JP2000007763A - Epoxy resin composition and insulating substrate using the same - Google Patents
Epoxy resin composition and insulating substrate using the sameInfo
- Publication number
- JP2000007763A JP2000007763A JP17301198A JP17301198A JP2000007763A JP 2000007763 A JP2000007763 A JP 2000007763A JP 17301198 A JP17301198 A JP 17301198A JP 17301198 A JP17301198 A JP 17301198A JP 2000007763 A JP2000007763 A JP 2000007763A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- epoxy
- compound
- polyphenylene ether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 56
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 55
- 239000000203 mixture Substances 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 title claims abstract description 18
- 229920001955 polyphenylene ether Polymers 0.000 claims abstract description 24
- 239000004593 Epoxy Substances 0.000 claims abstract description 20
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- 239000003999 initiator Substances 0.000 claims abstract description 11
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011521 glass Substances 0.000 claims abstract description 6
- 150000008065 acid anhydrides Chemical class 0.000 claims description 8
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 claims description 5
- 150000008064 anhydrides Chemical class 0.000 claims description 5
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- -1 cyanate compound Chemical class 0.000 abstract description 14
- 239000000463 material Substances 0.000 abstract description 8
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 abstract description 5
- 150000001491 aromatic compounds Chemical class 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 238000013329 compounding Methods 0.000 abstract description 2
- 150000003839 salts Chemical class 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 20
- 229920005989 resin Polymers 0.000 description 13
- 239000011347 resin Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 8
- 239000002966 varnish Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- GVLZQVREHWQBJN-UHFFFAOYSA-N 3,5-dimethyl-7-oxabicyclo[2.2.1]hepta-1,3,5-triene Chemical compound CC1=C(O2)C(C)=CC2=C1 GVLZQVREHWQBJN-UHFFFAOYSA-N 0.000 description 3
- 239000004342 Benzoyl peroxide Substances 0.000 description 3
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 3
- 235000019400 benzoyl peroxide Nutrition 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 description 3
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- JDIPZHAYUYYGSN-UHFFFAOYSA-N (4-propylphenyl) cyanate Chemical compound CCCC1=CC=C(OC#N)C=C1 JDIPZHAYUYYGSN-UHFFFAOYSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- JNCRKOQSRHDNIO-UHFFFAOYSA-N [4-[(4-cyanato-3,5-dimethylphenyl)methyl]-2,6-dimethylphenyl] cyanate Chemical compound CC1=C(OC#N)C(C)=CC(CC=2C=C(C)C(OC#N)=C(C)C=2)=C1 JNCRKOQSRHDNIO-UHFFFAOYSA-N 0.000 description 1
- SIZDMAYTWUINIG-UHFFFAOYSA-N [4-[1-(4-cyanatophenyl)ethyl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)C1=CC=C(OC#N)C=C1 SIZDMAYTWUINIG-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、エポキシ樹脂組成
物およびこのエポキシ樹脂組成物を用いた絶縁基板に関
するものであり、具体的には、プリント配線基板等の電
子材料に用いられるエポキシ樹脂組成物に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition and an insulating substrate using the epoxy resin composition. More specifically, the present invention relates to an epoxy resin composition used for an electronic material such as a printed wiring board. It is about.
【0002】[0002]
【従来の技術】積層板用、プリント配線基板用等の絶縁
基板に使用されるエポキシ樹脂組成物としては、基材に
含浸させるものであり、そして、情報通信分野で使用さ
れる上述のような絶縁基板は、MHz帯からGHz帯と
いう高周波領域に対応するため、優れた電気特性が要求
され、特に、誘電率(ε)、誘電正接(tanδ)が低
いことを要求されていた。2. Description of the Related Art An epoxy resin composition used for an insulating substrate such as a laminated board or a printed wiring board is one that is impregnated into a base material, and is used in the information and communication fields as described above. Insulating substrates are required to have excellent electrical characteristics in order to cope with a high-frequency range from the MHz band to the GHz band, and in particular, to have a low dielectric constant (ε) and a low dielectric loss tangent (tan δ).
