。また、これらに炭素や、MgF2な
どのフッ化物を混合したものも、膜の残留応力が小さい
ことから好ましい。特にZnSとSiO2 の混合膜ある
いは、ZnSとSiO2 と炭素の混合膜は、記録、消去
の繰り返しによっても、記録感度、C/N、消去率など
の劣化が起きにくいことから好ましく特にZnSとSi
O2 と炭素の混合膜が好ましい。As such a protective layer, ZnS, Si
O 2 , Ta 2 O 5 , ITO, ZrC, TiC, MgF 2
Inorganic films such as these and mixed films thereof can be used. Especially Zn
A mixed film of S and SiO 2 or ZnS and MgF 2 is preferable because it has excellent long-term storage reliability and suppresses deterioration at the time of recording / erasing. Further, those obtained by mixing carbon or a fluoride such as MgF 2 with these are also preferable because the residual stress of the film is small. Especially mixed film of ZnS and SiO 2 or a mixed film of ZnS and SiO 2 and carbon are recorded, even by the repetition of erasing and recording sensitivity, C / N, preferably in particular ZnS since does not occur easily deteriorate, such as erasure ratio Si
A mixed film of O 2 and carbon is preferred.
【0022】記録層としては、構成元素として少なくと
もGe、Sb、Teの3元素を含む合金を用いることが
高速でオーバーライトが可能である点から好ましい。さ
らに、その組成は次式で表される範囲にあることが熱安
定性と繰り返し安定性に優れている点から好ましい。As the recording layer, it is preferable to use an alloy containing at least three elements Ge, Sb, and Te as constituent elements from the viewpoint that overwriting can be performed at high speed. Further, the composition is preferably within the range represented by the following formula, from the viewpoint of excellent thermal stability and repetition stability.
【0023】 Mz (Sbx Te1-x )1-y-z (Ge0.5 Te0.5 )y 0.35≦x≦0.5 0.2≦y≦0.5 0.0005≦z≦0.01 ここで、Mはパラジウム,ニオブ、白金、銀、金、コバ
ルトから選ばれる少なくとも一種の金属、Sbはアンチ
モン、Teはテルル、Geはゲルマニウムを表す。ま
た、x,y,z、および数字は、各元素の原子の数(各
元素のモル数)を表す。特に、パラジウム,ニオブにつ
いては少なくとも一種を含むことが好ましい。M z (Sb x Te 1-x ) 1-yz (Ge 0.5 Te 0.5 ) y 0.35 ≦ x ≦ 0.5 0.2 ≦ y ≦ 0.5 0.0005 ≦ z ≦ 0.01 Here, M represents at least one metal selected from palladium, niobium, platinum, silver, gold and cobalt, Sb represents antimony, Te represents tellurium, and Ge represents germanium. In addition, x, y, z, and numerals represent the number of atoms of each element (the number of moles of each element). In particular, palladium and niobium preferably contain at least one kind.
【0024】第2保護層または光吸収層の上に形成され
た光反射層には、光学的な干渉効果により、再生時の信
号コントラストを改善すると共に、冷却効果により、非
晶状態の記録マークの形成を容易にし、かつ消去特性、
繰り返し特性を改善する効果が期待される。この記録層
膜厚としては、10〜100nmであることが好まし
い。The light reflection layer formed on the second protective layer or the light absorption layer improves the signal contrast at the time of reproduction by an optical interference effect, and has an amorphous recording mark by a cooling effect. Facilitates the formation of the
The effect of improving the repetition characteristics is expected. The thickness of the recording layer is preferably from 10 to 100 nm.