【0003】[0003]
【発明が解決しようとする課題】従来、このような電気
特性を有する基板の一つとして、エポキシ樹脂に、ポリ
フェニレンエーテル樹脂(PPO樹脂ともいう。)を混
合した材料が用いられてきた。この材料は、通常のエポ
キシ樹脂材料よりも、低誘電率性であり、かつ、高耐熱
ではあるが、他の高価な高周波用材料であるテフロン樹
脂、ビスマレイミドトリアジン樹脂、ポリイミド樹脂な
どと比較すると、ガラス転移温度(Tg)が低く、誘電
正接も高いという欠点があった。Heretofore, as one of the substrates having such electric characteristics, a material obtained by mixing a polyphenylene ether resin (also referred to as a PPO resin) with an epoxy resin has been used. This material has a lower dielectric constant than ordinary epoxy resin materials, and has high heat resistance, but compared to other expensive high-frequency materials such as Teflon resin, bismaleimide triazine resin, polyimide resin, etc. However, there are drawbacks that the glass transition temperature (Tg) is low and the dielectric loss tangent is high.
【0004】そこで、本発明者らは、エポキシ樹脂にポ
リフェニレンエーテル樹脂を混合した材料にシアネート
およびその自重合体を配合し、耐熱性と電気特性をより
向上させる方策について特願平9−71333号公報や
特願平9−82850号公報に示すごとき提案をしてき
た。Therefore, the present inventors have disclosed a method for further improving heat resistance and electric characteristics by blending a cyanate and a self-polymer thereof with a material obtained by mixing a polyphenylene ether resin with an epoxy resin, as disclosed in Japanese Patent Application No. Hei 9-71333. And Japanese Patent Application No. 9-82850.
【0005】しかしながら、このようなエポキシ樹脂組
成物は、積層板やプリント配線板等の絶縁基板に使用す
ると、密着性、耐熱性が悪くなるという問題があった。However, when such an epoxy resin composition is used for an insulating substrate such as a laminated board or a printed wiring board, there has been a problem that adhesion and heat resistance are deteriorated.
【0006】本発明は、上述の事実に鑑みてなされたも
のであって、その目的とするところは、高耐熱性と、低
誘電正接を有し、密着性に優れたエポキシ樹脂組成物お
よびこのエポキシ樹脂組成物を用いた絶縁基板を提供す
ることにある。The present invention has been made in view of the above-mentioned facts, and has as its object to provide an epoxy resin composition having high heat resistance, a low dielectric loss tangent, and excellent adhesion. An object of the present invention is to provide an insulating substrate using an epoxy resin composition.
【0007】[0007]
【課題を解決するための手段】本発明の請求項1に係る
エポキシ樹脂組成物は、一分子中に少なくともエポキシ
基を2個以上有するエポキシ化合物に下記式〔I〕、式
〔II〕、式〔III 〕の群から選ばれたいずれか1種の多
官能エポキシ化合物を併用し、ポリフェニレンエーテル
をフェノール類とラジカル開始剤の存在下で再分配反応
させて得られたフェノール変性ポリフェニレンエーテル
とシアネート化合物、および、硬化促進剤を必須成分と
して含有することを特徴とする。The epoxy resin composition according to claim 1 of the present invention comprises an epoxy compound having at least two epoxy groups in one molecule by the following formulas (I), (II) and (II). A phenol-modified polyphenylene ether and a cyanate compound obtained by redistributing a polyphenylene ether with a phenol and a radical initiator in the presence of a polyfunctional epoxy compound selected from the group [III]; And a curing accelerator as an essential component.
【0008】[0008]
【化4】 Embedded image
【0009】[0009]
【化5】 Embedded image
【0010】[0010]
【化6】 Embedded image
【0011】本発明の請求項2に係るエポキシ樹脂組成
物は、上記必須成分にテトラヒドロ無水フタル酸、メチ
ルヘキサヒドロ無水フタル酸、無水メチルハイミック酸
の群から選ばれた少なくとも1種の酸無水物が配合され
たものであることを特徴とする。The epoxy resin composition according to claim 2 of the present invention is characterized in that the essential component is at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic anhydride. It is characterized in that a product is blended.
【0012】本発明の請求項3に係るエポキシ樹脂組成
物は、上記フェノール変性ポリフェニレンエーテルの数
平均分子量が、10000以下であることを特徴とす
る。The epoxy resin composition according to claim 3 of the present invention is characterized in that the phenol-modified polyphenylene ether has a number average molecular weight of 10,000 or less.