【0025】反射層の材質としては、光反射性を有する
Al、Auなどの金属、およびこれらを主成分とし、T
i、Cr、Hfなどの添加元素を含む合金およびAl、
Auなどの金属にAl、Siなどの金属窒化物、金属酸
化物、金属カルコゲン化物などの金属化合物を混合した
ものなどがあげられる。Al、Auなどの金属、および
これらを主成分とする合金は、光反射性が高く、かつ熱
伝導率を高くできることから好ましい。前述の合金の例
として、AlにSi、Mg、Cu、Pd、Ti、Cr、
Hf、Ta、Nb、Mnなどの少なくとも1種の元素を
合計で5原子%以下、1原子%以上加えたもの、あるい
は、AuにCr、Ag、Cu、Pd、Pt、Niなどの
少なくとも1種の元素を合計で20原子%以下1原子%
以上加えたものなどがある。特に、材料のコストが安価
にできることから、Alを主成分とする合金が好まし
く、とりわけ、耐腐食性が良好なことから、AlにT
i、Cr、Ta、Hf、Zr、Mn、Pdから選ばれる
少なくとも1種以上の金属を合計で5原子%以下0.5
原子%以上添加した合金が好ましい。とりわけ、耐腐食
性が良好でかつヒロックなどの発生が起こりにくいこと
から、添加元素を合計で0.5原子%以上3原子%未満
含む、Al−Hf−Pd合金、Al−Hf合金、Al−
Ti合金、Al−Ti−Hf合金、Al−Cr合金、A
l−Ta合金、Al−Ti−Cr合金、Al−Si−M
n合金のいずれかのAlを主成分とする合金が反射層材
料として好ましい。As a material of the reflection layer, a metal such as Al or Au having light reflectivity and a material containing these as main components,
alloys containing additional elements such as i, Cr, Hf and Al,
Examples include a mixture of a metal such as Au and a metal compound such as a metal nitride such as Al and Si, a metal oxide, and a metal chalcogenide. Metals such as Al and Au and alloys containing these as main components are preferable because of high light reflectivity and high heat conductivity. Examples of the aforementioned alloys include Al, Si, Mg, Cu, Pd, Ti, Cr,
At least one element such as Hf, Ta, Nb, Mn or the like added in a total of 5 atomic% or less and 1 atomic% or more, or at least one element of Au, Cr, Ag, Cu, Pd, Pt, Ni, etc. Element total 20 atomic% or less 1 atomic%
These are the ones added above. In particular, an alloy containing Al as a main component is preferable because the cost of the material can be reduced. In particular, since the corrosion resistance is good, T
i, Cr, Ta, Hf, Zr, Mn, Pd and at least one metal selected from the group consisting of at most 5 atomic%
Alloys containing at least atomic% are preferred. In particular, Al-Hf-Pd alloys, Al-Hf alloys, Al-Hf alloys containing a total of 0.5 to less than 3 atomic% of additional elements because of good corrosion resistance and low occurrence of hillocks and the like.
Ti alloy, Al-Ti-Hf alloy, Al-Cr alloy, A
l-Ta alloy, Al-Ti-Cr alloy, Al-Si-M
Any of the n-alloys containing Al as a main component is preferable as the material of the reflective layer.
【0026】記録媒体用の基板としては、基板側から記
録再生を行うためにはレーザー光が良好に透過する材料
を用いることが好ましく、たとえばポリメチルメタクリ
レート樹脂、ポリカーボネート樹脂、ポリオレフィン樹
脂、エポキシ樹脂などの有機高分子樹脂、それらの混合
物、共重合体物などを用いることができる。中でも、ポ
リカーボネート樹脂を光学特性と耐熱性の観点から最も
好まく用いることができる。As a substrate for a recording medium, it is preferable to use a material through which laser light can be transmitted in order to perform recording / reproduction from the substrate side. For example, polymethyl methacrylate resin, polycarbonate resin, polyolefin resin, epoxy resin, etc. Organic polymer resins, mixtures thereof, copolymers and the like can be used. Among them, a polycarbonate resin can be most preferably used from the viewpoint of optical characteristics and heat resistance.
【0027】この熱可塑性樹脂を用いて、例えば射出成
形や射出圧縮成形によって円板状の基板を作製する。こ
の基板成型時、金型内に所定のグルーブやピット雄型が
表面に形成されたスタンパを装着し、スタンパからの転
写により表面に所望のトラックが形成された基板を成形
する。Using this thermoplastic resin, a disk-shaped substrate is produced by, for example, injection molding or injection compression molding. At the time of molding the substrate, a stamper having a predetermined groove or pit male mold formed on the surface is mounted in a mold, and a substrate having a desired track formed on the surface by transfer from the stamper is molded.