【0013】本発明の請求項4に係るエポキシ樹脂組成
物を用いた絶縁基板は、請求項1ないし請求項3何れか
記載のエポキシ樹脂組成物をガラス基材に含浸させ、硬
化させてなることを特徴とする。An insulating substrate using the epoxy resin composition according to claim 4 of the present invention is obtained by impregnating a glass substrate with the epoxy resin composition according to any one of claims 1 to 3 and curing the glass substrate. It is characterized by.
【0014】[0014]
【発明の実施の形態】以下、本発明の実施形態を詳しく
説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail.
【0015】本発明に係るエポキシ樹脂組成物は、一分
子中に少なくともエポキシ基を2個以上有するエポキシ
化合物に下記式〔I〕、式〔II〕、式〔III 〕の群から
選ばれたいずれか1種の多官能エポキシ化合物を併用
し、ポリフェニレンエーテルをフェノール類とラジカル
開始剤の存在下で再分配反応させて得られたフェノール
変性ポリフェニレンエーテルとシアネート化合物、およ
び、硬化促進剤を必須成分として含有するものである。The epoxy resin composition according to the present invention is characterized in that the epoxy compound having at least two epoxy groups in one molecule is selected from the group consisting of the following formulas (I), (II) and (III): Phenol-modified polyphenylene ether obtained by redistributing polyphenylene ether with phenols and a radical initiator in the presence of a radical initiator using a polyfunctional epoxy compound or a cyanate compound, and a curing accelerator as essential components It contains.
【0016】[0016]
【化7】 Embedded image
【0017】[0017]
【化8】 Embedded image
【0018】[0018]
【化9】 Embedded image
【0019】上記エポキシ樹脂は、1分子あたり2個以
上のエポキシ基を有するものであれば、特に限定される
ものではなく、例えば、ビスフェノールA型エポキシ樹
脂、ビスフェノールF 型エポキシ樹脂、フェノールノボ
ラック型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビ
フェニル型型エポキシ樹脂やこれらのブロモ化エポキシ
樹脂などが挙げられる。これらは、単独あるいは、2種
以上を併用して使用される。The epoxy resin is not particularly limited as long as it has two or more epoxy groups per molecule. Examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, and phenol novolak type epoxy resin. Resins, naphthalene-type epoxy resins, biphenyl-type epoxy resins, and brominated epoxy resins thereof. These are used alone or in combination of two or more.
【0020】上記多官能エポキシ化合物は、上記式
〔I〕、式〔II〕、式〔III 〕の群から選ばれたいずれ
か1種で表わされるものである。The polyfunctional epoxy compound is represented by any one selected from the group consisting of the formulas [I], [II] and [III].
【0021】これらは、硬化過程において、ポリフェニ
レンエーテル類との反応性が良く、架橋点を増加させる
ことにより、高耐熱性の硬化物を生成することができ
る。さらに、硬化物中の未反応物が減少するため、硬化
物を加熱する際、揮発成分が少なくなり、耐熱性、密着
性に優れた硬化物を生成することができる。These have good reactivity with polyphenylene ethers during the curing process, and can increase the number of crosslinking points to produce a cured product having high heat resistance. Furthermore, since unreacted substances in the cured product are reduced, when the cured product is heated, volatile components are reduced, and a cured product excellent in heat resistance and adhesion can be produced.
【0022】これらエポキシの配合量は、15〜35重
量部であることが好ましく、これ未満では硬化不良を生
じ、耐熱性が劣化し、逆に、これを越えると電気特性が
悪くなるものである。The compounding amount of these epoxies is preferably from 15 to 35 parts by weight. If the amount is less than this, curing failure will occur and the heat resistance will be degraded. .
【0023】上記ポリフェニレンエーテル類は、末端に
水酸基を1個以上有するものであれば特に限定されない
が、分子量は10000以下である方が、流動性が良
く、エポキシ樹脂との反応性も高いので好ましい。市販
のポリフェニレンエーテルから低分子量のものを得るに
は、ビスフェノールA等のフェノール類と過酸化物を開
始剤として、トルエン等の溶媒中で加熱すればよく、フ
ェノール類の配合比を増加させるほど、低分子量のもの
が得られる。The above-mentioned polyphenylene ethers are not particularly limited as long as they have at least one hydroxyl group at a terminal, but those having a molecular weight of 10,000 or less are preferable because of good fluidity and high reactivity with an epoxy resin. . In order to obtain a low-molecular-weight product from commercially available polyphenylene ether, a phenol such as bisphenol A and a peroxide may be used as an initiator and heated in a solvent such as toluene. A low molecular weight product is obtained.
【0024】上記シアネート化合物は、1分子あたり2
個以上のシアネート基を有する芳香族化合物である。例
えば、2,2−ビス(4−シアナートフェニル)プロパ
ン、ビス(3,5ジメチル−4−シアナートフェニル)
メタン、2,2−ビス(4−シアナートフェニル)エタ
ンなどが挙げられる。これらは単独、あるいは2種以上
を併用して使用される。The above cyanate compound is used in an amount of 2 per molecule.
An aromatic compound having at least two cyanate groups. For example, 2,2-bis (4-cyanatophenyl) propane, bis (3,5dimethyl-4-cyanatophenyl)
Methane, 2,2-bis (4-cyanatophenyl) ethane and the like can be mentioned. These are used alone or in combination of two or more.
【0025】上記シアネート化合物による硬化物は、電
気特性に優れる上に、エポキシとポリフェニレンエーテ
ル類の硬化反応に関与し、架橋構造を形成するため、ガ
ラス転移温度も上昇することが考えられる。It is considered that a cured product of the above cyanate compound has excellent electrical properties and also participates in a curing reaction between epoxy and polyphenylene ethers to form a crosslinked structure, so that the glass transition temperature also increases.
【0026】上記シアネート化合物の配合比は、エポキ
シ樹脂およびポリフェニレンエーテル類に対して、1〜
30重量%の範囲で有効である。これより多くなると、
含浸性低下や結晶析出の問題がある。The mixing ratio of the above cyanate compound is 1 to 1 with respect to the epoxy resin and the polyphenylene ether.
It is effective in the range of 30% by weight. If more than this,
There are problems of impregnation deterioration and crystal precipitation.
【0027】上記反応促進剤としては、オクタン酸、ス
テアリン酸、アセチルアセトネート、ナフテン酸、サリ
チル酸等の有機酸とZnやCu等の金属塩や、トリエチ
ルアミン、トリエタノールアミン等の3級アミン、2−
エチル−4−イミダゾール、4−メチルイミダゾール等
のイミダゾール類が有効である。これらは、単独、ある
いは2種以上を併用して用いられる。Examples of the reaction accelerator include organic acids such as octanoic acid, stearic acid, acetylacetonate, naphthenic acid and salicylic acid, metal salts such as Zn and Cu, and tertiary amines such as triethylamine and triethanolamine. −
Imidazoles such as ethyl-4-imidazole and 4-methylimidazole are effective. These are used alone or in combination of two or more.
【0028】これら金属有機酸塩は、シアネートの反応
に寄与し、イミダゾール化合物は、主に、エポキシとポ
リフェニレンエーテル類の反応に寄与すると考えられる
ものである。These metal organic acid salts are considered to contribute to the reaction of cyanate, and the imidazole compound is considered to mainly contribute to the reaction between epoxy and polyphenylene ethers.
【0029】上記必須成分にテトラヒドロ無水フタル
酸、メチルヘキサヒドロ無水フタル酸、無水メチルハイ
ミック酸の群から選ばれた少なくとも1種の酸無水物が
配合されたものは、上記エポキシ化合物とポリフェニレ
ンエーテル類を予備的に反応させたものである。この反
応は、イミダゾール化合物の存在下で容易に進行するも
のである。ただし、反応させすぎると、粘度が上昇し
て、逆効果となるものである。When the above essential components are blended with at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic anhydride, the epoxy compound and the polyphenylene ether Are preliminarily reacted. This reaction proceeds easily in the presence of the imidazole compound. However, if the reaction is performed too much, the viscosity increases, which has an adverse effect.
【0030】なお、上記酸無水物は、テトラヒドロ無水
フタル酸、メチルヘキサヒドロ無水フタル酸、無水メチ
ルハイミック酸の群から選ばれた少なくとも1種のもの
である。The acid anhydride is at least one selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic anhydride.
【0031】これらを配合することにより、硬化物中の
未反応物が減少するため、硬化物を加熱する際、揮発成
分が少なくなり、耐熱性、密着性に優れた硬化物を生成
することができる。By blending these, the amount of unreacted substances in the cured product is reduced, so that when the cured product is heated, the volatile components are reduced and a cured product excellent in heat resistance and adhesion can be produced. it can.