【0028】基板の大きさは光記録媒体ドライブ装置か
らの要求規格に合わせる必要がある。例えば、直径とし
ては80mm、90mm、120mmまたは130mm
の基板が規定されている。厚みとしては1.2mmない
し0.6mmが通常用いられるが、本発明の効果は基板
厚みが薄い方が、顕著に現れるため、1mm以下、特に
0.6mm以下の場合に効果が高い。The size of the substrate needs to conform to the standard required by the optical recording medium drive. For example, the diameter is 80 mm, 90 mm, 120 mm or 130 mm
Substrates are defined. A thickness of 1.2 mm to 0.6 mm is usually used, but the effect of the present invention is more pronounced when the substrate thickness is smaller, so that the effect is high when the thickness is 1 mm or less, particularly 0.6 mm or less.
【0029】このような基板上に少なくとも前述の層が
必要に応じ適正な厚みで積層される。この層の上には有
機樹脂保護層を設けても良い。有機樹脂保護層として
は、重合性モノマーおよびオリゴマーを主成分とする光
硬化性樹脂組成物や、熱硬化性樹脂組成物が用いられ、
一般にスピンコート法によって形成される。また、同様
な有機樹脂組成物からなる保護層を光の入射面側の基板
上に、耐摩耗性、耐刷性向上などの基板保護の目的や、
ホコリ付着防止のための制電性付与の目的で設けても良
い。On such a substrate, at least the above-mentioned layers are laminated with an appropriate thickness as required. An organic resin protective layer may be provided on this layer. As the organic resin protective layer, a photocurable resin composition containing a polymerizable monomer and an oligomer as a main component, and a thermosetting resin composition are used,
Generally, it is formed by a spin coating method. In addition, a protective layer made of a similar organic resin composition is provided on the substrate on the light incident surface side for the purpose of protecting the substrate such as abrasion resistance and printing durability,
It may be provided for the purpose of imparting antistatic properties to prevent dust adhesion.
【0030】[0030]
【実施例】実施例1 図1に示すホルダを用いて、表1に示す条件で直径12
0mmのポリカーボネートからなる透明基板上に以下に
示す構成の薄膜をスパッタ装置を用いてスパッタし、光
ディスクを作製した。各層の膜厚は水晶発振子式膜厚計
によりモニタしながら行った。多孔質部材としてセラミ
ックスを使用した。EXAMPLE 1 Using a holder shown in FIG.
An optical disk was manufactured by sputtering a thin film having the following structure on a transparent substrate made of 0 mm polycarbonate using a sputtering apparatus. The thickness of each layer was monitored while monitoring with a crystal oscillator type thickness meter. Ceramics were used as the porous member.
【0031】得られたディスクのスパッタ面にスピンコ
ート法によってアクリル酸エステル系紫外線硬化樹脂を
8μm形成し、光記録媒体を得た。さらに、この光記録
媒体に波長820nmの半導体レーザのビームを照射し
て、ディスク全面の記録層を結晶化させ、初期化した。An optical recording medium was obtained by forming an acrylic ester-based ultraviolet curable resin to a thickness of 8 μm on the sputter surface of the obtained disk by spin coating. Further, the optical recording medium was irradiated with a semiconductor laser beam having a wavelength of 820 nm to crystallize and initialize the recording layer on the entire surface of the disk.
【0032】 第1層 第1保護層 80ZnS−20SiO2 (mol%) 160nm 第2層 記録層 55Te19Ge26Sb 25nm 第3層 第2保護層 80ZnS−20SiO2 (mol%) 40nm 第4層 反射層 Al 100nm 温度23℃、湿度50%の状態で一日放置後、光記録媒
体の機械特性を機械特性測定装置(小野測器(株)社
製、LM100)で測定した。表1に記録媒体外周部
(半径56mm)のディスク反り量(DEF)とチルト
角を示す。First layer First protective layer 80 ZnS-20SiO 2 (mol%) 160 nm Second layer Recording layer 55Te19Ge26Sb 25 nm Third layer Second protective layer 80 ZnS-20SiO 2 (mol%) 40 nm Fourth layer Reflective layer Al 100 nm After standing at 23 ° C. and 50% humidity for one day, the mechanical properties of the optical recording medium were measured with a mechanical property measuring device (LM100, manufactured by Ono Sokki Co., Ltd.). Table 1 shows the disk warpage (DEF) and the tilt angle at the outer peripheral portion (radius 56 mm) of the recording medium.