【0032】これら酸無水物の配合量は、1〜30重量
部であることが好ましく、これ未満では、硬化不良を生
じ、耐熱性が劣化し、逆に、これを越えると、電気特性
が悪くなる。The amount of these acid anhydrides is preferably from 1 to 30 parts by weight. If the amount is less than this, curing failure will occur and the heat resistance will be degraded. Become.
【0033】なお、本発明のエポキシ樹脂組成物は、適
当な溶剤中で、ガラス基材に含浸させ、乾燥後、加熱硬
化させることによって、積層板、プリント配線板などの
絶縁基板として用いることができるものである。The epoxy resin composition of the present invention can be used as an insulating substrate such as a laminated board or a printed wiring board by impregnating a glass substrate in an appropriate solvent, drying and heating and curing. You can do it.
【0034】そして、本発明は、シアネート基を有する
芳香族化合物の硬化物の良好な電気特性と多官能エポキ
シやポリフェニレンエーテル類との反応性を利用したも
のである。すなわち、硬化系にとりこまれることによっ
て、耐熱性、密着性も向上するものである。The present invention utilizes the good electrical properties of a cured product of an aromatic compound having a cyanate group and the reactivity with a polyfunctional epoxy or polyphenylene ether. That is, heat resistance and adhesion are improved by being incorporated into the curing system.
【0035】[0035]
【実施例】以下、本発明の実施例を詳しく説明する。Embodiments of the present invention will be described below in detail.
【0036】(実施例1)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を150g、さらに、下式
〔I〕の3官能エポキシ樹脂(油化シェル製エピコート
1032H60)を80g、ポリフェニレンエーテル類
としてポリ(2,6−ジメチル−1,4−フェニレンエ
ーテル)(GE製)60gとビスフェノールA8.2
g、反応開始剤としてベンゾイルパーオキシド(ナカラ
イテスク製)4.5gを加熱反応させたもの(数平均分
子量約4000)を用いた。シアネート化合物として
は、2,2−ビス(4−シアナートフェニル)プロパン
(チバガイギー社製)62.5g、触媒としてアセチル
アセトネート亜鉛を0.016g、2−エチル−4−イ
ミダゾールを0.6g用いた。これらをトルエン100
g中で混合し、エポキシ樹脂組成物の樹脂ワニスを作製
した。(Example 1) As an epoxy resin, 150 g of a bisphenol A type epoxy resin and a bromide thereof (DER542 manufactured by Dow Chemical), and a trifunctional epoxy resin represented by the following formula [I] (Epicoat 1032H60 manufactured by Yuka Shell) Of poly (2,6-dimethyl-1,4-phenylene ether) (manufactured by GE) as polyphenylene ethers and bisphenol A 8.2.
g, a reaction initiator (4.5 g of benzoyl peroxide (manufactured by Nacalai Tesque)) reacted by heating (number average molecular weight: about 4000) was used. 62.5 g of 2,2-bis (4-cyanatophenyl) propane (manufactured by Ciba-Geigy) as a cyanate compound, 0.016 g of zinc acetylacetonate and 0.6 g of 2-ethyl-4-imidazole as a catalyst Was. These are treated with toluene 100
g) to prepare a resin varnish of the epoxy resin composition.
【0037】[0037]
【化10】 Embedded image
【0038】(実施例2)実施例1において、ビスフェ
ノールA型エポキシおよびその臭素化物を150g、さ
らに、下式〔II〕の3官能エポキシを55g用いた以外
は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニスを
合成した。Example 2 An epoxy resin composition was prepared in the same manner as in Example 1 except that bisphenol A type epoxy and its bromide were used in an amount of 150 g, and a trifunctional epoxy represented by the following formula [II] was used in an amount of 55 g. Was synthesized.
【0039】[0039]
【化11】 Embedded image
【0040】(実施例3)実施例1において、ビスフェ
ノールA型エポキシおよびその臭素化物を100g、さ
らに、下式〔III 〕の4官能エポキシを75g用いた以
外は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニス
を合成した。Example 3 An epoxy resin composition was prepared in the same manner as in Example 1 except that 100 g of bisphenol A type epoxy and its bromide were used, and 75 g of a tetrafunctional epoxy represented by the following formula [III] was used. Was synthesized.
【0041】[0041]
【化12】 Embedded image
【0042】(実施例4)実施例1において、シアネー
ト化合物として、2,2−ビス(4−シアナートフェニ
ル)プロパン(チバガイギー社製)を62.5g、さら
に、酸無水物としてテトラヒドロ無水フタル酸を23g
用いた以外は、全て同じ配合でエポキシ樹脂組成物の樹
脂ワニスを作製した。Example 4 In Example 1, 62.5 g of 2,2-bis (4-cyanatophenyl) propane (manufactured by Ciba Geigy) was used as a cyanate compound, and tetrahydrophthalic anhydride was used as an acid anhydride. 23g
A resin varnish of an epoxy resin composition was prepared with the same composition except that it was used.
【0043】(実施例5)実施例4において、酸無水物
として、メチルヘキサヒドロ無水フタル酸を22g用い
た以外は、全て同じ配合でエポキシ樹脂組成物の樹脂ワ
ニスを作製した。Example 5 A resin varnish of an epoxy resin composition was prepared in the same manner as in Example 4, except that 22 g of methylhexahydrophthalic anhydride was used as the acid anhydride.
【0044】(実施例6)実施例4において、酸無水物
として、無水メチルハイミック酸を20g用いた以外
は、全て同じ配合でエポキシ樹脂組成物の樹脂ワニスを
作製した。Example 6 A resin varnish of an epoxy resin composition was prepared in the same manner as in Example 4, except that 20 g of methylhymic anhydride was used as the acid anhydride.
【0045】(比較例1)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を205g、ポリフェニレンエ
ーテル類としてポリ(2,6−ジメチル−1,4−フェ
ニレンエーテル)(GE製)60gとビスフェノールA
8.2g 、さらに、反応開始剤としてベンゾイルパーオ
キシド4.5gを加熱反応させたもの(数平均分子量約
4000)を用いた。硬化剤としてエタキュアー5.2
g、触媒としてアセチルアセトネート亜鉛を5.2g、
2−エチル−4−イミダゾールを3.6g用いた。これ
らを混合し、エポキシ樹脂組成物の樹脂ワニスを作製し
た。Comparative Example 1 205 g of a bisphenol A type epoxy resin and a bromide thereof (DER542 manufactured by Dow Chemical) were used as epoxy resins, and poly (2,6-dimethyl-1,4-phenylene ether) was used as polyphenylene ethers ( GE) 60g and bisphenol A
8.2 g, and a reaction initiator (4.5 g of benzoyl peroxide) which had been heated and reacted as a reaction initiator (number average molecular weight: about 4000) were used. Etacure 5.2 as a curing agent
g, 5.2 g of zinc acetylacetonate as a catalyst,
3.6 g of 2-ethyl-4-imidazole was used. These were mixed to prepare a resin varnish of an epoxy resin composition.
【0046】(比較例2)エポキシ樹脂として、ビスフ
ェノールA型エポキシ樹脂およびその臭素化物(ダウケ
ミカル製DER542)を205g、ポリフェニレンエ
ーテル類としてポリ(2,6−ジメチル−1,4−フェ
ニレンエーテル)(GE製)60gとビスフェノールA
8.2g、さらに、反応開始剤としてベンゾイルパーオ
キシド4.5gを加熱反応させたもの(数平均分子量約
4000)を用いた。シアネート化合物としては、2,
2−ビス(4−シアナートフェニル)プロパン(チバガ
イギー社製)62.5gにアセチルアセトネート亜鉛を
1.2g加え、120℃で3時間プレポリマー化させた
もの(平均分子量500)、触媒としてアセチルアセト
ネート亜鉛を0.016g、2−エチル−4−イミダゾ
ールを0.6g用いた。これらをトルエン100g中で
混合し、エポキシ樹脂組成物の樹脂ワニスを作製した。(Comparative Example 2) As an epoxy resin, 205 g of bisphenol A type epoxy resin and a bromide thereof (DER542 manufactured by Dow Chemical Co., Ltd.), and poly (2,6-dimethyl-1,4-phenylene ether) as polyphenylene ethers ( GE) 60g and bisphenol A
8.2 g and a reaction initiator (4.5 g of benzoyl peroxide) as a reaction initiator (number average molecular weight of about 4000) were used. As the cyanate compound, 2,
1.2 g of zinc acetylacetonate was added to 62.5 g of 2-bis (4-cyanatophenyl) propane (manufactured by Ciba Geigy) and prepolymerized at 120 ° C. for 3 hours (average molecular weight: 500). 0.016 g of zinc acetonate and 0.6 g of 2-ethyl-4-imidazole were used. These were mixed in 100 g of toluene to prepare a resin varnish of the epoxy resin composition.