【0033】実施例2 基板厚みを表1に示すように変えた以外は、実施例1と
同様にして光ディスクを作製した。結果を表1に示す。Example 2 An optical disk was produced in the same manner as in Example 1 except that the thickness of the substrate was changed as shown in Table 1. Table 1 shows the results.
【0034】比較例1〜2 基板厚みを表1に示すようにし、図3に示すホルダを用
いた以外は、実施例1と同様にしてディスクを作製し
た。結果を表1に示す。Comparative Examples 1 and 2 Discs were prepared in the same manner as in Example 1 except that the thickness of the substrate was as shown in Table 1 and the holder shown in FIG. 3 was used. Table 1 shows the results.
【0035】[0035]
【表1】 表1に示す結果から、本発明のホルダを用いることによ
って光記録媒体の機械特性が改善されることがわかる。[Table 1] The results shown in Table 1 show that the use of the holder of the present invention improves the mechanical properties of the optical recording medium.
【0036】[0036]
【発明の効果】本発明によれば、光記録媒体の製造にお
いて、生産性を向上させるとともに、簡易なプロセスで
スパッタ後の光記録媒体の反り、チルト、加速度等の機
械特性を改善し、歪みの少ない光記録媒体を作製するこ
とができる。According to the present invention, in the production of an optical recording medium, not only the productivity is improved, but also the mechanical properties such as warpage, tilt, acceleration and the like of the optical recording medium after sputtering are improved by a simple process, and the distortion is improved. It is possible to manufacture an optical recording medium having a small amount of light.
【図1】本発明のスパッタホルダの一実施態様を示す断
面図である。FIG. 1 is a sectional view showing one embodiment of a sputter holder of the present invention.
【図2】図1のA−B切断面平面図である。FIG. 2 is a plan view taken along a line AB in FIG. 1;
【図3】従来のスパッタホルダの断面図である。FIG. 3 is a cross-sectional view of a conventional sputter holder.
1:基板 2:アウターマスク 3:センタマスク 4:ホルダ 5:窪み部 6:多孔質部材 1: substrate 2: outer mask 3: center mask 4: holder 5: depression 6: porous member
Claims (4)
めのホルダであって、該基板を保持するホルダの基板に
接触する部位を多孔質部材で構成したことを特徴とする
光記録媒体用スパッタホルダ。An optical recording medium sputtering apparatus comprising: a holder for holding an optical recording medium substrate at the time of sputtering, wherein a portion of the holder for holding the substrate which contacts the substrate is formed of a porous member. holder.
を特徴とする請求項1記載の光記録媒体用スパッタホル
ダ。2. The sputter holder for an optical recording medium according to claim 1, wherein the porous member is made of a ceramic.
た基板を保持するホルダを用いて、光記録媒体基板を上
記ホルダで保持してスパッタを行うことを特徴とする光
記録媒体の製造方法。3. A method of manufacturing an optical recording medium, comprising: using a holder for holding a substrate having a portion that is in contact with the substrate with a porous member and holding the optical recording medium substrate with the holder to perform sputtering. Method.
0.6mm以下の基板であることを特徴とする請求項2
記載の光記録媒体の製造方法。4. A substrate having a thickness of 0.6 mm or less, which is obtained by injection molding a thermoreversible resin.
The manufacturing method of the optical recording medium according to the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10169755A JP2000011466A (en) | 1998-06-17 | 1998-06-17 | Sputter holder for optical recording medium and production of optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10169755A JP2000011466A (en) | 1998-06-17 | 1998-06-17 | Sputter holder for optical recording medium and production of optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2000011466A true JP2000011466A (en) | 2000-01-14 |
Family
ID=15892256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10169755A Pending JP2000011466A (en) | 1998-06-17 | 1998-06-17 | Sputter holder for optical recording medium and production of optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2000011466A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7968362B2 (en) | 2001-03-27 | 2011-06-28 | Ricoh Company, Ltd. | Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system |
-
1998
- 1998-06-17 JP JP10169755A patent/JP2000011466A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7968362B2 (en) | 2001-03-27 | 2011-06-28 | Ricoh Company, Ltd. | Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system |
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