【0047】上述のようにして得られた実施例1〜6お
よび比較例1〜2のエポキシ樹脂組成物における評価法
は、以下のとおりである。The evaluation methods for the epoxy resin compositions of Examples 1 to 6 and Comparative Examples 1 and 2 obtained as described above are as follows.
【0048】エポキシ樹脂組成物の樹脂ワニスをEガラ
スクロスに含浸してプリプレグを作製し、これを4枚重
ねて、200℃−2時間プレス成形して、絶縁基板とし
て積層板を作製する。A resin varnish of an epoxy resin composition is impregnated into E glass cloth to prepare a prepreg, and four prepregs are laminated and pressed at 200 ° C. for 2 hours to prepare a laminate as an insulating substrate.
【0049】この積層板の物性評価は、ガラス転移温
度、誘電率、誘電正接、ピール強度についてJIS−C
6481に従って行った。なお、オーブン耐熱性は、積
層板5枚を260℃の乾燥器内で30分保温し、それぞ
れのふくれ発生等を目視で判定した。そして、この積層
板5枚のうち、何枚ふくれ発生等があったかを不良発生
率として評価した。The evaluation of the physical properties of this laminated plate was conducted according to JIS-C
6481. The oven heat resistance was determined by keeping five laminated plates in a dryer at 260 ° C. for 30 minutes, and visually observing the occurrence of blisters. The number of blisters among the five laminates was evaluated as a defect occurrence rate.
【0050】ガラス転移温度(表中では、Tgと示
す。)、誘電率(表中では、εと示す。)、誘電正接
(表中では、tanδと示す。)、ピール強度、不良発
生率の結果を下記の表1に実施例1〜6および比較例1
〜2についてそれぞれまとめておいた。The glass transition temperature (indicated by Tg in the table), the dielectric constant (indicated by ε in the table), the dielectric loss tangent (indicated by tan δ in the table), the peel strength, and the defect occurrence rate The results are shown in Table 1 below in Examples 1 to 6 and Comparative Example 1.
2 are summarized.
【0051】[0051]
【表1】 [Table 1]
【0052】実施例1〜6および比較例1〜2につい
て、それぞれ比べてみてわかるように、いずれの項目に
おいても、実施例1〜6のものの方が比較例1〜2のも
のよりもはるかに上回った結果が得られており、このこ
とから、本発明のエポキシ樹脂組成物は、高耐熱性と、
低誘電正接を有し、密着性に優れたものになるといえる
ことがわかる。As can be seen from comparison between Examples 1 to 6 and Comparative Examples 1 and 2, in each case, those of Examples 1 to 6 are far more than those of Comparative Examples 1 and 2. Excellent results have been obtained, from this, the epoxy resin composition of the present invention, with high heat resistance,
It can be seen that the material has a low dielectric loss tangent and is excellent in adhesion.
【0053】[0053]
【発明の効果】本発明の請求項1に係るエポキシ樹脂組
成物によると、高耐熱性と、低誘電正接を有し、密着性
に優れたものになる。According to the epoxy resin composition according to the first aspect of the present invention, the epoxy resin composition has high heat resistance, low dielectric loss tangent, and excellent adhesion.
【0054】本発明の請求項2または請求項3に係るエ
ポキシ樹脂組成物によると、請求項1記載の場合に加え
て、高耐熱性と、低誘電正接をより一層確実に有し、密
着性としてもより一層確実に優れたものになる。According to the epoxy resin composition of claim 2 or 3 of the present invention, in addition to the case of claim 1, the epoxy resin composition has high heat resistance and low dielectric loss tangent more reliably, and Will surely be better.
【0055】本発明の請求項4に係るエポキシ樹脂組成
物を用いた絶縁基板によると、高耐熱性と、低誘電正接
を有し、密着性に優れた基板が得られ、その結果、基板
の品質を上げることができるものとなる。According to the insulating substrate using the epoxy resin composition according to claim 4 of the present invention, a substrate having high heat resistance, a low dielectric loss tangent, and excellent adhesion can be obtained. Quality can be improved.
Claims (4)
以上有するエポキシ化合物に下記式〔I〕、式〔II〕、
式〔III 〕の群から選ばれたいずれか1種の多官能エポ
キシ化合物を併用し、ポリフェニレンエーテルをフェノ
ール類とラジカル開始剤の存在下で再分配反応させて得
られたフェノール変性ポリフェニレンエーテルとシアネ
ート化合物、および、硬化促進剤を必須成分として含有
することを特徴とするエポキシ樹脂組成物。 【化1】 【化2】 【化3】 An epoxy compound having at least two epoxy groups in one molecule is represented by the following formula [I], formula [II],
A phenol-modified polyphenylene ether obtained by redistributing a polyphenylene ether with a phenol and a radical initiator in combination with any one of polyfunctional epoxy compounds selected from the group of the formula [III]; An epoxy resin composition comprising a compound and a curing accelerator as essential components. Embedded image Embedded image Embedded image
酸、メチルヘキサヒドロ無水フタル酸、無水メチルハイ
ミック酸の群から選ばれた少なくとも1種の酸無水物が
配合されたものであることを特徴とする請求項1記載の
エポキシ樹脂組成物。2. The method according to claim 1, wherein at least one acid anhydride selected from the group consisting of tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride and methylhymic anhydride is blended with the essential components. The epoxy resin composition according to claim 1,
テルの数平均分子量が、10000以下であることを特
徴とする請求項1または請求項2記載のエポキシ樹脂組
成物。3. The epoxy resin composition according to claim 1, wherein the phenol-modified polyphenylene ether has a number average molecular weight of 10,000 or less.
ポキシ樹脂組成物をガラス基材に含浸させ、硬化させて
なることを特徴とするエポキシ樹脂組成物を用いた絶縁
基板。4. An insulating substrate using an epoxy resin composition, wherein the epoxy resin composition according to claim 1 is impregnated into a glass substrate and cured.
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JP17301198A JP3525745B2 (en) | 1998-06-19 | 1998-06-19 | Epoxy resin composition and insulating substrate using this epoxy resin composition |
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JP17301198A JP3525745B2 (en) | 1998-06-19 | 1998-06-19 | Epoxy resin composition and insulating substrate using this epoxy resin composition |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001062828A1 (en) * | 2000-02-23 | 2001-08-30 | Asahi Kasei Kabushiki Kaisha | Modified polyphenylene ether |
WO2013183303A1 (en) * | 2012-06-08 | 2013-12-12 | 株式会社Adeka | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and hardener for said curable resin composition and resin composition |
JP2015013941A (en) * | 2013-07-04 | 2015-01-22 | パナソニック株式会社 | Resin composition, prepreg and laminate sheet |
-
1998
- 1998-06-19 JP JP17301198A patent/JP3525745B2/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001062828A1 (en) * | 2000-02-23 | 2001-08-30 | Asahi Kasei Kabushiki Kaisha | Modified polyphenylene ether |
WO2013183303A1 (en) * | 2012-06-08 | 2013-12-12 | 株式会社Adeka | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and hardener for said curable resin composition and resin composition |
KR20150031235A (en) | 2012-06-08 | 2015-03-23 | 가부시키가이샤 아데카 | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and hardener for said curable resin composition and resin composition |
JPWO2013183303A1 (en) * | 2012-06-08 | 2016-01-28 | 株式会社Adeka | Curable resin composition, resin composition, resin sheet using these, and cured products thereof |
US9598573B2 (en) | 2012-06-08 | 2017-03-21 | Adeka Corporation | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and cured materials thereof |
KR102008550B1 (en) | 2012-06-08 | 2019-08-07 | 가부시키가이샤 아데카 | Curable resin composition, resin composition, resin sheet formed by using said curable resin composition and resin composition, and hardener for said curable resin composition and resin composition |
JP2015013941A (en) * | 2013-07-04 | 2015-01-22 | パナソニック株式会社 | Resin composition, prepreg and laminate sheet |
Also Published As
Publication number | Publication date |
---|---|
JP3525745B2 (en) | 2004-05-10 |
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